JP6909910B2 - セラミックヒータ - Google Patents
セラミックヒータ Download PDFInfo
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- JP6909910B2 JP6909910B2 JP2020128159A JP2020128159A JP6909910B2 JP 6909910 B2 JP6909910 B2 JP 6909910B2 JP 2020128159 A JP2020128159 A JP 2020128159A JP 2020128159 A JP2020128159 A JP 2020128159A JP 6909910 B2 JP6909910 B2 JP 6909910B2
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- thermocouple
- outer peripheral
- ceramic heater
- ceramic plate
- peripheral side
- Prior art date
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7626—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0432—Apparatus for thermal treatment mainly by conduction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/02—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/02—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples
- G01K7/04—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples the object to be measured not forming one of the thermoelectric materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0202—Switches
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/18—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
- H10P72/0602—Temperature monitoring
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/005—Heaters using a particular layout for the resistive material or resistive elements using multiple resistive elements or resistive zones isolated from each other
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/016—Heaters using particular connecting means
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Resistance Heating (AREA)
Description
ウエハ載置面を有する円盤状のセラミックプレートと、
小径部と大径部とを有し、前記セラミックプレートのうち前記ウエハ載置面とは反対側の裏面に前記大径部の端面が接合された筒状シャフトと、
前記セラミックプレートの内周部に埋設された内周側抵抗発熱体と、
前記セラミックプレートの外周部に埋設された外周側抵抗発熱体と、
前記内周側抵抗発熱体の一対の端子及び前記外周側抵抗発熱体の一対の端子を含む付帯部品と、
前記セラミックプレートの前記裏面のうち前記小径部の内側領域の起点から前記セラミックプレートの外周部の所定の終端位置に至る長穴と、
を備え、
前記筒状シャフトの内部空間は、前記小径部の内径と同じ径の円筒空間と、前記円筒空間の外側に前記大径部によって囲まれた環状の拡張空間とを有し、
前記長穴の入口部分は、長溝であり、
前記長溝は、前記起点から前記セラミックプレートの前記裏面のうち前記拡張空間内の拡張領域に至るように設けられ、
前記付帯部品は、前記セラミックプレートの前記裏面のうち前記小径部の内側領域であって前記長溝以外の位置に設けられている、
ものである。
Claims (14)
- ウエハ載置面を有する円盤状のセラミックプレートと、
小径部と大径部とを有し、前記セラミックプレートのうち前記ウエハ載置面とは反対側の裏面に前記大径部の端面が接合された筒状シャフトと、
前記セラミックプレートの内周部に埋設された内周側抵抗発熱体と、
前記セラミックプレートの外周部に埋設された外周側抵抗発熱体と、
前記内周側抵抗発熱体の一対の端子及び前記外周側抵抗発熱体の一対の端子を含む付帯部品と、
前記セラミックプレートの前記裏面のうち前記小径部の内側領域の起点から前記セラミックプレートの外周部の所定の終端位置に至る長穴と、
を備え、
前記筒状シャフトの内部空間は、前記小径部の内径と同じ径の円筒空間と、前記円筒空間の外側に前記大径部によって囲まれた環状の拡張空間とを有し、
前記長穴の入口部分は、長溝であり、
前記長溝は、前記起点から前記セラミックプレートの前記裏面のうち前記拡張空間内の拡張領域に至るように設けられ、
前記付帯部品は、前記セラミックプレートの前記裏面のうち前記小径部の内側領域であって前記長溝以外の位置に設けられている、
セラミックヒータ。 - 前記長溝は、前記セラミックプレートの半径方向に沿って設けられている、
請求項1に記載のセラミックヒータ。 - 前記長溝は、前記セラミックプレートの半径方向から外れた方向に沿って設けられている、
請求項1に記載のセラミックヒータ。 - 前記長穴は、熱電対を挿入する熱電対挿入用長穴である、
請求項1〜3のいずれか1項に記載のセラミックヒータ。 - 前記長溝は、前記ウエハ載置面に対して垂直方向から水平方向に転換する湾曲部を備えた熱電対ガイドの前記湾曲部を配置するために用いられる、
請求項1〜4のいずれか1項に記載のセラミックヒータ。 - 請求項5に記載のセラミックヒータであって、
前記長溝に配置された前記熱電対ガイドを備える、
セラミックヒータ。 - 請求項6に記載のセラミックヒータであって、
前記熱電対ガイド及び前記長穴に挿入された熱電対を備える、
セラミックヒータ。 - 前記セラミックプレートを前記裏面からみたときに前記熱電対の測温部が前記外周側抵抗発熱体の幅の中に収まるように配置されている、
請求項7に記載のセラミックヒータ。 - 前記長穴は、断面略四角形の穴であり、前記穴の天井面と側面との境界部は、曲率半径が0.5mm以上のR面である、
請求項1〜8のいずれか1項に記載のセラミックヒータ。 - 前記長穴は、前記起点から前記終端位置までの途中にテーパ部を有し、前記起点から前記テーパ部の一端までは幅広部であり、前記テーパ部の他端から前記終端位置までは幅狭部である、
請求項1〜9のいずれか1項に記載のセラミックヒータ。 - 前記長穴の天井面は、前記起点から前記終端位置までの途中に傾斜状の段差を有し、前記天井面のうち前記起点から前記段差までの深さは前記段差から前記終端位置までの深さよりも深い、
請求項1〜10のいずれか1項に記載のセラミックヒータ。 - 前記外周側熱電対の測温部は凸状曲面であり、前記長穴の終端面のうち前記外周側熱電対の測温部が接触する部分は凹状曲面である、
請求項1〜11のいずれか1項に記載のセラミックヒータ。 - 前記長溝と前記付帯部品との間隔は、2mm以上である、
請求項1〜12のいずれか1項に記載のセラミックヒータ。 - 前記長穴の前記起点側の壁は、前記セラミックプレートの前記裏面から前記長穴の奥に向かって湾曲している、
請求項1〜13のいずれか1項に記載のセラミックヒータ。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018238226 | 2018-12-20 | ||
| JP2018238226 | 2018-12-20 | ||
| JP2020514637A JP6743325B1 (ja) | 2018-12-20 | 2019-12-04 | セラミックヒータ |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020514637A Division JP6743325B1 (ja) | 2018-12-20 | 2019-12-04 | セラミックヒータ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020194784A JP2020194784A (ja) | 2020-12-03 |
| JP6909910B2 true JP6909910B2 (ja) | 2021-07-28 |
Family
ID=71100253
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020514637A Active JP6743325B1 (ja) | 2018-12-20 | 2019-12-04 | セラミックヒータ |
| JP2020128159A Active JP6909910B2 (ja) | 2018-12-20 | 2020-07-29 | セラミックヒータ |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020514637A Active JP6743325B1 (ja) | 2018-12-20 | 2019-12-04 | セラミックヒータ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11664244B2 (ja) |
| JP (2) | JP6743325B1 (ja) |
| KR (1) | KR102432592B1 (ja) |
| CN (1) | CN111788862B (ja) |
| TW (1) | TWI767164B (ja) |
| WO (1) | WO2020129641A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12009185B2 (en) * | 2018-02-09 | 2024-06-11 | Applied Materials, Inc. | Semiconductor processing apparatus having improved temperature control |
| JP7197534B2 (ja) * | 2020-06-12 | 2022-12-27 | 日本碍子株式会社 | セラミックヒータ |
| USD1065275S1 (en) * | 2020-09-18 | 2025-03-04 | Ksm Component Co., Ltd. | Ceramic heater |
| JP7372224B2 (ja) * | 2020-10-16 | 2023-10-31 | 日本碍子株式会社 | ウエハ載置台 |
| JP2023170989A (ja) * | 2022-05-20 | 2023-12-01 | 日本特殊陶業株式会社 | セラミックスヒータ |
| WO2026038385A1 (ja) * | 2024-08-16 | 2026-02-19 | 日本碍子株式会社 | セラミックヒータおよびセラミックヒータの製造方法 |
| WO2026038386A1 (ja) * | 2024-08-16 | 2026-02-19 | 日本碍子株式会社 | セラミックヒータ |
Family Cites Families (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6562657B1 (en) * | 2000-08-22 | 2003-05-13 | Charles W. C. Lin | Semiconductor chip assembly with simultaneously electrolessly plated contact terminal and connection joint |
| EP1251551A1 (en) * | 2000-08-30 | 2002-10-23 | Ibiden Co., Ltd. | Ceramic heater for semiconductor manufacturing and inspecting equipment |
| EP1406472A1 (en) * | 2001-07-09 | 2004-04-07 | Ibiden Co., Ltd. | Ceramic heater and ceramic joined article |
| JP3909248B2 (ja) * | 2002-01-28 | 2007-04-25 | 京セラ株式会社 | 試料加熱装置 |
| JP2004296532A (ja) * | 2003-03-25 | 2004-10-21 | Ibiden Co Ltd | ホットプレートユニット |
| JP2005056759A (ja) * | 2003-08-06 | 2005-03-03 | Ngk Insulators Ltd | 加熱装置 |
| US7381673B2 (en) * | 2003-10-27 | 2008-06-03 | Kyocera Corporation | Composite material, wafer holding member and method for manufacturing the same |
| JP2006127883A (ja) * | 2004-10-28 | 2006-05-18 | Kyocera Corp | ヒータ及びウェハ加熱装置 |
| JP2007258115A (ja) * | 2006-03-24 | 2007-10-04 | Ngk Insulators Ltd | 加熱装置 |
| US20070251938A1 (en) * | 2006-04-26 | 2007-11-01 | Watlow Electric Manufacturing Company | Ceramic heater and method of securing a thermocouple thereto |
| JP5245268B2 (ja) * | 2006-06-16 | 2013-07-24 | 東京エレクトロン株式会社 | 載置台構造及び熱処理装置 |
| JP4450106B1 (ja) * | 2008-03-11 | 2010-04-14 | 東京エレクトロン株式会社 | 載置台構造及び処理装置 |
| JP5202175B2 (ja) * | 2008-08-07 | 2013-06-05 | 日本碍子株式会社 | シャフト付きヒータ |
| TWI527500B (zh) * | 2010-05-13 | 2016-03-21 | 應用材料股份有限公司 | 具有獨立中心區控制之加熱器 |
| JP2011243906A (ja) * | 2010-05-21 | 2011-12-01 | Disco Abrasive Syst Ltd | ウエーハの加工方法 |
| JP5791412B2 (ja) * | 2010-07-26 | 2015-10-07 | 日本碍子株式会社 | セラミックヒーター |
| KR101357928B1 (ko) * | 2010-09-24 | 2014-02-03 | 엔지케이 인슐레이터 엘티디 | 반도체 제조 장치 부재 |
| JP2012080103A (ja) * | 2010-10-01 | 2012-04-19 | Ngk Insulators Ltd | サセプター及びその製法 |
| JP2012160368A (ja) * | 2011-02-01 | 2012-08-23 | Nihon Ceratec Co Ltd | セラミックスヒータ及びその製造方法 |
| JP5882614B2 (ja) * | 2011-06-29 | 2016-03-09 | 株式会社日本セラテック | セラミックスヒータ |
| US10276410B2 (en) * | 2011-11-25 | 2019-04-30 | Nhk Spring Co., Ltd. | Substrate support device |
| JP5807032B2 (ja) * | 2012-03-21 | 2015-11-10 | 日本碍子株式会社 | 加熱装置及び半導体製造装置 |
| CN106068251B (zh) * | 2014-03-07 | 2019-12-27 | 日本碍子株式会社 | 接合体的制造方法 |
| CN105282877B (zh) * | 2014-06-17 | 2019-10-25 | 住友电气工业株式会社 | 用于半导体制造装置的陶瓷加热器 |
| TWI665328B (zh) * | 2014-07-02 | 2019-07-11 | Applied Materials, Inc. | 用於電漿處理的多區域基座 |
| JP6650332B2 (ja) * | 2016-04-15 | 2020-02-19 | 日本特殊陶業株式会社 | 基板保持装置及びその製造方法 |
| JP2018018587A (ja) * | 2016-07-25 | 2018-02-01 | 日本特殊陶業株式会社 | 保持装置 |
| KR20180059761A (ko) * | 2016-08-10 | 2018-06-05 | 엔지케이 인슐레이터 엘티디 | 세라믹 히터 |
| JP6767826B2 (ja) * | 2016-09-23 | 2020-10-14 | 日本特殊陶業株式会社 | 加熱装置 |
| US12009185B2 (en) * | 2018-02-09 | 2024-06-11 | Applied Materials, Inc. | Semiconductor processing apparatus having improved temperature control |
-
2019
- 2019-12-04 WO PCT/JP2019/047380 patent/WO2020129641A1/ja not_active Ceased
- 2019-12-04 CN CN201980015453.2A patent/CN111788862B/zh active Active
- 2019-12-04 KR KR1020207022066A patent/KR102432592B1/ko active Active
- 2019-12-04 JP JP2020514637A patent/JP6743325B1/ja active Active
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| JP6743325B1 (ja) | 2020-08-19 |
| JPWO2020129641A1 (ja) | 2021-02-15 |
| CN111788862A (zh) | 2020-10-16 |
| WO2020129641A1 (ja) | 2020-06-25 |
| TWI767164B (zh) | 2022-06-11 |
| TW202031091A (zh) | 2020-08-16 |
| US20200350187A1 (en) | 2020-11-05 |
| KR20200103087A (ko) | 2020-09-01 |
| JP2020194784A (ja) | 2020-12-03 |
| US11664244B2 (en) | 2023-05-30 |
| CN111788862B (zh) | 2022-09-13 |
| KR102432592B1 (ko) | 2022-08-18 |
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