JP6911576B2 - Quantum cascade semiconductor laser - Google Patents

Description

The present invention relates to a quantum cascade semiconductor laser.

The quantum cascade laser (QCL) disclosed in Non-Patent Document 1 has a configuration in which a lower electrode, a semiconductor substrate, a semiconductor laminate, and an upper electrode are sequentially laminated. A metal film is provided on the end face of the QCL laser cavity via an insulating film. _{SiO 2} is used for the insulating film, and Au is used for the metal film. This QCL is mounted on an electronic component via solder.

S.R. Darvish, et al. “High-power, continuous-wave operation of distributed-feedback quantum-cascade lasers at λ ~ 7.8 μm”, Applied Physics Letters 89, 251119, 2006.

Some QCLs have a structure in which a lower electrode, a semiconductor substrate, a semiconductor laminate, and an upper electrode are sequentially laminated. A metal film may be formed as a reflective film on the end face of the QCL laser resonator in order to increase the reflectance of the laser beam on the end face. However, if a metal film is directly formed on the end face, each layer of the semiconductor element portion may be short-circuited on the end face, which may lead to a malfunction of the QCL. Therefore, it is desirable that an insulating film is provided as an underlayer between the end face and the metal film (see, for example, Non-Patent Document 1). These insulating film and metal film are sequentially formed on the end face from the side facing the end face. At this time, the insulating film and the metal film are also formed on the upper electrode and the lower electrode by wrapping around on the upper electrode and the lower electrode. When the QCL on which the insulating film and the metal film are formed in this way is mounted on the electronic component via, for example, solder, the metal film on the lower electrode comes into contact with the solder. When a voltage (for example, a high voltage of 10 V or more) is applied between the upper electrode and the lower electrode for laser oscillation while the metal film is in contact with the solder, the voltage applied to the lower electrode is changed. , Is applied to the metal film via solder. As a result, an equivalent voltage is applied between the metal film on the upper electrode and the upper electrode via the insulating film.

However, since the thickness of the insulating film on the upper electrode tends to be extremely thin (for example, about a fraction) of the thickness of the insulating film on the end face, the thickness of the insulating film on the upper electrode is passed through such an extremely thin insulating film. When a high voltage of, for example, 10 V or more is applied between the metal film and the upper electrode, the insulating film between them may be destroyed. As a result, a large current (so-called inrush current) flows in the vicinity of the end face via the broken portion of the insulating film, and a failure such as end face breakage may occur in the QCL.

If the thickness of the insulating film on the upper electrode is to be increased, it is necessary to further increase the thickness of the insulating film on the end face (for example, about several times). In this case, the time for forming the insulating film on the end face is increased (for example, about several times), so that the productivity of the QCL is lowered. In addition, when such an extremely thick insulating film is formed on the end face, the end face is deteriorated due to an increase in stress generated in the insulating film, cracks in the insulating film, and the end face of the insulating film. There is a risk of peeling.

The present invention has been made in view of such problems, and suppresses destruction of the insulating film in a quantum cascade semiconductor laser having an insulating film and a metal film sequentially laminated on the end faces constituting the laser cavity. The purpose is.

The quantum cascade semiconductor laser according to an embodiment of the present invention includes a semiconductor substrate having a main surface and a back surface facing each other in the first direction, and a substrate end surface intersecting a second direction orthogonal to the first direction, and a semiconductor substrate in the first direction. It has a surface provided on the opposite side of the main surface, a laminated end surface included in a plane including the substrate end surface, a core layer extending along the second direction from the laminated end surface, and a clad layer provided on the core layer. A semiconductor laminate provided on the surface, a first electrode provided on the front surface, a second electrode provided on the back surface, and a first insulating film provided on the laminated end face and the substrate end face and extending over the first electrode. A metal film provided on the laminated end face and the substrate end face via the first insulating film and extending over the first electrode, and a second electrode provided on the substrate end face via the first insulating film and the metal film. It includes a second insulating film that extends over and covers part or all of the metal film.

According to the present invention, in a quantum cascade semiconductor laser having an insulating film and a metal film that are sequentially laminated on the end faces constituting the laser cavity, it is possible to suppress the destruction of the insulating film.

FIG. 1 is a perspective view showing a state in which the quantum cascade semiconductor laser of one embodiment is mounted. FIG. 2 is a perspective view of the quantum cascade semiconductor laser of FIG. FIG. 3 is a cross-sectional view taken along the line III-III of FIG. 4 (a) to 4 (c) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. 5 (a) to 5 (c) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. FIG. 6 is a diagram showing a manufacturing process of the quantum cascade semiconductor laser of FIG. 7 (a) and 7 (b) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. 8 (a) and 8 (b) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. FIG. 9 is a perspective view of a quantum cascade semiconductor laser as a comparative example. FIG. 10 is a cross-sectional view taken along the line XX of FIG. FIG. 11 is a cross-sectional view of the quantum cascade semiconductor laser according to the first modification. FIG. 12 is a diagram showing a manufacturing process of the quantum cascade semiconductor laser of FIG. FIG. 13 is a cross-sectional view of a quantum cascade semiconductor laser according to another example of the first modification. FIG. 14 is a cross-sectional view of the quantum cascade semiconductor laser according to the second modification. 15 (a) to 15 (c) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. FIG. 16 is a cross-sectional view of a quantum cascade semiconductor laser according to another example of the second modification. 17 (a) to 17 (c) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. FIG. 18 is a cross-sectional view of a quantum cascade semiconductor laser according to a third modification. FIG. 19 is a cross-sectional view of a quantum cascade semiconductor laser according to another example of the third modification. FIG. 20 is a cross-sectional view of a quantum cascade semiconductor laser according to a fourth modification. 21 (a) to 21 (c) are diagrams showing a manufacturing process of the quantum cascade semiconductor laser of FIG. 20. FIG. 22 is a cross-sectional view of the quantum cascade semiconductor laser according to the fifth modification.

[Explanation of Embodiments of the Present Invention]
First, the contents of the embodiments of the present invention will be listed and described. The quantum cascade semiconductor laser according to an embodiment of the present invention includes a semiconductor substrate having a main surface and a back surface facing each other in the first direction, and a substrate end surface intersecting a second direction orthogonal to the first direction, and a semiconductor substrate in the first direction. It has a surface provided on the opposite side of the main surface, a laminated end surface included in a plane including the substrate end surface, a core layer extending along the second direction from the laminated end surface, and a clad layer provided on the core layer. A semiconductor laminate provided on the surface, a first electrode provided on the front surface, a second electrode provided on the back surface, and a first insulating film provided on the laminated end face and the substrate end face and extending over the first electrode. A metal film provided on the laminated end face and the substrate end face via the first insulating film and extending over the first electrode, and a second electrode provided on the substrate end face via the first insulating film and the metal film. It includes a second insulating film that extends over and covers part or all of the metal film.

In the quantum cascade semiconductor laser described above, for example, a second electrode is mounted on an electronic component via solder, and a voltage (for example, a high voltage of 10 V or more) is applied between the first electrode and the second electrode. , Laser beam oscillates. Here, if the solder comes into contact with the metal film, the voltage applied to the second electrode is applied to the metal film via the solder, and the first electrode is placed between the metal film on the first electrode and the first electrode. The voltage is applied through the insulating film. Since the first insulating film between the metal film and the first electrode is likely to be formed thin, when such a voltage is applied to the first insulating film, the first insulating film may be destroyed by the voltage. .. However, in the quantum cascade semiconductor laser described above, the second insulating film is provided on the laminated end face via the metal film and is provided over the second electrode. In addition, since the second insulating film covers the metal film, the second insulating film is interposed between the metal film and the solder. Thereby, the contact between the metal film and the above-mentioned solder can be suppressed. That is, the metal film, the second electrode, and the solder described above can be electrically insulated from each other. Therefore, according to the quantum cascade semiconductor laser described above, it is possible to suppress the application of the voltage between the metal film on the first electrode and the first electrode via the first insulating film, and the voltage is applied. The destruction of the first insulating film can be suppressed. As a result, it is possible to suppress the deterioration of the element characteristics of the quantum cascade semiconductor laser described above due to the end face destruction caused by the destruction of the first insulating film.

Further, in the quantum cascade semiconductor laser described above, the second insulating film may extend on the laminated end face, or may extend on the laminated end face and extend over the first electrode. Thereby, the mechanical strength of the first insulating film and the metal film can be increased.

Further, in the quantum cascade semiconductor laser described above, the surface includes a first region and a second region located between the laminated end face and the first region in the second direction, and is provided on the second region. The thickness of the electrode may be thinner than the thickness of the first electrode provided on the first region. By reducing the thickness of the first electrode in the vicinity of the laminated end face and the substrate end face to be the cleaved surface in this way, the cleaved end face and the substrate end face can be easily cleaved. As a result, the yield when manufacturing a quantum cascade semiconductor laser can be increased. Further, since the thickness of the first electrode provided on the second region is thinner than the thickness of the first electrode provided on the first region, it is smaller than the electrical resistance of the first electrode provided on the first region. The electrical resistance of the first electrode provided on the second region is larger. As a result, the leakage current flowing in the vicinity of the laminated end face and the substrate end face can be reduced. As a result, the device characteristics of the quantum cascade semiconductor laser described above can be improved (for example, the threshold current can be reduced). Further, in the quantum cascade semiconductor laser described above, the first electrode may be provided only on the first region. By preventing the first electrode from being provided in the vicinity of the laminated end face and the substrate end face which are cleavage planes in this way, the above effect can be more prominently exhibited.

Further, in the quantum cascade semiconductor laser described above, the back surface includes a third region and a fourth region located between the substrate end face and the third region in the second direction, and is provided on the fourth region. The thickness of the electrode may be thinner than the thickness of the second electrode provided on the third region. By reducing the thickness of the laminated end face to be the cleaved surface and the second electrode in the vicinity of the substrate end face in this way, the cleaved end face and the substrate end face can be easily cleaved. As a result, the yield when manufacturing the above-mentioned quantum cascade semiconductor laser can be increased. Further, since the thickness of the second electrode in the fourth region is thinner than the thickness of the second electrode in the third region, the electricity of the second electrode in the fourth region is larger than the electrical resistance of the second electrode in the third region. The resistance is greater. As a result, the leakage current flowing in the vicinity of the laminated end face and the substrate end face can be reduced. As a result, the device characteristics of the quantum cascade semiconductor laser described above can be improved (for example, the threshold current can be reduced). Further, in the quantum cascade semiconductor laser described above, the second electrode may be provided only on the third region. By preventing the second electrode from being provided in the vicinity of the laminated end face and the substrate end face which are cleavage planes in this way, the above effect can be more prominently exhibited.

Further, the quantum cascade semiconductor laser described above may further include a third insulating film provided between the first electrode and the first insulating film in the first direction. By providing the third insulating film in addition to the first insulating film between the first electrode and the metal film in this way, the insulating region between them (that is, the region composed of the first insulating film and the third insulating film). Can be sufficiently secured. That is, the dielectric strength between the first electrode and the metal film can be enhanced. As a result, even if a voltage for oscillating the laser beam (for example, a high voltage of 10 V or more) is applied between the first electrode and the metal film, the insulating film is destroyed by the voltage. It can be suppressed. That is, it is possible to more reliably suppress the deterioration of the element characteristics of the quantum cascade semiconductor laser described above due to the end face destruction caused by the destruction of the insulating film.

Further, in the quantum cascade semiconductor laser described above, the third insulating film _{may contain at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. These have excellent durability and insulating properties as protective films for laminated end faces and substrate end faces. Further, these are easily formed on the laminated end face and on the substrate end face by using a general dielectric film forming method such as sputtering, CVD, or spin coating. That is, the step of forming the third insulating film can be easily introduced into the step of manufacturing the quantum cascade semiconductor laser described above.

Further, the quantum cascade semiconductor laser described above further includes a fourth insulating film, the first insulating film and the metal film extend over the second electrode, and the fourth insulating film is the second electrode in the first direction. It may be provided between the first insulating film and the first insulating film. By providing the fourth insulating film in addition to the first insulating film between the second electrode and the metal film in this way, the insulating region between them (that is, the region composed of the first insulating film and the fourth insulating film). Can be sufficiently secured. That is, the dielectric strength between the second electrode and the metal film can be enhanced. As a result, even if a voltage for laser oscillation (for example, a high voltage of 10 V or more) is applied between the second electrode and the metal film, the destruction of the insulating film due to the voltage can be suppressed. Can be done. That is, it is possible to more reliably suppress the deterioration of the element characteristics of the quantum cascade semiconductor laser described above due to the end face destruction caused by the destruction of the insulating film.

Further, in the quantum cascade semiconductor laser described above, the fourth insulating film _{may contain at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. These have excellent durability and insulating properties as protective films for laminated end faces and substrate end faces. Further, these are easily formed on the laminated end face and on the substrate end face by using a general dielectric film forming method such as sputtering, CVD, or spin coating. That is, the step of forming the fourth insulating film can be easily introduced into the step of manufacturing the quantum cascade semiconductor laser described above.

Further, in the quantum cascade semiconductor laser described above, the metal film may not be provided on the second electrode. As a result, the metal film and the second electrode can be more reliably electrically insulated from each other. As a result, it is possible to further suppress the application of a voltage for laser oscillation between the metal film on the first electrode and the first electrode via the first insulating film. That is, the destruction of the first insulating film due to the voltage can be further suppressed. This makes it possible to further suppress the deterioration of the element characteristics of the quantum cascade semiconductor laser described above due to the end face destruction caused by the destruction of the first insulating film. Further, in the quantum cascade semiconductor laser described above, the first insulating film may not be provided on the second electrode. As described above, even when the first insulating film is not provided on the second electrode in addition to the metal film, the same effect as described above can be obtained.

Further, in the quantum cascade semiconductor laser described above, at least one of the first insulating film and the second insulating film _{may contain at least one of SiO 2} , SiON, SiN, alumina, BCB resin, or polyimide resin. These have excellent durability and insulating properties as protective films for laminated end faces and substrate end faces. Further, these are easily formed on the laminated end face and on the substrate end face by using a general dielectric film forming method such as sputtering, CVD, or spin coating. That is, the step of forming these insulating films can be easily introduced into the step of manufacturing the quantum cascade semiconductor laser described above.

Further, in the quantum cascade semiconductor laser described above, the metal film may contain Au. As a result, the metal film can effectively function as a reflective film having a high reflectance of, for example, more than 90% on the laminated end face and the substrate end face.

Further, in the quantum cascade semiconductor laser described above, the clad layer may be an InP layer. InP is transparent to oscillated light in the mid-infrared region (does not show light absorption), and is therefore suitable as a material for a clad layer. Further, since InP is a binary mixed crystal and lattice-matched with the InP substrate, the InP layer can be satisfactorily crystal-grown on the InP substrate. Further, since the thermal conductivity of InP is good, heat from the core layer can be satisfactorily released through the clad layer. This makes it possible to enhance the temperature characteristics of the quantum cascade semiconductor laser described above.

Further, in the quantum cascade semiconductor laser described above, the core layer includes a plurality of active layers which are light emitting regions and a plurality of injection layers for injecting carriers into the active layer, and the active layer and the injection layer are the first. They may be arranged alternately along the direction. By providing the injection layer between the active layers in this way, electrons are continuously and smoothly transferred to the adjacent active layers, and the electrons transition between the subbands in the conduction band in the active layer to efficiently emit light. Can occur well. As a result, the oscillation characteristics of the quantum cascade semiconductor laser described above can be improved.

Further, in the quantum cascade semiconductor laser described above, the active layer and the injection layer may include a superlattice sequence of GaInAs / AlInAs. This superlattice sequence can provide transitions between electron subbands in the conduction band within the active layer, which correspond to wavelengths in the mid-infrared region (eg, 3-20 μm). Therefore, it is suitable as a material for the core layer of a quantum cascade semiconductor laser capable of oscillating light having a wavelength in the mid-infrared region.

Further, in the quantum cascade semiconductor laser described above, the semiconductor substrate may be an InP substrate. The semiconductor laminate constituting the quantum cascade semiconductor laser in the mid-infrared region has a lattice constant close to that of InP. Therefore, by using the semiconductor substrate as the InP substrate, the semiconductor laminate can be grown on the semiconductor substrate with good crystal quality. Further, since InP is transparent to light in the mid-infrared region, the InP substrate can function as a clad layer with respect to the core layer.

[Details of Embodiments of the present invention]
A specific example of the quantum cascade semiconductor laser according to the embodiment of the present invention will be described below with reference to the drawings. It should be noted that the present invention is not limited to these examples, and is indicated by the scope of claims, and is intended to include all modifications within the meaning and scope equivalent to the scope of claims. In the following description, the same elements will be designated by the same reference numerals in the description of the drawings, and duplicate description will be omitted.

(Embodiment)
FIG. 1 is a perspective view showing a state in which the quantum cascade semiconductor laser (QCL) 1 of one embodiment is mounted. Note that FIG. 1 shows an XYZ Cartesian coordinate system for ease of understanding. The QCL1 is a distributed feedback (DFB) type element that oscillates single-mode light, and can oscillate in the mid-infrared region of, for example, 3 μm to 20 μm. As shown in FIG. 1, the QCL1 is mounted on the submount 3 mounted on the carrier 2 via the solder 4. Specifically, the QCL1 is die-bonded on the submount 3 using the solder 4 in an epi-up form (a form in which the epitaxially grown side is arranged so as to be the upper surface). The lower electrode of QCL1, which will be described later, is electrically connected to the carrier 2 via the submount 3 and the solder 4. Further, one end of a wire 5 for supplying power to the QCL1 is connected on the upper electrode described later of the QCL1. The other end of the wire 5 is connected to a bonding pad (not shown). The upper electrode of the QCL1 is electrically connected to the bonding pad via the wire 5. The carrier 2 and the bonding pad are electrically connected to an external power source (not shown). Then, by applying a predetermined voltage from the external power source to the upper electrode and the lower electrode of the QCL1, the QCL1 turns on, a current flows inside the QCL1, and the QCL1 oscillates with a laser.

The lengths W1 and L1 of the carrier 2 in the X direction and the Y direction are, for example, 4 mm to 8 mm, respectively, and the thickness H1 of the carrier 2 in the Z direction is, for example, 1 mm to 8 mm. The lengths W2 and L2 of the submount 3 in the X direction and the Y direction are, for example, 1 mm to 4 mm and 2 mm to 4 mm, respectively, and the thickness H2 of the submount 3 in the Z direction is, for example, 0.1 mm to 0.5 mm. be. Further, for example, AIN or CuW is used for the sub mount 3, and for example, Cu or CuW is used for the carrier 2. Further, for the solder 4, for example, AuSn, In or silver paste is used, and for the wire 5, for example, Au wire or the like is used.

FIG. 2 is a perspective view of QCL1 of FIG. FIG. 3 is a cross-sectional view taken along the line III-III of FIG. As shown in FIGS. 2 and 3, the QCL1 includes a semiconductor element portion 10, an insulating film 71 (first insulating film), a metal film 72, and an insulating film 75 (second insulating film). The semiconductor device unit 10 has an embedded heterostructure (BH) current constriction structure. The semiconductor element unit 10 has a rectangular parallelepiped shape with the resonance direction (Y direction) as the longitudinal direction. The length L3 of the semiconductor element portion 10 in the Y direction is, for example, 1 mm to 3 mm, and the length W3 of the semiconductor element portion 10 in the X direction is, for example, 400 μm to 800 μm, in the Z direction of the semiconductor element portion 10. The length (thickness) H3 is, for example, 100 μm to 200 μm. The semiconductor element portion 10 has a rear end surface 10a and a front end surface 10b facing each other in the Y direction. Further, the semiconductor element portion 10 includes a semiconductor substrate 20, a semiconductor laminate 30, two current block portions 40, an upper electrode (first electrode) 50, and a lower electrode (second electrode) 60.

As shown in FIG. 3, the semiconductor substrate 20 is mounted on the submount 3 via the solder 4. The semiconductor substrate 20 is, for example, an n-type InP substrate. The semiconductor substrate 20 has conductivity because a voltage is applied to the upper electrode 50 and the lower electrode 60 to supply a current to the semiconductor laminate 30. Since electrons are used as carriers in QCL1, the conductive type of the semiconductor substrate 20 is usually n type. The semiconductor substrate 20 functions as a lower clad layer with respect to the core layer 33. The semiconductor substrate 20 does not have to function as the lower clad layer, and in that case, the lower clad layer is provided between the semiconductor substrate 20 and the core layer 33. The semiconductor substrate 20 includes a main surface 20a, a back surface 20b, and a substrate end surface 20c. The main surface 20a and the back surface 20b face each other in the thickness direction (Z direction, which is the first direction). The back surface 20b is arranged on the submount 3 side of the semiconductor substrate 20 in the Z direction with respect to the main surface 20a. In one example, the distance between the main surface 20a and the back surface 20b in the Z direction (that is, the thickness of the semiconductor substrate 20 in the Z direction) is 100 nm. The substrate end surface 20c intersects the Y direction (second direction) and connects the main surface 20a and the back surface 20b. The substrate end surface 20c is included in the rear end surface 10a.

The semiconductor laminate 30 is provided on the main surface 20a of the semiconductor substrate 20. The semiconductor laminate 30 includes a top surface (surface) 30a that intersects the Z direction and a laminate end face 30b that intersects the Y direction. The upper surface 30a is provided on the side opposite to the main surface 20a in the Z direction. The laminated end face 30b is included in a plane including the substrate end face 20c. That is, the laminated end face 30b is included in the rear end face 10a including the substrate end face 20c. Further, the semiconductor laminate 30 has a mesa shape. That is, the semiconductor laminate 30 has a predetermined width WM in the X direction and has a striped shape extending along the Y direction, and is located at the central portion of the QCL1 in the X direction. The semiconductor laminate 30 includes both end faces facing each other in the Y direction and both side surfaces facing each other in the X direction. Both end faces of the semiconductor laminate 30 are mirrors for forming a laser resonator of QCL1. One end face of both end faces is included in the laminated end face 30b. The semiconductor laminate 30 includes a buffer layer 32, a core layer 33, a diffraction grating layer 34, an upper clad layer 35, and a contact layer 36, which are sequentially laminated on the semiconductor substrate 20.

The buffer layer 32 and the upper clad layer 35 are, for example, an n-type InP layer. The buffer layer 32, together with the semiconductor substrate 20, functions as a lower clad layer with respect to the core layer 33. The upper clad layer 35 is provided on the core layer 33 via the diffraction grating layer 34. The buffer layer 32 may not be provided in the semiconductor laminate 30. In this case, the core layer 33 is provided on the main surface 20a of the semiconductor substrate 20. The core layer 33 extends from the laminated end face 30b along the Y direction. The core layer 33 has a plurality of unit structures. The plurality of unit structures are arranged side by side in the stacking direction (Z direction), and adjacent unit structures are in contact with each other. The number of unit structures is, for example, several tens. Each unit structure constitutes a superlattice array in which quantum well layers (thickness of several nm) and barrier layers (thickness of several nm) are alternately laminated along the Z direction. GaInAs or GaInAsP is often used for the quantum well layer, and AlInAs is often used for the barrier layer. Also, each unit structure consists of one active layer and one injection layer. The active layer is the light emitting region. The injection layer is provided to inject carriers into the active layer. In one example, the active layer and the infused layer are laminated together along the Z direction to form a GaInAs / AlInAs superlattice sequence.

Here, the light emitting principle of QCL1 will be briefly described. In QCL1, only electrons are used as carriers, and light emission occurs when electrons transition between subbands in the conduction band in the active layer. The light generated by the light emission is amplified in the laser cavity of the QCL1, so that the QCL1 oscillates the laser light in the mid-infrared region. Specifically, QCL1 realizes the following three-level laser operation in the conduction band in the active layer. First, electrons are injected from the injection layer to the upper level of the active layer by tunneling. This electron transitions from the upper level to the lower level of the active layer. At this time, according to this transition, light having a wavelength corresponding to the transition energy (energy difference between the subbands of the upper level and the lower level) is emitted. The electrons that have transitioned to the lower level undergo a non-emission transition to the base level with a short relaxation time due to LO phonon scattering. The behavior of electrons as described above is due to the fact that the energy difference between the lower level and the base level is designed to be the energy of LO phonons in order to cause LO phonon scattering resonantly. .. In this way, the non-emission transition of the electron to the basal level with a short relaxation time realizes a population inversion between the upper level and the lower level in the active layer. The electrons relaxed to the base level move to the upper level of the injection layer in the next stage by a predetermined electric field. After that, by repeating the same operation for, for example, several tens of cycles, the gain required for the laser oscillation of QCL1 can be obtained. Here, by appropriately selecting the material composition of the quantum well layer and the barrier layer and the film thickness of these layers and appropriately adjusting the energy difference between the upper level and the lower level, for example, in 3 μm to 20 μm. QCL1 capable of oscillating in the infrared region is realized.

As shown in FIG. 3, the diffraction grating layer 34 is formed with a diffraction grating 34a having a concavo-convex pattern in which concave portions and convex portions are alternately and repeatedly arranged in a period Λ along the Y direction. The diffraction grating 34a is formed by patterning a resist on the convex diffraction grating layer 34 at intervals of period Λ and then periodically etching a part of the concave diffraction grating layer 34 in the Z direction. Will be done. The period Λ is appropriately set, and only light having a Bragg wavelength corresponding to this period Λ is selectively reflected by the diffraction grating and amplified in the laser cavity. As a result, the QCL1 oscillates a single-mode laser beam only at this Bragg wavelength. The performance of the diffraction grating layer 34 is represented by a coupling coefficient indicating the magnitude of coupling between the waveguide light traveling forward and the waveguide light traveling backward in the laser resonator. In order for the QCL1 to oscillate a single-mode laser beam satisfactorily, it is desirable to use a diffraction grating 34a that can obtain a large coupling coefficient. Therefore, as the material of the diffraction grating layer 34, a semiconductor having a high refractive index, which is advantageous for realizing a large coupling coefficient, is used. In one example, for the diffraction grating layer 34, for example, undoped or n-type GaInAs or the like is used.

The contact layer 36 realizes good ohmic contact with the upper electrode 50. In order to realize good ohmic contact, the contact layer 36 preferably contains a material having a small bandgap and capable of lattice matching with the semiconductor substrate 20. The contact layer 36 is, for example, n-type GaInAs. If good ohmic contact can be realized between the upper clad layer 35 and the upper electrode 50, the contact layer 36 may not be provided on the semiconductor laminate 30.

The two current block portions 40 shown in FIG. 2 function as a current constriction layer for constricting the current (carrier) in the semiconductor laminate 30. The two current block portions 40 have both side surfaces of the semiconductor laminate 30 embedded therein. In other words, the two current block portions 40 are arranged on both side surfaces of the semiconductor laminate 30 on the main surface 20a of the semiconductor substrate 20. An undoped or semi-insulating semiconductor is used for each current block unit 40. Since these semiconductors have high electrical resistance to electrons as carriers, they are suitable as materials for the current block portion 40. Semi-insulating properties of semiconductors are achieved by adding (doping) transition metals such as Fe, Ti, Cr, and Co to III-V compound semiconductors to form deep levels that trap electrons in the forbidden band. Will be done. III-V compound transition metal is added in the semiconductor has a sufficiently high electrical resistance characteristics of the example 10 ⁵ [Omega] cm or more for electrons. Fe is suitable as the above transition metal. When the undoped semiconductor has sufficiently high electrical resistance to electrons, the undoped semiconductor may be applied to the current block unit 40. Examples of the undoped or semi-insulating III-V compound semiconductor include InP, GaInAs, AlInAs, GaInAsP, AlGaInAs and the like. These semiconductors are lattice-matched with the semiconductor substrate 20 and are grown using common growth methods such as molecular beam epitaxy (MBE) and metalorganic vapor phase growth (OMVPE).

The upper electrode 50 and the lower electrode 60 are provided to supply an electric current to the core layer 33. For the upper electrode 50 and the lower electrode 60, for example, Ti / Au, Ti / Pt / Au, or Au / Ge is used. The upper electrode 50 is, for example, a cathode electrode. The upper electrode 50 is provided on the upper surface 30a (specifically, on the contact layer 36) of the semiconductor laminate 30 and on the current block portion 40. The lower electrode 60 is, for example, an anode electrode. The lower electrode 60 is provided between the back surface 20b of the semiconductor substrate 20 and the solder 4. The lower electrode 60 is at a positive potential with respect to the upper electrode 50.

An optical confinement layer may be provided between the core layer 33 and the semiconductor substrate 20 and between the core layer 33 and the upper clad layer 35. The bandgap of the light confinement layer is smaller than the bandgap of the semiconductor substrate 20 and the upper clad layer 35, and larger than the bandgap of the core layer 33. As a result, the electrons injected from the buffer layer 32 are efficiently injected into the core layer 33 without being blocked by the light confinement layer. When the magnitude relationship of the band gap as described above is satisfied, the refractive index of the light confinement layer is larger than that of the semiconductor substrate 20 and the upper clad layer 35 and smaller than that of the core layer 33. Therefore, the semiconductor substrate 20 and the upper clad layer 35 work to confine the light generated in the core layer 33 to the core layer 33 and the light confinement layer, and as a result, the confinement of the light to the core layer 33 is strengthened. The optical confinement layer has a higher refractive index than the semiconductor substrate 20 and the upper clad layer 35 and can be lattice-matched to the semiconductor substrate 20 in order to strengthen the confinement of the waveguide light in the core layer 33. It is desirable to consist of materials. For the light confinement layer, for example, undoped or n-type GaInAs is used.

The insulating film 71 is provided on the rear end surface 10a side of the semiconductor element portion 10 in the Y direction. Specifically, the insulating film 71 is provided on the laminated end face 30b and the substrate end face 20c, and extends over the upper electrode 50 and the lower electrode 60. More specifically, the insulating film 71 covers all the laminated end surface 30b and the substrate end surface 20c, and also covers all the end portion of the upper electrode 50 on the rear end surface 10a side and the end portion of the lower electrode 60 on the rear end surface 10a side. The thickness of the insulating film 71 on the rear end surface 10a in the Y direction is larger than the thickness of the insulating film 71 on the upper electrode 50 in the Z direction and the thickness of the insulating film 71 on the lower electrode 60 in the Z direction. In one example, the thickness of the insulating film 71 on the rear end surface 10a in the Y direction is 100 nm to 200 nm, and the thickness of the insulating film 71 on the upper electrode 50 and the lower electrode 60 in the Z direction is 20 nm to 30 nm. be. The insulating film 71 is a _{dielectric film containing at least one of SiO 2} , SiON, SiN, Al ₂ O ₃ (alumina), BCB resin, and polyimide resin, for example.

The metal film 72 is provided on the laminated end face 30b and the substrate end face 20c via the insulating film 71, and extends over the upper electrode 50 and the lower electrode 60. Specifically, the metal film 72 covers all of the laminated end surface 30b and the substrate end surface 20c, and also covers the end portion of the upper electrode 50 on the rear end surface 10a side and the end portion of the lower electrode 60 on the rear end surface 10a side. The edge of the metal film 72 on the upper electrode 50 is provided on the rear end surface 10a side in the Y direction with respect to the edge of the insulating film 71 on the upper electrode 50, and is not in direct contact with the upper electrode 50. .. Further, the edge of the metal film 72 on the lower electrode 60 is provided on the rear end surface 10a side in the Y direction with respect to the edge of the insulating film 71 on the lower electrode 60, and is not in direct contact with the lower electrode 60. .. The metal film 72 contains, for example, Au and has a high reflectance of, for example, more than 90%.

The insulating film 75 covers a part of the metal film 72. Specifically, the insulating film 75 is provided on the substrate end face 20c via the insulating film 71 and the metal film 72, extends over the lower electrode 60, and covers a part of the insulating film 71 and the metal film 72. There is. The part is provided on the portion of the insulating film 71 and the metal film 72 located on the back surface side of the substrate end surface 20c in the Z direction and on the lower electrode 60. The edge of the insulating film 75 on the lower electrode 60 extends toward the front end surface 10b in the Y direction with respect to the edge of the insulating film 71 and the edge of the metal film 72 on the lower electrode 60, and is in direct contact with the lower electrode 60. is doing. As described above, since the insulating film 75 covers the insulating film 71 and the metal film 72, the metal film 72 is not in direct contact with the solder 4. The thickness of the insulating film 75 on the lower electrode 60 and the metal film 72 in the Z direction is, for example, 100 to 300 nm, and more preferably 150 to 300 nm. The insulating film 75 may be a dielectric film made of the same material as the insulating film 71, or may be a dielectric film made of a material different from the insulating film 71. The insulating film 75 is a _{dielectric film containing, for example, at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin.

An example of a method for producing QCL1 having the above configuration will be described below. 4 (a) to 4 (c), 5 (a) to 5 (c), 6, 7 (a) and 7 (b), and 8 (a) and 8 (b). ) Is a diagram showing a manufacturing process of QCL1 in FIG. 4 (a) to 4 (c) and 6 show a cross section corresponding to a YZ cross section along the line III-III of FIG. 1, and FIGS. 5 (a) to 5 (c) show a cross section. Indicates an XZ cross section. First, a wafer to be the semiconductor substrate 20 is prepared. Then, in the first crystal growth step, the buffer layer 32, the core layer 33, and the diffraction grating layer 34 are crystal-grown in this order on the main surface of the wafer by using a growth method such as MBE and OMVPE. Then, the resist 80 is applied onto the diffraction grating layer 34. Subsequently, as shown in FIG. 4A, a pattern for the diffraction grating 34a is formed on the resist 80 by a conventional photolithography technique. At this time, the width of the pattern of the resist 80 in the Y direction is Λ. Subsequently, by etching the diffraction grating layer 34 in the Z direction, a periodic structure for the diffraction grating 34a is formed on the diffraction grating layer 34, as shown in FIG. 4 (b).

Next, in the second crystal growth step, as shown in FIG. 4C, the upper clad layer 35 and the contact layer 36 are crystal-grown on the diffraction grating layer 34 in this order. Next, as shown in FIG. 5A, the mask 81 is formed in the region to be the semiconductor laminate 30 by a normal photolithography technique. The region of the semiconductor laminate 30 has a predetermined width WM in the X direction and extends in the Y direction at the center of the QCL1 in the X direction. For the mask 81, for example, the same material as that of the insulating film 71 is used. That is, a dielectric material containing at least one of SiN, SiON, alumina, and SiO _{2 is used for the mask 81.}

Then, using this mask 81, the contact layer 36, the upper clad layer 35, the diffraction grating layer 34, the core layer 33, the buffer layer 32, and the semiconductor substrate 20 are etched in the Z direction in FIG. 5 (b). ), A mesa-shaped semiconductor lamination 30 is formed. As the etching of the semiconductor laminate 30, dry etching or wet etching can be applied, but it is preferable to apply dry etching. The reason is that the predetermined width WM of the semiconductor laminate 30 has a great influence on the element characteristics of the QCL1, so that the predetermined width WM can be processed with high accuracy by dry etching having excellent vertical etching properties. As the dry etching, for example, reactive ion etching (RIE) can be used. In reactive ion etching, a plasma-like etching gas is used.

Next, in the third crystal growth step, a semi-insulating semiconductor layer such as InP to which Fe is added is grown with the mask 81 left on the semiconductor laminate 30. At this time, as shown in FIG. 5 (c), crystal growth is not performed on the mask 81, and the crystals are removed by etching in two regions on both side surfaces of the semiconductor laminate 30 (that is, in FIG. 5 (b)). The semiconductor layer is grown so as to embed (two regions corresponding to the portions). In this way, the two current block portions 40 are formed. Next, after removing the mask 81, the upper electrode 50 is formed on the upper surface 30a of the semiconductor laminate 30 as shown in FIG. Then, the thickness of the wafer is reduced to a thickness that can be cleaved (for example, 100 to 200 μm) by polishing or the like, and then the lower electrode 60 is formed on the back surface 20b of the semiconductor substrate 20 as shown in FIG.

Through the above steps, as shown in FIG. 7A, a plurality of semiconductor element portions 10 of the QCL1 are formed in a state of being aligned in the X direction and the Y direction on the entire surface of the wafer. Note that FIG. 7A shows boundary lines B1 and B2 between the semiconductor element portions 10 when the plurality of semiconductor element portions 10 are individually divided. The boundary line B1 is along the X direction, and the boundary line B2 is along the Y direction. Then, the plurality of semiconductor element portions 10 are cleaved at the boundary line B1 to cause cracks in the wafer along the boundary line B1. As a result, the wafer is divided along the boundary line B1 to form the chip bar 85 as shown in FIG. 7 (b). The chip bar 85 is composed of a plurality of semiconductor element portions 10 arranged along the X direction. The tip bar 85 has an end face 85a including a rear end face 10a of QCL1 in the X direction.

Subsequently, a step of forming the insulating film 71 and the metal film 72 on the end face 85a will be described. First, as shown in FIG. 8A, two protective plates 90 are prepared in order to form the insulating film 71 in a desired region of the chip bar 85. The desired region is a part of the region including the end face 85a of the tip bar 85. The protective plate 90 has a rectangular thin plate shape with the X direction as the longitudinal direction. As shown in FIG. 8A, one protective plate 90 is used to cover all the upper electrodes 50 included in the other regions of the chip bar 85 except the partial region. Then, another protective plate 90 is used to cover all the lower electrodes 60 included in the other region of the chip bar 85. Next, the insulating film 71 is formed on the end face 85a. Specifically, for example, CVD or sputtering is used to deposit the constituent atoms of the insulating film 71 on the end face 85a from the side facing the end face 85a. The side facing the end face 85a refers to a position facing the end face 85a in the normal direction of the end face 85a. At this time, the insulating film 71 is also formed on the upper electrode 50 and the lower electrode 60 by wrapping around on the upper electrode 50 and the lower electrode 60. In this way, the insulating film 71 is formed in the partial region of the chip bar 85.

Subsequently, a metal film 72 is formed on the end face 85a. Specifically, for example, electron beam deposition is used to deposit the constituent atoms of the metal film 72 on the end face 85a from the side facing the end face 85a. At this time, the metal film 72 is also formed on the insulating film 71 on the upper electrode 50 and the lower electrode 60 by wrapping around on the upper electrode 50 and the lower electrode 60. In this way, the metal film 72 is formed in the portion of the chip bar 85. The length of the protective plate 90 used when forming the metal film 72 in the Y direction is longer than the length of the protective plate 90 used when forming the insulating film 71 in the Y direction. As a result, the edge of the insulating film 71 on the upper electrode 50 is located on the side opposite to the end face 85a in the Y direction with respect to the edge of the metal film 72 on the upper electrode 50, so that the metal film 72 is located on the upper electrode 50. It is possible to prevent the occurrence of a short circuit due to direct contact with the metal.

Subsequently, a step of forming the insulating film 75 on the end face 85a will be described. First, as shown in FIG. 8B, the lower electrode 60 is covered with the protective plate 90, and the upper electrode 50 is covered with the protective plate 91 instead of the protective plate 90 that covered the upper electrode 50. The L-shaped bent portion of the protective plate 91 covers all the portions of the end surface 85a located on the upper electrode 50 side in the Z direction with respect to the position where the edge of the insulating film 75 is formed. The portion of the protective plate 91 other than the bent portion covers the entire upper electrode 50. Next, the insulating film 75 is formed on the end face 85a. Specifically, for example, CVD or sputtering is used to deposit the constituent atoms of the insulating film 75 on the end face 85a from the side facing the end face 85a. At this time, the insulating film 75 is also formed on the metal film 72 on the lower electrode 60 by wrapping around on the lower electrode 60. In this way, the insulating film 75 is formed.

Finally, the chip bar 85 is cleaved along the boundary line B2 along the Y direction (see FIG. 7B) to cause cracks in the wafer along the boundary line B2. As a result, the tip bar 85 is individually divided along the boundary line B2. Finally, QCL1 as shown in FIG. 1 is formed.

The effects obtained by the QCL1 of the present embodiment described above will be described together with the problems of the prior art. The QCL is promising as a light source that can be used in technical fields where high growth is expected in the future, such as environmental gas analysis, medical diagnosis, and industrial processing. The QCL can generate laser oscillation light in the mid-infrared region (for example, wavelength 3 μm to 30 μm). The QCL is expected as a light source that realizes miniaturization and cost reduction, and is currently being actively developed. In particular, in the field of gas sensing, which is promising in the mid-infrared region, it is necessary to detect only the absorption line of a specific gas, so the development of a DFB-type QCL capable of single-mode operation in the mid-infrared region has become the mainstream. ing. In such a QCL, in principle, non-emission recombination due to LO phonon scattering or the like occurs remarkably, so that the threshold current required for laser oscillation of the QCL increases from several hundred mA to several A. The power consumption of the QCL also increases. Such an increase in the threshold current is one of the factors that hinder the practical use of the QCL. Therefore, in order to suppress such an increase in the threshold current, it is conceivable to provide a metal film on the end face constituting the QCL laser cavity.

Here, the structure of the QCL in which the metal film is provided on the end face will be described as a comparative example. FIG. 9 is a perspective view of the QCL100 as a comparative example. FIG. 10 is a cross-sectional view taken along the line XX of FIG. In each figure, an XYZ Cartesian coordinate system is shown for easy understanding. Further, since the QCL 100 is actually mounted on the submount via the solder 4, FIG. 10 shows a state in which the solder 4 is attached under the QCL 100. The current constriction structure of the QCL100 is an embedded heterostructure similar to the structure of the QCL1 of the present embodiment. As shown in FIG. 9, the QCL100 includes a semiconductor element portion 10, an insulating film 71, and a metal film 72.

The difference between the QCL100 and the QCL1 of the present embodiment is that the QCL100 does not have the insulating film 75. When this QCL100 is mounted on the submount via the solder 4, the metal film 72 on the lower electrode 60 comes into contact with the solder 4. When a voltage (for example, a high voltage of 10 V or more) is applied between the upper electrode 50 and the lower electrode 60 for laser oscillation of the QCL100 while the metal film 72 is in contact with the solder 4, the lower electrode The voltage applied to the 60 is applied to the metal film 72 via the solder 4. As a result, the voltage is applied between the metal film 72 on the upper electrode 50 and the upper electrode 50 via the insulating film 71.

However, as described above, the thickness T2 of the insulating film 71 on the upper electrode 50 tends to be extremely thinner than the thickness T1 of the insulating film 71 on the rear end surface 10a, so such an extremely thin insulating film 71 is used. When a high voltage of, for example, 10 V or more is applied between the metal film 72 on the upper electrode 50 and the upper electrode 50, the insulating film 71 between them may be destroyed. As a result, a large current (so-called inrush current) flows in the vicinity of the rear end surface 10a via the broken portion of the insulating film 71, and there is a possibility that a failure such as end face destruction may occur in the QCL 100. If the thickness of the insulating film 71 on the upper electrode 50 is to be increased, the thickness of the insulating film 71 on the rear end surface 10a needs to be further increased (for example, about several times). In this case, the time for forming the insulating film 71 on the rear end surface 10a increases (for example, about several times), so that the productivity of the QCL 100 decreases. In addition, when such an extremely thick insulating film 71 is formed on the rear end surface 10a, the rear end surface 10a is deteriorated due to the increase in stress generated in the insulating film 71, and the insulating film 71 is cracked or insulated. There is a risk of peeling from the rear end surface 10a of the film 71.

On the other hand, in the QCL1 of the present embodiment, as shown in FIG. 3, the insulating film 75 is provided on the substrate end face 20c via the metal film 72 and is provided over the lower electrode 60. In addition, since the insulating film 75 covers the entire metal film 72 on the lower electrode 60, the insulating film 75 is interposed between the metal film 72 and the solder 4. As a result, contact between the metal film 72 and the solder 4 can be suppressed. That is, the metal film 72, the lower electrode 60, and the solder 4 can be electrically insulated from each other. Therefore, according to the above-mentioned QCL1, it is possible to suppress the application of the voltage between the metal film 72 on the upper electrode 50 and the upper electrode 50 via the insulating film 71, and the insulating film 71 due to the voltage can be suppressed. Destruction can be suppressed. As a result, deterioration of the element characteristics of the QCL1 due to end face destruction or the like caused by the destruction of the insulating film 71 can be suppressed. The metal film 72 covers at least all of the laminated end face 30b in which most of the waveguide light in the laser cavity of QCL1 is distributed, so that the metal film 72 preferably functions as a highly reflective film that reflects the waveguide light. be able to. Thereby, the element characteristics of QCL1 can be improved (for example, the threshold current can be reduced).

Further, as in the present embodiment, at least one of the insulating film 71 and the insulating film 75 _{may contain at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. They have excellent durability and insulation. Further, these are easily formed by using a general dielectric film forming method such as sputtering, CVD, or spin coating. That is, the film forming steps of the insulating films 71 and 75 can be easily introduced into the QCL1 manufacturing step described above.

Further, as in the present embodiment, the metal film 72 may include Au. As a result, the metal film 72 can be effectively functioned as a highly reflective film having a reflectance of, for example, more than 90% on the rear end surface 10a.

Further, as in the present embodiment, the upper clad layer 35 may be an InP layer. Since InP is transparent to oscillated light in the mid-infrared region (does not show light absorption), it is suitable as a material for the upper clad layer 35. Further, since InP is a binary mixed crystal and lattice-matched with the semiconductor substrate 20 of InP, the InP layer can be satisfactorily crystal-grown on the InP substrate. Further, since the thermal conductivity of InP is good, heat from the core layer 33 can be satisfactorily released through the upper clad layer 35. Thereby, the temperature characteristic of QCL1 can be enhanced.

Further, as in the present embodiment, the core layer 33 includes a plurality of active layers which are light emitting regions and a plurality of injection layers for injecting carriers into the active layer, and the active layer and the injection layer are in the Z direction. It may be arranged alternately along. By providing the injection layer between the active layers in this way, the electrons are continuously and smoothly transferred to the adjacent active layers, and the emission is efficient due to the electrons transitioning between the subbands in the conduction band in the active layer. Can occur well. As a result, the oscillation characteristics of QCL1 can be improved.

Further, as in the present embodiment, the active layer and the injection layer may each include a superlattice sequence of GaInAs / AlInAs. This superlattice sequence can provide transitions between electron subbands in the conduction band within the active layer, which correspond to wavelengths in the mid-infrared region (eg, 3-20 μm). Therefore, it is suitable as a material for the core layer 33 of QCL1 capable of oscillating light having a wavelength in the mid-infrared region.

Further, as in the present embodiment, the semiconductor substrate 20 may be an InP substrate. The semiconductor laminate 30 constituting QCL1 has a lattice constant close to that of InP. Therefore, by using the semiconductor substrate 20 as an InP substrate, the semiconductor laminate 30 can be grown on the semiconductor substrate 20 with good crystal quality. Further, since InP is transparent to light in the mid-infrared region, the InP substrate can function as a lower clad layer with respect to the core layer 33.

(First modification)
FIG. 11 is a cross-sectional view of QCL1A according to the first modification of the above embodiment. Note that FIG. 11 shows a YZ cross section including the semiconductor laminate 30 of QCL1A. Further, since the QCL1A is actually mounted on the submount 3 via the solder 4 as in the above embodiment, FIG. 11 shows a state in which the solder 4 is attached under the QCL1A. .. The difference between this modification and the above embodiment is the range in which the insulating film is provided. That is, the insulating film 75A according to the present modification extends from the substrate end surface 20c to the laminated end surface 30b in addition to the configuration of the insulating film 75 of the above embodiment. Specifically, the insulating film 75A completely covers the laminated end face 30b and the substrate end face 20c via the insulating film 71 and the metal film 72. The thickness of the insulating film 75A on the laminated end face 30b in the Y direction is, for example, 100 to 300 nm. By providing the insulating film 75A on the laminated end face 30b and the substrate end face 20c in this way, the mechanical strength of the insulating film 71 and the metal film 72 can be increased. Further, even when the insulating film 75A is provided in this way, the metal film 72 can effectively function as a highly reflective film, as in the above embodiment.

Subsequently, an example of the method for producing QCL1A according to this modification will be described below. The method for producing QCL1A according to this modification is the same as that of the above embodiment up to the step of forming the metal film 72 on the end face 85a (see FIG. 8A). Therefore, in the following, the description up to that step will be omitted, and the steps after the step of forming the insulating film 75A on the end face 85a will be described. FIG. 12 is a diagram showing a manufacturing process of QCL1A of FIG. First, a new protective plate 92 having a rectangular thin plate shape with the X direction as the longitudinal direction is prepared. The length of the protective plate 92 in the Y direction is longer than the length of the protective plate 90 in the Y direction, and is a length that can cover the entire upper electrode 50. Then, as shown in FIG. 12, the lower electrode 60 is covered with the protective plate 90, and the upper electrode 50 is completely covered with the protective plate 92 instead of the protective plate 90 that covered the upper electrode 50. At this time, the protective plate 92 also covers the insulating film 71 and the metal film 72 on the upper electrode 50.

Next, an insulating film 75A is formed on the end face 85a. Specifically, for example, CVD or sputtering is used to deposit the constituent atoms of the insulating film 75A on the end face 85a from the side facing the end face 85a. At this time, the insulating film 75A is formed over the entire end face 85a, and is also formed on the lower electrode 60 by wrapping around the lower electrode 60. Since the upper electrode 50 is covered with the protective plate 92, the insulating film 75A is not formed on the upper electrode 50. In this way, the insulating film 75A is formed on the end face 85a. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

FIG. 13 is a cross-sectional view of QCL1B according to another example of this modification. FIG. 13 shows a YZ cross section including the semiconductor laminate 30 of QCL1B. Since the QCL1B is actually mounted on the submount 3 via the solder 4 as in the above embodiment, FIG. 13 shows a state in which the solder 4 is attached under the QCL1B. As shown in FIG. 13, in addition to the configuration of the insulating film 75 of the above embodiment, the insulating film 75B extends on the laminated end face 30b and extends over the upper electrode 50. That is, the insulating film 75B covers all of the insulating film 71 and the metal film 72. The edge of the insulating film 75B extends toward the front end surface 10b in the Y direction with respect to the edges of the insulating film 71 and the metal film 72 on the upper electrode 50, and is in direct contact with the upper electrode 50.

By providing the insulating film 75B on the laminated end face 30b and the upper electrode 50 in this way, the above effect can be more prominently exhibited. That is, according to QCL1B according to this modification, the mechanical strength of the insulating film 71 and the metal film 72 can be further increased. The method for producing QCL1B is the same as that of the above embodiment up to the step of forming the metal film 72 on the end face 85a (see FIG. 8A). After that step, in the method for producing QCL1B, the upper electrode 50 is replaced with the protective plate 90 that covers the upper electrode 50 and the lower electrode 60 by a protective plate having a length slightly shorter in the Y direction than the protective plate 90. And covers the lower electrode 60. Then, an insulating film 75B is formed on the end face 85a. At this time, the insulating film 75B is also formed on the metal film 72 on the upper electrode 50 and the lower electrode 60 by wrapping around on the upper electrode 50 and the lower electrode 60. In this way, the insulating film 75B is formed.

(Second modification)
FIG. 14 is a cross-sectional view of QCL1C according to the second modification of the above embodiment. Note that FIG. 14 shows a YZ cross section including the semiconductor laminate 30 of QCL1C. The difference between this modification and the above embodiment is the thickness of the upper electrode and the lower electrode. That is, a part of the upper electrode 50A and the lower electrode 60A of this modified example is thinned. As shown in FIG. 14, the upper surface 30a includes a region 30c (first region) and a region 30d (second region) located between the laminated end faces 30b and the region 30c in the Y direction. The regions 30c and 30d are arranged along the Y direction. The region 30c is a region excluding the region 30d of the upper surface 30a and is connected to the front end surface 10b. The region 30d is a region provided at one end of the upper surface 30a in the Y direction and is connected to the rear end surface 10a. The upper electrode 50A is provided on the region 30c and on the region 30d. The thickness of the upper electrode 50A provided on the region 30d is thinner than the thickness of the upper electrode 50A provided on the region 30c.

The back surface 20b includes a region 20f (third region) and a region 20g (fourth region) located between the substrate end surface 20c and the region 30c in the Y direction. The region 20f and the region 20g are arranged along the Y direction. The region 20f is a region excluding the region 20g of the back surface 20b and is connected to the front end surface 10b. The region 20g is a region provided at one end of the back surface 20b in the Y direction and is connected to the rear end surface 10a. The lower electrode 60A is provided on the region 20f and on the region 20g. The thickness of the lower electrode 60A provided on the region 20g is thinner than the thickness of the lower electrode 60A provided on the region 20f.

The thickness of the upper electrode 50A provided on the region 30c in the Z direction and the thickness of the lower electrode 60A provided on the region 20f in the Z direction are, for example, 5 μm to 10 μm in order to suppress a decrease in heat dissipation of QCL1C. Is set to the thickness of. On the other hand, the thickness of the upper electrode 50A provided on the region 30d in the Z direction and the thickness of the lower electrode 60A provided on the region 20g in the Z direction are, for example, 0.5 to 1 μm. Further, the length of the upper electrode 50A provided on the region 30d in the Y direction (that is, the length of the region 30d in the Y direction) and the length of the lower electrode 60A provided on the region 20g in the Y direction (that is, the region 20g). The length in the Y direction) is, for example, 10 to 100 μm.

The insulating film 71, the insulating film 75, and the metal film 72 extend from the region 20g over the region 20f. The insulating film 71 and the metal film 72 further extend from the region 30d to the region 30c. The insulating film 71 is formed with a stepped portion 71a near the boundary between the upper electrode 50A provided on the region 30c and the upper electrode 50A provided on the region 30d. Further, the insulating film 71 is formed with a stepped portion 71b near the boundary between the lower electrode 60A provided on the region 20f and the lower electrode 60A provided on the region 20g. In one example, the stepped portion 71a and the stepped portion 71b are orthogonal to the Y direction.

By reducing the thickness of the upper electrode 50A and the lower electrode 60A in the vicinity of the rear end surface 10a (that is, the laminated end surface 30b and the substrate end surface 20c) which becomes the cleavage surface in this way, the rear end surface 10a can be easily cleaved. .. As a result, the yield when producing QCL1C can be increased. Further, since the thickness of the upper electrode 50A provided on the region 30d is thinner than the thickness of the upper electrode 50A provided on the region 30c, the region is larger than the electrical resistance of the upper electrode 50A provided on the region 30c. The electrical resistance of the upper electrode 50A provided on 30d is larger. Further, since the thickness of the lower electrode 60A provided on the region 20g is thinner than the thickness of the lower electrode 60A provided on the region 20f, the region is larger than the electrical resistance of the lower electrode 60A provided on the region 20f. The electrical resistance of the lower electrode 60A provided on 20 g is larger. As a result, the leakage current flowing in the vicinity of the rear end surface 10a can be reduced. As a result, the element characteristics of QCL1C can be improved (for example, the threshold current can be reduced). Further, even when the thickness of the upper electrode 50A provided on the region 30d and the thickness of the lower electrode 60A provided on the region 20g are reduced in this way, the same effect as that of the above-described embodiment can be obtained. It can be played favorably.

Subsequently, an example of the method for producing QCL1C according to this modification will be described below. The method for producing QCL1C according to this modification is the same as that of the above embodiment up to the third crystal growth step (see FIG. 5C) for forming the two current block portions 40. Therefore, the description up to that step will be omitted, and the steps after the step of forming the upper electrode 50A on the semiconductor laminate 30 will be described. 15 (a) to 15 (c) are views showing the manufacturing process of QCL1C of FIG. 15 (a) to 15 (c) show a YZ cross section including the semiconductor laminate 30 of QCL1C. First, as shown in FIG. 15A, a thin metal film 51 to be the upper electrode 50A is formed on the entire surface of the upper surface 30a of the semiconductor laminate 30. Then, the resist 86 is patterned so as to cover the metal film 51 provided on the region 30d.

Next, as shown in FIG. 15B, a metal film 51 is further formed on the thinly formed metal film 51. At this time, since the metal film 51 is not formed on the resist 86, the metal film 51 is further formed only on the metal film 51 provided on the region 30c. As a result, the thickness of the metal film 51 provided on the region 30d becomes smaller than the thickness of the metal film 51 provided on the region 30c. In this way, the upper electrode 50A is formed on the upper surface 30a. Next, the resist 86 is removed as shown in FIG. 15 (c). Subsequently, the lower electrode 60A is formed on the back surface 20b of the semiconductor substrate 20 in the same manner as in the step of forming the upper electrode 50A. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

Here, when the metal film 72 is formed on the end face 85a from the side facing the end face 85a, the metal particles constituting the metal film 72 are repelled at the step portion 71a, so that the metal film 72 is on the region 30c. It becomes difficult to wrap around on the upper electrode 50A provided in. As a result, the metal film 72 is less likely to be formed on the upper electrode 50A provided on the region 30c, so that the electrical insulation between the metal film 72 and the upper electrode 50A can be further ensured. Further, at this time, since the metal particles constituting the metal film 72 are also repelled by the step portion 71b, it becomes difficult for the metal film 72 to wrap around on the lower electrode 60A provided on the region 20f. As a result, the metal film 72 is less likely to be formed on the lower electrode 60A provided on the region 20f, so that the electrical insulation between the metal film 72 and the lower electrode 60A can be further ensured. That is, according to the QCL1C of the present modification, the insulating property in the vicinity of the rear end surface 10a can be enhanced, and the destruction of the insulating film 71 in the vicinity of the rear end surface 10a can be suppressed.

In this modification, the thicknesses of both the upper electrode 50A provided on the region 30d and the lower electrode 60A provided on the region 20g are provided on the upper electrode 50A provided on the region 30c and the region 20f. Although the case where each of the lower electrodes is thinner than the thickness of the lower electrode 60A is illustrated, only the upper electrode 50A provided on the region 30d may be thinner than the upper electrode 50A provided on the region 30c and is provided on the region 20g. Only the lower electrode 60A may be thinner than the lower electrode 60A provided on the region 20f. Even in such a case, the above effect can be preferably achieved.

FIG. 16 is a cross-sectional view of QCL1D according to another example of this modification. As shown in FIG. 16, the upper electrode 50A may be provided only on the region 30c, and the lower electrode 60A may be provided only on the region 20f. That is, the upper electrode 50A is not provided on the region 30d, and the lower electrode 60A is not provided on the region 20g. The insulating film 71, the insulating film 75, and the metal film 72 extend from the region 20g over the region 20f. The insulating film 71 and the metal film 72 further extend from the region 30d to the region 30c.

By preventing the upper electrode 50A and the lower electrode 60A from being provided in the vicinity of the rear end surface 10a in this way, the above effect can be more prominently exhibited. That is, according to this QCL1D, cleavage can be made more easily on the rear end surface 10a. As a result, the yield when producing QCL1D can be further increased. Further, since the upper electrode 50A and the lower electrode 60A are not provided in the vicinity of the rear end surface 10a, the electric resistance in the vicinity of the rear end surface 10a can be further increased. As a result, the leakage current flowing in the vicinity of the rear end surface 10a can be further reduced. As a result, the element characteristics of QCL1D can be further improved (for example, the threshold current can be reduced).

When producing QCL1D, the following steps are performed after the third crystal growth step (see FIG. 5C) for forming the two current block portions 40 of the above embodiment. 17 (a) to 17 (c) are views showing the manufacturing process of QCL1D of FIG. 17 (a) to 17 (c) show a YZ cross section including the semiconductor laminate 30 of QCL1D. First, as shown in FIG. 17A, the resist 87 is patterned so as to cover the region 30d. Next, as shown in FIG. 17B, a metal film 52 to be the upper electrode 50A is formed on the region 30c and the resist 87 by vapor deposition or the like. Next, as shown in FIG. 17 (c), the resist 87 is removed by lift-off. As a result, the resist 87 and the metal film 52 formed on the resist 87 are simultaneously removed. In this way, the upper electrode 50A is formed on the upper surface 30a.

Subsequently, the lower electrode 60A is formed on the back surface 20b of the semiconductor substrate 20 in the same manner as in the step of forming the upper electrode 50A. In this way, the semiconductor element portion 10A of the QCL1D according to this modification is completed. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted. In QCL1D, the case where both the upper electrode 50A and the lower electrode 60A are provided only on the region 30c and the region 20f is illustrated, but the configuration in which the upper electrode 50A is provided only on the region 30c, the lower portion Only one of the configurations in which the electrode 60A is provided only on the region 20f may be adopted. Even in such a case, the above effect can be preferably achieved.

(Third modification example)
FIG. 18 is a cross-sectional view of the QCL1E according to the third modification of the above embodiment. Note that FIG. 18 shows a YZ cross section including the semiconductor laminate 30 of QCL1E. The difference between this modification and the above embodiment is the range in which the metal film is provided. That is, as shown in FIG. 18, the metal film 72A according to this modification is not provided on the lower electrode 60, but is provided only on the rear end surface 10a and the upper electrode 50. By not providing the metal film 72A on the lower electrode 60 in this way, the metal film 72A and the lower electrode 60 can be more reliably electrically insulated from each other. As a result, it is possible to further suppress the application of a voltage for laser oscillation between the metal film 72A on the upper electrode 50 and the upper electrode 50 via the insulating film 71. That is, the destruction of the insulating film 71 due to the voltage can be further suppressed. As a result, deterioration of the element characteristics of the QCL1E due to end face destruction or the like caused by the destruction of the insulating film 71 can be further suppressed.

Subsequently, an example of the method for producing QCL1E according to this modification will be described below. The method for producing the QCL1E according to this modification is the same as that of the above embodiment up to the step of forming the insulating film 71 on the end face 85a (see FIG. 8A). Therefore, in the following, the description up to that step will be omitted, and the steps after the step of forming the metal film 72A on the end face 85a will be described. First, the protective plate 92 used in the above first modification is prepared. The upper electrode 50 is covered with the protective plate 90, and the lower electrode 60 is completely covered with the protective plate 92 instead of the protective plate 90 that covered the lower electrode 60. At this time, the protective plate 92 also covers the insulating film 71 on the lower electrode 60.

Next, a metal film 72A is formed on the end face 85a. Specifically, for example, electron beam deposition is used to deposit the constituent atoms of the metal film 72A on the end face 85a from the side facing the end face 85a. At this time, the metal film 72A is also formed on the upper electrode 50 by wrapping around on the upper electrode 50. Since the lower electrode 60 is covered with the protective plate 92, the metal film 72A is not formed on the lower electrode 60. In this way, the metal film 72A is formed. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

In the above method for producing QCL1E, the metal film 72A is formed by using the protective plate 92, but the metal film 72A can also be formed without using the protective plate 92. In this case, after the step of forming the insulating film 71 on the end face 85a, the metal film 72A is subsequently formed on the end face 85a. At this time, the constituent atoms of the metal film 72A are deposited on the end face 85a from a position higher than the side facing the end face 85a. That is, the constituent atoms are deposited on the insulating film 71 on the end face 85a from diagonally above with respect to the normal direction along the Y direction of the end face 85a. As a result, the metal film 72A does not wrap around on the lower electrode 60, so that the metal film 72A is not formed on the lower electrode 60.

FIG. 19 is a cross-sectional view of QCL1F according to another example of this modification. Note that FIG. 19 shows a YZ cross section including the semiconductor laminate 30 of QCL1F. In the QCL1F according to this modification, as shown in FIG. 19, in addition to the metal film 72A, the insulating film 71A is not provided on the lower electrode 60, but is provided only on the rear end surface 10a and the upper electrode 50. Has been done. Even when the insulating film 71A is not provided on the lower electrode 60 as described above, the same effect as described above can be obtained. When producing QCL1F, the following steps are performed after the step of forming the tip bar 85 (see FIG. 7B of the above embodiment). First, the upper electrode 50 is covered with the protective plate 90, and the lower electrode 60 is completely covered with the protective plate 92. At this time, the protective plate 92 also covers the edge of the insulating film 71 in the Z direction adjacent to the lower electrode 60 in the Y direction. After that, the insulating film 71A and the metal film 72A are continuously formed on the end face 85a. In this way, the insulating film 71A and the metal film 72A are formed. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

(Fourth modification)
FIG. 20 is a cross-sectional view of QCL1G according to the fourth modification of the above embodiment. Note that FIG. 20 shows a YZ cross section including the semiconductor laminate 30 of QCL1G. The difference between this modification and the above embodiment is that the QCL1G according to this modification further includes an insulating film 76 (third insulating film). In the QCL1G, the insulating film 76 is provided between the upper electrode 50 and the insulating film 71 in the Z direction, and is in contact with the upper electrode 50 and the insulating film 71. Further, one end of the insulating film 76 in the Y direction is included in a plane including the rear end surface 10a, and the other end of the insulating film 76 extends from the plane toward the front end surface 10b side in the Y direction. The edge of the insulating film 71 and the edge of the metal film 72 on the upper electrode 50 are located on the insulating film 76. That is, the insulating film 71 and the metal film 72 cover a part of the insulating film 76 on the plane side. On the insulating film 76, the edge of the metal film 72 is located on the plane side in the Y direction with respect to the edge of the insulating film 71.

Further, the thickness of the insulating film 76 in the Z direction is thicker than the thickness of the insulating film 71 on the upper electrode 50 in the Z direction. The thickness of the insulating film 76 in the Z direction is, for example, 100 nm or more, more preferably 150 nm or more. The insulating film 76 may be a dielectric film made of the same material as the insulating film 71, or may be a dielectric film made of a material different from the insulating film 71. The insulating film 76 is a _{dielectric film containing, for example, at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. SiN and SION are used as the material of the insulating film 76 because they have good adhesion to the upper electrode 50.

By providing the insulating film 76 in addition to the insulating film 71 between the upper electrode 50 and the metal film 72 in this way, the insulating region between them (that is, the region composed of the insulating film 71 and the insulating film 76) is sufficiently provided. Can be secured. That is, the dielectric strength between the upper electrode 50 and the metal film 72 can be increased. As a result, even if a voltage for oscillating the laser beam (for example, a high voltage of 10 V or more) is applied between the upper electrode 50 and the metal film 72, the insulating film 71 due to the voltage is applied. The destruction of 76 can be suppressed. That is, deterioration of the element characteristics of the QCL1G due to end face destruction or the like caused by the destruction of the insulating films 71 and 76 can be more reliably suppressed.

Subsequently, an example of the method for producing QCL1G according to this modification will be described below. Since the method for producing QCL1G according to this modification is the same as that of the above embodiment up to the third crystal growth step (see FIG. 5C of the above embodiment), the description of the steps up to that point will be omitted. 21 (a) to 21 (c) are diagrams showing the manufacturing process of QCL1G of FIG. 20. It should be noted that FIGS. 21 (a) to 21 (c) show a YZ cross section including the semiconductor laminate 30 of QCL1G. In the method for producing QCL1G, after the third crystal growth step, the mask 81 is removed, and the upper electrode 50 is formed on the upper surface 30a as shown in FIG. 21 (a). After that, as shown in FIG. 21B, an insulating film 77 to be the insulating film 76 is formed on the upper electrode 50. Next, the resist 88 is patterned on the region of the upper electrode 50 where the insulating film 76 is formed. Next, when the insulating film 77 is etched in the Z direction, only the insulating film 77 protected by the resist 88 remains on the upper electrode 50. After that, when the resist 88 is removed, an insulating film 76 is formed on the upper electrode 50 as shown in FIG. 21 (c). Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

(Fifth modification)
FIG. 22 is a cross-sectional view of QCL1H according to the fifth modification. Note that FIG. 22 shows a YZ cross section including the semiconductor laminate 30 of QCL1H. The difference between this modification and the above embodiment is that the QCL1H according to this modification further includes an insulating film 78 (fourth insulating film). The QCL1H also includes the insulating film 76 of the fourth modification. In the QCL1H, the insulating film 78 is provided between the lower electrode 60 and the insulating film 71 in the Z direction, and is in contact with the lower electrode 60 and the insulating film 71. Further, one end of the insulating film 78 in the Y direction is included in a plane including the rear end surface 10a, and the other end of the insulating film 78 extends from the plane toward the front end surface 10b side in the Y direction. The edge of the insulating film 71 and the edge of the metal film 72 on the lower electrode 60 are located on the insulating film 78. That is, the insulating film 71 and the metal film 72 cover a part of the insulating film 78 on the plane side. On the insulating film 78, the edge of the metal film 72 is located on the plane side in the Y direction with respect to the edge of the insulating film 71.

Further, the thickness of the insulating film 78 in the Z direction is thicker than the thickness of the insulating film 71 on the lower electrode 60 in the Z direction. The thickness of the insulating film 78 in the Z direction is, for example, 100 nm or more, more preferably 150 nm or more. The insulating film 78 may be a dielectric film made of the same material as the insulating film 71, or may be a dielectric film made of a material different from the insulating film 71. That is, the insulating film 78 is a _{dielectric film containing, for example, at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. SiN and SION are used as the material of the insulating film 78 because they have good adhesion to the lower electrode 60.

In this way, by providing the insulating film 78 in addition to the insulating film 71 between the lower electrode 60 and the metal film 72, an insulating region (that is, a region composed of the insulating film 71 and the insulating film 78) between them is provided. It can be sufficiently secured. That is, the dielectric strength between the lower electrode 60 and the metal film 72 can be increased. As a result, even if a voltage for laser oscillation (for example, a high voltage of 10 V or more) is applied between the lower electrode 60 and the metal film 72, the insulating films 71 and 78 due to the voltage are applied. Destruction can be suppressed. That is, deterioration of the element characteristics of the QCL1H due to end face destruction or the like caused by the destruction of the insulating films 71 and 78 can be more reliably suppressed.

When producing QCL1H, after the step of forming the insulating film 76 on the upper electrode 50 (see FIGS. 21 (a) to 21 (c)), the lower electrode 60 is formed in the same manner as in this step. An insulating film 78 is formed on the film. Since the subsequent steps are the same as those in the above embodiment, the description thereof will be omitted.

The quantum cascade semiconductor laser of the present invention is not limited to the above-described embodiment, and various other modifications are possible. For example, the above-described embodiments and modifications may be combined with each other according to the required purpose and effect. Further, in the above-described embodiment and each modification, the insulating film and the metal film are provided only on the rear end surface side of the semiconductor element portion in the Y direction, but the insulating film and the metal film are provided on the front end surface of the semiconductor element portion. It may be provided only on the side, or may be provided on both the front end surface and the rear end surface of the semiconductor element portion. Further, in the above-described embodiment and each modification, the QCL has an embedded heterostructure, but for example, a Hymesa having an insulating film (for example, a dielectric film such as SiO ₂ ) formed on both side surfaces of the semiconductor laminate 30. It may have any other structure such as a structure. Further, in the above-described embodiment and each modification, the DFB type QCL having the diffraction grating layer 34 has been described, but the present invention is not limited thereto. That is, the above-described embodiment and each modification can be similarly applied to, for example, a Fabry-Perot (FP) type QCL having no diffraction grating layer 34. This FP type QCL can provide the same improvements as the DFB type QCL. Further, in the above-described embodiment and each modification, the case where the upper electrode is the cathode electrode and the lower electrode is the anode electrode is illustrated, but even if the upper electrode is the anode electrode and the lower electrode is the cathode electrode. Often, in this case as well, the same effects as those of the above-described embodiment and each modification can be obtained.

1,1A, 1B, 1C, 1D, 1E, 1F, 1G, 1H ... Quantum cascade semiconductor laser, 2 ... carrier, 3 ... submount, 4 ... solder, 5 ... wire, 10 ... semiconductor element, 10a ... rear end face 10, b ... front end face, 20 ... semiconductor substrate, 20a ... main surface, 20b ... back surface, 20c ... substrate end face, 20f, 20g, 30c, 30d ... region, 30 ... semiconductor lamination, 30a ... top surface, 30b ... laminated end face, 32 ... Buffer layer, 33 ... Core layer, 34 ... Diffraction grating layer, 34a ... Diffraction grating, 35 ... Upper clad layer, 36 ... Contact layer, 40 ... Current block, 50, 50A ... Upper electrode, 60, 60A ... Lower electrode , 71, 71A, 75, 75A, 75B, 76, 78 ... Insulating film, 72, 72A ... Metal film.

Claims (17)

A semiconductor substrate having a main surface and a back surface facing each other in the first direction, and a substrate end surface intersecting a second direction orthogonal to the first direction.
On the surface provided on the side opposite to the main surface in the first direction, the laminated end surface included in the plane including the substrate end surface, the core layer extending from the laminated end surface along the second direction, and the core layer. With a semiconductor laminate provided on the main surface, which has a clad layer provided on the
The first electrode provided on the surface and
The second electrode provided on the back surface and
A first insulating film provided on the laminated end face and the substrate end face and extending over the first electrode.
A metal film provided on the laminated end face and the substrate end face via the first insulating film and extending over the first electrode.
A second insulating film provided on the substrate end face via the first insulating film and the metal film, extending over the second electrode, and covering a part of the metal film.
Equipped with a,
A quantum cascade semiconductor laser in which the edge of the second insulating film on the second electrode is in contact with the second electrode. The surface includes a first region and a second region located between the laminated end face and the first region in the second direction.
The thickness of the second region on the first electrode is provided, the first smaller than the thickness of the first electrode provided on the region, the quantum cascade laser according to claim 1. The surface includes a first region and a second region located between the laminated end face and the first region in the second direction.
The quantum cascade semiconductor laser according to claim 1, wherein the first electrode is provided only on the first region. The back surface includes a third region and a fourth region located between the substrate end face and the third region in the second direction.
The quantum cascade according to any one of claims 1 to 3 , wherein the thickness of the second electrode provided on the fourth region is thinner than the thickness of the second electrode provided on the third region. Semiconductor laser. The back surface includes a third region and a fourth region located between the substrate end face and the third region in the second direction.
The quantum cascade semiconductor laser according to any one of claims 1 to 3 , wherein the second electrode is provided only on the third region. A semiconductor substrate having a main surface and a back surface facing each other in the first direction, and a substrate end surface intersecting a second direction orthogonal to the first direction.
On the surface provided on the side opposite to the main surface in the first direction, the laminated end surface included in the plane including the substrate end surface, the core layer extending from the laminated end surface along the second direction, and the core layer. With a semiconductor laminate provided on the main surface, which has a clad layer provided on the
The first electrode provided on the surface and
The second electrode provided on the back surface and
A first insulating film provided on the laminated end face and the substrate end face and extending over the first electrode.
A metal film provided on the laminated end face and the substrate end face via the first insulating film and extending over the first electrode.
A second insulating film provided on the substrate end face via the first insulating film and the metal film, extending over the second electrode, and covering a part or all of the metal film.
And a third insulating film provided between the first insulating film and the first electrode in the first direction, the quantum cascade laser. The quantum cascade semiconductor laser according to claim 6 , wherein the third insulating film _{contains at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. A semiconductor substrate having a main surface and a back surface facing each other in the first direction, and a substrate end surface intersecting a second direction orthogonal to the first direction.
On the surface provided on the side opposite to the main surface in the first direction, the laminated end surface included in the plane including the substrate end surface, the core layer extending from the laminated end surface along the second direction, and the core layer. With a semiconductor laminate provided on the main surface, which has a clad layer provided on the
The first electrode provided on the surface and
The second electrode provided on the back surface and
A first insulating film provided on the laminated end face and the substrate end face and extending over the first electrode.
A metal film provided on the laminated end face and the substrate end face via the first insulating film and extending over the first electrode.
A second insulating film provided on the substrate end face via the first insulating film and the metal film, extending over the second electrode, and covering a part or all of the metal film.
A fourth insulating film comprises,
The first insulating film and the metal film extend over the second electrode.
The fourth insulating film is provided between the second electrode and the first insulating film in the first direction, the quantum cascade laser. The quantum cascade semiconductor laser according to claim 8 , wherein the fourth insulating film _{contains at least one of SiO 2} , SiON, SiN, alumina, BCB resin, and polyimide resin. The quantum cascade semiconductor laser according to any one of claims 1 to 7 , wherein the metal film is not provided on the second electrode. The quantum cascade semiconductor laser according to any one of claims 1 to 7 , wherein the first insulating film and the metal film are not provided on the second electrode. The first insulating film and at least one of the second insulating film include at least one of SiO ₂ , SiON, SiN, alumina, BCB resin, and polyimide resin, according to any one of claims 1 to 11. The quantum cascade semiconductor laser described. The quantum cascade semiconductor laser according to any one of claims 1 to 12 , wherein the metal film contains Au. The quantum cascade semiconductor laser according to any one of claims 1 to 13 , wherein the clad layer is an InP layer. The core layer includes a plurality of active layers which are light emitting regions and a plurality of injection layers for injecting carriers into the active layer.
The quantum cascade semiconductor laser according to any one of claims 1 to 14 , wherein the active layer and the injection layer are alternately arranged along the first direction. The quantum cascade semiconductor laser according to claim 15 , wherein the active layer and the injection layer include a superlattice array of GaInAs / AlInAs. The quantum cascade semiconductor laser according to any one of claims 1 to 16 , wherein the semiconductor substrate is an InP substrate.

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