JP6918233B2 - 真空蒸着装置用の蒸着源 - Google Patents
真空蒸着装置用の蒸着源 Download PDFInfo
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- JP6918233B2 JP6918233B2 JP2020523574A JP2020523574A JP6918233B2 JP 6918233 B2 JP6918233 B2 JP 6918233B2 JP 2020523574 A JP2020523574 A JP 2020523574A JP 2020523574 A JP2020523574 A JP 2020523574A JP 6918233 B2 JP6918233 B2 JP 6918233B2
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- container
- vapor deposition
- crucible
- outer container
- vacuum
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
Claims (2)
- 真空チャンバ内に配置され、昇華性の有機材料を昇華させて被蒸着物に対して蒸着するための真空蒸着装置用の蒸着源において、
被蒸着物に向けて昇華した有機材料を噴出する噴出口を有する外容器と、この外容器にその壁面から間隔を置いて内挿されて昇華性の有機材料を収容する内容器と、内容器内の有機材料の加熱を可能とする加熱手段とを備え、
内容器は、網目の大きさが#10〜#50の範囲の金属メッシュを有底筒状の輪郭に成形した筒状体で構成されて、外容器の内側壁と対向する部分に昇華した有機材料の連通を許容する複数の透孔を有し、
前記外容器は、前記噴出口を構成するように鉛直方向上面を開口したものであり、
内容器の外側壁と外容器の内側壁との少なくとも一方に複数のスペーサ部材が設けられ、内容器をその底壁側から外容器内に挿入すると、スペーサ部材により外容器に対して内容器が位置決めされて内容器の外側壁と外容器の内側壁との間に1mm〜30mmの範囲の隙間が形成されることを特徴とする真空蒸着装置用の蒸着源。 - 前記内容器は、その外底壁に脚片が設けられ、内容器の外底壁と外容器の内底壁との間に1mm〜30mmの範囲の隙間が形成されることを特徴とする請求項1記載の真空蒸着装置用の蒸着源。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018110671 | 2018-06-08 | ||
| JP2018110671 | 2018-06-08 | ||
| PCT/JP2019/018352 WO2019235118A1 (ja) | 2018-06-08 | 2019-05-08 | 真空蒸着装置用の蒸着源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2019235118A1 JPWO2019235118A1 (ja) | 2020-12-17 |
| JP6918233B2 true JP6918233B2 (ja) | 2021-08-11 |
Family
ID=68770004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020523574A Active JP6918233B2 (ja) | 2018-06-08 | 2019-05-08 | 真空蒸着装置用の蒸着源 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6918233B2 (ja) |
| KR (1) | KR102453030B1 (ja) |
| CN (1) | CN111108230A (ja) |
| TW (1) | TW202000955A (ja) |
| WO (1) | WO2019235118A1 (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7633048B2 (ja) | 2021-03-10 | 2025-02-19 | 株式会社アルバック | 真空蒸着装置用の蒸着源 |
| JP7444843B2 (ja) * | 2021-12-02 | 2024-03-06 | キヤノントッキ株式会社 | 蒸着用坩堝及び蒸着装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010001529A (ja) | 2008-06-20 | 2010-01-07 | Seiko Epson Corp | 蒸着源、および蒸着装置 |
| JP4468474B1 (ja) * | 2008-12-24 | 2010-05-26 | 三菱重工業株式会社 | 真空蒸着装置及び温度調整方法 |
| JP2013209696A (ja) * | 2012-03-30 | 2013-10-10 | Samsung Display Co Ltd | 真空蒸着装置およびその蒸着源 |
| KR20140103583A (ko) * | 2013-02-18 | 2014-08-27 | (주)와이에스썸텍 | 선형증발원 |
| JP6851143B2 (ja) * | 2016-04-05 | 2021-03-31 | 株式会社アルバック | 蒸発源、真空蒸着装置および真空蒸着方法 |
| CN205662589U (zh) * | 2016-05-16 | 2016-10-26 | 鄂尔多斯市源盛光电有限责任公司 | 一种蒸镀源及蒸镀装置 |
| KR20180047087A (ko) * | 2016-10-31 | 2018-05-10 | 한국표준과학연구원 | 유도 가열 증발 증착 장치 |
-
2019
- 2019-05-08 CN CN201980004684.3A patent/CN111108230A/zh active Pending
- 2019-05-08 KR KR1020207033597A patent/KR102453030B1/ko active Active
- 2019-05-08 JP JP2020523574A patent/JP6918233B2/ja active Active
- 2019-05-08 WO PCT/JP2019/018352 patent/WO2019235118A1/ja not_active Ceased
- 2019-05-17 TW TW108117013A patent/TW202000955A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202000955A (zh) | 2020-01-01 |
| WO2019235118A1 (ja) | 2019-12-12 |
| JPWO2019235118A1 (ja) | 2020-12-17 |
| CN111108230A (zh) | 2020-05-05 |
| KR20210002607A (ko) | 2021-01-08 |
| KR102453030B1 (ko) | 2022-10-11 |
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