JP6937557B2 - Method of manufacturing polyimide film - Google Patents
Method of manufacturing polyimide film Download PDFInfo
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- JP6937557B2 JP6937557B2 JP2016190215A JP2016190215A JP6937557B2 JP 6937557 B2 JP6937557 B2 JP 6937557B2 JP 2016190215 A JP2016190215 A JP 2016190215A JP 2016190215 A JP2016190215 A JP 2016190215A JP 6937557 B2 JP6937557 B2 JP 6937557B2
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/06—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the heating method
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C69/00—Combinations of shaping techniques not provided for in a single one of main groups B29C39/00 - B29C67/00, e.g. associations of moulding and joining techniques; Apparatus therefore
- B29C69/02—Combinations of shaping techniques not provided for in a single one of main groups B29C39/00 - B29C67/00, e.g. associations of moulding and joining techniques; Apparatus therefore of moulding techniques only
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/24—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length
- B29C41/30—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of indefinite length incorporating preformed parts or layers, e.g. moulding around inserts or for coating articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
- B29C41/34—Component parts, details or accessories; Auxiliary operations
- B29C41/46—Heating or cooling
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C55/00—Shaping by stretching, e.g. drawing through a die; Apparatus therefor
- B29C55/02—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
- B29C55/04—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique
- B29C55/08—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique transverse to the direction of feed
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C55/00—Shaping by stretching, e.g. drawing through a die; Apparatus therefor
- B29C55/02—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
- B29C55/10—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial
- B29C55/12—Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets multiaxial biaxial
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/18—Handling of layers or the laminate
- B32B38/1825—Handling of layers or the laminate characterised by the control or constructional features of devices for tensioning, stretching or registration
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2079/00—Use of polymers having nitrogen, with or without oxygen or carbon only, in the main chain, not provided for in groups B29K2061/00 - B29K2077/00, as moulding material
- B29K2079/08—PI, i.e. polyimides or derivatives thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2009/00—Layered products
- B29L2009/005—Layered products coated
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2379/00—Other polymers having nitrogen, with or without oxygen or carbon only, in the main chain
- B32B2379/08—Polyimides
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Moulding By Coating Moulds (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
本発明は、ポリイミド層を有する積層体の製造方法及びこの積層体を使用するポリイミドフィルムの製造方法及び機能層をポリイミド層上に設けた積層体の製造方法に関する。 The present invention relates to a method for producing a laminate having a polyimide layer, a method for producing a polyimide film using this laminate, and a method for producing a laminate in which a functional layer is provided on the polyimide layer.
ポリイミドフィルムは、フレキシブルデバイス用ポリイミドフィルムとして優れる。本発明は、タッチパネル、バリアフィルム、液晶表示装置、有機ELディスプレイ、有機EL照明、電子ペーパー、カラーフィルター、回路基板、カバーレイ等のフレキシブルデバイスに用いられる極薄ポリイミドフィルムの製造方法として適する。 The polyimide film is excellent as a polyimide film for flexible devices. The present invention is suitable as a method for producing an ultrathin polyimide film used for flexible devices such as touch panels, barrier films, liquid crystal displays, organic EL displays, organic EL lighting, electronic paper, color filters, circuit boards, and coverlays.
例えば、液晶表示装置や有機EL表示装置等の表示装置は、テレビのような大型ディスプレイや、携帯電話、パソコン、スマートフォンなどの小型ディスプレイをはじめ、各種のディスプレイ用途に使用されている。このうち、例えば、有機EL表示装置では、ガラス基板上に薄膜トランジスタ(TFT)を形成し、更に電極、発光層、電極を順次形成して、最後に別途ガラス基板や多層薄膜等で気密封止して作られる。有機EL装置の構造には、支持基材であるガラス基板側から光を取り出すボ卜ムエミッション構造と、支持基材であるガラス基板と逆側から光を取り出すトップエミッション構造とが有り、用途により使い分けられている。また、構造上、外光がそのまま通過する構造も取れるため、TFTなどの電子素子が外部から透けて見える透明構造も提案されている。いずれも透明性のある電極や基板材料の選定により実現できる。 For example, display devices such as liquid crystal displays and organic EL display devices are used for various display applications such as large displays such as televisions and small displays such as mobile phones, personal computers, and smartphones. Of these, for example, in an organic EL display device, a thin film transistor (TFT) is formed on a glass substrate, electrodes, a light emitting layer, and electrodes are sequentially formed, and finally, the glass substrate or a multilayer thin film is separately airtightly sealed. Is made. The structure of the organic EL device includes a bomb emission structure that extracts light from the glass substrate side that is the supporting base material and a top emission structure that extracts light from the opposite side of the glass substrate that is the supporting base material. It is used properly. Further, since the structure allows external light to pass through as it is, a transparent structure has been proposed in which an electronic element such as a TFT can be seen through from the outside. Both can be realized by selecting transparent electrodes and substrate materials.
これらの表示装置において、ガラス基板を樹脂基板に置き換えることで、従来よりも薄型、軽量、フレキシブル化が実現でき、表示装置の用途やバリエーションを更に広げることができる。しかしながら、一般に、樹脂はガラスと比較して寸法安定性、透明性、耐熱性、耐湿性、ガスバリア性等に劣るため、これらを改善するための検討が種々行われている。 By replacing the glass substrate with a resin substrate in these display devices, it is possible to realize thinner, lighter weight, and more flexible display devices than before, and it is possible to further expand the applications and variations of the display devices. However, in general, resin is inferior in dimensional stability, transparency, heat resistance, moisture resistance, gas barrier property, etc. as compared with glass, and various studies have been conducted to improve these.
例えば、特許文献1では、支持基材上にポリイミド層を備えた基材フィルムを用い、ロール・ツー・ロール方式等によって機能層を形成した後、ポリイミド層と支持材との界面を利用して支持材を分離して取り除くことで、ポリイミド層からなる薄い樹脂フィルム上に機能層を備えた積層部材を得られることを開示している。
For example, in
また、非特許文献1及び2では、透明性の高い樹脂材料を支持基板に適用した有機EL表示装置が提案されている。
Further, Non-Patent
特許文献2及び3には、支持体上にポリアミック酸溶液を流延し、加熱することにより部分イミド化された自己支持性フィルムを得て、これを支持体から剥離して、延伸装置を用いてこれを長さ方向及び幅方向に延伸しつつ、加熱処理してイミド化が完了したポリイミドフィルムを得ることが記載されている。この延伸には幅方向に引っ張る機構を備えるテンターが使用されている。テンターは、幅方向の端部を把持する機構を備え、それにより長尺状のフィルム等を長さ方向に移動させつつ、幅方向に引っ張ることにより、幅方向の延伸を行う機能を有する。この幅方向の延伸は、長さ方向の移動につれて、徐々に両端側の把持機構の幅を広げて行うことが通常である。
In
支持基材上にポリイミド層を備えた積層体は薄いポリイミドフィルムのハンドリング性を向上させるが、支持基材とポリイミド層の線膨張係数(CTE)が異なると硬化後の冷却時に反りが発生し、取扱いが困難となる。 A laminate having a polyimide layer on a support base material improves the handleability of a thin polyimide film, but if the linear expansion coefficient (CTE) of the support base material and the polyimide layer are different, warpage occurs during cooling after curing. It becomes difficult to handle.
本発明は、支持基材上に薄いポリイミド層を備えた積層体を得る上で、その乾燥、加熱処理工程を簡素化し、CTEが異なる組み合わせであってもカールを抑制する製造方法を提供することを目的とする。 The present invention provides a manufacturing method for obtaining a laminate having a thin polyimide layer on a supporting base material, simplifying the drying and heat treatment steps, and suppressing curling even if the CTEs are different combinations. With the goal.
上記課題を解決するために、本発明者らは鋭意検討した結果、支持基材上にポリアミック酸溶液またはポリイミド溶液を塗布した支持基材の両端を保持したまま硬化させ、好ましくは延伸しながら硬化させることが有利であることを見出して本発明を完成させた。 As a result of diligent studies in order to solve the above problems, the present inventors have applied a polyamic acid solution or a polyimide solution on the supporting substrate and cured the supporting substrate while holding both ends, and preferably cured while stretching. The present invention was completed by finding that it is advantageous to make it.
本発明は、支持基材上に、1層以上のポリイミド層を有する積層体の製造方法であって、支持基材として長尺状の可撓性フィルムを使用し、支持基材上にポリアミック酸溶液又はポリイミド溶液を塗布して1層以上の塗布層を形成する塗布工程、塗布層を有する支持基材を搬送しながら加熱処理する加熱処理工程を有し、前記加熱処理工程では支持基材の幅方向の端部を把持する機構により、塗布層を有する支持基材の幅方向端部を固定もしくは幅方向に引張りながら送り方向にフィルムを搬送すること、及び前記加熱処理はポリアミック酸のイミド化が完了する温度と時間又は最高温度が200℃以上となる条件で行われて、ポリイミド層が形成されることを特徴とするポリイミド層を有する積層体の製造方法である。 The present invention is a method for producing a laminate having one or more polyimide layers on a support base material, in which a long flexible film is used as the support base material and a polyamic acid is used on the support base material. It has a coating step of applying a solution or a polyimide solution to form one or more coating layers, and a heat treatment step of heat-treating while transporting a supporting base material having the coating layer. The film is conveyed in the feed direction while fixing or pulling the widthwise end of the supporting substrate having the coating layer by the mechanism for gripping the widthwise end, and the heat treatment is imidization of the polyimideic acid. This is a method for producing a laminate having a polyimide layer, which is carried out under the condition that the temperature and time for completion or the maximum temperature is 200 ° C. or higher to form a polyimide layer.
上記ポリイミド層を有する積層体の製造方法において、下記の要件の1又は2以上を満たすことが好ましい。
1) 加熱処理工程において、塗布層を有する支持基材を送り方向に搬送する際に、送り方向に引張りながら搬送すること。
2) 塗布工程において、支持基材の片面又は両面に1層以上の塗布層を形成すること。
3) 可撓性フィルムが、25〜200μm厚みの樹脂フィルム又は金属箔であること。
4) 支持基材が、ポリイミド樹脂フィルムであること。
5) 支持基材とポリイミド層の熱膨張係数の差が1ppm/K以上であること、又は支持基材と隣接するポリイミド層の熱膨張係数の差が1ppm/K以上であること。
6) 加熱処理工程において、支持基材の幅方向にフィルムを引張ることにより、幅方向の延伸率が100%〜120%となるように延伸すること。
In the method for producing a laminate having a polyimide layer, it is preferable that one or two or more of the following requirements are satisfied.
1) In the heat treatment step, when transporting the supporting base material having the coating layer in the feed direction, transport while pulling in the feed direction.
2) In the coating process, form one or more coating layers on one side or both sides of the supporting base material.
3) The flexible film is a resin film or metal foil with a thickness of 25 to 200 μm.
4) The supporting base material is a polyimide resin film.
5) The difference in the coefficient of thermal expansion between the supporting base material and the polyimide layer is 1 ppm / K or more, or the difference in the coefficient of thermal expansion between the supporting base material and the polyimide layer adjacent to it is 1 ppm / K or more.
6) In the heat treatment step, by pulling the film in the width direction of the supporting base material, the film is stretched so that the stretch ratio in the width direction is 100% to 120%.
加熱処理工程の次に、機能層形成工程を設け、機能層をポリイミド層上に設けることは、本発明の積層体の製造方法の好ましい態様である。 It is a preferable aspect of the method for producing a laminate of the present invention that a functional layer forming step is provided next to the heat treatment step and the functional layer is provided on the polyimide layer.
また、本発明は上記のポリイミド層を有する積層体の製造方法で得られた積層体を、支持基材層とポリイミド層の界面でポリイミド層を剥がしてポリイミドフィルムとすることを特徴とするポリイミドフィルムの製造方法である。 Further, the present invention is characterized in that the laminate obtained by the above-mentioned method for producing a laminate having a polyimide layer is formed into a polyimide film by peeling the polyimide layer at the interface between the support base material layer and the polyimide layer. It is a manufacturing method of.
上記のポリイミド層を有する積層体の製造方法で得られた積層体が、ポリイミド層を複数有するものである場合は、そのポリイミド層間の界面の少なくとも1つの界面でポリイミドフィルム層を剥がしてポリイミドフィルムとすることは、本発明のポリイミドフィルムの製造方法の他の態様である。 When the laminate obtained by the above method for producing a laminate having a polyimide layer has a plurality of polyimide layers, the polyimide film layer is peeled off at at least one interface between the polyimide layers to obtain a polyimide film. Is another aspect of the method for producing a polyimide film of the present invention.
本発明のポリイミド層を有する積層体の製造方法によれば、塗布されたポリイミド層又は前駆体層(塗布層)を有する支持基材から、塗布層と支持基材とを一旦分離することなく、そのまま加熱処理して硬化を完了させるので、製造工程が簡素化される。また、幅方向にも延伸又は張力又は保持力を与えながら加熱処理することにより、ポリイミド層のCTEを低下させることができるだけでなく、積層体の各層のCTEが異なる組み合わせであってもカールを小さくでき、ロール搬送工程中のポリイミド層の剥離を防ぎ、積層体又はロールの取り扱いを容易にすることができる。 According to the method for producing a laminate having a polyimide layer of the present invention, the coating layer and the support base material are not once separated from the support base material having the coated polyimide layer or the precursor layer (coating layer). Since the curing is completed by heat treatment as it is, the manufacturing process is simplified. Further, by heat-treating while applying stretching or tension or holding force in the width direction, not only the CTE of the polyimide layer can be lowered, but also the curl can be reduced even if the CTE of each layer of the laminated body is different. It is possible to prevent the polyimide layer from peeling off during the roll transfer process, and to facilitate the handling of the laminate or the roll.
加熱処理工程の次に、機能層形成工程を設け、機能層をポリイミド層上に設け、その後に支持基材層とポリイミド層の界面でポリイミド層を剥がして機能層を有するポリイミドフィルムとすれば、薄いポリイミドフィルムに機能層を有するフレキシブルデバイスを効果的に得ることができる。 After the heat treatment step, a functional layer forming step is provided, the functional layer is provided on the polyimide layer, and then the polyimide layer is peeled off at the interface between the supporting base material layer and the polyimide layer to obtain a polyimide film having the functional layer. A flexible device having a functional layer on a thin polyimide film can be effectively obtained.
本発明のポリイミド層を有する積層体の製造方法では、支持基材上にポリアミック酸溶液又はポリイミド溶液(以下、樹脂溶液という。)を塗布して1層以上の塗布層を形成する塗布工程、塗布層を有する支持基材を搬送しながら加熱処理する加熱処理工程を有する。ここで、塗布層は加熱処理後にはポリイミド層となるが、いずれも樹脂層であるので、両者を含む意味で樹脂層ともいう。 In the method for producing a laminate having a polyimide layer of the present invention, a coating step of coating a polyamic acid solution or a polyimide solution (hereinafter referred to as a resin solution) on a supporting base material to form one or more coating layers, and coating. It has a heat treatment step of heat-treating while transporting a supporting base material having a layer. Here, the coating layer becomes a polyimide layer after the heat treatment, but since both are resin layers, it is also called a resin layer in the sense that both are included.
支持基材上には、ポリアミック酸溶液及びポリイミド溶液から選ばれる樹脂溶液を塗布する。この塗布は支持基材の片面であっても、両面であってもよい。両面に設ければ、同時に2枚のポリイミドフィルムを得ることができる。また、樹脂溶液は、1層を塗布しても、多層に塗布してもよいが、ポリイミドフィルムの用途に応じて定める。多層に塗布し、ポリイミド層間において剥離可能な層間とすれば、そこで剥離することにより、同時に2枚のポリイミドフィルムを得ることを可能とする。 A resin solution selected from a polyamic acid solution and a polyimide solution is applied onto the supporting base material. This coating may be on one side or both sides of the supporting substrate. If provided on both sides, two polyimide films can be obtained at the same time. The resin solution may be applied in one layer or in multiple layers, but it is determined according to the use of the polyimide film. If it is applied in multiple layers to form a removable interlayer between the polyimide layers, it is possible to obtain two polyimide films at the same time by peeling there.
ポリアミック酸溶液又はポリイミド溶液におけるポリアミック酸又はポリイミドは、原料としてのジアミンとテトラカルボン酸二無水物及び/又はトリカルボン酸無水物から得られるポリアミック酸又はポリイミドであることができる。上記ジアミンとテトラカルボン酸二無水物及び/又はトリカルボン酸無水物は、それぞれ単一種からなってもよく、複数種からなってもよい。 The polyamic acid or polyimide in the polyamic acid solution or polyimide solution can be a polyamic acid or polyimide obtained from diamine and tetracarboxylic acid dianhydride and / or tricarboxylic acid anhydride as raw materials. The diamine and the tetracarboxylic dianhydride and / or the tricarboxylic acid anhydride may each consist of a single species or a plurality of species.
一般に、ポリイミドは、原料である酸無水物とジアミンとを重合して得られ、下記一般式(1)で表すことができる。ポリアミック酸は、ポリイミドの前駆体であり、これを加熱処理等に付すことによりポリイミドとすることができる。したがって、ポリイミドの説明からポリアミック酸が理解できるので、ポリイミドの説明で代表する。 Generally, polyimide is obtained by polymerizing an acid anhydride as a raw material and a diamine, and can be represented by the following general formula (1). The polyamic acid is a precursor of polyimide, and can be obtained as polyimide by subjecting it to heat treatment or the like. Therefore, since polyamic acid can be understood from the explanation of polyimide, it is represented by the explanation of polyimide.
式中、Ar1は酸無水物残基である4価の有機基を表し、Ar2はジアミン残基である2価の有機基であり、耐熱性の観点から、Ar1、Ar2の少なくとも一方は、芳香族残基であるのが望ましい。
In the formula, Ar 1 represents a tetravalent organic group which is an acid anhydride residue, and Ar 2 is a divalent organic group which is a diamine residue. From the viewpoint of heat resistance, at least Ar 1 and Ar 2 One is preferably an aromatic residue.
本発明において用いられるポリイミドは、特に制限しないが第1の例として、下記繰り返し構造単位(a)を有するポリイミドが挙げられる。
この第1の例のような繰返し構造単位(a)を有するポリイミドであれば、ガラス転移温度(Tg)が300℃以上の耐熱性ポリイミド層を形成することができ、しかもこのようなポリイミド層が形成されることで、ポリイミド層と支持材との界面での分離を容易にすることができる。 A polyimide having a repeating structural unit (a) as in the first example can form a heat-resistant polyimide layer having a glass transition temperature (Tg) of 300 ° C. or higher, and such a polyimide layer can be formed. By being formed, it is possible to facilitate separation at the interface between the polyimide layer and the support material.
また、好適に用いられるポリイミドの第2の例としては、含フッ素ポリイミドが挙げられる。ここで、含フッ素ポリイミドとは、ポリイミド構造中にフッ素原子を有するものを指し、ポリイミド原料である酸無水物、及びジアミンの少なくとも一方の成分において、フッ素を有するものである。このような含フッ素ポリイミドとしては、例えば、上記一般式(1)で表されるもののうち、式中のAr1が4価の有機基であり、Ar2が下記一般式(2)又は(3)で表される2価の有機基で表されるものが例示される。
上記一般式(2)又は一般式(3)におけるR1〜R8は、互いに独立に水素原子、フッ素原子、炭素数1〜5までのアルキル基若しくはアルコキシ基、又はフッ素置換炭化水素基であり、一般式(2)にあっては、R1〜R4のうち少なくとも一つはフッ素原子又はフッ素置換炭化水素基であり、また、一般式(3)にあっては、R1〜R8のうち少なくとも一つはフッ素原子又はフッ素置換炭化水素基である。このうち、R1〜R8の好適な具体例としては、−H、−CH3、−OCH3、−F、−CF3などが挙げられるが、式(2)又は式(3)において少なくとも一つの置換基が、−F又は−CF3の何れかであるのが好ましい。 R 1 to R 8 in the general formula (2) or the general formula (3) are hydrogen atoms, fluorine atoms, alkyl groups or alkoxy groups having 1 to 5 carbon atoms, or fluorine-substituted hydrocarbon groups independently of each other. , In the general formula (2), at least one of R 1 to R 4 is a fluorine atom or a fluorine-substituted hydrocarbon group, and in the general formula (3), R 1 to R 8 At least one of them is a fluorine atom or a fluorine-substituted hydrocarbon group. Of these, suitable specific examples of R 1 to R 8 include -H, -CH 3 , -OCH 3 , -F, -CF 3, and the like, but at least in the formula (2) or the formula (3). It is preferable that one substituent is either -F or -CF 3.
含フッ素ポリイミドである場合の一般式(1)中のAr1の具体例としては、例えば以下のような4価の酸無水物残基が挙げられる。
上記のような含フッ素ポリイミドには透明性に優れたものが含まれるので、透明性のポリイミドフィルムが望まれる用途には好適である。例えば、液晶表示装置や有機EL表示装置等の表示装置をはじめ、それらで使用されて透明性が要求される積層部材を得る場合のポリイミド層として好適である。その透明性をより優れたものとしたり、ポリイミド層と支持材との界面での剥離性をより向上させることなどを考慮すれば、一般式(1)におけるAr2を与える具体的なジアミン残基の好ましい例は以下に示される。 Since the fluorine-containing polyimide as described above includes those having excellent transparency, it is suitable for applications in which a transparent polyimide film is desired. For example, it is suitable as a polyimide layer for obtaining a laminated member that is used in a display device such as a liquid crystal display device or an organic EL display device and requires transparency. Considering that the transparency is made more excellent and the peelability at the interface between the polyimide layer and the support material is further improved, a specific diamine residue giving Ar 2 in the general formula (1) is given. Preferred examples of are shown below.
また、このような含フッ素ポリイミドにおいて、次に挙げる一般式(4)、(5)又は(6)で表される構造単位のいずれかを80モル%以上の割合で有する場合には、透明性と剥離性が優れる他、熱膨張性が低く寸法安定性に優れることからより好ましい。すなわち、下記一般式(4)、(5)又は(6)で表される構造単位を有するポリイミドであれば、440nmから780nmの波長領域での光線透過率が70%以上、好適には80%以上を示すことから、表示装置等のように透明性が要求される積層部材におけるポリイミド層を形成するものとしてより有利である。また、300℃以上のガラス転移温度を有するようになると共に、熱膨張係数は25ppm/K以下、好適には10ppm/K以下にすることができる。そのため、このようなポリイミドを使用することで、プロセス中に温度変化を受けても両者の熱膨張係数が近いため、反ったり皺が寄ったりすることを防止できる。そして、支持基材としてポリイミド樹脂フィルムを使用し、そのポリイミド樹脂フィルムとその上に形成されるポリイミド層を共に、このような含フッ素ポリイミドとすることで、反ったり皺が寄ったりすることを防止する効果が一層向上する。 Further, in such a fluorine-containing polyimide, when any of the structural units represented by the following general formulas (4), (5) or (6) is contained in a proportion of 80 mol% or more, transparency is obtained. In addition to being excellent in peelability, it is more preferable because it has low thermal expansion and excellent dimensional stability. That is, in the case of a polyimide having a structural unit represented by the following general formula (4), (5) or (6), the light transmittance in the wavelength region of 440 nm to 780 nm is 70% or more, preferably 80%. From the above, it is more advantageous to form a polyimide layer in a laminated member that requires transparency such as a display device. Further, the glass transition temperature of 300 ° C. or higher can be obtained, and the coefficient of thermal expansion can be 25 ppm / K or less, preferably 10 ppm / K or less. Therefore, by using such a polyimide, even if the temperature is changed during the process, the thermal expansion coefficients of both are close to each other, so that it is possible to prevent warping or wrinkling. Then, a polyimide resin film is used as the supporting base material, and the polyimide resin film and the polyimide layer formed on the polyimide resin film are both made of such a fluorine-containing polyimide to prevent warping or wrinkling. The effect of
上記第1及び第2の例を含めて、ポリイミドは、脂環構造のジアミンもしくは酸無水物から生じる単位を含んでもよく、その例としてはCBDA(1,2,3,4−シクロブタンテトラカルボン酸二無水物)、CHDA(1,2,4,5-シクロヘキサンジカルボン酸無水物)又はトランス−1,4−ジアミノシクロヘキサンなどが挙げられる。 Including the first and second examples above, the polyimide may contain a unit derived from a diamine or acid anhydride having an alicyclic structure, for example, CBDA (1,2,3,4-cyclobutanetetracarboxylic acid). Dianoxide), CHDA (1,2,4,5-cyclohexanedicarboxylic acid anhydride) or trans-1,4-diaminocyclohexane and the like.
上記第1及び第2の例を含めて、ポリイミドは、ポリアミック酸をイミド化して得ることができる。ここで、ポリアミック酸の樹脂溶液は、原料であるジアミンとテトラカルボン酸二無水物及び/又はトリカルボン酸無水物とを実質的に等モル使用し、有機溶媒中で反応させることによって得るのがよい。具体的には、窒素気流下にN,N−ジメチルアセトアミドなどの有機極性溶媒にジアミンを溶解させた後、テトラカルボン酸二無水物及び/又はトリカルボン酸無水物を加えて、室温で5時間程度反応させることにより得ることができる。塗工時の膜厚均一化と得られるポリイミドフィルムの機械強度の観点から、得られたポリアミック酸の重量平均分子量は1万から30万が好ましい。なお、得られるポリイミド層の好ましい分子量範囲もこのポリアミック酸と同じ分子量範囲である。また、ポリイミド層は、単層で形成されていてもよく、複数層から形成されてもよい。複数層から形成される場合には、少なくとも支持基材と接する層については、上記第1及び第2の例として挙げたようなポリイミドを用いるようにすることがよい。 Including the first and second examples above, the polyimide can be obtained by imidizing a polyamic acid. Here, the resin solution of polyamic acid is preferably obtained by reacting a diamine as a raw material with tetracarboxylic dianhydride and / or tricarboxylic acid anhydride in substantially equimolar amounts in an organic solvent. .. Specifically, after dissolving diamine in an organic polar solvent such as N, N-dimethylacetamide under a nitrogen stream, tetracarboxylic acid dianhydride and / or tricarboxylic acid anhydride is added, and the temperature at room temperature is about 5 hours. It can be obtained by reacting. From the viewpoint of uniform film thickness during coating and mechanical strength of the obtained polyimide film, the weight average molecular weight of the obtained polyamic acid is preferably 10,000 to 300,000. The preferable molecular weight range of the obtained polyimide layer is also the same molecular weight range as this polyamic acid. Further, the polyimide layer may be formed of a single layer or may be formed of a plurality of layers. When formed from a plurality of layers, it is preferable to use polyimide as described as the first and second examples above, at least for the layer in contact with the supporting base material.
支持基材は、フレキシブル性を有すると共に、樹脂溶液が塗布可能であり、加熱処理が終了するまで、あるいはその後の機能層を形成するなどの工程が終了するまでは剥がれることがなく、終了後は一定以上の力で容易に剥離するものであることがよい。そして、延伸する場合は、塗布された樹脂と一緒に延伸が可能なポリイミド樹脂やPETなどの樹脂フィルムが適する。また、本発明でいう可撓性フィルムには、銅箔やSUS箔などの可撓性を有する金属箔等が含まれ、シート状を含む。支持基材の厚みは、20〜500μmの範囲がよく、好ましくは25〜200μmであり、更に好ましくは50〜100μmの範囲である。 The supporting base material has flexibility and can be coated with a resin solution, and does not peel off until the heat treatment is completed or the subsequent steps such as forming a functional layer are completed. It should be easily peeled off with a force of a certain level or higher. When stretching, a resin film such as a polyimide resin or PET that can be stretched together with the applied resin is suitable. Further, the flexible film referred to in the present invention includes a flexible metal foil such as a copper foil or a SUS foil, and includes a sheet shape. The thickness of the supporting base material is preferably in the range of 20 to 500 μm, preferably in the range of 25 to 200 μm, and more preferably in the range of 50 to 100 μm.
支持基材としてはポリイミド樹脂フィルムであることが好ましい。ポリイミド層と支持基材との界面での分離を容易にする観点から、好ましくは、ポリイミド層と接する支持基材の表面は、表面粗さRaが100nm以下であるのがよいが、30nm以下が好ましい。また、延伸する場合は、支持基材は伸びやすいものが適する。 The supporting base material is preferably a polyimide resin film. From the viewpoint of facilitating separation at the interface between the polyimide layer and the supporting base material, the surface of the supporting base material in contact with the polyimide layer preferably has a surface roughness Ra of 100 nm or less, but 30 nm or less. preferable. Further, when stretching, a support base material that is easily stretchable is suitable.
本発明の製造方法では、塗布工程と加熱処理工程を連続的に行うことがよく、そのためには支持基材は、ロールで連続的に送り出し、巻き取りを行って、ロールが移動する間に塗布工程と加熱処理工程を設けることを可能とするように、長尺である必要がある。長尺とは、支持基材の一方の辺と比較して他方の辺が長い状態であり、ロールを形成する場合は、長い辺側が送り方向となるようにロールを形成する。なお、塗布工程と加熱処理工程の間には、乾燥工程等の他の工程を有することができ、乾燥工程と加熱処理工程の加熱は別の加熱炉で行ってもよい。 In the production method of the present invention, the coating step and the heat treatment step are often continuously performed, and for that purpose, the supporting base material is continuously fed out by a roll, wound up, and coated while the roll moves. It needs to be long so that it is possible to provide a process and a heat treatment process. The long length is a state in which the other side is longer than one side of the supporting base material, and when forming a roll, the roll is formed so that the long side is in the feeding direction. It should be noted that another step such as a drying step may be provided between the coating step and the heat treatment step, and the drying step and the heat treatment step may be heated in different heating furnaces.
また、本発明の製造方法にあっては、支持基材とポリイミド層全体の熱膨張係数の差が1ppm/K以上である場合、又は支持基材と隣接するポリイミド層の熱膨張係数の差が1ppm/K以上である場合に、効果が大きい。熱膨張係数の差が大きいとカールが発生しやすいが、本発明の製造方法では、それを減少することができる。特に、支持基材よりポリイミド層の熱膨張係数が大きい場合、カールが発生しやすいが、本発明の製造方法によれば、ポリイミド層の熱膨張係数の増加を抑止して、これを防止する。また、支持基材の端部を把持することにより加熱処理工程中での反りが防止される。 Further, in the production method of the present invention, when the difference in thermal expansion coefficient between the supporting base material and the entire polyimide layer is 1 ppm / K or more, or when the difference in thermal expansion coefficient between the supporting base material and the polyimide layer adjacent to the supporting base material is 1 ppm / K or more. The effect is large when it is 1 ppm / K or more. If the difference in the coefficient of thermal expansion is large, curl is likely to occur, but it can be reduced by the production method of the present invention. In particular, when the coefficient of thermal expansion of the polyimide layer is larger than that of the supporting base material, curl is likely to occur, but according to the production method of the present invention, an increase in the coefficient of thermal expansion of the polyimide layer is suppressed to prevent this. Further, by gripping the end portion of the supporting base material, warpage during the heat treatment process is prevented.
塗布工程において、塗布層厚みは特に限定されないが、タッチパネル、液晶表示装置、有機ELディスプレイ、有機EL照明、カラーフィルターなどのポリイミド層に透明性が要求される用途に適用するためには、ポリイミド層が80%以上の透過率であること求められ、このためポリイミド層の厚みは30μm以下が好ましく、20μm以下がさらに好ましいので、このような厚みとなるようにすることがよい。 In the coating process, the thickness of the coating layer is not particularly limited, but in order to apply it to applications where transparency is required for the polyimide layer such as a touch panel, a liquid crystal display device, an organic EL display, an organic EL lighting, and a color filter, the polyimide layer is used. Is required to have a transmittance of 80% or more. Therefore, the thickness of the polyimide layer is preferably 30 μm or less, more preferably 20 μm or less, and therefore it is preferable to have such a thickness.
塗布される樹脂溶液の濃度は5〜30wt%が好ましい。塗布手段としては、流延塗布はナイフコーターやリップコーター、ダイコーター等が適する。 The concentration of the resin solution to be applied is preferably 5 to 30 wt%. As the coating means, a knife coater, a lip coater, a die coater or the like is suitable for the cast coating.
塗布工程終了後は、必要により乾燥したのち、加熱処理工程に付す。乾燥は、例えば150〜160℃程度で加熱して行うが、加熱処理工程で乾燥の一部又は全部を行ってもよい。加熱処理は、最高温度が300〜450℃となる温度でポリアミック酸のイミド化が完了するように行われる。イミド化に際して行う加熱処理は、例えば、160℃程度の温度から400℃程度の温度まで連続的又は段階的に昇温を行うようにすればよい。 After the coating process is completed, it is dried if necessary and then subjected to a heat treatment process. The drying is carried out by heating at, for example, about 150 to 160 ° C., but a part or all of the drying may be carried out in the heat treatment step. The heat treatment is carried out so that the imidization of the polyamic acid is completed at a temperature at which the maximum temperature is 300 to 450 ° C. The heat treatment performed at the time of imidization may be, for example, continuously or stepwise raising the temperature from a temperature of about 160 ° C. to a temperature of about 400 ° C.
塗布工程において、樹脂溶液としてポリイミド溶液を使用した場合は、イミド化は不要であるが、乾燥及び加熱処理は必要であり、最高温度が200℃以上となる条件で、好ましくは300℃以上となる条件で行う。乾燥条件より高めの温度や時間等の条件で加熱処理を行えば、ポリイミドフィルムの特性が向上する。 When a polyimide solution is used as the resin solution in the coating step, imidization is not necessary, but drying and heat treatment are necessary, and the maximum temperature is 200 ° C. or higher, preferably 300 ° C. or higher. Perform under conditions. If the heat treatment is performed under conditions such as a temperature and time higher than the drying conditions, the characteristics of the polyimide film are improved.
この加熱処理工程では、支持基材の幅方向の端部を把持する機構により、塗布層を有する支持基材の幅方向端部を固定もしくは幅方向に引張りながら送り方向にフィルムを搬送する。その結果、カール(反り量ともいう。)やCTEの小さいポリイミドフィルムを得ることができる。幅方向端部を固定もしくは幅方向に引張る装置としては、公知のテンター装置が使用できる。幅方向の端部を固定するとは、延伸はしないが、保持力又は引張り力を加えて、支持基材に張力又は端部の位置(例えば、水平位置)を一定に保つ力を与えることをいう。幅方向に引張るとは、幅方向に延伸することを含む。
テンターを使用することにより、ポリイミド層のCTEを小さくできるだけでなく、ポリイミドフィルムの引っ張り強度を大きくすることができる。
In this heat treatment step, the film is conveyed in the feeding direction while fixing or pulling the widthwise end of the supporting base material having the coating layer by a mechanism for gripping the widthwise end of the supporting base material. As a result, a polyimide film having a small curl (also referred to as a warp amount) and a CTE can be obtained. A known tenter device can be used as a device for fixing the end portion in the width direction or pulling the end portion in the width direction. Fixing the end in the width direction means applying a holding force or a tensile force to the supporting base material to give the supporting base material a force to keep the tension or the position of the end (for example, the horizontal position) constant without stretching. .. Pulling in the width direction includes stretching in the width direction.
By using the tenter, not only the CTE of the polyimide layer can be reduced, but also the tensile strength of the polyimide film can be increased.
上記端部を把持する機構や形状は特に制限しないが、両端部を把持するクリップや両端部を突き刺すピンなどを例示できる。 The mechanism and shape for gripping the ends are not particularly limited, and examples thereof include clips for gripping both ends and pins for piercing both ends.
幅方向端部を固定もしくは幅方向に引張り操作は、80℃以上、好ましくは160℃以上の温度となり、最高温度に達した後で、ポリイミドのガラス転移温度以下となるまでの範囲とすることが好ましい。具体的には、最高温度を支持基材の幅方向の端部を把持又は引張りながら昇温し、最高温度に達した後で、ポリイミド層を構成するポリイミドのガラス転移温度〜ガラス転移温度マイナス100℃の温度域に降温するとともに、幅方向の引張の力を、昇温時の90〜50%に緩め、ポリイミド層を形成することが好ましい。この方法でポリイミド層を形成することで、ポリイミド層の送り方向のCTEと幅方向のCTEの差が小さく、かつ、反り量が小さい積層体を得ることができる。 The operation of fixing the end in the width direction or pulling in the width direction may be performed at a temperature of 80 ° C. or higher, preferably 160 ° C. or higher, and after reaching the maximum temperature, the temperature may be within the range until the glass transition temperature of polyimide or lower. preferable. Specifically, the maximum temperature is raised while grasping or pulling the end portion in the width direction of the supporting base material, and after reaching the maximum temperature, the glass transition temperature of the polyimide constituting the polyimide layer to the glass transition temperature minus 100. It is preferable to form the polyimide layer by lowering the temperature to a temperature range of ° C. and relaxing the tensile force in the width direction to 90 to 50% at the time of raising the temperature. By forming the polyimide layer by this method, it is possible to obtain a laminate in which the difference between the CTE in the feed direction and the CTE in the width direction of the polyimide layer is small and the amount of warpage is small.
長さ方向の延伸は、巻き取りロールと送り出しロールの速度を調整し、送り方向に引張りながら搬送することにより可能である。したがって、本発明の製造方法にあっては、一軸延伸又は二軸延伸フィルムとなるように延伸することが好ましい。延伸率としては1倍を超え、1.2倍の範囲が好ましい。長さ方向の延伸によりカールやCTEの小さいポリイミドフィルムを得ることができる。 Stretching in the length direction is possible by adjusting the speeds of the take-up roll and the feed roll and transporting the roll while pulling in the feed direction. Therefore, in the production method of the present invention, it is preferable to stretch the film so as to form a uniaxially stretched or biaxially stretched film. The draw ratio is preferably in the range of more than 1 time and 1.2 times. A polyimide film having a small curl and CTE can be obtained by stretching in the length direction.
本発明のポリイミド層を有する積層体の製造方法を、図面を参照して説明する。
図1は、この積層体を製造する装置の一例を示す模式図であり、支持基材4は回転ロール2により、ロール8から引出され、2つ塗布装置1により両面に樹脂溶液が塗布され、樹脂層5が形成される。樹脂層が形成された支持基材は加熱炉61で乾燥され、複数回転ロール22、23を経て第2の加熱炉6で加熱処理されたのち、巻き取りロール3で巻き取られる。加熱炉6の入口手前から出口の直後までは、把持具7を有するテンターを備えられ、これで樹脂層が形成された支持基材の両端を保持して、固定又は延伸をする。
The method for producing a laminate having a polyimide layer of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic view showing an example of an apparatus for manufacturing this laminate. The
図2は、積層体を製造する装置の他の一例を示し、図1と共通する符号は同じ意味を有する。この例では、乾燥のための加熱炉は有さず、加熱炉6において乾燥及び熱処理がなされる。図3はテンターの平面図であり、両端に配置される把持具7は、両端の間隔(開き)が、出口側に向かって一定である部分と、徐々に大きくなる拡大部と、一定となる部分がある。そして、上記拡大部は加熱炉6内に存在して、そこで延伸がなされる。なお、延伸をしない場合は、拡大部は有しないが、樹脂層が形成された支持基材に一定の張力を与えて固定する。
FIG. 2 shows another example of an apparatus for manufacturing a laminate, and the reference numerals common to those in FIG. 1 have the same meaning. In this example, there is no heating furnace for drying, and drying and heat treatment are performed in the heating furnace 6. FIG. 3 is a plan view of the tenter, and the
加熱処理工程を経て得られたポリイミド層を有する積層体は、支持基材と剥離してポリイミドフィルムとする。ポリイミド層を多層に有する場合であって、ポリイミド層間を剥離可能なものとすれば、そこでも剥離してよい。 The laminate having the polyimide layer obtained through the heat treatment step is peeled off from the supporting base material to form a polyimide film. If the polyimide layer is provided in multiple layers and the polyimide layer can be peeled off, the polyimide layer may be peeled off there as well.
本発明においては、上記で例示したポリイミドを用いるなどすることにより、好適には、ポリイミド層と支持基材との界面における接着強度が0.1〜20N/mにすることができて、例えば人の手で容易に剥離することができるようになる。ポリイミド層から支持基材を剥離する際の剥離強度の上限は、ポリイミド層の厚み、機能層の種類、剥離方法などにより異なり、特に限定されない。積層体をロール・ツー・ロール方式で搬送する際のポリイミド層と支持基材の界面での剥離を防止するためには、0.1N/m以上とすることがよい。一方、剥離を容易とするためには、20N/m以下にすることがよい。 In the present invention, by using the polyimide exemplified above, the adhesive strength at the interface between the polyimide layer and the supporting base material can be preferably 0.1 to 20 N / m, for example, human. It will be possible to easily peel it off by hand. The upper limit of the peel strength when peeling the support base material from the polyimide layer varies depending on the thickness of the polyimide layer, the type of the functional layer, the peeling method, and the like, and is not particularly limited. In order to prevent peeling at the interface between the polyimide layer and the supporting base material when the laminate is conveyed by the roll-to-roll method, it is preferably 0.1 N / m or more. On the other hand, in order to facilitate peeling, it is preferably 20 N / m or less.
更に、ポリイミドフィルムに機能層を設ける場合は、剥離を行う前の積層体に機能層を設けるようにすれば、薄いポリイミドフィルムであっても、機能層の形成が容易となる。 Further, when the functional layer is provided on the polyimide film, if the functional layer is provided on the laminated body before peeling, the functional layer can be easily formed even with a thin polyimide film.
ここで、機能層とは、液晶表示装置や有機EL表示装置、電子ペーパー、タッチパネル等の表示装置、蒸着マスク、ファンアウトウェハーレベルパッケージ(FOWLP)用基板、照明装置、検出装置、又はその構成部品を構成する層や各種機能性材料層を構成するものであって、具体的には、電極層、発光層、ガスバリア層、接着層、粘着層、薄膜トランジスタ、配線層、透明導電層等の1種又は2種以上を組み合わせたようなものを意味する。
機能層を設けたポリイミドフィルムは、有機EL照明装置で用いたり、ITO等が積層された導電性フィルム、水分や酸素等の浸透を防止するガスバリアフィルム、フレキシブル回路基板の構成部品などの各種機能を有した機能性材料として用いられる。好適には、フレキシブルデバイスとして用いられる。
Here, the functional layer is a liquid crystal display device, an organic EL display device, an electronic paper, a display device such as a touch panel, a vapor deposition mask, a substrate for a fan-out wafer level package (FOWLP), a lighting device, a detection device, or a component thereof. It constitutes a layer and various functional material layers, and specifically, one kind such as an electrode layer, a light emitting layer, a gas barrier layer, an adhesive layer, an adhesive layer, a thin film transistor, a wiring layer, and a transparent conductive layer. Or it means something like a combination of two or more types.
The polyimide film provided with the functional layer can be used in organic EL lighting equipment, and has various functions such as a conductive film on which ITO and the like are laminated, a gas barrier film that prevents the penetration of moisture and oxygen, and components of a flexible circuit board. It is used as a functional material that has. Preferably, it is used as a flexible device.
機能層を設けたポリイミドフィルムをフレキシブルデバイスというが、これは人手で曲げられる程度の屈曲性を有する電子機器用素子または電子機器用部材である。フレキシブルデバイスが電子機器に搭載される形態は、曲率が使用時に変化する屈曲用途でもよく、曲率が変化しない固定曲面でもよく、また平面でもよい。 A polyimide film provided with a functional layer is called a flexible device, which is an element for an electronic device or a member for an electronic device having flexibility to the extent that it can be bent manually. The form in which the flexible device is mounted on an electronic device may be a bending application in which the curvature changes during use, a fixed curved surface in which the curvature does not change, or a flat surface.
ここで、上記ポリイミド層を有する積層体が反っているとハンドリングが困難になり、その製造が困難となるだけでなく、機能層の積層やポリイミド層の剥離などが困難となるのでカールは小さいことが重要である。カールを抑えるためには、支持基材とポリイミド層のCTEを合せることでことが有効であるが、支持基材とポリイミドの選択が制限されるため他の方法による制御が望ましい。そのため、加熱処理工程において、幅方向端部を固定もしくは幅方向への引張り操作は、ポリイミド層のCTEを減少させ、カールを抑えるために有効である。 Here, if the laminate having the polyimide layer is warped, it becomes difficult to handle it, and not only the production thereof becomes difficult, but also the lamination of the functional layer and the peeling of the polyimide layer become difficult, so that the curl is small. is important. In order to suppress curl, it is effective to combine the CTEs of the support base material and the polyimide layer, but control by another method is desirable because the selection of the support base material and the polyimide is limited. Therefore, in the heat treatment step, fixing the end portion in the width direction or pulling operation in the width direction is effective for reducing the CTE of the polyimide layer and suppressing curling.
以下、実施例に基づいて本発明を詳細に説明するが、本発明は以下の実施例の範囲に限定されるものではない。 Hereinafter, the present invention will be described in detail based on Examples, but the present invention is not limited to the scope of the following Examples.
実施例中の略語及び各種物性の測定方法とその条件について以下に示す。 The abbreviations in the examples, the methods for measuring various physical properties, and the conditions thereof are shown below.
TFMB:2,2'-ビス(トリフルオロメチル)-4,4'-ジアミノビフェニル
6FDA:2,2'−ビス(3,4−ジカルボキシフェニル)ヘキサフルオロプロパン二無水物
PMDA:ピロメリット酸二無水物
DMAc:N,N-ジメチルアセトアミド
TFMB: 2,2'-bis (trifluoromethyl) -4,4'-diaminobiphenyl 6FDA: 2,2'-bis (3,4-dicarboxyphenyl) hexafluoropropane dianhydride PMDA: dipyromellitic acid Anhydride DMAc: N, N-dimethylacetamide
・反り量
ポリイミド層を有する積層体を、支持基材側を下にして、10cm×10cmのサイズに切り出して平らな場所に置き、積層体の反りの状況を判断した。積層体片の4角の浮き量(mm)の平均値の数値を反り量とした。なお、支持基材側に反った場合は、マイナス(−)の値とし、ポリイミド層側に反った場合はプラス(+)の値とした。
-Amount of warpage The laminate having the polyimide layer was cut out to a size of 10 cm x 10 cm with the support substrate side facing down and placed on a flat place, and the state of warpage of the laminate was judged. The value of the average value of the floating amount (mm) of the four corners of the laminated body piece was taken as the warp amount. When it was warped on the support substrate side, it was set to a negative (−) value, and when it was warped on the polyimide layer side, it was set to a positive (+) value.
・熱膨張係数:CTE
ポリイミド層を有する積層体からポリイミド層を剥離してポリイミドフィルムとして、幅方向(TD方向)を長辺にした3mm×15mmのサイズとし、このポリイミドフィルムを、熱機械分析(TMA)装置にて5. 0gの荷重を加えながら一定の昇温速度(10℃/min)で30℃から280℃の温度範囲で引張り試験を行い、温度に対するポリイミドフィルムの伸び量から幅方向の熱膨張係数(ppm/K)を測定した。また、送り方向(MD方向)を長辺にした3mm×15mmのサイズとし、同様の測定方法で、送り方向の熱膨張係数(ppm/K)を測定した。
・ Coefficient of thermal expansion: CTE
The polyimide layer is peeled off from the laminate having the polyimide layer to form a polyimide film having a size of 3 mm × 15 mm with the width direction (TD direction) as the long side, and this polyimide film is subjected to 5 by a thermomechanical analysis (TMA) apparatus. A tensile test was conducted in the temperature range of 30 ° C. to 280 ° C. at a constant temperature rise rate (10 ° C./min) while applying a load of 0.0 g, and the coefficient of thermal expansion (ppm /) in the width direction was determined from the amount of elongation of the polyimide film with respect to the temperature. K) was measured. Further, the size was 3 mm × 15 mm with the feeding direction (MD direction) as the long side, and the coefficient of thermal expansion (ppm / K) in the feeding direction was measured by the same measuring method.
合成例1
30Lの反応釜にTFMB849gを、7kgのDMAcに溶解させた。次いで、この溶液に6FDA147gを加え撹拌し、続けてPMDA504gを加え、固形分が15wt%になるように1.5kgのDMAcを加えて、室温で5時間攪拌して重合反応を行った。反応後、粘稠な透明のポリアミック酸溶液Aを得た。
Synthesis example 1
849 g of TFMB was dissolved in 7 kg of DMAc in a 30 L reaction kettle. Next, 147 g of 6FDA was added to this solution and stirred, and then 504 g of PMDA was added, 1.5 kg of DMAc was added so that the solid content became 15 wt%, and the mixture was stirred at room temperature for 5 hours to carry out a polymerization reaction. After the reaction, a viscous transparent polyamic acid solution A was obtained.
合成例2
30Lの反応釜にTFMB765gを、7kgのDMAcに溶解させた。次いで、この溶液に6FDA423gを加え撹拌し、続けてPMDA311gを加え、固形分が15wt%になるように1.5kgのDMAcを加えて、室温で5時間攪拌して重合反応を行った。反応後、粘稠な透明のポリアミック酸溶液Bを得た。
Synthesis example 2
765 g of TFMB was dissolved in 7 kg of DMAc in a 30 L reaction kettle. Next, 423 g of 6FDA was added to this solution and stirred, and then 311 g of PMDA was added, 1.5 kg of DMAc was added so that the solid content became 15 wt%, and the mixture was stirred at room temperature for 5 hours to carry out a polymerization reaction. After the reaction, a viscous transparent polyamic acid solution B was obtained.
合成例3
30Lの反応釜にTFMB629gを、7kgのDMAcに溶解させた。次いで、この溶液に6FDA871gを加え撹拌し、固形分が15wt%になるように1.5kgのDMAcを加えて、室温で6時間攪拌して重合反応を行った。反応後、粘稠な無色透明のポリアミック酸溶液Cを得た。
Synthesis example 3
629 g of TFMB was dissolved in 7 kg of DMAc in a 30 L reaction kettle. Next, 871 g of 6FDA was added to this solution and stirred, 1.5 kg of DMAc was added so that the solid content became 15 wt%, and the mixture was stirred at room temperature for 6 hours to carry out a polymerization reaction. After the reaction, a viscous colorless and transparent polyamic acid solution C was obtained.
以下の実施例及び比較例において、支持基材としては、厚み75μm、CTE56ppm/Kのポリイミド樹脂フィルム(幅方向520mm、送り方向200m)を使用した。また、実施例9以外は、巻き出しロールの速度及び巻き取りロールの速度を0.5m/minとした。 In the following Examples and Comparative Examples, a polyimide resin film having a thickness of 75 μm and a CTE of 56 ppm / K (520 mm in the width direction and 200 m in the feed direction) was used as the supporting base material. In addition, except for Example 9, the speed of the unwinding roll and the speed of the winding roll were set to 0.5 m / min.
実施例1
支持基材である長尺状のポリイミド樹脂フィルム上に、合成例1で得たポリアミック酸溶液Aを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を保持、固定しながら180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Example 1
The polyamic acid solution A obtained in Synthesis Example 1 was applied onto a long polyimide resin film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, a polyimide layer is formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min while holding and fixing the film edge in the width direction of the supporting base material, and a polyimide layer having a thickness of 10 μm is formed. A laminate was obtained.
実施例2
実施例1と同様に、支持基材である長尺状のポリイミド樹脂フィルム上に、合成例1で得たポリアミック酸溶液Aを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を把持具で保持しながら支持基材を加熱炉に搬入し、180℃から360℃まで約30℃/分の昇温速度で熱処理しながら支持基材を幅方向に2%延伸してポリイミド層を形成した。厚み10μmのポリイミド層を備えた積層体を得た。
Example 2
Similar to Example 1, the polyamic acid solution A obtained in Synthesis Example 1 was applied onto a long polyimide resin film as a supporting base material, and then heated and dried at 120 ° C. to remove the solvent. Next, the support base material is carried into the heating furnace while holding the film end in the width direction of the support base material with a gripper, and is supported while being heat-treated at a heating rate of about 30 ° C./min from 180 ° C. to 360 ° C. The substrate was stretched by 2% in the width direction to form a polyimide layer. A laminate having a polyimide layer having a thickness of 10 μm was obtained.
実施例3
支持基材である長尺状のポリイミド樹脂フィルム上に、合成例2で得たポリアミック酸溶液Bを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を保持、固定しながら180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Example 3
The polyamic acid solution B obtained in Synthesis Example 2 was applied onto a long polyimide resin film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, a polyimide layer is formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min while holding and fixing the film edge in the width direction of the supporting base material, and a polyimide layer having a thickness of 10 μm is formed. A laminate was obtained.
実施例4
実施例3と同様に、支持基材である長尺状のポリイミド樹脂フィルム上に、合成例2で得たポリアミック酸溶液Bを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を把持具で保持しながら支持基材を加熱炉に搬入し、180℃から360℃まで約30℃/分の昇温速度で熱処理しながら支持基材を幅方向に2%延伸してポリイミド層を形成した。厚み10μmのポリイミド層を備えた積層体を得た。
Example 4
Similar to Example 3, the polyamic acid solution B obtained in Synthesis Example 2 was applied onto a long polyimide resin film as a supporting base material, and then heated and dried at 120 ° C. to remove the solvent. Next, the support base material is carried into the heating furnace while holding the film end in the width direction of the support base material with a gripper, and is supported while being heat-treated at a heating rate of about 30 ° C./min from 180 ° C. to 360 ° C. The substrate was stretched by 2% in the width direction to form a polyimide layer. A laminate having a polyimide layer having a thickness of 10 μm was obtained.
比較例1
支持基材である長尺状のポリイミド樹脂フィルム上に、合成例1で得たポリアミック酸溶液Aを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、フィルム端部を保持することなく180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Comparative Example 1
The polyamic acid solution A obtained in Synthesis Example 1 was applied onto a long polyimide resin film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, a polyimide layer was formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min without holding the edge of the film, and a laminate having a polyimide layer having a thickness of 10 μm was obtained. ..
比較例2
支持基材である長尺状のポリイミド樹脂フィルム上に、合成例2で得たポリアミック酸溶液Bを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、フィルム端部を保持することなく180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Comparative Example 2
The polyamic acid solution B obtained in Synthesis Example 2 was applied onto a long polyimide resin film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, a polyimide layer was formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min without holding the edge of the film, and a laminate having a polyimide layer having a thickness of 10 μm was obtained. ..
実施例5
支持基材である長尺状のポリイミド樹脂フィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を保持、固定しながら180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Example 5
The polyamic acid solution C obtained in Synthesis Example 3 was applied onto a long polyimide resin film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, a polyimide layer is formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min while holding and fixing the film edge in the width direction of the supporting base material, and a polyimide layer having a thickness of 10 μm is formed. A laminate was obtained.
実施例6
実施例5と同様に、支持基材である長尺状のポリイミド樹脂フィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を把持具で保持しながら支持基材を加熱炉に搬入し、180℃から360℃まで約30℃/分の昇温速度で熱処理しながら支持基材を幅方向に2%延伸してポリイミド層を形成した。厚み10μmのポリイミド層を備えた積層体を得た。
Example 6
Similar to Example 5, the polyamic acid solution C obtained in Synthesis Example 3 was applied onto a long polyimide resin film as a supporting base material, and then heated and dried at 120 ° C. to remove the solvent. Next, the support base material is carried into the heating furnace while holding the film end in the width direction of the support base material with a gripper, and is supported while being heat-treated at a heating rate of about 30 ° C./min from 180 ° C. to 360 ° C. The substrate was stretched by 2% in the width direction to form a polyimide layer. A laminate having a polyimide layer having a thickness of 10 μm was obtained.
実施例7
実施例6と同様に、支持基材である長尺状のポリイミド樹脂フィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を把持具で保持しながら支持基材を加熱炉に搬入し、180℃から360℃まで約30℃/分の昇温速度で熱処理しながら支持基材を幅方向に5%延伸してポリイミド層を形成した。厚み10μmのポリイミド層を備えた積層体を得た。
Example 7
Similar to Example 6, the polyamic acid solution C obtained in Synthesis Example 3 was applied onto a long polyimide resin film as a supporting base material, and then heated and dried at 120 ° C. to remove the solvent. Next, the support base material is carried into the heating furnace while holding the film end in the width direction of the support base material with a gripper, and is supported while being heat-treated at a heating rate of about 30 ° C./min from 180 ° C. to 360 ° C. The substrate was stretched by 5% in the width direction to form a polyimide layer. A laminate having a polyimide layer having a thickness of 10 μm was obtained.
実施例8
実施例6と同様に、支持基材である長尺状のポリイミド樹脂フィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、支持基材の幅方向のフィルム端部を把持具で保持しながら支持基材を加熱炉に搬入し、180℃から360℃まで約30℃/分の昇温速度で熱処理しながら支持基材を幅方向に10%延伸してポリイミド層を形成した。厚み10μmのポリイミド層を備えた積層体を得た。
Example 8
Similar to Example 6, the polyamic acid solution C obtained in Synthesis Example 3 was applied onto a long polyimide resin film as a supporting base material, and then heated and dried at 120 ° C. to remove the solvent. Next, the support base material is carried into the heating furnace while holding the film end in the width direction of the support base material with a gripper, and is supported while being heat-treated at a heating rate of about 30 ° C./min from 180 ° C. to 360 ° C. The substrate was stretched by 10% in the width direction to form a polyimide layer. A laminate having a polyimide layer having a thickness of 10 μm was obtained.
実施例9
支持基材である長尺状のポリイミドフィルム上に、合成例1で得たポリアミック酸溶液Aを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、巻き出しロールの速度(0.5m/min)より2%速い0.51m/minで巻き取ることによって縦方向に延伸しながら180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Example 9
The polyamic acid solution A obtained in Synthesis Example 1 was applied onto a long polyimide film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, the temperature rise rate of about 30 ° C./min from 180 ° C. to 360 ° C. while stretching in the vertical direction by winding at 0.51 m / min, which is 2% faster than the speed of the unwinding roll (0.5 m / min). A polyimide layer was formed by heat treatment with, and a laminate having a polyimide layer having a thickness of 10 μm was obtained.
実施例10
支持基材である長尺状のポリイミドフィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、幅方向の両端部を把持し、20%延伸しながら180℃から360℃まで約30℃/分の昇温速度で熱処理を行い、その後、250℃に降温して、幅方向の延伸を緩め、延伸率を16%にすることでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Example 10
The polyamic acid solution C obtained in Synthesis Example 3 was applied onto a long polyimide film as a supporting base material, and then dried by heating at 120 ° C. to remove the solvent. Next, both ends in the width direction are gripped, heat treatment is performed from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min while stretching 20%, and then the temperature is lowered to 250 ° C. to stretch in the width direction. A polyimide layer was formed by loosening the above and setting the draw ratio to 16%, and a laminate having a polyimide layer having a thickness of 10 μm was obtained.
比較例3
長尺状のポリイミド樹脂フィルム上に、合成例3で得たポリアミック酸溶液Cを塗布した後、120℃で加熱乾燥し溶剤を除去した。次に、フィルム端部を保持することなく180℃から360℃まで約30℃/分の昇温速度で熱処理することでポリイミド層を形成し、厚み10μmのポリイミド層を備えた積層体を得た。
Comparative Example 3
After applying the polyamic acid solution C obtained in Synthesis Example 3 on a long polyimide resin film, the solvent was removed by heating and drying at 120 ° C. Next, a polyimide layer was formed by heat-treating from 180 ° C. to 360 ° C. at a heating rate of about 30 ° C./min without holding the edge of the film, and a laminate having a polyimide layer having a thickness of 10 μm was obtained. ..
実施例及び比較例で得られた積層体について、各種評価を行った結果を表1及び表2に示す。 Tables 1 and 2 show the results of various evaluations of the laminates obtained in Examples and Comparative Examples.
1 塗布装置
4 支持基材
6 加熱炉
7 把持具
1 Coating device
4 Support base material
6 Heating furnace
7 Grip
Claims (10)
Claim 1 is characterized in that, in the heat treatment step, by pulling the support base material in the width direction of the support base material, the stretch ratio in the width direction exceeds 1 times and stretches to 1.2 times or less. A method for producing a laminate having a polyimide layer according to any one of 0 to 6.
The laminate obtained by the method for producing a laminate having a polyimide layer according to any one of claims 1 to 8 has a plurality of polyimide layers, and a polyimide film is formed at at least one interface between the polyimide layers. A method for producing a polyimide film, which comprises peeling off a layer to form a polyimide film.
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| JP7212480B2 (en) * | 2017-09-29 | 2023-01-25 | 日鉄ケミカル&マテリアル株式会社 | Polyimide films, metal-clad laminates and circuit boards |
| WO2019156302A1 (en) * | 2018-02-07 | 2019-08-15 | 권경대 | Roll-type polyimide fabric using separation membrane, and method for manufacturing same |
| KR101841416B1 (en) * | 2018-02-07 | 2018-03-22 | 권경대 | Polyimide film and process for producing the same |
| KR101912455B1 (en) * | 2018-04-10 | 2018-10-26 | (주)아이피아이테크 | Polyimide surface treated aerogel insulation materials and method of manufacturing the same |
| JP2020001381A (en) * | 2018-06-22 | 2020-01-09 | 住友化学株式会社 | Method for producing transparent resin film |
| JP7161359B2 (en) * | 2018-09-27 | 2022-10-26 | 東京応化工業株式会社 | HEAT TREATMENT APPARATUS, IMIDE-BASED RESIN FILM MANUFACTURING SYSTEM, AND HEAT TREATMENT METHOD |
| WO2020159035A1 (en) * | 2019-02-01 | 2020-08-06 | 주식회사 엘지화학 | Polyimide film, flexible substrate using same, and flexible display comprising flexible substrate |
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| JP7378949B2 (en) * | 2019-03-29 | 2023-11-14 | 日鉄ケミカル&マテリアル株式会社 | Manufacturing method of polyimide film |
| TWI851809B (en) * | 2019-09-11 | 2024-08-11 | 日商日鐵化學材料股份有限公司 | Metal-clad laminate for flexible electronic component and flexible electronic component using the same |
| JP6869396B1 (en) * | 2020-03-30 | 2021-05-12 | 株式会社ノリタケカンパニーリミテド | Heat treatment device for polyimide metal laminated sheet |
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