JP6949145B2 - Devices and methods for separating substances - Google Patents

Description

The present invention relates to devices for separating substances in the form of particles and / or droplets from a gas stream. Furthermore, the present invention relates to a method for separating a substance in the form of particles and / or droplets from a gas stream.

Currently, electrical methods such as filters, cyclones, or electric filters or ion blow methods are used to separate particles from gas purification systems and gas streams. Methods and devices for separating particles or droplets from a gas stream are known, for example, in German Patent No. 1471620 (A1) and German Patent No. 19751984 (A1).

Air purifiers in use today break away from traditional methods that use filters to mechanically extract unwanted particles from the air. Such conventional filtration systems have the disadvantage of having to limit the airflow to a slow flow stream and having to remove the filter on a regular basis for cleaning. In addition, if the particles have a diameter in the range between one nanometer and several tens of nanometers, known techniques cannot achieve good cleaning results.

The operation of the cyclone is based on a decrease in the velocity of the gas stream, such as heavy particles in the gas stream falling into the accumulator. Cyclones can therefore be applied to separate heavy particles.

In an electric filter, the separation of particles from the gas is carried out on the stacking plate or on the inner surface of the pipe. The velocity of the gas flowing in the electric filter should normally be less than 1.0 m / s and is about 0.3-0.5 m / s as recommended by the manufacturer. The reason for slowing the gas flow velocity is that at higher flow velocities, the particles deposited on the plate are released, which significantly reduces the purification rate. The operation of the electric filter is based on the electrostatic charge of the particles. However, it is difficult to charge particles in the nanometer category. In addition, not all substances are charged. A slow rate of gas flow should also be used for the cleaning phase of the accumulator plate. When cleaning the plate, the blow is directed at the plate, releasing the accumulated particulate matter. It is intended that during the cleaning phase, only the smallest possible amount of particulate matter released from the plate will return to the gas stream. The slow rate of gas flow allows acceptable particle passage.

Further, the electric air purifier utilizes the charge characteristics of the ionized gas and extracts charged particles from the air flow guided by the electrostatic method. This extraction method improves efficiency not only in terms of the total amount of particles extracted, but also in terms of particle type. Air purifiers typically take advantage of the properties of positively or negatively charged particles and the electric field interacts with those charged particles. The charged particles are pulled towards the ion blow onto the stacking surface in response to the electric field.

For example, European Patent No. 1165241 (B1) discloses a method and device for separating a substance in the form of particles and / or droplets from a gas stream, in which the gas stream provides an integration chamber. Guided through, its outer wall is grounded, where a high voltage is directed to an ion yield chip located in the integration chamber, thereby bringing ion flow from the ion yield chip to the integration surface, delivering the desired material. Separate from the gas stream. It is a feature of the present invention that the integrated surface that conducts electricity is electrically insulated from the outer casing, and that a high voltage of DC voltage having a sign opposite to the high voltage guided to the ion yield chip is guided to the integrated surface. .. According to one embodiment of the invention, the electrical insulator is made of ABS and the surface conducting electricity comprises a thin chrome layer disposed on the insulating layer. The ion yield chips are arranged in a ring, and with the help of this, the distance between the ion yield chips and the accumulation surface is shortened. Therefore, the particles contained in the slow gas stream do not pass through the ion beam, but instead pass between the anchoring rod and the ion yield tip.

In view of the above, it is beneficial to provide methods and systems that further improve the purification rate. The system should be manufacturable on an industrial scale.

The present invention is defined by the characteristics of the independent claims. Some specific embodiments are defined in the dependent claims.

According to a first aspect of the invention, a device for separating a substance in the form of particles and / or droplets from a gas stream is provided. The device includes an inlet for air to be taken in for cleaning, an integration chamber, an outlet for clean air, a voltage source with actuators, and a anchorage column to which ion yield tips are coupled. The device is configured to direct a high voltage to the ion yield chip and bring an ion beam from the ion yield chip to the integration surface, which is electrically insulated from the outer wall of the integration chamber by an electrical insulator. The device is configured to direct a voltage opposite to the voltage directed to the integration surface to the ion yield chip. The ion yield tip is placed directly on the surface of the anchorage column having a certain length. The ion yield tip projects from the surface of the anchorage column into the cavity of the integration chamber.

The various embodiments of the first aspect may comprise at least one feature from the bulleted list below.
-The integration chamber is formed in a cylindrical, oval, or annular shape.
-Fixed columns are formed in a cylindrical, elliptical, or annular shape.
-The diameter of the cylindrical fixing column is in the range of 40 to 150 mm, preferably in the range of 80 to 120 mm, for example 100 mm.
-The long axis of the elliptical anchoring column is in the range of 40-150 mm, preferably in the range of 80-120 mm, for example 100 mm, and / or the minor axis of the elliptical anchoring column is in the range of 20-120 mm. It is preferably in the range of 50 to 100 mm, for example 80 mm.
-The maximum diameter or maximum major axis of the integration chamber is in the range of 200 to 1600 mm.
-The voltage is in the range of 10 to 100 kV, preferably in the range of 10 to 60 kV.
The − current is in the range of 50 to 5000 μA, preferably in the range of 400 to 2300 μA, for example 1500 μA.
-The length of the ion yield tip is in the range of 1-40 mm, preferably 5-20 mm.
− The ion yield chips are arranged in a spiral around the surface of the anchoring column.
- volumetric flow rate of air is in the range of 20~800m ³ / h, such as 200m ³ / h.
-Velocity of airflow through the cavity is in the range 0.5-2.5 m / s, for example faster than 1.0 m / s.
-A plurality of ion yield chips in a set of ion yield chips are equidistant from each other.
-At least a portion of the ion yield tip is oriented downstream with respect to the surface of the anchorage column, in the range of 40-50 °, preferably at an angle of 45 °, or upstream with respect to the surface of the anchorage column. It is oriented in the range of 40-50 °, preferably 45 °, or at an angle in the range of 80-100 °, preferably at right angles to the surface of the anchorage column.
− The anchorage column comprises an outer surface that forms a closed body.
-The device is configured to guide the air flow through the cavity between the anchorage column and the stacking surface.
-At least a portion of the outer wall of the accumulation chamber, or at least a portion of the band surrounding the outer wall of the accumulation chamber, made of a conductive material, is grounded.

According to a second aspect of the invention, there is provided a method of separating a substance in the form of particles and / or droplets from a gas stream. This method guides the gas flow through the integration chamber, provides a cavity for the gas flow between the anchorage column and the electrically insulating integration surface, which is electrically insulated from the outer wall of the integration chamber, and the surface of the anchorage column. By providing an ion yield chip in the space, a high voltage is created between the ion yield chip and the accumulation surface, and the ion yield chip protruding from the surface of the fixing column into the cavity of the integration chamber is fixed with a certain length and diameter. To be provided on the surface of the column, to guide a high voltage of DC voltage opposite to the high voltage led to the ion yield chip to the integration surface, to separate at least a part of the material from the gas stream inside the integration chamber. ,including.

The various embodiments of the second aspect may comprise at least one feature from the bulleted list below.
− The gas flow is guided through the cavity between the surface of the anchorage column and the accumulation surface.
− The gas flow is guided along the surface of the anchorage column.
-The gas flow is exposed to the electric field in the cavity between the ion yield chip and the accumulation surface, and all substances contained in the gas pass through the cavity.
-In this method, a voltage of 10 to 100 kV, preferably a voltage in the range of 10 to 60 kV is used.
-In this method, a fixing column having a diameter in the range of 40 to 150 mm is used.
-In this method, a current in the range of 50 to 5000 μA, preferably in the range of 400 to 2300 μA, for example 1500 μA is used.
- the gas flow is in the range of 20~800m ³ / h, for example with a volume flow of air 200 meters ³ / h, is guided through the cavity.
-Gas flow is guided through the cavity in the range of 0.5-2.5 m / s, for example faster than 1.0 m / s.

Certain embodiments of the present invention provide great advantages. Systems and methods for separating substances in the form of particles and / or droplets from a gas stream are provided. Certain embodiments of the invention can further improve the separation of substances from the gas stream. Specifically, a high purification rate can be realized.

Surprisingly, increasing the diameter of the anchorage column, and thus increasing the local flow velocity in the cavity, does not reduce the purification rate compared to known systems. Surprisingly, the effects of increased electric and current in the cavity between the anchorage column and the integration surface appear to be more important than the effects of faster gas flow velocities. For example, a device according to a particular embodiment of the invention, using a anchoring column with a diameter of 100 mm, a voltage of 60 kV, and a current of 1400 μA, provides good purification rates for particles having a size of, for example, 50-200 nm. rice field. The purification rate can be improved by about 70% to about 80% depending on the specific embodiment of the present invention. A suitable amount of ion yield chips can be placed directly on the surface of the anchoring column. The gas flow is exposed to the electric field in the cavity between the ion yield chip and the accumulation surface, and all substances contained in the gas pass through the cavity. There is no gas flow through the ring outside the electric field. According to certain embodiments, the purification rate can also be improved for particles and / or drops of different diameters from 1 nanometer to 10 nanometers, or 20 nanometers, or even tens of nanometers. .. In particular, the system according to a particular embodiment of the invention also improves the purification rate of particles and / or droplets with a diameter of less than 10 nanometers.

FIG. 6 is a schematic representation of a device for separating substances according to at least some embodiments of the present invention. FIG. 3 is a schematic side view of a fixing column according to at least some embodiments of the present invention.

The present invention relates to a device for separating a substance in the form of particles and / or droplets from a gas stream, the device comprising a chamber arranged in a housing provided with inlets and outlets for the air stream. The housing provides a surface that acts as an integration surface. A pillar with a cylindrical or elliptical body is provided approximately in the center of the inside of the housing. On the surface of the cylindrical or elliptical body, a series of ion yield tips are placed to guide the ion beam to the integration surface. The column is connected to a power source, which allows the ion yield chip to generate an electric field in the form of an ion beam generated from the ion yield chip. The housings and columns are separated from each other and they can be connected to separate power sources to have different charges for the purpose of directing an electric field. Generally, a pillar is a body that is at least partially cylindrical and has a surface defined by its diameter in its cross section and the length of the body. The dimensions of the column define the cross-sectional area of the cavity between the column and the stacking surface. The local velocity of airflow in the cavity can be increased by increasing the diameter of the column. In addition, the larger the surface area, the more ion yield chips can be placed on the column body, thereby increasing the electric field and the current generated by wrapping the body. This allows greater exposure of the electric field so that the particles contained in the air stream are charged and then guided to the stacking surface for removal. The high density electric field created inside the chamber improves the efficiency of particle extraction by extracting more particles from a fast air stream. In addition, all particles contained in the air stream must pass through the cavity between the column and the stacking surface.

FIG. 1 shows a schematic diagram of a device for separating substances according to at least some embodiments of the present invention. Device 1 is designed to separate substances in the form of particles and / or droplets from a gas stream. In particular, the device is designed to separate particles and / or droplets of different diameters from one nanometer to several tens of nanometers. The device includes an inlet 2 for air 3 taken in for cleaning, an integration chamber 4, an outlet 6 for clean air 7, a voltage source with actuators, and a anchoring column 9 to which the ion yield tip 10 is coupled. A metal band (not shown) surrounding the outer wall of the integration chamber is grounded. The anchoring column 9 includes an outer surface that forms a closed body. The device 1 is configured to guide the air flow through the cavity 14 between the anchoring column 9 and the integration surface 12. The device 1 is further configured to direct a high voltage to the ion yield chip 10 and bring the ion beam 11 from the ion yield chip 10 to the integration surface 12.

The accumulator surface 12 that conducts electricity is electrically insulated from the outer wall 5 of the accumulator chamber 4 by an electric insulator. The electrical insulator may be attached to the outer wall 5 of the integration chamber 4 using, for example, a fixing tool (not shown). The electrical insulator may be glass, plastic, acrylo-nitrile-butadiene-styrene (ABS), or other similar material that insulates high voltage, for example.

Further, the device 1 is configured to guide a voltage having a sign opposite to the voltage guided to the integration surface 12 to the ion yield chip 10. In other words, as a high voltage (negative in the figure) led to the ion yield chip 10, a voltage having the opposite sign of the DC voltage (positive in the figure) is guided to the surface 12 that conducts electricity. Thus, the voltages are opposite, i.e. the ion yield chip 10 is positive and the surface 12 conducting electricity is negative, or the ion yield chip 10 is negative and the surface 12 conducting electricity is positive. In general, the voltage of the ion yield chip 10 is substantially equal to the voltage of the integration surface 12, but it is possible to use voltages of different magnitudes. The advantage of the same voltage is the simplification of the structure of the high voltage source. Better cleaning results are also achieved at the same voltage.

The ion yield chips 10 are _{placed directly on the surface 13 of the anchoring column 9 having a length L col} and a diameter D _col , and the ion yield chips 10 project from the surface 13 of the anchoring column into the cavity 14 of the integration chamber 4. The dimensions of the anchoring column 9 define the cross-sectional area of the cavity 14 between the column and the stacking surface. Therefore, a given volumetric flow rate in the air application of the Continuity equation increases the local velocity of the air flow through the cavity 14 with the increased diameter of the anchorage column.

FIG. 2 shows a schematic side view of the anchoring column 9 according to at least some embodiments of the present invention. The diameter D _col of the fixing column 9 may be in the range of, for example, 40 to 150 mm. Specifically, the diameter D _col of the anchoring column may be, for example, 40 mm, 100 mm, or 150 mm. The ratio between the diameter D _col to the maximum diameter of the integration chamber may be, for example, 1: 3. The anchoring column 9 may include, for example, 48 ion yield chips 10. The length of the ion yield tip 10 may be, for example, in the range of 2 to 15 mm. Specifically, the length of the ion yield tip 10 may be, for example, 5 mm or 10 mm. In FIG. 2, the ion yield chips are equidistant from each other. According to a particular embodiment, the ion yield chips 10 are arranged so as to be spirally wound around the surface 13 of the anchoring column 9.

During the use of the anchoring column 9 shown in device 1 according to FIG. 1, air flows through the ring-shaped cavity of the integration chamber 4. The volumetric flow rate of air may be, for example, about 200 m ³ / h. The velocity of the air flow through the cavity 14 may be in the range of 0.5 to 2.5 m / s, for example 1.5 m / s.

All particles and / or droplets contained in the air stream pass through the cavity 14 between the accumulating surface 12 and the surface 13 of the anchoring column 9. As a result, all particles and / or droplets pass through the ion beam 11 to improve the air purification process.

The disclosed embodiments of the invention are not limited to the particular structures, processing steps, or substances disclosed herein, but can be extended to their equivalents, as will be appreciated by those skilled in the art. I want to be understood. It should also be understood that the terms used herein are used solely for the purpose of representing a particular embodiment and are not intended to be limiting.

References to an embodiment or embodiment throughout the specification include specific features, structures, or properties described in connection with that embodiment in at least one embodiment of the invention. Means that. Therefore, the phrases "in one embodiment" or "in one embodiment" appearing in various places throughout the specification do not necessarily refer to all of the same embodiments. For example, when referring to a number using terms such as "about" or "substantially", the exact number is also specified.

As used herein, multiple items, structural elements, components, and / or substances may be presented in a common list for convenience. However, these lists should be interpreted so that each member of the list is individually identified as a separate and unique member. Therefore, the individual members of such a list should be interpreted as being virtually equivalent to any other member of the same list, based solely on their presence within a common group, without showing the opposite. is not it. In addition, various embodiments and examples of the present invention may be referred to herein along with alternatives to their various components. It should be understood that such embodiments, examples, and alternatives should not be construed as being virtually equivalent to each other, but should be considered as separate and independent representations of the invention.

In addition, the features, structures, or properties described may be combined in any suitable manner in one or more embodiments. In the following description, many specific details such as length, width, shape examples, etc. are provided to provide a complete understanding of the embodiments of the present invention. However, one of ordinary skill in the art will appreciate that the present invention can be practiced without one or more specific details, or with other methods, components, materials, and the like. In other examples, known structures, substances, or behaviors are not shown or described in detail to avoid ambiguous aspects of the invention.

Although the above examples exemplify the principles of the invention in one or more specific applications, those skilled in the art will implement them without the use of their ability to invent and without departing from the principles and concepts of the invention. It will be clear that many changes in morphology, use, and details can be made. Therefore, the present invention is not intended to be limited except by the claims described below.

The terms "provide" and "include" are used as non-exclusive limitations that do not require or exclude the presence of features not listed herein. The features listed in the dependent claims can be freely combined with each other unless explicitly stated otherwise. Further, it should be understood that the use of the singular "a" or "an" does not exclude the plural throughout the specification.

At least some embodiments of the present invention find industrial applicability in purifying air purifiers and / or air. It is very well used for air intake, especially in hospitals, operating rooms, isolated rooms in factories that manufacture microchips, and rooms where biological weapons should be repelled. Of course, the present invention may also find applications in the cleaning of home and office rooms.

1 Device for separating substances 2 Inlet 3 Intake air 4 Accumulation chamber 5 Outer wall 6 Outlet 7 Clean air 9 Fixing pillar 10 Ion yield tip 11 Ion beam 12 Accumulation surface 13 Surface 14 Cavity L _col Length D _col diameter

Claims (7)

A device (1) for separating a substance from a gas stream.
-Inlet (2) of air (3) taken in for cleaning,
-Integration chamber (4) and
-Clean air (7) outlet (6) and
− Voltage source and
− An anchorage column (9) to which an ion yield tip (10) is bonded, wherein the ion yield tip is placed directly on the surface of the anchoring column, and the ion yield tip is from the surface of the anchoring column to the integration chamber. With a fixing column (9) protruding into the cavity of
-The device (1) is configured to direct a high voltage to the ion yield chip (10) and bring an ion beam (11) from the ion yield chip (10) to the integration surface (12).
-The integrated surface (12) that conducts electricity is electrically insulated from the outer wall (5) of the integrated chamber (4) by an electric insulator.
-The device (1) is configured to guide a voltage having a sign opposite to the voltage guided to the integration surface (12) to the ion yield chip (10).
-The diameter of the anchoring column is in the range of 80 to 120 mm, the ratio between the diameter of the anchoring column (9) and the diameter of the integration chamber (4) is 1: 3, and the voltage is 10 to 10. Device (1), with a range of 60 kV and a current in the range of 400-2300 μA. The device according to claim 1 , wherein the length of the ion yield chip is in the range of 1 to 40 mm. The device (1) according to claim 1 or 2 , wherein the volumetric flow rate of air is in the range of 20 to 800 m ^{3 / h.} The device (1) according to any one of claims 1 to 3 , wherein the velocity of the air flow through the cavity (14) is in the range of 0.5 to 2.5 m / s. A method for separating substances in the form of particles and / or droplets from a gas stream.
-To guide the gas flow through the integration chamber (4) and
-A cavity (14) for the gas flow is provided between the fixing column (9) and the electricity-carrying accumulation surface (12) electrically insulated from the outer wall (5) of the accumulation chamber (4). That and
− The ion yield chip (10) is provided on the surface (13) of the fixing column (9), and the ion yield chip (10) is integrated from the surface (13) of the fixing column (9). Projecting into the cavity (14) of the chamber (4), the diameter of the anchoring column is in the range of 80-120 mm, and the ratio between the diameter of the anchoring column (9) and the maximum diameter of the integration chamber is , 1: 3 Ru der, and be provided,
-Creating a high voltage between the ion yield tip (10) and the integration surface (12)
-A high voltage with a DC voltage having a sign opposite to the high voltage led to the ion yield chip (10) is led to the integrated surface (12), and the voltage is in the range of 10 to 60 kV, and The current is in the range of 400-2300 μA, leading and
-A method comprising separating at least a portion of the material from the gas stream inside the integration chamber (4). The method of claim 5 , wherein the gas flow is guided through a cavity with a volumetric flow rate of air in the range ^{of 20-800 m 3} / h. The method of claim 5 or 6 , wherein the gas stream is guided through the cavity at a velocity in the range of 0.5 to 2.5 m / s.

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