JP6953107B2 - Enclosure - Google Patents
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- JP6953107B2 JP6953107B2 JP2015170213A JP2015170213A JP6953107B2 JP 6953107 B2 JP6953107 B2 JP 6953107B2 JP 2015170213 A JP2015170213 A JP 2015170213A JP 2015170213 A JP2015170213 A JP 2015170213A JP 6953107 B2 JP6953107 B2 JP 6953107B2
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- photocatalyst
- coating liquid
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- 239000011941 photocatalyst Substances 0.000 claims description 176
- 238000000576 coating method Methods 0.000 claims description 103
- 239000011248 coating agent Substances 0.000 claims description 96
- 239000007788 liquid Substances 0.000 claims description 69
- 239000002245 particle Substances 0.000 claims description 65
- 239000000126 substance Substances 0.000 claims description 54
- 239000000463 material Substances 0.000 claims description 46
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 39
- 229920005989 resin Polymers 0.000 claims description 37
- 239000011347 resin Substances 0.000 claims description 37
- 239000013078 crystal Substances 0.000 claims description 35
- 238000004519 manufacturing process Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- 239000011550 stock solution Substances 0.000 claims description 11
- 239000002904 solvent Substances 0.000 claims description 7
- 229920000178 Acrylic resin Polymers 0.000 claims description 6
- 239000004925 Acrylic resin Substances 0.000 claims description 6
- 229920002050 silicone resin Polymers 0.000 claims description 6
- 239000011164 primary particle Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000011163 secondary particle Substances 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 2
- 229920002803 thermoplastic polyurethane Polymers 0.000 claims description 2
- 239000010408 film Substances 0.000 description 76
- 230000001699 photocatalysis Effects 0.000 description 29
- 230000000694 effects Effects 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 12
- 238000001035 drying Methods 0.000 description 12
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 12
- -1 Ammonium ions Chemical class 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 11
- 239000004800 polyvinyl chloride Substances 0.000 description 10
- 229920000915 polyvinyl chloride Polymers 0.000 description 10
- 230000004913 activation Effects 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical compound O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000007756 gravure coating Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 239000011147 inorganic material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- 239000002344 surface layer Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920000219 Ethylene vinyl alcohol Polymers 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- 229910018557 Si O Inorganic materials 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910003077 Ti−O Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000007607 die coating method Methods 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007602 hot air drying Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 238000010422 painting Methods 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- HPBHTRPUVBOBKU-UHFFFAOYSA-J Cl[Ti](Cl)(Cl)(Cl)[K] Chemical compound Cl[Ti](Cl)(Cl)(Cl)[K] HPBHTRPUVBOBKU-UHFFFAOYSA-J 0.000 description 1
- 241000195493 Cryptophyta Species 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000004715 ethylene vinyl alcohol Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- YDZQQRWRVYGNER-UHFFFAOYSA-N iron;titanium;trihydrate Chemical compound O.O.O.[Ti].[Fe] YDZQQRWRVYGNER-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000019645 odor Nutrition 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Catalysts (AREA)
Description
本発明は、囲い板に関し、特に、光触媒フィルムが貼付された囲い板に関する。 The present invention relates to an enclosure, and more particularly to an enclosure to which a photocatalyst film is attached.
特許文献1には、重量運搬車やダンプカー等の大型車両が排出する排気ガス中に含まれる有害成分や悪臭を除去するのに有効であり、さらに板本体の表面に塗布した装飾のための各種の模様、色彩、絵、宣伝広告のための文字等の視認可能な表示要素をはげ落ちにくくし、繰り返し使用して、長期間、風雨にさらされても、その視認可能な表示要素を再塗布しなおさなくてもよく、揮発性有機化合物(VOC)の発生の問題もない仮囲い板について開示されている。 Patent Document 1 is effective in removing harmful components and foul odors contained in exhaust gas emitted by large vehicles such as heavy-duty trucks and dump trucks, and further, various types for decoration applied to the surface of the plate body. It makes it difficult for visible display elements such as patterns, colors, pictures, and characters for advertising to come off, and reapplies the visible display elements even if they are exposed to wind and rain for a long period of time after repeated use. A temporary enclosure that does not have to be re-doed and does not have the problem of generating volatile organic compounds (VOCs) is disclosed.
この仮囲い板は、板本体の表裏面の少なくとも一方の面に、光触媒活性を有する塗膜を形成したものとしている。さらに、板本体の表面に視認可能な表示要素を塗布し、少なくともこの塗布面に、光触媒活性を有する塗膜を形成したものとしている。また、板本体の表裏面の少なくとも一方の面に、光触媒活性を有する塗膜を形成したフィルムを貼り替え自在として貼着したものとしている。
しかし、特許文献1に開示されている発明は、光触媒活性を有する塗膜について十分に検証されておらず、とりわけ、塗膜の剥離防止の観点、NOx又はSOxなどの有機物の分解能力の観点、光触媒の親水性の発現の観点、光触媒の塗膜の劣化防止の観点についての考察がされていない。 However, the invention disclosed in Patent Document 1 has not been sufficiently verified for a coating film having photocatalytic activity, and in particular, from the viewpoint of preventing peeling of the coating film, from the viewpoint of the ability to decompose organic substances such as NOx or SOx, The viewpoint of developing hydrophilicity of the photocatalyst and the viewpoint of preventing deterioration of the coating film of the photocatalyst have not been considered.
そこで、本発明は、優れた光触媒活性等を有する光触媒フィルムが貼付された囲い板を提供することを課題とする。 Therefore, it is an object of the present invention to provide an enclosure plate to which a photocatalytic film having excellent photocatalytic activity and the like is attached.
上記課題を解決するために、本発明の囲い板は、
ナノオーダーサイズの光触媒粒子と、前記光触媒粒子を含む溶媒中で当該光触媒粒子との間で相互に反発しあうゼータ電位が−30mV〜−70mVの負帯電物質と、未硬化状態の樹脂とを含む光触媒塗工液を硬化させてなる光触媒フィルムが貼付される。
In order to solve the above problems, the enclosure plate of the present invention is used.
It contains a nano-order size photocatalyst particle, a negatively charged substance having a zeta potential of −30 mV to −70 mV, which repels each other in a solvent containing the photocatalyst particle, and a resin in an uncured state. A photocatalyst film obtained by curing the photocatalyst coating liquid is attached.
本発明の囲い板に貼付される光触媒フィルムとなる光触媒塗工液は、生活環境下の光により光触媒活性を有していて、煩雑な工程を経ずにコートすることにより得られる、セルフクリーニング性を備えた、有機無機ハイブリッド光触媒塗工液である。すなわち、本発明に係る光触媒塗工液は、典型的には、シリカ粒子及び樹脂、光触媒をハイブリッド化させることにより、光触媒フィルムを形成したときに密着性を得られるようにしている。 The photocatalytic coating liquid, which is a photocatalytic film to be attached to the enclosure plate of the present invention, has photocatalytic activity due to light in a living environment and is self-cleaning property obtained by coating without going through a complicated process. It is an organic-inorganic hybrid photocatalyst coating liquid provided with. That is, the photocatalyst coating liquid according to the present invention typically obtains adhesion when a photocatalyst film is formed by hybridizing silica particles, a resin, and a photocatalyst.
例えば、前記光触媒粒子は光触媒塗工液を用いて製造した光触媒フィルムに対して3wt%〜70wt%、前記負帯電物質は光触媒塗工液を用いて製造した光触媒フィルムに対して19wt%〜80wt%、前記樹脂は光触媒塗工液を用いて製造した光触媒フィルムに対して3wt%〜60wt%の中から選択するとよい。なお、本明細書において光触媒塗工液に関して「wt%」という表記を用いた説明箇所は、これを乾燥させて光触媒フィルムとした場合の量に換算した値としている。したがって、例えば、水分の多い光触媒含有体を用いて光触媒塗工液を製造した場合であっても、光触媒塗工液における当該光触媒含有体は上記のものよりも多くなる点に留意されたい。 For example, the photocatalyst particles are 3 wt% to 70 wt% with respect to the photocatalyst film produced using the photocatalyst coating liquid, and the negatively charged substance is 19 wt% to 80 wt% with respect to the photocatalyst film produced using the photocatalyst coating liquid. The resin may be selected from 3 wt% to 60 wt% with respect to the photocatalyst film produced by using the photocatalyst coating liquid. In the present specification, the description using the notation "wt%" for the photocatalyst coating liquid is a value converted into the amount when the photocatalyst coating liquid is dried to obtain a photocatalyst film. Therefore, it should be noted that, for example, even when the photocatalyst coating liquid is produced using a photocatalyst-containing material having a large amount of water, the amount of the photocatalyst-containing material in the photocatalyst coating liquid is larger than that described above.
前記負帯電物質は、pHが7以上9未満であり、平均1次粒子径で1nm以上、かつ、平均2次粒子径で4000nm以下の範囲であり、シリカを含むとよい。 The negatively charged substance may have a pH of 7 or more and less than 9, an average primary particle size of 1 nm or more, and an average secondary particle size of 4000 nm or less, and may contain silica.
前記樹脂は、アクリル樹脂、シリコン樹脂、シリコーン樹脂、ウレタン樹脂、フッ素樹脂のいずれかを含むとよい。 The resin may contain any one of an acrylic resin, a silicone resin, a silicone resin, a urethane resin, and a fluororesin.
前記光触媒粒子は、扁平形状の結晶粒子と、それに比較して厚みがある立体形状の結晶粒子とが結合した光触媒粒子とするとよい。 The photocatalyst particles may be photocatalyst particles in which flat crystal particles and three-dimensional crystal particles having a thickness relative to the flat crystal particles are bonded to each other.
以下、本発明の実施形態について、図面を参照して説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.
まず、本実施形態の囲い板に貼付される光触媒フィルムとなる光触媒塗工液の概要について説明する。ここでは、まず、本実施形態に係る光触媒塗工液の組成物について説明し、次いで、その製造方法及び塗工方法、更に光触媒フィルムの製造方法について説明する。 First, an outline of a photocatalyst coating liquid serving as a photocatalyst film to be attached to the enclosure plate of the present embodiment will be described. Here, first, the composition of the photocatalyst coating liquid according to the present embodiment will be described, and then the production method and coating method thereof, and further the production method of the photocatalyst film will be described.
本実施形態に係る光触媒塗工液は、典型的には、以下説明する、TiO2などの光触媒含有体と、アクリル樹脂等の樹脂と、シリカ粒子等の負帯電物質とを含む。 The photocatalyst coating liquid according to the present embodiment typically contains a photocatalyst-containing substance such as TiO 2 described below, a resin such as an acrylic resin, and a negatively charged substance such as silica particles.
[光触媒含有体]
本実施形態に係る光触媒塗工液を組成する「光触媒含有体」とは、それ自体が光触媒作用を有する化合物をいい、また、それのみならず、所要の行程を経ることで光触媒に転換しうる光触媒前駆体を含むものをいう。
[Photocatalyst-containing material]
The "photocatalyst-containing substance" that composes the photocatalyst coating liquid according to the present embodiment means a compound that has a photocatalytic action by itself, and can be converted into a photocatalyst by undergoing a required process. A compound containing a photocatalytic precursor.
本実施形態に係る光触媒含有体は、例えば、扁平形状の結晶粒子と、それに比較して厚みがある立体形状の結晶粒子とが結合した光触媒粒子を含む、いわゆる可視光応答型のTiO2光触媒含有体としている。具体的には、これらに限定されるものではないが、鯤コーポレーション株式会社製のサガンコートTOsol85、TPX、TPX−HP、TPX−HL、TPX−VB、TPX−AD、TPX−ID、TPX−FxFC、TPX−FxSP、TPX−FxFA、TPX−FxFNなどのいずれか用いることができる(いずれも製品名)。加えて、これらのいずれかに対して、水系塗料である光触媒塗料を基材表面に密着させるために、例えば、イソプロピルアルコール(IPA)を溶剤として混合している。これらの混合比としては、例えば、100:1〜100:100のとすればよく、好ましくは、光触媒塗工液の種別にもよるが、100:55〜100:75である。 The photocatalyst-containing material according to the present embodiment contains, for example, a so-called visible light responsive TiO 2 photocatalyst containing photocatalyst particles in which flat crystal particles and three-dimensional crystal particles thicker than the flat crystal particles are bonded. It is a body. Specifically, but not limited to these, Sagan Coat TOsol85, TPX, TPX-HP, TPX-HL, TPX-VB, TPX-AD, TPX-ID, TPX-FxFC manufactured by Saba Corporation. , TPX-FxSP, TPX-FxFA, TPX-FxFN, etc. (all are product names). In addition, for any of these, for example, isopropyl alcohol (IPA) is mixed as a solvent in order to bring the photocatalytic paint, which is a water-based paint, into close contact with the surface of the base material. The mixing ratio thereof may be, for example, 100: 1 to 100: 100, preferably 100: 55 to 100: 75, although it depends on the type of photocatalyst coating liquid.
もっとも、本実施形態に係る光触媒含有体の材料は、TiO2のみならず、ZnO、SrTiO3、CdS、CdO、InP、In2O3、BaTiO3、K2NbO3、Fe2O3、Ta2O5、WO3、Bi2O3、NiO、Cu2O、SiO2、MoS2、MoS3、InPb、RuO2、CeO2、GaP、ZrO2、SnO2、V2O5、KTaO3、Nb2O5、CuO、MoO3、Cr2O3、GaAs、Si、CdSe、CdFeO3、RaRhO3などを用いることができる。 However, the material of the photocatalyst-containing material according to the present embodiment is not only TiO 2, but also ZnO, SrTIO 3 , CdS, CdO, InP, In 2 O 3 , BaTIO 3 , K 2 NbO 3 , Fe 2 O 3 , and Ta. 2 O 5 , WO 3 , Bi 2 O 3 , NiO, Cu 2 O, SiO 2 , MoS 2 , MoS 3 , InPb, RuO 2 , CeO 2 , GaP, ZrO 2 , SnO 2 , V 2 O 5 , KTaO 3 , Nb 2 O 5 , CuO, MoO 3 , Cr 2 O 3 , GaAs, Si, CdSe, CdFeO 3 , RaRhO 3, and the like can be used.
ここで、可視光応答型の光触媒含有体とは、例えば約400nm〜約800nmの波長の光が照射されたときに、光触媒活性や親水性といった光触媒作用を発揮することができる光触媒含有体をいう。この種の光触媒含有体を用いた光触媒塗工液は、主として、太陽光に含まれる紫外線が十分に照射されない室内等の場所においても、環境浄化効果や防汚効果が得られるといった利点がある。 Here, the visible light responsive photocatalyst-containing material refers to a photocatalyst-containing material capable of exhibiting photocatalytic action such as photocatalytic activity and hydrophilicity when irradiated with light having a wavelength of, for example, about 400 nm to about 800 nm. .. The photocatalyst coating liquid using this type of photocatalyst-containing body has an advantage that an environmental purification effect and an antifouling effect can be obtained mainly even in a place such as a room where the ultraviolet rays contained in sunlight are not sufficiently irradiated.
また、本実施形態に係る光触媒含有体は、異なる2種類の結晶粒子が結合された光触媒粒子を含んでいる点がユニークであるが、1種類の結晶粒子からなる光触媒粒子を含む光触媒塗工液が、本発明の範囲から排除されることではない点に留意されたい。 Further, the photocatalyst-containing material according to the present embodiment is unique in that it contains photocatalyst particles in which two different types of crystal particles are bonded, but a photocatalyst coating liquid containing photocatalyst particles composed of one type of crystal particles. However, it should be noted that this is not excluded from the scope of the present invention.
TEM写真で確認したところ、上記の2種類の結晶粒子のうち、扁平形状の結晶粒子は、その平均的な大きさが板面方向には、おおよそ3nm〜40nm程度の範囲に収まり、平均では10nm〜20nm程度である。また、扁平形状の光触媒粒子の厚みは、おおよそ0.3nm〜5.0nm程度の範囲に収まり、平均では1.0nm〜3.0nm程度である。本実施形態に係る光触媒含有体は、ナノオーダーサイズである点が特徴的な点の一つである。 As confirmed by TEM photographs, of the above two types of crystal particles, the average size of the flat crystal particles falls within the range of about 3 nm to 40 nm in the plate surface direction, and the average is 10 nm. It is about 20 nm. The thickness of the flat photocatalyst particles is in the range of about 0.3 nm to 5.0 nm, and is about 1.0 nm to 3.0 nm on average. One of the characteristics of the photocatalyst-containing material according to the present embodiment is that it has a nano-order size.
なお、扁平形状とは、面方向に相対的に広く、かつ、厚み方向の相対的に薄い形状の総称と定義する。面は平滑面のみでなく、多少の凹凸状、曲面状のものも含む。面の形状も限定されず、円、楕円、六角形、四角形等の多角形など何でもよい。 The flat shape is defined as a general term for a shape that is relatively wide in the surface direction and relatively thin in the thickness direction. The surface includes not only a smooth surface but also a slightly uneven or curved surface. The shape of the surface is not limited, and any polygon such as a circle, an ellipse, a hexagon, or a quadrangle may be used.
扁平形状の結晶粒子は、例えば、以下のようにして製造する。まず、例えば、四塩化チタンの約50wt%〜70wt%水溶液約10mLを、蒸留水で約1000mLに希釈した分散液に対して、約2.0wt%〜2.5wt%アンモニア水を約10mL程度滴下して、水酸化チタンの沈殿物を生成する。 The flat crystal particles are produced, for example, as follows. First, for example, about 10 mL of about 2.0 wt% to 2.5 wt% ammonia water is added dropwise to a dispersion liquid obtained by diluting about 10 mL of an aqueous solution of about 50 wt% to 70 wt% of titanium tetrachloride to about 1000 mL with distilled water. To produce a titanium hydroxide precipitate.
そして、上記分散液の中から沈殿物を遠心分離や濾別等によって抽出して、その後、水酸化チタンゲル自体を、不純物除去のために、純水、イオン交換水、蒸留水などで水洗する。水酸化チタンゲルに純水、イオン交換水、又は蒸留水を加えて100mL〜500mLとした水酸化チタン懸濁液を製造する。 Then, the precipitate is extracted from the dispersion liquid by centrifugation, filtration, or the like, and then the titanium hydroxide gel itself is washed with pure water, ion-exchanged water, distilled water, or the like in order to remove impurities. Pure water, ion-exchanged water, or distilled water is added to the titanium hydroxide gel to produce a titanium hydroxide suspension having a volume of 100 mL to 500 mL.
つぎに、水酸化チタン懸濁液に30wt%過酸化水素水を10mL〜20mL加えて攪拌してから、例えば2時間〜15時間、65℃〜400℃の温度で加熱する。この結果、鏃型形状のアナターゼ結晶の酸化チタンを含む光触媒原液を得ることができる。なお、この光触媒原液には、5nm以下の結晶化が不完全な酸化チタンも残存している。 Next, 10 mL to 20 mL of 30 wt% hydrogen peroxide solution is added to the titanium hydroxide suspension, and the mixture is stirred and then heated at a temperature of 65 ° C. to 400 ° C. for, for example, 2 hours to 15 hours. As a result, a photocatalyst stock solution containing titanium oxide, which is an anatase crystal in the shape of an arrowhead, can be obtained. In addition, titanium oxide having an incomplete crystallization of 5 nm or less remains in this photocatalyst stock solution.
上記酸化チタンの表面には、ペルオキソ基が修飾されることになる。このため、光触媒原液中では、ペルオキソ基の分極によって粒子間の電気的斥力が働き、酸化チタンが相互に反発しあうので凝集することがない。なお、光触媒原液中におけるアンモニウムイオンなども上記分散に寄与している。このため、光触媒原液は、酸化チタンが均一に分散した液体となる。また、こうして製造した酸化チタンは、1個以上のOH基を有することになる。 A peroxo group will be modified on the surface of the titanium oxide. Therefore, in the photocatalyst stock solution, the polarization of the peroxo group exerts an electrical repulsive force between the particles, and the titanium oxides repel each other and do not aggregate. Ammonium ions and the like in the photocatalyst stock solution also contribute to the above dispersion. Therefore, the photocatalyst stock solution becomes a liquid in which titanium oxide is uniformly dispersed. Further, the titanium oxide thus produced will have one or more OH groups.
つぎに、本実施形態に係る光触媒含有体に含まれている立体形状の結晶粒子について説明する。立体形状の結晶粒子とは、例えば、略球型形状、断面が略楕円型形状、円型形状、角型形状、これらの折れ線型形状などの立体的な種々の形状のものを意味する。立体形状の結晶粒子は、上述の扁平形状の結晶粒子とは異なり、面方向と厚み方向との相対差が小さい形状の総称と定義する。 Next, the three-dimensional crystal particles contained in the photocatalyst-containing material according to the present embodiment will be described. The three-dimensional crystal particles mean, for example, those having various three-dimensional shapes such as a substantially spherical shape, a substantially elliptical cross section, a circular shape, a square shape, and these polygonal linear shapes. The three-dimensional crystal particles are defined as a general term for shapes in which the relative difference between the plane direction and the thickness direction is small, unlike the flat crystal particles described above.
また、本実施形態では、扁平形状の結晶粒子の平均サイズを、立体形状の結晶粒子の平均サイズ以上としている。こうすると、扁平形状の結晶粒子の隙間に、立体形状の結晶粒子が入りこむことになり、しかも、後述するように両酸化チタンは相互に混合される。 Further, in the present embodiment, the average size of the flat crystal particles is set to be equal to or larger than the average size of the three-dimensional crystal particles. In this way, the three-dimensional crystal particles enter into the gaps between the flat crystal particles, and the titanium both oxides are mixed with each other as described later.
立体形状の結晶粒子は、例えば、以下のようにして製造する。まず、酸化鉄及び酸化チタンが主成分であるイルメナイト鉱石と硫酸とを反応させることによって硫酸塩を製造する。つぎに、硫酸塩から不純物を除去してから、その硫酸塩を加水分解して、不溶性の白色含水酸化チタンを沈澱させる。この際、一つ以上のOH基が形成される。 The three-dimensional crystal particles are produced, for example, as follows. First, a sulfate is produced by reacting ilmenite ore, which is mainly composed of iron oxide and titanium oxide, with sulfuric acid. Next, impurities are removed from the sulfate, and then the sulfate is hydrolyzed to precipitate an insoluble white titanium hydroxide. At this time, one or more OH groups are formed.
その後、これを中和洗浄し、乾燥又は焼成して、平均サイズが6nm程度で大きさにばらつきが少ない略球型となるまで微粒子化する。このように製造した酸化チタンは、1個以上のOH基を有することになる。 Then, this is neutralized and washed, dried or fired, and finely divided until it becomes a substantially spherical shape having an average size of about 6 nm and little variation in size. The titanium oxide thus produced will have one or more OH groups.
なお、上記製造方法は、いわゆる硫酸法と称されている手法であるが、これに限定されず、塩素法、フッ酸法塩化チタンカリ法、四塩化チタン水溶液法、アルコキシド加水分解法など他の製造方法を用いてもよい。 The above production method is a so-called sulfuric acid method, but is not limited to this, and other production methods such as a chlorine method, a hydrofluoric acid method, a titanium tetrachloride potassium method, a titanium tetrachloride aqueous solution method, and an alkoxide hydrolysis method are used. The method may be used.
また、本実施形態に係る光触媒含有体は、可視光照射によって光触媒作用が得られるように、可視光域の吸収が可能なバンドギャップとすべく、酸化チタンに対する各種ドーパントの導入、酸化チタンの高温還元、酸化チタンに対するX線などの高エネルギー照射などを行ってもよい。 Further, in the photocatalyst-containing material according to the present embodiment, various dopants are introduced into titanium oxide and the high temperature of titanium oxide is introduced so that the photocatalytic action can be obtained by irradiation with visible light so as to have a band gap capable of absorbing the visible light region. Reduction, high-energy irradiation such as X-ray to titanium oxide may be performed.
つぎに、扁平形状の結晶粒子と立体形状の結晶粒子とが結合した光触媒粒子を含む、いわゆる可視光応答型のTiO2光触媒含有体の製造方法について説明する。 Next, a method for producing a so-called visible light responsive TiO 2 photocatalyst-containing material containing photocatalyst particles in which flat crystal particles and three-dimensional crystal particles are bonded will be described.
まず、扁平形状の結晶粒子を含む光触媒原液に対して、立体形状の結晶粒子を混ぜて、必要に応じて、この光触媒原液を攪拌して両者を結合させる。ここで、既述のように、扁平形状の結晶粒子は、ペルオキソ基で修飾されていて光触媒原液中で分散しているので、この状態を維持しながら立体形状の結晶粒子を添加するとよい。 First, the three-dimensional crystal particles are mixed with the photocatalyst stock solution containing the flat crystal particles, and if necessary, the photocatalyst stock solution is stirred to bond the two. Here, as described above, the flat crystal particles are modified with a peroxo group and dispersed in the photocatalyst stock solution. Therefore, it is preferable to add the three-dimensional crystal particles while maintaining this state.
この添加の際には、ペルオキソ基の減少を回避する、又は、光触媒原液中における上記分散に寄与するアンモニウムイオン濃度などの不純物の減少を回避するために、ペルオキソチタン酸の濃度が例えば5wt%以下とならないようにする、又は、アンモニウムイオンなど不純物が例えば100ppm以下とならないようするとよい。 At the time of this addition, the concentration of peroxotitanic acid is, for example, 5 wt% or less in order to avoid a decrease in peroxo groups or a decrease in impurities such as an ammonium ion concentration that contributes to the above dispersion in the photocatalyst stock solution. However, it is preferable that impurities such as ammonium ions do not become 100 ppm or less, for example.
こうして、扁平形状の結晶粒子を含む光触媒原液に対して、立体形状の結晶粒子を混ぜると、扁平形状の結晶粒子も立体形状の結晶粒子も、双方ともに1個以上のOH基を有しているため、両結晶粒子は、互いのOH基部分で水素結合される。 In this way, when the three-dimensional crystal particles are mixed with the photocatalyst stock solution containing the flat-shaped crystal particles, both the flat-shaped crystal particles and the three-dimensional crystal particles have one or more OH groups. Therefore, both crystal particles are hydrogen-bonded at each other's OH group portions.
[樹脂]
つぎに、本実施形態に係る光触媒塗工液を組成する樹脂について説明する。本実施形態に係る樹脂は、光触媒フィルムを製造したときに、透光性がある仕上がりとなるようにする、好ましくは、透明性が高い仕上がりとなるようにすると、光触媒フィルムの用途が限定されないという点で利点がある。
[resin]
Next, the resin constituting the photocatalyst coating liquid according to the present embodiment will be described. It is said that the use of the photocatalyst film is not limited if the resin according to the present embodiment has a translucent finish when the photocatalyst film is manufactured, preferably a highly transparent finish. There is an advantage in that.
本実施形態に係る樹脂は、水系樹脂とすることもできるし、溶剤系樹脂とすることもできるが、環境配慮の観点から水系樹脂を用いることが好ましい。水系樹脂として、一例を挙げると、アクリル樹脂、アクリルウレタン(アクリルポリオール)、アクリルシリコン樹脂、水性シリコーン、シリコーン樹脂とアクリルとの樹脂とのブロック重合体、アクリルスチレン樹脂、ソルビタン脂肪酸エチレンオキサイド、ソルビタン脂肪酸エステル、ウレタン系アセテート、ポリカーボネートジオールおよび/又はポリイソシアネートの架橋型ウレタン、ウレタンディスパージョン、ポリアクリル酸アクリルエステル架橋体などがある。 The resin according to the present embodiment may be an aqueous resin or a solvent-based resin, but it is preferable to use an aqueous resin from the viewpoint of environmental consideration. Examples of water-based resins include acrylic resin, acrylic urethane (acrylic polyol), acrylic silicon resin, aqueous silicone, block polymer of silicone resin and acrylic resin, acrylic styrene resin, sorbitan fatty acid ethylene oxide, and sorbitan fatty acid. There are crosslinked urethanes of esters, urethane-based acetates, polycarbonate diols and / or polyisocyanates, urethane dispersions, crosslinked polyacrylic acid ester and the like.
[負帯電物質]
本実施形態では、負帯電物質として、例えば、シリカ粒子が水又は有機溶媒中にコロイド状に分散されたコロイダルシリカ、珪酸ソーダ(例えば高モル珪酸ソーダ)、シリカ化合物(例えば、ケイ酸アンモニウム)など、シリカを含むものを用いることができる。なお、負帯電物質は、光触媒塗工液の塗工面とのバインダーとしても機能するものを用いるとよい。こうすると、光触媒塗工液を用いて製造した光触媒フィルムを、その貼付対象に貼付する場合に、光触媒塗工液の塗工面との間に接着層などを形成する必要がなくなるという利点がある。本実施形態に係る負帯電物質は、ゼータ電位(界面動電電位)が−30mV〜−70mV程度のものを用いている。
[Negatively charged substance]
In the present embodiment, as the negatively charged substance, for example, colloidal silica in which silica particles are colloidally dispersed in water or an organic solvent, sodium silicate (for example, high molar sodium silicate), silica compound (for example, ammonium silicate) and the like. , Silica-containing ones can be used. As the negatively charged substance, it is preferable to use a substance that also functions as a binder with the coated surface of the photocatalyst coating liquid. This has the advantage that when the photocatalyst film produced using the photocatalyst coating liquid is attached to the application target, it is not necessary to form an adhesive layer or the like between the photocatalyst film and the coated surface of the photocatalyst coating liquid. As the negatively charged substance according to this embodiment, a substance having a zeta potential (interfacial electrokinetic potential) of about -30 mV to -70 mV is used.
本実施形態に係る負帯電物質は、光触媒含有体を含む液体中において負に帯電している光触媒含有体内の光触媒粒子と反発しあう結果、樹脂については正帯電物質と負帯電物質とが存在しているが、光触媒粒子についてはTi−O−とTi−O−とが反発しあいながら安定化していて、負帯電物質についてはSi−O−とSi−O−とが反発しあいながら安定化している。すなわち、樹脂は、相対的に分子量の小さい負帯電物質との軽い水素結合が図られ、これらの結合は、光触媒粒子が近傍にくると、負帯電物質がマイナスイオンを有するため反発しあうことで安定化し、光触媒粒子が樹脂を分解することを鈍化させている。 As a result of the negatively charged substance according to the present embodiment repelling the photocatalyst particles in the photocatalyst-containing body that are negatively charged in the liquid containing the photocatalyst-containing substance, there are positively charged substances and negatively charged substances in the resin. and which, but for the photocatalyst particles Ti-O - If you are a stabilizing while repel is, Si-O for negatively charged substances - - and Ti-O is stabilized while the can repel - and Si-O .. That is, the resin has a light hydrogen bond with a negatively charged substance having a relatively small molecular weight, and these bonds repel each other because the negatively charged substance has negative ions when the photocatalyst particles come close to each other. It stabilizes and slows the photocatalyst particles from decomposing the resin.
これにより、具体的には、光触媒フィルム上においては、基材表層に易接着処理を施した+イオンを比較的有する樹脂層が電気二重層を有して荷電子が界面近傍にてシュテルン層を形成する。これにより、光触媒フィルムの表面には、負帯電物質と光触媒粒子とが反発しあう状態で多く存在することになる。 As a result, specifically, on the photocatalyst film, the resin layer having a relatively easy-adhesion treatment on the surface layer of the base material has an electric double layer, and the valence electrons form a Stern layer near the interface. Form. As a result, many negatively charged substances and photocatalyst particles are present on the surface of the photocatalyst film in a state of repulsion.
光触媒が表面に位置する光触媒フィルムは、可視光等が照射されると、光触媒の能力を十分に活かした光触媒活性が得られる。換言すると、負帯電物質を用いずに光触媒フィルムを製造しようとすると、樹脂中に多くの光触媒粒子が位置することになり、光触媒フィルムに可視光等が照射されても電子がその近傍に飛び出すことができず、十分な光触媒活性が得られなくなってしまう。 When the photocatalyst film on which the photocatalyst is located on the surface is irradiated with visible light or the like, photocatalytic activity that fully utilizes the ability of the photocatalyst can be obtained. In other words, if an attempt is made to manufacture a photocatalyst film without using a negatively charged substance, many photocatalyst particles will be located in the resin, and even if the photocatalyst film is irradiated with visible light or the like, electrons will jump out in the vicinity thereof. This makes it impossible to obtain sufficient photocatalytic activity.
また、本実施形態に係る負帯電物質は、pHの下限を7程度とするとよい。これを下回ると、光触媒塗工液がゲル化してしまうためである。一方、負帯電物質のpHの上限は、9以下であることが好ましい。これを上回ると、光触媒塗工液が白濁化してしまい、透光性を有する光触媒フィルムが得られないためである。換言すると、本実施形態に係る光触媒フィルムが透光性を有しなくてもよい場合には、負帯電物質のpHは9を上回ってもよいということになる。 Further, the lower limit of pH of the negatively charged substance according to the present embodiment is preferably about 7. This is because if it is less than this, the photocatalyst coating liquid will gel. On the other hand, the upper limit of the pH of the negatively charged substance is preferably 9 or less. If it exceeds this, the photocatalyst coating liquid becomes cloudy, and a photocatalyst film having translucency cannot be obtained. In other words, when the photocatalytic film according to the present embodiment does not have to have translucency, the pH of the negatively charged substance may exceed 9.
なお、本実施形態に係る負帯電物質は、平均1次粒子径での粒径サイズの下限を1nm、好ましくは5nmとするとよい。粒径サイズが小さくなるほど光触媒塗工液の保存安定性が低下する傾向にあり、1nmを下回ると、本実施形態に係る光触媒塗工液の保存安定性が確保しづらいためである。換言すると、光触媒塗工液を製造後、あまり長期に保存せずに使用する場合には、上記の粒径サイズ未満の負帯電物質を採用することもできる。負帯電物質の一次粒子径の測定は、G.W.Sears,Jr.による「Analytical Chemistry 28,1981〜1983(1956)」に記載されているシアーズ法を用いて行っている。 In the negatively charged substance according to the present embodiment, the lower limit of the particle size in the average primary particle size is preferably 1 nm, preferably 5 nm. This is because the storage stability of the photocatalyst coating liquid tends to decrease as the particle size becomes smaller, and if it is less than 1 nm, it is difficult to secure the storage stability of the photocatalyst coating liquid according to the present embodiment. In other words, when the photocatalyst coating liquid is used after being manufactured without being stored for a very long period of time, a negatively charged substance having a particle size smaller than the above may be adopted. The measurement of the primary particle size of the negatively charged substance is carried out by G.I. W. Sears, Jr. The Sears method described in "Analytical Chemistry 28, 1981-1983 (1956)" is used.
また、負帯電物質の粒径サイズの上限は、400nm、好ましくは100nm、より好ましくは50nmとするとよい。粒径サイズが大きくなるほど、光触媒フィルムの透明性が低下するためである。換言すると、本実施形態に係る光触媒フィルムが透光性を有しなくてもよい場合には、負帯電物質の粒径サイズは400nmを上回ってもよく、具体的には、平均2次粒子径で4000nm程度を上限とすることができる。 The upper limit of the particle size of the negatively charged substance is preferably 400 nm, preferably 100 nm, and more preferably 50 nm. This is because the larger the particle size, the lower the transparency of the photocatalyst film. In other words, when the photocatalytic film according to the present embodiment does not have to have translucency, the particle size of the negatively charged substance may exceed 400 nm, specifically, the average secondary particle size. The upper limit can be about 4000 nm.
上記各要件を満たす負帯電物質は、水性分散液の状態で、酸性、塩基性のいずれであっても用いることができる。どのような性質の負帯電物質を用いるかは、混合する光触媒含有体及び樹脂の安定領域に応じて適宜選択すればよい。 A negatively charged substance that satisfies each of the above requirements can be used in the state of an aqueous dispersion, whether it is acidic or basic. The nature of the negatively charged substance to be used may be appropriately selected depending on the photocatalyst-containing material to be mixed and the stable region of the resin.
[光触媒塗工液の製造方法]
既述のように各々製造した光触媒含有体と樹脂と負帯電物質とを混合する。具体的には、まず、光触媒含有体を例えば100rpm〜700rpm程度の回転数で撹拌しながら、ここに負帯電物質を投入する。
[Manufacturing method of photocatalyst coating liquid]
As described above, the produced photocatalyst-containing material, the resin, and the negatively charged substance are mixed. Specifically, first, the photocatalyst-containing substance is stirred at a rotation speed of, for example, about 100 rpm to 700 rpm, and a negatively charged substance is charged therein.
なお、撹拌時間は、光触媒含有体に対する負帯電物質の投入速度、光触媒含有体と負帯電物質との総量、撹拌翼のサイズ等にもよるが、常温下であれば、例えば、光触媒含有体と負帯電物質との総量が40kL程度の場合であれば、30分程度とすればよい。 The stirring time depends on the charging rate of the negatively charged substance to the photocatalyst-containing substance, the total amount of the photocatalyst-containing substance and the negatively charged substance, the size of the stirring blade, etc. If the total amount of the negatively charged substance is about 40 kL, it may be about 30 minutes.
つづいて、上記撹拌後の負帯電物質入りの光触媒含有体を例えば100rpm〜700rpm程度の回転数で撹拌しながら、ここに樹脂を投入する。 Subsequently, the resin is added thereto while stirring the photocatalyst-containing material containing the negatively charged substance after stirring at a rotation speed of, for example, about 100 rpm to 700 rpm.
なお、撹拌時間は、負帯電物質入りの光触媒含有体に対する樹脂の投入速度等にもよるが、常温下であれば、例えば、約40kLの負帯電物質入りの光触媒含有体に対して、約20kLの樹脂を投入する場合には20分程度とすればよい。 The stirring time depends on the rate at which the resin is added to the photocatalyst-containing material containing a negatively charged substance, but at room temperature, for example, about 40 kL of the photocatalyst-containing material containing a negatively charged substance is about 20 kL. When the resin of the above is added, it may take about 20 minutes.
本実施形態に係る光触媒塗工液には、さらに、Ag、Cu、Znのような金属を添加することができる。このような金属が添加された表面層は、表面に付着した細菌や黴や藻を暗所でも死滅させることができ、よって抗菌性をより向上させることができる。添加量は、1wt%〜5wt%程度でよい。 Metals such as Ag, Cu, and Zn can be further added to the photocatalyst coating liquid according to the present embodiment. The surface layer to which such a metal is added can kill bacteria, molds and algae adhering to the surface even in a dark place, and thus can further improve antibacterial properties. The addition amount may be about 1 wt% to 5 wt%.
本実施形態に係る光触媒塗工液には、さらに、Pt、Pd、Ru、Rh、Ir、Osのような白金族金属を添加することができる。このような金属が添加された表面層は、光触媒の酸化還元活性を増強でき、有機物汚れの分解性、有害気体や悪臭の分解性を向上させることができる。添加量は、1wt%〜5wt%程度でよい。 Platinum group metals such as Pt, Pd, Ru, Rh, Ir, and Os can be further added to the photocatalyst coating liquid according to the present embodiment. The surface layer to which such a metal is added can enhance the redox activity of the photocatalyst, and can improve the decomposability of organic stains and the decomposability of harmful gases and malodors. The addition amount may be about 1 wt% to 5 wt%.
[光触媒塗工液の塗工方法]
本実施形態に係る光触媒塗工液は、各種基材表面に塗工し、硬化させることで高い親水性を有する光触媒塗膜を形成することが可能である。基材は、光触媒塗膜を形成することができる限り、特に限定されるものではない。基材の材料としては、例えば、木、紙を含む有機材料、金属を含む無機材料、及び、これらの混合物或いは化合物など様々なものが挙げられる。
[Photocatalyst coating liquid coating method]
The photocatalyst coating liquid according to the present embodiment can form a photocatalyst coating film having high hydrophilicity by applying and curing the surface of various base materials. The base material is not particularly limited as long as it can form a photocatalytic coating film. Examples of the material of the base material include various materials such as wood, an organic material including paper, an inorganic material containing metal, and a mixture or compound thereof.
例えば、有機材料としては、塩化ビニル樹脂、ポリエチレン、ポリプロピレン、ポリカーボネート、アクリル樹脂、ポリアセタール、フッ素樹脂、シリコーン樹脂、エチレン−酢酸ビニル共重合体(EVA)、アクリロニトリル−ブタジエンゴム(NBR)、ポリエチレンテレフタレート(PET)、エチレン−ビニルアルコール共重合体(EVOH)、ポリイミド樹脂、ポリフェニレンサルファイド(PPS)、アクリロニトリル−ブタジエン−スチレン(ABS)樹脂、メラミン樹脂等の合成樹脂材料、天然、合成もしくは半合成の繊維材料および繊維製品が挙げられるが、特に耐候性、強度、価格面でバランスのよいポリ塩化ビニル樹脂製を用いることが好ましい。また仮囲いという用途の性質上、不透明で隠蔽性能のある基材を使用することが好ましい。これらは、光触媒フィルム、その他の成型品、積層体などの所要の形状、構成に製品化されていてよい。 For example, as organic materials, vinyl chloride resin, polyethylene, polypropylene, polycarbonate, acrylic resin, polyacetal, fluororesin, silicone resin, ethylene-vinyl acetate copolymer (EVA), acrylonitrile-butadiene rubber (NBR), polyethylene terephthalate ( Synthetic resin materials such as PET), ethylene-vinyl alcohol copolymer (EVOH), polyimide resin, polyphenylene sulfide (PPS), acrylonitrile-butadiene-styrene (ABS) resin, melamine resin, natural, synthetic or semi-synthetic fiber materials. And textile products, but it is particularly preferable to use a polyvinyl chloride resin having a good balance in weather resistance, strength, and price. Further, due to the nature of the temporary enclosure, it is preferable to use a base material that is opaque and has concealing performance. These may be commercialized in a required shape and configuration such as a photocatalyst film, other molded products, and a laminate.
基材が有機材料からなる場合には、予め、基材を表面活性化処理しておくことが好ましい。この処理により、本実施形態に係る光触媒塗工液の基体への濡れ性および塗工性が向上する。表面活性化処理としては、例えば、コロナ処理、常圧(もしくは大気圧)プラズマ処理、低圧低温プラズマ処理、易接着処理などを用いることができる。 When the base material is made of an organic material, it is preferable to surface-activate the base material in advance. By this treatment, the wettability and coatability of the photocatalyst coating liquid according to the present embodiment to the substrate are improved. As the surface activation treatment, for example, corona treatment, normal pressure (or atmospheric pressure) plasma treatment, low pressure low temperature plasma treatment, easy adhesion treatment and the like can be used.
無機材料としては、例えば、ガラス、セラミック材料等が挙げられる。これらはタイル、碍子、ミラー等の様々な形に製品化されうる。また、無機材料としては金属が挙げられる。これには、鋳鉄、鋼材、鉄、鉄合金、アルミニウム、アルミニウム合金、ニッケル、ニッケル合金、亜鉛ダイキャスト等が含まれ、それらはメッキが施され、有機塗料が塗布されていてもよい。また、無機または有機の材料表面に施された金属メッキ被覆であってもよい。 Examples of the inorganic material include glass and ceramic materials. These can be commercialized in various forms such as tiles, insulators and mirrors. Moreover, metal is mentioned as an inorganic material. This includes cast iron, steel, iron, iron alloys, aluminum, aluminum alloys, nickel, nickel alloys, zinc diecasts and the like, which may be plated and organically coated. Further, it may be a metal plating coating applied to the surface of an inorganic or organic material.
[光触媒フィルムの製造方法]
つぎに、本実施形態に係る光触媒フィルムを製造する方法について説明する。本実施形態に係る光触媒フィルムは、まず、基材となる樹脂フィルムの厚さが例えば10μm〜300μm、好ましくは50μm〜250μm、より好ましくは50μm〜150μmの範囲となる条件で選定し、選定された基材表層に、その厚さが例えば0.1μm〜100μm、好ましくは0.1μm〜50μm、より好ましくは0.1μm〜5.0μmの範囲となる条件で、光触媒塗工液をフィルム製造装置台に塗布する。
[Manufacturing method of photocatalytic film]
Next, a method for producing the photocatalyst film according to the present embodiment will be described. The photocatalyst film according to the present embodiment was first selected and selected under the condition that the thickness of the resin film as a base material is, for example, 10 μm to 300 μm, preferably 50 μm to 250 μm, and more preferably 50 μm to 150 μm. A photocatalyst coating solution is applied to the surface layer of the base material under the condition that the thickness is, for example, 0.1 μm to 100 μm, preferably 0.1 μm to 50 μm, and more preferably 0.1 μm to 5.0 μm. Apply to.
この塗布方法は、既知のものでよく、具体的には、ディップコーティング法、スピンコーティング法、スプレーコーティング法、刷毛塗り法、含浸法、ロール法、ワイヤーバー法、ダイコーティング法、ダイレクトグラビアコーティング法、マイクログラビアコーティング法、インクジェット法、リバースコーティング法等を利用すればよい。さらに、塗工速度は、1mpm〜100mpm、好ましくは10mpm〜70mpmとすればよい。また、塗布量は、10g/m2wet〜300g/m2wet、好ましくは10g/m2wet〜50g/m2wetとなる条件とすればよい。 This coating method may be a known one, and specifically, a dip coating method, a spin coating method, a spray coating method, a brush coating method, an impregnation method, a roll method, a wire bar method, a die coating method, or a direct gravure coating method. , Microgravure coating method, inkjet method, reverse coating method and the like may be used. Further, the coating speed may be 1 mpm to 100 mmp, preferably 10 mpm to 70 mmp. Further, coating amount, 10g / m 2 wet~300g / m 2 wet, may be preferably a condition to be 10g / m 2 wet~50g / m 2 wet.
つづいて、光触媒塗工液が塗布されたフィルム製造装置台を乾燥炉内に搬送して、熱風乾燥、遠赤外線ヒーター又はパネルヒータ等によって加熱乾燥させることによって、光触媒塗工液を硬化させる。このとき、乾燥温度は30℃〜160℃、好ましくは40℃〜100℃とすればよい。 Subsequently, the film manufacturing apparatus base coated with the photocatalyst coating liquid is conveyed into a drying furnace and dried by heating with hot air drying, a far-infrared heater, a panel heater, or the like to cure the photocatalyst coating liquid. At this time, the drying temperature may be 30 ° C. to 160 ° C., preferably 40 ° C. to 100 ° C.
なお、光触媒フィルムの厚さが上記の範囲となる条件で光触媒塗工液を塗布する理由は、その塗布厚が上記下限を下回ると、光触媒フィルムとしての光触媒活性が十分に得られないことになるし、一方で上記上限を上回ると、光触媒フィルム又はその製造中の前駆体がフィルム製造装置台から剥離したり、割れたり、そりが生じたりする可能性があり、結果として薄膜の耐久性が低下することになるためである。 The reason for applying the photocatalyst coating liquid under the condition that the thickness of the photocatalyst film is within the above range is that if the coating thickness is less than the above lower limit, the photocatalytic activity as the photocatalyst film cannot be sufficiently obtained. On the other hand, if the above upper limit is exceeded, the photocatalyst film or its precursor during production may be peeled off from the film production equipment base, cracked, or warped, resulting in a decrease in the durability of the thin film. This is because it will be done.
[囲い板への光触媒フィルムの貼付方法]
本実施形態では、囲い板に対して、光触媒フィルムを容易に貼付できるようにするために、光触媒フィルムとなる光触媒塗工液をポリ塩化ビニルフィルム等の一方の面に設け、ポリ塩化ビニルフィルム等の他方の面に粘着層を設け、かつ、その粘着層の表面をシリコーン又はその他の離型剤の剥離紙又は剥離フィルムで覆われている。
[How to attach the photocatalyst film to the enclosure]
In the present embodiment, in order to make it easy to attach the photocatalyst film to the surrounding plate, a photocatalyst coating liquid to be a photocatalyst film is provided on one surface of the polyvinyl chloride film or the like, and the polyvinyl chloride film or the like is provided. An adhesive layer is provided on the other surface of the adhesive layer, and the surface of the adhesive layer is covered with a release paper or a release film of silicone or other release agent.
こうすると、場所を選ばず、囲い板に対して光触媒フィルムを貼付する際に、剥離紙等を取って、粘着層を囲い板に貼付することができる。もっとも、本実施形態に係る光触媒フィルムは、剥離紙等を設けることは必須ではなく、したがって、直接、紙などの基材に対して塗工することも可能である。 In this way, when the photocatalyst film is attached to the enclosure plate at any place, the release paper or the like can be removed and the adhesive layer can be attached to the enclosure plate. However, it is not essential that the photocatalyst film according to the present embodiment is provided with a release paper or the like, and therefore, it is possible to directly apply the photocatalyst film to a base material such as paper.
ここで、粘着層の製造にあたり、溶剤型、エマルジョン型、無溶剤型アクリル系、ゴム系、ウレタン系、又は、シリコーン系のものなど、各種樹脂等を用いる。これらのいずれか又はこれらの幾つかを混合したものを剥離紙等に塗布する。この際、コンマ法、グラビア法、メイヤーバー法、ダイコーティング法、ロール法、リバースコーティング法、ディップ法等を利用することができる。塗工速度は、1mpm〜100mpm、好ましくは10mpm〜70mpmとすればよい。また、塗布量は、10g/m2dry〜300g/m2dry、好ましくは20g/m2dry〜60g/m2dryとなる条件とすればよい。 Here, in producing the adhesive layer, various resins such as solvent type, emulsion type, solvent-free acrylic type, rubber type, urethane type, and silicone type are used. One of these or a mixture of some of these is applied to a release paper or the like. At this time, a comma method, a gravure method, a Mayer bar method, a die coating method, a roll method, a reverse coating method, a dip method and the like can be used. The coating speed may be 1 mpm to 100 mmp, preferably 10 mpm to 70 mmp. Further, coating amount, 10g / m 2 dry~300g / m 2 dry, it may be preferably a condition to be 20g / m 2 dry~60g / m 2 dry.
つづいて、上記各種樹脂等が塗布された剥離紙等を乾燥炉内に搬送して、熱風乾燥、遠赤外線ヒーター又はパネルヒータ等によって加熱乾燥させることによって硬化させる。このとき、乾燥温度は30℃〜150℃、好ましくは60℃〜110℃とすればよい。 Subsequently, the release paper or the like coated with the above-mentioned various resins or the like is conveyed into a drying furnace and cured by hot air drying, heating and drying with a far-infrared heater, a panel heater, or the like. At this time, the drying temperature may be 30 ° C. to 150 ° C., preferably 60 ° C. to 110 ° C.
本実施形態に係る光触媒フィルムは、後述の各実施例で説明するように、
(1)密着性に優れているため、一般的には密着性が確保しにくいポリ塩化ビニルフィルム等からも剥離しにくいという利点があり、たとえ、囲い板の運搬時などに外力が掛かっても剥離しにくく、
(2)加えて、有機物の分解能力に優れているので効果的な空気浄化が可能で、また、可視光応答型でもあるため、屋外工事現場での使用する囲い板のみならず、屋内工事現場で使用する囲い板としても好適であり、
(3)光触媒の親水性の発現が見られ、セルフクリーニング性も優れているので、屋外工事現場での使用にももちろん好適であり、
(4)光触媒の塗膜が劣化しにくいということから、密着性及び屋外使用時の点で利点がある。
The photocatalyst film according to this embodiment will be described in each of the examples below.
(1) Since it has excellent adhesion, it has the advantage that it is difficult to peel off even from polyvinyl chloride film, which is generally difficult to secure adhesion, and even if an external force is applied during transportation of the enclosure plate, etc. Hard to peel off
(2) In addition, since it has an excellent ability to decompose organic matter, effective air purification is possible, and because it is also a visible light responsive type, it is not only an enclosure used at outdoor construction sites, but also indoor construction sites. It is also suitable as an enclosure for use in
(3) Since the photocatalyst exhibits hydrophilicity and has excellent self-cleaning properties, it is of course suitable for use at outdoor construction sites.
(4) Since the coating film of the photocatalyst is less likely to deteriorate, there are advantages in terms of adhesion and outdoor use.
本実施形態の囲い板は、例えば、定期的に又は不定期に、表面の光触媒フィルムを張り替えるとよい。これにより、使用により光触媒フィルムが多少剥離したとしても、新品状態に戻すことができるためである。これは、焼き付け塗装をするタイプの囲い板の場合には得られない利点でもある。 For the enclosure plate of the present embodiment, for example, the photocatalyst film on the surface may be replaced regularly or irregularly. This is because even if the photocatalyst film is slightly peeled off by use, it can be returned to a new state. This is also an advantage that cannot be obtained in the case of a baking finish type enclosure.
また、見方を変えると、焼き付け塗装をするタイプの囲い板の場合には、定期的に又は不定期に、囲い板を洗浄し、乾燥し、必要に応じて塗装場所まで運搬して再塗装するなどの、種々の作業が必要となる。これに対して、光触媒フィルムを張替作業は、簡易に行うことができ、コストも低廉とすることができるし、運搬時に運搬車を用いることによって生じる二酸化炭素の排出低減ができるといった利点もある。 From a different point of view, in the case of a baking-painting type enclosure, the enclosure is cleaned and dried regularly or irregularly, and if necessary, transported to the painting site for repainting. Various operations such as are required. On the other hand, the photocatalyst film re-covering work can be easily performed, the cost can be reduced, and the emission of carbon dioxide generated by using a transport vehicle during transportation can be reduced. ..
なお、光触媒フィルムの塗布対象は、ポリ塩化ビニルフィルムに限定されるものではなく、実施例に記載の各種樹脂フィルムであったり、それ以外の樹脂フィルムであったり、更には金属等が含まれることは言うまでもない。 The application target of the photocatalyst film is not limited to the polyvinyl chloride film, but may be various resin films described in the examples, other resin films, and further include metals and the like. Needless to say.
本発明の囲い板の実施例として、樹脂フィルムに関して説明するが、本発明の範囲はこれらの実施例に限定されるものではない点に留意されたい。 Although the resin film will be described as an example of the enclosure plate of the present invention, it should be noted that the scope of the present invention is not limited to these examples.
(実施例1)
本実施例では、まず、光触媒塗工液(TPX−FxFC 鯤コーポレーション社製)とイソプロピルアルコール(和光純薬社製)とを、例えば100:55〜75の割合で配合する。また、基材表面に対して当該イソプロピルアルコールを下地材として塗工することによって表面活性化処理を施し、上記イソプロピルアルコールを配合した光触媒塗工液等との密着性を高める。それから、塩ビフィルム基材(東和合成工業社製)に対して、ダイレクトグラビアコーティング法にて、塗布量を例えば10g/m2dry〜50g/m2wet、乾燥温度を例えば40℃〜100℃、塗工速度を例えば10mpm〜70mpmとする条件で塗工処理を行った。
(Example 1)
In this embodiment, first, a photocatalytic coating liquid (manufactured by TPX-FxFC Saba Corporation) and isopropyl alcohol (manufactured by Wako Pure Chemical Industries, Ltd.) are blended in a ratio of, for example, 100: 55 to 75. Further, the surface of the base material is coated with the isopropyl alcohol as a base material to perform a surface activation treatment to improve the adhesion to the photocatalyst coating liquid or the like containing the isopropyl alcohol. Then, the PVC film base material (manufactured by Towa Synthetic Industry Co., Ltd.) was coated with a direct gravure coating method, for example, a coating amount of 10 g / m 2 dry to 50 g / m 2 wet, and a drying temperature of, for example, 40 ° C to 100 ° C. The coating treatment was performed under the condition that the coating speed was, for example, 10 mpm to 70 mpm.
(実施例2)
本実施例は、実施例1と対比すると、表面活性化処理していない点のみ相違する。すなわち、本実施例では、光触媒塗工液(TPX−FxFC 鯤コーポレーション社製)とイソプロピルアルコール(和光純薬社製)とを、例えば100:55〜75の割合で配合し、塩ビフィルム基材(東和合成工業社製)に対して、ダイレクトグラビアコーティング法にて、塗布量を例えば10g/m2wet〜50g/m2wet、乾燥温度を例えば40℃〜100℃、塗工速度を例えば10mpm〜70mpmとする条件で塗工処理を行った。
(Example 2)
This example differs from Example 1 only in that it has not been surface-activated. That is, in this embodiment, a photocatalytic coating liquid (manufactured by TPX-FxFC Saba Corporation) and isopropyl alcohol (manufactured by Wako Pure Chemical Industries, Ltd.) are blended at a ratio of, for example, 100: 55 to 75, and a vinyl chloride film base material (manufactured by Wako Pure Chemical Industries, Ltd.) is blended. Towa respect Gosei Co., Ltd.) at a direct gravure coating method, the coating amount for example 10g / m 2 wet~50g / m 2 wet, drying temperature, for example 40 ° C. to 100 ° C., the coating speed for example 10mpm~ The coating treatment was performed under the condition of 70 mpm.
(実施例3)
本実施例は、実施例1と対比すると、表面活性化処理を施していない点に加えて、光触媒塗工液の種別が相違する。すなわち、本実施例では、光触媒塗工液(TPX−FxFA 鯤コーポレーション社製)とイソプロピルアルコール(和光純薬社製)とを、例えば100:55〜75の割合で配合し、塩ビフィルム基材(東和合成工業社製)に対して、ダイレクトグラビアコーティング法にて、塗布量を例えば10g/m2wet〜50g/m2wet、乾燥温度を例えば40℃〜100℃、塗工速度を例えば10mpm〜70mpmとする条件で塗工処理を行った。
(Example 3)
Compared with Example 1, this example is different in the type of photocatalyst coating liquid in addition to the fact that the surface activation treatment is not applied. That is, in this embodiment, a photocatalytic coating liquid (manufactured by TPX-FxFA Saba Corporation) and isopropyl alcohol (manufactured by Wako Pure Chemical Industries, Ltd.) are blended at a ratio of, for example, 100: 55 to 75, and a vinyl chloride film base material (manufactured by Wako Pure Chemical Industries, Ltd.) is blended. Towa respect Gosei Co., Ltd.) at a direct gravure coating method, the coating amount for example 10g / m 2 wet~50g / m 2 wet, drying temperature, for example 40 ° C. to 100 ° C., the coating speed for example 10mpm~ The coating treatment was performed under the condition of 70 mpm.
(実施例4)
本実施例は、実施例1と対比すると種々の点が相違する。すなわち、本実施例では、光触媒塗工液(TPX−FxFA 鯤コーポレーション社製)とイソプロピルアルコールとを約100:65の割合で配合し、塩ビフィルム基材(東和合成工業社製)に対して、手塗りで例えば20g/m2、乾燥温度を例えば100℃、乾燥時間を例えば5分間とする条件で塗工処理を行った。
(Example 4)
This example differs from Example 1 in various points. That is, in this embodiment, the photocatalyst coating liquid (manufactured by TPX-FxFA Saba Corporation) and isopropyl alcohol are blended at a ratio of about 100:65, and the PVC film base material (manufactured by Towa Synthetic Industry Co., Ltd.) is mixed. hand-painted, for example, 20 g / m 2, the drying temperature, for example 100 ° C., the coating treatment was carried out under conditions that the drying time for example, 5 minutes.
(比較例1)
本比較例として、既述のような光触媒塗工液の塗工処理を行っていない塩ビフィルム基材(東和合成工業社製)を用意した。
(Comparative Example 1)
As this comparative example, a vinyl chloride film base material (manufactured by Towa Synthetic Industry Co., Ltd.) that has not been coated with the photocatalyst coating liquid as described above was prepared.
(比較例2)
本実施例は、相対的に見ると実施例4における条件と近いが、光触媒塗工液の種別と、光触媒塗工液に対してイソプロピルアルコールを配合していない点と、表面活性化処理を施していない点とが相違する。すなわち、本比較例では、光触媒塗工液(TPX−FxFC 鯤コーポレーション社製)を、塩ビフィルム基材(東和合成工業社製)に対して、手塗りで20g/m2、乾燥温度を100℃、乾燥時間を5分間とする条件で塗工処理を行った。
(Comparative Example 2)
This example is relatively close to the conditions in Example 4, but the type of photocatalyst coating liquid, the fact that isopropyl alcohol is not mixed with the photocatalyst coating liquid, and the surface activation treatment are applied. It is different from the point that it is not. That is, in this comparative example, the photocatalytic coating liquid (manufactured by TPX-FxFC Saba Corporation) was manually applied to a vinyl chloride film base material (manufactured by Towa Synthetic Industry Co., Ltd.) at 20 g / m 2 and the drying temperature was 100 ° C. The coating treatment was carried out under the condition that the drying time was 5 minutes.
つぎに、各実施例及び各比較例の光触媒塗工液を用いて、実施形態で説明した方法によって、厚みが1μmとなる光触媒フィルムを形成した。これらの光触媒フィルムについて、下記項目について各々測定又は評価した。 Next, using the photocatalyst coating liquids of each Example and each Comparative Example, a photocatalyst film having a thickness of 1 μm was formed by the method described in the embodiment. Each of these photocatalytic films was measured or evaluated for the following items.
1.外観の見た目の評価
2.分解活性:JIS R1703に準じた分解活性評価
1. 1. Evaluation of appearance 2. Degradation activity: Evaluation of degradation activity according to JIS R1703
なお、分解活性については、本塗工液に使用した酸化チタンは可視光応答性が認められるため、紫外光を照射することに代えて可視光を照射した。 Regarding the decomposition activity, since the titanium oxide used in this coating liquid was recognized to have visible light responsiveness, visible light was irradiated instead of ultraviolet light.
表1は、既述の各実施例及び各比較例の各種前提条件及び測定結果をまとめたものである。
まず、比較例について考察してみる。
比較例1では、そもそも塩ビフィルム基材に対して光触媒塗工液を塗布していないため、分解活性が−0.07という結果になった。つまり、比較例1のものは、分解活性といった光触媒活性が得られないということがわかる。
First, let us consider a comparative example.
In Comparative Example 1, since the photocatalyst coating liquid was not applied to the PVC film base material in the first place, the decomposition activity was −0.07. That is, it can be seen that in Comparative Example 1, photocatalytic activity such as decomposition activity cannot be obtained.
また、比較例2では、塩ビフィルム基材に対して光触媒塗工液を塗布しているものの、当該光触媒塗工液にはイソプロピルアルコールが配合されていない。このため、塩ビフィルム基材に対して光触媒塗工液が十分に濡れ広がらず、結果的には、外観上、塩ビフィルム基材には所望の光触媒塗膜が形成されていなかった。したがって、比較例2のものも、結果的に、所望の光触媒作用が得られるものではないことがわかる。 Further, in Comparative Example 2, although the photocatalyst coating liquid was applied to the vinyl chloride film base material, isopropyl alcohol was not blended in the photocatalyst coating liquid. Therefore, the photocatalyst coating liquid did not sufficiently wet and spread on the PVC film base material, and as a result, the desired photocatalyst coating film was not formed on the PVC film base material in appearance. Therefore, it can be seen that even in Comparative Example 2, the desired photocatalytic action cannot be obtained as a result.
これらに対して、実施例1〜4のものは、いずれも外観異常も見受けられず、また、優れた分解活性効果が確認できた。付言すると、分解活性は、5.0以上の数値であれば、光触媒工業会で設定されている所定のセルフクリーニング性能があるといえるので、本実施例のいずれのものも、セルフクリーニング性能を有していることになる。 On the other hand, in each of Examples 1 to 4, no abnormal appearance was observed, and an excellent decomposition activity effect was confirmed. In addition, if the decomposition activity has a value of 5.0 or more, it can be said that there is a predetermined self-cleaning performance set by the Photocatalyst Industry Association. Therefore, all of the examples have the self-cleaning performance. You will be doing.
加えて、実施例1では、表面活性化処理を施しているため、そうでない実施例2に比して、高い分解活性が得られることがわかる。もっとも、実施例3では、表面活性化処理を施していないが、光触媒塗工液の種別を変更することで、実施例2のものよりは、高い分解活性が得られることがわかる。さらに、実施例4では、表面活性化処理を施していないが、光触媒塗工液の種別に応じて、これに適した割合でイソプロピルアルコールを配合したものを用いることで、高い分解活性が得られることがわかる。 In addition, it can be seen that in Example 1, since the surface activation treatment is performed, higher decomposition activity can be obtained as compared with Example 2 in which the surface activation treatment is not performed. However, in Example 3, although the surface activation treatment was not performed, it can be seen that higher decomposition activity can be obtained than that in Example 2 by changing the type of the photocatalyst coating liquid. Further, in Example 4, although the surface activation treatment is not performed, high decomposition activity can be obtained by using a photocatalyst coating liquid in which isopropyl alcohol is blended in an appropriate ratio according to the type of the photocatalyst coating liquid. You can see that.
なお、本実施例では、光触媒塗工液に配合する溶剤の例として、イソプロピルアルコールを挙げたが、これに限定されるものではなく、エタノール、水などを用いることもできる。
In this example, isopropyl alcohol has been mentioned as an example of the solvent to be blended in the photocatalyst coating liquid, but the present invention is not limited to this, and ethanol, water and the like can also be used.
Claims (8)
厚さが10μm〜300μmの範囲の樹脂フィルムに、1mpm〜100mpmの塗工速度で0.1μm〜100μmの範囲の厚さとなるように前記光触媒塗工液を塗布して硬化して、硬化した後の光触媒塗工液のうち表面の部分には表面を除く他の部分に比較して、より多くの負帯電物質と光触媒粒子が存在する光触媒フィルムを製造するステップと、
囲い板に光触媒フィルムを貼付するステップと、
を含む囲い板の製造方法。 A negatively charged substance having a zeta potential of -30 mV to -70 mV in a stock solution that repels each other between the nano-order size photocatalyst particles and the photocatalyst particles in a solvent containing the photocatalyst particles, and an uncured resin. , A step of mixing isopropyl alcohol as a solvent with the water-based coating material containing the photocatalyst particles at a ratio of 100: 1 to 100: 100 to produce a photocatalyst coating liquid.
After applying the photocatalyst coating liquid to a resin film having a thickness in the range of 10 μm to 300 μm so as to have a thickness in the range of 0.1 μm to 100 μm at a coating rate of 1 mpm to 100 mmp, the photocatalyst coating liquid is cured, and then cured. The step of producing a photocatalyst film in which more negatively charged substances and photocatalyst particles are present in the surface part of the photocatalyst coating liquid than in other parts other than the surface.
Steps to attach the photocatalyst film to the enclosure and
A method of manufacturing an enclosure including.
前記負帯電物質は光触媒塗工液を用いて製造した光触媒フィルムに対して19wt%〜80wt%、
前記樹脂は光触媒塗工液を用いて製造した光触媒フィルムに対して3wt%〜60wt%の中から選択される請求項1記載の囲い板の製造方法。 The photocatalyst particles are 3 wt% to 70 wt% with respect to the photocatalyst film produced by using the photocatalyst coating liquid.
The negatively charged substance is 19 wt% to 80 wt% with respect to the photocatalyst film produced by using the photocatalyst coating liquid.
The method for producing an enclosure according to claim 1, wherein the resin is selected from 3 wt% to 60 wt% with respect to the photocatalyst film produced by using the photocatalyst coating liquid.
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