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JP6955202B2 - Manufacturing method of substrate with film - Google Patents
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JP6955202B2 - Manufacturing method of substrate with film - Google Patents

Manufacturing method of substrate with film Download PDF

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JP6955202B2
JP6955202B2 JP2017169436A JP2017169436A JP6955202B2 JP 6955202 B2 JP6955202 B2 JP 6955202B2 JP 2017169436 A JP2017169436 A JP 2017169436A JP 2017169436 A JP2017169436 A JP 2017169436A JP 6955202 B2 JP6955202 B2 JP 6955202B2
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substrate
film
adhesive layer
main surface
forming
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JP2019044237A (en
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悦二 福井
悦二 福井
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Nippon Electric Glass Co Ltd
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Description

本発明は、膜付き基板の製造方法に関する。 The present invention relates to a method for manufacturing a substrate with a film.

ガラス基板等の基板の両主面のうち、基板の一方の主面のみに機能性膜を成膜する場合がある。この場合、基板の他方の主面を基板用保護具により保護することで、基板の他方の主面における機能性膜の成膜を抑えることができる。例えば、特許文献1では、基板の他方の主面における周縁部に付着する付着面を有する治具を用いることで、基板の他方の主面の周縁部への成膜材料の付着を抑えている。 Of both main surfaces of a substrate such as a glass substrate, a functional film may be formed only on one main surface of the substrate. In this case, by protecting the other main surface of the substrate with a protective tool for the substrate, it is possible to suppress the formation of a functional film on the other main surface of the substrate. For example, in Patent Document 1, the adhesion of the film-forming material to the peripheral edge of the other main surface of the substrate is suppressed by using a jig having an adhesive surface that adheres to the peripheral edge of the other main surface of the substrate. ..

特開2016−197623号公報Japanese Unexamined Patent Publication No. 2016-197623

上記従来技術のように、基板の一方の主面のみに機能性膜を成膜する際に、成膜材料の回り込みによる基板の他方の主面周縁部への成膜材料の付着を抑える技術について未だ改善の余地がある。 A technique for suppressing adhesion of a film-forming material to the peripheral edge of the other main surface of a substrate due to wraparound of the film-forming material when a functional film is formed on only one main surface of the substrate as in the above-mentioned conventional technique. There is still room for improvement.

本発明の目的は、基板の一方の主面のみに機能性膜を好適に成膜することのできる膜付き基板の製造方法を提供することにある。 An object of the present invention is to provide a film-coated substrate manufacturing method of that can in fact be only suitably deposited a functional film on the one principal surface of the substrate.

上記課題を解決する膜付き基板の製造方法は、第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、前記基板用保護具は、可撓性材料から構成され、少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、前記基材シートと前記基板の周縁部とを粘着させる粘着層と、前記基材シートを挟んで前記粘着層の反対の位置に配置されるスペーサーとを備え、前記基材シートは、前記粘着層に囲まれる位置に貫通孔を有し、前記製造方法は、前記基板用保護具と前記基板とを粘着させた成膜用基板を準備する準備工程と、前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備え、前記準備工程では、前記基板用保護具を載置する載置面と前記載置面に開口する吸引部とを有する吸引装置が用いられ、前記載置面と前記基材シートとの間に前記スペーサーが配置されるように前記基板用保護具を前記吸引装置の前記載置面に載置し、前記吸引部により前記基板用保護具の前記基材シートの前記貫通孔を通じて前記粘着層上の前記基板を吸引する。 Method for producing a film-coated substrate to solve the above problems, a first major surface, a substrate protection which protects the first major surface of the substrate and a second main surface on the opposite side of the first main surface A method for manufacturing a film-coated substrate using the film-coated substrate , wherein the protective device for the substrate is made of a flexible material and has a size capable of covering at least the peripheral edge of the substrate. The base sheet is provided with a base sheet, an adhesive layer for adhering the base sheet to the peripheral edge of the substrate, and a spacer arranged at a position opposite to the pressure-sensitive adhesive layer across the base sheet. may have a through hole at a position surrounded by the adhesive layer, the manufacturing method includes a preparation step of preparing a deposition substrate by the adhesive and the substrate and the substrate protection, the deposition substrate In the preparatory step, a film forming step of forming a functional film on the second main surface of the substrate is provided. A suction device having a portion is used, and the protective device for a substrate is placed on the front-described mounting surface of the suction device so that the spacer is arranged between the front-described mounting surface and the base material sheet. The suction portion sucks the substrate on the adhesive layer through the through hole of the base sheet of the protective device for the substrate.

この方法によれば、成膜前に基材シートの貫通孔を通じて基板を吸引し、粘着層により基板の周縁部と基材シートの周縁部どうしを粘着させることができ、成膜時に成膜材料が回り込んで基板の第1主面の周縁部に付着することを抑制できる。また、基板が、例えば0.05〜1.5mmと薄い場合には、吸引時に基板が撓んだとしても、可撓性材料から構成した基材シートも撓むため、基板の周縁部と基材シートの周縁部との間の粘着層が剥がれることがない。また、基板に基板用保護具を取り付ける際に、基板の第2主面を治具等で押圧しなくてもよいため、基板の第2主面の清浄性が保たれ易い。また、基板用保護具は、上記スペーサーを備えるため、吸引時に基板及び基材シートが撓んでも吸引装置の載置面に接触することを抑制することができる。 According to this method , the substrate is sucked through the through hole of the base material sheet before film formation, and the peripheral edge portion of the substrate and the peripheral edge portion of the base material sheet can be adhered to each other by the adhesive layer, and the film forming material can be formed at the time of film formation. Can be prevented from wrapping around and adhering to the peripheral edge of the first main surface of the substrate. Further, when the substrate is as thin as 0.05 to 1.5 mm, even if the substrate bends during suction, the base sheet made of a flexible material also bends, so that the base sheet and the peripheral portion of the substrate are formed. The adhesive layer between the material sheet and the peripheral edge of the material sheet does not come off. Further, when the protective device for the substrate is attached to the substrate, it is not necessary to press the second main surface of the substrate with a jig or the like, so that the cleanliness of the second main surface of the substrate can be easily maintained. Further, since the protective tool for the substrate includes the spacer, it is possible to prevent the substrate and the base material sheet from coming into contact with the mounting surface of the suction device even if the substrate and the base material sheet are bent during suction.

上記膜付き基板の製造方法において、前記基板用保護具の前記粘着層は、環状に形成されることが好ましい。
この方法によれば、成膜時に成膜材料が回り込んで基板の第1主面の周縁部に付着することをさらに抑制できる。
In the method for manufacturing a substrate with a film, it is preferable that the adhesive layer of the protective device for the substrate is formed in an annular shape.
According to this method , it is possible to further prevent the film-forming material from wrapping around during film formation and adhering to the peripheral edge of the first main surface of the substrate.

本発明によれば、基板の一方の主面のみに機能性膜を好適に成膜することができる。 According to the present invention, a functional film can be suitably formed on only one main surface of a substrate.

実施形態における基板用保護具を示す分解斜視図である。It is an exploded perspective view which shows the protective equipment for a substrate in an embodiment. 成膜用基板を示す斜視図である。It is a perspective view which shows the substrate for film formation. 基板用保護具及び膜付き基板を示す斜視図である。It is a perspective view which shows the protective equipment for a substrate and the substrate with a film. 成膜用基板の準備工程を説明する斜視図である。It is a perspective view explaining the preparation process of the substrate for film formation. 成膜用基板の準備工程を説明する端面図である。It is an end view explaining the preparation process of the substrate for film formation. 成膜用基板の準備工程を説明する端面図である。It is an end view explaining the preparation process of the substrate for film formation. 成膜用基板の変更例を示す端面図である。It is an end view which shows the modification example of the film-forming substrate. 成膜用基板の準備工程を説明する端面図である。It is an end view explaining the preparation process of the substrate for film formation.

以下、本発明の基板用保護具、及び膜付き基板の製造方法の実施形態について図面を参照して説明する。なお、図面では、説明の便宜上、構成の一部(例えば、厚さ)を誇張して示す場合がある。また、各部分の寸法比率についても、実際と異なる場合がある。 Hereinafter, embodiments of the substrate protective tool of the present invention and the method for manufacturing a substrate with a film will be described with reference to the drawings. In the drawings, for convenience of explanation, a part (for example, thickness) of the configuration may be exaggerated. In addition, the dimensional ratio of each part may differ from the actual one.

図1に示すように、基板用保護具11を用いて保護する基板Sは、第1主面S1と、第1主面S1の反対側の第2主面S2とを有している。基板用保護具11は、基板Sの第1主面S1を保護する。基板用保護具11で保護された基板Sの第2主面S2は、機能性膜が成膜される主面であり、この第2主面S2に機能性膜を成膜することで、膜付き基板が得られる。本実施形態では、基板Sとしてガラス基板を用いているが、例えば、樹脂基板やセラミック基板を用いることもできる。 As shown in FIG. 1, the substrate S protected by the substrate protective tool 11 has a first main surface S1 and a second main surface S2 on the opposite side of the first main surface S1. The substrate protective tool 11 protects the first main surface S1 of the substrate S. The second main surface S2 of the substrate S protected by the protective tool 11 for the substrate is the main surface on which the functional film is formed, and by forming the functional film on the second main surface S2, the film is formed. Attached substrate is obtained. In the present embodiment, a glass substrate is used as the substrate S, but for example, a resin substrate or a ceramic substrate can also be used.

基板用保護具11は、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12と、基材シート12と基板Sの周縁部とを粘着させる粘着層13とを備えている。 The substrate protective tool 11 includes a base sheet 12 having a size capable of covering at least the peripheral edge of the substrate S, and an adhesive layer 13 for adhering the base sheet 12 and the peripheral edge of the substrate S. ing.

基材シート12は、可撓性材料から構成されている。可撓性材料としては、例えば、樹脂材料又はゴム材料等の高分子材料が挙げられる。基材シート12は、柔軟(軟質)であり、変形し易い。樹脂材料としては、例えば、ポリオレフィン樹脂、ポリエステル樹脂、ポリアミド樹脂、及びポリイミド樹脂が挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。例えば、加熱を伴う成膜を行う場合、成膜時の熱に耐え得る耐熱性の基材シート12を用いればよい。基材シート12の厚さは、例えば、10μm以上、500μm以下の範囲である。 The base sheet 12 is made of a flexible material. Examples of the flexible material include polymer materials such as resin materials and rubber materials. The base sheet 12 is flexible (soft) and easily deformed. Examples of the resin material include polyolefin resin, polyester resin, polyamide resin, and polyimide resin. Examples of the rubber material include silicon rubber, urethane rubber, chloroprene rubber, styrene / butadiene rubber, and ethylene / propylene / diene rubber. For example, when forming a film with heating, a heat-resistant base sheet 12 that can withstand the heat during the film formation may be used. The thickness of the base sheet 12 is, for example, in the range of 10 μm or more and 500 μm or less.

粘着層13は、環状に形成されている。粘着層13は、基材シート12に設けられている。粘着層13は、周知の粘着材料から構成することができる。粘着層13としては、例えば、シリコーン系粘着層、アクリル系粘着層、及びウレタン系粘着層が挙げられる。例えば、加熱を伴う成膜を行う場合、成膜時の熱に耐え得る耐熱性の粘着層を用いればよい。粘着層13は、両面粘着テープの一方の面を構成する粘着層や、基材シート12に塗布することで形成した粘着層から構成することができる。本実施形態では、両面粘着テープを基材シート12に貼り合わせることで基材シート12に粘着層13を設けている。なお、図面では、両面粘着テープの支持体、及び両面粘着テープの他方の面を構成する粘着層(支持体を基材シート12に粘着する粘着層)については省略している。両面粘着テープの支持体は、例えば、ポリイミドフィルムやPETフィルム等の樹脂フィルムから構成されている。 The adhesive layer 13 is formed in an annular shape. The adhesive layer 13 is provided on the base sheet 12. The adhesive layer 13 can be made of a well-known adhesive material. Examples of the adhesive layer 13 include a silicone-based adhesive layer, an acrylic-based adhesive layer, and a urethane-based adhesive layer. For example, when forming a film with heating, a heat-resistant adhesive layer that can withstand the heat during the film formation may be used. The adhesive layer 13 can be composed of an adhesive layer forming one surface of the double-sided adhesive tape or an adhesive layer formed by applying the adhesive layer to the base sheet 12. In the present embodiment, the adhesive layer 13 is provided on the base sheet 12 by attaching the double-sided adhesive tape to the base sheet 12. In the drawings, the support of the double-sided adhesive tape and the adhesive layer forming the other surface of the double-sided adhesive tape (the adhesive layer that adheres the support to the base sheet 12) are omitted. The support of the double-sided adhesive tape is made of, for example, a resin film such as a polyimide film or a PET film.

粘着層13の基板Sに対する粘着力は、成膜後において基板Sから粘着層13を容易に剥離させる観点から、例えば、3.0(N/25mm幅)以下の弱粘着性を有することが好ましい。なお、粘着層13の基板Sに対する粘着力の下限は、基板Sに対する密着性を確保し易くするため、0.05(N/25mm幅)以上であることが好ましい。粘着層13の粘着力は、JIS Z0237(2009)に規定される180°剥離試験に準拠して測定される。 The adhesive strength of the adhesive layer 13 to the substrate S is preferably 3.0 (N / 25 mm width) or less, for example, from the viewpoint of easily peeling the adhesive layer 13 from the substrate S after film formation. .. The lower limit of the adhesive force of the adhesive layer 13 to the substrate S is preferably 0.05 (N / 25 mm width) or more in order to facilitate the adhesion to the substrate S. The adhesive strength of the adhesive layer 13 is measured according to the 180 ° peeling test specified in JIS Z0237 (2009).

図1及び図2に示すように、基材シート12は、粘着層13に囲まれる位置に貫通孔12aを有している。詳述すると、基材シート12において粘着層13に囲まれる内側は、非粘着部として構成され、この非粘着部が貫通孔12aを有している。基材シート12の貫通孔12aは、基板用保護具11を基板Sに取り付ける際に、基板Sと基材シート12との間の空気を排出するための空気排出孔として用いられる。貫通孔12aの数は、本実施形態のように単数であってもよいし、複数に変更してもよい。貫通孔12aの形状は、本実施形態のように四角形状であってもよいし、例えば、円形状に変更してもよい。貫通孔12aの面積は、基材シート12の面積を100%としたとき、例えば、5%以上、50%以下の範囲であることが好ましい。貫通孔12aの面積が大きいほど、空気排出孔としての機能がより発揮され易くなる。貫通孔12aの面積が小さいほど、基板Sの第1主面S1を基材シート12でより広く覆うことができるため、第1主面S1の清浄性が保たれ易くなる。貫通孔12aは、基材シート12の非粘着部の周縁よりも中央に近い位置に形成されていることが好ましい。この場合、基板Sと基材シート12との間における全体の空気をバランスよく排出することができる。 As shown in FIGS. 1 and 2, the base sheet 12 has a through hole 12a at a position surrounded by the adhesive layer 13. More specifically, the inside of the base sheet 12 surrounded by the adhesive layer 13 is configured as a non-adhesive portion, and this non-adhesive portion has a through hole 12a. The through hole 12a of the base sheet 12 is used as an air discharge hole for discharging air between the substrate S and the base sheet 12 when the substrate protective tool 11 is attached to the substrate S. The number of through holes 12a may be singular as in the present embodiment, or may be changed to a plurality. The shape of the through hole 12a may be a quadrangular shape as in the present embodiment, or may be changed to a circular shape, for example. The area of the through hole 12a is preferably in the range of, for example, 5% or more and 50% or less when the area of the base sheet 12 is 100%. The larger the area of the through hole 12a, the easier it is for the function as an air discharge hole to be exhibited. The smaller the area of the through hole 12a, the wider the first main surface S1 of the substrate S can be covered with the base sheet 12, so that the cleanliness of the first main surface S1 can be easily maintained. The through hole 12a is preferably formed at a position closer to the center than the peripheral edge of the non-adhesive portion of the base sheet 12. In this case, the entire air between the substrate S and the base sheet 12 can be discharged in a well-balanced manner.

本実施形態の基板用保護具11は、基材シート12を挟んで粘着層13の反対の位置に配置されるスペーサー14をさらに備えている。スペーサー14の形状は、粘着層13と同様の形状、すなわち基板Sの第1主面S1における周縁部に沿って連続する環状である。スペーサー14を構成する材料としては、例えば、織布又は不織布、及びゴム材料が挙げられる。織布又は不織布としては、例えば、ガラスクロスが挙げられる。ゴム材料としては、例えば、シリコンゴム、ウレタンゴム、クロロプレンゴム、スチレン・ブタジエンゴム、及びエチレン・プロピレン・ジエンゴムが挙げられる。スペーサー14は、単層構造であってもよいし、同種又は異種の材料から構成した多層構造であってもよい。例えば、加熱を伴う成膜を行う場合、成膜時の熱に耐え得るスペーサー14を用いればよい。スペーサー14は、基材シート12に周知の接着剤又は粘着剤で固定することができる。スペーサー14は、例えば、スペーサー14を支持体として構成された片面粘着テープ(ガラスクロステープ等)を用いて配置してもよい。スペーサー14の厚さは、例えば、150μm〜5mmの範囲である。 The substrate protective tool 11 of the present embodiment further includes a spacer 14 arranged at a position opposite to the pressure-sensitive adhesive layer 13 with the base material sheet 12 interposed therebetween. The shape of the spacer 14 is similar to that of the adhesive layer 13, that is, an annular shape continuous along the peripheral edge portion of the first main surface S1 of the substrate S. Examples of the material constituting the spacer 14 include a woven fabric or a non-woven fabric, and a rubber material. Examples of the woven fabric or non-woven fabric include glass cloth. Examples of the rubber material include silicon rubber, urethane rubber, chloroprene rubber, styrene / butadiene rubber, and ethylene / propylene / diene rubber. The spacer 14 may have a single-layer structure or a multi-layer structure composed of the same or different materials. For example, when forming a film with heating, a spacer 14 that can withstand the heat during the film formation may be used. The spacer 14 can be fixed to the base sheet 12 with a well-known adhesive or adhesive. The spacer 14 may be arranged by using, for example, a single-sided adhesive tape (glass cloth tape or the like) configured with the spacer 14 as a support. The thickness of the spacer 14 is, for example, in the range of 150 μm to 5 mm.

次に、膜付き基板の製造方法について説明する。
図2に示すように、膜付き基板の製造方法は、基板Sに基板用保護具11を取り付けることで、基板Sと基板用保護具11とを有する成膜用基板SAを準備する準備工程と、成膜用基板SAの基板Sにおける第2主面S2に機能性膜Fを成膜する成膜工程とを備えている。準備工程では、基板用保護具11の基材シート12の貫通孔12aを通じて吸引し、基板用保護具11と基板Sとを粘着させた成膜用基板を準備する。
Next, a method for manufacturing a substrate with a film will be described.
As shown in FIG. 2, the method for manufacturing a substrate with a film includes a preparatory step of attaching a substrate protective tool 11 to the substrate S to prepare a film-forming substrate SA having the substrate S and the substrate protective tool 11. The film forming step of forming the functional film F on the second main surface S2 of the substrate S of the film forming substrate SA is provided. In the preparatory step, a film-forming substrate is prepared by sucking through the through hole 12a of the base material sheet 12 of the substrate protective tool 11 and adhering the substrate protective tool 11 and the substrate S.

図3に示すように、成膜工程で得られた膜付き基板SFは、基板Sの第2主面S2に設けられた機能性膜Fを有している。
図4及び図5に示すように、本実施形態の準備工程では、基板Sを吸引する吸引装置15が用いられる。吸引装置15は、減圧室16と、減圧室16内の空気を排気する排気部17と、基板用保護具11が載置される載置面18と、載置面18に開口するとともに減圧室16の外部の空気を吸引する吸引部19とを備えている。排気部17には、図示を省略した周知の真空ポンプが接続される。
As shown in FIG. 3, the film-attached substrate SF obtained in the film forming step has a functional film F provided on the second main surface S2 of the substrate S.
As shown in FIGS. 4 and 5, in the preparation step of this embodiment, a suction device 15 that sucks the substrate S is used. The suction device 15 opens into the decompression chamber 16, the exhaust unit 17 for exhausting the air in the decompression chamber 16, the mounting surface 18 on which the substrate protective tool 11 is mounted, and the mounting surface 18, and the decompression chamber. It is provided with a suction unit 19 for sucking the outside air of 16. A well-known vacuum pump (not shown) is connected to the exhaust unit 17.

準備工程において成膜用基板SAを得るには、まず基板用保護具11の粘着層13が上面となるように、基板用保護具11を吸引装置15の載置面18に載置し、その基板用保護具11の粘着層13上に基板Sを載置する。 In order to obtain the film-forming substrate SA in the preparatory step, first, the substrate protective tool 11 is placed on the mounting surface 18 of the suction device 15 so that the adhesive layer 13 of the substrate protective tool 11 is on the upper surface. The substrate S is placed on the adhesive layer 13 of the substrate protective tool 11.

次に、図6に示すように、吸引装置15の減圧室16内の空気を排気部17から排気する。これにより、吸引装置15の吸引部19は、基板用保護具11の基材シート12における貫通孔12aを通じて、基板用保護具11の基材シート12と基板Sとの間の空気を吸引する。こうした吸引によって、基板Sを基板用保護具11の粘着層13に押し付けることで、基板Sに基板用保護具11を取り付けることができる。 Next, as shown in FIG. 6, the air in the decompression chamber 16 of the suction device 15 is exhausted from the exhaust unit 17. As a result, the suction unit 19 of the suction device 15 sucks the air between the base sheet 12 of the substrate protective tool 11 and the substrate S through the through hole 12a in the base sheet 12 of the substrate protective tool 11. By pressing the substrate S against the adhesive layer 13 of the substrate protective tool 11 by such suction, the substrate protective tool 11 can be attached to the substrate S.

ここで、吸引装置15を用いて基板用保護具11の基材シート12と基板Sとの間の空気を吸引した際に、平板状の基板Sが吸引装置15側に凸となるように湾曲する場合がある。例えば、平板状の基板Sとして、厚さが0.05〜1.5mmのガラス基板を用いる場合、上記のように湾曲し易い傾向となる。上記の吸引時に基板Sが撓んだとしても、可撓性材料から構成した基材シート12も撓むため、基板Sの周縁部と基材シート12の周縁部との間の粘着層13が剥がれることがない。 Here, when the air between the substrate sheet 12 and the substrate S of the substrate protective tool 11 is sucked by using the suction device 15, the flat plate-shaped substrate S is curved so as to be convex toward the suction device 15. May be done. For example, when a glass substrate having a thickness of 0.05 to 1.5 mm is used as the flat plate-shaped substrate S, it tends to be easily curved as described above. Even if the substrate S bends during the above suction, the base sheet 12 made of a flexible material also bends, so that the adhesive layer 13 between the peripheral edge of the substrate S and the peripheral edge of the base sheet 12 is formed. It will not come off.

膜付き基板SFの製造方法における成膜工程では、スパッタリング法等のPVD(Physical Vapor Deposition)法、CVD(Chemical Vapor Deposition)法、スプレー、スピンコート等のコーティング法等の周知の成膜法を用いることができる。機能性膜Fとしては、例えば、所定の光学的特性を有する膜(誘電体膜等)、所定の機械的特性を有する膜、及び所定の化学的特性を有する膜、所定の色を有する膜が挙げられる。機能性膜Fを形成するための成膜材料は、無機材料であってもよいし、有機材料であってもよい。 In the film forming process in the manufacturing method of the substrate SF with a film, a well-known film forming method such as PVD (Physical Vapor Deposition) method such as sputtering method, CVD (Chemical Vapor Deposition) method, coating method such as spraying and spin coating is used. be able to. Examples of the functional film F include a film having a predetermined optical property (dielectric film, etc.), a film having a predetermined mechanical property, a film having a predetermined chemical property, and a film having a predetermined color. Can be mentioned. The film-forming material for forming the functional film F may be an inorganic material or an organic material.

成膜工程は、成膜用基板SAの第2主面S2が水平面となる姿勢、垂直面となる姿勢、又は傾斜面となる姿勢のいずれの姿勢で行ってもよい。例えば、成膜用基板SAの第2主面S2が垂直面となる姿勢に配置する場合、基板用保護具11の基材シート12の形状を基板Sよりも外方に突出するように変更し、その突出部分を利用して成膜用基板SAを吊り下げて配置することもできる。 The film forming step may be performed in any posture in which the second main surface S2 of the film forming substrate SA is a horizontal plane, a vertical plane, or an inclined plane. For example, when the second main surface S2 of the film-forming substrate SA is arranged so as to be a vertical surface, the shape of the substrate sheet 12 of the substrate protective tool 11 is changed so as to project outward from the substrate S. , The film-forming substrate SA can be suspended and arranged by utilizing the protruding portion.

成膜工程後の基板用保護具11は、膜付き基板SFの製造方法に繰り返し使用することもできる。このとき、基板用保護具11の厚さは比較的薄いため、複数の基板用保護具11を厚さ方向に重ね合わせることで、コンパクトにまとめて保管することができる。 The substrate protective tool 11 after the film forming step can be repeatedly used in the method for manufacturing a substrate SF with a film. At this time, since the thickness of the protective equipment 11 for the substrate is relatively thin, it is possible to store the plurality of protective equipment 11 for the substrate in a compact manner by stacking them in the thickness direction.

以上詳述した実施形態によれば、次のような作用効果が発揮される。
(1)基板用保護具11は、可撓性材料から構成され、少なくとも基板Sの周縁部を覆うことが可能なサイズに構成された基材シート12を備えている。基板用保護具11は、基材シート12と基板Sの周縁部とを粘着させる粘着層13をさらに備えている。基材シート12は、粘着層13に囲まれる位置に貫通孔12aを有している。
According to the embodiment described in detail above, the following effects are exhibited.
(1) The protective tool 11 for a substrate includes a base material sheet 12 made of a flexible material and having a size capable of covering at least the peripheral edge of the substrate S. The substrate protective tool 11 further includes an adhesive layer 13 for adhering the substrate sheet 12 and the peripheral edge portion of the substrate S. The base sheet 12 has a through hole 12a at a position surrounded by the adhesive layer 13.

この構成によれば、成膜前に基材シート12の貫通孔12aを通じて基板Sを吸引し、粘着層13により基板Sの周縁部と基材シート12の周縁部どうしを粘着させることができ、成膜時に成膜材料が回り込んで基板の第1主面S1の周縁部に付着することを抑制できる。また、基板Sが、例えば0.05〜1.5mmと薄い場合には、吸引時に基板Sが撓んだとしても、可撓性材料から構成した基材シート12も撓むため、基板Sの周縁部と基材シート12の周縁部との間の粘着層13が剥がれることがない。また、基板Sに基板用保護具11を取り付ける際に、基板Sの第2主面S2を治具等で押圧しなくてもよいため、基板Sの第2主面S2の清浄性が保たれ易い。 According to this configuration, the substrate S can be sucked through the through hole 12a of the base sheet 12 before the film formation, and the peripheral edge portion of the substrate S and the peripheral edge portion of the base sheet 12 can be adhered to each other by the adhesive layer 13. It is possible to prevent the film-forming material from wrapping around during film-forming and adhering to the peripheral edge of the first main surface S1 of the substrate. Further, when the substrate S is as thin as 0.05 to 1.5 mm, even if the substrate S bends during suction, the base sheet 12 made of a flexible material also bends, so that the substrate S is bent. The adhesive layer 13 between the peripheral edge portion and the peripheral edge portion of the base material sheet 12 does not peel off. Further, when the protective tool 11 for the substrate is attached to the substrate S, the second main surface S2 of the substrate S does not have to be pressed by a jig or the like, so that the cleanliness of the second main surface S2 of the substrate S is maintained. easy.

従って、基板Sの第2主面S2のみに機能性膜Fを好適に成膜することができる。
(2)基板用保護具11の粘着層13は、環状に形成されている。この場合、成膜時に成膜材料が回り込んで基板Sの第1主面S1の周縁部に付着することをさらに抑制できる。従って、基板Sの第2主面S2のみに機能性膜Fをより好適に成膜することができる。
Therefore, the functional film F can be suitably formed only on the second main surface S2 of the substrate S.
(2) The adhesive layer 13 of the protective tool 11 for a substrate is formed in an annular shape. In this case, it is possible to further prevent the film-forming material from wrapping around during film formation and adhering to the peripheral edge of the first main surface S1 of the substrate S. Therefore, the functional film F can be more preferably formed only on the second main surface S2 of the substrate S.

また、基板用保護具11の粘着層13を基板Sの全面ではなく基板Sの周縁部のみに粘着するように形成することで、基板用保護具11が基板Sに対して過剰に粘着し難くなるため、成膜後に基板用保護具11を基板Sから容易に引き剥がすことができる。また、粘着層13を基板Sの全面ではなく基板Sの周縁部のみに粘着するように形成することで、第1主面S1において基板Sの性能に影響する範囲に粘着剤が転写することを回避することができる。 Further, by forming the adhesive layer 13 of the substrate protective tool 11 so as to adhere only to the peripheral edge portion of the substrate S instead of the entire surface of the substrate S, it is difficult for the substrate protective tool 11 to excessively adhere to the substrate S. Therefore, the substrate protective tool 11 can be easily peeled off from the substrate S after the film formation. Further, by forming the adhesive layer 13 so as to adhere only to the peripheral edge portion of the substrate S instead of the entire surface of the substrate S, the adhesive is transferred to a range affecting the performance of the substrate S on the first main surface S1. It can be avoided.

(3)基板用保護具11は、基材シート12を挟んで粘着層13と反対側の位置に配置されるスペーサー14をさらに備えている。
この場合、吸引時に基板Sが撓んだとしても、基板Sと吸引装置15の載置面18とのスペースをスペーサー14によって確保することができる。従って、基板Sに不要な衝撃が加わることを回避することができる。
(3) The protective tool 11 for a substrate further includes a spacer 14 arranged at a position opposite to the adhesive layer 13 with the base material sheet 12 interposed therebetween.
In this case, even if the substrate S is bent during suction, the space between the substrate S and the mounting surface 18 of the suction device 15 can be secured by the spacer 14. Therefore, it is possible to avoid applying an unnecessary impact to the substrate S.

(4)膜付き基板SFの製造方法は、基板用保護具11の基材シート12の貫通孔12aを通じて吸引し、基板用保護具11と基板Sとを粘着させた成膜用基板SAを準備する準備工程と、成膜用基板SAにおける基板Sの第2主面S2に機能性膜Fを成膜する成膜工程とを備えている。 (4) As a method for manufacturing the substrate SF with a film, a film-forming substrate SA is prepared by sucking through the through hole 12a of the substrate sheet 12 of the substrate protective tool 11 and adhering the substrate protective tool 11 and the substrate S. A preparatory step for forming a functional film F on the second main surface S2 of the substrate S in the film forming substrate SA is provided.

この方法によれば、上記(1)欄で述べた効果と同様の効果が得られる。
(変更例)
・上記実施形態の基板用保護具11のスペーサー14は、基板用保護具11の基材シート12に固定されているが、基材シート12に固定せずに基材シート12に重ねるように配置してもよいし、例えば、吸引装置15の載置面18に固定されていてもよい。
According to this method, the same effect as that described in the above column (1) can be obtained.
(Change example)
The spacer 14 of the substrate protective tool 11 of the above embodiment is fixed to the base sheet 12 of the substrate protective tool 11, but is arranged so as to be overlapped with the base sheet 12 without being fixed to the base sheet 12. It may be fixed to the mounting surface 18 of the suction device 15, for example.

・基板用保護具11のスペーサー14を省略することもできる。
・基板用保護具11の粘着層13は、環状以外の形状に形成されてもよい。
・図7に示すように、基板Sの形状は、曲板状であってもよい。上記基板用保護具11によれば、基材シート12が可撓性材料から構成されているため、曲板状の基板Sの第1主面S1に対しても、粘着層13を追従させて密着させることができる。
-The spacer 14 of the protective tool 11 for the substrate can be omitted.
The adhesive layer 13 of the protective tool 11 for a substrate may be formed in a shape other than an annular shape.
-As shown in FIG. 7, the shape of the substrate S may be a curved plate shape. According to the substrate protective tool 11, since the substrate sheet 12 is made of a flexible material, the adhesive layer 13 is made to follow the first main surface S1 of the curved substrate S as well. Can be brought into close contact.

図8に示すように、例えば、吸引装置15を用いて曲板状の基板Sに基板用保護具11を取り付ける場合、基板用保護具11のスペーサー14が、吸引装置15の載置面18に沿うように変形する。これにより、基板用保護具11の粘着層13の上面全体に対して基板Sの第1主面S1が押圧され易くなる結果、基板用保護具11の粘着層13に対する基板Sの第1主面S1の密着性を高めることができる。 As shown in FIG. 8, for example, when the substrate protective tool 11 is attached to the curved plate-shaped substrate S by using the suction device 15, the spacer 14 of the substrate protective tool 11 is placed on the mounting surface 18 of the suction device 15. It deforms along. As a result, the first main surface S1 of the substrate S is easily pressed against the entire upper surface of the adhesive layer 13 of the substrate protective tool 11, and as a result, the first main surface of the substrate S against the adhesive layer 13 of the substrate protective tool 11 is easily pressed. The adhesion of S1 can be improved.

このようにスペーサー14を備えた基板用保護具11では、基板Sの第1主面S1の形状と、吸引装置15の載置面18の形状が異なったとしても、基板用保護具11のスペーサー14が吸引装置15の載置面18に追従することで、基板Sに基板用保護具11を取り付けることが可能となる。このため、吸引装置15では、曲板状の基板Sの第1主面S1に沿った高精度の載置面18が不要となり、また曲率の異なる基板であっても、共通する吸引装置15を用いることが可能となる。従って、設備のコストを削減することが可能となる。 In the substrate protective tool 11 provided with the spacer 14 in this way, even if the shape of the first main surface S1 of the substrate S and the shape of the mounting surface 18 of the suction device 15 are different, the spacer of the substrate protective tool 11 When the 14 follows the mounting surface 18 of the suction device 15, the substrate protective tool 11 can be attached to the substrate S. Therefore, in the suction device 15, a high-precision mounting surface 18 along the first main surface S1 of the curved plate-shaped substrate S becomes unnecessary, and even if the substrates have different curvatures, the common suction device 15 can be used. It can be used. Therefore, it is possible to reduce the cost of equipment.

11…基板用保護具、12…基材シート、12a…貫通孔、13…粘着層、14…スペーサー、F…機能性膜、S…基板、S1…第1主面、S2…第2主面、SA…成膜用基板、SF…膜付き基板。
11 ... Substrate protective equipment, 12 ... Base sheet, 12a ... Through hole, 13 ... Adhesive layer, 14 ... Spacer, F ... Functional film, S ... Substrate, S1 ... First main surface, S2 ... Second main surface , SA ... Substrate for film formation, SF ... Substrate with film.

Claims (2)

第1主面と、前記第1主面の反対側の第2主面とを有する基板の前記第1主面を保護する基板用保護具を用いて膜付き基板を製造する膜付き基板の製造方法であって、
前記基板用保護具は、可撓性材料から構成され、少なくとも前記基板の周縁部を覆うことが可能なサイズに構成された基材シートと、
前記基材シートと前記基板の周縁部とを粘着させる粘着層と、
前記基材シートを挟んで前記粘着層の反対の位置に配置されるスペーサーと、を備え、
前記基材シートは、前記粘着層に囲まれる位置に貫通孔を有し、
前記製造方法は、前記基板用保護具と前記基板とを粘着させた成膜用基板を準備する準備工程と、
前記成膜用基板における前記基板の前記第2主面に機能性膜を成膜する成膜工程とを備え、
前記準備工程では、前記基板用保護具を載置する載置面と前記載置面に開口する吸引部とを有する吸引装置が用いられ、
前記載置面と前記基材シートとの間に前記スペーサーが配置されるように前記基板用保護具を前記吸引装置の前記載置面に載置し、
前記吸引部により前記基板用保護具の前記基材シートの前記貫通孔を通じて前記粘着層上の前記基板を吸引することを特徴とする膜付き基板の製造方法。
Manufacture of a film-coated substrate by using a substrate protector that protects the first main surface of a substrate having a first main surface and a second main surface opposite to the first main surface. It ’s a method,
The substrate protective device includes a substrate sheet made of a flexible material and having a size capable of covering at least the peripheral edge of the substrate.
An adhesive layer that adheres the base material sheet to the peripheral edge of the substrate,
A spacer that is arranged at a position opposite to the adhesive layer with the base material sheet sandwiched therein is provided.
The base material sheet has a through hole at a position surrounded by the adhesive layer, and has a through hole.
The manufacturing method includes a preparatory step of preparing a film-forming substrate on which the protective equipment for the substrate and the substrate are adhered to each other.
A film forming step of forming a functional film on the second main surface of the substrate in the film forming substrate is provided.
In the preparatory step, a suction device having a mounting surface on which the protective equipment for a substrate is placed and a suction portion that opens in the above-mentioned mounting surface is used.
The substrate protective device is placed on the previously described surface of the suction device so that the spacer is arranged between the previously described surface and the base sheet.
A method for manufacturing a substrate with a film, which comprises sucking the substrate on the adhesive layer through the through hole of the base material sheet of the protective tool for the substrate by the suction portion.
前記基板用保護具の前記粘着層は、環状に形成されることを特徴とする請求項1に記載の膜付き基板の製造方法。 The method for manufacturing a substrate with a film according to claim 1, wherein the adhesive layer of the protective device for a substrate is formed in an annular shape.
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