JP6963016B2 - 試料保持具 - Google Patents
試料保持具 Download PDFInfo
- Publication number
- JP6963016B2 JP6963016B2 JP2019538466A JP2019538466A JP6963016B2 JP 6963016 B2 JP6963016 B2 JP 6963016B2 JP 2019538466 A JP2019538466 A JP 2019538466A JP 2019538466 A JP2019538466 A JP 2019538466A JP 6963016 B2 JP6963016 B2 JP 6963016B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- porous member
- hole
- sample holder
- bonding layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7616—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating, a hardness or a material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7624—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
2:支持体
3:第1接合層
4:第2接合層
5:多孔質部材
6:吸着電極
7:第1貫通孔
8:第1凹部
9:第2貫通孔
10:筒状部材
11:第2凹部
12:第3凹部
13:第3接合層
100:試料保持具
Claims (8)
- セラミックスを有し上面に試料保持面を有する基体と、
金属を有し上面が前記基体の下面を覆う支持体と、
前記基体の下面および前記支持体の上面を接合する第1接合層と、を備えており、
前記支持体の下面から前記第1接合層を通って前記基体の上面まで貫通するとともに、前記基体中の少なくとも一部において前記支持体中および前記第1接合層中よりも細くなっている第1貫通孔を有しており、
前記第1貫通孔の内部に位置しており前記基体の下面に第2接合層を介して接合された多孔質部材を備えており、
前記第1貫通孔の内部に位置しており、前記多孔質部材の下面の一部および外周面の少なくとも一部を覆うとともに前記第1貫通孔に沿って伸びる絶縁性の筒状部材を備えた試料保持具。 - 前記基体中における前記第1貫通孔が、前記基体の下面に位置する第1凹部および前記第1凹部の底面と前記基体の上面とに開口する第2貫通孔を有しているとともに、前記第1凹部の底面に前記多孔質部材が接合されている請求項1に記載の試料保持具。
- 前記筒状部材は下端の内径よりも、前記多孔質部材の下面に接する面の内径が大きい請求項1または請求項2に記載の試料保持具。
- 前記多孔質部材および前記第2接合層が、前記第1貫通孔のうち前記基体に位置する部分と内周面が連続する第2凹部を有する請求項1乃至請求項3のいずれかに記載の試料保持具。
- 前記基体の前記上面から前記第2接合層を通って前記多孔質部材まで伸びる第3凹部をさらに有する請求項1乃至請求項4のいずれかに記載の試料保持具。
- 前記筒状部材の上端が前記多孔質部材の上面よりも上方にある請求項1乃至請求項5のいずれかに記載の試料保持具。
- 前記第1凹部の内部に前記多孔質部材の全体が位置している請求項2に記載の試料保持具。
- 前記多孔質部材と前記筒状部材とが離れて位置している請求項1乃至請求項7のいずれかに記載の試料保持具。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017206974 | 2017-10-26 | ||
| JP2017206974 | 2017-10-26 | ||
| PCT/JP2018/039298 WO2019082875A1 (ja) | 2017-10-26 | 2018-10-23 | 試料保持具 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2019082875A1 JPWO2019082875A1 (ja) | 2021-08-19 |
| JP6963016B2 true JP6963016B2 (ja) | 2021-11-05 |
Family
ID=66247471
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019538466A Active JP6963016B2 (ja) | 2017-10-26 | 2018-10-23 | 試料保持具 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US11515192B2 (ja) |
| JP (1) | JP6963016B2 (ja) |
| KR (1) | KR102394687B1 (ja) |
| CN (1) | CN111213230B (ja) |
| WO (1) | WO2019082875A1 (ja) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11456161B2 (en) * | 2018-06-04 | 2022-09-27 | Applied Materials, Inc. | Substrate support pedestal |
| WO2020111194A1 (ja) * | 2018-11-30 | 2020-06-04 | 京セラ株式会社 | 試料保持具 |
| KR102255246B1 (ko) * | 2019-05-20 | 2021-05-25 | (주)케이에스티이 | 정전척 및 그 제조방법 |
| US20200411355A1 (en) * | 2019-06-28 | 2020-12-31 | Applied Materials, Inc. | Apparatus for reduction or prevention of arcing in a substrate support |
| JP7299805B2 (ja) * | 2019-09-09 | 2023-06-28 | 日本特殊陶業株式会社 | 保持装置 |
| CN112687602B (zh) * | 2019-10-18 | 2024-11-08 | 中微半导体设备(上海)股份有限公司 | 一种静电吸盘及其制造方法、等离子体处理装置 |
| JP7433857B2 (ja) * | 2019-11-25 | 2024-02-20 | 京セラ株式会社 | 試料保持具 |
| JP7512037B2 (ja) * | 2019-12-27 | 2024-07-08 | 東京エレクトロン株式会社 | 載置台、基板処理装置及び伝熱ガス供給方法 |
| JP7372271B2 (ja) * | 2021-01-06 | 2023-10-31 | 日本碍子株式会社 | 半導体製造装置用部材及びその製法 |
| KR102779855B1 (ko) * | 2021-02-17 | 2025-03-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 다공성 플러그 본딩 |
| JP2023006679A (ja) * | 2021-06-30 | 2023-01-18 | Toto株式会社 | 静電チャック |
| US12341048B2 (en) * | 2021-11-29 | 2025-06-24 | Applied Materials, Inc. | Porous plug for electrostatic chuck gas delivery |
| JP7514815B2 (ja) * | 2021-12-22 | 2024-07-11 | 日本碍子株式会社 | 半導体製造装置用部材 |
| JP7514817B2 (ja) * | 2021-12-27 | 2024-07-11 | 日本碍子株式会社 | 半導体製造装置用部材 |
| JP7759834B2 (ja) * | 2022-03-31 | 2025-10-24 | 日本碍子株式会社 | ウエハ載置台 |
| KR102592338B1 (ko) * | 2022-10-25 | 2023-10-23 | 주식회사 동탄이엔지 | 일체형 다공성 필터를 포함하는 정전척 및 이의 제조 방법 |
| KR102810844B1 (ko) * | 2023-02-06 | 2025-05-22 | 엔지케이 인슐레이터 엘티디 | 서셉터 |
| JP7774113B1 (ja) * | 2024-10-28 | 2025-11-20 | 日本特殊陶業株式会社 | 保持装置 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100505035B1 (ko) * | 2003-11-17 | 2005-07-29 | 삼성전자주식회사 | 기판을 지지하기 위한 정전척 |
| US7646580B2 (en) * | 2005-02-24 | 2010-01-12 | Kyocera Corporation | Electrostatic chuck and wafer holding member and wafer treatment method |
| CN101512749B (zh) * | 2006-09-19 | 2010-07-28 | 创意科技股份有限公司 | 静电吸盘的馈电结构及其制造方法以及静电吸盘的馈电结构的再生方法 |
| US20090086401A1 (en) * | 2007-09-28 | 2009-04-02 | Intevac, Inc. | Electrostatic chuck apparatus |
| US20090086400A1 (en) * | 2007-09-28 | 2009-04-02 | Intevac, Inc. | Electrostatic chuck apparatus |
| JP5449750B2 (ja) * | 2008-11-19 | 2014-03-19 | 株式会社日本セラテック | 静電チャックおよびその製造方法 |
| JP5250408B2 (ja) * | 2008-12-24 | 2013-07-31 | 新光電気工業株式会社 | 基板温調固定装置 |
| JP2010182763A (ja) * | 2009-02-04 | 2010-08-19 | Hitachi High-Technologies Corp | プラズマ処理装置 |
| JP3154629U (ja) * | 2009-08-04 | 2009-10-22 | 日本碍子株式会社 | 静電チャック |
| KR20110056712A (ko) * | 2009-11-23 | 2011-05-31 | 삼성전자주식회사 | 정전 척 |
| US8937800B2 (en) | 2012-04-24 | 2015-01-20 | Applied Materials, Inc. | Electrostatic chuck with advanced RF and temperature uniformity |
| JP5956379B2 (ja) | 2012-04-27 | 2016-07-27 | 日本碍子株式会社 | 半導体製造装置用部材 |
| JP5984504B2 (ja) | 2012-05-21 | 2016-09-06 | 新光電気工業株式会社 | 静電チャック、静電チャックの製造方法 |
| KR101729603B1 (ko) * | 2013-02-25 | 2017-04-24 | 쿄세라 코포레이션 | 시료 유지구 |
| JP5633766B2 (ja) | 2013-03-29 | 2014-12-03 | Toto株式会社 | 静電チャック |
| JP6228031B2 (ja) * | 2014-02-25 | 2017-11-08 | 京セラ株式会社 | 試料保持具およびこれを用いたプラズマエッチング装置 |
| JP5811513B2 (ja) * | 2014-03-27 | 2015-11-11 | Toto株式会社 | 静電チャック |
| US9608550B2 (en) * | 2015-05-29 | 2017-03-28 | Lam Research Corporation | Lightup prevention using multi-layer ceramic fabrication techniques |
| JP6525793B2 (ja) * | 2015-07-29 | 2019-06-05 | 京セラ株式会社 | 試料保持具 |
| JP6526219B2 (ja) * | 2015-09-29 | 2019-06-05 | 京セラ株式会社 | 試料保持具 |
| JP6634315B2 (ja) * | 2016-03-03 | 2020-01-22 | 日本特殊陶業株式会社 | 保持装置および保持装置の製造方法 |
-
2018
- 2018-10-23 WO PCT/JP2018/039298 patent/WO2019082875A1/ja not_active Ceased
- 2018-10-23 US US16/754,234 patent/US11515192B2/en active Active
- 2018-10-23 KR KR1020207009856A patent/KR102394687B1/ko active Active
- 2018-10-23 CN CN201880067290.8A patent/CN111213230B/zh active Active
- 2018-10-23 JP JP2019538466A patent/JP6963016B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN111213230A (zh) | 2020-05-29 |
| JPWO2019082875A1 (ja) | 2021-08-19 |
| CN111213230B (zh) | 2023-10-10 |
| KR20200047675A (ko) | 2020-05-07 |
| US11515192B2 (en) | 2022-11-29 |
| WO2019082875A1 (ja) | 2019-05-02 |
| US20200279765A1 (en) | 2020-09-03 |
| KR102394687B1 (ko) | 2022-05-06 |
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