JP6967953B2 - Etching agent for roughening the surface of a base material whose surface is at least all or part of aluminum or an aluminum alloy, a method for producing a roughened base material, a roughened base material, a base material-a cured resin product. Manufacturing method of the bonded body and the bonded body of the base material-resin cured product - Google Patents
Etching agent for roughening the surface of a base material whose surface is at least all or part of aluminum or an aluminum alloy, a method for producing a roughened base material, a roughened base material, a base material-a cured resin product. Manufacturing method of the bonded body and the bonded body of the base material-resin cured product Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/14—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
- B29C65/56—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using mechanical means or mechanical connections, e.g. form-fits
- B29C65/64—Joining a non-plastics element to a plastics element, e.g. by force
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/20—Acidic compositions for etching aluminium or alloys thereof
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- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- ing And Chemical Polishing (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
- Laminated Bodies (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Description
本発明は、少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材(以下、「アルミニウム含有基材」と称することもある)の表面を粗面化するためのエッチング剤、粗面化基材の製造方法、粗面化基材、基材−樹脂硬化物の接合体の製造方法、及び基材−樹脂硬化物の接合体に関する。 The present invention is an etching agent for roughening the surface of a base material (hereinafter, also referred to as "aluminum-containing base material") in which at least all or part of the surface is made of aluminum or an aluminum alloy. The present invention relates to a method for producing a base material, a roughened base material, a method for producing a base material-cured resin product joint, and a base material-cured resin product joint.
金属と樹脂との接合技術について、射出成形接合、接着剤接合等が検討されている。 Injection molding joining, adhesive joining, etc. are being studied for joining technology between metal and resin.
例えば、特許文献1では、両性金属イオン、酸化剤、及びアルカリ源を含むアルカリ系エッチング剤又は第二鉄イオン及び第二銅イオンの少なくとも一方、及び酸を含む酸系エッチング剤によって、アルミニウム製部品の表面を粗化処理する工程を含むアルミニウム−樹脂複合体の製造方法が開示されている。 For example, in Patent Document 1, an aluminum component is used with an alkaline etching agent containing an amphoteric metal ion, an oxidizing agent, and an alkaline source, or at least one of ferrous and ferric copper ions, and an acid etching agent containing an acid. A method for producing an aluminum-resin composite, which comprises a step of roughening the surface of the above, is disclosed.
また、特許文献2では、アルミニウム合金製のアルミ形状体に対し、ハロゲンイオン濃度を特定範囲で含む塩酸水溶液又はリン酸水溶液からなるエッチング液でエッチング処理を行う工程を含む、アルミ・樹脂射出一体成形品の製造方法が開示されている。 Further, Patent Document 2 includes an aluminum / resin injection integral molding including a step of etching an aluminum shaped body made of an aluminum alloy with an etching solution consisting of an aqueous hydrochloric acid solution or an aqueous solution of phosphoric acid containing a halogen ion concentration in a specific range. The manufacturing method of the product is disclosed.
上記特許文献1及び2に記載の基材−樹脂硬化物の接合体は、基材と樹脂との接合強度が不十分の場合がある。それゆえ、基材と樹脂が強固に接合した基材−樹脂硬化物の接合体が求められている。そこで、本発明は、アルミニウム含有基材に対して、樹脂との接合強度に優れた粗面を形成させることができるエッチング剤等を提供することを目的とする。 In the base material-resin cured product bonded body described in Patent Documents 1 and 2, the bonding strength between the base material and the resin may be insufficient. Therefore, there is a demand for a base material-resin cured product bonded body in which the base material and the resin are firmly bonded. Therefore, an object of the present invention is to provide an etching agent or the like capable of forming a rough surface having excellent bonding strength with a resin on an aluminum-containing base material.
本発明者らは、上記課題を解決するために鋭意検討した結果、アルミニウム含有基材を、ペルオキソ二硫酸イオンと塩化物イオンを含むエッチング剤と接触させることにより、樹脂との接合強度に優れる粗面を形成できることを見出し、本発明を完成するに至った。 As a result of diligent studies to solve the above problems, the present inventors have brought the aluminum-containing substrate into contact with an etching agent containing peroxodisulfate ion and chloride ion, whereby the crude material has excellent bonding strength with the resin. We have found that a surface can be formed, and have completed the present invention.
すなわち、本発明は、
(1)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面を粗面化するためのエッチング剤であって、少なくともペルオキソ二硫酸イオンと塩化物イオンを含む、エッチング剤。
(2)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、(1)に記載のエッチング剤を接触させるエッチング工程を含む、粗面化基材の製造方法。
(3)前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、(2)に記載の粗面化基材の製造方法。
(4)(2)又は(3)に記載の粗面化基材の製造方法によって得られる粗面化基材。
(5)少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材の表面又は表面上に、(1)に記載のエッチング剤を接触させるエッチング工程と、前記エッチング剤を接触させ、前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、を含む、基材−樹脂硬化物の接合体の製造方法。
(6)前記エッチング工程の前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を含む、(5)に記載の基材−樹脂硬化物の接合体の製造方法。
(7)(5)又は(6)に記載の製造方法によって得られる基材−樹脂硬化物の接合体。からなる。
That is, the present invention
(1) An etching agent for roughening the surface of a base material whose surface is at least wholly or partially made of aluminum or an aluminum alloy, and which contains at least peroxodisulfate ion and chloride ion.
(2) A method for producing a roughened base material, which comprises an etching step of bringing the etching agent according to (1) into contact with the surface or surface of a base material having at least all or part of the surface made of aluminum or an aluminum alloy. ..
(3) The method for producing a roughened substrate according to (2), which comprises a zincate step of forming a zincate film on the surface of the substrate before the etching step.
(4) The roughened base material obtained by the method for producing a roughened base material according to (2) or (3).
(5) An etching step in which the etching agent according to (1) is brought into contact with the surface or surface of a base material whose surface is at least all or partly made of aluminum or an aluminum alloy, and the etching agent is brought into contact with the base. A method for producing a substrate-resin cured product bonded body, which comprises a step of putting a resin composition into a recess formed by roughening the material.
(6) The method for producing a substrate-resin cured product bonded body according to (5), which comprises a gincate step of forming a gincate film on the surface of the substrate before the etching step.
(7) A base material-resin cured product bonded body obtained by the production method according to (5) or (6). Consists of.
本発明により、アルミニウム含有基材に対して、樹脂との接合強度に優れる粗面を形成させることができるエッチング剤等を提供することができる。 INDUSTRIAL APPLICABILITY According to the present invention, it is possible to provide an etching agent or the like capable of forming a rough surface having excellent bonding strength with a resin on an aluminum-containing base material.
以下、本発明の実施形態について詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
≪エッチング剤≫
本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオンと塩化物イオンを少なくとも含む水溶液である。前記エッチング剤をアルミニウム含有基材の表面又は表面上に接触させることで、前記基材を粗面化することができる。前記エッチング剤は、ペルオキソ二硫酸化合物と塩素化合物を水に溶解させて調製する。前記エッチング剤中には、前記基材由来のアルミニウム、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛等の元素が存在していてもよい。また、後述するジンケート工程で形成した皮膜が溶解することによって、亜鉛等の元素が混入していてもよい。
≪Etching agent≫
The etching agent according to the embodiment of the present invention is an aqueous solution containing at least peroxodisulfate ion and chloride ion. The surface of the base material can be roughened by bringing the etching agent into contact with the surface or the surface of the aluminum-containing base material. The etching agent is prepared by dissolving a peroxodisulfate compound and a chlorine compound in water. Elements such as aluminum, magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper, and zinc derived from the substrate may be present in the etching agent. Further, an element such as zinc may be mixed by dissolving the film formed in the zincating step described later.
本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオン(S2O8 2−)を含む。ペルオキソ二硫酸イオン源としては、例えば、ペルオキソ二硫酸ナトリウム、ペルオキソ二硫酸カリウム、ペルオキソ二硫酸アンモニウム等のペルオキソ二硫酸化合物から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。本発明の実施形態に係るエッチング剤は、ペルオキソ二硫酸イオンを好ましくは0.02mol/L以上0.90mol/L以下、より好ましくは0.10mol/L以上0.50mol/L以下、さらに好ましくは0.15mol/L以上0.40mol/L以下を含む。 Etching agent in accordance with an embodiment of the present invention comprises a peroxodisulfate ion (S 2 O 8 2-). As the peroxodisulfate ion source, for example, one or more suitable peroxodisulfate compounds can be selected from peroxodisulfate compounds such as sodium peroxodisulfate, potassium peroxodisulfate, and ammonium peroxodisulfate, but the present invention is limited thereto. It is not something that will be done. The etching agent according to the embodiment of the present invention preferably contains peroxodisulfate ion of 0.02 mol / L or more and 0.90 mol / L or less, more preferably 0.10 mol / L or more and 0.50 mol / L or less, and further preferably. Includes 0.15 mol / L or more and 0.40 mol / L or less.
本発明の実施形態に係るエッチング剤は、塩化物イオン(Cl−)を含む。塩化物イオン源としては、例えば、塩化リチウム、塩化ナトリウム、塩化カリウム、塩化カルシウム、塩化アンモニウム等の塩素化合物から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。ただし、塩化鉄等の遷移金属の塩化物は用いないことが好ましい。また、塩酸を用いるとミストが発生し、作業者への健康被害や、周辺の金属性部品や装置を腐食させる可能性があるため、用いないことが好ましい。本発明の実施形態に係るエッチング剤は、塩化物イオンを好ましくは0.40mol/L以上2.50mol/L以下、より好ましくは0.80mol/L以上2.00mol/L以下、さらに好ましくは1.20mol/L以上1.70mol/L以下を含む。
本発明の実施形態に係るエッチング剤は、リン酸を実質的に含まなくてもよい。実質的に含まないとは、検出限界以下であることをいう。
本発明の実施形態にかかるエッチング剤のpHは、6.0以下の範囲内であることが好ましく、2.0から4.0の範囲内であることがより好ましい。
エッチング剤のpHは、市販のpH計測機器及び電極に制限はなく、これらを用いて測定することができる。また、pH計測機器及び電極が温度補償機能を有する機器を用い、
pH電極の内部液と市販のpH標準液とを、エッチング剤等と同一のそれぞれの温度に調整してpH計測機器を校正すれば、前記エッチング剤等の使用する温度におけるpHを計測することもできる。
The etching agent according to the embodiment of the present invention contains chloride ion (Cl − ). As the chloride ion source, for example, one or more suitable chloride compounds can be selected from chlorine compounds such as lithium chloride, sodium chloride, potassium chloride, calcium chloride, and ammonium chloride, but the chloride ion source is limited to these. It's not a thing. However, it is preferable not to use chlorides of transition metals such as iron chloride. Further, it is preferable not to use hydrochloric acid because it may generate mist, which may damage the health of workers and corrode surrounding metallic parts and devices. The etching agent according to the embodiment of the present invention preferably contains chloride ions of 0.40 mol / L or more and 2.50 mol / L or less, more preferably 0.80 mol / L or more and 2.00 mol / L or less, and further preferably 1. Includes .20 mol / L or more and 1.70 mol / L or less.
The etching agent according to the embodiment of the present invention may be substantially free of phosphoric acid. Substantially not included means that it is below the detection limit.
The pH of the etching agent according to the embodiment of the present invention is preferably in the range of 6.0 or less, and more preferably in the range of 2.0 to 4.0.
The pH of the etching agent is not limited to commercially available pH measuring instruments and electrodes, and can be measured using these. Also, use a pH measuring device and a device whose electrodes have a temperature compensation function.
If the internal solution of the pH electrode and the commercially available pH standard solution are adjusted to the same temperature as the etching agent and the pH measuring device is calibrated, the pH at the temperature at which the etching agent or the like is used can be measured. can.
≪粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法≫
本発明の実施形態に係る粗面化基材の製造方法は、前記基材の表面又は表面上に、少なくともペルオキソ二硫酸イオンと塩化物イオンを含むエッチング剤と接触させるエッチング工程を含む。また、本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法は、前記エッチング工程と、前記エッチング剤を接触させて前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、を含む。本発明の実施形態に係る粗面化基材の製造方法により得られる粗面化基材の表面又は表面上に、射出成形接合や接着剤接合のような、粗面化することにより形成された凹みに樹脂組成物を入れる工程(単に樹脂組成物を凹みに入れる工程ともいう)を行うことによって、基材と、樹脂組成物を強固に接合することができる。また、本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法のいずれにおいても、エッチング工程を行う前に、前記基材の表面にジンケート皮膜を形成させるジンケート工程を行うことが好ましい。なお、本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法においては、他の工程が存在していてもよい。当該他の工程の例としては、各工程を行う前に、前記基材の表面を清浄化させる表面清浄工程を挙げることができる。また、エッチング工程を行った後、樹脂組成物を凹みに入れる工程を行う前に、皮膜を形成する後処理工程を行ってもよい。各工程は、必要であれば繰り返し行ってもよい。
<< Manufacturing method of roughened base material and base material-Manufacturing method of bonded resin cured product >>
The method for producing a roughened base material according to an embodiment of the present invention includes an etching step of contacting the surface or surface of the base material with an etching agent containing at least peroxodisulfate ion and chloride ion. Further, in the method for producing a substrate-resin cured product bonded body according to an embodiment of the present invention, the etching step and the dent formed by contacting the etching agent to roughen the substrate are formed. Includes a step of adding the resin composition. It was formed by roughening the surface or surface of the roughened base material obtained by the method for producing a roughened base material according to the embodiment of the present invention, such as injection molding bonding or adhesive bonding. By performing the step of putting the resin composition in the dent (also referred to simply as the step of putting the resin composition in the dent), the base material and the resin composition can be firmly bonded. Further, in both the method for producing a roughened substrate and the method for producing a substrate-resin cured product bonded body according to the embodiment of the present invention, a zincate film is formed on the surface of the substrate before the etching step is performed. It is preferable to carry out a zincating step to form the above. In addition, in the method for producing a roughened base material and the method for producing a substrate-resin cured product bonded body according to the embodiment of the present invention, other steps may be present. Examples of the other steps include a surface cleaning step of cleaning the surface of the base material before each step. Further, after performing the etching step, and before performing the step of putting the resin composition into the recess, a post-treatment step of forming a film may be performed. Each step may be repeated if necessary.
本発明の実施形態に係る粗面化基材の製造方法は、エッチング工程とそれ以外の後述する任意の工程を以下に例示するように含んでもよい。基材を脱脂処理する工程(任意)→基材をアルカリ洗処理する工程(任意)→基材を酸洗処理する工程(任意)→ジンケート工程(任意)→エッチング工程。なお、基材をアルカリ洗処理する工程と基材を酸洗処理する工程の順番は逆であってもよく、どちらか一方のみを含んでいてもよく、どちらも含んでいなくてもよい。
本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法は、エッチング工程及び樹脂組成物を凹みに入れる工程と、それら以外の後述する任意の工程を以下に例示するように含んでもよい。基材を脱脂処理する工程(任意)→基材をアルカリ洗処理する工程(任意)→基材を酸洗処理する工程(任意)→ジンケート工程(任意)→エッチング工程→後処理工程(任意)→樹脂組成物を凹みに入れる工程。なお、基材をアルカリ洗処理する工程と基材を酸洗処理する工程の順番は逆であってもよく、どちらか一方のみを含んでいてもよく、どちらも含んでいなくてもよい。
以下、基材及び各工程を詳述する。
The method for producing a roughened base material according to an embodiment of the present invention may include an etching step and other optional steps described later as exemplified below. Step of degreasing the base material (arbitrary) → step of alkaline washing the base material (arbitrary) → step of pickling the base material (arbitrary) → ginkating step (arbitrary) → etching process. The order of the steps of alkaline washing the base material and pickling the base material may be reversed, and may contain only one of them, or may not contain either of them.
The method for producing a substrate-resin cured product bonded body according to an embodiment of the present invention includes an etching step, a step of inserting the resin composition into a recess, and any other steps described below as exemplified below. But it may be. Step of degreasing the base material (arbitrary) → Step of alkaline washing treatment of the base material (arbitrary) → Step of pickling the base material (arbitrary) → Ginkating process (arbitrary) → Etching process → Post-treatment process (arbitrary) → The process of putting the resin composition into the dent. The order of the steps of alkaline washing the base material and pickling the base material may be reversed, and may contain only one of them, or may not contain either of them.
Hereinafter, the base material and each process will be described in detail.
<基材>
本発明の実施形態に適用される基材は、少なくとも表面の全部又は一部がアルミニウム又はアルミニウム合金からなる基材であれば特に限定されない。前記基材は鋳物材、ダイカスト材を含み、熱処理を施していてもよい。また、前記基材は他の加工及び/又は他の処理がなされていてもよく、例えば、切削加工、研削加工、ブラスト加工、磨き(ラッピング)、穴あけ等の加工がなされていてもよい。また、板材のほか、棒、帯、管、線、箔、鋳鍛造品、軸受等、前記基材の形状は特に限定されない。なお、前記基材は成形品であってもよいし、成形前の材料であってもよい。さらに、前記基材の表面の全部又は一部がアルミニウム又はアルミニウム合金の皮膜であってもよく、その皮膜の形成方法は、例えば、めっき法、溶射法等が挙げられるが、これらに限定されない。前記基材の表面の全部又は一部がアルミニウム又はアルミニウム合金であれば、前記基材の表面以外の部分はアルミニウム又はアルミニウム合金でない材料であってもよく、例えば、アルミニウム又はアルミニウム合金を除く金属、樹脂、ゴム、木材、セラミック、複合材料等が挙げられる
が、これらに限定されない。なお、アルミニウム合金におけるアルミニウム以外の合金成分としては、例えば、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛を挙げることができる。
<Base material>
The base material applied to the embodiment of the present invention is not particularly limited as long as the base material has at least all or part of the surface made of aluminum or an aluminum alloy. The base material contains a casting material and a die casting material, and may be heat-treated. Further, the base material may be subjected to other processing and / or other processing, and may be subjected to processing such as cutting, grinding, blasting, polishing (wrapping), and drilling. Further, in addition to the plate material, the shape of the base material such as rods, bands, pipes, wires, foils, cast and forged products, bearings, etc. is not particularly limited. The base material may be a molded product or a material before molding. Further, the entire or part of the surface of the base material may be a film of aluminum or an aluminum alloy, and the method for forming the film includes, for example, a plating method, a thermal spraying method, and the like, but is not limited thereto. If all or part of the surface of the base material is aluminum or an aluminum alloy, the portion other than the surface of the base material may be a material other than aluminum or an aluminum alloy, for example, a metal other than aluminum or an aluminum alloy. Examples thereof include, but are not limited to, resins, rubbers, woods, ceramics, and composite materials. Examples of alloy components other than aluminum in the aluminum alloy include magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper, and zinc.
<ジンケート工程>
エッチング工程の前処理として前記基材の表面にジンケート皮膜を形成させるジンケート工程を行ってもよい。ジンケート工程は、アルミニウムに対するジンケート工程であれば公知の工程を用いることができる。ジンケート工程は、例えば、酸化亜鉛を溶解させた水酸化ナトリウム水溶液を用い、40.0℃以下に浴温を保ち、前記基材を1.0秒から5.0分程度浸漬して、自然酸化膜を除去すると同時にジンケート皮膜を形成させることができる。また、形成された皮膜を前記エッチング剤や硝酸で溶解し、再度皮膜を形成させる操作を1回以上行ってもよい。これらのジンケート工程に用いる処理液には、必須の成分以外に前記基材由来のアルミニウム、マグネシウム、ケイ素、チタン、クロム、マンガン、鉄、ニッケル、銅、亜鉛等の金属が存在していてもよい。
ジンケート工程に用いる処理液のpHは、公知の範囲であれば、制限されるものではなく、例えばアルカリ側のpHを示す処理液の場合は10.0以上でもよく、13.0以上であってもよい。好ましくは、11.0から13.0の範囲内である。ジンケート液のpHを調整するために、水酸化ナトリウム又は水酸化カリウムを用いてpHを上昇させることができる。
<Ginkating process>
As a pretreatment for the etching step, a zincate step of forming a zincate film on the surface of the base material may be performed. As the zincating step, a known step can be used as long as it is a zincating step for aluminum. In the zincating step, for example, a sodium hydroxide aqueous solution in which zinc oxide is dissolved is used, the bath temperature is maintained at 40.0 ° C. or lower, and the substrate is immersed for about 1.0 second to 5.0 minutes for natural oxidation. A zinc oxide film can be formed at the same time as the film is removed. Further, the operation of dissolving the formed film with the etching agent or nitric acid and forming the film again may be performed once or more. In addition to the essential components, the treatment liquid used in these zincating steps may contain metals such as aluminum, magnesium, silicon, titanium, chromium, manganese, iron, nickel, copper and zinc derived from the substrate. ..
The pH of the treatment liquid used in the zincating step is not limited as long as it is within a known range. For example, in the case of a treatment liquid showing a pH on the alkaline side, it may be 10.0 or more, and may be 13.0 or more. May be good. It is preferably in the range of 11.0 to 13.0. To adjust the pH of the zincate solution, sodium hydroxide or potassium hydroxide can be used to raise the pH.
<エッチング工程>
本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法では、前記基材の表面又は表面上に前記エッチング剤を接触させるエッチング工程が必須である。前記エッチング剤は液温10.0から70.0℃とすることが好ましい。このエッチング剤に前記基材を、例えば浸漬することで接触させる。本発明の実施形態に係る粗面化基材の製造方法及び基材−樹脂硬化物の接合体の製造方法がジンケート工程を含む場合、前記エッチング剤にジンケート工程後の前記基材を接触させる。接触時間は液温及びpHによって異なるが、例えば、1.0秒間から3600.0秒間の範囲内である。エッチング工程の温度については、5.0から70.0℃であることが好ましく、20.0から40.0℃であることがより好ましい。
<Etching process>
In the method for producing a roughened base material and the method for producing a substrate-resin cured product bonded body according to an embodiment of the present invention, an etching step of bringing the etching agent into contact with the surface or the surface of the base material is indispensable. be. The etching agent preferably has a liquid temperature of 10.0 to 70.0 ° C. The base material is brought into contact with this etching agent, for example, by immersing it. When the method for producing a roughened substrate and the method for producing a substrate-resin cured product bonded body according to an embodiment of the present invention include a zincating step, the etching agent is brought into contact with the substrate after the zincating step. The contact time varies depending on the liquid temperature and pH, but is, for example, in the range of 1.0 second to 3600.0 seconds. The temperature of the etching step is preferably 5.0 to 70.0 ° C, more preferably 20.0 to 40.0 ° C.
<他の工程>
(表面清浄工程)
本発明の実施形態に係る製造方法は、全ての工程を行う前に、予め、前記基材の表面を清浄化させる表面清浄工程を含んでいてもよい。例えば、表面清浄工程の一例として、前記基材の表面を脱脂処理する工程を挙げることができる。脱脂処理の方法は、特に限定されず、例えば、溶剤系、水系又はエマルジョン系の脱脂剤を用いる手法を挙げることができる。ここで、当該脱脂剤は、アルカリ塩、界面活性剤等を含んでいてもよい。上記脱脂処理する工程の時間は0.5から30.0分であることが好ましい。上記脱脂処理する工程の温度は30.0から70.0℃であることが好ましい。また、表面清浄工程の一例として、前記基材の表面をアルカリ洗処理する工程を挙げることができる。アルカリ洗処理で用いられる薬剤としては、公知のものを適用することができる。上記脱脂処理する工程の後に、アルカリ洗処理する工程を行ってもよい。
上記アルカリ洗処理する工程の時間は0.5から30.0分であることが好ましい。上記アルカリ洗処理する工程の温度は30.0から70.0℃であることが好ましい。また、表面清浄工程の一例として、前記基材の表面を酸洗処理する工程を挙げることができる。酸洗処理で用いられる薬剤としては、公知のものを適用することができる。なお、上記脱脂処理する工程の後に、酸洗処理する工程を行ってもよい。上記酸洗処理する工程の時間は0.5から30.0分であることが好ましい。上記酸洗処理する工程の温度は30.0から70.0℃であることが好ましい。
<Other processes>
(Surface cleaning process)
The production method according to the embodiment of the present invention may include a surface cleaning step of cleaning the surface of the base material in advance before performing all the steps. For example, as an example of the surface cleaning step, a step of degreasing the surface of the base material can be mentioned. The method of degreasing treatment is not particularly limited, and examples thereof include a method using a solvent-based, water-based or emulsion-based degreasing agent. Here, the degreasing agent may contain an alkaline salt, a surfactant and the like. The time of the degreasing treatment step is preferably 0.5 to 30.0 minutes. The temperature of the step of degreasing treatment is preferably 30.0 to 70.0 ° C. Further, as an example of the surface cleaning step, a step of alkaline washing the surface of the base material can be mentioned. Known chemicals can be applied as the chemicals used in the alkaline washing treatment. After the degreasing treatment step, an alkaline washing treatment step may be performed.
The time of the alkaline washing process is preferably 0.5 to 30.0 minutes. The temperature of the alkaline washing process is preferably 30.0 to 70.0 ° C. Further, as an example of the surface cleaning step, a step of pickling the surface of the base material can be mentioned. As the chemical used in the pickling treatment, known agents can be applied. After the degreasing treatment step, a pickling treatment step may be performed. The time of the pickling treatment step is preferably 0.5 to 30.0 minutes. The temperature of the pickling step is preferably 30.0 to 70.0 ° C.
(後処理工程)
本発明の実施形態に係る製造方法によるエッチング工程の後、前記基材の表面に皮膜を形成させてもよい。皮膜の形成方法は塗布型であっても反応型であってもよく、形成させる皮膜として例えば、アルマイト皮膜、化成皮膜(リン酸塩皮膜、クロメート皮膜、ケイ酸塩皮膜、リチウム化成皮膜、カルシウム化成皮膜、酸化ジルコニウム皮膜等)、シランカップリング剤硬化皮膜、及びめっき皮膜等が挙げられるが、これらに限定されない。
(Post-treatment process)
After the etching step by the manufacturing method according to the embodiment of the present invention, a film may be formed on the surface of the base material. The method of forming the film may be a coating type or a reaction type, and examples of the film to be formed include an alumite film, a chemical conversion film (phosphate film, chromate film, silicate film, lithium chemical conversion film, and calcium chemical formation). (Film, zirconium oxide film, etc.), silane coupling agent cured film, plating film, etc., but are not limited thereto.
(その他の処理工程)
前述の工程のほか、必要に応じてその他の工程を適宜行ってもよい。例えば、水洗工程はすべての工程{エッチング工程の前に行う各種処理(例えば、表面清浄工程やジンケート工程)、エッチング工程、後処理工程等の、すべての工程}後に行ってもよい。また、各工程後に適宜乾燥工程を行ってもよい。
(Other processing processes)
In addition to the above-mentioned steps, other steps may be appropriately performed as needed. For example, the water washing step may be performed after all the steps {all steps such as various treatments (for example, surface cleaning step and zincating step), etching step, post-treatment step, etc. performed before the etching step}. Further, a drying step may be appropriately performed after each step.
<基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程>
前記基材の表面又は表面上に前記エッチング剤を接触させるエッチング工程を経て粗面化基材を得た後、粗面化することにより形成された該粗面化基材の凹みに樹脂組成物を入れる工程である。前記樹脂組成物として、後述する熱可塑性樹脂及び接着剤を挙げることができる。前記樹脂組成物を前記粗面化基材の凹みに入れる工程の例として、射出成形又は接着剤接合を挙げることができる。
射出成形として、インサート成形やアウトサート成形を挙げることができる。インサート成形を行う場合、金型を用意してアルミニウム合金を射出成形金型にインサートして、樹脂組成物を射出し、そのまま離型したら既に接合して一体化しているのが好ましい。前記基材を粗面化することにより形成された凹みに、射出成形により樹脂組成物を入れることで、前記基材と樹脂を強固に接合することが可能である。以後、この方法を射出成形接合と呼称することもある。なお、粗面の表面又は表面上にはジンケート工程で形成した皮膜や、後処理工程で形成した皮膜があってもよい。主に射出成形に用いる樹脂組成物を構成する樹脂は熱可塑性樹脂であっても、熱硬化性樹脂であってもよく、例えば、ポリビニル樹脂、ポリアルキレン樹脂、ポリスチレン樹脂、アクリロニトリル・ブタジエン・スチレン共重合樹脂、アクリロニトリル・スチレン共重合樹脂、ポリアクリル樹脂、ポリアルキレンテレフタレート樹脂、ポリアルキレンナフタレート樹脂、ポリオキシアルキレン樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアセタール樹脂、ポリカーボネート樹脂、ポリフェニレンエーテル樹脂、ポリスルホン樹脂、ポリフェニレンスルフィド樹脂、ポリアリレート樹脂、液晶ポリマー、シンジオタクチックポリスチレン樹脂、フェノール樹脂、エポキシ樹脂、ユリア樹脂、メラミン樹脂、アルキド樹脂、ポリウレタン樹脂、シリコン樹脂、フッ素樹脂等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。また、樹脂には充填材が含まれていてもよく、例えば、ガラス繊維、カーボン繊維、金属繊維、セラミック繊維、ガラスビーズ、カーボン粉末、金属粉末、セラミック粉末、酸化アルミニウム粉末、顔料等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。
<Step of putting the resin composition into the dent formed by roughening the base material>
A resin composition is formed in the dents of the roughened base material formed by roughening the surface of the base material after obtaining the roughened base material through an etching step of bringing the etching agent into contact with the surface or the surface of the base material. It is a process to put in. Examples of the resin composition include thermoplastic resins and adhesives described later. As an example of the step of putting the resin composition into the recess of the roughened base material, injection molding or adhesive bonding can be mentioned.
Examples of injection molding include insert molding and outsert molding. When performing insert molding, it is preferable to prepare a mold, insert the aluminum alloy into the injection molding mold, inject the resin composition, and when the mold is released as it is, it is already joined and integrated. By putting the resin composition into the recess formed by roughening the base material by injection molding, the base material and the resin can be firmly bonded to each other. Hereinafter, this method may be referred to as injection molding joining. In addition, there may be a film formed in the zincate step or a film formed in the post-treatment step on the surface or the surface of the rough surface. The resin constituting the resin composition mainly used for injection molding may be a thermoplastic resin or a thermosetting resin, for example, polyvinyl resin, polyalkylene resin, polystyrene resin, acrylonitrile, butadiene, and styrene. Polymerized resin, acrylonitrile / styrene copolymer resin, polyacrylic resin, polyalkylene terephthalate resin, polyalkylene naphthalate resin, polyoxyalkylene resin, polyamide resin, polyimide resin, polyacetal resin, polycarbonate resin, polyphenylene ether resin, polysulfone resin, polyphenylene One or two suitable ones or two from sulfide resin, polyarylate resin, liquid crystal polymer, syndiotactic polystyrene resin, phenol resin, epoxy resin, urea resin, melamine resin, alkyd resin, polyurethane resin, silicon resin, fluororesin, etc. The above can be selected, but the present invention is not limited to these. Further, the resin may contain a filler, and is suitable from, for example, glass fiber, carbon fiber, metal fiber, ceramic fiber, glass bead, carbon powder, metal powder, ceramic powder, aluminum oxide powder, pigment and the like. One type or two or more types can be selected, but the present invention is not limited thereto.
前記接着剤接合の方法として、例えば、前記粗面に対し樹脂組成物としての接着剤を塗布して、粗面化基材の凹みに接着剤を入れた後に相手材を貼り合わせ、接着剤を硬化させて接合を行う態様を挙げることができる。このとき、前記基材を粗面化することにより形成された凹みに接着剤を入れることで、前記基材と接着剤を強固に接着することが可能である。前記相手材は、樹脂材料だけでなく、金属、ゴム、木材、セラミック、複合材料を含むあらゆる材料であってよい。また、前記相手材の形状は特に限定されず、板、棒、帯、管、線、フィルム等であってもよい。接着剤は、例えば、塩化ビニル樹脂系接着剤、酢酸ビニル樹脂系接着剤、ポリビニルアルコール系接着剤、ポリアクリル系接着剤、ポリアミド系接着剤、セルロース系接着剤、α−オレフィン系接着剤、水性高分子−イソシアネ
ート系接着剤、シアノアクリレート系接着剤、ユリア樹脂系接着剤、メラミン樹脂系接着剤、フェノール樹脂系接着剤、レゾルシノール樹脂系接着剤、エポキシ樹脂系接着剤、シリコン樹脂系接着剤、ポリエステル系接着剤、ポリウレタン系接着剤、ポリアロマティック系接着剤、クロロプレンゴム系接着剤、ニトリルゴム系接着剤、スチレン・ブタジエンゴム系接着剤、ポリサルファイド系接着剤、ブチルゴム系接着剤、シリコンゴム系接着剤、アクリルゴム系接着剤、ウレタンゴム系接着剤、等から適当なものを1種又は2種以上選択することができるが、これらに限定されるものではない。
As a method of joining the adhesive, for example, an adhesive as a resin composition is applied to the rough surface, the adhesive is put into the dent of the roughened base material, and then the mating material is bonded to apply the adhesive. Examples thereof include a mode in which the bonding is performed by curing. At this time, by putting the adhesive in the recess formed by roughening the base material, it is possible to firmly bond the base material and the adhesive. The mating material may be any material including not only resin materials but also metals, rubbers, woods, ceramics and composite materials. Further, the shape of the mating material is not particularly limited, and may be a plate, a rod, a band, a tube, a wire, a film or the like. The adhesives include, for example, vinyl chloride resin adhesives, vinyl acetate resin adhesives, polyvinyl alcohol adhesives, polyacrylic adhesives, polyamide adhesives, cellulose adhesives, α-olefin adhesives, and water-based adhesives. Polymer-isocyanate adhesive, cyanoacrylate adhesive, urea resin adhesive, melamine resin adhesive, phenol resin adhesive, resorcinol resin adhesive, epoxy resin adhesive, silicon resin adhesive, Polyester adhesives, polyurethane adhesives, polyaromatic adhesives, chloroprene rubber adhesives, nitrile rubber adhesives, styrene / butadiene rubber adhesives, polysulfide adhesives, butyl rubber adhesives, silicon rubber adhesives One or two or more suitable adhesives can be selected from adhesives, acrylic rubber adhesives, urethane rubber adhesives, etc., but the present invention is not limited thereto.
本発明の実施形態に係る基材−樹脂硬化物の接合体は、前記粗面化基材と前記樹脂組成物の硬化物のみから構成されるものであってもよいし、前記粗面化基材と前記樹脂組成物の硬化物に加え、その硬化物に接触する相手材を含むものであってもよい。前記樹脂組成物は、粗面化することにより形成された該粗面化基材の凹みに該樹脂組成物を入れる工程の後に、該樹脂組成物が熱可塑性樹脂組成物であれば冷却により、該樹脂組成物が接着剤であれば放置又は加熱することにより硬化して、基材−樹脂硬化物の接合体を形成できる。 The substrate-resin cured product bonded body according to the embodiment of the present invention may be composed of only the roughened base material and the cured product of the resin composition, or the roughened group. In addition to the cured product of the material and the resin composition, it may contain a mating material that comes into contact with the cured product. After the step of putting the resin composition into the recess of the roughened base material formed by roughening the resin composition, if the resin composition is a thermoplastic resin composition, it is cooled by cooling. If the resin composition is an adhesive, it can be cured by being left or heated to form a substrate-resin cured product bond.
≪本発明の実施形態に係る粗面化基材及び基材−樹脂硬化物の接合体の用途≫
本発明の実施形態に係る粗面化基材の製造方法で得られる粗面化基材の表面又は表面上に、1層又は2層以上のラミネート層を形成させるラミネート加工を施してもよい。前記粗面化基材は放熱用部材、摺動用部材の材料として有用である。本発明の実施形態に係る基材−樹脂硬化物の接合体の製造方法で得られる基材−樹脂硬化物の接合体は、自動車用部材、航空機用部材、電子機器用部材、モバイル機器用部材、OA機器用部材、家電機器用部材、医療機器用部材として有用である。なお、本発明の実施形態の製造方法により得られる、前記粗面化基材及び前記基材−樹脂硬化物の接合体は上記の用途に限定されるものではない。
<< Use of roughened base material and base material-bonded body of cured resin according to the embodiment of the present invention >>
A laminating process for forming one layer or two or more laminated layers may be performed on the surface or the surface of the roughened base material obtained by the method for producing a roughened base material according to the embodiment of the present invention. The roughened base material is useful as a material for heat dissipation members and sliding members. The base material-resin cured product bonded body obtained by the method for producing a base material-resin cured product bonded body according to an embodiment of the present invention is a member for an automobile, a member for an aircraft, a member for an electronic device, or a member for a mobile device. It is useful as a member for OA equipment, a member for home electric appliances, and a member for medical equipment. The bonded body of the roughened base material and the base material-cured resin product obtained by the production method of the embodiment of the present invention is not limited to the above applications.
以下に、実施例を比較例とともに挙げ、本発明及びその効果を具体的に説明する。なお、実施例で使用した基材、すべての処理に用いた薬剤は、市販されている材料や試薬の中から任意に選定したものであり、本発明の実際の用途を限定するものではない。 Hereinafter, the present invention and its effects will be specifically described with reference to Examples with Comparative Examples. The base material used in the examples and the chemicals used for all the treatments are arbitrarily selected from commercially available materials and reagents, and do not limit the actual use of the present invention.
≪基材−樹脂硬化物の接合体の製造≫
<基材>
実施例1から13及び比較例1から12に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体の製造においては、特に断りのない限り、基材として20mm×45mm×t1.5mmのアルミニウム材又はアルミニウム合金材を用いた。
≪Manufacturing of bonded body of base material-cured resin product≫
<Base material>
There is no particular notice in the production of the base material-resin cured product bonded body by injection molding bonding and the base material-resin cured product bonded body by adhesive bonding according to Examples 1 to 13 and Comparative Examples 1 to 12. As long as the base material was 20 mm × 45 mm × t1.5 mm, an aluminum material or an aluminum alloy material was used.
<基材−樹脂硬化物の接合体の製造方法>
実施例1から13及び比較例1から4に係る基材−樹脂硬化物の接合体は、特に断りのない限り、[表面清浄工程→ジンケート工程→エッチング工程→射出成形接合工程及び接着剤接合工程のいずれかの工程]の処理工程を経て製造した。
比較例5〜12に係る基材−樹脂硬化物の接合体は、ジンケート工程を含まないこと以外は上記と同じ処理工程を経て製造した。
以下、当該処理工程の各処理を説明する。
<Manufacturing method of base material-residue cured product>
Unless otherwise specified, the substrate-resin cured product bonded bodies according to Examples 1 to 13 and Comparative Examples 1 to 4 are [surface cleaning step → gincate step → etching step → injection molding joining step and adhesive joining step. It was manufactured through the processing step of [one of the steps].
The substrate-resin cured product conjugate according to Comparative Examples 5 to 12 was produced through the same treatment steps as described above except that the zincating step was not included.
Hereinafter, each process of the process will be described.
(表面清浄工程)
表面清浄工程では、アルカリ脱脂{ファインクリーナー315E 日本パーカライジング株式会社製、30g/L(固形分濃度)、70℃、浸漬時間1分}の後、アルカリ洗(水酸化ナトリウム100g/L、50℃、浸漬時間1分)を実施し、各工程後に水洗を実
施した。なお、実施例11、12、13においては、アルカリ洗(水酸化ナトリウム2.5mol/L、50℃、浸漬時間1分)の後、さらに酸洗(55重量%フッ化水素酸:60重量%硝酸=1:9(質量比)、25℃、浸漬時間30秒)を実施した。
(Surface cleaning process)
In the surface cleaning step, after alkaline degreasing {Fine Cleaner 315E Nippon Parkering Co., Ltd., 30 g / L (solid content concentration), 70 ° C., immersion time 1 minute}, alkaline washing (sodium hydroxide 100 g / L, 50 ° C., Soaking time 1 minute) was carried out, and washing with water was carried out after each step. In Examples 11, 12, and 13, after alkaline washing (sodium hydroxide 2.5 mol / L, 50 ° C., immersion time 1 minute), further pickling (55% by weight hydrofluoric acid: 60% by weight). Nitric acid = 1: 9 (mass ratio), 25 ° C., immersion time 30 seconds) was carried out.
(ジンケート工程)
ジンケート工程では、ジンケート液に基材を浸漬させた。
(Ginkating process)
In the zinge step, the base material was immersed in the zinge liquid.
(エッチング工程)
エッチング工程では、エッチング剤に基材を浸漬させた。なお、エッチング剤のpH調整に関しては、塩酸水溶液を用いてpHを下降させ、水酸化ナトリウム水溶液を用いてpHを上昇させた。
(Etching process)
In the etching step, the substrate was immersed in the etching agent. Regarding the pH adjustment of the etching agent, the pH was lowered by using an aqueous hydrochloric acid solution and the pH was raised by using an aqueous sodium hydroxide solution.
(射出成形接合工程)
射出成形接合工程では、前記エッチング工程までの工程を経た上記基材に対し、樹脂組成物としてガラスファイバーを30%含むポリフェニレンサルファイド(PPS樹脂)を射出成形し、接合させた。射出成形には東洋機械金属株式会社製電動サーボ射出成形機(Si−50III)を用いた。射出成形条件は、プレヒート125℃、成形温度320℃、金型温度135℃、射出速度30mm/秒、射出圧力1000kgf、保圧1200kgf、冷却時間15秒とした。成形された基材−樹脂硬化物の接合体は10mm×45mm×t3mmである。また、基材との接合面積は10mm×5mmである。
(Injection molding joining process)
In the injection molding joining step, polyphenylene sulfide (PPS resin) containing 30% of glass fiber as a resin composition was injection molded and bonded to the base material that had undergone the steps up to the etching step. An electric servo injection molding machine (Si-50III) manufactured by Toyo Machinery Metals Co., Ltd. was used for injection molding. The injection molding conditions were preheat 125 ° C., molding temperature 320 ° C., mold temperature 135 ° C., injection speed 30 mm / sec, injection pressure 1000 kgf, holding pressure 1200 kgf, and cooling time 15 seconds. The molded substrate-resin cured product has a size of 10 mm × 45 mm × t3 mm. The bonding area with the base material is 10 mm × 5 mm.
(接着剤接合工程)
接着剤接合工程では、前記エッチング工程までの工程を経た上記基材2枚に対し、アズワン株式会社製ガラスビーズBZ−02を10%含む、ニチバン株式会社製エポキシ系接着剤AR−S30を塗布し、接合させた。上記基材2枚の接合面積は10mm×20mmである。
(Adhesive joining process)
In the adhesive bonding step, the epoxy adhesive AR-S30 manufactured by Nichiban Co., Ltd., which contains 10% of glass beads BZ-02 manufactured by AS ONE Co., Ltd., is applied to the two base materials that have undergone the steps up to the etching step. , Joined. The bonding area of the two substrates is 10 mm × 20 mm.
以下、上述した基材及びプロセスに基づき、実施例1から13及び比較例1から12に係る基材−樹脂硬化物の接合体を製造した。以下に、実施例及び比較例での手順等を述べる。 Hereinafter, based on the above-mentioned base material and process, a base material-resin cured product bonded body according to Examples 1 to 13 and Comparative Examples 1 to 12 was produced. The procedures and the like in Examples and Comparative Examples will be described below.
[実施例1]
(A5052からなる基材を用いた実施例及び比較例)
前記基材として、JIS H4000で規格されたA5052を用いた。ジンケート工程は実施しなかった。前記エッチング工程として、以下のエッチング剤(1)を用いて、基材を480秒間浸漬した。このようにして、[実施例1]に係る射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(1)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
・塩化ナトリウム: 1.70mol/L
<pH>
3.0
[Example 1]
(Examples and Comparative Examples Using a Base Material Made of A5052)
As the base material, A5052 specified by JIS H4000 was used. No zincating process was performed. As the etching step, the substrate was immersed for 480 seconds using the following etching agent (1). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 1] were obtained.
Etching agent (1)
<Ingredients>
・ Water ・ Sodium peroxodisulfate: 0.35 mol / L
-Sodium chloride: 1.70 mol / L
<pH>
3.0
[実施例2]
ジンケート工程を実施した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、前記ジンケート工程として、以下のジンケート液を用いて、基材を30秒間浸漬した。このようにして、[実施例2]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。な
お、前記ジンケート液のpHは塩酸水溶液を用いて、pHを12.5に調整した。
ジンケート液
<成分>
・水
・酸化亜鉛:0.25mol/L
・水酸化ナトリウム:3.80mol/L
・酒石酸:0.07mol/L
<pH>
12.5
<ジンケート工程の温度>
40.0℃
[Example 2]
A substrate-resin cured product bonded body was produced in the same manner as in [Example 1] except that the zinge step was carried out. Specifically, as the ginking step, the substrate was immersed for 30 seconds using the following ginking solution. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 2] were obtained. The pH of the zincate solution was adjusted to 12.5 by using an aqueous hydrochloric acid solution.
Zincate liquid <ingredients>
-Water / zinc oxide: 0.25 mol / L
-Sodium hydroxide: 3.80 mol / L
-Tartaric acid: 0.07 mol / L
<pH>
12.5
<Temperature of ginkgo process>
40.0 ℃
[実施例3]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、以下のエッチング剤(2)を用いて、基材を480秒間浸漬した。このようにして、[実施例3]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(2)
<成分>
・水
・ペルオキソ二硫酸カリウム:0.30mol/L
・塩化カリウム:1.40mol/L
<pH>
3.0
[Example 3]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 480 seconds using the following etching agent (2). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 3] were obtained.
Etching agent (2)
<Ingredients>
・ Water ・ Potassium persulfate: 0.30 mol / L
-Potassium chloride: 1.40 mol / L
<pH>
3.0
[実施例4]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、以下のエッチング剤(3)を用いて、基材を480秒間浸漬した。このようにして、[実施例4]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(3)
<成分>
・水
・ペルオキソ二硫酸アンモニウム:0.36mol/L
・塩化ナトリウム:1.70mol/L
<pH>
3.0
[Example 4]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 480 seconds using the following etching agent (3). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 4] were obtained.
Etching agent (3)
<Ingredients>
・ Water ・ Ammonium peroxodisulfate: 0.36 mol / L
-Sodium chloride: 1.70 mol / L
<pH>
3.0
[実施例5]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、エッチング工程として、表1のエッチング剤(4)を用いて、基材を480秒間浸漬した。このようにして、[実施例5]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−基材接合体を得た。
エッチング剤(4)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
・塩化カルシウム:0.90mol/L
<pH>
3.0
[Example 5]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 480 seconds using the etching agent (4) in Table 1. In this way, the base material-resin cured product bonded body by injection molding bonding and the base material-base material bonded body by adhesive bonding according to [Example 5] were obtained.
Etching agent (4)
<Ingredients>
・ Water ・ Sodium peroxodisulfate: 0.35 mol / L
-Calcium chloride: 0.90 mol / L
<pH>
3.0
[比較例1]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(5)を用いて、基材を480秒間浸漬した。このようにして、[比較例1]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(5)
<成分>
・水
・ペルオキソ二硫酸ナトリウム:0.35mol/L
<pH>
3.0
[Comparative Example 1]
A substrate-resin cured product bonded body was obtained in the same manner as in [Example 2] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 480 seconds using the following etching agent (5). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 1] were obtained.
Etching agent (5)
<Ingredients>
・ Water ・ Sodium peroxodisulfate: 0.35 mol / L
<pH>
3.0
[比較例2]
エッチング工程を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(6)を用いて、基材を480秒間浸漬した。このようにして、[比較例2]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(6)
<成分>
・水
・塩化ナトリウム:1.70mol/L
<pH>
3.0
[Comparative Example 2]
A substrate-resin cured product bonded body was obtained in the same manner as in [Example 2] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 480 seconds using the following etching agent (6). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 2] were obtained.
Etching agent (6)
<Ingredients>
・ Water ・ Sodium chloride: 1.70 mol / L
<pH>
3.0
[比較例3]
エッチング工程を変更した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(7)を用いて、基材を300秒間浸漬した。このようにして、[比較例3]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(7)
<成分>
・水
・リン酸:5.10mol/L
・塩化ナトリウム:0.85mol/L
<pH>
1.0
[Comparative Example 3]
A substrate-resin cured product bonded body was obtained in the same manner as in [Example 1] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 300 seconds using the following etching agent (7). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 3] were obtained.
Etching agent (7)
<Ingredients>
-Water / phosphoric acid: 5.10 mol / L
-Sodium chloride: 0.85 mol / L
<pH>
1.0
[比較例4]
エッチング工程を変更した点以外は[実施例1]と同様の方法で、基材−樹脂硬化物の接合体を得た。具体的には、エッチング工程として、以下のエッチング剤(8)を用いて、基材を300秒間浸漬した。このようにして、[比較例4]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
エッチング剤(8)
<成分>
・水
・硫酸:0.50mol/L
・塩化ナトリウム:1.70mol/L
<pH>
1.0
[Comparative Example 4]
A substrate-resin cured product bonded body was obtained in the same manner as in [Example 1] except that the etching process was changed. Specifically, as an etching step, the substrate was immersed for 300 seconds using the following etching agent (8). In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 4] were obtained.
Etching agent (8)
<Ingredients>
・ Water / sulfuric acid: 0.50 mol / L
-Sodium chloride: 1.70 mol / L
<pH>
1.0
[引張せん断試験]
実施例1から5及び比較例1から4の、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体について、引張せん断強度を測定した。引張せん断試験は、株式会社島津製作所製オートグラフ精密万能試験機(AG−100kNX)を用いて行った。引張速度は10mm/分とし、引張せん断強度(MPa)は破壊荷重(N)/接合部面積(50mm2)として算出した。結果を表1に示す。
[Tension shear test]
The tensile shear strength of the joints of the base material-cured resin product obtained by injection molding bonding and the base material-cured resin product formed by adhesive bonding in Examples 1 to 5 and Comparative Examples 1 to 4 was measured. The tensile shear test was performed using an autograph precision universal testing machine (AG-100kNX) manufactured by Shimadzu Corporation. The tensile speed was 10 mm / min, and the tensile shear strength (MPa) was calculated as the fracture load (N) / joint area (50 mm 2). The results are shown in Table 1.
(その他のアルミニウム又はアルミニウム合金からなる基材を用いた実施例及び比較例)[実施例6]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA1050を用いた。このようにして、[実施例6]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
(Examples and Comparative Examples Using Other Base Materials Made of Aluminum or Aluminum Alloy) [Example 6]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A1050 standardized by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 6] were obtained.
[実施例7]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA2017を用いた。このようにして、[実施例7]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 7]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A2017 specified by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 7] were obtained.
[実施例8]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA3003を用いた。このようにして、[実施例8]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 8]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A3003 standardized by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 8] were obtained.
[実施例9]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4140で規格されたA4032を用いた。このようにして、[実施例9]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 9]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A4032 specified by JIS H4140 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 9] were obtained.
[実施例10]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4040で規格されたA6063を用いた。このようにして、[実施例10]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 10]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A6063 specified by JIS H4040 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 10] were obtained.
[実施例11]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA7075を用いた。このようにして、[実施例11]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 11]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, A7075 specified by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 11] were obtained.
[実施例12]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5202で規格されたAC8Aを用いた。このようにして、[実施例12]
に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 12]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, AC8A specified by JIS H5202 was used as the base material. In this way, [Example 12]
A bonded body of a base material-cured resin product by injection molding bonding and a bonded body of a base material-cured resin product by adhesive bonding were obtained.
[実施例13]
基材を変更した点以外は[実施例2]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5302で規格されたADC12を用いた。このようにして、[実施例13]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Example 13]
A base material-resin cured product bonded body was produced in the same manner as in [Example 2] except that the base material was changed. Specifically, ADC12 standardized by JIS H5302 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Example 13] were obtained.
[比較例5]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA1050を用いた。このようにして、[比較例5]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 5]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A1050 standardized by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 5] were obtained.
[比較例6]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA2017を用いた。このようにして、[比較例6]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 6]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A2017 specified by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 6] were obtained.
[比較例7]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA3003を用いた。このようにして、[比較例7]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 7]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A3003 standardized by JIS H4000 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 7] were obtained.
[比較例8]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4140で規格されたA4032を用いた。このようにして、[比較例8]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 8]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A4032 specified by JIS H4140 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 8] were obtained.
[比較例9]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製
造した。具体的には、基材としてJIS H4040で規格されたA6063を用いた。このようにして、[比較例9]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 9]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A6063 specified by JIS H4040 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 9] were obtained.
[比較例10]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H4000で規格されたA7075を用いた。このようにして、[比較例10]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 10]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, A7075 specified by JIS H4000 was used as the base material. In this way, the bonded body of the base material-cured resin product by injection molding bonding and the bonded body of the base material-cured resin product by adhesive bonding according to [Comparative Example 10] were obtained.
[比較例11]
基材を変更した点以外は[比較例4]と同様の方法で、基材−樹脂硬化物の接合体を製造した。具体的には、基材としてJIS H5202で規格されたAC8Aを用いた。このようにして、[比較例11]に係る、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体を得た。
[Comparative Example 11]
A base material-resin cured product bonded body was produced in the same manner as in [Comparative Example 4] except that the base material was changed. Specifically, AC8A specified by JIS H5202 was used as the base material. In this way, a substrate-resin cured product bonded body by injection molding bonding and a base material-resin cured product bonded body by adhesive bonding according to [Comparative Example 11] were obtained.
[比較例12]
基材を変更した点以外は[比較例4]と同様の方法で、[比較例12]の基材−樹脂硬化物の接合体を製造した。具体的には、基材としてADC12を用いた。このようにして、[比較例12]に係る基材−樹脂硬化物の接合体及び基材−基材接合体を得た。
[Comparative Example 12]
A bonded body of the base material-cured resin product of [Comparative Example 12] was produced by the same method as in [Comparative Example 4] except that the base material was changed. Specifically, ADC12 was used as a base material. In this way, a base material-cured resin product bonded body and a base material-base material bonded body according to [Comparative Example 12] were obtained.
実施例6から13及び比較例5から12の、射出成形接合による基材−樹脂硬化物の接合体及び接着剤接合による基材−樹脂硬化物の接合体について、引張せん断強度を測定した。結果を表3に示す。 The tensile shear strength was measured for the base material-resin cured product bonded body by injection molding bonding and the base material-resin cured product bonded body by adhesive bonding in Examples 6 to 13 and Comparative Examples 5 to 12. The results are shown in Table 3.
Claims (7)
少なくともペルオキソ二硫酸イオンと塩化物イオンを含む、エッチング剤(但し、塩化鉄を含むエッチング剤、及び塩酸を含むエッチング剤を除く)。 An etching agent for roughening the surface of a base material whose surface is at least all or partly made of aluminum or an aluminum alloy.
Etching agents containing at least peroxodisulfate ions and chloride ions (excluding etching agents containing iron chloride and etching agents containing hydrochloric acid) .
請求項1に記載のエッチング剤を接触させるエッチング工程と、
前記エッチング剤を接触させ、前記基材を粗面化することにより形成された凹みに樹脂組成物を入れる工程と、
を含む、基材−樹脂硬化物の接合体の製造方法。 On the surface or surface of a substrate of which at least all or part of the surface is made of aluminum or an aluminum alloy.
The etching step of contacting the etching agent according to claim 1 and
A step of putting the resin composition into the recess formed by bringing the etching agent into contact and roughening the base material, and
A method for producing a substrate-resin cured product bonded body, which comprises.
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| JP2017231283A JP6967953B2 (en) | 2017-11-30 | 2017-11-30 | Etching agent for roughening the surface of a base material whose surface is at least all or part of aluminum or an aluminum alloy, a method for producing a roughened base material, a roughened base material, a base material-a cured resin product. Manufacturing method of the bonded body and the bonded body of the base material-resin cured product |
| CN201880074136.3A CN111386361B (en) | 2017-11-30 | 2018-11-30 | Etchant, roughened base material and method for producing the same, and base material-resin cured product combination and method for producing the same |
| KR1020207014238A KR102447059B1 (en) | 2017-11-30 | 2018-11-30 | An etchant for roughening the surface of a substrate whose surface is at least all or part of which is made of aluminum or an aluminum alloy, a method for manufacturing a roughened substrate, a method for manufacturing a roughened substrate, a bonded body of a substrate-resin cured product, and substrate-resin curing conjugation of water |
| PCT/JP2018/044116 WO2019107529A1 (en) | 2017-11-30 | 2018-11-30 | Etchant for roughening surface of substrate of which at least all or part of surface is formed from aluminum or aluminum alloy; manufacturing method of roughened substrate; roughened substrate; manufacturing method of bonded body comprising substrate and resin cured product; and bonded body comprising substrate and resin cured product |
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| US3281293A (en) * | 1963-07-19 | 1966-10-25 | Chemcut Corp | Method of etching aluminum |
| JPS5024135B1 (en) * | 1971-05-24 | 1975-08-13 | ||
| ZA743293B (en) * | 1974-03-01 | 1975-05-28 | Pennwalt Corp | Non-chromated alkaline etching bath and etching process for aluminium |
| EP1481796B1 (en) * | 2002-03-05 | 2015-08-19 | Hitachi Chemical Co., Ltd. | Metal foil with resin and metal-clad laminate, and printed wiring board using the same and method for production thereof |
| JP2004034524A (en) * | 2002-07-03 | 2004-02-05 | Mec Kk | Metal resin composite and method for producing the same |
| JP5253416B2 (en) * | 2007-12-18 | 2013-07-31 | 大成プラス株式会社 | Metal-resin composite and method for producing the same |
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