JP6968419B2 - Manufacturing method of wavefront control element - Google Patents

Description

The present invention relates to a method for manufacturing a wavefront control element.

In X-ray interferometers and neutron interferometers, it is necessary to precisely control the wavefront of X-rays and neutrons, and for that purpose, it is necessary to arrange the wavefront control element to be used in a highly accurate and accurate shape. In particular, in X-ray Talbot interferometers and neutron Talbot interferometers, diffraction gratings are used as wavefront control elements, but in order to improve sensitivity and spatial resolution, a diffraction grating with a shorter cycle and a higher precision shape is required. ..

Conventionally, as a diffraction grating of an X-ray Talbot interferometer, the depth of the recess is about 10 μm by performing transfer molding on a Pd-based metallic glass material that has been supercooled at a heating rate of 0.33 K / s. A diffraction grating made of metallic glass having a concavo-convex period of 8 μm has been obtained by the present inventors (see, for example, Non-Patent Document 1). However, in this method, in order to obtain a metallic glass diffraction grid, it is necessary to maintain the temperature _{at the time of molding at a temperature between the glass transition temperature (T g} ) and the crystallization start temperature ( _Ton). There is a problem that the metallic glass material must be molded in a state of high viscosity.

Further, as a method of obtaining a diffraction grating of a neutron Talbot interferometer, a diffraction grating made of Gadox is manufactured by injecting a powder of Gadox (Gd sulfate) into a substrate grating made of Si, infiltrating it, and further solidifying it. A method has been developed (see, for example, Non-Patent Document 2). However, the diffraction grating obtained by this method has a problem that it is difficult to obtain a structure smaller than several hundred μm because the depth of the concave portion is 500 μm and the period of the unevenness is 477 μm. _{Therefore, with this method, it is possible to manufacture a G 0} (Source Grating) diffraction grating having a relatively long uneven period among the diffraction gratings of a neutron Talbot interferometer _{, but a shorter period G 2} (Analyzer Grating). ) Diffraction grating cannot be manufactured.

Further, as a method of obtaining a diffraction grating having a shorter cycle, a diffraction grating made of Gd is manufactured by spraying Gd steam diagonally from above onto a diffraction grating die made of Si and depositing the diffraction grating on the Si die. A method has been developed (see, for example, Non-Patent Document 3). This method obtains a short-period diffraction grating that has a recess depth of about 11 μm and an uneven period of about 4 μm and _{can be used as a G 2 diffraction grating for a neutron Talbot interferometer.} There was a problem that it could not be controlled precisely. Therefore, there is a risk that the thickness of the convex portion of the diffraction grating will be uneven and the spatial resolution of the interferometer will be reduced. Further, it takes about 2 days to 1 week to manufacture one diffraction grating, and there is also a problem that the manufacturing time is long.

Therefore, in order to solve these problems, the method described in Non-Patent Document 1 is improved, and the liquidmetal glass material in the supercooled state is equal to or higher than _{the crystallization start temperature (Ton) of the supercooled liquid of the supercooled liquidmetal material.} By heating to the above temperature and completing the crystallization process of the supercooled liquid, there is a method of processing the metallic glass material into a mixed phase of the metallic glass and the crystalline phase or a molded body having a crystalline single phase. , Developed by the present inventors (see, for example, Patent Document 1).

Further, by improving the microcasting method and pouring a molten Bi, Au-Sn-based alloy or a Pb-based alloy into a diffraction grating mold (template) made of Si, a structure of several μm to several tens of μm is formed. A method for manufacturing a diffraction grating of an X-ray interferometer having a high aspect ratio has also been developed (see, for example, Non-Patent Documents 4 to 6). Further, a method of manufacturing a diffraction grating of a high aspect ratio X-ray interferometer having a structure of about several μm, which is gold-plated on a Si substrate by using X-ray lithography and electroforming, has also been developed. (See, for example, Non-Patent Document 7).

Wataru Yashiro, Daiji Noda, Tadashi Hattori, Kouichi Hayashi, Atsushi Momose, and Hidemi Kato, “A metallic glass grating for X-ray grating interferometers plotted by imprinting”, Applied Physics Express, 2014, 7, 032501 J. Kim, et al., “Fabrication and characterization of the source grating for visibility improvement of neutron phase imaging with gratings”, Rev. Sci. Instrum., 2013, 84, 063705 C. Grunzweig, et al., “Design, fabrication, and characterization of diffraction gratings for neutron phase contrast imaging”, Rev. Sci. Instrum., 2008, 79, 053703 Yaohu Lei, et al., “Improvement of filling bismuth for x-ray absorption gratings through the enhancement of wettability”, J. Micromech. Microeng., 2016, 26, 065011 L. Romano, et al., “High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication”, Microelectronic Engineering, 2017, 176, p.6-10 L. Romano, et al., “Hot embossing of Au- and Pb-based alloys for x-ray grating fabrication”, J. Vac. Sci. Technol. B, 2017, Vol.35, No.6, 06G302 ASICON Co., Ltd., "Products and Services; Gratings for X-ray Talbot-Lau Interferometry", [online], [Search on April 25, 2018] , Internet <URL: http://www.asicon-tokyo.com/imt04.php>

International release WO2016 / 208517

According to the method described in Patent Document 1, _{by heating to a crystallization start temperature (Ton} ) or higher, a metallic glass material can be processed into a molded product in a state of low viscosity, so that the shape can be changed at the time of molding. It can be controlled more precisely. Therefore, it is possible to manufacture a _{G 2} diffraction grating of a neutron Talbot interferometer or an X-ray Talbot interferometer having a small structure of several tens of μm to several hundred nm. Further, since the molding is performed while the metallic glass material contains the supercooled state, the manufacturing time is inevitably shortened. However, there is a problem that it is necessary to precisely control the temperature of the metallic glass material at the time of manufacturing, which increases the cost.

Further, the methods described in Non-Patent Documents 4 to 6 also have a structure of several μm to several tens of μm, and can manufacture a wave surface control element having a high aspect ratio. Since it is necessary to manage it precisely, there is also a problem that the manufacturing cost is high. Further, the method described in Non-Patent Document 7 also has a structure of about several μm and can manufacture a wavefront control element having a high aspect ratio, but it requires precise control of manufacturing conditions, and is also at the time of manufacturing. There was a problem that the cost was high.

The present invention has been made by paying attention to such a problem, and provides a method for manufacturing a wavefront control element capable of manufacturing a wavefront control element having a structure of several tens of μm or less at a lower cost. The purpose.

In order to achieve the above object, the method for manufacturing a wavefront control element according to the present invention uses a mold having irregularities periodically, and material particles containing a metal element are filled in the concave portions of the mold by centrifugal filling to fill the concave portions of the mold. It is characterized by manufacturing a control element.

In the method for manufacturing a wavefront control element according to the present invention, material particles can be filled in the recesses of a mold with a relatively high filling rate by centrifugal filling. Therefore, by using a mold having a structure of several tens of μm or less and material particles that can be inserted into the recesses of the mold, a wavefront control element having a structure of several tens of μm or less can be manufactured. In addition, precise temperature and pressure control is not required at the time of manufacture, and the wavefront control element can be manufactured at a lower cost than those requiring precise temperature and pressure control.

In the method for manufacturing a wavefront control element according to the present invention, the shape can be precisely controlled by a mold to manufacture a wavefront control element. Therefore, it is also possible to manufacture a wavefront control element having a high aspect ratio. The mold may be anything as long as it has irregularities periodically, depending on the application of the wavefront control element to be manufactured. For example, the concave portions and the convex portions are continuously extended in one direction and orthogonal to the concave portions and the convex portions. The unevenness may appear repeatedly in the direction, or the unevenness may appear repeatedly in two directions orthogonal to each other.

In the method for manufacturing a wavefront control element according to the present invention, it is preferable to perform the centrifugal filling at a rotation speed of 40,000 rpm or more. In this case, the filling rate of the material particles in the recesses can be increased. In addition, the wavefront control element can be manufactured in a shorter time. By increasing the rotation speed, it is possible to accurately manufacture a wavefront control element having a higher aspect ratio.

In the method for manufacturing a wavefront control element according to the present invention, in the mold, the depth of the recess is 10 μm or more and 1000 μm or less, the period of the unevenness is 100 nm or more and 100 μm or less, and the material particles have a diameter of 5 nm or more and 10 μm or less. It is preferable that the concave portion has a size that can be filled. In this case, it is possible to manufacture a wavefront control element having a high aspect ratio and a smaller structure, such as a neutron Talbot interferometer and a G _{2 diffraction grating of an X-ray Talbot interferometer.}

In the method for manufacturing a wavefront control element according to the present invention, sintering may be performed after the centrifugal filling, or heat treatment may be performed at a temperature equal to or higher than the melting point of the material particles. When sintering is performed, the material particles are bonded to each other, so that a precise wavefront control element can be manufactured. Further, when the heat treatment is performed at a temperature equal to or higher than the melting point of the material particles, the material particles soften or melt, so that the material particles flow according to the shape of the concave portion, and the shape accuracy can be improved. If the material particles are difficult to flow due to the surface tension of the softened or melted material particles or the adhesive force between the material particles and the mold, pressure is applied to the material particles so that the material particles are filled in the recesses. You may.

The wavefront control element manufactured by the method for manufacturing a wavefront control element according to the present invention is, for example, the diffraction grating of a neutron beam interferometer or an X-ray interferometer, or the G ₂ of a neutron Talbot interferometer or an X-ray Talbot interferometer. It is a diffraction grating. When the wavefront control element is a diffraction grating of a neutron beam interferometer or a G ₂ diffraction grating of a neutron Talbot interferometer, the material particles are alloy particles containing Gd or a metal containing Gd as a main component. It is preferably composed of oxide particles. In these cases, Gd absorbs thermal neutrons better than other elements, and is therefore most suitable as a diffraction grating for a neutron beam interferometer or a neutron Talbot interferometer.

When the wave surface control element is a diffraction grating of an X-ray interferometer or a G ₂ diffraction grating of an X-ray Talbot interferometer, the material particles are Pt, Au, Ta, W, Re, Pb or It has a metal particle composed of Bi, an alloy particle having Pt, Au, Ta, W, Re, Pb or Bi as a main component, or an oxide of Pt, Au, Ta, W, Re, Pb or Bi as a main component. It is preferably composed of metal oxide particles. In this case, Pt, Au, Ta, W, Re, Pb, and Bi absorb X-rays better than other elements, so that they are most suitable as diffraction gratings for X-ray interferometers and X-ray Talbot interferometers. ..

Further, the material particles may be composed of Gd group, Sm group, Eu group, Dy group, Pt group, Au group, Pd group or Ni group metallic glass particles. In the case of Gd group, Sm group, Eu group, and Dy group metal glass particles, the wavefront control element to be manufactured is most suitable as a diffraction grating for a neutron beam interferometer or a neutron Talbot interferometer, and has a Pt group or Au group. In the case of Pd-based and Ni-based metal glass particles, the manufactured wavefront control element is most suitable as a diffraction grating of an X-ray interferometer or an X-ray Talbot interferometer. In this case, since the material particles are made of metallic glass particles, adjacent convex portions and concave portions are formed by performing molding such as transfer molding using a supercooled liquid state as described in Patent Document 1 after centrifugation. A diffraction grating having a distance from and on the order of nm can be manufactured.

In the method for manufacturing a wavefront control element according to the present invention, after the centrifugal filling, a metallic glass ribbon may be laid so as to cover the recesses filled with the material particles, and heat treatment may be performed. In this case, by keeping the sinterable temperature of the material particles equal to the glass transition temperature of the metallic glass ribbon, the material particles and the metallic glass ribbon can be densified at the same time by a heat treatment such as sintering. Further, during the heat treatment, pressure may be applied to the material particles from above the metallic glass ribbon so that the material particles are filled in the recesses. This makes it possible to improve the shape accuracy.

When this metal glass ribbon is used, when the wave surface control element is a diffraction lattice of an X-ray interferometer or an X-ray Talbot interferometer, for example, the material particles are pure gold nanoparticles and the metal glass ribbon is the melting point of the pure gold nanoparticles. It may be made of metal glass having a glass transition temperature (Tg) equivalent to that of the above and having a composition having a large average atomic number. Further, when the wave surface control element is a diffraction lattice of a neutron beam interferometer or a neutron beam Talbot interferometer, for example, the material particles are alloy particles containing Gd, and the metal glass ribbon is a glass transition equivalent to the melting point of the alloy particles. It may be made of Gd-based metal glass having a temperature (Tg) and a composition having a large average atomic number.

Further, when this metallic glass ribbon is used, heat treatment may be performed so that the metallic particles are made of metallic glass particles and the metallic particles and the metallic glass ribbon are in a mixed phase or a crystalline single phase of the metallic glass and the crystalline phase. In this case, since the material particles are bonded to each other and integrated with the metallic glass ribbon, it is possible to manufacture a wavefront control element made of an alloy having the same composition as that of the metallic glass, which is dense.

According to the present invention, it is possible to provide a method for manufacturing a wavefront control element, which can manufacture a wavefront control element having a structure of several tens of μm or less at a lower cost.

It is a front view which shows the state which (a) the state which put the mold and the particle dispersion liquid in a container, and (b) the state which is performing the centrifugal filling of the manufacturing method of the wavefront control element of embodiment of this invention. Of the method for manufacturing a wave surface control element according to the embodiment of the present invention, (a) scanning electron microscope (SEM) photograph, (b) (a) of the cross section of the mold after centrifugal filling using gold particles. It is an SEM photograph which enlarged the concave part. An SEM photograph of (a) the transmitted light of monochromatic X-rays irradiated from the front side of the wavefront control element manufactured by the method for manufacturing the wavefront control element according to the embodiment of the present invention, taken from the back side, (b) (b). a) It is a graph which shows the measurement result of the transmittance along the line in a). It is a scanning electron microscope (SEM) photograph of the cross section of the mold after centrifugal filling using Pt particles of the method of manufacturing the wave surface control element of the embodiment of this invention. It is a scanning electron microscope (SEM) photograph of the cross section of the mold after centrifugal filling using gadolinium oxide particles of the method of manufacturing the wave surface control element of the embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
1 to 5 show a method for manufacturing a wavefront control element according to an embodiment of the present invention.
In the method of manufacturing the wavefront control element according to the embodiment of the present invention, in order to manufacture the wavefront control element, first, as shown in FIG. 1A, a mold 11 having periodic irregularities is placed on the opening side of the recess. Is placed on the bottom of the container 12 with the face up.

The mold 11 is formed so that the depth of the concave portion and the period of the unevenness of the wavefront control element to be manufactured have a desired size. As a specific example, in the mold 11, the depth of the concave portion is 10 μm or more and 300 μm or less, and the period of the unevenness is 100 nm or more and 100 μm or less. Further, as a method for manufacturing the mold 11, for example, a method such as Deep RIE (deep digging etching), anisotropic etching, X-ray lithography, anodized porous alumina, and 3D printing can be used. The mold 11 may be made of any material such as silicon as long as it is a material that is not destroyed by the centrifugal filling performed later.

Further, the mold 11 may be of any shape as long as it has irregularities periodically, depending on the application of the wavefront control element to be manufactured. For example, the concave portions and the convex portions are continuously extended in one direction. The unevenness may appear repeatedly in the direction orthogonal to it, or the unevenness may appear repeatedly in two directions orthogonal to it.

Next, the particle dispersion liquid 13 in which the material particles containing the metal element are dispersed in water is placed in the container 12 in which the mold 11 is arranged. The material particles have a size that can be filled in the recesses of the mold 11. In a specific example, the material particles have a diameter of 5 nm or more and 10 μm or less. The material particles are, for example, alloy particles containing Gd that absorbs thermal neutrons well, or alloy particles in the case of manufacturing a diffraction grating _{of a neutron beam interferometer or a G 2} diffraction grating of a neutron Talbot interferometer as a wave surface control element. It is preferably composed of metal oxide particles containing Gd as a main component.

Further, when the material particles are used as a wave surface control element _{to manufacture a diffraction grid of an X-ray interferometer or a G 2} diffraction grid of an X-ray alloy Talbot interferometer, Pt, Au, Ta, W that absorb X-rays well. , Re, Pb or Bi metal particles, alloy particles having Pt, Au, Ta, W, Re, Pb or Bi as main components, oxidation of Pt, Au, Ta, W, Re, Pb or Bi as main components It is preferably composed of metal oxide particles having a substance, or metal glass particles having a Pt group, an Au group, a Pd group, or a Ni group.

After the particle dispersion liquid 13 is put in the container 12, the container 12 is sealed with a lid 12a, and as shown in FIG. 1 (b), the bottom of the container 12 in which the mold 11 is arranged is with respect to the center of rotation. Centrifugal filling is performed so that it is on the outside. In a specific example, the rotation speed of centrifugal filling is 40,000 rpm or more. As a result, the recesses of the mold 11 are filled with the material particles, and the wavefront control element can be manufactured. It is preferable that the material particles protruding from the recesses of the mold 11 are removed. In this case, it can be easily removed by, for example, Ar milling, reactive dry etching, wet etching, polishing, or the like.

Next, the action will be described.
In the method for manufacturing a wavefront control element according to the embodiment of the present invention, material particles can be filled in the recesses of the mold 11 with a relatively high filling rate by centrifugal filling. Therefore, depending on the size of the mold 11, for example, a wavefront control element such as a diffraction grating of a neutron beam interferometer or an X-ray interferometer having a thickness of several hundred μm to several tens of μm or less can be manufactured. In addition, precise temperature and pressure control is not required at the time of manufacture, and the wavefront control element can be manufactured at a lower cost than those requiring precise temperature and pressure control.

In the method for manufacturing a wavefront control element according to the embodiment of the present invention, the shape can be precisely controlled by the mold 11 to manufacture the wavefront control element. Therefore, it is also possible to manufacture a wavefront control element having a high aspect ratio. As described above, according to the method for manufacturing a wavefront control element according to the embodiment of the present invention, it is possible to manufacture a wavefront control element having a size of about 100 nm, and G of a neutron Talbot interferometer or an X-ray Talbot interferometer. It is possible to manufacture a wavefront control element having a high aspect ratio and a smaller structure, such as a diffraction grating of _2.

In the method for manufacturing a wavefront control element according to the embodiment of the present invention, the filling rate of material particles in the recesses can be increased by performing centrifugal filling at a rotation speed of 40,000 rpm or more. In addition, the wavefront control element can be manufactured in a shorter time. By increasing the rotation speed, it is possible to accurately manufacture a wavefront control element having a higher aspect ratio.

In the method for manufacturing the wavefront control element according to the embodiment of the present invention, sintering may be performed after centrifugal filling, or heat treatment may be performed at a temperature equal to or higher than the melting point of the material particles. When sintering is performed, the material particles are bonded to each other, so that a precise wavefront control element can be manufactured. Further, when the heat treatment is performed at a temperature equal to or higher than the melting point of the material particles, the material particles soften or melt and flow according to the shape of the concave portion, so that the shape accuracy can be improved. If the material particles are difficult to flow due to the surface tension of the softened or melted material particles or the adhesive force between the material particles and the mold, pressure is applied to the material particles so that the material particles are filled in the recesses. You may.

Further, in the method for manufacturing the wavefront control element according to the embodiment of the present invention, after centrifugal filling, a metallic glass ribbon may be laid so as to cover the recesses filled with the material particles, and heat treatment may be performed. In this case, by keeping the sinterable temperature of the material particles equal to the glass transition temperature of the metallic glass ribbon, the material particles and the metallic glass ribbon can be densified at the same time by a heat treatment such as sintering. Further, during the heat treatment, pressure may be applied to the material particles from above the metallic glass ribbon so that the material particles are filled in the recesses. This makes it possible to improve the shape accuracy.

Further, when the material particles are made of metallic glass particles and a metallic glass ribbon is used, heat treatment may be performed so that the metallic particles and the metallic glass ribbon have a mixed phase of metallic glass and a crystalline phase or a single crystalline phase. In this case, since the material particles are bonded to each other and integrated with the metallic glass ribbon, it is possible to manufacture a wavefront control element made of an alloy having the same composition as that of the metallic glass, which is dense.

The wavefront control element was manufactured by the method for manufacturing the wavefront control element according to the embodiment of the present invention. As the mold 11, a 10 mm square silicon thin plate having periodic irregularities formed in an 8 mm square region by Deep RIE was used. The mold 11 has a concave-convex period of 30 μm, a concave portion width of 20 μm, and a concave portion depth of 80 μm. Further, as the particle dispersion liquid 13, 0.1 g of spherical gold (Au) particles having a diameter of 1.5 μm was used as the material particles 14 in 6 ml of water. Centrifugal filling was performed at an ambient temperature of 4 ° C. and a rotation speed of 40,000 rpm for 1 hour.

A scanning electron microscope (SEM) photograph of the cross section of the mold 11 after centrifugation is shown in FIG. As shown in FIG. 2, it was confirmed that the recess 11a is filled with the material particles 14 and that a wavefront control element having a structure of about several tens of μm is manufactured. The manufactured wavefront control element can be used as a diffraction grating of an X-ray interferometer in the state shown in FIG. 2 with the silicon mold 11 attached.

Further, the transmittance of the wavefront control element shown in FIG. 2A was measured using a monochromatic X-ray of 33.3 keV. At this time, by expanding the beam size in the horizontal direction by asymmetric Bragg reflection, the measurement was performed with a spatial resolution sufficiently higher than 10 μm. FIG. 3A is a scanning electron microscope (SEM) photograph of the transmitted light of X-rays emitted from the front surface side of the wavefront control element, that is, the tip end side of the convex portion of the mold 11, taken from the back surface side of the wavefront control element. Shown in. Further, the transmittance along the line in FIG. 3 (a) (the line extending in the lateral direction near the upper edge in the figure) is obtained and shown in FIG. 3 (b).

As shown in FIG. 3A, the bright and dark striped pattern of the transmitted light was clearly confirmed corresponding to the unevenness of the wavefront control element. That is, the convex portion of the mold 11 in which Si is thick is brightened by transmitting a large amount of X-rays, and the concave portion 11a of the mold 11 filled with the material particles 14 is difficult to transmit X-rays and is dark. It was confirmed that it was. Further, from the transmittance value in FIG. 3B, it was confirmed that the volume filling rate of the material particles 14 into the recess 11a of the mold 11 was 75% or more, and the packing was almost close-packed.

The wavefront control element was manufactured by the method for manufacturing the wavefront control element according to the embodiment of the present invention. As the mold 11, a 10 mm square silicon thin plate having periodic irregularities formed in an 8 mm square region by Deep RIE was used. The mold 11 has a concave-convex period of 9 μm, a concave portion width of 4.5 μm on average, and a concave portion depth of about 45 μm. Further, as the particle dispersion liquid 13, 0.1 g of spherical Pt particles having a diameter of 100 nm was used as the material particles 14 in 6 ml of water. Centrifugal filling was performed at an ambient temperature of 4 ° C. and a rotation speed of 40,000 rpm for 1 hour.

A scanning electron microscope (SEM) photograph of the cross section of the mold 11 after centrifugation is shown in FIG. As shown in FIG. 4, the material particles 14 are slightly spilled when the cross section is produced, but the recesses 11a are filled with the material particles 14, and a wavefront control element having a structure of about several μm is manufactured. It was confirmed that. The manufactured wavefront control element can be used, for example, as a G ₂ diffraction grating of an X-ray Talbot interferometer.

The wavefront control element was manufactured by the method for manufacturing the wavefront control element according to the embodiment of the present invention. As the mold 11, a 10 mm square silicon thin plate having periodic irregularities formed in an 8 mm square region by Deep RIE was used. The mold 11 has a concave-convex period of 9 μm, a concave portion width of 4.5 μm on average, and a concave portion depth of about 45 μm. Further, as the particle dispersion liquid 13, 0.1 g of spherical gadolinium oxide particles having a diameter of 2 μm or less was used as the material particles 14 in 6 ml of water or ethanol. Centrifugal filling was performed at an ambient temperature of 4 ° C. and a rotation speed of 50,000 rpm for 1 hour.

A scanning electron microscope (SEM) photograph of the cross section of the mold 11 after centrifugation is shown in FIG. As shown in FIG. 5, the material particles 14 are spilled to some extent when the cross section is produced, but the recesses 11a are filled with the material particles 14, and a wavefront control element having a structure of about several μm is manufactured. It was confirmed that. The manufactured wavefront control element can be used, for example, as a G ₂ diffraction grating of a neutron Talbot interferometer.

11 type 11a recess 12 container 12a lid 13 particle dispersion 14 material particles

Claims (9)

A method for manufacturing a wavefront control element, which comprises using a mold having irregularities periodically and filling the recesses of the mold with material particles containing a metal element by centrifugal filling to manufacture a wavefront control element. The method for manufacturing a wavefront control element according to claim 1, wherein the centrifugal filling is performed at a rotation speed of 40,000 rpm or more. In the mold, the depth of the concave portion is 10 μm or more and 1000 μm or less, and the period of the unevenness is 100 nm or more and 100 μm or less.
The method for manufacturing a wavefront control element according to claim 1 or 2, wherein the material particles have a diameter of 5 nm or more and 10 μm or less and have a size capable of filling the recesses. The method for manufacturing a wavefront control element according to any one of claims 1 to 3, wherein sintering is performed after the centrifugal filling. The method for manufacturing a wavefront control element according to any one of claims 1 to 3, wherein the heat treatment is performed at a temperature equal to or higher than the melting point of the material particles after the centrifugal filling. The material particles are composed of alloy particles containing Gd or metal oxide particles containing Gd as a main component.
The wavefront control element, the manufacturing method of the wavefront control device according to any one of claims 1 to 5, characterized in that a diffraction grating G ₂ of the diffraction grating or neutron Talbot interferometer neutron interferometer .. The material particles are metal particles composed of Pt, Au, Ta, W, Re, Pb or Bi, alloy particles having Pt, Au, Ta, W, Re, Pb or Bi as main components, or Pt as main components. , Au, Ta, W, Re, Pb or Bi, composed of metal oxide particles having oxides.
The wavefront control element, the manufacture of the wavefront control device according to any one of claims 1 to 5, characterized in that a diffraction grating G ₂ of the diffraction grating or X-ray Talbot interferometer X-ray interferometer Method. The material particles are composed of Gd group, Sm group, Eu group, Dy group, Pt group, Au group, Pd group or Ni group metallic glass particles.
The wavefront control element is a diffraction grating of a neutron beam interferometer or an X-ray interferometer, or a G ₂ diffraction grating of a neutron Talbot interferometer or an X-ray Talbot interferometer. The method for manufacturing a wavefront control element according to any one item. The wavefront control element according to any one of claims 1 to 8, wherein a metallic glass ribbon is laid so as to cover the recess filled with the material particles after the centrifugal filling, and heat treatment is performed. Production method.

Images