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JP6970591B2 - Magnetic sensor and current sensor - Google Patents
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JP6970591B2 - Magnetic sensor and current sensor - Google Patents

Magnetic sensor and current sensor Download PDF

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JP6970591B2
JP6970591B2 JP2017218634A JP2017218634A JP6970591B2 JP 6970591 B2 JP6970591 B2 JP 6970591B2 JP 2017218634 A JP2017218634 A JP 2017218634A JP 2017218634 A JP2017218634 A JP 2017218634A JP 6970591 B2 JP6970591 B2 JP 6970591B2
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洋介 井出
光博 後藤
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Alps Alpine Co Ltd
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Description

本発明は、磁気センサおよび当該磁気センサを備えた電流センサに関する。 The present invention relates to a magnetic sensor and a current sensor including the magnetic sensor.

電気自動車やハイブリッドカーにおけるモータ駆動技術などの分野や、柱状トランスなどインフラ関連の分野では、比較的大きな電流が取り扱われるため、大電流を非接触で測定することが可能な電流センサが求められている。このような電流センサとしては、被測定電流からの誘導磁界を検出する磁気センサを用いたものが知られている。磁気センサ用の磁気検出素子として、例えば、GMR(巨大磁気抵抗効果)素子などの磁気抵抗効果素子が挙げられる。 In fields such as motor drive technology for electric vehicles and hybrid cars, and in infrastructure-related fields such as pole transformers, relatively large currents are handled, so there is a need for current sensors that can measure large currents in a non-contact manner. There is. As such a current sensor, one using a magnetic sensor that detects an induced magnetic field from a measured current is known. Examples of the magnetic detection element for a magnetic sensor include a magnetoresistive element such as a GMR (giant magnetoresistive effect) element.

磁気抵抗効果素子は、検出感度が高いものの、線形性高く検出可能な磁界強度範囲が比較的狭いという特徴がある。このため、特許文献1の図3に示される電流センサのように、被測定電流と磁気抵抗効果素子との間に磁気シールドを配置して、磁気抵抗効果素子に実質的に印加される誘導磁界の強度を小さくして、被測定磁界の大きさを良好な検出特性を有する磁界強度範囲内とする方法が用いられる場合がある。 Although the magnetoresistive sensor has high detection sensitivity, it is characterized by high linearity and a relatively narrow range of detectable magnetic field strength. Therefore, as in the current sensor shown in FIG. 3 of Patent Document 1, a magnetic shield is arranged between the measured current and the magnetoresistive sensor, and an induced magnetic field substantially applied to the magnetoresistive sensor. In some cases, a method of reducing the strength of the magnetic field to be measured so that the magnitude of the measured magnetic field is within the magnetic field strength range having good detection characteristics is used.

このように磁気シールドを用いることによって、磁気抵抗効果素子に実質的に印加される磁界の強度を低減させて、磁界強度の測定範囲を拡げることが実現されているが、磁気シールドが磁気的なヒステリシスの原因となる場合がある。特許文献2では、磁気シールド上にハードバイアス層を設けることによりこの時期的なヒステリシスを抑制し、磁気抵抗効果素子の出力の線形性を向上させることが実現されている。 By using the magnetic shield in this way, it is possible to substantially reduce the strength of the magnetic field applied to the magnetoresistive sensor and expand the measurement range of the magnetic field strength, but the magnetic shield is magnetic. It may cause hysteresis. In Patent Document 2, it is realized that by providing a hard bias layer on the magnetic shield, this temporal hysteresis is suppressed and the linearity of the output of the magnetoresistive sensor is improved.

国際公開第2011/111493号International Publication No. 2011/111493 国際公開第2011/155261号International Publication No. 2011/155261

磁気シールドに印加される磁場が数十mT程度と強い場合には、磁気シールドが軟磁性材料から構成されていても、磁気シールドに残留磁化が生じやすくなってしまう。こうして生じた磁気シールドの残留磁化に基づく磁界が磁気抵抗効果素子に印加されると、磁気抵抗効果素子のゼロ磁場ヒステリシスがマイナス側に大きくなるなどの磁気抵抗効果素子の測定精度に悪影響を与えてしまうおそれがある。 When the magnetic field applied to the magnetic shield is as strong as about several tens of mT, residual magnetization is likely to occur in the magnetic shield even if the magnetic shield is made of a soft magnetic material. When a magnetic field based on the residual magnetization of the magnetic shield generated in this way is applied to the magnetoresistive sensor, the zero magnetic field hysteresis of the magnetoresistive sensor increases to the negative side, which adversely affects the measurement accuracy of the magnetoresistive sensor. There is a risk that it will end up.

本発明は、かかる現状を鑑み、磁気シールドおよび磁気抵抗効果素子を備える磁気センサであって、磁気センサに印加される磁場が大きい場合であっても、磁気抵抗効果素子の測定精度が低下しにくい磁気センサを提供することを目的とする。本発明は、かかる磁気センサを備える電流センサを提供することをも目的とする。 In view of the present situation, the present invention is a magnetic sensor including a magnetic shield and a magnetoresistive sensor, and the measurement accuracy of the magnetoresistive sensor is unlikely to decrease even when the magnetic field applied to the magnetic sensor is large. It is intended to provide a magnetic sensor. It is also an object of the present invention to provide a current sensor including such a magnetic sensor.

上記の課題を解決するために提供される本発明は、一態様において、第1の方向に感度軸を持つ磁気抵抗効果素子と、前記磁気抵抗効果素子の上方に離間配置され、前記磁気抵抗効果素子に印加される被測定磁界の強度を減衰させる磁気シールドと、を備えた磁気センサであって、前記磁気シールドは、本体部と、前記第1の方向に突出する突出部とを有し、前記本体部は平面視で前記第1の方向に直交する第2の方向を長手とする形状を有し、前記突出部は前記本体部よりも厚さが薄い部分を有することを特徴とする磁気センサである。このような構成を備えることにより、磁気シールドの残留磁化に基づく磁界は突出部の先端から放出されるため、磁気シールドから放出され磁気抵抗効果素子に対して放出された向きとは反対向きに印加される磁界(還流磁界)の強度を低減させることができ、磁気抵抗効果素子のヒステリシスを少なくすることができる。 The present invention provided to solve the above-mentioned problems is, in one embodiment, a magnetoresistive effect element having a sensitivity axis in a first direction and a magnetoresistive effect element arranged above the magnetoresistive effect element. A magnetic sensor including a magnetic shield that attenuates the strength of a magnetic field to be measured applied to an element, wherein the magnetic shield has a main body portion and a protruding portion protruding in the first direction. The main body portion has a shape having a length in a second direction orthogonal to the first direction in a plan view, and the protruding portion has a portion thinner than the main body portion. It is a sensor. With such a configuration, since the magnetic field based on the residual magnetization of the magnetic shield is emitted from the tip of the protrusion, it is applied in the direction opposite to the direction emitted from the magnetic shield and emitted to the magnetoresistive sensor. The strength of the magnetic field (recirculation magnetic field) to be generated can be reduced, and the hysteresis of the magnetoresistive sensor can be reduced.

前記突出部は、前記磁気シールドの下端に位置することが、磁気抵抗効果素子のヒステリシスを効率的に少なくする観点から好ましい。 It is preferable that the protruding portion is located at the lower end of the magnetic shield from the viewpoint of efficiently reducing the hysteresis of the magnetoresistive sensor.

平面視で、前記磁気抵抗効果素子の全体が前記磁気シールドの前記本体部に重なることが、磁気抵抗効果素子のヒステリシスを効率的に少なくする観点から好ましい。 In a plan view, it is preferable that the entire magnetoresistive sensor overlaps with the main body of the magnetic shield from the viewpoint of efficiently reducing the hysteresis of the magnetoresistive sensor.

上記の磁気センサは、磁気平衡用コイルをさらに備え、前記磁気平衡用コイルに流れる電流に基づき前記被測定磁界の強度を測定するものであってもよい。この場合において、前記磁気平衡用コイルはスパイラルコイルであって、前記磁気抵抗効果素子と前記磁気シールドとの間に位置することが好ましい場合がある。 The magnetic sensor may further include a magnetic equilibrium coil and measure the strength of the magnetic field to be measured based on the current flowing through the magnetic equilibrium coil. In this case, the magnetic equilibrium coil is a spiral coil, and it may be preferable that the coil is located between the magnetoresistive sensor and the magnetic shield.

本発明は、他の一態様として、上記の磁気センサを備え、前記磁気センサは被測定電流の誘導磁界を前記被測定磁界とする電流センサを提供する。 As another aspect of the present invention, the magnetic sensor is provided, and the magnetic sensor provides a current sensor in which the induced magnetic field of the measured current is the measured magnetic field.

本発明によれば、印加磁場が大きく磁気シールドに残留磁化が生じる場合であっても、残留磁化に基づく還流磁界が磁気抵抗効果素子に与える影響が低減される。このため、磁気抵抗効果素子の測定精度が低下しにくい磁気センサが提供される。また、かかる磁気センサを用いてなる電流センサも提供される。 According to the present invention, even when the applied magnetic field is large and residual magnetization occurs in the magnetic shield, the influence of the recirculation magnetic field based on the residual magnetization on the magnetoresistive element is reduced. Therefore, a magnetic sensor is provided in which the measurement accuracy of the magnetoresistive effect element is unlikely to decrease. Further, a current sensor using such a magnetic sensor is also provided.

本発明の一実施形態に係る磁気センサの構造を概念的に示す平面図である。It is a top view which conceptually shows the structure of the magnetic sensor which concerns on one Embodiment of this invention. 図1のV1−V1線による断面図である。It is sectional drawing by V1-V1 line of FIG. 本発明の他の一実施形態に係る磁気センサの構造を概念的に示す平面図である。It is a top view which conceptually shows the structure of the magnetic sensor which concerns on another Embodiment of this invention. 図3のV2−V2線による断面図である。FIG. 3 is a cross-sectional view taken along the line V2-V2 of FIG. 磁気シールドとGMR素子との距離D1と、ゼロ磁場ヒステリシスZHとの関係を示すグラフである。It is a graph which shows the relationship between the distance D1 between a magnetic shield and a GMR element, and zero magnetic field hysteresis ZH.

図1は、本発明の一実施形態に係る磁気センサの構造を概念的に示す平面図である。図2は図1のV1−V1線での断面図である。 FIG. 1 is a plan view conceptually showing the structure of a magnetic sensor according to an embodiment of the present invention. FIG. 2 is a cross-sectional view taken along the line V1-V1 of FIG.

本発明の一実施形態に係る磁気センサ1は、図1および図2に示されるように、4つの磁気抵抗効果素子(磁気抵抗効果素子11から磁気抵抗効果素子14)および磁気シールド15を備える。 As shown in FIGS. 1 and 2, the magnetic sensor 1 according to an embodiment of the present invention includes four magnetoresistive elements (magnetoresistive elements 11 to 14) and a magnetic shield 15.

本発明の一実施形態に係る磁気センサ1の4つの磁気抵抗効果素子のそれぞれは、ミアンダ形状(X1−X2方向に延在する複数の長尺パターンが折り返すようにつながって構成される形状)を有する巨大磁気抵抗効果素子(GMR素子)を備える。各磁気抵抗効果素子(磁気抵抗効果素子11から磁気抵抗効果素子14)の感度軸方向Pは図1において矢印にて表され、磁気抵抗効果素子11および磁気抵抗効果素子14の感度軸方向P(第1の方向)はY1−Y2方向Y2側を向き、磁気抵抗効果素子12および磁気抵抗効果素子13の感度軸方向PはY1−Y2方向Y1側を向くように設定されている。 Each of the four magnetoresistive elements of the magnetic sensor 1 according to the embodiment of the present invention has a meander shape (a shape formed by connecting a plurality of long patterns extending in the X1-X2 direction so as to be folded back). It is equipped with a giant magnetoresistive effect element (GMR element). The sensitivity axial direction P of each magnetoresistive effect element (magnetic resistance effect element 11 to 14) is represented by an arrow in FIG. 1, and the sensitivity axial direction P of the magnetoresistive effect element 11 and the magnetoresistive element 14 ( The first direction) is set to face the Y2 side in the Y1-Y2 direction, and the sensitivity axial direction P of the magnetoresistive effect element 12 and the magnetoresistive sensor 13 is set to face the Y1 side in the Y1-Y2 direction.

入力端子5aに接続される配線5は磁気抵抗効果素子11の一端に接続され、磁気抵抗効果素子11の他端と磁気抵抗効果素子12の一端とが直列に接続されて、磁気抵抗効果素子12の他端が配線6を介してグランド端子6aに接続される。入力端子5aに接続される配線5は途中で分岐して磁気抵抗効果素子13の一端にも接続され、磁気抵抗効果素子13の他端と磁気抵抗効果素子14の一端とが直列に接続されて、磁気抵抗効果素子14の他端が配線6を介してグランド端子6aに接続される。第1の中点電位測定用端子7aは磁気抵抗効果素子11の他端と磁気抵抗効果素子12の一端との間に配線7により接続され、第2の中点電位測定用端子8aは磁気抵抗効果素子13の他端と磁気抵抗効果素子14の一端との間に配線8により接続される。第1の中点電位測定用端子7aの電位と第2の中点電位測定用端子8aの電位とを対比することにより、電流線40を流れる被測定電流Ioの誘導磁界(被測定磁界)の強度および向きを測定することができる。 The wiring 5 connected to the input terminal 5a is connected to one end of the magnetoresistive element 11, and the other end of the magnetoresistive element 11 and one end of the magnetoresistive element 12 are connected in series to form the magnetoresistive element 12. The other end of the is connected to the ground terminal 6a via the wiring 6. The wiring 5 connected to the input terminal 5a branches in the middle and is also connected to one end of the magnetoresistive sensor 13, and the other end of the magnetoresistive element 13 and one end of the magnetoresistive element 14 are connected in series. The other end of the magnetoresistive sensor 14 is connected to the ground terminal 6a via the wiring 6. The first midpoint potential measuring terminal 7a is connected by a wiring 7 between the other end of the magnetoresistive effect element 11 and one end of the magnetoresistive effect element 12, and the second midpoint potential measuring terminal 8a is a magnetic resistance. It is connected by a wiring 8 between the other end of the effect element 13 and one end of the magnetoresistive effect element 14. By comparing the potential of the first midpoint potential measuring terminal 7a with the potential of the second midpoint potential measuring terminal 8a, the induced magnetic field (measured magnetic field) of the measured current Io flowing through the current line 40 The strength and orientation can be measured.

図2は、磁気抵抗効果素子11のミアンダ形状を構成する複数の長尺パターンの長軸方向(X1−X2方向)に沿った方向を法線とする面で磁気センサ1を切断して得られる断面図である。この断面内方向の1つであるY1−Y2方向(第1の方向)が磁気抵抗効果素子11の感度軸方向P(Y1−Y2方向Y2側の向き)である。磁気抵抗効果素子11は、基板29上に形成され、絶縁材料(アルミナ、窒化ケイ素などが具体例として挙げられる。)からなる絶縁層IMによって覆われている。 FIG. 2 is obtained by cutting the magnetic sensor 1 at a plane whose normal is the direction along the long axis direction (X1-X2 direction) of a plurality of long patterns constituting the meander shape of the magnetoresistive effect element 11. It is a cross-sectional view. The Y1-Y2 direction (first direction), which is one of the inward directions in the cross section, is the sensitivity axial direction P (direction toward Y2 in the Y1-Y2 direction) of the magnetoresistive effect element 11. The magnetoresistive element 11 is formed on the substrate 29 and is covered with an insulating layer IM made of an insulating material (alumina, silicon nitride or the like is a specific example).

磁気シールド15は、磁気抵抗効果素子11の上(Z1−Z2方向Z1側)に磁気抵抗効果素子11から離間して配置される。磁気シールド15と磁気抵抗効果素子11との離間距離は、間に位置する絶縁層IMの厚さによって調整される。 The magnetic shield 15 is arranged on the magnetoresistive effect element 11 (Z1 side in the Z1-Z2 direction) at a distance from the magnetoresistive sensor 11. The separation distance between the magnetic shield 15 and the magnetoresistive sensor 11 is adjusted by the thickness of the insulating layer IM located between them.

本発明の一実施形態に係る磁気センサ1では、磁気シールド15は磁気抵抗効果素子(磁気抵抗効果素子11から磁気抵抗効果素子14)に印加される被測定磁界の強度を減衰させるものであって、図1に示されるように、平面視で(Z1−Z2方向からみて)、第1の方向(Y1−Y2方向)に直交する第2方向(X1−X2方向)を長手とする矩形を有する本体部150と、本体部150から少なくとも第1の方向(Y1−Y2方向)に突出する突出部15Pを有する。突出部15Pは、図2に示されるように、本体部150よりも厚さが薄い部分を有し、磁気シールド15の下端(Z1−Z2方向Z2側の端部)に位置する。 In the magnetic sensor 1 according to the embodiment of the present invention, the magnetic shield 15 attenuates the strength of the measured magnetic field applied to the magnetoresistive effect element (magnetoresistive element 11 to 14). As shown in FIG. 1, it has a rectangular shape having a second direction (X1-X2 direction) orthogonal to the first direction (Y1-Y2 direction) in a plan view (viewed from the Z1-Z2 direction). It has a main body portion 150 and a protruding portion 15P protruding from the main body portion 150 in at least a first direction (Y1-Y2 direction). As shown in FIG. 2, the protruding portion 15P has a portion thinner than the main body portion 150, and is located at the lower end of the magnetic shield 15 (the end portion on the Z2 side in the Z1-Z2 direction).

このような構造は、具体的には、前記磁気シールドの下端(Z1−Z2方向Z2側端部)に位置し軟磁性体からなる下地層151と、下地層151の上(Z1−Z2方向Z1側)に形成された軟磁性層152とを有する構造により実現されている。下地層151における上側(Z1−Z2方向Z1側)に軟磁性層152が形成されていない部分が突出部15Pとなっており、この突出部15Pは、Z1−Z2方向からみて磁気抵抗効果素子11よりもY1−Y2方向の外側に突出した状態に位置している。磁気センサ1では、図2に示されるように、突出部15Pは磁気シールド15のY1−Y2方向の両側に設けられている。 Specifically, such a structure is located at the lower end of the magnetic shield (Z1-Z2 direction Z2 side end) and is formed on the base layer 151 made of a soft magnetic material and above the base layer 151 (Z1-Z2 direction Z1). It is realized by a structure having a soft magnetic layer 152 formed on the side). The portion of the base layer 151 on which the soft magnetic layer 152 is not formed on the upper side (Z1 side in the Z1-Z2 direction) is the protruding portion 15P, and the protruding portion 15P is the magnetoresistive effect element 11 when viewed from the Z1-Z2 direction. It is located in a state of protruding outward in the Y1-Y2 direction. In the magnetic sensor 1, as shown in FIG. 2, the protrusions 15P are provided on both sides of the magnetic shield 15 in the Y1-Y2 direction.

本体部150は、第2方向(X1−X2方向)を長手とするため、短手である第1の方向(Y1−Y2方向)には、形状磁気異方性効果により磁化しにくいが、外部磁場が強い場合には、図2に示されるように第1の方向(Y1−Y2方向)に残留磁化M0が生じる場合がある。このような場合であっても、このように突出部15Pを設けることにより、磁気シールド15の残留磁化M0に基づく磁界は、主に、この突出部15Pの先端PEから磁気シールド15外に放出される。その結果、磁気シールド15の残留磁化M0に基づく磁界であって、残留磁化M0の向きとは反対向きに磁気抵抗効果素子11に印加される磁界(還流磁界RM0)の強度が相対的に低くなって、磁気抵抗効果素子11のゼロ磁場ヒステリシスZHが小さくなる。それゆえ、磁気シールド15が突出部15Pを有しない場合に比べて、磁気抵抗効果素子11を備える磁気センサ1の測定精度が向上する。 Since the main body 150 has a second direction (X1-X2 direction) as a longitudinal direction, it is difficult to magnetize in the first direction (Y1-Y2 direction), which is short, due to the shape magnetic anisotropy effect, but it is external. When the magnetic field is strong, residual magnetization M0 may occur in the first direction (Y1-Y2 direction) as shown in FIG. Even in such a case, by providing the protruding portion 15P in this way, the magnetic field based on the residual magnetization M0 of the magnetic shield 15 is mainly emitted from the tip PE of the protruding portion 15P to the outside of the magnetic shield 15. NS. As a result, the strength of the magnetic field (refluxing magnetic field RM0) applied to the magnetoresistive sensor 11 in the direction opposite to the direction of the residual magnetization M0, which is the magnetic field based on the residual magnetization M0 of the magnetic shield 15, becomes relatively low. Therefore, the zero magnetic field hysteresis ZH of the magnetoresistive effect element 11 becomes small. Therefore, the measurement accuracy of the magnetic sensor 1 provided with the magnetoresistive effect element 11 is improved as compared with the case where the magnetic shield 15 does not have the protruding portion 15P.

突出部15Pは、図2に示されるように、磁気シールド15の下端(Z1−Z2方向Z2側端部)に位置することが好ましい。このような構成を備える場合には、磁気シールド15のY1−Y2方向Y2側から磁気シールド15の残留磁化M0に基づく磁界が放出される際に、Y1−Y2方向Y1側に周回する成分は全てZ1−Z2方向からみて磁気抵抗効果素子11のY1−Y2方向の端部の外側の位置する突出部15Pの先端15PEから放出されることになる。したがって、磁気シールド15の先端PEから放出される残留磁化M0は、磁気センサ1をZ1−Z2方向からみた時に磁気抵抗効果素子11の端部のより遠い位置から放出されることとなるため、磁気シールド15の残留磁化M0に基づく磁界(還流磁界RM0)の磁気抵抗効果素子11への印加強度をより弱めた状態にすることができる。 As shown in FIG. 2, the protruding portion 15P is preferably located at the lower end (Z2 side end portion in the Z1-Z2 direction) of the magnetic shield 15. When such a configuration is provided, when the magnetic field based on the residual magnetization M0 of the magnetic shield 15 is emitted from the Y1 side in the Y1-Y2 direction of the magnetic shield 15, all the components circulating in the Y1 side in the Y1-Y2 direction are all. It is emitted from the tip 15PE of the protruding portion 15P located outside the end portion in the Y1-Y2 direction of the magnetoresistive effect element 11 when viewed from the Z1-Z2 direction. Therefore, the residual magnetization M0 emitted from the tip PE of the magnetic shield 15 is emitted from a position farther from the end of the magnetoresistive effect element 11 when the magnetic sensor 1 is viewed from the Z1-Z2 direction. The strength of application of the magnetic field (refluxing magnetic field RM0) based on the residual magnetization M0 of the shield 15 to the magnetoresistive sensor 11 can be made weaker.

平面視で(Z1−Z2方向からみて)、磁気抵抗効果素子11の全体が磁気シールド15に重なることが好ましく、磁気シールド15の本体部150に重なることがより好ましい。この場合には、磁気シールド15の残留磁化M0に基づく磁界(還流磁界RM0)の放出部である突出部15Pの先端15PEと磁気抵抗効果素子11のX1−X2方向(第1の方向)の離間距離を適切に確保することができ、磁気抵抗効果素子11に印加される還流磁界RM0の強度を安定的に低減させることができる。 In a plan view (viewed from the Z1-Z2 direction), it is preferable that the entire magnetoresistive element 11 overlaps the magnetic shield 15, and more preferably it overlaps the main body 150 of the magnetic shield 15. In this case, the distance between the tip 15PE of the protrusion 15P, which is the emission part of the magnetic field (recirculation magnetic field RM0) based on the residual magnetization M0 of the magnetic shield 15, and the X1-X2 direction (first direction) of the magnetoresistive element 11. The distance can be appropriately secured, and the strength of the recirculation magnetic field RM0 applied to the magnetoresistive effect element 11 can be stably reduced.

下地層151および軟磁性層152はFe,Co,Niなど鉄族元素を含む軟磁性材料から構成される。下地層151の厚さは突出部15Pが磁気シールド15の残留磁化M0に基づく磁界の放出部として機能する範囲で任意に設定される。下地層151の厚さの限定されない例として、10nm以上1μm以下が挙げられる。下地層151の厚さは、20nm以上500nm以下が好ましい場合があり、50nm以上200nm以下がより好ましい場合がある。軟磁性層152の厚さは、磁気シールド15が所定の磁気遮蔽機能を有する範囲で任意に設定される。軟磁性層152の厚さの限定されない例として、1μm以上50μm以下が挙げられ、軟磁性層152の厚さは、5μm以上30μm以下が好ましい場合があり、10μm以上25μm以下がより好ましい場合がある。突出部15Pを構成する下地層151の厚さ(Z1−Z2方向長さ)は、次に説明するように磁気シールド15の実質的なアスペクト比を高める観点、および突出部15Pから磁気シールド15の残留磁化M0に基づく磁界が効率的に放出される観点から、軟磁性層152の厚さの3%以下であることが好ましく、1%以下であることがより好ましい。 The base layer 151 and the soft magnetic layer 152 are made of a soft magnetic material containing iron group elements such as Fe, Co, and Ni. The thickness of the base layer 151 is arbitrarily set within a range in which the protrusion 15P functions as a magnetic field emitting portion based on the residual magnetization M0 of the magnetic shield 15. An example in which the thickness of the base layer 151 is not limited is 10 nm or more and 1 μm or less. The thickness of the base layer 151 may be preferably 20 nm or more and 500 nm or less, and more preferably 50 nm or more and 200 nm or less. The thickness of the soft magnetic layer 152 is arbitrarily set within a range in which the magnetic shield 15 has a predetermined magnetic shielding function. An example in which the thickness of the soft magnetic layer 152 is not limited is 1 μm or more and 50 μm or less, and the thickness of the soft magnetic layer 152 may be preferably 5 μm or more and 30 μm or less, and more preferably 10 μm or more and 25 μm or less. .. The thickness (Z1-Z2 direction length) of the base layer 151 constituting the projecting portion 15P is determined from the viewpoint of increasing the substantial aspect ratio of the magnetic shield 15 as described below, and from the projecting portion 15P to the magnetic shield 15. From the viewpoint that the magnetic field based on the residual magnetization M0 is efficiently emitted, the thickness is preferably 3% or less, more preferably 1% or less of the thickness of the soft magnetic layer 152.

上記のように軟磁性層152に比べて下地層151の厚さが十分に薄い場合には、磁気シールド15において異方性磁界Hkを発生させる部分は、実質的に本体部150のみとなる。このため、異方性磁界Hkの程度に影響を及ぼす磁気シールド15の実質的なアスペクト比は、本体部150の長手方向(X1−X2方向)の長さの短手方向(Y1−Y2方向)の長さに対する比となる。磁気シールド15の実質的なアスペクト比が大きくなることにより、磁気シールド15の異方性磁界Hkを大きくなり、磁気シールド15の磁気センサ1の感度軸方向において、磁化曲線の線形領域をより大きくできる。その結果、磁気センサ1の出力の線形領域が大きくなって、磁気センサ1のダイナミックレンジをより拡げることが可能となる。 When the thickness of the base layer 151 is sufficiently thinner than that of the soft magnetic layer 152 as described above, the portion of the magnetic shield 15 that generates the anisotropic magnetic field Hk is substantially only the main body portion 150. Therefore, the substantial aspect ratio of the magnetic shield 15 that affects the degree of the anisotropic magnetic field Hk is the lateral direction (Y1-Y2 direction) of the length in the longitudinal direction (X1-X2 direction) of the main body 150. It is the ratio to the length of. By increasing the substantial aspect ratio of the magnetic shield 15, the anisotropic magnetic field Hk of the magnetic shield 15 can be increased, and the linear region of the magnetization curve can be made larger in the sensitivity axis direction of the magnetic sensor 1 of the magnetic shield 15. .. As a result, the linear region of the output of the magnetic sensor 1 becomes large, and the dynamic range of the magnetic sensor 1 can be further expanded.

前述のように、磁気センサ1をZ1−Z2方向からみたときに、磁気シールド15の端部は磁気抵抗効果素子11の端部から遠いことが好ましいが、この要請を満たすべく本体部150のY1−Y2方向の長さを伸ばすと、磁気シールド15の実質的なアスペクト比が低下して、磁気シールドの異方性磁界Hkが低減してしまう。そこで、上記のように、本体部150からY1−Y2方向に延びる突出部15Pの厚さを薄くすることにより、磁気シールド15の実質的なアスペクト比を低下させることなく、磁気シールド15の端部(突出部15Pの先端15PE)を磁気抵抗効果素子11の端部から遠くに位置させることが可能となる。このように、磁気シールド15において突出部15Pの厚さを薄くすることにより、磁気シールド15の異方性磁界Hkを大きくすることと、磁気抵抗効果素子11に印加される還流磁界RM0の強度を低下させることとを両立させることが可能となる。これにより、磁気センサ1に外部から強磁場が付与されたりして磁気シールド15に残留磁場が生じても、この残留磁場によって生じる還流磁場の影響を低減し、磁気センサ1の出力のヒステリシスも低減することができるとともに、ダイナミックレンジも大きく維持できる。結果、磁気抵抗効果素子11に磁気シールド15を近接させ、被測定磁界の遮蔽効果を増大させて、磁気センサ1のヒステリシスを増大させること無く磁気センサ1のダイナミックレンジをさらに増大させることも期待できる。 As described above, when the magnetic sensor 1 is viewed from the Z1-Z2 direction, it is preferable that the end portion of the magnetic shield 15 is far from the end portion of the magnetoresistive effect element 11. If the length in the −Y2 direction is extended, the substantial aspect ratio of the magnetic shield 15 is lowered, and the anisotropic magnetic field Hk of the magnetic shield is reduced. Therefore, as described above, by reducing the thickness of the protruding portion 15P extending from the main body portion 150 in the Y1-Y2 direction, the end portion of the magnetic shield 15 is not lowered in the substantial aspect ratio of the magnetic shield 15. (The tip 15PE of the protruding portion 15P) can be positioned far from the end portion of the magnetoresistive effect element 11. In this way, by reducing the thickness of the protruding portion 15P in the magnetic shield 15, the anisotropic magnetic field Hk of the magnetic shield 15 is increased, and the strength of the recirculation magnetic field RM0 applied to the magnetoresistive element 11 is increased. It is possible to achieve both reduction and reduction. As a result, even if a strong magnetic field is applied to the magnetic sensor 1 from the outside and a residual magnetic field is generated in the magnetic shield 15, the influence of the recirculation magnetic field generated by the residual magnetic field is reduced, and the hysteresis of the output of the magnetic sensor 1 is also reduced. At the same time, the dynamic range can be maintained large. As a result, it can be expected that the magnetic shield 15 is brought close to the magnetoresistive effect element 11 to increase the shielding effect of the magnetic field to be measured, and the dynamic range of the magnetic sensor 1 is further increased without increasing the hysteresis of the magnetic sensor 1. ..

なお、図1に示される磁気シールド15には、タンタル(Ta)などからなる酸化保護層PLが軟磁性層152の上(Z1−Z2方向Z1側)にさらに形成されている。 In the magnetic shield 15 shown in FIG. 1, an oxidation protection layer PL made of tantalum (Ta) or the like is further formed on the soft magnetic layer 152 (Z1-Z2 direction Z1 side).

磁気シールド15の製造方法は任意である。限定されない一例として、スパッタリングなどのドライプロセス、無電解めっきなどのウェットプロセスによって下地層151を形成し、この下地層151の上に所定の形状にパターニングされたレジスト層を形成した後、露出する下地層151を導電層として軟磁性層152を電気めっきにより形成することが挙げられる。この場合において、下地層151を導電層として形成する際には特段のパターニングを行わず、電気めっきで軟磁性層152を形成した後、エッチングなどによって下地層151を適切に除去することにより、効率的に磁気シールド15を製造することができる。このような製造方法において、下地層151を軟磁性層152と平面視で(Z1−Z2方向からみて)同形状にエッチングするのではなく、突出部15Pを有するように除去加工すれば、本発明の一実施形態に係る磁気センサ1の磁気シールド15を特に効率的に形成することができる。 The method of manufacturing the magnetic shield 15 is arbitrary. As an example without limitation, the base layer 151 is formed by a dry process such as sputtering or a wet process such as electroplating, and a resist layer patterned in a predetermined shape is formed on the base layer 151 and then exposed. The soft magnetic layer 152 may be formed by electroplating with the stratum 151 as a conductive layer. In this case, when the base layer 151 is formed as the conductive layer, no special patterning is performed, and after the soft magnetic layer 152 is formed by electroplating, the base layer 151 is appropriately removed by etching or the like for efficiency. The magnetic shield 15 can be manufactured. In such a manufacturing method, the underlying layer 151 is not etched into the same shape as the soft magnetic layer 152 in a plan view (viewed from the Z1-Z2 direction), but is removed so as to have a protruding portion 15P. The magnetic shield 15 of the magnetic sensor 1 according to the embodiment can be formed particularly efficiently.

図3は、本発明の他の一実施形態に係る磁気センサの構造を概念的に示す平面図である。図4は図3のV2−V2断面図である。図3および図4に示される磁気センサ1Aは、図1に示される磁気センサ1と同様に磁気抵抗効果素子11および磁気シールド15を備え、さらに磁気抵抗効果素子11と磁気シールド15との間にスパイラル形状を有する磁気平衡用コイル(スパイラルコイル)16を備える。図3では、磁気平衡用コイル16の外形が太い破線にて示されている。この破線で示される領域のX−Y平面内を周回するようにコイル配線が配置される。図4では、磁気平衡用コイル16における周回する複数のコイル配線の断面がY1−Y2方向に並んで示されている。磁気平衡用コイル16は、磁気抵抗効果素子11と磁気シールド15との間に位置することにより、磁気シールド15により減衰した状態で印加される外部磁場をキャンセルするような誘導磁界を比較的小電流により生じさせることが可能となる。このため、磁気平衡式の磁気センサを省電力で動作させることが可能である。 FIG. 3 is a plan view conceptually showing the structure of the magnetic sensor according to another embodiment of the present invention. FIG. 4 is a cross-sectional view taken along the line V2-V2 of FIG. The magnetic sensor 1A shown in FIGS. 3 and 4 includes a magnetoresistive effect element 11 and a magnetic shield 15 similar to the magnetic sensor 1 shown in FIG. 1, and further, between the magnetoresistive effect element 11 and the magnetic shield 15. A magnetic equilibrium coil (spiral coil) 16 having a spiral shape is provided. In FIG. 3, the outer shape of the magnetic equilibrium coil 16 is shown by a thick broken line. The coil wiring is arranged so as to orbit in the XY plane of the region indicated by the broken line. In FIG. 4, the cross sections of the plurality of rotating coil wirings in the magnetic equilibrium coil 16 are shown side by side in the Y1-Y2 directions. The magnetic equilibrium coil 16 is located between the magnetoresistive effect element 11 and the magnetic shield 15, so that an induced magnetic field that cancels an external magnetic field applied in a state of being attenuated by the magnetic shield 15 is generated with a relatively small current. Can be caused by. Therefore, it is possible to operate the magnetically balanced magnetic sensor with low power consumption.

以上の実施形態では、磁気センサ1,1Aが備える磁気抵抗効果素子11から磁気抵抗効果素子14がGMR素子からなる場合を具体例としているが、これに限定されない。限定されない一例において、磁気抵抗効果素子は、異方性磁気抵抗効果素子(AMR素子)、巨大磁気抵抗効果素子(GMR素子)およびトンネル磁気抵抗効果素子(TMR素子)からなる群から選ばれる1種以上の素子からなる。 In the above embodiment, the case where the magnetoresistive effect element 14 to the magnetic resistance effect element 11 included in the magnetic sensors 1 and 1A is composed of a GMR element is taken as a specific example, but the present invention is not limited to this. In one example without limitation, the magnetoresistive element is one selected from the group consisting of an anisotropic magnetoresistive element (AMR element), a giant magnetoresistive element (GMR element), and a tunnel magnetoresistive element (TMR element). It consists of the above elements.

なお、磁気センサ1が備える磁気抵抗効果素子11から磁気抵抗効果素子14を構成するそれぞれのGMR素子の固定層がセルフピン構造を有する場合には、固定層の磁化は磁場中成膜によって行うことができ、成膜後に磁場中の加熱処理が必要とされない。このため、同一基板上に固定層の磁化の向きが異なるGMR素子を配置でき、一基板上にフルブリッジ回路を構成することが可能となる。 When the fixed layer of each GMR element constituting the magnetic resistance effect element 11 to the magnetic resistance effect element 14 included in the magnetic sensor 1 has a self-pin structure, the fixation of the fixed layer may be performed by film formation in a magnetic field. It can be formed and does not require heat treatment in a magnetic field after film formation. Therefore, GMR elements having different magnetization directions of the fixed layer can be arranged on the same substrate, and a full bridge circuit can be configured on one substrate.

本発明の一実施形態に係る磁気抵抗効果素子を備えた磁気センサ1,1Aは、電流センサとして好適に使用されうる。 The magnetic sensors 1, 1A provided with the magnetoresistive element according to the embodiment of the present invention can be suitably used as a current sensor.

本発明の一実施形態に係る電流センサの具体例として、磁気比例式電流センサおよび磁気平衡式電流センサが挙げられる。 Specific examples of the current sensor according to the embodiment of the present invention include a magnetically proportional current sensor and a magnetically balanced current sensor.

磁気比例式電流センサの具体例は、図1および図2に示される磁気センサ1を用いる場合であり、かかる電流センサでは、図2の上方(Z1−Z2方向Z1側)において、被測定電流Ioが流れる電流線40がX1−X2方向に延びるように位置する(図1参照)。被測定磁界となる被測定電流Ioの誘導磁界は、磁気抵抗効果素子11に対して感度軸方向P(Y1−Y2方向)に沿った方向に印加される。被測定磁界の一部はより透磁率の高い磁気シールド15を通るため、磁気抵抗効果素子11に実質的に印加される被測定磁界の強度を低減させることができる。それゆえ、磁気センサ1の測定範囲を拡げることが可能となる。しかも、磁気シールド15は突出部15Pを有するため、磁気シールド15の残留磁化M0に基づく還流磁界RM0が磁気抵抗効果素子11に与える影響が抑制される。 A specific example of the magnetic proportional current sensor is the case where the magnetic sensor 1 shown in FIGS. 1 and 2 is used. In such a current sensor, the measured current Io is located above FIG. 2 (Z1 side in the Z1-Z2 direction). The current line 40 through which the current flows is located so as to extend in the X1-X2 direction (see FIG. 1). The induced magnetic field of the measured current Io, which is the measured magnetic field, is applied to the magnetoresistive element 11 in the direction along the sensitivity axial direction P (Y1-Y2 direction). Since a part of the magnetic field to be measured passes through the magnetic shield 15 having a higher magnetic permeability, the strength of the magnetic field to be measured substantially applied to the magnetoresistive sensor 11 can be reduced. Therefore, it is possible to expand the measurement range of the magnetic sensor 1. Moreover, since the magnetic shield 15 has the protruding portion 15P, the influence of the recirculation magnetic field RM0 based on the residual magnetization M0 of the magnetic shield 15 on the magnetoresistive effect element 11 is suppressed.

好ましい一例において、磁気比例式電流センサ1は、4つの磁気抵抗効果素子(磁気抵抗効果素子11から磁気抵抗効果素子14)を備え、被測定電流Ioの誘導磁界からなる被測定磁界に応じた電位差を生じる2つの出力を備える磁界検出ブリッジ回路を有する(図1参照)。このブリッジ回路を有する磁気比例式電流センサ1では、被測定磁界に応じて磁界検出ブリッジ回路から出力される電位差により、被測定電流Ioが測定される。 In a preferred example, the magnetic proportional current sensor 1 includes four magnetoresistive effect elements (magnetoresistive element 11 to 14), and has a potential difference according to a measured magnetic field composed of an induced magnetic field of the measured current Io. Has a magnetic field detection bridge circuit with two outputs to produce (see FIG. 1). In the magnetic proportional current sensor 1 having this bridge circuit, the measured current Io is measured by the potential difference output from the magnetic field detection bridge circuit according to the measured magnetic field.

磁気平衡式電流センサの具体例は、図3および図4に示される磁気センサ1Aを用いる場合であり、かかる電流センサでは、図4の上方(Z1−Z2方向Z1側)において、被測定電流Ioが流れる電流線40がX1−X2方向に延びるように位置する。被測定磁界である被測定電流Ioの誘導磁界は、磁気抵抗効果素子11に対して感度軸方向P(Y1−Y2方向)に沿った方向に印加される。被測定磁界の一部はより透磁率の高い磁気シールド15を通るため、磁気抵抗効果素子11に実質的に印加される被測定磁界の強度を低減させることができる。それゆえ、磁気抵抗効果素子11に実質的に印加される被測定電流Ioによる磁界をキャンセルするような誘導磁界を発生させるべく磁気平衡用コイル16に流される電流量を少なくすることができ、電流センサの省電力化が実現される。しかも、磁気シールド15は突出部15Pを有するため、磁気シールド15の残留磁化M0に基づく還流磁界RM0が磁気抵抗効果素子11に与える影響が抑制される。 A specific example of the magnetically balanced current sensor is the case where the magnetic sensor 1A shown in FIGS. 3 and 4 is used. In such a current sensor, the measured current Io is located above FIG. 4 (Z1 side in the Z1-Z2 direction). The current line 40 through which the current flows is located so as to extend in the X1-X2 direction. The induced magnetic field of the measured current Io, which is the measured magnetic field, is applied to the magnetoresistive effect element 11 in the direction along the sensitivity axial direction P (Y1-Y2 direction). Since a part of the magnetic field to be measured passes through the magnetic shield 15 having a higher magnetic permeability, the strength of the magnetic field to be measured substantially applied to the magnetoresistive sensor 11 can be reduced. Therefore, the amount of current flowing through the magnetic equilibrium coil 16 can be reduced in order to generate an induced magnetic field that cancels the magnetic field due to the measured current Io substantially applied to the magnetoresistive effect element 11, and the current can be reduced. Power saving of the sensor is realized. Moreover, since the magnetic shield 15 has the protruding portion 15P, the influence of the recirculation magnetic field RM0 based on the residual magnetization M0 of the magnetic shield 15 on the magnetoresistive effect element 11 is suppressed.

好ましい一例において、磁気平衡式電流センサは、4つの磁気抵抗効果素子(磁気抵抗効果素子11から磁気抵抗効果素子14)を備え、被測定電流Ioからの誘導磁界からなる被測定磁界およびこの被測定磁界をキャンセルするように印加された磁気平衡用コイル16からの誘導磁界に応じた電位差を生じる2つの出力を備える磁界検出ブリッジ回路を有する(図3参照)。このブリッジ回路を有する磁気平衡式電流センサでは、磁界検出ブリッジ回路から出力される電位差がゼロとなったときに磁気平衡用コイル16に流れる電流に基づいて、被測定電流Ioが測定される。 In a preferred example, the magnetically balanced current sensor comprises four magnetic resistance effect elements (magnetic resistance effect element 11 to 14), and is a measured magnetic field composed of an induced magnetic field from the measured current Io and the measured magnetic field. It has a magnetic field detection bridge circuit with two outputs that produce a potential difference depending on the induced magnetic field from the magnetic equilibrium coil 16 applied to cancel the magnetic field (see FIG. 3). In the magnetic balance type current sensor having this bridge circuit, the measured current Io is measured based on the current flowing through the magnetic balance coil 16 when the potential difference output from the magnetic field detection bridge circuit becomes zero.

以上説明した実施形態は、本発明の理解を容易にするために記載されたものであって、本発明を限定するために記載されたものではない。したがって、上記実施形態に開示された各要素は、本発明の技術的範囲に属する全ての設計変更や均等物をも含む趣旨である。例えば、突出部15Pは下地層151のみにより構成されていなくてもよい。磁気抵抗効果素子11に近位になる(Z1−Z2方向Z2側)ほど、軟磁性層152の第1の方向(Y1−Y2方向)の長さが長くなるようなテーパ構造を有していてもよい。 The embodiments described above are described for facilitating the understanding of the present invention, and are not described for limiting the present invention. Therefore, each element disclosed in the above embodiment is intended to include all design changes and equivalents belonging to the technical scope of the present invention. For example, the protruding portion 15P does not have to be composed of only the base layer 151. It has a tapered structure in which the length of the soft magnetic layer 152 in the first direction (Y1-Y2 direction) becomes longer as it becomes proximal to the magnetoresistive element 11 (Z1-Z2 direction Z2 side). May be good.

以下、実施例等により本発明をさらに具体的に説明するが、本発明の範囲はこれらの実施例等に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples and the like, but the scope of the present invention is not limited to these Examples and the like.

(実施例1)
図2に示される断面構造と同様の構造を有する磁気平衡式の磁気センサを作製した。磁気抵抗効果素子はGMR素子であった。磁気シールドは、平面形状が800μm×200μmであってNiFeからなり厚さ100nmの下地層をスパッタリングにより形成し、その上に800μm×140μmであってNiFeからなり厚さ16.5μmの軟磁性層を電気めっきにより積層し、さらにTaからなり厚さ10nmの酸化保護層をスパッタリングにより形成した。その結果、平面視で(Z1−Z2方向からみて)本体部のY1−Y2方向の両側から30μmの突出部が位置する形状を有する磁気シールドが得られた。磁気センサを製造する過程で磁気シールとコイルとの間の距離(Y1−Y2方向の距離)を変更することにより、磁気シールドとGMR素子との間の距離(Y1−Y2方向の距離)D1が約8μmから約11.5μmの範囲にある異なる磁気センサを複数作製した。
(Example 1)
A magnetic balance type magnetic sensor having a structure similar to the cross-sectional structure shown in FIG. 2 was manufactured. The magnetoresistive element was a GMR element. The magnetic shield has a planar shape of 800 μm × 200 μm and is made of NiFe, and a base layer having a thickness of 100 nm is formed by sputtering. It was laminated by electroplating, and an oxidation protective layer made of Ta and having a thickness of 10 nm was formed by sputtering. As a result, a magnetic shield having a shape in which protrusions of 30 μm are located from both sides of the main body in the Y1-Y2 direction (when viewed from the Z1-Z2 direction) in a plan view was obtained. By changing the distance between the magnetic seal and the coil (distance in the Y1-Y2 direction) in the process of manufacturing the magnetic sensor, the distance D1 between the magnetic shield and the GMR element (distance in the Y1-Y2 direction) can be increased. Multiple different magnetic sensors in the range of about 8 μm to about 11.5 μm were made.

(比較例1)
実施例1と同様の構造であるが、磁気シールドが突出部を有しない形状である磁気センサを作製した。
(Comparative Example 1)
A magnetic sensor having the same structure as that of the first embodiment but having a shape in which the magnetic shield does not have a protruding portion was manufactured.

(測定例1)ゼロ磁場ヒステリシスの測定
実施例により作製した磁気センサおよび比較例により作製した磁気センサのそれぞれについて、印加する外部磁場の最大強度(最大印加磁場)を±18mTとして外部磁場を変化させながらヒステリシスループを測定した。このヒステリシスループから、ゼロ磁場ヒステリシスZH(単位:%/FS)を測定した。ゼロ磁場ヒステリシスZHは、フルブリッジ出力曲線における出力の最大値(正の最大磁場を印加したときの値−負の最大磁場を印加したときの値)に対するゼロ磁場における出力の大きさ(正の最大磁場の印加から印加磁場ゼロまで変化させたときの値−負の最大磁場の印加から印加磁場ゼロまで変化させたときの値)の割合(単位:%)である。測定結果を図5に示す。
(Measurement Example 1) Measurement of zero magnetic field hysteresis The external magnetic field is changed by setting the maximum strength (maximum applied magnetic field) of the applied external magnetic field to ± 18 mT for each of the magnetic sensor manufactured by the example and the magnetic sensor manufactured by the comparative example. While measuring the hysteresis loop. From this hysteresis loop, zero magnetic field hysteresis ZH (unit:% / FS) was measured. Zero magnetic field hysteresis ZH is the magnitude of the output at zero magnetic field (positive maximum) with respect to the maximum value of the output in the full bridge output curve (value when positive maximum magnetic field is applied-value when negative maximum magnetic field is applied). It is the ratio (unit:%) of the value when the magnetic field is applied to the applied magnetic field of zero-the value when the negative maximum magnetic field is applied to the applied magnetic field of zero. The measurement results are shown in FIG.

図5に示されるように、比較例に係る磁気センサでは、ゼロ磁場ヒステリシスZHは、+0.05%から−0.2%の範囲となった。距離D1が小さいとき、すなわち、8μmに近いほど、ゼロ磁場ヒステリシスZHは負の値となる傾向がみられた。これは、外部磁場の印加強度がゼロの場合であっても磁気シールドの残留磁化に基づく還流磁界が残留磁化の向きとは反平行にGMR素子に印加され、この還流磁界の強度は、GMR素子が磁気シールドに近いほど高くなるためである。 As shown in FIG. 5, in the magnetic sensor according to the comparative example, the zero magnetic field hysteresis ZH was in the range of + 0.05% to −0.2%. When the distance D1 was small, that is, the closer it was to 8 μm, the zero magnetic field hysteresis ZH tended to be a negative value. This is because the recirculation magnetic field based on the residual magnetization of the magnetic shield is applied to the GMR element in antiparallel to the direction of the remanent magnetization even when the applied strength of the external magnetic field is zero, and the intensity of this recirculation magnetic field is the GMR element. This is because the closer to the magnetic shield, the higher the value.

これに対し、実施例に係る磁気センサでは、ゼロ磁場ヒステリシスZHは+0.05%から−0.05%の範囲となり、ゼロ磁場ヒステリシスZHはマイナス側で絶対値が小さくなる傾向がみられた。これは、磁気シールドが突出部を有する形状となったことで、還流磁界の影響が相対的に低減されたことに起因している。 On the other hand, in the magnetic sensor according to the embodiment, the zero magnetic field hysteresis ZH was in the range of + 0.05% to −0.05%, and the absolute value of the zero magnetic field hysteresis ZH tended to be smaller on the minus side. This is because the magnetic shield has a shape having a protruding portion, so that the influence of the reflux magnetic field is relatively reduced.

本発明の一実施形態に係る磁気抵抗効果素子を備えた磁気センサは、柱状トランスなどのインフラ設備の電流センサの構成要素や、電気自動車、ハイブリッドカーなどの電流センサの構成要素として好適に使用されうる。 The magnetic sensor provided with the magnetoresistive effect element according to the embodiment of the present invention is suitably used as a component of a current sensor of infrastructure equipment such as a columnar transformer and a component of a current sensor of an electric vehicle, a hybrid car, or the like. sell.

1,1A 磁気センサ
11,12,13,14 磁気抵抗効果素子
5,6,7,8 配線
5a 入力端子
6a グランド端子
7a 第1の中点電位測定用端子
8a 第2の中点電位測定用端子
40 電流線
Io 被測定電流
IM 絶縁層
15 磁気シールド
150 本体部
15P 突出部
15PE 突出部の先端
151 下地層
152 軟磁性層
16 磁気平衡用コイル(スパイラルコイル)
PL 酸化保護層
29 基板
M0 残留磁化
RM0 還流磁界
1,1A Magnetic sensor 11, 12, 13, 14 Magnetic resistance effect element 5, 6, 7, 8 Wiring 5a Input terminal 6a Ground terminal 7a First midpoint potential measurement terminal 8a Second midpoint potential measurement terminal 40 Current line Io Measured current IM Insulation layer 15 Magnetic shield 150 Main body 15P Protruding part 15PE Protruding tip 151 Underlayer layer 152 Soft magnetic layer 16 Magnetic equilibrium coil (spiral coil)
PL Oxidation protection layer 29 Substrate M0 Remaining magnetization RM0 Reflux magnetic field

Claims (6)

第1の方向に感度軸を持つ磁気抵抗効果素子と、前記磁気抵抗効果素子の上方に離間配置され、前記磁気抵抗効果素子に印加される被測定磁界の強度を減衰させる磁気シールドと、を備えた磁気センサであって、
前記磁気シールドは、本体部と、前記本体部から前記第1の方向に突出する突出部とを有し、前記本体部は平面視で前記第1の方向に直交する第2の方向を長手とする形状を有し、前記突出部は前記本体部よりも厚さが薄い部分を有すること
を特徴とする磁気センサ。
It includes a magnetoresistive sensor having a sensitivity axis in the first direction, and a magnetic shield that is spaced above the magnetoresistive sensor and attenuates the strength of the magnetic field to be measured applied to the magnetoresistive sensor. It is a magnetic sensor
The magnetic shield has a main body portion and a protruding portion protruding from the main body portion in the first direction, and the main body portion is longitudinally oriented in a second direction orthogonal to the first direction in a plan view. A magnetic sensor characterized in that the protruding portion has a portion thinner than the main body portion.
前記突出部は、前記磁気シールドの下端に位置する、請求項1に記載の磁気センサ。 The magnetic sensor according to claim 1, wherein the protruding portion is located at the lower end of the magnetic shield. 平面視で、前記磁気抵抗効果素子の全体が前記磁気シールドの前記本体部に重なる、請求項1または請求項2に記載の磁気センサ。 The magnetic sensor according to claim 1 or 2, wherein the entire magnetoresistive sensor overlaps the main body portion of the magnetic shield in a plan view. 磁気平衡用コイルをさらに備え、前記磁気平衡用コイルに流れる電流に基づき前記被測定磁界の強度を測定する、請求項1から請求項3のいずれか一項に記載の磁気センサ。 The magnetic sensor according to any one of claims 1 to 3 , further comprising a magnetic equilibrium coil and measuring the strength of the measured magnetic field based on a current flowing through the magnetic equilibrium coil. 前記磁気平衡用コイルはスパイラルコイルであって、前記磁気抵抗効果素子と前記磁気シールドとの間に位置する、請求項4に記載の磁気センサ。 The magnetic sensor according to claim 4, wherein the magnetic balancing coil is a spiral coil and is located between the magnetoresistive sensor and the magnetic shield. 請求項1から請求項5のいずれか一項に記載される磁気センサを備え、前記磁気センサは被測定電流の誘導磁界を前記被測定磁界とする電流センサ。 The magnetic sensor according to any one of claims 1 to 5, wherein the magnetic sensor is a current sensor whose measured magnetic field is an induced magnetic field of a measured current.
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