JP6970673B2 - 光造形製造用光硬化性樹脂組成物、該組成物を用いて作製される三次元物品、及び関連する製造方法 - Google Patents
光造形製造用光硬化性樹脂組成物、該組成物を用いて作製される三次元物品、及び関連する製造方法 Download PDFInfo
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C67/00—Shaping techniques not covered by groups B29C39/00 - B29C65/00, B29C70/00 or B29C73/00
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
- B29K2033/04—Polymers of esters
- B29K2033/08—Polymers of acrylic acid esters, e.g. PMA, i.e. polymethylacrylate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2033/00—Use of polymers of unsaturated acids or derivatives thereof as moulding material
- B29K2033/04—Polymers of esters
- B29K2033/12—Polymers of methacrylic acid esters, e.g. PMMA, i.e. polymethylmethacrylate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2075/00—Use of PU, i.e. polyureas or polyurethanes or derivatives thereof, as moulding material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Description
(i)下記式(I)により表される、少なくとも1つのラジカル重合性化合物であって、R1は平均分子量200〜3,000g/molの直鎖又は分岐ポリテトラメチレングリコール残基であり、R2はジイソシアナート化合物残基であり、R3はR2と同一であるか異なるジイソシアナート化合物残基であり、R4はAcrO−CH2−CH2−;(AcrO−CH2)2CH−;(AcrO−CH2)3C−CH2−;AcrO−CH2−CHCH3−、AcrO−CH2−CHC2H5−及び(AcrO−CH2)2C(C2H5)CH2−からなる群から選択され、また式中、AcrはCH2=C(R)−CO−であり、Rは水素原子又はメチル基である少なくとも1つのラジカル重合性化合物(A)と、
(ii)化合物(A)と異なる少なくとも1つのラジカル重合性有機化合物(B)と、
(iii)感光性ラジカル重合開始剤(C)と、を含み、
ラジカル重合性化合物(A)の含有量が化合物(A)及び(B)の総量を基準として5〜70重量%である。
Claims (12)
- (i)下記式(I)により表される、少なくとも1つのラジカル重合性化合物であって、
R4O-CO-NH-R2-NH-CO-O-R1-O-CO-NH-R3-NH-CO-OR4…(I)
R1は平均分子量200〜3,000g/molの直鎖又は分岐ポリテトラメチレングリコール残基であり、R2はジイソシアナート化合物残基であり、R3はR2と同一であるか異なるジイソシアナート化合物残基であり、R4はAcrO−CH2−CH2−;(AcrO−CH2)2CH−;(AcrO−CH2)3C−CH2−;AcrO−CH2−CHCH3−、AcrO−CH2−CHC2H5−及び(AcrO−CH2)2C(C2H5)CH2−からなる群から選択され、また式中、AcrはCH2=C(R)−CO−であり、Rは水素原子又はメチル基である少なくとも1つのラジカル重合性化合物(A)と、
(ii)化合物(A)と異なる少なくとも1つのラジカル重合性有機化合物(B)と、
(iii)感光性ラジカル重合開始剤(C)と、を含み、
ラジカル重合性化合物(A)の含有量が化合物(A)及び(B)の総量を基準として10〜50重量%(ただし、10重量%を除く)である、光造形用液状光硬化性樹脂組成物。 - 前記化合物(B)が、エポキシ化合物及び(メタ)アクリル酸を反応させることにより得られる化合物を含まないことを特徴とする、請求項1に記載の光造形用液状光硬化性樹脂組成物。
- 前記化合物(B)が、分子中に3個以上の(メタ)アクリロイル基を有する多官能(メタ)アクリレート化合物を含まないことを特徴とする、請求項1又は2に記載の光造形用液状光硬化性樹脂組成物。
- 化合物(C)を、化合物(A)及び(B)の総量を基準として、0.1〜10重量部含むことを特徴とする、請求項1〜3のいずれか1項に記載の光造形用液状光硬化性樹脂組成物。
- 化合物(D)として、100重量部の化合物(A)、(B)及び(C)を基準として5から60重量部の1つ又は複数の充填剤及び/あるいは改質樹脂をさらに含有することを特徴とする、請求項1〜4のいずれか一項に記載の光造形用液状光硬化性樹脂組成物。
- その硬化形態において、JIS B0601法により測定される0.4μmより小さい表面粗さRaを有する、請求項1〜5のいずれか一項に記載の光造形用液状光硬化性樹脂組成物。
- 光造形プロセスにおける、下記式(I)の化合物(A)を含む光造形用液状光硬化性樹脂組成物の使用であって、
R4O-CO-NH-R2-NH-CO-O-R1-O-CO-NH-R3-NH-CO-OR4…(I)
R1は平均分子量200〜3,000g/molの直鎖又は分岐ポリテトラメチレングリコール残基であり、R2はジイソシアナート化合物残基であり、R3はR2と同一であるか異なるジイソシアナート化合物残基であり、R4はAcrO−CH2−CH2−;(AcrO−CH2)2CH−;(AcrO−CH2)3C−CH2−;AcrO−CH2−CHCH3−、AcrO−CH2−CHC2H5−及び(AcrO−CH2)2C(C2H5)CH2−からなる群から選択され、また式中、AcrはCH2=C(R)−CO−であり、Rは水素原子又はメチル基である化合物(A)と、
(ii)化合物(A)と異なる少なくとも1つのラジカル重合性有機化合物(B)と、
(iii)感光性ラジカル重合開始剤(C)と、を含み、
ラジカル重合性化合物(A)の含有量が化合物(A)及び(B)の総量を基準として10〜50重量%(ただし、10重量%を除く)である、光造形用液状光硬化性樹脂組成物の使用。 - 前記光造形プロセスがレイヤーバイレイヤー光造形プロセスであり、具体的には光透過性底面を有する成形容器に化合物(A)を含む液状光硬化性樹脂組成物の層を収容する工程と、前記容器の底からその層を照射して前記層を硬化する工程と、を含み、前記容器の底及び最後の硬化層間に化合物(A)を含む液状光硬化性樹脂組成物のさらなる層を収容するこれらの工程を繰り返して、立体造形物を作製するプロセスであることを特徴とする請求項7に記載の使用。
- 前記光造形プロセスにより得られる立体造形物が、JIS B0601法により測定される、0.4μmより小さい表面粗さRaを有することを特徴とする、請求項7又は8に記載の使用。
- 光造形による三次元物品の作製方法であって、前記三次元物品が、選択的に光を層に照射することにより層ごとに硬化される請求項1〜6のいずれか一項に記載の液状光硬化性樹脂組成物から作製される、三次元物品の作製方法。
- 光透過性底面を有する成形容器に前記液状光硬化性樹脂組成物の層を収容する工程と、前記容器の底からその層を照射して前記層を硬化する工程と、を含み、前記容器の底及び最後の硬化層間に硬化される液状光硬化性樹脂組成物のさらなる層を収容するこれらの工程を繰り返して、立体造形物を作製する、請求項10に記載の三次元物品の作製方法。
- 前記三次元物品が、JIS B0601法により測定される、0.4μmより小さい表面粗さRaを有することを特徴とする、請求項10又は11に記載の三次元物品の作製方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT102016000008951 | 2016-01-28 | ||
| ITUB2016A000408A ITUB20160408A1 (it) | 2016-01-28 | 2016-01-28 | Composizione di resina fotoindurente per produzioni stereolitografiche, articoli tridimensionali prodotti con detta composizione e relativo metodo di produzione |
| PCT/IB2017/050449 WO2017130153A1 (en) | 2016-01-28 | 2017-01-27 | A photocurable resin composition for stereolithographic manufacturing, three-dimensional articles produced with said composition and a relative manufacturing method |
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| Publication Number | Publication Date |
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| JP2019505628A JP2019505628A (ja) | 2019-02-28 |
| JP6970673B2 true JP6970673B2 (ja) | 2021-11-24 |
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| Country | Link |
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| US (1) | US11042088B2 (ja) |
| EP (1) | EP3408708B1 (ja) |
| JP (1) | JP6970673B2 (ja) |
| KR (1) | KR20180098382A (ja) |
| CN (1) | CN108475011A (ja) |
| BR (1) | BR112018014407A2 (ja) |
| CA (1) | CA3009615A1 (ja) |
| HK (1) | HK1258601A1 (ja) |
| IL (1) | IL260355A (ja) |
| IT (1) | ITUB20160408A1 (ja) |
| MX (1) | MX2018008853A (ja) |
| RU (1) | RU2689578C1 (ja) |
| SG (1) | SG11201805416RA (ja) |
| TW (1) | TWI648331B (ja) |
| WO (1) | WO2017130153A1 (ja) |
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| EP3717089B1 (en) * | 2017-12-01 | 2024-05-01 | Lego A/S | An additively manufactured toy building brick |
| CN115284609B (zh) * | 2022-08-01 | 2024-06-18 | 深圳市金石三维打印科技有限公司 | 光固化3d打印机的构件表面平滑打印方法、装置及设备 |
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| GB1352063A (en) | 1971-01-08 | 1974-05-15 | Ici Ltd | Polymerisable compositions and resins derived thererom |
| GB1465897A (en) | 1973-04-24 | 1977-03-02 | Ici Ltd | Dental compositions |
| GB1498421A (en) | 1974-05-21 | 1978-01-18 | Ici Ltd | Dental compositions |
| IT1190382B (it) | 1985-07-26 | 1988-02-16 | Montedison Spa | Diesteri acrilici per bisfenolo alchil etere,relativi polimeri e compositi per uso dentale |
| DE3820498A1 (de) | 1988-06-16 | 1989-12-21 | Bayer Ag | Dentalwerkstoffe |
| GB8815065D0 (en) | 1988-06-24 | 1988-08-03 | Ici Plc | Prosthetic devices |
| JPH0452042Y2 (ja) | 1988-07-13 | 1992-12-08 | ||
| JP3276388B2 (ja) | 1992-01-13 | 2002-04-22 | 株式会社ジーシー | 歯科用修復材組成物 |
| JP3419488B2 (ja) | 1993-03-09 | 2003-06-23 | 株式会社クラレ | 光重合性歯科用組成物 |
| DE4443702A1 (de) | 1994-12-08 | 1996-06-13 | Ivoclar Ag | Feinkörnige unter Druck oder Scherbeanspruchung fließfähige polymerisierbare Zusammensetzungen |
| JPH0970897A (ja) * | 1995-07-06 | 1997-03-18 | Japan Synthetic Rubber Co Ltd | 光造形法 |
| JPH09217004A (ja) * | 1996-02-09 | 1997-08-19 | Takemoto Oil & Fat Co Ltd | 光学的立体造形用光硬化性組成物 |
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-
2016
- 2016-01-28 IT ITUB2016A000408A patent/ITUB20160408A1/it unknown
-
2017
- 2017-01-13 TW TW106101101A patent/TWI648331B/zh not_active IP Right Cessation
- 2017-01-27 JP JP2018533152A patent/JP6970673B2/ja active Active
- 2017-01-27 CA CA3009615A patent/CA3009615A1/en not_active Abandoned
- 2017-01-27 SG SG11201805416RA patent/SG11201805416RA/en unknown
- 2017-01-27 WO PCT/IB2017/050449 patent/WO2017130153A1/en not_active Ceased
- 2017-01-27 MX MX2018008853A patent/MX2018008853A/es unknown
- 2017-01-27 US US16/069,825 patent/US11042088B2/en active Active
- 2017-01-27 EP EP17714271.8A patent/EP3408708B1/en active Active
- 2017-01-27 BR BR112018014407A patent/BR112018014407A2/pt not_active IP Right Cessation
- 2017-01-27 HK HK19100960.5A patent/HK1258601A1/zh unknown
- 2017-01-27 RU RU2018129215A patent/RU2689578C1/ru not_active IP Right Cessation
- 2017-01-27 KR KR1020187021693A patent/KR20180098382A/ko not_active Ceased
- 2017-01-27 CN CN201780007592.1A patent/CN108475011A/zh active Pending
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Also Published As
| Publication number | Publication date |
|---|---|
| IL260355A (en) | 2018-08-30 |
| EP3408708A1 (en) | 2018-12-05 |
| JP2019505628A (ja) | 2019-02-28 |
| BR112018014407A2 (pt) | 2018-12-11 |
| HK1258601A1 (zh) | 2019-11-15 |
| SG11201805416RA (en) | 2018-07-30 |
| US20190011832A1 (en) | 2019-01-10 |
| US11042088B2 (en) | 2021-06-22 |
| EP3408708B1 (en) | 2020-03-18 |
| KR20180098382A (ko) | 2018-09-03 |
| MX2018008853A (es) | 2019-01-14 |
| TW201726797A (zh) | 2017-08-01 |
| WO2017130153A1 (en) | 2017-08-03 |
| TWI648331B (zh) | 2019-01-21 |
| RU2689578C1 (ru) | 2019-05-28 |
| ITUB20160408A1 (it) | 2017-07-28 |
| CN108475011A (zh) | 2018-08-31 |
| CA3009615A1 (en) | 2017-08-03 |
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