JP7009130B2 - Developing equipment, developing method and printing plate manufacturing method - Google Patents

Description

The present invention relates to a developing device.

Conventionally, there has been known a technique for manufacturing a printing plate by forming irregularities on a photosensitive resin layer provided on the surface of an original plate. For example, by irradiating the original plate with ultraviolet light through an image mask and exposing the photosensitive resin layer in a predetermined pattern, an exposed portion and an unexposed portion are formed on the photosensitive resin layer (exposure step), and the original plate is formed. By rubbing the surface of the original plate with a brush while supplying the developing liquid to the surface, the resin in the unexposed area is scraped off to form a relief (development process), and the rinse liquid is supplied to the surface of the original plate on which the relief is formed to generate debris. A technique for manufacturing a flexible printing plate through a step group of removing (rinsing step) has been proposed (see, for example, Patent Documents 1 and 2).

Japanese Unexamined Patent Publication No. 2011-64796 JP-A-2015-125398A

By the way, in recent years, a metal bar is attached to the tip of a large (long) original plate, and the bar is transported in a predetermined direction by a transport means such as a chain and arranged at predetermined intervals along the transport direction. A so-called "in-line type" development process has been proposed in which a development process and a rinsing process are continuously performed by rubbing the surface of the original plate with a plurality of brushes.

In such an "in-line type" development process, since the developing area where the developing process is performed and the rinsing area where the rinsing process is performed are adjacent to each other, the developer mixed with debris invades the rinsing area. There was a risk that the rinse would not proceed easily. In particular, when so-called "water development" is carried out in which an aqueous developer is used in the developing process, the resin content scraped off by the brush is not dissolved but dispersed in the aqueous developer in small pieces and debris. There is a problem that the aqueous developer containing this debris easily invades the rinse region.

The present invention has been made in view of such circumstances, and an object of the present invention is to prevent a developer mixed with debris from invading the rinse region when performing an in-line development process.

In order to achieve the above object, the first developing apparatus according to the present invention is an apparatus for developing an original plate having a photosensitive resin layer on its surface, and by transporting the original plate in a predetermined direction, a developing solution is transferred to the original plate. In the developing region where It is provided with a lift portion for lifting.

When such a configuration is adopted, the original plate can be locally lifted vertically upward in the boundary region between the developing region where the developer is supplied to the original plate and the rinse region where the rinse liquid is supplied to the original plate. Therefore, since the original plate itself can function as a weir to prevent the developer mixed with debris from invading the rinse region, it is possible to suppress the invasion of debris into the rinse region very easily.

In the first developing apparatus according to the present invention, the first developing region on the upstream side where the developing solution containing the used developing solution is supplied to the original plate, and the filtered development obtained by filtering the used developing solution. A developing region having a second developing region on the downstream side where the liquid is supplied to the original plate can be adopted. In such a case, a developing region lift portion that locally lifts the original plate vertically upward in the boundary region between the first developing region and the second developing region can be adopted.

When such a configuration is adopted, in the boundary region between the first developing region where the developer containing the used developer is supplied to the original plate and the second developing region where the filtered developer is supplied to the original plate. , The original plate can be lifted vertically upward locally. Therefore, the original plate itself can function as a weir to prevent the used developer mixed with debris from entering the second developing region, and can be applied to the second developing region (and the rinse region on the downstream side thereof). The invasion of debris can be suppressed very easily.

In the first developing apparatus according to the present invention, the first rinse region on the upstream side where a new developer containing no used developer is supplied to the original plate as a rinse liquid, and water is supplied to the original plate as a rinse liquid. A rinse region having a second rinse region on the downstream side and a rinse region having the same can be adopted. In such a case, a rinse region lift portion that locally lifts the original plate vertically upward in the boundary region between the first rinse region and the second rinse region can be adopted.

When such a configuration is adopted, the original plate is locally lifted vertically upward in the boundary region between the first rinse region where the new developer is supplied to the original plate and the second rinse region where water is supplied to the original plate. be able to. Therefore, the original plate itself can function as a weir to prevent the new developer (which is mixed with debris by the rinsing treatment in the first rinsing region) from entering the second rinsing region, and debris to the second rinsing region. Invasion can be suppressed very easily.

The second developing apparatus according to the present invention is an apparatus for developing an original plate having a photosensitive resin layer on its surface, and a developing solution is supplied to the original plate by transporting the original plate in a predetermined direction. A transport unit that passes the region and the rinse region to which the rinse liquid is supplied to the original plate in this order, and the first development on the upstream side of the development region where the developer containing the used developer is supplied to the original plate. The original plate is locally vertical in the boundary region between the region and the second developing region on the downstream side where the filtered developing liquid obtained by filtering the used developing liquid is supplied to the original plate. It is provided with a developing area lift portion that is lifted upward.

When such a configuration is adopted, in the boundary region between the first developing region where the developer containing the used developer is supplied to the original plate and the second developing region where the filtered developer is supplied to the original plate. , The original plate can be lifted vertically upward locally. Therefore, the original plate itself can function as a weir to prevent the used developer mixed with debris from entering the second developing region, and can be applied to the second developing region (and the rinse region on the downstream side thereof). The invasion of debris can be suppressed very easily.

Further, the third developing apparatus according to the present invention is an apparatus for developing an original plate having a photosensitive resin layer on the surface, and a developer is supplied to the original plate by transporting the original plate in a predetermined direction. A transport unit that passes the region and the rinse region to which the rinse liquid is supplied to the original plate in this order, and the upstream of the rinse region where the new developer containing no used developer is supplied to the original plate as the rinse liquid. Rinse region lift section that locally lifts the original plate vertically upward at the boundary region between the first rinse region on the side and the second rinse region on the downstream side where water is supplied to the original as a rinse solution. And.

When such a configuration is adopted, the original plate is locally lifted vertically upward in the boundary region between the first rinse region where the new developer is supplied to the original plate and the second rinse region where water is supplied to the original plate. be able to. Therefore, the original plate itself can function as a weir to prevent the new developer (which is mixed with debris by the rinsing treatment in the first rinsing region) from entering the second rinsing region, and debris to the second rinsing region. Invasion can be suppressed very easily.

According to the present invention, it is possible to suppress the invasion of the developer mixed with debris into the rinse region when the in-line development process is performed.

It is a block diagram for demonstrating the whole structure of the developing apparatus which concerns on embodiment of this invention. It is a side view of the lift part of the developing apparatus which concerns on embodiment of this invention. It is a top view of the lift part of the developing apparatus which concerns on embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the following embodiments are merely suitable application examples, and the scope of application of the present invention is not limited thereto.

First, the configuration of the developing apparatus 1 according to the embodiment of the present invention will be described. The developing apparatus 1 according to the present embodiment is an apparatus called an "in-line type", which develops an original plate P having a photosensitive resin layer on its surface. In the developing apparatus 1 according to the present embodiment, the developing process of the original plate is performed using water containing a surfactant as a developing solution. Such development processing is referred to as "water development".

The original plate P is formed by forming a photosensitive resin layer on the surface of a support (not shown), and has a sheet shape as a whole. As the photosensitive resin, for example, acrylic resin, polyester, nylon, polyvinyl alcohol and the like can be used. A part of the surface of the original plate P is irradiated with ultraviolet rays prior to the development process by the developing apparatus 1. In the part exposed to ultraviolet rays (that is, the exposed part), a chemical change occurs in which the photosensitive resin is cured. On the other hand, in the unexposed portion, the photosensitive resin is not cured. In the developing process of the developing apparatus 1, the uncured photosensitive resin is removed, and irregularities having a predetermined pattern are formed on the surface of the original plate P.

As shown in FIG. 1, the developing apparatus 1 includes a transport unit 2, a discharge unit 3, and a brush unit 4.

The transport unit 2 is configured to transport the original plate P, and has an original plate mounting unit 22 on the upper surface thereof. The original plate P is placed on the original plate placing portion 22 so that the exposed surface faces upward. A guide plate 24 is fixed to one end of the original plate P. The guide plate 24 is a metal member and has a flat shape. The transport unit 2 has a guide chain (not shown). The guide chain is arranged along the original plate mounting portion 22, and the end portion of the guide plate 24 is locked to the guide chain. When a motor (not shown) is driven, the guide chain rotates to move the guide plate 24 along the original plate mounting portion 22. As a result, the original plate P is conveyed in the direction indicated by the arrow A.

The discharge unit 3 is configured to discharge the developer and water, and has a plurality of discharge pipes 31, 32, 33, 34. The discharge pipes 31, 32, 33, and 34 are all arranged above the original plate mounting portion 22 and have a pipe shape.

The discharge pipes 31 and 32 supply the developer to the original plate P transported by the transport unit 2 in the developing region (first developing region 11 and second developing region 12 described later). The discharge pipe 31 supplies the developer containing the used developer to the upstream region (the first development region 11 described later) of the development region, and the discharge pipe 32 filters the used developer. The filtered developer obtained is supplied to the downstream region (second development region 12 described later) of the development region.

The discharge pipes 33 and 34 supply the rinsing liquid to the original plate P conveyed by the conveying unit 2 in the rinsing region (first rinsing region 13 and second rinsing region 14 described later) adjacent to the downstream side of the developing region. This removes debris from the surface of the original plate P. The discharge pipe 33 supplies a new developer containing no used developer as a rinse liquid to the upstream region of the rinse region (first rinse region 13 described later), and the discharge pipe 34 rinses water. It is supplied as a liquid to the downstream region of the rinse region (second rinse region 14 described later).

The brush portion 4 has roll brushes 41, 42, 43, 44. The roll brushes 41, 42, 43, 44 are arranged above the original plate mounting portion 22 and below the discharge pipes 31, 32, 33, 34 so that their respective axes extend substantially horizontally. Elastic hair bundles are arranged on the outer peripheral portions of the roll brushes 41, 42, 43, 44. When the roll brushes 41, 42, 43, and 44 rotate around their respective axes, the tips of the hair bundles move around the axes and are repeatedly arranged on the original plate mounting portion 22 side. The roll brushes 41 and 42 are arranged in the developing area and rub the surface of the original plate P to remove the unexposed portion.

As shown in FIG. 1, the developing apparatus 1 can be divided into a first developing region 11, a second developing region 12, a first rinsing region 13, and a second rinsing region 14. The first developing region 11, the second developing region 12, the first rinsing region 13, and the second rinsing region 14 are arranged so as to be arranged in this order in the direction in which the original plate P is conveyed. The discharge pipe 31 and the roll brush 41 are arranged in the first development area 11, the discharge pipe 32 and the roll brush 42 are arranged in the second development area 12, and the discharge pipe 33 and the roll brush 43 are arranged in the first rinse area 13. Is arranged, and a discharge pipe 34 and a roll brush 44 are arranged in the second rinse region 14.

In the first developing region 11, the developer is discharged from the discharge pipe 31 and supplied to the surface of the original plate P. As will be described later, the developer discharged here contains a used developer and contains debris. Further, the roll brush 41 rotates, and the hair bundle rubs the surface of the original plate P. As a result, the uncured photosensitive resin is scraped from the surface of the original plate P and discharged together with the developer. The original plate P that has passed through the first developing region 11 then reaches the second developing region 12.

In the second developing region 12, the developer is discharged from the discharge tube 32 and supplied to the surface of the original plate P. As will be described later, the developer discharged here is obtained by filtering a used developer, and debris is almost removed. Further, the roll brush 42 rotates, and the hair bundle rubs the surface of the original plate P. As a result, the uncured photosensitive resin is scraped from the surface of the original plate P and discharged together with the developer. The original plate P that has passed through the second development region 12 then reaches the first rinse region 13.

In the first rinse region 13, the developer is discharged from the discharge pipe 33 and supplied to the surface of the original plate P. As will be described later, the developer discharged here is a new developer that does not contain a used developer. Further, the roll brush 43 rotates, and the hair bundle rubs the surface of the original plate P. As a result, the debris adhering to the surface of the original plate P is removed and discharged together with the developer. The original plate P that has passed through the first rinse region 13 then reaches the second rinse region 14.

In the second rinse region 14, a large amount of water is discharged from the discharge pipe 34 and supplied to the surface of the original plate P. Further, the roll brush 44 rotates, and the hair bundle rubs the surface of the original plate P. As a result, debris and surfactant adhering to the surface of the original plate P are removed.

The original plate P that has been subjected to the development treatment by such a developing apparatus 1 is swollen by a developer or water. The original plate P is dried by a drying device (not shown). In the drying process, the original plate P is promoted to be dried by blowing high temperature air. The dried original plate P is used as a printing plate.

Further, as shown in FIG. 1, the developing apparatus 1 includes a recovery and supply mechanism 5, a new liquid supply mechanism 6, and a water supply mechanism 7.

The recovery and supply mechanism 5 is configured to supply the developer to the first development region 11 and the second development region 12. The recovery / supply mechanism 5 has a drain pan 51 arranged below the discharge pipe 31, a recovery liquid storage tank 52, a filter device 54, and a filtrate storage tank 56.

The drain pan 51 is located below the transport unit 2 and in a portion corresponding to the first development region 11, the second development region 12, and the first rinse region 13. The drain pan 51 is configured to collect the developer discharged downward from the first developing region 11, the second developing region 12, and the first rinsing region 13.

The recovery liquid storage tank 52 is a container capable of storing liquid. The developer recovered by the drain pan 51 flows into and is stored inside the recovery liquid storage tank 52. The developer contains debris scraped from the surface of the original plate P in the first developed region 11 and the second developed region 12, and debris removed from the surface of the original plate P in the first rinse region 13. The debris is dispersed in the developer.

A part of the developer stored in the recovery liquid storage tank 52 is sucked by the pump 53b via the suction pipe 53a and fed to the filter device 54 via the feed pipe 53c. The filter device 54 has a filter (not shown) inside thereof. The developer fed by the feed pipe 53c is supplied into the filter device 54 and passes through the filter. When the developer passes through the filter, the surfactant is removed from the surface of the resin residue dispersed in the developer due to friction with the filter. As a result, in the developer that has passed through the filter, the resin residue agglomerates without adding a flocculant, and agglomerates are generated. In the present specification, such agglomerates and resin residues are collectively referred to as "debris".

The developer in the filter device 54 containing the debris is fed to the filter liquid storage tank 56 via the feed pipe 55. The filtrate storage tank 56 is a container capable of storing liquid. A filter 56a is arranged inside the filtrate storage tank 56. The developer supplied by the supply pipe 55 is supplied into the filtrate storage tank 56 and passes through the filter 56. When the developer passes through the filter 56a, the debris contained in the developer is almost removed. The filtrate storage tank 56 stores the developer from which debris has been substantially removed.

A part of the filtered developer stored in the filtrate storage tank 56 is sucked by the pump 57b via the suction pipe 57a and returned to the recovery liquid storage tank 52 via the feed pipe 57c. By supplying the developer from which debris has been removed from the filtrate storage tank 56, the concentration of debris decreases in the recovery liquid storage tank 52.

The developer stored in the recovery liquid storage tank 52 is sucked by the pump 58b via the suction pipe 58a and supplied to the discharge pipe 31 of the first developing region 11 via the feed pipe 58c. The discharge pipe 31 discharges the developer and supplies it to the original plate P arranged in the first developing region 11. Specifically, the developer is discharged from one discharge tube 31 toward the two roll brushes 41, and is supplied to the surface of the original plate P via the bristles of these roll brushes 41. The developer supplied in the first developing region 11 drops from the transport unit 2, is collected by the drain pan 51 as described above, and is subjected to a process of removing debris. That is, the developer supplied to the first developing region 11 is repeatedly subjected to the development of the original plate P.

On the other hand, the filtered developer stored in the filtrate storage tank 56 is sucked by the pump 59b via the suction pipe 59a and also into the discharge pipe 32 of the second developing region 12 via the feed pipe 59c. Will be supplied. The discharge pipe 32 discharges the developer and supplies it to the original plate P arranged in the second developing region 12. Specifically, the developer is discharged from one discharge tube 32 toward the two roll brushes 42, and is supplied to the surface of the original plate P via the bristles of these roll brushes 42. The developer supplied in the second developing region 12 drops from the transport unit 2, is collected by the drain pan 51 as described above, and is subjected to a process of removing debris. That is, the developer supplied to the second developing region 12 is also repeatedly subjected to the development of the original plate P.

The new liquid supply unit 6 is configured to supply the developer to the first rinse region 13. The new liquid supply unit 6 has a new liquid supply source 61. The new liquid supply source 61 is a tank for storing a new developing liquid that has not yet been used for developing the original plate P (that is, does not contain debris). The developer of the new liquid supply source 61 is sucked by the pump 63b via the suction pipe 63a and supplied to the discharge pipe 33 of the first rinse region 13 via the feed pipe 63c. The discharge pipe 33 discharges the developer and supplies it to the original plate P arranged in the first rinse region 13. Specifically, the developer is discharged from one discharge tube 33 toward the two roll brushes 43, and is supplied to the surface of the original plate P via the hair bundles of these roll brushes 43. The developer supplied in the first rinse region 13 falls from the transport unit 2 and is collected by the drain pan 51. That is, the developer supplied to the first rinse region 13 by the new liquid supply unit 6 is subjected to a process of removing debris together with the developer supplied to the first development region 11 and the second development region 12. Is supplied to the first development area 11 and the second development area 12.

The water supply unit 7 is configured to supply water to the second rinse region 14. The water supply unit 7 has a water supply source 71. The water supply source 71 is, for example, a tank for storing water supplied from tap water. The water of the water supply source 71 is sucked by the pump 73b via the suction pipe 73a and supplied to the discharge pipe 34 of the second rinse region 14 via the supply pipe 73c. The discharge pipe 34 discharges water and supplies it to the original plate P arranged in the second rinse region 14. Specifically, water is discharged from one discharge pipe 34 toward two roll brushes 44, and is supplied to the surface of the original plate P through the bristles of these roll brushes 44. The water supplied in the second rinse region 14 falls from the transport unit 2 and is collected by the drain pan 75. The water recovered by the drain pan 75 is filtered by a filtration device (not shown) to remove impurities, and is returned to the water supply source 71.

Further, as shown in FIG. 1, the developing apparatus 1 has a boundary between a developing region (first developed region 11 and second developed region 12) and a rinse region (first rinse region 13 and second rinse region 14). A lift portion 8 configured to locally lift the original plate P vertically upward in the region B is provided. The boundary region B is a region having a predetermined width located between the developing region and the rinsing region, and the width thereof is appropriately changed according to the specifications of the apparatus and the like.

As shown in FIGS. 2 and 3, the lift portion 8 in the present embodiment has a base member 81 and a rotating member 82 rotatably attached to the base member 81.

As shown in FIG. 2, the base member 81 is a member having an L-shape when viewed from the side, and is arranged in pairs so as to sandwich the original plate mounting portion 22 of the transport portion 2 and is fixed to a predetermined portion. The rotating member 82 is configured to rotate with respect to a pair of base members 81 about a rotating shaft 83, and is one of an upper plate portion 82a having a rectangular shape in a plan view and an upper plate portion 82a. It has a pair of side plate portions 82b arranged on the end portion (upstream side end portion in the transport direction A of the original plate P) and fixed to the side of the upper plate portion 82a. The pair of side plate portions 82b are attached to the pair of base members 81 via the rotation shaft 83, respectively. The other end of the upper plate 82a (the downstream end of the original plate P in the transport direction A) is slightly bent downward as shown in FIG. 2, whereby the upper surface of the upper plate 82a is formed. , The top 84 that comes into contact with the lower surface of the original plate P will be formed.

The rotating member 82 is provided so that the top portion 84 is positioned vertically above the other portion as shown in FIG. 2 due to the urging force of the urging member (not shown) arranged around the rotating shaft 83. Posture is maintained. Since this posture is maintained even when the original plate P is placed on the top 84, the original plate P can be lifted vertically upward by the top 84. On the other hand, when the relatively heavy guide plate 24 is placed on the top 84, the rotating member 82 is urged by the weight of the guide plate 24 as shown by the broken line in FIG. It is configured to rotate around the rotation shaft 83 against the force, move the top portion 84 downward, and make most of the upper plate portion 82a horizontal. Therefore, the rotating member 82 does not obstruct the passage of the guide plate 24.

Next, a developing method using the developing apparatus 1 according to the embodiment of the present invention will be described.

First, while the original plate P is conveyed in the predetermined direction A by the conveying unit 2, the developer is supplied to the original plate P in the developing region (first developing region 11 and the second developing region 12) with the roll brushes 41 and 42. The unexposed portion is removed by rubbing the surface of the original plate P (development step). Here, in the developing step, the developing solution containing the used developing solution is supplied to the upstream region (first developing area 11) of the developing region, while the used developing solution is filtered to obtain the filtered development. The solution is supplied to the downstream region (second development region 12) of the development region.

Next, while transporting the original plate P in a predetermined direction A, the original plate P is supplied with a rinse liquid in the rinse regions (first rinse region 13 and second rinse region 14) on the downstream side of the developing region. Debris is removed from the surface of the surface (rinse process). Here, the rinsing step includes a new liquid rinsing step of supplying a new developing liquid containing no used developing liquid as a rinsing liquid to the upstream region (first rinsing region 13) of the rinsing region, and rinsing with water as the rinsing liquid. A water rinsing step of supplying to the downstream region (second rinsing region 14) of the region is included. After that, the original plate P is dried by a drying device (not shown) to obtain a printing plate.

In the developing apparatus 1 according to the embodiment described above, the developing region (first developing region 11 and the second developing region 12) in which the developing solution is supplied to the original plate P and the rinsing region in which the rinsing liquid is supplied to the original plate P. In the boundary region B between (first rinse region 13 and second rinse region 14), the original plate P can be locally lifted vertically upward. Therefore, since the original plate P itself can function as a weir to prevent the developer mixed with debris from invading the rinse region, it is possible to suppress the invasion of debris into the rinse region very easily.

In the above embodiment, an example is shown in which the lift portion 8 having the base member 81 and the rotating member 82 rotatably attached to the base member 81 is adopted, but the configuration of the lift portion is the same. The configuration is not limited to this, and any configuration may be used as long as the original plate P can be locally lifted vertically upward in the boundary region B between the developing region and the rinsing region. For example, instead of adopting the urging member in the present embodiment, the upper plate portion 82a is pushed vertically upward by using an air cylinder, so that the original plate P is locally lifted vertically upward by the top 84 of the upper plate portion 82a. It is also possible to adopt a lift portion configured as described above.

Further, in the above embodiment, the example in which the lift portion 8 is arranged in the boundary region B between the developing region and the rinsing region is shown, but the lift portion having the same configuration is arranged in another boundary region. You can also.

For example, as shown in FIG. 1, a developing region lift unit 9 that locally lifts the original plate P vertically upward in the boundary region C between the first developing region 11 and the second developing region 12 can be adopted. In this way, between the first developing region 11 in which the developer containing the used developer is supplied to the original plate P and the second developing region 12 in which the filtered developer is supplied to the original plate P. In the boundary region C, the original plate P can be locally lifted vertically upward. Therefore, the original plate P itself can function as a weir to prevent the used developer mixed with debris from entering the second developing region 12, and the second developing region 12 (and the rinse region on the downstream side thereof) can function as a weir. ) Can be suppressed very easily.

Further, as shown in FIG. 1, a rinse region lift portion 10 that locally lifts the original plate P vertically upward in the boundary region D between the first rinse region 13 and the second rinse region 14 may be adopted. In this way, the original plate P is locally distributed in the boundary region D between the first rinse region 13 in which the new developer is supplied to the original plate P and the second rinse region 14 in which water is supplied to the original plate P. Can be lifted vertically upwards. Therefore, the original plate P itself can function as a weir to prevent the new developer (in which debris is mixed by the rinsing treatment in the first rinsing region 13) from entering the second rinsing region 14, and the second rinsing region can be used. The invasion of debris into 14 can be suppressed very easily.

The present invention is not limited to the above embodiments, and those having a design modification appropriately by those skilled in the art are also included in the scope of the present invention as long as they have the features of the present invention. .. That is, each element included in the embodiment and its arrangement, material, condition, shape, size, etc. are not limited to those exemplified, and can be appropriately changed. Further, the elements included in the embodiment can be combined as much as technically possible, and the combination thereof is also included in the scope of the present invention as long as the features of the present invention are included.

1 ... Developing device 2 ... Conveying unit 8 ... Lifting unit 9 ... Developing area Lifting unit 10 ... Rinsing area Lifting unit 11 ... First developing area 12 ... Second developing area 13 ... First rinse area 14 ... Second rinse area B ... Boundary area (between the developed area and the rinse area) C ... Boundary area (between the first developed area and the second developed area) D ... Boundary area (between the first rinse area and the second rinse area) Area P ... Original version

Claims (10)

A device for developing an original plate having a photosensitive resin layer on its surface.
A transport unit that passes the developing region in which the developer is supplied to the original plate and the rinse region in which the rinse liquid is supplied to the original plate in this order by transporting the original plate in a predetermined direction.
A lift portion that functions the original plate itself as a weir that blocks the developer from entering the rinse region by locally lifting the original plate vertically upward in the boundary region between the developing region and the rinsing region. When,
A developing device. The developing region includes a first developing region on the upstream side where a developer containing a used developer is supplied to the original plate, and a filtered developer obtained by filtering the used developer into the original plate. Has a second developing area on the downstream side to be supplied,
By locally lifting the original plate vertically upward in the boundary region between the first developed region and the second developed region, the original plate is used as a weir to prevent the developer from invading the second developed region. Further equipped with a developing area lift unit that functions itself ,
The developing apparatus according to claim 1. The rinse region includes a first rinse region on the upstream side where a new developer containing no used developer is supplied to the master plate as the rinse liquid, and a downstream side where water is supplied to the master plate as the rinse liquid. With a second rinse area,
The original plate is used as a weir to prevent the developer from invading the second rinse region by locally lifting the original plate vertically upward at the boundary region between the first rinse region and the second rinse region. It also has a rinse area lift that allows it to function .
The developing apparatus according to claim 1 or 2. A device for developing an original plate having a photosensitive resin layer on its surface.
A transport unit that passes the developing region in which the developer is supplied to the original plate and the rinse region in which the rinse liquid is supplied to the original plate in this order by transporting the original plate in a predetermined direction.
Filtered development obtained by filtering the used developer in the first development area on the upstream side where the developer containing the used developer in the development area is supplied to the original plate and the used developer in the development area. By locally lifting the original plate vertically upward in the boundary region between the second developing region on the downstream side where the liquid is supplied to the original plate, the developing solution invades the second developing region. A developer area lift that functions the original plate itself as a blocking dam ,
A developing device. A device for developing an original plate having a photosensitive resin layer on its surface.
A transport unit that passes the developing region in which the developer is supplied to the original plate and the rinse region in which the rinse liquid is supplied to the original plate in this order by transporting the original plate in a predetermined direction.
A new developer containing no used developer in the rinse region is supplied to the master plate as the rinse liquid on the upstream side, and water in the rinse region is supplied to the master plate as the rinse liquid. By locally lifting the master plate vertically upward in the boundary region between the second rinse region on the downstream side to be supplied, the master plate is used as a dam to prevent the developer from invading the second rinse region. Rinse area lift part that makes itself function ,
A developing device. A developing method for developing using the developing apparatus according to any one of claims 1 to 5. A developing step of removing an unexposed portion by rubbing the surface of the original plate with a roll brush while supplying a developer to the original plate in the developing area.
A rinsing step of removing debris from the surface of the original plate by supplying a rinsing liquid to the original plate in the rinse region on the downstream side of the development region.
In the boundary region between the developing region and the rinsing region, the original plate itself functions as a weir to prevent the developer from invading the rinsing region by locally lifting the original plate vertically upward. Development method. In the developing step, the developer containing the used developer is supplied to the upstream region of the developing region, while the filtered developer obtained by filtering the used developer is supplied to the downstream side of the developing region. The developing method according to claim 7, wherein the area is supplied. The rinsing step includes a new liquid rinsing step in which a new developer containing no used developer is supplied to the upstream region of the rinse region as a rinse liquid, and water is supplied to the downstream region of the rinse region as a rinse liquid. The developing method according to claim 7 or 8, which comprises a water rinsing step. A developing step of removing an unexposed portion by rubbing the surface of the original plate with a roll brush while supplying a developer to the original plate in the developing area.
A rinsing step of removing debris from the surface of the original plate by supplying a rinsing liquid to the original plate in the rinse region on the downstream side of the development region.
In the boundary region between the developing region and the rinsing region, the original plate itself functions as a weir to prevent the developer from invading the rinsing region by locally lifting the original plate vertically upward. How to make a printing plate.

Images