JP7015888B2 - Spherical silica powder - Google Patents
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本発明は、低い誘電正接を有する球状シリカ粉末に関する。 The present invention relates to a spherical silica powder having a low dielectric loss tangent.
近年、通信分野における情報通信量の増加に伴い、電子機器や通信機器等において高周波数帯の活用が広がっている。高周波は、広帯域性、直進性、透過性等の特徴があり、特に、周波数が109以上であるGHz帯の使用が盛んに行われている。例えば、自動車分野において、衝突防止目的で搭載されるミリ波レーダー、準ミリ波レーダーにおいては、それぞれ76~79GHz、24GHzの高周波数が使用されており、今後更なる普及が進んでいくことが予想される。 In recent years, with the increase in the amount of information communication in the communication field, the utilization of high frequency bands is spreading in electronic devices and communication devices. High frequencies are characterized by wideband, straightness, transparency, etc., and in particular, the GHz band having a frequency of 109 or more is actively used. For example, in the automobile field, high frequencies of 76 to 79 GHz and 24 GHz are used in millimeter-wave radars and quasi-millimeter-wave radars installed for the purpose of collision prevention, respectively, and it is expected that they will become more widespread in the future. Will be done.
高周波帯の適用に伴い、回路信号の伝送損失が大きくなる問題が生じている。伝送損失は、大別して、配線の表皮効果による導体損失と、基板等の電気電子部品を構成する絶縁体の誘電体材質の特性による誘電体損失からなる。誘電体損失は、周波数の1乗、絶縁体の誘電率の1/2乗および誘電正接の1乗に比例するため、高周波帯用のデバイスに用いられる材料に関して、誘電率および誘電正接が共に低いことが求められている。 With the application of the high frequency band, there is a problem that the transmission loss of the circuit signal becomes large. The transmission loss is roughly classified into a conductor loss due to the skin effect of wiring and a dielectric loss due to the characteristics of the dielectric material of the insulator constituting an electric / electronic component such as a substrate. Since the dielectric loss is proportional to the first power of the frequency, the 1/2 power of the dielectric constant of the insulator, and the first power of the dielectric loss tangent, both the dielectric constant and the dielectric loss tangent are low for the materials used for the device for the high frequency band. Is required.
絶縁体材料に用いられるポリマー材料は、一般に誘電率が低いが、誘電正接は高いものが多い。一方、セラミックス材料はその逆の特性を持つものが多く、両特性を両立させるために、セラミックスフィラー充填ポリマー材料が検討されている(例えば特許文献1)。 Polymer materials used for insulator materials generally have a low dielectric constant, but often have a high dielectric loss tangent. On the other hand, many ceramic materials have the opposite characteristics, and in order to achieve both of these characteristics, a ceramic filler-filled polymer material has been studied (for example, Patent Document 1).
GHz帯のセラミックス材料の誘電特性は、例えば、非特許文献1等により知られているが、いずれも焼結された基板としての特性である。シリカ(SiO2)は、誘電率が小さく(3.7)、品質係数指標Qf(誘電正接の逆数と測定周波数を掛けた値)が約12万であり、低誘電率かつ誘電正接を有するフィラーの材料として有望である。また、樹脂中での配合を容易にするためには、フィラー形状が球形に近い程好ましいが、球状シリカは容易に合成可能であり(例えば特許文献2)、既に多くの用途で使用されている。そのため、高周波帯の誘電体デバイス等においても広く用いられることが期待される。 The dielectric properties of the ceramic material in the GHz band are known, for example, in Non-Patent Document 1 and the like, but all of them are the properties of a sintered substrate. Silica (SiO 2 ) has a small dielectric constant (3.7), a quality coefficient index Qf (the reciprocal of the dielectric loss tangent multiplied by the measurement frequency) of about 120,000, and a filler having a low dielectric constant and a dielectric loss tangent. It is a promising material for. Further, in order to facilitate compounding in the resin, it is preferable that the filler shape is closer to a spherical shape, but spherical silica can be easily synthesized (for example, Patent Document 2) and has already been used in many applications. .. Therefore, it is expected to be widely used in high frequency band dielectric devices and the like.
しかしながら、球状シリカの粒子の表面には、吸着水やシラノール基といった極性官能基等が多く存在し、特に、誘電正接が焼結された基板としての特性よりも悪化するという問題点がある。 However, there are many polar functional groups such as adsorbed water and silanol groups on the surface of the spherical silica particles, and there is a problem that the dielectric loss tangent is worse than the characteristics of the sintered substrate.
フィラー粒子の表面の吸着水や極性官能基の低減方法としては、例えば、非特許文献2で、シランカップリング剤により表面処理する方法が検討されているが、1~10MHzでは誘電正接はほとんど低減しておらず、ミリ波帯の効果は明記されていない。 As a method for reducing the adsorbed water and polar functional groups on the surface of the filler particles, for example, in Non-Patent Document 2, a method of surface treatment with a silane coupling agent has been studied, but the dielectric loss tangent is almost reduced at 1 to 10 MHz. The effect of the millimeter wave band is not specified.
本発明は、誘電正接が低い球状シリカ粉末を提供することにある。 The present invention is to provide a spherical silica powder having a low dielectric loss tangent.
(1)25℃から30℃/minの条件で1000℃まで昇温した際に、500℃~1000℃における脱離する水分子数が0.01mmol/g以下であり、比表面積が1~30m2/gであることを特徴とする球状シリカ粉末。
(2)表面処理する前の球状シリカ粉末において、拡散反射FT-IR法にて測定したシリカ粉末の波数3735cm-1~3755cm-1のピーク強度をA、波数3660cm-1~3680cm-1のピーク強度をBとしたとき、B/Aが3.0以下であることを特徴とする(1)に記載の球状シリカ粉末。
(3)不活性雰囲気下で高温加熱処理されている、あるいは還元的な反応場で高温加熱処理されていることを特徴とする(1)または(2)に記載の球状シリカ粉末。
(4) 平均円形度が0.85以上であることを特徴とする(1)~(3)にいずれか一項に記載の球状シリカ粉末。
(5) 表面処理剤で表面処理されていることを特徴とする(1)~(4)いずれか一項に記載の球状シリカ粉末。
(6)樹脂中に配合して使用されることを特徴とする、(1)~(5)いずれか一項に記載の球状シリカ粉末。
(1) When the temperature is raised from 25 ° C. to 30 ° C./min to 1000 ° C., the number of water molecules desorbed at 500 ° C. to 1000 ° C. is 0.01 mmol / g or less, and the specific surface area is 1 to 30 m. Spherical silica powder characterized by being 2 / g.
(2) In the spherical silica powder before surface treatment, the peak intensity of the silica powder with a wave number of 3735 cm -1 to 3755 cm -1 measured by the diffuse reflection FT-IR method is A, and the peak intensity of the wave number is 3660 cm -1 to 3680 cm -1 . The spherical silica powder according to (1), wherein the B / A is 3.0 or less when the strength is B.
(3) The spherical silica powder according to (1) or (2), which is subjected to high-temperature heat treatment in an inert atmosphere or high-temperature heat treatment in a reducing reaction field.
(4) The spherical silica powder according to any one of (1) to (3), which has an average circularity of 0.85 or more.
(5) The spherical silica powder according to any one of (1) to (4), which is surface-treated with a surface treatment agent.
(6) The spherical silica powder according to any one of (1) to (5), which is used by blending in a resin.
本発明によれば、樹脂材料、例えば基板等の誘電正接を低くすることが可能な球状シリカ粉末を提供することができる。 According to the present invention, it is possible to provide a resin material, for example, a spherical silica powder capable of lowering the dielectric loss tangent of a substrate or the like.
以下、本発明の実施形態について説明する。ただし、本発明は以下の実施形態に限定されるものではない。
本発明のシリカ粉末は、25℃から30℃/minの条件で1000℃まで昇温した際に、500℃~1000℃における脱離する水分子数が0.01mmol/g以下である。脱離水分量は、例えば、昇温脱離ガス分析装置(TDS)を用いて測定することが可能であり、25℃から30℃/minで昇温し、得られるマスクロマトグラム(m/z=18)の500℃~1000℃範囲における面積値から、H2O脱離分子数を算出する。脱離分子数は、好ましくは0.008mmol/g以下であり、下限値は特に規定されないが、現実的には0.0001mmol/g以上である。
Hereinafter, embodiments of the present invention will be described. However, the present invention is not limited to the following embodiments.
The silica powder of the present invention has 0.01 mmol / g or less of water molecules desorbed at 500 ° C. to 1000 ° C. when the temperature is raised from 25 ° C. to 30 ° C./min to 1000 ° C. The amount of desorbed water can be measured using, for example, a heated desorbed gas analyzer (TDS), and the temperature is raised from 25 ° C. to 30 ° C./min to obtain a mass chromatogram (m / z =). The number of H2O desorbed molecules is calculated from the area value in the range of 500 ° C. to 1000 ° C. in 18). The number of desorbed molecules is preferably 0.008 mmol / g or less, and the lower limit is not particularly specified, but in reality, it is 0.0001 mmol / g or more.
本発明のシリカ粉末は、表面処理する前の球状シリカ粉末において、拡散反射FT-IR法にて測定したシリカ粉末の波数3735cm-1~3755cm-1のピーク強度をA、波数3660cm-1~3680cm-1のピーク強度をBとしたとき、B/Aが3.0以下である。一般に、波数3735cm-1~3755cm-1のピークは孤立シラノール基、波数3660cm-1~3680cm-1のピークは水素結合シラノール基であることが知られている。本発明では、水素結合性シラノール基強度に着目し、B/Aが3.0以下の時、樹脂組成物の誘電正接を十分に低下させることができる。 The silica powder of the present invention has a peak intensity of 3735 cm -1 to 3755 cm -1 wave number of the silica powder measured by the diffuse reflection FT-IR method in the spherical silica powder before surface treatment, and has a wave number of 3660 cm -1 to 3680 cm. When the peak intensity of -1 is B, B / A is 3.0 or less. It is generally known that the peak with a wave number of 3735 cm -1 to 3755 cm -1 is an isolated silanol group, and the peak with a wave number of 3660 cm -1 to 3680 cm -1 is a hydrogen-bonded silanol group. In the present invention, paying attention to the hydrogen-bonding silanol group strength, when the B / A is 3.0 or less, the dielectric loss tangent of the resin composition can be sufficiently reduced.
本発明の球状シリカ粉末は、比表面積が1~30m2/gである。比表面積が30m2/gより大きくなると樹脂中での配合が困難になり、1m2/g未満であると誘電正接低減処理効果が小さくなる。 The spherical silica powder of the present invention has a specific surface area of 1 to 30 m 2 / g. If the specific surface area is larger than 30 m 2 / g, it becomes difficult to mix in the resin, and if it is less than 1 m 2 / g, the dielectric loss tangent reduction treatment effect becomes small.
本発明の球状シリカ粉末は、平均円形度が0.85以上であることが好ましく、さらに好ましくは0.90以上である。平均円形度が0.85未満であると、樹脂と混合した際に、粘度の増加や流動性の低下が生じる可能性があり、加工性や充填性が悪くなる場合がある。 The spherical silica powder of the present invention preferably has an average circularity of 0.85 or more, more preferably 0.90 or more. If the average circularity is less than 0.85, the viscosity may increase or the fluidity may decrease when mixed with the resin, and the processability and filling property may deteriorate.
本発明の球状シリカ粉末の密度は、1.8~2.4g/cm3であることが望ましい。密度が1.8より小さくなると、粒子内に多く空隙を含むこととなり、樹脂中での混練が難しくなる。密度が2.4より大きくなると、シリカの結晶構造にα-石英やクリストバライト等を含むこととなり、例えば、熱膨張率が大きくなる等、物性への影響が懸念される場合がある。 The density of the spherical silica powder of the present invention is preferably 1.8 to 2.4 g / cm 3 . When the density is smaller than 1.8, a large amount of voids are contained in the particles, which makes kneading in the resin difficult. If the density is higher than 2.4, the crystal structure of silica contains α-quartz, cristobalite, etc., and there may be a concern about the influence on physical properties such as an increase in thermal expansion rate.
本発明の原料シリカ粉末としては、平均円形度が0.85以上、比表面積が1~30m2/gの球状シリカ粉末であれば、好適に使用することができる。原料の球状シリカ粉末の製造方法としては、例えば、融点以上の温度の高温域を通過させ球状化させる粉末溶融法が挙げられる。 As the raw material silica powder of the present invention, any spherical silica powder having an average circularity of 0.85 or more and a specific surface area of 1 to 30 m 2 / g can be preferably used. Examples of the method for producing spherical silica powder as a raw material include a powder melting method in which a spheroidal silica powder is spheroidized by passing through a high temperature range having a temperature higher than the melting point.
本発明の球状シリカ粉末は、原料シリカ粉末を不活性雰囲気下で粉体を流動させながら高温加熱処理あるいは還元的な反応場である電気炉により加熱処理することによって製造することができる。温度および時間は、25℃~1000℃まで30℃/minの条件で昇温した際に、500℃~1000℃における脱離する水分子数が0.01mmol/g以下であれば良く、原料シリカ粉末の比表面積によっても異なるが、例えば、窒素あるいはアルゴン雰囲気下で700~1000℃、1~24時間、ロータリーキルン内にて粉体を流動させながら処理し、炉内にて自然放冷すればよい。還元的な反応場である電気炉とは、例えば、炉材がカーボンであるカーボン炉、炉材がカーボン以外の場合は、数%水素を添加した雰囲気で焼成することである。200℃以下に冷却後、真空乾燥器内で乾燥させ、その後、防湿アルミ袋にて回収することにより製造することができる。 The spherical silica powder of the present invention can be produced by heat-treating the raw material silica powder in a high-temperature heat treatment or an electric furnace which is a reducing reaction field while flowing the powder in an inert atmosphere. The temperature and time may be such that the number of water molecules desorbed at 500 ° C. to 1000 ° C. is 0.01 mmol / g or less when the temperature is raised from 25 ° C. to 1000 ° C. under the condition of 30 ° C./min, and the raw material silica is used. Although it depends on the specific surface area of the powder, for example, the powder may be treated in a rotary kiln at 700 to 1000 ° C. for 1 to 24 hours while flowing in a rotary kiln, and then naturally allowed to cool in a furnace. .. The electric furnace, which is a reducing reaction field, is, for example, a carbon furnace in which the furnace material is carbon, and when the furnace material is other than carbon, firing is performed in an atmosphere in which several% hydrogen is added. It can be manufactured by cooling to 200 ° C. or lower, drying it in a vacuum dryer, and then collecting it in a moisture-proof aluminum bag.
上記の製造方法により、比表面積といった粉体特性を変化させずに、球状シリカ粒子の表面の吸着水および極性官能基を低減させることができる。製造後においても、例えば、1ヵ月の間高湿度下、例えば40℃-90%RH環境下に保存しても、球状シリカの誘電正接の増加に影響するほど粒子の表面の吸着水および極性官能基量が変化しないことが期待できる。 By the above-mentioned production method, the adsorbed water and polar functional groups on the surface of the spherical silica particles can be reduced without changing the powder characteristics such as the specific surface area. Even after production, for example, even if stored in high humidity for one month, for example, in a 40 ° C.-90% RH environment, the adsorbed water and polar functionality on the surface of the particles affect the increase in the dielectric loss tangent of the spherical silica. It can be expected that the base amount will not change.
製造方法において、所望の比表面積および平均粒子径が得られるように粉末を分級する工程を備えてもよい。加熱温度が1000℃以下であれば、加熱前後にて比表面積および平均粒子径は変化しないことから、分級する工程は加熱前に実施し、所望の比表面積および平均粒子径に調整の後、加熱処理をすることが望ましい。 The production method may include a step of classifying the powder so as to obtain a desired specific surface area and average particle size. If the heating temperature is 1000 ° C. or lower, the specific surface area and average particle size do not change before and after heating. Therefore, the classification step is performed before heating, and after adjusting to the desired specific surface area and average particle size, heating is performed. It is desirable to process.
得られた粉末は、表面処理剤によって表面処理をすることで、さらに表面極性基を低減させ、誘電正接を低減させることができる。また、樹脂界面との馴染みや密着性の改善も期待できる。表面処理剤は、添加する樹脂種との相性が良いものや表面処理後に極性官能基が残存しにくいものが良く、例えば、γ-グリシドキシプロピルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシシラン、アミノプロピルトリエトキシシラン、N-フェニルアミノプロピルトリメトキシシラン等のアミノシラン、ビニルトリメトキシシラン等のビニルシラン、アクリロキシトリメトキシシラン等のアクリルシラン、ヘキサメチルジシラザン等のシラザン等が例示される。アミノシランやアクリルシランのように極性官能基を多く有する処理剤の添加量は、可能な限り少ない方が好ましく、例えば、球状シリカ粉末100質量部に対して1質量部以下である。表面処理の後に、再度、防湿アルミ袋にて回収することが望ましい。 By surface-treating the obtained powder with a surface treatment agent, the surface polar groups can be further reduced and the dielectric loss tangent can be reduced. In addition, it can be expected to improve the compatibility with the resin interface and the adhesion. The surface treatment agent is preferably one that is compatible with the resin type to be added and one in which polar functional groups are unlikely to remain after surface treatment. For example, γ-glycidoxypropyltriethoxysilane and β- (3,4-epoxy). Cyclohexyl) Epoxysilane such as ethyltrimethoxysilane, aminopropyltriethoxysilane, aminosilane such as N-phenylaminopropyltrimethoxysilane, vinylsilane such as vinyltrimethoxysilane, acrylicsilane such as acryloxytrimethoxysilane, hexamethyldi Examples thereof include silane such as silane. The amount of the treating agent having a large amount of polar functional groups such as aminosilane and acrylic silane is preferably as small as possible, and is, for example, 1 part by mass or less with respect to 100 parts by mass of the spherical silica powder. After surface treatment, it is desirable to collect it again in a moisture-proof aluminum bag.
本発明の球状シリカ粉末に含まれるNa、Li又はK等のアルカリ金属類、及びFe等の金属元素の不純物は、誘電正接低減の観点からできる限り少ない方が好ましい。その他不純物も可能な限り低減させた方が良い。 The impurities of alkali metals such as Na, Li or K and metal elements such as Fe contained in the spherical silica powder of the present invention are preferably as small as possible from the viewpoint of reducing the dielectric loss tangent. Other impurities should be reduced as much as possible.
本発明の誘電正接を低減した球状シリカ粉末の保存方法としては、JIS Z 0208-1976の条件B(温度40℃-相対湿度90%)の透湿度が0.1(g/m2・24h)以下の防湿袋、例えば防湿アルミ袋やPET/AL/PEラミネート袋を用いて保存するのが好ましい。 As a method for preserving the spherical silica powder with reduced dielectric tangents of the present invention, the water permeability under condition B (temperature 40 ° C.-relative humidity 90%) of JIS Z 0208-1976 is 0.1 (g / m 2.24h ). It is preferable to store in the following moisture-proof bag, for example, a moisture-proof aluminum bag or a PET / AL / PE laminated bag.
本発明の球状シリカ粉末と、比表面積や平均粒子径、組成が異なる他の粉末と配合・混合することにより、混合粉末を得ることができる。混合粉末とすることにより、樹脂に配合した場合の誘電率、誘電正接、熱膨張係数、熱伝導率、充填率等をより容易に調整することができる。 A mixed powder can be obtained by blending and mixing the spherical silica powder of the present invention with another powder having a different specific surface area, average particle size, and composition. By using the mixed powder, the dielectric constant, the dielectric loss tangent, the coefficient of thermal expansion, the thermal conductivity, the filling ratio, and the like when blended in the resin can be more easily adjusted.
本発明の球状シリカ粉末及び混合粉末は、例えば、樹脂中に配合して使用される。本発明で使用される樹脂としては、例えば、ポリエチレン、ポリプロピレン、エポキシ樹脂、シリコーン樹脂、フェノール樹脂、メラミン樹脂、ユリア樹脂、不飽和ポリエステル、フッ素樹脂、ポリイミド、ポリアミドイミド、ポリエーテルイミド等のポリアミド、ポリブチレンテレフタレート、ポリエチレンテレフタレート等のポリエステル、ポリフェニレンスルフィド、全芳香族ポリエステル、ポリスルホン、液晶ポリマー、ポリエーテルスルホン、ポリカーボネート、マレイミド変性樹脂、ABS樹脂、AAS(アクリロニトリル-アクリルゴム・スチレン)樹脂、AES(アクリロニトリル・エチレン・プロピレン・ジエンゴム-スチレン)樹脂等が挙げられる。 The spherical silica powder and the mixed powder of the present invention are used, for example, by blending them in a resin. Examples of the resin used in the present invention include polyamides such as polyethylene, polypropylene, epoxy resin, silicone resin, phenol resin, melamine resin, urea resin, unsaturated polyester, fluororesin, polyimide, polyamideimide, and polyetherimide. Polybutylene terephthalate, polyester such as polyethylene terephthalate, polyphenylene sulfide, total aromatic polyester, polysulfone, liquid crystal polymer, polyethersulfone, polycarbonate, maleimide modified resin, ABS resin, AAS (acrylonitrile-acrylic rubber / styrene) resin, AES (acrylonitrile) -Ethyl, propylene, diene rubber-styrene) resin and the like can be mentioned.
本発明の球状シリカ粉末及び混合粉末は、特に高周波用の基板材料や絶縁材料に用いる場合、本用途に用いられる公知の低誘電樹脂に配合して用いることができる。具体的には以下の樹脂中に配合し、必要に応じて架橋、硬化させて使用される。このような樹脂としては、例えば炭化水素系エラストマー、ポリフェニレンエーテル、芳香族ポリエン系樹脂から選ばれる一種以上を使用できる。この中では、炭化水素系エラストマー又はポリフェニレンエーテルが好ましい。球状シリカ粉末及び混合粉末とこれら樹脂の質量比は任意であるが、好ましくは5:95~80:20の範囲、さらに好ましくは5:95~70:30の範囲である。 The spherical silica powder and the mixed powder of the present invention can be blended with a known low-dielectric resin used for this application, particularly when used as a substrate material or an insulating material for high frequency. Specifically, it is blended in the following resins, crosslinked and cured as necessary, and used. As such a resin, for example, one or more selected from hydrocarbon-based elastomers, polyphenylene ethers, and aromatic polyene-based resins can be used. Among these, hydrocarbon-based elastomers or polyphenylene ethers are preferable. The mass ratio of the spherical silica powder and the mixed powder to these resins is arbitrary, but is preferably in the range of 5:95 to 80:20, more preferably in the range of 5:95 to 70:30.
<炭化水素系エラストマー>
炭化水素系エラストマーの中では、共役ジエン系重合体が好ましい。共役ジエン系重合体の中では、1,2-ポリブタジエンが好ましい。好適に用いることができる炭化水素系エラストマーは、数平均分子量は1000以上、好ましくは1万以上であってよい。炭化水素系エラストマーの例としては、エチレン系やプロピレン系のエラストマー、共役ジエン系重合体や芳香族ビニル化合物-共役ジエン系のブロック共重合体またはランダム共重合体、およびこれらの水素化物(水添物)から選ばれる単数または複数のエラストマーが挙げられる。エチレン系エラストマーとしては、エチレン-オクテン共重合体やエチレン-1-ヘキセン共重合体等のエチレン-αオレフィン共重合体、EPR、EPDMが挙げられる。プロピレン系エラストマーとしては、アタクティックポリプロピレン、低立体規則性のポリプロピレン、プロピレン-1-ブテン共重合体等のプロピレン-αオレフィン共重合体が挙げられる。
<Hydrocarbon elastomer>
Among the hydrocarbon-based elastomers, conjugated diene-based polymers are preferable. Among the conjugated diene-based polymers, 1,2-polybutadiene is preferable. The hydrocarbon-based elastomer that can be suitably used may have a number average molecular weight of 1000 or more, preferably 10,000 or more. Examples of hydrocarbon-based elastomers include ethylene-based and propylene-based elastomers, conjugated diene-based polymers and aromatic vinyl compounds-conjugated diene-based block copolymers or random copolymers, and hydrides thereof (hydrogenated. The one or more elastomers selected from the thing) can be mentioned. Examples of the ethylene-based elastomer include ethylene-α-olefin copolymers such as ethylene-octene copolymer and ethylene-1-hexene copolymer, EPR, and EPDM. Examples of the propylene-based elastomer include propylene-α-olefin copolymers such as atactic polypropylene, polypropylene with low stereoregularity, and propylene-1-butene copolymer.
<共役ジエン系重合体>
共役ジエン系重合体としては、ポリブタジエンや1,2-ポリブタジエンが挙げられる。芳香族ビニル化合物-共役ジエン系のブロック共重合体またはランダム共重合体、およびこれらの水素化物(水添物)としては、SBS、SIS、SEBS、SEPS、SEEPS、SEEBS等が例示できる。好適に用いることができる1,2-ポリブタジエンは、例えば、JSR株式会社の製品として入手できるほか、日本曹達株式会社から、液状ポリブタジエン:製品名B-1000、2000、3000の製品名で入手できる。また、好適に用いることができる1,2-ポリブタジエン構造を含む共重合体としては、TOTAL CRAY VALLEY社の「Ricon100」が例示できる。
<Conjugated diene polymer>
Examples of the conjugated diene polymer include polybutadiene and 1,2-polybutadiene. Examples of the aromatic vinyl compound-conjugated diene-based block copolymer or random copolymer, and hydrogenated products thereof (hydrogenates) include SBS, SIS, SEBS, SEPS, SEEPS, and SEEBS. The 1,2-polybutadiene that can be suitably used can be obtained, for example, as a product of JSR Corporation, or can be obtained from Nippon Soda Corporation under the product names of liquid polybutadiene: product names B-1000, 2000 and 3000. Further, as a copolymer containing a 1,2-polybutadiene structure that can be preferably used, "Ricon 100" manufactured by TOTAL CRAY VALLEY can be exemplified.
<ポリフェニレンエーテル>
ポリフェニレンエーテルとしては、市販の公知のポリフェニレンエーテルを用いることができる。ポリフェニレンエーテルの数平均分子量は任意であり、配合物の成形加工性を考慮すると数平均分子量は好ましくは1万以下、最も好ましくは5000以下である。また数平均分子量は好ましくは500以上であってよい。また、配合物の硬化を目的とした添加の場合、分子末端が変性されていることが好ましく、及び/または、一分子内に複数の官能基を有していることが好ましい。官能基としては、アリル基、ビニル基、エポキシ基等が挙げられる。官能基としては、ラジカル重合性の官能基が好ましい。ラジカル重合性の官能基としては、ビニル基が好ましい。ビニル基としては、(メタ)アクリル基や芳香族ビニル基が好ましい。さらに分子鎖の両末端がラジカル重合性の官能基で変性されている二官能性ポリフェニレンエーテルが特に好ましい。このようなポリフェニレンエーテルとしてはSABIC社のNoryl(商標)SA9000や三菱ガス化学社製二官能ポリフェニレンエーテルオリゴマー(OPE-2St)を用いることができる。
<Polyphenylene ether>
As the polyphenylene ether, a commercially available known polyphenylene ether can be used. The number average molecular weight of the polyphenylene ether is arbitrary, and the number average molecular weight is preferably 10,000 or less, most preferably 5,000 or less in consideration of the molding processability of the compound. The number average molecular weight may be preferably 500 or more. Further, in the case of addition for the purpose of curing the formulation, it is preferable that the molecular end is modified, and / or it is preferable that a plurality of functional groups are contained in one molecule. Examples of the functional group include an allyl group, a vinyl group, an epoxy group and the like. As the functional group, a radically polymerizable functional group is preferable. As the radically polymerizable functional group, a vinyl group is preferable. As the vinyl group, a (meth) acrylic group or an aromatic vinyl group is preferable. Further, bifunctional polyphenylene ethers in which both ends of the molecular chain are modified with radically polymerizable functional groups are particularly preferable. As such a polyphenylene ether, SABIC's Noryl ™ SA9000 or Mitsubishi Gas Chemical Company's bifunctional polyphenylene ether oligomer (OPE-2St) can be used.
<芳香族ポリエン系樹脂>
芳香族ポリエン系樹脂とは、日鉄ケミカル&マテリアル社製、ジビニルベンゼン系反応性多分岐共重合体(PDV)を包含する。このようなPDVは、例えば文献「多官能芳香族ビニル共重合体の合成とそれを用いた新規IPN型低誘電損失材料の開発」(川辺正直他、エレクトロニクス実装学会誌 p125、Vol.12 No.2(2009))に記載されている。また芳香族ポリエン系樹脂としては、上述した芳香族ポリエン単量体を主構成単位とする芳香族ポリエン重合体樹脂も挙げられる。
<Aromatic polyene resin>
The aromatic polyene-based resin includes a divinylbenzene-based reactive multi-branched copolymer (PDV) manufactured by Nittetsu Chemical & Materials Co., Ltd. For such PDV, for example, the document "Synthesis of polyfunctional aromatic vinyl copolymer and development of new IPN type low dielectric loss material using it" (Honest Kawabe et al., Journal of Electronics Packaging Society p125, Vol. 12 No. 2 (2009)). Further, examples of the aromatic polyene-based resin include the aromatic polyene polymer resin having the above-mentioned aromatic polyene monomer as a main constituent unit.
本発明の球状シリカ粉末及び混合粉末はこれら樹脂と共に、以下の架橋材や硬化剤を用い架橋、硬化させて使用することができる。架橋材としては、各種のマレイミド類、ビスマレイミド類、無水マレイン酸、グリシジル(メタ)アクリレート、グリシジル(メタ)アクリレート、トリアリルイソシアヌレート、トリ(メタ)アクリルイソシアヌレート、トリメチロールプロパントリ(メタ)アクリレート等が挙げられる。本発明に使用可能なマレイミド類、ビスマレイミド類は例えば国際公開2016/114287号に記載されており、例えば大和化成工業株式会社から購入できる。これらマレイミド基含有化合物は、有機溶媒への溶解性、高周波特性、導体との高接着性、プリプレグの成形性等の観点から、ポリアミノビスマレイミド化合物として用いてもよい。ポリアミノビスマレイミド化合物は、例えば、末端に2個のマレイミド基を有する化合物と分子中に2個の一級アミノ基を有する芳香族ジアミン化合物とをマイケル付加反応させることにより得られる。少量の添加で高い架橋効率を得ようとする場合、二官能基以上の多官能基を有する架橋材の使用が好ましく、ビスマレイミド類、トリアリルイソシアヌレート(TAIC)、トリメチロールプロパントリ(メタ)アクリレートが例示できる。架橋材の量は、前記樹脂100質量部に対し、0.1~30質量部、好ましくは0.1~10質量部の範囲であってよい。 The spherical silica powder and the mixed powder of the present invention can be crosslinked and cured by using the following crosslinking materials and curing agents together with these resins. As the cross-linking material, various maleimides, bismaleimides, maleic anhydride, glycidyl (meth) acrylate, glycidyl (meth) acrylate, triallyl isocyanurate, tri (meth) acrylic isocyanurate, trimethylolpropane tri (meth). Examples include acrylate. Maleimides and bismaleimides that can be used in the present invention are described in, for example, International Publication No. 2016/114287, and can be purchased from, for example, Daiwa Kasei Kogyo Co., Ltd. These maleimide group-containing compounds may be used as polyaminobismaleimide compounds from the viewpoints of solubility in an organic solvent, high frequency characteristics, high adhesiveness to a conductor, moldability of a prepreg, and the like. The polyaminobismaleimide compound is obtained, for example, by carrying out a Michael addition reaction between a compound having two maleimide groups at the terminal and an aromatic diamine compound having two primary amino groups in the molecule. When high cross-linking efficiency is to be obtained with a small amount of addition, it is preferable to use a cross-linking material having a polyfunctional group of two or more functional groups, such as bismaleimides, triallyl isocyanurate (TAIC), and trimethylolpropane tri (meth). An acrylate can be exemplified. The amount of the cross-linking material may be in the range of 0.1 to 30 parts by mass, preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the resin.
<硬化剤>
用いられる硬化剤としては、従来芳香族ポリエン、芳香族ビニル化合物の重合、又は硬化に使用できる公知の硬化剤を用いてよい。このような硬化剤には、ラジカル重合開始剤、カチオン重合開始剤、アニオン重合開始剤が例示できるが、好ましくはラジカル重合開始剤を用いることができる。好ましくは、有機過酸化物系(パーオキサイド)、アゾ系重合開始剤等であり、用途、条件に応じて自由に選択できる。有機過酸化物が掲載されたカタログは日油ホームページ、例えば
https://www.nof.co.jp/business/chemical/product01a.html
https://www.nof.co.jp/business/chemical/product01b.html
https://www.nof.co.jp/business/chemical/product01c.html
からダウンロ-ド可能である。また有機過酸化物は和光純薬社や東京化成工業社のカタログ等にも記載されている。本発明に用いられる硬化剤はこれらの会社より入手できる。また公知の光、紫外線、放射線を用いる光重合開始剤を硬化剤として用いることも出来る。光重合開始剤を用いる硬化剤としては、光ラジカル重合開始剤、光カチオン重合開始剤、または光アニオン重合開始剤が挙げられる。このような光重合開始剤は例えば東京化成工業株式会社から入手できる。さらに、放射線あるいは電子線そのものによる硬化も可能である。また、硬化剤を含まず、含まれる原料の熱重合による架橋、硬化を行うことも可能である。硬化剤の使用量に特に制限はないが、一般的には前記樹脂100質量部(硬化剤及び溶剤を除くことが好ましい)に対し、0.01~10質量部が好ましい。過酸化物系(パーオキサイド)、アゾ系重合開始剤等の硬化剤を用いる場合には、その半減期を考慮し、適切な温度、時間で硬化処理を行う。この場合の条件は、硬化剤に合わせて任意であるが、一般的には50℃から180℃程度の温度範囲が適当である。
<Curing agent>
As the curing agent to be used, a known curing agent that can be conventionally used for polymerization or curing of aromatic polyenes and aromatic vinyl compounds may be used. Examples of such a curing agent include a radical polymerization initiator, a cationic polymerization initiator, and an anionic polymerization initiator, and a radical polymerization initiator can be preferably used. Preferred are organic peroxide-based (peroxide), azo-based polymerization initiators, and the like, which can be freely selected depending on the intended use and conditions. Catalogs containing organic peroxides can be found on the NOF website, for example.
https://www.nof.co.jp/business/chemical/product01a.html
https://www.nof.co.jp/business/chemical/product01b.html
https://www.nof.co.jp/business/chemical/product01c.html
It is possible to download from. Organic peroxides are also listed in the catalogs of Wako Pure Chemical Industries, Ltd. and Tokyo Chemical Industry Co., Ltd. The curing agent used in the present invention is available from these companies. Further, a known photopolymerization initiator using light, ultraviolet rays, or radiation can also be used as a curing agent. Examples of the curing agent using the photopolymerization initiator include a photoradical polymerization initiator, a photocationic polymerization initiator, and a photoanionic polymerization initiator. Such a photopolymerization initiator can be obtained from, for example, Tokyo Chemical Industry Co., Ltd. Furthermore, it can be cured by radiation or the electron beam itself. Further, it is also possible to carry out cross-linking and curing by thermal polymerization of the contained raw materials without containing a curing agent. The amount of the curing agent used is not particularly limited, but generally 0.01 to 10 parts by mass is preferable with respect to 100 parts by mass of the resin (preferably excluding the curing agent and the solvent). When a curing agent such as a peroxide-based or azo-based polymerization initiator is used, the curing treatment is performed at an appropriate temperature and time in consideration of its half-life. The conditions in this case are arbitrary according to the curing agent, but generally, a temperature range of about 50 ° C. to 180 ° C. is suitable.
本発明の球状シリカ粉末及び混合粉末を、特に高周波用の基板材料や絶縁材料に用いる場合に用いる前記各種樹脂、架橋材、及び/または硬化剤などの組成物及びその硬化物については、例えば以下の特許に記載されている。特開平8―208856号公報、特開2017―75270号公報、特開2009-167268号公報、特開2011ー68713号公報、特開2018ー131519号公報、特表2016-534549号公報、特開2017ー57352号公報、WO2016―175325号国際公開パンフレット、WO2016―175326号国際公開パンフレット。 The compositions such as the various resins, cross-linking materials, and / or curing agents used when the spherical silica powder and mixed powder of the present invention are used as a substrate material or an insulating material for high frequency, and the cured product thereof are described below, for example. It is described in the patent of. Japanese Patent Application Laid-Open No. 8-208856, Japanese Patent Application Laid-Open No. 2017-75270, Japanese Patent Application Laid-Open No. 2009-167268, Japanese Patent Application Laid-Open No. 2011-678713, Japanese Patent Application Laid-Open No. 2018-1315119, Japanese Patent Application Laid-Open No. 2016-534549, Japanese Patent Application Laid-Open No. 2017-573352 Gazette, WO2016-175325 International Pamphlet, WO2016-175326 International Pamphlet.
樹脂中における球状シリカ粉末及び混合粉末の割合は、目標とする誘電率や誘電正接等の物性に応じて適宜選択される。例えば、樹脂の使用量は、球状シリカ粉末100質量部に対して、10~10000質量部の範囲で適宜選択される。樹脂の密度を1.2g/cm3とすると、樹脂の体積比率は1.8~94.3%の範囲で適宜選択される。 The ratio of the spherical silica powder and the mixed powder in the resin is appropriately selected according to the physical properties such as the target dielectric constant and the dielectric loss tangent. For example, the amount of the resin used is appropriately selected in the range of 10 to 10000 parts by mass with respect to 100 parts by mass of the spherical silica powder. Assuming that the density of the resin is 1.2 g / cm 3 , the volume ratio of the resin is appropriately selected in the range of 1.8 to 94.3%.
本実施形態の球状シリカ粉末を樹脂中に配合することにより、粉末配合後の樹脂シートの誘電正接を低くすることができる。また、本実施形態の球状シリカ粉末を配合した樹脂シートは、低粘度であるため流動性がよく、成形性に優れている。 By blending the spherical silica powder of the present embodiment in the resin, the dielectric loss tangent of the resin sheet after the powder blending can be lowered. Further, the resin sheet containing the spherical silica powder of the present embodiment has a low viscosity, so that it has good fluidity and excellent moldability.
以下、実施例により本発明をより具体的に説明するが、本発明は実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to the Examples.
[原料シリカ粉末1]
球状シリカ(デンカ社製:FB-5D、比表面積2.3m2/g)を加熱処理せずにそのまま、後述の実施例1と同様に評価を行った。評価結果を表1に示す。なお、原料シリカ粉末1の樹脂シートの誘電正接は、樹脂にポリエチレン(PE)を使用した場合は8.0×10-4、ポリプロピレン(PP)を使用した場合は6.1×10-4であった。
[Raw material silica powder 1]
Spherical silica (manufactured by Denka Co., Ltd .: FB-5D, specific surface area 2.3 m 2 / g) was evaluated as it was without heat treatment in the same manner as in Example 1 described later. The evaluation results are shown in Table 1. The dielectric loss tangent of the resin sheet of the raw material silica powder 1 is 8.0 × 10 -4 when polyethylene (PE) is used as the resin, and 6.1 × 10 -4 when polypropylene (PP) is used. there were.
[原料シリカ粉末2]
球状シリカ(デンカ社製:SFP-30M、比表面積6.0m2/g)を加熱処理せずにそのまま、後述の実施例1と同様に評価を行った。評価結果を表1に示す。なお、原料シリカ粉末2の樹脂シート(PE)の誘電正接は、1.4×10-3であった。
[Raw material silica powder 2]
Spherical silica (manufactured by Denka: SFP-30M, specific surface area of 6.0 m 2 / g) was evaluated as it was without heat treatment in the same manner as in Example 1 described later. The evaluation results are shown in Table 1. The dielectric loss tangent of the resin sheet (PE) of the raw material silica powder 2 was 1.4 × 10 -3 .
[実施例1]
原料シリカとして、原料シリカ粉末1(デンカ社製:FB-5D、比表面積2.3m2/g)を50g、石英ガラス製円筒容器に入れ、円筒容器をムライト製のロータリーキルン内に充填し、窒素雰囲気にてロータリーキルン内温度900℃にて2時間加熱処理した。加熱処理後、炉内が200℃以下になるまで冷却し、真空乾燥機(120℃-133Pa未満環境下)にて24時間乾燥させた。各種評価の直前までアルミパック(PET/AL/PEラミネート袋:生産日本社製)のスタンドパック内で保存した。評価結果を表2に示す。なお、樹脂シート(PE)の誘電正接は、4.7×10-4であった。
[Example 1]
As the raw material silica, 50 g of the raw material silica powder 1 (manufactured by Denka: FB-5D, specific surface area 2.3 m 2 / g) is placed in a quartz glass cylindrical container, and the cylindrical container is filled in a mulite rotary kiln, and nitrogen is used. In the atmosphere, the rotary kiln was heat-treated at a temperature of 900 ° C. for 2 hours. After the heat treatment, the inside of the furnace was cooled to 200 ° C. or lower, and dried in a vacuum dryer (in an environment of less than 120 ° C.-133 Pa) for 24 hours. It was stored in a stand pack of an aluminum pack (PET / AL / PE laminated bag: manufactured by Japan) until just before various evaluations. The evaluation results are shown in Table 2. The dielectric loss tangent of the resin sheet (PE) was 4.7 × 10 -4 .
[実施例2、3]
加熱処理温度と時間を表2の通りにした以外は、実施例1と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Examples 2 and 3]
The heat treatment and evaluation were carried out in the same manner as in Example 1 except that the heat treatment temperature and time were as shown in Table 2. The evaluation results are shown in Table 2.
[実施例4]
原料シリカとして、原料シリカ粉末1(デンカ社製:FB-5D、比表面積2.3m2/g)を50g、石英ガラス製円筒容器に入れ、円筒容器をムライト製のロータリーキルン内に充填し、窒素雰囲気にてロータリーキルン内温度900℃にて2時間加熱処理した。加熱処理後、炉内が200℃以下になるまで冷却し、真空乾燥機(120℃-133Pa未満環境下)にて24時間乾燥させた。回収した試料100質量部に対して、表面処理剤として、ヘキサメチルジシラザン(信越シリコーン社製、SZ-31;HMDS)を1質量部添加した。添加した粉末をResodyn社製振動式ミキサーにて混合し、真空乾燥機(120℃-133Pa未満環境下)にて24時間乾燥させ、各種評価の直前まで実施例1と同様にアルミパック内で保存した。評価は、実施例1と同様に行った。評価結果を表2に示す。
[Example 4]
As the raw material silica, 50 g of the raw material silica powder 1 (manufactured by Denka: FB-5D, specific surface area 2.3 m 2 / g) is placed in a quartz glass cylindrical container, and the cylindrical container is filled in a mulite rotary kiln, and nitrogen is used. In the atmosphere, the rotary kiln was heat-treated at a temperature of 900 ° C. for 2 hours. After the heat treatment, the inside of the furnace was cooled to 200 ° C. or lower, and dried in a vacuum dryer (in an environment of less than 120 ° C.-133 Pa) for 24 hours. To 100 parts by mass of the recovered sample, 1 part by mass of hexamethyldisilazane (SZ-31; HMDS, manufactured by Shinetsu Silicone Co., Ltd.) was added as a surface treatment agent. The added powder is mixed with a vibration mixer manufactured by Resodyn, dried in a vacuum dryer (in an environment of less than 120 ° C.-133 Pa) for 24 hours, and stored in an aluminum pack in the same manner as in Example 1 until just before various evaluations. did. The evaluation was carried out in the same manner as in Example 1. The evaluation results are shown in Table 2.
[実施例5]
表面処理剤として、ビニルトリメトキシシラン(信越シリコーン社製、KBM-1003;ビニル)とした以外は実施例4と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Example 5]
Heat treatment and evaluation were carried out in the same manner as in Example 4 except that vinyltrimethoxysilane (KBM-1003; vinyl manufactured by Shinetsu Silicone Co., Ltd.) was used as the surface treatment agent. The evaluation results are shown in Table 2.
[実施例6]
原料シリカを原料シリカ粉末2(デンカ社製:SFP-30M、比表面積6.0m2/g)とした以外は、実施例1と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Example 6]
Heat treatment and evaluation were carried out in the same manner as in Example 1 except that the raw material silica was the raw material silica powder 2 (manufactured by Denka Co., Ltd .: SFP-30M, specific surface area 6.0 m 2 / g). The evaluation results are shown in Table 2.
[実施例7]
誘電特性の評価時にポリプロピレン粉末を使用した以外は、実施例1と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Example 7]
Heat treatment and evaluation were carried out in the same manner as in Example 1 except that polypropylene powder was used in the evaluation of the dielectric property. The evaluation results are shown in Table 2.
[実施例8]
原料シリカとして、原料シリカ粉末1(デンカ社製:FB-5D、比表面積2.3m2/g)を50g、アルミナ坩堝入れ、富士電波工業製ハイマルチ(カーボン炉)、窒素雰囲気にて電気炉内温度1000℃-4時間加熱処理した。加熱処理後、炉内が200℃以下になるまで冷却し、真空乾燥機(120℃-133Pa未満環境下)にて24時間乾燥させた。各種評価の直前までアルミパック(PET/AL/PEラミネート袋:生産日本社製)のスタンドパック内で保存した。評価結果を表2に示す。
[Example 8]
As raw material silica, 50 g of raw material silica powder 1 (manufactured by Denka: FB-5D, specific surface area 2.3 m 2 / g), an alumina crucible, high mulch (carbon furnace) manufactured by Fuji Denpa Kogyo, electric furnace in a nitrogen atmosphere. Internal temperature 1000 ° C.-4 hours heat treatment. After the heat treatment, the inside of the furnace was cooled to 200 ° C. or lower, and dried in a vacuum dryer (in an environment of less than 120 ° C.-133 Pa) for 24 hours. It was stored in a stand pack of an aluminum pack (PET / AL / PE laminated bag: manufactured by Japan) until just before various evaluations. The evaluation results are shown in Table 2.
[実施例9]
原料シリカを原料シリカ粉末2(デンカ社製:SFP-30M、比表面積6.0m2/g)とし加熱温度と雰囲気を表2の通りにした以外は、実施例8と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Example 9]
Heat treatment and evaluation were performed in the same manner as in Example 8 except that the raw material silica was the raw material silica powder 2 (manufactured by Denka: SFP-30M, specific surface area 6.0 m 2 / g) and the heating temperature and atmosphere were as shown in Table 2. Was done. The evaluation results are shown in Table 2.
[実施例10]
加熱処理温度と時間と雰囲気を表2の通りにした以外は、実施例9と同様に加熱処理および評価を行った。評価結果を表2に示す。
[Example 10]
The heat treatment and evaluation were carried out in the same manner as in Example 9 except that the heat treatment temperature, time and atmosphere were as shown in Table 2. The evaluation results are shown in Table 2.
[比較例1~4]
加熱処理温度、時間、原料シリカ粉末、雰囲気を表3の通りにした以外は、実施例1と同様に加熱処理および評価を行った。評価結果を表3に示す。
[Comparative Examples 1 to 4]
The heat treatment and evaluation were carried out in the same manner as in Example 1 except that the heat treatment temperature, time, raw material silica powder, and atmosphere were as shown in Table 3. The evaluation results are shown in Table 3.
各試料の特性を、以下の方法で評価した。各評価結果を表1~3に示す。 The characteristics of each sample were evaluated by the following method. The evaluation results are shown in Tables 1 to 3.
[平均円形度]
粉末をカーボンテープで試料台に固定後、オスミウムコーティングを行い、走査型電子顕微鏡(日本電子社製、JSM-7001F SHL)で撮影した倍率500~50000倍、解像度1280×1024ピクセルの画像をパソコンに取り込んだ。この画像を、画像解析装置(日本ローパー社製、Image-Pro Premier Ver.9.3)を使用し、粒子(粉末粒子)の投影面積(S)と粒子の投影周囲長(L)を算出してから、下記の式(1)より円形度を算出した。原料シリカがFB-5Dの場合1~10μm、原料シリカSFP-30Mの場合、0.2~1μmの任意の粒子200個について円形度を算出し、その平均値を平均円形度とした。
円形度=4πS/L2 ・・・式(1)
[Average circularity]
After fixing the powder to the sample table with carbon tape, osmium coating is applied, and an image with a magnification of 500 to 50,000 times and a resolution of 1280 x 1024 pixels taken with a scanning electron microscope (JSM-7001F SHL manufactured by JEOL Ltd.) is transferred to a personal computer. I took it in. Using an image analysis device (Image-Pro Premier Ver. 9.3, manufactured by Nippon Roper Co., Ltd.), the projected area (S) of the particles (powder particles) and the projected peripheral length (L) of the particles were calculated for this image. Then, the circularity was calculated from the following equation (1). When the raw material silica was FB-5D, the circularity was calculated for 1 to 10 μm, and when the raw material silica was SFP-30M, the circularity was calculated for 200 arbitrary particles of 0.2 to 1 μm, and the average value was taken as the average circularity.
Circularity = 4πS / L 2 ... Equation (1)
[密度]
粉末1.2gを測定用試料セルに入れ、乾式密度計(島津製作所社製「アキュピックII1340」)を用い、気体(ヘリウム)置換法により測定した。
[density]
1.2 g of the powder was placed in a sample cell for measurement, and measured by a gas (helium) substitution method using a dry densitometer (“Accupic II 1340” manufactured by Shimadzu Corporation).
[比表面積]
測定用セルに試料を1g充填し、Mountech社製 Macsorb HM model-1201全自動比表面積系測定装置(BET一点法)により比表面積を測定した。測定前の脱気条件は、200℃-10分とした。吸着ガスは窒素とした。
[Specific surface area]
The measurement cell was filled with 1 g of a sample, and the specific surface area was measured by a Maxorb HM model-1201 fully automatic specific surface area measuring device (BET one-point method) manufactured by Muntech. The degassing condition before the measurement was 200 ° C. for 10 minutes. The adsorbed gas was nitrogen.
[B/A]
B(水素結合性シラノール基)とA(孤立シラノール基)の積分強度比は、フーリエ変換型赤外分光光度計(PerkinElmer社製Frontier型赤外分光装置)を用いて、大気雰囲気下で拡散反射法による測定(分解能8.0cm-1、積算回数32回)を行い、得られた拡散反射スペクトルから、3800-2875cm-1の間にベースラインを引き、3735cm-1~3755cm-1の孤立シラノール基ピーク強度、3660cm-1~3680cm-1の水素結合性シラノール基ピーク強度をそれぞれ算出し、そのピーク強度比を求めた。
[B / A]
The integrated intensity ratio of B (hydrogen-binding silanol group) and A (isolated silanol group) is diffusely reflected in an atmospheric atmosphere using a Fourier transform infrared spectrophotometer (Frontier infrared spectroscope manufactured by PerkinElmer). Measurements by the method (resolution 8.0 cm -1 , integration count 32 times) were performed, and a baseline was drawn between 3800-2875 cm -1 from the obtained diffuse reflection spectrum, and 3735 cm -1 to 3755 cm -1 isolated silanol. The group peak intensity and the hydrogen-binding silanol group peak intensity of 3660 cm -1 to 3680 cm -1 were calculated, respectively, and the peak intensity ratio was determined.
[脱離水分量]
昇温脱離ガス分析装置(電子科学製 EMD-WA1000S/W;TDS)を用い、上部熱電対の温度において、25℃から30℃/minで1000℃まで大気雰囲気下で昇温し、得られたマスクロマトグラム(m/z=18)の500℃~1000℃範囲における面積値から、H2O脱離分子数を算出した。石英試料皿に、カーボンシート、試料粉末(10mg)、カーボンシートの順で載せた状態で、測定を行った。
[Amount of desorbed water]
Obtained by raising the temperature of the upper thermocouple from 25 ° C to 30 ° C / min to 1000 ° C in an atmospheric atmosphere using a temperature-raising desorption gas analyzer (EMD-WA1000S / W; TDS manufactured by Electronic Science). The number of H2O desorbed molecules was calculated from the area value of the mass chromatogram (m / z = 18) in the range of 500 ° C. to 1000 ° C. The measurement was performed with the carbon sheet, the sample powder (10 mg), and the carbon sheet placed in this order on the quartz sample dish.
[誘電特性の評価]
加熱処理後の球状シリカ粉末の充填量が40体積%になるように、球状シリカ粉末及び、ポリエチレン(PE)粉末(住友精化社製フローセンUF-20S)またはポリプロピレン(PP)粉末(住友精化社製フローブレンQB200)を計量し、Resodyn社製振動式ミキサーにて混合した(加速度60g, 処理時間2分)。得られた混合粉末を所定体積分(厚さが0.3 mmになるように)計量し、直径3cmの金枠内に入れ、熱プレス機(井元製作所社製「IMC-1674-A型」)にてPEの場合、140℃, 10MPa, 15分、PPの場合、190℃, 10MPa, 60分にてシート化し評価試料とした。評価試料のシートの厚さは0.3mmであり、形状やサイズは測定器に搭載できれば、評価結果に影響しないが、1.5cm角である。
[Evaluation of dielectric properties]
Spherical silica powder and polyethylene (PE) powder (Frosen UF-20S manufactured by Sumitomo Seika Chemical Co., Ltd.) or polypropylene (PP) powder (Sumitomo Seika Chemical Co., Ltd.) so that the filling amount of the spherical silica powder after heat treatment is 40% by volume. Flowbren QB200 manufactured by Co., Ltd.) was weighed and mixed with a vibration mixer manufactured by Resodyn (acceleration 60 g, processing time 2 minutes). The obtained mixed powder is weighed in a predetermined volume (so that the thickness is 0.3 mm), placed in a metal frame with a diameter of 3 cm, and placed in a heat press machine (“IMC-1674-A type” manufactured by Imoto Seisakusho Co., Ltd.”. ) At 140 ° C., 10 MPa, 15 minutes for PE, and 190 ° C., 10 MPa, 60 minutes for PP, and used as an evaluation sample. The thickness of the sheet of the evaluation sample is 0.3 mm, and the shape and size are 1.5 cm square, although it does not affect the evaluation result if it can be mounted on the measuring instrument.
誘電特性の測定は、36GHz空洞共振器(サムテック社製)をベクトルネットワークアナライザ(85107、キーサイトテクノロジー社製)に接続し、試料(1.5cm角、厚さ0.3mm)を共振器に設けられた直径10mmの穴をふさぐようセットし、共振周波数(f0)、無負荷Q値(Qu)を測定した。測定ごとにサンプルを回転させ、同様に測定を5回繰り返し、得られたf0、Quの平均をとって測定値とした。f0より誘電率、Quより誘電正接を解析ソフト(サムテック社製ソフトウェア)にて算出した。測定温度は20℃、湿度は60%RHであった。
また、原料球状シリカ粉末1および2を樹脂に配合して測定した樹脂シートの誘電正接をa、実施例および比較例の球状シリカ粉末を樹脂に配合して測定した樹脂シートの誘電正接をbとし、式(2)から樹脂シート自体の誘電正接の低減率(%)を求めた。
樹脂シート自体の誘電正接の低減率(%)={1-(b/a)}×100 ・・・式(2)
To measure the dielectric characteristics, a 36 GHz hollow resonator (manufactured by Samtec) is connected to a vector network analyzer (85107, manufactured by KeySight Technology), and a sample (1.5 cm square, thickness 0.3 mm) is provided in the resonator. The hole having a diameter of 10 mm was set to be closed, and the resonance frequency (f0) and the no-load Q value (Qu) were measured. The sample was rotated for each measurement, and the measurement was repeated 5 times in the same manner, and the average of the obtained f0 and Qu was taken and used as the measured value. The permittivity was calculated from f0, and the dielectric loss tangent was calculated from Qu using analysis software (software manufactured by Samtec). The measured temperature was 20 ° C. and the humidity was 60% RH.
Further, the dielectric loss tangent of the resin sheet measured by blending the raw material spherical silica powders 1 and 2 with the resin is defined as a, and the dielectric loss tangent of the resin sheet measured by blending the spherical silica powders of Examples and Comparative Examples with the resin is defined as b. , The reduction rate (%) of the dielectric loss tangent of the resin sheet itself was obtained from the formula (2).
Reduction rate of dielectric loss tangent of the resin sheet itself (%) = {1- (b / a)} × 100 ... Equation (2)
実施例1~10の球状シリカ粉末を含有する樹脂シートは、比較例1~4の球状シリカ粉末を含有する樹脂シートと比較して、誘電正接がより低く抑えられるという結果になった。 The results show that the resin sheets containing the spherical silica powders of Examples 1 to 10 have a lower dielectric loss tangent than the resin sheets containing the spherical silica powders of Comparative Examples 1 to 4.
本発明の球状シリカ粉末は、樹脂材料に充填した場合に、従来の球状シリカと比較して基材の誘電正接を低くすることができるフィラーとして利用可能である。 The spherical silica powder of the present invention can be used as a filler capable of lowering the dielectric loss tangent of the base material as compared with the conventional spherical silica when filled in a resin material.
Claims (3)
表面処理する前の球状シリカ粉末において、拡散反射FT-IR法にて測定したシリカ粉末の波数3735cm-1~3755cm-1のピーク強度をA、波数3660cm-1~3680cm-1のピーク強度をBとしたとき、B/Aが3.0以下であり、
平均円形度が0.85以上であることを特徴とする球状シリカ粉末。 When the temperature is raised from 25 ° C to 30 ° C / min to 1000 ° C, the number of water molecules desorbed at 500 ° C to 1000 ° C is 0.010 mmol / g or less, and the specific surface area is 1 to 30 m 2 /. g,
In the spherical silica powder before surface treatment, the peak intensity of the silica powder with a wave number of 3735 cm -1 to 3755 cm -1 measured by the diffuse reflection FT-IR method is A, and the peak intensity of a wave number of 3660 cm -1 to 3680 cm -1 is B. When, B / A is 3.0 or less,
A spherical silica powder having an average circularity of 0.85 or more.
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| WO2017188301A1 (en) | 2016-04-28 | 2017-11-02 | 株式会社アドマテックス | Crystalline silica particle material and method for manufacturing same, slurry composition containing crystalline silica particle material, and resin composition containing crystalline silica particle material |
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| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |