JP7031395B2 - Cleaning mechanism and cleaning method - Google Patents

Description

The present invention relates to a cleaning mechanism for cleaning a tool or work used for machining, and a method for cleaning the tool or work.

Machine tools perform a wide variety of machining by automatically changing tools. The machine tool is equipped with a tool storage and a tool changer. The tool storage unit stores multiple types of tools while holding them in the tool holder, and sends out the necessary tools to the replacement position. The tool changer receives the tool at the change position, then conveys the tool to be mounted on the spindle to the change position, and attaches the tool to the spindle of the machine tool.

The spindle is located inside the processing chamber. Chips generated by processing exist inside the processing chamber. Chips may adhere to the tool holder before it is mounted on the spindle. In this case, the tool cannot be correctly positioned with respect to the spindle due to the influence of chips. For example, the tool rotates in an eccentric state, and the machining accuracy is lowered. If the amount of chips adhered is large, the tool cannot be attached to the spindle.

In order to solve such a problem, the machine tool is equipped with a tool cleaning device that cleans the tool using a cleaning liquid (cleaning liquid). The tool cleaning device ejects cleaning liquid to the inside and outside of the tool during machining work and tool replacement. This will wash away the chips adhering to the tool.

For example, in Patent Document 1, a storage unit is provided in the middle of the cleaning liquid passage connecting the cleaning liquid tank and the injection nozzle, and the injection nozzle ejects the cleaning liquid temporarily stored in the storage unit to stabilize a large amount of cleaning liquid under a small resistance. Discloses a tool cleaning device that can be ejected and can clean tools well in a short time.

Japanese Unexamined Patent Publication No. 2011-25398

However, in the tool cleaning device of Patent Document 1, the cleaning liquid in the cleaning liquid tank is a dirty cleaning liquid containing chips, and there arises a problem that the filter that filters the cleaning liquid flowing from the cleaning liquid tank to the injection nozzle and the storage portion is immediately clogged. ..

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a cleaning mechanism and a cleaning method capable of preventing clogging of a filter while making the apparatus compact.

The cleaning mechanism according to the present invention stores a first tank for storing the cleaning liquid used for machining, a first filter for filtering the cleaning liquid from the first tank, and a cleaning liquid for tool cleaning filtered by the first filter. In a cleaning mechanism including a storage tank, a second tank that stores cleaning liquid that is cleaner than the first tank, a pump that sends the cleaning liquid in the first tank to the first filter side, the first filter, and the above. It is characterized by including a second filter located between the pumps and a first flow path for sending the cleaning liquid filtered by the second filter to the second tank.

In the present invention, the cleaning liquid in the first tank flows through the first filter after undergoing a primary filtration treatment in the second filter. Therefore, clogging of the first filter can be prevented.
Further, the cleaning liquid filtered by the second filter flows to the second tank via the first flow path. Therefore, the cleaning liquid filtered by the second filter can be selectively sent to the storage tank or the second tank, if necessary. Therefore, since the first filter does not filter the cleaning liquid flowing to the second tank, clogging of the first filter can be reduced and the frequency of replacement of the first filter can be reduced.

The cleaning mechanism according to the present invention is arranged in the first valve arranged in the first flow path, the second flow path for discharging excess cleaning liquid in the storage tank from the storage tank, and the second flow path. It is characterized by being provided with a second valve.

In the present invention, the cleaning liquid filtered by the second filter is discharged from the storage tank or sent to the second tank by appropriately controlling the opening and closing of the first valve and the second valve. Can be done.

The cleaning mechanism according to the present invention is characterized in that the first valve is closed when the second valve is open, and the second valve is opened when the second valve is closed.

In the present invention, since the first valve and the second valve are configured to perform opening and closing operations opposite to each other, control is not required for each, and the first valve and the second valve are used. It can be controlled collectively, and the configuration of the cleaning mechanism can be made compact.

The cleaning mechanism according to the present invention is characterized by comprising a valve control unit that controls to open the first valve and close the second valve when the storage tank stores a predetermined amount of cleaning liquid. ..

In the present invention, for example, when the storage tank stores a predetermined amount of cleaning liquid required for tool cleaning, the valve control unit opens the first valve and closes the second valve. I do. After that, the cleaning liquid filtered by the second filter does not flow to the storage tank but flows to the second tank, so that the second tank can be replenished.

The cleaning mechanism according to the present invention is characterized by comprising a valve control unit that controls to close the first valve and open the second valve after cleaning the tool.

In the present invention, when the tool cleaning is completed, the valve control unit controls to close the first valve and open the second valve. After that, the cleaning liquid filtered by the second filter does not flow to the second tank but flows to the storage tank, so that the storage tank can be replenished.

The cleaning mechanism according to the present invention is characterized in that the second flow path discharges excess cleaning liquid from the storage tank to the second tank.

In the present invention, since the second flow path sends the excess cleaning liquid discharged from the storage tank to the second tank, it is used for replenishing the second tank. Therefore, the clean cleaning liquid stored in the storage tank can be effectively used.

The cleaning mechanism according to the present invention is characterized by including a delay portion that delays the operation of the first valve.

In the present invention, since the delay portion delays the operation of the first valve, the first valve and the second valve perform opening and closing operations opposite to each other, but are closed together for a certain period of time, for example. It becomes the state of. At this time, the internal pressure of the storage tank is increased, and the pressure of the tool cleaning cleaning liquid flowing out of the storage tank can be increased.

The cleaning mechanism according to the present invention is characterized in that the first valve is an air valve operated by pneumatic pressure, and the delay portion includes a speed control valve.

In the present invention, the delay portion includes a speed control valve, and the operation of the first valve can be delayed by reducing the air pressure applied to the first valve by the speed control valve.

The cleaning method according to the present invention stores a first tank for storing the cleaning liquid used for machining, a first filter for filtering the cleaning liquid from the first tank, and a cleaning liquid for tool cleaning filtered by the first filter. Located between the storage tank, the second tank that stores the cleaning liquid that is cleaner than the first tank, the pump that sends the cleaning liquid in the first tank to the first filter side, and the first filter and the pump. A second filter to be used, a first flow path for sending the cleaning liquid filtered by the second filter to the second tank, a first valve arranged in the first flow path, and an excess cleaning liquid in the storage tank. In the cleaning method in a cleaning mechanism including a second flow path discharged from the storage tank and a second valve arranged in the second flow path, when the storage tank stores a predetermined amount of cleaning liquid, the first It is characterized in that one valve is opened and the second valve is closed.

In the present invention, for example, when the storage tank stores a predetermined amount of cleaning liquid required for tool cleaning, the first valve is opened and the second valve is closed. After that, the cleaning liquid filtered by the second filter does not flow to the storage tank but flows to the second tank, so that the second tank can be replenished.

The cleaning method according to the present invention stores a first tank for storing the cleaning liquid used for machining, a first filter for filtering the cleaning liquid from the first tank, and a cleaning liquid for tool cleaning filtered by the first filter. Located between the storage tank, the second tank that stores the cleaning liquid that is cleaner than the first tank, the pump that sends the cleaning liquid in the first tank to the first filter side, and the first filter and the pump. A second filter to be used, a first flow path for sending the cleaning liquid filtered by the second filter to the second tank, a first valve arranged in the first flow path, and an excess cleaning liquid in the storage tank. In a cleaning method in a cleaning mechanism including a second flow path discharged from the storage tank and a second valve arranged in the second flow path, the first valve is closed after cleaning the tool, and the second valve is closed. It is characterized by opening the valve.

In the present invention, when the tool cleaning is completed, the first valve is closed and the second valve is opened. After that, the cleaning liquid filtered by the second filter does not flow to the second tank but flows to the storage tank, so that the storage tank can be replenished.

According to the present invention, it is possible to prevent the first filter from being clogged while making the cleaning mechanism compact.

It is a partial perspective view of the machine tool provided with the conventional cleaning mechanism. It is a block diagram of the main part of the cleaning mechanism which concerns on Embodiment 1. FIG. It is a functional block diagram which shows the composition of the main part of the control part of the cleaning mechanism which concerns on Embodiment 1. FIG. It is a flowchart explaining an example of the processing of the control part in the cleaning mechanism which concerns on Embodiment 1. FIG. It is a block diagram of the main part of the cleaning mechanism which concerns on Embodiment 2. FIG. It is a block diagram of the main part of the cleaning mechanism which concerns on Embodiment 3. FIG.

(Embodiment 1)
FIG. 1 is a partial perspective view of a machine tool provided with a conventional cleaning mechanism.

The machine tool 100 provided with the conventional cleaning mechanism is provided with a control box 3 and a column 4 on a base 2 supported on a floor surface. The operator operates the machine tool 100 from the front (front). The column 4 is a support column that stands vertically in the center of the rear part of the base 2 in the left-right direction. The machine tool 100 is provided with a processing chamber 40 on the front side of the column 4. The processing chamber 40 is provided with a processing table that can be moved back and forth and left and right inside. The machine tool 100 processes a work on a processing table.

Column 4 supports a spindle head (not shown) in the front portion. The spindle head is equipped with an automatic tool changer (not shown) and rises and falls along column 4. The automatic tool changer is equipped with a tool storage and a tool changer. The tool exchange mechanism automatically exchanges any one of the plurality of tools held by the tool storage unit.

The control box 3 is attached to the rear side of the column 4. The control box 3 houses a control unit (not shown) inside. The control unit controls the machine tool 100, such as machining work and automatic tool change.

As shown in FIG. 1, the machine tool 100 includes a cleaning liquid unit 10. The cleaning liquid unit 10 includes a tank 11, a recovery tank 12, a pump 13, a pump 14, and a pump 60 (second pump). The tank 11 is a box-shaped container and stores the cleaning liquid to be supplied into the processing chamber 40. The recovery tank 12, the pump 13, the pump 14 and the pump 60 are installed on the tank 11.

The cleaning liquid unit 10 can be attached to and detached from the rear side of the base 2. The recovery tank 12 collects the used cleaning liquid. The recovery tank 12 includes a primary filter for primary filtering the recovered cleaning liquid. The primary filter is plate-shaped and has innumerable fine holes. The contaminated tank is located below the primary filter. The contaminated tank stores the cleaning liquid that has been filtered by the primary filter. The tank 11 includes a contaminated tank.

The tank 11 includes a semi-separation tank in addition to the contaminated tank. The contaminated tank and the quasi-septic tank are next to each other. The cleaning liquid stored in the contaminated tank flows into the semi-separation tank after being filtered by a pair of filters. In the pair of filters, two filters face each other with a predetermined interval, and each filter has a plate shape having innumerable holes smaller than the above-mentioned primary filter.

The pump 13, the pump 14, and the pump 60 suck up the cleaning liquid in the tank 11 and send it out to the processing chamber 40. The pump 13 is a cleaning pump. The processing chamber 40 is provided with a cleaning liquid nozzle (not shown) on the inner wall, and the discharge side of the pump 13 is connected to the cleaning liquid nozzle. The pump 13 sucks up the cleaning liquid in the tank 11 (quasi-separation tank) and injects it into the processing chamber 40 from the cleaning liquid nozzle. The cleaning liquid flushes the chips in the processing chamber 40 to the tank 11 (contaminated tank).

The pump 14 is a pump for cleaning liquid. The processing chamber 40 is provided with a cleaning nozzle (not shown) inside, and the discharge side of the pump 14 is connected to such a cleaning nozzle. The pump 14 sucks up the cleaning liquid in the tank 11 (quasi-separation tank) and sends it to the cleaning filter 141. The cleaning filter 141 performs a filtration treatment on the cleaning liquid. The cleaning liquid that has undergone the filtration treatment of the cleaning filter 141 is temporarily stored in the storage tank 50 and sent to the cleaning nozzle in the processing chamber 40 when cleaning the tools. The cleaning nozzle in the processing chamber 40 sprays the cleaning liquid from the storage tank 50 onto the tool being replaced. The cleaning liquid washes away chips adhering to the tool before it is attached to the spindle.

The pump 60 is a pump that serves as both a cooling liquid and a cleaning liquid. The pump 60 sucks up the cleaning liquid in the tank 11 (quasi-separation tank) and sends it out to the processing chamber 40. The discharge side of the pump 60 opens to the tip of the tool through the flow path inside the tool. The pump 60 sucks up the cleaning liquid in the tank 11 (quasi-separation tank) and injects it from the tip of the tool being machined toward the work surface of the work. The cleaning liquid cools the tool and workpiece being machined.

If the cleaning liquid is used repeatedly for a long time, the cleaning liquid becomes very dirty, so it is not desirable to use the cleaning liquid in the tank 11 as it is for cleaning the tool. Generally, a filter is arranged between the pump and the nozzle on the discharge side, and the filtration process is performed again. For example, in the machine tool 100, the cleaning liquid is sent to the nozzle on the discharge side via the cleaning filter 141. However, since the cleaning liquid containing chips is sucked up, a failure is likely to occur on the pump side as well. Clogging is also likely to occur in a filter that filters a cleaning liquid containing chips.

The present invention provides a cleaning mechanism capable of solving such a problem. Hereinafter, the cleaning mechanism according to the first embodiment will be described with reference to the drawings.

FIG. 2 is a configuration diagram of a main part of the cleaning mechanism 1 according to the first embodiment. Hereinafter, the same parts as those of the conventional cleaning mechanism described above are designated by the same reference numerals, and the description thereof will be omitted.

The cleaning mechanism 1 according to the first embodiment includes a tank 11, a pump 14 (first pump), and a pump 60 (second pump). The tank 11 has a first tank 111 and a second tank 110. The first tank 111 corresponds to a semi-separation tank of the machine tool 100, and may be a contaminated tank of the machine tool 100.

The first tank 111 stores the used dirty cleaning liquid, and the second tank 110 stores the high-precision cleaning liquid described later, which is obtained by filtering the cleaning liquid of the first tank 111. The second tank 110 stores a cleaning liquid that is cleaner than the first tank 111.

The cleaning mechanism 1 temporarily performs a filtration process before sending the cleaning liquid in the first tank 111 to the first filter 66. The first filter 66 corresponds to the cleaning filter 141 of the cleaning mechanism 1. Thereby, in the cleaning mechanism 1 according to the present embodiment, clogging of the first filter 66 can be prevented.

The cleaning mechanism 1 includes a second filter 62 that temporarily filters the cleaning liquid in the first tank 111. The pump 14 sucks up the dirty cleaning liquid in the first tank 111 containing chips and sends it to the second filter 62. The second pump 60 sucks up the high-precision cleaning liquid in the second tank 110 and sends it into the processing chamber 40.

For example, the second filter 62 is a cyclone filter. The second filter 62 removes filth such as chips in the cleaning liquid contaminated by the centrifugation treatment. The second filter 62 sends the cleaning liquid after filtration that has undergone the centrifugation treatment to the storage tank 50. The second filter 62 sends the sewage containing the sewage removed by the centrifugation to the sewage storage unit 63.

The sewage accommodating portion 63 has, for example, a cylindrical shape and has an inflow port 631 connected to the second filter 62. The sewage accommodating portion 63 receives the sewage discharged from the second filter 62 through the inflow port 631 and temporarily accommodates it. The sewage accommodating unit 63 discharges sewage through the discharge port 632. A cage-shaped filter 65 is located below the sewage accommodating portion 63. The discharge port 632 of the sewage storage unit 63 is connected to the discharge path 85. One end of the discharge path 85 is connected to the discharge port 632 of the sewage accommodating portion 63, and the other end extends to the cage-shaped filter 65. The other end of the discharge path 85 is open inside the cage filter 65. Therefore, the sewage discharged from the discharge port 632 by the sewage storage unit 63 flows to the cage-shaped filter 65 via the discharge passage 85.

The discharge passage 85 includes a discharge port valve 64. The control device 9, which will be described later, controls the flow of sewage from the sewage accommodating portion 63 to the cage-shaped filter 65 by controlling the opening and closing of the discharge port valve 64.

The second filter 62 sends the cleaning liquid filtered through the centrifugation process to the storage tank 50 via the third flow path 81. One end of the third flow path 81 is connected to the second filter 62, and the other end is connected to the storage tank 50. The third flow path 81 has a first filter 66. The third flow path 81 has a check valve 67 between the first filter 66 and the storage tank 50. The first filter 66 re-filters the clean cleaning liquid from the second filter 62.

Therefore, the cleaning liquid of the first tank 111 flows into the storage tank 50 after the primary filtration treatment by the second filter 62 and then the secondary filtration treatment by the first filter 66. The storage tank 50 stores the cleaning liquid (high-precision cleaning liquid) that has undergone the primary filtration treatment and the secondary filtration treatment.

A fourth flow path 82 is connected to the third flow path 81. One end of the fourth flow path 82 is connected between the check valve 67 and the storage tank 50, and the other end is connected to the nozzle 30b in the processing chamber 40. Therefore, the nozzle 30b injects the high-precision cleaning liquid that has been filtered by the first filter 66 onto the tool and the work. The fourth flow path 82 includes a fourth flow path valve 69. The control device 9 controls the flow of the high-precision cleaning liquid to the nozzle 30b by controlling the opening and closing of the fourth flow path valve 69.

The storage tank 50 stores a high-precision cleaning liquid. For example, when the storage tank 50 is full, the surplus high-precision cleaning liquid flows into the first tank 111 via the second flow path 83. One end of the second flow path 83 is connected to the storage tank 50, and the other end is opened by the first tank 111. The second flow path 83 includes a second flow path valve 51 (second valve). The control device 9 controls the flow of the high-precision cleaning liquid from the storage tank 50 to the first tank 111 by controlling the opening and closing of the second flow path valve 51.

The storage tank 50 discharges the high-precision cleaning liquid to the fourth flow path 82 by the pressure of the air supplied by the air source 91 described later. A discharge valve 52 is located in the air passage from the storage tank 50 to the air source 91. The control device 9 controls the flow of the high-precision cleaning liquid to the nozzle 30b by controlling the opening and closing of the discharge valve 52.

The pump 60 sucks up the high-precision cleaning liquid in the second tank 110 and sends it to the processing chamber 40 via the fifth flow path 84. One end of the fifth flow path 84 is connected to the pump 60, and the other end is connected to the nozzle 30a in the processing chamber 40. The nozzle 30a injects the high-precision cleaning liquid sucked up by the pump 60 onto the tool and the work. The fifth flow path 84 includes a fifth flow path valve 68, and a line filter 841 is arranged between the fifth flow path valve 68 and the pump 60. The control device 9 controls the flow of the high-precision cleaning liquid to the nozzle 30a by controlling the opening and closing of the fifth flow path valve 68.
Hereinafter, for convenience of explanation, the nozzle 30a and the nozzle 30b are also referred to as a nozzle 30.

The cleaning mechanism 1 includes a first flow path 86 that sends the cleaning liquid after the filtration treatment by the second filter 62 to the second tank 110. The first flow path 86 is connected to the third flow path 81. One end of the first flow path 86 is connected between the second filter 62 and the first filter 66, and the other end extends to the second tank 110. The other end of the first flow path 86 is open inside the second tank 110. The cleaning liquid after the filtration treatment in the second filter 62 can flow into the second tank 110 via the first flow path 86, if necessary.

The first flow path 86 includes a first flow path valve 70 (first valve). The control device 9 controls the flow of the cleaning liquid after the filtration treatment from the second filter 62 to the second tank 110 by controlling the opening and closing of the first flow path valve 70.

The cleaning mechanism 1 includes an instruction receiving unit 90 that receives an instruction to start / stop the cleaning mechanism 1 from the user. The instruction receiving unit 90 is, for example, a power switch, an operation panel, or the like. The instruction receiving unit 90 may be a power switch of the machine tool including the cleaning mechanism 1.

The cleaning mechanism 1 includes a control device 9. The control device 9 includes an air source 91, a control unit 92, and a control valve 93.
The first flow path valve 70, the second flow path valve 51, the fourth flow path valve 69, the fifth flow path valve 68, the discharge port valve 64, and the discharge valve 52 are all air valves, and can be opened and closed by air pressure. conduct. The air source 91 sends air to the first flow path valve 70, the second flow path valve 51, the fourth flow path valve 69, the fifth flow path valve 68, the discharge port valve 64, and the discharge valve 52 via the control valve 93. Supply. Hereinafter, the first flow path valve 70, the second flow path valve 51, the fourth flow path valve 69, the fifth flow path valve 68, the discharge port valve 64, and the discharge valve 52 are collectively referred to as air valves 70, 51, 69, 68. , 64, 52.

The control unit 92 controls the air source 91 and the control valve 93, and controls the opening / closing operation of the air valves 70, 51, 69, 68, 64, 52.
The control valve 93 is located in the air passage (broken line in the figure) from the air source 91 to the air valves 70, 51, 69, 68, 64, 52. The control valve 93 is a so-called solenoid valve, and permits / prohibits the air supplied by the air source 91 to the air valves 70, 51, 69, 68, 64, 52 according to the instruction of the control unit 92.

The control valve 93 includes a control valve 93a, a control valve 93b, a control valve 93c, a control valve 93d, and a control valve 93e.
The control valve 93a permits or prohibits the supply of air to the fourth flow path valve 69. The control valve 93b permits or prohibits the supply of air to the fifth flow path valve 68. The control valve 93d permits / prohibits the supply of air to the discharge valve 52. The control valve 93e permits / prohibits the supply of air to the outlet valve 64.

On the other hand, the control valve 93c permits or prohibits the supply of air to the first flow path valve 70 and the second flow path valve 51. The first flow path valve 70 and the second flow path valve 51 are provided so as to perform opening and closing operations opposite to each other. When air from the air source 91 is added, when the first flow path valve 70 is opened, the second flow path valve 51 is closed, and when the first flow path valve 70 is closed, the second flow path valve 51 is closed. Will be open.
The opening and closing operations of the first flow path valve 70 and the second flow path valve 51 can be reversed from each other because the cleaning liquid of the storage tank 50 is used when changing tools before and after machining, but the cleaning liquid of the second tank 110 is used during machining. This is because it is used when cooling the tool and cleaning the chips, so that the cleaning liquid of the storage tank 50 and the cleaning liquid of the second tank 110 are not used at the same time.

Therefore, one of the control valves 93c can control both the first flow path valve 70 and the second flow path valve 51. Therefore, the number of parts of the cleaning mechanism 1 can be reduced and the cleaning mechanism 1 can be made compact.
By default, the second flow path valve 51 remains open and the first flow path valve 70 remains closed.

FIG. 3 is a functional block diagram showing a main configuration of the control unit 92 of the cleaning mechanism 1 according to the first embodiment. The control unit 92 includes a CPU 921, a ROM 922, a RAM 923, a valve control unit 924, and a detection unit 925.

The ROM 922 stores various control programs, basically fixed data among parameters for calculation in advance, and a program for controlling the opening / closing operation of the first flow path valve 70 and the second flow path valve 51 as described later. Remember. The RAM 923 temporarily stores data and reads it out regardless of the storage order, storage position, or the like. The RAM 923 stores, for example, a program of the ROM 922, various data generated by executing the program, changing parameters, and the like.
The CPU 921 controls the various hardware described above by loading and executing the control program stored in the ROM 922 on the RAM 923.

The detection unit 925 detects the amount of high-precision cleaning liquid in the storage tank 50. The detection unit 925 detects whether the storage tank 50 is full. For example, a sensor such as a flow meter is provided between the second flow path 83 and the storage tank 50, and the detection unit 925 detects whether the storage tank 50 is full based on the detection result of the sensor. When the storage tank 50 is full, excess high-precision cleaning liquid overflows through the second flow path 83, so that it can be detected that the storage tank 50 is full based on the detection result of the sensor.

The valve control unit 924 controls the opening / closing operation of the air valves 70, 51, 69, 68, 64, 52 by controlling the air source 91 and the control valve 93. The valve control unit 924 controls the opening / closing operation of the first flow path valve 70 and the second flow path valve 51 based on the monitoring result of the detection unit 925.

FIG. 4 is a flowchart illustrating an example of processing of the control unit 92 in the cleaning mechanism 1 according to the first embodiment. As described above, by default, the second flow path valve 51 is in the open state and the first flow path valve 70 is in the closed state.

When the instruction receiving unit 90 receives the instruction to start the operation by the user's operation, the cleaning mechanism 1 starts the operation (step S101).

The detection unit 925 detects whether or not the storage tank 50 is full, and the CPU 921 determines whether or not the storage tank 50 is full based on the detection result of the detection unit 925 (step S102). When the CPU 921 determines that the storage tank 50 is not full (step S102: NO), the valve control unit 924 controls the control valve 93c to supply air to the first flow path valve 70 and the second flow path valve 51. Ban. As a result, the default open / closed state can be maintained, the first flow path valve 70 is maintained in the closed state, and the second flow path valve 51 is maintained in the open state (step S110). After that, the process returns to step S101. The CPU 921 repeats this process until the storage tank 50 is full.

When the CPU 921 determines that the storage tank 50 is full (step S102: YES), the valve control unit 924 controls the control valve 93c to supply air to the first flow path valve 70 and the second flow path valve 51. Allow. As a result, the first flow path valve 70 changes from the closed state to the open state, and the second flow path valve 51 changes from the open state to the closed state (step S103).

After that, the cleaning liquid after the filtration treatment by the second filter 62 does not flow to the full storage tank 50, but flows to the second tank 110 via the first flow path 86. Therefore, it is possible to prevent the first pump 14 from idling and to replenish the high-precision cleaning liquid of the second tank 110. The second tank 110 is configured to overflow to the adjacent first tank 111 when it is full.

The CPU 921 determines whether or not it is the timing for cleaning the tool (step S104). For example, in the case of tool replacement, the CPU 921 determines that it is time to clean the tool.

When the CPU 921 determines that it is not the timing for cleaning the tool (step S104: NO), the process returns to step S103.
When the CPU 921 determines that it is the tool cleaning timing (step S104: YES), the valve control unit 924 controls the control valve 93c, the first flow path valve 70 is in the open state, and the second flow path valve 51 is closed. (Step S105).

In this state, the valve control unit 924 controls the control valve 93d to permit the supply of air to the discharge valve 52, and controls the control valve 93a to permit the supply of air to the fourth flow path valve 69. .. As a result, the discharge valve 52 is opened, and the pressure of the air from the air source 91 is applied to the storage tank 50. The fourth flow path valve 69 is also opened.
Since the second flow path valve 51 is in the closed state, the high-precision cleaning liquid in the storage tank 50 flows into the fourth flow path 82 and flows into the processing chamber 40 (nozzle 30b) via the fourth flow path valve 69. The nozzle 30b sprays a high-precision cleaning liquid to perform tool cleaning (step S106).

The CPU 921 determines whether or not it is time to end the tool cleaning (step S107). When the CPU 921 determines that it is not the timing to end the tool cleaning (step S107: NO), the process returns to step S106.
When the CPU 921 determines that it is the timing to end the tool cleaning (step S107: YES), the valve control unit 924 controls the control valve 93c to supply air to the first flow path valve 70 and the second flow path valve 51. Allow supply. As a result, the first flow path valve 70 is changed from the open state to the closed state, and the second flow path valve 51 is changed from the closed state to the open state (step S108).

After that, the cleaning liquid after the filtration treatment by the second filter 62 does not flow to the first flow path 86 (second tank 110), but flows to the first filter 66. The high-precision cleaning liquid that has been filtered by the first filter 66 flows into the storage tank 50. Therefore, the high-precision cleaning liquid of the storage tank 50 reduced by the tool cleaning can be replenished.
Since the cleaning liquid flowing from the first tank 111 to the second tank 110 does not pass through the first filter 66, clogging of the first filter 66 is reduced and the replacement frequency of the first filter 66 is reduced.

Next, the CPU 921 determines whether or not a power-off instruction has been received from the user by, for example, monitoring the instruction receiving unit 90 (step S109). When the CPU 921 determines that the power off instruction has not been received from the user (step S109: NO), the process returns to step S102. When the CPU 921 determines that the power off instruction has been received from the user (step S109: YES), the CPU 921 ends the process.

The valve control unit 924 and the detection unit 925 described above may be configured by hardware logic, or may be constructed by software by the CPU 921 executing a predetermined program.

(Embodiment 2)
FIG. 5 is a configuration diagram of a main part of the cleaning mechanism 1 according to the second embodiment. Hereinafter, the same parts as those of the cleaning mechanism 1 of the above-described first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

In the cleaning mechanism 1 according to the second embodiment, one end of the second flow path 83A is connected to the storage tank 50, and the other end is opened by the second tank 110. Therefore, when the storage tank 50 is full, the excess high-precision cleaning liquid flows into the second tank 110 via the second flow path 83A.

In the cleaning mechanism 1 of the second embodiment, when the storage tank 50 is full, the excess high-precision cleaning liquid is not returned to the first tank 111 having a low cleanliness, but flows to the second tank 110 having the same cleanliness. It is possible to effectively utilize the high-precision cleaning liquid that has been subjected to the filtration treatment of the first filter 66 and the second filter 62.

The same parts as those in the first embodiment are designated by the same reference numerals, and detailed description thereof will be omitted.

(Embodiment 3)
FIG. 6 is a configuration diagram of a main part of the cleaning mechanism 1 according to the third embodiment. Hereinafter, the same parts as those of the cleaning mechanism 1 of the above-described first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

The cleaning mechanism 1 according to the third embodiment includes a delay portion 71 that delays the operation of the first flow path valve 70. The delay portion 71 is located in the vicinity of the first flow path valve 70 in the air passage connecting the air source 91 (control valve 93) and the first flow path valve 70. The delay portion 71 adjusts the pressure of the air supplied from the air source 91 to the first flow path valve 70, and slows down the operation of the first flow path valve 70.

The delay unit 71 has, for example, a speed control valve. The speed control valve obstructs the flow of air from the air source 91 to the first flow path valve 70. This delays the operation of the first flow path valve 70 from the closed state to the open state. On the other hand, the speed control valve does not obstruct the flow of air from the first flow path valve 70 to the air source 91, and the first flow path valve 70 quickly changes from open to closed.
In the cleaning mechanism 1 according to the third embodiment, the delay portion 71 delays the first flow path valve 70 from being closed to the open state, so that the pressure in the storage tank 50 can be increased.

When attempting to inject a high-precision cleaning liquid from the nozzle 30b, the control valve 93 changes the first flow path valve 70 from closed to open, the second flow path valve 51 from open to closed, and the air source 91 opens. Air is supplied to the storage tank 50 to give air pressure. However, only the first flow path valve 70 is slowed down from the closed state to the open state by the delay portion 71. Therefore, for a certain period of time, both the first flow path valve 70 and the second flow path valve 51 are closed, or the first flow path valve 70 is closed and the second flow path valve 51 is half closed. The state can be maintained. In this state, air pressure is applied to the storage tank 50, but since both the second flow path valve 51 and the first flow path valve 70 are closed, the pressure inside the storage tank 50 increases. Therefore, the high-precision cleaning liquid can be ejected from the nozzle 30b at a high pressure, and chips can be efficiently removed.

When the injection of the high-precision cleaning liquid from the nozzle 30b is completed, the control valve 93 sets the first flow path valve 70 from the open state to the closed state in order to replenish the high-precision cleaning liquid in the storage tank 50, and the second flow path. The valve 51 is changed from closed to open. Since the delay portion 71 (speed control valve) does not obstruct the flow of air from the first flow path valve 70 toward the air source 91, the first flow path valve 70 quickly changes from open to closed. Therefore, after the high-precision cleaning liquid of the storage tank 50 is consumed, the replenishment of the high-precision cleaning liquid of the storage tank 50 starts immediately. Therefore, it is not necessary to increase the capacity of the storage tank 50, and the storage tank 50 can be miniaturized.

Further, since the air pressure is applied to the storage tank 50 while controlling the first flow path valve 70 and the second flow path valve 51, the air pressure of the air source 91 drops sharply, which may hinder the operation of the cleaning mechanism 1. There is also.
On the other hand, in the cleaning mechanism 1 according to the third embodiment, since the delay portion 71 delays the operation of the first flow path valve 70, the operation of the first flow path valve 70 is delayed by the amount of the delay, and the air source 91. It is possible to prevent a sudden drop in air pressure at.

1 Cleaning mechanism 50 Storage tank 51 2nd flow path valve 61 1st pump 66 1st filter 62 2nd filter 70 1st flow path valve 71 Delay part 83 2nd flow path 86 1st flow path 92 Control part 110 2nd tank 111 1st tank 711 Orifice 924 Valve control unit

Claims (10)

A cleaning mechanism including a first tank for storing the cleaning liquid used for work, a first filter for filtering the cleaning liquid from the first tank, and a storage tank for storing the cleaning liquid for tool cleaning filtered by the first filter. In
A second tank that stores cleaning liquid that is cleaner than the first tank,
A pump that sends the cleaning liquid in the first tank to the first filter side,
A second filter located between the first filter and the pump,
A cleaning mechanism including a first flow path for sending a cleaning liquid after filtration by the second filter and before filtration by the first filter to the second tank. The first valve arranged in the first flow path and
A second flow path for discharging excess cleaning liquid from the storage tank, and
The cleaning mechanism according to claim 1, further comprising a second valve arranged in the second flow path. The cleaning mechanism according to claim 2, wherein the first valve is closed when the second valve is open, and is opened when the second valve is closed. 2. Cleaning mechanism. The cleaning mechanism according to claim 2 or 3, further comprising a valve control unit that controls the first valve to be closed and the second valve to be opened after cleaning the tool. The cleaning mechanism according to any one of claims 2 to 5, wherein the second flow path discharges excess cleaning liquid from the storage tank to the second tank. The cleaning mechanism according to claim 4 or 5, further comprising a delay portion that delays the operation of the first valve. The first valve is an air valve operated by pneumatic pressure.
The cleaning mechanism according to claim 7, wherein the delay portion includes a speed control valve. A first tank for storing the cleaning liquid used for the work, a first filter for filtering the cleaning liquid from the first tank, a storage tank for storing the cleaning liquid for tool cleaning filtered by the first filter, and the first one. A second tank that stores cleaning liquid that is cleaner than the tank, a pump that sends the cleaning liquid in the first tank to the first filter side, a second filter located between the first filter and the pump, and the first filter. A first flow path that sends the cleaning liquid filtered by the filter to the second tank, a first valve arranged in the first flow path, and a second that discharges excess cleaning liquid from the storage tank from the storage tank. In the cleaning method in the cleaning mechanism including the flow path and the second valve arranged in the second flow path.
A cleaning method comprising opening the first valve and closing the second valve when the storage tank stores a predetermined amount of cleaning liquid. A first tank for storing the cleaning liquid used for the work, a first filter for filtering the cleaning liquid from the first tank, a storage tank for storing the cleaning liquid for tool cleaning filtered by the first filter, and the first one. A second tank that stores cleaning liquid that is cleaner than the tank, a pump that sends the cleaning liquid in the first tank to the first filter side, a second filter located between the first filter and the pump, and the first filter. A first flow path that sends the cleaning liquid filtered by the filter to the second tank, a first valve arranged in the first flow path, and a second that discharges excess cleaning liquid from the storage tank from the storage tank. In the cleaning method in the cleaning mechanism including the flow path and the second valve arranged in the second flow path.
A cleaning method comprising cleaning the tool, closing the first valve, and opening the second valve.

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