JP7035349B2 - Embossing simulation device and embossing simulation method - Google Patents

Description

The present invention relates to an embossing simulation device and an embossing simulation method for simulating the uneven shape of the surface of a face material such as embossed wallpaper or leather.

Embossing is a processing method for forming an uneven shape by embossing a pattern or the like on the surface of a face material such as wallpaper or leather. For example, an uneven shape is formed on the surface of a surface material such as a medium such as wallpaper or synthetic leather, a car interior material, a decorative sheet used for a floor or furniture, and a decorative material on the surface of an industrial product. At this time, an uneven shape along the pattern is formed on the surface of the face material. For this purpose, a face material having an uneven shape pattern is produced by first printing a pattern on the surface of the face material and then embossing the surface to make it stand out.

In order to confirm the pattern accompanied by this embossing, it was necessary to actually print the pattern and produce a prototype that had undergone the process of embossing. However, the production of the prototype requires the production of an embossed plate (embossed plate) for printing and embossing the pattern, so that the production cost and the production time are high. Along with this, there is a drawback that the price of the embossed face material increases.

In order to solve this shortcoming, Patent Document 1 describes a device for simulating the finish of the pattern of the embossed face material without actually creating a prototype. In Patent Document 1, when predicting the uneven shape after embossing, fluctuation factors such as the height and heat of the resin layer are assumed, and a profile recording the relationship between the uneven shape error between the processed object and the height field data. Is used.

Japanese Unexamined Patent Publication No. 2014-71564

However, although the method of Patent Document 1 is simple in that it does not require a very large capacity memory as in the case of fluid simulation, it includes a range that is not included in the height field data to be actually processed. It is necessary to predict in advance the height and spread of the uneven shape after processing. Furthermore, since the error prediction focuses on a single uneven shape, the influence of the peripheral shape is not included. In the actual embossing process, it is difficult to perform an accurate simulation only by error prediction focusing on a single uneven shape as a variable factor during processing because it is affected by the peripheral shape.

For example, Patent Document 1 describes the extrusion and expansion of the resin due to the relationship between the depth of the shape of interest and the pressing pressure as an error due to the pressure difference when the embossed plate is pressed. However, it is not described in Patent Document 1 that these phenomena affect the peripheral shape. The error due to the pressure difference when pressing the assumed embossed plate and the heat of the resin layer may be affected by the peripheral shape. That is, it is clear that phenomena such as the pressure difference when the embossed plate is pressed and the heat of the resin layer affect the peripheral shape, and it is also clear that the peripheral shape affects the shape of interest.

Further, Patent Document 1 refers to the deformation of the resin layer at the time of cooling in consideration of the relationship between the embossed plate and the ground contact area of the resin layer in the error due to the heat of the resin layer. However, when the entire embossed surface has an uneven shape, the ground contact area changes continuously, and the time required for cooling also changes due to the influence. Therefore, if the predicted value pays attention to a single uneven shape, the result does not match the actual shape.

If such an influence of the peripheral shape is performed by using the method described in Patent Document 1, the height of the peripheral shape, the range of the peripheral shape that affects the shape of interest, and the like are further variable factors. Must be assumed as. Therefore, it is necessary to create a huge number of profiles according to the number of profiles.

In view of the above problems, it is an object of the present invention to provide an embossing simulation apparatus and an embossing simulation method capable of simulating the finish of an embossed face material in consideration of the influence of the peripheral shape.

In order to achieve the above object, one of the representative embossing simulation devices of the present invention is a storage unit having uneven shape data recorded as image information and an uneven shape formed on the surface of the face material by embossing. Equipped with a processing unit that simulates the finish of
The original uneven shape data and the corresponding uneven shape data after processing are stored in the storage unit.
The processing unit simulates the finish of the uneven shape after embossing, which is performed using the uneven shape data recorded as image information in the storage unit, in consideration of the influence of the surrounding uneven shape on a specific location. And output as image information, in the simulation, the embossed uneven shape data stored in the storage unit has the same pixel configuration range as the range including the specific location and the periphery of the specific location. Searching from the original uneven shape data to be performed, the corresponding pixel value of the uneven shape data after embossing corresponding to the central pixel in the range of the same pixel configuration is set as the predicted uneven shape predicted value after embossing. It is characterized by.

Further, one of the embossing simulation methods of the present invention is to obtain the finish of the embossed uneven shape after the embossing processed by using the uneven shape data stored as image information in the storage unit, and to obtain the peripheral uneven shape with respect to a specific location. The processing unit has a step of performing a simulation in consideration of the influence of the above and outputting it as image information. The corresponding pixel value of the embossed uneven shape data corresponding to the central pixel in the range of the same pixel configuration is embossed by searching from the original uneven shape data in which the embossed uneven shape data stored in is present. It is characterized in that it is performed by using the predicted value of the uneven shape after processing .

According to the present invention, in the embossing simulation apparatus and the embossing simulation method, the finished uneven shape of the embossed face material surface can be more accurately simulated including the influence of the peripheral shape.
Issues, configurations and effects other than those described above will be clarified by the following description of the embodiments.

It is a block diagram which shows an example of the structure in 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a figure which shows the structural example of the face material which is an example of the simulation object in 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a figure which shows an example of the structure of the simulation information table stored in the storage part in the 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a flowchart which shows the example of the embossing processing simulation processing in 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a graph which shows the 1st example of the embossing simulation processing which considered the influence of pressure in 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a graph which shows the 2nd example of the embossing simulation processing which considered the influence of pressure in 1st Embodiment of the embossing processing simulation apparatus of this invention. It is a block diagram which shows an example of the structure in 2nd Embodiment of the embossing processing simulation apparatus of this invention. It is a figure which shows an example of the structure of the simulation information table stored in the storage part in the 2nd Embodiment of the embossing processing simulation apparatus of this invention. It is a flowchart which shows the example of the embossing processing simulation processing in the 2nd Embodiment of the embossing processing simulation apparatus of this invention. It is a figure which shows the example of the search method of the corresponding point with respect to the simulation target pixel in the embossing processing simulation processing in the 2nd Embodiment of the embossing processing simulation apparatus of this invention. It is a flowchart which shows the example of the embossing processing simulation processing in the 3rd Embodiment of the embossing processing simulation apparatus of this invention.

A mode for carrying out the present invention will be described.

(First Embodiment)
FIG. 1 is a block diagram showing an example of a configuration according to a first embodiment of the embossing simulation apparatus of the present invention. In FIG. 1, the embossing simulation device 1 includes an input unit 101, a storage unit 102, a processing unit 103, and a display unit 104.

The input unit 101 is a means for inputting information. For example, information obtained from an input means such as a keyboard, a mouse, and a touch panel is input. Using these means, operations such as selection and change of the uneven shape data for generating the uneven shape data after the embossing that the user wants to confirm are input. Further, the input unit 101 also inputs information such as processing conditions (for example, pressure applied to the embossed plate and conditions for the height of the object after processing) when embossing is performed.

The storage unit 102 is a storage unit that stores necessary information. Examples of the information to be stored include the uneven shape data of the embossing process selected by the user, the file name thereof, and the processing conditions in the embossing process input by the user, which are obtained from the input unit 101. Further, the storage unit 102 also stores the uneven shape data and the file name thereof, in which the error caused by the embossing is simulated by the processing unit 103 shown below. Further, the file name of the uneven shape data (concave and convex shape image), the processing conditions such as pressure and height, and the file name of the simulated uneven shape data (concave and convex shape image after processing) are stored as a simulation information table. .. This point will also be described with reference to FIG. 3 described later.

The processing unit 103 is a processing unit that generates the expected uneven shape data after embossing. The predicted uneven shape data after embossing is generated based on the processing conditions input by the user in the input unit 101 and the uneven shape data selected in consideration of the error caused by the embossing. In addition, the processing unit 103 also performs processing for displaying on the display unit 104. The processing unit 103 is composed of a CPU (Central Processing Unit), a ROM (Read Only Memory), a RAM (Random Access Memory), and the like.

The display unit 104 predicts the uneven shape data to be targeted for error simulation after embossing in the input unit 101, the interface used when selecting the processing conditions, and the uneven shape data selected by the user in the input unit 101. The uneven shape data after processing and the conversion method assuming an error are displayed as an image. As the display unit 104, an image device using a liquid crystal display, an organic EL, or the like can be applied.

FIG. 2 is a diagram showing a configuration example of a face material which is an example of a simulation target in the first embodiment of the embossing simulation apparatus of the present invention. FIG. 2 shows an example in which a resin layer 12 is formed as a face material surface on the lower pattern layer 11. The resin layer 12 is an embossed film having an uneven shape.

For embossing, for example, as shown in FIG. 2, a face material made of a resin layer 12 may be used as a face material surface on the pattern layer 11. At this time, the embossing is applied to the resin layer 12, and the uneven shape data after the embossing on the resin layer 12 to be the embossed film is used as the uneven shape data. For example, here, the resin layer 12 is made of a transparent resin, and a pattern is described on the surface side (resin layer 12 side) of the pattern layer 11. Therefore, the pattern of the pattern layer 11 is configured to be visible through the surface of the resin layer 12. As a result, the unevenness of the embossed film due to the resin layer 12 and the pattern of the pattern layer 11 are combined to enable various designs for the face material.

In the first embodiment, as shown in FIG. 2, an embossing simulation is performed on a face material composed of a pattern layer 11 and a resin layer 12 provided with an embossed film having an uneven shape on the surface side. be able to.

Further, the embossing simulation device 1 can be applied even in a configuration that does not depend on the pattern layer 11 and the resin layer 12 as shown in FIG. That is, any configuration may be used as long as the surface of the face material has an uneven shape formed by embossing, and for example, it can be applied to a face material made of only resin. In this case, unevenness can be formed on the surface of the face material by embossing, and the embossing simulation device 1 can perform embossing simulation.

FIG. 3 is a diagram showing an example of the configuration of a simulation information table stored in the storage unit according to the first embodiment of the embossing simulation apparatus of the present invention. The simulation information table 20 shown in FIG. 3 is stored in the storage unit 102. The simulation information table 20 includes information on the uneven shape image file name 21, the processing condition pressure 22, the processing condition height 23, and the uneven shape image file name 24 after processing. The simulation information table 20 has one or more uneven shape image file names 21. For each uneven shape image file name 21, the processing condition pressure 22, the processing condition height 23, and the uneven shape image file name 24 after processing are obtained. Information is stored.

The uneven shape image file name 21 is a file name of the uneven shape image data. The uneven shape image data is uneven shape data indicating the height of the uneven shape applied to the surface of the face material such as wallpaper or leather, and the height of the uneven shape is represented by a gray scale at regular intervals. The gray scale is specified by, for example, 8 bits (gradation value 0 to 255).

The processing condition pressure 22 is information on the pressure as the processing condition used for the data of the corresponding uneven shape image file name 21. This pressure information is used, for example, in the processing of FIGS. 5 and 6 described later.

The processing condition height 23 is information on the height as the processing condition used for the data of the corresponding uneven shape image file name 21. Since the grayscale information of the height in the above-mentioned uneven shape is a relative value, the height information as a processing condition can be used when visualizing the unevenness. For example, this information can be used when creating a visualized image.

The uneven shape image file name 24 after processing is a file name of the uneven shape image data after processing. The uneven shape image data after processing is uneven shape data representing the height of the uneven shape after embossing with respect to the uneven shape image data of the corresponding uneven shape image file name 21, and the height in the uneven shape is shown in gray scale. It is expressed for each fixed range. For example, the result of processing the uneven shape image data corresponding to the uneven shape image file name 21 according to FIG. 4 is stored as the processed uneven shape image data. The gray scale is specified by, for example, 8 bits (gradation value 0 to 255).

FIG. 4 is a flowchart showing an example of embossing simulation processing according to the first embodiment of the embossing simulation apparatus of the present invention.

First, the input unit 101 inputs the processing conditions for embossing by the user. The input information is stored in the storage unit 102 (S101). The processing conditions stored here are conditions such as the pressure applied to the embossed plate when embossing is performed and the height of the object expected after processing. Further, these stored conditions are used when performing the embossing processing simulation described later. The simulation information table 20 of FIG. 3 is stored as information on the machining condition pressure 22 and the machining condition height 23 corresponding to the uneven shape image file name 21.

Next, the input unit 101 selects the original uneven shape data for the user to perform the embossing processing simulation, and stores it in the storage unit 102 (S102).

Here, the uneven shape data is data representing the height of the uneven shape given to the surface of the face material such as wallpaper and leather, and the height is specified by 8 bits (gradation value 0 to 255) on a gray scale. .. Here, since the height is information based on one axis, it can be specified in gray scale. This uneven shape data is the target uneven shape data set in advance, and the height of the embossed plate mold is determined based on this data. Here, the uneven shape data corresponds to the uneven shape image data of the uneven shape image file name 21 in the simulation information table 20 of FIG. 3 described above.

Next, the processing unit 103 performs an embossing simulation in consideration of an error due to the influence of the peripheral shape caused by the embossing from the gray scale value of the original uneven shape data selected in S101 and stored in the storage unit 102 (S103). ).

The embossing simulation here simulates the pixel of interest affected by the peripheral pixels when embossing is performed using the original uneven shape data selected in S102. That is, the effect of the height (grayscale value) of the peripheral pixels around the pixel of interest is adjusted and processed. The user can determine to what extent the influence of the peripheral pixels is considered on the peripheral pixels and how much the influence of the peripheral pixels is on the peripheral pixels by specifying the conditions. ..

・・・（式１） For example, the gray scale value of the uneven shape data selected in S102 is f (i, j), the gray scale value after the embossing simulation is g (i, j), and the conversion process is performed by the formula 1.

... (Equation 1)

Here, i and j in Equation 1 indicate the coordinates of the pixel of interest (specific location). That is, in the two-dimensional plane, the pixel whose x direction is i and the y direction is j is the pixel of interest. In the equation 1, i + m and j + n indicate the coordinates of the peripheral pixels, and m and n here represent the difference in the x-direction and the y-direction with respect to the coordinates i and j of the pixel of interest. Further, by specifying w, the range of m and n is specified. That is, the range of peripheral pixels with respect to the coordinates of interest can be specified in the range of w to −w with respect to the coordinates i and j of the pixels of interest. Thereby, the range of peripheral pixels in consideration of the influence can be determined by w specified by the user. For example, if w specifies "1", the x direction is in the range of "i-1" to "i + 1" and the y direction is in the range of "j-1" to "j-1" with respect to the coordinates i and j of the pixel of interest. It is specified in the range of "j + 1", and the influence of 8 pixels around the pixel of interest is taken into consideration. For example, if w specifies "2", the x direction is the range of "i-2" to "i + 2" and the y direction is "j-2" to "j-2" with respect to the coordinates i and j of the pixel of interest. It is specified in the range of "j + 2", and the influence of 24 pixels around the pixel of interest is taken into consideration. An integer can be applied to i, j, m, n, and w.

Further, σ ₁ and σ ₂ are variables representing weighting. σ ₁ is a variable that weights in the spatial direction, and σ ₂ is a variable that weights in the grayscale value direction. Equation 1 is characterized in that the distance between the pixel of interest and the peripheral pixels is weighted by σ ₁ and the difference between the grayscale value of the pixel of interest and the grayscale value of the peripheral pixels is weighted by σ ₂ . be.

The user can determine the range of peripheral pixels to be considered in the simulation by inputting and specifying w from the input unit 101. Further, the user can determine the degree of weighting in the equation 1 by inputting and designating σ ₁ and σ ₂ from the input unit 101. Here, the values of w, σ ₁ , and σ ₂ can be determined based on the results of embossing so far, the user's experience value, and the like. This makes it possible to perform a more accurate post-embossing simulation in consideration of the influence of peripheral pixels.

Further, the processing unit 103 can perform a simulation in consideration of the influence of pressure as a processing condition. Here, based on the processing conditions of the pressure applied to the embossed plate input in S101, further simulation processing is performed on the simulation result based on the influence of the peripheral pixels performed using Equation 1 and the like.

For example, when the pressure under the machining conditions is high, the highlight part of the uneven shape data, that is, the part to be machined at a high height (the part with a large depth in the embossed plate), is on the surface side of the face material after being machined by the embossed plate. (Transparent resin on the resin layer 12 side in FIG. 2) repels. As a result, the height of the embossing formed on the surface of the face material becomes lower than the target, and there is a possibility that the unevenness of the embossed plate is not reproduced and the output is flat at that portion. In this case, the gradation of the highlight portion after processing in the gray scale is not actually reproduced based on the uneven shape data.

On the other hand, when the pressure under the processing conditions is low, insufficient pressure due to the embossed plate occurs in the shadow portion of the uneven shape data, that is, the portion where the height is processed to be low (the portion where the depth is small in the embossed plate). As a result, on the surface of the face material, the unevenness of the embossed plate may not be reproduced as intended and the output may be flat. In this case, the gradation of the shadow portion after processing in the gray scale is not actually reproduced based on the uneven shape data.

FIGS. 5 and 6 show an example of simulation processing based on such a situation. FIG. 5 is a graph showing a first example of embossing simulation processing in consideration of the influence of pressure in the first embodiment of the embossing processing simulation apparatus of the present invention, and FIG. 6 is a graph showing the second example as well. Is.

In FIGS. 5 and 6, the horizontal axis is the gray scale value before considering the influence of pressure. For example, the result of g (i, j) according to Equation 1 can be applied to this. Further, the vertical axis is a grayscale value considering the influence of pressure, and is a value after simulation considering the influence of pressure. The straight line 31 in this graph is the result when there is no influence of pressure, and the gray scale value before considering the influence of pressure and the gray scale value considering the influence of pressure are the same.

FIG. 5 is a graph considering the influence when the pressure is low, and the state considering the influence of the pressure is shown by the line 32. In this case, in the part where the gray scale value is low (the part where the height is low), even if the value of the original gray scale value increases, the gray scale value considering the influence of pressure does not increase and remains constant at 0. (Lower flat portion 32a). Then, when the original gray scale value reaches the shadow gray scale inflection point 35, the gray scale value considering the influence of pressure also increases with the increase of the original gray scale value and reaches on the straight line 31. (Straight line portion 32b). In this way, by setting the shadow grayscale inflection point 35 in the portion where the grayscale value is low (the portion where the height is low), the simulation can be performed in consideration of the influence when the pressure is low. Here, the shadow grayscale inflection point 35 is a constant low value even if the grayscale value before considering the influence of pressure increases, the grayscale value considering the influence of pressure does not increase up to that value. The point is that the value remains.

FIG. 6 is a graph considering the influence when the pressure is high, and the state considering the influence of the pressure is shown by the line 33. In this case, up to the highlight grayscale inflection point 36, as the original grayscale value increases, the grayscale value in consideration of the influence of pressure also increases along the straight line 31 (straight line portion 33a). However, in the part where the grayscale value is high (the part where the height is high), when the highlight grayscale turning point 36 is reached, even if the grayscale value before considering the influence of pressure increases, the influence of pressure is exerted. The considered gray scale value does not increase and becomes a constant value (upper flat portion 33b). Here, the highlight grayscale inflection point 36 is set on the straight line 31. In this way, by setting the highlight grayscale inflection point 36 in the portion where the grayscale value is high (the portion where the height is high), the simulation can be performed in consideration of the influence when the pressure is high. Here, at the highlight grayscale inflection point 36, even if the grayscale value before considering the influence of pressure increases, the grayscale value considering the influence of pressure does not increase after that value and is constant. It is a point that becomes a value. The highlight gray scale inflection point 36 and the shadow gray scale inflection point 35 are set according to the pressure as the processing condition.

In FIG. 4, when the S103 embossing simulation process is completed, the user inputs the storage name of the uneven shape data after the embossing simulation by the input unit 101, and the simulation result is stored in the storage unit 102 (S104). At this time, in the simulation information table 20 of FIG. 3, the processed uneven shape image file name 24 corresponding to the uneven shape image file name 21 is saved.

By the above processing, the simulation of the uneven shape data after embossing is completed. Further, by displaying the result on the display unit 104, the user can confirm the simulation result. If the display here is a grayscale display, the user can check the simulation result in an easy-to-understand manner.

In the first embodiment, it has been described that the simulation after embossing by the relative height is carried out using the gray scale value of the uneven shape data. Further, using the information on the height of the object expected after processing stored in S101, the simulation after embossing may be performed after converting to an absolute height. In that case, the absolute value is obtained by multiplying the height of the object expected after processing stored in S101 by the gray scale value of the uneven shape data divided by the maximum value (255 in this embodiment). Used as a high height.

As described above, in the first embodiment, it is possible to more accurately perform the simulation after embossing in consideration of the influence on the height of the peripheral pixels with respect to the pixel of interest. Furthermore, accurate simulation is possible by setting the range in which peripheral pixels are considered and the degree of their influence. Furthermore, by simulating the embossing when the influence of pressure is taken into consideration, it is possible to make an accurate simulation in consideration of the error due to the influence of pressure.

(Second embodiment)
A second embodiment of the present invention will be described. In the second embodiment, the differences from the first embodiment will be mainly described, and the same parts are designated by the same reference numerals.

FIG. 7 is a block diagram showing an example of the configuration in the second embodiment of the embossing simulation apparatus of the present invention. In FIG. 7, the embossing simulation device 2 includes an input unit 101, a storage unit 102, a processing unit 103, and a display unit 104. Further, if necessary, an uneven shape output unit 201 and an uneven shape acquisition unit 202 are provided.

The input unit 101 inputs operations such as selection and change of the uneven shape data for generating the uneven shape data after the embossing that the user wants to confirm. Further, the input unit 101 also inputs information such as processing conditions (for example, pressure applied to the embossed plate and conditions for the height of the object after processing) when embossing is performed.

Examples of the information stored in the storage unit 102 include the original uneven shape data of the embossing process selected by the user, the file name thereof, and the processing conditions in the embossing process input by the user, which are obtained from the input unit 101. Further, the storage unit 102 also stores the uneven shape data and the file name thereof, in which the error caused by the embossing is simulated by the processing unit 103 shown below. Further, the storage unit 102 also stores the data as a result of the uneven shape data obtained by the past actual measurement. That is, the uneven shape data of the result after the actual embossing corresponding to the original uneven shape data of the embossing is stored by using the gray scale value or the like. Further, the file name of the uneven shape data (concave and convex shape image), the processing conditions such as pressure and height, and the file name of the simulated uneven shape data (concave and convex shape image after processing) are used as the simulation information table in FIG. It will be remembered.

The processing unit 103 is a processing unit that generates the expected uneven shape data after embossing. For the generation of the predicted uneven shape data after embossing, the uneven shape data (grayscale value) as a result of past actual measurement is used based on the processing conditions input by the user in the input unit 101 and the selected uneven shape data. Therefore, it is generated in consideration of the error caused by embossing. In addition, control of the uneven shape output unit 201, processing for generating uneven shape data after embossing based on the measurement information of the uneven shape acquisition unit 202, processing for displaying on the display unit 104, and the like are also performed.

The uneven shape output unit 201 is an actual device that outputs the uneven shape data acquired by the user in the input unit 101 and stored in the storage unit 102 as an embossed film. For example, an embossed film can be formed by providing an embossed plate cylinder engraved with uneven shape data and pressing the vinyl chloride sheet against the embossed plate cylinder.

The uneven shape acquisition unit 202 is a measuring instrument capable of acquiring three-dimensional shape information. The height of the embossed film after processing is measured for each position with respect to the actual embossed film generated by the uneven shape output unit 201, and the information is acquired. The acquired information is stored in the storage unit 102. The measurement may be performed on an actual embossed film generated by another film other than that generated by the concave-convex shape output unit 201. At that time, by storing the measured actual uneven shape data together with the original uneven shape data, it can be used for the simulation in the processing unit 103 described later.

As described above, the uneven shape output unit 201 is a means for actually generating the embossed film, and the uneven shape acquisition unit 202 is a means for measuring the actual embossed film. Even if these means are not provided, processing by the processing unit 103, which will be described later, is possible.

Also in the second embodiment, the simulation information table 20 described with reference to FIG. 3 of the first embodiment can be similarly applied. That is, with respect to the uneven shape data of the selected uneven shape image file name 21, the uneven shape data after the embossing after the simulation can be saved as the uneven shape image file name 24 after the processing. Further, in the second embodiment, the simulation information table 30 shown in FIG. 8 can also be used.

FIG. 8 is a diagram showing an example of the configuration of a simulation information table stored in the storage unit in the second embodiment of the embossing simulation apparatus of the present invention. Here, the simulation information is stored in the storage unit 102 as the simulation information table 30. Simulation information The simulation information table 30 includes an uneven shape image file name 34 after processing by actual measurement, and stores the corresponding uneven shape image file name 31, processing condition pressure 32, and processing condition height 33. .. The configuration of the concave-convex shape image file name 31, the machining condition pressure 32, and the machining condition height 33 is the same as the configuration of the concave-convex shape image file name 21, the machining condition pressure 22, and the machining condition height 23 described with reference to FIG. be.

The uneven shape image file name 34 after processing by actual measurement is a file name of the uneven shape image data after processing by actual measurement. The uneven shape image data after processing by actual measurement is a gray scale representation of information on the height of the uneven shape after processing actually measured in the past. The gray scale is specified by, for example, 8 bits (gradation value 0 to 255).

FIG. 9 is a flowchart showing an example of embossing simulation processing in the second embodiment of the embossing simulation apparatus of the present invention.

First, the input unit 101 inputs the processing conditions for embossing by the user. The input information is stored in the storage unit 102 (S201). The processing here is the same as that of S101 in the first embodiment.

Next, the input unit 101 selects the original uneven shape data for the user to perform the embossing processing simulation, and stores it in the storage unit 102 (S202). The processing here is the same as that of S102 in the first embodiment.

Next, the processing unit 103 considers the influence of the peripheral shape by using the uneven shape data after embossing actually measured in the past from the gray scale value of the uneven shape data selected in S202 and stored in the storage unit 102. Perform embossing simulation (S203). Here, the height of the uneven shape after embossing is predicted with respect to the uneven shape data selected by the input unit 101.

The storage unit 102 stores the uneven shape data after embossing actually measured in the past, the original uneven shape data corresponding to the data, and the processing conditions such as pressure, height, and thickness at that time. .. In the processing here, the uneven shape data selected by the input unit 101 is compared with the original uneven shape data having the uneven shape data after the embossing actually measured in the past, which matches the processing conditions. In the uneven shape data selected in S202, a range including peripheral pixels is determined for a certain pixel of interest (specific location). For the pixel configuration within this range, the range having the same pixel configuration is searched from the original uneven shape data corresponding to the uneven shape data after the embossing actually measured in the past. When there is a range of the same pixel configuration, the gray scale value of the corresponding pixel of the corresponding pixel after embossing that was actually measured in the past is used as the predicted value of the uneven shape after embossing for the center pixel within that range. do.

Explaining these with reference to FIGS. 3 and 8, the unevenness of the uneven shape image file name 31 that matches the processing conditions with respect to the uneven shape image data of the uneven shape image file name 21 selected in S202 to be simulated this time. Compare with the shape image data. Then, a predetermined range of peripheral pixels is determined for a certain pixel of interest (specific location) in the uneven shape image data of the uneven shape image file name 21. For the pixel configuration within this range, it is searched whether or not there is a range of the same pixel configuration in the concave-convex shape image data of the concave-convex shape image file name 31. When there is a range of the same pixel configuration, the unevenness of the concave-convex shape image file name 34 after processing by the corresponding actual measurement with respect to the center pixel in the range of the same pixel configuration of the concave-convex shape image data of the concave-convex shape image file name 31. The value of the corresponding pixel of the shape image data is used as the predicted value of the uneven shape after embossing.

Further, these will be specifically described with reference to FIG. FIG. 10 is a diagram showing an example of a method of searching for a corresponding point for a pixel to be simulated in the embossing simulation process according to the second embodiment of the embossing simulation apparatus of the present invention. (A) (left side) of FIG. 10 shows an uneven shape image based on the selected uneven shape data. Further, (b) (right side) in FIG. 10 shows an uneven shape image based on the uneven shape data stored in the storage unit 102.

FIG. 10A shows an example of the uneven shape data selected in S202. In the simulation information table 20 of FIG. 3, the uneven shape image data of the uneven shape image file name 21 selected in S202 corresponds to the uneven shape image data. Here, a range 42 including the periphery around the pixel of interest 41 is designated. The designation is a shaded portion, and here, an example in which 3 × 3 pixels are designated is shown.

FIG. 10B shows an example of the original uneven shape data corresponding to the actually measured uneven shape data after embossing stored in the storage unit 102. In the simulation information table 30 of FIG. 8, the uneven shape image data of the uneven shape image file name 31 corresponds to the uneven shape image data. Here, the processing unit 103 searches for a range having the same pixel configuration as the pixel configuration of the range 42. And in FIG. 10B, the range 52 corresponds to it. That is, the gray scale (height) values in the left, right, top, and bottom pixels are the same in the range 42 and the range 52. The central pixel 51 in the range 52 corresponds to the pixel of interest 41 in the range 42.

After that, the processing unit 103 uses the value of the corresponding pixel of the embossed uneven shape data measured in the past corresponding to the central pixel 51 of the range 52 as the embossed uneven shape predicted value. In the case of the simulation information table 30 of FIG. 8, the value of the corresponding pixel of the uneven shape image data of the uneven shape image file name 34 after processing by actual measurement corresponds.

In this way, if the processing is advanced for each pixel of the uneven shape data selected in S202, the uneven shape data after the embossing process can be created.

In FIG. 9, when the embossing simulation process of S203 is completed, the user inputs the storage name of the uneven shape data after the embossing simulation by the input unit 101, and the simulation result is stored in the storage unit 102 (S204). The processing here is the same as that of S104 in the first embodiment.

By the above processing, the simulation of the uneven shape data after embossing is completed. Further, the display of the display unit 104 is the same as that of the first embodiment.

As described above, in the second embodiment, the effect of the peripheral shape is obtained by searching for the data of the same pixel configuration for the prediction of the height including the peripheral pixels for the pixel of interest based on the result of the actual measured value. It is possible to more accurately simulate embossing in consideration of the above.

Further, the ranges 42 and 52 show an example of 3 × 3 pixels, but the range 42 and 52 are not limited to this. For example, it may be 5 × 5 or the like. Here, more accurate simulation becomes possible by considering the entire enclosed surroundings with respect to the pixel of interest in a well-balanced manner. However, for example, even if the aspect ratio is different, accurate simulation above a certain level is possible. For example, 3 × 5 and 1 × 3 are set in consideration of the printing direction. In this case, it is advisable to lengthen the range in the printing direction. In the present embodiment, at least one or more surrounding pixels need to be considered, but the range can be specified as needed. The designation of these ranges can be input by the input unit 101.

(Third embodiment)
A third embodiment of the present invention will be described. In the third embodiment, the differences from the first embodiment or the second embodiment will be mainly described, and the same parts are designated by the same reference numerals.

The block diagram of the third embodiment is the same as the block diagram of the second embodiment shown in FIG. 7. The embossing simulation device according to the third embodiment includes an input unit 101, a storage unit 102, a processing unit 103, a display unit 104, an uneven shape output unit 201, and an uneven shape acquisition unit 202.

The input unit 101 inputs operations such as selection and change of the uneven shape data for generating the uneven shape data after the embossing that the user wants to confirm. Further, the input unit 101 also inputs information such as processing conditions (for example, pressure applied to the embossed plate and conditions for the height of the object after processing) when embossing is performed. Further, the input unit 101 can input acquisition conditions such as the size, resolution, and height resolution of the region to be acquired at the time of measurement.

Examples of the information stored in the storage unit 102 include the original uneven shape data of the embossing process selected by the user, the file name thereof, and the processing conditions in the embossing process input by the user, which are obtained from the input unit 101. Further, the storage unit 102 also stores the uneven shape data and the file name thereof as a result of the actual embossing and measurement. In addition, the file name of the uneven shape data (concave and convex shape image), the processing conditions such as pressure and height, and the file name of the actually measured uneven shape data (concave and convex shape image after processing) are stored as a simulation information table. File.

The processing unit 103 controls the uneven shape output unit 201 with respect to the original uneven shape data of the selected embossing, and processes and displays the uneven shape data after the embossing based on the measurement information of the uneven shape acquisition unit 202. Processing for displaying on the unit 104 is performed.

The uneven shape output unit 201 is an actual device that outputs the uneven shape data acquired by the user in the input unit 101 and stored in the storage unit 102 as an embossed film. For example, an embossed film can be formed by providing an embossed plate cylinder engraved with uneven shape data and pressing the vinyl chloride sheet against the embossed plate cylinder.

The uneven shape acquisition unit 202 is a measuring instrument capable of acquiring three-dimensional shape information. The height of the embossed film after processing is measured for each position with respect to the actual embossed film generated by the uneven shape output unit 201, and the information is acquired. The acquired information is stored in the storage unit 102. The measurement may be performed on an actual embossed film generated by another film other than that generated by the concave-convex shape output unit 201. At that time, by storing the measured actual uneven shape data together with the original uneven shape data, it can be used for the simulation in the processing unit 103 described later.

Also in the third embodiment, the simulation information table 20 described with reference to FIG. 3 of the first embodiment can be similarly applied. In this case, the processed uneven shape image file name 24 stores the result based on the actual uneven shape data measured by the uneven shape acquisition unit 202.

FIG. 11 is a flowchart showing an example of embossing simulation processing according to a third embodiment of the embossing simulation apparatus of the present invention.

First, the input unit 101 inputs the processing conditions for embossing by the user. The input information is stored in the storage unit 102 (S301). The processing here is the same as that of S101 in the first embodiment.

Next, the input unit 101 selects the original uneven shape data for the user to perform the embossing processing simulation, and stores it in the storage unit 102 (S302). The processing here is the same as that of S102 in the first embodiment.

Next, the uneven shape output unit 201 outputs the uneven shape data acquired by the user in the input unit 101 and stored in the storage unit 102 as an embossed film (S303). Here, in the uneven shape output unit 201, the embossed film is actually processed from the original uneven shape data selected in S302 based on the processing conditions input in S301. For example, when using an embossed plate cylinder engraved with uneven shape data, an embossed plate cylinder corresponding to the original uneven shape data selected in S302 is selected, and the embossed plate cylinder is crimped to a vinyl chloride sheet to emboss. A membrane is formed. Here, in the case of the structure of the face material shown in FIG. 2, the resin layer 12 formed on the surface of the pattern layer 11 corresponds to a vinyl chloride sheet, and an embossed film is formed here by an embossed cylinder. The control here can be performed by the processing unit 103.

Next, in the uneven shape acquisition unit 202, the uneven shape output unit 201 acquires the height information of the embossed film actually generated from the uneven shape data (S304). Here, the height of the embossed film generated by the uneven shape output unit 201 is three-dimensionally measured by the uneven shape acquisition unit 202. At this time, the user specifies acquisition conditions such as the size and resolution of the area to be acquired and the resolution of the height information in the input unit 101. For example, the size of the area: 300 × 200 mm, the resolution: 600 dpi, the resolution in the height direction: 10 μm, and the like are specified. Then, the processing unit 103 acquires the measured measurement result according to the conditions such as the size, resolution, and resolution of the designated area. Further, the height information of the acquired product is stored in the storage unit 102 as a gray scale in the same manner as the uneven shape information.

Next, the processing unit 103 removes the measurement error from the height information image of the embossed film stored in the storage unit 102 (S304). Here, the error associated with the measurement by the uneven shape acquisition unit 202 is removed.

As an example of error removal, noise reduction by measurement generated when the height information of the object is acquired by the uneven shape acquisition unit 202 is performed. Here, since the height may be acquired high as a whole at the time of measurement, correction is performed to match the height reference. For example, the noise level measured by the user in the stored height information is specified by a gray scale value (for example, a gray scale value 5), and the specified value is subtracted from all the pixels. As a result, the height of the gray scale value of 5 minutes is subtracted as a whole. At that time, when the pixel value becomes a negative value due to the subtraction, the pixel having a negative value is processed to set the pixel value to 0 regardless of the subtraction result. It is stored in the storage unit 102 again as height information after noise reduction.

As the next example of error removal, the uneven shape acquisition unit 202 performs parallelization processing of the height information acquisition image of the object as necessary. Here, since the height information may be acquired for the inclined surface as a whole rather than the actual surface at the time of measurement, the correction is performed by the parallelization process. The parallelization process is a process for correcting the inclination caused by the geometrical conditions when the height information is acquired. For example, the points corresponding to the four corners of the object are extracted from the acquired image, and the points are corrected so as to be recorded from the state where the points at the four corners face each other (horizontal state).

When the process of removing the measurement error in S304 is completed, the user inputs the storage name of the uneven shape data after the embossing simulation by the input unit 101, and the simulation result is stored in the storage unit 102 (S305). The processing here is the same as that of S104 in the first embodiment.

By the above processing, the simulation of the uneven shape data after the embossing of the third embodiment is completed. In the third embodiment, the uneven shape data after embossing is acquired by the actual measurement. The uneven shape data can be displayed on the display unit 104, but can be used for further simulation. For example, when the pattern layer 11 and the resin layer 12 are separated as shown in FIG. 2, the information on the embossed film of the resin layer 12 uses the uneven shape data after the embossing according to the third embodiment. Then, by changing the pattern of the pattern layer 11, it is possible to simulate various designs using a three-dimensional graphic or the like. By displaying these results on the display unit 104, the user can confirm the simulation results.

In the third embodiment, it is based on the actual measurement, and as a result of actually including the influence of the peripheral shape, more accurate embossing simulation can be performed. Furthermore, by removing measurement errors, more accurate embossing simulation can be performed.

As described above, the embodiments of the present invention have been described, but the present invention is not limited to the above-described embodiments, and various modifications other than those described above are also included. For example, the present invention is not limited to the one provided with all the configurations provided in the above-described embodiment. It is also possible to delete a part of the configuration of a certain embodiment or replace it with another configuration.

For example, in the first embodiment, the formula for considering the influence of peripheral pixels is not limited to Equation 1, and after embossing, the influence on the height of peripheral pixels with respect to the pixel of interest (specific location) is taken into consideration. If the simulation of can be performed, other equations can be applied. At this time, the range for specifying the surrounding pixels enables more accurate simulation by considering the entire enclosed surroundings with respect to the pixel of interest in a well-balanced manner, but even if the aspect ratio is different, it is more accurate than a certain level. Simulation is possible. At least one or more surrounding pixels need to be considered, but the range may be determined as needed.

Further, in the second embodiment, if there is no corresponding concavo-convex shape data after embossing actually measured in the past, the result of another simulation may be used. For example, the simulation result in the first embodiment can be supplementarily used in place of the actually measured uneven shape data after embossing.

Further, the uneven shape data after the embossing based on the actual measurement acquired by the uneven shape acquisition unit 202 and having the error removed, which was described in the third embodiment, is the data after the embossing actually measured in the second embodiment. It can also be used as the uneven shape data of.

Further, in each embodiment, it has been described that the uneven shape data is represented by a gray scale value. As a result, the height can be represented by black-and-white information, but even pixel values other than the grayscale value can be applied to each embodiment.

11 Picture layer 12 Resin layer 101 Input unit 102 Storage unit 103 Processing unit 104 Display unit 201 Concavo-convex shape output unit 202 Concavo-convex shape acquisition unit

Claims (18)

It is equipped with a storage unit that has uneven shape data recorded as image information and a processing unit that simulates the finish of the uneven shape formed on the surface of the face material by embossing.
The original uneven shape data and the corresponding uneven shape data after processing are stored in the storage unit.
The processing unit simulates the finish of the uneven shape after embossing, which is performed using the uneven shape data recorded as image information in the storage unit, in consideration of the influence of the peripheral uneven shape on a specific location. And output as image information
In the simulation, the range of the same pixel configuration as the range including the specific portion and the periphery of the specific portion is searched from the original uneven shape data in which the embossed uneven shape data stored in the storage unit exists. Then, the embossing simulation apparatus is characterized in that the corresponding pixel value of the uneven shape data after embossing corresponding to the central pixel in the range of the same pixel configuration is set as the predicted value of the uneven shape after embossing. .. The embossing simulation apparatus according to claim 1, wherein the image information indicates the value of the height of the uneven shape by the value of the pixel. The embossing simulation apparatus according to claim 1 or 2, wherein the image information indicates a value of the height of the uneven shape by a gray scale value. The embossing processing simulation apparatus according to claim 2 or 3 , wherein the processing unit simulates the finish of the uneven shape after processing in consideration of the processing conditions of pressure. The embossing processing simulation apparatus according to claim 1, wherein the uneven shape data after processing is data obtained by actually measuring the uneven shape after processing. Claim 1 is provided with a concavo-convex shape acquisition unit capable of measuring a three-dimensional shape, and the processing unit outputs data of the concavo-convex shape after embossing measured by the concavo-convex shape acquisition unit as image information. The embossing simulation apparatus according to any one of claims 3 . The embossing simulation apparatus according to claim 6 , wherein the processing unit removes measurement errors from the data of the embossed uneven shape measured by the uneven shape acquisition unit. The uneven shape output unit is provided, and the uneven shape output unit is a device that outputs the uneven shape data stored in the storage unit as an actual embossed film, and the uneven shape acquisition unit is the uneven shape output unit. The embossing simulation apparatus according to claim 6 or 7 , wherein the height of the embossed film output in 1 is measured. The embossing simulation apparatus according to any one of claims 1 to 8 , further comprising an input unit capable of inputting the simulation conditions. The embossing simulation apparatus according to any one of claims 1 to 9 , further comprising a display unit capable of displaying the result of the simulation as image information. The finish of the uneven shape after embossing, which is performed using the uneven shape data stored as image information in the storage unit, is simulated by the processing unit in consideration of the influence of the peripheral uneven shape on a specific location, and the image is imaged. Has a step to output as information
In the simulation, the range of the same pixel configuration as the range including the specific part and the periphery of the specific part is searched from the original uneven shape data in which the embossed uneven shape data stored in the storage unit exists. The embossing simulation method is characterized in that the corresponding pixel value of the uneven shape data after embossing corresponding to the central pixel in the range of the same pixel configuration is set as the predicted value of the uneven shape after embossing. The embossing simulation method according to claim 11, wherein the image information indicates the value of the height of the uneven shape by the value of the pixel. The embossing simulation method according to claim 11 or 12 , wherein the image information indicates a value of the height of the uneven shape by a gray scale value. The embossing processing simulation method according to claim 12 , wherein the processing unit has a step of simulating the finish of the uneven shape after processing in consideration of the processing conditions of pressure. The embossing processing simulation method according to claim 11 , wherein the uneven shape data after processing is data obtained by actually measuring the uneven shape after processing. 13 . The described embossing simulation method. The embossing simulation method according to claim 16 , further comprising a step of removing a measurement error of the measured embossed film height. The embossing simulation method according to claim 16 or 17 , wherein the uneven shape data stored in the storage unit is used as an actual embossing film and is output by the uneven shape output unit.

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