JP7041482B2 - Exposure device - Google Patents

Description

The present invention relates to an exposure apparatus that transports a long substrate (workpiece) such as a flexible printed circuit board by a roll-to-roll carrier (hereinafter referred to as RtoR transport system).

In an exposure device equipped with an RtoR transfer system, a supply reel (winding roll) is arranged on the upstream side of the exposure stage, and a take-up reel (winding roll) is arranged on the downstream side to supply a long substrate such as a printed wiring board. After winding around a reel and a take-up reel, exposure is performed while transporting from the upstream side to the downstream side.

Specifically, while moving the exposure stage that attracts and supports the back surface of the long substrate along the long substrate transport direction, the exposure head installed above the long substrate moves it to the position of the projection area (exposure target area). Project the corresponding pattern light. When the exposure stage moves to the exposure completion position, the exposure stage descends and returns to the first exposure position. By repeating the same exposure operation, a pattern is formed on the entire long substrate.

Japanese Patent Application Laid-Open No. 2015-222370

The conventional RtoR transfer system is fixed to the base (housing) of the exposure apparatus. Therefore, the long substrate is intermittently pulled out from the supply reel before the start of exposure and is sent out to the downstream side. Further, as the exposure stage returns to the upstream side after the end of the exposure, the long substrate may be rewound to the upstream side. Due to such movement of the substrate, meandering occurs in the long substrate, and exposure position shift, or damage such as warpage, wrinkles, and rubbing of the long substrate occurs. In particular, when a plurality of long substrates are run in parallel and exposed at the same time, it becomes difficult to adjust the meandering.

Therefore, it is required to construct a substrate transport system capable of reliably suppressing meandering of a long substrate.

The exposure apparatus of the present invention includes an exposure stage that supports a long substrate and can be reciprocated along a substrate transfer line, a substrate supply unit that is arranged on the upstream side of the exposure stage and is provided with a supply reel, and an exposure stage. It is arranged on the downstream side and includes a substrate take-up section provided with a take-up reel. Here, the "upstream side" supports the supply reel side of the exposure stage, and the "downstream side" represents the take-up reel side.

For example, the substrate supply unit may be configured to include an upstream support roller, and the substrate winding unit may be configured to provide a downstream support roller. It is also possible to configure the long substrate with a plurality of parallel long substrates. The exposure stage may be configured to be able to move up and down while adsorbing and holding a long substrate, for example.

In the present invention, the substrate supply unit and the substrate winding unit can be moved along the substrate transfer line. The "board transfer line" here represents the direction in which the board is sent out or vice versa, and corresponds to the moving direction of the exposure stage. During the exposure operation, the substrate supply unit and the substrate winding unit may be moved according to the movement of the exposure stage.

The exposure apparatus may be provided with a stage moving mechanism for reciprocating the exposure stage along the substrate transport line and a transport section moving mechanism for reciprocating the substrate supply unit and the substrate winding unit along the substrate transfer line. It is possible. In the transport unit moving mechanism, for example, the substrate supply unit and the substrate winding unit can be interlocked with each other by one moving mechanism, that is, they can be integrally moved.

Further, it is also possible to provide a movement control unit that controls the movement of the substrate supply unit and the substrate winding unit so as to maintain the relative positional relationship between the exposure stage and the substrate supply unit and the substrate winding unit. For example, a sensor for detecting the distance between at least one of the substrate supply unit and the substrate winding unit and the exposure stage is provided, and the movement control unit determines the exposure stage, the substrate supply unit, and the substrate according to the detected distance interval. The movement of the take-up unit may be controlled.

The exposure apparatus according to another aspect of the present invention supports a plurality of parallel long substrates, has an exposure stage that can be reciprocated along a substrate transport line, and is arranged to face each other on both sides of the exposure stage. A plurality of reel pairs for transporting a substrate are provided, and the plurality of reel pairs can be reciprocated along a substrate transport line together with an exposure stage.

Multiple reel pairs can wind multiple long boards in the same direction, and at least one of the reel pairs winds in a different direction from the other long boards. It is also possible to configure it in.

The exposure apparatus according to another aspect of the present invention includes an exposure stage that supports a long substrate, a pair of reels that are arranged on the upstream side and the downstream side of the exposure stage, respectively, and an exposure unit that exposes the long substrate. , The exposed unit is relatively movable along the substrate transfer line with respect to the exposed stage and the pair of reels.

According to the present invention, in an exposure apparatus provided with an RtoR transfer system, exposure can be performed while suppressing meandering of a long substrate.

It is a schematic block diagram of the exposure apparatus which is this embodiment. It is a perspective view which shows a part of an exposure apparatus schematically. It is a schematic block diagram of an exposure apparatus. It is a figure which showed the position of the exposure stage and the transport system at the start of exposure and at the completion of exposure.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic configuration diagram of an exposure apparatus according to this embodiment. FIG. 2 is a perspective view schematically showing a part of the exposure apparatus. FIG. 3 is a schematic block diagram of the exposure apparatus.

The exposure apparatus 10 is an exposure apparatus provided with an RtoR transfer system that performs an exposure operation while conveying a long substrate W wound in a roll shape, and includes a substrate supply device 20, a substrate winding device 30, and an exposure unit 40. .. Here, the long substrate W is formed in a roll shape by winding a long sheet-like substrate on which a copper thin film layer is formed on a long film and a photosensitive material such as a photoresist is coated (or affixed) on the long film. Has been done. As shown in FIG. 2, the long substrate W is composed of two strips (pair) of substrates W1 and W2 having the same width.

The exposure stage (table) 15 attracts the back surface of the long substrate W and holds it flat, and can move up and down in the Z direction between the back surface adsorption position and a predetermined separation position away from the back surface, and is not shown. It goes up and down by the elevating mechanism. The exposure stage 15 is supported by the stage moving mechanism 50 as described later, and can move along the X direction. In the following, the direction along the transport direction (transport line) M of the long substrate W is "X", the direction perpendicular to the transport direction M (board width direction) is "Y", and perpendicular to X and Y. Direction (vertical direction) is represented by "Z".

The exposure unit 40 is arranged at a predetermined distance in the Z direction from the long substrates W1 and W2, and is fixed to the base 10B via a frame (not shown). As shown in FIG. 3, the exposure unit 40 includes a light source 41 such as a semiconductor laser, an illumination optical system 42, a DMD (Digital Micro-mirror Device) 43 in which a plurality of micromirrors are arranged in a matrix, and an imaging optical system. Each of the exposure heads is composed of a plurality of exposure heads including 44 and the like, and each exposure head is defined with an exposure region along the transport direction M. The light source 41 is driven by the light source control unit 110.

The DMD of each exposure head positions the posture of the micromirror based on the drawing data (raster data) corresponding to the exposure area position sent from the exposure control unit 120, whereby the pattern light is transmitted to the long substrates W1 and W2. Projected on. By switching the posture of the micromirror according to the relative movement of the long substrates W1 and W2 with respect to the exposed portion 40, the photosensitive materials of the long substrates W1 and W2 are exposed (multiple exposure, etc.), whereby a pattern is formed. Will be done. The controller 100 (see FIG. 3) controls the entire exposure operation of the exposure apparatus 10. It is also possible to configure it by an exposed portion using a mask.

The substrate supply device 20 includes supply reels 22A and 22B arranged on the upstream side of the exposure stage 15, a support roller 24, and a drive mechanism (not shown) for axially rotating the supply reels 22A and 22B, respectively. The drive mechanism is composed of, for example, a stepping motor or the like. The supply reels 22A and 22B, which are cantilevered and supported by the substrate supply device 20, hold and fix the unexposed portions of the long substrates W1 and W2 in a rolled state, respectively, and rotate the axis to the downstream side. The long substrate W can be sent out toward. The supply reels 22A and 22B are referred to as "upstream side" and the take-up reels 32A and 32B are referred to as "downstream side" when viewed from the exposure stage 15.

The substrate take-up device 30 includes a take-up reels 32A and 32B arranged on the downstream side of the exposure stage 15, a support roller 34, and a drive mechanism (not shown) for axially rotating the take-up reels 32A and 32B, respectively. There is. The take-up reels 32A and 32B hold and fix the exposed portions of the long boards W1 and W2 in a rolled state, respectively, and can take up the long boards W1 and W2 by rotating the shaft, respectively. can. The winding process of the long substrates W1 and W2 by the substrate supply device 20 and the substrate winding device 30 is controlled by the transfer control unit 130 (see FIG. 3).

The support rollers 24 and 34 arranged between the supply reels 22A and 22B, the take-up reels 32A and 32B and the exposure stage 15, respectively, support the long substrates W1 and W2, and the long substrates W1 and W2 are conveyed. It is configured as a free roller that rotates around the reel. The heights of the support rollers 24 and 34 are adjusted so that the long substrates W1 and W2 move to the downstream side at a position slightly lower than the exposed surface height or the exposed surface height, respectively. It is cantilevered by the substrate winding device 30. The long boards W1 and W2 are appropriately tensioned at the bridged portion of the section T (see FIG. 1) of the support rollers 24 and 34, and the long boards W1 and W2 are conveyed without wrinkles or elongation. Will be done.

The supply reels 22A and 22B and the take-up reels 32A and 32B include well-known mechanisms 26A and 26B and 36A and 36B for fixing the roll-shaped winding portions of the long substrates W1 and W2 when the substrate is mounted. Further, in the drive mechanism of each of the board supply device 20 and the board take-up device 30, the supply reel 22A and the take-up reel 32A, and the supply reel 22B and the take-up reel 32B are rotated synchronously, respectively, and the long boards W1 and W2 are designated. It is transported intermittently by the length.

The stage moving mechanism 50 includes a moving member 52 equipped with an elevating mechanism (not shown) that cantilevers support the exposure stage 15, and a pair of guide rails 54A and 54B and an actuator 55 installed on the base 10B. The pair of guide rails 54A and 54B extend along the X direction, and the moving member 52 can move along the guide rails 54A and 54B in the X direction and vice versa. The actuator 55 is composed of, for example, a ball screw.

The transport unit moving mechanism 60 includes a plate-shaped moving member 62, a pair of guide rails 64A and 64B installed on the base 10B, and an actuator 65. The board supply device 20 and the board take-up device 30 are mounted on the moving member 62, and move (interlock) as one. The pair of guide rails 64A and 64B extend along the X direction, and the moving member 62 can move along the guide rails 64A and 64B in the X direction and vice versa.

The movement control unit 70 provided on the base 10B controls the drive of the actuators 55 and 65, and maintains the relative positional relationship between the transfer system (board supply device 20 and board winding device 30) and the exposure stage 15. That is, the movement of the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 is feedback-controlled so that the relative distance interval becomes constant.

In order to measure the relative distance between the exposure stage 15 and the substrate supply device 20 (board winding device 30) along the transport direction M, the position detection photosensor 90 faces the exposure stage 15 of the substrate supply device 20. It is arranged on the side surface (see FIG. 2). The position detection photo sensor 90 has a built-in light source such as an LED and illuminates the side surface of the exposure stage 15. The side surface of the exposure stage 15 is formed so that the light irradiation position has a light amount difference between the reference position and the other positions. The movement control unit 70 controls the actuators 55 and 65 based on the difference between the relative distance interval according to the detected light amount and the reference relative distance interval.

A position sensor 80 for detecting the end face positions of each of the long substrates W1 and W2 is provided on the support roller 24 side of the exposure stage 15. The position sensor 80 can be configured by a transmissive photo sensor such as a line sensor. The board supply measure 20 and the board take-up device 30 are provided with a mechanism (not shown) for controlling the axial positions of the supply reels 22A and 22B and the take-up reels 32A and 32B, respectively, according to the detected end face position. It is possible to correct the meandering running by adjusting the position in the reel axis direction.

FIG. 4 is a diagram showing the positions of the exposure stage and the transport system at the start of exposure and the completion of exposure.

Before the start of exposure, the exposure stage 15 attracts and holds the long substrates W1 and W2, and the supply reels 22A and 22B and the take-up reels 32A and 32B are in a stationary state because they are not driven. With the start of exposure, the exposure stage 15 moves at a predetermined speed along the X direction. At this time, the substrate supply device 20 and the substrate winding device 30 move in accordance with the movement of the exposure stage 15.

That is, the movement starts in synchronization with the exposure stage 15, and moves in the X direction at the same speed as the exposure stage 15 so as to maintain the relative positional relationship between the substrate supply device 20 and the substrate winding device 30 and the exposure stage 15. Go (run in parallel). Therefore, the long substrates W1 and W2 are not sent to the downstream side before the exposure stage 15 is moved and during the movement of the exposure stage 15, and are stationary with respect to the exposure stage 15. While the exposure stage 15 is moving, pattern light corresponding to the exposure area position of each exposure head is projected from the exposure unit 40.

When the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 reach the exposure completion position, the exposure stage 15 releases the suction support of the long substrates W1 and W2 and descends. Then, the supply reels 22A and 22B and the take-up reels 32A and 32B rotate synchronously, and the long substrates W1 and W2 are taken up by the take-up reels 32A and 32B by a predetermined length.

When the winding to the take-up reels 32A and 32B is completed, the exposure stage 15, the substrate supply device 20, and the substrate take-up device 30 move synchronously and return to the exposure start position. During this time, the supply reels 22A and 22B and the take-up reels 32A and 32B are in a stationary state because they are not driven. By repeating the above-mentioned exposure operation, a pattern is formed on the entire long substrates W1 and W2.

As described above, according to the present embodiment, in the exposure apparatus 10 provided with the RtoR transport system for transporting the long substrates W1 and W2, the substrate supply for holding the supply reels 22A and 22B provided on the upstream side of the exposure stage 15 is provided. A device 20 and a substrate winding device 30 for holding the take-up reels 32A and 32B provided on the downstream side are provided. During the exposure operation, the exposure stage 15 is moved in the X direction by the stage moving mechanism 50, and at the same time, the substrate supply device 20 and the substrate winding device 30 are moved together in the X direction by the transport unit moving mechanism 60.

Since the substrate transfer system (board supply device 20, substrate winding device 30) moves together with the exposure stage 15, the long substrates W1 and W2 are not sent to the downstream side before and during the movement of the exposure stage 15. .. Therefore, meandering running during exposure unlike a conventional transport system is suppressed, and exposure position shift due to meandering running or wrinkles on the substrate does not cause warpage. Further, by constructing such a substrate transport system, it is not necessary to provide a mechanism such as a dancer roller, and it is possible to construct the substrate transport system with a simple configuration.

The substrate supply device 20 and the substrate take-up device 30 need only feed the long substrate W in only one direction on the downstream side during exposure, and do not need to rewind. Therefore, it is possible to realize pattern exposure in which the meandering of the long substrate W is suppressed. In particular, it is suitable for an exposure apparatus that conveys two long substrates W1 and W2 whose meandering adjustment is difficult.

Since the board transfer system moves, the board transfer length (the board length between the supply reels 22A and 22B and the take-up reels 32A and 32B) can be shortened. By shortening the substrate transport length, wrinkles and elongation of the long substrates W1 and W2 are less likely to occur, and a pattern can be formed with high accuracy. In particular, it is possible to configure a transport system that feeds out the long substrates W1 and W2 only by providing one support roller 24 and 34.

Further, after the exposure operation is completed, the long substrates W1 and W2 are sent out to the downstream side and wound while the exposure stage 15 does not adsorb and support the long substrates W1 and W2, so that the winding can be smoothly performed. .. At this time, since the substrate transport length is short, winding can be performed in a short time.

In the present embodiment, the exposure stage 15 and the substrate transport system (board supply device 20, substrate winding device 30) are separately driven by the stage moving mechanism 50 and the transport unit moving mechanism 60, respectively. Regarding the long boards W1 and W2, the winding diameters of the roll-shaped portions of the supply reels 22A and 22B and the roll-shaped portions of the take-up reels 32A and 32B are such that the long boards W1 and W2 are taken up by the board take-up device 30. It changes sequentially in the process of being reeled, and the weight balance is not constant.

However, by providing the transport unit moving mechanism 60 different from the stage moving mechanism 50, it is possible to prevent the movement control of the exposure stage 15 from being affected even if the weight balance of the long substrates W1 and W2 changes. In addition, it is possible to construct a transport system while using the conventional stage moving mechanism.

On the other hand, the board supply device 20 and the board take-up device 30 are fixedly supported by the same moving member 62 and move together. Since the board supply device 20 and the board take-up device 30 are interlocked with each other, the relative positional relationship between the board supply device 20 and the board take-up device 30 does not change, and the relative maintenance relationship with the exposure stage 15 is maintained. It becomes easy to make it. Further, the transport unit moving mechanism 60 can be integrated into one drive system.

On the other hand, the movement control unit 70 drives and controls the actuators 55 and 65 so as to maintain the relative positional relationship between the exposure stage 15 and the substrate supply device 20 and the substrate winding device 30 while the exposure stage 15 is moving. There is. As a result, the supply reels 22A and 22B and the take-up reels 32A and 32B can be prevented from approaching the exposure stage 15 and the long substrates W1 and W2 from being stretched or warped, and the exposure position can be prevented from being displaced.

The movement control unit 70 may control the movement speed and acceleration when the distance interval becomes equal to or greater than the threshold value. Alternatively, the supply reels 22A and 22B and / or the take-up reels 32A and 32B may be controlled to rotate around the axis so that appropriate tension is applied to the long substrates W1 and W2.

Not only the two long substrates W1 and W2, but also a larger number of long substrates can be conveyed in parallel at the same time, and it is also possible to configure one long substrate. The substrate supply device 20 and the substrate take-up device 30 may not be mechanically connected but may be moved by separate moving mechanisms. Further, the exposure stage 15, the substrate supply device 20, and the substrate winding device 30 may be moved by the same moving mechanism.

In the above embodiment, the substrate supply device 20 is provided on the upstream side of the exposure stage 15 and the substrate winding device 30 is provided on the downstream side, and the supply reels 22A and 22B are provided so as to move the long substrates W1 and W2 in the same direction. Although the take-up reels 32A and 32B were driven, the long substrates W1 and W2 may be moved in opposite directions to each other.

That is, two pairs of reels are provided on both sides of the exposure stage 15, and a supply reel and a take-up reel are installed so that one reel pair is wound in the X direction, while the other reel pair is directed in the −X direction. It is possible to provide a supply reel and a take-up reel so as to take up the reel. In this case, a pair of transfer devices that combine the functions of the board supply device and the board take-up device are moved with respect to the exposure stage. When the long substrates W1 and W2 are configured to move in opposite directions to each other in this way, it is possible to reduce the change in the weight balance of the long substrates on the upstream side and the downstream side of the exposure stage.

Further, in the above embodiment, the exposure stage 15 is moved to realize the relative movement between the long substrates W1 and W2 and the exposure unit 40 for exposure, but the exposure stage 15 is fixed to the base 10B and exposed. The unit 40 may be moved relative to each other by moving in the substrate transport direction by a moving device (not shown). In that case, the substrate supply device 20 and the substrate winding device 30 are fixed to the base 10B so as to maintain a relative positional relationship with the exposure stage 15.

10 Exposure device 15 Exposure stage 20 Board supply device 22A, 22B Supply reel 30 Board winding device 32A, 32B Winding reel 40 Exposure unit 50 Stage movement mechanism 60 Transport unit movement mechanism 70 Movement control unit 80 Position sensor 90 Position detection photo Sensor

Claims (5)

An exposure stage that supports a long substrate and can be reciprocated along the substrate transfer line.
An exposed unit that projects pattern light onto the long substrate,
A substrate supply unit arranged on the upstream side of the exposure stage and provided with a supply reel,
A substrate take-up section arranged on the downstream side of the exposure stage and provided with a take-up reel ,
A moving mechanism that integrally moves the exposure stage, the substrate supply unit, and the substrate take-up unit along the substrate transfer line during the exposure operation.
An exposure apparatus characterized by comprising. The board supply unit is provided with an upstream support roller.
The exposure apparatus according to claim 1 , wherein the substrate winding portion includes a downstream support roller. The exposure apparatus according to claim 1 or 2 , wherein the long substrate is composed of a plurality of parallel long substrates. The exposure apparatus according to any one of claims 1 to 3 , wherein the exposure stage moves while adsorbing and holding the long substrate and can be moved up and down. An exposure stage that supports a long substrate and can be reciprocated along the substrate transfer line.
An exposed unit that projects pattern light onto the long substrate,
A pair of reels arranged on the upstream side and the downstream side of the exposure stage and carrying the long substrate, and
A moving mechanism that integrally moves the exposure stage and the pair of reels along the substrate transfer line during the exposure operation.
An exposure apparatus characterized by comprising.

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