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JP7051392B2 - Method for manufacturing quartz glass crucible and quartz glass crucible - Google Patents
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JP7051392B2 - Method for manufacturing quartz glass crucible and quartz glass crucible - Google Patents

Method for manufacturing quartz glass crucible and quartz glass crucible Download PDF

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JP7051392B2
JP7051392B2 JP2017225352A JP2017225352A JP7051392B2 JP 7051392 B2 JP7051392 B2 JP 7051392B2 JP 2017225352 A JP2017225352 A JP 2017225352A JP 2017225352 A JP2017225352 A JP 2017225352A JP 7051392 B2 JP7051392 B2 JP 7051392B2
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茂雄 小幡
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Coorstek KK
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Description

本発明は石英ガラスルツボ及び石英ガラスルツボの製造方法に関し、シリコン単結晶を引上げる際に用いられる、原料シリコン融液を収容するための石英ガラスルツボ及び石英ガラスルツボの製造方法に関する。 The present invention relates to a quartz glass rutsubo and a method for manufacturing a quartz glass rutsubo, and to a quartz glass rutsubo and a quartz glass rutsubo for accommodating a raw material silicon melt, which are used when pulling up a silicon single crystal.

シリコン単結晶の製造においては、CZ法が広く用いられている。この方法は、ルツボ内に収容された原料シリコン融液の表面に種結晶を接触させ、ルツボを回転させるとともに、前記種結晶を反対方向に回転させながら上方へ引上げることにより、種結晶の下端に単結晶インゴットを育成していくものである。
上記方法において、シリコン融液を収容するためのルツボには、一般に、内層が高純度の石英ガラスからなり、外層が内層よりも純度が低く、安価な、天然石英ガラスからなる石英ガラスルツボが用いられている。
The CZ method is widely used in the production of silicon single crystals. In this method, the seed crystal is brought into contact with the surface of the raw material silicon melt contained in the crucible, the crucible is rotated, and the seed crystal is pulled upward while rotating in the opposite direction, thereby pulling the lower end of the seed crystal upward. It is intended to grow single crystal ingots.
In the above method, as the crucible for accommodating the silicon melt, a quartz glass crucible made of natural quartz glass, which has an inner layer made of high-purity quartz glass and an outer layer having a lower purity than the inner layer and is inexpensive, is generally used. Has been done.

近年、シリコン単結晶製造の効率化のため、引上げるシリコン単結晶の大口径化が進み、これに伴い、シリコン単結晶の製造に要する時間も長くなり、ルツボの使用時間、すなわち、加熱時間も長くなり、ルツボは長時間にわたって高温下に曝される。そのため、ルツボを構成する石英ガラスの粘性が低下し、ルツボが変形を生じやすくなることが懸念される。 In recent years, in order to improve the efficiency of silicon single crystal production, the diameter of the silicon single crystal to be pulled up has been increased, and along with this, the time required for producing the silicon single crystal has become longer, and the crucible usage time, that is, the heating time has also increased. As it gets longer, the crucible is exposed to high temperatures for extended periods of time. Therefore, there is a concern that the viscosity of the quartz glass constituting the crucible will decrease and the crucible will be easily deformed.

これに対しては、高温下でのルツボの変形抑制するために、石英原料粉にアルミニウム(Al)を添加することにより、石英ガラスの粘性を高めることが知られている。
例えば、特許文献1には、少なくともルツボの外周部分にアルミニウム濃度5~45ppmおよびリチウム濃度がアルミニウム濃度の2%以上の石英粉を用いて製造されたルツボであって、1500℃での粘度が9.6×109ポイズ以上であるルツボが示されている。
On the other hand, it is known that the viscosity of quartz glass is increased by adding aluminum (Al) to the quartz raw material powder in order to suppress the deformation of the crucible at high temperature.
For example, Patent Document 1 describes a crucible manufactured by using quartz powder having an aluminum concentration of 5 to 45 ppm and a lithium concentration of 2% or more at least on the outer peripheral portion of the crucible, and has a viscosity of 9 at 1500 ° C. A crucible that is 6 × 10 9 poise or more is shown.

特開2006-16240号公報Japanese Unexamined Patent Publication No. 2006-16240

ところで、石英原料粉にアルミニウム(Al)を添加することにより、石英ガラスの粘性を高めたルツボにおいて、石英ガラスルツボの内表面に多数のしわが発生するという現象が見られた。
このしわの発生について、図1に基づいて具体的に説明する。
図1に示すように、石英ガラスルツボ1は、高純度の石英ガラスからなる内層2と、石英原料粉にアルミニウム(Al)を添加し、粘性を高めた天然石英ガラスからなる外層3を備え、開口端部から直胴部4、湾曲部5、底部6が形成され、全体形状として有底円筒状に形成されている。
そして、この石英ガラスルツボ1が長時間にわたって高温下に曝されると、図1に示すように、直胴部4の下部から湾曲部5の領域における石英ガラスルツボ1の内表面に、多数のしわ(凹凸)が発生する。
By the way, a phenomenon was observed in which a large number of wrinkles were generated on the inner surface of the quartz glass crucible in the crucible in which the viscosity of the quartz glass was increased by adding aluminum (Al) to the quartz raw material powder.
The occurrence of this wrinkle will be specifically described with reference to FIG.
As shown in FIG. 1, the quartz glass crucible 1 includes an inner layer 2 made of high-purity quartz glass and an outer layer 3 made of natural quartz glass having aluminum (Al) added to quartz raw material powder to increase the viscosity. A straight body portion 4, a curved portion 5, and a bottom portion 6 are formed from the open end portion, and are formed in a bottomed cylindrical shape as a whole.
When the quartz glass crucible 1 is exposed to a high temperature for a long time, as shown in FIG. 1, a large number of quartz glass crucibles 1 are formed on the inner surface of the quartz glass crucible 1 in the region from the lower part of the straight body portion 4 to the curved portion 5. Wrinkles (unevenness) occur.

本発明者は、石英ガラスルツボの直胴部の下部から湾曲部の領域における石英ガラスルツボの内表面に発生するしわの抑制について鋭意研究した。
その結果、石英ガラスルツボの外層の石英原料粉にアルミニウム(Al)を添加し石英ガラスの粘性を高めたとしても、内層と外層の粘性の差が大きい場合には、粘性の小さい内層の沈み込み(図1における矢方向への移動)が大きくなり、直胴部の下部から湾曲部の領域において多数のしわ(凹凸)が発生することを知見した。
また、このしわの発生により結晶化した内表面では亀裂幅(クラックの幅:クラックの長さ方向(長手方向)ではなく、幅方向(短手方向)の幅)が大きくなりやすく、シリコン融液と石英ガラス内表面との反応により発生したガスが溜りやすくなる。溜まったガスが離脱し、シリコン融液内に移動して固液界面に到達し、シリコン単結晶内に取り込まれ、エアポケットとなることを知見した。
The present inventor has diligently studied the suppression of wrinkles generated on the inner surface of the quartz glass crucible in the region from the lower part of the straight body portion to the curved portion of the quartz glass crucible.
As a result, even if aluminum (Al) is added to the quartz raw material powder in the outer layer of the quartz glass crucible to increase the viscosity of the quartz glass, if the difference in viscosity between the inner layer and the outer layer is large, the inner layer with less viscosity sinks. It was found that (movement in the direction of the arrow in FIG. 1) became large, and a large number of wrinkles (unevenness) occurred in the region from the lower part of the straight body portion to the curved portion.
In addition, the crack width (crack width: width in the width direction (short direction), not in the crack length direction (longitudinal direction)) tends to be large on the inner surface crystallized by the occurrence of this wrinkle, and the silicon melt. The gas generated by the reaction between the crystallized glass and the inner surface of the quartz glass tends to accumulate. It was found that the accumulated gas escaped, moved into the silicon melt, reached the solid-liquid interface, was taken into the silicon single crystal, and became an air pocket.

本発明は上記技術的課題を解決するためになされたものであり、内層と外層の粘性差を特定の範囲とすることにより、直胴部の下部から湾曲部の領域における内表面に発生するしわ(凹凸)を抑制し、また内表面の発生する亀裂幅(クラックの幅)がより縮小する、石英ガラスルツボ及び石英ガラスルツボの製造方法を提供することを目的とする。 The present invention has been made to solve the above technical problems, and by setting the viscosity difference between the inner layer and the outer layer within a specific range, wrinkles generated on the inner surface in the region from the lower part of the straight body portion to the curved portion. It is an object of the present invention to provide a quartz glass crucible and a method for manufacturing a quartz glass crucible, which suppresses (unevenness) and further reduces the crack width (crack width) generated on the inner surface.

上記目的を達成するためになされた本発明に係る石英ガラスルツボは、高純度の石英ガラスからなる内層と、石英原料粉にアルミニウム(Al)を添加し、粘性を高めた天然石英ガラスからなる外層を有するシリコン単結晶引上石英ガラスルツボであって、前記内層のAl濃度が10ppm以下であり、かつ、前記外層のAl濃度が7ppm以上20ppm以下であり、前記内層と前記外層の1400℃における粘性差が0.8×10 +10 (poise)以下であることを特徴としている。 The quartz glass rutsubo according to the present invention made to achieve the above object has an inner layer made of high-purity quartz glass and an outer layer made of natural quartz glass having aluminum (Al) added to quartz raw material powder to increase the viscosity. The inner layer has an Al concentration of 10 ppm or less, the outer layer has an Al concentration of 7 ppm or more and 20 ppm or less, and the inner layer and the outer layer have viscosity at 1400 ° C. It is characterized in that the difference is 0.8 × 10 +10 (poise) or less.

このように、前記内層と前記外層の1400℃における粘性差が0.8×10 +10 (poise)以下であるため、シリコン単結晶引上げの際に、内層の沈み込み(内層の下方への移動)が抑制され、ルツボの直胴部下部の内表面から湾曲部の内表面に発生するしわ(凹凸)を抑制することができる。
また、前記しわ(凹凸)の発生によって生じる亀裂(クラック)も抑制でき、またその幅をより小さくできる。
このように、シリコン融液と石英ガラス内表面との反応により発生したガスの溜りとなる亀裂(クラック)が抑制され、その結果、シリコン単結晶内のエアポケットも抑制される。
As described above, since the viscosity difference between the inner layer and the outer layer at 1400 ° C. is 0.8 × 10 +10 (poise) or less, the inner layer sinks (moves downward of the inner layer) when the silicon single crystal is pulled up. Can be suppressed, and wrinkles (unevenness) generated from the inner surface of the lower part of the straight body portion of the crucible to the inner surface of the curved portion can be suppressed.
In addition, cracks caused by the generation of wrinkles (unevenness) can be suppressed, and the width thereof can be made smaller.
In this way, cracks, which are gas pools generated by the reaction between the silicon melt and the inner surface of the quartz glass, are suppressed, and as a result, air pockets in the silicon single crystal are also suppressed.

更に、本発明に係る石英ガラスルツボにあっては、前記内層のAl濃度が10ppm以下であり、かつ、前記外層のAl濃度が7ppm以上20ppm以下である。
前記内層は、シリコン融液中への不純物の拡散を抑制するため、高純度の石英ガラスで形成される。そのため、Al濃度は10ppm以下である必要がある。
また、前記内層と前記外層の1400℃における粘性差が0.8×10 +10 (poise)以下になすためには、前記外層のAl濃度が7ppm以上20ppm以下である必要がある。
外層のAl濃度が7ppm未満の場合には、高温下でのルツボの変形抑制できないため、好ましくない。一方、外層のAl濃度が20ppmを超える場合には、前記内層と前記外層の1400℃における粘性差を0.8×10 +10 (poise)以下にできず、直胴部の下部から湾曲部の内表面領域において多数のしわ(凹凸)が発生するため、好ましくない。
Further, in the quartz glass crucible according to the present invention, the Al concentration of the inner layer is 10 ppm or less, and the Al concentration of the outer layer is 7 ppm or more and 20 ppm or less.
The inner layer is made of high-purity quartz glass in order to suppress the diffusion of impurities into the silicon melt. Therefore, the Al concentration needs to be 10 ppm or less.
Further, in order for the viscosity difference between the inner layer and the outer layer at 1400 ° C. to be 0.8 × 10 +10 (poise) or less, the Al concentration of the outer layer needs to be 7 ppm or more and 20 ppm or less.
When the Al concentration of the outer layer is less than 7 ppm, the deformation of the crucible cannot be suppressed under high temperature, which is not preferable. On the other hand, when the Al concentration of the outer layer exceeds 20 ppm, the viscosity difference between the inner layer and the outer layer at 1400 ° C. cannot be less than 0.8 × 10 +10 (poise), and the inside of the curved portion from the lower part of the straight body portion. It is not preferable because a large number of wrinkles (unevenness) occur in the surface region.

上記目的を達成するためになされた本発明に係る石英ガラスルツボの製造方法は、高純度の石英ガラスからなる内層と、天然石英ガラスからなる外層を有する、上記シリコン単結晶引上用の石英ガラスルツボの製造方法であって、前記内層を形成するための石英原料粉中にAl成分を添加することなく、かつ前記外層を形成するための石英原料粉中にAl成分を添加し、前記内層のAl濃度が10ppm以下であり、かつ、前記外層のAl濃度が7ppm以上20ppm以下に調整されることを特徴としている。 The method for producing a quartz glass rut according to the present invention, which has been made to achieve the above object, has an inner layer made of high-purity quartz glass and an outer layer made of natural quartz glass, and is used for pulling out a silicon single crystal. It is a method for producing a glass rut, in which the Al component is added to the quartz raw material powder for forming the outer layer without adding the Al component to the quartz raw material powder for forming the inner layer, and the inner layer is added. The Al concentration of the outer layer is 10 ppm or less, and the Al concentration of the outer layer is adjusted to 7 ppm or more and 20 ppm or less.

このように、前記外層を形成する石英原料粉中にAl成分を所定量添加することにより、直胴部の下部から湾曲部の内表面領域におけるしわの発生を抑制できる石英ガラスを容易に製造することができる。 As described above, by adding a predetermined amount of the Al component to the quartz raw material powder forming the outer layer, it is possible to easily produce quartz glass capable of suppressing the generation of wrinkles in the inner surface region of the curved portion from the lower part of the straight body portion. be able to.

本発明によれば、内層と外層の粘性差を特定の範囲とすることにより、直胴部の下部から湾曲部の領域における内表面に発生するしわ(凹凸)を抑制し、また内表面の発生する亀裂幅(クラックの幅)がより縮小する、石英ガラスルツボ及び石英ガラスルツボの製造方法を得ることができる。 According to the present invention, by setting the difference in viscosity between the inner layer and the outer layer within a specific range, wrinkles (unevenness) generated on the inner surface in the region from the lower part of the straight body portion to the curved portion are suppressed, and the generation of the inner surface is suppressed. It is possible to obtain a quartz glass crucible and a method for manufacturing a quartz glass crucible in which the crack width (crack width) is further reduced.

図1は、石英ガラスルツボの直胴部下部から湾曲部の領域の内表面に発生するしわを説明するための概略図である。FIG. 1 is a schematic view for explaining wrinkles generated on the inner surface of the region of the curved portion from the lower part of the straight body portion of the quartz glass crucible. 図2は、使用した石英ルツボに生じたクラックを示す図である。FIG. 2 is a diagram showing cracks generated in the quartz crucible used.

以下、本発明にかかる石英ガラスルツボ及び石英ガラスルツボの製造方法の一実施形態を説明する。
本発明にかかる石英ガラスルツボは、高純度の石英ガラスからなる内層と、天然石英ガラスからなる外層を有するシリコン単結晶引上用の石英ガラスルツボであって、前記内層と前記外層の1400℃における粘性差が0.8×10 +10 (poise)以下であることを特徴としている。
Hereinafter, an embodiment of a quartz glass crucible and a method for manufacturing a quartz glass crucible according to the present invention will be described.
The quartz glass rutsubo according to the present invention is a quartz glass rutsubo for pulling a silicon single crystal having an inner layer made of high-purity quartz glass and an outer layer made of natural quartz glass, and at 1400 ° C. of the inner layer and the outer layer. It is characterized in that the viscosity difference is 0.8 × 10 +10 (poise) or less.

この石英ガラスルツボは、図1に示した石英ガラスルツボと同様の形状に形成されている。即ち、高純度石英原料粉で形成される高純度の石英ガラスからなる内層と、アルミニウム(Al)を添加した石英原料粉で形成された、粘性を高めた天然石英ガラスからなる外層とを備え、全体形状として有底円筒状に形成され、開口端部から直胴部、湾曲部、底部が形成されている。 This quartz glass crucible is formed in the same shape as the quartz glass crucible shown in FIG. That is, it is provided with an inner layer made of high-purity quartz glass formed of high-purity quartz raw material powder and an outer layer made of highly viscous natural quartz glass made of quartz raw material powder added with aluminum (Al). The overall shape is a bottomed cylindrical shape, and a straight body portion, a curved portion, and a bottom portion are formed from the open end portion.

前記内層は高純度石英原料粉によって形成され、前記内層のAl濃度が10ppm以下、また他の不純物、例えば、Na,K,Liの濃度が1ppm未満となる高純度石英原料が用いられる。
Alは石英原料に比較的多く含まれている元素である、一方、Na、Kは粘性が低下し、ルツボが変形を生じやすくなるため、濃度が低いことが好ましい。また、前記高純度石英原料粉に含まれる不純物のうち、特に、Al,Na,K又はLiが石英ガラス中で拡散しやすく、ブラウンモールドの生成、さらに、ルツボ内表面の荒れや剥離に大きな影響を及ぼす。このため、これらの不純物をほとんど含まないことが好ましい。
即ち、内層のAl濃度が10ppm以下、また他の不純物、例えば、Na,K,Liの濃度が1ppm未満であることが好ましい。
The inner layer is formed of high-purity quartz raw material powder, and a high-purity quartz raw material having an Al concentration of 10 ppm or less in the inner layer and other impurities such as Na, K, Li of less than 1 ppm is used.
Al is an element contained in a relatively large amount in the quartz raw material, while Na and K have a low viscosity and tend to deform the crucible, so a low concentration is preferable. Further, among the impurities contained in the high-purity quartz raw material powder, Al, Na, K or Li are particularly likely to diffuse in the quartz glass, which has a great influence on the formation of a brown mold and further on the roughness and peeling of the inner surface of the crucible. To exert. Therefore, it is preferable that these impurities are hardly contained.
That is, it is preferable that the Al concentration of the inner layer is 10 ppm or less, and the concentration of other impurities such as Na, K, and Li is less than 1 ppm.

また、前記内層は、前記高純度石英原料粉を溶融することによって形成され、気泡を含まない透明石英ガラスとして形成される。
前記高純度石英原料粉は、合成石英粉末でも、天然石英粉末を合成石英粉末と同等レベルまで高純度化したものであってもよい。合成石英粉末としては、例えば、シリコンアルコキシドの加水分解等により合成されたものを用いることができ、また、天然石英粉末としては、例えば、水晶等の天然石英原料を用いることができる。
Further, the inner layer is formed by melting the high-purity quartz raw material powder, and is formed as transparent quartz glass containing no bubbles.
The high-purity quartz raw material powder may be a synthetic quartz powder or a natural quartz powder purified to the same level as the synthetic quartz powder. As the synthetic quartz powder, for example, one synthesized by hydrolysis of silicon alkoxide or the like can be used, and as the natural quartz powder, for example, a natural quartz raw material such as crystal can be used.

前記外層は、アルミニウム(Al)が添加された天然石英原料粉末によって形成される。前記外層を、合成石英粉末によって形成しても良いが、コストの面から天然石英原料粉末を用いるのが好ましい。
前記アルミニウム(Al)は、外層のAl濃度が7ppm以上20ppm以下となるように天然石英原料粉末に添加される。
The outer layer is formed of a natural quartz raw material powder to which aluminum (Al) has been added. The outer layer may be formed of synthetic quartz powder, but it is preferable to use natural quartz raw material powder from the viewpoint of cost.
The aluminum (Al) is added to the natural quartz raw material powder so that the Al concentration of the outer layer is 7 ppm or more and 20 ppm or less.

また、前記外層は天然石英原料粉を溶融することによって形成され、多数の閉気孔(気泡)を含む石英ガラスとして形成される。また、天然石英粉末としては、例えば、水晶等の天然石英原料を用いることができる。 Further, the outer layer is formed by melting natural quartz raw material powder, and is formed as quartz glass containing a large number of closed pores (air bubbles). Further, as the natural quartz powder, for example, a natural quartz raw material such as crystal can be used.

前記天然石英原料粉への前記アルミニウム(Al)の添加量が少なく、外層のAl濃度が7ppm未満の場合には、高温下でのルツボの変形抑制できないため、好ましくない。
一方、前記天然石英原料粉への前記アルミニウム(Al)の添加量が多く、外層のAl濃度が20ppmを超える場合には、前記内層と前記外層の1400℃における粘性差を0.8×10 +10 (poise)以下にできず、直胴部の下部から湾曲部の内面領域において多数のしわ(凹凸)が発生するため、好ましくない。
When the amount of the aluminum (Al) added to the natural quartz raw material powder is small and the Al concentration of the outer layer is less than 7 ppm, the deformation of the crucible cannot be suppressed at a high temperature, which is not preferable.
On the other hand, when the amount of the aluminum (Al) added to the natural quartz raw material powder is large and the Al concentration of the outer layer exceeds 20 ppm, the viscosity difference between the inner layer and the outer layer at 1400 ° C. is 0.8 × 10 +10 . (Poise) or less, and a large number of wrinkles (unevenness) are generated from the lower part of the straight body portion to the inner surface region of the curved portion, which is not preferable.

ところで、内層と前記外層の1400℃における粘性差を0.8×10 +10 (poise)を超える場合には、既に述べたように、石英ガラスルツボが長時間にわたって高温下に曝されると、石英ガラスルツボの内表面における、直胴部の下部から湾曲部の内表面の領域において多数のしわ(凹凸)が発生する。
その理由は、内層と外層の粘性差が大きい場合には、図1の矢印Xに示すように、外層に対して内層が僅かに下方へ移動する(沈み込み)。一方、外層は粘性が高いために(結晶化するために)、下方へ移動はない(沈み込みはない)。その結果、内層と外層の移動量(沈み込み量)に差が生じ、更に湾曲部、底面部のおける内層の沈み込み量が直胴部に比べて小さいために、直胴部の下部から湾曲部の内表面の領域において多数のしわ(凹凸)が発生するものと推察される。特に、ルツボ内表面(内層表面)に結晶化促進剤が添加されている場合は、よりしわが生じやすくなる。
By the way, when the viscosity difference between the inner layer and the outer layer at 1400 ° C. exceeds 0.8 × 10 +10 (poise), as described above, when the quartz glass crucible is exposed to high temperature for a long time, quartz is used. On the inner surface of the glass crucible, a large number of wrinkles (unevenness) occur in the region from the lower part of the straight body portion to the inner surface of the curved portion.
The reason is that when the viscosity difference between the inner layer and the outer layer is large, the inner layer moves slightly downward (subduction) with respect to the outer layer, as shown by the arrow X in FIG. On the other hand, because the outer layer is highly viscous (to crystallize), it does not move downward (no subduction). As a result, there is a difference in the amount of movement (subduction amount) between the inner layer and the outer layer, and since the amount of subduction of the inner layer in the curved part and the bottom part is smaller than that in the straight body part, it is curved from the lower part of the straight body part. It is presumed that a large number of wrinkles (unevenness) occur in the area of the inner surface of the portion. In particular, when a crystallization accelerator is added to the inner surface (inner layer surface) of the crucible, wrinkles are more likely to occur.

また、 内層及び外層を含む石英ガラスルツボ全体の厚さは、ルツボの強度や重量等を考慮して、5~30mm程度であることが好ましい。通常は15mm程度とする。
また、外層の厚さは、特に限定されるものではないが、同様の観点から、3~28mm程度であることが好ましい。
また、内層の厚さは、特に限定されるものではないが、同様の観点から、2mm程度であることが好ましい。
Further, the thickness of the entire quartz glass crucible including the inner layer and the outer layer is preferably about 5 to 30 mm in consideration of the strength and weight of the crucible. Normally, it is about 15 mm.
The thickness of the outer layer is not particularly limited, but is preferably about 3 to 28 mm from the same viewpoint.
The thickness of the inner layer is not particularly limited, but is preferably about 2 mm from the same viewpoint.

本発明に係る石英ガラスルツボは、従来の製造方法を用いて製造することができる。一般的には、回転モールド法及びアーク溶融法により製造される。
以下に、具体的な製造方法の一例を説明するが、本発明に係る石英ガラスルツボの製造方法は、これに限定されるものではない。
まず、内層を形成する高純度石英原料粉の不純物濃度を測定し、Al,Na,K,Liの濃度が10ppm未満となる高純度石英原料を選択する。尚、前記したように、内層のAl濃度が10ppm以下、また他の不純物、例えば、Na,K,Liの濃度が1ppm未満であることが好ましい。
このような高純度石英原料粉を用いることにより、内層におけるAl濃度を10ppm以下になすことができる。また他の不純物、例えば、Na,K,Liの濃度を1ppm未満となすことができる。
The quartz glass crucible according to the present invention can be manufactured by using a conventional manufacturing method. Generally, it is manufactured by a rotary molding method and an arc melting method.
An example of a specific manufacturing method will be described below, but the manufacturing method of the quartz glass crucible according to the present invention is not limited to this.
First, the impurity concentration of the high-purity quartz raw material powder forming the inner layer is measured, and a high-purity quartz raw material having an Al, Na, K, Li concentration of less than 10 ppm is selected. As described above, it is preferable that the Al concentration of the inner layer is 10 ppm or less, and the concentration of other impurities such as Na, K, and Li is less than 1 ppm.
By using such high-purity quartz raw material powder, the Al concentration in the inner layer can be reduced to 10 ppm or less. Further, the concentration of other impurities such as Na, K and Li can be set to less than 1 ppm.

次に、外層を形成する天然石英原料粉のAl濃度を測定し、外層のAl濃度が7ppm以上20ppm以下となるように天然石英原料粉末にアルミニウム(Al)を所定量添加する。
前記Al成分は、硝酸アルミニウム九水和物(Al(NO3)3・9H2O)の水溶液として、天然石英原料粉にそれぞれ添加されることが好ましい。
各水溶液は天然石英原料粉の量に応じて、できるだけ均一に添加することができるように適宜濃度調整し、天然石英原料粉に均一に添加した後、これを乾燥して、再度粉末化して使用することが好ましい。
このような硝酸塩の水溶液の添加によれば、Alの濃度調整を均一かつ容易に行うことができる。また、過剰の水分及び硝酸分は、乾燥、加熱により容易に除去することができ、取扱い容易である。
Next, the Al concentration of the natural quartz raw material powder forming the outer layer is measured, and a predetermined amount of aluminum (Al) is added to the natural quartz raw material powder so that the Al concentration of the outer layer is 7 ppm or more and 20 ppm or less.
The Al component is preferably added to the natural quartz raw material powder as an aqueous solution of aluminum nitrate nine hydrate (Al (NO 3 ) 3.9H 2 O).
Each aqueous solution is appropriately adjusted in concentration so that it can be added as uniformly as possible according to the amount of the natural quartz raw material powder, and after being uniformly added to the natural quartz raw material powder, it is dried and powdered again before use. It is preferable to do so.
By adding such an aqueous solution of nitrate, the concentration of Al can be adjusted uniformly and easily. In addition, excess water and nitric acid can be easily removed by drying and heating, and are easy to handle.

そして、ルツボの中心軸周りに回転するルツボ成形用型内に、外層を形成するためのアルミニウム(Al)が所定量添加された天然石英原料粉を供給し、遠心力及び機械的押圧によって、外層を成形する。
次いで、前記ルツボ成形用型内の外層の成形体の内表面全体に高純度石英原料粉を供給し、遠心力及び機械的押圧によって、前記外層の成形体の内側に内層を成形する。
そして、上記のようにして得られた2層構造のルツボ成形体を、アーク溶融法により全体をガラス化することにより、外層が気泡を含む天然石英ガラスであり、内層が気泡を含まない高純度の石英ガラスにより構成された石英ガラスルツボを製造する。
Then, a natural quartz raw material powder to which a predetermined amount of aluminum (Al) for forming an outer layer is added is supplied into the crucible molding mold that rotates around the central axis of the crucible, and the outer layer is subjected to centrifugal force and mechanical pressing. To mold.
Next, high-purity quartz raw material powder is supplied to the entire inner surface of the outer layer molded body in the crucible molding mold, and the inner layer is molded inside the outer layer molded body by centrifugal force and mechanical pressing.
Then, by vitrifying the whole crucible molded body having a two-layer structure obtained as described above by an arc melting method, the outer layer is a natural quartz glass containing bubbles, and the inner layer is high-purity without containing bubbles. A quartz glass crucible made of quartz glass is manufactured.

(実施例1)
内層を形成する高純度石英原料粉として、Al,Na,K,Liの濃度が1ppm未満の合成石英原料粉ものを用い、また外層を形成する石英原料粉として、Al濃度が12ppm(Al添加量6ppm)の天然石英原料粉末を用いた。
そして、これら高純度石英原料粉、石英原料粉を用いて、一般的な回転モールド法によりシリコン単結晶引上用の石英ガラスルツボを製造した。
(Example 1)
As the high-purity quartz raw material powder forming the inner layer, synthetic quartz raw material powder having an Al, Na, K, Li concentration of less than 1 ppm is used, and as the quartz raw material powder forming the outer layer, the Al concentration is 12 ppm (Al addition amount). 6 ppm) of natural quartz raw material powder was used.
Then, using these high-purity quartz raw material powder and quartz raw material powder, a quartz glass crucible for pulling a silicon single crystal was manufactured by a general rotary molding method.

得られたルツボを用いて、石英ルツボ内にドーパント剤やシリコン原料を充填して、減圧・不活性雰囲気の状態で原料を溶融し、その後、融液温度を制御しながら、所望のシリコン単結晶を引き上げる。そして、得られたシリコンインゴットを約1mm厚にスライスした際に確認できたエアポケット個数から、単位体積当たりのエアポケット発生個数を算出した。
尚、エアポケットは、シリコンインゴットを約1mm厚にスライスし、ウェーハを作成し、次にウェーハの裏面から赤外光を照射し,透過光を表面側のカメラで撮像、画像処理(2値化および形状判定)することによって、エアポケットを測定した。
Using the obtained crucible, a dopant agent or a silicon raw material is filled in the quartz crucible, the raw material is melted in a reduced pressure / inert atmosphere, and then a desired silicon single crystal is controlled while controlling the melt temperature. Pull up. Then, the number of air pockets generated per unit volume was calculated from the number of air pockets that could be confirmed when the obtained silicon ingot was sliced to a thickness of about 1 mm.
The air pocket slices the silicon ingot to a thickness of about 1 mm to create a wafer, then irradiates infrared light from the back surface of the wafer, captures the transmitted light with the camera on the front surface, and performs image processing (binarization). And shape determination), the air pocket was measured.

内層、外層の粘性差を、ビームベンディング法にて測定した。
まず、未使用の石英ガラスルツボを4×4×40mmに切断、加工し、鏡面研磨し、内層サンプル及び外層サンプルを製作する。そして、測定は、各サンプルに1400℃で10分間、荷重をかけ変位量を測定して粘性値を算出した。そして、内層サンプル及び外層サンプルの粘性値から粘性差を求めた。
The difference in viscosity between the inner layer and the outer layer was measured by the beam bending method.
First, an unused quartz glass crucible is cut into 4 × 4 × 40 mm, processed, and mirror-polished to produce an inner layer sample and an outer layer sample. Then, in the measurement, a load was applied to each sample at 1400 ° C. for 10 minutes, the displacement amount was measured, and the viscosity value was calculated. Then, the viscosity difference was obtained from the viscosity values of the inner layer sample and the outer layer sample.

また、しわ発生部の表面粗さを測定した。
このしわ発生部の表面粗さは、使用した石英ルツボからしわ発生部分を切り出し、サンプルとした。このしわ発生部の表面粗さについては、表面粗さ計にて基準長さと評価長さを設定し、サンプルの表面をなぞり、触針の上下運動を電気的に検出する方法で測定した。
In addition, the surface roughness of the wrinkled portion was measured.
For the surface roughness of this wrinkled portion, the wrinkled portion was cut out from the used quartz crucible and used as a sample. The surface roughness of the wrinkled portion was measured by setting a reference length and an evaluation length with a surface roughness meter, tracing the surface of the sample, and electrically detecting the vertical movement of the stylus.

更に、使用した石英ルツボに生じたクラックの幅を測定した。
クラックの表面幅は、マイクロスコープにてサンプル表面部分を拡大してクラック部分の幅を計測する方法で測定した。その結果を表1に示す。
尚、図2に示すように、クラックXの幅は、図2に示すように、クラックの長さ方向(長手方向)ではなく、幅方向(短手方向)の幅tを測定した。
Furthermore, the width of the crack generated in the quartz crucible used was measured.
The surface width of the crack was measured by a method of measuring the width of the crack portion by enlarging the sample surface portion with a microscope. The results are shown in Table 1.
As shown in FIG. 2, the width of the crack X was measured not in the length direction (longitudinal direction) of the crack but in the width direction (short direction) as shown in FIG.

Figure 0007051392000001
Figure 0007051392000001

尚、表1における表面粗さ比はしわの凹凸比、表面幅比はクラックの隙間(幅)の比率、AP(エアポケット)発生比はエアポケット密度の比率を示し、比較例1を1とした場合の比で示している。 In Table 1, the surface roughness ratio indicates the wrinkle unevenness ratio, the surface width ratio indicates the crack gap (width) ratio, and the AP (air pocket) generation ratio indicates the air pocket density ratio. It is shown by the ratio when it is done.

(実施例2)
内層を形成する高純度石英原料粉として、Al,Na,K,Liの濃度が10ppm未満の天然石英原料粉末を用い、また外層を形成する石英原料粉として、Al濃度が8.5ppm(Al添加量2.5ppm)の天然石英原料粉末を用いた。そして、これら高純度石英原料粉、石英原料粉を用いて、一般的な回転モールド法によりシリコン単結晶引上用の石英ガラスルツボを製造した。
そして、実施例1と同様に、粘性値、単位体積当たりのエアポケット発生個数、内層、外層の粘性、しわ発生部の表面粗さ、クラックの表面幅を測定した。その結果を表1に示す。
(Example 2)
As the high-purity quartz raw material powder forming the inner layer, natural quartz raw material powder having an Al, Na, K, Li concentration of less than 10 ppm is used, and as the quartz raw material powder forming the outer layer, the Al concentration is 8.5 ppm (Al added). A natural quartz raw material powder having an amount of 2.5 ppm) was used. Then, using these high-purity quartz raw material powder and quartz raw material powder, a quartz glass crucible for pulling a silicon single crystal was manufactured by a general rotary molding method.
Then, in the same manner as in Example 1, the viscosity value, the number of air pockets generated per unit volume, the viscosity of the inner layer and the outer layer, the surface roughness of the wrinkled portion, and the surface width of the crack were measured. The results are shown in Table 1.

(実施例3)
内層を形成する高純度石英原料粉として、Al,Na,K,Liの濃度が1ppm未満の合成石英原料粉末を用い、また外層を形成する石英原料粉として、Al濃度が10ppm(Al添加量4ppm)、Na濃度が約0.6ppm、K濃度が約0.3ppm、Li濃度が約0.1ppmでアルカリ総量が1ppmの天然石英原料粉末を用いた。
そして、これら高純度石英原料粉、石英原料粉を用いて、一般的な回転モールド法によりシリコン単結晶引上用の石英ガラスルツボを製造した。
そして、実施例1と同様に、粘性値、単位体積当たりのエアポケット発生個数、内層、外層の粘性、しわ発生部の表面粗さ、クラックの表面幅を測定した。その結果を表1に示す。
(Example 3)
As the high-purity quartz raw material powder forming the inner layer, synthetic quartz raw material powder having an Al, Na, K, Li concentration of less than 1 ppm is used, and as the quartz raw material powder forming the outer layer, the Al concentration is 10 ppm (Al addition amount 4 ppm). ), A natural quartz raw material powder having a Na concentration of about 0.6 ppm, a K concentration of about 0.3 ppm, a Li concentration of about 0.1 ppm and a total alkali content of 1 ppm was used.
Then, using these high-purity quartz raw material powder and quartz raw material powder, a quartz glass crucible for pulling a silicon single crystal was manufactured by a general rotary molding method.
Then, in the same manner as in Example 1, the viscosity value, the number of air pockets generated per unit volume, the viscosity of the inner layer and the outer layer, the surface roughness of the wrinkled portion, and the surface width of the crack were measured. The results are shown in Table 1.

(比較例1)
内層を形成する高純度石英原料粉として、Al,Na,K,Liの濃度が1ppm未満の合成石英原料粉末を用い、また外層を形成する石英原料粉として、Na濃度が約2ppm、K,Liの各濃度が約1ppmでアルカリ総量が4ppm、Alを添加しない天然石英原料粉末を用いた。この天然石英原料のAl濃度は、6ppmであった。
そして、これら高純度石英原料粉、石英原料粉を用いて、一般的な回転モールド法によりシリコン単結晶引上用の石英ガラスルツボを製造した。
そして、実施例1と同様に、粘性値、単位体積当たりのエアポケット発生個数、内層、外層の粘性、しわ発生部の表面粗さ、クラックの表面幅を測定した。その結果を表1に示す。
(Comparative Example 1)
As the high-purity quartz raw material powder forming the inner layer, synthetic quartz raw material powder having an Al, Na, K, Li concentration of less than 1 ppm is used, and as the quartz raw material powder forming the outer layer, the Na concentration is about 2 ppm, K, Li. A natural quartz raw material powder having a concentration of about 1 ppm, a total amount of alkali of 4 ppm, and no addition of Al was used. The Al concentration of this natural quartz raw material was 6 ppm.
Then, using these high-purity quartz raw material powder and quartz raw material powder, a quartz glass crucible for pulling a silicon single crystal was manufactured by a general rotary molding method.
Then, in the same manner as in Example 1, the viscosity value, the number of air pockets generated per unit volume, the viscosity of the inner layer and the outer layer, the surface roughness of the wrinkled portion, and the surface width of the crack were measured. The results are shown in Table 1.

(比較例2)
内層を形成する高純度石英原料粉として、Al,Na,K,Liの濃度が1ppm未満の合成石英原料粉末を用い、また外層を形成する石英原料粉として、Al添加量が15ppmの天然石英原料粉末を用いた。このときの天然石英原料のAl濃度は、21ppmであった。
そして、これら高純度石英原料粉、石英原料粉を用いて、一般的な回転モールド法によりシリコン単結晶引上用の石英ガラスルツボを製造した。
そして、実施例1と同様に、粘性値、単位体積当たりのエアポケット発生個数、内層、外層の粘性、しわ発生部の表面粗さ、クラックの表面幅を測定した。その結果を表1に示す。
(Comparative Example 2)
As the high-purity quartz raw material powder forming the inner layer, synthetic quartz raw material powder having an Al, Na, K, Li concentration of less than 1 ppm is used, and as the quartz raw material powder forming the outer layer, a natural quartz raw material having an Al addition amount of 15 ppm is used. Powder was used. The Al concentration of the natural quartz raw material at this time was 21 ppm.
Then, using these high-purity quartz raw material powder and quartz raw material powder, a quartz glass crucible for pulling a silicon single crystal was manufactured by a general rotary molding method.
Then, in the same manner as in Example 1, the viscosity value, the number of air pockets generated per unit volume, the viscosity of the inner layer and the outer layer, the surface roughness of the wrinkled portion, and the surface width of the crack were measured. The results are shown in Table 1.

実施例1乃至3に示すように、内層と外層との粘性差を小さくすることで、シリコン単結晶引上時の石英ガラスルツボの沈み込み量を小さくすることができ、内表面のしわが発生しにくくなり、エアポケットの発生を低減することができることを確認した。 As shown in Examples 1 to 3, by reducing the viscosity difference between the inner layer and the outer layer, the amount of subduction of the quartz glass crucible at the time of pulling up the silicon single crystal can be reduced, and wrinkles on the inner surface are generated. It was confirmed that it became difficult to do so and the generation of air pockets could be reduced.

1 石英ガラスルツボ
2 内層
3 外層
4 直胴部
5 湾曲部
6 底部
X 内層の移動方向(沈み込み方向)
1 Quartz glass crucible 2 Inner layer 3 Outer layer 4 Straight body 5 Curved part 6 Bottom X Inner layer movement direction (sinking direction)

Claims (2)

高純度の石英ガラスからなる内層と、石英原料粉にアルミニウム(Al)を添加し、粘性を高めた天然石英ガラスからなる外層を有するシリコン単結晶引上石英ガラスルツボであって、
前記内層のAl濃度が10ppm以下であり、かつ、前記外層のAl濃度が7ppm以上20ppm以下であり、
前記内層と前記外層の1400℃における粘性差が0.8×10 +10 (poise)以下であることを特徴とする石英ガラスルツボ。
A silicon single crystal pull-up quartz glass rutsubo having an inner layer made of high-purity quartz glass and an outer layer made of natural quartz glass whose viscosity has been increased by adding aluminum (Al) to the quartz raw material powder.
The Al concentration of the inner layer is 10 ppm or less, and the Al concentration of the outer layer is 7 ppm or more and 20 ppm or less.
A quartz glass crucible characterized in that the viscosity difference between the inner layer and the outer layer at 1400 ° C. is 0.8 × 10 +10 (poise) or less.
高純度の石英ガラスからなる内層と、天然石英ガラスからなる外層を有する、請求項1記載のシリコン単結晶引上用の石英ガラスルツボの製造方法であって、
前記内層を形成するための石英原料粉中にAl成分を添加することなく、かつ前記外層を形成するための石英原料粉中にAl成分を添加し、
前記内層のAl濃度が10ppm以下であり、かつ、前記外層のAl濃度が7ppm以上20ppm以下に調整されることを特徴とする石英ガラスルツボの製造方法。
The method for producing a quartz glass crucible for pulling a silicon single crystal according to claim 1, which has an inner layer made of high-purity quartz glass and an outer layer made of natural quartz glass.
The Al component was not added to the quartz raw material powder for forming the inner layer, and the Al component was added to the quartz raw material powder for forming the outer layer.
A method for producing a quartz glass crucible, wherein the Al concentration of the inner layer is 10 ppm or less, and the Al concentration of the outer layer is adjusted to 7 ppm or more and 20 ppm or less.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016240A (en) 2004-06-30 2006-01-19 Japan Siper Quarts Corp High viscosity high purity quartz glass material, its manufacturing method and its use
JP2012116716A (en) 2010-12-02 2012-06-21 Japan Siper Quarts Corp Quartz glass crucible for pulling silicon single crystal and method for manufacturing the same
JP2014005154A (en) 2012-06-21 2014-01-16 Covalent Materials Corp Quartz glass crucible for pulling up silicon single crystal and manufacturing method therefor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006016240A (en) 2004-06-30 2006-01-19 Japan Siper Quarts Corp High viscosity high purity quartz glass material, its manufacturing method and its use
JP2012116716A (en) 2010-12-02 2012-06-21 Japan Siper Quarts Corp Quartz glass crucible for pulling silicon single crystal and method for manufacturing the same
JP2014005154A (en) 2012-06-21 2014-01-16 Covalent Materials Corp Quartz glass crucible for pulling up silicon single crystal and manufacturing method therefor

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