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JP7053427B2 - Enamel wire manufacturing method - Google Patents
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JP7053427B2 - Enamel wire manufacturing method - Google Patents

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JP7053427B2
JP7053427B2 JP2018192322A JP2018192322A JP7053427B2 JP 7053427 B2 JP7053427 B2 JP 7053427B2 JP 2018192322 A JP2018192322 A JP 2018192322A JP 2018192322 A JP2018192322 A JP 2018192322A JP 7053427 B2 JP7053427 B2 JP 7053427B2
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泰行 戸田
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礎電線株式会社
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Description

本発明は、カーボンナノチューブを含むエナメル線の製造方法に関するものである。 The present invention relates to a method for producing an enamel wire containing carbon nanotubes.

カーボンナノチューブは軽量でありながら機械的強度が高く、導電材料として一般的に使われている銅よりも高い導電性を有している。そのため、導電材料としての用途で注目されている。 Although carbon nanotubes are lightweight, they have high mechanical strength and have higher conductivity than copper, which is generally used as a conductive material. Therefore, it is attracting attention for its use as a conductive material.

一方、エナメル線は、モータ、変圧器、偏向ヨークなどの電気機器のコイル用電線として広く用いられている(例えば特許文献1)。エナメル線は、導体に天然樹脂又は合成樹脂絶縁塗料を焼き付けた電線である。 On the other hand, the enamel wire is widely used as a coil wire for electric devices such as motors, transformers, and deflection yokes (for example, Patent Document 1). Enamel wire is an electric wire in which a conductor is baked with a natural resin or synthetic resin insulating paint.

特開平8-185716号公報Japanese Unexamined Patent Publication No. 8-185716

しかしながら、カーボンナノチューブを用いたエナメル線は未だに実用化されていない。 However, enamel wires using carbon nanotubes have not yet been put into practical use.

そこで、本発明は上述の課題の少なくとも一部を解決するためになされたものであり、以下の態様または適用例として実現することができる。 Therefore, the present invention has been made to solve at least a part of the above-mentioned problems, and can be realized as the following aspects or application examples.

]本発明に係るエナメル線の製造方法は、
複数のカーボンナノチューブの集合体である導体をボビンから引き出し、前記導体の真円度を調整する成型工程と、
前記成型工程後に、前記導体を有機溶剤で洗浄する洗浄工程と、
前記洗浄工程後の前記導体を加熱して前記導体に付着した有機溶剤を除去するアニール工程と、
前記アニール工程後の前記導体に塗料を塗布する塗布工程と、
前記塗布工程で前記導体に塗布された塗料の焼き付けを行う焼き付け工程と、
を含み、
前記導体は、複数のカーボンナノチューブの紡績糸を撚った撚糸、複数の前記撚糸の束または前記撚糸もしくは前記束の外面に金属めっきを施したものであり、
前記導体に対して前記成型工程から前記焼き付け工程までボビンに巻き付けられることなく各工程が実行され、
前記成型工程は、前記導体の外面の一部が円形の断面を有するダイス孔の内面及び対向する少なくとも2つのローラの湾曲した溝に接触すると共に、前記導体の外面から突出している部分が前記ダイス孔の前記内面及び前記ローラの前記溝に押圧されて変形することで、前記導体の真円度を1.0以上1.25以下に調整し、
前記成型工程における前記導体に対する引張応力は200MPa以上2000MPa以下であり、
前記塗布工程における塗料の粘度は、0.5dPa・s以上50dPa・s以下であることを特徴とすることを特徴とする。
[ 1 ] The method for producing an enamel wire according to the present invention is as follows.
A molding process in which a conductor , which is an aggregate of a plurality of carbon nanotubes, is pulled out from a bobbin and the roundness of the conductor is adjusted.
After the molding step, a cleaning step of cleaning the conductor with an organic solvent and
An annealing step of heating the conductor after the cleaning step to remove the organic solvent adhering to the conductor, and a step of annealing.
A coating step of applying paint to the conductor after the annealing step, and a coating step of applying the paint to the conductor.
A baking step of baking the paint applied to the conductor in the coating step, and a baking step of baking the paint.
Including
The conductor is a twisted yarn obtained by twisting spun yarns of a plurality of carbon nanotubes, a bundle of the plurality of twisted yarns, or the twisted yarn or the outer surface of the bundle obtained by metal plating.
Each step is executed without being wound around the bobbin from the molding step to the baking step on the conductor.
In the molding step, a part of the outer surface of the conductor comes into contact with the inner surface of the die hole having a circular cross section and the curved groove of at least two rollers facing each other, and the portion protruding from the outer surface of the conductor is the die. 1. The roundness of the conductor is 1.0 or more by being pressed and deformed by the inner surface of the hole and the groove of the roller. Adjust to 25 or less,
The tensile stress on the conductor in the molding step is 200 MPa or more and 2000 MPa or less.
The viscosity of the coating material in the coating step is characterized by being 0.5 dPa · s or more and 50 dPa · s or less.

本実施形態に係るエナメル線の一部を断面で示す図である。It is a figure which shows a part of the enamel wire which concerns on this embodiment in a cross section. 本実施形態に係るエナメル線の製造方法を実施するための製造装置の一例の模式図である。It is a schematic diagram of an example of the manufacturing apparatus for carrying out the manufacturing method of the enamel wire which concerns on this embodiment. 本実施形態に係るエナメル線の製造方法に用いるダイスの断面図である。It is sectional drawing of the die used in the manufacturing method of the enamel wire which concerns on this embodiment. 本実施形態に係るエナメル線の製造方法に用いるローラの斜視図である。It is a perspective view of the roller used in the manufacturing method of the enamel wire which concerns on this embodiment. 実施例1の導体を500倍で撮影した写真である。It is a photograph which took the conductor of Example 1 at 500 times. 実施例1のエナメル線を500倍で撮影した写真である。It is a photograph which took the enamel wire of Example 1 at 500 times. 実施例1のエナメル線の切断面を1000倍で撮影した写真である。It is a photograph which took the cut surface of the enamel wire of Example 1 at 1000 times . 実施例2の導体を500倍で撮影した写真である。It is a photograph which took the conductor of Example 2 at 500 times. 実施例2のエナメル線を500倍で撮影した写真である。It is a photograph which took the enamel wire of Example 2 at 500 times. 実施例2のエナメル線の切断面を500倍で撮影した写真である。It is a photograph which took the cut surface of the enamel wire of Example 2 at a magnification of 500 times. 比較例1のエナメル線を500倍で撮影した写真である。It is a photograph of the enamel wire of Comparative Example 1 taken at 500 times. 比較例1のエナメル線の断面を500倍で撮影した写真である。It is a photograph which took the cross section of the enamel wire of the comparative example 1 at a magnification of 500 times. 実施例及び比較例の電気抵抗と温度との関係を示すグラフである。It is a graph which shows the relationship between the electric resistance and the temperature of an Example and a comparative example. 実施例及び比較例のインピーダンスと周波数との関係を示すグラフである。It is a graph which shows the relationship between the impedance and the frequency of an Example and a comparative example.

以下、本発明の好適な実施形態について、図面を用いて詳細に説明する。なお、以下に説明する実施形態は、特許請求の範囲に記載された本発明の内容を不当に限定するものではない。また、以下で説明される構成の全てが本発明の必須構成要件であるとは限らない。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. The embodiments described below do not unreasonably limit the content of the present invention described in the claims. Moreover, not all of the configurations described below are essential constituent requirements of the present invention.

1.エナメル線
図1を用いて本発明の一実施形態に係るエナメル線10について説明する。図1は本実施形態に係るエナメル線10の一部を断面で示す図である。図1では真円度及び偏心度を説明するために大きく変形した形状を示している。
1. 1. Enamel wire The enamel wire 10 according to the embodiment of the present invention will be described with reference to FIG. FIG. 1 is a cross-sectional view showing a part of the enamel wire 10 according to the present embodiment. FIG. 1 shows a greatly deformed shape for explaining the roundness and the eccentricity.

エナメル線10は、複数のカーボンナノチューブの集合体である導体20と、導体20を被覆する絶縁被膜30と、を含む。 The enamel wire 10 includes a conductor 20 which is an aggregate of a plurality of carbon nanotubes, and an insulating coating 30 which covers the conductor 20.

エナメル線10は、導体20である素線に塗料を焼き付けて導体を被覆する絶縁被膜30を形成した電線である。エナメル線10は、導体20である素線に絶縁被膜30を直接被覆したものに限らず、導体20の外面に金属めっきを施した素線に絶縁被膜30を被覆したものも含む。 The enamel wire 10 is an electric wire having an insulating coating 30 formed by baking a paint on a wire which is a conductor 20 to cover the conductor. The enamel wire 10 is not limited to a wire having an insulating coating 30 directly coated on a wire which is a conductor 20, but also includes a wire having a metal plating on the outer surface of the conductor 20 coated with an insulating film 30.

導体20は、複数のカーボンナノチューブの集合体(以下「CNT集合体」という)である。CNT集合体は、カーボンナノチューブが複数本集合して一本の糸のようになったものをいう。CNT集合体は、湿式紡績または乾式紡績により紡績されたカーボンナノチューブの紡績糸を撚った撚糸であってもよいし、複数の撚糸を束にしたものであってもよい。CNT集合体はカーボンナノチューブ間のファンデルワールス力により集合している。CNT集合体は、撚糸の外層に金属めっきを施したものでもよいし、複数の撚糸の束の外面に金属めっきを施したものでもよい。金属めっきとしてはカーボンナノチューブにおいて公知のもの例えば銅めっき等を採用できる。CNT集合体としては、例えば日立造船社のCNT撚糸やCNT撚糸を金属被覆したCNTワイヤー、村田機械社のCNT撚糸等を採用することができる。 The conductor 20 is an aggregate of a plurality of carbon nanotubes (hereinafter referred to as “CNT aggregate”). The CNT aggregate is a collection of a plurality of carbon nanotubes to form a single thread. The CNT aggregate may be a twisted yarn obtained by twisting spun yarns of carbon nanotubes spun by wet spinning or dry spinning, or may be a bundle of a plurality of twisted yarns . The CNT aggregates are assembled by the van der Waals force between the carbon nanotubes. The CNT aggregate may be one in which the outer layer of the twisted yarn is metal-plated, or the outer surface of a bundle of a plurality of twisted yarns is metal-plated. As the metal plating, known carbon nanotubes such as copper plating can be adopted. As the CNT aggregate, for example, a CNT twisted yarn manufactured by Hitachi Zosen Corporation, a CNT wire coated with a metal-coated CNT twisted yarn, a CNT twisted yarn manufactured by Murata Machinery Corporation, or the like can be adopted.

カーボンナノチューブは電気伝導性に優れた金属型のものを用いることができる。カーボンナノチューブの層構造は特に限定されず、単層及び多層(2層以上)のカーボンナノチューブを含むことができ、単層カーボンナノチューブ及び多層カーボンナノチューブのいずれか一方のみから構成されてもよい。カーボンナノチューブの製造方法は、特に限定されず、例えば気相成長法など公知の方法で製造したものを用いることができる。 As the carbon nanotube, a metal type having excellent electrical conductivity can be used. The layer structure of the carbon nanotubes is not particularly limited, and may include single-walled and multi-walled (two or more layers) carbon nanotubes, and may be composed of only one of the single-walled carbon nanotubes and the multi-walled carbon nanotubes. The method for producing carbon nanotubes is not particularly limited, and those produced by a known method such as a vapor phase growth method can be used.

導体20の直径(線径)は、例えば30μm以上200μm以下であることができる。導体20の直径が30μm以上であればエナメル線として実用化可能であり、200μm以下であればCNT集合体として入手が可能である。本明細書において「線径」とは、レーザマイクロメータ(例えばキーエンス社製LS9500)によりCNT集合体の長手方向に沿って1m間隔で3箇所以上の直径を測定し、その算術平均値をいう。 The diameter (wire diameter) of the conductor 20 can be, for example, 30 μm or more and 200 μm or less. If the diameter of the conductor 20 is 30 μm or more, it can be put into practical use as an enamel wire, and if it is 200 μm or less, it can be obtained as a CNT aggregate. As used herein, the term "wire diameter" refers to an arithmetic mean value obtained by measuring the diameters of three or more points at 1 m intervals along the longitudinal direction of a CNT aggregate with a laser micrometer (for example, LS9500 manufactured by KEYENCE CORPORATION).

導体20は、真円度が1.0以上1.5以下である。図1に示すように、真円度は、導体20の長さ方向の任意の位置における導体20の直径をマイクロスコープで測定し、その最大径D1と最小径D2との比(D1/D2)である。CNT集合体は、複数のカーボンナノチューブがファンデルワールス力で束になっているだけなので、そのままでは表面の凹凸が大きい。しかも、カーボンナノチューブは疎水性でエナメル線の塗料と濡れにくい。そのため、真円度が1.5を超えるような導体20に塗料を塗布すると微細な欠陥(例えばピンホール)が生じる恐れがある。導体20は、真円度が1.0以上1.2以下であることがさらに好ましい。 The conductor 20 has a roundness of 1.0 or more and 1.5 or less. As shown in FIG. 1, for roundness, the diameter of the conductor 20 at an arbitrary position in the length direction of the conductor 20 is measured with a microscope, and the ratio of the maximum diameter D1 to the minimum diameter D2 (D1 / D2). Is. Since a plurality of carbon nanotubes are only bundled by van der Waals force in the CNT aggregate, the surface unevenness is large as it is. Moreover, carbon nanotubes are hydrophobic and do not easily get wet with enamel wire paint. Therefore, if a paint is applied to the conductor 20 having a roundness of more than 1.5, fine defects (for example, pinholes) may occur. It is more preferable that the conductor 20 has a roundness of 1.0 or more and 1.2 or less.

導体20がCNT集合体を銅等の金属めっきで被覆したものである場合、導体20の表面(銅めっきの表面)が平滑であり最大高さ(Rz)が5μm以下であることが好ましい。導体20の表面に凹凸が少ないことにより、絶縁被膜30を良好に形成することができる。「最大高さ」はJIS B0601に規定する輪郭曲線の「最大山高さ」と「最大谷深さ」の和(山頂点と谷底点の間隔)のことをいい、マイクロスコープ(キーエンス社製「VHX-5000」)で撮影した写真を形状測定ソフト(キーエンス社製「VHX-H4M」)で分析して求めることができる。また例えば、500倍から1000倍程度の拡大写真を撮影して、定規を用いて輪郭の高さと深さを計測してもよい。 When the conductor 20 is a CNT aggregate coated with a metal plating such as copper, it is preferable that the surface of the conductor 20 (the surface of the copper plating) is smooth and the maximum height (Rz) is 5 μm or less. Since the surface of the conductor 20 has few irregularities, the insulating coating 30 can be satisfactorily formed. "Maximum height" is the sum of "maximum mountain height" and "maximum valley depth" of the contour curve specified in JIS B0601 (distance between the peak and valley bottom points), and is a microscope (Keyence "VHX"). -5000 ") can be analyzed and obtained by shape measurement software ("VHX-H4M "manufactured by KEYENCE CORPORATION). Further, for example, a magnified photograph of about 500 to 1000 times may be taken and the height and depth of the contour may be measured using a ruler.

絶縁被膜30は、導体20を被覆する絶縁の被膜である。絶縁被膜30の材質としては、ポリウレタン、ポリビニルホルマール、ポリウレタンナイロン、ポリエステル、ポリエステルナイロン、ポリエステルイミド、ポリアミドイミド、ポリエステルイミド/ポリア
ミドイミド、ポリイミド等を用いることができる。
The insulating coating 30 is an insulating coating that covers the conductor 20. As the material of the insulating film 30, polyurethane, polyvinylformal, polyurethane nylon, polyester, polyester nylon, polyesterimide, polyamideimide, polyesterimide / polyamideimide, polyimide and the like can be used.

絶縁被膜30の偏肉度は、1.0以上2.0以下であることができる。図1に示すように、偏肉度は、絶縁被膜30の偏心の度合いである。具体的には、偏肉度は、エナメル線10の中心Oを通る仮想線上の絶縁被膜30の肉厚をマイクロスコープで測定し、最も厚い肉厚T1と最も薄い肉厚T2との比(T1/T2)である。偏肉度が2.0以下であれば、被膜が導体円周上を均一に覆うことになり、エナメル線の絶縁性能を確保することができる。この範囲から外れると肉厚の薄い部分に欠陥を生じ、絶縁性低下のおそれがある。 The degree of unevenness of the insulating film 30 can be 1.0 or more and 2.0 or less. As shown in FIG. 1, the degree of eccentricity is the degree of eccentricity of the insulating coating 30. Specifically, the degree of deviation is measured by measuring the wall thickness of the insulating coating 30 on the virtual line passing through the center O of the enamel wire 10 with a microscope, and the ratio of the thickest wall thickness T1 to the thinnest wall thickness T2 (T1). / T2). When the degree of uneven thickness is 2.0 or less, the coating film uniformly covers the circumference of the conductor, and the insulation performance of the enamel wire can be ensured. If it deviates from this range, a defect may occur in a thin portion and the insulation may be deteriorated.

絶縁被膜30の肉厚は、5μm以上であることができる。肉厚は導体20の表面から絶縁被膜30の外表面までの厚さである。肉厚が5μm以上であることでエナメル線10の絶縁性能を確保することができる。また、絶縁被膜30の肉厚は、導体20の線径の5%以上であることが好ましい。肉厚が線径の5%以上であることでエナメル線10の絶縁性能を確保することができる。 The wall thickness of the insulating coating 30 can be 5 μm or more. The wall thickness is the thickness from the surface of the conductor 20 to the outer surface of the insulating coating 30. When the wall thickness is 5 μm or more, the insulation performance of the enamel wire 10 can be ensured. Further, the wall thickness of the insulating coating 30 is preferably 5% or more of the wire diameter of the conductor 20. When the wall thickness is 5% or more of the wire diameter, the insulation performance of the enamel wire 10 can be ensured.

エナメル線10は、抵抗計で測定した0℃~200℃における電気抵抗が20℃における電気抵抗を100%としたときに90%以上110%以下であることができる。一般に金属導体のエナメル線は温度を上げると電気抵抗が大きくなるが、本実施形態に係るエナメル線は温度上昇に伴う電気抵抗の変化が少ない。このため、例えば、原子炉、宇宙開発用途に好適に採用し得る。 The enamel wire 10 can have an electric resistance at 0 ° C. to 200 ° C. measured by a resistance meter of 90% or more and 110% or less when the electric resistance at 20 ° C. is 100%. Generally, the electric resistance of the enamel wire of a metal conductor increases when the temperature is raised, but the electric resistance of the enamel wire according to the present embodiment does not change much with the temperature rise. Therefore, for example, it can be suitably adopted for nuclear reactors and space development applications.

エナメル線10は、インピーダンス測定装置で測定した0kHz~200kHzにおけるインピーダンスが0kHzにおけるインピーダンスを100%としたときに80%以上120%以下であることができる。一般に金属導体のエナメル線は周波数を上げるとインピーダンスが大きくなるが、本実施形態に係るエナメル線は周波数上昇に伴うインピーダンスの変化が少ない。このため、例えば、高周波コイルに好適に採用し得る。 The enamel wire 10 can have an impedance at 0 kHz to 200 kHz measured by an impedance measuring device of 80% or more and 120% or less when the impedance at 0 kHz is 100%. Generally, the impedance of the enamel wire of a metal conductor increases as the frequency is increased, but the impedance of the enamel wire according to the present embodiment does not change much with the frequency increase. Therefore, for example, it can be suitably used for a high frequency coil.

2.エナメル線の製造方法
本実施形態に係るエナメル線の製造方法は、複数のカーボンナノチューブの集合体である導体の真円度を調整する成型工程と、成型工程で得られた導体に塗料を塗布する塗布工程と、塗布工程で導体に塗布された塗料の焼き付けを行う焼き付け工程と、を含む。
2. 2. Manufacturing method of enamel wire In the manufacturing method of enamel wire according to the present embodiment, a molding step of adjusting the roundness of a conductor which is an aggregate of a plurality of carbon nanotubes and a coating material are applied to the conductor obtained in the molding step. It includes a coating step and a baking step of baking the paint applied to the conductor in the coating step.

図2~図4を用いて本発明の一実施形態に係るエナメル線10の製造方法について説明する。図2は本実施形態に係るエナメル線10の製造方法を実施するための製造装置100の一例の模式図であり、図3は本実施形態に係るエナメル線10の製造方法に用いるダイス600の断面図であり、図4は本実施形態に係るエナメル線10の製造方法に用いるローラ610の斜視図である。 A method for manufacturing the enamel wire 10 according to the embodiment of the present invention will be described with reference to FIGS. 2 to 4. FIG. 2 is a schematic view of an example of a manufacturing apparatus 100 for carrying out the method for manufacturing the enamel wire 10 according to the present embodiment, and FIG. 3 is a cross section of a die 600 used for the method for manufacturing the enamel wire 10 according to the present embodiment. FIG. 4 is a perspective view of a roller 610 used in the method for manufacturing an enamel wire 10 according to the present embodiment.

図2に示すように、製造装置100は、導体20が巻かれたボビン50と、ボビン50から引き出された導体20を成型する成型部60と、成型部60で成型された導体20に塗料を塗布する塗布部70と、塗料を焼き付ける焼付部80と、絶縁被覆されたエナメル線10を巻き取る巻取部90と、を有する。 As shown in FIG. 2, the manufacturing apparatus 100 applies paint to the bobbin 50 around which the conductor 20 is wound, the molding portion 60 for molding the conductor 20 drawn from the bobbin 50, and the conductor 20 molded by the molding portion 60. It has a coating unit 70 for coating, a baking unit 80 for baking paint, and a winding unit 90 for winding up an insulatingly coated enamel wire 10.

ボビン50に巻きつけられた導体20は、CNT集合体である。ボビン50から導体20を引きだし、成型部60に導入する。 The conductor 20 wound around the bobbin 50 is a CNT aggregate. The conductor 20 is pulled out from the bobbin 50 and introduced into the molded portion 60.

成型部60は、導体20に対し成型工程を実施する。成型工程は複数のカーボンナノチューブの集合体である導体20の真円度を調整する工程である。成型工程は、導体20の表面と成型部材とを接触させることにより導体20の表面の凹凸を減少させ、導体20の真円度を1.0に近づける。成型部60の成形部材としては例えば図3のダイス600及び図4のローラ610を採用することができる。成型部60は、導体20の真円度を徐々に1.0に近づけるためにダイス600及び/またはローラ610を複数直列に配置してもよい。 The molding unit 60 carries out a molding process on the conductor 20. The molding step is a step of adjusting the roundness of the conductor 20, which is an aggregate of a plurality of carbon nanotubes. In the molding step, the surface of the conductor 20 and the molding member are brought into contact with each other to reduce the unevenness of the surface of the conductor 20 and bring the roundness of the conductor 20 close to 1.0. As the molding member of the molding portion 60, for example, the die 600 of FIG. 3 and the roller 610 of FIG. 4 can be adopted. In the molding portion 60, a plurality of dies 600 and / or rollers 610 may be arranged in series in order to gradually bring the roundness of the conductor 20 closer to 1.0.

図3に示すようにダイス600の出口604は入口602の直径より小さい。入口602及び出口604は円形であり、ダイス600は入口602から出口604に向かって徐々に細くなる円錐台形状のダイス孔606を有する。入口602の直径は導体20の最大径よりも大きく、例えば導体20の最大径の1.5倍程度である。出口604の直径は例えば導体20の最大径の1.0倍~1.5倍であり、特に導体20の最大径の1.2倍程度であることが好ましい。 As shown in FIG. 3, the outlet 604 of the die 600 is smaller than the diameter of the inlet 602. The inlet 602 and the outlet 604 are circular, and the die 600 has a truncated cone-shaped die hole 606 that gradually narrows from the inlet 602 to the outlet 604. The diameter of the inlet 602 is larger than the maximum diameter of the conductor 20, for example, about 1.5 times the maximum diameter of the conductor 20. The diameter of the outlet 604 is, for example, 1.0 to 1.5 times the maximum diameter of the conductor 20, and particularly preferably about 1.2 times the maximum diameter of the conductor 20.

成型工程は、導体20の真円度を1.0以上1.5以下に調整する。導体20はダイス600から引き出されると円形の断面を有するダイス孔606に接触しながら真円に近い断面形状に成型される。導体20の外面の一部はダイス孔606の内面に接触し、特に導体20の突出している部分はダイス孔606の内面に押圧されて変形し、成型される。導体20は複数のカーボンナノチューブがファンデルワールス力で集合しただけであるのでダイス孔606との接触により容易に変形することができる。 In the molding process, the roundness of the conductor 20 is adjusted to 1.0 or more and 1.5 or less. When the conductor 20 is pulled out from the die 600, the conductor 20 is molded into a cross-sectional shape close to a perfect circle while contacting the die hole 606 having a circular cross section. A part of the outer surface of the conductor 20 comes into contact with the inner surface of the die hole 606, and in particular, the protruding portion of the conductor 20 is pressed against the inner surface of the die hole 606 to be deformed and molded. Since the conductor 20 is simply a collection of a plurality of carbon nanotubes by a van der Waals force, the conductor 20 can be easily deformed by contact with the die hole 606.

また、成型工程は、導体20の表面に金属めっき被膜を有する場合にも、表面の凹凸を減少させることができる。 Further, in the molding step, even when the surface of the conductor 20 has a metal plating film, the unevenness of the surface can be reduced.

成型工程における導体20に対する引張応力は200MPa以上2000MPa以下であることが好ましい。導体20はCNT集合体であるので導体20に過度の引張応力がかかると破断してしまうため、導体20の送り速度を調整して成型工程における引張応力を比較的小さな値に維持する必要がある。一般的な導体線加工ダイスの場合には導体線に伸線加工が施されるが、本実施形態に係る導体20は伸線加工を施すのではない。導体20の外形を真円に近い形状に整えるために成型工程が行われる。 The tensile stress on the conductor 20 in the molding step is preferably 200 MPa or more and 2000 MPa or less. Since the conductor 20 is an aggregate of CNTs, it breaks when an excessive tensile stress is applied to the conductor 20, so it is necessary to adjust the feed rate of the conductor 20 to maintain the tensile stress in the molding process at a relatively small value. .. In the case of a general conductor wire processing die, the conductor wire is drawn, but the conductor 20 according to the present embodiment is not drawn. A molding process is performed in order to arrange the outer shape of the conductor 20 into a shape close to a perfect circle.

また、ダイス600に代えて、あるいはダイス600の前後に連続して、図4に示すローラ610を用いてもよい。ローラ610はボビン50から引き出された導体20を挟み込むように2つのローラ610を有する。2つの対向するローラ610は、わずかな間隔を隔てて配置され、導体20の送り出される方向に回転する。ローラ610は断面円弧状に湾曲した溝612を有する。互いに対向する溝612は導体20の最大径よりもわずかに大きな間隔を有して配置される。溝612は、ローラ610間を通る導体20に接触して真円に近い断面形状に導体20を成型する。図4では2つのローラ610を鉛直方向に間隔をあけて配置したが、2つのローラ610を水平方向に間隔をあけて配置してもよい。また、鉛直方向に配置したローラ610と水平方向に配置したローラ610を2組直列に並べて配置して導体20に対し2方向から接触してもよい。 Further, the roller 610 shown in FIG. 4 may be used instead of the die 600 or continuously before and after the die 600. The roller 610 has two rollers 610 so as to sandwich the conductor 20 drawn from the bobbin 50. The two opposing rollers 610 are spaced apart from each other and rotate in the direction in which the conductor 20 is fed. The roller 610 has a groove 612 curved in an arcuate cross section. The grooves 612 facing each other are arranged with a distance slightly larger than the maximum diameter of the conductor 20. The groove 612 contacts the conductor 20 passing between the rollers 610 and forms the conductor 20 into a cross-sectional shape close to a perfect circle. In FIG. 4, the two rollers 610 are arranged vertically spaced apart, but the two rollers 610 may be arranged horizontally spaced apart. Further, two sets of rollers 610 arranged in the vertical direction and rollers 610 arranged in the horizontal direction may be arranged side by side in series and come into contact with the conductor 20 from two directions.

塗布部70は、成型工程で所定の真円度に成型された導体20に塗料を塗布する塗布工程を実行する。塗布部70で塗布する塗料は、上述した絶縁被膜30の樹脂を溶媒に溶解した塗料を用いる。 The coating unit 70 executes a coating step of applying paint to the conductor 20 molded to a predetermined roundness in the molding step. As the paint to be applied by the coating unit 70, a paint in which the resin of the insulating coating 30 described above is dissolved in a solvent is used.

塗布工程における塗料の粘度は、0.5dPa・s以上50dPa・s以下であることができる。塗料の粘度は、JIS C2103に準拠して例えばリオン株式会社のデジタル回転式粘度計(ビスコテスタ)を用いて、測定することができる。塗料の粘度が0.5dPa・s以下であれば焼付部80で焼成される前に塗料が液だれ状になり偏肉度不良の原因となるため好ましくなく、50dPa・s以上であれば導体に過度の応力がかかり破断の原因となるため好ましくない。
The viscosity of the paint in the coating step can be 0.5 dPa · s or more and 50 dPa · s or less. The viscosity of the paint can be measured according to JIS C2103, for example, using a digital rotary viscometer (Viscometer) manufactured by Rion Co., Ltd. If the viscosity of the paint is 0.5 dPa · s or less, it is not preferable because the paint becomes dripping before firing in the baking portion 80 and causes poor thickness unevenness. If it is 50 dPa · s or more, it becomes a conductor. It is not preferable because excessive stress is applied and it causes breakage.

焼付部80は、塗布工程で導体20に塗布された塗料の焼き付けを行う焼き付け工程を実行する。焼き付けを行う温度は塗料の種類に応じて適当な温度に設定する。 The baking unit 80 executes a baking step of baking the paint applied to the conductor 20 in the coating step. The baking temperature is set to an appropriate temperature according to the type of paint.

塗布工程及び焼き付け工程を複数回繰り返すことにより、導体20に複数層からなる絶縁被膜30を形成することができる。複数回塗布することで絶縁被膜30の肉厚を均一化することができる。具体的には塗布部70及び焼付部80を通った導体20を再び塗布部70へ戻して塗布工程及び焼き付け工程を繰り返し行う。例えば、絶縁被膜30は5回以上の塗布工程及び焼き付け工程により形成することができる。 By repeating the coating process and the baking process a plurality of times, the insulating film 30 composed of a plurality of layers can be formed on the conductor 20. By applying the insulating film 30 times a plurality of times, the wall thickness of the insulating film 30 can be made uniform. Specifically, the conductor 20 that has passed through the coating portion 70 and the baking portion 80 is returned to the coating portion 70 again, and the coating step and the baking step are repeated. For example, the insulating coating 30 can be formed by five or more coating steps and baking steps.

成型工程後であって塗布工程前に、導体20を有機溶剤で洗浄する洗浄工程と、導体20を加熱して導体20に付着した有機溶剤を除去するアニール工程と、をさらに含んでもよい。洗浄工程は導体20に付着した不純物を洗い流すことができる。また、導体20が金属めっきで被覆されていない場合は洗浄工程で有機溶剤が導体20の内部の隙間に入り込み、アニール工程で有機溶剤が除去されることで導体20の内部にあった隙間が減少して空隙率が低くなる。導体20の空隙率が低くなれば、エナメル線10における電気抵抗を低く抑えることができる。また、導体20の空隙率が低くなれば、エナメル線10においける引張強さが向上する。 After the molding step and before the coating step, a cleaning step of cleaning the conductor 20 with an organic solvent and an annealing step of heating the conductor 20 to remove the organic solvent adhering to the conductor 20 may be further included. The cleaning step can wash away impurities adhering to the conductor 20. When the conductor 20 is not coated with metal plating, the organic solvent enters the gap inside the conductor 20 in the cleaning step, and the organic solvent is removed in the annealing step, so that the gap inside the conductor 20 is reduced. As a result, the porosity becomes low. If the porosity of the conductor 20 is low, the electrical resistance of the enamel wire 10 can be kept low. Further, if the porosity of the conductor 20 is low, the tensile strength of the enamel wire 10 is improved.

アニール工程は、導体20に付着した有機溶剤を揮発させることができる温度に加熱する。 The annealing step heats the organic solvent adhering to the conductor 20 to a temperature at which it can be volatilized.

有機溶剤としては導体20が金属めっきで被覆されていない場合はアセトンが好ましい。導体20がCNT集合体を銅等の金属めっきで被覆したものである場合は有機溶剤としてアセトンの他、例えば、エタノール、メタノール、イソプロパノール、二塩化エチレン或いはクロロホルムを用いてもよい。 As the organic solvent, acetone is preferable when the conductor 20 is not coated with metal plating. When the conductor 20 is a CNT aggregate coated with a metal plating such as copper, in addition to acetone, for example, ethanol, methanol, isopropanol, ethylene dichloride or chloroform may be used as the organic solvent.

(1)実施例のサンプルの作製
実施例1~実施例3として市販のCNT集合体を表1に記載の真円度に成型して、絶縁被膜を塗布して焼き付けして実施例1~実施例3のエナメル線のサンプルを得た。
(1) Preparation of Samples of Examples Examples 1 to 3 are carried out by molding commercially available CNT aggregates as Examples 1 to 3 into the roundness shown in Table 1, applying an insulating film, and baking them. A sample of the enamel wire of Example 3 was obtained.

実施例1の「導体」は日立造船社製の線径50μmの「CNTワイヤー」であり、「塗料」は東特塗料社製の粘度0.5dPa・sを用いて5層のポリウレタンの絶縁被膜(平均肉厚7μm)を形成した。 The "conductor" of Example 1 is a "CNT wire" having a wire diameter of 50 μm manufactured by Hitachi Zosen Corporation, and the "paint" is a five-layer polyurethane insulating film using a viscosity of 0.5 dPa · s manufactured by Totoku Toryo Co., Ltd. (Average wall thickness 7 μm) was formed.

実施例2の「導体」は日立造船社製の線径40μm、銅めっき厚さ1μm(片側)の「CNTワイヤーCuめっきあり」であり、「塗料」は東特塗料社製の粘度0.5dPa・sを用いて5層のポリウレタンの絶縁被膜(平均肉厚8.5μm)を形成した。 The "conductor" of Example 2 is "with CNT wire Cu plating" having a wire diameter of 40 μm and a copper plating thickness of 1 μm (one side) manufactured by Hitachi Shipbuilding Co., Ltd., and the “paint” has a viscosity of 0.5 dPa manufactured by Totoku Toryo Co., Ltd. -S was used to form a five-layer polyurethane insulating coating (average wall thickness 8.5 μm).

実施例3の「導体」は村田機械社製の線径100μmの「CNTヤーン」であり、「塗料」は東特塗料社製の粘度0.5dPa・sを用いて5層のポリウレタンの絶縁被膜(平均肉厚12μm)を形成した。 The "conductor" of Example 3 is a "CNT yarn" having a wire diameter of 100 μm manufactured by Murata Machinery Co., Ltd., and the "paint" is a five-layer polyurethane insulating film using a viscosity of 0.5 dPa · s manufactured by Totoku Toryo Co., Ltd. (Average wall thickness 12 μm) was formed.

(2)比較例のサンプルの作製
比較例1として「導体」は名城ナノカーボン社製の線径120μmのCNT集合体を用いて真円度を調整することなく有機溶剤による洗浄も行わず東特塗料社製の粘度0.5dPa・sの塗料を用いて5層のポリウレタンの絶縁被膜(平均肉厚5μm)を形成した。
(2) Preparation of sample of comparative example As comparative example 1, the "conductor" is a CNT aggregate with a wire diameter of 120 μm manufactured by Meijo Nanocarbon Co., Ltd., without adjusting the roundness and without cleaning with an organic solvent. A five-layer polyurethane insulating film (average wall thickness 5 μm) was formed using a paint having a viscosity of 0.5 dPa · s manufactured by Paint Co., Ltd.

比較例2として線径30μmの銅線にポリウレタンの絶縁被膜(平均肉厚5μm)を形成した2種エナメル線を用いた。 As Comparative Example 2, a type 2 enamel wire having a polyurethane insulating film (average wall thickness of 5 μm) formed on a copper wire having a wire diameter of 30 μm was used.

比較例3としてサカイ産業社の炭素繊維集合線(線径230μm)にポリウレタンの絶縁被膜(平均肉厚5μm)を形成した。 As Comparative Example 3, a polyurethane insulating film (average wall thickness 5 μm) was formed on a carbon fiber assembly wire (wire diameter 230 μm) manufactured by Sakai Sangyo Co., Ltd.

(3)各種寸法の測定
実施例1~3及び比較例1~3の導体をマイクロスコープを用いて撮影し、画像計測ソフトで線径(「導体径」)を測定した。図5と図8は実施例1と実施例2のCNT集合体の外観を500倍に拡大して撮影した写真である。図11は比較例1のCNT集合体の外観を500倍に拡大して撮影した写真である。実施例1~3の導体は成型工程後の寸法であり、比較例1~3は成型工程を行わない状態の寸法とした。各導体の長さ方向の同じ位置でエナメル線を回転して5箇所で線径を測定し、測定結果の最大径D1と最小径D2から真円度(D1/D2)を計算した。エナメル線の線径は「仕上径」として表2,3に示した。その真円度を各導体の長さ方向の10か所で算出し、その内の最も大きな真円度を表1~表3に示した。
(3) Measurement of various dimensions The conductors of Examples 1 to 3 and Comparative Examples 1 to 3 were photographed with a microscope, and the wire diameter (“conductor diameter”) was measured with image measurement software. 5 and 8 are photographs taken by magnifying the appearance of the CNT aggregates of Examples 1 and 2 at a magnification of 500 times. FIG. 11 is a photograph taken by magnifying the appearance of the CNT aggregate of Comparative Example 1 by 500 times. The conductors of Examples 1 to 3 are the dimensions after the molding step, and the conductors of Comparative Examples 1 to 3 are the dimensions in the state where the molding step is not performed. The enamel wire was rotated at the same position in the length direction of each conductor, the wire diameter was measured at five points, and the roundness (D1 / D2) was calculated from the maximum diameter D1 and the minimum diameter D2 of the measurement results. The wire diameter of the enamel wire is shown in Tables 2 and 3 as the "finishing diameter". The roundness was calculated at 10 points in the length direction of each conductor, and the largest roundness among them is shown in Tables 1 to 3.

実施例1~3及び比較例1~3のエナメル線を切断した断面をマイクロスコープを用いて撮影し、画像計測ソフトで5箇所以上の肉厚を測定した。測定結果から最も厚い肉厚T1と最も薄い肉厚T2との比(T1/T2)を偏肉度として求めた。各導体の長さ方向の10か所で測定し、その内の最も大きな偏肉度を表1~表3に示した。 The cross sections of Examples 1 to 3 and Comparative Examples 1 to 3 in which the enamel wires were cut were photographed using a microscope, and the wall thicknesses at five or more points were measured with image measurement software. From the measurement results, the ratio (T1 / T2) of the thickest wall thickness T1 and the thinnest wall thickness T2 was determined as the degree of deviation. Measurements were made at 10 points in the length direction of each conductor, and the largest degree of unevenness among them is shown in Tables 1 to 3.

(4)絶縁被膜の評価
図6は実施例1のエナメル線の外観を500倍に拡大して撮影した写真であり、図7は実施例1のエナメル線の切断面を1000倍に拡大して撮影した写真であり、図8は実施例2のエナメル線の外観を500倍に拡大して撮影した写真であり、図9は実施例2のエナメル線の切断面を1000倍に拡大して撮影した写真である。実施例1~3及び比較例2のエナメル線は、表2及び表3に示すように偏肉度が2.0以下であり、拡大写真を観察してもピンホールなどの欠陥は見当たらなかった。
(4) Evaluation of Insulation Film FIG. 6 is a photograph taken by magnifying the appearance of the enamel wire of Example 1 by 500 times, and FIG. 7 is a photograph taken by magnifying the cut surface of the enamel wire of Example 1 by 1000 times. It is a photograph taken, FIG. 8 is a photograph taken by magnifying the appearance of the enamel wire of Example 2 by 500 times, and FIG. 9 is a photograph taken by magnifying the cut surface of the enamel wire of Example 2 by 1000 times. It is a photograph that was taken. As shown in Tables 2 and 3, the enamel wires of Examples 1 to 3 and Comparative Example 2 had a degree of deviation of 2.0 or less, and no defects such as pinholes were found even when the enlarged photographs were observed. ..

図12は比較例1のエナメル線の断面を500倍に拡大して撮影した写真である。図12に示すように比較例1は断面が扁平になり表面の凹凸も多く、それに付随して絶縁被膜の欠陥が各所にみられる。比較例1の導体の真円度は1.9であり、エナメル線の偏肉度は測定不能であった。 FIG. 12 is a photograph taken by magnifying the cross section of the enamel wire of Comparative Example 1 by 500 times. As shown in FIG. 12, Comparative Example 1 has a flat cross section and many surface irregularities, and accompanying defects of the insulating coating are observed in various places. The roundness of the conductor of Comparative Example 1 was 1.9, and the degree of unevenness of the enamel wire could not be measured.

(5)機械的特性
実施例1~3及び比較例1~3の導体及びエナメル線のサンプルについて、JIS C3202試験片について、株式会社オリエンテック社製の引張試験機を用いて、23±2℃、標準線間距離200mm、引張速度5±1mm/secでJIS C3216に基づいて引張試験を行い、引張強さ(N)、破断荷重(gf)を測定した。測定結果を表1~表3に示した。
(5) Mechanical properties For the conductor and enamel wire samples of Examples 1 to 3 and Comparative Examples 1 to 3, JIS C3202 test pieces were used at 23 ± 2 ° C. using a tensile tester manufactured by Orientec Co., Ltd. , A tensile test was performed based on JIS C3216 at a standard line distance of 200 mm and a tensile speed of 5 ± 1 mm / sec, and the tensile strength (N) and the breaking load (gf) were measured. The measurement results are shown in Tables 1 to 3.

Figure 0007053427000001
Figure 0007053427000001

Figure 0007053427000002
Figure 0007053427000002

Figure 0007053427000003
Figure 0007053427000003

(6)線抵抗の測定及び評価
実施例1~3及び比較例2,3のエナメル線のサンプルについて、鶴賀電機社製の抵抗計を用いてJIS C3216に基づいて電気抵抗を測定し、その測定結果を図13に示した。図13では20℃における電気抵抗を100%としたときの0℃~200℃での電気抵抗の変化(抵抗比)を示した。図13によれば、比較例2のエナメル線の電気抵抗は温度の上昇と共に大きくなるのに対し、実施例1~3及び比較例3のエナメル線の電気抵抗は温度が0℃~200℃と変化しても±20%の変化はなかった。具体的には、0℃と200℃における各例の電気抵抗の変化は、実施例1が102%と86%、実施例2が101%と87%、実施例3が102%と84%であった。
(6) Measurement and evaluation of wire resistance With respect to the enamel wire samples of Examples 1 to 3 and Comparative Examples 2 and 3, the electrical resistance was measured based on JIS C3216 using a resistance meter manufactured by Tsuruga Electric Co., Ltd., and the measurement thereof. The results are shown in FIG. FIG. 13 shows the change (resistance ratio) of the electric resistance from 0 ° C. to 200 ° C. when the electric resistance at 20 ° C. is 100%. According to FIG. 13, the electric resistance of the enamel wire of Comparative Example 2 increases as the temperature rises, whereas the electric resistance of the enamel wires of Examples 1 to 3 and Comparative Example 3 has a temperature of 0 ° C to 200 ° C. There was no change of ± 20% even if it changed. Specifically, the changes in electrical resistance of each example at 0 ° C. and 200 ° C. were 102% and 86% in Example 1, 101% and 87% in Example 2, and 102% and 84% in Example 3. there were.

(7)インピーダンスの測定及び評価
実施例1~3及び比較例2,3のエナメル線のサンプルについて、GW Instek社製のインピーダンス測定器を用いてJIS C3216に基づいて電気抵抗を測定し、0kHz~200kHzにおけるインピーダンスを測定し、その測定結果を図14に示した。図14では0kHzにおけるインピーダンスを100%としたときの0kHz~200kHzにおけるインピーダンスの変化を示した。図14によれば、比較例2のエナメル線のインピーダンスは周波数が高くなると大きくなるのに対し、実施例1~3及び比較例3のエナメル線のインピーダンスは周波数が高くなるにつれ低くなり、200kHzになっても90%を下回らなかった。特に実施例1~3のエナメル線のインピーダンスはほぼ同じ傾向を示した。具体的には、0kHzと200kHzにおけるインピーダンスの変化は、実施例1が100%と99%、実施例2が100%と96%、実施例3が100%と92%であった。
(7) Impedance measurement and evaluation For the enamel wire samples of Examples 1 to 3 and Comparative Examples 2 and 3, the electrical resistance was measured based on JIS C3216 using an impedance measuring instrument manufactured by GW Instek, and the electric resistance was measured from 0 kHz to 0 kHz. Impedance at 200 kHz was measured, and the measurement results are shown in FIG. FIG. 14 shows the change in impedance from 0 kHz to 200 kHz when the impedance at 0 kHz is 100%. According to FIG. 14, the impedance of the enamel wire of Comparative Example 2 increases as the frequency increases, whereas the impedance of the enamel wire of Examples 1 to 3 and Comparative Example 3 decreases as the frequency increases to 200 kHz. Even so, it did not fall below 90%. In particular, the impedances of the enamel wires of Examples 1 to 3 showed almost the same tendency. Specifically, the changes in impedance at 0 kHz and 200 kHz were 100% and 99% in Example 1, 100% and 96% in Example 2, and 100% and 92% in Example 3.

(8)有機溶剤による効果
村田機械社製の「CNTヤーン」をアセトンに浸漬したところ、線径が44.4μmから39.5μmにまで縮小した。導体が金属めっきで被覆されていない場合はアセトンによる洗浄と同時に空隙率が減少した。アセトンの代わりにエタノール、メタノール、イソプロパノール、二塩化エチレン及びクロロホルムで洗浄したが、空隙率の減少は見られな
かった。
(8) Effect of organic solvent When "CNT yarn" manufactured by Murata Machinery Co., Ltd. was immersed in acetone, the wire diameter was reduced from 44.4 μm to 39.5 μm. When the conductor was not coated with metal plating, the porosity decreased at the same time as washing with acetone. Washing with ethanol, methanol, isopropanol, ethylene dichloride and chloroform instead of acetone did not show any decrease in porosity.

本発明は、上述した実施形態に限定されるものではなく、さらに種々の変形が可能である。例えば、本発明は、実施形態で説明した構成と実質的に同一の構成(例えば、機能、方法、及び結果が同一の構成、あるいは目的及び効果が同一の構成)を含む。また、本発明は、実施形態で説明した構成の本質的でない部分を置き換えた構成を含む。また、本発明は、実施形態で説明した構成と同一の作用効果を奏する構成又は同一の目的を達成することができる構成を含む。また、本発明は、実施形態で説明した構成に公知技術を付加した構成を含む。 The present invention is not limited to the above-described embodiment, and various modifications are possible. For example, the present invention includes substantially the same configurations as those described in the embodiments (eg, configurations with the same function, method, and result, or configurations with the same purpose and effect). The present invention also includes a configuration in which a non-essential part of the configuration described in the embodiment is replaced. Further, the present invention includes a configuration having the same action and effect as the configuration described in the embodiment or a configuration capable of achieving the same object. Further, the present invention includes a configuration in which a known technique is added to the configuration described in the embodiment.

10…エナメル線、20…導体、30…絶縁被膜、50…ボビン、60…成型部、70…塗布部、80…焼付部、90…巻取部、100…製造装置、600…ダイス、602…入口、604…出口、606…ダイス孔、610…ローラ、612…溝 10 ... enamel wire, 20 ... conductor, 30 ... insulating film, 50 ... bobbin, 60 ... molding part, 70 ... coating part, 80 ... baking part, 90 ... winding part, 100 ... manufacturing equipment, 600 ... die, 602 ... Entrance, 604 ... Exit, 606 ... Dice hole, 610 ... Roller, 612 ... Groove

Claims (1)

複数のカーボンナノチューブの集合体である導体をボビンから引き出し、前記導体の真円度を調整する成型工程と、
前記成型工程後に、前記導体を有機溶剤で洗浄する洗浄工程と、
前記洗浄工程後の前記導体を加熱して前記導体に付着した有機溶剤を除去するアニール工程と、
前記アニール工程後の前記導体に塗料を塗布する塗布工程と、
前記塗布工程で前記導体に塗布された塗料の焼き付けを行う焼き付け工程と、
を含み、
前記導体は、複数のカーボンナノチューブの紡績糸を撚った撚糸、複数の前記撚糸の束または前記撚糸もしくは前記束の外面に金属めっきを施したものであり、
前記導体に対して前記成型工程から前記焼き付け工程までボビンに巻き付けられることなく各工程が実行され、
前記成型工程は、前記導体の外面の一部が円形の断面を有するダイス孔の内面及び対向する少なくとも2つのローラの湾曲した溝に接触すると共に、前記導体の外面から突出している部分が前記ダイス孔の前記内面及び前記ローラの前記溝に押圧されて変形することで、前記導体の真円度を1.0以上1.25以下に調整し、
前記成型工程における前記導体に対する引張応力は200MPa以上2000MPa以下であり、
前記塗布工程における塗料の粘度は、0.5dPa・s以上50dPa・s以下であることを特徴とする、エナメル線の製造方法。
A molding process in which a conductor , which is an aggregate of a plurality of carbon nanotubes, is pulled out from a bobbin and the roundness of the conductor is adjusted.
After the molding step, a cleaning step of cleaning the conductor with an organic solvent and
An annealing step of heating the conductor after the cleaning step to remove the organic solvent adhering to the conductor, and a step of annealing.
A coating step of applying paint to the conductor after the annealing step, and a coating step of applying the paint to the conductor.
A baking step of baking the paint applied to the conductor in the coating step, and a baking step of baking the paint.
Including
The conductor is a twisted yarn obtained by twisting spun yarns of a plurality of carbon nanotubes, a bundle of the plurality of twisted yarns, or a twisted yarn or an outer surface of the bundle obtained by metal plating.
Each step is executed without being wound around the bobbin from the molding step to the baking step on the conductor.
In the molding step, a part of the outer surface of the conductor comes into contact with the inner surface of the die hole having a circular cross section and the curved groove of at least two rollers facing each other, and the portion protruding from the outer surface of the conductor is the die. 1. The roundness of the conductor is 1.0 or more by being pressed and deformed by the inner surface of the hole and the groove of the roller. Adjust to 25 or less,
The tensile stress on the conductor in the molding step is 200 MPa or more and 2000 MPa or less.
A method for producing an enamel wire, wherein the viscosity of the coating material in the coating step is 0.5 dPa · s or more and 50 dPa · s or less.
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