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JP7058412B2 - Manufacturing method of 3D resin molded circuit parts - Google Patents
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JP7058412B2 - Manufacturing method of 3D resin molded circuit parts - Google Patents

Manufacturing method of 3D resin molded circuit parts Download PDF

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JP7058412B2
JP7058412B2 JP2017252216A JP2017252216A JP7058412B2 JP 7058412 B2 JP7058412 B2 JP 7058412B2 JP 2017252216 A JP2017252216 A JP 2017252216A JP 2017252216 A JP2017252216 A JP 2017252216A JP 7058412 B2 JP7058412 B2 JP 7058412B2
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resin molded
hydrophilic region
metal
molded body
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JP2019117903A (en
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勇治 関冨
邦人 竹内
一実 澤村
剛 芳賀
信哉 清水
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Imuzak
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Structure Of Printed Boards (AREA)

Description

本発明は、3次元構造の樹脂成形体に導体回路パターンが一体的に形成されている3次元樹脂成形回路部品、その製造方法及びめっき用中間部品に関する。 The present invention relates to a three-dimensional resin molded circuit component in which a conductor circuit pattern is integrally formed on a resin molded body having a three-dimensional structure, a manufacturing method thereof, and an intermediate component for plating.

コンピュータ、携帯電話、スマートフォン、自動車の電装部品など各種の電気・電子機器に組み込む構成部品として、例えば金型を用いた射出成形によって所望形状の立体構造からなる樹脂成形体を成形し、その表面に、直接、所望パターンの導体回路を形成したMID(Molded Interconnect Device)と呼ばれる部品(3次元樹脂成形回路部品)が知られている。 As a component to be incorporated into various electric and electronic devices such as computers, mobile phones, smartphones, and electrical components of automobiles, for example, a resin molded body having a three-dimensional structure having a desired shape is molded by injection molding using a mold, and the surface thereof is formed. , A component (three-dimensional resin molded circuit component) called an MID (Molded Interconnect Device) that directly forms a conductor circuit having a desired pattern is known.

この3次元樹脂成形回路部品は、構成部品(基材)としての樹脂成形体の表面に所望の導体回路パターンが形成されているので、これを組み込んだ電気・電子機器は、構成部品とは別にその駆動用のプリント回路基板などを組み込まなければなければならない一般的な電気・電子機器の場合に比べ、小型化(省スペース化)、薄型化、軽量化、そして多機能化を図ることができる。 In this three-dimensional resin molded circuit component, a desired conductor circuit pattern is formed on the surface of the resin molded body as a component (base material), so that the electrical / electronic device incorporating this is separate from the component. Compared to general electrical and electronic equipment that must incorporate a printed circuit board for driving, it is possible to reduce the size (space saving), thinning, weight reduction, and multifunctionality. ..

樹脂成形体の表面に、直接、導体回路パターンを形成する方法としては様々な方法が知られている。例えば、特許文献1では、樹脂成形品の表面全体に無電解めっき、スパッタリング、真空蒸着などの方法で金属薄膜を形成し、ついでその金属薄膜にレーザー光を照射して、目的とする導体回路パターンの部分は残し、残りの金属薄膜は全て除去して導体回路パターンを形成し、更にその導体回路パターンに例えば銅の電解めっきを行って所望する厚みの導体回路にする方法が開示されている。 Various methods are known as a method of directly forming a conductor circuit pattern on the surface of a resin molded body. For example, in Patent Document 1, a metal thin film is formed on the entire surface of a resin molded product by a method such as electroplating, sputtering, or vacuum vapor deposition, and then the metal thin film is irradiated with laser light to obtain a target conductor circuit pattern. A method is disclosed in which a conductor circuit pattern is formed by removing all the remaining metal thin films, and the conductor circuit pattern is electroplated with copper, for example, to obtain a conductor circuit having a desired thickness.

また、特許文献2では、樹脂成形品の表面を例えば化学エッチングして凹凸構造の粗化面とし、その粗化面のうち目的とする導体回路パターンに対応する部位以外の表面にめっきレジストを塗布(マスキング)し、しかる後、表出している導体回路パターンに対応する部位の凹凸構造に化学(無電解)めっき時の触媒核となる金属を含む触媒液を塗布して当該触媒核を被着させ、そこに例えば銅の無電解めっきを行って所望する厚みの導体回路にする方法が開示されている。 Further, in Patent Document 2, for example, the surface of the resin molded product is chemically etched to form a roughened surface having an uneven structure, and a plating resist is applied to the surface of the roughened surface other than the portion corresponding to the target conductor circuit pattern. After (masking), a catalyst solution containing a metal that becomes a catalyst nucleus during chemical (non-electrolytic) plating is applied to the uneven structure of the part corresponding to the exposed conductor circuit pattern, and the catalyst nucleus is adhered. A method is disclosed in which a conductor circuit having a desired thickness is obtained by subjecting it to, for example, electrolytic plating of copper.

特開平6―164105号公報Japanese Unexamined Patent Publication No. 6-164105 特開平8―288621号公報Japanese Unexamined Patent Publication No. 8-288621

しかしながら、上記した先行技術には次のような問題がある。
特許文献1では、目的とする回路部品の製造に際して、少なくとも樹脂成形工程と、得られた樹脂成形品の一つ一つに対して行うレーザー加工工程と、無電解めっき工程という3工程が必要となる。言い換えれば、特許文献1の場合、高価なレーザー照射装置とその複雑な操作が必要となって製造コストは高くなり、製造時間も長くなり、また回路部品は単品生産となるので大量生産には向いていないという問題がある。
However, the above-mentioned prior art has the following problems.
Patent Document 1 requires at least three steps of a resin molding step, a laser processing step performed on each of the obtained resin molded products, and an electroless plating step when manufacturing the target circuit component. Become. In other words, in the case of Patent Document 1, an expensive laser irradiation device and its complicated operation are required, the manufacturing cost is high, the manufacturing time is long, and the circuit parts are manufactured individually, which is suitable for mass production. There is a problem that it is not.

特許文献2の場合、樹脂成形工程で得た樹脂成形品の一つ一つに対して、少なくとも、それぞれの表面全体を粗化面にするエッチング工程、目的とする導体回路パターンに対応する部位以外の表面にめっきレジストを塗布する工程、導体回路パターンに対応する部位に行う無電解めっき工程、そして最後に塗布しためっきレジストを除去する工程という5工程が必要となる。この場合も、特許文献1に開示の技術と同じように、製造工程は複雑であり、回路部品の製造コストは高くなり、製造時間も長くなり、回路部品の大量生産には向いていないという問題がある。 In the case of Patent Document 2, for each of the resin molded products obtained in the resin molding process, at least the etching process for making the entire surface of each surface roughened, and the portion corresponding to the target conductor circuit pattern are not included. Five steps are required: a step of applying a plating resist to the surface of the surface, a step of electroless plating performed on the portion corresponding to the conductor circuit pattern, and a step of removing the last applied plating resist. In this case as well, as in the technique disclosed in Patent Document 1, the manufacturing process is complicated, the manufacturing cost of circuit parts is high, the manufacturing time is long, and it is not suitable for mass production of circuit parts. There is.

また、特許文献1,2に開示の製造方法はいずれも、樹脂成形品の表面のうち比較的平坦な外側表面に対しては適用可能であるが、外側表面であっても深い凹部になっている表面部分や、また樹脂成形品の一方の外側表面から他方の外側表面に向かって樹脂成形品の内部を貫通するスルーホールの内側表面に目的とする導体回路パターンを形成することは事実上不可能であるという問題がある。そのため、樹脂成形して得られた樹脂成形体の表面において、導体回路パターンを形成する箇所は制約を受けることになる。 Further, all of the manufacturing methods disclosed in Patent Documents 1 and 2 can be applied to a relatively flat outer surface of the surface of the resin molded product, but even the outer surface has deep recesses. It is virtually impossible to form the desired conductor circuit pattern on the surface portion of the resin molded product or on the inner surface of the through hole penetrating the inside of the resin molded product from one outer surface of the resin molded product toward the other outer surface. There is the problem that it is possible. Therefore, on the surface of the resin molded body obtained by resin molding, the place where the conductor circuit pattern is formed is restricted.

本発明は上記した先行技術の問題を解消し、導体回路パターンを各樹脂成形品に個別に形成するためのレーザー照射工程、マスキングやエッチング処理工程などの専用の工程や設備を不要とし、導体回路パターンの形成を複数個の樹脂成形体に同時に又は連続して行うことができ、製造時間や製造コストの低減を図ることができると共に、樹脂成形体の深い凹部やスルーホールの各表面にも導体回路パターンを形成することができ、さらには、導体回路パターンの位置精度のばらつきも少なくすることができる3次元樹脂成形回路部品、その製造方法、及びめっき用中間部品の提供を課題とする。 The present invention solves the above-mentioned problems of the prior art, eliminates the need for dedicated processes and equipment such as a laser irradiation process for individually forming a conductor circuit pattern on each resin molded product, a masking process, and an etching process, and a conductor circuit. The pattern can be formed on a plurality of resin molded bodies at the same time or continuously, and the manufacturing time and manufacturing cost can be reduced. At the same time, conductors can be formed on each surface of deep recesses and through holes of the resin molded body. An object of the present invention is to provide a three-dimensional resin molded circuit component capable of forming a circuit pattern and further reducing variation in the position accuracy of the conductor circuit pattern, a manufacturing method thereof, and an intermediate component for plating.

上記した課題を解決するために、本発明の3次元樹脂成形回路部品は、樹脂成形体の表面に導体回路パターンが形成されている3次元樹脂成形回路部品であって、前記樹脂成形体の表面に、前記導体回路パターンに対応するパターンで形成された凹凸構造からなる親水性領域を有し、前記導体回路パターンが、前記親水性領域を被覆してなり、かつ無電解めっき時に触媒核として作用する金属粒子を含む導電性下地層と、前記導電性下地層に積層された金属めっき層とを有していること特徴とする。 In order to solve the above-mentioned problems, the three-dimensional resin molded circuit component of the present invention is a three-dimensional resin molded circuit component in which a conductor circuit pattern is formed on the surface of the resin molded body, and is a surface of the resin molded body. In addition, it has a hydrophilic region having a concavo-convex structure formed by a pattern corresponding to the conductor circuit pattern, the conductor circuit pattern covers the hydrophilic region, and acts as a catalyst nucleus during electroless plating. It is characterized by having a conductive base layer containing the metal particles to be formed and a metal plating layer laminated on the conductive base layer.

前記親水性領域を除いた前記樹脂成形体の表面の少なくとも一部が、凹凸構造からなる撥水性領域になっていることが好ましい。
前記金属粒子が金属ナノ粒子であることが好ましく、さらには、前記金属粒子が銀ナノ粒子であり、前記金属めっき層が銅めっき層であることが好ましい。
It is preferable that at least a part of the surface of the resin molded product excluding the hydrophilic region is a water-repellent region having an uneven structure.
It is preferable that the metal particles are metal nanoparticles, further, the metal particles are silver nanoparticles, and the metal plating layer is a copper plating layer.

また、本発明の3次元樹脂成形回路部品の製造方法は、樹脂成形体の表面に導体回路パターンが形成されている3次元樹脂成形回路部品の製造方法であって、凹凸構造からなる親水性領域転写部が、前記導体回路パターンに対応するパターンで型面に形成されてなる金型を用いて樹脂成形を行い、前記親水性領域転写部が転写された、凹凸構造からなる親水性領域を表面に有する樹脂成形体を得る工程と、得られた樹脂成形体の前記親水性領域に、無電解めっき時に触媒核として作用する金属粒子を含む金属粒子分散液を接触させ、前記親水性領域に前記金属粒子を含む導電性下地層を形成する工程と、前記導電性下地層に導電金属の無電解めっき処理を施して、前記導電性下地層に前記導電金属からなる金属めっき層を積層する工程とを含み、前記親水性領域上に、前記導電性下地層と前記金属めっき層とからなる導体回路パターンを形成することを特徴とする。 Further, the method for manufacturing a three-dimensional resin molded circuit component of the present invention is a method for manufacturing a three-dimensional resin molded circuit component in which a conductor circuit pattern is formed on the surface of a resin molded body, and is a hydrophilic region having a concavo-convex structure. Resin molding is performed using a mold in which the transfer portion is formed on the mold surface with a pattern corresponding to the conductor circuit pattern, and the hydrophilic region having the uneven structure to which the hydrophilic region transfer portion is transferred is surfaced. A metal particle dispersion liquid containing metal particles acting as a catalyst nucleus during electroless plating is brought into contact with the hydrophilic region of the obtained resin molded body in the step of obtaining the resin molded body having the above-mentioned hydrophilic region. A step of forming a conductive base layer containing metal particles, and a step of subjecting the conductive base layer to electroless plating of a conductive metal and laminating a metal plating layer made of the conductive metal on the conductive base layer. It is characterized in that a conductor circuit pattern including the conductive base layer and the metal plating layer is formed on the hydrophilic region.

前記金型として、前記親水性領域転写部を除いた型面の少なくとも一部に、凹凸構造からなる撥水性領域転写部が形成されているものを用い、前記親水性領域を除いた前記樹脂成形体の表面の少なくとも一部を、凹凸構造からなる撥水性領域とするものを用いることが好ましい。
前記金属粒子分散液を接触させる処理が、前記樹脂成形体を前記金属粒子分散液へ浸漬する処理、又は前記導電性分散液を前記親水性領域へ塗布する処理であることが好ましく、前記浸漬処理後又は前記塗布処理後に、更に乾燥処理又は焼成処理を行うことが好ましい。また、前記金属粒子として金属ナノ粒子を用いることが好ましい。
As the mold, a mold having a water-repellent region transfer portion having a concavo-convex structure formed on at least a part of the mold surface excluding the hydrophilic region transfer portion is used, and the resin molding excluding the hydrophilic region is used. It is preferable to use a water-repellent region having an uneven structure at least a part of the surface of the body.
It is preferable that the treatment for bringing the metal particle dispersion liquid into contact is a treatment for immersing the resin molded body in the metal particle dispersion liquid or a treatment for applying the conductive dispersion liquid to the hydrophilic region, and the dipping treatment. After that or after the coating treatment, it is preferable to further perform a drying treatment or a baking treatment. Further, it is preferable to use metal nanoparticles as the metal particles.

また、本発明のめっき用中間部品は、めっき処理によって表面に導体回路パターンが形成された3次元樹脂成形回路部品を製造するための樹脂成形体からなるめっき用中間部品であって、前記樹脂成形体の表面に、前記導体回路パターンに対応するパターンで形成された凹凸構造からなる親水性領域と、前記親水性領域を除いた表面の少なくとも一部に形成された凹凸構造からなる撥水性領域とを備えていることを特徴とする。 Further, the intermediate part for plating of the present invention is an intermediate part for plating made of a resin molded body for manufacturing a three-dimensional resin molded circuit part having a conductor circuit pattern formed on the surface by a plating process, and is the resin molding. On the surface of the body, a hydrophilic region formed of an uneven structure formed by a pattern corresponding to the conductor circuit pattern, and a water-repellent region formed of an uneven structure formed on at least a part of the surface excluding the hydrophilic region. It is characterized by having.

本発明の3次元樹脂成形回路部品は、基材である樹脂成形体に、目的とする導体回路パターンに対応するパターンの親水性領域が形成されている。そのため、この樹脂成形体を、触媒核として作用する金属粒子を含む金属粒子分散液と接触させるだけで、親水性領域に金属粒子からなる導電性下地層を形成することができる。したがって、導電性下地層とその上に形成される金属めっき層からなる導体回路パターンは、従来のように、レーザー加工、マスキング処理、エッチング処理など特別の処理を行うことなく形成することができる。 In the three-dimensional resin molded circuit component of the present invention, a hydrophilic region of a pattern corresponding to a target conductor circuit pattern is formed on a resin molded body as a base material. Therefore, a conductive base layer made of metal particles can be formed in the hydrophilic region only by bringing this resin molded body into contact with a metal particle dispersion liquid containing metal particles acting as a catalyst nucleus. Therefore, the conductor circuit pattern composed of the conductive base layer and the metal plating layer formed on the conductive base layer can be formed without performing special treatment such as laser processing, masking processing, and etching processing as in the conventional case.

また、樹脂成形体の表面に形成される親水性領域は、その表面を凹凸構造とすることによって親水性が付与された領域になっているので、それに対応する金型の型面の部位に親水性を発揮する凹凸構造の親水性領域転写部を形成しておくことにより、目的とする樹脂成形体を成形すると同時に、当該樹脂成形体の表面に親水性領域を形成することができる。
したがって、樹脂成形体に用いる樹脂材料は成形可能な材料であれば何であってもよく、材料コストや全体の製造コストも低減する。
Further, since the hydrophilic region formed on the surface of the resin molded body is a region to which hydrophilicity is imparted by forming the surface into an uneven structure, the hydrophilic region corresponds to the portion of the mold surface of the mold. By forming the hydrophilic region transfer portion of the concavo-convex structure that exhibits the property, it is possible to form the target resin molded product and at the same time form the hydrophilic region on the surface of the resin molded product.
Therefore, the resin material used for the resin molded body may be any material as long as it can be molded, and the material cost and the overall manufacturing cost are reduced.

また、金型側に親水性を発揮する凹凸構造の親水性領域転写部を形成するだけでよいのであるから、樹脂成形体の一つ一つに対して個別に導体回路パターンの加工を行わなくてもよく、製造工程は簡略化され、製造コストや製造時間の大幅な低減に寄与する。
また、樹脂成形だけで親水性領域を形成できるので、樹脂成形体の凹部表面やスルーホールの内側の表面(内面)にも目的とする導体回路パターンを形成することができる。
Further, since it is only necessary to form a hydrophilic region transfer portion having a concavo-convex structure that exhibits hydrophilicity on the mold side, it is not necessary to individually process the conductor circuit pattern for each resin molded body. However, the manufacturing process is simplified, which contributes to a significant reduction in manufacturing cost and manufacturing time.
Further, since the hydrophilic region can be formed only by resin molding, the desired conductor circuit pattern can be formed on the concave surface of the resin molded body and the inner surface (inner surface) of the through hole.

また、樹脂成形体の表面には、親水性領域のほかに同じく凹凸構造からなる撥水性領域を形成すると、導電性下地層を形成する際に使用する金属粒子分散液が親水性領域以外に留まることをより確実に抑制でき、得られる導体回路パターンの位置精度が高くなる。 Further, when a water-repellent region having a concavo-convex structure is formed on the surface of the resin molded body in addition to the hydrophilic region, the metal particle dispersion used for forming the conductive base layer stays in the region other than the hydrophilic region. This can be suppressed more reliably, and the position accuracy of the obtained conductor circuit pattern becomes high.

図1は、本発明の一の実施形態に係る3次元樹脂成形回路部品を示す斜視図である。FIG. 1 is a perspective view showing a three-dimensional resin molded circuit component according to an embodiment of the present invention. 図2は、図1のII-II線に沿う断面図である。FIG. 2 is a cross-sectional view taken along the line II-II of FIG. 図3は、図2のIII-III線に沿う断面拡大図である。FIG. 3 is an enlarged cross-sectional view taken along the line III-III of FIG. 図4は、親水性領域を形成する凹凸構造の一例を示す斜視図である。FIG. 4 is a perspective view showing an example of an uneven structure forming a hydrophilic region. 図5は、金型の一例を模式的に示した図であり、(a)は一方側から見た断面模式図、(b)は(a)と直交する方向から見た断面模式図である。5A and 5B are views schematically showing an example of a mold, FIG. 5A is a schematic cross-sectional view seen from one side, and FIG. 5B is a schematic cross-sectional view seen from a direction orthogonal to (a). .. 図6は、図5の金型で成形された樹脂成形体の断面図である。FIG. 6 is a cross-sectional view of the resin molded body molded by the mold of FIG. 図7は、本発明の他の実施形態に係る3次元樹脂成形回路部品を示す図であり、(a)は上側表面から見た斜視図であり、(b)は裏側表面から見た斜視図であり、(c)は(b)のA矢視図である。7A and 7B are views showing a three-dimensional resin molded circuit component according to another embodiment of the present invention, FIG. 7A is a perspective view seen from the upper surface, and FIG. 7B is a perspective view seen from the back surface. (C) is the A arrow view of (b). 図8は、図7のVIII-VIII線に沿う断面図である。FIG. 8 is a cross-sectional view taken along the line VIII-VIII of FIG. 図9は、撥水性領域を形成する凹凸構造の一例を示す斜視図である。FIG. 9 is a perspective view showing an example of an uneven structure forming a water-repellent region.

以下に図面を用いて本発明の一の実施形態を説明する。
図1は本実施形態に係る3次元樹脂成形回路部品Aを示す斜視図であり、図2は図1のII-II線に沿う断面図であり、図3は図2のIII-III線に沿う断面の一部切り欠き拡大図である。
An embodiment of the present invention will be described below with reference to the drawings.
1 is a perspective view showing a three-dimensional resin molding circuit component A according to the present embodiment, FIG. 2 is a cross-sectional view taken along line II-II of FIG. 1, and FIG. 3 is a cross-sectional view taken along line III-III of FIG. It is a partial notch enlarged view of the cross section along.

図1及び図2において、3次元樹脂成形回路部品Aには、基材である樹脂成形体1の上側表面1aから下側表面1bに向かって貫通するスルーホール2が形成されている。樹脂成形体1の上側表面1a、下側表面1b、側面1c、1dには所望するパターンで導体回路パターン3が形成され、またスルーホール2の内面2aにも導体回路パターン3が形成されている。 In FIGS. 1 and 2, the three-dimensional resin molding circuit component A is formed with a through hole 2 penetrating from the upper surface 1a of the resin molded body 1 as a base material toward the lower surface 1b. The conductor circuit pattern 3 is formed on the upper surface 1a, the lower surface 1b, the side surfaces 1c, and 1d of the resin molded body 1 in a desired pattern, and the conductor circuit pattern 3 is also formed on the inner surface 2a of the through hole 2. ..

図3は、樹脂成形体1の表面とそこに形成された導体回路パターン3との一体的な結合構造を示す断面図であり、導体回路パターン3が形成されている樹脂成形体1の表面(図では上側表面1aの一部表面)には、親水性領域4が形成されている。この親水性領域4は、凸部4aと凹部4bを組み合わせた凹凸構造4Aから構成される。親水性機能を備えた凹凸構造4Aの構成は何ら限定されるものではなく、凸部4aや凹部4bの形状(畝状、多角形、円形等)、凸部4aの凹部4bからの立ち上げ角度、凸部4aの高さ(凹部4bの深さと同じ)、凸部4aの幅、凸部4aと凹部4bのピッチ間隔(凹部4bの溝幅)を適切に設定することにより、水滴の接触角が90度未満となる親水性を発揮する面として形成することができる。 FIG. 3 is a cross-sectional view showing an integral coupling structure between the surface of the resin molded body 1 and the conductor circuit pattern 3 formed therein, and is a cross-sectional view showing the surface of the resin molded body 1 on which the conductor circuit pattern 3 is formed. In the figure, a hydrophilic region 4 is formed on a partial surface of the upper surface 1a). The hydrophilic region 4 is composed of a concave-convex structure 4A in which a convex portion 4a and a concave portion 4b are combined. The configuration of the concave-convex structure 4A having a hydrophilic function is not limited in any way, and the shape of the convex portion 4a and the concave portion 4b (ridge-shaped, polygonal, circular, etc.) and the rising angle of the convex portion 4a from the concave portion 4b. By appropriately setting the height of the convex portion 4a (the same as the depth of the concave portion 4b), the width of the convex portion 4a, and the pitch interval between the convex portion 4a and the concave portion 4b (the groove width of the concave portion 4b), the contact angle of the water droplet is set. It can be formed as a surface exhibiting hydrophilicity having a temperature of less than 90 degrees.

本実施形態の親水性領域4を形成する凹凸構造4Aは、図4に示したように、導体回路パターン3の配線方向(X方向)に沿って断面矩形の畝状に延びる複数の凸部4aが導体回路パターン3の線幅方向(Y方向)に配列され、凹部4bが凸部4aに沿って溝状に延びる構造になっている。例えば、図4の例において、凹部4bの断面方向の幅を20~35μm、凸部4aの断面方向のピッチ(隣接する凸部4aの幅中心間の距離)を40~60μm、凸部4aの高さ(凹部4bの深さ)を30~50μmに設定することにより、樹脂成形体1の表面のうち、この凹凸構造4Aが形成されている表面だけを親水性領域4とすることができる。 As shown in FIG. 4, the concave-convex structure 4A forming the hydrophilic region 4 of the present embodiment has a plurality of convex portions 4a extending in a ridge shape having a rectangular cross section along the wiring direction (X direction) of the conductor circuit pattern 3. Are arranged in the line width direction (Y direction) of the conductor circuit pattern 3, and the concave portions 4b have a structure extending in a groove shape along the convex portion 4a. For example, in the example of FIG. 4, the width of the concave portion 4b in the cross-sectional direction is 20 to 35 μm, the pitch of the convex portion 4a in the cross-sectional direction (distance between the width centers of the adjacent convex portions 4a) is 40 to 60 μm, and the convex portion 4a. By setting the height (depth of the recess 4b) to 30 to 50 μm, only the surface on which the uneven structure 4A is formed can be designated as the hydrophilic region 4 on the surface of the resin molded body 1.

また、凸部4a及び凹部4bの各表面をさらに幅方向に沿って上記よりも各寸法が1/5~1/10程度の細かな凹凸構造とすることにより、親水性をより高めることもできる。このほか、例えば、実用新案登録第3188769号に示されているように、種々の形状、寸法の凸部4aや凹部4bにより親水性領域4を形成することができる。 Further, the hydrophilicity can be further enhanced by forming each surface of the convex portion 4a and the concave portion 4b into a fine uneven structure having each dimension of about 1/5 to 1/10 of the above along the width direction. .. In addition, for example, as shown in Utility Model Registration No. 3188769, the hydrophilic region 4 can be formed by the convex portions 4a and the concave portions 4b having various shapes and dimensions.

このような凹凸構造4Aからなる親水性領域4は、後述する樹脂成形工程において、金型を用いた樹脂成形時に樹脂成形体1を成形すると同時にその表面に形成される。この凹凸構造4Aからなる親水性領域4の表面は、導電性下地層5により被覆されている。 The hydrophilic region 4 composed of such an uneven structure 4A is formed on the surface of the resin molded body 1 at the same time as molding the resin molded body 1 at the time of resin molding using a mold in the resin molding step described later. The surface of the hydrophilic region 4 made of the uneven structure 4A is covered with the conductive base layer 5.

導電性下地層5は、後述する金属めっき積層工程で導電金属の無電解めっきを行うときに触媒核として作用する金属粒子、好ましくはnmオーダーの金属粒子(金属ナノ粒子)が付着して形成された薄い導電性の被覆層になっている。 The conductive base layer 5 is formed by adhering metal particles, preferably nm-order metal particles (metal nanoparticles), which act as catalyst nuclei when electroless plating the conductive metal in the metal plating laminating step described later. It is a thin conductive coating layer.

導電性下地層5に用いられる金属粒子(好ましくは金属ナノ粒子)を構成する金属としては、例えば、銀、金、銅、パラジウム、ニッケルなどをあげることができ、それらの一種又は二種以上を含んでいてもよい。但し、導電性の点から金、銀、銅が好ましく、銅より酸化しにくく、金より安価であることから銀(好ましくは銀ナノ粒子)がより好ましい。 Examples of the metal constituting the metal particles (preferably metal nanoparticles) used in the conductive base layer 5 include silver, gold, copper, palladium, nickel and the like, and one or more of them can be mentioned. It may be included. However, gold, silver, and copper are preferable from the viewpoint of conductivity, silver (preferably silver nanoparticles) is more preferable because it is less likely to oxidize than copper and is cheaper than gold.

この導電性下地層5に金属めっき層6が積層され、導体回路パターン3が形成されている。具体的には導電性下地層5に導電金属の無電解めっき処理を行って当該導電金属をめっき析出させ、凹凸構造4Aの全体を埋設した状態で形成されている。導電金属としては、銅、ニッケル、銀、金などをあげることができるが、導電性、経済性などの点から銅であることが好ましい。なお、金属めっき層6の形成に際しては、上記した無電解めっき処理に続けて、更に通常の電解めっきを施すこともできる。 The metal plating layer 6 is laminated on the conductive base layer 5, and the conductor circuit pattern 3 is formed. Specifically, the conductive base layer 5 is subjected to electroless plating treatment of the conductive metal to be plated and deposited, and the concave-convex structure 4A is formed in a state of being entirely embedded. Examples of the conductive metal include copper, nickel, silver, and gold, but copper is preferable from the viewpoint of conductivity and economy. In addition, when forming the metal plating layer 6, it is also possible to perform ordinary electrolytic plating further after the electroless plating treatment described above.

次に、3次元樹脂成形回路部品Aの製造方法を図面に則して説明する。
(樹脂成形工程)
この工程では、樹脂成形体1を成形すると同時に、その表面に目的とする導体回路パターン3に対応したパターンの凹凸構造4A(親水性領域4)を形成する。この凹凸構造4Aのパターンは金型を用いた樹脂成形(例えば射出成形)によって成形した樹脂成形体1の表面に一体に形成される。
Next, a manufacturing method of the three-dimensional resin molding circuit component A will be described with reference to the drawings.
(Resin molding process)
In this step, at the same time as molding the resin molded body 1, the uneven structure 4A (hydrophilic region 4) of the pattern corresponding to the target conductor circuit pattern 3 is formed on the surface thereof. The pattern of the uneven structure 4A is integrally formed on the surface of the resin molded body 1 molded by resin molding (for example, injection molding) using a mold.

まず、図5(a),(b)で示した金型7を用意する。この金型7は、上型7Aと下型7Bとが組み合わさることにより所定形状の樹脂成形体1を形成するが、この例では、樹脂成形体1のスルーホール2を形成するための突出部7aが上型7Aに、下型7B方向に突出するように形成されている。 First, the mold 7 shown in FIGS. 5 (a) and 5 (b) is prepared. The mold 7 forms a resin molded body 1 having a predetermined shape by combining the upper mold 7A and the lower mold 7B. In this example, the protruding portion for forming the through hole 2 of the resin molded body 1. The 7a is formed so as to protrude from the upper mold 7A in the direction of the lower mold 7B.

上型7Aと下型7Bの型面(両者の対向する内面)のうち、樹脂成形体1の表面に形成される親水性領域4となる凹凸構造4Aに対応する部位には、当該凹凸構造4Aと同じパターンで、当該凹凸構造4Aを反転させた断面形状の凹凸構造からなる親水性領域転写部71が形成されている。このため、樹脂成形体1の表面には、成形時に、親水性領域転写部71が転写され、凹凸構造4Aが形成される。樹脂成形体1の凹凸構造4Aを親水性領域4として機能させるため、親水性領域転写部71は、図4に示した凹凸構造4の凸部4a、凹部4bと全く同様の条件の凸部71aと凹部71bを備えている。なお、親水性領域転写部71として、図4に示したものと同様の微細な凸部71aと凹部71bとを有する凹凸構造を、金型7の型面(内面)に形成するに当たっては、レーザー加工、切削加工、研削加工、半導体プロセス加工などを用いた超微細加工方法によって形成することができる。 Of the mold surfaces of the upper mold 7A and the lower mold 7B (the inner surfaces facing each other), the portion corresponding to the uneven structure 4A which is the hydrophilic region 4 formed on the surface of the resin molded body 1 is the uneven structure 4A. In the same pattern as above, the hydrophilic region transfer portion 71 having a concavo-convex structure having a cross-sectional shape obtained by reversing the concavo-convex structure 4A is formed. Therefore, the hydrophilic region transfer portion 71 is transferred to the surface of the resin molded body 1 at the time of molding, and the uneven structure 4A is formed. In order to make the concave-convex structure 4A of the resin molded body function as the hydrophilic region 4, the hydrophilic region transfer portion 71 has the convex portion 71a under exactly the same conditions as the convex portion 4a and the concave portion 4b of the concave-convex structure 4 shown in FIG. And a recess 71b. When forming a concavo-convex structure having a fine convex portion 71a and a concave portion 71b similar to that shown in FIG. 4 as the hydrophilic region transfer portion 71 on the mold surface (inner surface) of the mold 7, a laser is used. It can be formed by an ultrafine processing method using processing, cutting, grinding, semiconductor process processing, or the like.

次に、この金型7を用いて樹脂材料を射出する。これにより、突出部7aに対応する位置にスルーホール2を備えた樹脂成形体1が形成される。このとき、樹脂成形体1の成形と同時に、上型7Aと下型7Bの型面に形成されている親水性領域転写部71が転写されるため、当該親水性領域転写部71の凸部71aに対応する位置の樹脂成形体1の表面に凹部4bが形成され、当該親水性領域転写部71の凹部71bに対応する位置の樹脂成形体1の表面に凸部4aが形成される。親水性領域転写部71の凸部71a及び凹部71bの形状、寸法等は、図4に示したとおりであるため、それと同様の形状、寸法等の凹部4b及び凸部4aを備えた微細な凹凸構造4が樹脂成形体1の表面に形成される。このようにして、表面に、目的とする導体回路パターン3に対応するパターンの凹凸構造4Aからなる親水性領域4が形成された樹脂成形体1が製造される(図6参照)。 Next, the resin material is injected using the mold 7. As a result, the resin molded body 1 having the through hole 2 is formed at the position corresponding to the protruding portion 7a. At this time, at the same time as the molding of the resin molded body 1, the hydrophilic region transfer portion 71 formed on the mold surfaces of the upper mold 7A and the lower mold 7B is transferred, so that the convex portion 71a of the hydrophilic region transfer portion 71 is transferred. A concave portion 4b is formed on the surface of the resin molded body 1 at a position corresponding to the above, and a convex portion 4a is formed on the surface of the resin molded body 1 at a position corresponding to the concave portion 71b of the hydrophilic region transfer portion 71. Since the shapes, dimensions, etc. of the convex portion 71a and the concave portion 71b of the hydrophilic region transfer portion 71 are as shown in FIG. 4, fine unevenness having the concave portion 4b and the convex portion 4a having the same shape, dimensions, etc. The structure 4 is formed on the surface of the resin molded body 1. In this way, the resin molded body 1 in which the hydrophilic region 4 composed of the uneven structure 4A of the pattern corresponding to the target conductor circuit pattern 3 is formed on the surface is manufactured (see FIG. 6).

本実施形態では、樹脂成形工程で樹脂成形と同時に形成した親水性領域4に後述するように導電性下地層5及び金属めっき層6を形成し、樹脂成形体1の一つ一つにレーザー加工等を行う必要がないため、ここで用いる樹脂は、レーザー加工等に対応した特殊な樹脂である必要はなく、金型成形が可能な樹脂であれば格別限定されるものではない。例えば、PPS、PBT、PA、POM、PP、ABSのような汎用樹脂を用いることができる。 In the present embodiment, the conductive base layer 5 and the metal plating layer 6 are formed in the hydrophilic region 4 formed at the same time as the resin molding in the resin molding step as described later, and laser processing is performed on each of the resin molded bodies 1. Since it is not necessary to perform such as, the resin used here does not need to be a special resin corresponding to laser processing or the like, and is not particularly limited as long as it is a resin capable of mold molding. For example, general-purpose resins such as PPS, PBT, PA, POM, PP, and ABS can be used.

(導電性下地層形成工程)
この工程では、樹脂成形工程で製造された樹脂成形体1の親水性領域4の表面に導電性下地層5を形成する。
そのために、図6で示した樹脂成形体1の表面に転写されてなる凹凸構造4Aからなる親水性領域4に、次工程で導電金属の無電解めっき処理を行ったときに当該導電金属を析出させるための触媒核として作用するnmオーダーの金属粒子を含有する金属粒子分散液を接触させる。
(Conductive base layer forming process)
In this step, the conductive base layer 5 is formed on the surface of the hydrophilic region 4 of the resin molded body 1 manufactured in the resin molding step.
Therefore, the conductive metal is deposited on the hydrophilic region 4 made of the uneven structure 4A transferred to the surface of the resin molded body 1 shown in FIG. 6 when the electroless plating treatment of the conductive metal is performed in the next step. A metal particle dispersion containing nm-order metal particles acting as a catalyst nucleus for causing the plating is brought into contact with the metal particles.

両者を接触させる処理としては、金属粒子分散液の中に樹脂成形体1を浸漬する処理、又は、金属粒子分散液を例えばインクジェットプリンターやピペットなどを用いて塗布する処理などが好適である。とくに浸漬する処理は 特別の器具を用いることも必要としないという点で好適である。 As the treatment for bringing the two into contact with each other, a treatment of immersing the resin molded body 1 in the metal particle dispersion liquid or a treatment of applying the metal particle dispersion liquid using, for example, an inkjet printer or a pipette is preferable. In particular, the dipping process is suitable in that it does not require the use of special equipment.

凹凸構造4Aが親水性領域4になっているため、上記した処理を施すことにより、金属粒子分散液は親和性の高い当該凹凸構造4A(親水性領域4)を濡らし、当該凹凸構造4A(親水性領域4)の表面を被覆する一方で、樹脂成形体1の表面のうち、親水性領域4以外の部位には、親和性が低く付着しにくい。凹凸構造4Aからなる親水性領域4が、上記のように導体回路パターン3に対応したパターンで形成されるため、このように、例えば浸漬処理するだけで、金属粒子分散液が導体回路パターン3に従ったパターンで樹脂成形体1の表面に付着することになる。 Since the uneven structure 4A is a hydrophilic region 4, by performing the above treatment, the metal particle dispersion wets the uneven structure 4A (hydrophilic region 4) having a high affinity, and the uneven structure 4A (hydrophilic). While covering the surface of the sex region 4), it has a low affinity and is difficult to adhere to a portion of the surface of the resin molded body 1 other than the hydrophilic region 4. Since the hydrophilic region 4 composed of the concavo-convex structure 4A is formed in the pattern corresponding to the conductor circuit pattern 3 as described above, the metal particle dispersion liquid becomes the conductor circuit pattern 3 in this way, for example, simply by dipping. It will adhere to the surface of the resin molded body 1 in the following pattern.

次に、樹脂成形体1に対して、温風やオーブンなどを用いて乾燥し、さらに、好ましくは、100~300℃で温度で、10~120分間焼成し、金属粒子分散液の分散媒を蒸発除去することが好ましい。このような処理を施すことにより、凹凸構造4A(親水性領域4)の表面に金属粒子(金属ナノ粒子)が当該表面を100nm~20μm程度の厚みで薄膜状に被覆して残り、触媒核として有効に作用する導電性下地層5となる。 Next, the resin molded product 1 is dried using warm air, an oven, or the like, and further preferably fired at a temperature of 100 to 300 ° C. for 10 to 120 minutes to prepare a dispersion medium for the metal particle dispersion. It is preferable to remove by evaporation. By performing such a treatment, metal particles (metal nanoparticles) remain on the surface of the concave-convex structure 4A (hydrophilic region 4) as a thin film with a thickness of about 100 nm to 20 μm, and serve as a catalyst nucleus. It becomes a conductive base layer 5 that works effectively.

なお、金属粒子分散液としては、粒径1~500nm、好ましくは10~100nmの金属粒子が、水などの分散媒に質量比で5%~60%、より好ましくは10%~30%濃度で分散してなるものが用いられる。 As the metal particle dispersion liquid, metal particles having a particle size of 1 to 500 nm, preferably 10 to 100 nm are contained in a dispersion medium such as water at a mass ratio of 5% to 60%, more preferably 10% to 30%. Distributed ones are used.

また金属粒子としては、上記のように銀ナノ粒子、金ナノ粒子などをあげることができる。これらのうち、触媒核としての機能や入手が比較的容易であるという点からして、銀ナノ粒子が好適である。銀ナノ粒子を含有する金属粒子分散液としては、例えば銀ナノ粒子インクをあげることができる。 Further, examples of the metal particles include silver nanoparticles, gold nanoparticles and the like as described above. Of these, silver nanoparticles are preferable because they function as catalyst nuclei and are relatively easy to obtain. Examples of the metal particle dispersion liquid containing silver nanoparticles include silver nanoparticles ink.

(金属めっき積層工程)
この工程では、凹凸構造4Aからなる親水性領域4を被覆する上記した導電性下地層5に導電金属の無電解めっきを行って、当該導電性下地層5の上に導電金属のめっき層を形成する。すなわち、導電性下地層5を有する樹脂成形体1を、そのまま、導電金属の無電解めっき液に浸漬する。導電性下地層5を構成する金属粒子が触媒核として作用するので、その上に、当該導電金属が析出する。その後、必要に応じて、電解めっきを行い金属めっき層6を形成する(図3参照)。この際、導電性下地層5は、予め導体回路パターン3に対応するように形成された凹凸構造4A(親水性領域4)上に形成されており、導電性下地層5上に積層される金属めっき層6もそのパターンで形成されることになる。ここに、樹脂成形体1の表面に、導電性下地層5と金属めっき層6が積層されてなる所定の導体回路パターン3が形成された3次元樹脂成形回路部品Aが得られる(図1参照)。
(Metal plating laminating process)
In this step, electroless plating of the conductive metal is performed on the above-mentioned conductive base layer 5 covering the hydrophilic region 4 composed of the uneven structure 4A, and a conductive metal plating layer is formed on the conductive base layer 5. do. That is, the resin molded body 1 having the conductive base layer 5 is immersed in the electroless plating solution of the conductive metal as it is. Since the metal particles constituting the conductive base layer 5 act as catalyst nuclei, the conductive metal is deposited on the metal particles. Then, if necessary, electrolytic plating is performed to form the metal plating layer 6 (see FIG. 3). At this time, the conductive base layer 5 is formed on the uneven structure 4A (hydrophilic region 4) previously formed so as to correspond to the conductor circuit pattern 3, and the metal laminated on the conductive base layer 5. The plating layer 6 will also be formed in that pattern. Here, a three-dimensional resin molded circuit component A in which a predetermined conductor circuit pattern 3 formed by laminating a conductive base layer 5 and a metal plating layer 6 on the surface of the resin molded body 1 is obtained (see FIG. 1). ).

金属めっき積層工程で用いる導電金属としては、例えば銅、ニッケル、銀、金などをあげることができ、導電性等に優れていることからして銅を用いることが好ましいことは上記のとおりである。 Examples of the conductive metal used in the metal plating laminating step include copper, nickel, silver, and gold, and it is preferable to use copper because of its excellent conductivity and the like as described above. ..

なお、金属めっき積層工程後に、形成された導体回路パターン3に対して例えば温度100~300℃、圧力50Pa程度かそれ以上の熱圧着処理を施すと、凹凸構造4A、導電性下地層5、金属めっき層6間の相互密着力が高まるので好適である。 When the formed conductor circuit pattern 3 is subjected to thermocompression bonding at a temperature of 100 to 300 ° C. and a pressure of about 50 Pa or more after the metal plating laminating step, the concave-convex structure 4A, the conductive base layer 5, and the metal are applied. It is suitable because the mutual adhesion between the plating layers 6 is increased.

次に、本発明の他の実施形態を図7~図9に基づき説明する。上記実施形態の3次元樹脂成形回路部品Aは、樹脂成形体1の表面に、導体回路パターン3に対応したパターンで形成された親水性領域4を形成しただけであったが、本実施形態の3次元樹脂成形回路部品Bでは、親水性領域4を除いた表面における少なくとも一部に凹凸構造40Aからなる撥水性領域40を形成した構造である(図8及び図9参照)。撥水性領域40は、特に、親水性領域4との境界部10付近に形成されていることが好ましい。上記のように、親水性領域4は樹脂成形体1の成形時に形成され、その後、金属粒子分散液に浸漬や塗布するだけで親水性領域4に導電性下地層5が付着されるが、少なくとも親水性領域4の隣接部(境界部10)付近を撥水性領域40とすることにより、金属粒子分散液が撥水性領域40には付着せず、親水性領域4にだけ選択的に形成され、その後に形成される金属めっき層6の線幅のばらつきが小さくなり、導体回路パターン3の位置精度が高くなる。 Next, another embodiment of the present invention will be described with reference to FIGS. 7 to 9. In the three-dimensional resin molding circuit component A of the above embodiment, only the hydrophilic region 4 formed by the pattern corresponding to the conductor circuit pattern 3 is formed on the surface of the resin molding body 1, but the present embodiment has only been formed. The three-dimensional resin molding circuit component B has a structure in which a water-repellent region 40 composed of an uneven structure 40A is formed on at least a part of the surface excluding the hydrophilic region 4 (see FIGS. 8 and 9). The water-repellent region 40 is particularly preferably formed in the vicinity of the boundary portion 10 with the hydrophilic region 4. As described above, the hydrophilic region 4 is formed at the time of molding the resin molded body 1, and then the conductive base layer 5 is attached to the hydrophilic region 4 only by immersing or applying it in a metal particle dispersion liquid, but at least. By setting the vicinity of the adjacent portion (boundary portion 10) of the hydrophilic region 4 as the water-repellent region 40, the metal particle dispersion does not adhere to the water-repellent region 40 and is selectively formed only in the hydrophilic region 4. The variation in the line width of the metal plating layer 6 formed thereafter becomes small, and the positional accuracy of the conductor circuit pattern 3 becomes high.

したがって、導電性下地層形成工程及び金属めっき積層工程の前の段階で成形されためっき用中間部品である樹脂成形体1としては、本実施形態のように、導体回路パターン3に対応するパターンで形成された凹凸構造4Aからなる親水性領域4と、親水性領域4を除いた表面の少なくとも一部、好ましくは少なくとも親水性領域4の隣接部(境界部10)付近に形成された凹凸構造40Aからなる撥水性領域40とを備えている構成であることが望ましい。 Therefore, the resin molded body 1 which is an intermediate component for plating molded in the stage before the conductive base layer forming step and the metal plating laminating step has a pattern corresponding to the conductor circuit pattern 3 as in the present embodiment. The concavo-convex structure 40A formed in the vicinity of the hydrophilic region 4 composed of the formed concavo-convex structure 4A and at least a part of the surface excluding the hydrophilic region 4, preferably at least in the vicinity of the adjacent portion (boundary portion 10) of the hydrophilic region 4. It is desirable that the configuration includes a water-repellent region 40 made of.

撥水性領域40は、親水性領域4と同様に、型7の型面(内面)における親水性領域転写部71以外の少なくとも一部、好ましくは、少なくとも親水性領域転写部71の隣接部(例えば、図5において符号75で示した部位)に撥水性領域転写部(図示せず)を形成することで、樹脂成形体1を成形すると同時に、その表面に目的とする導体回路パターン3に対応したパターンの親水性領域4と共に、凹凸構造40Aからなる撥水性領域40を形成することができる。 Similar to the hydrophilic region 4, the water-repellent region 40 is at least a part of the mold surface (inner surface) of the mold 7 other than the hydrophilic region transfer portion 71, preferably at least an adjacent portion (for example, at least an adjacent portion of the hydrophilic region transfer portion 71). By forming a water-repellent region transfer portion (not shown) at the portion indicated by reference numeral 75 in FIG. 5, the resin molded body 1 is molded, and at the same time, the surface thereof corresponds to the target conductor circuit pattern 3. Along with the hydrophilic region 4 of the pattern, a water-repellent region 40 having an uneven structure 40A can be formed.

例えば、本実施形態の撥水性領域40は、図9に示したような凹凸構造40Aから形成される。凹凸構造40Aの形状、寸法等を適切に設定することにより、水滴との接触角が90度以上となる撥水性を発揮させることができる。例えば、図9では、凹凸構造40Aを、凸部40aと凹部40bがX方向とY方向に互いに格子模様で配列された構造とし、凹部40bの断面方向の幅を10μm以下、凸部40aの断面方向のピッチ(隣接する凸部40aの幅中心間の距離)を20μm以下、凸部40aの高さ(凹部40bの深さ)を20~50μmに設定して撥水性を付与している。また、凹部40bの断面形状は略矩形又は略V字形とすることが好ましい。撥水性をより高める場合、凸部40aの表面にこれらの1/5~1/10程度の寸法のより微細な凹凸構造を形成することで達成することができる。このほか、例えば、実用新案登録第3188770号に示されているように、種々の形状、寸法の凸部40aや凹部40bにより撥水性領域40を形成することができる。 For example, the water-repellent region 40 of the present embodiment is formed from the uneven structure 40A as shown in FIG. By appropriately setting the shape, dimensions, etc. of the uneven structure 40A, it is possible to exhibit water repellency in which the contact angle with water droplets is 90 degrees or more. For example, in FIG. 9, the concave-convex structure 40A has a structure in which the convex portions 40a and the concave portions 40b are arranged in a grid pattern in the X direction and the Y direction, the width of the concave portions 40b in the cross-sectional direction is 10 μm or less, and the cross section of the convex portions 40a. Water repellency is imparted by setting the pitch in the direction (distance between the width centers of the adjacent convex portions 40a) to 20 μm or less and the height of the convex portions 40a (depth of the concave portions 40b) to 20 to 50 μm. Further, the cross-sectional shape of the recess 40b is preferably a substantially rectangular shape or a substantially V-shape. The improvement of water repellency can be achieved by forming a finer uneven structure having a size of about 1/5 to 1/10 of these on the surface of the convex portion 40a. In addition, for example, as shown in Utility Model Registration No. 3188770, the water-repellent region 40 can be formed by the convex portions 40a and the concave portions 40b having various shapes and dimensions.

なお、このような撥水性領域40を形成するために型7に形成される上記の撥水性転写部は、図9に示した凹凸構造40Aを反転させた微細な凹凸構造から形成されることは、上記実施形態で説明した親水性領域4の凹凸構造4Aと親水性領域転写部71の凹凸構造との関係と同様である。 The water-repellent transfer portion formed on the mold 7 in order to form such a water-repellent region 40 may be formed from a fine uneven structure obtained by reversing the concave-convex structure 40A shown in FIG. The same is true for the relationship between the uneven structure 4A of the hydrophilic region 4 and the uneven structure of the hydrophilic region transfer portion 71 described in the above embodiment.

また、本実施形態の3次元樹脂成形回路部品Bは、図7(a),(b)に示したように、断面凹状に形成され、導体回路パターン3を、樹脂成形体1の上側表面1aからスルーホール2を介して裏側表面1eに至るまで形成している。また、裏側表面1eの角部には、図7(c)に示したように窪み部1fが形成されており、その内表面にも導体回路パターン3が形成されている。本実施形態においても、樹脂成形時に親水性領域4を一体形成する構成であるため、スルーホール2やこのような窪み部1f等、従来、導体回路の形成が困難であった部位にも容易に導体回路パターン3を形成することができる。なお、図7においては、上側表面1aに形成した導体回路パターン3をアンテナ回路3aとし、裏側表面1eに沿った導体回路パターン3に、LED、ダイオード、抵抗等の電子回路部品3bを実装した例を示している。 Further, the three-dimensional resin molded circuit component B of the present embodiment is formed with a concave cross section as shown in FIGS. 7A and 7B, and the conductor circuit pattern 3 is formed on the upper surface 1a of the resin molded body 1. It is formed from the to the back side surface 1e through the through hole 2. Further, as shown in FIG. 7C, a recessed portion 1f is formed at the corner portion of the back surface 1e, and a conductor circuit pattern 3 is also formed on the inner surface thereof. Also in this embodiment, since the hydrophilic region 4 is integrally formed at the time of resin molding, it is easy to form a conductor circuit in a portion such as a through hole 2 or such a recessed portion 1f, which has been difficult to form in the past. The conductor circuit pattern 3 can be formed. In FIG. 7, the conductor circuit pattern 3 formed on the upper surface 1a is used as the antenna circuit 3a, and the electronic circuit components 3b such as LEDs, diodes, and resistors are mounted on the conductor circuit pattern 3 along the back surface 1e. Is shown.

上記各実施形態によれば、樹脂成形時に、めっき中間体としての樹脂成形体1の表面に、凹凸構造4Aからなる親水性領域4を、導体回路パターン3に対応したパターンで一体的に形成している。そのため、金属めっき層6を積層するために必要な導電性下地層5を、所定の金属粒子分散液に樹脂成形体1を接触するだけで導体回路パターン3と同じパターンで形成することができる。したがって、従来のように所定パターンの導体回路を得るための加工工程の中で、レーザー等により樹脂成形体の表面を一つずつ加工したりする必要がなく、複数個同時の加工や連続的加工が可能であり、大量生産に適し、製造工程の簡略化、製造コストの低減に寄与できる。しかも、深い凹部やスルーホール等、様々な部位への回路形成が可能となり、応用範囲の広い3次元樹脂成形回路部品を提供することができる。 According to each of the above embodiments, at the time of resin molding, a hydrophilic region 4 composed of an uneven structure 4A is integrally formed on the surface of the resin molded body 1 as a plating intermediate with a pattern corresponding to the conductor circuit pattern 3. ing. Therefore, the conductive base layer 5 required for laminating the metal plating layer 6 can be formed in the same pattern as the conductor circuit pattern 3 only by contacting the resin molded body 1 with the predetermined metal particle dispersion liquid. Therefore, it is not necessary to process the surface of the resin molded body one by one with a laser or the like in the processing process for obtaining a conductor circuit having a predetermined pattern as in the conventional case, and multiple simultaneous processing or continuous processing is not required. It is suitable for mass production and can contribute to simplification of manufacturing process and reduction of manufacturing cost. Moreover, it is possible to form circuits in various parts such as deep recesses and through holes, and it is possible to provide three-dimensional resin molded circuit parts having a wide range of applications.

A,B 3次元樹脂成形回路部品
1 樹脂成形体
1a 樹脂成形体1の上側表面
1b 樹脂成形体1の下側表面
1c,1d 樹脂成形体1の側面
1f 窪み部
2 スルーホール
2a スルーホール2の内面
3 導体回路パターン
4 親水性領域
4A 凹凸構造(親水性領域)
4a 凸部
4b 凹部
40 撥水性領域
40A 凹凸構造(撥水性領域)
40a 凸部
40b 凹部
5 導電性下地層(金属粒子の被覆層)
6 金属めっき層
7 金型
7A 金型7の上型
7a 突出部
7B 金型7の下型
71 親水性領域転写部
71a 凸部
71b 凹部
A, B 3D resin molding circuit parts 1 Resin molded body 1a Upper surface of resin molded body 1b Lower surface of resin molded body 1c, 1d Side surface 1f of resin molded body 1f Recessed part 2 Through hole 2a Through hole 2 Inner surface 3 Conductor circuit pattern 4 Hydrophilic region 4A Concavo-convex structure (hydrophilic region)
4a Convex part 4b Concave part 40 Water repellent area 40A Concavo-convex structure (water repellent area)
40a Convex part 40b Concave part 5 Conductive base layer (coating layer of metal particles)
6 Metal plating layer 7 Mold 7A Upper mold 7a Protruding part 7B Lower mold 7 of mold 7 Hydrophilic region Transfer part 71a Convex part 71b Concave part

Claims (5)

樹脂成形体の表面に導体回路パターンが形成されている3次元樹脂成形回路部品の製造方法であって、A method for manufacturing a three-dimensional resin molded circuit component in which a conductor circuit pattern is formed on the surface of a resin molded body.
凸部と凹部を組み合わせてなる凹凸構造によって親水性を発揮する親水性領域を前記樹脂成形体の表面に形成する工程であって、前記親水性領域となる前記凹凸構造を反転させた断面形状の凹凸構造からなる親水性領域転写部が、前記導体回路パターンに対応するパターンで型面に形成されてなる金型を用いて樹脂成形を行い、前記親水性領域転写部を転写させて前記親水性領域を表面に有する前記樹脂成形体を得る工程と、It is a step of forming a hydrophilic region exhibiting hydrophilicity on the surface of the resin molded product by a concavo-convex structure formed by combining convex portions and concave portions, and has a cross-sectional shape obtained by reversing the concavo-convex structure that is the hydrophilic region. The hydrophilic region transfer portion having an uneven structure is resin-molded using a mold formed on the mold surface with a pattern corresponding to the conductor circuit pattern, and the hydrophilic region transfer portion is transferred to the hydrophilic region. The step of obtaining the resin molded product having a region on the surface and
得られた前記樹脂成形体の前記親水性領域に、無電解めっき時に触媒核として作用する金属粒子を含む金属粒子分散液を接触させ、前記親水性領域に前記金属粒子を含む導電性下地層を形成する工程と、A metal particle dispersion liquid containing metal particles acting as a catalyst nucleus during electroless plating is brought into contact with the hydrophilic region of the obtained resin molded body, and a conductive underlayer containing the metal particles is formed in the hydrophilic region. The process of forming and
前記導電性下地層に導電金属の無電解めっき処理を施して、前記導電性下地層に前記導電金属からなる金属めっき層を積層する工程とA step of subjecting the conductive base layer to electroless plating of a conductive metal and laminating a metal plating layer made of the conductive metal on the conductive base layer.
を含み、Including
前記親水性領域上に、前記導電性下地層と前記金属めっき層とからなる導体回路パターンを形成することを特徴とする3次元樹脂成形回路部品の製造方法。A method for manufacturing a three-dimensional resin molded circuit component, characterized in that a conductor circuit pattern including the conductive base layer and the metal plating layer is formed on the hydrophilic region.
凸部と凹部を組み合わせてなる凹凸構造によって撥水性を発揮する撥水性領域を前記樹脂成形体の表面に形成するため、前記金型として、前記親水性領域転写部を除いた型面の少なくとも一部に、前記撥水性領域となる前記凹凸構造を反転させた断面形状の凹凸構造からなる撥水性領域転写部が形成されているものを用い、前記親水性領域を除いた前記樹脂成形体の表面の少なくとも一部を前記撥水性領域とする請求項1記載の3次元樹脂成形回路部品の製造方法。In order to form a water-repellent region exhibiting water repellency on the surface of the resin molded product by a concave-convex structure formed by combining convex portions and concave portions, at least one of the mold surfaces excluding the hydrophilic region transfer portion is used as the mold. A water-repellent region transfer portion having a cross-sectional shape concavo-convex structure obtained by reversing the concavo-convex structure, which is the water-repellent region, is formed in the portion, and the surface of the resin molded body excluding the hydrophilic region is used. The method for manufacturing a three-dimensional resin molded circuit component according to claim 1, wherein at least a part of the above is a water-repellent region. 前記金属粒子分散液を接触させる処理が、前記樹脂成形体を前記金属粒子分散液へ浸漬する処理、又は前記導電性分散液を前記親水性領域へ塗布する処理である請求項1又は2記載の3次元樹脂成形回路部品の製造方法。The treatment according to claim 1 or 2, wherein the treatment of bringing the metal particle dispersion into contact is a treatment of immersing the resin molded product in the metal particle dispersion or a treatment of applying the conductive dispersion to the hydrophilic region. A method for manufacturing 3D resin molded circuit parts. 前記浸漬処理後又は前記塗布処理後に、更に乾燥処理又は焼成処理を行う請求項3記載の3次元樹脂成形回路部品の製造方法。The method for manufacturing a three-dimensional resin molded circuit component according to claim 3, wherein a drying treatment or a firing treatment is further performed after the dipping treatment or the coating treatment. 前記金属粒子が金属ナノ粒子である請求項1~4のいずれか1に記載の3次元樹脂成形回路部品の製造方法。The method for manufacturing a three-dimensional resin molded circuit component according to any one of claims 1 to 4, wherein the metal particles are metal nanoparticles.
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