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JP7103340B2 - Ceramic heater - Google Patents
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JP7103340B2 - Ceramic heater - Google Patents

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JP7103340B2
JP7103340B2 JP2019504876A JP2019504876A JP7103340B2 JP 7103340 B2 JP7103340 B2 JP 7103340B2 JP 2019504876 A JP2019504876 A JP 2019504876A JP 2019504876 A JP2019504876 A JP 2019504876A JP 7103340 B2 JP7103340 B2 JP 7103340B2
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insulator
feeder
mounting table
ceramic heater
substrate mounting
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JPWO2019012959A1 (en
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悦弘 西本
成伸 先田
晃 三雲
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Sumitomo Electric Industries Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/02Details
    • H05B3/06Heater elements structurally combined with coupling elements or holders
    • H05B3/08Heater elements structurally combined with coupling elements or holders having electric connections specially adapted for high temperatures
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B1/00Details of electric heating devices
    • H05B1/02Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
    • H05B1/0227Applications
    • H05B1/023Industrial applications
    • H05B1/0233Industrial applications for semiconductors manufacturing
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/10Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/10Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
    • H05B3/18Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor the conductor being embedded in an insulating material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/20Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater
    • H05B3/22Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible
    • H05B3/28Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
    • H05B3/283Heating elements having extended surface area substantially in a two-dimensional [2D] plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00Ohmic-resistance heating
    • H05B3/68Heating arrangements specially adapted for cooking plates or analogous hot-plates
    • H05B3/74Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0432Apparatus for thermal treatment mainly by conduction
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002Heaters using a particular layout for the resistive material or resistive elements

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Resistance Heating (AREA)

Description

本開示は、セラミックスヒータに関する。本出願は、2017年7月13日出願の日本出願2017-136821号に基づく優先権を主張し、前記日本出願に記載された全ての記載内容を援用するものである。 The present disclosure relates to ceramic heaters. This application claims priority based on Japanese application 2017-136821 filed on July 13, 2017, and incorporates all the contents described in the Japanese application.

LSIなどの半導体デバイスを製造する半導体製造装置では、被処理物である半導体基板(半導体ウエハ)に対してCVDやスパッタリングに代表される成膜処理やエッチング処理など、様々な薄膜処理が施される。これらの薄膜処理は、半導体基板を所定の温度に加熱した状態で処理を行うのが一般的であるため、当該処理が行われる真空チャンバー内には、載置面に載置された半導体基板をその下面から加熱するサセプタとも称するセラミックス製のヒータが搭載されている。 In semiconductor manufacturing equipment that manufactures semiconductor devices such as LSI, various thin film treatments such as film formation treatment and etching treatment typified by CVD and sputtering are applied to the semiconductor substrate (semiconductor wafer) to be processed. .. Since these thin film treatments are generally performed in a state where the semiconductor substrate is heated to a predetermined temperature, the semiconductor substrate mounted on the mounting surface is placed in the vacuum chamber in which the treatment is performed. A ceramic heater, also called a susceptor, that heats from the lower surface is mounted.

上記のセラミックスヒータは、例えば特許文献1に示されるように、上面に平坦な基板載置面を備えたセラミックス製の円板状部材からなる基板載置台と、これを下面側から支持する円筒状の支持部材とから構成されている。基板載置台の内部にはパターニング加工された金属薄膜からなる抵抗発熱体や電熱コイル等の発熱回路が基板載置面に平行な面内に埋設されている。発熱回路の両端部には基板載置台の下面側から挿入した電極端子が電気的に接続している。この電極端子及びそれに接続される給電線を介して外部電源から該発熱回路に給電が行われる。 As shown in Patent Document 1, for example, the above-mentioned ceramic heater has a substrate mounting table made of a ceramic disk-shaped member having a flat substrate mounting surface on the upper surface, and a cylindrical shape that supports the substrate mounting table from the lower surface side. It is composed of a support member of. Inside the substrate mounting table, heating circuits such as a resistance heating element and an electric heating coil made of a patterned metal thin film are embedded in a plane parallel to the substrate mounting surface. Electrode terminals inserted from the lower surface side of the board mount are electrically connected to both ends of the heat generating circuit. Power is supplied to the heat generating circuit from an external power source via the electrode terminal and the power supply line connected to the electrode terminal.

かかる構造のセラミックスヒータでは、製品となる半導体デバイスの品質にばらつきが生じないように、基板載置面での均熱性を高めて半導体基板を全面に亘って均一に加熱することが求められている。そのため、該発熱回路の回路パターンを緻密にして温度ムラが生じないようにしたり、基板載置面を複数のゾーンに区分してそれらの各々に配した発熱回路に個別に給電することでゾーンごとにきめ細かく温度制御したりすることが行われている。 In a ceramic heater having such a structure, it is required to improve the heat equalizing property on the substrate mounting surface and uniformly heat the semiconductor substrate over the entire surface so that the quality of the semiconductor device to be a product does not vary. .. Therefore, the circuit pattern of the heat generating circuit is made precise so that temperature unevenness does not occur, or the substrate mounting surface is divided into a plurality of zones and the heat generating circuits arranged in each of them are individually fed to each zone. The temperature is finely controlled.

特開2003-17224号公報Japanese Unexamined Patent Publication No. 2003-17224

本開示のセラミックスヒータは、上面に基板載置面を有する円板形状のセラミックスからなる基板載置台と、基板載置面側から見て、基板載置台の複数のゾーンにそれぞれ埋設された複数の発熱回路と、複数の発熱回路の端部にそれぞれ接続された複数の電極端子と、複数の電極端子にそれぞれ接続された複数の給電部と、基板載置台の下面中央部に接続された筒状支持体と、筒状支持体の内側に基板載置台と対向するように配置された円板状の絶縁体と、を備える。複数の給電部は、複数の電極端子から絶縁体に向かって延在するように筒状支持体の内側に配置され、かつ、絶縁体に沿って絶縁体の中心部に集められ絶縁体の基板載置台と対向する面とは反対側の面から延出している。 The ceramic heater of the present disclosure includes a substrate mounting table made of disk-shaped ceramics having a substrate mounting surface on the upper surface, and a plurality of substrates embedded in a plurality of zones of the substrate mounting table when viewed from the substrate mounting surface side. A heating circuit, a plurality of electrode terminals connected to the ends of a plurality of heating circuits, a plurality of feeding parts connected to the plurality of electrode terminals, and a tubular shape connected to the center of the lower surface of the board mounting table. It includes a support and a disk-shaped insulator arranged inside the tubular support so as to face the substrate mounting table. The plurality of feeding parts are arranged inside the cylindrical support so as to extend from the plurality of electrode terminals toward the insulator, and are collected at the center of the insulator along the insulator to form an insulator substrate. It extends from the surface opposite to the surface facing the mounting table.

図1は、本開示に係るセラミックスヒータの実施形態の縦断面図である。FIG. 1 is a vertical cross-sectional view of an embodiment of the ceramic heater according to the present disclosure. 図2は、図1のセラミックスヒータが有する複数の発熱回路の回路パターンを示す平面図である。FIG. 2 is a plan view showing a circuit pattern of a plurality of heat generating circuits included in the ceramic heater of FIG. 図3Aは、図1のセラミックスヒータが有する多電極集約構造部の部分縦断面図である。FIG. 3A is a partial vertical cross-sectional view of the multi-electrode integrated structure portion of the ceramic heater of FIG. 図3Bは、図1のセラミックスヒータが有する多電極集約構造部の底面図である。FIG. 3B is a bottom view of the multi-electrode integrated structure portion of the ceramic heater of FIG. 図4は、従来のセラミックスヒータの縦断面図である。FIG. 4 is a vertical cross-sectional view of a conventional ceramic heater.

上記の薄膜処理の際、真空チャンバー内の雰囲気は腐食環境になるので、基板載置台の下面側に位置する電極端子は、真空チャンバー内の雰囲気から隔離するのが好ましい。そこで、従来、基板載置台を下面側から支える筒状支持体の上下両端部をそれぞれ基板載置台の下面及び真空チャンバーの底部に気密に接合すると共に、上記電極端子を筒状支持体の内側に設置することが行われている。 Since the atmosphere inside the vacuum chamber becomes a corrosive environment during the above thin film treatment, it is preferable to isolate the electrode terminals located on the lower surface side of the substrate mounting table from the atmosphere inside the vacuum chamber. Therefore, conventionally, the upper and lower ends of the tubular support that supports the substrate mount from the lower surface side are airtightly joined to the lower surface of the substrate mount and the bottom of the vacuum chamber, respectively, and the electrode terminals are attached to the inside of the tubular support. It is being installed.

しかしながら、基板載置面を複数のゾーンに区分して複数の発熱回路をそれらゾーン内にそれぞれ埋設する場合は、当該複数の発熱回路の端部に接続する複数の電極端子、及びそれらと外部電源とを接続する複数の給電線を筒状支持体の内側の狭い空間内に収納する必要がある。その結果、これら複数の給電線は筒状支持体の内側において錯綜し、組み立て時や点検時の作業が煩雑になって結線位置を間違えたり、短絡が生じたりすることがあった。 However, when the substrate mounting surface is divided into a plurality of zones and a plurality of heat generating circuits are embedded in each of the zones, a plurality of electrode terminals connected to the ends of the plurality of heat generating circuits, and their and an external power supply are used. It is necessary to store a plurality of feeder lines connecting the and in a narrow space inside the tubular support. As a result, these plurality of feeder lines are complicated inside the tubular support, and the work at the time of assembly and inspection becomes complicated, and the connection position may be mistaken or a short circuit may occur.

[本開示が解決しようとする課題]
本開示は、このような事情に鑑みてなされたものであり、基板載置台の載置面上に画定した複数のゾーン内にそれぞれ埋設された複数の発熱回路に給電するための複数の給電線を、該基板載置台の下面側に設けられた筒状支持体の内側において錯綜させることなく収納することが可能な半導体基板加熱用のセラミックスヒータを提供することを目的とする。
[Issues to be solved by this disclosure]
The present disclosure has been made in view of such circumstances, and a plurality of feeder lines for supplying power to a plurality of heat generating circuits embedded in a plurality of zones defined on a mounting surface of a board mounting table. It is an object of the present invention to provide a ceramic heater for heating a semiconductor substrate, which can be stored inside a tubular support provided on the lower surface side of the substrate mounting table without complication.

最初に本開示の実施形態を列記して説明する。本開示のセラミックスヒータは、上面に基板載置面を有する円板形状のセラミックスからなる基板載置台と、基板載置面側から見て、基板載置台の複数のゾーンにそれぞれ埋設された複数の発熱回路と、複数の発熱回路の端部にそれぞれ接続された複数の電極端子と、複数の電極端子にそれぞれ接続された複数の給電部と、基板載置台の下面中央部に接続された筒状支持体と、筒状支持体の内側に基板載置台と対向するように配置された円板状の絶縁体と、を備える。複数の給電部は、複数の電極端子から絶縁体に向かって延在するように筒状支持体の内側に配置され、かつ、絶縁体に沿って絶縁体の中心部に集められ絶縁体の基板載置台と対向する面とは反対側の面から延出している。これにより、基板載置台の内部に埋設された複数の発熱回路への給電用の複数の給電部を、該基板載置台の下面側に設けた筒状支持体の内側において錯綜させることなく収納することができる。 First, the embodiments of the present disclosure will be listed and described. The ceramic heater of the present disclosure includes a substrate mounting table made of disk-shaped ceramics having a substrate mounting surface on the upper surface, and a plurality of substrates embedded in a plurality of zones of the substrate mounting table when viewed from the substrate mounting surface side. A heating circuit, a plurality of electrode terminals connected to the ends of a plurality of heating circuits, a plurality of feeding parts connected to the plurality of electrode terminals, and a tubular shape connected to the center of the lower surface of the board mounting table. It includes a support and a disk-shaped insulator arranged inside the tubular support so as to face the substrate mounting table. The plurality of feeding parts are arranged inside the cylindrical support so as to extend from the plurality of electrode terminals toward the insulator, and are collected at the center of the insulator along the insulator to form an insulator substrate. It extends from the surface opposite to the surface facing the mounting table. As a result, a plurality of power feeding portions for supplying power to the plurality of heat generating circuits embedded inside the board mounting table are housed inside the cylindrical support provided on the lower surface side of the board mounting table without complication. be able to.

上記のセラミックスヒータにおいて、複数の給電部の各々は、筒状支持体の内側で下方に延在する第1給電線と、絶縁体の基板載置台と対向する面とは反対側の面から延出する第2給電線と、第1給電線と第2給電線の間に介在する導電部とからなり、導電部は、絶縁体の下面において絶縁体の中心部から外縁部に向かって延在するように設けられていることが好ましい。これにより筒状支持体の内側において給電部間の干渉を和らげることができる。また、組み立て時や点検時に各給電部の接続位置を容易に把握することができる。 In the above-mentioned ceramics heater, each of the plurality of feeding parts extends from the first feeding line extending downward inside the tubular support and the surface of the insulator opposite to the surface facing the substrate mount. It consists of a second feeder to be output and a conductive portion interposed between the first feeder and the second feeder, and the conductive portion extends from the center of the insulator to the outer edge on the lower surface of the insulator. It is preferable that the cable is provided so as to do so. This makes it possible to mitigate the interference between the feeding portions inside the cylindrical support. In addition, the connection position of each power feeding unit can be easily grasped at the time of assembly or inspection.

また、上記のセラミックスヒータにおいて、少なくとも第1給電線又は第2給電線のいずれかは、絶縁体と、ねじ止め、リベット止め、溶接、又はろう付けにより接続されていることが好ましい。これにより、導電体に確実に給電線を接続することができるので、短絡等の問題が生じにくくなる。また、上記のセラミックスヒータにおいては、第1給電線は撚り線からなり、第2給電線は導電性の棒状体からなることが好ましい。これにより、セラミックスヒータの加熱や冷却の際に給電線に熱応力が生じにくくなるうえ、組み立て時や点検時の作業が容易になる。 Further, in the above-mentioned ceramic heater, it is preferable that at least one of the first feeder line and the second feeder is connected to the insulator by screwing, riveting, welding, or brazing. As a result, the feeding line can be reliably connected to the conductor, so that problems such as short circuits are less likely to occur. Further, in the above-mentioned ceramic heater, it is preferable that the first feeder is made of a stranded wire and the second feeder is made of a conductive rod-shaped body. As a result, thermal stress is less likely to occur in the feeder line when the ceramic heater is heated or cooled, and the work during assembly and inspection becomes easier.

次に、本開示のセラミックスヒータ10の一具体例として、半導体基板に対してエッチング処理やCVD処理などを行う半導体製造装置の真空チャンバー内に搭載される基板加熱用セラミックスヒータについて説明する。本開示のセラミックスヒータ10は、図1に示すように半導体基板を載置する基板載置面1aを上面に備えた好適にはセラミックスからなる略円板状の基板載置台1と、この基板載置台1の下面の中央部に接合され、基板載置台1をその下面側から支持する好適にはセラミックスからなる略円筒形状の筒状支持体2と、この筒状支持体2の内側において基板載置台1と対向するように配置された円板状の絶縁体3とを有している。 Next, as a specific example of the ceramic heater 10 of the present disclosure, a ceramic heater for heating a substrate mounted in a vacuum chamber of a semiconductor manufacturing apparatus that performs etching processing, CVD processing, etc. on a semiconductor substrate will be described. As shown in FIG. 1, the ceramic heater 10 of the present disclosure includes a substantially disk-shaped substrate mounting table 1 preferably made of ceramics, which is provided with a substrate mounting surface 1a on which a semiconductor substrate is mounted on the upper surface, and the substrate mounting. A substantially cylindrical tubular support 2 joined to the central portion of the lower surface of the pedestal 1 and preferably made of ceramics to support the substrate pedestal 1 from the lower surface side, and a substrate mounted inside the tubular support 2. It has a disk-shaped insulator 3 arranged so as to face the pedestal 1.

これら基板載置台1や筒状支持体2の材質であるセラミックスとしては、例えば窒化アルミニウム、窒化ケイ素、炭化ケイ素、酸化アルミニウム等を挙げることができる。これらの中では熱伝導率の高い窒化アルミニウムが好ましい。基板載置台1と筒状支持体2は互いに同じ材質からなることが好ましい。これにより加熱や冷却の際に基板載置台1と筒状支持体2は、同様に膨張や縮小させることができる。よって、熱応力による基板載置面1aの反りや基板載置台1と筒状支持体2との接合部の破損等の問題を生じにくくすることができる。 Examples of the ceramics used as the material of the substrate mounting table 1 and the tubular support 2 include aluminum nitride, silicon nitride, silicon carbide, and aluminum oxide. Among these, aluminum nitride having high thermal conductivity is preferable. It is preferable that the substrate mounting table 1 and the tubular support 2 are made of the same material. As a result, the substrate mounting table 1 and the cylindrical support 2 can be similarly expanded and contracted during heating and cooling. Therefore, it is possible to prevent problems such as warpage of the substrate mounting surface 1a due to thermal stress and damage to the joint portion between the substrate mounting base 1 and the tubular support 2.

筒状支持体2の上下両端部は外側に屈曲したフランジ部を有している。フランジ部の環状端面には、図示しないO-リング、ガスケット等のシール材が設けられている。フランジ部を貫通する図示しないネジ等の結合手段によって、筒状支持体2の上下両端部は基板載置台1の下面及び図示しない真空チャンバーの底部にそれぞれ気密に接合している。これにより、筒状支持体2の内側を真空チャンバー内の腐食性ガス雰囲気から隔離することが可能になる。 The upper and lower ends of the tubular support 2 have flanges that are bent outward. Sealing materials such as O-rings and gaskets (not shown) are provided on the annular end surface of the flange portion. The upper and lower ends of the tubular support 2 are airtightly joined to the lower surface of the substrate mounting table 1 and the bottom of the vacuum chamber (not shown) by means of connecting means such as screws penetrating the flange portion. This makes it possible to isolate the inside of the tubular support 2 from the corrosive gas atmosphere in the vacuum chamber.

本開示のセラミックスヒータ10では、図2に示すように、基板載置台1の基板載置面1aが周方向に6つに均等に区分されている。これにより画定される6つの扇形ゾーンの各々をほぼ全面的にカバーするように、同心円状の複数の湾曲部と、これら湾曲部の隣接するもの同士を接続する直線部とがジグザグ状に連なった扇形の回路パターンを有する発熱回路11~16がそれぞれ埋設されている。 In the ceramic heater 10 of the present disclosure, as shown in FIG. 2, the substrate mounting surface 1a of the substrate mounting table 1 is evenly divided into six in the circumferential direction. A plurality of concentric curved portions and straight portions connecting adjacent ones of these curved portions are connected in a zigzag shape so as to cover each of the six fan-shaped zones defined by this. Heat generating circuits 11 to 16 having a fan-shaped circuit pattern are embedded respectively.

上記の6つの発熱回路11~16は、いずれも一端部に個別の電極端子21~26が電気的に接続している。発熱回路11~16の他端部には、共通の電極端子20が電気的に接続している。発熱回路11~16の端部と電極端子20~26とは、例えばカシメ、溶接、ロウ接、ネジ止め等の接合方法により接続できる。合計6個の電極端子21~26及び1個の共通電極端子20は基板載置台1の下面側から部分的に突出し、突出部分に複数の給電部として7本の給電体30~36がそれぞれ接続している。 In each of the above six heat generating circuits 11 to 16, individual electrode terminals 21 to 26 are electrically connected to one end thereof. A common electrode terminal 20 is electrically connected to the other end of the heating circuits 11 to 16. The ends of the heat generating circuits 11 to 16 and the electrode terminals 20 to 26 can be connected by, for example, a joining method such as caulking, welding, brazing, or screwing. A total of 6 electrode terminals 21 to 26 and 1 common electrode terminal 20 partially project from the lower surface side of the substrate mounting table 1, and 7 power supply bodies 30 to 36 are connected to the projecting portions as a plurality of power supply portions. is doing.

7本の給電体30~36は、それぞれ第1給電線30a~36aと、第2給電線30b~36bと、これら両給電線の間に介在する導電体30c~36cとから構成される。基板載置面1aの中心部に位置する共通電極端子20用の給電体30を除く6本の給電体31~36は、筒状支持体2の内側で下方に向かって延在してから円板状の絶縁体3に沿って絶縁体3の中心部に集められた後、絶縁体3の基板載置台1と対向する面とは反対側の面から筒状支持体2の下端側へ延出するようになっている。なお、本開示のセラミックスヒータでは、図2の回路パターンに示すように共通電極端子20が基板載置面1aの中心部に位置している。よって、給電体30は絶縁体3に沿って絶縁体3の中心部に集められる構造にはなっていない。一方、共通電極端子20の位置によっては6本の給電体31~36と同様に絶縁体3に沿って絶縁体3の中心部に集められる構造になる場合がある。 The seven feeders 30 to 36 are composed of the first feeders 30a to 36a, the second feeders 30b to 36b, and the conductors 30c to 36c interposed between the two feeders, respectively. The six feeding bodies 31 to 36, excluding the feeding body 30 for the common electrode terminal 20 located at the center of the substrate mounting surface 1a, extend downward inside the tubular support 2 and then form a circle. After being collected at the center of the insulator 3 along the plate-shaped insulator 3, it extends from the surface of the insulator 3 opposite to the surface facing the substrate mounting table 1 to the lower end side of the tubular support 2. It is supposed to be put out. In the ceramic heater of the present disclosure, the common electrode terminal 20 is located at the center of the substrate mounting surface 1a as shown in the circuit pattern of FIG. Therefore, the feeding body 30 does not have a structure in which the feeding body 30 is gathered at the center of the insulator 3 along the insulating body 3. On the other hand, depending on the position of the common electrode terminal 20, the structure may be such that the common electrode terminals 20 are gathered at the center of the insulator 3 along the insulator 3 as in the case of the six feeders 31 to 36.

7本の給電体30~36について具体的に説明する。7個の電極端子20~26の突出部分には、例えば金属の撚り線からなる第1給電線30a~36aがそれぞれ電気的に接続している。第1給電線30a~36aは、筒状支持体2の内側の下方に位置する絶縁体3に向かって筒状支持体2の内側をほぼ鉛直方向に垂下している。絶縁体3には上記の電極端子20~26のほぼ真下の位置に7個の貫通孔が設けられている。第1給電線30a~36aの先端部はこれら貫通孔をそれぞれ通り抜けて絶縁体3の下面側に設けられた導電体30c~36cの一端部にそれぞれ導通可能に固定されている。なお、絶縁体3の外径は、筒状支持体2の内径よりも数mm程度小さく形成されている。これにより筒状支持体2の内側において移動可能な状態で第1給電線30a~36aに吊り下げられるようにして配されている。 The seven power feeding bodies 30 to 36 will be specifically described. First feed lines 30a to 36a made of, for example, metal stranded wires are electrically connected to the protruding portions of the seven electrode terminals 20 to 26, respectively. The first feeder lines 30a to 36a hang down from the inside of the tubular support 2 in a substantially vertical direction toward the insulator 3 located below the inside of the tubular support 2. The insulator 3 is provided with seven through holes at positions substantially directly below the electrode terminals 20 to 26. The tip portions of the first feeder lines 30a to 36a pass through these through holes and are fixed to one end portions of the conductors 30c to 36c provided on the lower surface side of the insulator 3 so as to be conductive. The outer diameter of the insulator 3 is formed to be several mm smaller than the inner diameter of the tubular support 2. As a result, they are arranged so as to be suspended from the first feeder lines 30a to 36a in a movable state inside the tubular support 2.

7個の導電体30c~36cのうち絶縁体3の中央部に位置する導電体30cを除く導電体31c~36cは、図3A、図3Bに示すように、絶縁体3の下面側において絶縁体3のラジアル方向(放射方向)に均一に延在するように設けられている。なお、図3Aでは、絶縁体3の下面側の7か所に設けられた矩形の溝部内に短冊状の導電体30c~36cがそれぞれ嵌められた構造になっている。しかし導電体30c~36cの形態はこれに限定されるものではない。溝部のない平坦な絶縁板の下面に導電体を固定してもよいし、メタライズ法等で薄膜状の導電体を成膜してもよい。また、絶縁体3の下面における導電体31c~36cの延在方向や長さは、絶縁体3の中心部から外縁部に向かって延在するのであれば図3Bに示すような絶縁体3のラジアル方向に一定の長さで均一に延在する場合に限定するものではない。つまり電極端子21~26の位置に応じて導電体31c~36cの長さが各々異なっていてもよい。あるいは、導電体31c~36cの延在方向が不均一であってもよい。 Of the seven conductors 30c to 36c, the conductors 31c to 36c excluding the conductor 30c located at the center of the insulator 3 are insulators on the lower surface side of the insulator 3 as shown in FIGS. 3A and 3B. It is provided so as to extend uniformly in the radial direction (radial direction) of 3. In addition, in FIG. 3A, the strip-shaped conductors 30c to 36c are fitted into the rectangular grooves provided at seven places on the lower surface side of the insulator 3, respectively. However, the form of the conductors 30c to 36c is not limited to this. The conductor may be fixed to the lower surface of a flat insulating plate having no groove, or a thin-film conductor may be formed by a metallizing method or the like. Further, the extending direction and length of the conductors 31c to 36c on the lower surface of the insulator 3 are as shown in FIG. 3B if the conductors extend from the central portion to the outer edge portion of the insulator 3. It is not limited to the case where it extends uniformly in the radial direction with a certain length. That is, the lengths of the conductors 31c to 36c may be different depending on the positions of the electrode terminals 21 to 26. Alternatively, the extending directions of the conductors 31c to 36c may be non-uniform.

7本の第1給電線30a~36aの先端部は、共通電極端子20用の第1給電線30aを除いて6個の導電体31c~36cにおける絶縁体3の中心側とは反対側の端部に電気的に接続している。6個の導電体31c~36cにおいて絶縁体3の中心側の端部に、筒状支持体2の外部に延出する6本の第2給電線31b~36bが電気的に接続している。これにより、6本の給電体31~36においては、筒状支持体2の内側において絶縁体3の中心部に集められることになる。よって、給電体30を合わせた7本の給電体の全体を集約化された形態として外部電源に接続することが可能になる。 The tips of the seven first feeders 30a to 36a are the ends of the six conductors 31c to 36c opposite to the center side of the insulator 3, except for the first feeder 30a for the common electrode terminal 20. It is electrically connected to the part. In the six conductors 31c to 36c, six second feeder lines 31b to 36b extending to the outside of the tubular support 2 are electrically connected to the central end of the insulator 3. As a result, in the six feeding bodies 31 to 36, they are collected at the center of the insulator 3 inside the tubular support 2. Therefore, it is possible to connect the entire seven power feeding bodies including the power feeding body 30 to the external power source as an integrated form.

なお、前述したように、共通電極端子20は基板載置面1aの中心部に位置している。よって、導電体30cにおいて絶縁体3の中心側の一端部に第1給電線30aが電気的に接続している。絶縁体3の反対側の他端部には、第2給電線30bが電気的に接続している。しかし、共通電極端子20の位置によっては接続位置がこの逆になる場合がある。また、発熱回路の端部を共通電極端子に代えて個別の電極端子にする場合は、給電体の数は12本になる。よって、12本の第2給電線が筒状支持体2の外部に延出することになる。 As described above, the common electrode terminal 20 is located at the center of the substrate mounting surface 1a. Therefore, in the conductor 30c, the first feeder line 30a is electrically connected to one end of the insulator 3 on the center side. A second feeder line 30b is electrically connected to the other end of the insulator 3 on the opposite side. However, the connection position may be reversed depending on the position of the common electrode terminal 20. Further, when the end of the heat generating circuit is replaced with an individual electrode terminal instead of the common electrode terminal, the number of feeding bodies is twelve. Therefore, the twelve second feeders extend to the outside of the tubular support 2.

7本の第2給電線30b~36bの各々は、第1給電線30a~36aと同様の金属の撚り線でもよい。または、導電性の棒状体からなるいわゆるピン構造にしてもよい。このように7本の第2給電線30b~36bをピン構造にすると共に、外部電源側の給電線の先端部を該ピン構造の第2給電線群に対して一括して係合可能なソケット構造にすることで、外部電源側の給電線との取り合い部の構造を簡素化することができる。なお、導電体30c~36cの少なくとも第1給電線30a~36a又は第2給電線30b~36bとの接続は、ねじ止め、リベット止め、溶接、又はろう付けによって行うことが好ましい。 Each of the seven second feeders 30b to 36b may be a stranded metal wire similar to the first feeders 30a to 36a. Alternatively, a so-called pin structure made of a conductive rod-shaped body may be used. In this way, the seven second feeder lines 30b to 36b have a pin structure, and the tip of the feeder line on the external power supply side can be collectively engaged with the second feeder group of the pin structure. By adopting the structure, it is possible to simplify the structure of the connection portion with the power supply line on the external power supply side. The conductors 30c to 36c are preferably connected to at least the first feeder lines 30a to 36a or the second feeder lines 30b to 36b by screwing, riveting, welding, or brazing.

以上説明した多電極集約構造部を採用することにより、図4に示す従来のセラミックスヒータ100が抱える問題を解消することができる。すなわち、従来のセラミックスヒータ100では、図4に示すように基板載置台101の下面に設けた電極端子120~126に電気的に接続された給電線130~136は、特に拘束されることなく筒状支持体102の内側にランダムに収納される。よって、給電線130~136の間で短絡が生じたり、組み立て時や点検時に給電線130~136の結線位置を間違えたり等の問題が発生することがあった。また、筒状支持体102の下端部から延出される給電線130~136の長さにばらつきが生じ、外部電源との接続が困難になることがあった。 By adopting the multi-electrode integrated structure described above, the problem of the conventional ceramic heater 100 shown in FIG. 4 can be solved. That is, in the conventional ceramic heater 100, as shown in FIG. 4, the feeder lines 130 to 136 electrically connected to the electrode terminals 120 to 126 provided on the lower surface of the substrate mounting table 101 are cylinders without any particular restraint. It is randomly stored inside the shape support 102. Therefore, there may be a problem that a short circuit occurs between the feeder lines 130 to 136, or that the connection position of the feeder lines 130 to 136 is mistaken during assembly or inspection. In addition, the lengths of the feeder lines 130 to 136 extending from the lower end of the tubular support 102 may vary, making it difficult to connect to an external power source.

これに対して、本開示のセラミックスヒータの多電極集約構造部を採用することにより、基板載置台の内部に埋設された複数の発熱回路の給電用の複数の給電線が筒状支持体の内側に収納される場合であっても、これら給電線が錯綜しなくなり、組み立てや点検が用意になる。さらに、給電線の結線ミスや短絡等の問題発生を防ぐことができる。 On the other hand, by adopting the multi-electrode integrated structure portion of the ceramic heater of the present disclosure, a plurality of feeder lines for feeding a plurality of heat generating circuits embedded inside the substrate mount are provided inside the tubular support. Even if it is stored in, these feeders will not be complicated, and assembly and inspection will be easy. Further, it is possible to prevent problems such as connection mistakes and short circuits of the feeding lines.

今回開示された実施の形態はすべての点で例示であって、どのような面からも制限的なものではないと理解されるべきである。本発明はこれらの例示に限定されるものではなく、請求の範囲によって示され、請求の範囲と均等の意味及び範囲内でのすべての変更が含まれることが意図される。 It should be understood that the embodiments disclosed here are exemplary in all respects and are not restrictive in any way. The present invention is not limited to these examples, and is indicated by the claims and is intended to include all modifications within the meaning and scope equivalent to the claims.

1、101 基板載置台
1a、101a 基板載置面
2、102 筒状支持体
3 絶縁体
11~16 発熱回路
20、120 共通の電極端子
21~26、121~126 個別の電極端子
30~36 給電体
30a~36a 第1給電線
30b~36b 第2給電線
30c~36c 導電体
130~136 給電線
10、100 セラミックスヒータ
1,101 Board mounting base 1a, 101a Board mounting surface 2,102 Cylindrical support 3 Insulators 11 to 16 Heat generation circuits 20, 120 Common electrode terminals 21 to 26, 121 to 126 Individual electrode terminals 30 to 36 Feeding Body 30a to 36a 1st feeder line 30b to 36b 2nd feeder line 30c to 36c Conductor 130 to 136 feeder line 10,100 Ceramics heater

Claims (4)

上面に基板載置面を有する円板形状のセラミックスからなる基板載置台と、
前記基板載置面側から見て、前記基板載置台の複数のゾーンにそれぞれ埋設された複数の発熱回路と、
前記複数の発熱回路の端部にそれぞれ接続された複数の電極端子と、
前記複数の電極端子にそれぞれ接続された複数の給電部と、
前記基板載置台の下面中央部に接続された筒状支持体と、
前記筒状支持体の内側に前記基板載置台と対向するように配置された円板状の絶縁体と、を備え、
前記複数の給電部は、前記複数の電極端子から前記絶縁体に向かって延在するように前記筒状支持体の内側に配置され、
かつ、前記絶縁体の前記基板載置台と対向する面とは反対側の面に沿って前記絶縁体の中心部に集められ前記反対側の面から延出している、セラミックスヒータ。
A board mounting table made of disk-shaped ceramics having a board mounting surface on the upper surface,
When viewed from the board mounting surface side, a plurality of heat generating circuits embedded in each of the plurality of zones of the board mounting table, and a plurality of heat generating circuits.
A plurality of electrode terminals connected to the ends of the plurality of heat generating circuits, respectively,
A plurality of power feeding units connected to the plurality of electrode terminals, respectively,
A tubular support connected to the center of the lower surface of the board mounting table, and
A disk-shaped insulator arranged inside the cylindrical support so as to face the substrate mounting table is provided.
The plurality of feeding portions are arranged inside the tubular support so as to extend from the plurality of electrode terminals toward the insulator.
A ceramic heater that is collected at the center of the insulator along a surface of the insulator opposite to the surface of the insulator facing the substrate mounting table and extends from the surface of the insulator.
前記複数の給電部の各々は、
前記筒状支持体の内側で下方に延在する第1給電線と、
記反対側の面から延出する第2給電線と、前記第1給電線と前記第2給電線の間に介在する導電部とからなり、
前記導電部は、前記絶縁体の下面において前記絶縁体の中心部から外縁部に向かって延在するように設けられている、請求項1に記載のセラミックスヒータ。
Each of the plurality of power feeding units
A first feeder extending downward inside the cylindrical support,
It is composed of a second feeder extending from the opposite surface and a conductive portion interposed between the first feeder and the second feeder.
The ceramic heater according to claim 1, wherein the conductive portion is provided on the lower surface of the insulator so as to extend from the central portion of the insulator toward the outer edge portion.
少なくとも前記第1給電線又は前記第2給電線のいずれかは、前記絶縁体と、ねじ止め、リベット止め、溶接、又はろう付けにより接続されている、
請求項2に記載のセラミックスヒータ。
At least one of the first feeders or the second feeder is connected to the insulator by screwing, riveting, welding, or brazing.
The ceramic heater according to claim 2.
前記第1給電線は撚り線からなり、
前記第2給電線は導電性の棒状体からなる、
請求項2又は請求項3に記載のセラミックスヒータ。
The first feeder is made of stranded wire.
The second feeder is made of a conductive rod-shaped body.
The ceramic heater according to claim 2 or 3.
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