JP7248682B2 - Curable resin composition, dry film, cured product, and printed wiring board - Google Patents
Curable resin composition, dry film, cured product, and printed wiring board Download PDFInfo
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
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- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
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- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
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- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
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- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
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- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
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Description
本発明は、硬化性樹脂組成物、ドライフィルム、硬化物、及びプリント配線板に関する。 TECHNICAL FIELD The present invention relates to a curable resin composition, a dry film, a cured product, and a printed wiring board.
近年、スマートフォンやタブレット端末の普及と性能の向上が急速に進行している。これらに代表される情報機器端末は、小型化、薄型化への消費者の要求が高く、その要求に応えるべく、製品内部の回路基板の高密度化、省スペース化が必要となっている。そのため、折り曲げての収納が可能で、回路配置の自由度を高めることのできるフレキシブルプリント配線板の用途が拡大しており、フレキシブルプリント配線板に対する信頼性もこれまで以上に高いものが求められている。
プリント配線板の製造工程には、基板上にスクリーン印刷などの方法によって形成した配線(回路)パターンを外部環境から保護したり、電子部品をプリント配線板に表面実装する際に行われるはんだ付け工程において、不必要な部分にはんだが付着しないように保護するために、カバーレイもしくはソルダーレジストと呼ばれる保護層をプリント配線板上に被覆することが行われている。従来、かかる用途に使用されるソルダーレジスト用の硬化性樹脂組成物において、主としてエポキシ系のカルボキシル基含有感光性樹脂が使用されている。
In recent years, the spread of smartphones and tablet terminals and the improvement in their performance are progressing rapidly. Consumer demands for miniaturization and thinning of information equipment terminals represented by these are high, and in order to meet such demands, it is necessary to increase the density and space saving of the circuit board inside the product. Therefore, the use of flexible printed wiring boards, which can be folded and stored and can increase the degree of freedom in circuit layout, is expanding, and flexible printed wiring boards with higher reliability than ever before are in demand. there is
Printed wiring board manufacturing processes include protecting the wiring (circuit) patterns formed on the board by methods such as screen printing from the external environment, and the soldering process used when electronic components are surface-mounted on the printed wiring board. In order to prevent solder from adhering to unnecessary portions, a protective layer called a coverlay or solder resist is coated on the printed wiring board. Conventionally, epoxy-based carboxyl group-containing photosensitive resins are mainly used in curable resin compositions for solder resists used for such applications.
例えば、特開平10-282665号公報には、ラジカル重合性不飽和アシル基とカルボキシル基を有する樹脂のカルボキシル基に、1つのエポキシ基と1つ以上のラジカル重合性不飽和基を1分子中に合わせもつ化合物を反応することにより得られる紫外線硬化性樹脂を使用したソルダーフォトレジストインキ組成物が提案されている。
また、特許5556990号公報には、多官能エポキシ樹脂と不飽和モノカルボン酸のエステル化合物又は飽和若しくは不飽和多塩基酸のエステル化合物との反応生成物に、飽和又は不飽和多塩基酸無水物を反応させた後、さらに1分子中にグリシジル基1つとエチレン性不飽和基を少なくとも1つ以上有する化合物を付加させた感光性プレポリマー、分子中に少なくとも1個以上のエチレン性不飽和基を有する光重合性モノマ、光重合開始剤、ブロック化イソシアネート、ビスマレイミド化合物を含有する感光性樹脂組成物が提案されている。
For example, in JP-A-10-282665, the carboxyl group of a resin having a radically polymerizable unsaturated acyl group and a carboxyl group, one epoxy group and one or more radically polymerizable unsaturated groups in one molecule. A solder photoresist ink composition using an ultraviolet curable resin obtained by reacting a combined compound has been proposed.
Japanese Patent No. 5556990 discloses that a saturated or unsaturated polybasic acid anhydride is added to a reaction product of a polyfunctional epoxy resin and an unsaturated monocarboxylic acid ester compound or a saturated or unsaturated polybasic acid ester compound. A photosensitive prepolymer obtained by further adding a compound having one glycidyl group and at least one ethylenically unsaturated group in one molecule after the reaction, and having at least one ethylenically unsaturated group in the molecule. A photosensitive resin composition containing a photopolymerizable monomer, a photopolymerization initiator, a blocked isocyanate and a bismaleimide compound has been proposed.
しかしながら、上記のようなカルボキシル基含有感光性樹脂を使用した樹脂組成物から得られる硬化膜は、はんだ耐熱性は良好であるが、折り曲げ性が低かったり、反りが大いという問題があり、改善の余地があった。 However, the cured film obtained from the resin composition using the carboxyl group-containing photosensitive resin as described above has good solder heat resistance, but has problems such as low bending property and large warpage. There was room for
本発明の目的は、はんだ耐熱性のみならず、折り曲げ性、低反り性も優れた硬化物を与える硬化性樹脂組成物、及びそれを使用したドライフィルム、硬化物、及びプリント配線板を提供することにある。 An object of the present invention is to provide a curable resin composition that gives a cured product having not only solder heat resistance but also excellent bendability and low warpage, and a dry film, a cured product, and a printed wiring board using the same. That's what it is.
本発明者らは鋭意研究を行った結果、特定のカルボキシル基含有感光性樹脂を含有した硬化性樹脂組成物に、少なくとも2種の、5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物を配合することにより、はんだ耐熱性のみならず、折り曲げ性、低反り性も優れた硬化物を与える硬化性樹脂組成物を得ることに成功し、本発明を完成するに至った。 As a result of intensive research by the present inventors, a curable resin composition containing a specific carboxyl group-containing photosensitive resin contains at least two ethylenically unsaturated groups having 5 or more alkylene oxide skeletons. By blending the compound, the present inventors succeeded in obtaining a curable resin composition that gives a cured product having not only solder heat resistance but also excellent bendability and low warpage, thereby completing the present invention.
即ち、本発明は、下記のとおりである。
[項1]
(A)カルボキシル基含有樹脂と、
(B)光重合開始剤と、
(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物と、を含む樹脂組成物であって、
前記(A)成分として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂を含み、
前記(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含むことを特徴とする硬化性樹脂組成物。
[項2]
前記(C)成分が、5個以上30個以下のアルキレンオキシド骨格を有することを特徴とする項1に記載の硬化性樹脂組成物。
[項3]
前記(A)成分としてさらに、(A2)ビスフェノール型エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有感光性樹脂および(A3)ウレタン骨格を有するカルボキシル基含有樹脂の少なくともいずれか1種を含むことを特徴とする項1または2に記載の硬化性樹脂組成物。
[項4]
前記(A)成分100重量部に対し、前記(A1)成分の含有量は10~30重量部であることを特徴とする項1~3のいずれか1項に記載の硬化性樹脂組成物。
[項5]
さらに、(D)下記一般式(1)の構造を有するエポキシ樹脂を含むことを特徴とする項1~4のいずれか1項に記載の硬化性樹脂組成物。
[項6]
前記(D)成分として、一般式(1)中のXがジシクロペンタジエン骨格であるエポキシ樹脂を含むことを特徴とする項5に記載の硬化性樹脂組成物。
[項7]
フレキシブルプリント配線板の製造に用いられることを特徴とする項1~6のいずれか1項に記載の硬化性樹脂組成物。
[項8]
項1~7のいずれか1項に記載の硬化性樹脂組成物から得られる樹脂層を有することを特徴とするドライフィルム。
[項9]
項1~7のいずれか1項に記載の硬化性樹脂組成物または項8に記載のドライフィルムの樹脂層を硬化して得られることを特徴とする硬化物。
[項10]
項9に記載の硬化物を有することを特徴とするプリント配線板。
That is, the present invention is as follows.
[Section 1]
(A) a carboxyl group-containing resin;
(B) a photoinitiator;
(C) a resin composition containing an ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons,
As the component (A), epoxy resin (A1) is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. Including a carboxyl group-containing photosensitive resin obtained by adding a compound having a saturated group,
A curable resin composition comprising at least two ethylenically unsaturated group-containing compounds as the component (C).
[Section 2]
Item 2. The curable resin composition according to Item 1, wherein the component (C) has 5 to 30 alkylene oxide skeletons.
[Section 3]
Further, as the component (A), a carboxyl group-containing photosensitive resin obtained by reacting (A2) a bisphenol type epoxy resin with a carboxylic acid having an ethylenically unsaturated group and reacting the resulting hydroxyl group with an acid anhydride, and ( A3) The curable resin composition according to Item 1 or 2, which contains at least one of carboxyl group-containing resins having a urethane skeleton.
[Section 4]
Item 4. The curable resin composition according to any one of Items 1 to 3, wherein the content of component (A1) is 10 to 30 parts by weight with respect to 100 parts by weight of component (A).
[Section 5]
Item 5. The curable resin composition according to any one of items 1 to 4, further comprising (D) an epoxy resin having a structure represented by the following general formula (1).
[Section 6]
Item 6. The curable resin composition according to item 5, wherein the component (D) contains an epoxy resin in which X in the general formula (1) is a dicyclopentadiene skeleton.
[Section 7]
Item 7. The curable resin composition according to any one of Items 1 to 6, which is used for manufacturing a flexible printed wiring board.
[Item 8]
Item 8. A dry film comprising a resin layer obtained from the curable resin composition according to any one of Items 1 to 7.
[Item 9]
A cured product obtained by curing the resin layer of the curable resin composition according to any one of Items 1 to 7 or the dry film according to Item 8.
[Item 10]
Item 10. A printed wiring board comprising the cured product according to item 9.
本発明によれば、はんだ耐熱性のみならず、折り曲げ性、低反り性も優れた硬化物を与える硬化性樹脂組成物、及びそれを使用したドライフィルム、硬化物、及びプリント配線板を提供することができる。 According to the present invention, there is provided a curable resin composition that gives a cured product having not only solder heat resistance but also excellent bendability and low warpage, and a dry film, a cured product, and a printed wiring board using the same. be able to.
本発明は、(A)カルボキシル基含有樹脂と、(B)光重合開始剤と、(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物と、を含む樹脂組成物であって、前記(A)成分として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂(単に(A1)成分ともいう)を含み、前記(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含むことを特徴とする硬化性樹脂組成物である。 The present invention is a resin composition comprising (A) a carboxyl group-containing resin, (B) a photopolymerization initiator, and (C) an ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons. As the component (A), the epoxy resin (A1) is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. a carboxyl group-containing photosensitive resin (also simply referred to as component (A1)) to which a compound having a polyunsaturated group is added, and at least two ethylenically unsaturated group-containing compounds as the component (C). It is a curable resin composition characterized by
以下、本発明の硬化性樹脂組成物の各成分をそれぞれ説明する。なお、(メタ)アクリレートとは、アクリレート、メタクリレートおよびそれらの混合物を総称する用語で、以下他の類似の表現についても同様である。 Each component of the curable resin composition of the present invention will be described below. (Meth)acrylate is a general term for acrylate, methacrylate and mixtures thereof, and the same applies to other similar expressions below.
(A)カルボキシル基含有樹脂
本発明の組成物に、(A)カルボキシル基含有樹脂として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂を必須成分として含む。
(A) Carboxyl group-containing resin The composition of the present invention is reacted with a carboxylic acid having an ethylenically unsaturated group as (A) a carboxyl group-containing resin, (A1) an epoxy resin, and acid anhydride is added to the generated hydroxyl group. A carboxyl group-containing photosensitive resin obtained by adding a compound having a glycidyl group and an ethylenically unsaturated group to a carboxyl group-containing resin obtained by reacting a substance is included as an essential component.
前記エチレン性不飽和基を有するカルボン酸としては、(メタ)アクリル酸などが好ましくあげられる。
前記酸無水物としては、代表的なものとして無水マレイン酸、無水コハク酸、無水イタコン酸、無水フタル酸、無水テトラヒドロフタル酸、無水ヘキサヒドロフタル酸、メチルヘキサヒドロ無水フタル酸、無水エンドメチレンテトラヒドロフタル酸、無水メチルエンドメチレンテトラヒドロフタル酸、無水クロレンド酸、メチルテトラヒドロ無水フタル酸などの二塩基性酸無水物;無水トリメリット酸、無水ピロメリット酸、ベンゾフェノンテトラカルボン酸二無水物などの芳香族多価カルボン酸無水物;その他これに付随する例えば5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸無水物のような多価カルボン酸無水物誘導体などが使用できるが、二塩基性酸無水物が好ましい。
As the carboxylic acid having an ethylenically unsaturated group, (meth)acrylic acid is preferably used.
Typical examples of the acid anhydride include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, endomethylene tetrahydro dibasic acid anhydrides such as phthalic acid, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, and methyltetrahydrophthalic anhydride; aromatics such as trimellitic anhydride, pyromellitic anhydride, and benzophenonetetracarboxylic dianhydride Polyvalent carboxylic anhydrides; other polyvalent carboxylic anhydrides associated therewith such as, for example, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride dibasic acid anhydrides are preferred.
前記のエポキシ樹脂として、エポキシ基を有する樹脂であり、公知のものをいずれも使用できる。分子中に2個のエポキシ基を有する2官能性エポキシ樹脂、分子中にエポキシ基を多数有する多官能エポキシ樹脂等が挙げられる。
前記(A1)成分の原料となるエポキシ樹脂としては、ビスフェノールA型エポキシ樹脂、ブロム化エポキシ樹脂、ノボラック型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、グリシジルアミン型エポキシ樹脂、ヒダントイン型エポキシ樹脂、脂環式エポキシ樹脂、トリヒドロキシフェニルメタン型エポキシ樹脂、ビキシレノール型もしくはビフェノール型エポキシ樹脂又はそれらの混合物;ビスフェノールS型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、テトラフェニロールエタン型エポキシ樹脂、複素環式エポキシ樹脂、ジグリシジルフタレート樹脂、テトラグリシジルキシレノイルエタン樹脂、ナフタレン基含有エポキシ樹脂、ジシクロペンタジエン骨格を有するエポキシ樹脂等が挙げられる。それらの中でも、ビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂などのビスフェノール型エポキシ樹脂、ビキシレノール型エポキシ樹脂およびビフェノール型エポキシ樹脂が好ましい。
前記グリシジル基とエチレン性不飽和基を有する化合物として、グリシジル(メタ)アクリレート、α-メチルグリシジル(メタ)アクリレートなどの分子中に1つのグリシジル基と1つ以上の(メタ)アクリロイル基を有する化合物等が挙げられる。
As the epoxy resin, any known epoxy resin having an epoxy group can be used. Examples include bifunctional epoxy resins having two epoxy groups in the molecule and polyfunctional epoxy resins having many epoxy groups in the molecule.
Examples of epoxy resins used as raw materials for component (A1) include bisphenol A type epoxy resins, brominated epoxy resins, novolac type epoxy resins, bisphenol F type epoxy resins, hydrogenated bisphenol A type epoxy resins, glycidylamine type epoxy resins, Hydantoin-type epoxy resin, alicyclic epoxy resin, trihydroxyphenylmethane-type epoxy resin, bixylenol-type or biphenol-type epoxy resin, or a mixture thereof; bisphenol S-type epoxy resin, bisphenol A novolak-type epoxy resin, tetraphenylolethane-type epoxy resin Epoxy resins, heterocyclic epoxy resins, diglycidyl phthalate resins, tetraglycidyl xylenoyl ethane resins, naphthalene group-containing epoxy resins, epoxy resins having a dicyclopentadiene skeleton, and the like. Among them, bisphenol type epoxy resins such as bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin and biphenol type epoxy resin are preferable.
Compounds having one glycidyl group and one or more (meth)acryloyl groups in the molecule, such as glycidyl (meth)acrylate and α-methylglycidyl (meth)acrylate, as the compound having a glycidyl group and an ethylenically unsaturated group. etc.
(A1)成分として、下記の(1)~(2)の樹脂に、さらにグリシジル(メタ)アクリレート、α-メチルグリシジル(メタ)アクリレートなどの分子中に1つのグリシジル基と1つ以上の(メタ)アクリロイル基を有する化合物を付加してなるカルボキシル基含有感光性樹脂が更に好ましい。 As a component (A1), the following resins (1) to (2) are further added with one glycidyl group and one or more (meth)acrylates in the molecule such as glycidyl (meth)acrylate and α-methylglycidyl (meth)acrylate ) A carboxyl group-containing photosensitive resin obtained by adding a compound having an acryloyl group is more preferable.
(1)2官能またはそれ以上の多官能エポキシ樹脂に(メタ)アクリル酸を反応させ、側鎖に存在する水酸基に2塩基酸無水物を付加させたカルボキシル基含有感光性樹脂。
(2)2官能エポキシ樹脂の水酸基をさらにエピクロロヒドリンでエポキシ化した多官能エポキシ樹脂に(メタ)アクリル酸を反応させ、生じた水酸基に2塩基酸無水物を付加させたカルボキシル基含有感光性樹脂。
(1) A carboxyl group-containing photosensitive resin obtained by reacting (meth)acrylic acid with a polyfunctional epoxy resin having a functionality of two or more, and adding a dibasic acid anhydride to the hydroxyl group present in the side chain.
(2) A carboxyl group-containing photosensitizer obtained by reacting (meth)acrylic acid with a polyfunctional epoxy resin obtained by further epoxidizing the hydroxyl groups of a bifunctional epoxy resin with epichlorohydrin, and adding a dibasic acid anhydride to the resulting hydroxyl groups. synthetic resin.
本発明の組成物に、(A)カルボキシル基含有樹脂として、さらに、(A2)ビスフェノール型エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有感光性樹脂および(A3)ウレタン骨格を有するカルボキシル基含有樹脂の少なくともいずれか1種を含むことが、はんだ耐熱性、折り曲げ性、反り性の点から好ましい。
(A2)成分として、ビスフェノール型エポキシ樹脂に(メタ)アクリル酸を反応させ、側鎖に存在する水酸基に2塩基酸無水物を付加させたカルボキシル基含有感光性樹脂が更に好ましい。
The composition of the present invention is reacted with (A) a carboxyl group-containing resin, and (A2) a bisphenol type epoxy resin is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. and (A3) a carboxyl group-containing resin having a urethane skeleton, from the viewpoint of solder heat resistance, bendability, and warpage resistance.
As the component (A2), a carboxyl group-containing photosensitive resin obtained by reacting a bisphenol type epoxy resin with (meth)acrylic acid and adding a dibasic acid anhydride to the hydroxyl group present in the side chain is more preferable.
前記の(A3)ウレタン骨格を有するカルボキシル基含有樹脂として、下記の(3)~(6)のいずれかの樹脂があげられる。
(3)ジイソシアネートと、カルボキシル基含有ジアルコール化合物の重付加反応によるカルボキシル基含有ウレタン樹脂。
(4)脂肪族ジイソシアネート、分岐脂肪族ジイソシアネート、脂環式ジイソシアネート、芳香族ジイソシアネート等のジイソシアネートと、ジメチロールプロピオン酸、ジメチロールブタン酸等のカルボキシル基を含有する、ジアルコール化合物、ポリカーボネート系ポリオール、ポリエーテル系ポリオール、ポリエステル系ポリオール、ポリオレフィン系ポリオール、アクリル系ポリオール、ビスフェノールA系アルキレンオキシド付加体ジオール、フェノール性ヒドロキシル基およびアルコール性ヒドロキシル基を有する化合物等のジオール化合物の重付加反応によるカルボキシル基含有感光性ウレタン樹脂。
(5)ジイソシアネートと、ビスフェノールA型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビキシレノール型エポキシ樹脂、ビフェノール型エポキシ樹脂等の2官能エポキシ樹脂の(メタ)アクリレートもしくはその部分酸無水物変性物と、カルボキシル基含有ジアルコール化合物の重付加反応によるカルボキシル基含有感光性ウレタン樹脂。
(6)上述の(4)または(5)の樹脂の合成中に、ヒドロキシアルキル(メタ)アクリレート等の分子内に1つの水酸基と1つ以上の(メタ)アクリロイル基を有する化合物を加え、末端(メタ)アクリル化したカルボキシル基含有感光性ウレタン樹脂。
(7)上述の(5)または(6)の樹脂の合成中に、イソホロンジイソシアネートとペンタエリスリトールトリアクリレートの等モル反応物など、分子内に1つのイソシアネート基と1つ以上の(メタ)アクリロイル基を有する化合物を加え末端(メタ)アクリル化したカルボキシル基含有感光性ウレタン樹脂。
(A2)成分を含むと、硬化物の柔軟性が向上し、硬化物の折り曲げ性に優れるようになり、(A3)成分を含むと、硬化物の折り曲げ性と耐熱性を向上させることができる。
Examples of (A3) a carboxyl group-containing resin having a urethane skeleton include the following resins (3) to (6).
(3) A carboxyl group-containing urethane resin produced by a polyaddition reaction between a diisocyanate and a carboxyl group-containing dialcohol compound.
(4) dialcohol compounds containing diisocyanates such as aliphatic diisocyanates, branched aliphatic diisocyanates, alicyclic diisocyanates, and aromatic diisocyanates, and carboxyl groups such as dimethylolpropionic acid and dimethylolbutanoic acid; polycarbonate-based polyols; Carboxyl group-containing by polyaddition reaction of diol compounds such as polyether-based polyols, polyester-based polyols, polyolefin-based polyols, acrylic-based polyols, bisphenol A-based alkylene oxide adduct diols, and compounds having phenolic hydroxyl groups and alcoholic hydroxyl groups Photosensitive urethane resin.
(5) Diisocyanate and bifunctional epoxy resin such as bisphenol A type epoxy resin, hydrogenated bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bixylenol type epoxy resin, biphenol type epoxy resin ( A carboxyl group-containing photosensitive urethane resin obtained by a polyaddition reaction of a meth)acrylate or its partial acid anhydride-modified product and a carboxyl group-containing dialcohol compound.
(6) During the synthesis of the resin of (4) or (5) above, a compound having one hydroxyl group and one or more (meth)acryloyl groups in the molecule such as hydroxyalkyl (meth)acrylate is added, and the terminal (Meth)acrylated carboxyl group-containing photosensitive urethane resin.
(7) One isocyanate group and one or more (meth)acryloyl groups in the molecule, such as equimolar reactants of isophorone diisocyanate and pentaerythritol triacrylate, during the synthesis of the resins of (5) or (6) above A carboxyl group-containing photosensitive urethane resin terminally (meth)acrylated by adding a compound having
When the component (A2) is included, the flexibility of the cured product is improved and the bending property of the cured product is excellent, and when the component (A3) is included, the bending property and heat resistance of the cured product can be improved. .
前記(A)カルボキシル基含有樹脂において、(A1)成分の含有割合に特に限定されない。しかしながら、(A1)成分の含有量が低すぎると、(A1)成分による耐熱性向上効果が不十分となる恐れがあり、高すぎると、折り曲げ性が劣り、反りが大きくなる恐れがある。耐熱性と、折り曲げ性、低反り性とのバランスの点から、前記(A)成分100重量部に対し、前記(A1)成分の含有量は、好ましくは10~30重量部、さらに好ましく10~20重量部である。
(B)光重合開始剤
本発明において、(B)成分として用いる光重合開始剤としては、通常に硬化性樹脂組成物に用いられるものであれば特に制限はない。
In the carboxyl group-containing resin (A), the content of component (A1) is not particularly limited. However, if the content of the component (A1) is too low, the heat resistance improving effect of the component (A1) may be insufficient, and if it is too high, the bendability may be poor and warping may increase. From the viewpoint of the balance between heat resistance, bendability, and low warpage, the content of component (A1) is preferably 10 to 30 parts by weight, more preferably 10 to 30 parts by weight, per 100 parts by weight of component (A). 20 parts by weight.
(B) photoinitiator
In the present invention, the photopolymerization initiator used as the component (B) is not particularly limited as long as it is commonly used in curable resin compositions.
例えば、ベンゾフェノン、N,N’-テトラアルキル-4,4’-ジアミノベンゾフェノン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノ-プロパノン-1等の芳香族ケトン、4,4’-ビス(ジメチルアミノ)ベンゾフェノン(ミヘラーケトン)、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、4-メトキシ-4’-ジメチルアミノベンゾフェノン、2-ベンジル-2-ジメチルアミノ-1-(モルホリノフェノン)-ブタノン-1、2-エチルアントラキノン、フェナントレンキノン等の芳香族ケトン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインフェニルエーテル等のベンゾインエーテル、メチルベンゾイン、エチルベンゾイン等のベンゾイン、ベンジルジメチルケタール等のベンジル誘導体、2-(o-クロロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-クロロフェニル)-4,5-ジ(m-メトキシフェニル)イミダゾール二量体、2-(o-フルオロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-メトキシフェニル)-4,5-ジフェニルイミダゾール二量体、2,4-ジ(p-メトキシフェニル)-5-フェニルイミダゾール二量体、2-(2,4-ジメトキシフェニル)-4,5-ジフェニルイミダゾール二量体等の2,4,5-トリアリールイミダゾール二量体、9-フェニルアクリジン、1,7-ビス(9,9’-アクリジニル)ヘプタン等のアクリジン誘導体、N-フェニルグリシン、N-フェニルグリシン誘導体、クマリン系化合物等などが挙げられる。
これらは1種類を単独で或いは2種類以上を組み合わせて用いることができる。
For example, benzophenone, N,N′-tetraalkyl-4,4′-diaminobenzophenone, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,2-methyl-1-[4 -(methylthio)phenyl]-2-morpholino-propanone-1 and other aromatic ketones, 4,4'-bis(dimethylamino)benzophenone (miheler ketone), 4,4'-bis(diethylamino)benzophenone, 4-methoxy- Aromatic ketones such as 4'-dimethylaminobenzophenone, 2-benzyl-2-dimethylamino-1-(morpholinophenone)-butanone-1,2-ethylanthraquinone, phenanthrenequinone, benzoin methyl ether, benzoin ethyl ether, benzoinphenyl Benzoin ethers such as ethers, benzoins such as methylbenzoin and ethylbenzoin, benzyl derivatives such as benzyldimethylketal, 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)-4 ,5-di(m-methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer 2,4,5-dimer such as 2,4-di(p-methoxyphenyl)-5-phenylimidazole dimer, 2-(2,4-dimethoxyphenyl)-4,5-diphenylimidazole dimer, etc. -Triarylimidazole dimer, 9-phenylacridine, acridine derivatives such as 1,7-bis(9,9'-acridinyl)heptane, N-phenylglycine, N-phenylglycine derivatives, coumarin compounds, etc. be done.
These can be used singly or in combination of two or more.
(B)成分としては、オキシムエステル基を有するオキシムエステル系光重合開始剤、アルキルフェノン系光重合開始剤、α-アミノアセトフェノン系光重合開始剤、アシルホスフィンオキサイド系光重合開始剤、チタノセン系光重合開始剤からなる群から選択される1種以上の光重合開始剤を好適に使用することができる。
オキシムエステル系光重合開始剤としては、市販品として、BASFジャパン社製のCGI-325、イルガキュアーOXE01、イルガキュアーOXE02、アデカ社製N-1919、NCI-831などが挙げられる。また、分子内に2個のオキシムエステル基を有する光重合開始剤も好適に用いることができる。オキシムエステル系光重合開始剤としては、カルバゾール構造を有するオキシムエステル化合物が好ましい。
アルキルフェノン系光重合開始剤の市販品としてはBASFジャパン社製イルガキュアー184、ダロキュアー1173、イルガキュアー2959、イルガキュアー127などのα―ヒドロキシアルキルフェノンタイプが挙げられる。
α-アミノアセトフェノン系光重合開始剤としては、具体的には2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパノン-1、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン、N,N-ジメチルアミノアセトフェノンなどが挙げられる。市販品としては、BASFジャパン社製のイルガキュアー907、イルガキュアー369、イルガキュアー379などが挙げられる。
アシルホスフィンオキサイド系光重合開始剤としては、具体的には2,4,6-トリメチルベンゾイルジフェニルホスフィンオキサイド、ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキサイド、ビス(2,6-ジメトキシベンゾイル)-2,4,4-トリメチル-ペンチルホスフィンオキサイドなどが挙げられる。市販品としては、BASF社製のルシリンTPO、BASFジャパン社製のイルガキュアー819などが挙げられる。
また、光重合開始剤としてはBASFジャパン製のイルガキュアー389、イルガキュアー784等のチタノセン系光重合開始剤も好適に用いることが出来る。
(B)光重合開始剤の配合量は、(A)カルボキシル基含有樹脂100質量部に対して、0.1~25質量部であることが好ましく、1~20質量部であることがより好ましい。0.1~25質量部であることにより、光硬化性及び解像性に優れ、密着性やPCT耐性も向上し、さらには無電解金めっき耐性などの耐薬品性にも優れる硬化膜を得ることができる。特に、25質量部以下であると、アウトガスの低減効果が得られ、さらに塗膜表面での光吸収が激しくなり、深部硬化性が低下することを抑えることができる。
Component (B) includes an oxime ester photopolymerization initiator having an oxime ester group, an alkylphenone photopolymerization initiator, an α-aminoacetophenone photopolymerization initiator, an acylphosphine oxide photopolymerization initiator, and a titanocene photopolymerization initiator. One or more photopolymerization initiators selected from the group consisting of polymerization initiators can be suitably used.
Examples of the oxime ester-based photopolymerization initiator include commercially available products such as CGI-325, Irgacure OXE01 and Irgacure OXE02 manufactured by BASF Japan, N-1919 and NCI-831 manufactured by Adeka. A photopolymerization initiator having two oxime ester groups in the molecule can also be preferably used. As the oxime ester photopolymerization initiator, an oxime ester compound having a carbazole structure is preferred.
Commercially available alkylphenone-based photopolymerization initiators include α-hydroxyalkylphenone types such as Irgacure 184, Darocure 1173, Irgacure 2959 and Irgacure 127 manufactured by BASF Japan.
As the α-aminoacetophenone-based photopolymerization initiator, specifically, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropanone-1,2-benzyl-2-dimethylamino-1- (4-morpholinophenyl)-butan-1-one, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-[4-(4-morpholinyl)phenyl]-1-butanone, N , N-dimethylaminoacetophenone, and the like. Commercially available products include Irgacure 907, Irgacure 369, and Irgacure 379 manufactured by BASF Japan.
Specific examples of acylphosphine oxide photopolymerization initiators include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, bis(2,6-dimethoxy benzoyl)-2,4,4-trimethyl-pentylphosphine oxide and the like. Commercially available products include Lucirin TPO manufactured by BASF and Irgacure 819 manufactured by BASF Japan.
Titanocene-based photopolymerization initiators such as Irgacure 389 and Irgacure 784 manufactured by BASF Japan can also be suitably used as the photopolymerization initiator.
The amount of the photopolymerization initiator (B) is preferably 0.1 to 25 parts by mass, more preferably 1 to 20 parts by mass, relative to 100 parts by mass of the carboxyl group-containing resin (A). . By using 0.1 to 25 parts by mass, a cured film having excellent photocurability and resolution, improved adhesion and PCT resistance, and excellent chemical resistance such as electroless gold plating resistance can be obtained. be able to. In particular, when the content is 25 parts by mass or less, the effect of reducing outgassing can be obtained, and furthermore, the light absorption on the coating film surface becomes intense, and it is possible to suppress the deterioration of the deep-part curability.
(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物
本発明において、(C)成分として、5個以上のアルキレンオキシド骨格を有し、かつエチレン性不飽和基を含有すれば、特に限定されない。分子中に5個以上のEO又はPOを有し、且つ2個以上のエチレン性不飽和基を有する化合物が好ましい。また、(C)成分は、アルキレンオキシド骨格の末端に(メタ)アクリロイル基を有する構造を含むことが好ましい。エチレン性不飽和基の数は、2以上4以下であることがより好ましく、2以上3以下であることが最も好ましい。
なお、「EO」とは「エチレンオキシド」のことを称し、「PO」とは「プロピレンオキシド」のことを称す。また、以下に、「EO変性」とはエチレンオキシドユニット(-CH2-CH2-O-)のブロック構造を有することを意味し、「PO変性」とはプロピレンオキシドユニット(-CH2-CH2-CH2-O-、-CH(CH3)-CH2-O-、-CH2-CH(CH3)-O-)のブロック構造を有することを意味する。
(C) Ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons In the present invention, if component (C) has 5 or more alkylene oxide skeletons and contains an ethylenically unsaturated group , is not particularly limited. Compounds having 5 or more EO or PO in the molecule and 2 or more ethylenically unsaturated groups are preferred. Also, the component (C) preferably contains a structure having a (meth)acryloyl group at the terminal of the alkylene oxide skeleton. The number of ethylenically unsaturated groups is more preferably 2 or more and 4 or less, and most preferably 2 or more and 3 or less.
In addition, "EO" refers to "ethylene oxide", and "PO" refers to "propylene oxide". Further, hereinafter, “EO-modified” means having a block structure of ethylene oxide units (—CH 2 —CH 2 —O—), and “PO-modified” means having a block structure of propylene oxide units (—CH 2 —CH 2 It means having a block structure of —CH 2 —O—, —CH(CH 3 )—CH 2 —O—, —CH 2 —CH(CH 3 )—O—).
(C)成分として、EO変性の多価アクリレートを例に、下記の一般式(1)又は(2)で示される化合物がさらに好ましい。
「5個以上のアルキレンオキシド骨格を有する」とは、二種類以上のアルキレンオキシド骨格を含有する場合、あらゆる種類のアルキレンオキシド骨格を合計で5個以上を有することを意味する。5個未満であれば、本発明の優れた折り曲げ性及び低反り性を実現できなくなる。
ほかの性能とのバランスの点から、前記(C)成分が、5個以上30個以下のアルキレンオキシド骨格を有することが好ましく、5個以上20個以下を有することがより好ましい。アルキレンオキシド骨格の数が30個以下であると組成物の粘度を調整せずに、硬化膜の厚さを安易に確保できる。
本発明では、(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含む必要がある。(C)成分が一つのエチレン性不飽和基含有化合物のみである場合、本発明の硬化物の反り性を得られないだけでなく、折り曲げ性及びはんだ耐熱性を低下させることもある。
"Having 5 or more alkylene oxide skeletons" means having 5 or more alkylene oxide skeletons of all kinds in total when two or more kinds of alkylene oxide skeletons are contained. If the number is less than 5, the excellent bendability and low warpage of the present invention cannot be achieved.
From the viewpoint of balance with other performances, the component (C) preferably has 5 to 30 alkylene oxide skeletons, more preferably 5 to 20 alkylene oxide skeletons. When the number of alkylene oxide skeletons is 30 or less, the thickness of the cured film can be easily secured without adjusting the viscosity of the composition.
In the present invention, at least two ethylenically unsaturated group-containing compounds must be included as component (C). If the component (C) is only one ethylenically unsaturated group-containing compound, the cured product of the present invention cannot be warped, and the bendability and soldering heat resistance may be lowered.
(C)成分の合計配合量は、(A)カルボキシル基含有樹脂100質量部に対して、1~40質量部であることが好ましく、10~35質量部であることがより好ましく、15~30質量部であることがさらに好ましい。 The total amount of component (C) is preferably 1 to 40 parts by mass, more preferably 10 to 35 parts by mass, more preferably 15 to 30 parts by mass, relative to 100 parts by mass of the carboxyl group-containing resin (A). Parts by mass are more preferred.
そのほかの成分
本発明において、上記の(A)~(C)成分に加えて、さらに、(D)下記一般式(1)の構造を有するエポキシ樹脂を含んでもよい。
前記一般式(1)中のXがジシクロペンタジエン骨格であることが、本発明の効果を著しく発揮するので好ましい。
なお、本発明においては、(D)成分以外のエポキシ樹脂、例えば上記のビスフェノールA型エポキシ樹脂等を含んでいてもよい。
Other Components In addition to the above components (A) to (C), the present invention may further contain (D) an epoxy resin having the structure of the following general formula (1).
It is preferable that X in the general formula (1) is a dicyclopentadiene skeleton because the effects of the present invention are exhibited remarkably.
In addition, in the present invention, an epoxy resin other than the component (D), such as the bisphenol A type epoxy resin described above, may be included.
本発明において、上記の(A)~(C)成分に加えて、さらに、(E)エーテル骨格を有するジアミンを含んでもよい。(E)成分としては、例えば、JEFFAMINE D-230、JEFFAMINE D-2000(ハンツマン社製)が挙げられる。
本発明の硬化性樹脂組成物の現像性、ポットライフの点から、前記(E)成分が、好ましくはエーテル骨格の数が15以上のポリエーテルアミン(ポリエーテルジアミンともいう。)を含み、より好ましくはポットライフおよび耐熱性の観点からエーテル骨格の数が1以上10以下のジアミンと、エーテル骨格の数が20以上40以下のポリエーテルアミンとの両方を含むことが好ましい。エーテル骨格の数が1以上10以下のジアミンの含有量は、(E)成分の総重量を100重量部に対し、1~40重量部であることが好ましく、エーテル骨格の数が15以上のポリエーテルアミンの含有量は、(E)成分の総重量を100重量部に対し、60~99重量部であることが好ましい。
In the present invention, in addition to the above components (A) to (C), (E) a diamine having an ether skeleton may also be included. Examples of component (E) include JEFFAMINE D-230 and JEFFAMINE D-2000 (manufactured by Huntsman).
From the viewpoint of the developability and pot life of the curable resin composition of the present invention, the component (E) preferably contains a polyetheramine (also referred to as polyetherdiamine) having 15 or more ether skeletons, and more From the viewpoint of pot life and heat resistance, it is preferable to include both a diamine having 1 to 10 ether skeletons and a polyetheramine having 20 to 40 ether skeletons. The content of the diamine having 1 to 10 ether skeletons is preferably 1 to 40 parts by weight per 100 parts by weight of the total weight of the component (E), and the poly The ether amine content is preferably 60 to 99 parts by weight per 100 parts by weight of the total weight of component (E).
また、本発明の硬化性樹脂組成物には、本発明の効果を妨げない限り、(F)架橋密度向上ための3官能以上のエチレン性不飽和基含有化合物((C)成分を除く)を含有してもよい。その(F)成分として、例えば、トリメチロールプロパントリ(メタ)アクリレート、EO変性トリメチロールプロパントリ(メタ)アクリレート、PO変性トリメチロールプロパントリ(メタ)アクリレート、EO・PO変性トリメチロールプロパントリ(メタ)アクリレート、テトラメチロールメタントリ(メタ)アクリレート、テトラメチロールメタンテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート等が挙げられる。
さらに、本発明の硬化性樹脂組成物には、所望の物性に応じて硫酸バリウム、酸化珪素、タルク、クレー、炭酸カルシウム、シリカ、ベントナイト、カオリン、ガラス繊維、炭素繊維、雲母等の公知・慣用の充填剤、フタロシアニンブルー、フタロシアニングリーン、酸化チタン、カーボンブラック等の公知・慣用の染料や着色顔料、消泡剤、難燃剤、密着性付与剤またはレベリング剤などの各種添加剤、あるいはハイドロキノン、ハイドロキノンモノメチルエーテル、ピロガロール、t-ブチルカテコール、フェノチアジン等の公知・慣用の重合禁止剤などを添加してもよい。
さらに、本発明の硬化性樹脂組成物は、組成物の調製や粘度調整のために用いられる有機溶剤を含有してもよい。有機溶剤としては、例えば、メチルエチルケトン、シクロヘキサノン等のケトン類;トルエン、キシレン、テトラメチルベンゼン等の芳香族炭化水素類;セロソルブ、メチルセロソルブ、ブチルセロソルブ、カルビトール、メチルカルビトール、ブチルカルビトール、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル(DPM)、ジプロピレングリコールジエチルエーテル、トリプロピレングリコールモノメチルエーテル等のグリコールエーテル類;酢酸エチル、酢酸ブチル、乳酸ブチル、セロソルブアセテート、ブチルセロソルブアセテート、カルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、炭酸プロピレン等のエステル類;オクタン、デカン等の脂肪族炭化水素類;石油エーテル、石油ナフサ、ソルベントナフサ等の石油系溶剤などを使用することができる。これらの有機溶剤は、単独で、または、2種類以上を組み合わせて用いることができる。
本発明の硬化性樹脂組成物によれば、はんだ耐熱性のみならず、折り曲げ性、低反り性も優れた硬化物を得られるので、フレキシブルプリント配線板の製造に好ましく用いられる。
In addition, the curable resin composition of the present invention contains (F) a trifunctional or higher ethylenically unsaturated group-containing compound (excluding component (C)) for improving the crosslink density, as long as it does not interfere with the effects of the present invention. may contain. Examples of the component (F) include trimethylolpropane tri(meth)acrylate, EO-modified trimethylolpropane tri(meth)acrylate, PO-modified trimethylolpropane tri(meth)acrylate, EO/PO-modified trimethylolpropane tri(meth)acrylate, ) acrylate, tetramethylolmethane tri(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate and the like.
Furthermore, the curable resin composition of the present invention may contain known and commonly used materials such as barium sulfate, silicon oxide, talc, clay, calcium carbonate, silica, bentonite, kaolin, glass fiber, carbon fiber, and mica, depending on the desired physical properties. fillers, known and commonly used dyes and coloring pigments such as phthalocyanine blue, phthalocyanine green, titanium oxide, carbon black, various additives such as antifoaming agents, flame retardants, adhesion imparting agents or leveling agents, or hydroquinone, hydroquinone Known and commonly used polymerization inhibitors such as monomethyl ether, pyrogallol, t-butylcatechol and phenothiazine may be added.
Furthermore, the curable resin composition of the present invention may contain an organic solvent used for preparing the composition and adjusting the viscosity. Examples of organic solvents include ketones such as methyl ethyl ketone and cyclohexanone; aromatic hydrocarbons such as toluene, xylene and tetramethylbenzene; cellosolve, methyl cellosolve, butyl cellosolve, carbitol, methyl carbitol, butyl carbitol, propylene glycol; Glycol ethers such as monomethyl ether, dipropylene glycol monomethyl ether (DPM), dipropylene glycol diethyl ether, tripropylene glycol monomethyl ether; ethyl acetate, butyl acetate, butyl lactate, cellosolve acetate, butyl cellosolve acetate, carbitol acetate, butyl carbi Esters such as tall acetate, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate, and propylene carbonate; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether, petroleum naphtha, and solvent naphtha. can do. These organic solvents can be used alone or in combination of two or more.
According to the curable resin composition of the present invention, a cured product having not only solder heat resistance but also excellent bending property and low warpage property can be obtained, so that it is preferably used for the production of flexible printed wiring boards.
本発明のもう一つの形態は、上記の硬化性樹脂組成物から得られる樹脂層を有するドライフィルムを提供する。
本発明のドライフィルムは、キャリアフィルム(支持体)上に塗布、乾燥させることより得られることができる。ドライフィルム化に際しては、本発明の組成物を、必要に応じて上記の有機溶剤により希釈して適切な粘度に調整し、コンマコーター、ブレードコーター、リップコーター、ロッドコーター、スクイズコーター、リバースコーター、トランスファロールコーター、グラビアコーター、スプレーコーター等でキャリアフィルム上に均一な厚さに塗布し、通常、50~130℃の温度で1~30分間乾燥して、乾燥塗膜としての樹脂層とすることができる。樹脂層の厚さは特に制限はないが、一般に、乾燥後の膜厚で0.1~100μm、好適には0.5~50μmの範囲で適宜選択される。
Another aspect of the present invention provides a dry film having a resin layer obtained from the above curable resin composition.
The dry film of the present invention can be obtained by coating on a carrier film (support) and drying. When forming a dry film, the composition of the present invention is diluted with the above organic solvent as necessary to adjust the viscosity to an appropriate value, and is coated with a comma coater, blade coater, lip coater, rod coater, squeeze coater, reverse coater, It is coated on a carrier film with a uniform thickness using a transfer roll coater, gravure coater, spray coater, etc., and usually dried at a temperature of 50 to 130° C. for 1 to 30 minutes to form a resin layer as a dry coating film. can be done. Although the thickness of the resin layer is not particularly limited, it is generally selected appropriately within the range of 0.1 to 100 μm, preferably 0.5 to 50 μm, in terms of film thickness after drying.
キャリアフィルムとしては、プラスチックフィルムが用いられ、ポリエチレンテレフタレート等のポリエステルフィルム、ポリイミドフィルム、ポリアミドイミドフィルム、ポリプロピレンフィルム、ポリスチレンフィルム等のプラスチックフィルムを用いることが好ましい。キャリアフィルムの厚さについては特に制限はないが、一般に、0.1~150μmの範囲で適宜選択される。
この場合、キャリアフィルム上に樹脂層を形成した後、樹脂層の表面に塵が付着するのを防ぐなどの目的で、樹脂層の表面にさらに、剥離可能なカバーフィルムを積層することが好ましい。剥離可能なカバーフィルムとしては、例えば、ポリエチレンフィルム、ポリテトラフルオロエチレンフィルム、ポリプロピレンフィルム、表面処理した紙等を用いることができ、カバーフィルムを剥離する際に、樹脂層とカバーフィルムとの接着力が、樹脂層とキャリアフィルムとの接着力よりも小さいものであればよい。
As the carrier film, a plastic film is used, and it is preferable to use a plastic film such as a polyester film such as polyethylene terephthalate, a polyimide film, a polyamideimide film, a polypropylene film and a polystyrene film. The thickness of the carrier film is not particularly limited, but is generally selected appropriately within the range of 0.1 to 150 μm.
In this case, after forming the resin layer on the carrier film, it is preferable to further laminate a peelable cover film on the surface of the resin layer for the purpose of preventing dust from adhering to the surface of the resin layer. As the peelable cover film, for example, a polyethylene film, a polytetrafluoroethylene film, a polypropylene film, a surface-treated paper, or the like can be used. is smaller than the adhesive force between the resin layer and the carrier film.
本発明のもう一つの形態は、上記の硬化性樹脂組成物から得られる硬化物を提供する。
本発明の硬化性樹脂組成物は、必要に応じて塗布方法に適した粘度に調整し、これを例えば、回路形成されたプリント配線板にスクリーン印刷法、カーテンコート法、スプレーコート法、ロールコート法等の方法により塗布し、必要に応じて例えば60~100℃の温度で組成物中に含まれる有機溶剤を揮発乾燥させることにより、タックフリーの塗膜を形成できる。その後、得られた塗膜又は上記のドライフィルムの樹脂層を、所定の露光パターンを形成したフォトマスクを通して選択的に活性エネルギー線照射により露光し、未露光部を現像液により現像してレジストパターンを形成でき、さらに、例えば140~180℃の温度に加熱して熱硬化させることにより、はんだ耐熱性、折り曲げ性、低反り性に優れた硬化物がレジスト膜として得られる。
Another form of the present invention provides a cured product obtained from the above curable resin composition.
The curable resin composition of the present invention is adjusted to a viscosity suitable for the coating method as necessary, and is applied to a printed wiring board having a circuit formed thereon by, for example, a screen printing method, a curtain coating method, a spray coating method, or a roll coating method. A tack-free coating film can be formed by applying the composition according to a method such as a method of the present invention, and optionally drying the organic solvent contained in the composition at a temperature of 60 to 100° C., for example. After that, the obtained coating film or the resin layer of the dry film is selectively exposed by irradiation with active energy rays through a photomask having a predetermined exposure pattern, and the unexposed area is developed with a developer to form a resist pattern. Further, for example, by heating to a temperature of 140 to 180° C. for thermal curing, a cured product excellent in soldering heat resistance, bending property and low warpage property can be obtained as a resist film.
本発明の組成物を塗布した後に行う揮発乾燥は、熱風循環式乾燥炉、IR炉、ホットプレート、コンベクションオーブンなど、蒸気による空気加熱方式の熱源を備えたものを用いて乾燥機内の熱風を向流接触させる方法、および、ノズルより支持体に吹き付ける方法を用いて行うことができる。 The volatilization drying performed after applying the composition of the present invention is performed using a hot air circulation drying oven, an IR oven, a hot plate, a convection oven, or the like, which is equipped with a steam air heating type heat source, and directs the hot air in the dryer. It can be carried out using a method of flowing contact and a method of spraying the support from a nozzle.
活性エネルギー線照射に用いられる露光機としては、高圧水銀灯ランプ、超高圧水銀灯ランプ、メタルハライドランプ、水銀ショートアークランプ等を搭載し、350~450nmの範囲で紫外線を照射する装置であればよく、さらに、直接描画装置(例えば、コンピューターからのCADデータにより直接活性エネルギー線を照射し画像を描くダイレクトイメージング装置)も用いることができる。直描機の光源としては、最大波長が350~410nmの範囲にある光を用いているものであればよい。画像形成のための露光量は膜厚等によって異なるが、一般には20~1000mJ/cm2、好ましくは20~800mJ/cm2の範囲内とすることができる。
前記現像方法としては、ディッピング法、シャワー法、スプレー法、ブラシ法等によることができ、現像液としては、水酸化カリウム、水酸化ナトリウム、炭酸ナトリウム、炭酸カリウム、リン酸ナトリウム、ケイ酸ナトリウム、アンモニア、アミン類などの希アルカリ水溶液が使用できる。
The exposure device used for active energy ray irradiation may be any device equipped with a high-pressure mercury lamp, an extra-high pressure mercury lamp, a metal halide lamp, a mercury short arc lamp, or the like, and irradiating ultraviolet rays in the range of 350 to 450 nm. A direct drawing device (for example, a direct imaging device that draws an image by directly irradiating active energy rays according to CAD data from a computer) can also be used. As the light source of the direct drawing machine, any light having a maximum wavelength in the range of 350 to 410 nm may be used. The amount of exposure for image formation varies depending on the film thickness and the like, but can generally be in the range of 20-1000 mJ/cm 2 , preferably in the range of 20-800 mJ/cm 2 .
Examples of the developing method include a dipping method, a shower method, a spray method, and a brush method. Examples of the developing solution include potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate Dilute alkaline aqueous solutions such as ammonia and amines can be used.
また、本発明は、上記の硬化物を有するプリント配線板を提供する。 Moreover, this invention provides the printed wiring board which has said hardened|cured material.
以下に実施例及び比較例を示して本発明について具体的に説明するが、本発明が下記実施例に限定されるものではないことはもとよりである。尚、以下において「部」及び「%」とあるのは、特に断りのない限り全て質量基準である。 EXAMPLES The present invention will be specifically described below with reference to examples and comparative examples, but it goes without saying that the present invention is not limited to the following examples. In the following, "parts" and "%" are all based on mass unless otherwise specified.
硬化性樹脂組成物を、表1に示した各成分を、そこに示す固形分の配合比(質量基準)で混合することにより得た。
[(A1)成分の合成例1]
ジエチレングリコールモノエチルエーテルアセテート700gにオルソクレゾールノボラック型エポキシ樹脂(DIC社製、エピクロン(EPICLON) N-695、軟化点95℃、エポキシ当量214、平均官能基数7.6)1070g(グリシジル基数(芳香環総数):5.0モル)、アクリル酸360g(5.0モル)、およびハイドロキノン1.5gを仕込み、100℃に加熱攪拌し、均一溶解した。
次いで、トリフェニルホスフィン4.3gを仕込み、110℃に加熱して2時間反応後、さらにトリフェニルホスフィン1.6gを追加し、120℃に昇温してさらに12時間反応を行った。得られた反応液に、芳香族系炭化水素(ソルベッソ150)562g、テトラヒドロ無水フタル酸684g(4.5モル)を仕込み、110℃で4時間反応を行った。さらに、得られた反応液にグリシジルメタクリレート142.0g(1.0モル)を仕込み、115℃で4時間反応を行い、(A1)成分となるカルボキシル基含有感光性樹脂溶液を得た。このようにして得られた樹脂溶液の固形分は65%、固形分の酸価は87mgKOH/gであった。
A curable resin composition was obtained by mixing each component shown in Table 1 at the solid content mixing ratio (mass basis) shown therein.
[(A1) Component Synthesis Example 1]
To 700 g of diethylene glycol monoethyl ether acetate, add 1070 g of ortho-cresol novolac type epoxy resin (manufactured by DIC, EPICLON N-695, softening point 95° C., epoxy equivalent weight 214, average functional group number 7.6) (number of glycidyl groups (total number of aromatic rings) ): 5.0 mol), 360 g (5.0 mol) of acrylic acid, and 1.5 g of hydroquinone were charged, heated to 100° C. with stirring, and uniformly dissolved.
Then, 4.3 g of triphenylphosphine was charged, heated to 110° C. and reacted for 2 hours, then 1.6 g of triphenylphosphine was added, the temperature was raised to 120° C. and the reaction was further carried out for 12 hours. 562 g of aromatic hydrocarbon (Solvesso 150) and 684 g (4.5 mol) of tetrahydrophthalic anhydride were added to the obtained reaction liquid, and the reaction was carried out at 110° C. for 4 hours. Further, 142.0 g (1.0 mol) of glycidyl methacrylate was added to the resulting reaction solution and reacted at 115° C. for 4 hours to obtain a carboxyl group-containing photosensitive resin solution as component (A1). The resin solution thus obtained had a solid content of 65% and an acid value of the solid content of 87 mgKOH/g.
[(A2)成分の合成例]
エポキシ当量800、軟化点79℃のビスフェノールF型固形エポキシ樹脂400部を、エピクロルヒドリン925部とジメチルスルホキシド462.5部を溶解させた後、攪拌下70℃で98.5%NaOH81.2部を100分かけて添加した。添加後、さらに70℃で3時間反応を行なった。
次いで、過剰の未反応エピクロルヒドリンおよびジメチルスルホキシドの大半を減圧下に留去し、副生塩とジメチルスルホキシドを含む反応生成物をメチルイソブチルケトン750部に溶解させ、さらに30%NaOH10部を加え70℃で1時間反応させた。反応終了後、水200部で2回水洗を行った。油水分離後、油層よりメチルイソブチルケトンを蒸留回収して、エポキシ当量290、軟化点62℃のエポキシ樹脂(a-1)370部を得た。
得られたエポキシ樹脂(a-1)2900部(10当量(エポキシ基で10モル))、アクリル酸720部(10当量(カルボキシル基で10モル))、メチルハイドロキノン2.8部、カルビトールアセテート1950部を仕込み、90℃に加熱、攪拌し、反応混合物を溶解した。次いで、反応液を60℃に冷却し、トリフェニルフォスフィン16.7部を仕込み、100℃に加熱し、約32時間反応し、酸価が1.0mgKOH/gの反応物を得た。次に、これに無水マレイン酸786部(酸無水物構造で7.86モル)、カルビトールアセテート423部を仕込み、95℃に加熱し、約6時間反応を行い、感光性のカルボキシル基含有樹脂溶液を得た。
このようにして得られた樹脂溶液の固形分は65%、固形分の酸価は100mgKOH/gであった。
[Synthesis example of component (A2)]
925 parts of epichlorohydrin and 462.5 parts of dimethyl sulfoxide are dissolved in 400 parts of bisphenol F solid epoxy resin having an epoxy equivalent of 800 and a softening point of 79°C, and then 81.2 parts of 98.5% NaOH is added to 100 parts at 70°C while stirring. added in portions. After the addition, the reaction was further carried out at 70°C for 3 hours.
Next, most of the excess unreacted epichlorohydrin and dimethyl sulfoxide were distilled off under reduced pressure, the reaction product containing the by-product salt and dimethyl sulfoxide was dissolved in 750 parts of methyl isobutyl ketone, and 10 parts of 30% NaOH was further added and the temperature was kept at 70°C. was reacted for 1 hour. After completion of the reaction, it was washed twice with 200 parts of water. After oil-water separation, methyl isobutyl ketone was recovered from the oil layer by distillation to obtain 370 parts of epoxy resin (a-1) having an epoxy equivalent of 290 and a softening point of 62°C.
Epoxy resin (a-1) obtained 2900 parts (10 equivalents (10 mol with epoxy group)), 720 parts of acrylic acid (10 equivalents (10 mol with carboxyl group)), 2.8 parts of methyl hydroquinone, carbitol acetate 1950 parts were charged, heated to 90° C. and stirred to dissolve the reaction mixture. Then, the reaction solution was cooled to 60°C, charged with 16.7 parts of triphenylphosphine, heated to 100°C, and reacted for about 32 hours to obtain a reactant having an acid value of 1.0 mgKOH/g. Next, 786 parts of maleic anhydride (7.86 mol in terms of acid anhydride structure) and 423 parts of carbitol acetate were added thereto, heated to 95° C., and reacted for about 6 hours to obtain a photosensitive carboxyl group-containing resin. A solution was obtained.
The solid content of the resin solution thus obtained was 65%, and the acid value of the solid content was 100 mgKOH/g.
[(A3)成分の合成例]
撹拌装置、温度計、コンデンサーを備えた反応容器に、アルコール性ヒドロキシル基を複数有する化合物として1,5-ペンタンジオールと1,6-ヘキサンジオールから誘導されるポリカーボネートジオール(旭化成ケミカルズ(株)製T5650J、数平均分子量800)を3600g(4.5モル)、ジメチロールブタン酸を814g(5.5モル)、及び分子量調整剤(反応停止剤)としてn-ブタノール118g(1.6モル)を投入した。次に、芳香環を有しないイソシアネート化合物としてトリメチルヘキサメチレンジイソシアネート2009g(10.8モル)を投入し、撹拌しながら60℃まで加熱して停止し、反応容器内の温度が低下し始めた時点で再度加熱して80℃で撹拌を続け、赤外線吸収スペクトルでイソシアネート基の吸収スペクトル(2280cm-1)が消失したことを確認して反応を終了した。次いで、固形分が60wt%となるようにカルビトールアセテートを添加し、希釈剤を含有する粘稠液体のカルボキシル基含有樹脂を得た。得られた(A3)ウレタン骨格を有するカルボキシル基含有樹脂の固形分の酸価は49.8mgKOH/gであった。
[Synthesis example of component (A3)]
A polycarbonate diol derived from 1,5-pentanediol and 1,6-hexanediol (T5650J manufactured by Asahi Kasei Chemicals Co., Ltd.) was placed in a reaction vessel equipped with a stirrer, a thermometer, and a condenser as a compound having multiple alcoholic hydroxyl groups. , 3600 g (4.5 mol) of number average molecular weight 800), 814 g (5.5 mol) of dimethylolbutanoic acid, and 118 g (1.6 mol) of n-butanol as a molecular weight modifier (reaction terminator). bottom. Next, 2009 g (10.8 mol) of trimethylhexamethylene diisocyanate was added as an isocyanate compound having no aromatic ring, heated to 60° C. with stirring, and stopped. The mixture was heated again and stirred at 80° C. After confirming that the absorption spectrum (2280 cm −1 ) of the isocyanate group disappeared in the infrared absorption spectrum, the reaction was terminated. Then, carbitol acetate was added so that the solid content was 60 wt % to obtain a viscous liquid carboxyl group-containing resin containing a diluent. The acid value of the solid content of the carboxyl group-containing resin having a urethane skeleton (A3) was 49.8 mgKOH/g.
市販の材料として、光重合開始剤として、BASFジャパン製のイルガキュア784、イルガキュアー369、4,4’-ビス(ジエチルアミノ)ベンゾフェノン(EAB)を使用し、ジシクロペンタジエン型固形エポキシとして、日本化薬株式会社製XD-1000を使用し、ビフェニルノボラック型エポキシとして、日本化薬株式会社製NC-3000を使用し、EO変性アクリルモノマーとして、新中村化学社工業株式会社製A-600、A-400、A-GLY-20Eを使用した。そのほか、DPHA(ジペンタエリスリトールトリアクリレート、日本化薬株式会社製)、JEFFAMINE D-230、JEFFAMINE D-2000(ハンツマン社製)。 As commercially available materials, BASF Japan Irgacure 784, Irgacure 369, 4,4'-bis (diethylamino) benzophenone (EAB) is used as a photopolymerization initiator, and as a dicyclopentadiene type solid epoxy, Nippon Kayaku Using XD-1000 manufactured by Co., Ltd., using NC-3000 manufactured by Nippon Kayaku Co., Ltd. as biphenyl novolak type epoxy, and using A-600 and A-400 manufactured by Shin-Nakamura Chemical Co., Ltd. as EO-modified acrylic monomers. , A-GLY-20E was used. In addition, DPHA (dipentaerythritol triacrylate, manufactured by Nippon Kayaku Co., Ltd.), JEFFAMINE D-230, JEFFAMINE D-2000 (manufactured by Huntsman).
銅回路を有するポリイミド基板(ポリイミドフィルムの厚み:25μm、銅回路:1/3オンス)上に、実施例1~8、および比較例1~3の各組成物をスクリーン印刷で乾燥後10μmとなるように全面塗布し、熱風循環式乾燥炉で160℃30分で乾燥させて乾燥塗膜を形成し、次いで、オーク製作所社製メタルハライドランプを搭載した露光機により感度7段となる露光量で露光した。その後、1wt%Na2CO3水溶液によりスプレー圧0.1MPaで1分間現像し、次いで、熱風循環式乾燥炉を用いて150℃で60分間熱硬化処理を施すことにより、ポリイミド基板上に厚み10μmの硬化塗膜を作製した。 Each composition of Examples 1 to 8 and Comparative Examples 1 to 3 was screen-printed on a polyimide substrate having a copper circuit (thickness of polyimide film: 25 μm, copper circuit: 1/3 oz) to a thickness of 10 μm after drying. and dried at 160 ° C. for 30 minutes in a hot air circulation drying oven to form a dry coating film, then exposed with an exposure amount that gives a sensitivity of 7 steps with an exposure machine equipped with a metal halide lamp manufactured by Oak Manufacturing Co., Ltd. bottom. After that, it was developed with a 1 wt% Na 2 CO 3 aqueous solution at a spray pressure of 0.1 MPa for 1 minute, and then heat-cured at 150°C for 60 minutes using a hot air circulating drying oven to obtain a thickness of 10 µm on the polyimide substrate. A cured coating film was produced.
得られた各硬化性樹脂組成物の硬化塗膜を評価した結果を表1に示す。なお、評価方法及び評価基準は、次の通りである。
(硬化物-低反り性評価)
硬化塗膜を有するポリイミド基板を5cm×5cmに切り出して評価サンプルを作成した。硬化塗膜の面を上面として各角の反りを定規にて測定し4点の平均値を評価した。
○:各角反りの平均値2mm以下
△:各角反りの平均値3mm以下
×:各角反りの平均値4mm以下
(折り曲げ性)
硬化塗膜を有するポリイミド基板を、幅10mm×長さ70mmに切り出し、評価サンプルを作成した。硬化塗膜の面を山折りにして重り1Kgを乗せ、10秒乗せた後に折り曲げ部を拡げた。そして、再度、折り曲げ部に重りを10秒間乗せて、これを1回とした。折り曲げ部を顕微鏡にて観察し銅が見えるまでの回数を評価した。
○:折り曲げ回数-2回
△:折り曲げ回数-1回
×:折り曲げ回数-0回
(はんだ耐熱性試験)
硬化塗膜を有するポリイミド基板を、縦20mm×横20mmに切り出し、評価サンプルを作成した。はんだ槽の温度を320℃とし、この中にサンプル基板を入れ、10秒後に基板を取り出し、基板表面上の硬化塗膜の膨れを確認し、膨れが出るまでの回数を評価した。
○:320℃×10秒 3回以上
△:320℃×10秒 2回
×:320℃×10秒 1回
Table 1 shows the evaluation results of the cured coating films of the obtained curable resin compositions. The evaluation method and evaluation criteria are as follows.
(Cured product-Low warpage evaluation)
A polyimide substrate having a cured coating film was cut into a size of 5 cm×5 cm to prepare an evaluation sample. With the surface of the cured coating film facing upward, the warpage at each corner was measured with a ruler, and the average value of the four points was evaluated.
○: Average value of each corner warp 2 mm or less △: Average value of each corner warp 3 mm or less ×: Average value of each corner warp 4 mm or less (bending property)
A polyimide substrate having a cured coating film was cut into a size of 10 mm in width×70 mm in length to prepare an evaluation sample. The surface of the cured coating film was folded into a mountain, and a weight of 1 kg was placed on it. Then, the weight was again put on the bent portion for 10 seconds, which was regarded as one time. The bent portion was observed with a microscope, and the number of times until the copper was visible was evaluated.
○: Number of times of bending -2 times △: Number of times of bending -1 time ×: Number of times of bending -0 times (solder heat resistance test)
A polyimide substrate having a cured coating film was cut into a size of 20 mm long×20 mm wide to prepare an evaluation sample. The temperature of the solder bath was set to 320° C., and the sample substrate was placed in the bath. After 10 seconds, the substrate was taken out, and swelling of the cured coating film on the substrate surface was confirmed, and the number of times until swelling appeared was evaluated.
○: 320°C x 10 seconds 3 times or more △: 320°C x 10 seconds twice x: 320°C x 10 seconds once
表1から明らかなように、(A1)成分を使用し、かつ2種の5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物を併用した実施例1~8のいずれも、硬化物の低反り性、折り曲げ性、及びはんだ耐熱性の評価に優れた結果となった。それに対して、5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物を一つのみ使用した比較例1~2、(A1)成分を含有しない比較例3は、性能が不十分となった。具体的に、比較例1では硬化物の低反り性、折り曲げ性、及びはんだ耐熱性のいずれもやや悪かった。比較例2では硬化物の低反り性がやや悪かった。比較例3では、硬化物の低反り性、折り曲げ性がやや悪く、はんだ耐熱性が不良となった。
それらの結果から、本発明の硬化性樹脂組成物は、はんだ耐熱性のみならず、折り曲げ性、低反り性も優れた硬化物を形成することが可能であることが判明した。優れた折り曲げ性、低反り性の結果から、フレキシブルプリント配線板へも好適に使用される。
As is clear from Table 1, any of Examples 1 to 8 in which the component (A1) was used and two ethylenically unsaturated group-containing compounds having 5 or more alkylene oxide skeletons were used in combination, the cured product Excellent results were obtained in the evaluation of low warpage, bendability, and solder heat resistance. On the other hand, Comparative Examples 1 and 2 using only one ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons, and Comparative Example 3 containing no component (A1) have insufficient performance. rice field. Specifically, in Comparative Example 1, all of the low warpage property, bendability, and solder heat resistance of the cured product were slightly poor. In Comparative Example 2, the low warpage property of the cured product was slightly poor. In Comparative Example 3, the cured product was slightly inferior in low warpage property and bending property, and poor in solder heat resistance.
From these results, it was found that the curable resin composition of the present invention can form a cured product that is excellent not only in soldering heat resistance but also in bendability and low warpage. Due to its excellent bendability and low warpage, it is also suitable for use in flexible printed wiring boards.
Claims (9)
(B)光重合開始剤と、
(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物と、を含む樹脂組成物であって、
前記(A)成分として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂を含み、
前記(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含み、
前記(A)成分としてさらに、(A2)ビスフェノール型エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有感光性樹脂および(A3)ウレタン骨格を有するカルボキシル基含有樹脂の少なくともいずれか1種を含むことを特徴とする硬化性樹脂組成物。 (A) a carboxyl group-containing resin;
(B) a photoinitiator;
(C) a resin composition containing an ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons,
As the component (A), epoxy resin (A1) is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. Including a carboxyl group-containing photosensitive resin obtained by adding a compound having a saturated group,
At least two ethylenically unsaturated group-containing compounds are included as the component (C),
Further, as the component (A), a carboxyl group-containing photosensitive resin obtained by reacting (A2) a bisphenol type epoxy resin with a carboxylic acid having an ethylenically unsaturated group and reacting the resulting hydroxyl group with an acid anhydride, and ( A3) A curable resin composition comprising at least one carboxyl group-containing resin having a urethane skeleton.
(B)光重合開始剤と、
(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物と、を含む樹脂組成物であって、
前記(A)成分として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂を含み、
前記(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含み、
前記(A)成分100重量部に対し、前記(A1)成分の含有量は10~30重量部であることを特徴とする硬化性樹脂組成物。 (A) a carboxyl group-containing resin;
(B) a photoinitiator;
(C) a resin composition containing an ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons,
As the component (A), epoxy resin (A1) is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. Including a carboxyl group-containing photosensitive resin obtained by adding a compound having a saturated group,
At least two ethylenically unsaturated group-containing compounds are included as the component (C),
A curable resin composition characterized in that the content of component (A1) is 10 to 30 parts by weight per 100 parts by weight of component (A).
(B)光重合開始剤と、
(C)5個以上のアルキレンオキシド骨格を有するエチレン性不飽和基含有化合物と、を含む樹脂組成物であって、
前記(A)成分として、(A1)エポキシ樹脂に、エチレン性不飽和基を有するカルボン酸を反応させ、生成した水酸基に酸無水物を反応させてなるカルボキシル基含有樹脂にグリシジル基とエチレン性不飽和基を有する化合物を付加してなるカルボキシル基含有感光性樹脂を含み、
前記(C)成分として、少なくとも2種のエチレン性不飽和基含有化合物を含み、
さらに、(D)下記一般式(1)の構造を有するエポキシ樹脂を含むことを特徴とする硬化性樹脂組成物。
(式(1)中、Xは、炭素数7以上の脂環式骨格または芳香族骨格を表し、nは0以上の数を表す。) (A) a carboxyl group-containing resin;
(B) a photoinitiator;
(C) a resin composition containing an ethylenically unsaturated group-containing compound having 5 or more alkylene oxide skeletons,
As the component (A), epoxy resin (A1) is reacted with a carboxylic acid having an ethylenically unsaturated group, and the resulting hydroxyl group is reacted with an acid anhydride. Including a carboxyl group-containing photosensitive resin obtained by adding a compound having a saturated group,
At least two ethylenically unsaturated group-containing compounds are included as the component (C),
A curable resin composition further comprising (D) an epoxy resin having a structure represented by the following general formula (1).
(In formula (1), X represents an alicyclic skeleton or aromatic skeleton having 7 or more carbon atoms, and n represents a number of 0 or more.)
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| JP2001247649A (en) | 1999-12-28 | 2001-09-11 | Dainippon Ink & Chem Inc | Photosensitive resin, method for producing the same, and solder resist ink composition |
| JP2017116787A (en) | 2015-12-25 | 2017-06-29 | 三洋化成工業株式会社 | Photosensitive resin composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW494276B (en) * | 1999-05-06 | 2002-07-11 | Solar Blak Water Co Ltd | Solder resist ink composition |
| DE60103529T2 (en) * | 2000-03-29 | 2005-06-02 | Kanagawa University, Yokohama | CURING COMPOSITION THAT IS CURED BY LIGHT AND HEAT, A LIGHT-SENSITIVE DRYER MANUFACTURED FROM THIS PRODUCT, AND METHOD FOR FORMING A PATTERN THEREFOR |
| JP2004062057A (en) * | 2002-07-31 | 2004-02-26 | Showa Denko Kk | Photosensitive thermosetting resin composition and its hardened product |
| CN100482752C (en) * | 2008-01-30 | 2009-04-29 | 深圳市容大电子材料有限公司 | Light sensitive anti-solder ink composition, application and circuit board containing the same |
| JP5377020B2 (en) * | 2009-03-23 | 2013-12-25 | 太陽ホールディングス株式会社 | Photo-curable thermosetting resin composition, dry film and cured product thereof, and printed wiring board using them |
| KR102493938B1 (en) * | 2015-01-28 | 2023-01-30 | 고오 가가쿠고교 가부시키가이샤 | Method for producing carboxyl group-containing resin, photosensitive resin composition, dry film, printed wiring board, and carboxyl group-containing resin |
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2017
- 2017-12-27 CN CN201711447768.3A patent/CN109970953B/en active Active
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- 2018-08-15 JP JP2020535591A patent/JP7248682B2/en active Active
- 2018-08-15 WO PCT/CN2018/100676 patent/WO2019128257A1/en not_active Ceased
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001247649A (en) | 1999-12-28 | 2001-09-11 | Dainippon Ink & Chem Inc | Photosensitive resin, method for producing the same, and solder resist ink composition |
| JP2017116787A (en) | 2015-12-25 | 2017-06-29 | 三洋化成工業株式会社 | Photosensitive resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109970953A (en) | 2019-07-05 |
| WO2019128257A1 (en) | 2019-07-04 |
| JP2021508849A (en) | 2021-03-11 |
| PH12020550991A1 (en) | 2021-04-19 |
| CN109970953B (en) | 2021-04-09 |
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