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JP7292913B2 - Vacuum device, Conveyor, Alignment method - Google Patents
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JP7292913B2 - Vacuum device, Conveyor, Alignment method - Google Patents

Vacuum device, Conveyor, Alignment method Download PDF

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JP7292913B2
JP7292913B2 JP2019059096A JP2019059096A JP7292913B2 JP 7292913 B2 JP7292913 B2 JP 7292913B2 JP 2019059096 A JP2019059096 A JP 2019059096A JP 2019059096 A JP2019059096 A JP 2019059096A JP 7292913 B2 JP7292913 B2 JP 7292913B2
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mask
substrate
frame
power receiving
terminal
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JP2020158829A (en
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裕利 中尾
泰樹 西ノ坊
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Ulvac Inc
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Ulvac Inc
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Description

本発明は、基板とマスクとを固定させる運搬装置と、その運搬装置を有する真空装置に関する。 The present invention relates to a carrier for fixing a substrate and a mask, and a vacuum apparatus having the carrier.

従来、基板とマスクとを機械式のクランプ装置を利用し、水平あるいは垂直に配置してマスクに形成された開口パターンの形状の薄膜を基板表面に形成する技術が多用されていた。 Conventionally, a technique has been widely used in which a substrate and a mask are arranged horizontally or vertically using a mechanical clamping device to form a thin film in the shape of an opening pattern formed in the mask on the surface of the substrate.

また基板の大型化に伴い、装置の設置面積も大きくなり過ぎることから、基板を縦型に配置して搬送し、薄膜を形成する技術が主流になってきた。 In addition, as the size of the substrate increases, the installation area of the apparatus becomes too large. Therefore, the technique of forming a thin film by arranging the substrate vertically and transporting it has become mainstream.

ここでの課題として、水平搬送時も発生するが、特に縦型に配置された基板とマスクとを位置合わせしての搬送を行うと、位置合わせ後に位置がずれる問題の発生確率が上昇するため、基板とマスクとを互いに固定して位置合わせの状態を維持するクランプ装置などが必須となる。 As a problem here, although it also occurs during horizontal transport, the probability of occurrence of the problem of misalignment after alignment increases, especially when transporting the vertically arranged substrate and mask while aligning them. , a clamping device for fixing the substrate and the mask to each other and maintaining the aligned state is essential.

しかしながらクランプ装置を取り付けた状態で薄膜を形成すると、クランプ装置にも薄膜が堆積し、真空雰囲気中のダスト発生の原因となる。 However, if the thin film is formed while the clamping device is attached, the thin film is also deposited on the clamping device, causing dust to be generated in the vacuum atmosphere.

また、基板とマスクとを機械式のクランプにてクランプする場合は垂直抗力の時間変化量の制御が難しい事、またクランプ固定時に発生する摩擦力と拮抗する、基板あるいはマスク平面面積部にて発生する水平方向の熱応力(主に成膜と搬送工程での温度差が起因となる)がクランプ接触点部位に応力集中をもたらす場合はダスト発生が問題となる。この力が基板に印加される場合は、基板の欠け、ひび割れの原因となり、また、基板とマスクの相対位置を位置合わせした結果の相対位置で保持することが困難であり、これらの解決が望まれている。 In addition, when the substrate and mask are clamped with a mechanical clamp, it is difficult to control the amount of change in vertical force over time. Dust generation becomes a problem when horizontal thermal stress (mainly caused by the temperature difference between deposition and transport) causes stress concentration at the clamp contact point. If this force is applied to the substrate, it may cause chipping or cracking of the substrate, and it is difficult to maintain the relative positions of the substrate and the mask after aligning them. It is rare.

特開平10-328959号公報JP-A-10-328959

本発明は上記従来技術の不都合を解決するために創作されたものであり、その目的は、吸着状体を維持するのに電力を必要とせず、ダストが発生せず、また、基板とマスクを相対固定しつつ基板に欠けや割れが発生せず、任意の基板-マスク相対位置で固定する技術を提供することにある。 The present invention has been created to solve the above-mentioned disadvantages of the prior art. To provide a technique for fixing a substrate and a mask at an arbitrary relative position without causing chipping or cracking of the substrate while relatively fixing the substrate.

上記課題を解決するために本発明は、真空排気される真空槽と、マスクが配置されるマスク用枠体が設けられたマスク配置装置と、基板が配置される基板用枠体が設けられた基板配置装置と、を有し、前記マスク配置装置に配置された前記マスクと前記基板配置装置に配置された前記基板とが対面した状態で前記マスク用枠体と前記基板用枠体とが前記真空槽の内部で固定される真空装置であって、被吸着部と、前記被吸着部を磁気吸引する吸着部と、を有し、前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に前記被吸着部が設けられ、他方の枠体に前記吸着部が設けられ、前記吸着部は、前記マスク配置装置と前記基板配置装置とが対面したときに、前記被吸着部を磁気吸引して前記基板用枠体と前記マスク用枠体とを固定する吸着状態と、前記磁気吸引の力が前記吸着状態よりも弱化されて前記基板用枠体と前記マスク用枠体とが分離できるようにされた解除状態との、いずれの状態にもすることが可能であり、前記吸着部は、前記被吸着部を磁気吸引する磁界を形成する永久磁石部と、磁芯に磁気コイルが巻き回され、前記磁気コイルに所定の大きさの解除電流が流されると、前記吸着部が前記被吸着部を磁気吸引する前記磁界が弱化されて前記吸着状態が前記解除状態に移行される電磁石部と、を有する真空装置である。
本発明は、前記磁芯の一端は、前記吸着状態では磁気吸引する前記被吸着部に向けられており、前記吸着部には、一部が前記磁芯の他端側に位置し、先端が前記磁芯の一端と同じ方向に向けられたヨーク部が設けられ、前記被吸着部は、前記磁芯の一端と対面する第一の被吸着部と、前記ヨーク部の先端と対面する第二の被吸着部とを有し、前記永久磁石部のN極とS極のうちのいずれか一方の極性の磁極は前記磁芯の前記他端に向けられ、前記永久磁石部の他方の極性の磁極は前記ヨーク部の底面部に向けられた真空装置である。
本発明は、前記吸着部は前記マスク用枠体に設けられ、前記マスク配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される真空装置である。
本発明は、前記マスク配置装置が着脱自在に配置される着脱部が前記真空槽内に設けられ、前記着脱部には、前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる真空装置である。
本発明は、前記吸着部は前記基板用枠体に設けられ、前記基板配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される真空装置である。
本発明は、前記基板配置装置が着脱自在に配置される着脱部が前記真空槽内に設けられ、前記着脱部には、前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる真空装置である。
本発明は、前記第一の受電端子と前記第一の給電端子のうち、いずれか一方の電極には第一の弾性部が設けられ、前記第一の受電端子と前記第一の給電端子とが接触しながら前記第一の弾性部が変形され、前記第二の受電端子と前記第二の給電端子のうち、いずれか一方の電極には第二の弾性部が設けられ、前記第二の受電端子と前記第二の給電端子とが接触しながら前記第二の弾性部が変形され、前記第一の弾性部の復元力によって前記第一の受電端子と前記第一の給電端子とが互いに押しつけられ、前記第二の弾性部の復元力によって前記第二の受電端子と前記第二の給電端子とが互いに押しつけられる真空装置である。
本発明は、前記解除電流の大きさを制御する電流制御回路を有する真空装置である。
本発明は、前記吸着状態では、前記被吸着部と前記吸着部とは、離間して対面する真空装置である。
本発明は、マスクが配置されるマスク用枠体が設けられたマスク配置装置と、基板が配置される基板用枠体が設けられた基板配置装置と、を有し、前記マスク配置装置に配置された前記マスクと前記基板配置装置に配置された前記基板とが対面した状態で前記マスク用枠体と前記基板用枠体とが固定される運搬装置であって、被吸着部と、前記被吸着部を磁気吸引する吸着部と、を有し、前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に前記被吸着部が設けられ、他方の枠体に前記吸着部が設けられ、前記吸着部は、前記マスク配置装置と前記基板配置装置とが対面したときに、前記被吸着部を磁気吸引して前記基板用枠体と前記マスク用枠体とを固定する吸着状態と、前記磁気吸引の力が前記吸着状態よりも弱化されて前記基板用枠体と前記マスク用枠体とが分離できるようにされた解除状態との、いずれの状態にもすることが可能であり、前記吸着部は、前記被吸着部を磁気吸引する磁界を形成する永久磁石部と、磁芯に磁気コイルが巻き回され、前記磁気コイルに所定の大きさの解除電流が流されると、前記吸着部が前記被吸着部を磁気吸引する前記磁界が弱化されて前記吸着状態が前記解除状態に移行される電磁石部と、を有する運搬装置である。
本発明は、前記磁芯の一端は、前記吸着状態では磁気吸引する前記被吸着部に向けられており、前記吸着部には、一部が前記磁芯の他端側に位置し、先端が前記磁芯の一端と同じ方向に向けられたヨーク部が設けられ、前記被吸着部は、前記磁芯の一端と対面する第一の被吸着部と、前記ヨーク部の先端と対面する第二の被吸着部とを有し、前記永久磁石部のN極とS極のうちのいずれか一方の極性の磁極は前記磁芯の前記他端に向けられ、前記永久磁石部の他方の極性の磁極は前記ヨーク部の底面部に向けられた運搬装置である。
本発明は、前記吸着部は前記マスク用枠体に設けられ、前記マスク配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される運搬装置である。
本発明は、真空槽内に設けられ、前記マスク配置装置が着脱自在に配置される着脱部に前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる運搬装置である。
本発明は、前記吸着部は前記基板用枠体に設けられ、前記基板配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される運搬装置である。
本発明は、真空槽内に設けられ、前記基板配置装置が着脱自在に配置される移動装置に前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる運搬装置である。
本発明は、前記吸着状態では、前記被吸着部と前記吸着部とは、離間して対面する運搬装置である。
本発明は、マスクが配置されたマスク用枠体を有するマスク配置装置と、基板が配置された基板用枠体を有する基板配置装置とを相対的に移動させ、前記マスクと前記基板との位置合わせを行う位置合わせ工程と、前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に設けられた吸着部が有する永久磁石部が形成する磁界によって、他方の枠体に設けられた被吸着部を磁気吸引して前記マスク用枠体と前記基板用枠体とを互いに固定して、前記マスクと前記基板とを相対的に固定させる固定工程と、前記マスクと前記基板とを相対的に固定した状態で前記マスク配置装置と前記基板配置装置とを一緒に移動させる移動工程と、を有するアラインメント方法であって、前記位置合わせ工程では、前記吸着部の前記磁気吸引する力を前記吸着部に設けられた電磁石部に解除電流を流して弱化させ、前記固定工程では、前記解除電流を停止させるアラインメント方法である。
本発明は、前記電磁石部に流れる電流を漸減させて前記解除電流を停止させるアラインメント方法である。
本発明は、前記吸着部が前記被吸着部を磁気吸引する力を弱化させる電流の値と前記マスク配置装置の温度との関係を求めて記憶しておき、前記マスク配置装置の温度を測定し、測定した温度に対応する値の電流を前記解除電流として前記電磁石部に流すアラインメント方法である。
In order to solve the above-mentioned problems, the present invention is provided with a vacuum chamber to be evacuated, a mask placement device provided with a mask frame on which a mask is placed, and a substrate frame on which a substrate is placed. a substrate arranging device, wherein the mask frame and the substrate frame are arranged in a state in which the mask arranged in the mask arranging device and the substrate arranged in the substrate arranging device face each other; A vacuum device fixed inside a vacuum chamber, comprising a suction portion and a suction portion for magnetically attracting the suction portion, wherein the mask frame and the substrate frame include: One of the frames is provided with the sucked portion, and the other frame is provided with the sucking portion. an attraction state in which the substrate frame and the mask frame are fixed by magnetically attracting an attraction portion; and an attraction state in which the force of magnetic attraction is weakened compared to the attraction state and the substrate frame and the mask frame. The attracting portion can be in either of a released state in which the body can be separated from the body, and the attracting portion includes a permanent magnet portion forming a magnetic field for magnetically attracting the attracting portion, and a magnetic core. When a release current of a predetermined magnitude is passed through the magnetic coil, the magnetic field that causes the attracting portion to magnetically attract the attracted portion is weakened, and the attracted state changes to the released state. and a transferred electromagnet.
According to the present invention, one end of the magnetic core is directed toward the attracted portion that is magnetically attracted in the attracted state, and a portion of the attracted portion is positioned on the other end side of the magnetic core, and a tip end of the magnetic core. A yoke portion directed in the same direction as one end of the magnetic core is provided, and the attracted portion includes a first attracted portion facing one end of the magnetic core and a second attracted portion facing the tip of the yoke portion. one of the N pole and S pole of the permanent magnet portion is directed to the other end of the magnetic core, and the other polarity of the permanent magnet portion is directed to the other end of the magnetic core. A magnetic pole is a vacuum device directed toward the bottom portion of the yoke portion.
In the present invention, the attracting portion is provided on the mask frame, and the mask placement device includes a first power receiving terminal electrically connected to one end of the magnetic coil and a power receiving terminal connected to the other end of the magnetic coil. and a second power receiving terminal electrically connected to each other, wherein a voltage applied between the first power receiving terminal and the second power receiving terminal causes a current to flow through the magnetic coil. be.
In the present invention, an attachment/detachment section in which the mask placement device is detachably arranged is provided in the vacuum chamber, and the attachment/detachment section includes a first power receiving terminal which can be brought into contact with and separated from the first power receiving terminal. and a second power supply terminal that can be brought into contact with and separated from the second power reception terminal, and the first power reception terminal and the first power supply terminal are electrically connected while they are in contact with each other. the second power receiving terminal and the second power supply terminal are electrically connected during contact, and the voltage applied between the first power supply terminal and the second power supply terminal is a vacuum device through which the release current flows.
In the present invention, the attraction part is provided on the substrate frame, and the substrate placement device includes a first power receiving terminal electrically connected to one end of the magnetic coil and a power receiving terminal connected to the other end of the magnetic coil. and a second power receiving terminal electrically connected to each other, wherein a voltage applied between the first power receiving terminal and the second power receiving terminal causes a current to flow through the magnetic coil. be.
In the present invention, an attachment/detachment section in which the substrate placement device is detachably arranged is provided in the vacuum chamber, and the attachment/detachment section includes a first power receiving terminal which can be brought into contact with and separated from the first power receiving terminal. and a second power supply terminal that can be brought into contact with and separated from the second power reception terminal, and the first power reception terminal and the first power supply terminal are electrically connected while they are in contact with each other. the second power receiving terminal and the second power supply terminal are electrically connected during contact, and the voltage applied between the first power supply terminal and the second power supply terminal is a vacuum device through which the release current flows.
In the present invention, one of the first power receiving terminal and the first power feeding terminal is provided with a first elastic portion, and the first power receiving terminal and the first power feeding terminal are connected to each other. The first elastic portion is deformed while the contacts are in contact with each other, and the second elastic portion is provided to either one of the second power receiving terminal and the second power feeding terminal, and the second The second elastic portion is deformed while the power receiving terminal and the second power feeding terminal are in contact with each other, and the restoring force of the first elastic portion causes the first power receiving terminal and the first power feeding terminal to mutually move. In the vacuum device, the second power receiving terminal and the second power feeding terminal are pressed against each other by the restoring force of the second elastic portion.
The present invention is a vacuum apparatus having a current control circuit for controlling the magnitude of the release current.
The present invention is a vacuum device in which, in the suction state, the suctioned portion and the suction portion face each other while being separated from each other.
The present invention includes a mask placement device provided with a mask frame on which a mask is placed, and a substrate placement device provided with a substrate frame on which a substrate is placed, and a mask is placed on the mask placement device. a transporting device in which the mask frame and the substrate frame are fixed in a state in which the mask placed on the substrate and the substrate placed in the substrate placement device are opposed to each other; and a suction portion that magnetically attracts the suction portion, wherein the suction portion is provided on one of the mask frame and the substrate frame, and the suction portion is provided on the other frame. A suction unit is provided, and the suction unit magnetically attracts the suctioned portion to fix the substrate frame and the mask frame when the mask placement device and the substrate placement device face each other. and a released state in which the force of the magnetic attraction is weakened compared to the attracted state so that the substrate frame and the mask frame can be separated from each other. The attraction part includes a permanent magnet part that forms a magnetic field for magnetically attracting the part to be attracted, and a magnetic coil wound around a magnetic core. and an electromagnet unit that weakens the magnetic field that causes the attracting unit to magnetically attract the attracting unit and shifts the attracting state to the releasing state when the attracting unit is engaged with the attracting unit.
According to the present invention, one end of the magnetic core is directed toward the attracted portion that is magnetically attracted in the attracted state, and a portion of the attracted portion is positioned on the other end side of the magnetic core, and a tip end of the magnetic core. A yoke portion directed in the same direction as one end of the magnetic core is provided, and the attracted portion includes a first attracted portion facing one end of the magnetic core and a second attracted portion facing the tip of the yoke portion. one of the N pole and S pole of the permanent magnet portion is directed to the other end of the magnetic core, and the other polarity of the permanent magnet portion is directed to the other end of the magnetic core. A magnetic pole is a carrying device directed toward the bottom portion of the yoke portion.
In the present invention, the attracting portion is provided on the mask frame, and the mask placement device includes a first power receiving terminal electrically connected to one end of the magnetic coil and a power receiving terminal connected to the other end of the magnetic coil. and an electrically connected second power receiving terminal, wherein a voltage applied between the first power receiving terminal and the second power receiving terminal causes current to flow through the magnetic coil. be.
The present invention includes a first power supply terminal which is provided in a vacuum chamber and which can be brought into contact with and separated from the first power reception terminal at an attachment/detachment portion in which the mask placement device is detachably arranged, and the second power reception terminal. A second power supply terminal that can be brought into contact with and separated from the two power reception terminals is provided, the first power reception terminal and the first power supply terminal are electrically connected during contact, and The two power receiving terminals and the second power supply terminal are electrically connected during contact, and the voltage applied between the first power supply terminal and the second power supply terminal causes the release current to flow. It is a transport device.
In the present invention, the attraction part is provided on the substrate frame, and the substrate placement device includes a first power receiving terminal electrically connected to one end of the magnetic coil and a power receiving terminal connected to the other end of the magnetic coil. and an electrically connected second power receiving terminal, wherein a voltage applied between the first power receiving terminal and the second power receiving terminal causes current to flow through the magnetic coil. be.
The present invention is provided in a vacuum chamber and provided in a moving device on which the substrate arranging device is detachably arranged; A second power supply terminal that can be brought into contact with and separated from the two power reception terminals is provided, the first power reception terminal and the first power supply terminal are electrically connected during contact, and The two power receiving terminals and the second power supply terminal are electrically connected during contact, and the release current flows due to the voltage applied between the first power supply terminal and the second power supply terminal. It is a transport device.
The present invention is a conveying device in which the part to be sucked and the part to be sucked face each other while being separated from each other in the sucked state.
According to the present invention, a mask arranging device having a mask frame on which a mask is arranged and a substrate arranging device having a substrate frame on which a substrate is arranged are moved relative to each other. A positioning step of performing alignment, and a magnetic field formed by a permanent magnet portion of an attracting portion provided in one of the mask frame and the substrate frame causes the other frame to move. a fixing step of fixing the mask frame and the substrate frame to each other by magnetically attracting a portion to be attracted provided in the mask and fixing the mask and the substrate relative to each other; a moving step of moving together the mask arranging device and the substrate arranging device in a state in which the substrate is relatively fixed, wherein in the alignment step, the magnetic attraction of the attracting portion In the alignment method, a release current is applied to the electromagnet section provided in the attracting section to weaken the force, and the release current is stopped in the fixing step.
The present invention is an alignment method for stopping the release current by gradually decreasing the current flowing through the electromagnet section.
According to the present invention, the temperature of the mask placement device is measured by obtaining and storing the relationship between the value of the current that weakens the force of the adsorption portion magnetically attracting the portion to be adsorbed and the temperature of the mask placement device. 2) an alignment method in which a current having a value corresponding to the measured temperature is passed through the electromagnet unit as the release current;

通電がされない状態で磁力が発生しており、基板とマスクとを密着させた状態に維持するため、基板とマスクとを固定する際の電力は不要である。基板用枠体がマスク用枠体に磁気吸引されると、通電が停止しても基板が落下する虞が無い。 A magnetic force is generated in the absence of energization, and the substrate and the mask are maintained in close contact with each other. Therefore, electric power is not required when fixing the substrate and the mask. When the substrate frame is magnetically attracted to the mask frame, there is no possibility that the substrate will drop even if the current is stopped.

電磁石部に流れる電流を漸減させることができるので、急激に変化する力が基板やマスクに印加されず、基板の欠けやひび割れは発生しない。 Since the current flowing through the electromagnet portion can be gradually decreased, a rapidly changing force is not applied to the substrate and the mask, and chipping and cracking of the substrate do not occur.

また、電磁石部に流れる電流を制御できるので、温度に応じて解除電流の値を変更することができる。 Also, since the current flowing through the electromagnet can be controlled, the value of the release current can be changed according to the temperature.

クランプ部を設ける必要が無いので、クランプ部に薄膜が形成されることはなく、ダストは発生しない。 Since there is no need to provide a clamping portion, no thin film is formed on the clamping portion and no dust is generated.

本発明の真空装置が設けられた成膜装置を説明するための図A diagram for explaining a film forming apparatus provided with a vacuum apparatus of the present invention. 本発明の真空装置の内部とアラインメント動作とを説明するための内部概略図(1)Internal schematic diagram (1) for explaining the interior and alignment operation of the vacuum apparatus of the present invention 本発明の真空装置の内部とアラインメント動作とを説明するための内部概略図(2)Internal schematic diagram (2) for explaining the interior and alignment operation of the vacuum device of the present invention 本発明の真空装置の内部とアラインメント動作とを説明するための内部概略図(3)Internal schematic diagram (3) for explaining the interior and alignment operation of the vacuum device of the present invention 本発明の真空装置の内部とアラインメント動作とを説明するための内部概略図(4)Internal schematic diagram (4) for explaining the interior and alignment operation of the vacuum device of the present invention 真空処理装置を説明するための図Diagram for explaining a vacuum processing apparatus (a):基板配置装置のA-A線截断断面図 (b):その正面図(a): AA cross-sectional view of the board placement device (b): Front view thereof (a):基板が配置された基板配置装置のA-A線截断断面図 (b):その正面図(a): AA sectional view of the board placement device in which the board is placed (b): Front view thereof (a):マスク配置装置の正面図 (b):そのB-B線截断断面図(a): Front view of the mask placement device (b): Its BB cutaway cross-sectional view 吸着部とその付近の拡大断面図Enlarged cross-sectional view of the suction part and its vicinity 基板用枠体を磁気吸着した吸着部とその付近の拡大断面図Enlarged cross-sectional view of a chucking portion magnetically chucking a substrate frame and its vicinity 離間した給電部と受電部とそれらの付近の拡大断面図Enlarged cross-sectional view of the separated power supply unit, power reception unit, and their vicinity 端子が接続された給電部と受電部とそれらの付近の拡大断面図Enlarged cross-sectional view of power supply unit and power reception unit with terminals connected and their vicinity 基板用枠体が磁気吸着された状態の給電部と受電部とそれらの付近の拡大断面図Enlarged cross-sectional view of the power supply unit, the power reception unit, and their vicinity in a state where the substrate frame is magnetically attracted. 基板用枠体が磁気吸着された状態で離間した給電部と受電部とそれらの付近の拡大断面図Enlarged cross-sectional view of the power supply unit and the power reception unit separated from each other with the substrate frame magnetically attracted, and the vicinity thereof 基板配置装置に吸着装置が設けられた場合の例を説明するための図FIG. 4 is a diagram for explaining an example in which a suction device is provided in the substrate placement device; 給電回路とコイルの接続の一例を示すブロック図Block diagram showing an example of the connection between the power supply circuit and the coil 電磁石に流れる電流の経時変化を説明するためのグラフGraph for explaining changes over time in the current flowing through the electromagnet (a):吸着部の正面図 (b):第一、第二の被吸着部の正面図(a): Front view of the suction part (b): Front view of the first and second suction parts

図1の符号2は成膜装置であり、搬入装置75aと、本発明の一例の真空装置12と、処理装置13と、搬出装置75bとを有している。 Reference numeral 2 in FIG. 1 denotes a film forming apparatus, which includes a loading device 75a, a vacuum device 12 as an example of the present invention, a processing device 13, and an unloading device 75b.

搬入装置75aと、真空装置12と、処理装置13と、搬出装置75bとは、真空バルブ76~78によってこの順序でそれぞれ接続されており、真空バルブ76~78を開閉すると、各装置75a、12、13,75bの間の連通と遮断とを制御できるようになっている。 The loading device 75a, the vacuum device 12, the processing device 13, and the unloading device 75b are connected in this order by vacuum valves 76 to 78, respectively. , 13 and 75b can be controlled.

各装置75a、12、13、75bには、真空排気装置70~73がそれぞれ接続されており、真空バルブ76~78を閉じた状態で真空排気装置70~73を動作させると各装置75a、12、13,75bがそれぞれ個別に真空排気され、各装置75a、12、13,75bの内部に真空雰囲気が形成される。 Each device 75a, 12, 13, 75b is connected to an evacuation device 70 to 73, respectively. , 13 and 75b are individually evacuated to form a vacuum atmosphere inside each device 75a, 12, 13 and 75b.

<真空装置>
図2は、真空装置12の内部を示す概略図である。真空装置12は真空槽21を有している。真空槽21の内部には後述するマスク配置装置が配置される着脱部25が設けられている。
<Vacuum device>
FIG. 2 is a schematic diagram showing the inside of the vacuum device 12. As shown in FIG. The vacuum device 12 has a vacuum chamber 21 . Inside the vacuum chamber 21, an attachment/detachment section 25 is provided in which a mask placement device, which will be described later, is placed.

図9(a)、(b)の符号30はマスク配置装置を示しており、マスク配置装置30は、マスク用枠体31と、マスク用枠体31の中央に設けられたマスク用窓部34とを有している。図9(a)はマスク配置装置30の正面図であり、図9(b)はそのB-B線截断断面図である。 Reference numeral 30 in FIGS. 9(a) and 9(b) denotes a mask placement device, and the mask placement device 30 includes a mask frame 31 and a mask window 34 provided in the center of the mask frame 31. and FIG. 9(a) is a front view of the mask placement device 30, and FIG. 9(b) is a sectional view taken along the line BB.

マスク用枠体31の内側にはマスク15が配置されており、マスク15はマスク用枠体31に溶接等で固定されている。
マスク配置装置30では、不図示の保持装置により、略鉛直の立設姿勢にされた状態でもマスク15がマスク配置装置30から脱落しない。
A mask 15 is arranged inside the mask frame 31, and the mask 15 is fixed to the mask frame 31 by welding or the like.
In the mask arranging device 30, the mask 15 does not drop off from the mask arranging device 30 even in a substantially vertical standing position by means of a holding device (not shown).

マスク15とマスク用枠体31とは、一緒に鉛直又は水平に配置されても良いし、マスク15とマスク用枠体31とを、小さい角度で傾けてもよい。 The mask 15 and the mask frame 31 may be arranged vertically or horizontally together, or the mask 15 and the mask frame 31 may be tilted at a small angle.

マスク15は所定パターンの貫通口が形成された金属薄板であり、マスク15の表面とマスク用枠体31の表面とは同じ平面上に位置しており、マスク15の表面はマスク用枠体31の表面とともに露出されており、マスク15の裏面はマスク用窓部34の底面に露出されている。 The mask 15 is a thin metal plate having through holes of a predetermined pattern. The surface of the mask 15 and the surface of the mask frame 31 are located on the same plane. , and the back surface of the mask 15 is exposed at the bottom surface of the mask window 34 .

次に、図7(a)、(b)の符号42は基板配置装置であり、基板用枠体41と、基板用枠体41に設けられた基板用窓部44とを有している。基板用窓部44は貫通孔であり、その周囲には真空処理の対象である基板を配置するための突起又は突条から成る基板保持部43が設けられている。図7(a)、図8(a)は、図7(b)、図8(b)のA-A線截断断面図である。図8(a)、(b)は、基板保持部43に基板16が配置された状態が示されており、基板16の表面と裏面とは露出されている。 Next, reference numeral 42 in FIGS. 7(a) and 7(b) denotes a substrate placement device, which has a substrate frame 41 and a substrate window 44 provided in the substrate frame 41. As shown in FIG. The substrate window portion 44 is a through hole, and a substrate holding portion 43 consisting of a protrusion or a ridge for placing a substrate to be vacuum-processed is provided around the window portion 44 . 7(a) and 8(a) are cross-sectional views taken along line AA of FIGS. 7(b) and 8(b). 8A and 8B show a state in which the substrate 16 is placed on the substrate holding portion 43, and the front and back surfaces of the substrate 16 are exposed.

図3には、マスク15が配置されたマスク配置装置30が略鉛直の立設姿勢にされた状態で着脱部25に配置された状態が示されている。 FIG. 3 shows a state in which the mask placement device 30 with the mask 15 placed thereon is placed in the attachment/detachment section 25 in a substantially vertical standing posture.

図9(a)、(b)に示されたように、マスク用枠体31の表面には複数個の有底の配置孔381~384が設けられており、各配置孔381~384の中には、吸着部321~324が一個ずつ配置されている。吸着部321~324の中には、後述する解除電流の値を決めるための温度測定器40が設けられており、吸着部321~324の温度を検出し、検出した信号を制御装置26に出力し、温度測定器40と制御装置26とによって、吸着部321~324の温度を測定できるようにされている。 As shown in FIGS. 9(a) and 9(b), a plurality of bottomed arrangement holes 38 1 to 38 4 are provided on the surface of the mask frame 31, and each arrangement hole 38 1 to Each of the adsorption units 32 1 to 32 4 is arranged in 38 4 . A temperature measuring device 40 for determining the release current value, which will be described later, is provided in each of the attracting portions 32 1 to 32 4 , detects the temperature of the attracting portions 32 1 to 32 4 , and controls the detected signal. The temperature of the adsorption portions 32 1 to 32 4 can be measured by the temperature measuring device 40 and the control device 26 by outputting to the device 26 .

図10は、一個の吸着部321の図9(a)のB-B線截断断面図に相当する図面であり、他の吸着部322~324も同じ構造なので、吸着部321~324に関し、一個の吸着部321で説明を代表させる。 FIG . 10 is a drawing corresponding to a sectional view cut along the line BB in FIG . Regarding 32 4 , the description will be representative of one adsorption unit 32 1 .

吸着部321は、永久磁石部17と電磁石部14とヨーク部35とを有している。 The attracting portion 32 1 has a permanent magnet portion 17 , an electromagnet portion 14 and a yoke portion 35 .

電磁石部14は柱状の磁芯36と、筒状の磁気コイル18とを有しており、磁芯36は磁気コイル18の中に挿通されている。磁気コイル18は磁芯36の周囲を巻き回す巻線である。 The electromagnet section 14 has a columnar magnetic core 36 and a tubular magnetic coil 18 , and the magnetic core 36 is inserted through the magnetic coil 18 . The magnetic coil 18 is a winding wound around a magnetic core 36 .

磁気コイル18と磁芯36とは、それらの中心軸線が、マスク用枠体31に配置されるマスク15の表面に対して垂直になるように配置されており、磁気コイル18の一端と磁芯36の一端とは、配置孔381の開口33よりも配置孔381の底面側に位置した状態で、マスク配置装置30と対面配置される基板配置装置42の基板用枠体41に向けられている。 The magnetic coil 18 and the magnetic core 36 are arranged such that their central axes are perpendicular to the surface of the mask 15 arranged on the mask frame 31, and one end of the magnetic coil 18 and the magnetic core The one end of 36 is directed toward the substrate frame 41 of the substrate arranging device 42 arranged to face the mask arranging device 30 in a state positioned closer to the bottom surface of the arranging hole 38 1 than the opening 33 of the arranging hole 38 1 . ing.

磁芯36の他端には、磁芯36よりも大径の拡大部37が設けられている。ここでは、拡大部37は板状であり、磁芯36の他端が拡大部37と一体に形成されているが、拡大部37と磁芯36とは別々に形成してもよい。 An enlarged portion 37 having a larger diameter than the magnetic core 36 is provided at the other end of the magnetic core 36 . Here, the enlarged portion 37 is plate-shaped, and the other end of the magnetic core 36 is formed integrally with the enlarged portion 37, but the enlarged portion 37 and the magnetic core 36 may be formed separately.

拡大部37を中央に位置させた場合は、永久磁石部17が配置された側の面は、マスク15が配置された面とは反対側の面に配置されている。 When the enlarged portion 37 is positioned at the center, the surface on which the permanent magnet portion 17 is arranged is arranged on the surface opposite to the surface on which the mask 15 is arranged.

拡大部37側を永久磁石部17の表面とすると、永久磁石部17の裏面側と配置孔381の底面との間には、ヨーク部35の一部が配置されている。 Assuming that the enlarged portion 37 side is the surface of the permanent magnet portion 17, a portion of the yoke portion 35 is arranged between the rear surface side of the permanent magnet portion 17 and the bottom surface of the arrangement hole 381 .

ヨーク部35は、有底筒形形状又はコ字形形状であり、底面部35aが永久磁石部17の裏面側と配置孔381の底面との間に配置され、底面部35aと垂直に配置された側面部35bが、磁気コイル18の側面と配置孔381の側面との間に配置されている。 The yoke portion 35 has a cylindrical shape with a bottom or a U-shape, and the bottom portion 35a is arranged between the back side of the permanent magnet portion 17 and the bottom surface of the arrangement hole 38 1 , and is arranged perpendicular to the bottom portion 35a. The side surface portion 35b is arranged between the side surface of the magnetic coil 18 and the side surface of the placement hole 38 1 .

ここでは、ヨーク部35は有底筒形形状であり、側面部35bの下端側は底面部35aと接触しており、上端側はヨーク部35の先端を構成する。 Here, the yoke portion 35 has a cylindrical shape with a bottom.

磁芯36の一端とヨーク部35の先端とは、配置孔381の開口33よりも底面部35a側に位置し、配置孔381の開口33に向けられており、磁芯36の一端も開口33に向けられて先端となり、ヨーク部35の先端と磁芯36の先端とは、同じ方向に向けられている。 One end of the magnetic core 36 and the tip of the yoke portion 35 are positioned closer to the bottom surface portion 35a than the opening 33 of the placement hole 38 1 and are directed toward the opening 33 of the placement hole 38 1 . The tip of the yoke portion 35 and the tip of the magnetic core 36 are oriented in the same direction.

磁芯36と拡大部37とヨーク部35とは、透磁率が高く、且つ、保磁力が小さい軟質磁性体で構成されており、永久磁石部17の表面は拡大部37に接触され、裏面はヨーク部35の底面部35aに接触されている。 The magnetic core 36, the enlarged portion 37, and the yoke portion 35 are made of a soft magnetic material having a high magnetic permeability and a small coercive force. It is in contact with the bottom surface portion 35 a of the yoke portion 35 .

永久磁石部17の二個の磁極のうち、拡大部37側に向けられた方の磁極がN極の場合は、N極から放出された磁力線は、拡大部37の中と、磁芯36の中とを通って、磁芯36の先端から吸着部321の外部に放出され、ヨーク部35の先端からヨーク部35の中に入り、永久磁石部17のS極に戻る。 Of the two magnetic poles of the permanent magnet portion 17 , when the magnetic pole directed toward the enlarged portion 37 is the N pole, the magnetic lines of force emitted from the N pole are directed to the inside of the enlarged portion 37 and the magnetic core 36 . It passes through the inside, is released from the tip of the magnetic core 36 to the outside of the attracting portion 32 1 , enters the yoke portion 35 from the tip of the yoke portion 35 , and returns to the S pole of the permanent magnet portion 17 .

永久磁石部17の二個の磁極のうち、底面部35a側に向けられた方がN極の場合の磁極は、これとは逆の順序になる。 Of the two magnetic poles of the permanent magnet portion 17, the magnetic poles are arranged in the opposite order when the one directed toward the bottom portion 35a is the N pole.

いずれの場合も、永久磁石部17によって磁芯36の先端とヨーク部35の先端の間に、強磁性体を吸着する吸着磁界が形成される。 In either case, the permanent magnet portion 17 forms an attraction magnetic field between the tip of the magnetic core 36 and the tip of the yoke portion 35 to attract the ferromagnetic material.

吸着部321~324はマスク用枠体31の四隅に配置されており、マスク15の大きさは、マスク15の四辺が吸着部321~324の内側に位置するように配置されている。 The suction portions 32 1 to 32 4 are arranged at the four corners of the mask frame 31, and the size of the mask 15 is such that the four sides of the mask 15 are positioned inside the suction portions 32 1 to 32 4 . there is

鉛直姿勢のマスク用枠体31の下端には受電部8が設けられており、図12に示すように着脱部25には給電部9が設けられている。 A power receiving portion 8 is provided at the lower end of the mask frame 31 in a vertical posture, and a power feeding portion 9 is provided at the attaching/detaching portion 25 as shown in FIG.

図12は、マスク15が配置された鉛直姿勢のマスク配置装置30が、着脱部25に配置される前の状態であり、受電部8と給電部9とは離間されている。 FIG. 12 shows a state before the mask placement device 30 in the vertical posture with the mask 15 placed thereon is placed on the attachment/detachment section 25, and the power receiving section 8 and the power feeding section 9 are separated from each other.

受電部8には有底孔である受電凹部51a、51bが形成されており、受電凹部51a、51bの底面には第一、第二の受電端子19a、19bが配置されている。ここでは、二個の受電凹部51a、51bが設けられており、一方の受電凹部51aの底面に第一の受電端子19aが配置され、他方の受電凹部51bの底面に第二の受電端子19bが配置されているが、一個の受電凹部に第一、第二の受電端子19a、19bの両方が配置されていてもよい。 Power receiving recesses 51a and 51b, which are bottomed holes, are formed in the power receiving portion 8, and first and second power receiving terminals 19a and 19b are arranged on the bottom surfaces of the power receiving recesses 51a and 51b. Here, two power receiving recesses 51a and 51b are provided, the first power receiving terminal 19a is arranged on the bottom surface of one power receiving recess 51a, and the second power receiving terminal 19b is placed on the bottom surface of the other power receiving recess 51b. However, both the first and second power receiving terminals 19a and 19b may be placed in one power receiving recess.

但し着膜による短絡防止の効果を発揮させる場合、つまり沿面距離を増大させる効果を発揮させる場合は凹部を複数個設けることが望ましい。また、第一、第二の受電端子19a、19bは受電凹部51a、51b以外の場所に配置されていてもよい。 However, it is desirable to provide a plurality of concave portions when the effect of short-circuit prevention by film deposition is exhibited, that is, when the effect of increasing the creepage distance is exhibited. Also, the first and second power receiving terminals 19a and 19b may be arranged at locations other than the power receiving recesses 51a and 51b.

給電部9には、有底孔である給電凹部52が設けられており、給電凹部52には第一、第二の給電端子29a、29bが設けられている。 The power supply portion 9 is provided with a power supply recess 52 that is a bottomed hole, and the power supply recess 52 is provided with first and second power supply terminals 29a and 29b.

第一、第二の給電端子29a、29bは棒状であり、給電凹部52の底面に設けられた第一、第二の弾性部47a、47bにそれぞれ取り付けられ、第一、第二の給電端子29a、29bの先端は給電凹部52から突き出されている。 The first and second power supply terminals 29a and 29b are bar-shaped and attached to first and second elastic parts 47a and 47b provided on the bottom surface of the power supply recess 52, respectively. , 29b protrude from the feeding recess 52 .

第一、第二の弾性部47a、47bは、変形と復元とが可能な弾性材料で形成されており、ここでは渦巻バネが用いられているがそれに限定されるものではない。 The first and second elastic parts 47a and 47b are made of an elastic material that can be deformed and restored, and spiral springs are used here, but the material is not limited to this.

第一、第二の受電端子19a、19bはマスク用枠体31上に固定された金属膜又は金属薄板である。 The first and second power receiving terminals 19 a and 19 b are metal films or thin metal plates fixed on the mask frame 31 .

第一、第二の給電端子29a、29bの中心間距離は、第一、第二の受電端子19a、19bの中心間距離と同じにされており、受電部8と給電部9とが対面したときに、第一、第二の給電端子29a、29bは、第一、第二の受電端子19a、19bに向くように配置されており、受電部8と給電部9とが離間して対面した状態でマスク配置装置30と着脱部25とが相対的に移動して近接することで受電部8と給電部9とが相対的に近接すると、第一、第二の給電端子29a、29bの先端は第一、第二の受電端子19a、19bに近づく。 The center-to-center distance between the first and second power supply terminals 29a and 29b is the same as the center-to-center distance between the first and second power receiving terminals 19a and 19b, and the power receiving section 8 and the power feeding section 9 face each other. Sometimes, the first and second power supply terminals 29a and 29b are arranged to face the first and second power reception terminals 19a and 19b, and the power reception section 8 and the power supply section 9 face each other while being separated from each other. When the power reception unit 8 and the power supply unit 9 are relatively close to each other due to the mask placement device 30 and the attachment/detachment unit 25 moving relatively close to each other in this state, the tips of the first and second power supply terminals 29a and 29b approaches the first and second power receiving terminals 19a and 19b.

受電凹部51a、51bの開口には、蓋部61a、61bが設けられており、受電部8と給電部9とが相対的に近接する方向に移動する際には、先ず、第一、第二の給電端子29a、29bの先端が蓋部61a、61bにそれぞれ接触される。 Lids 61a and 61b are provided at the openings of the power receiving recesses 51a and 51b, respectively. The ends of the power supply terminals 29a and 29b are brought into contact with the lid portions 61a and 61b, respectively.

更に受電部8が給電部9に近接する方向にマスク用枠体31を移動させると、第一、第二の給電端子29a、29bの先端が蓋部61a、61bを曲げ、受電凹部51a、51bの中に入り、次いで、第一、第二の給電端子29a、29bの先端が第一、第二の受電端子19a、19bにそれぞれ接触される。この状態では、第一、第二の給電端子29a、29bと第一、第二の受電端子19a、19bとは電気的に導通される。 Further, when the mask frame 31 is moved in a direction in which the power receiving portion 8 approaches the power feeding portion 9, the tips of the first and second power feeding terminals 29a and 29b bend the lid portions 61a and 61b, and the power receiving recesses 51a and 51b are bent. , and then the tips of the first and second power supply terminals 29a and 29b are brought into contact with the first and second power reception terminals 19a and 19b, respectively. In this state, the first and second power supply terminals 29a and 29b and the first and second power reception terminals 19a and 19b are electrically connected.

更に受電部8と給電部9とを相対的に近接する方向に移動させると、図13に示されているように、第一、第二の給電端子29a、29bの先端が第一、第二の受電端子19a、19bに接触した状態で、第一、第二の給電端子29a、29bが押圧され、第一、第二の弾性部47a、47bは長さが短くなるように変形する。 Further, when the power receiving portion 8 and the power feeding portion 9 are moved in a direction relatively approaching each other, as shown in FIG. The first and second power supply terminals 29a and 29b are pressed in contact with the power receiving terminals 19a and 19b, and the first and second elastic portions 47a and 47b are deformed so as to be shortened.

第一、第二の弾性部47a、47bは、変形させる力が除去されると元の形状に戻る復元力を有しており、受電部8と給電部9との移動が停止されても、第一、第二の弾性部47a、47bが変形した状態では、変形の復元力によって第一、第二の給電端子29a、29bの先端が第一、第二の受電端子19a、19bに押圧され、第一、第二の給電端子29a、29bの先端と第一、第二の受電端子19a、19bとの間の接触が維持されることで、導電性が維持される。 The first and second elastic portions 47a and 47b have a restoring force to return to the original shape when the deforming force is removed. When the first and second elastic portions 47a and 47b are deformed, the tips of the first and second power supply terminals 29a and 29b are pressed against the first and second power reception terminals 19a and 19b by the restoring force of the deformation. , the electrical conductivity is maintained by maintaining contact between the tips of the first and second power supply terminals 29a and 29b and the first and second power receiving terminals 19a and 19b.

ここでは、第一、第二の給電端子29a、29bの先端と第一、第二の受電端子19a、19bの表面とは金属等の導電性材料で構成されており、第一、第二の給電端子29a、29bの先端は、真空槽21の外部に配置された給電回路20に電気的に接続されている。 Here, the tips of the first and second power supply terminals 29a and 29b and the surfaces of the first and second power reception terminals 19a and 19b are made of a conductive material such as metal. The ends of the power supply terminals 29 a and 29 b are electrically connected to the power supply circuit 20 arranged outside the vacuum chamber 21 .

第一、第二の受電端子19a、19bは、一方が磁気コイル18である巻線の一端に電気的に接続され、他方が巻線の他端に電気的に接続されており、第一、第二の給電端子29a、29bの先端が第一、第二の受電端子19a、19bに押圧された状態では、磁気コイル18の両端は、第一、第二の受電端子19a、19bと、第一、第二の給電端子29a、29bの先端とを介して、給電回路20に接続されている。 One of the first and second power receiving terminals 19a and 19b is electrically connected to one end of the winding, which is the magnetic coil 18, and the other is electrically connected to the other end of the winding. When the tips of the second power supply terminals 29a and 29b are pressed against the first and second power receiving terminals 19a and 19b, both ends of the magnetic coil 18 are connected to the first and second power receiving terminals 19a and 19b and the second power receiving terminals 19a and 19b. It is connected to the power supply circuit 20 via the tips of the first and second power supply terminals 29a and 29b.

なお、上記例では第一、第二の給電端子29a、29bを棒状にし、根本側を第一、第二の弾性部47a、47bに設け、先端側を第一、第二の受電端子19a、19bに当接させるようにしたが、第一、第二の受電端子を棒状にして根本側をマスク用枠体31に固定した弾性部にそれぞれ設け、先端側を膜状又は薄板状等の第一、第二の給電端子に当接させるようにしてもよい。 In the above example, the first and second power supply terminals 29a and 29b are rod-shaped, the root side is provided on the first and second elastic parts 47a and 47b, and the tip side is provided on the first and second power receiving terminals 19a and 47b. 19b, but the first and second power receiving terminals are rod-shaped, and their base sides are provided respectively on the elastic portions fixed to the mask frame 31, and the tip side is a film-like or thin-plate-like second power receiving terminal. You may make it contact|abut on the 1st, 2nd electric power feeding terminal.

また、第一、第二の弾性部47a、47bは棒状以外の形状の電極に設けても良く、要するに、第一の給電端子29aと第一の受電端子19aのうち、いずれか一方に第一の弾性部が設けられ、第二の給電端子29bと第二の受電端子19bのうち、いずれか一方に第二の弾性部が設けられていればよい。 Also, the first and second elastic portions 47a and 47b may be provided on electrodes having a shape other than a rod shape. , and the second elastic portion may be provided on either one of the second power supply terminal 29b and the second power receiving terminal 19b.

給電回路20は、電源装置48と通電回路49とを有している。 The power supply circuit 20 has a power supply device 48 and a power supply circuit 49 .

第一の給電端子29aと第二の給電端子29bのうち、いずれか一方が電源装置48に電気的に接続され、他方が通電回路49に電気的に接続されている。ここでは第一の給電端子29aが電源装置48の電圧出力端子に接続されており、第二の給電端子29bが通電回路49に接続されている。 One of the first power supply terminal 29 a and the second power supply terminal 29 b is electrically connected to the power supply device 48 , and the other is electrically connected to the energization circuit 49 . Here, the first power supply terminal 29a is connected to the voltage output terminal of the power supply 48, and the second power supply terminal 29b is connected to the energizing circuit 49. As shown in FIG.

<通電回路>
図17によって通電回路49の構成を説明すると、まず、通電回路49は、検出抵抗63と、電流制御回路65と、電圧測定回路66と、電流測定回路67とを有している。
<Conducting circuit>
The configuration of the energization circuit 49 will be described with reference to FIG.

検出抵抗63と電流制御回路65とは直列接続されて直列接続回路68を構成しており、直列接続回路68の一端が第二の給電端子29bに接続され、他端が電源装置48の接地電位の端子と同電位の箇所に接続されている。 The detection resistor 63 and the current control circuit 65 are connected in series to form a series connection circuit 68. One end of the series connection circuit 68 is connected to the second power supply terminal 29b, and the other end is connected to the ground potential of the power supply device 48. It is connected to a point that has the same potential as the terminal of .

電流制御回路65は導通と遮断を行うスイッチ回路であり、第一、第二の給電端子29a、29bと第一、第二の受電端子19a、19bとがそれぞれ電気的に接続された状態で電源装置48の出力電圧端子から所定の値の磁化電圧が出力され、その状態で電流制御回路65が遮断から導通に転じると、電磁石部14中の磁気コイル18と電流制御回路65とに、電流が流れる。 The current control circuit 65 is a switch circuit that conducts and cuts off, and the power supply is turned on while the first and second power supply terminals 29a and 29b are electrically connected to the first and second power reception terminals 19a and 19b, respectively. When a magnetizing voltage of a predetermined value is output from the output voltage terminal of the device 48 and the current control circuit 65 changes from interruption to conduction in this state, current flows through the magnetic coil 18 in the electromagnet section 14 and the current control circuit 65. flow.

なお、温度測定器40が検出した温度信号を制御装置26に出力するために、制御装置26に接続された第一、第二の入力端子を着脱部25に設け、温度測定器40に接続された第一、第二の出力端子をマスク配置装置30に設け、第一の入力端子と第一の出力端子とが接触され、第二の入力端子と第二の出力端子とが接触されたときに、温度測定器40が出力した測定信号が第一、第二の出力端子から第一、第二の入力端子に送信され、制御装置26によって受信されるようにすることができる。 In order to output a temperature signal detected by the temperature measuring device 40 to the control device 26 , first and second input terminals connected to the control device 26 are provided in the detachable portion 25 and connected to the temperature measuring device 40 . When the mask placement device 30 is provided with first and second output terminals, the first input terminal and the first output terminal are brought into contact, and the second input terminal and the second output terminal are brought into contact. Secondly, the measurement signals output by the temperature measuring device 40 can be transmitted from the first and second output terminals to the first and second input terminals and received by the control device 26 .

電流制御回路65は主制御回路60に接続されており、電流制御回路65に流れる電流は、主制御回路60によって制御されている。主制御回路60は、制御装置26に接続されており、主制御回路60は制御装置26によって制御されている。 The current control circuit 65 is connected to the main control circuit 60 and the current flowing through the current control circuit 65 is controlled by the main control circuit 60 . The main control circuit 60 is connected to the control device 26 and is controlled by the control device 26 .

ここで、磁気コイル18に電流が流れると、磁気コイル18の両端には磁極が誘起され、コイル磁界が形成される。 Here, when a current flows through the magnetic coil 18, magnetic poles are induced at both ends of the magnetic coil 18, forming a coil magnetic field.

永久磁石部17により、磁芯36の先端とヨーク部35の先端との間に一定強度の吸着磁界が形成されているが、磁気コイル18に流れる電流の方向により、磁気コイル18が形成するコイル磁界は、吸着部321~324と吸着部321~324によって磁気吸引される被吸着部231~234との間に形成される磁界強度を大きくして磁力を増加させる場合と、磁界強度を弱くして磁力を小さくする場合とがある。 An attraction magnetic field of constant strength is formed between the tip of the magnetic core 36 and the tip of the yoke portion 35 by the permanent magnet portion 17 . The magnetic field may increase the magnetic force by increasing the strength of the magnetic field formed between the attracting portions 32 1 to 32 4 and the attracted portions 23 1 to 23 4 which are magnetically attracted by the attracting portions 32 1 to 32 4 . , and the magnetic force may be reduced by weakening the magnetic field strength.

磁気コイル18に流れる電流の方向及び電流値と、吸着部321~324と被吸着部231~234との間の磁力との関係を予め求めておき、吸着部321~324と被吸着部231~234との間の磁力ができるだけ小さくなる方向と電流値の電流を解除電流と呼ぶものとすると、解除電流が磁気コイル18を流れると、吸着部321~324と被吸着部231~234との間の磁力は弱化されてゼロに近くなり、吸着部321~324は被吸着部231~234を吸着しない状態になる。被吸着部231~234は後述する。 The relationship between the direction and value of the current flowing through the magnetic coil 18 and the magnetic force between the attracting portions 32 1 to 32 4 and the attracting portions 23 1 to 23 4 is determined in advance, and the attracting portions 32 1 to 32 4 are obtained. and the attracting portions 23 1 to 23 4 , the direction and the current value of which is as small as possible is called a release current . and the attracted portions 23 1 to 23 4 are weakened and become close to zero, and the attracting portions 32 1 to 32 4 do not attract the attracted portions 23 1 to 23 4 . The sucked portions 23 1 to 23 4 will be described later.

<アラインメント>
搬入装置75aの内部には、基板16が配置された基板配置装置42が予め配置されており、搬入装置75aの内部が真空排気されて真空雰囲気が形成された後、搬入装置75aの内部と真空装置12の真空槽21の内部とが接続され、基板配置装置42は真空バルブ76を通って真空装置12の真空槽21の内部に搬入される。
<Alignment>
A substrate arranging device 42 in which the substrate 16 is arranged is arranged in advance inside the carrying-in device 75a. The interior of the vacuum chamber 21 of the device 12 is connected, and the substrate placement device 42 is carried into the interior of the vacuum chamber 21 of the vacuum device 12 through the vacuum valve 76 .

真空槽21の内部の天井には取付部22が設けられており、取付部22には、基板配置装置42を保持させ、所望方向に移動させることができる移動装置24が設けられている。真空槽21に搬入された基板配置装置42は移動装置24に着脱自在に保持され、移動装置24によって、基板配置装置42とマスク配置装置30とは相対的に移動される。 A mounting portion 22 is provided on the ceiling inside the vacuum chamber 21, and the mounting portion 22 is provided with a moving device 24 capable of holding a substrate placement device 42 and moving it in a desired direction. The substrate arranging device 42 carried into the vacuum chamber 21 is detachably held by the moving device 24 , and the substrate arranging device 42 and the mask arranging device 30 are relatively moved by the moving device 24 .

図8には、基板用枠体41に設けられた突起等の基板保持部43によって基板16が保持され、基板16と共に基板用枠体41が鉛直にされた基板配置装置42が示されている。 FIG. 8 shows a substrate arranging device 42 in which the substrate 16 is held by substrate holding portions 43 such as projections provided on the substrate frame 41 and the substrate 16 and the substrate frame 41 are vertical. .

この例では、真空装置12はアラインメント装置であり、真空装置12には撮像装置27a、27bが設けられている。
基板16とマスク15とにはそれぞれアラインメントマークが設けられており、それらのアラインメントマークを撮像装置27a、27bによって撮像し、基板16のアラインメントマークとマスク15のアラインメントマークとが所定の位置関係になるように、基板16とマスク15とを相対的に移動させると位置合わせを行うことができる。
In this example, the vacuum device 12 is an alignment device, and the vacuum device 12 is provided with imaging devices 27a and 27b.
Alignment marks are provided on the substrate 16 and the mask 15, respectively, and these alignment marks are imaged by imaging devices 27a and 27b so that the alignment marks of the substrate 16 and the alignment marks of the mask 15 have a predetermined positional relationship. Thus, alignment can be performed by relatively moving the substrate 16 and the mask 15 .

基板16とマスク15とを相対的に移動させる際には、基板16が配置された基板用枠体41とマスク15が設けられたマスク用枠体31とを相対移動させることになる。 When the substrate 16 and the mask 15 are relatively moved, the substrate frame 41 on which the substrate 16 is arranged and the mask frame 31 on which the mask 15 is provided are moved relative to each other.

基板用枠体41には、被吸着部231~234が設けられている。基板用枠体41とマスク用枠体31とが対面して配置されたときに、吸着部321~324と被吸着部231~234とは対面するように配置されている。各吸着部321~324のヨーク部35の先端と磁芯36の先端は被吸着部231~234に対面する。 The substrate frame 41 is provided with portions to be attracted 23 1 to 23 4 . When the substrate frame 41 and the mask frame 31 are arranged to face each other, the attracting portions 32 1 to 32 4 and the attracted portions 23 1 to 23 4 are arranged to face each other. The tip of the yoke portion 35 and the tip of the magnetic core 36 of each of the attracting portions 32 1 to 32 4 face the attracted portions 23 1 to 23 4 .

被吸着部231~234は磁力によって磁気吸引される材料で形成されており、磁気コイル18に解除電流が流れていないときには、吸着部321~324と被吸着部231~234とが近接して対面すると、吸着部321~324の磁力によって被吸着部231~234は吸着部321~324に磁気吸引され、基板用枠体41とマスク用枠体31とが接触する。この状態では、基板用枠体41とマスク用枠体31とは磁力によって互いに押圧される吸着状態になり、基板用枠体41とマスク用枠体31との間の摩擦力により、基板用枠体41とマスク用枠体31とは相対移動させることができない。 The attracted portions 23 1 to 23 4 are made of a material that is magnetically attracted by magnetic force. , the attracted portions 23 1 to 23 4 are magnetically attracted to the attracted portions 32 1 to 32 4 by the magnetic force of the attracted portions 32 1 to 32 4 , and the substrate frame 41 and the mask frame 31 are magnetically attracted to each other. come into contact with. In this state, the substrate frame 41 and the mask frame 31 are attracted to each other by magnetic force, and the frictional force between the substrate frame 41 and the mask frame 31 causes the substrate frame to move. The body 41 and the mask frame 31 cannot be moved relative to each other.

従って、位置合わせを行う際には、先ず、基板用枠体41とマスク用枠体31とを近接させる前に各吸着部321~324にそれぞれ解除電流を流して磁気吸引力が弱化された解除状態にし、移動装置24により、基板配置装置42をマスク配置装置30に近接させ、基板配置装置42とマスク配置装置30とを、図4に示すようにマスク15と基板16とが離間した状態で近接して対面するように配置する。 Therefore, when performing alignment, first, before the substrate frame 41 and the mask frame 31 are brought close to each other, release currents are applied to the respective attracting portions 32 1 to 32 4 to weaken the magnetic attraction force. In the released state, the substrate arranging device 42 is brought close to the mask arranging device 30 by the moving device 24, and the substrate arranging device 42 and the mask arranging device 30 are separated from the mask 15 and the substrate 16 as shown in FIG. placed in close proximity to each other.

解除状態では磁気吸引力は弱化されているため、被吸着部231~234は吸着部321~324に磁気吸引されず、制御装置26は撮像装置27a、27bによって撮像しながら、アラインメントマークが所定の位置関係になるように、移動装置24によって基板配置装置42とマスク配置装置30とを相対的に移動させる。 Since the magnetic attraction force is weakened in the released state, the attracted portions 23 1 to 23 4 are not magnetically attracted to the attracted portions 32 1 to 32 4 . The moving device 24 relatively moves the substrate arranging device 42 and the mask arranging device 30 so that the marks have a predetermined positional relationship.

ここではマスク配置装置30が静止され、基板配置装置42が移動装置24によって移動されるが、その逆でもよいし、両方移動されてもよい。 Here, the mask placement device 30 is stationary and the substrate placement device 42 is moved by the moving device 24, but it may be the other way around, or both may be moved.

このように、吸着部321~324に解除電流が流されて磁気吸引力が弱化される解除状態では、基板配置装置42とマスク配置装置30とを非接触の状態で近接して配置することが可能であり、近接配置した状態で基板配置装置42とマスク配置装置30とを相対的に移動させると、基板16とマスク15との位置合わせを行うことができる。 In this way, in the released state in which the releasing current is supplied to the attracting portions 32 1 to 32 4 to weaken the magnetic attraction force, the substrate arranging device 42 and the mask arranging device 30 are arranged close to each other in a non-contact state. By relatively moving the substrate arranging device 42 and the mask arranging device 30 while they are arranged close to each other, the substrate 16 and the mask 15 can be aligned.

位置合わせが行われた後、解除状態のまま、基板配置装置42とマスク配置装置30とは互いに近接する方向に移動され、基板用枠体41とマスク用枠体31とが接触される。 After the alignment is performed, the substrate arranging device 42 and the mask arranging device 30 are moved toward each other in the released state, and the substrate frame 41 and the mask frame 31 are brought into contact with each other.

基板用枠体41とマスク用枠体31とが接触された後、磁気コイル18に流れる解除電流が停止されると、磁気コイル18が形成する磁界は消滅し、永久磁石部17が、磁芯36の先端とヨーク部35の先端との間に形成する磁界によって吸着部321~324が被吸着部231~234を磁気吸引する吸着状態になる。 After the substrate frame 41 and the mask frame 31 are brought into contact with each other, when the release current flowing through the magnetic coil 18 is stopped, the magnetic field formed by the magnetic coil 18 disappears, and the permanent magnet portion 17 becomes the magnetic core. Due to the magnetic field formed between the tip of 36 and the tip of yoke portion 35, the attracting portions 32 1 to 32 4 are brought into an attracted state in which the attracted portions 23 1 to 23 4 are magnetically attracted.

吸着状態では、基板用枠体41とマスク用枠体31とは接触し、摩擦力によって基板用枠体41とマスク用枠体31とは相対的に移動できない状態になり、磁気吸引力によって互いに固定され、搬送ロボット等によって、互いに固定された基板配置装置42とマスク配置装置30とは一緒に移動される。 In the attracted state, the substrate frame 41 and the mask frame 31 are in contact with each other, and the substrate frame 41 and the mask frame 31 are brought into a state in which they cannot move relatively due to the frictional force. The substrate arranging device 42 and the mask arranging device 30, which are fixed and fixed to each other, are moved together by a transfer robot or the like.

<吸着部と被吸着部の形状>
吸着部321~324の形状と被吸着部231~234の形状とを説明する。
<Shapes of the sucking part and the sucked part>
The shapes of the attracting portions 32 1 to 32 4 and the shapes of the attracted portions 23 1 to 23 4 will be described.

図19(a)は、吸着部321~324の正面図であり、配置孔381~384の内部に配置された円柱形形状の磁芯36の先端と、円筒形形状のヨーク部35の先端とが示されている。同図(b)に示すように、基板用枠体41の被吸着部231~234は、磁芯36の先端と対面する部分である円形の第一の被吸着部391と、ヨーク部35の先端と対面する部分であるリング形形状の第二の被吸着部392とをそれぞれ有している。 FIG. 19(a) is a front view of the attraction portions 32 1 to 32 4 , showing the tip of the cylindrical magnetic core 36 arranged inside the arrangement holes 38 1 to 38 4 and the cylindrical yoke portion. 35 tips are shown. As shown in FIG. 4B, the chucked portions 23 1 to 23 4 of the substrate frame 41 include a circular first chucked portion 39 1 facing the tip of the magnetic core 36, a yoke Each has a ring-shaped second sucked portion 39 2 that faces the tip of the portion 35 .

基板16が配置された基板用枠体41のうち、少なくとも第一、第二の被吸着部391、392は強磁性体で構成されており、解除電流により、磁芯36の先端とヨーク部35の先端との間に形成される磁界の強度が小さくされているときには、第一、第二の被吸着部391、392が吸着部321~324に近接しても、第一、第二の被吸着部391、392が吸着部321~324に磁気吸着されないが、解除電流が停止された状態で基板用枠体41がマスク用枠体31に近接すると、ヨーク部35の先端と磁芯36の先端との間に形成された磁界の中に第一、第二の被吸着部391、392が入り、第一、第二の被吸着部391、392が吸着部321~324に磁気吸引される。 Of the substrate frame 41 on which the substrate 16 is arranged, at least the first and second attracted portions 39 1 and 39 2 are made of a ferromagnetic material. When the strength of the magnetic field formed between the tip of the portion 35 and the tip of the portion 35 is small, even if the first and second attracted portions 39 1 and 39 2 are close to the attracting portions 32 1 to 32 4 , the first The first and second attracted portions 39 1 and 39 2 are not magnetically attracted to the attracted portions 32 1 to 32 4 , but when the substrate frame 41 approaches the mask frame 31 while the release current is stopped, The first and second attracted portions 39 1 and 39 2 enter the magnetic field formed between the tip of the yoke portion 35 and the tip of the magnetic core 36 , and the first and second attracted portions 39 1 , 39 2 are magnetically attracted to the attracting portions 32 1 to 32 4 .

磁芯36の先端とヨーク部35の先端とは、配置孔381~384の開口と底面との間の開口に近い場所に位置しており、吸着部321~324と被吸着部231~234とが対面した状態で基板用枠体41とマスク用枠体31とが接触したときには、磁芯36の先端と第一の被吸着部391とは非接触の状態で近接して対面し、また、ヨーク部35の先端と第二の被吸着部392とも非接触の状態で近接して対面する。 The tip of the magnetic core 36 and the tip of the yoke portion 35 are positioned near the openings between the openings and bottom surfaces of the arrangement holes 38 1 to 38 4 , and the attracting portions 32 1 to 32 4 and the attracted portions When the substrate frame 41 and the mask frame 31 are brought into contact with the substrate frame 41 and the mask frame 31 facing each other 23 1 to 23 4 , the tip of the magnetic core 36 and the first attracted portion 39 1 approach each other in a non-contact state. In addition, the tip of the yoke portion 35 and the second sucked portion 392 also face each other closely in a non-contact state.

基板用枠体41とマスク用枠体31とが接触したときの磁芯36の先端と第一の被吸着部391との間の距離とヨーク部35の先端と第二の被吸着部392との間の距離とは0.1mm以下の範囲で非接触であるとよい。 The distance between the tip of the magnetic core 36 and the first attracted portion 39 1 and the tip of the yoke portion 35 and the second attracted portion 39 when the substrate frame 41 and the mask frame 31 are in contact with each other 2 is preferably non-contact within a range of 0.1 mm or less.

但し、本発明には基板用枠体41とマスク用枠体31とがマスクを介して対面する場合も含まれる。 However, the present invention also includes the case where the substrate frame 41 and the mask frame 31 face each other through a mask.

図11と図14は、基板用枠体41の第一、第二の被吸着部391、392が吸着部321~324に磁気吸着された状態である。 11 and 14 show the state in which the first and second attracted portions 39 1 and 39 2 of the substrate frame 41 are magnetically attracted to the attracting portions 32 1 to 32 4 .

基板16が基板用枠体41に配置された状態では、基板保持部43(図7、図8)等の基板を保持する装置により、基板16は基板用枠体41に対して移動できないようにされており、また、マスク15がマスク保持装置によってマスク用枠体31に配置された状態では、マスク15はマスク用枠体31に対して移動できないようにされている。 When the substrate 16 is arranged on the substrate frame 41 , the substrate 16 is prevented from moving with respect to the substrate frame 41 by a substrate holding device such as the substrate holding part 43 (FIGS. 7 and 8). In addition, when the mask 15 is placed on the mask frame 31 by the mask holding device, the mask 15 is prevented from moving with respect to the mask frame 31 .

この例では、基板16が配置された基板用枠体41の第一、第二の被吸着部391、392が、マスク15が配置されたマスク用枠体31の吸着部321~324に磁気吸引されて、基板用枠体41とマスク用枠体31とが互いに固定されると、基板16とマスク15とも互いに移動しないようになる。符号28は、マスク配置装置30と基板配置装置42とから成り、マスク15と基板16とを運搬する運搬装置を示している。 In this example, the first and second sucked portions 39 1 and 39 2 of the substrate frame 41 on which the substrate 16 is arranged are the sucked portions 32 1 to 32 of the mask frame 31 on which the mask 15 is arranged. 4 and the substrate frame 41 and the mask frame 31 are fixed to each other, the substrate 16 and the mask 15 do not move relative to each other. Numeral 28 indicates a transporting device comprising a mask placing device 30 and a substrate placing device 42 and carrying the mask 15 and the substrate 16 .

解除電流が停止され、吸着状態でマスク配置装置30と基板配置装置42とが一緒に移動した場合は基板16とマスク15とは、位置合わせがされた状態が維持される。 When the release current is stopped and the mask arranging device 30 and the substrate arranging device 42 move together in the suction state, the substrate 16 and the mask 15 are kept aligned.

従って、磁気コイル18に電流が流れなくても第一、第二の被吸着部391、392は吸着部321~324によって磁気吸着されており、図15に示されたように、マスク配置装置30が着脱部25から分離され、第一、第二の給電端子29a、29bと第一、第二の受電端子19a、19bとが離間して移動されても、基板16とマスク15とが位置合わせされた状態は、電流が供給されなくても維持される。 Therefore, even if no current flows through the magnetic coil 18, the first and second attracted portions 39 1 and 39 2 are magnetically attracted by the attracting portions 32 1 to 32 4 , as shown in FIG. Even if the mask placement device 30 is separated from the attaching/detaching portion 25 and the first and second power supply terminals 29a and 29b and the first and second power receiving terminals 19a and 19b are moved away from each other, the substrate 16 and the mask 15 do not move. are maintained in alignment even when current is not supplied.

マスク配置装置30が着脱部25から分離されたときには第一、第二の給電端子29a、29bと第一、第二の受電端子19a、19bとは離間しており、弾性部材47a、47bは元の形状に復元する。 When the mask placement device 30 is separated from the attaching/detaching portion 25, the first and second power supply terminals 29a and 29b are separated from the first and second power receiving terminals 19a and 19b, and the elastic members 47a and 47b are in the original state. to restore the shape of

別形態として、基板16が基板用枠体41に対して移動可能である構成の場合は、基板用枠体41とマスク用枠体31とが互いに固定される際に基板16が挟み込まれる構成とする事で、吸着部321~324を中心に垂直応力に基づく摩擦力を発生させ、その結果、基板用枠体41とマスク15とが基板16を挟み、互いに固定され、解除電流が停止された状態でマスク配置装置30と基板配置装置42とが一緒に移動した場合でも、基板16とマスク15との位置合わせがなされた状態が維持される。 Alternatively, in the case of a configuration in which the substrate 16 is movable with respect to the substrate frame 41, the substrate 16 may be sandwiched when the substrate frame 41 and the mask frame 31 are fixed to each other. As a result, the substrate frame 41 and the mask 15 sandwich the substrate 16 and are fixed to each other, stopping the release current. Even if the mask arranging device 30 and the substrate arranging device 42 move together in this state, the aligned state of the substrate 16 and the mask 15 is maintained.

なお、マスク15がマスク用枠体31に対して移動可能である構成の場合も同様に、マスク用枠体31と基板用枠体41とが互いに固定される際にマスク15が挟み込まれる構成としても良い。 In the case of the configuration in which the mask 15 is movable with respect to the mask frame 31, the mask 15 is similarly sandwiched when the mask frame 31 and the substrate frame 41 are fixed to each other. Also good.

なお、ここでは弾性部材47a、47bは渦巻バネによって形成したが、板バネやゴム等を用いることもできる。 Although the elastic members 47a and 47b are formed of spiral springs here, leaf springs, rubber, or the like can also be used.

<真空処理>
着脱部25から分離されたマスク配置装置30と基板配置装置42とは、真空バルブ77を通り、真空槽21の内部から処理装置13の内部に移動される。
<Vacuum treatment>
The mask arranging device 30 and the substrate arranging device 42 separated from the attaching/detaching part 25 pass through the vacuum valve 77 and are moved from the inside of the vacuum chamber 21 to the inside of the processing apparatus 13 .

基板16とマスク15とはアラインメントされており、マスク配置装置30を電源装置48から切り離しても基板用枠体41はマスク用枠体31に磁気吸着された吸着状態にあり、マスク配置装置30を着脱部25から分離させ、互いに固定されたマスク配置装置30と基板配置装置42とを一緒に移動させることができる。 The substrate 16 and the mask 15 are aligned, and even if the mask placement device 30 is separated from the power supply device 48, the substrate frame 41 is magnetically attracted to the mask frame 31, and the mask placement device 30 is held. The mask arranging device 30 and the substrate arranging device 42, which are separated from the attaching/detaching part 25 and fixed to each other, can be moved together.

図6には処理装置13の内部が示されている。この処理装置13はスパッタリング装置であり、真空槽79を有している。真空槽79にはバッキングプレート57に設けられたスパッタリングターゲット58が配置されており、バッキングプレート57にはスパッタ電源56が接続され、真空槽79にはガス供給装置74が接続されている。 FIG. 6 shows the inside of the processing device 13 . This processing apparatus 13 is a sputtering apparatus and has a vacuum chamber 79 . A sputtering target 58 provided on a backing plate 57 is placed in the vacuum chamber 79 , a sputtering power source 56 is connected to the backing plate 57 , and a gas supply device 74 is connected to the vacuum chamber 79 .

基板配置装置42とマスク配置装置30とが磁気吸引されて互いに固定された状態で、マスク配置装置30側がスパッタリングターゲット58に向けられ、処理装置13の真空槽79が真空排気されながらガス供給装置74からスパッタリングガスが供給され、スパッタ電源56によってバッキングプレート57にスパッタリング電圧が印加されるとスパッタリングターゲット58の表面近傍でプラズマが形成され、スパッタリングターゲット58がスパッタリングされる。 With the substrate arranging device 42 and the mask arranging device 30 fixed to each other by magnetic attraction, the mask arranging device 30 side is directed toward the sputtering target 58, and the gas supply device 74 is operated while the vacuum chamber 79 of the processing device 13 is being evacuated. When a sputtering gas is supplied from the source 56 and a sputtering voltage is applied to the backing plate 57 by the sputtering power supply 56, plasma is formed in the vicinity of the surface of the sputtering target 58, and the sputtering target 58 is sputtered.

スパッタリングにより、スパッタ粒子がスパッタリングターゲット58の表面から飛び出し、飛び出したスパッタリング粒子は基板16とマスク15とが位置する方向に飛行し、マスク15に設けられた開口を通過したスパッタリング粒子は基板16の表面に到達し、開口の表面形状と同じ表面形状の薄膜を成長させる。 By sputtering, the sputtered particles fly out from the surface of the sputtering target 58 , the sputtered particles fly in the direction where the substrate 16 and the mask 15 are located, and the sputtered particles passing through the openings provided in the mask 15 reach the surface of the substrate 16 . and grow a thin film having the same surface shape as the opening.

このような真空処理が行われ、基板16の表面に所定膜厚の薄膜が形成された後、基板配置装置42とマスク配置装置30とは、次段の真空バルブ78を通過して搬出装置75bの内部に一緒に搬送される。 After such vacuum processing is performed and a thin film having a predetermined film thickness is formed on the surface of the substrate 16, the substrate arranging device 42 and the mask arranging device 30 pass through the vacuum valve 78 in the next stage, and the unloading device 75b. are transported together inside the

この搬出装置75b内では、第一、第二の受電端子19a、19bの間に電圧が印加され、磁気コイル18に解除電流が流される。つまり、磁気コイル18には電源装置48から供給される電圧によって解除電流が流され、吸着部321~324の磁気吸着力が弱くされ、基板配置装置42とマスク配置装置30とが分離される。 A voltage is applied between the first and second power receiving terminals 19a and 19b in the unloading device 75b, and a release current is caused to flow through the magnetic coil 18. As shown in FIG. That is, a release current is supplied to the magnetic coil 18 by the voltage supplied from the power supply device 48, the magnetic attraction force of the attraction portions 32 1 to 32 4 is weakened, and the substrate arranging device 42 and the mask arranging device 30 are separated. be.

分離されたマスク配置装置30は、真空雰囲気を維持された搬送路を通って真空装置12の真空槽21の内部に戻され、他方、分離された基板配置装置42は大気中に取り出され、次の工程に移動される。 The separated mask arranging device 30 is returned to the inside of the vacuum chamber 21 of the vacuum device 12 through the conveying path in which the vacuum atmosphere is maintained, while the separated substrate arranging device 42 is taken out into the atmosphere and then is moved to the process of

<解除電流の制御>
次に、解除電流の制御について説明する。
<Control of release current>
Next, control of the release current will be described.

電流制御回路65に加え、電圧測定回路66と電流測定回路67とも主制御回路60に接続されており、各回路65~67は主制御回路60によって制御され、主制御回路60は制御装置26によって制御されるようになっている。 In addition to the current control circuit 65, the voltage measurement circuit 66 and the current measurement circuit 67 are also connected to the main control circuit 60. Each of the circuits 65 to 67 is controlled by the main control circuit 60, and the main control circuit 60 is It is supposed to be controlled.

磁気コイル18に流れる電流は、図18のグラフのような大きさになるように、主制御回路60によって制御されており、磁気コイル18の電流の流れを開始する際には、電流制御回路65により、磁気コイル18に流れる電流は、電流値がゼロの状態から漸増が開始される(時刻t0)。 The current flowing through the magnetic coil 18 is controlled by the main control circuit 60 so as to have the magnitude shown in the graph of FIG. As a result, the current flowing through the magnetic coil 18 starts to gradually increase from the state where the current value is zero (time t 0 ).

磁気コイル18を流れる電流は検出抵抗63を流れ、検出抵抗63の両端に生じた電圧は、電流測定回路67によって測定されており、測定値が主制御回路60に出力されると主制御回路60は検出抵抗63に流れる電流を算出し、算出結果から、電流制御回路65に流れる電流を一定割合で漸増させる。 The current flowing through the magnetic coil 18 flows through the detection resistor 63, and the voltage generated across the detection resistor 63 is measured by the current measurement circuit 67. When the measured value is output to the main control circuit 60, the main control circuit 60 calculates the current flowing through the detection resistor 63, and gradually increases the current flowing through the current control circuit 65 at a constant rate from the calculation result.

磁気コイル18に流れる電流が所定の大きさの解除電流値Ixに達すると(時刻t1)、次のように、解除電流値Ixを維持させて継続して電流を流す。 When the current flowing through the magnetic coil 18 reaches the release current value Ix of a predetermined magnitude (time t 1 ), the current continues to flow while maintaining the release current value Ix as follows.

解除電流値Ixの電流が磁気コイル18に流れると吸着部321~324の磁気吸着力が弱くされ、マスク用枠体31が磁気吸着されないようになる。解除電流値Ixの電流が解除電流である。 When the current of the release current value Ix flows through the magnetic coil 18, the magnetic attraction force of the attraction portions 32 1 to 32 4 is weakened, and the mask frame 31 is no longer magnetically attracted. The current of the release current value Ix is the release current.

通電回路49又は電源装置48にはダイオード素子11が配置されており、ダイオード素子11のカソード電極は第一の給電端子29aに電気的に接続され、アノード電極は、検出抵抗63と電流制御回路65とが電気的に接続された部分に電気的に接続されている。 A diode element 11 is arranged in the energization circuit 49 or the power supply device 48, the cathode electrode of the diode element 11 is electrically connected to the first power supply terminal 29a, and the anode electrode is connected to the detection resistor 63 and the current control circuit 65. is electrically connected to the portion to which is electrically connected.

電流制御回路65が導通して電源装置48から磁気コイル18に電流が供給される間は、ダイオード素子11は逆バイアスされ、ダイオード素子11には電流は流れない。 While the current control circuit 65 is turned on and current is supplied from the power supply 48 to the magnetic coil 18, the diode element 11 is reverse-biased and current does not flow through the diode element 11. FIG.

主制御回路60には、解除電流値Ixよりも大きな上限電流値と解除電流値Ixよりも小さな下限電流値とが設定されており、電流制御回路65が導通して磁気コイル18に流れる電流が漸増し、上限電流値よりも大きくなったことが電流測定回路67によって検出されると、主制御回路60は電流制御回路65を導通から遮断に転じさせる。 The main control circuit 60 is set with an upper limit current value larger than the release current value Ix and a lower limit current value smaller than the release current value Ix. When the current measurement circuit 67 detects that the current gradually increases and becomes larger than the upper limit current value, the main control circuit 60 changes the current control circuit 65 from conduction to interruption.

電流制御回路65が導通から遮断に転じると、電源装置48から磁気コイル18に供給される電流が停止し、磁気コイル18に誘導起電力が発生し、ダイオード素子11が順バイアスされ、誘導起電力によってダイオード素子11と磁気コイル18と検出抵抗63とに電流が流される。 When the current control circuit 65 switches from conduction to interruption, the current supplied from the power supply 48 to the magnetic coil 18 stops, an induced electromotive force is generated in the magnetic coil 18, the diode element 11 is forward biased, and the induced electromotive force current flows through the diode element 11 , the magnetic coil 18 and the detection resistor 63 .

誘導起電力によって流れる電流は漸減し、電流値が下限電流値よりも小さくなったことが電流測定回路67によって検出されると、主制御回路60は電流制御回路65を遮断から導通に転じさせ、電源装置48から磁気コイル18への電流供給が再開される。 The current flowing due to the induced electromotive force gradually decreases, and when the current measurement circuit 67 detects that the current value has become smaller than the lower limit current value, the main control circuit 60 switches the current control circuit 65 from cutoff to on, Current supply from the power supply 48 to the magnetic coil 18 is resumed.

このように、磁気コイル18に流れる電流が上限電流値と下限電流値の間で変化するので、上限電流値と下限電流値との差を小さくしておくと、磁気コイル18には平均して解除電流値Ixの大きさの解除電流が定電流として継続して流される。 In this way, the current flowing through the magnetic coil 18 varies between the upper limit current value and the lower limit current value. A release current having the magnitude of the release current value Ix is continuously supplied as a constant current.

解除電流が流れる間は解除状態であり、マスク用枠体31と基板用枠体41とが近接され、基板16とマスク15とを相対移動させてアラインメントが行われ、マスク用枠体31と基板用枠体41とが接触される。マスク用枠体31と基板用枠体41とは、間にマスク15が配置された状態で接触されてもよい。 While the release current is flowing, the mask frame 31 and the substrate frame 41 are brought close to each other, the substrate 16 and the mask 15 are moved relative to each other for alignment, and the mask frame 31 and the substrate are aligned. The contact frame 41 is brought into contact therewith. The mask frame 31 and the substrate frame 41 may be in contact with each other with the mask 15 interposed therebetween.

アラインメント終了などの信号が主制御回路60に入力されると、磁気吸着を開始させるために、主制御回路60は磁気コイル18に流れる電流の値の漸減を開始させ(時刻t2)、電流がゼロの状態に戻す(時刻t3)。 When a signal such as the end of alignment is input to the main control circuit 60, the main control circuit 60 starts to gradually decrease the value of the current flowing through the magnetic coil 18 (time t 2 ) in order to start magnetic attraction. Return to the zero state (time t 3 ).

漸減の途中又は終了の時点で、磁芯36の先端とヨーク部35の先端の間に、基板用枠体41がマスク用枠体31に磁気吸着される程度の磁気吸引力を発生させる磁界が形成され、マスク用枠体31と基板用枠体41とが互いに固定される。それと共に基板16とマスク15とも互いに固定される。 During or at the end of the gradual decrease, a magnetic field is generated between the tip of the magnetic core 36 and the tip of the yoke portion 35 to generate a magnetic attraction force to the extent that the substrate frame 41 is magnetically attracted to the mask frame 31 . The mask frame 31 and the substrate frame 41 are fixed to each other. At the same time, the substrate 16 and the mask 15 are also fixed to each other.

磁気コイル18に流れる電流が漸減するので、磁気吸引力は漸増し、急激な力変化は発生しないから、基板16の割れや欠けは発生しない(直接基板16に垂直応力を発生させた場合は特に効果的である)。 Since the current flowing through the magnetic coil 18 gradually decreases, the magnetic attractive force gradually increases and no sudden change in force occurs, so that the substrate 16 does not crack or chip (especially when vertical stress is directly applied to the substrate 16). effective).

なお、第二の給電端子29bは電圧測定回路66に接続されており、磁気コイル18の一端の電圧を測定し、正常か異常かを監視することができる。 The second power supply terminal 29b is connected to a voltage measuring circuit 66, which measures the voltage at one end of the magnetic coil 18 and monitors whether it is normal or abnormal.

このように、吸着の開始と吸着解除の開始の際の急激な電流変化が防止されているので、基板用枠体41とマスク用枠体31との衝突や基板16の跳ね、垂直応力の急激な時間変化によるダスト発生等のトラブルを防止することができる。 In this manner, a rapid current change at the start of adsorption and the start of release of adsorption is prevented. It is possible to prevent troubles such as the generation of dust due to changes over time.

なお、解除電流が小さすぎると永久磁石部17の磁界が被吸着部391、392を磁気吸引しない程度に十分に小さくすることができなくなる。その場合は、永久磁石部17の残存する磁力によって、吸着部321~324が被吸着部391、392を磁気吸引してしまう。 If the release current is too small, the magnetic field of the permanent magnet portion 17 cannot be sufficiently reduced to the extent that the attracted portions 39 1 and 39 2 are not magnetically attracted. In that case, the remaining magnetic force of the permanent magnet portion 17 causes the attracting portions 32 1 to 32 4 to magnetically attract the attracted portions 39 1 and 39 2 .

他方、解除電流が大きすぎると、永久磁石部17の磁気吸引力を消滅させる磁界よりも大きな磁界が電磁石部14によって形成され、吸着部321~324が被吸着部391、392を磁気吸引してしまう。 On the other hand, if the release current is too large, a magnetic field larger than the magnetic field that eliminates the magnetic attraction force of the permanent magnet portion 17 is formed by the electromagnet portion 14, causing the attracting portions 32 1 to 32 4 to move the attracting portions 39 1 and 39 2 . magnetically attracted.

永久磁石部17が被吸着部391、392を吸引する磁力を消滅させるためには、電磁石部14に、適切な電流値の電流を流すとよい。 In order to eliminate the magnetic force of the permanent magnet portion 17 that attracts the attracted portions 39 1 and 39 2 , an appropriate current value should be applied to the electromagnet portion 14 .

吸着部321~324が被吸着部391、392を磁気吸引する力を最も小さくする解除電流の値は磁気コイル18の等価抵抗値の温度変化等、温度も影響しており、通電回路49は磁気コイル18に流す電流の値を変更することができるから、予め複数の温度雰囲気中で最適な解除電流の値を測定し、温度と最適な解除電流の値との関係を求めて主制御回路60に記憶しておき、アラインメントする際には温度測定器40によってマスク配置装置30の中の吸着部321~324の温度を測定し、磁気コイル18に、記憶された最適な解除電流の値から、測定した温度に対応する電流値の解除電流を流すようにすればよい。 The value of the release current that minimizes the force with which the attracting portions 32 1 to 32 4 magnetically attract the attracting portions 39 1 and 39 2 is also affected by temperature, such as temperature changes in the equivalent resistance value of the magnetic coil 18. Since the circuit 49 can change the value of the current flowing through the magnetic coil 18, the optimum release current value is measured in advance in a plurality of temperature atmospheres, and the relationship between the temperature and the optimum release current value is obtained. It is stored in the main control circuit 60, and the temperature of the adsorption parts 32 1 to 32 4 in the mask placement device 30 is measured by the temperature measuring device 40 when aligning. A release current having a current value corresponding to the measured temperature may be applied based on the value of the release current.

上記例では、吸着部321~324はマスク用枠体31に設けられ、被吸着部231~234は基板用枠体41に設けられていたが、図16のようにその逆に、配置孔381~384と配置孔381~384の中の吸着部321~324とを基板用枠体41に設け、被吸着部231~234をマスク用枠体31に設け、吸着部321~324と被吸着部231~234とが非接触で対面した状態でマスク用枠体31と基板用枠体41とが接触するようにしてもよい。 In the above example, the suction portions 32 1 to 32 4 are provided on the mask frame 31, and the suction portions 23 1 to 23 4 are provided on the substrate frame 41. However, as shown in FIG. , arranging holes 38 1 to 38 4 and the sucking portions 32 1 to 32 4 in the arranging holes 38 1 to 38 4 are provided in the substrate frame 41, and the sucked portions 23 1 to 23 4 are provided in the mask frame 31. The mask frame 31 and the substrate frame 41 may be in contact with each other while the suction portions 32 1 to 32 4 and the suction portions 23 1 to 23 4 face each other without contact.

その場合、給電部9は、着脱部25ではなく、基板用枠体41が接触する移動装置24に設け、受電部8はマスク用枠体31ではなく基板用枠体41に設けると良い。 In this case, the power supply unit 9 should be provided not on the attachment/detachment unit 25 but on the moving device 24 with which the substrate frame 41 contacts, and the power receiving unit 8 should be provided on the substrate frame 41 instead of the mask frame 31 .

また、上記例では永久磁石部17は磁芯36とは別に設けたが、磁芯36を永久磁石で構成させれば、磁芯36を永久磁石部17として磁気コイル18の中に配置させることができる。 In the above example, the permanent magnet portion 17 is provided separately from the magnetic core 36, but if the magnetic core 36 is made of a permanent magnet, the magnetic core 36 can be arranged inside the magnetic coil 18 as the permanent magnet portion 17. can be done.

8……受電部
9……給電部
12……真空装置
14……電磁石部
15……マスク
16……基板
17……永久磁石部
18……磁気コイル
19a……第一の受電端子
19b……第二の受電端子
21……真空槽
231~234……被吸着部
24……移動装置
25……着脱部
29a……第一の給電端子
29b……第二の給電端子
30……マスク配置装置
31……マスク用枠体
321~324……吸着部
35……ヨーク部
35a……底面部
35b……側面部
36……磁芯
391……第一の被吸着部
392……第二の被吸着部
41……基板用枠体
42……基板配置装置
47a……第一の弾性部
47b……第二の弾性部
49……通電回路
65……電流制御回路
8 Power receiving unit 9 Power feeding unit 12 Vacuum device 14 Electromagnet unit 15 Mask 16 Substrate 17 Permanent magnet unit 18 Magnetic coil 19a First power receiving terminal 19b Second power receiving terminal 21 Vacuum chambers 23 1 to 23 4 Adsorbed portion 24 Moving device 25 Detachable portion 29a First power feeding terminal 29b Second power feeding terminal 30 Mask Placement device 31 Mask frame 32 1 to 32 4 Attracting portion 35 Yoke portion 35 a Bottom portion 35 b Side portion 36 Magnetic core 39 1 First attracted portion 39 2 ……Second attracted portion 41 ……Board frame 42 ……Board placement device 47a ……First elastic portion 47b ……Second elastic portion 49 ……Conducting circuit 65 ……Current control circuit

Claims (18)

真空排気される真空槽と、
マスクが配置されるマスク用枠体が設けられたマスク配置装置と、
基板が配置される基板用枠体が設けられた基板配置装置と、
を有し、
前記マスク配置装置に配置された前記マスクと前記基板配置装置に配置された前記基板とが対面した状態で前記マスク用枠体と前記基板用枠体とが前記真空槽の内部で固定される真空装置であって、
被吸着部と、前記被吸着部を磁気吸引する吸着部と、前記吸着部の温度を検出する温度測定器と、電流制御回路とを有し、
前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に前記被吸着部が設けられ、他方の枠体に前記吸着部が設けられ、
前記吸着部は、前記マスク配置装置と前記基板配置装置とが対面したときに、前記被吸着部を磁気吸引して前記基板用枠体と前記マスク用枠体とを固定する吸着状態と、前記磁気吸引の力が前記吸着状態よりも弱化されて前記基板用枠体と前記マスク用枠体とが分離できるようにされた解除状態との、いずれの状態にもすることが可能であり、
前記吸着部は、前記被吸着部を磁気吸引する磁界を形成する永久磁石部と、
磁芯に磁気コイルが巻き回され、前記磁気コイルに所定の大きさの解除電流が流されると、前記吸着部が前記被吸着部を磁気吸引する前記磁界が弱化されて前記吸着状態が前記解除状態に移行される電磁石部と、を有し、
前記電流制御回路は、前記温度測定器で検出された温度に基づいて前記解除電流の大きさを制御する
真空装置。
an evacuated vacuum chamber;
a mask placement device provided with a mask frame on which the mask is placed;
a board placement device provided with a board frame on which a board is placed;
has
a vacuum in which the mask frame and the substrate frame are fixed inside the vacuum chamber while the mask arranged in the mask arrangement device and the substrate arranged in the substrate arrangement device face each other; a device,
An attracting part, an attracting part that magnetically attracts the attracting part, a temperature measuring device that detects the temperature of the attracting part, and a current control circuit ,
one of the mask frame and the substrate frame is provided with the suction portion, and the other frame is provided with the suction portion;
The attracting part has an attracting state in which the attracting part is magnetically attracted to fix the substrate frame and the mask frame when the mask arranging device and the substrate arranging device face each other; a released state in which the force of magnetic attraction is weakened compared to the attracted state so that the substrate frame and the mask frame can be separated,
The attracting portion includes a permanent magnet portion that forms a magnetic field that magnetically attracts the attracted portion;
A magnetic coil is wound around the magnetic core, and when a releasing current of a predetermined magnitude is passed through the magnetic coil, the magnetic field that causes the attracting portion to magnetically attract the attracted portion is weakened, and the attracted state is changed to the released state. an electromagnet portion that is transitioned to a state ;
The current control circuit controls the magnitude of the release current based on the temperature detected by the temperature measuring device.
vacuum device.
前記磁芯の一端は、前記吸着状態では磁気吸引する前記被吸着部に向けられており、
前記吸着部には、一部が前記磁芯の他端側に位置し、先端が前記磁芯の一端と同じ方向に向けられたヨーク部が設けられ、
前記被吸着部は、前記磁芯の一端と対面する第一の被吸着部と、前記ヨーク部の先端と対面する第二の被吸着部とを有し、
前記永久磁石部のN極とS極のうちのいずれか一方の極性の磁極は前記磁芯の前記他端に向けられ、前記永久磁石部の他方の極性の磁極は前記ヨーク部の底面部に向けられた請求項1記載の真空装置。
one end of the magnetic core is directed to the attracted portion that is magnetically attracted in the attracted state;
The attracting portion is provided with a yoke portion partly positioned on the other end side of the magnetic core and having a tip directed in the same direction as one end of the magnetic core,
The attracted portion has a first attracted portion facing one end of the magnetic core and a second attracted portion facing the tip of the yoke portion,
One of the N pole and S pole of the permanent magnet portion is directed to the other end of the magnetic core, and the other magnetic pole of the permanent magnet portion is directed to the bottom portion of the yoke portion. The vacuum apparatus of claim 1, directed.
前記吸着部は前記マスク用枠体に設けられ、
前記マスク配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、
前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される請求項1又は請求項2のいずれか1項記載の真空装置。
The suction portion is provided on the mask frame,
The mask placement device is provided with a first power receiving terminal electrically connected to one end of the magnetic coil and a second power receiving terminal electrically connected to the other end of the magnetic coil,
3. The vacuum apparatus according to claim 1, wherein a voltage applied between said first power receiving terminal and said second power receiving terminal causes a current to flow through said magnetic coil.
前記マスク配置装置が着脱自在に配置される着脱部が前記真空槽内に設けられ、
前記着脱部には、前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、
前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、
前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、
前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる請求項3記載の真空装置。
A detachable part in which the mask arranging device is detachably arranged is provided in the vacuum chamber,
The detachable portion includes a first power supply terminal that can be brought into contact with and separated from the first power reception terminal, and a second power supply terminal that can be brought into contact with and separated from the second power reception terminal. and
The first power receiving terminal and the first power feeding terminal are electrically connected during contact,
The second power receiving terminal and the second power feeding terminal are electrically connected during contact,
4. The vacuum apparatus according to claim 3, wherein the release current flows due to a voltage applied between the first power supply terminal and the second power supply terminal.
前記吸着部は前記基板用枠体に設けられ、
前記基板配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、
前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される請求項1又は請求項2のいずれか1項記載の真空装置。
The suction part is provided on the substrate frame,
The substrate placement device is provided with a first power receiving terminal electrically connected to one end of the magnetic coil and a second power receiving terminal electrically connected to the other end of the magnetic coil,
3. The vacuum apparatus according to claim 1, wherein a voltage applied between said first power receiving terminal and said second power receiving terminal causes a current to flow through said magnetic coil.
前記基板配置装置が着脱自在に配置される着脱部が前記真空槽内に設けられ、
前記着脱部には、前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、
前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、
前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、
前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる請求項5記載の真空装置。
a detachable portion in which the substrate arranging device is detachably disposed is provided in the vacuum chamber;
The detachable portion includes a first power supply terminal that can be brought into contact with and separated from the first power reception terminal, and a second power supply terminal that can be brought into contact with and separated from the second power reception terminal. and
The first power receiving terminal and the first power feeding terminal are electrically connected during contact,
The second power receiving terminal and the second power feeding terminal are electrically connected during contact,
6. The vacuum apparatus according to claim 5, wherein the release current flows due to a voltage applied between the first power supply terminal and the second power supply terminal.
前記第一の受電端子と前記第一の給電端子のうち、いずれか一方の電極には第一の弾性部が設けられ、前記第一の受電端子と前記第一の給電端子とが接触しながら前記第一の弾性部が変形され、
前記第二の受電端子と前記第二の給電端子のうち、いずれか一方の電極には第二の弾性部が設けられ、前記第二の受電端子と前記第二の給電端子とが接触しながら前記第二の弾性部が変形され、
前記第一の弾性部の復元力によって前記第一の受電端子と前記第一の給電端子とが互いに押しつけられ、前記第二の弾性部の復元力によって前記第二の受電端子と前記第二の給電端子とが互いに押しつけられる請求項4又は請求項6のいずれか1項記載の真空装置。
A first elastic portion is provided on one electrode of the first power receiving terminal and the first power feeding terminal, and while the first power receiving terminal and the first power feeding terminal are in contact with each other, the first elastic portion is deformed,
A second elastic portion is provided on one electrode of the second power receiving terminal and the second power feeding terminal, and while the second power receiving terminal and the second power feeding terminal are in contact with each other, the second elastic portion is deformed,
The first power receiving terminal and the first power feeding terminal are pressed against each other by the restoring force of the first elastic portion, and the second power receiving terminal and the second power feeding terminal are pressed by the restoring force of the second elastic portion. 7. Vacuum apparatus according to claim 4 or claim 6, wherein the power supply terminals are pressed against each other.
前記吸着状態では、前記被吸着部と前記吸着部とは、離間して対面する請求項1乃至請求項のいずれか1項記載の真空装置。 8. The vacuum device according to any one of claims 1 to 7 , wherein in the suction state, the suctioned portion and the suction portion face each other while being separated from each other. マスクが配置されるマスク用枠体が設けられたマスク配置装置と、
基板が配置される基板用枠体が設けられた基板配置装置と、
を有し、
前記マスク配置装置に配置された前記マスクと前記基板配置装置に配置された前記基板とが対面した状態で前記マスク用枠体と前記基板用枠体とが固定される運搬装置であって、
被吸着部と、前記被吸着部を磁気吸引する吸着部と、前記吸着部の温度を検出する温度測定器と、電流制御回路とを有し、
前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に前記被吸着部が設けられ、他方の枠体に前記吸着部が設けられ、
前記吸着部は、前記マスク配置装置と前記基板配置装置とが対面したときに、前記被吸着部を磁気吸引して前記基板用枠体と前記マスク用枠体とを固定する吸着状態と、前記磁気吸引の力が前記吸着状態よりも弱化されて前記基板用枠体と前記マスク用枠体とが分離できるようにされた解除状態との、いずれの状態にもすることが可能であり、
前記吸着部は、前記被吸着部を磁気吸引する磁界を形成する永久磁石部と、
磁芯に磁気コイルが巻き回され、前記磁気コイルに所定の大きさの解除電流が流されると、前記吸着部が前記被吸着部を磁気吸引する前記磁界が弱化されて前記吸着状態が前記解除状態に移行される電磁石部と、を有し、
前記電流制御回路は、前記温度測定器で検出された温度に基づいて前記解除電流の大きさを制御する
運搬装置。
a mask placement device provided with a mask frame on which the mask is placed;
a board placement device provided with a board frame on which a board is placed;
has
A carrier device in which the mask frame and the substrate frame are fixed in a state in which the mask arranged in the mask arrangement device and the substrate arranged in the substrate arrangement device face each other,
An attracting part, an attracting part that magnetically attracts the attracting part, a temperature measuring device that detects the temperature of the attracting part, and a current control circuit ,
one of the mask frame and the substrate frame is provided with the suction portion, and the other frame is provided with the suction portion;
The attracting part has an attracting state in which the attracting part is magnetically attracted to fix the substrate frame and the mask frame when the mask arranging device and the substrate arranging device face each other; a released state in which the force of magnetic attraction is weakened compared to the attracted state so that the substrate frame and the mask frame can be separated,
The attracting portion includes a permanent magnet portion that forms a magnetic field that magnetically attracts the attracted portion;
A magnetic coil is wound around the magnetic core, and when a releasing current of a predetermined magnitude is passed through the magnetic coil, the magnetic field that causes the attracting portion to magnetically attract the attracted portion is weakened, and the attracted state is changed to the released state. an electromagnet portion that is transitioned to a state ;
The current control circuit controls the magnitude of the release current based on the temperature detected by the temperature measuring device.
Conveyor.
前記磁芯の一端は、前記吸着状態では磁気吸引する前記被吸着部に向けられており、
前記吸着部には、一部が前記磁芯の他端側に位置し、先端が前記磁芯の一端と同じ方向に向けられたヨーク部が設けられ、
前記被吸着部は、前記磁芯の一端と対面する第一の被吸着部と、前記ヨーク部の先端と対面する第二の被吸着部とを有し、
前記永久磁石部のN極とS極のうちのいずれか一方の極性の磁極は前記磁芯の前記他端に向けられ、前記永久磁石部の他方の極性の磁極は前記ヨーク部の底面部に向けられた請求項記載の運搬装置。
one end of the magnetic core is directed to the attracted portion that is magnetically attracted in the attracted state;
The attracting portion is provided with a yoke portion partly positioned on the other end side of the magnetic core and having a tip directed in the same direction as one end of the magnetic core,
The attracted portion has a first attracted portion facing one end of the magnetic core and a second attracted portion facing the tip of the yoke portion,
One of the N pole and S pole of the permanent magnet portion is directed to the other end of the magnetic core, and the other magnetic pole of the permanent magnet portion is directed to the bottom portion of the yoke portion. A conveying device according to claim 9 oriented.
前記吸着部は前記マスク用枠体に設けられ、
前記マスク配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、
前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される請求項又は請求項10のいずれか1項記載の運搬装置。
The suction portion is provided on the mask frame,
The mask placement device is provided with a first power receiving terminal electrically connected to one end of the magnetic coil and a second power receiving terminal electrically connected to the other end of the magnetic coil,
11. A transporting apparatus according to claim 9 or 10 , wherein a voltage applied between said first power receiving terminal and said second power receiving terminal causes current to flow through said magnetic coil.
真空槽内に設けられ、前記マスク配置装置が着脱自在に配置される着脱部に前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、
前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、
前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、
前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる請求項11記載の運搬装置。
A first power supply terminal that can be brought into contact with and separated from the first power reception terminal, and the second power reception terminal, which is provided in a vacuum chamber and can be attached to and detached from the mask placement device. A second power supply terminal that can be contacted and separated from is provided,
The first power receiving terminal and the first power feeding terminal are electrically connected during contact,
The second power receiving terminal and the second power feeding terminal are electrically connected during contact,
12. The transporting apparatus according to claim 11 , wherein the voltage applied between the first power supply terminal and the second power supply terminal causes the release current to flow.
前記吸着部は前記基板用枠体に設けられ、
前記基板配置装置には、前記磁気コイルの一端に電気的に接続された第一の受電端子と、前記磁気コイルの他端に電気的に接続された第二の受電端子と、が設けられ、
前記第一の受電端子と前記第二の受電端子との間に印加される電圧によって前記磁気コイルに電流が流される請求項又は請求項10のいずれか1項記載の運搬装置。
The suction part is provided on the substrate frame,
The substrate placement device is provided with a first power receiving terminal electrically connected to one end of the magnetic coil and a second power receiving terminal electrically connected to the other end of the magnetic coil,
11. A transporting apparatus according to claim 9 or 10 , wherein a voltage applied between said first power receiving terminal and said second power receiving terminal causes current to flow through said magnetic coil.
真空槽内に設けられ、前記基板配置装置が着脱自在に配置される移動装置に前記第一の受電端子に対して接触と離間とが可能な第一の給電端子と、前記第二の受電端子に対して接触と離間とが可能な第二の給電端子とが設けられ、
前記第一の受電端子と前記第一の給電端子とは接触中は電気的に接続され、
前記第二の受電端子と前記第二の給電端子とは接触中は電気的に接続され、
前記第一の給電端子と前記第二の給電端子との間に印加される電圧によって、前記解除電流が流れる請求項13記載の運搬装置。
A first power supply terminal capable of contacting and separating from the first power receiving terminal, and the second power receiving terminal are provided in a vacuum chamber and are disposed on a moving device on which the substrate placement device is detachably arranged. A second power supply terminal that can be contacted and separated from is provided,
The first power receiving terminal and the first power feeding terminal are electrically connected during contact,
The second power receiving terminal and the second power feeding terminal are electrically connected during contact,
14. The transporting apparatus according to claim 13 , wherein the voltage applied between the first power supply terminal and the second power supply terminal causes the release current to flow.
前記吸着状態では、前記被吸着部と前記吸着部とは、離間して対面する請求項乃至請求項14のいずれか1項記載の運搬装置。 15. The conveying device according to claim 9 , wherein in the suction state, the suctioned portion and the suction portion face each other while being separated from each other. マスクが配置されたマスク用枠体を有するマスク配置装置と、基板が配置された基板用枠体を有する基板配置装置とを相対的に移動させ、前記マスクと前記基板との位置合わせを行う位置合わせ工程と、
前記マスク用枠体と前記基板用枠体とのうち、いずれか一方の枠体に設けられた吸着部が有する永久磁石部が形成する磁界によって、他方の枠体に設けられた被吸着部を磁気吸引して前記マスク用枠体と前記基板用枠体とを互いに固定して、前記マスクと前記基板とを相対的に固定させる固定工程と、
前記マスクと前記基板とを相対的に固定した状態で前記マスク配置装置と前記基板配置装置とを一緒に移動させる移動工程と、を有するアラインメント方法であって、
前記位置合わせ工程では、温度測定器により前記吸着部の温度を測定し、前記吸着部の前記磁気吸引する力を前記吸着部に設けられた電磁石部に前記吸着部の温度に対応する解除電流を流して弱化させ、
前記固定工程では、前記解除電流を停止させるアラインメント方法。
A position for aligning the mask and the substrate by relatively moving a mask placement device having a mask frame on which a mask is placed and a substrate placement device having a substrate frame on which a substrate is placed. a matching process;
By the magnetic field formed by the permanent magnet portion of the attracting portion provided on one of the mask frame and the substrate frame, the attracting portion provided on the other frame is moved. a fixing step of fixing the mask frame and the substrate frame to each other by magnetic attraction to relatively fix the mask and the substrate;
a moving step of moving the mask placement device and the substrate placement device together while the mask and the substrate are relatively fixed, the alignment method comprising:
In the alignment step, the temperature of the attracting portion is measured by a temperature measuring device, and the magnetic attracting force of the attracting portion is applied to the electromagnet portion provided in the attracting portion by applying a release current corresponding to the temperature of the attracting portion. drain and weaken,
The alignment method of stopping the release current in the fixing step.
前記電磁石部に流れる電流を漸減させて前記解除電流を停止させる請求項16記載のアラインメント方法。 17. The alignment method according to claim 16 , wherein the current flowing through the electromagnet portion is gradually decreased to stop the release current. 前記吸着部が前記被吸着部を磁気吸引する力を弱化させる電流の値と前記マスク配置装置の温度との関係を求めて記憶しておき、
前記マスク配置装置の温度を測定し、測定した温度に対応する値の電流を前記解除電流として前記電磁石部に流す請求項16又は請求項17のいずれか1項記載のアラインメント方法。
Obtaining and storing a relationship between a value of a current that weakens the force of the attracting part magnetically attracting the part to be attracted and the temperature of the mask placement device;
18. The alignment method according to claim 16 , wherein the temperature of said mask placement device is measured, and a current having a value corresponding to the measured temperature is passed through said electromagnet unit as said release current.
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