JP7335136B2 - 樹脂保護部材形成装置 - Google Patents
樹脂保護部材形成装置 Download PDFInfo
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- JP7335136B2 JP7335136B2 JP2019201387A JP2019201387A JP7335136B2 JP 7335136 B2 JP7335136 B2 JP 7335136B2 JP 2019201387 A JP2019201387 A JP 2019201387A JP 2019201387 A JP2019201387 A JP 2019201387A JP 7335136 B2 JP7335136 B2 JP 7335136B2
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/023—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/52—Heating or cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/03—Injection moulding apparatus
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
- H10P14/6502—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed before formation of the materials
- H10P14/6508—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed before formation of the materials by exposure to a liquid
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0432—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7416—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/78—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using vacuum or suction, e.g. Bernoulli chucks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W40/00—Arrangements for thermal protection or thermal control
- H10W40/20—Arrangements for cooling
- H10W40/28—Arrangements for cooling comprising Peltier coolers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2101/00—Use of unspecified macromolecular compounds as moulding material
- B29K2101/12—Thermoplastic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2031/00—Other particular articles
- B29L2031/34—Electrical apparatus, e.g. sparking plugs or parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
このように、本樹脂保護部材形成装置では、面状の樹脂載置面によって樹脂を冷却するため、樹脂を均等に冷やすことができる。したがって、樹脂を硬化させることによって得られる保護部材に厚みのばらつきが生じることを、抑制することが可能である。その結果、保護部材の厚みを、略均等にすることができる。
なお、真空形成チャンバー2の上面における支持柱11の貫通部分には、真空形成チャンバー2内の真空を維持するための真空シール2aが設けられている。
なお、粒状の熱可塑性樹脂Pが樹脂載置面23から落ちないように、樹脂載置面23の外周には環状の凸部を形成していてもよい。
この状態で、制御手段70は、真空ポンプ7を制御して、真空形成チャンバー2内を真空引きする。
なお、ウェーハ搬送手段40は、ウェーハWの第1面Waを保持してもよい。
2:真空形成チャンバー、3:カバー、5:カバー開閉手段、7:真空ポンプ、
10:ウェーハ保持手段、12:ウェーハ保持テーブル、13:ウェーハ保持面、
14:エア供給源、15:通気路、16:吸引源、
20:ステージ、22:樹脂載置テーブル、23:樹脂載置面、
24:ペルチェ素子、24a:上面、24b:下面、
25:第1電力線、26:第2電力線、
27:切換手段、28:直流電源、
30:上下移動手段、60:荷重検知手段、
40:ウェーハ搬送手段、50:樹脂搬送手段、
70:制御手段、
S:溶融樹脂層、
W:ウェーハ、Wb:第2面
Claims (1)
- 粒状の熱可塑性樹脂を載置するための樹脂載置面を有するステージと、該樹脂載置面に対面したウェーハ保持面によってウェーハを保持するウェーハ保持手段と、該ステージと該ウェーハ保持手段とを相対的に該樹脂載置面に垂直な上下方向に移動させる上下移動手段と、を備え、該熱可塑性樹脂を溶かして該ウェーハの一方の面の全面に保護部材を形成する樹脂保護部材形成装置であって、
該ステージは、
該ステージの内部に配置され、該樹脂載置面に平行で該樹脂載置面に近い上面と該樹脂載置面から遠い下面とを有するペルチェ素子と、
該ペルチェ素子に直流電流を供給する直流電源と、
該ペルチェ素子に供給される該直流電流の方向を、該ペルチェ素子の該上面を加熱する第1方向と、該ペルチェ素子の該上面を冷却する該第1方向とは逆方向の第2方向とを切り換える切換手段と、を備え、
該切換手段を制御して該直流電流を該第1方向に流すことにより、該ペルチェ素子の該上面を加熱して、該樹脂載置面に載置された該熱可塑性樹脂を溶かすこと、
該樹脂載置面とウェーハの一方の面との間で、ウェーハの一方の面の全面に、溶かした樹脂を押し広げること、および、
該切換手段を制御して該直流電流を該第2方向で流すことにより、該ペルチェ素子の該上面を冷却して、該樹脂載置面とウェーハの一方の面との間で押し広げられた樹脂を硬化して、ウェーハの一方の面の全面に保護部材を形成すること、を実施する制御手段をさらに備える、
樹脂保護部材形成装置。
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019201387A JP7335136B2 (ja) | 2019-11-06 | 2019-11-06 | 樹脂保護部材形成装置 |
| TW109136160A TWI844741B (zh) | 2019-11-06 | 2020-10-19 | 樹脂保護構件形成裝置 |
| CN202011189606.6A CN112786461A (zh) | 2019-11-06 | 2020-10-30 | 树脂保护部件形成装置 |
| KR1020200145295A KR102770658B1 (ko) | 2019-11-06 | 2020-11-03 | 수지 보호 부재 형성 장치 |
| DE102020213865.6A DE102020213865B4 (de) | 2019-11-06 | 2020-11-04 | Ausbildungsvorrichtung für Kunststoffschutzelement |
| US17/089,049 US11443951B2 (en) | 2019-11-06 | 2020-11-04 | Resin protection member forming apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019201387A JP7335136B2 (ja) | 2019-11-06 | 2019-11-06 | 樹脂保護部材形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021077694A JP2021077694A (ja) | 2021-05-20 |
| JP7335136B2 true JP7335136B2 (ja) | 2023-08-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019201387A Active JP7335136B2 (ja) | 2019-11-06 | 2019-11-06 | 樹脂保護部材形成装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11443951B2 (ja) |
| JP (1) | JP7335136B2 (ja) |
| KR (1) | KR102770658B1 (ja) |
| CN (1) | CN112786461A (ja) |
| DE (1) | DE102020213865B4 (ja) |
| TW (1) | TWI844741B (ja) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7376322B2 (ja) * | 2019-11-06 | 2023-11-08 | 株式会社ディスコ | 樹脂シート固定装置 |
| CN115763320A (zh) * | 2022-12-07 | 2023-03-07 | 西安奕斯伟材料科技有限公司 | 单晶硅片处理方法及装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006156683A (ja) | 2004-11-29 | 2006-06-15 | Tokyo Ohka Kogyo Co Ltd | サポートプレートの貼り付け方法 |
| WO2006090650A1 (ja) | 2005-02-23 | 2006-08-31 | Jsr Corporation | ウェハ加工方法 |
| JP2011119578A (ja) | 2009-12-07 | 2011-06-16 | Disco Abrasive Syst Ltd | 貼着装置 |
| JP2012146871A (ja) | 2011-01-13 | 2012-08-02 | Disco Abrasive Syst Ltd | ワーク保持装置 |
| JP2019186437A (ja) | 2018-04-12 | 2019-10-24 | 株式会社ディスコ | 拡張方法及び拡張装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP4141725B2 (ja) | 2002-04-09 | 2008-08-27 | 株式会社メカワールド | フィルム貼付け方法 |
| JP3859654B2 (ja) * | 2003-07-31 | 2006-12-20 | 沖電気工業株式会社 | 半導体装置の製造方法 |
| JP5089370B2 (ja) * | 2007-12-21 | 2012-12-05 | 株式会社ディスコ | 樹脂被覆方法および装置 |
| JP5320058B2 (ja) * | 2008-12-26 | 2013-10-23 | 株式会社ディスコ | 樹脂被覆方法および樹脂被覆装置 |
| JP2012028651A (ja) * | 2010-07-26 | 2012-02-09 | Toshiba Corp | 樹脂供給装置および半導体装置の製造方法 |
| CN103930252B (zh) * | 2011-11-08 | 2016-08-17 | 山田尖端科技株式会社 | 树脂密封装置 |
| JP6184717B2 (ja) * | 2013-03-28 | 2017-08-23 | 株式会社ディスコ | ウェーハ貼着装置 |
| JP6104070B2 (ja) * | 2013-06-20 | 2017-03-29 | 株式会社ディスコ | 切削方法 |
| KR20170092323A (ko) * | 2016-02-03 | 2017-08-11 | 삼성전자주식회사 | 반도체 패키지의 몰딩 장치 |
| JP6602702B2 (ja) * | 2016-03-15 | 2019-11-06 | 株式会社ディスコ | 保護部材形成装置 |
| JP6641209B2 (ja) * | 2016-03-22 | 2020-02-05 | 株式会社ディスコ | 保護部材形成装置 |
| JP2018142630A (ja) * | 2017-02-28 | 2018-09-13 | 日化精工株式会社 | ウェーハ仮止め用ワックス及びウェーハの仮止め方法 |
| JP7105053B2 (ja) * | 2017-11-06 | 2022-07-22 | 株式会社ディスコ | 保護部材形成装置 |
| DE102018202254A1 (de) * | 2018-02-14 | 2019-08-14 | Disco Corporation | Verfahren zum Bearbeiten eines Wafers |
| JP7024599B2 (ja) * | 2018-05-23 | 2022-02-24 | セイコーエプソン株式会社 | 可塑化装置、射出成形機および造形装置 |
| JP7099119B2 (ja) * | 2018-07-20 | 2022-07-12 | セイコーエプソン株式会社 | 射出成形装置および射出成形方法 |
| JP6839314B2 (ja) * | 2019-03-19 | 2021-03-03 | 日本碍子株式会社 | ウエハ載置装置及びその製法 |
-
2019
- 2019-11-06 JP JP2019201387A patent/JP7335136B2/ja active Active
-
2020
- 2020-10-19 TW TW109136160A patent/TWI844741B/zh active
- 2020-10-30 CN CN202011189606.6A patent/CN112786461A/zh active Pending
- 2020-11-03 KR KR1020200145295A patent/KR102770658B1/ko active Active
- 2020-11-04 DE DE102020213865.6A patent/DE102020213865B4/de active Active
- 2020-11-04 US US17/089,049 patent/US11443951B2/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006156683A (ja) | 2004-11-29 | 2006-06-15 | Tokyo Ohka Kogyo Co Ltd | サポートプレートの貼り付け方法 |
| WO2006090650A1 (ja) | 2005-02-23 | 2006-08-31 | Jsr Corporation | ウェハ加工方法 |
| JP2011119578A (ja) | 2009-12-07 | 2011-06-16 | Disco Abrasive Syst Ltd | 貼着装置 |
| JP2012146871A (ja) | 2011-01-13 | 2012-08-02 | Disco Abrasive Syst Ltd | ワーク保持装置 |
| JP2019186437A (ja) | 2018-04-12 | 2019-10-24 | 株式会社ディスコ | 拡張方法及び拡張装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20210134598A1 (en) | 2021-05-06 |
| US11443951B2 (en) | 2022-09-13 |
| DE102020213865B4 (de) | 2024-10-24 |
| JP2021077694A (ja) | 2021-05-20 |
| TW202119539A (zh) | 2021-05-16 |
| DE102020213865A1 (de) | 2021-05-06 |
| CN112786461A (zh) | 2021-05-11 |
| TWI844741B (zh) | 2024-06-11 |
| KR102770658B1 (ko) | 2025-02-19 |
| KR20210055006A (ko) | 2021-05-14 |
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