JP7337766B2 - Vacuum processing equipment - Google Patents

Description

The technology disclosed in the specification of the present application relates to a vacuum processing apparatus. Substrates to be processed include, for example, semiconductor wafers, glass substrates for liquid crystal display devices, flat panel display (FPD) substrates such as organic EL (electroluminescence) display devices, optical disk substrates, magnetic disk substrates, and magneto-optical disks. substrates for photomasks, glass substrates for photomasks, ceramic substrates, substrates for field emission displays (ie, FEDs), substrates for solar cells, and the like.

2. Description of the Related Art Conventionally, a vacuum processing apparatus has been used that performs various processes on an object to be processed, such as a substrate placed on a movable stage in a vacuum chamber.

JP 2015-230926 A JP-A-2001-44107

Deformation can occur in the vacuum chamber when the vacuum is applied. As a result, when moving a stage on which a substrate or the like is placed within a vacuum chamber, the stage fixed to the vacuum chamber is affected by the deformation of the vacuum chamber, and the movement accuracy of the stage decreases. be.

The technology disclosed in the specification of the present application has been made in view of the problems described above, and is a technology for increasing the movement accuracy of a stage that moves in a vacuum chamber.

A vacuum processing apparatus, which is a first aspect of the technology disclosed in the specification of the present application, includes a vacuum chamber, a stage provided in the vacuum chamber, and a stage provided outside the vacuum chamber. an external fixing part connected via a member; and a moving mechanism fixed to the external fixing part and provided in the vacuum chamber for moving the stage, wherein the moving mechanism is connected to the external part. a coil module that is fixed to a fixed part and generates magnetic force; and a magnet module that is connected to the stage and moves relative to the coil module by the magnetic force generated by the coil module. wherein said elastic member is hollow and communicates with an opening formed in said vacuum chamber, said coil module extending into said elastic member and through said opening in said vacuum chamber; fixed to a fixed part, the external fixed part being inserted into the elastic member and having a first end to which the coil module of the moving mechanism is fixed; 1 and further comprising a cooling part for cooling the moving mechanism .

A vacuum processing apparatus, which is a second aspect of the technology disclosed in the specification of the present application, relates to the vacuum processing apparatus, which is the first aspect, wherein the external fixing portion is provided on the bottom surface of the vacuum chamber. It is connected to the vacuum chamber via a member.

A vacuum processing apparatus according to a third aspect of the technology disclosed in the specification of the present application relates to the vacuum processing apparatus according to the first or second aspect, and is provided in the vacuum chamber along the moving direction of the stage. The guide part is fixed to the external fixed part.

A vacuum processing apparatus according to a fourth aspect of the technology disclosed in the present specification relates to the vacuum processing apparatus according to any one of the first to third aspects, and includes: A lead portion for measuring the amount of movement along the movement direction is further provided, and the lead portion is fixed to the external fixing portion.

According to at least the first aspect of the technology disclosed in this specification, the moving mechanism is fixed to the external fixing part. And the external fixing part is connected to the vacuum chamber via an elastic member. Therefore, even if the vacuum chamber is deformed, the elastic member absorbs the deformation of the vacuum chamber and suppresses the positional deviation of the external fixing part. Displacement is suppressed. That is, it is possible to improve the moving accuracy of the stage moved by the moving mechanism.

Also, the objects, features, aspects, and advantages associated with the technology disclosed herein will become more apparent from the detailed description and accompanying drawings presented below.

1 is a perspective view schematically showing an example of the configuration of a vacuum processing apparatus according to an embodiment; FIG. 2 is a cross-sectional view showing an example of the internal configuration and peripheral configuration of a vacuum chamber of the vacuum processing apparatus according to the embodiment; FIG. FIG. 4 is a cross-sectional view showing an example of a linear motor mechanism inside a vacuum chamber and its peripheral configuration; FIG. 10 is a cross-sectional view showing an example of the internal configuration of a vacuum chamber and the peripheral configuration of a vacuum processing apparatus as a modified example;

Embodiments will be described below with reference to the attached drawings. In the following embodiments, detailed features and the like are also shown for technical explanation, but they are examples, and not all of them are necessarily essential features for enabling the embodiments.

It should be noted that the drawings are shown schematically, and for the sake of convenience of explanation, the configurations may be omitted or simplified in the drawings as appropriate. In addition, the mutual relationship of sizes and positions of configurations shown in different drawings is not necessarily described accurately and can be changed as appropriate. In addition, even in drawings such as plan views that are not cross-sectional views, hatching may be added to facilitate understanding of the contents of the embodiments.

In addition, in the description given below, the same components are denoted by the same reference numerals, and their names and functions are also the same. Therefore, a detailed description thereof may be omitted to avoid duplication.

Also, in the description below, when a component is described as “comprising,” “including,” or “having,” it is an exclusive term that excludes the presence of other components unless otherwise specified. not an expression.

Also, in the descriptions set forth below, specific positions or directions such as "top", "bottom", "left", "right", "side", "bottom", "front" or "back" are meant. However, these terms are used for convenience in order to facilitate understanding of the content of the embodiments, and the positions or directions when actually implemented are different. It is irrelevant.

<Embodiment>
A vacuum processing apparatus according to this embodiment will be described below.

<Regarding the configuration of the vacuum processing apparatus>
FIG. 1 is a perspective view schematically showing an example of the configuration of a vacuum processing apparatus 1 according to this embodiment. In FIG. 1, the illustration of the chamber frame that supports the vacuum chamber 12 or the wiring that is actually connected is omitted for the sake of convenience. It should be noted that the "vacuum" in the present embodiment is desirably a high vacuum (for example, 0.00001 Pa) in order to prevent deterioration of the characteristics of the substrate W, but if the degree of vacuum does not reach the high vacuum, shall also include

As shown in FIG. 1, the vacuum processing apparatus 1 includes a vacuum chamber 12, an external fixed part 14 such as a granite plate, and a vacuum chamber 12 and external fixed part 14, which are made of, for example, stainless steel. The bellows 16A which is a stretchable member, the irradiation unit 18 which irradiates light into the vacuum chamber 12, the vacuum pump 20 which reduces the pressure in the vacuum chamber 12 to a vacuum state, and the vacuum processing apparatus 1 are driven. and a control unit 22 for controlling the unit. In the above description, bellows made of stainless steel or the like is shown as an example of the elastic member. An elastic member made of resin or the like may be employed. Further, the shape of the stretchable member may not be a bellows shape like the bellows 16A described above.

The vacuum chamber 12 has a space in which the substrate W is accommodated. The substrate W is, for example, a substrate having a thin film formed on its upper surface. An opening 12A is formed in the side surface of the vacuum chamber 12 through which the substrate W passes when the substrate W is loaded and unloaded. The opening 12A is appropriately closed when the vacuum chamber 12 is evacuated. Other configurations accommodated inside the vacuum chamber 12 will be described later.

The irradiation unit 18 irradiates the upper surface of the substrate W housed in the vacuum chamber 12 with light. The irradiation unit 18 irradiates laser light, for example. The irradiating section 18 may irradiate light such as an electron beam depending on the purpose of processing. The irradiation unit 18 irradiates the upper surface of the substrate W accommodated in the vacuum chamber 12 with light from the outside of the vacuum chamber 12 through an irradiation window (transparent plate such as quartz) (not shown). Light scans the upper surface of the substrate W by moving the substrate W in the vacuum chamber 12 relative to the irradiation unit 18 or by controlling the optical system in the irradiation unit 18 . Also, the irradiation unit 18 is arranged on the upper surface of a mount 24 fixed to the external fixing unit 14 .

The control unit 22 includes, for example, a hard disk drive (ie, HDD), a random access memory (ie, RAM), a read only memory (ie, ROM), a flash memory, a volatile Or non-volatile semiconductor memory, magnetic disk, flexible disk, optical disk, compact disk, mini disk or storage device including memory (storage medium) including DVD, for example, the storage device, external CD-ROM, external A processing circuit such as a central processing unit (i.e., CPU) that executes programs stored in a DVD-ROM or an external flash memory, and a mouse, keyboard, touch panel, or various switches , an input device to which information can be input, and an output device, such as a display, a liquid crystal display, or a lamp, to which information can be output.

The control unit 22 controls the output of the light source and the irradiation area in the irradiation unit 18, or the output control of the vacuum pump 20, and furthermore, each driving unit described later (for example, the driving unit of the linear motor mechanism or the driving of the lift pin mechanism part) drive control, etc.

FIG. 2 is a cross-sectional view showing an example of the internal configuration and peripheral configuration of the vacuum chamber 12 of the vacuum processing apparatus 1 according to this embodiment. As shown in FIG. 2, inside the vacuum chamber 12 are a stage 42 on which the substrate W is placed, and a slider 44 that is movable in the Y-axis direction and supports the stage 42 from below. a base 46 fixed to the external fixing part 14 independently of the vacuum chamber 12; a linear guide 48 fixed to the base 46 and extending in the Y-axis direction; A linear motor mechanism 50 for moving in the axial direction and a lift pin mechanism 52 having lift pins 52A for supporting the substrate W through through holes (not shown here) formed in the stage 42 are provided.

The stage 42 holds the substrate W substantially horizontally while directing the processing surface of the substrate W upward. The slider 44 supporting the stage 42 is moved in the Y-axis direction by the linear motor mechanism 50, and the light emitted from the irradiation unit 18 is scanned in the X-axis direction. It becomes possible to scan the entire surface with light. Note that the lift pin mechanism 52 is fixed to the base 46 .

The linear motor mechanism 50 is fixed to the external fixing part 14 positioned on the side of the vacuum chamber 12 through an opening 12B formed in the side surface of the vacuum chamber 12 . Specifically, linear motor mechanism 50 is fixed to the end of hollow post 14A passing through bellows 16A welded to opening 12B. At this time, wiring and the like connected to the linear motor mechanism 50 are led out of the vacuum chamber 12 through the inside of the columnar member 14A. The columnar member 14A included in the external fixing portion 14 is fixed to the external member 14B included in the external fixing portion 14. As shown in FIG. Also, the columnar member 14A does not come into contact with the bellows 16A connected to the side surface of the vacuum chamber 12. As shown in FIG.

The base 46 is fixed to the external fixing part 14 positioned below the vacuum chamber 12 through an opening 12C formed in the bottom surface of the vacuum chamber 12 . Specifically, the base 46 is fixed to the end of the columnar member 14C passing through the bellows 16B welded to the opening 12C. The columnar member 14C included in the external fixing portion 14 is fixed to the external member 14B included in the external fixing portion 14. As shown in FIG. Also, the columnar member 14C does not come into contact with the bellows 16B connected to the bottom surface of the vacuum chamber 12. As shown in FIG.

In FIG. 2, the external fixtures 14 are arranged laterally and downwardly of the vacuum chamber 12, but it is not essential that the external fixtures 14 at these positions be continuous, but distributed at these positions. It may be provided as such, or may be provided only at one of the positions. In addition, the vacuum chamber 12 is supported and fixed vertically by a chamber frame (not shown) separately from the bellows 16B.

FIG. 3 is a cross-sectional view showing an example of the linear motor mechanism 50 inside the vacuum chamber 12 and its peripheral configuration. As an example is shown in FIG. 3, the linear motor mechanism 50 is fixed to the outer member 14B via the columnar member 14A.

Vacuum chamber 12 and external member 14B are connected via bellows 16A. Therefore, even if the inside of the vacuum chamber 12 is evacuated and the vacuum chamber 12 is deformed such as shrinking, the bellows 16A absorbs the deformation of the vacuum chamber 12 and suppresses the displacement of the external member 14B. . Therefore, even if the inside of the vacuum chamber 12 becomes a vacuum state and the vacuum chamber 12 is deformed such as shrinking, the positional deviation of the linear motor mechanism 50 fixed to the external member 14B via the columnar member 14A is Suppressed.

The linear motor mechanism 50 includes a coil module 50A fixed to the end of the columnar member 14A, a magnet module 50B movable in the Y-axis direction with respect to the coil module 50A, and wiring 50C for applying current to the coil module 50A. and

The current flowing through the coil of the coil module 50A is controlled by the control unit 22 . Magnet module 50B is, for example, a permanent magnet, and can move in the Y-axis direction at high speed with high precision due to attraction and repulsion with magnetic flux generated by current flowing through coil module 50A.

Further, since the magnet module 50B is fixed to the slider 44, the slider 44 (furthermore, the stage 42) moves along the linear guide 48 in the Y-axis direction as the magnet module 50B moves in the Y-axis direction.

The wiring 50C is led out of the vacuum chamber 12 through the inner space 142 of the hollow columnar member 14A. When the wiring 50C is led out to the outside, the vacuum chamber 12 and the bellows 16A are kept airtight by, for example, a hermetic connector.

Wiring 50C and the like for driving the coil module 50A are connected to the coil module 50A. However, since the coil module 50A is fixed to the columnar member 14A, it is sufficient to move the magnet module 50B in the Y-axis direction in order to move the slider 44 in the Y-axis direction. , the wiring 50C connected to the coil module 50A and the like do not move within the vacuum chamber 12. Therefore, it is possible to suppress the generation of frictional heat or dust due to the movement of the wiring 50C or the like.

A cooling path 144, which is a hollow path through which a cooling medium such as air or cooling water passes, may be formed in the columnar member 14A. The cooling path 144 is preferably located near the end to which the linear motor mechanism 50 is fixed, as shown for example in FIG. By passing cooling water or the like through the cooling path 144, the heat generated in the coil module 50A can be effectively cooled.

A lead portion 54 for measuring the position in the Y-axis direction of the slider 44 moving in the Y-axis direction may be provided in the vacuum chamber 12 . The lead section 54 includes a read head 54A for measuring the position of the slider 44 in the Y-axis direction, and a support section 54B for supporting the read head 54A.

The read head 54A reads the value of a linear scale (not shown) attached to the opposing surface of the slider 44 (that is, part of the side surface of the slider 44) and extending in the Y-axis direction. The positional information read by the read head 54A is output to the control unit 22, and the amount of movement of the slider 44 (that is, the stage 42) extracted from the positional information is controlled by the current control of the coil module 50A in the control unit 22. Used.

The support portion 54B supports the read head 54A at one end and is fixed to the columnar member 14A at the other end. Therefore, even if the inside of the vacuum chamber 12 is evacuated and the vacuum chamber 12 is deformed such as shrinking, it is fixed to the external member 14B via the columnar member 14A as in the case of the linear motor mechanism 50. Positional displacement of the lead portion 54 is suppressed.

Wiring and the like for driving the read head 54A are connected to the read head 54A. However, the read head 54A is fixed to the columnar member 14A via the supporting portion 54B, and the position of the slider 44 in the Y-axis direction can be measured by moving the slider 44 relatively to the read head 54A in the Y-axis direction. Therefore, the wires connected to the read head 54A do not move within the vacuum chamber 12 as the slider 44 moves. Therefore, it is possible to suppress the generation of frictional heat or the generation of dust due to the movement of the wiring or the like.

Although the linear motor mechanism 50 and the lead portion 54 are fixed to the external member 14B via the columnar member 14A in the same bellows 16A in FIG. may be secured to the same or separate external members via .

FIG. 4 is a cross-sectional view showing an example of the internal configuration of the vacuum chamber 112 and the peripheral configuration of a vacuum processing apparatus as a modification. As an example is shown in FIG. 4, inside the vacuum chamber 112 are a stage 42, a slider 44, a base 46 fixed to an external fixing portion 114 independently of the vacuum chamber 112, and a linear guide 48. , a linear motor mechanism 150 for moving the slider 44 along the linear guide 48 in the Y-axis direction, and a lift pin mechanism 52 . The linear motor mechanism 150 includes a coil module fixed to the end of the columnar member 14D, a magnet module movable in the Y-axis direction with respect to the coil module, and wiring for applying current to the coil module.

The linear motor mechanism 150 is fixed to an external fixing portion 114 located below the vacuum chamber 112 through an opening 12D formed in the bottom surface of the vacuum chamber 112. As shown in FIG. Specifically, linear motor mechanism 150 is fixed to the end of hollow post 14D passing through bellows 16C welded to opening 12D. At this time, wires and the like connected to the linear motor mechanism 150 are led out of the vacuum chamber 112 through the inside of the columnar member 14D. The columnar member 14D included in the external fixing portion 114 is fixed to the external member 14E included in the external fixing portion 114. As shown in FIG. Also, the columnar member 14D does not come into contact with the bellows 16C connected to the bottom surface of the vacuum chamber 112. As shown in FIG.

The base 46 is fixed to an external fixing portion 114 located below the vacuum chamber 112 through an opening 12C formed in the bottom surface of the vacuum chamber 112. As shown in FIG. Specifically, the base 46 is fixed to the end of the columnar member 14C passing through the bellows 16B welded to the opening 12C. The columnar member 14C included in the external fixing portion 114 is fixed to the external member 14E included in the external fixing portion 114. As shown in FIG. Also, the columnar member 14C does not come into contact with the bellows 16B connected to the bottom surface of the vacuum chamber 112 .

In FIG. 4, the external fixing part 114 is arranged over the entire lower part of the vacuum chamber 112, but it is not essential that the external fixing part 114 is continuous in this range, and even if it is distributed Alternatively, it may be provided only at one of the positions. In addition, the vacuum chamber 112 is supported and fixed vertically by a chamber frame (not shown) separately from the bellows 16B and bellows 16C. be done.

According to the configuration as described above, even if the interior of the vacuum chamber 112 is evacuated and the vacuum chamber 112 is deformed such as shrinking, it is fixed to the external member 14E via the columnar member 14D. Positional deviation of the motor mechanism 150 is suppressed.

Moreover, according to the configuration as described above, no bellows is connected to the side surface of the vacuum chamber 112 . Therefore, for example, if the top and side surfaces of vacuum chamber 112 and the bottom surface of vacuum chamber 112 are configured to be separable, the top and side surfaces of vacuum chamber 112 are removed, and bellows 16B and bellows 16C are attached to the bottom surface of vacuum chamber 112. are connected, it is possible to easily adjust the arrangement of each component accommodated in the vacuum chamber 112 .

As in the case shown in FIG. 3, also in FIG. 4, lead portions for measuring the position in the Y-axis direction of the slider 44 moving in the Y-axis direction may be provided. The lead portion includes a read head for reading the value of a linear scale extending in the Y-axis direction attached to the facing surface of the slider 44 (for example, part of the lower surface of the slider 44), and a lead while being fixed to the columnar member 14D. and a support for supporting the head.

3, a cooling path for cooling the linear motor mechanism 150 may be formed in the columnar member 14D in FIG. 4 as well.

Also, although the base 46 and the linear motor mechanism 150 are fixed to the outer member 14E through the pillar members in separate bellows in FIG. , etc., to the same or separate external members.

<About the effect produced by the embodiment described above>
Next, examples of effects produced by the embodiments described above are shown. In the following description, the effect will be described based on the specific configuration exemplified in the embodiment described above. may be substituted with other specific configurations shown.

According to the embodiments described above, the vacuum processing apparatus includes the vacuum chamber 12 (or the vacuum chamber 112; hereinafter, for convenience, any one of these may be referred to correspondingly). , a stage 42, an external fixed portion 14 (or an external fixed portion 114; hereinafter, for the sake of convenience, any one of these may be referred to as corresponding), and a moving mechanism. Here, the moving mechanism corresponds to, for example, at least one of the linear motor mechanism 50, the linear motor mechanism 150, etc. sometimes). A stage 42 is provided within the vacuum chamber 12 . The external fixing part 14 is connected to the vacuum chamber 12 via an elastic member. Here, the elastic member corresponds to, for example, at least one of bellows 16A, bellows 16B, bellows 16C, etc. sometimes). The linear motor mechanism 50 is provided inside the vacuum chamber 12 while being fixed to the external fixing portion 14 . Also, the linear motor mechanism 50 moves the stage 42 . The linear motor mechanism 50 includes a coil module 50A and a magnet module 50B. The coil module 50A is fixed to the external fixing portion 14 . In addition, the coil module 50A generates magnetic force when current flows. Magnet module 50B is connected to stage 42 . Also, the magnet module 50B moves relative to the coil module 50A by the magnetic force generated by the coil module 50A.

With such a configuration, the linear motor mechanism 50 is fixed to the external fixing portion 14 . The external fixing portion 14 is connected to the vacuum chamber 12 via a bellows 16A. Therefore, even if the inside of the vacuum chamber 12 is evacuated and the vacuum chamber 12 is deformed such as shrinking, the bellows 16A absorbs the deformation of the vacuum chamber 12 and suppresses the displacement of the external fixing portion 14. Therefore, positional deviation of the linear motor mechanism 50 fixed to the external fixing portion 14 is suppressed. That is, the movement accuracy of the stage 42 moved by the linear motor mechanism 50 can be improved. Further, the coil module 50A is fixed to the external fixing portion 14, and in order to move the stage 42, it is sufficient to move the magnet module 50B. Therefore, the wires connected to the coil module 50A do not move within the vacuum chamber 12 as the stage 42 moves. Therefore, it is possible to suppress the generation of frictional heat or the generation of dust due to the movement of the wiring or the like.

It should be noted that when other configurations exemplified in the present specification are appropriately added to the above configurations, that is, when other configurations in the present specification that are not mentioned as the above configurations are added as appropriate can produce a similar effect.

Moreover, according to the embodiments described above, the external fixing part 114 is connected to the vacuum chamber 112 via the bellows 16C provided on the bottom surface of the vacuum chamber 112 . According to such a configuration, if the top surface and side surfaces of the vacuum chamber 112 and the bottom surface of the vacuum chamber 112 are separable, the top surface and side surfaces of the vacuum chamber 112 are removed and the bottom surface of the vacuum chamber 112 is provided with a bellows. With the bellows 16C connected to the bellows 16B, it is possible to easily adjust the arrangement of the components accommodated in the vacuum chamber 112. FIG.

Also, according to the embodiment described above, the columnar member 14A included in the external fixing portion 14 is inserted into the bellows 16A. Also, the first end of the columnar member 14A is fixed to the linear motor mechanism 50 . A columnar member 14</b>A included in the external fixing portion 14 is provided at the first end and has a cooling portion for cooling the linear motor mechanism 50 . Here, the cooling section corresponds to, for example, the cooling path 144 and the like. According to such a configuration, the heat generated in the coil module 50A can be effectively cooled by passing cooling water or the like through the cooling path 144 .

Further, according to the embodiments described above, the vacuum processing apparatus includes a guide portion provided along the moving direction of the stage 42 within the vacuum chamber 12 . Here, the guide portion corresponds to, for example, the linear guide 48 or the like. The linear guide 48 is fixed to the external fixed part 14 via the base 46 . According to such a configuration, even if the inside of the vacuum chamber 12 is evacuated and the vacuum chamber 12 is deformed such as shrinking, the bellows 16A absorbs the deformation of the vacuum chamber 12 and the external fixing portion is fixed. Since the displacement of the linear guide 48 fixed to the external fixing portion 14 is suppressed, the displacement of the linear guide 48 is suppressed. That is, the movement accuracy of the stage 42 moved by the linear guides 48 can be improved.

Further, according to the embodiments described above, the vacuum processing apparatus includes the lead section 54 for measuring the movement amount along the movement direction of the stage 42 within the vacuum chamber 12 . The lead portion 54 is fixed to the external fixing portion 14 . According to such a configuration, even if the inside of the vacuum chamber 12 is evacuated and the vacuum chamber 12 is deformed such as shrinking, the bellows 16A absorbs the deformation of the vacuum chamber 12 and the external fixing portion is fixed. 14, positional displacement of the lead portion 54 fixed to the external fixing portion 14 is suppressed. That is, it is possible to improve the measurement accuracy of the movement amount of the stage 42 measured by the lead portion 54 .

<Regarding Modifications of the Embodiments Described Above>
In the embodiments described above, the material, material, size, shape, relative arrangement relationship, implementation conditions, etc. of each component may be described, but these are only examples in all aspects. and shall not be limiting.

Accordingly, myriad modifications and equivalents not exemplified are contemplated within the scope of the technology disclosed herein. For example, modifications, additions, or omissions of at least one component shall be included.

Further, in the embodiments described above, when a material name is described without being specified, unless there is a contradiction, the material contains other additives, such as an alloy. shall be included.

Reference Signs List 1 vacuum processing apparatus 12, 112 vacuum chamber 12A, 12B, 12C, 12D opening 14, 114 external fixing section 14A, 14C, 14D columnar member 14B, 14E external member 16A, 16B, 16C bellows 18 irradiation section 20 vacuum pump 22 control Part 24 Frame 42 Stage 44 Slider 46 Base 48 Linear Guide 50, 150 Linear Motor Mechanism 50A Coil Module 50B Magnet Module 50C Wiring 52 Lift Pin Mechanism 52A Lift Pin 54 Lead Part 54A Read Head 54B Support Part 142 Internal Space 144 Cooling Path

Claims (4)

a vacuum chamber;
a stage provided within the vacuum chamber;
an external fixing part provided outside the vacuum chamber and connected to the vacuum chamber via an elastic member;
a movement mechanism provided in the vacuum chamber while being fixed to the external fixing part and for moving the stage,
The moving mechanism is
a coil module fixed to the external fixed part and for generating a magnetic force;
a magnet module connected to the stage and for moving relative to the coil module by magnetic forces generated by the coil module;
the elastic member is hollow and communicates with an opening formed in the vacuum chamber;
the coil module is secured to the external fixture within the stretchable member and through the opening of the vacuum chamber;
the external fixation portion is inserted into the elastic member and has a first end to which the coil module of the movement mechanism is fixed;
The external fixing part further includes a cooling part provided at the first end and for cooling the moving mechanism,
Vacuum processing equipment. A vacuum processing apparatus according to claim 1,
The external fixing part is connected to the vacuum chamber via the elastic member provided on the bottom surface of the vacuum chamber,
Vacuum processing equipment. A vacuum processing apparatus according to claim 1 or 2 ,
further comprising a guide part provided along the moving direction of the stage in the vacuum chamber,
The guide part is fixed to the external fixing part,
Vacuum processing equipment. A vacuum processing apparatus according to any one of claims 1 to 3 ,
further comprising a lead unit for measuring a movement amount along the movement direction of the stage in the vacuum chamber;
The lead portion is fixed to the external fixing portion,
Vacuum processing equipment.

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