JP7360159B2 - Laser light diffraction focusing method and diffraction focusing optical element device - Google Patents
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Description
本発明は、レーザー光の回折集光方法及び回折集光光学素子装置に関する。 The present invention relates to a laser beam diffraction focusing method and a diffraction focusing optical element device.
核融合、粒子加速、実験室天文学、高温高圧化の極限状態化の物質の研究など、高強度レーザーを利用した研究はレーザーのピーク強度の増大とともに発展してきた。これらのレーザーの集光強度の増大はチャープパルス増幅の発明、光学素子の大型化・高精度化や波面・位相補正技術などの進展により達成されてきた。しかしながら、これらレーザーシステムの更なる高強度・大出力化のためにシステム中の光学素子が解決すべき課題は多く、次世代の高強度レーザー実現には大きな問題を抱えている。 Research using high-intensity lasers, such as nuclear fusion, particle acceleration, laboratory astronomy, and the study of materials in extreme conditions at high temperatures and pressures, has developed as the peak intensity of lasers has increased. Increases in the focused intensity of these lasers have been achieved through the invention of chirped pulse amplification, larger and more precise optical elements, and advances in wavefront and phase correction technology. However, in order to further increase the intensity and output of these laser systems, there are many issues that need to be solved with respect to the optical elements in the systems, and there are major problems in realizing the next generation of high-intensity lasers.
パルスレーザーによる加工においては、レーザーを加工対象物の直前でレンズや集光鏡によって集光し、高強度の光場を作って材料の加工を行う。この時、加工時にレーザー照射部で融解した微粒子(デブリ)が、レーザーの集光レンズや、上流の光学素子などに付着し、レーザー光透過率の低下や素子の損傷が起こることが問題になっている。 In processing using pulsed lasers, the laser is focused by a lens or condensing mirror just in front of the object to be processed, creating a high-intensity optical field to process the material. At this time, fine particles (debris) that melt in the laser irradiation area during processing adhere to the laser condenser lens and upstream optical elements, causing problems such as a decrease in laser light transmittance and damage to the elements. ing.
このような問題に対して、例えば、特許文献1では、レーザー光線を被加工物に集光する対物レンズと、該対物レンズと被加工物との間に配設され該被加工物から飛散するデブリを遮断して該対物レンズの汚染を防止するレンズ保護カバーを備えることが記載されている。 To address this problem, for example, Patent Document 1 discloses an objective lens that focuses a laser beam on a workpiece, and a system that is arranged between the objective lens and the workpiece to prevent debris flying from the workpiece. It is described that the objective lens is provided with a lens protection cover that blocks out contamination of the objective lens.
また、特許文献2には、集光レンズで集光されて被加工物に集光されるレーザービームが通過する通過孔が形成されるとともに該通過孔に対して対称に伸長する吸引路と、該吸引路の一端と他端とがそれぞれ選択的に接続される吸引源とを有し、該集光レンズで集光されたレーザービームが被加工物に照射されることで発生するデブリを集塵する集塵手段を備えることが記載されている。 Further, Patent Document 2 discloses that a passage hole is formed through which a laser beam condensed by a condensing lens and focused on a workpiece passes, and a suction path extends symmetrically with respect to the passage hole; One end and the other end of the suction path each have a suction source selectively connected to collect debris generated when the workpiece is irradiated with a laser beam focused by the condenser lens. It is described that the device is equipped with a means for collecting dust.
また、その他にも、低圧のガスを材料近くに流すことでデブリの付着を防ぐ手法(非特許文献1)や、液体をレンズと加工対象の間に入れてデブリを吸収させる方法(非特許文献2)、磁場を印加して電荷をもつデブリの軌跡を制御する方法(非特許文献3)などが考案されている。 In addition, there are other methods to prevent debris from adhering by flowing low-pressure gas near the material (Non-patent Document 1), and a method to absorb debris by inserting a liquid between the lens and the workpiece (Non-patent Document 1). 2) A method of controlling the trajectory of charged debris by applying a magnetic field (Non-Patent Document 3) has been devised.
しかしながら、これらの方法も、数百μmの大きさのデブリへは効果がない、液体など余計なものが入り加工物へのレーザー照射強度が低下する、電荷を帯びていない中性粒子は制御できないなど、完全なデブリの制御には至っていない。これらのデブリ保護の不完全性が、レーザー加工機におけるメンテナンス時間を決めることになり、定期的なクリーニングを必要するなど、現状より高い繰り返しや高出力化に向けたレーザー利用の大きな足かせになっているのが現状である。 However, these methods are not effective against debris with a size of several hundred micrometers, the intensity of laser irradiation on the workpiece decreases due to the introduction of extra substances such as liquid, and they cannot control neutral particles that are not charged. Complete debris control has not yet been achieved. The incompleteness of these debris protections determines the maintenance time for laser processing machines and requires periodic cleaning, which is a major impediment to the use of lasers for higher repetition rates and higher output than currently available. The current situation is that
そこで、本発明の目的は、上述の如き従来の実情に鑑み、高い強度のレーザー光でも回折及び集光することができ、デブリの影響を受けないレーザー光の回折集光方法及び回折集光光学素子装置を提供することにある。 SUMMARY OF THE INVENTION In view of the above-mentioned conventional circumstances, an object of the present invention is to provide a method for diffraction and focusing of a laser beam, which is capable of diffracting and focusing even a high-intensity laser beam, and is not affected by debris, and a diffraction focusing optical system. An object of the present invention is to provide an element device.
すなわち、本発明の一態様は、共鳴的に光を吸収する分子を含む気体を供給して一定の領域を形成し、その分子の吸収帯域の波長の励起用レーザー光を前記領域内において交差するように照射して該気体を光励起するとともに、交差させる2つの励起用レーザー光の光路のうち少なくとも一方に集光光学系及び発散光学系の片方もしくは両方を有することで、領域内に曲率を持った干渉縞を生成し、領域内における干渉縞を過渡的な回折及び集光素子として用いて、干渉縞に入射される気体の非吸収帯域の波長のレーザー光を回折及び集光させることを特徴とするレーザー光の回折集光方法である。 That is, in one embodiment of the present invention, a gas containing molecules that absorb light resonantly is supplied to form a certain region, and excitation laser light having a wavelength in the absorption band of the molecule is intersected within the region. In addition to optically exciting the gas by irradiating it in a manner similar to It is characterized by generating interference fringes within the region and using the interference fringes in the region as a transient diffraction and focusing element to diffract and focus laser light having a wavelength in the non-absorption band of the gas that is incident on the interference fringes. This is a method of diffraction and focusing of laser light.
本発明の一態様によれば、共鳴的に光を吸収する分子を含む気体に励起用レーザーの空間周期的な照射を行い、気体内部に大振幅の密度変調構造を生成することで、レーザー光を回折及び集光させる透過型体積回折集光素子とすることができる。また、この素子は媒質が気体であるため、通常の固体光学素子のようにデブリが付着して影響を受けることが無く、同時に回折により角度が偏向されるので、この素子より上流の光学素子を保護することもできる。 According to one aspect of the present invention, a gas containing molecules that absorb light resonantly is irradiated with an excitation laser in a spatial periodic manner to generate a large-amplitude density modulation structure inside the gas. It can be made into a transmissive volume diffraction condensing element that diffracts and condenses light. In addition, since the medium of this element is gas, it is not affected by debris adhering to it like normal solid-state optical elements, and at the same time, the angle is deflected by diffraction, so the optical elements upstream from this element are It can also be protected.
このとき、本発明の一態様では、共鳴的に光を吸収する分子を含む気体は、オゾンを含むガスであり、励起用レーザーは、波長230~270nmの紫外パルスレーザーであるとしてもよい。また、レーザー光のコヒーレンスは、十分高く明瞭なコントラストの干渉縞が生成できるレーザーが好ましく用いられる。交差させる2光線の強度は、そのガス内で同等になるように調整されることが望ましい。 At this time, in one aspect of the present invention, the gas containing molecules that absorb light resonantly may be a gas containing ozone, and the excitation laser may be an ultraviolet pulsed laser with a wavelength of 230 to 270 nm. Furthermore, the coherence of the laser beam is preferably high enough to generate interference fringes with clear contrast. It is desirable that the intensities of the two intersecting beams be adjusted to be equivalent within the gas.
このように、共鳴的に光を吸収する分子を含む気体としては、オゾンを含むガスが好ましく用いられる。 As described above, a gas containing ozone is preferably used as the gas containing molecules that absorb light resonantly.
また、本発明の一態様では、気体による一定の領域は層流状態となっていることが好ましい。 Further, in one aspect of the present invention, it is preferable that a certain region of gas be in a laminar flow state.
このようにすることで、上記気体による一定の領域に励起用レーザーによる高いコントラスト比をもつ曲率を持った密度変調を生成することができる。 By doing so, density modulation with a curvature having a high contrast ratio can be generated by the excitation laser in a certain region caused by the gas.
また、本発明の一態様では、集光光学系及び発散光学系の距離を調整することで、回折及び集光される前記レーザー光の焦点距離を調整することとしてもよい。 Further, in one aspect of the present invention, the focal length of the laser beam to be diffracted and focused may be adjusted by adjusting the distance between the condensing optical system and the diverging optical system.
焦点距離は励起用レーザー光による干渉縞の曲率で決定されるため、干渉光学系内部の集光光学系及び発散光学系の距離を調整することにより、焦点距離を容易に変化させることができる。 Since the focal length is determined by the curvature of interference fringes caused by the excitation laser beam, the focal length can be easily changed by adjusting the distance between the condensing optical system and the diverging optical system inside the interference optical system.
また、本発明の一態様では、励起用レーザー光の射出角度を可変とすることで、回折及び集光されるレーザー光の焦点位置を走査することとしてもよい。 Further, in one embodiment of the present invention, the focal position of the diffracted and focused laser beam may be scanned by making the emission angle of the excitation laser beam variable.
干渉光学系内部の反射鏡等を調整して励起用レーザー光の射出角度を可変とすることで、レーザー光の焦点位置を走査することができる。 The focal position of the laser beam can be scanned by adjusting the reflection mirror or the like inside the interference optical system to make the emission angle of the excitation laser beam variable.
また、本発明の一態様では、気体による一定の領域の近傍に、レーザー光が通過する開口を有する遮蔽板を設けることとしてもよい。 Further, in one embodiment of the present invention, a shielding plate having an opening through which the laser beam passes may be provided near a certain region of gas.
遮蔽板を設けることで、例えば、レーザー加工時の加工対象から生じたデブリが光励起や集光されるレーザーの光学系などに混入するのを防止することができる。 By providing the shielding plate, it is possible to prevent, for example, debris generated from the object to be processed during laser processing from entering the optical system of the laser for light excitation and focusing.
本発明の他の態様は、共鳴的に光を吸収する分子を含む気体を供給して一定の領域を形成する気体発生手段と、その分子の吸収帯域の波長の励起用レーザー光を前記領域内において交差するように照射して該気体を光励起するとともに、交差させる2つの励起用レーザー光の光路のうち少なくとも一方に集光光学系及び発散光学系の片方もしくは両方を有することで、前記領域内に曲率を持った干渉縞を生成する光励起手段とを備え、前記領域内における干渉縞を過渡的な回折及び集光素子として用いて、干渉縞に入射される気体の非吸収帯域の波長のレーザー光を回折及び集光させることを特徴とする回折集光光学素子装置である。 Another aspect of the present invention provides a gas generating means for forming a certain area by supplying a gas containing molecules that absorb light resonantly, and an excitation laser beam having a wavelength in the absorption band of the molecule within the area. In addition to optically exciting the gas by irradiating the gas in such a manner that they cross each other, at least one of the optical paths of the two intersecting excitation laser beams is provided with one or both of a condensing optical system and a diverging optical system. and an optical excitation means for generating interference fringes having a curvature in the area, and using the interference fringes in the region as a transient diffraction and focusing element, a laser having a wavelength in the non-absorption band of the gas incident on the interference fringes. This is a diffractive and condensing optical element device characterized by diffracting and condensing light.
上述したレーザー光の回折集光方法は、このような構成の回折集光光学素子装置として実現することができる。 The above-described laser beam diffraction and focusing method can be realized as a diffraction and focusing optical element device having such a configuration.
以上説明したように本発明によれば、高い強度のレーザー光でも回折及び集光することができ、デブリの影響を受けないレーザー光の回折集光方法及び回折集光光学素子装置を提供することができる。 As explained above, according to the present invention, there is provided a laser beam diffraction and focusing method and a diffractive focusing optical element device that can diffract and focus even high-intensity laser beams and are not affected by debris. I can do it.
以下、本発明の好適な実施の形態について詳細に説明する。なお、以下に説明する本実
施形態は、特許請求の範囲に記載された本発明の内容を不当に限定するものではなく、本
実施形態で説明される構成の全てが本発明の解決手段として必須であるとは限らない。
Hereinafter, preferred embodiments of the present invention will be described in detail. Note that this embodiment described below does not unduly limit the content of the present invention described in the claims, and all of the configurations described in this embodiment are essential as a solution to the present invention. Not necessarily.
図1は、本発明の一実施形態に係る回折集光光学素子装置の構成の一例を示す概略図である。本発明の一実施形態に係る回折集光光学素子装置100は、共鳴的に光を吸収する分子を含む気体を供給して一定の領域を形成する気体発生手段10と、その分子の吸収帯域の波長の励起用レーザー光を前記領域内において交差するように照射して該気体を光励起するとともに、交差させる2つの励起用レーザー光の光路のうち少なくとも一方に集光光学系及び発散光学系の片方もしくは両方を有することで、前記領域内に曲率を持った干渉縞を生成する光励起手段20を有する。 FIG. 1 is a schematic diagram showing an example of the configuration of a diffraction focusing optical element device according to an embodiment of the present invention. A diffraction focusing optical element device 100 according to an embodiment of the present invention includes a gas generating means 10 that supplies a gas containing molecules that absorb light resonantly to form a certain region, and a gas generating means 10 that forms a certain area by supplying a gas containing molecules that absorb light resonantly, and an absorption band of the molecules. The gas is optically excited by irradiating excitation laser beams of different wavelengths so as to intersect in the region, and one of a condensing optical system and a diverging optical system is attached to at least one of the optical paths of the two intersecting excitation laser beams. Alternatively, by having both, the optical excitation means 20 is provided which generates interference fringes with curvature within the region.
本発明の一態様に係る回折集光光学素子装置100において、気体発生手段10は、共鳴的に光を吸収する分子を含む気体を供給して一定の領域を形成する機能を有し、例えば、図1に示すように、ガス生成部11、ガス流路12、ガス排出部13などから構成される。 In the diffraction focusing optical element device 100 according to one aspect of the present invention, the gas generation means 10 has a function of supplying a gas containing molecules that absorb light resonantly to form a certain region, for example, As shown in FIG. 1, it is composed of a gas generation section 11, a gas flow path 12, a gas discharge section 13, and the like.
供給する気体は、共鳴的に光を吸収する分子を含む気体であれば特に限定はされないが、オゾンを含むガスが好ましく用いられる。オゾンは、紫外レーザー(50mJ/cm2)が3~10mmの厚みのガス層で吸収するのに十分な濃度(1~3%程度)を用意することが望ましい。オゾンの生成方法としては、例えば、酸素ガスを原料とした誘電バリア放電などが用いられる。 The gas to be supplied is not particularly limited as long as it contains molecules that absorb light resonantly, but a gas containing ozone is preferably used. It is desirable to prepare ozone at a concentration (approximately 1 to 3%) sufficient for the ultraviolet laser (50 mJ/cm 2 ) to be absorbed by a gas layer with a thickness of 3 to 10 mm. As a method for generating ozone, for example, dielectric barrier discharge using oxygen gas as a raw material is used.
ガス生成部11でオゾンを含むガスを生成する場合、一例として、誘電バリア放電を発生する空間ギャップ内に酸素O2を含む原料ガスを供給して放電によりオゾンO3を含むガスを発生させる。より具体的には、平行平板状に配置された一対の金属電極と、金属電極間に設置された一対の誘電体を備え、酸素ボンベまたは空気タンクなどの原料ガス源から酸素O2を含む原料ガス(高濃度酸素や脱湿空気等)がダイヤフラムポンプにより一対の誘電体間の空間ギャップに送り込まれるとともに、高周波電源により高周波高電圧が一対の金属電極に印加されるようになっている。高周波電源には、例えば、13MHz・100Wの電源が用いられる。 When the gas generation unit 11 generates a gas containing ozone, for example, a source gas containing oxygen O 2 is supplied into a space gap where dielectric barrier discharge is generated, and gas containing ozone O 3 is generated by discharge. More specifically, it includes a pair of metal electrodes arranged in a parallel plate shape and a pair of dielectrics installed between the metal electrodes, and a raw material containing oxygen O 2 is supplied from a raw material gas source such as an oxygen cylinder or an air tank. Gas (highly concentrated oxygen, dehumidified air, etc.) is pumped into the space gap between the pair of dielectrics by a diaphragm pump, and a high frequency high voltage is applied to the pair of metal electrodes by a high frequency power source. For example, a 13 MHz/100 W power source is used as the high frequency power source.
なお、オゾン含有ガスの生成は上記態様に限定されず、電解法や紫外線ランプ法によりオゾン含有ガスを生成してもよい。あるいは、オゾン含有ガスは、例えば、液体オゾンを気化させることにより得られる高濃度オゾンガスであっても良い。 Note that the generation of the ozone-containing gas is not limited to the above embodiment, and the ozone-containing gas may be generated by an electrolytic method or an ultraviolet lamp method. Alternatively, the ozone-containing gas may be, for example, highly concentrated ozone gas obtained by vaporizing liquid ozone.
ガス流路12は、ガス生成部11で生成したガスを供給する流路で、励起用レーザーによって気体を励起するための一定の領域を形成する機能を有する。ガス流路12の形状は特に限定はされないが、例えば、矩形断面形状で十分な長さを確保し、その中央部に開口部14が設けられている。励起用のレーザー光や被制御レーザー光(加工用レーザー光)は開口部14からガス流路12の内部に入射され、反対側の開口部14を通って出射される。このような機能を有するものであれば、開口部14の数や形状は特に限定されず、励起用のレーザー光と被制御レーザー光(加工用レーザー光)が通る開口部14は同じであってもよいし、異なっていてもよい。一例として、ガス流路12は、長さ250mm、内径が奥行(レーザー光の進行方向)3mm×側面10mmのガスフローチューブ等であり、開口部14は縦6mm×横10mm等である。 The gas flow path 12 is a flow path for supplying the gas generated by the gas generation unit 11, and has a function of forming a certain region for exciting the gas with an excitation laser. Although the shape of the gas flow path 12 is not particularly limited, for example, it has a rectangular cross-sectional shape with a sufficient length, and an opening 14 is provided in the center thereof. Excitation laser light and controlled laser light (processing laser light) are input into the gas flow path 12 through the opening 14 and exit through the opening 14 on the opposite side. As long as it has such a function, the number and shape of the openings 14 are not particularly limited, and the openings 14 through which the excitation laser beam and the controlled laser beam (processing laser beam) pass are the same. It may be different or it may be different. As an example, the gas flow path 12 is a gas flow tube or the like with a length of 250 mm and an inner diameter of 3 mm in depth (in the direction of propagation of the laser beam) x 10 mm on the sides, and the opening 14 is 6 mm in length x 10 mm in width.
ガス排出部13は、ガス流路12からガスを排気する。ガス流路12のレーザー照射部分は上述のように開口となっているため、該開口部からガスが漏れないようにガス排出速度を調整する。一実施形態として、ガス排出部13から回収されたガスは、再循環ラインを介して再度ガス生成部11に戻されるようにしてもよい。 The gas exhaust section 13 exhausts gas from the gas flow path 12. Since the laser irradiated portion of the gas flow path 12 is an opening as described above, the gas discharge speed is adjusted so that the gas does not leak from the opening. In one embodiment, the gas recovered from the gas outlet 13 may be returned to the gas generator 11 via a recirculation line.
本発明の一態様では、気体による一定の領域は層流状態となっていることが好ましい。層流状態とすることで、気体による一定の領域に励起用レーザーを照射した時に高いコントラスト比をもつ曲率を持った密度変調を生成することができる。したがって、ガス排出部13側のガス排出速度とガス生成部11側のガス供給速度は、開口部14においても層流が保たれるように制御することが望ましい。 In one aspect of the present invention, it is preferable that a certain region of gas be in a laminar flow state. By creating a laminar flow state, it is possible to generate density modulation with a curvature with a high contrast ratio when a certain region of gas is irradiated with an excitation laser. Therefore, it is desirable to control the gas discharge speed on the gas discharge section 13 side and the gas supply speed on the gas generation section 11 side so that laminar flow is maintained also in the opening section 14.
本発明の一態様に係る回折集光光学素子装置100において、光励起手段20は、レンズとなるガス流路12内の窓なし領域において、大振幅の密度変調構造を生成させるために、空間的に周期強度分布を作るために用いられる。より具体的には、気体発生手段10から供給される気体を励起するレーザー光を発生させる励起用レーザー光源21と、このレーザー光源21から出射されたレーザー光Lを2本のレーザー光L1、L2に分岐させるビームスプリッタ22と、2本に分岐したレーザー光L1、L2が気体発生手段10により形成された一定の領域において交差するように光路を反射させる反射鏡23A~23Fと、交差させる2つの励起用レーザー光L1、L2の光路のうち少なくとも一方(図1では、レーザー光L2側)に集光光学系24(例えば凸レンズ)及び発散光学系25(例えば凹レンズ)等を備える。ガス流路12の開口部14において励起用レーザー光の干渉による効果的な空間周期強度分布を得るために、ビームスプリッタ22からガス流路12の開口部14までの距離はレーザー光L1、L2においてほぼ一致させることが望ましい。このような球面波と平面波の組み合わせによる干渉縞の間隔は、徐々に変化するが、数千以上の高い次数の干渉縞を生成させることで、過渡的生成されるレンズ内で縞間隔の差が1%以下になるようにすることが望ましい。 In the diffractive focusing optical element device 100 according to one aspect of the present invention, the optical excitation means 20 is configured spatially to generate a large-amplitude density modulation structure in a windowless region in the gas flow path 12 that serves as a lens. Used to create periodic intensity distribution. More specifically, an excitation laser light source 21 generates a laser light that excites the gas supplied from the gas generation means 10, and the laser light L emitted from this laser light source 21 is converted into two laser lights L1 and L2. a beam splitter 22 that splits the laser beams into two, reflecting mirrors 23A to 23F that reflect the optical path so that the two split laser beams L1 and L2 intersect in a certain area formed by the gas generation means 10; A condensing optical system 24 (for example, a convex lens), a diverging optical system 25 (for example, a concave lens), etc. are provided on at least one of the optical paths of the excitation laser beams L1 and L2 (on the laser beam L2 side in FIG. 1). In order to obtain an effective spatial periodic intensity distribution due to interference of the excitation laser beam at the opening 14 of the gas flow path 12, the distance from the beam splitter 22 to the opening 14 of the gas flow path 12 is set such that the distance between the beam splitter 22 and the opening 14 of the gas flow path 12 is It is desirable that they almost match. The spacing of interference fringes due to such a combination of spherical waves and plane waves gradually changes, but by generating several thousand or more high-order interference fringes, the difference in the fringe spacing within the transiently generated lens can be reduced. It is desirable to keep it below 1%.
図2は、励起用レーザーによる干渉縞生成を説明した概念図である。このように、2本に分割された励起用レーザーの一方の光路(L1)は平面波のままとし、もう一方の光路(L2)においては凸レンズと凹レンズなどの集光-発散光学系の組み合わせ等を配置することで、所望する球面波が生成されるようになり、2つの励起用レーザー光は適当な入射角度でガス流路の窓無し領域に同強度となるように伝播され、高いコントラスト比をもつ曲率を持った干渉縞を生成することができる。この干渉縞により、被制御レーザー光源(例えば、加工用レーザー光源)40から照射された被制御レーザーLinを、回折及び集光されたレーザー光Loとすることができる。干渉縞の縞間隔は、例えば、数μmであるが、この間隔は後述する干渉光学系30によって可変とすることができる。 FIG. 2 is a conceptual diagram illustrating generation of interference fringes by an excitation laser. In this way, one optical path (L1) of the excitation laser divided into two is left as a plane wave, and the other optical path (L2) is a combination of condensing and diverging optical systems such as a convex lens and a concave lens. By arranging it, the desired spherical wave is generated, and the two excitation laser beams are propagated with the same intensity into the windowless area of the gas flow path at an appropriate incident angle, resulting in a high contrast ratio. It is possible to generate interference fringes with a certain curvature. Due to the interference fringes, the controlled laser Lin irradiated from the controlled laser light source (for example, a processing laser light source) 40 can be turned into diffracted and focused laser light Lo. The interval between the interference fringes is, for example, several μm, but this interval can be made variable by an interference optical system 30, which will be described later.
共鳴的に光を吸収する分子を含む気体がオゾンを含むガスの場合、励起用レーザーは、波長230~270nmの紫外パルスレーザーとすることが好ましい。この時、パルス幅はオゾン混合ガスレンズの横方向の口径を決めるので、例えば、数ナノ秒以下とする。 When the gas containing molecules that absorb light resonantly is a gas containing ozone, the excitation laser is preferably an ultraviolet pulsed laser with a wavelength of 230 to 270 nm. At this time, the pulse width determines the lateral aperture of the ozone mixed gas lens, so it is set to, for example, several nanoseconds or less.
ガス内部の屈折率変調が最大となる紫外レーザー照射後数十ナノ秒後に、被制御レーザーを適当な入射角で入射させると、1次回折光でほぼ100%の回折効率で回折し、なおかつ集光される光を作ることができる。被制御レーザーは、例えば、加工対象50をレーザー加工するための加工用レーザーである。 Several tens of nanoseconds after ultraviolet laser irradiation, when the refractive index modulation inside the gas is at its maximum, if a controlled laser is made incident at an appropriate angle of incidence, the first-order diffracted light will be diffracted with almost 100% diffraction efficiency and will be focused. It is possible to create light that is The controlled laser is, for example, a processing laser for laser processing the processing object 50.
本発明の一実施形態に係る回折集光光学素子装置100の焦点距離は励起用レーザー干渉縞の曲率で決定され、曲率は干渉光学系30内部の2枚のレンズ(集光光学系24及び発散光学系25)の距離で容易に変化させることができる。また、集光点も縞の間隔を変えることで変化させることができる。 The focal length of the diffractive focusing optical element device 100 according to an embodiment of the present invention is determined by the curvature of the excitation laser interference fringes, and the curvature is determined by the curvature of the two lenses inside the interference optical system 30 (the focusing optical system 24 and the divergent It can be easily changed by changing the distance of the optical system 25). Furthermore, the focal point can also be changed by changing the interval between the stripes.
すなわち、本発明の一態様では、集光光学系24及び発散光学系25の距離を調整することで、回折及び集光されるレーザー光Loの焦点距離を調整することとしてもよい。焦点距離は励起用レーザー光による干渉縞の曲率で決定されるため、干渉光学系内部の集光光学系24及び発散光学系25の距離を調整することにより、焦点距離を容易に変化させることができる。 That is, in one aspect of the present invention, by adjusting the distance between the condensing optical system 24 and the diverging optical system 25, the focal length of the diffracted and condensed laser beam Lo may be adjusted. Since the focal length is determined by the curvature of the interference fringes caused by the excitation laser beam, the focal length can be easily changed by adjusting the distance between the condensing optical system 24 and the diverging optical system 25 inside the interference optical system. can.
また、本発明の一態様では、励起用レーザー光の射出角度を可変とすることで、回折及び集光されるレーザー光の焦点位置を走査することとしてもよい。例えば、干渉光学系30内部の反射鏡(反射鏡23D,23Eなど)を調整して励起用レーザー光L1、L2の射出角度を可変とすることで、レーザー光Loの焦点位置を走査することができ、加工対象50に対するレーザー加工の自由度を高めることができる。 Further, in one embodiment of the present invention, the focal position of the diffracted and focused laser beam may be scanned by making the emission angle of the excitation laser beam variable. For example, by adjusting the reflecting mirrors (reflecting mirrors 23D, 23E, etc.) inside the interference optical system 30 to make the emission angles of the excitation laser beams L1 and L2 variable, it is possible to scan the focal position of the laser beam Lo. Therefore, the degree of freedom in laser processing of the processing object 50 can be increased.
さらに、本発明の一態様では、ガス流路12の気体による一定の領域の近傍に、レーザー光Lin、Loが通過する開口を有する遮蔽板60を設けることとしてもよい。遮蔽板60を設けることで、加工対象50へのレーザー加工時に生じるデブリ51が干渉光学系30などに混入するのを防止することができる。遮蔽板60は、一例として、開口が2mmのものを用いることができる。 Furthermore, in one aspect of the present invention, a shielding plate 60 having an opening through which the laser beams Lin and Lo pass may be provided near a certain region of gas in the gas flow path 12. By providing the shielding plate 60, it is possible to prevent debris 51 generated during laser processing of the processing object 50 from entering the interference optical system 30 and the like. As the shielding plate 60, for example, one having an opening of 2 mm can be used.
共鳴的に光を吸収する分子を含む気体としてオゾンを含むガスを採用した場合のガス媒質中の屈折率変調構造励起原理は以下のようになっていると考えられる。すなわち、まず誘電体バリア放電等によって原料酸素ガスからオゾンを生成し、この媒質にオゾンに対して共鳴吸収のある紫外レーザーを干渉させた状態で入射する。ここで紫外レーザーが照射された領域のオゾンは、紫外レーザーのエネルギーにより光分解(O2+O)したのち再結合し、高エネルギー状態のオゾンとなる。その後、数ナノ秒~数十ナノ秒かけて高い運動エネルギーをもった励起オゾンはその周囲の酸素分子等と衝突し、膨張・圧縮されることで、非照射領域と照射領域との間で粗密を形成する。この密度差が回折に必要な屈折差率となる。 When a gas containing ozone is used as the gas containing molecules that absorb light resonantly, the principle of excitation of the refractive index modulation structure in the gas medium is considered to be as follows. That is, first, ozone is generated from raw material oxygen gas by dielectric barrier discharge or the like, and an ultraviolet laser having resonance absorption is made to interfere with the ozone and enter the medium into this medium. Here, the ozone in the area irradiated with the ultraviolet laser is photodecomposed (O 2 +O) by the energy of the ultraviolet laser and then recombined to become ozone in a high energy state. After that, over several nanoseconds to tens of nanoseconds, the excited ozone with high kinetic energy collides with surrounding oxygen molecules, expands and compresses, and becomes dense and dense between the non-irradiated area and the irradiated area. form. This density difference becomes the refractive index necessary for diffraction.
この空間密度変調構造は、縞間隔の差が1%以下で円もしくは直線の干渉縞の場合、ほぼ紫外レーザーの干渉照射パターンによって決定される。よって、ガス中にわずかに曲率を持った紫外レーザー干渉パターンを作成すれば、原理的にはフレネルゾーンプレートのように、回折機能に加え集光光学素子としての機能を持たせることが可能になる。 This spatial density modulation structure is approximately determined by the interference irradiation pattern of the ultraviolet laser in the case of circular or straight interference fringes with a difference in fringe spacing of 1% or less. Therefore, by creating an ultraviolet laser interference pattern with a slight curvature in the gas, it is theoretically possible to provide it with the function of a focusing optical element in addition to the diffraction function, like a Fresnel zone plate. .
図3は、本発明の一実施形態に係るレーザー光の回折集光方法を実施した際の焦点距離260mmでの典型的な垂直・水平方向の集光特性を示している。横軸はガスレンズ領域からの距離、縦軸は集光径を示しており、垂直、水平方向ともにM2=1.1の優れた集光特性を示している。 FIG. 3 shows typical vertical and horizontal focusing characteristics at a focal length of 260 mm when the laser beam diffraction focusing method according to an embodiment of the present invention is implemented. The horizontal axis represents the distance from the gas lens region, and the vertical axis represents the condensing diameter, showing excellent condensing characteristics with M 2 =1.1 in both the vertical and horizontal directions.
このように、本発明の一実施形態では、オゾンを数%に含むガスに紫外レーザーの空間周期的な照射を行い、ガス内部に大振幅の密度変調構造を生成することで、レーザー光を回折させる透過型体積回折格子になっている。さらに、本発明の一実施形態では、ガス中に紫外レーザーをわずかに湾曲させた干渉条件で照射することで、回折させた光をレンズと同じように集光させることができる。 In this way, in one embodiment of the present invention, a gas containing several percent ozone is irradiated with an ultraviolet laser in a spatial periodic manner to generate a large-amplitude density modulation structure inside the gas, thereby diffracting the laser light. It is a transmission type volume diffraction grating. Furthermore, in one embodiment of the present invention, by irradiating the gas with an ultraviolet laser under slightly curved interference conditions, the diffracted light can be focused in the same way as a lens.
また、本発明では、光励起された気体中に大振幅の密度変調構造を生成し、それをもと
に再生可能な過渡的な回折集光光学素子を作るので、例えレーザー光が通過後に回折集光光学素子を破壊しても、その都度再生が可能であり、高強度のレーザーに対応できる回折集光光学系を作ることができる。したがって、破壊強度以上の光が入射されても、毎回再生されるために、使用限界の強度で安全係数なしに使用が可能になる。
In addition, in the present invention, a large-amplitude density modulation structure is generated in the optically excited gas, and a reproducible transient diffraction focusing optical element is created based on this, so even if the laser beam passes through the diffraction focusing optical element, Even if an optical optical element is destroyed, it can be regenerated each time, making it possible to create a diffractive focusing optical system that can handle high-intensity lasers. Therefore, even if light exceeding the destructive intensity is incident, it is regenerated every time, so it can be used with the intensity at the limit of use without a safety factor.
本発明の一態様で使用しているオゾン分子を含むガス、例えば酸素ガスは、一般的なレーザー加工に使用されるレーザー波長に対しては吸収断面積が10-20~10-23cm2と小さいので、ガスによるレーザーエネルギーの損失は無視でき、体積回折格子であるので少ない紫外レーザーによる粗密波の形成でほぼ100%の回折効率が得られる。 The gas containing ozone molecules used in one embodiment of the present invention, such as oxygen gas, has an absorption cross section of 10 -20 to 10 -23 cm 2 for the laser wavelength used in general laser processing. Since it is small, the loss of laser energy due to gas can be ignored, and since it is a volume diffraction grating, almost 100% diffraction efficiency can be obtained by forming compression waves using a small amount of ultraviolet laser.
さらに、本発明の一実施形態に係る回折集光光学素子装置は、媒質がガスであるため、通常の固体光学素子のようにデブリが付着しない。またこの素子は加工用レーザーのような高強度レーザーに対しても固体光学素子より3桁高い損傷閾値をもつため、素子自体がレーザーによる光学損傷に強く、また破壊されたとしても直ちに再生が可能な過渡的素子である。 Furthermore, since the diffractive condensing optical element device according to one embodiment of the present invention uses gas as a medium, debris does not adhere to it unlike a normal solid optical element. In addition, this element has a damage threshold three orders of magnitude higher than that of solid-state optical elements even when exposed to high-intensity lasers such as processing lasers, so the element itself is resistant to optical damage caused by lasers, and even if it is destroyed, it can be immediately rebuilt. It is a transient element.
なお、上記のように本発明の一実施形態について詳細に説明したが、本発明の新規事項及び効果から実体的に逸脱しない多くの変形が可能であることは、当業者には、容易に理解できるであろう。従って、このような変形例は、全て本発明の範囲に含まれるものとする。 Although one embodiment of the present invention has been described in detail as above, those skilled in the art will easily understand that many modifications can be made without substantively departing from the novelty and effects of the present invention. It will be possible. Therefore, all such modifications are included within the scope of the present invention.
例えば、明細書又は図面において、少なくとも一度、より広義又は同義な異なる用語と共に記載された用語は、明細書又は図面のいかなる箇所においても、その異なる用語に置き換えることができる。また、レーザー光の回折集光方法及び回折集光光学素子装置の構成、動作も本発明の一実施形態で説明したものに限定されず、種々の変形実施が可能である。 For example, a term that appears at least once in the specification or drawings together with a different term with a broader or synonymous meaning may be replaced by that different term anywhere in the specification or drawings. Furthermore, the structure and operation of the laser beam diffraction and focusing method and the diffraction and focusing optical element device are not limited to those described in the embodiment of the present invention, and various modifications are possible.
本発明の一実施形態は、パルスレーザーによる材料加工のためのデブリフリーで半永久的なダメージ問題のない最終集光レンズとして使用できる。現在、レーザー加工においては高強度のレーザーを集光する光学素子や、その上流のレーザーシステムを構成する光学素子を保護するためのデブリシールド素子が必要になっているが、本発明の一実施形態では、その洗浄や交換自体が必要でなくなり、メンテンナンスフリーに近いシステムが実現できる。 An embodiment of the present invention can be used as a final focusing lens for material processing using a pulsed laser, which is free of debris and has no problem of semi-permanent damage. Currently, laser processing requires an optical element that focuses a high-intensity laser and a debris shield element that protects the optical elements that make up the upstream laser system. Now, there is no need to clean or replace them, making it possible to create a nearly maintenance-free system.
また、本発明の一実施形態で説明したオゾン混合ガスレンズは、ナノ秒のレーザーに対してkJ/cm2の損傷耐力があるので、小さい断面積でも高強度レーザーで使用可能であり、レーザー加工のみならず、さらに高強度のレーザープラズマ技術などにも応用できる。 In addition, the ozone mixed gas lens described in one embodiment of the present invention has a damage resistance of kJ/cm 2 against nanosecond laser, so it can be used with high-intensity laser even with a small cross-sectional area, and it can be used for laser processing. It can also be applied to high-intensity laser plasma technology.
本発明の一態様として、オゾン混合ガスレンズを生成するために必要な紫外レーザーのエネルギーは50mJ/cm2であり、被制御レーザーの最大エネルギー1.6kJ/cm2に対してわずかな光で制御が可能であり、効率的なレンズ生成とレーザー光の焦点位置、焦点距離制御が可能である。 As one aspect of the present invention, the energy of the ultraviolet laser required to generate the ozone mixed gas lens is 50 mJ/cm 2 , and the maximum energy of the controlled laser is 1.6 kJ/cm 2 , and the control requires only a small amount of light. This makes it possible to efficiently generate lenses and control the focal position and focal length of the laser beam.
10 気体発生手段、11 ガス生成部、12 ガス流路、13 ガス排出部、14 開口部、20 光励起手段、21 励起用レーザー光源、22 ビームスプリッタ、23A~23F 反射鏡、24 集光光学系、25 発散光学系、30 干渉光学系、40 被制御レーザー光源、50 加工対象、51 デブリ、60 遮蔽板、100 回折集光光学素子装置、L,L1,L2 励起用レーザー光、Lin 被制御レーザー光、Lo 回折及び集光されたレーザー光 10 gas generation means, 11 gas generation section, 12 gas flow path, 13 gas discharge section, 14 opening, 20 optical excitation means, 21 excitation laser light source, 22 beam splitter, 23A to 23F reflecting mirror, 24 condensing optical system, 25 diverging optical system, 30 interference optical system, 40 controlled laser light source, 50 processing object, 51 debris, 60 shielding plate, 100 diffraction focusing optical element device, L, L1, L2 excitation laser light, Lin controlled laser light , Lo diffraction and focused laser light
Claims (12)
前記分子の吸収帯域の波長の励起用レーザー光を前記領域内において交差するように照射して該気体を光励起するとともに、前記交差させる2つの励起用レーザー光の光路のうち少なくとも一方に集光光学系及び発散光学系の片方もしくは両方を有することで、前記領域内に曲率を持った干渉縞を生成し、
前記領域内における前記干渉縞を過渡的な回折及び集光素子として用いて、前記干渉縞に入射される前記気体の非吸収帯域の波長のレーザー光を回折及び集光させることを特徴とするレーザー光の回折集光方法。 A certain area is formed by supplying a gas containing molecules that absorb light resonantly,
Excitation laser beams having a wavelength in the absorption band of the molecules are irradiated so as to intersect in the region to optically excite the gas, and condensing optics on at least one of the optical paths of the two intersecting excitation laser beams. generating interference fringes with curvature in the region by having one or both of a system and a diverging optical system,
A laser characterized in that the interference fringes in the region are used as a transient diffraction and focusing element to diffract and focus laser light having a wavelength in a non-absorption band of the gas that is incident on the interference fringes. Diffraction and focusing method of light.
前記励起用レーザーは、波長230~270nmの紫外パルスレーザーであることを特徴とする請求項1に記載のレーザー光の回折集光方法。 The gas containing molecules that absorb light resonantly is a gas containing ozone,
2. The laser beam diffraction and focusing method according to claim 1, wherein the excitation laser is an ultraviolet pulse laser with a wavelength of 230 to 270 nm.
前記分子の吸収帯域の波長の励起用レーザー光を前記領域内において交差するように照射して該気体を光励起するとともに、前記交差させる2つの励起用レーザー光の光路のうち少なくとも一方に集光光学系及び発散光学系の片方もしくは両方を有することで、前記領域内に曲率を持った干渉縞を生成する光励起手段とを備え、
前記領域内における前記干渉縞を過渡的な回折及び集光素子として用いて、前記干渉縞に入射される前記気体の非吸収帯域の波長のレーザー光を回折及び集光させることを特徴とする回折集光光学素子装置。 a gas generating means for forming a certain area by supplying a gas containing molecules that absorb light resonantly;
Excitation laser beams having a wavelength in the absorption band of the molecules are irradiated so as to intersect in the region to optically excite the gas, and condensing optics on at least one of the optical paths of the two intersecting excitation laser beams. and an optical excitation means that generates interference fringes with curvature in the region by having one or both of a system and a diverging optical system,
Diffraction characterized by using the interference fringes in the region as a transient diffraction and condensing element to diffract and condense laser light having a wavelength in a non-absorption band of the gas that is incident on the interference fringes. Concentrating optical element device.
前記励起用レーザーは、波長230~270nmの紫外パルスレーザーであることを特徴とする請求項7に記載の回折集光光学素子装置。 The gas containing molecules that absorb light resonantly is a gas containing ozone,
8. The diffraction focusing optical element device according to claim 7, wherein the excitation laser is an ultraviolet pulsed laser having a wavelength of 230 to 270 nm.
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