JP7374304B2 - film - Google Patents

Description

FIELD OF THE INVENTION The present invention relates to films.

Transparent resin films have excellent optical properties and are less fragile than glass, so they can be considered as a substitute for glass.

Methods for producing transparent resin films include the so-called cell casting method, in which a curable composition is injected into cells and then cured, and a method in which a curable composition is poured onto a steel belt. Methods such as flow casting and curing are known.

Although the cell casting method is known from Patent Document 1 and the like, this method cannot continuously produce films and is not efficient.

A method of flow casting a curable composition onto a steel belt and curing it is known, such as in Patent Document 2, but with this method, it is difficult to produce a film with uniform physical properties. .

Japanese Patent Application Publication No. 08-132455 Japanese Patent Application Publication No. 04-080007

The present invention aims to provide a film. The present invention has excellent optical properties such as transparency or haze, mechanical properties such as hardness, and flexibility, and has a controlled surface morphology suitable for various uses. One of our objectives is to provide a film with excellent durability.

Among the physical properties mentioned in this specification, physical properties whose results are affected by measurement temperature and/or measurement pressure are the results of measurements at normal temperature and/or normal pressure, unless otherwise specified.

The term "normal temperature" refers to the natural temperature without heating or cooling, for example, any one temperature within the range of 10°C to 30°C, about 23°C or about 25°C. Further, in this specification, the unit of temperature is Celsius (°C) unless otherwise specified.

The term "normal pressure" refers to the natural pressure that is not pressurized or depressurized, and usually means about 1 atmosphere below the atmospheric pressure level.

In the present specification, when the measured humidity is a physical property that affects the result, the physical property is a physical property measured at the normal temperature and/or normal pressure state and at the natural humidity that is not particularly adjusted.

In the present invention, the term "alkyl group, alkylene group, or alkoxy group" means 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 8 carbon atoms, unless otherwise specified. 4 straight chain or branched alkyl group, alkylene group or alkoxy group, or a group having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 6 carbon atoms. It means a cyclic alkyl group, alkylene group or alkoxy group.

In the present invention, the term "alkenyl group" means a straight chain or branched group having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms, unless otherwise specified. It means a chain alkenyl group, or a cyclic alkenyl group having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 6 carbon atoms.

In the present invention, the term "aryl group or arylene group" means an aryl group or arylene group having 6 to 24 carbon atoms, 6 to 18 carbon atoms, or 6 to 12 carbon atoms, or a phenyl group or an arylene group, unless otherwise specified. Means a phenylene group.

In the present invention, the term "epoxy group" means a cyclic ether having three ring atoms or a monovalent residue derived from a compound containing the cyclic ether, unless otherwise specified. Examples of the epoxy group include a glycidyl group, an epoxyalkyl group, a glycidoxyalkyl group, and an alicyclic epoxy group. In the above, the alicyclic epoxy group refers to a compound containing an aliphatic hydrocarbon ring structure, and two carbon atoms forming the aliphatic hydrocarbon ring also forming an epoxy group. means a monovalent residue derived from Examples of the alicyclic epoxy group include alicyclic epoxy groups having 6 to 12 carbon atoms, such as a 3,4-epoxycyclohexylethyl group.

The alkyl group, alkylene group, alkoxy group, alkenyl group, aryl group, arylene group or epoxy group may be optionally substituted with one or more substituents.

FIELD OF THE INVENTION The present invention relates to films. In one example, the film may include a cured material layer. The cured material layer may be a cured material layer of an energy ray curable composition. The film may have a single layer structure consisting only of the cured material layer, or may have a multilayer structure including other layers. For example, the film may further include a base film, and in such a case, the cured material layer may be formed on one or both sides of the base film.

At least one surface of the cured material layer may have an uneven surface. For example, when the cured material layer is formed on one surface of the base film, the surface of the cured material layer opposite to the surface facing the base film may be an uneven surface. The shape of such an uneven surface can be controlled in various ways depending on the purpose.

For example, the uneven surface may have an arithmetic mean roughness (Ra) of about 0.01 μm to 2 μm. The arithmetic mean roughness may be the arithmetic mean roughness of the uneven surface before or after performing a steel wool test to be described later. The uneven surface may be a surface integrated with the cured material layer. This means that the uneven surface is not formed by a separate layer different from the cured material layer, but that the uneven surface is formed in the cured material layer itself.

The arithmetic mean roughness can be determined according to the KS B 0601 standard or the ISO 4287/1 standard. Such arithmetic mean roughness is, in other examples, 0.05 μm or more, 0.1 μm or more, 0.15 μm or more, 0.2 μm or more, 0.25 μm or more, or 0.3 μm or more, or 1.8 μm Below, about 1.6 μm or less, 1.4 μm or less, 1.2 μm or less, 1 μm or less, 0.9 μm or less, 0.8 μm or less, 0.7 μm or less, 0.6 μm or less, 0.5 μm or less, or 0.4 μm or less It may be.

In one example, the uneven surface may be an uneven surface forming a so-called anti-glare surface.

The uneven surface may exhibit a haze within a range of 3% to 50%. The haze may be the haze on the uneven surface before or after performing the steel wool test described below. The haze can be measured by the method disclosed in Examples described later. In other examples, the haze is 3.5% or more, 4% or more, 4.5% or more, 5% or more, 5.5% or more, 6% or more, 6.5% or more, 7% or more, 7 .5% or more, 8% or more, 8.5% or more, 9% or more, 9.5% or more, 10% or more, 10.5% or more, 11% or more, 11.5% or more, 12% or more, 12 .5% or more, 13% or more, 13.5% or more, 14% or more, 14.5% or more, 15% or more, 15.5% or more, 16% or more, 16.5% or more, 17% or more, 17 .5% or more, 18% or more, 18.5% or more, 19% or more, 19.5% or more, 20% or more, 20.5% or more, or 21% or more, or 45% or less, 40% or less, It may be about 35% or less, 30% or less, 25% or less, 20% or less, 15% or less, 10% or less, or about 7% or less.

The uneven surface may have a 60 degree gloss of 10% to 90%. The 60 degree gloss may be a 60 degree gloss applied to the uneven surface before or after performing the steel wool test described below. The 60 degree gloss can be measured by the method disclosed in Examples described later. In other examples, the 60 degree gloss is 15% or more, 20% or more, 25% or more, 30% or more, 35% or more, 40% or more, 45% or more, 50% or more, 55% or more, 60% or more. Alternatively, it may be 65% or more, 85% or less, 80% or less, 75% or less, 70% or less, 65% or less, 60% or less, 55% or less, or about 50% or less.

The uneven surface can exhibit excellent surface properties.

For example, the uneven surface can exhibit a pencil hardness of 5H or higher. The pencil hardness is measured according to the JIS 5600 standard by using a pencil hardness measuring device and applying a pencil lead to the uneven surface of the film at a temperature of about 25° C. and a relative humidity of 50% with a load of 500 g and an angle of 45 degrees. Can be measured. Pencil hardness can be measured by increasing the hardness of the pencil lead in steps until defects such as indentations, scratches, or ruptures are observed on the uneven surface of the film. In other examples, the pencil hardness of the uneven surface may be approximately 6H or more, 7H or more, 8H or more, or 9H or more. The maximum value of pencil hardness determined by a known method for measuring pencil hardness is 9H. Therefore, the upper limit of the pencil hardness of the uneven surface may be 9H.

The textured surface may exhibit 500g steel wool resistance of 1,500 times or more. The above-mentioned 500g steel wool resistance is a surface property confirmed by a steel wool test. In other examples, the 500g steel wool resistance of the uneven surface of the film is about 2,000 times or more, 2,500 times or more, 3,000 times or more, 3,500 times or more, 4,000 times or more. 4,500 times or more, 5,000 times or more, 5,500 times or more, 6,000 times or more, 6,500 times or more, 7,000 times or more, 7,500 times or more, 8,000 times or more , 8,500 times or more, 9,000 times or more, or 9,500 times or more. The higher the steel wool resistance value is, the more excellent the scratch resistance of the uneven surface of the film is, so the upper limit is not particularly limited. In one example, the 500g steel wool resistance is about 20,000 times or less, about 15,000 times or less, about 14,000 times or less, about 13,000 times or less, about 12,000 times or less, or about 11,000 times. It may be less than that.

The uneven surface formed as described above in the film of the present invention can exhibit durability capable of stably maintaining its shape.

For example, the uneven surface may satisfy any one of the following formulas 1 to 3, two of the formulas, or all of the formulas.

[Formula 1]
0.3≧△H=100×｜(H _A −H _I )/N｜

[Formula 2]
0.3≧△G=100×｜(G _A − G _I )/N｜

[Formula 3]
0.3≧△R=100×｜(R _A − R _I )/N｜

In Equations 1 to 3, ΔH, ΔG, and ΔR are the haze change rate, 60 degree gloss change rate, and arithmetic mean roughness (Ra) change rate of the uneven surface, respectively.

In Equation 1, _HI is the initial haze of the uneven surface (haze before performing the steel wool test described below), and _HA is the haze of the uneven surface after performing the steel wool test described later. , N is the number of times the steel wool test was conducted, and |(H _A - H _I )/N| is calculated by substituting H _A , H _I and N into (H _A - H _I )/N. This is the absolute value of the obtained value.

In Equation 2, _GI is the initial 60 degree gloss of the uneven surface (60 degree gloss before performing the steel wool test described below), and _GA is the initial 60 degree gloss of the uneven surface after performing the steel wool test described below. N is the number of times the steel wool test was performed, |(G _A - G _I )/N| is the 60 degree gross of G _A , _{G I} and _N. This is the absolute value of the numerical value obtained by substituting /N.

In Equation 3, R _I is the initial arithmetic mean roughness (Ra) of the uneven surface (arithmetic mean roughness before conducting the steel wool test described below), and R _A is the initial arithmetic mean roughness (Ra) of the uneven surface (arithmetic mean roughness before performing the steel wool test described below) is the arithmetic mean roughness (Ra) of the uneven surface afterward, N is the number of times the steel wool test was performed, |( _{R A} - R _I )/ _N | This is the absolute value of the numerical value obtained by substituting N into (R _A − R _I )/N.

The steel wool test carried out to confirm the above formulas 1 to 3 is carried out by scratching the uneven surface with grade #0000 steel wool under a load of 500 g according to the method described in the examples below. . The scratching may be performed a variable N times using Equations 1 to 3. In this case, N is, for example, 1,000 or more, 1,100 or more, 1,200 or more, 1,300 or more, 1,400 or more, or 1,500 or more, or 3,000 or less, 2,900 or less , 2,800 or less, 2,700 or less, 2,600 or less, 2,500 or less, 2,400 or less, 2,300 or less, 2,200 or less, 2,100 or less, 2,000 or less, 1,900 or less , 1,800 or less, 1,700 or less, 1,600 or less, or 1,500 or less.

In Formula 1, ΔH is, in other examples, about 0.25 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, about 0.09 or less, about 0.08 or less, about It may be about 0.07 or less, about 0.06 or less, about 0.05 or less, about 0.04 or less, about 0.03 or less, about 0.02 or less, or about 0.01 or less. Since the lower the value of ΔH, the better the ability to maintain the uneven surface, the lower limit is not particularly limited. In one example, the ΔH may be greater than or equal to 0 or more than 0.

In Formula 2, ΔG is, in other examples, about 0.25 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, about 0.09 or less, about 0.08 or less, about It may be about 0.07 or less, about 0.06 or less, about 0.05 or less, about 0.04 or less, about 0.03 or less, or about 0.02 or less. Since the lower the value of ΔG, the better the ability to maintain the uneven surface, the lower limit is not particularly limited. In one example, the ΔG may be greater than or equal to 0 or more than 0.

In Formula 3, ΔR is, in other examples, about 0.25 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, about 0.09 or less, about 0.08 or less, about 0.07 or less, about 0.065 or less, about 0.06 or less, about 0.055 or less, about 0.05 or less, about 0.045 or less, about 0.04 or less, about 0.035 or less, about 0. 03 or less, about 0.025 or less, about 0.02 or less, about 0.015 or less, about 0.01 or less, about 0.009 or less, about 0.008 or less, about 0.007 or less, about 0.006 or less , about 0.005 or less, or about 0.004 or less. Since the lower the value of ΔR, the better the ability to maintain the uneven surface, the lower limit is not particularly limited. In one example, the ΔR may be greater than or equal to 0 or more than 0.

It represents one or more physical properties selected from the group consisting of the arithmetic mean roughness (Ra), haze, 60 degree gloss, pencil hardness and 500g steel wool resistance, and the formula The so-called skewness of the uneven surface can be adjusted in order to form an uneven surface exhibiting a shape retention force that satisfies one or more of 1 to 3. The skewness is a value that indicates the degree to which an arbitrary distribution deviates from symmetry and is biased to one side, and for an uneven surface, it is a value that indicates the degree of symmetry of the surface height with respect to the average plane. If the skewness is a positive number, it means that a peak forming the uneven surface is predominant, and if it is a negative value, it means that a valley forming the uneven surface is predominant. The skewness can be confirmed using a well-known optical profiler or an atomic force microscope (AFM) device according to the ISO 25178 standard.

The present inventors have confirmed that the intended characteristics of the uneven surface can be achieved by making the uneven surface have a negative skewness as determined by the ISO 25178 standard. The skewness may be, for example, about −2 or more and less than 0. In other examples, the skewness is about -1.9 or more, about -1.8 or more, about -1.7 or more, about -1.6 or more, about -1.5 or more, about -1.4. or more, about -1.3 or more, about -1.2 or more, about -1.1 or more, about -1.0 or more, or about -0.9 or more, or -0.1 or less, about -0. It may be less than or equal to 2, less than or equal to about -0.3, less than or equal to about -0.4, or less than or equal to about -0.5. By adjusting the degree of distortion within such a range, it is possible to form an uneven surface that stably maintains the shape that is desired.

In order to ensure such degree of distortion, it is necessary to use a so-called anti-glare film as a template to transfer the uneven shape of the film to the cured material layer. That is, since the uneven surface formed by the known method of forming an uneven surface known as a so-called anti-glare film exhibits positive skewness, it is possible to transfer the surface with such positive skewness to the opposite phase. The surface can exhibit negative skewness. In addition, in the process of being transferred to the opposite phase, the absolute value of the skewness is maintained within a similar range and its sign changes, so by controlling the skewness of the uneven surface used as the template, it is possible to It is possible to form an uneven surface in which the absolute value of skewness is in a negative region.

Therefore, the cured material layer can be formed by irradiating the energy ray curable composition layer with energy rays while the energy ray curable composition layer is in contact with an anti-glare film. Through this method, a cured material layer satisfying the above-mentioned characteristics can be formed. The energy ray curable composition layer is a layer formed using an energy ray curable composition, for example, by coating or casting the energy ray curable composition on the base film. It means a layer.

The term "energy beam curable composition" means a composition that is cured by irradiation with energy beams. The term "energy rays" includes microwaves, infrared rays (IR), ultraviolet rays (UV), X-rays, and gamma rays, as well as alpha-particle beams and proton beams. , particle beams such as neutron beams or electron beams. Typically, ultraviolet rays or electron beams are used as energy rays.

The term "anti-glare film" refers to a film that includes a surface configured to exhibit a low reflectance for at least a portion or the entire visible light range. A surface formed to exhibit said low reflectivity is sometimes referred to as an anti-glare surface.

The anti-glare surface of such an anti-glare film may have various shapes, but usually has an uneven surface having a certain level of roughness, and the anti-glare surface is formed using a known method. The uneven surface of has positive skewness. By bringing the uneven surface of such an anti-glare film into contact with the energy ray curable composition layer and irradiating the layer with energy rays to cure the energy ray curable composition, desired physical properties can be obtained. It is possible to form a film having a textured surface that satisfies the requirements.

Through the process, the uneven surface of the anti-glare film can be transferred to the surface of the cured material layer, and the transferred uneven surface increases the utilization of the cured material layer. For example, the cured material layer to which the uneven surface has been transferred may exhibit a low reflectance by itself for part or all of the visible light region, or may exhibit the low reflectance in combination with a necessary layer. be able to. Therefore, such a cured material layer can be effectively applied to a variety of applications requiring the above-mentioned excellent physical properties and low reflectance.

The anti-glare surface that comes into contact with the energy beam curable composition layer in the step may be an uneven surface as described above, and such an uneven surface may be an uneven surface exhibiting positive skewness. It's okay. The uneven surface can also be confirmed according to the ISO 25178 standard. The uneven surface of the anti-glare film may be greater than 0 and less than or equal to about 2. In other examples, the skewness is about 1.9 or less, about 1.8 or less, about 1.7 or less, about 1.6 or less, about 1.5 or less, about 1.4 or less, about 1.3. less than or equal to about 1.2, less than or equal to about 1.1, less than or equal to about 1.0, or less than or equal to about 0.9, or greater than or equal to 0.1, greater than or equal to about 0.2, greater than or equal to about 0.3, or less than or equal to about 0.4 or about 0.5 or more. By applying an uneven surface having a skewness in such a range, it is possible to form an uneven surface having a desired skewness.

The uneven surface of the anti-glare surface in contact with the energy beam curable composition layer may have an arithmetic mean roughness (Ra) of about 0.01 μm to 2 μm. By applying an anti-glare surface that is an uneven surface having an arithmetic mean roughness within such a range, it may be possible to produce a cured material layer with desired physical properties. The arithmetic mean roughness can be measured by the method disclosed in Examples described later. Such arithmetic mean roughness may be 0.05 μm or more, 0.1 μm or more, 0.15 μm or more, 0.2 μm or more, or 0.25 μm or more, or 1.8 μm or less, 1.6 μm, in other examples. Below, it may be about 1.4 μm or less, 1.2 μm or less, 1 μm or less, 0.9 μm or less, 0.8 μm or less, 0.7 μm or less, 0.6 μm or less, 0.5 μm or less, or 0.4 μm or less. .

The anti-glare surface in contact with the energy beam curable composition layer may have a 60 degree gloss within the range of 10% to 90%. By applying an anti-glare surface which is a surface having a 60 degree gloss within such a range, it may be possible to produce a cured material layer with desired physical properties. The 60 degree gloss can be measured by the method disclosed in Examples described later. In other examples, such 60 degree gloss is 15% or more, 20% or more, 25% or more, 30% or more, 35% or more, 40% or more, or 45% or more, 85% or less, 80% Below, it may be about 75% or less or 70% or less.

The anti-glare surface in contact with the energy beam curable composition layer may be a surface exhibiting a haze of 3% to 50%. By applying an anti-glare surface that has a haze within such a range, it may be possible to produce a cured material layer with desired physical properties. The haze can be measured by the method disclosed in Examples described later. In other examples, such haze is about 3.5% or more, 4% or more, or 4.5% or more, or about 45% or less, 40% or less, 35% or less, 30% or less, or 25% or less. It may be.

The type of anti-glare film that can be applied in the present invention is not particularly limited, and for example, an anti-glare film that has an uneven surface with haze, 60 degree gloss and/or arithmetic mean roughness Ra mentioned above can be applied. be.

In a preferred example, a film having an anti-glare layer containing a binder resin and particles can be used as the anti-glare film.

At this time, as the binder resin, a heat or energy ray curable binder resin can be applied. Specific examples thereof are not particularly limited, but applying an energy ray curable binder resin is suitable for the process. It can be advantageous from a certain point of view. The type of energy ray-curable binder resin that can be used is not particularly limited, but non-urethane polyfunctional acrylate compounds can be used to ensure a suitable effect. For example, a compound having two or more curable functional groups (ex. (meth)acryloyloxy group, etc.) can be used as the compound. The number of functional groups in the compound may be about 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, or 3 or less. Such compounds include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, neopentyl Glycol adipate di(meth)acrylate, hydroxyl pivalic acid neopentyl glycol di(meth)acrylate, dicyclopentanyl di(meth)acrylate, caprolactone modified dicyclopentenyl Ji( meth)acrylate, ethylene oxide modified di(meth)acrylate, di(meth)acryloxyethyl isocyanurate, allyl cyclohexyl di(meth)acrylate, tricyclodecane dimethanol(meth)acrylate, dimethyloldicyclopentanedi (meth)acrylate, ethylene oxide modified hexahydrophthalic acid di(meth)acrylate, tricyclodecane dimethanol (meth)acrylate, neopentyl glycol modified trimethylpropane di(meth)acrylate, adamantane di(meth)acrylate or 9 , 9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorine; trimethylolpropane tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, propionic acid-modified dipenta trifunctional acrylates such as erythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate or propylene oxide modified trimethylolpropane tri(meth)acrylate; such as diglycerol tetra(meth)acrylate or pentaerythritol tetra(meth)acrylate Tetrafunctional acrylates; pentafunctional acrylates such as propionic acid modified dipentaerythritol penta(meth)acrylate; and hexafunctional acrylates such as dipentaerythritol hexa(meth)acrylate or caprolactone modified dipentaerythritol hexa(meth)acrylate. Polyfunctional acrylate compounds and the like can be used, and one or more of these can be selected and used in consideration of the desired viscosity and physical properties.

An anti-glare layer can be applied that is coated with the curable binder resin mixed with particles and cured using a curing method depending on the type of resin. There are no particular restrictions on the types of particles that can be applied, and examples include organic polymer particles such as PMMA (poly (methyl methacrylate)) particles and PS (polystyrene) particles, silica particles, zirconia particles, alumina particles, and titania particles. Inorganic particles etc. can be applied. There is no particular restriction on the shape, average particle size and/or ratio of the particles, and an appropriate shape and/or average particle size may be determined by taking into consideration the desired 60 degree gloss, haze, arithmetic mean roughness Ra, etc. Particles having the following properties can be applied in appropriate proportions.

In the anti-glare layer, any necessary components such as a silicone-based or fluorine-based slip agent and an initiator may be added to the above-mentioned components.

The anti-glare film may include a base film and the anti-glare layer formed on one surface of the base film. In this case, as the base film, a base film having an appropriate transmittance, for example, a transmittance of 80% or more for light having a wavelength of about 370 nm can be used. That is, since a normal anti-glare film exists at the outermost part of an optical film, it is provided with an ultraviolet blocking function and exhibits low transmittance (50% or less) at a wavelength of 370 nm in most cases. In the present invention, an anti-glare film is applied to the mold, and it is necessary to use a film that has high transmittance to ultraviolet light for the ultraviolet curing process. Therefore, the transmittance as described above can be applied. The type of base film is not particularly limited as long as it has the above-mentioned transmittance, and for example, one that shows the above-mentioned transmittance can be selected from among known polymer films.

The step of irradiating the energy rays may be performed while the antiglare surface of the antiglare film is in contact with the energy ray curable composition layer.

The energy ray curable composition layer that comes into contact with the antiglare film can be formed by casting or coating the energy ray curable composition. In this case, the method of casting or coating is not particularly limited, and may be a known method such as gravure coating, roll coating, reverse coating, knife coating, die coating, lip coating, doctor coating, extrusion. Methods such as coating, slide coating, wire bar coating, curtain coating, extrusion coating or spin coating can be applied. In order to prevent gel-like deposits and foreign matter from occurring during the casting process, the casting is performed under conditions where no energy rays are irradiated, and the temperature of the casting can also be appropriately controlled as required.

The thickness of the energy ray curable composition layer formed by a casting method etc. depends on the type of the composition, the type of functional group contained in the resin contained in the composition, the intended use, casting uniformity, and as described below. The thickness can be adjusted to an appropriate value by considering whether or not a flat layer is formed. The thickness of the formed layer may be within the range of approximately 1 μm to 1000 μm. In other examples, the thickness is 5 μm or more, 10 μm or more, 15 μm or more, 20 μm or more, 25 μm or more, 30 μm or more, or 35 μm or more, 900 μm or less, 800 μm or less, 700 μm or less, 600 μm or less, 500 μm or less, 400 μm or less , 300 μm or less, 200 μm or less, 100 μm or less, 90 μm or less, 85 μm or less, 80 μm or less, 75 μm or less, 70 μm or less, 65 μm or less, 60 μm or less, 55 μm or less, 50 μm or less, 45 μm or less, 40 μm or less, 35 μm or less, 30 μm or less, or 25 μm It may be less than or equal to, but is not limited to. For example, when the energy ray curable composition layer is formed on a base material layer on which a flat layer (described later) is not formed, the energy ray curable composition layer may be formed in consideration of the shrinkage force of the energy ray curable composition layer, etc. The thickness of the layer can be additionally controlled. When forming the energy ray curable composition layer on one surface of the base layer on which the flat layer is not formed, the thickness of the curable composition layer may be, for example, 35 μm or less. In other examples, the thickness of the curable composition layer is 33 μm or less, 31 μm or less, 29 μm or less, 27 μm or less, 25 μm or less, 23 μm or less, or 21 μm or less, 5 μm or more, 10 μm or more, or 15 μm or more. Good too. As mentioned above, the thickness of the curable composition layer is determined based on not only whether a flat layer is formed on the base layer, but also the type of resin contained in the curable composition layer, which will be described later. Therefore, the thickness is not limited to these.

The irradiation of the energy ray curable composition with energy rays includes the steps of: casting the energy ray curable composition on a base film to form an energy ray curable composition layer; The method may be performed on a laminate manufactured by a method including the steps of laminating the anti-glare film on a layer and bringing the anti-glare film into contact with the energy ray curable composition layer. In this case, as described above, the surface of the anti-glare film that comes into contact with the energy ray-curable composition layer may be the anti-glare surface described above.

By applying the method, it is possible to more stably maintain the uniformity of the physical properties and quality of the cured material layer produced.

The type of the base film is not particularly limited, and any base film having appropriate surface smoothness can be used. For example, the base film may include polyester film, polypropylene, polyolefin film such as polyethylene or norbornene resin film, acetate film, acrylic film, vinyl fluoride film, polycarbonate film, polyamide film, polyarylate film, cellophane film, etc. Films such as polyether sulfone film can be used alone or in combination of two or more. Among such films, an appropriate film can be selected in consideration of required heat resistance and transparency.

As the base film, a transparent film, for example, a film having a light transmittance of 80% or more or 85% or more can be used. There is no particular limit to the thickness of the base film, but it should be approximately 10 μm or more, taking into account resistance to tension applied during the film manufacturing process, warpage and distortion of the laminate, and energy ray transmission efficiency. It can be selected from 400 μm or within the range of 50 μm to 300 μm.

As the base film, a film having a flattening layer formed on one surface can be used. For example, the energy ray curable composition layer can be formed on the surface of a base film having a flattening layer formed on one surface, where the flattening layer is not provided. By applying the base film on which the flattening layer is formed, curls and the like occur even though the energy ray curable composition layer is formed of the resin and/or thickness described below. It is possible to produce a film with even better surface properties without any problems.

There are no particular restrictions on the material forming the planarization layer. In one example, the flattening layer may be formed by coating the same energy ray curable composition used in forming the film on a base film and curing the composition.

After casting an energy ray curable composition on a base film and laminating the antiglare surface of the antiglare film on the cast energy ray curable composition to produce a laminate, irradiation with energy rays is performed. It can be carried out.

If necessary, the energy ray-curable composition layer and the anti-glare surface may be brought into contact with each other by applying a constant pressure.

The cured material layer can be manufactured by irradiating the anti-glare film with energy rays in a state where the composition is in contact with the energy ray curable composition layer to cure the composition. At this time, the irradiation direction of the energy rays is not limited, and for example, the energy rays are irradiated on the anti-glare film side, on the side of the energy ray-curable composition layer that does not contact the anti-glare film, or on both sides. can. Also when the laminate (anti-glare film/energy ray curable composition layer/base film) is irradiated with energy rays, the energy rays may be applied to the anti-glare film side, the base film side or both sides. Can be irradiated.

In one example, when irradiating the laminate with energy rays, the energy rays can be irradiated to the energy ray-curable composition layer through the base film.

For example, when irradiating ultraviolet rays as energy rays, it is possible to irradiate ultraviolet rays generated using an ultraviolet lamp. As the ultraviolet lamp, a metal halide lamp, a high pressure mercury lamp, a low pressure mercury lamp, a pulsed xenon lamp, a xenon/mercury mixed lamp, a low pressure sterilization lamp, and/or an electrodeless lamp can be used. The irradiation conditions can be determined depending on the composition of the energy ray curable composition, etc., and the irradiation can usually be performed so that the exposure amount is approximately 0.01 to 10 mJ/cm ² . The amount of energy exposed is about 0.05 mJ/cm2 ^or more, 0.1 mJ/cm2 ^or more, 0.5 mJ/cm2 ^or more, 1 mJ/cm2 or ^more , or 1.5 mJ/cm2, in other examples. ² or more, or about 9 mJ/cm ² or less, 8 mJ/cm ² or less, 7 mJ/cm ² or less, 6 mJ/cm ² or less, or 5 mJ/cm ² or less.

The temperature at which such energy ray irradiation is performed is not particularly limited. Normally, the energy ray irradiation is carried out at room temperature (within a range of 15°C to 35°C), but the temperature can be adjusted as necessary. In such cases, heating may be performed during the energy ray irradiation process. /A cooling device etc. may also be applied.

Although there is no particular restriction on the type of energy ray curable composition that can be applied in the present invention, energy ray curable compositions are A material that has curability and fluidity or plasticity that allows casting can be used. If necessary, the curing shrinkage rate can be controlled within an appropriate range in order to prevent warpage, distortion, etc. due to curing shrinkage before and after curing. Generally, an energy beam curable composition having a volumetric shrinkage rate before and after curing within the range of 3% to 10% can be used.

For example, as the energy ray curable composition, an appropriate type is selected and used from the so-called acrylic energy ray curable composition, silicone energy ray curable composition, or epoxy energy ray curable composition. can. Further, a solvent-free type composition can be applied in consideration of process efficiency and film properties.

As the energy ray curable composition, for example, a composition containing at least a silicone resin component and a reactive diluent can be used.

The type of silicone resin component to be applied is not particularly limited, but in order to more effectively satisfy the desired physical properties, a silicone resin component represented by the following average unit formula 1 can be applied.

[Average unit formula 1]
(R ¹ ₃ SiO _1/2 ) _a (R ² ₂ SiO _2/2 ) _b (R ³ SiO _3/2 ) _c (SiO _4/2 ) _d (RO _1/2 ) _e

In the average unit formula 1, R ¹ to R ³ are each independently a hydrogen atom, an alkyl group, an aryl group, or an energy ray-curable group, and when a plurality of R ¹ to R ³ are present, they are mutually They may be the same or different, and at least one of R ¹ to R ³ is an energy ray-curable group, and a, b, c, and d each represent 0≦a≦ when a+b+c+d is converted to 1. 1, 0<b≦1, 0<c≦1 and 0≦d≦1, and e is a number such that e/(a+b+c+d) is within the range of 0 to 0.4. The energy ray-curable group may be, for example, a radical-curable group or a cation-curable group, and is preferably a radical-curable group in consideration of realizing the desired physical properties.

The average unit indicates an average proportion of monomer units contained in the silicone resin component, that is, so-called M, D, T, and Q units, and the silicone resin component exhibits the average unit formula 1. This is because the component contains one polymeric component (silicone resin) containing monomer units in the proportion according to the average unit formula 1, or the component contains two or more polymeric components (silicone resin). It means the case where the average of all monomer units contained in the two or more components is defined by the average unit formula 1.

In the average unit formula 1, when a+b+c+d is converted to 1, a and d are each independently 0.95 or less, 0.9 or less, 0.85 or less, 0.8 or less, 0.75 or less. , 0.7 or less, 0.65 or less, 0.6 or less, 0.55 or less, 0.5 or less, 0.45 or less, 0.4 or less, 0.35 or less, 0.3 or less, 0.25 or less , 0.2 or less, 0.15 or less, 0.1 or less, or 0.05 or less.

In the average unit formula 1, when a+b+c+d is converted to 1, b is 0.01 or more, 0.02 or more, 0.03 or more, 0.04 or more, 0.05 or more, 0 in other examples. .06 or more, 0.07 or more, 0.08 or more, 0.09 or more, 0.1 or more, 0.15 or more, 0.2 or more, or 0.25 or more, or 0.95 or less, 0.9 Below, 0.85 or less, 0.8 or less, 0.75 or less, 0.7 or less, 0.65 or less, 0.6 or less, 0.55 or less, 0.5 or less, 0.45 or less, 0.4 Below, it may be about 0.35 or less, 0.3 or less, or 0.25 or less.

In the average unit formula 1, when a + b + c + d is converted to 1, the c is, in other examples, 0.1 or more, 0.15 or more, 0.2 or more, 0.25 or more, 0.3 or more, 0 .35 or more, 0.4 or more, 0.45 or more, 0.5 or more, 0.55 or more, 0.6 or more, 0.65 or more, 0.7 or more, or 0.75 or more, or 0.95 Below, it may be about 0.9 or less, 0.85 or less, 0.8 or less, or 0.75 or less.

In the average unit formula 1, RO _1/2 means a condensable functional group bonded to a silicon atom. That is, in one example, the silicone resin component can be manufactured by condensing a condensable silane compound, and the condensable functional group remaining without reacting during the process may be represented by the RO _1/2 .

In the average unit formula 1, e may be a number such that e/(a+b+c+d) is in the range of 0 to 0.4. In other examples, the e/(a+b+c+d) is about 0.35 or less, about 0.3 or less, about 0.25 or less, about 0.2 or less, about 0.15 or less, about 0.1 or less, or 0. It may be about .05 or less.

In the average unit formula 1, R ¹ to R ³ are each a functional group directly bonded to a silicon atom, and each of R 1 to R 3 may exist in plural numbers within the silicone resin component represented by the average unit formula 1. , if there are multiple, they may be the same or different. The R ¹ to R ³ may each independently be a hydrogen atom, an alkyl group, an aryl group, or an energy ray-curable functional group. At least one of R ¹ to R ³ is an energy ray curable functional group, and for example, at least the R ³ (if there is a plurality of R ³ , at least one of R ³ ) is an energy ray curable functional group. It may be a sexual functional group.

In the average unit formula, R ² may suitably be an alkyl group.

The energy ray-curable functional group mentioned above may be, for example, a so-called radical-curable functional group or a cation-curable functional group. Typical examples of radically curable functional groups include alkenyl groups, (meth)acryloyl groups, (meth)acryloyloxy groups, (meth)acryloylalkyl groups, and (meth)acryloyloxyalkyl groups. An example of the group is an epoxy group. The term "epoxy group" means a cyclic ether having three ring atoms or a monovalent residue derived from a compound containing the cyclic ether, unless otherwise specified. Examples of the epoxy group include a glycidyl group, an epoxyalkyl group, a glycidoxyalkyl group, and an alicyclic epoxy group. In the above, the alicyclic epoxy group refers to a compound containing an aliphatic hydrocarbon ring structure, and two carbon atoms forming the aliphatic hydrocarbon ring also forming an epoxy group. means a monovalent residue derived from Examples of the alicyclic epoxy group include alicyclic epoxy groups having 6 to 12 carbon atoms, such as a 3,4-epoxycyclohexylethyl group.

The energy ray-curable functional group may preferably be a radical-curable functional group. In the case of resins containing cationic curable functional groups, polymerization occurs through a ring-opening reaction, so there is almost no volume reduction due to curing, etc., whereas in the case of resins containing radical curable functional groups, polymerization occurs through ring-opening. By shrinking the material, the atomic density can be increased, making it more suitable for achieving desired physical properties.

Such energy ray-curable functional groups account for approximately 50 mol% or more, approximately 55 mol% or more, approximately 60 mol% or more, approximately 65 mol% or more, approximately 70 mol% or more of the total R ¹ to R ³ , It can be present in a proportion of about 75 mol% or more, about 80 mol% or more, about 85 mol% or more, about 90 mol% or more, or about 95 mol% or more. There is no particular restriction on the upper limit of the proportion of the energy ray-curable functional group, and for example, the proportion of the functional group is about 100 mol% or less, about 95 mol% or less, about 90 mol% or less, about 85 mol%. % or less, approximately 80 mol % or less, approximately 75 mol % or less, or approximately 70 mol % or less.

The silicone resin component may have a weight average molecular weight (Mw) of 10,000 to 50,000. The weight average molecular weight may be a standard polystyrene value measured by so-called GPC (Gel Permeation Chromatography). In other examples, the weight average molecular weight is about 11000 g/mol or more, 12000 g/mol or more, 13000 g/mol or more, 14000 g/mol or more, 15000 g/mol or more, 16000 g/mol or more, 17000 g/mol or more, 18000 g/mol 19000g/mol or more, 20000g/mol or more, 21000g/mol or more, 22000g/mol or more, 23000g/mol or more, 24000g/mol or more, 25000g/mol or more, 26000g/mol or more, 27000g/mol or more, 28000g/mol It may be about 29,000 g/mol or more, 30,000 g/mol or more, or about 45,000 g/mol or less, 40,000 g/mol or less, 35,000 g/mol or less, 30,000 g/mol or less, 25,000 g/mol or less, or 20,000 g/mol or less. .

The silicone resin component may also have a molecular weight distribution (PDI, Mw/Mn), that is, a ratio of weight average molecular weight (Mw) to number average molecular weight (Mn) of about 1.8 or more. In other examples, the molecular weight distribution is 1.9 or more, 2.0 or more, 2.1 or more, 2.2 or more, or 2.3 or more, 3.0 or less, 2.9 or less, 2. It may be 8 or less, 2.7 or less, 2.6 or less, 2.5 or less, or 2.4 or less.

The silicone resin component having the above-mentioned average unit and having the above-mentioned molecular weight characteristics allows a cured product layer with desired physical properties to be effectively formed.

In order to produce the silicone resin component, a polymerization process of condensing a so-called condensable silane compound (ex. alkoxysilane compound) and a molecular weight adjustment process subsequent to the polymerization process are required. Various methods of manufacturing a silicone resin component by condensing condensable silane compounds are known, and usually, only the condensation process is performed to manufacture a silicone resin component. However, it is difficult to ensure the above-mentioned level of molecular weight characteristics simply by polymerization through the condensation process as described above. Therefore, a suitable molecular weight adjustment step is required following the condensation step.

The molecular weight adjustment process can be performed, for example, while maintaining the polymerization reaction product at a predetermined temperature and under reduced pressure conditions. In this process, the solvent, low molecular weight components, and/or unreacted substances contained in the polymerization reaction product are removed, and the molecular weight can be adjusted to a desired level. The decompression conditions mentioned above are not particularly limited, but the depressurization process can be performed at a degree of vacuum of about 50 to 90 Torr. In other examples, the degree of vacuum may be about 55 Torr or more, about 60 Torr or more, or about 65 Torr or more, or about 85 Torr or less, about 80 Torr or less, or about 75 Torr or less.

The pressure reduction step may be performed under a predetermined temperature profile. For example, the depressurization step includes a first step of maintaining the degree of vacuum at the level at a temperature within the range of about 30° C. to 70° C., and subsequent to the first step, while maintaining the degree of vacuum at the level, the temperature and a second step of maintaining the temperature within the range of 60 to 100°C. In the first stage, if the temperature is maintained within the range of about 30°C to 70°C and the mentioned degree of vacuum is maintained, the temperature decreases due to the reduced pressure and usually reaches a level of about 10°C to 30°C. Temperature decreases. Therefore, when the temperature decreases as described above, the temperature is further increased to the second stage level to further proceed with the molecular weight adjustment process. The temperature of the first stage may be about 35°C or higher, 40°C or higher, or 45°C or higher, or 65°C or lower, 60°C or lower, or 55°C or lower, in other examples, and the temperature of the second stage The temperature may be about 65°C or more, 70°C or more, or 75°C or more, or about 95°C or less, about 90°C or less, or 85°C or less, in other examples. Further, in the first step, as mentioned above, the temperature is reduced from a temperature in the range of about 30° C. to 70° C. to a level of about 10° C. to 30° C. at the vacuum level mentioned above. A process may be performed. The time period during which the first and second steps are performed is not particularly limited, but in order to ensure an appropriate level of molecular weight, the first step is performed for approximately 1 to 5 hours, and the second step is performed for approximately 1 to 5 hours. This can be done in about 10 to 60 minutes.

The method of obtaining the polymerization reaction product applied to the molecular weight adjustment step is not particularly limited. Various methods of manufacturing silicone resin using condensable compounds such as alkoxysilanes are known in the industry, and all of these methods can be applied to the present invention.

In order to advantageously obtain the desired molecular weight in the subsequent molecular weight adjustment process, the polymerization process involves base-coating the condensable silane, such as an alkoxysilane, in a mixed solvent of an aqueous solvent and an alcohol, ketone and/or acetate. A method of polymerizing by applying a catalyst can be applied.

In the above process, known compounds can be used as the alkoxysilane.

Examples of aqueous solvents that can be used in the above include water, and such aqueous solvents contain about 0.1 to 10 moles per mole of the total condensable silane compound (ex. alkoxysilane) applied to the polymerization. Can be applied as a percentage. In other examples, the proportion of the aqueous solvent is about 0.5 moles or more, about 1 mole or more, about 1.5 moles or more, about 2 moles or more, or about 2.5 moles or more, or about 9 moles or less. , about 8 moles or less, about 7 moles or less, about 6 moles or less, about 5 moles or less, about 4 moles or less, or about 3 moles or less.

Examples of the applicable alcohol include ethyl alcohol, n-propyl alcohol, i-propyl alcohol, i-butyl alcohol, n-butyl alcohol and/or t-butyl alcohol, and examples of the ketone solvent include acetone, Examples include methyl ethyl ketone, methyl isobutyl ketone, dimethyl ketone, methyl isopropyl ketone and/or acetylacetone, and examples of acetate solvents include methyl acetate, ethyl acetate, propyl acetate and/or butyl acetate, but are limited to these. It's not a thing. Such alcohol, ketone or acetate solvent can be applied in a proportion of approximately 0.1 to 10 moles per mole of the total condensable silane compound (ex. alkoxysilane) applied to the polymerization. In other examples, the proportion of the alcohol, ketone or acetate solvent is about 0.5 moles or more, about 1 mole or more, about 1.5 moles or more, about 2 moles or more, or about 2.5 moles or more; It may be about 9 moles or less, about 8 moles or less, about 7 moles or less, about 6 moles or less, about 5 moles or less, about 4 moles or less, or about 3 moles or less.

As the base catalyst used in the above process, for example, an amine compound having a pKa of 15 or less can be used. In other examples, the pKa of the amine compound is about 14.5 or less, about 14 or less, about 13.5 or less, about 13 or less, about 12.5 or less, about 12 or less, about 11.5 or less, about 11 less than or equal to about 10.5, about 1 or more, about 2 or more, about 3 or more, about 4 or more, about 5 or more, about 6 or more, about 7 or more, about 8 or more, about 9 or more, or about 10 or more may be used, but is not limited to these. As the amine compound, for example, a trialkylamine such as triethylamine can be used, but it is not particularly limited as long as the pKa is within the above range.

The amine compound can be applied at a ratio of about 0.0001 mol to 0.1 mol per 1 mol of the total condensable silane compound (ex. alkoxysilane). In other examples, the proportion is about 0.0005 mole or more, about 0.0007 mole or more, about 0.0009 mole or more, or about 0.01 mole or more, or about 0.09 mole or less, about 0.01 mole or more. 08 mol or less, about 0.07 mol or less, about 0.06 mol or less, about 0.05 mol or less, about 0.04 mol or less, about 0.03 mol or less, or about 0.02 mol or less good.

For example, a polymerization reaction product can be obtained by maintaining a mixture of the above components at a temperature in a range of about 50 to 110° C. for about 8 to 16 hours. In other examples, the temperature of the polymerization reaction is about 55°C or more, about 60°C or more, about 65°C or more, about 70°C or more, or about 75°C or more, or about 105°C or less, about 100°C or less, The temperature may be about 95°C or less, about 90°C or less, or about 85°C or less, and the polymerization time is, in other examples, about 9 hours or more, about 10 hours or more, or about 11 hours or more, or about 15 hours or more. It may be about 1 hour or less, about 14 hours or less, or about 13 hours or less.

When the polymer polymerized by the method described above is introduced into the molecular weight adjustment step, the desired molecular weight characteristics can be more effectively ensured.

The energy ray curable composition may contain a reactive diluent together with the components. The reactive diluent can adjust the viscosity of the composition within an appropriate range so that the casting process can be performed appropriately.

As the reactive diluent, known components can be used without any particular restrictions. Suitable reactive diluents are known depending on the curing type of the energy beam curable composition (for example, whether it is radical curable or cationic curable).

In one example, the silicone resin component includes a radical curable functional group (for example, an alkenyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, a (meth)acryloyl alkyl group, (meth)acryloyloxyalkyl group, etc.), various acrylate compounds can be used as the reactive diluent.

Such acrylate compounds include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, t-butyl (meth)acrylate, sec-butyl (meth)acrylate, pentyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-ethylbutyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, Alkyl (meth)acrylates such as lauryl (meth)acrylate or tetradecyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate or hydroxyalkyl (meth)acrylate such as 8-hydroxyoctyl (meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di (meth)acrylate, polyethylene glycol di(meth)acrylate, neopentyl glycol adipate di(meth)acrylate, hydroxyl pivalic acid, neopentyl glycol di(meth)acrylate, dicyclopentanyl ( dicyclopentanyl di(meth)acrylate, caprolactone-modified dicyclopentenyl di(meth)acrylate, ethylene oxide-modified di(meth)acrylate, di(meth)acryloxyethyl isocyanurate, allyl-modified cyclohexyl di(meth)acrylate, Cyclodecane dimethanol (meth)acrylate, dimethylol dicyclopentane di(meth)acrylate, ethylene oxide modified hexahydrophthalic acid di(meth)acrylate, tricyclodecane dimethanol (meth)acrylate, neopentyl glycol modified trimethylpropane di(meth)acrylate, Difunctional acrylates such as meth)acrylate, adamantane di(meth)acrylate or 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorine; trimethylolpropane tri(meth)acrylate , dipentaerythritol tri(meth)acrylate, propionic acid modified dipentaerythritol tri(meth)acrylate, pentaerythritol tri(meth)acrylate, propylene oxide modified trimethylolpropane tri(meth)acrylate, trifunctional urethane(meth)acrylate or trifunctional acrylates such as tris(meth)acryloxyethyl isocyanurate; tetrafunctional acrylates such as diglycerol tetra(meth)acrylate or pentaerythritol tetra(meth)acrylate; propionic acid modified dipentaerythritol penta(meth)acrylate and dipentaerythritol hexa(meth)acrylate, caprolactone-modified dipentaerythritol hexa(meth)acrylate or urethane(meth)acrylate (ex. Polyfunctional acrylate compounds such as hexafunctional acrylates such as reaction products of isocyanate monomer and trimethylolpropane tri(meth)acrylate can be used, and among these, considering the desired viscosity and physical properties, etc. One type or two or more types can be selected and used.

In another example, when the silicone resin component includes a cationically curable functional group (e.g., an epoxy group) as an energy ray-curable functional group, an epoxy compound or an oxetane compound is used as the reactive diluent. can.

A variety of epoxy or oxetane compounds that can be used as reactive diluents in cationically curable compositions are known in the art, and such known reactive diluents can be used without restriction.

For example, epoxy compounds or oxetane compounds applicable to the reactive diluent include bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, bisphenol A diglycidyl bromide, bisphenol F diglycidyl bromide. Ether, brominated bisphenol S diglycidyl ether, epoxy novolak resin, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, hydrogenated bisphenol S diglycidyl ether, 3,4-epoxycyclohexylmethyl-3',4 '-Epoxycyclohexanecarboxylate, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy)-cyclohexane-1,4-dioxane, bis(3,4-epoxycyclohexylmethyl)adipate, Vinylcyclohexene oxide, 4-vinylepoxycyclohexane, vinylcyclohexene dioxide, limonene oxide, limonene dioxide, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, 3,4-epoxy-6-methylcyclohexyl-3 ',4'-Epoxy-6'-methylcyclohexanecarboxylate, ε-caprolactone-modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, trimethylcaprolactone-modified 3,4-epoxycyclohexylmethyl- 3',4'-epoxycyclohexanecarboxylate, β-methyl-δvalerolactone-modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, methylenebis(3,4-epoxycyclohexane), bicyclohexyl -3,3'-epoxide, -O-, -S-, -SO-, -SO ₂ -, -C(CH ₃ ) ₂ -, -CBr ₂ -, -C(CBr ₃ ) ₂ -, -C Bis( _{3,4 -} epoxycyclohexyl) _{, dicyclopentadiene} diepoxide, _di ( ₃ , 4-epoxycyclohexylmethyl) ether, ethylene bis(3,4-epoxycyclohexanecarboxylate), epoxyhexahydrodioctyl phthalate, epoxyhexahydro-di-2-ethylhexyl phthalate, 1,4-butanediol diglycidyl ether, 1 , 6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, glycerol triglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, diglycidyl ester of aliphatic long chain dibasic acids , monoglycidyl ethers of aliphatic higher alcohols, phenol, cresol, butylphenol, or monoglycidyl ethers of polyether alcohols obtained by adding alkylene oxide to these compounds, glycidyl esters of higher fatty acids, epoxidized soybean oil, epoxybutyl Stearic acid, epoxyoctylstearic acid, epoxidized linseed oil, epoxidized polybutadiene, 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene, 3-ethyl-3-hydroxymethyloxetane, 3-ethyl -3-(3-hydroxypropyl)oxymethyloxetane, 3-ethyl-3-(4-hydroxybutyl)oxymethyloxetane, 3-ethyl-3-(5-hydroxypentyl)oxymethyloxetane, 3-ethyl-3 -Phenoxymethyloxetane, bis((1-ethyl(3-oxetanyl)methyl)ether, 3-ethyl-3-((2-ethylhexyloxy)methyl)oxetane, 3-ethyl-((triethoxysilylpropoxymethyl)oxetane , 3-(meth)allyloxymethyl-3-ethyloxetane, 3-hydroxymethyl-3-ethyloxetane, (3-ethyl-3-oxetanylmethoxy)methylbenzene, 4-fluoro-[1-(3-ethyl-) 3-oxetanylmethoxy)methyl]benzene, 4-methoxy-[1-(3-ethyl-3-oxetanylmethoxy)methyl]-benzene, [1-(3-ethyl-3-oxetanylmethoxy)ethyl]phenyl ether, iso Butoxymethyl (3-ethyl-3-oxetanylmethyl) ether, 2-ethylhexyl (3-ethyl-3-oxetanylmethyl) ether, ethyldiethylene glycol (3-ethyl-3-oxetanylmethyl) ether, dicyclopentadiene (3-ethyl -3-oxetanylmethyl) ether, dicyclopentenyloxyethyl (3-ethyl-3-oxetanylmethyl) ether, dicyclopentenyl (3-ethyl-3-oxetanylmethyl) ether, tetrahydrofurfuryl (3-ethyl-3- oxetanylmethyl) ether, 2-hydroxyethyl (3-ethyl-3-oxetanylmethyl) ether or 2-hydroxypropyl (3-ethyl-3-oxetanylmethyl) ether, or two or more selected from the above. Examples include combinations, but the invention is not limited to these.

The proportion of the reactive diluent applied in the energy beam curable composition is adjusted in consideration of the desired viscosity, etc., and is not particularly limited, but usually 100 parts by weight of the silicone resin component. The reactive diluent can be applied in an amount of 1 to 200 parts by weight. In other examples, the proportion is 3 parts by weight or more, 5 parts by weight or more, 7 parts by weight or more, or 9 parts by weight or more, or 190 parts by weight or less, 180 parts by weight or less, 170 parts by weight or less, 160 parts by weight. Below, 150 parts by weight or less, 140 parts by weight or less, 130 parts by weight or less, 120 parts by weight or less, 110 parts by weight or less, 100 parts by weight or less, 90 parts by weight or less, 80 parts by weight or less, 70 parts by weight or less, 60 parts by weight Below, it may be about 50 parts by weight or less, 40 parts by weight or less, 30 parts by weight or less, or about 20 parts by weight or less.

The energy ray curable composition contains the silicone resin component and the reactive diluent as basic components, and may also contain necessary additional components. Such additive components include an initiator capable of initiating curing of the energy beam curable composition, a dispersant, a surfactant, an antistatic agent, a silane coupling agent, a thickener, and a color inhibitor. Examples include, but are not limited to, colorants (pigments, dyes), antifoaming agents, leveling agents, flame retardants, ultraviolet absorbers, adhesion promoters, polymerization inhibitors, antioxidants, and/or surface modifiers. It is not something that will be done.

Additional components that may be included in the energy beam curable composition also include scattering particles for haze control. Such particles usually have a particle size that allows light scattering, and in addition, particles with a refractive index different from that of the surrounding matrix are applied, and an appropriate level of particle size and refraction is applied considering the desired haze. Particles having a certain ratio can be used.

By applying the energy ray-curable composition as described above to the method described above to produce a cured material layer, a cured material layer having desired physical properties can be produced.

The film of the present invention may include a base film on which the cured material layer is formed on one surface. This base film may be a base film applied by the manufacturing method described above.

As mentioned above, any known film can be used as the base film without any special restrictions, but in order to more effectively satisfy the desired physical properties, it is preferable to use a film that is mechanically and/or thermally anisotropic. Polymer film can be applied. In this specification, an anisotropic polymer film can be referred to as an asymmetric polymer film from the mechanical and/or thermal viewpoint. In the above, a polymer film is said to be anisotropic from the viewpoint of mechanical properties when it has the properties of elongation, stress, and elastic modulus that will be described later, and it is said that it is thermally anisotropic when it has the characteristics of elongation, stress, and elastic modulus that will be described later. This is the case when the material has a coefficient of thermal expansion.

The physical properties of each polymer film mentioned in this specification are measured by the method described in the Examples section of this specification.

As such a polymer film, a film known as a so-called highly oriented PET (poly(ethylene terephthalate)) film or SRF (Super Retardation Film) is typically known. Therefore, in the present invention, the polymer film may be, for example, a polyester film.

Films such as those described above are known in the art and exhibit asymmetries in mechanical and/or thermal properties due to high stretching steps during manufacturing. Typical examples of the polymer films known in the industry include polyester films such as PET (poly(ethylene terephthalate)) films, such as SRF (Super Retardation Film) supplied by Toyobo. There is a series of films.

In one example, the polymer film includes a film (including a cured material layer/base film or including a cured material layer/base film/flattening layer) (E1) in an arbitrary first direction within the plane; The ratio (E1/E2) of the film (containing a cured product layer/base film or including a cured product layer/base film/flattening layer) (E2) in a second direction perpendicular to the first direction is It may be 3 or more. The ratio (E1/E2) may be about 3.5 or more, 4 or more, 4.5 or more, 5 or more, 5.5 or more, 6 or more, or 6.5 or more, in other examples. The ratio (E1/E2) may be about 20 or less, 18 or less, 16 or less, 14 or less, 12 or less, 10 or less, 8 or less, or 7.5 or less, in other examples.

In this specification, the term "first direction and second direction of the polymer film" refers to any direction within the plane of the film substrate. For example, when the polymer film is a stretched polymer film, the in-plane direction may be an in-plane direction formed by MD (machine direction) and TD (transverse direction) directions of the polymer film. good. In one example, the first direction described herein is one of the slow axis and fast axis directions of the polymer film, and the second direction is the slow axis and fast axis directions. It may be in the other direction. In another example, when the polymer film is a stretched polymer film, the first direction is one of MD (Machine Direction) and TD (Transverse Direction), and the second direction is The direction may be the other of the MD (Machine Direction) and the TD (Transverse Direction).

The elongation rate of the polymer film in the first direction (for example, the aforementioned slow axis direction or TD direction) is 15% or more, 20% or more, 25% or more, 30% or more, 35% or more, or 40% or more. There may be. The elongation percentage may be about 60% or less, 55% or less, 50% or less, or 45% or less, in other examples.

The polymer film may have a ratio (CTE2/CTE1) of a coefficient of thermal expansion in the second direction (CTE2) to a coefficient of thermal expansion (CTE1) in the first direction of 1.5 or more. The coefficients of thermal expansion (CTE1, CTE2) are values confirmed within a temperature range of 40° C. to 80° C., respectively. In other examples, the ratio (CTE2/CTE1) may be about 2 or more, about 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, or about 3 or less. .

The coefficient of thermal expansion (CTE2) in the second direction may be within a range of 5 to 150 ppm/K. The thermal expansion coefficient is about 10 ppm/K or more, 15 ppm/K or more, 20 ppm/K or more, 25 ppm/K or more, 30 ppm/K or more, 35 ppm/K or more, 40 ppm/K or more, 45 ppm/K or more, 50 ppm/K. or more, about 55 ppm/K or more, 60 ppm/K or more, or 65 ppm/K or more, or 140 ppm/K or less, 130 ppm/K or less, 120 ppm/K or less, 100 ppm/K or less, 95 ppm/K or less, 90 ppm/K or less , 85 ppm/K or less, 80 ppm/K or less, 75 ppm/K or less, or 70 ppm/K or less.

The polymer film may have a ratio (YM1/YM2) of an elastic modulus (YM2) in the second direction to an elastic modulus (YM1) in the first direction of 1.5 or more. In other examples, the ratio (YM1/YM2) is about 2 or more, 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, 3 or less, or 2.5 or less. There may be.

The elastic modulus (YM1) in the first direction may be within a range of about 2 to 10 GPa. In other examples, the elastic modulus (YM1) is about 2.5 GPa or more, 3 GPa or more, 3.5 GPa or more, 4 GPa or more, 4.5 GPa or more, 5 GPa or more, or 5.5 GPa or more, or about 9.5 GPa. Below, it may be 9 GPa or less, 8.5 GPa or less, 8 GPa or less, 7.5 GPa or less, 7 GPa or less, 6.5 GPa or less, or 6 GPa or less.

Unless otherwise specified, the elastic modulus referred to in this specification is the so-called Young's modulus, and is measured by the method described in Examples below.

In the polymer film, a ratio (MS1/MS2) of maximum stress (MS2) in the second direction to maximum stress (MS1) in the first direction may be 1.5 or more. In other examples, the ratio (MS1/MS2) is about 2 or more, 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, 3 or less, or 2.5 or less. There may be.

The maximum stress (MS1) in the first direction (eg, the aforementioned slow axis direction or TD direction) may be within a range of about 80 to 300 MPa. In other examples, the maximum stress (MS1) is about 90 MPa or more, about 100 MPa or more, about 110 MPa or more, about 120 MPa or more, about 130 MPa or more, about 140 MPa or more, about 150 MPa or more, about 155 MPa or more, 160 MPa or more, 165 MPa or more , 170 MPa or more, 175 MPa or more, or 180 MPa or more, 185 MPa or more, 190 MPa or more, or 195 MPa or more, or about 300 MPa or less, about 290 MPa or less, about 280 MPa or less, about 270 MPa or less, about 260 MPa or less, about 250 MPa or less, about 245 MPa or less, It may be 240 MPa or less, 235 MPa or less, 230 MPa or less, 225 MPa or less, 220 MPa or less, 215 MPa or less, 210 MPa or less, 205 MPa or less, or 200 MPa or less.

As mentioned above, a typical example of a polymer film having such large optical, mechanical and/or thermal asymmetry is oriented PET (polyethylene terephthalate), which is known as a so-called highly oriented polyester film. films, and such films are readily available in the industry.

A film (including a base film + cured product layer) in which the cured product layer is formed on one side of the polymer film (base film), or a film in which the cured product layer is formed on one side of the base film and the other On the surface, the film on which the flattening layer is formed (including the flattening layer + base film + cured material layer) is equivalent to the polymer film (base film) or has a controlled asymmetrical shape. can show gender.

For example, the film (containing a cured product layer/base film or including a cured product layer/base film/flattening layer) may be or a cured product layer/base film/flattening layer) (EF1) and a film in a second direction perpendicular to the first direction (cured product layer/base film or cured product layer/base film /including the planarization layer) (EF2) may be 1.5 or more. The ratio (EF1/EF2) may be about 2 or more, 2.5 or more, 3 or more, or 3.5 or more, in other examples. In other examples, the ratio (EF1/EF2) is about 20 or less, 18 or less, 16 or less, 14 or less, 12 or less, 10 or less, 8 or less, 7.5 or less, 7 or less, 6.5 or less, 6 Below, it may be 5.5 or less, 5 or less, 4.5 or less, 4 or less, 3.5 or less, or 3 or less.

The first mentioned in describing the mechanical and/or thermal properties of the film (including the cured material layer/substrate film or including the cured material layer/substrate film/flattening layer) referred to herein. And the second direction may be the same direction as the first and second directions mentioned in describing the mechanical and/or thermal properties of the polymer film (base film), respectively.

The elongation rate (EF1) of the film (including the cured product layer/base film or including the cured product layer/base film/flattening layer) in the first direction is 1.5% or more and 2% or more. , 2.5% or more, 3% or more, 3.5% or more, 4% or more, 4.5% or more, 5% or more, 5.5% or more, or 6% or more. The elongation percentage may be about 20% or less, 15% or less, 10% or less, or 5% or less.

The elongation rate (E1) of the polymer film in the first direction and the elongation rate of the film (including the cured product layer/base film or including the cured product layer/base film/flattening layer) in the first direction The ratio (E1/EF1) with (EF1) may be within the range of about 2 to 20, for example. In other examples, the ratio (E1/EF1) is about 2.5 or more, about 3 or more, about 3.5 or more, about 4 or more, about 4.5 or more, about 5 or more, about 5.5 or more, about 6 or more, about 6.5 or more, about 7 or more, about 7.5 or more, about 8 or more, about 8.5 or more, about 9 or more, about 9.5 or more, or about 10 or more, or about 19 or less , 18 or less, 17 or less, 16 or less, 15 or less, 14 or less, 13 or less, 12 or less, 11 or less, 10 or less, 9 or less, 8 or less, or 7 or less.

The film (including a cured material layer/base film or containing a cured material layer/base film/flattening layer) has a coefficient of thermal expansion in the second direction (CTEF2) and a coefficient of thermal expansion in the first direction (CTEF2). CTEF1) (CTEF2/CTEF1) may be 1.5 or more. The thermal expansion coefficients (CTEF1, CTEF2) are values confirmed within a temperature range of 40°C to 80°C. In other examples, the ratio (CTEF2/CTEF1) may be about 2 or more, about 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, or about 3 or less. .

The coefficient of thermal expansion (CTEF2) in the second direction may be within a range of 5 to 150 ppm/K. The thermal expansion coefficient is about 10 ppm/K or more, 15 ppm/K or more, 20 ppm/K or more, 25 ppm/K or more, 30 ppm/K or more, 35 ppm/K or more, 40 ppm/K or more, 45 ppm/K or more, 50 ppm/K. or more, about 55 ppm/K or more, 60 ppm/K or more, or 65 ppm/K or more, 70 ppm/K or more, 75 ppm/K or more, 80 ppm/K or more, or 85 ppm/K or more, or 140 ppm/K or less, 130 ppm/K or less , 120 ppm/K or less, 100 ppm/K or less, 95 ppm/K or less, or 90 ppm/K or less.

The coefficient of thermal expansion (CTE2) of the polymer film in the second direction and the film (including the cured product layer/base film or including the cured product layer/base film/flattening layer) in the second direction The ratio (CTE2/CTEF2) to the coefficient of thermal expansion (CTEF2) may be, for example, about 2 or less. In other examples, the ratio (CTE2/CTEF2) is about 0 or more, about 0.1 or more, about 0.2 or more, about 0.3 or more, about 0.4 or more, about 0.5 or more, about 0. It may be greater than or equal to .6, or greater than or equal to about 0.7, or less than or equal to about 1.5, less than or equal to 1, less than or equal to 0.9, less than or equal to 0.85, or less than or equal to 0.8.

The film (including a cured material layer/base film or containing a cured material layer/base film/flattening layer) has an elastic modulus in the second direction (YMF2) and an elastic modulus in the first direction (YMF1). The ratio (YMF1/YMF2) may be 1 or more. In other examples, the ratio (YMF1/YMF2) is about 1.1 or more, 1.2 or more, 1.3 or more, 1.4 or more, 1.5 or more, 1.6 or more, 1.7 or more, or 1.8 or more, 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, 3 or less, 2.5 or less, 2 or less, 1.9 or less, 1.8 or less, or It may be 1.8 or less.

The elastic modulus (YMF1) in the first direction may be within a range of approximately 2 to 10 GPa. In other examples, the elastic modulus (YMF1) is about 2.5 GPa or more, 3 GPa or more, 3.5 GPa or more, 4 GPa or more, or 4.5 GPa or more, or about 9.5 GPa or less, 9 GPa or less, 8.5 GPa. Below, it may be 8 GPa or less, 7.5 GPa or less, 7 GPa or less, 6.5 GPa or less, 6 GPa or less, 5.5 GPa or less, or 5 GPa or less.

The elastic modulus (YM1) of the polymer film in the first direction and the elastic modulus of the film (including the cured product layer/base film or including the cured product layer/base film/flattening layer) in the first direction The ratio (YM1/YMF1) to (YMF1) may be within the range of about 0.5 to 10, for example. In other examples, the ratio (YM1/YMF1) is about 1 or more or more than 1, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, 3 or less, 2 or less, or 1.5 or less. It may be.

The film (including a cured product layer/base film or including a cured product layer/base film/flattening layer) has a maximum stress in the second direction (MSF2) and a maximum stress in the first direction (MSF1). The ratio (MSF1/MSF2) may be 1.5 or more. The ratio (MSF1/MSF2) may be about 2 or more, 10 or less, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 or less, or 3 or less, in other examples.

The maximum stress in the first direction (MSF1) may be in the range of about 50-200 MPa. In other examples, the maximum stress (MSF1) is about 55 MPa or more, about 60 MPa or more, about 65 MPa or more, about 70 MPa or more, about 75 MPa or more, about 80 MPa or more, about 85 MPa or more, about 90 MPa or more, or 95 MPa or more? , about 190 MPa or less, about 180 MPa or less, about 170 MPa or less, about 160 MPa or less, about 150 MPa or less, about 145 MPa or less, about 140 MPa or less, about 135 MPa or less, about 130 MPa or less, about 125 MPa or less, about 120 MPa or less, about 115 MPa or less, about It may be 110 MPa or less, about 105 MPa or less, 90 MPa or less, or about 80 MPa or less.

The maximum stress (MS1) in the first direction of the polymer film and the maximum stress in the first direction of the film (including the cured product layer/base film or including the cured product layer/base film/flattening layer) The ratio (MS1/MSF1) to (MSF1) may be in the range of about 0.5 to 10, for example. In other examples, the ratio (MS1/MSF1) is about 1 or more, 1.5 or more, 2 or more, or 2.5 or more, 9 or less, 8 or less, 7 or less, 6 or less, 5 or less, 4 It may be less than or equal to 3.

As mentioned above, by applying a substrate film with large optical, mechanical and/or thermal asymmetry, the physical properties of the mentioned film are ensured, which makes it possible for the film to be used in diverse applications. It is possible to secure physical properties that can be effectively applied to

For example, the film of the invention can have excellent flexibility. The film of the present invention can, for example, exhibit the above-mentioned scratch resistance and/or surface hardness, while at the same time exhibiting excellent flexibility. For example, the film alone or in combination with other films can exhibit a maximum sustained radius of curvature on the order of 1 to 40 pi. The term "maximum maintained radius of curvature" as used above refers to the radius of curvature when the film is bent to its maximum without any defects observed on the surface when the film is bent by a mandrel test according to the ASTM D522 standard.

In other examples, the radius of curvature is 1.5 pi or more, about 38 pi or less, about 36 pi or less, about 34 pi or less, about 32 pi or less, about 30 pi or less, about 28 pi or less, about 26 pi or less, about 24 pi or less, It may be about 22 pi or less, about 20 pi or less, about 18 pi or less, about 16 pi or less, about 14 pi or less, about 12 pi or less, about 10 pi or less, about 8 pi or less, about 6 pi or less, about 4 pi or less, or about 3 pi or less.

The thickness of the base film applicable to the film of the present invention is not particularly limited, and can have a general thickness in consideration of the intended use.

The film of the present invention as described above can be applied to various uses. For example, the film can be applied to a variety of optical applications.

The invention therefore also relates to optical laminates. The optical laminate may include an optical functional layer and the film formed on at least one surface of the functional layer. In this case, the base film can be located adjacent to the functional layer with respect to the cured material layer in the film.

The type of optically functional layer that can be applied above is not particularly limited, and examples include known polarizing layers and retardation layers.

The present invention has excellent optical properties such as transparency or haze, mechanical properties such as hardness, and flexibility, and has a controlled surface morphology suitable for various uses. We can provide films with excellent durability.

EXAMPLES Hereinafter, the scope of the present invention will be explained in more detail based on Examples, but the scope of the present invention is not limited by the Examples below.

1. Haze measurement method: Haze was measured using a measuring device (manufacturer: MCRL, product name: HM-150) in accordance with the JIS K 7136 standard in a transmission mode with light incident on the uneven surface of the film. .

2. How to measure 60 degree gloss 60 degree gloss is measured by using a measuring device (manufacturer: BYK, product name: BYK Micro Glossmeter 60°4561) so that light is incident on the uneven surface of the film. Measurements were made according to the DIN EN ISO 2813 standard in reflection mode.

3. Measuring method of arithmetic mean roughness Ra The arithmetic mean roughness Ra of the uneven surface of the film, etc. is confirmed using Nano System's optical profiler (model name: NV2700) according to KS B 0601 or ISO 4287/1 standard. In case of disagreement between the two standards, the KS B 0601 standard was checked.

4. Evaluation of 500 g steel wool resistance Steel wool resistance was evaluated using grade #0000 steel wool sold by Liberon. The steel wool was brought into contact with the uneven surface of the film using a measuring device (manufacturer: Kibe Enti Co., Ltd., product name: KM-M4360) under a load of 500 g, and the steel wool resistance was evaluated while moving the film from side to side. At this time, the contact area was approximately 2 cm and 2 cm in width and length, respectively (contact area: 4 cm ² ). The movement was performed at a speed of about 60 times/min, and the movement distance was about 10 cm. Reflections were observed visually and a steel wool test was performed until any indentations, scratches, or ruptures were observed.

5. Evaluation of Pencil Hardness Pencil hardness is measured according to the JIS 5600 standard using measuring equipment (manufacturer: Chumbuk Tech Co., Ltd., product name: Pencil Hardness Tester) using a cylindrical pencil lead at a load of 500 g and an angle of 45 degrees. The hardness of the pencil lead was gradually increased until the occurrence of defects such as indentations, scratches, or ruptures was confirmed by tracing the uneven surface of the film using the pencil lead. The speed of the pencil lead was approximately 1 mm/sec, and the moving distance was approximately 10 mm. Such tests were conducted at a temperature of approximately 25° C. and a relative humidity of 50%.

6. GPC (Gel Permeation Chromatography)
The number average molecular weight (Mn) and molecular weight distribution were measured using GPC (Gel permeation chromatography). A substance to be analyzed, such as a silicone resin component, is placed in a 5 mL vial and diluted with THF (tetrahydrofuran) to a concentration of approximately 1 mg/mL. Thereafter, the calibration standard sample and the sample to be analyzed were filtered through a syringe filter (pore diameter: 0.45 μm) and then measured. The analysis program uses ChemStation from Agilent Technologies, and the elution time of the sample is compared with a calibration curve to determine the weight average molecular weight (Mw) and number average molecular weight (Mn), and the molecular weight distribution is determined by the ratio (Mw/Mn). (PDI) was calculated. The measurement conditions for GPC are as follows.

<GPC measurement conditions>
Equipment: Agilent technologies 1200 series
Column: Used 2 PLgel mixed B from Polymer laboratories Solvent: THF
Column temperature: 35℃
Sample concentration: 1 mg/mL, 200 μL injection Standard sample: Polystyrene (Mp: 3900000, 723000, 316500, 52200, 31400, 7200, 3940, 485)

7. Evaluation of tensile properties and coefficient of thermal expansion of the film The elastic modulus (Young's modulus), elongation (Elongation), and maximum stress (Max. stress) of the film were determined using UTM (Universal Testing Machine) equipment (Instron 3342). The tensile strength test was performed according to ASTM E831 standard by applying force at a tensile rate of 10 mm/min at room temperature (25° C.). In this case, each test piece is manufactured by cutting it to a width of about 10 mm and a length of about 30 mm, and the evaluation is performed after fixing it to the equipment by taping 10 mm each at both ends in the length direction. I proceeded. The thermal expansion coefficient was determined by performing a length expansion test using a TMA (Thermomechanical Analysis) device (Metteler toledo, SDTA840) while increasing the temperature from 40°C to 80°C at a rate of 10°C. Measured according to E831 standard. At the time of measurement, the length of the test piece in the measurement direction was set to 10 mm, and the load was set to 0.02N.

8. Method for measuring the skewness of the uneven surface The skewness of the uneven surface was confirmed according to the ISO 25178 standard using Nano System's optical profiler (model name: NV2700). In the above process, the nanomap program from Nanosystems was used.

Manufacturing example 1. Production of film material P Production of silicone resin component p 3-acryloyloxypropyltrimethoxysilane (KBM5103, Shinetsu Silicon), dimethyldimethoxysilane (DMDMS, Sigma-Aldrich), ethanol, water, and TEA (triethyl amine) were added to 0. Mix uniformly at room temperature at a molar ratio of .8:0.2:2.8:2.8:0.01 (KBM5103:DMDMS:ethanol:water:TEA), and while stirring at 80°C in a flask, approx. The reaction was carried out for about 12 hours to obtain a primary reaction product. The number average molecular weight (Mn) of the produced primary reaction product was about 8341.38 g/mol, and the molecular weight distribution (Mw/Mn) was about 2.05.

The first reactant was maintained under a vacuum condition of about 70 Torr and at a temperature of 50° C. for about 3 hours. During this process, the temperature decreased to about 20° C. due to reduced pressure. Next, while maintaining the vacuum condition, the temperature was raised to 80°C and maintained for 30 minutes to allow further polymerization and evaporation of the solvent (water) to obtain silicone resin component p. . The obtained silicone resin component p is a component represented by the following average unit formula A, and has a number average molecular weight (Mn) of about 13426.63 g/mol and a molecular weight distribution (Mw/Mn) of about 2.34. It was about.

[Average unit formula A]
(Me2SiO2 _{/ 2} ) _0.2 (AcSiO3 _/2 ) _0.8

In the average unit formula A, Me is a methyl group and Ac is a 3-acryloyloxypropyl group.

Production of solvent-free coating liquid p The silicone resin component p produced above was mixed with trimethylolpropane triacrylate (TMPTA) at a weight ratio of 9:1 (silicone resin component p:TMPTA), and 100 parts by weight of the mixture was mixed. About 2.5 parts by weight of a radical initiator (manufacturer: Dupont, product name: Igarcure 819) was added to the solution to produce a solvent-free coating liquid p.

Production example 2. Production of film material Q Production of silicone resin component q Production was performed in the same manner as silicone resin component p in Production Example 1, except that the reaction time was about 1 hour to obtain the primary reactant. The number average molecular weight (Mn) of the produced primary reactant was about 1712.88 g/mol, and the molecular weight distribution (Mw/Mn) was about 1.63.

The first reactant was maintained under a vacuum condition of about 70 Torr and at a temperature of 50° C. for about 3 hours. During this process, the temperature decreased to about 20° C. due to reduced pressure. Next, while maintaining the vacuum condition, the temperature was raised to 80° C. and maintained for 30 minutes to allow further polymerization and evaporation of the solvent (water) to obtain silicone resin component q. The obtained silicone resin component q is a component represented by the following average unit formula A, has a number average molecular weight (Mn) of about 2219.63 g/mol, and a molecular weight distribution (Mw/Mn) of about 1.77. It was about.

[Average unit formula A]
(Me2SiO2 _{/ 2} ) _0.2 (AcSiO3 _/2 ) _0.8

In the average unit formula A, Me is a methyl group and Ac is a 3-acryloyloxypropyl group.

Production of solvent-free coating liquid q The silicone resin component q produced above was mixed with trimethylolpropane triacrylate (TMPTA) at a weight ratio of 9:1 (silicone resin component q:TMPTA), and 100 parts by weight of the mixture was mixed. About 2.5 parts by weight of a radical initiator (manufacturer: Dupont, product name: Igarcure 819) was added to the mixture to produce a solvent-free coating liquid q.

Production example 3. Production of film material R Production of silicone resin component r Epoxycyclohexylethyltrimethoxysilane, dimethyldimethoxysilane (DMDMS, Sigma-Aldrich), ethanol, water and TEA (Triethyl amine) were mixed in a ratio of 0.8:0.2:2. Mix uniformly at room temperature at a molar ratio of 8:2.8:0.01 (epoxycyclohexylethyltrimethoxysilane:DMDMS:ethanol:water:TEA) and react for about 24 hours while stirring at 70°C in a flask. A primary reaction product was obtained.

The first reactant was maintained under a vacuum condition of about 70 Torr and at a temperature of 50° C. for about 3 hours. During this process, the temperature decreased to about 20° C. due to reduced pressure. Next, while maintaining the vacuum condition, the temperature was raised to 80° C. and maintained for 30 minutes to obtain silicone resin component r. The obtained silicone resin component r can be represented by the following average unit formula B.

[Average unit formula B]
(Me2SiO2 _{/ 2} ) _0.2 (EpSiO3 _/2 ) _0.8

In the average unit formula B, Me is a methyl group and Ep is a 3,4-epoxycyclohexylethyl group.

Production of solvent-free coating liquid R The silicone resin R produced above was mixed with epoxy dimer 13((([3-ethyloxetane-3-yl]methoxy)methyl)oxane) (DOX, Toagosei Co., Ltd.) in a 6:4 ratio. (epoxy resin: DOX), and about 3 parts by weight of a cationic initiator (IK-1, San-Apro) was added to 100 parts by weight of the mixture to form a solvent-free coating solution. r was produced.

Manufacturing example 4. Production of anti-glare film for molds (AG1 film) The anti-glare film for molds is made by coating a non-urethane polyfunctional film as a coating liquid on a PET (poly(ethylene terephthalate)) base film (TA063, Toyobo) with a thickness of 100 μm. Dipentaerythritol hexaacrylate (acrylate), silica particles with an average particle size (median particle size, D50 particle size) of about 1 μm, fluorine-based slip agent (manufacturer: 3M, product name: FC4430), and radical initiation A coating liquid containing a coating agent (manufacturer: Dupont, product name: Igarcure 819) in a weight ratio of 100:12:0.1:2 (non-urethane polyfunctional acrylate: silica particles: slip agent: radical initiator) was used as a solvent. A coating liquid prepared by diluting the liquid with a solid content of about 50% by weight was coated with a thickness of about 20 μm, and after drying at 80°C for about 2 minutes, it was coated with an H bulb (Fusion) at an energy of about 1 J/cm ² . Manufactured by irradiation with ultraviolet light. The arithmetic mean roughness Ra of the antiglare surface of the produced antiglare film was at a level of 0.2 to 0.4 μm, and the 60 degree gloss was 45%. Further, the skewness of the anti-glare surface was approximately 0.55 to 0.6.

Manufacturing example 5. Production of anti-glare film for mold (AG2 film) As a coating liquid, dipentaerythritol hexaacrylate (dipentaerythritol hexaacrylate), which is a non-urethane polyfunctional acrylate, and has an average particle size (median particle size, D50 particle size) of about 1 μm is used. Silica particles, fluorine-based slip agent (manufacturer: 3M, product name: FC4430), and radical initiator (manufacturer: Dupont, product name: Igarcure 819) were mixed in a weight ratio of 100:9:0.1:2 (non-urethane type). Same as Production Example 4 except that a coating solution prepared by diluting a coating solution containing polyfunctional acrylate (silica particles: slip agent: radical initiator) with a solvent to a solid content of about 50% by weight was used. An anti-glare film was manufactured. The arithmetic mean roughness Ra of the anti-glare surface of the film was at a level of 0.2 to 0.4 μm, and the 60 degree gloss was 65%. Further, the skewness of the anti-glare surface was approximately 0.75 to 0.85.

Example 1
A PET (poly(ethylene terephthalate)) film on which a flattening layer with a thickness of about 40 μm was formed was coated with the solvent-free coating solution P of Production Example 1 to a thickness of about 40 μm on the side without the flattening layer. . As the PET film, an SRF film manufactured by Toyobo was used. The in-plane retardation (Rin) of the SRF film was about 8,400 nm, and the thickness direction retardation (Rth) was about 9,200 nm. In addition, the coefficient of thermal expansion (CTE1), modulus of elasticity (YM1), maximum stress (MS1), and elongation (E1) in the TD direction of the SRF film are 27 ppm/K, 5.7 GPa, 199 MPa, and 44.5%, respectively. The coefficient of thermal expansion (CTE2), modulus of elasticity (YM2), maximum stress (MS2) and elongation (E2) in the MD direction were 67 ppm/K, 2.3 GPa, 81 MPa and 6.8%, respectively. Ta.

Next, the anti-glare surface of the anti-glare film (AG2 film) of Production Example 5 was brought into contact with the coating layer (coating layer formed on the opposite side of the flattening layer) to prevent air bubbles or air layers from being mixed in. In this state, using a D bulb (Fusion), ultraviolet rays were irradiated with an energy of 2 J/cm ² in a direction that transmitted through the anti-glare film and irradiated the coating layer, and further irradiated the PET film side. In this way, a film including a base film and a cured material layer was manufactured. A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 5.2%, the 60 degree gloss was about 65.8%, and the arithmetic mean roughness Ra was about 0.26 μm. Further, the steel wool resistance of the uneven surface was 10,000 times or more, and the pencil hardness was about 9H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 5.6%, and the 60 degree gloss was about 65.1%. , the arithmetic mean roughness Ra was about 0.29 μm.

Therefore, ΔH, ΔG and ΔR in Formulas 1 to 3 were approximately 0.027, 0.047 and 0.002, respectively.

In addition, the thermal expansion coefficient (CTEF1), elastic modulus (YMF1), maximum stress (MSF1), and elongation rate (EF1) in the TD direction of the base film of the film (flattening layer/base film/cured material layer) are , respectively, and the thermal expansion coefficient (CTEF2), elastic modulus (YMF2), maximum stress (MSF2) and elongation rate (EF2) in the MD direction are 42 ppm/K, 4.5 GPa, 76 MPa and 6.4%, respectively. , 87 ppm/K, 2.8 GPa, 33 MPa and 1.6%.

The skewness in the optical profile of the uneven surface was about −0.87.

Example 2
The surface of a PET (poly(ethylene terephthalate)) film on which the same flattening layer as in Example 1 was formed was coated with the solvent-free coating liquid P of Production Example 1 to a thickness of about 20 μm. Next, while the anti-glare surface of the anti-glare film (AG1) of Production Example 4 was in contact and pressurized on the coating liquid in the same manner as in Example 1, a D bulb (D bulb, manufactured by Fusion Inc.) was applied on the PET film side. A film including a base film and a cured material layer was manufactured by irradiating ultraviolet rays with an energy of 4 J/cm ² using a . A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 21.4%, the 60 degree gloss was about 46.2%, and the arithmetic mean roughness Ra was about 0.31 μm. Further, the steel wool resistance of the uneven surface was 10,000 times or more, and the pencil hardness was about 9H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 21.3%, and the 60 degree gloss was about 46.4%. , the arithmetic mean roughness Ra was about 0.34 μm.

Therefore, ΔH, ΔG and ΔR in Formulas 1 to 3 were approximately 0.007, 0.013 and 0.002, respectively.

In addition, the thermal expansion coefficient, elastic modulus, maximum stress, and elongation rate in the TD and MD directions of the base film of the film (flattening layer/base film/cured material layer) were confirmed in the same manner as in Example 1. It was done.

The skewness in the optical profile of the uneven surface was about −0.55.

Example 3
Different from Example 1, a PET (poly(ethylene terephthalate)) film without a planarization layer was applied. As the PET film, the same SRF film as in Example 1 was used. One side of the PET film was coated with the solvent-free coating solution P of Production Example 1 to a thickness of about 20 μm. Next, while the anti-glare surface of the anti-glare film (AG2) of Production Example 5 was in contact and pressurized on the coating liquid in the same manner as in Example 1, a D bulb (D bulb, manufactured by Fusion Inc.) was placed on the PET film side. A film including a base film and a cured material layer was manufactured by irradiating ultraviolet rays with an energy of 2 J/cm ² using a . A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 5.1%, the 60 degree gloss was about 66.1%, and the arithmetic mean roughness Ra was about 0.26 μm. Further, the steel wool resistance of the uneven surface was 10,000 times or more, and the pencil hardness was about 8H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 5.4%, and the 60 degree gloss was about 66.0%. , the arithmetic mean roughness Ra was about 0.31 μm.

Therefore, ΔH, ΔG and ΔR in Formulas 1 to 3 were approximately 0.02, 0.007 and 0.003, respectively.

Further, the elastic modulus (YMF1), maximum stress (MSF1), and elongation rate (EF1) in the TD direction of the base film of the film (flattening layer/base film/cured material layer) are respectively 4.8 GPa, The elastic modulus (YMF2), maximum stress (MSF2) and elongation (EF2) in the MD direction were 2.6 GPa, 39 MPa and 1.9%, respectively.

The skewness in the optical profile of the uneven surface was about −0.75.

Example 4
Different from Example 1, a PET (poly(ethylene terephthalate)) film without a planarization layer was applied. As the PET film, the same SRF film as in Example 1 was used. One side of the PET film was coated with the solvent-free coating solution P of Production Example 1 to a thickness of about 20 μm. Next, while the anti-glare surface of the anti-glare film (AG1) of Production Example 4 was in contact and pressurized on the coating liquid in the same manner as in Example 1, a D bulb (D bulb, manufactured by Fusion Inc.) was applied on the PET film side. A film in which a base film and a cured material layer were formed was manufactured by irradiating ultraviolet rays with an energy of 2 J/cm ² using a . A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 21.1%, the 60 degree gloss was about 47.4%, and the arithmetic mean roughness Ra was about 0.32 μm. Further, the steel wool resistance of the uneven surface was 10,000 times or more, and the pencil hardness was about 7H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 21.2%, and the 60 degree gloss was about 46.9%. , the arithmetic mean roughness Ra was about 0.36 μm.

Therefore, ΔH, ΔG and ΔR in Formulas 1 to 3 were approximately 0.007, 0.033 and 0.003, respectively.

Furthermore, the elastic modulus, maximum stress, and elongation in the TD and MD directions of the base film of the film (flattening layer/base film/cured material layer) were the same as in Example 3, respectively.

The skewness in the optical profile of the uneven surface was about −0.58.

Example 5
The surface of a PET (poly(ethylene terephthalate)) film on which the same flattening layer as in Example 1 was formed was coated with the solvent-free coating liquid q of Production Example 2 to a thickness of about 20 μm. Next, while the anti-glare surface of the anti-glare film (AG1) of Production Example 4 was in contact and pressurized on the coating liquid in the same manner as in Example 1, a D bulb (D bulb, manufactured by Fusion Inc.) was applied on the PET film side. A film including a base film and a cured material layer was manufactured by irradiating ultraviolet rays with an energy of 4 J/cm ² using a . A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 21.7%, the 60 degree gloss was about 45.5%, and the arithmetic mean roughness Ra was about 0.34 μm. Further, the steel wool resistance of the uneven surface was less than 3000 times, and the pencil hardness was about 7H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 22.0%, and the 60 degree gloss was about 44.7%. , the arithmetic mean roughness Ra was about 0.37 μm.

Therefore, ΔH, ΔG and ΔR in Formulas 1 to 3 were approximately 0.020, 0.053 and 0.002, respectively.

In addition, the thermal expansion coefficient, elastic modulus, maximum stress, and elongation rate in the TD and MD directions of the base film of the film (flattening layer/base film/cured material layer) were confirmed in the same manner as in Example 1. It was done.

The skewness in the optical profile of the uneven surface was about −0.59.

Comparative example 1
As a known coating liquid for forming an anti-glare layer, a coating liquid containing 60% by weight or more of a non-urethane polyfunctional acrylate with an average functional group of 2 or more was used as a TAC film (50 μm, manufactured by Fuji Co., Ltd. with a UV cut function). The film was coated with a thickness of approximately 15 μm, maintained at a temperature of 80°C for 2 minutes, dried, and then irradiated with ultraviolet rays at an energy of 1 J/cm ² through Fusion's H bulb to create an uneven structure. formed a surface with The haze measured on the uneven surface was about 22.1%, the 60 degree gloss was about 21.5%, and the arithmetic mean roughness Ra was about 0.32 μm. Further, the steel wool resistance of the uneven surface was 500 times or less, and the pencil hardness was about 3H.

On the other hand, the haze of the uneven surface measured after conducting the steel wool test 1,500 times using the mentioned method is about 38.4%, and the 60 degree gloss is about 14.2%, and the arithmetic average The roughness Ra was about 83 μm.

Therefore, ΔH, ΔG and ΔR in Equations 1 to 3 were approximately 1.087, 0.487 and 5.512, respectively.

The skewness in the optical profile of the uneven surface was about 0.33.

Comparative example 2
As a known coating solution for forming an anti-glare layer, a coating solution containing 60% by weight or more of a non-urethane polyfunctional acrylate with an average functional group of difunctionality or more was used as a TAC film (50 μm, manufactured by Fuji Co., Ltd. with a UV cut function). After completely drying the film, it was coated to a thickness of about 15 μm, maintained at a temperature of 80°C for 2 minutes, dried, and then exposed to ultraviolet rays with an energy of 1 J/cm ² through Fusion's H bulb. irradiation to form a surface with a textured structure. The haze measured on the uneven surface was about 28.2%, the 60 degree gloss was about 19.6%, and the arithmetic mean roughness Ra was about 0.23 μm. Further, the steel wool resistance of the uneven surface was 500 times or less, and the pencil hardness was about 3H.

On the other hand, the haze of the uneven surface measured after conducting the steel wool test 1,500 times using the mentioned method is about 40.1%, and the 60 degree gloss is about 14.6%, and the arithmetic average The roughness Ra was about 93 μm.

Therefore, ΔH, ΔG and ΔR in Equations 1 to 3 were approximately 0.793, 0.333 and 6.185, respectively.

The skewness in the optical profile of the uneven surface was about 0.51.

Comparative example 3
The surface of a PET (poly(ethylene terephthalate)) film on which the same flattening layer as in Example 1 was formed was coated with the solvent-free coating liquid r of Production Example 3 to a thickness of about 20 μm. Next, while the anti-glare surface of the anti-glare film (AG1) of Production Example 4 was in contact and pressurized on the coating liquid in the same manner as in Example 1, a D bulb (D bulb, manufactured by Fusion Inc.) was applied on the PET film side. A film including a base film and a cured material layer was manufactured by irradiating ultraviolet rays with an energy of 4 J/cm ² using a . A concavo-convex structure was integrally formed on the surface of the produced cured material layer that was in contact with the anti-glare surface. The haze measured on the uneven surface was about 23.5%, the 60 degree gloss was about 46.1%, and the arithmetic mean roughness Ra was about 0.3 μm. Further, the steel wool resistance of the uneven surface was less than 2000 times, and the pencil hardness was about 6H.

On the other hand, the haze of the uneven surface of the cured product measured after conducting the steel wool test 1,500 times using the method mentioned above was about 33.3%, and the 60 degree gloss was about 35.9%. , the arithmetic mean roughness Ra was about 5.58 μm.

Therefore, ΔH, ΔG and ΔR in Equations 1 to 3 were approximately 0.653, 0.68 and 0.352, respectively.

In addition, the thermal expansion coefficient, elastic modulus, maximum stress, and elongation rate in the TD and MD directions of the base film of the film (flattening layer/base film/cured material layer) were confirmed in the same manner as in Example 1. It was done.

The skewness in the optical profile of the uneven surface was approximately −0.79.

Claims (14)

comprising a cured material layer of an energy beam curable composition on at least one surface of which an uneven surface having a negative skewness according to the ISO 25178 standard is formed;
The energy ray curable composition includes a silicone resin component and a reactive diluent,
The silicone resin component is represented by the following average unit formula 1,
[Average unit formula 1]
(R ¹ ₃ SiO _1/2 ) _a (R ² ₂ SiO _2/2 ) _b (R ³ SiO _3/2 ) _c (SiO _4/2 ) _d (RO _1/2 ) _e
In average unit formula 1, R ¹ to R ³ are each independently a hydrogen atom, an alkyl group, an aryl group, or a radically curable group, and when a plurality of R ¹ to R ³ are present, they are the same as each other. However, they may be different, and at least one of R ¹ to R ³ is a radical curable group, and a, b, c, and d are each 0≦a<1 when a+b+c+d is converted to 1. , 0<b<1, 0<c<1 and 0≦d<1, e is a number such that e/(a+b+c+d) is within the range of 0 to 0.4,
the reactive diluent is an acrylate compound,
The energy ray curable composition contains 1 to 200 parts by weight of a reactive diluent based on 100 parts by weight of the silicone resin component,
The uneven surface satisfies one or more of the following formulas 1 to 3:
[Formula 1]
0.3≧△H=100×｜(H _A −H _I )/N｜
[Formula 2]
0.3≧△G=100×｜(G _A − G _I )/N｜
[Formula 3]
0.3≧△R=100×｜(R _A − R _I )/N｜
In formulas 1 to 3, △H, △G, and △R are the haze change rate, 60 degree gloss change rate, and arithmetic mean roughness (Ra , μm ) change rate of the uneven surface, respectively; In Equation 1, _HI is the initial haze of the uneven surface, _HA is the haze of the uneven surface after performing the steel wool test, and N is the number of times the steel wool test was performed. , N is 1500, and |(H _A - H _I )/N| is the absolute value of the numerical value obtained by substituting the above H _A , H _I and N into (H _A - H _I )/N. In Equation 2, _GI is the initial 60 degree gloss of the uneven surface, _GA is the 60 degree gloss of the uneven surface after the steel wool test, and N is the initial 60 degree gloss of the uneven surface after the steel wool test. |(G _A - G _I )/N | is the absolute value of the numerical value obtained by substituting the above G _A , G _I and N into (G _A - G _I )/N. In Equation 3, _RI is the initial arithmetic mean roughness (Ra) of the uneven surface, and _RA is the arithmetic mean roughness (Ra) of the uneven surface after performing the steel wool test. , N is the number of times the steel wool test was conducted, and |(R _A - R _I )/N| is calculated by substituting R _A , R _I and N into (R _A - R _I )/N. is the absolute value of the obtained numerical value,
The steel wool test is performed by moving the uneven surface from side to side using grade #0000 steel wool under a load of 500 g, and the contact area is 2 cm and 2 cm horizontally and vertically, respectively (contact area: 4 cm). ² ), the movement was performed at a speed of 60 times/min, and the movement distance was 10 cm,
The initial haze on the uneven surface is within the range of 3% to 50%,
The initial 60 degree gloss of the uneven surface is in the range of 10% to 90%,
The film, wherein the initial arithmetic mean roughness Ra of the uneven surface is within the range of 0.01 μm to 2 μm . The film according to claim 1, wherein the uneven surface satisfies two or more of the following formulas 1 to 3:
[Formula 1]
0.3≧△H=100×｜(H _A −H _I )/N｜
[Formula 2]
0.3≧△G=100×｜(G _A − G _I )/N｜
[Formula 3]
0.3≧△R=100×｜(R _A − R _I )/N｜
In formulas 1 to 3, △H, △G, and △R are the haze change rate, 60 degree gloss change rate, and arithmetic mean roughness (Ra , μm ) change rate of the uneven surface, respectively; In Equation 1, _HI is the initial haze of the uneven surface, _HA is the haze of the uneven surface after performing the steel wool test, and N is the number of times the steel wool test was performed. , N is 1500, and |(H _A - H _I )/N| is the absolute value of the numerical value obtained by substituting the above H _A , H _I and N into (H _A - H _I )/N. In Equation 2, _GI is the initial 60 degree gloss of the uneven surface, _GA is the 60 degree gloss of the uneven surface after the steel wool test, and N is the initial 60 degree gloss of the uneven surface after the steel wool test. |(G _A - G _I )/N | is the absolute value of the numerical value obtained by substituting the above G _A , G _I and N into (G _A - G _I )/N. In Equation 3, _RI is the initial arithmetic mean roughness (Ra) of the uneven surface, and _RA is the arithmetic mean roughness (Ra) of the uneven surface after performing the steel wool test. , N is the number of times the steel wool test was conducted, and |(R _A - R _I )/N| is calculated by substituting R _A , R _I and N into (R _A - R _I )/N. is the absolute value of the obtained value,
The steel wool test is performed by moving the uneven surface horizontally with grade #0000 steel wool under a load of 500 g, and the contact area is 2 cm and 2 cm horizontally and vertically, respectively (contact area: 4 cm). ² ), the movement was performed at a speed of 60 times/min, and the movement distance was 10 cm . The film according to claim 1, wherein the uneven surface satisfies all of the following formulas 1 to 3:
[Formula 1]
0.3≧△H=100×｜(H _A −H _I )/N｜
[Formula 2]
0.3≧△G=100×｜(G _A − G _I )/N｜
[Formula 3]
0.3≧△R=100×｜(R _A − R _I )/N｜
In formulas 1 to 3, △H, △G, and △R are the haze change rate, 60 degree gloss change rate, and arithmetic mean roughness (Ra , μm ) change rate of the uneven surface, respectively; In Equation 1, _HI is the initial haze of the uneven surface, _HA is the haze of the uneven surface after performing the steel wool test, and N is the number of times the steel wool test was performed. , N is 1500, and |(H _A - H _I )/N| is the absolute value of the numerical value obtained by substituting the above H _A , H _I and N into (H _A - H _I )/N. In Equation 2, _GI is the initial 60 degree gloss of the uneven surface, _GA is the 60 degree gloss of the uneven surface after the steel wool test, and N is the initial 60 degree gloss of the uneven surface after the steel wool test. |(G _A - G _I )/N | is the absolute value of the numerical value obtained by substituting the above G _A , G _I and N into (G _A - G _I )/N. In Equation 3, _RI is the initial arithmetic mean roughness (Ra) of the uneven surface, and _RA is the arithmetic mean roughness (Ra) of the uneven surface after performing the steel wool test. , N is the number of times the steel wool test was conducted, and |(R _A - R _I )/N| is calculated by substituting R _A , R _I and N into (R _A - R _I )/N. is the absolute value of the obtained value,
The steel wool test is performed by moving the uneven surface horizontally with grade #0000 steel wool under a load of 500 g, and the contact area is 2 cm and 2 cm horizontally and vertically, respectively (contact area: 4 cm). ² ), the movement was performed at a speed of 60 times/min, and the movement distance was 10 cm . The film according to claim 1, wherein the uneven surface has a skewness of −2 or more and less than 0 according to the ISO 25178 standard. The film according to claim 1 , wherein the silicone resin component has a weight average molecular weight within a range of 10,000 to 50,000. The film according to claim 1 , wherein the silicone resin component has a molecular weight distribution of 1.8 or more. The film according to claim 1, wherein the uneven surface has a pencil hardness of 5H or more. The uneven surface exhibits resistance to 500g steel wool over 1,500 cycles, and the steel wool resistance was evaluated using grade #0000 steel wool, and the steel wool was applied to the uneven surface of the film under a load of 500g. The contact area when making contact and moving left and right was 2 cm and 2 cm horizontally and vertically (contact area: 4 cm ² ), the movement was performed at a speed of 60 times/min, and the moving distance was: 2. The film according to claim 1, wherein the film is made into a film of 10 cm and visually observed for reflection until an indentation, scratch, or rupture is confirmed. The film according to claim 1, further comprising a base film, and wherein the cured material layer is formed on one or both sides of the base film. The ratio (CTEF2/CTEF1) of the coefficient of thermal expansion (CTEF1) in the first direction which is the TD (transverse direction) direction and the coefficient of thermal expansion (CTEF2) in the second direction perpendicular to the first direction is 1.5 or more. 10. The film of claim 9 . A ratio (YMF1/YMF2) of an elastic modulus (YMF1) in a first direction that is a TD ( transverse direction) direction and an elastic modulus (YMF2) in a second direction perpendicular to the first direction is 1 or more. 9. The film according to 9 . The ratio (MSF1/MSF2) of the maximum stress (MSF1) in a first direction, which is the TD ( transverse direction) direction, and the maximum stress (MSF2) in a second direction perpendicular to the first direction, is 1.5 or more. The film according to claim 9 . The ratio (EF1/EF2) of the elongation rate (EF1) in the first direction, which is the TD ( transverse direction) direction, and the elongation rate (EF2) in the second direction perpendicular to the first direction, is 1.5 or more. The film according to claim 9 . An optical laminate comprising an optical functional layer and the film according to claim 1 formed on one surface of the optical functional layer.