JP7433181B2 - drawing device - Google Patents

Description

The present invention relates to a drawing device that performs drawing on a substrate.

Conventionally, patterns can be drawn by irradiating light onto a photosensitive material formed on a semiconductor substrate, a printed circuit board, or a glass substrate for an organic EL display device or a liquid crystal display device (hereinafter referred to as a "substrate"). It is being done. In such a drawing apparatus, loading of a substrate, alignment of the substrate, drawing on the substrate, and carrying out of the substrate are performed in sequence.

In recent years, in order to improve the throughput of writing devices, two stages, two alignment detection systems, and one exposure head are provided in one writing device, and while writing is performed on a substrate on one stage, the other It is proposed to replace and align the substrate on the stage.

For example, in a step-and-scan type scanning projection exposure apparatus disclosed in Patent Document 1, when a substrate on one stage is being moved while the other stage is being exposed, vibrations caused by the movement may cause damage to the stage being exposed. In order to prevent the control performance of the exposure operation from deteriorating due to propagation, it has been proposed to set an upper limit on the moving speed and acceleration of the other stage during movement.

International Publication No. 2003/010802

By the way, in the exposure apparatus of Patent Document 1, since the moving speed of the stage is limited, the throughput of the exposure apparatus may be reduced. Further, if the positional relationship between the two stages changes due to the movement of the stage, deformation such as distortion may occur in the exposure apparatus, which may reduce the accuracy of exposure processing for the substrate.

The present invention has been made in view of the above problems, and an object of the present invention is to accurately perform drawing on a substrate.

The invention according to claim 1 is a drawing device that performs drawing on a substrate, and includes a pattern drawing section that draws a pattern by irradiating light onto the upper main surface of the substrate that moves horizontally below; a first substrate holding section; a first moving mechanism that horizontally moves the first substrate holding section in the substrate movement direction below the pattern drawing section; and a second substrate disposed adjacent to the first substrate holding section. a second movement, which is arranged in parallel with the first moving mechanism in a direction intersecting the substrate moving direction, and horizontally moves the second substrate holding section in the substrate moving direction below the pattern drawing section; a frame that supports the first moving mechanism and the second moving mechanism; a counterweight that is attached to the frame so as to be movable in a weight moving direction that intersects the substrate moving direction; and a counterweight that supports the weight moving mechanism. Based on the weight moving mechanism that moves in the direction and the positions of the first substrate holder and the second substrate holder in the substrate movement direction, the weight of the first substrate holder and the second substrate holder is and a weight movement control section that controls the weight movement mechanism so that the counterweight is placed at a position that suppresses deformation of the frame.

The invention according to claim 2 is the drawing apparatus according to claim 1, wherein the weight movement direction is perpendicular to the substrate movement direction.

The invention according to claim 3 is the drawing apparatus according to claim 1 or 2, wherein the center of gravity of the counterweight is located between the upper surface of the first substrate holder and the second substrate holder in the vertical direction. Located below the top surface.

The invention according to claim 4 is the drawing apparatus according to claim 3, in which the upper end of the counterweight is located above the upper surface of the first substrate holder and the upper surface of the second substrate holder in the vertical direction. Located below the top surface.

The invention according to claim 5 is the drawing device according to any one of claims 1 to 4, in which the frame straddles the first moving mechanism and the second moving mechanism, and the pattern drawing unit. , the gantry section extending from above the center portions of the first moving mechanism and the second moving mechanism in the substrate moving direction to one side in the substrate moving direction, and supporting the first moving mechanism and the second moving mechanism. The mechanism and the second moving mechanism protrude from the gantry part to the other side in the substrate moving direction, and the counterweight is arranged in the substrate moving direction with respect to the first moving mechanism and the second moving mechanism. placed adjacent to the other side.

The invention according to claim 6 is the drawing apparatus according to any one of claims 1 to 5, wherein the rigidity of the frame is determined based on the substrate movement direction of the first movement mechanism and the second movement mechanism. The counterweight is located adjacent to the other side in the substrate moving direction with respect to the first moving mechanism and the second moving mechanism. and the first substrate holder is located at a position where drawing is performed by the pattern drawing unit, and the second substrate holder is located at the one end in the substrate movement direction. In some cases, the counterweight is located at a reference position in the center of the first moving mechanism and the second moving mechanism in the weight moving direction, and the second substrate holding part is located at the center in the substrate moving direction. When the counterweight is located at a first position closer to the first moving mechanism than the reference position, and when the second substrate holder is located at the other end in the substrate moving direction, , the counterweight is located at a second position closer to the first moving mechanism than the first position, and the second substrate holding section is located at a position where drawing is performed by the pattern drawing section; , when the first substrate holder is located at the one end in the substrate movement direction, the counterweight is located at the reference position, and the first substrate holder is located at the center in the substrate movement direction. the counterweight is located at a third position closer to the second moving mechanism than the reference position, and the first substrate holder is located at the other end in the substrate moving direction. At this time, the counterweight is located at a fourth position closer to the second moving mechanism than the third position.

The invention according to claim 7 is the drawing apparatus according to any one of claims 1 to 5, wherein the rigidity of the frame is determined based on the substrate movement direction of the first movement mechanism and the second movement mechanism. The counterweight is located adjacent to the other side in the substrate moving direction with respect to the first moving mechanism and the second moving mechanism. and when the first substrate holder and the second substrate holder are located at the same position in the substrate movement direction, the counterweight moves between the first movement mechanism and the second movement mechanism in the weight movement direction. and when the second substrate holder is located on the other side in the substrate movement direction than the first substrate holder, the counterweight is located at the center reference position than the reference position. When the second substrate holding section is located closer to the first moving mechanism than the first substrate holding section in the substrate moving direction, the counterweight is located closer to the first moving mechanism than the reference position. 2. Located near the moving mechanism.

The invention according to claim 8 is the drawing apparatus according to any one of claims 1 to 7, wherein the pattern drawing section includes a drawing head that irradiates light downward, and a drawing head that irradiates light downward. , a drawing head moving mechanism that moves between a first drawing position above the first moving mechanism and a second drawing position above the second moving mechanism.

According to the present invention, drawing on a substrate can be performed with high precision.

FIG. 1 is a perspective view showing a drawing device according to one embodiment. FIG. 2 is a diagram showing the configuration of a computer. FIG. 2 is a block diagram showing the functions of a control section. FIG. 3 is a diagram showing the flow of drawing processing. FIG. 3 is a diagram showing the flow of drawing processing. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a 1st stage and a 2nd stage. It is a figure showing the position of a counterweight. It is a figure showing the flow of position adjustment of a counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. It is a figure showing the flow of position adjustment of a counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a diagram showing the positions of the first and second stages and the counterweight. FIG. 3 is a side view showing another example of the drawing device.

FIG. 1 is a perspective view showing a drawing device 1 according to one embodiment of the present invention. The drawing device 1 is a twin stage type direct drawing device that irradiates spatially modulated substantially beam-shaped light onto the photosensitive material on the substrate 9 and draws a pattern by scanning the irradiated area of the light on the substrate 9. It is a drawing device. In FIG. 1, three mutually orthogonal directions are indicated by arrows as an X direction, a Y direction, and a Z direction. In the example shown in FIG. 1, the X direction and the Y direction are horizontal directions perpendicular to each other, and the Z direction is a vertical direction. The same applies to other figures.

The substrate 9 is, for example, a substantially rectangular plate member when viewed from above. The substrate 9 is, for example, a printed circuit board. On the main surface (hereinafter also referred to as "upper surface 91") on the (+Z) side of the substrate 9, a resist film made of a photosensitive material is provided on the copper layer. In the drawing device 1 , a circuit pattern is drawn (that is, formed) on the resist film of the substrate 9 . Note that the type, shape, etc. of the substrate 9 may be variously changed.

The drawing device 1 includes a first transport mechanism 2a, a second transport mechanism 2b, an imaging section 3, a pattern drawing section 4, a frame 7, and a control section 10. The control unit 10 controls the first transport mechanism 2a, the second transport mechanism 2b, the imaging unit 3, and the pattern drawing unit 4.

The frame 7 is a main body base portion to which each component of the drawing device 1 is attached. The frame 7 includes a substantially rectangular parallelepiped base 71 and a gate-shaped first gantry section 72 and second gantry section 73 that straddle the base 71. The second gantry section 73 is arranged close to the (+Y) side of the first gantry section 72. In the following description, the first gantry section 72 and the second gantry section 73 are also collectively referred to as "gantry section 74." A first transport mechanism 2a and a second transport mechanism 2b are mounted on the base 71. The first gantry section 72 supports the imaging section 3. The second gantry section 73 supports the pattern drawing section 4. The frame 7 is placed on a pedestal (not shown).

The first transport mechanism 2a and the second transport mechanism 2b are mechanisms that hold and move the substrate 9 below the imaging section 3 and the pattern drawing section 4 (ie, on the (-Z) side). The second transport mechanism 2b is arranged adjacent to the (+X) side of the first transport mechanism 2a. The first transport mechanism 2a and the second transport mechanism 2b have substantially the same structure.

The first transport mechanism 2a includes a first stage 21a and a first moving mechanism 22a. The first stage 21a is a substantially flat first substrate holder that holds the substantially horizontal substrate 9 from below. The first stage 21a is, for example, a vacuum chuck that attracts and holds the lower surface of the substrate 9. The first stage 21a may have a structure other than a vacuum chuck. The upper surface 91 of the substrate 9 placed on the first stage 21a is approximately perpendicular to the Z direction (that is, the up-down direction) and approximately parallel to the X and Y directions.

The first moving mechanism 22a moves the first stage 21a relative to the imaging section 3 and the pattern drawing section 4 in a substantially horizontal direction (that is, a direction substantially parallel to the upper surface 91 of the substrate 9). It is a mechanism. The first moving mechanism 22a linearly moves the first stage 21a supported on the guide rail 221a below the imaging section 3 and the pattern drawing section 4 in the Y direction along the guide rail 221a. As a result, the substrate 9 held by the first stage 21a moves in the Y direction. In the following description, the Y direction will also be referred to as the "substrate movement direction." The drive source of the first moving mechanism 22a is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the first moving mechanism 22a may be modified in various ways.

The second transport mechanism 2b includes a second stage 21b and a second moving mechanism 22b. The second stage 21b is a substantially flat second substrate holder that holds the substantially horizontal substrate 9 from below. The second stage 21b is arranged adjacent to the side (that is, the (+X) side) of the first stage 21a. The upper surface of the second stage 21b is located at the same height as the upper surface of the first stage 21a in the vertical direction (ie, the Z direction). The second stage 21b is, for example, a vacuum chuck that attracts and holds the lower surface of the substrate 9. The second stage 21b may have a structure other than a vacuum chuck. The upper surface 91 of the substrate 9 placed on the second stage 21b is substantially perpendicular to the Z direction and substantially parallel to the X and Y directions. The upper surface 91 of the substrate 9 held on the second stage 21b is located at approximately the same height in the vertical direction (that is, approximately the same position in the Z direction) as the upper surface 91 of the substrate 9 held on the first stage 21a.

The second moving mechanism 22b moves the second stage 21b relative to the imaging section 3 and the pattern drawing section 4 in a substantially horizontal direction (that is, a direction substantially parallel to the upper surface 91 of the substrate 9). It is a mechanism. The second moving mechanism 22b moves the second stage 21b supported on the guide rail 221b below the imaging section 3 and the pattern drawing section 4 in a straight line in the Y direction (that is, the substrate movement direction) along the guide rail 221b. Moving. As a result, the substrate 9 held on the second stage 21b moves in the Y direction. The direction in which the second stage 21b is moved by the second moving mechanism 22b is approximately parallel to the direction in which the first stage 21a is moved by the first moving mechanism 22a. The drive source for the second moving mechanism 22b is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the second moving mechanism 22b may be modified in various ways.

The first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in a direction intersecting the substrate moving direction (ie, the Y direction). In the example shown in FIG. 1, the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in the X direction, and the second moving mechanism 22b is adjacent to the (+X) side of the first moving mechanism 22a. do. The first moving mechanism 22a and the second moving mechanism 22b are located at substantially the same height in the vertical direction.

The first moving mechanism 22a and the second moving mechanism 22b are supported from below by a base 71 of the frame 7. The first moving mechanism 22a and the second moving mechanism 22b extend from the (+Y) side to the (-Y) direction relative to the second gantry section 73, and extend below the pattern drawing section 4 supported by the second gantry section 73. Then, it passes below the imaging section 3 supported by the first gantry section 72 and protrudes from the first gantry section 72 to the (-Y) side. The first gantry section 72 is located at approximately the same position in the Y direction as the center portions of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. In other words, the gantry section 74 extends in the (+Y) direction from above the central portions of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. Therefore, the rigidity of the frame 7 decreases in the order of the (+Y) side end portion, the center portion in the Y direction, and the (−Y) side end portion of the first moving mechanism 22a and the second moving mechanism 22b.

In the drawing apparatus 1, the substrate 9 is carried in and out of the first stage 21a in a state where the first stage 21a is located on the (-Y) side with respect to the first gantry section 72. Furthermore, with the second stage 21b positioned on the (-Y) side with respect to the first gantry section 72, the substrate 9 is carried in and out of the second stage 21b.

As described above, the first gantry section 72 and the second gantry section 73 are provided across the first transport mechanism 2a and the second transport mechanism 2b. The first gantry section 72 includes two pillars extending in the Z direction on both sides of the first transport mechanism 2a and the second transport mechanism 2b in the X direction, and a beam part connecting the upper ends of the two pillars. Equipped with The beam portion extends in the X direction above the first transport mechanism 2a and the second transport mechanism 2b. The two support columns of the first gantry section 72 are connected to the base 71 at the ends on the (-Z) side. The second gantry section 73 includes two pillars extending in the Z direction on both sides of the first transport mechanism 2a and the second transport mechanism 2b in the X direction, and a beam part connecting the upper ends of the two pillars. Equipped with The beam portion extends in the X direction above the first transport mechanism 2a and the second transport mechanism 2b. The two support columns of the second gantry section 73 are connected to the base 71 at the ends on the (-Z) side.

The imaging unit 3 includes a plurality of (two in the example shown in FIG. 1) imaging heads 31 and an imaging head moving mechanism 32. The plurality of imaging heads 31 are arranged in the X direction and are movably attached to the beam section of the first gantry section 72. The imaging head moving mechanism 32 is attached to the beam and moves the plurality of imaging heads 31 in the X direction along the beam. The driving source of the imaging head moving mechanism 32 is, for example, a linear servo motor or a motor attached to a ball screw. In the example shown in FIG. 1, the interval between the two imaging heads 31 in the X direction can be changed. Note that in the imaging section 3, the number of imaging heads 31 may be one, or may be three or more.

Each imaging head 31 is a camera including an imaging sensor and an optical system (not shown). Each imaging head 31 is, for example, an area camera that captures two-dimensional images. The image sensor includes, for example, elements such as a plurality of CCDs (Charge Coupled Devices) arranged in a matrix. In each imaging head 31, reflected light of illumination light guided from a light source (not shown) to the upper surface 91 of the substrate 9 is guided to an imaging sensor via an optical system. The image sensor receives reflected light from the upper surface 91 of the substrate 9 and acquires an image of a substantially rectangular imaging area. As the light source, various light sources such as LEDs (Light Emitting Diodes) can be used. Note that each imaging head 31 may be another type of camera such as a line camera.

In the drawing apparatus 1, the plurality of imaging heads 31 are moved by the imaging head moving mechanism 32 between a first imaging position above the first transport mechanism 2a and a second imaging position above the second transport mechanism 2b. Ru. In FIG. 1, the plurality of imaging heads 31 are located at the first imaging position. The plurality of imaging heads 31 images the upper surface 91 of the substrate 9 on the first stage 21a at the first imaging position. Further, the plurality of imaging heads 31 images the upper surface 91 of the substrate 9 on the second stage 21b at the second imaging position.

The pattern drawing section 4 includes a plurality of (six in the example shown in FIG. 1) drawing heads 41 and a drawing head moving mechanism 42. The plurality of drawing heads 41 are arranged in the X direction and are movably attached to the beam section of the second gantry section 73. The drawing head moving mechanism 42 is attached to the beam and moves the plurality of drawing heads 41 integrally in the X direction along the beam. The drive source of the drawing head moving mechanism 42 is, for example, a linear servo motor or a motor attached to a ball screw. Note that in the pattern drawing section 4, the number of drawing heads 41 may be one or more.

Each drawing head 41 includes a light source, an optical system, and a spatial light modulation element (not shown). Various devices such as DMD (Digital Micro Mirror Device) and GLV (Grating Light Valve) (registered trademark of Silicon Light Machines, Sunnyvale, California) can be used as spatial light modulators. It is possible. Various light sources such as LD (Laser Diode) can be used as the light source. The plurality of drawing heads 41 have substantially the same structure.

In the drawing device 1, the drawing head moving mechanism 42 moves the plurality of drawing heads 41 between a first drawing position above the first transport mechanism 2a and a second drawing position above the second transport mechanism 2b. Ru. In FIG. 1, the plurality of drawing heads 41 are located at the second drawing position. The plurality of drawing heads 41 draw a pattern on the upper surface 91 of the substrate 9 on the first stage 21a at the first drawing position. Further, the plurality of drawing heads 41 draw a pattern on the upper surface 91 of the substrate 9 on the second stage 21b at the second drawing position.

The first drawing position and the second drawing position are located at substantially the same position in the Y direction as the center portions of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. Moreover, the above-mentioned first imaging position and second imaging position are also located at substantially the same position in the Y direction as the center portions of the first moving mechanism 22a and the second moving mechanism 22b in the Y direction. In other words, the plurality of drawing heads 41 of the pattern drawing section 4 and the plurality of imaging heads 31 of the imaging section 3 are connected to the central part in the Y direction of the first moving mechanism 22a and the second moving mechanism 22b, and located at approximately the same location.

When a pattern is drawn at the first drawing position, modulated (that is, spatially modulated) light is directed from the plurality of drawing heads 41 of the pattern drawing section 4 toward the substrate 9 on the first stage 21a below. is irradiated. Then, in parallel with the irradiation of the light, the substrate 9 is horizontally moved in the Y direction (that is, the substrate movement direction) by the first movement mechanism 22a. Thereby, the irradiation area of the light from the plurality of drawing heads 41 is scanned on the substrate 9 in the Y direction, and a pattern (for example, a circuit pattern) is drawn on the substrate 9. The first moving mechanism 22a is a scanning mechanism that moves the irradiation area of light from each drawing head 41 on the substrate 9 in the Y direction.

In the example shown in FIG. 1, drawing on the substrate 9 is performed by a so-called single pass method. Specifically, the first stage 21a is moved relative to the plurality of drawing heads 41 in the Y direction by the first moving mechanism 22a, and the irradiation area of light from the plurality of drawing heads 41 is adjusted to the upper surface 91 of the substrate 9. It is scanned only once in the Y direction at the top. This completes the drawing on the substrate 9. Note that in the drawing apparatus 1, drawing on the substrate 9 may be performed using a multi-pass method in which movement of the first stage 21a in the Y direction and step movement in the X direction are repeated. The pattern drawing at the second drawing position is the same as the pattern drawing at the first drawing position described above, except that the first stage 21a and the first moving mechanism 22a are changed to the second stage 21b and the second moving mechanism 22b. The same is true.

The drawing device 1 further includes a counterweight 51 and a weight moving mechanism 52. The counterweight 51 is a relatively heavy member, and is attached to the frame 7 to control deformation such as distortion of the frame 7. The counterweight 51 is made of a material with relatively high specific gravity, such as metal. The counterweight 51 is, for example, a substantially rectangular parallelepiped-shaped structure in which a plurality of plate members made of iron are stacked and fixed.

The counterweight 51 is movably attached to the weight support portion 75 of the frame 7. The weight support portion 75 is a substantially prismatic member provided at the (−Y) side end of the base 71 and extending in the X direction. The weight support portion 75 supports, for example, the center portion of the counterweight 51 in the vertical direction. The weight support part 75 is attached to the (-Y) side end of the guide rail 221a of the first moving mechanism 22a and the (-Y) side end of the guide rail 221b of the second moving mechanism 22b. -Y) side. Therefore, the counterweight 51 is arranged adjacent to the (-Y) side with respect to the first moving mechanism 22a and the second moving mechanism 22b.

The weight moving mechanism 52 is attached to the weight support section 75 and horizontally moves the counterweight 51 along the weight support section 75 in the X direction. In the following description, the X direction will also be referred to as the "weight movement direction." The weight movement direction is a direction that intersects the above-mentioned substrate movement direction (ie, Y direction). In the example shown in FIG. 1, the weight movement direction is approximately perpendicular to the substrate movement direction. The driving source of the weight moving mechanism 52 is, for example, a linear servo motor or a motor attached to a ball screw. The structure of the weight moving mechanism 52 may be modified in various ways.

In FIG. 1, the counterweight 51 is located at the center between the first moving mechanism 22a and the second moving mechanism 22b in the X direction (hereinafter also referred to as a "reference position"). The weight moving mechanism 52 moves the counterweight 51 from the reference position in the (-X) direction to position it on the (-Y) side of the first moving mechanism 22a, and also moves the counterweight 51 from the reference position in the (+X) direction. direction to position it on the (-Y) side of the second moving mechanism 22b.

The position of the center of gravity of the counterweight 51 is determined from the viewpoint of reducing the moment applied to the first transport mechanism 2a and the second transport mechanism 2b due to vibrations when the counterweight 51 moves. It is preferable that the distance is not too large in the vertical direction, and it is also preferable that the distance is near the weight support part 75. Specifically, the center of gravity of the counterweight 51 is preferably located below the upper surface of the first stage 21a and the upper surface of the second stage 21b in the vertical direction. Thereby, the above-mentioned moment etc. are reduced, and it is possible to prevent or suppress a decrease in the accuracy of processing for the substrate 9 held by the first stage 21a and the second stage 21b due to vibrations when the counterweight 51 moves. I can do it. Further, it is also possible to suppress vibrations of the counterweight 51 due to vibrations of the frame 7 during movement of the first stage 21a and the second stage 21b. In the example shown in FIG. 1, the center of gravity of the counterweight 51 is located above the center of the base 71 in the vertical direction.

In the example shown in FIG. 1, the upper end of the counterweight 51 (that is, the end surface on the (+Z) side) is located lower than the upper surface of the first stage 21a and the upper surface of the second stage 21b in the vertical direction. Thereby, movement of the substrate 9 can be prevented from being obstructed by the counterweight 51 when the substrate 9 is carried in and out of the first stage 21a and the second stage 21b.

FIG. 2 is a diagram showing the configuration of the computer 100 included in the control unit 10. The computer 100 is a normal computer including a processor 101, a memory 102, an input/output unit 103, and a bus 104. Bus 104 is a signal circuit that connects processor 101, memory 102, and input/output section 103. Memory 102 stores programs and various information. The processor 101 executes various processes (for example, numerical calculations and image processing) using the memory 102 and the like according to programs stored in the memory 102 and the like. The input/output unit 103 includes a keyboard 105 and a mouse 106 that accept input from an operator, and a display 107 that displays output from the processor 101 and the like. Note that the control unit 10 may be a programmable logic controller (PLC), a circuit board, or the like, or may be a combination of these and one or more computers.

FIG. 3 is a block diagram showing the functions of the control unit 10 implemented by the computer 100. In FIG. 3, configurations other than the control unit 10 are also shown. The control unit 10 includes a storage unit 111, an imaging control unit 112, a detection unit 113, a drawing control unit 114, and a weight movement control unit 115. The storage unit 111 is mainly realized by the memory 102 and stores in advance various information such as data of a pattern to be drawn on the substrate 9 (that is, drawing data) and information regarding movement of the counterweight 51.

The imaging control section 112, the detection section 113, the drawing control section 114, and the weight movement control section 115 are mainly realized by the processor 101. The imaging control unit 112 causes the imaging unit 3 to image the upper surface 91 of the substrate 9 on the first stage 21a and the second stage 21b by controlling the imaging unit 3, the first moving mechanism 22a, and the second moving mechanism 22b. to obtain the image. The image is sent to storage unit 111 and stored. The detection unit 113 detects the position of the substrate 9 using the image. The drawing control unit 114 controls the pattern drawing unit 4, the first moving mechanism 22a, and the second By controlling the moving mechanism 22b, the pattern drawing section 4 is caused to draw on the substrate 9 on the first stage 21a and the second stage 21b. As described later, the weight movement control unit 115 controls the weight movement mechanism 52 to adjust the position of the counterweight 51 based on the positions of the first stage 21a and the second stage 21b in the Y direction.

Next, the flow of drawing a pattern on the substrate 9 by the drawing apparatus 1 shown in FIG. 1 will be described. In the drawing apparatus 1, roughly speaking, while drawing is being performed on the substrate 9 held on one of the first stage 21a and the second stage 21b, the substrate 9 is placed on the other stage. It is brought in and undergoes alignment processing, etc. When the drawing on the substrate 9 held on the one stage is completed, the drawing on the substrate 9 held on the other stage is started. Further, while drawing is being performed on the substrate 9 on the other stage, the substrate 9 on which drawing has been performed is carried out from one stage, and a new substrate 9 is carried onto the one stage. Alignment processing etc. are performed.

In the drawing apparatus 1, while the above-described processing is being performed on the substrate 9, the counterweight 51 is also moved by the weight moving mechanism 52 in parallel. This will be done after the explanation regarding FIG. 4B is completed.

4A and 4B are diagrams showing an example of the flow of drawing processing in the drawing device 1. Steps S11 to S19 on the left side in FIGS. 4A and 4B show the flow of the drawing process on the substrate 9 on the first stage 21a, and steps S21 to S29 on the right side in FIGS. 21b shows the flow of drawing processing on the substrate 9 on the substrate 21b. Further, steps located at the same position in the vertical direction in FIGS. 4A and 4B are performed approximately in parallel. Specifically, step S11 and steps S21 to S26 are performed approximately in parallel. Further, step S28 and steps S13 to S18 are performed approximately in parallel.

In FIGS. 4A and 4B, the description starts from a state in which a pattern is drawn on the substrate 9 on the first stage 21a of the first transport mechanism 2a. Furthermore, FIGS. 5 to 10 are conceptual diagrams showing the approximate positions in the Y direction of the first stage 21a and the second stage 21b in the drawing apparatus 1 during drawing processing. In FIGS. 5 to 10, the first stage 21a, the first moving mechanism 22a, the second stage 21b, and the second moving mechanism 22b are drawn with solid lines, and the imaging head 31 and the drawing head 41 are drawn with broken lines. The same applies to FIGS. 11, 13 to 18, and 20 to 28, which will be described later. Further, in FIGS. 11, 13 to 18, and 20 to 28, the counterweight 51 is also drawn as a solid line.

In the following description, regarding the position of the first stage 21a in the Y direction, the position overlapping the imaging head 31 and/or the drawing head 41 in the vertical direction will be referred to as the "processing position", and the (-Y) side of the first moving mechanism 22a will be referred to as the "processing position". The position that overlaps the end of the first moving mechanism 22a in the vertical direction is called the "carry-in/out position", and the position that overlaps the end of the first moving mechanism 22a on the (+Y) side in the vertical direction is called the "standby position". Regarding the position of the second stage 21b in the Y direction, the position overlapping the imaging head 31 and/or the drawing head 41 in the vertical direction is called the "processing position", and the (-Y) side end of the second moving mechanism 22b is referred to as the "processing position". The position vertically overlapping with the (+Y) side end of the second moving mechanism 22b is called the "standby position." Note that the above-mentioned processing position does not refer to a single point in the Y direction, but rather a predetermined range in the Y direction (i.e., where the imaging unit 3 takes an image of the substrate 9 and the pattern drawing unit 4 draws a pattern) processing area).

In the drawing apparatus 1, as shown in FIG. 5, with the first stage 21a located at the processing position and the drawing head 41 located at the first drawing position, a pattern is applied to the substrate 9 on the first stage 21a. A pattern is drawn by the drawing unit 4 (step S11). In step S11, the pattern drawing section 4 and the first moving mechanism 22a are controlled by the drawing control section 114 (see FIG. 3), so that a pattern is drawn on the substrate 9 moving in the (-Y) direction at the processing position. Drawing is done.

Further, in parallel with step S11, the substrate 9 on which drawing has been performed is carried out from the second stage 21b located at the carry-in/out position, and a new substrate 9 is carried onto the second stage 21b and held (step S21, S22). Subsequently, the second stage 21b is moved in the (+Y) direction by the second moving mechanism 22b and positioned at the processing position as shown in FIG. 6 (Step S23). In the state shown in FIG. 6, the first stage 21a remains at the processing position, and drawing is performed on the substrate 9 on the first stage 21a. Further, the imaging head 31 is located at the second imaging position.

When the second stage 21b is located at the processing position, the imaging control unit 112 (see FIG. 3) controls the imaging unit 3 and the second moving mechanism 22b to align the alignment mark (not shown) on the substrate 9 on the second stage 21b. (omitted) is imaged, and the acquired image is sent to the detection unit 113 (see FIG. 3). The detection unit 113 performs pattern matching on the image using the reference image. The pattern matching is performed, for example, by a known pattern matching method (eg, geometric pattern matching, normalized correlation search, etc.). Thereby, the position of the alignment mark in the image is determined, and the position of the substrate 9 on the second stage 21b is detected (step S24).

The position of the substrate 9 detected by the detection unit 113 includes information indicating the coordinates of the substrate 9 in the X and Y directions on the second stage 21b, the orientation of the substrate 9, and deformation of the substrate 9 due to distortion, etc. . Further, the information indicating the deformation of the substrate 9 is information such as the shape of the deformed substrate 9 and the position of the drawing area on the substrate 9. In the detection unit 113, the drawing data for the substrate 9 on the second stage 21b is adjusted (ie, alignment processing) based on the detected position of the substrate 9.

When the imaging of the substrate 9 on the second stage 21b is completed, the second stage 21b is moved in the (+Y) direction by the second moving mechanism 22b and positioned at the standby position as shown in FIG. 7 (step S25). In the state shown in FIG. 7, the first stage 21a remains at the processing position, and drawing is being performed on the substrate 9 on the first stage 21a. The second stage 21b waits at the standby position until the drawing on the substrate 9 on the first stage 21a is completed (step S26).

When the drawing on the substrate 9 on the first stage 21a (step S11) is completed, the first stage 21a is moved in the (-Y) direction by the first moving mechanism 22a and positioned at the loading/unloading position as shown in FIG. (Step S12). Further, in parallel with step S12, the second stage 21b is moved in the (-Y) direction by the second moving mechanism 22b and positioned at the processing position (step S27). Further, the imaging head 31 is moved from the second imaging position to the first imaging position. The drawing head 41 is moved from the first drawing position to the second drawing position. The pattern drawing section 4 and the second moving mechanism 22b are controlled by the drawing control section 114 based on the alignment-processed drawing data, etc., so that the pattern drawing section 4 and the second moving mechanism 22b are controlled by the drawing control section 114, so that the pattern drawing section 4 and the second moving mechanism 22b are moved in the (-Y) direction at the processing position. A pattern is drawn on the substrate 9 on the second stage 21b (step S28).

In the drawing apparatus 1, in parallel with drawing on the substrate 9 on the second stage 21b, the drawn substrate 9 is carried out from the first stage 21a located at the carry-in/out position, and a new substrate 9 is transferred to the first stage. 21a and held there (steps S13, S14). Subsequently, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and positioned at the processing position as shown in FIG. 9 (Step S15). In the state shown in FIG. 9, the second stage 21b remains at the processing position, and drawing is being performed on the substrate 9 on the second stage 21b.

When the first stage 21a is located at the processing position, the imaging control unit 112 controls the imaging unit 3 and the first moving mechanism 22a, so that the alignment mark (not shown) on the substrate 9 on the first stage 21a is aligned with the imaging head. 31 and the acquired image is sent to the detection unit 113. In the detection unit 113, pattern matching is performed on the image in substantially the same manner as step S24, and the position of the substrate 9 on the first stage 21a is detected (step S16). The detection unit 113 adjusts the pattern data to be drawn on the substrate 9 on the first stage 21a (ie, alignment processing) based on the detected position of the substrate 9.

When the imaging of the substrate 9 on the first stage 21a is completed, the first stage 21a is moved in the (+Y) direction by the first moving mechanism 22a and is located at the standby position as shown in FIG. 10 (step S17). In the state shown in FIG. 10, the second stage 21b remains at the processing position, and drawing is being performed on the substrate 9 on the second stage 21b. The first stage 21a waits at the standby position until the drawing on the substrate 9 on the second stage 21b is completed (step S18).

When the drawing on the substrate 9 on the second stage 21b (step S28) is completed, the second stage 21b is moved in the (-Y) direction by the second moving mechanism 22b, and is moved to the loading/unloading position as shown in FIG. (Step S29). Further, in parallel with step S29, the first stage 21a is moved in the (-Y) direction by the first moving mechanism 22a and positioned at the processing position (step S19). Further, the imaging head 31 is moved from the first imaging position to the second imaging position. The drawing head 41 is moved from the second drawing position to the first drawing position.

Then, the process returns from step S19 to step S11, and the pattern drawing section 4 and the first moving mechanism 22a are controlled by the drawing control section 114 based on the alignment-processed drawing data, etc. at the processing position (-Y ) A pattern is drawn on the substrate 9 on the first stage 21a that moves in the direction (step S11). Further, the process returns from step S29 to step S21, and the drawn substrate 9 is carried out from the second stage 21b located at the carry-in/out position, and a new substrate 9 is carried onto the second stage 21b and held (step S21 , S22). In the drawing apparatus 1, steps S11 to S19 and steps S21 to S29 are repeated, and drawing is sequentially performed on the plurality of substrates 9.

As described above, in the drawing apparatus 1 shown in FIG. The weight movement mechanism 52 is controlled by the weight movement control unit 115 (see FIG. 3) based on the position of the counterweight 21b in the Y direction (i.e., the substrate movement direction), so that the counterweight 51 is moved in the X direction (i.e., the substrate movement direction). direction) is adjusted. This suppresses deformation of the frame 7 due to the weight of the first stage 21a and the second stage 21b.

A specific example of position adjustment of the counterweight 51 will be described below. In the following example, the counterweight 51 will be described as being located at one of five positions indicated by a solid line and a two-dot chain line in FIG. The position of the counterweight 51 indicated by the solid line in FIG. 11 is the above-mentioned reference position (that is, the center between the first moving mechanism 22a and the second moving mechanism 22b in the X direction). In the following explanation, among the above five positions, the position adjacent to the (-X) side of the reference position will be referred to as the "first position", and the position adjacent to the (-X) side of the first position will be referred to as the "second position". It is called "position". Furthermore, among the five positions described above, the position adjacent to the (+X) side of the reference position is referred to as the "third position", and the position adjacent to the (+X) side of the third position is referred to as the "fourth position".

The first position is a position closer to the first moving mechanism 22a than the reference position in the X direction, and the second position is a position closer to the first moving mechanism 22a than the first position in the X direction. The second position is the farthest position from the second moving mechanism 22b in the X direction. Further, the third position is a position closer to the second moving mechanism 22b than the reference position in the X direction, and the fourth position is a position closer to the second moving mechanism 22b than the third position in the X direction. The fourth position is the farthest position from the first moving mechanism 22a in the X direction.

In the example shown in FIG. 11, the second position is the (-X) side end of the movable range of the counterweight 51 by the weight moving mechanism 52. The first position is a central position in the X direction between the second position and the reference position. Further, the fourth position is the end on the (+X) side in the movable range of the counterweight 51 by the weight moving mechanism 52. The third position is a central position in the X direction between the fourth position and the reference position.

FIG. 12 is a diagram showing a first example of the flow of adjusting the position of the counterweight 51. As shown in FIG. In the first example, when drawing is being performed on the substrate 9 on one of the first stage 21a and the second stage 21b, the counterweight 51 is adjusted based on the position of the other stage. The position is adjusted. For example, in a state where drawing is being performed on the substrate 9 on the first stage 21a and the second stage 21b is located at the loading/unloading position (corresponding to step S11, steps S21 to S22, and FIG. 5), The counterweight 51 is located at the second position as shown in FIG. 13 (step S31).

Further, in a state where drawing is being performed on the substrate 9 on the first stage 21a and the second stage 21b is located at the processing position (corresponding to step S11, step S24 and FIG. 6), the counterweight 51 is located at the first position as shown in FIG. 14 (step S32). Then, in a state where drawing is being performed on the substrate 9 on the first stage 21a and the second stage 21b is located at the standby position (corresponding to step S11, step S26 and FIG. 7), the counterweight 51 is located at the reference position as shown in FIG. 15 (step S33).

As shown in FIG. 13 above, when the second stage 21b is located at the loading/unloading position where the frame 7 has low rigidity, the weight of the second stage 21b causes the (+X) side and (-Y) side of the frame 7 to Deformation (i.e., distortion) may occur in the frame 7 such that the portion sinks downward. Therefore, as in step S31, by positioning the counterweight 51 to the second position closest to (-X), the deformation moment applied to the frame 7 from the second stage 21b (i.e., The deformation of the frame 7 is prevented or suppressed by canceling out or partially canceling out (a moment that twists and deforms the frame 7 about an axis extending in the Y direction at the center of the second moving mechanism 22b).

Further, as shown in FIG. 14, when the second stage 21b is located at the processing position where the rigidity of the frame 7 is higher than the loading/unloading position, the amount of deformation of the frame 7 due to the weight of the second stage 21b is as shown in FIG. smaller than Therefore, as in step S32, by positioning the counterweight 51 to the first position closer to the reference position than the second position, the deformation moment applied to the frame 7 from the second stage 21b is offset, or The deformation of the frame 7 is prevented or suppressed by partially canceling out the deformation of the frame 7.

Furthermore, as shown in FIG. 15, when the second stage 21b is located at the standby position where the rigidity of the frame 7 is higher than the processing position, the frame 7 is hardly deformed by the weight of the second stage 21b. Therefore, by positioning the counterweight 51 to the reference position as in step S33, deformation of the frame 7 due to the weight of the counterweight 51 is prevented.

In the drawing apparatus 1, when the first stage 21a is located at the processing position and drawing is being performed on the substrate 9 on the first stage 21a (step S11), the position of the counterweight 51 in steps S31 to S33 is Adjustments are made to prevent or suppress deformation of the frame 7. As a result, it is possible to prevent or suppress the deformation of the frame 7 from having an adverse effect on the drawing on the substrate 9 on the first stage 21a, and it is possible to perform the drawing on the substrate 9 with high precision.

On the other hand, in a state where drawing is being performed on the substrate 9 on the second stage 21b and the first stage 21a is located at the loading/unloading position (corresponding to steps S13, S14, step S28 and FIG. 8), The counterweight 51 is located at the fourth position as shown in FIG. 16 (step S34). Further, in a state where drawing is being performed on the substrate 9 on the second stage 21b and the first stage 21a is located at the processing position (corresponding to step S16, step S28 and FIG. 9), the counterweight 51 is located at the third position as shown in FIG. 17 (step S35). Then, in a state where drawing is being performed on the substrate 9 on the second stage 21b and the first stage 21a is located at the standby position (corresponding to step S18, step S28 and FIG. 10), the counterweight 51 is located at the reference position as shown in FIG. 18 (step S36).

As shown in the above step diagram 16, when the first stage 21a is located at the loading/unloading position where the frame 7 has low rigidity, the weight of the first stage 21a causes the frame 7 to move on the (-X) side and (-Y) side. There is a possibility that the frame 7 is deformed (that is, distorted) so that the side portions sink downward. Therefore, as in step S34, by positioning the counterweight 51 to the fourth position closest to (+X), the deformation moment imparted to the frame 7 from the first stage 21a can be offset or partially to prevent or suppress deformation of the frame 7.

Further, as shown in FIG. 17, when the first stage 21a is located at the processing position where the rigidity of the frame 7 is higher than the loading/unloading position, the amount of deformation of the frame 7 due to the weight of the first stage 21a is as shown in FIG. smaller than Therefore, as in step S35, by positioning the counterweight 51 to a third position closer to the reference position than the fourth position, the deformation moment applied to the frame 7 from the first stage 21a is offset, or The deformation of the frame 7 is prevented or suppressed by partially canceling out the deformation of the frame 7.

Furthermore, as shown in FIG. 18, when the first stage 21a is located at the standby position where the rigidity of the frame 7 is higher than the processing position, the frame 7 is hardly deformed by the weight of the first stage 21a. Therefore, by positioning the counterweight 51 at the reference position as in step S36, deformation of the frame 7 due to the weight of the counterweight 51 is prevented.

In the drawing apparatus 1, when the second stage 21b is located at the processing position and drawing is being performed on the substrate 9 on the second stage 21b (step S28), the position of the counterweight 51 in steps S34 to S36 is Adjustments are made to prevent or suppress deformation of the frame 7. As a result, it is possible to prevent or suppress the deformation of the frame 7 from having an adverse effect on the drawing on the substrate 9 on the second stage 21b, and it is possible to perform the drawing on the substrate 9 with high precision.

FIG. 19 is a diagram showing a second example of the flow of adjusting the position of the counterweight 51. In the second example, the position of the counterweight 51 is adjusted based on the difference in the positions of the first stage 21a and the second stage 21b in the Y direction. For example, a state in which the first stage 21a is located at the processing position and the second stage 21b is located at the loading/unloading position on the (-Y) side of the first stage 21a (corresponding to step S11, steps S21 to S22, and FIG. 5). ), the counterweight 51 is located at the first position as shown in FIG. 20 (step S41). Further, when the first stage 21a and the second stage 21b are located at the processing position (corresponding to step S11, step S24 and FIG. 6), the counterweight 51 is located at the reference position as shown in FIG. S42).

Subsequently, in a state in which the first stage 21a is located at the processing position and the second stage 21b is located at the standby position on the (+Y) side of the first stage 21a (corresponding to step S11, step S26, and FIG. 7), The counterweight 51 is located at the third position as shown in FIG. 22 (step S43). In addition, the first stage 21a is located at the loading/unloading position, and the second stage 21b is located at the processing position on the (+Y) side of the first stage 21a (corresponding to steps S13 to S14, step S28, and FIG. 8). In this case, the counterweight 51 does not move from the third position as shown in FIG. 23.

Next, in a state where the first stage 21a and the second stage 21b are located at the processing position (corresponding to step S16, step S28 and FIG. 9), the counterweight 51 is located at the reference position as shown in FIG. Step S44). Then, in a state where the first stage 21a is located at the standby position and the second stage 21b is located at the processing position on the (-Y) side of the first stage 21a (corresponding to step S18, step S28 and FIG. 10), The counterweight 51 is located at the first position as shown in FIG. 25 (step S45).

As shown in FIG. 20 above, when the second stage 21b is located on the side where the rigidity of the frame 7 is lower (-Y) with respect to the first stage 21a, the deformation moment applied to the frame 7 from the first stage 21a Due to the difference between the deformation moment and the deformation moment applied to the frame 7 from the second stage 21b, the frame 7 is deformed (that is, distorted) so that the (+X) side and (-Y) side parts of the frame 7 sink downward. may occur. Therefore, as in step S41, by positioning the counterweight 51 to the first position on the (-X) side from the reference position, the difference in the deformation moment is offset or partially canceled out, and the frame 7 prevent or suppress deformation of The same applies to FIG. 25 as well.

Further, as shown in FIG. 21, when the first stage 21a and the second stage 21b are located at substantially the same position in the Y direction, there is almost no difference in the deformation moments, so the frame 7 hardly deforms. Therefore, by positioning the counterweight 51 to the reference position as in step S42, deformation of the frame 7 due to the weight of the counterweight 51 is prevented. The same applies to FIG. 24.

Furthermore, as shown in FIGS. 22 and 23, when the first stage 21a is located on the lower (-Y) side of the frame 7 with respect to the second stage 21b, the difference in the deformation moment causes the frame 7 to There is a possibility that the frame 7 is deformed (that is, distorted) so that the parts on the (-X) side and the (-Y) side sink downward. Therefore, as in step S43, by positioning the counterweight 51 to a third position on the (+X) side of the reference position, the difference in the deformation moment is offset or partially canceled out, and the frame 7 is Prevent or suppress deformation.

Note that in the second example of adjusting the position of the counterweight 51, the position of the counterweight 51 in steps S41 and S45 may be the second position. Further, the position of the counterweight 51 in step S43 may be a fourth position.

As described above, the drawing apparatus 1 that performs drawing on the substrate 9 includes the pattern drawing section 4, the first substrate holding section (i.e., the first stage 21a), the first moving mechanism 22a, and the second substrate holding section. (ie, the second stage 21b), a second moving mechanism 22b, a frame 7, a counterweight 51, a weight moving mechanism 52, and a weight moving control section 115. The pattern drawing unit 4 draws a pattern by irradiating light onto the upper main surface (ie, the upper surface 91) of the substrate 9 that moves horizontally below. The first moving mechanism 22a horizontally moves the first stage 21a below the pattern drawing section 4 in the substrate moving direction (in the above example, the Y direction). The second stage 21b is arranged adjacent to the first stage 21a. The second moving mechanism 22b horizontally moves the second stage 21b below the pattern drawing section 4 in the substrate moving direction. The second moving mechanism 22b is arranged in line with the first moving mechanism 22a in a direction intersecting the substrate moving direction (in the above example, the X direction).

The frame 7 supports the first moving mechanism 22a and the second moving mechanism 22b. The counterweight 51 is attached to the frame 7 so as to be movable in a weight movement direction (in the above example, the X direction) intersecting the substrate movement direction. The weight moving mechanism 52 moves the counterweight 51 in the weight moving direction. The weight movement control unit 115 moves the counterweight 51 to a position where deformation of the frame 7 due to the weight of the first stage 21a and the second stage 21b is suppressed based on the positions of the first stage 21a and the second stage 21b in the substrate movement direction. The weight moving mechanism 52 is controlled so that the weight is placed. Thereby, it is possible to suppress the deformation of the frame 7 from having an adverse effect on the drawing on the substrate 9, and it is possible to perform the drawing on the substrate 9 with high precision.

As mentioned above, the direction of weight movement is preferably perpendicular to the direction of substrate movement. As a result, when applying a predetermined deformation moment from the counterweight 51 to the frame 7, the movement distance of the counterweight 51 from the reference position is reduced compared to when the weight movement direction is obliquely inclined with respect to the substrate movement direction. Can be made smaller. As a result, the structure of the drawing apparatus 1 can be simplified and the enlargement of the drawing apparatus 1 can be suppressed.

As described above, the center of gravity of the counterweight 51 is preferably located below the upper surface of the first stage 21a and the upper surface of the second stage 21b in the up-down direction (that is, the Z direction). Thereby, vibration of the frame 7, the first stage 21a, and the second stage 21b due to the movement of the counterweight 51 can be suppressed. As a result, the accuracy of drawing on the substrate 9 can be improved.

As described above, the upper end of the counterweight 51 is preferably located below the upper surface of the first stage 21a and the upper surface of the second stage 21b in the vertical direction. Thereby, it is possible to prevent the counterweight 51 from obstructing the loading and unloading of the substrate 9 to and from the first stage 21a and the second stage 21b.

In the drawing apparatus 1 described above, the frame 7 includes a gantry section 74 that straddles the first moving mechanism 22a and the second moving mechanism 22b and supports the pattern drawing section 4. The gantry section 74 extends from above the center portions of the first moving mechanism 22a and the second moving mechanism 22b in the substrate moving direction to one side (in the above example, the (+Y) side) in the substrate moving direction. The first moving mechanism 22a and the second moving mechanism 22b protrude from the gantry section 74 to the other side (the (-Y) side in the above example) in the substrate moving direction. The counterweight 51 is preferably arranged adjacent to the other side of the substrate moving direction with respect to the first moving mechanism 22a and the second moving mechanism 22b. In this way, the relative position of the counterweight 51 with respect to the first moving mechanism 22a and the second moving mechanism 22b is set to the (-Y) side where the rigidity of the frame 7 is likely to be lower than other parts (i.e., when the substrate is moved). (the other side of the direction), when the first stage 21a or the second stage 21b moves to the (-Y) side and the deformation of the frame 7 increases, the deformation can be efficiently suppressed. can.

In the above-described drawing apparatus 1, the rigidity of the frame 7 is determined at the ends of the first moving mechanism 22a and the second moving mechanism 22b on one side ((+Y) side in the above example) in the substrate moving direction, the center portion, and The height is lower in the order of the end on the other side (in the above example, the (-Y) side). The counterweight 51 is arranged adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the other side in the substrate moving direction.

In a first example of adjusting the position of the counterweight 51 (see FIGS. 12 to 18), in a state where the first stage 21a is located at a position where the pattern drawing section 4 performs drawing, the second stage 21b is located at the one end in the substrate moving direction (in the above example, the standby position), the counterweight 51 moves between the first moving mechanism 22a and the second moving mechanism 22a in the weight moving direction (in the above example, the X direction). When the second stage 21b is located at the reference position in the center of the moving mechanism 22b and the second stage 21b is located at the center in the substrate moving direction (in the above example, the processing position), the counterweight 51 is moved closer to the first moving mechanism than the reference position. 22a, and when the second stage 21b is located at the other end in the substrate movement direction (in the above example, the loading/unloading position), the counterweight 51 is positioned closer to the first position than the first position. 1 is located at a second position closer to the moving mechanism 22a. Thereby, while drawing is being performed on the substrate 9 on the first stage 21a, deformation of the frame 7 can be suppressed regardless of the position of the second stage 21b in the substrate movement direction. As a result, drawing can be performed accurately on the substrate 9 on the first stage 21a.

Further, in the first example, in a state where the second stage 21b is located at a position where the pattern drawing section 4 performs drawing, the first stage 21a is located at the one end (the above) in the substrate movement direction. In the example, when the counterweight 51 is located at the reference position (standby position), the counterweight 51 is located at the reference position, and when the first stage 21a is located at the center in the substrate movement direction (the processing position in the example above), the counterweight 51 is located at the reference position. 51 is located at a third position closer to the second moving mechanism 22b than the reference position, and when the first stage 21a is located at the other end in the substrate moving direction (in the above example, the loading/unloading position), The counterweight 51 is located at a fourth position closer to the second moving mechanism 22b than the third position. Thereby, while drawing is being performed on the substrate 9 on the second stage 21b, deformation of the frame 7 can be suppressed regardless of the position of the first stage 21a in the substrate movement direction. As a result, drawing can be performed accurately on the substrate 9 on the second stage 21b.

As described above, the rigidity of the frame 7 is determined at the ends of the first moving mechanism 22a and the second moving mechanism 22b on one side (the (+Y) side in the above example) in the substrate moving direction, the center portion, and the other side. (In the above example, the (-Y) side) is the lowest end. The counterweight 51 is arranged adjacent to the first moving mechanism 22a and the second moving mechanism 22b on the other side in the substrate moving direction.

In a second example of adjusting the position of the counterweight 51 (see FIGS. 19 to 25), when the first stage 21a and the second stage 21b are located at the same position in the substrate movement direction, the counterweight 51 is The second stage 21b is located at the center reference position of the first moving mechanism 22a and the second moving mechanism 22b in the moving direction (X direction in the above example), and the second stage 21b is located on the other side in the substrate moving direction than the first stage 21a. , the counterweight 51 is located at a position closer to the first moving mechanism 22a than the reference position (in the above example, the first position), and the second stage 21b is located at a position closer to the substrate moving direction than the first stage 21a. When located on the one side, the counterweight 51 is located at a position closer to the second moving mechanism 22b than the reference position (in the above example, the third position). Thereby, deformation of the frame 7 due to the difference in position between the first stage 21a and the second stage 21b in the substrate movement direction can be suppressed. As a result, various processes (for example, carrying in and out of the substrate 9, alignment processing, and drawing processing) can be performed with high precision on the substrate 9 on the first stage 21a and the substrate 9 on the second stage 21b.

As described above, the pattern drawing section 4 preferably includes the drawing head 41 and the drawing head moving mechanism 42. The drawing head 41 emits light downward. The drawing head moving mechanism 42 moves the drawing head 41 between a first drawing position above the first moving mechanism 22a and a second drawing position above the second moving mechanism 22b. In this way, by performing drawing on the substrate 9 on the first stage 21a and drawing on the substrate 9 on the second stage 21b using the common drawing head 41, the structure of the drawing apparatus 1 can be simplified and the drawing apparatus 1 can be made smaller.

Various modifications can be made to the above-described drawing device 1.

For example, the upper end of the counterweight 51 may be located above the upper surface of the first stage 21a and the upper surface of the second stage 21b, or at the same position in the vertical direction. Further, the center of gravity of the counterweight 51 may also be located above the upper surface of the first stage 21a and the upper surface of the second stage 21b, or at the same position in the vertical direction.

In the drawing device 1, the counterweight 51 does not necessarily need to be placed adjacent to the (-Y) side of the first moving mechanism 22a and the second moving mechanism 22b, and may be placed in various other positions. good. For example, the counterweight 51 may be arranged vertically below the (-Y) side ends of the first moving mechanism 22a and the second moving mechanism 22b. In this case, the foot stamp of the drawing device 1 can be downsized.

In the drawing apparatus 1, the arrangement of the gantry section 74 (that is, the first gantry section 72 and the second gantry section 73) that supports the imaging section 3 and the pattern drawing section 4 is not limited to the example shown in FIG. May be changed to . For example, the first moving mechanism 22a and the second moving mechanism 22b do not necessarily need to protrude from the gantry section 74 toward the (-Y) side. Further, the first gantry section 72 and the second gantry section 73 may be a continuous member. The imaging section 3 and the pattern drawing section 4 may be supported by a structure other than the gantry section 74.

The rigidity of the frame 7 in the substrate movement direction does not necessarily have to be lowered in the order of the (+Y) end, the center, and the (-Y) end, and may be varied in various ways. Further, the frame 7 may have a structure in which it is supported from below, for example, at three points. If the number of parts that support the frame 7 from below is reduced, the frame 7 is more likely to deform. However, by controlling the deformation of the frame 7 by adjusting the position of the counterweight 51, even if the frame 7 is supported at limited locations (for example, three points), the substrate 9 on the first stage 21a and , various processes (for example, loading/unloading of the substrate 9, alignment process, and drawing process) on the substrate 9 on the second stage 21b can be performed with high accuracy.

If the second position, first position, reference position, third position, and fourth position of the counterweight 51 are arranged in this order in the weight movement direction, the specific positions on the weight support part 75 may vary. May be changed.

In a second example of adjusting the position of the counterweight 51 shown in FIG. 19, when the first stage 21a is located at the standby position and the second stage 21b is located at the loading/unloading position, the counterweight 51 is placed at the second position. may be done. Furthermore, when the first stage 21a is located at the loading/unloading position and the second stage 21b is located at the standby position, the counterweight 51 may be located at the fourth position.

The position adjustment of the counterweight 51 may be performed in a manner other than the first and second examples described above. Moreover, the counterweight 51 may be arranged at positions other than the reference position, the first position, the second position, the third position, and the fourth position.

The counterweight 51 does not necessarily need to be made of metal, nor does it need to be a single structure. For example, the counterweight 51 may include two or more weight elements. In the example shown in FIG. 26, the counterweight 51 includes two weight elements 53 that are movable independently of each other. For example, in a state where the first stage 21a is located at the processing position and the second stage 21b is located at the loading/unloading position, two weight elements 53 is located at the second position. Further, as in FIG. 14 described above, when the first stage 21a and the second stage 21b are located at the processing position, one weight element 53 is located at the reference position and the other weight element 53 is located at the reference position, as shown in FIG. Element 53 is located in the second position. Similarly to FIG. 15 described above, when the first stage 21a is located at the processing position and the second stage 21b is located at the standby position, the two weight elements 53 are at the reference position as shown in FIG. To position.

Also in the example shown in FIG. 29, the counterweight 51 includes two weight elements 53 that are movable independently of each other. One of the two weight elements 53 shown in FIG. 29 (that is, the (-X) side weight element 53) is moved between the reference position and the second position based on the position of the second stage 21b in the Y direction. Move between. The other weight element 53 (that is, the weight element 53 on the (+X) side) moves between the reference position and the fourth position based on the position of the first stage 21a in the Y direction. For example, in a state where the first stage 21a is located at the processing position and the second stage 21b is located at the loading/unloading position, as in FIG. The side weight element 53 is located at the second position, and the (+X) side weight element 53 is located at the third position. Further, similarly to FIG. 14 described above, when the first stage 21a and the second stage 21b are located at the processing position, the weight element 53 on the (-X) side is located at the first position, as shown in FIG. However, the weight element 53 on the (+X) side is located at the third position. Similarly to FIG. 15 described above, when the first stage 21a is located at the processing position and the second stage 21b is located at the standby position, as shown in FIG. is located at the reference position, and the weight element 53 on the (+X) side is located at the third position.

In the drawing apparatus 1, the direction of weight movement is not necessarily perpendicular to the direction of substrate movement, and may be changed in various ways. For example, the weight support portion 75 may not have a substantially linear shape extending in the X direction, but may have a substantially arc shape extending in the X direction while convexly curving toward the (+Y) side or the (-Y) side in plan view. . Alternatively, the first moving mechanism 22a and the second moving mechanism 22b are arranged so that the two linear weight support parts 75 intersect in an X-shape at the center of the first moving mechanism 22a and the second moving mechanism 22b in the X direction in a plan view. The above-mentioned weight elements 53 may be disposed below the second moving mechanism 22b and movably attached to each weight support section 75.

In the drawing apparatus 1, the first conveyance mechanism 2a includes a movement mechanism that moves the first stage 21a in the X direction, a rotation mechanism that rotates the first stage 21a around a rotation axis extending in the Z direction, and a first stage 21a. The device may further include one or more lifting mechanisms for moving the device in the Z direction. For example, a linear servo motor can be used as the moving mechanism and the lifting mechanism. Further, as the rotation mechanism, for example, a servo motor can be used. The structures of the moving mechanism, rotation mechanism, and lifting mechanism may be modified in various ways. The second transport mechanism 2b is also similar to the first transport mechanism 2a.

The pattern drawing section 4 includes a drawing head 41 that irradiates light onto the substrate 9 on the first stage 21a at the first drawing position, and a drawing head 41 that irradiates light onto the substrate 9 on the second stage 21b at the second drawing position. and may be provided separately. In this case, the drawing head moving mechanism 42 may be omitted.

In addition to the first conveyance mechanism 2a and the second conveyance mechanism 2b, the drawing apparatus 1 is provided with a third stage and a third movement mechanism that moves the third stage in the Y direction. 21b and the substrate 9 on the third stage, various processes (alignment process, drawing process, and loading/unloading of the substrate 9) may be performed in parallel.

FIG. 32 is a side view of another preferred drawing apparatus 1a according to the present invention, viewed from the (-Y) side. In FIG. 32, illustration of the counterweight 51, the imaging head 31, the first gantry section 72, etc. is omitted.

In the drawing apparatus 1a, a first stage 21a and a second stage 21b are arranged adjacent to each other in the vertical direction. In the example shown in FIG. 32, the second stage 21b is spaced apart below the first stage 21a. The first moving mechanism 22a supports the first stage 21a from the side (ie, the (-X) side). The second moving mechanism 22b supports the second stage 21b from the side (that is, the (+X) side).

The first transport mechanism 2a includes a first elevating mechanism (not shown) that moves the first stage 21a in the vertical direction. The second transport mechanism 2b includes a second elevating mechanism (not shown) that moves the second stage 21b in the vertical direction. After drawing is performed on the substrate 9 on the first stage 21a by the plurality of drawing heads 41 supported by the second gantry section 73, when drawing is performed on the substrate 9 on the second stage 21b, the drawing is performed on the substrate 9 on the second stage 21b. From the state shown in 32, the first stage 21a is lowered to the position of the second stage 21b in the figure, and the second stage 21b is raised to the position of the first stage 21a in the figure. The other configuration of the drawing device 1a is substantially the same as the corresponding structure of the drawing device 1.

The first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in a direction intersecting the substrate moving direction (ie, the Y direction), substantially similar to the above-described drawing apparatus 1. In the example shown in FIG. 32, the first moving mechanism 22a and the second moving mechanism 22b are arranged side by side in the X direction, and the second moving mechanism 22b is adjacent to the (+X) side of the first moving mechanism 22a. do. The first moving mechanism 22a and the second moving mechanism 22b are located at substantially the same height in the vertical direction.

In the drawing apparatus 1a, similarly to the drawing apparatus 1, the weight movement control unit 115 (see FIG. 3) performs the following operations based on the positions of the first stage 21a and the second stage 21b in the substrate movement direction (that is, the Y direction). The weight moving mechanism 52 is controlled so that the counterweight 51 (see FIG. 1) is placed at a position that suppresses deformation of the frame 7 due to the weight of the first stage 21a and the second stage 21b. Thereby, it is possible to suppress the deformation of the frame 7 from having an adverse effect on the drawing on the substrate 9, and it is possible to perform the drawing on the substrate 9 with high precision.

The above-mentioned board 9 is not necessarily limited to a printed circuit board. The drawing devices 1 and 1a detect the positions of, for example, semiconductor substrates, glass substrates for flat panel display devices such as liquid crystal display devices and organic EL display devices, glass substrates for photomasks, substrates for solar cell panels, etc. It's okay to be hurt.

The configurations of the above embodiment and each modification may be combined as appropriate unless mutually contradictory.

1, 1a Drawing device 4 Pattern drawing section 7 Frame 9 Substrate 21a First stage 21b Second stage 22a First moving mechanism 22b Second moving mechanism 41 Drawing head 42 Drawing head moving mechanism 51 Counterweight 52 Weight moving mechanism 74 Gantry section 91 Top surface 115 Weight movement control section S11 to S19, S21 to S29, S31 to S36, S41 to S45 Steps

Claims (8)

A drawing device that performs drawing on a substrate,
a pattern drawing unit that draws a pattern by irradiating light onto the upper main surface of the substrate that moves horizontally below;
a first substrate holding section;
a first moving mechanism that horizontally moves the first substrate holding section in the substrate movement direction below the pattern drawing section;
a second substrate holder disposed adjacent to the first substrate holder;
a second moving mechanism arranged in parallel with the first moving mechanism in a direction intersecting the substrate moving direction, and horizontally moving the second substrate holding section in the substrate moving direction below the pattern drawing section;
a frame that supports the first moving mechanism and the second moving mechanism;
a counterweight attached to the frame so as to be movable in a weight movement direction intersecting the substrate movement direction;
a weight moving mechanism that moves the counterweight in the weight moving direction;
Based on the positions of the first substrate holder and the second substrate holder in the substrate movement direction, the frame is positioned at a position that suppresses deformation of the frame due to the weight of the first substrate holder and the second substrate holder. a weight movement control section that controls the weight movement mechanism so that the counterweight is arranged;
A drawing device comprising: The drawing device according to claim 1,
A drawing apparatus characterized in that the weight moving direction is perpendicular to the substrate moving direction. The drawing device according to claim 1 or 2,
A drawing apparatus characterized in that a center of gravity of the counterweight is located below, in the vertical direction, an upper surface of the first substrate holder and an upper surface of the second substrate holder. The drawing device according to claim 3,
The drawing apparatus characterized in that an upper end of the counterweight is located lower than the upper surface of the first substrate holder and the upper surface of the second substrate holder in the vertical direction. A drawing device according to any one of claims 1 to 4,
The frame includes a gantry section that straddles the first moving mechanism and the second moving mechanism and supports the pattern drawing section,
The gantry section extends from above the center portions of the first moving mechanism and the second moving mechanism in the substrate moving direction to one side in the substrate moving direction,
The first moving mechanism and the second moving mechanism protrude from the gantry section to the other side in the substrate moving direction,
The drawing apparatus is characterized in that the counterweight is disposed adjacent to the first moving mechanism and the second moving mechanism on the other side in the substrate moving direction. A drawing device according to any one of claims 1 to 5,
The rigidity of the frame is lower in the order of one end, the center, and the other end of the first moving mechanism and the second moving mechanism in the substrate moving direction,
The counterweight is arranged adjacent to the other side of the substrate moving direction with respect to the first moving mechanism and the second moving mechanism,
When the first substrate holding section is located at a position where drawing is performed by the pattern drawing section, and the second substrate holding section is located at the one end in the substrate movement direction, The counterweight is located at a reference position in the center of the first moving mechanism and the second moving mechanism in the weight moving direction, and when the second substrate holder is located at the center in the substrate moving direction, , the counterweight is located at a first position closer to the first moving mechanism than the reference position, and when the second substrate holder is located at the other end in the substrate moving direction, the counterweight The weight is located at a second position closer to the first moving mechanism than the first position,
When the second substrate holding section is located at a position where drawing is performed by the pattern drawing section and the first substrate holding section is located at the one end in the substrate movement direction, The counterweight is located at the reference position, and when the first substrate holder is located at the center in the substrate movement direction, the counterweight is located at the third position closer to the second moving mechanism than the reference position. position, and when the first substrate holder is located at the other end in the substrate movement direction, the counterweight is located at a fourth position closer to the second moving mechanism than the third position. A drawing device characterized in that: A drawing device according to any one of claims 1 to 5,
The rigidity of the frame is lower in the order of one end, the center, and the other end of the first moving mechanism and the second moving mechanism in the substrate moving direction,
The counterweight is arranged adjacent to the other side of the substrate moving direction with respect to the first moving mechanism and the second moving mechanism,
When the first substrate holder and the second substrate holder are located at the same position in the substrate movement direction, the counterweight is located at the center of the first movement mechanism and the second movement mechanism in the weight movement direction. located at the reference position of
When the second substrate holder is located on the other side in the substrate movement direction than the first substrate holder, the counterweight is located closer to the first moving mechanism than the reference position,
When the second substrate holder is located on the one side in the substrate movement direction than the first substrate holder, the counterweight is located closer to the second moving mechanism than the reference position. A drawing device featuring: The drawing device according to any one of claims 1 to 7,
The pattern drawing section is
A drawing head that emits light downward;
a drawing head moving mechanism that moves the drawing head between a first drawing position above the first moving mechanism and a second drawing position above the second moving mechanism;
A drawing device comprising:

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