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JP7476712B2 - Method for manufacturing seal structure, and seal structure - Google Patents
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JP7476712B2 - Method for manufacturing seal structure, and seal structure - Google Patents

Method for manufacturing seal structure, and seal structure Download PDF

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JP7476712B2
JP7476712B2 JP2020132009A JP2020132009A JP7476712B2 JP 7476712 B2 JP7476712 B2 JP 7476712B2 JP 2020132009 A JP2020132009 A JP 2020132009A JP 2020132009 A JP2020132009 A JP 2020132009A JP 7476712 B2 JP7476712 B2 JP 7476712B2
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coating
raw material
seal structure
material liquid
coated
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JP2022028540A (en
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史朗 谷井
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AGC Inc
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Asahi Glass Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1254Sol or sol-gel processing
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125Process of deposition of the inorganic material
    • C23C18/1258Spray pyrolysis
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16JPISTONS; CYLINDERS; SEALINGS
    • F16J15/00Sealings
    • F16J15/02Sealings between relatively-stationary surfaces
    • F16J15/06Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
    • F16J15/10Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing
    • F16J15/104Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing characterised by structure
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16JPISTONS; CYLINDERS; SEALINGS
    • F16J15/00Sealings
    • F16J15/02Sealings between relatively-stationary surfaces
    • F16J15/06Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
    • F16J15/10Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with non-metallic packing
    • F16J15/108Special methods for making a non-metallic packing
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D1/00Casings; Linings; Walls; Roofs
    • F27D1/16Making or repairing linings ; Increasing the durability of linings; Breaking away linings
    • F27D1/1636Repairing linings by projecting or spraying refractory materials on the lining
    • F27D1/1642Repairing linings by projecting or spraying refractory materials on the lining using a gunning apparatus
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/10Reduction of greenhouse gas [GHG] emissions
    • Y02P10/143Reduction of greenhouse gas [GHG] emissions of methane [CH4]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Gasket Seals (AREA)
  • Sealing Material Composition (AREA)

Description

本発明は、シール構造体の製造方法、およびシール構造体に関する。 The present invention relates to a method for manufacturing a seal structure and a seal structure.

高温雰囲気炉のような、雰囲気制御が可能な内部空間を有する高温装置は、各種分野において、幅広く使用されている。 High-temperature equipment with an internal space that allows for atmospheric control, such as high-temperature atmospheric furnaces, are widely used in a variety of fields.

そのような高温装置において、該高温装置の使用中に、内部空間と外界とをシールするシール部材のシール性が低下することがある。また、その場合、しばしば、高温装置を高温状態に維持したままで、シール部材に対して補修を実施する必要が生じ得る。 In such high-temperature equipment, the sealing ability of the sealing members that seal the internal space from the outside world may deteriorate during use of the high-temperature equipment. In such cases, it may often become necessary to carry out repairs to the sealing members while the high-temperature equipment is maintained at a high temperature.

このような高温装置の、いわゆるin-situ補修のため、これまでに各種方法が提案されている(例えば特許文献1)。 Various methods have been proposed for so-called in-situ repair of such high-temperature equipment (e.g., Patent Document 1).

特開2016-3313号公報JP 2016-3313 A

高温装置のin-situ補修の一つの案として、シール部材の劣化部分に、水ガラスのような被膜成分を上塗りすることが考えられる。 One possible method for in-situ repair of high-temperature equipment is to apply a coating of a film component such as water glass to the deteriorated parts of the sealing material.

しかしながら、高温に維持されたシール部材の上に水ガラスの被膜を設置した場合、水ガラスから水分が蒸発する際に、被膜に貫通孔が形成されるという問題が生じる。この場合、得られる被膜は多孔質となり、良好なシール効果を発揮することができなくなる。 However, when a water glass coating is placed on a sealing member maintained at a high temperature, a problem occurs in that as the water evaporates from the water glass, through-holes form in the coating. In this case, the resulting coating becomes porous and is no longer able to provide a good sealing effect.

このように、高温装置のin-situ補修の際に、緻密なシール構造体を製造する方法に対して要望がある。 Thus, there is a demand for a method to produce a dense seal structure when performing in-situ repairs on high-temperature equipment.

本発明は、このような背景に鑑みなされたものであり、本発明では、高温装置のin-situ補修に有意に適用できるシール構造体の製造方法を提供することを目的とする。また、本発明では、そのようなシール構造体を提供することを目的とする。 The present invention has been made in consideration of this background, and aims to provide a manufacturing method for a seal structure that can be significantly applied to in-situ repair of high-temperature equipment. Another aim of the present invention is to provide such a seal structure.

本発明では、高温装置の内部空間を外界から遮断するシール構造体の製造方法であって、被膜成分を含む原料液をミスト化して、200℃以上の温度の被コーティング部に吹き付け、前記被コーティング部に前記被膜成分を堆積させ、被膜を形成する、製造方法が提供される。 The present invention provides a method for manufacturing a seal structure that isolates the internal space of a high-temperature device from the outside world, in which a raw material liquid containing a coating component is turned into a mist and sprayed onto a part to be coated at a temperature of 200°C or higher, and the coating component is deposited on the part to be coated to form a coating.

また、本発明では、シール構造体であって、多孔質な下地部材と、該下地部材の上に配置された被膜と、を有し、前記被膜は、非有機物膜であり、シリカ、アルミナ、および炭素の少なくとも一つを含み、前記下地部材の表面粗さRaは、1mm以上であり、前記被膜の厚さは、1μm~20μmの範囲である、シール構造体が提供される。 The present invention also provides a seal structure having a porous base member and a coating disposed on the base member, the coating being a non-organic film containing at least one of silica, alumina, and carbon, the surface roughness Ra of the base member being 1 mm or more, and the thickness of the coating being in the range of 1 μm to 20 μm.

本発明では、高温装置のin-situ補修に有意に適用できるシール構造体の製造方法を提供することができる。また、本発明では、そのようなシール構造体を提供することができる。 The present invention can provide a method for manufacturing a seal structure that can be significantly applied to in-situ repair of high-temperature equipment. The present invention can also provide such a seal structure.

本発明の一実施形態によるシール構造体の製造方法のフローを模式的に示した図である。5A to 5C are diagrams illustrating a flow of a method for manufacturing a seal structure according to an embodiment of the present invention. 高温装置のシール部に形成された、本発明の一実施形態によるシール構造体を模式的に示した断面図である。1 is a cross-sectional view showing a schematic diagram of a seal structure according to an embodiment of the present invention formed in a seal portion of a high-temperature device. 試験装置の構成を模式的に示した図である。FIG. 2 is a diagram illustrating a schematic configuration of a test device. 各例に係るシール構造体における200℃での評価試験結果をまとめて示した図である。FIG. 11 is a diagram showing a summary of evaluation test results at 200° C. for the seal structures according to the respective examples. 各例に係るシール構造体における300℃での評価試験結果をまとめて示した図である。FIG. 11 is a diagram showing a summary of evaluation test results at 300° C. for the seal structures according to the respective examples. 各例に係るシール構造体における400℃での評価試験結果をまとめて示した図である。FIG. 11 is a diagram showing a summary of evaluation test results at 400° C. for the seal structures according to the respective examples. 各例に係るシール構造体における500℃での評価試験結果をまとめて示した図である。FIG. 11 is a diagram showing a summary of evaluation test results at 500° C. for the seal structures according to the respective examples. 本発明の一実施形態によるシール構造体の断面の一例を示した写真である。1 is a photograph showing an example of a cross section of a seal structure according to an embodiment of the present invention.

以下、本発明の一実施形態について説明する。 One embodiment of the present invention is described below.

本発明の一実施形態では、高温装置の内部空間を外界から遮断するシール構造体の製造方法であって、被膜成分を含む原料液をミスト化して、200℃以上の温度の被コーティング部に吹き付け、前記被コーティング部に前記被膜成分を堆積させ、被膜を形成する、製造方法が提供される。 In one embodiment of the present invention, a method for manufacturing a seal structure that isolates the internal space of a high-temperature device from the outside world is provided, in which a raw material liquid containing a coating component is turned into a mist and sprayed onto a part to be coated at a temperature of 200°C or higher, and the coating component is deposited on the part to be coated to form a coating.

本発明の一実施形態では、200℃以上の高温に維持された被コーティング部に、ミスト化された原料液が吹き付けられる。 In one embodiment of the present invention, the mist of the raw material liquid is sprayed onto the part to be coated, which is maintained at a high temperature of 200°C or higher.

原料液は、被膜成分を含む。従って、この原料液をミスト化することにより、液体をまとった被膜成分が、ミストとして形成される。 The raw material liquid contains the coating components. Therefore, by turning this raw material liquid into mist, the coating components that are covered with the liquid are formed as a mist.

このようなミストを被コーティング部に吹き付けた場合、ミストが被コーティング部の表面と接触した際に、ミストに含まれる溶媒が気化される。従って、被コーティング部の表面には、溶媒を含まない被膜成分が堆積される。 When such a mist is sprayed onto the part to be coated, the solvent contained in the mist evaporates when the mist comes into contact with the surface of the part to be coated. Therefore, coating components that do not contain the solvent are deposited on the surface of the part to be coated.

このようなミストの被コーティング部との接触、および溶媒の気化が繰り返し継続されることにより、被コーティング部の表面に、被膜成分が逐次堆積される。 By repeatedly and continuously contacting the part to be coated with the mist and evaporating the solvent, the coating components are gradually deposited on the surface of the part to be coated.

例えば、原料液に含まれる被膜成分が粒子の形態の場合、原料液をミスト化することにより、液体を含む粒子(以下、特に、「ミスト化粒子」ともいう。)が形成される。このようなミスト化粒子を被コーティング部に吹き付けた場合、ミスト化粒子が被コーティング部の表面と接触した際に、溶媒が気化される。従って、被コーティング部の表面には、溶媒を含まない被膜成分の粒子が堆積される。 For example, when the coating component contained in the raw material liquid is in the form of particles, the raw material liquid is misted to form particles containing the liquid (hereinafter, also referred to as "mist particles" in particular). When such mist particles are sprayed onto the part to be coated, the solvent is vaporized when the mist particles come into contact with the surface of the part to be coated. Therefore, particles of the coating component that do not contain the solvent are deposited on the surface of the part to be coated.

あるいは、原料液に含まれる被膜成分が炭素を含む熱分解物質の形態の場合、原料液をミスト化することにより、液体をまとった熱分解物質(以下、特に、「ミスト化成分」ともいう。)が形成される。このミスト化成分が被コーティング部の表面と接触した際に、溶媒の気化と、熱分解物質の分解とが同時に生じる。従って、被コーティング部の表面には、溶媒を含まないカーボンが堆積される。 Alternatively, when the coating component contained in the raw material liquid is in the form of a pyrolyzed substance containing carbon, the raw material liquid is misted to form a pyrolyzed substance wrapped in liquid (hereinafter, also referred to as the "mist component" in particular). When this mist component comes into contact with the surface of the part to be coated, the solvent is vaporized and the pyrolyzed substance is decomposed at the same time. Therefore, carbon that does not contain the solvent is deposited on the surface of the part to be coated.

このような「ミスト化粒子」または「ミスト化成分」を経由して形成される堆積物には、溶媒が実質的に含まれていない。このため、堆積物には、溶媒が気化する結果として生じる貫通孔は、形成されない。 The deposit formed via such "mist particles" or "mist components" does not substantially contain solvent. Therefore, no through holes are formed in the deposit as a result of the solvent evaporating.

従って、本発明の一実施形態では、被コーティング部に、緻密な被膜を形成することができる。また、これにより、本発明の一実施形態では、良好なシール性能を発揮するシール構造体を製造することができる。 Therefore, in one embodiment of the present invention, a dense coating can be formed on the coated portion. This also makes it possible to manufacture a seal structure that exhibits good sealing performance in one embodiment of the present invention.

(本発明の一実施形態によるシール構造体の製造方法)
次に、図面を参照して、本発明の一実施形態によるシール構造体の製造方法について、より詳しく説明する。
(Method of manufacturing a seal structure according to an embodiment of the present invention)
Next, the method for manufacturing a seal structure according to an embodiment of the present invention will be described in more detail with reference to the drawings.

図1には、本発明の一実施形態によるシール構造体の製造方法のフローを模式的に示す。 Figure 1 shows a schematic flow of a method for manufacturing a seal structure according to one embodiment of the present invention.

図1に示すように、本発明の一実施形態によるシール構造体の製造方法(以下、「第1の製造方法」と称する。)は、
(1)原料液を調製する工程(工程S110)と、
(2)原料液をミスト化する工程(工程S120)と、
(3)ミスト化した原料液を、高温装置の被コーティング部に吹き付ける工程(工程S130)と、
を有する。
As shown in FIG. 1, a method for manufacturing a seal structure according to an embodiment of the present invention (hereinafter referred to as a "first manufacturing method") includes the following steps:
(1) A step of preparing a raw material liquid (step S110);
(2) A step of misting the raw material liquid (step S120);
(3) A step of spraying the mist of the raw material liquid onto a part to be coated in a high-temperature device (step S130);
has.

以下、各工程について説明する。 Each step is explained below.

なお、ここでは、一例として、原料液が被膜成分の粒子を含み、従って、原料液をミスト化することにより、「ミスト化粒子」が形成される場合を想定して、第1の製造方法の各工程を説明する。 Here, as an example, each step of the first manufacturing method will be described assuming that the raw material liquid contains particles of the coating component, and therefore "mist particles" are formed by misting the raw material liquid.

(工程S110)
まず、高温装置の被コーティング部に設置される被膜用の原料液が調製される。
(Step S110)
First, a raw material solution for the coating to be placed on the part to be coated in the high-temperature device is prepared.

原料液は、溶媒と、該溶媒中に分散された粒子とを有する。 The raw material liquid contains a solvent and particles dispersed in the solvent.

溶媒は、これに限られるものではないが、水、メタノール、エタノール、n-プロパノール、およびイソプロパノールの少なくとも一つを含んでもよい。安全上の観点から、溶媒は、特に、水であることが好ましい。 The solvent may include, but is not limited to, at least one of water, methanol, ethanol, n-propanol, and isopropanol. From a safety standpoint, it is particularly preferred that the solvent be water.

粒子は、後に形成される被膜の成分で構成される。粒子は、例えば、アルミナ、またはシリカを含んでもよい。 The particles are composed of the components of the coating that will be formed later. The particles may include, for example, alumina, or silica.

原料液は、例えば、ケイ酸アルカリ溶液、シリカゾル、またはアルミナゾルであってもよい。ケイ酸アルカリ溶液は、ケイ酸ナトリウム溶液(いわゆる水ガラス)であってもよい。 The raw material liquid may be, for example, an alkali silicate solution, a silica sol, or an alumina sol. The alkali silicate solution may be a sodium silicate solution (so-called water glass).

原料液に含まれる固形分粒子の濃度は、特に限られないが、例えば、1質量%~20質量%の範囲である。固形分粒子の濃度が20質量%を超えると、原料液の粘度が高くなり、所定のミスト化状態の維持、およびミスト化粒子の安定した供給が難しくなる場合がある。 The concentration of solid particles contained in the raw material liquid is not particularly limited, but is, for example, in the range of 1% to 20% by mass. If the concentration of solid particles exceeds 20% by mass, the viscosity of the raw material liquid increases, and it may become difficult to maintain the specified mist state and to steadily supply the mist particles.

(工程S120)
次に、前述の方法で調製された原料液がミスト化される。すなわち、原料液から、固形分粒子を含む液体粒子、すなわち「ミスト化粒子」が形成される。
(Step S120)
Next, the raw material liquid prepared by the above-mentioned method is misted. That is, liquid particles containing solid particles, that is, "mist particles", are formed from the raw material liquid.

原料液をミスト化する方法は、特に限られない。原料液は、例えば、スプレーガン、エアブラシ、または超音波ブラシ等を用いて、ミスト状にされてもよい。 The method for turning the raw material liquid into a mist is not particularly limited. The raw material liquid may be turned into a mist using, for example, a spray gun, an airbrush, or an ultrasonic brush.

ミスト化粒子の直径は、含まれる固形分粒子の濃度や粒径にも依存するが、例えば、2μm~50μmの範囲である。ミスト化粒子の直径を50μm以下とすることにより、以降の工程S130において、ミスト化粒子が被コーティング部の表面と接触し、次のミスト化粒子が到達する前に、ミスト化粒子に含まれる溶媒を迅速に気化させることができる。また、ミスト化粒子の直径を2μm以上とすることにより、以降の工程S130において、現実的な時間で、被コーティング部に被膜を形成することができる。 The diameter of the mist particles depends on the concentration and particle size of the solid particles contained, but is, for example, in the range of 2 μm to 50 μm. By making the diameter of the mist particles 50 μm or less, in the subsequent step S130, the mist particles come into contact with the surface of the part to be coated, and the solvent contained in the mist particles can be quickly vaporized before the next mist particles arrive. In addition, by making the diameter of the mist particles 2 μm or more, in the subsequent step S130, a coating can be formed on the part to be coated in a realistic amount of time.

なお、本願において、ミスト化粒子の直径は、レーザー回折式粒子分析で測定される。また、「ミスト化粒子」のキャリアガスとしては、空気の他、アルゴン、窒素、酸素等が使用され得る。 In this application, the diameter of the mist particles is measured by laser diffraction particle analysis. In addition, in addition to air, argon, nitrogen, oxygen, etc. can be used as the carrier gas for the "mist particles."

(工程S130)
次に、ミスト化された原料液が、被コーティング部に供給される。例えば、被コーティング部は、高温装置のシール部材の一部、例えば、シール部材の一表面であってもよい。
(Step S130)
The mist of the raw material liquid is then supplied to a part to be coated. For example, the part to be coated may be a part of a seal member of a high-temperature device, for example, one surface of the seal member.

高温装置は、これに限られるものではないが、例えば、石炭のコークス炉、鉄鉱石の高炉、ガラスの溶解炉、およびガラスの成形炉等の各種窯炉が含まれる。これらの高温装置のシール部材の温度は、200℃~500℃の範囲になり得る。 Examples of high-temperature equipment include, but are not limited to, various furnaces such as coal coke ovens, iron ore blast furnaces, glass melting furnaces, and glass forming furnaces. The temperature of the sealing members of these high-temperature equipment can range from 200°C to 500°C.

原料液の供給速度は、原料液の組成、含まれる固形分粒子の濃度、および設置対象の温度等によっても変化する。概して、原料液の供給速度は、例えば、0.0001~0.1cc/(sec・cm)の範囲であってもよい。 The supply rate of the raw material liquid varies depending on the composition of the raw material liquid, the concentration of the solid particles contained therein, the temperature of the installation target, etc. In general, the supply rate of the raw material liquid may be in the range of 0.0001 to 0.1 cc/(sec·cm 2 ), for example.

なお、供給速度が大き過ぎると、ミスト化粒子からの溶媒の気化が間に合わず、被膜に溶媒が含まれる可能性がある。 However, if the supply speed is too high, the solvent may not evaporate quickly enough from the mist particles, resulting in the coating being contaminated with the solvent.

従って、そのような問題を回避または抑制するため、ミスト化粒子を間欠的に供給してもよい。例えば、ミスト化された原料液の供給と停止を、周期的に繰り返してもよい。 Therefore, in order to avoid or suppress such problems, the mist particles may be supplied intermittently. For example, the supply of the mist-formed raw material liquid may be periodically repeated on and off.

被コーティング部が高温に維持されているため、ミスト化粒子が被コーティング部の表面に到達すると、ミスト化粒子に含まれる溶媒は、気化され逸散される。従って、被コーティング部の表面には、溶媒を含まない被膜成分の粒子が、気孔を含まずに緻密な状態で堆積される。また、ミスト化された原料液は、継続して被コーティング部に供給される。このため、被コーティング部では、ミスト化粒子の溶媒気化、および固形分粒子の堆積が繰り返される。また、これに伴い、被コーティング部の表面に、被膜の成分の固形分粒子が逐次堆積される。 Because the part to be coated is maintained at a high temperature, when the mist particles reach the surface of the part to be coated, the solvent contained in the mist particles is vaporized and dispersed. Therefore, on the surface of the part to be coated, particles of the coating components that do not contain the solvent are deposited in a dense state without any air holes. In addition, the mist-formed raw material liquid is continuously supplied to the part to be coated. Therefore, in the part to be coated, the solvent of the mist particles is vaporized and the solid particles are deposited repeatedly. In addition, as a result, the solid particles of the coating components are deposited successively on the surface of the part to be coated.

このような現象が繰り返される結果、被コーティング部に被膜が形成される。被膜の厚さは、特に限られないが、例えば1μm~20μmの範囲である。 As a result of this phenomenon being repeated, a film is formed on the coated part. The thickness of the film is not particularly limited, but is, for example, in the range of 1 μm to 20 μm.

第1の製造方法により得られる被膜は、貫通孔を含まず、緻密な形態を有する。 The coating obtained by the first manufacturing method does not contain any through holes and has a dense morphology.

従って、第1の製造方法では、シール性の良好な緻密な被膜をin-situで形成することができる。 Therefore, the first manufacturing method can form a dense coating with good sealing properties in-situ.

また、第1の製造方法では、ミスト化粒子が脱溶媒化され、粒子成分のみが逐次的に堆積され、これにより被膜が形成される。このような成膜方法では、被コーティング部の表面が比較的大きな凹凸を有する場合でも、緻密な被膜を形成することができる。 In addition, in the first manufacturing method, the mist particles are desolvated and only the particle components are deposited sequentially, thereby forming a coating. With this type of film formation method, a dense coating can be formed even if the surface of the part to be coated has relatively large irregularities.

例えば、第1の製造方法では、被コーティング部の表面粗さRaが1mm以上の場合でも、緻密な連続被膜を形成することができる。 For example, the first manufacturing method can form a dense, continuous coating even when the surface roughness Ra of the coated portion is 1 mm or more.

以上、原料液が被膜成分の固形分粒子を含む場合を例に、第1の製造方法について説明した。 The first manufacturing method has been described above using an example in which the raw material liquid contains solid particles of the coating component.

しかしながら、これは単なる一例であって、第1の製造方法は、別の構成を有してもよい。例えば、原料液は、被膜成分の粒子の代わりに、炭素を含む熱分解物質を含んでもよい。この場合、炭素を含む熱分解物質は、原料液中に溶解していてもよい。 However, this is merely one example, and the first manufacturing method may have a different configuration. For example, the raw material liquid may contain a pyrolysis substance containing carbon instead of particles of the coating component. In this case, the pyrolysis substance containing carbon may be dissolved in the raw material liquid.

そのような原料液を使用した場合、工程S120において、「ミスト化粒子」の代わりに、「ミスト化成分」が形成される。従って、後続の工程S130では、「ミスト化成分」が被コーティング部の表面と接触した際に、熱分解物質の分解と、溶媒の気化とが同時に生じる。その結果、被コーティング部には、炭素被膜が形成される。 When such a raw material liquid is used, in step S120, a "mist-forming component" is formed instead of "mist-forming particles." Therefore, in the subsequent step S130, when the "mist-forming component" comes into contact with the surface of the part to be coated, the decomposition of the pyrolysis substance and the evaporation of the solvent occur simultaneously. As a result, a carbon coating is formed on the part to be coated.

この他にも各種変更が可能であることは、当業者には容易に理解される。 Those skilled in the art will easily understand that various other modifications are possible.

(本発明の一実施形態によるシール構造体)
次に、図2を参照して、本発明の一実施形態によるシール構造体について説明する。
(Seal structure according to one embodiment of the present invention)
Next, a seal structure according to one embodiment of the present invention will be described with reference to FIG.

図2は、高温装置のシール部に形成された、本発明の一実施形態によるシール構造体を模式的に示した断面図である。 Figure 2 is a cross-sectional view showing a schematic of a seal structure according to one embodiment of the present invention formed in a seal portion of a high-temperature device.

図2に示すように、本発明の一実施形態によるシール構造体(以下、「第1のシール構造体」と称する。)100は、高温装置10の隙間15を塞ぐシール部20に設置される。 As shown in FIG. 2, a seal structure 100 according to one embodiment of the present invention (hereinafter referred to as the "first seal structure") is installed in a seal section 20 that seals a gap 15 in a high-temperature device 10.

より具体的には、高温装置10は、第1の壁部材30および第2の壁部材31を有し、第1および第2の壁部材30、31等により、高温装置10の内部に内部空間40が形成される。ただし、第1の壁部材30と第2の壁部材31との間には隙間15が存在し、この隙間15を封止するため、隙間15にシール部材42(下地部材)が充填される。これによりシール部20が構成され、内部空間40が外界と遮断される。 More specifically, the high-temperature device 10 has a first wall member 30 and a second wall member 31, and the first and second wall members 30, 31 form an internal space 40 inside the high-temperature device 10. However, a gap 15 exists between the first wall member 30 and the second wall member 31, and in order to seal this gap 15, a sealing member 42 (base member) is filled into the gap 15. This forms a sealing portion 20, and the internal space 40 is isolated from the outside world.

しかしながら、高温装置10を例えば長期間使用すると、シール部材42が劣化し、そのシール性能が低下する。そのような場合、高温装置10を使用した状態で、すなわち、シール部20が高温の状態で、シール部材42を補修する必要が生じ得る。 However, if the high-temperature device 10 is used for a long period of time, the sealing member 42 deteriorates and its sealing performance decreases. In such a case, it may become necessary to repair the sealing member 42 while the high-temperature device 10 is in use, i.e., while the sealing portion 20 is at a high temperature.

第1のシール構造体100は、そのようなin-situ補修により形成される。 The first seal structure 100 is formed by such an in-situ repair.

第1のシール構造体100は、(劣化した)シール部材42と、被膜120とを有する。 The first seal structure 100 has a (deteriorated) seal member 42 and a coating 120.

被膜120は、前述のような本発明の一実施形態による製造方法、例えば第1の製造方法により製造される。従って、被膜120は、貫通孔が有意に抑制された、緻密な構造を有する。 The coating 120 is manufactured by a manufacturing method according to one embodiment of the present invention, such as the first manufacturing method, as described above. Therefore, the coating 120 has a dense structure in which through holes are significantly suppressed.

被膜120は、非有機物膜で構成される。被膜120は、シリカ、アルミナ、および炭素の少なくとも一つを含む。
The coating 120 is made of a non-organic material and contains at least one of silica, alumina, and carbon.

また、シール部材42は、表面44に大きな凹凸を有し得る。表面44の表面粗さRaは、例えば、1mm以上である。通常、このような大きな凹凸を有する表面44上に、in-situで均一な連続被膜を形成することは容易ではない。従って、従来の方法では、表面44上に被膜を形成することができたとしても、そのような被膜は、不連続なものになり、および/または良好な密着性を有しない。すなわち、長期にわたって良好なシール性を発揮する被膜を形成することは難しい。 The sealing member 42 may also have large irregularities on the surface 44. The surface roughness Ra of the surface 44 is, for example, 1 mm or more. Normally, it is not easy to form a uniform continuous coating in situ on a surface 44 having such large irregularities. Therefore, even if a coating can be formed on the surface 44 by a conventional method, such a coating will be discontinuous and/or will not have good adhesion. In other words, it is difficult to form a coating that exhibits good sealing properties over a long period of time.

しかしながら、第1のシール構造体100においては、被膜120は、前述のような本発明の一実施形態による製造方法で形成される。すなわち、被膜120がアルミナおよび/またはシリカを含む場合、被膜120は、ミスト化粒子が脱溶媒され、粒子が表面に逐次堆積される現象を利用して形成される。また、被膜120が炭素を含む場合、被膜120は、ミスト化成分の脱溶媒および熱分解により、炭素が表面に逐次堆積される現象を利用して形成される。そのため、被膜120は、大きな凹凸を有する表面44上にも、均一に、適正な密着力で設置することができる。 However, in the first seal structure 100, the coating 120 is formed by the manufacturing method according to one embodiment of the present invention as described above. That is, when the coating 120 contains alumina and/or silica, the coating 120 is formed by utilizing the phenomenon in which the mist particles are desolvated and the particles are successively deposited on the surface. Also, when the coating 120 contains carbon, the coating 120 is formed by utilizing the phenomenon in which the carbon is successively deposited on the surface due to the desolvation and thermal decomposition of the mist components. Therefore, the coating 120 can be applied uniformly with appropriate adhesion even on a surface 44 having large irregularities.

従って、第1のシール構造体100は、シール部材42の凹凸の表面44に、長期にわたって良好なシール性を発揮する被膜120を配置することができる。また、これにより、第1のシール構造体100では、長期にわたって、高温装置10に良好なシール性を確保することができる。 Therefore, the first seal structure 100 can place a coating 120 that provides good sealing properties over a long period of time on the uneven surface 44 of the seal member 42. This also allows the first seal structure 100 to ensure good sealing properties for the high-temperature device 10 over a long period of time.

なお、シール構造体100が設置されるシール部20を形成する第1の壁部材30および第2の壁部材31は、金属(例えば耐熱金属)、およびセラミックス(例えば耐火レンガ)など、耐熱性を備えた材料であれば、いかなる材料で構成されてもよい。 The first wall member 30 and the second wall member 31 that form the seal portion 20 in which the seal structure 100 is installed may be made of any heat-resistant material, such as metal (e.g., heat-resistant metal) and ceramics (e.g., fire-resistant bricks).

また、シール構造体100が適用されるシール部20の温度は、高温装置10によって変化する。一例では、シール構造体100が適用されるシール部20の温度は、200℃~500℃の範囲である。 The temperature of the seal portion 20 to which the seal structure 100 is applied varies depending on the high-temperature device 10. In one example, the temperature of the seal portion 20 to which the seal structure 100 is applied is in the range of 200°C to 500°C.

次に、本発明の実施例について説明する。なお、以下の記載において、例1~例5は実施例であり、例11は、比較例である。 Next, examples of the present invention will be described. In the following description, Examples 1 to 5 are examples, and Example 11 is a comparative example.

(例1)
以下の方法により、シール構造体のシール性能の評価を行った。
(Example 1)
The sealing performance of the seal structure was evaluated by the following method.

(被膜用原料液の調製)
被膜の原料液には、水ガラス3号(富士化学社製)を水で希釈した溶液(水ガラス:水=2:1(質量比))を使用した。原料液に含まれる二酸化ケイ素粒子の濃度は、5質量%である。また、二酸化ケイ素のミスト化粒子の直径の平均値は、2.5μmである。例1~例4のミスト化粒子の直径は、シンパテックス社のレーザー回折式粒度分布測定装置(HELOS)を用いて測定した。
(Preparation of coating solution)
The raw material liquid for the coating was a solution in which water glass No. 3 (manufactured by Fuji Chemical Co., Ltd.) was diluted with water (water glass:water = 2:1 (mass ratio)). The concentration of silicon dioxide particles contained in the raw material liquid was 5 mass %. The average diameter of the silicon dioxide mist particles was 2.5 μm. The diameters of the mist particles in Examples 1 to 4 were measured using a laser diffraction particle size distribution analyzer (HELOS) manufactured by Sympatex Co., Ltd.

以下、調製された原料液を、「A液」と称する。 Hereinafter, the prepared raw material liquid will be referred to as "Liquid A."

(試験装置による評価)
図3には、試験装置の構成を模式的に示す。図3に示すように、この試験装置210は、金属管220と、該金属管220を収容する電気炉230とを備える。
(Evaluation using test equipment)
The configuration of the test apparatus is shown in Fig. 3. As shown in Fig. 3, the test apparatus 210 includes a metal tube 220 and an electric furnace 230 that houses the metal tube 220.

金属管220は、ステンレス鋼製で、略円柱形状を有する。金属管220の一つの面は開口226となっており、この開口226は、直径が25mmとなっている。なお、金属管220の内部の容積は約1Lである。 The metal tube 220 is made of stainless steel and has a generally cylindrical shape. One surface of the metal tube 220 is an opening 226, which has a diameter of 25 mm. The internal volume of the metal tube 220 is approximately 1 L.

金属管220は、開口226が電気炉230の先端と一致するようにして、電気炉230内に配置される。また、金属管220の一部には、別の開口が設けられており、この開口は、窒素ガスを安定して供給するためのバッファタンク240と接続されている。 The metal tube 220 is placed in the electric furnace 230 so that the opening 226 coincides with the tip of the electric furnace 230. In addition, another opening is provided in a part of the metal tube 220, and this opening is connected to a buffer tank 240 for a stable supply of nitrogen gas.

金属管220の開口226の内部には、予めシール部材228が設置されている。 A seal member 228 is already installed inside the opening 226 of the metal tube 220.

シール部材228は、ケイ砂による下地層(第1層)と、その上のモルタルによる第2層の2層構成とした。シール部材228は、以下のように形成した。 The sealing member 228 has a two-layer structure consisting of a base layer (first layer) made of silica sand and a second layer made of mortar on top of that. The sealing member 228 was formed as follows.

まず、バインダー(水ガラス)を用いて円柱状のケイ砂下地層(直径25mm×長さ30mm)を作製し、それを開口226に設置した。次に、試験温度まで昇温した後、その表面にモルタルによる第2層を形成した。 First, a cylindrical silica sand base layer (diameter 25 mm × length 30 mm) was prepared using a binder (water glass) and placed in the opening 226. Next, after raising the temperature to the test temperature, a second layer of mortar was formed on the surface.

得られたシール部材228には、多くの通気孔が認められた。また、シール部材228の表面は、凹凸が激しく、表面粗さRaは、約0.1mmであった。 The resulting sealing member 228 had many air holes. In addition, the surface of the sealing member 228 was very uneven, with a surface roughness Ra of approximately 0.1 mm.

試験装置を使用する際には、電気炉230を昇温し、金属管220の開口226を所定の温度に維持した。試験装置の各部材の温度が十分に安定してから、エアブラシ(カスタムマイクロンシリーズCM-CP2;アネスト岩田社製)を用いて、金属管220の開口226に向かって、前述のA液を吹き付けた。 When using the test device, the electric furnace 230 was heated and the opening 226 of the metal tube 220 was maintained at a predetermined temperature. After the temperature of each component of the test device was sufficiently stabilized, the aforementioned liquid A was sprayed toward the opening 226 of the metal tube 220 using an airbrush (Custom Micron Series CM-CP2; manufactured by Anest Iwata Corporation).

エアブラシと開口226との間の距離は、約100mmであった。また、A液の吹き付けは、0.0005cc/(sec・cm)における10秒間の供給および10秒間の停止を1サイクルとし、3サイクル実施した。 The distance between the airbrush and the opening 226 was about 100 mm. Liquid A was sprayed for 3 cycles, with one cycle consisting of a supply of 0.0005 cc/(sec·cm 2 ) for 10 seconds and a 10-second pause.

A液の吹き付けを完了してから3分経過後に、バッファタンク240から金属管220内に窒素ガスを供給した。窒素ガスの圧力が0.7kPaに達した時点で窒素ガスの供給を停止した。窒素ガスを停止した時点を時間の0(ゼロ)点とし、金属管220内の圧力の経時変化を測定した。 Three minutes after spraying of Liquid A was completed, nitrogen gas was supplied from the buffer tank 240 into the metal tube 220. When the nitrogen gas pressure reached 0.7 kPa, the supply of nitrogen gas was stopped. The time when the nitrogen gas supply was stopped was set as the 0 (zero) point, and the change in pressure over time in the metal tube 220 was measured.

(例2)
例1と同様の方法により、シール構造体のシール性能の評価を行った。
(Example 2)
The sealing performance of the seal structure was evaluated in the same manner as in Example 1.

ただし、この例2では、被膜の原料液として、シリカゾル(カタロイドS-20L;日揮触媒化成社製)を水で希釈した溶液を使用した。原料液に含まれる二酸化ケイ素粒子の濃度は、5質量%である。また、二酸化ケイ素のミスト化粒子の直径の平均値は、2.5μmである。 However, in this Example 2, a solution of silica sol (Cataloid S-20L; manufactured by JGC Catalysts and Chemicals) diluted with water was used as the raw material liquid for the coating. The concentration of silicon dioxide particles contained in the raw material liquid was 5% by mass. The average diameter of the silicon dioxide mist particles was 2.5 μm.

以下、調製された原料液を、「B液」と称する。 Hereinafter, the prepared raw material liquid will be referred to as "Liquid B."

(例3)
例1と同様の方法により、シール構造体のシール性能の評価を行った。
(Example 3)
The sealing performance of the seal structure was evaluated in the same manner as in Example 1.

ただし、この例3では、被膜の原料液として、シリカゾル(スノーテックスC;日産化学社製)を水で希釈した溶液を使用した。原料液に含まれる二酸化ケイ素粒子の濃度は、5質量%である。また、二酸化ケイ素のミスト化粒子の直径の平均値は、2.5μmである。 However, in this Example 3, a solution of silica sol (Snowtex C; manufactured by Nissan Chemical Industries, Ltd.) diluted with water was used as the raw material liquid for the coating. The concentration of silicon dioxide particles contained in the raw material liquid was 5 mass %. The average diameter of the silicon dioxide mist particles was 2.5 μm.

以下、調製された原料液を、「C液」と称する。 Hereinafter, the prepared raw material liquid will be referred to as "Liquid C."

(例4)
例1と同様の方法により、シール構造体のシール性能の評価を行った。
(Example 4)
The sealing performance of the seal structure was evaluated in the same manner as in Example 1.

ただし、この例4では、被膜の原料液として、アルミナゾル(カタロイド特殊品;日揮触媒化成社製)を水で希釈した溶液を使用した。原料液に含まれるアルミナゾルの濃度は、5質量%である。また、アルミナゾルのミスト化粒子の直径の平均値は、2.5μmである。 However, in this Example 4, a solution of alumina sol (Cataloid Specialty Product; manufactured by JGC Catalysts and Chemicals) diluted with water was used as the raw material liquid for the coating. The concentration of alumina sol contained in the raw material liquid was 5 mass %. The average diameter of the mist particles of alumina sol was 2.5 μm.

以下、調製された原料液を、「D液」と称する。 Hereinafter, the prepared raw material liquid will be referred to as "Liquid D."

(例5)
例1と同様の方法により、シール構造体のシール性能の評価を行った。
(Example 5)
The sealing performance of the seal structure was evaluated in the same manner as in Example 1.

ただし、この例5では、被膜の原料液として、ショ糖(富士フィルム和光純薬製スクロース)溶液を使用した。原料液に含まれるショ糖の濃度は、5質量%である。 However, in this Example 5, a sucrose (sucrose manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) solution was used as the raw material solution for the coating. The concentration of sucrose contained in the raw material solution was 5% by mass.

以下、調製された原料液を、「E液」と称する。 Hereinafter, the prepared raw material liquid will be referred to as "Liquid E."

(例11)
例1と同様の方法により、シール構造体のシール性能の評価を行った。
(Example 11)
The sealing performance of the seal structure was evaluated in the same manner as in Example 1.

ただし、この例11では、シール部材228の上に、被膜を設置しなかった。すなわち、例11では、開口226にシール部材228のみを設置した状態で、金属管220内の圧力の経時変化を測定した。 However, in this Example 11, no coating was placed on the sealing member 228. That is, in Example 11, the change in pressure over time inside the metal tube 220 was measured with only the sealing member 228 placed in the opening 226.

(結果)
図4~図7には、各例に係る評価試験によって得られた結果をまとめて示す。図4には、開口226が200℃の場合の試験結果を示し、図5には、開口226が300℃の場合の試験結果を示し、図6には、開口226が400℃の場合の試験結果を示し、図7には、開口226が500℃の場合の試験結果を示す。
(result)
The results obtained by the evaluation tests for each example are shown in Figures 4 to 7. Figure 4 shows the test results when the opening 226 is at 200°C, Figure 5 shows the test results when the opening 226 is at 300°C, Figure 6 shows the test results when the opening 226 is at 400°C, and Figure 7 shows the test results when the opening 226 is at 500°C.

これらの試験結果から、いずれの温度においても、例1~例5では、例11に比べて、圧力の低下が抑制されていることがわかる。吹付部の温度によって溶媒の揮散速度、粒子の結合度合いが変化するため、温度毎に各被膜のシール性能は変化している。 These test results show that at all temperatures, pressure drop is suppressed in Examples 1 to 5 compared to Example 11. The temperature of the spray area affects the evaporation rate of the solvent and the degree of particle bonding, so the sealing performance of each coating changes with each temperature.

図8には、例1におけるシール部材228の表面近傍における試験後の断面の一例を示す。 Figure 8 shows an example of a cross section near the surface of the seal member 228 in Example 1 after testing.

図8から、例1では、シール部材228の上に、薄くて均一な被膜が形成されていることがわかる。また、この被膜には、貫通孔がほとんど認められないことがわかる。SEM-EDXを用いた分析の結果、この被膜は、シリカで構成されていることがわかった。 From Figure 8, it can be seen that in Example 1, a thin and uniform coating is formed on the sealing member 228. It can also be seen that this coating has almost no through holes. Analysis using SEM-EDX revealed that this coating is composed of silica.

また、図には示さないが、例2~例5におけるシール構造体の被膜部分においても、同様の形態が認められた。 Although not shown in the figure, a similar morphology was observed in the coating portions of the seal structures in Examples 2 to 5.

なお、例2および例3におけるシール構造体の被膜は、シリカで構成されていることがわかった。また、例4におけるシール構造体の被膜は、アルミナで構成されていることがわかった。さらに、例5におけるシール構造体の被膜は、炭素で構成されていることがわかった。 The coating of the seal structure in Examples 2 and 3 was found to be made of silica. The coating of the seal structure in Example 4 was found to be made of alumina. Furthermore, the coating of the seal structure in Example 5 was found to be made of carbon.

このように、例1~例5において調製した原料液をミスト化して、対象部分に吹き付けることにより、良好なシール性を有するシール構造体が得られることが確認された。 In this way, it was confirmed that a seal structure with good sealing properties could be obtained by misting the raw material liquid prepared in Examples 1 to 5 and spraying it onto the target part.

(まとめ)
以上によれば、例1~例5において調製した原料液をミスト化して、200℃以上の温度の被コーティング部に吹き付けることにより、高温装置のin-situ補修に有意に適用できるシール構造体の製造方法を提供することができる。また、そのようなシール構造体を提供することができる。
(summary)
As described above, it is possible to provide a method for manufacturing a seal structure that can be effectively applied to in-situ repair of high-temperature equipment by misting the raw material liquids prepared in Examples 1 to 5 and spraying the mist onto a portion to be coated at a temperature of 200° C. or higher. Also, it is possible to provide such a seal structure.

10 高温装置
15 隙間
20 シール部
30 第1の壁部材
31 第2の壁部材
40 内部空間
42 シール部材
44 表面
100 第1のシール構造体
120 被膜
210 試験装置
220 金属管
226 開口
228 シール部材
230 電気炉
240 バッファタンク
REFERENCE SIGNS LIST 10 High temperature device 15 Gap 20 Seal portion 30 First wall member 31 Second wall member 40 Internal space 42 Seal member 44 Surface 100 First seal structure 120 Coating 210 Test device 220 Metal tube 226 Opening 228 Seal member 230 Electric furnace 240 Buffer tank

Claims (7)

高温装置の内部空間を外界から遮断するシール構造体の製造方法であって、
被膜成分を含む原料液をミスト化して、200℃以上の温度の被コーティング部に吹き付け、
前記被コーティング部に前記被膜成分を堆積させ、被膜を形成する工程を有し、
前記原料液は、溶媒と、前記被膜成分の粒子とを含み、前記被膜成分の粒子の濃度は、1質量%~20質量%(ただし、20質量%を除く)の範囲であり、
前記原料液をミスト化することにより形成される、液体を含む粒子であるミスト化粒子の直径は、2μm~50μmの範囲である、製造方法。
A method for manufacturing a seal structure that isolates an internal space of a high-temperature device from the outside world, comprising the steps of:
The raw material liquid containing the coating components is turned into a mist and sprayed onto the part to be coated at a temperature of 200°C or higher.
A step of depositing the coating component on the coated part to form a coating,
the raw material liquid contains a solvent and particles of the coating component, and the concentration of the particles of the coating component is in the range of 1% by mass to 20% by mass (excluding 20% by mass);
The diameter of the mist particles, which are particles containing the liquid and are formed by misting the raw material liquid, is in the range of 2 μm to 50 μm .
前記溶媒は、水、メタノール、エタノール、n-プロパノール、およびイソプロパノールの少なくとも一つを含む、請求項に記載の製造方法。 The method according to claim 1 , wherein the solvent comprises at least one of water, methanol, ethanol, n-propanol, and isopropanol. 前記原料液は、ケイ酸アルカリ溶液、シリカゾル、またはアルミナゾルである、請求項1または2に記載の製造方法。 The method according to claim 1 or 2 , wherein the raw material liquid is an alkali silicate solution, a silica sol, or an alumina sol. 前記被膜は、厚さが1μm~20μmの範囲である、請求項1~のいずれか一項に記載の製造方法。 The method according to any one of claims 1 to 3 , wherein the coating has a thickness in the range of 1 µm to 20 µm. 前記被コーティング部は、シール部材の一部である、請求項1~のいずれか一項に記載の製造方法。 The manufacturing method according to any one of claims 1 to 4 , wherein the portion to be coated is a part of a seal member. シール構造体であって、
多孔質な下地部材と、
該下地部材の上に配置された被膜と、
を有し、
前記被膜は、非有機物膜であり、シリカ、アルミナ、および炭素の少なくとも一つを含み、
前記下地部材の表面粗さRaは、1mm以上であり、
前記被膜の厚さは、1μm~20μmの範囲である、シール構造体。
A seal structure,
A porous base material;
a coating disposed on the base member;
having
The coating is a non-organic film and contains at least one of silica, alumina, and carbon;
The surface roughness Ra of the base member is 1 mm or more,
The seal structure, wherein the coating has a thickness in the range of 1 μm to 20 μm.
高温装置の内部空間を外界から遮断するシール構造体の製造方法であって、A method for manufacturing a seal structure that isolates an internal space of a high-temperature device from the outside world, comprising the steps of:
被膜成分を含む原料液をミスト化して、200℃以上の温度の被コーティング部に吹き付け、The raw material liquid containing the coating components is turned into a mist and sprayed onto the part to be coated at a temperature of 200°C or higher.
前記被コーティング部に前記被膜成分を堆積させ、被膜を形成する工程を有し、A step of depositing the coating component on the coated part to form a coating,
前記被膜成分は、炭素を含む熱分解物質の形態であり、前記被膜は、炭素で構成される、製造方法。The method of claim 1, wherein the coating components are in the form of pyrolyzed materials that include carbon, and the coating is comprised of carbon.
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JP2004168586A (en) 2002-11-19 2004-06-17 Kawasaki Refract Co Ltd Refractory materials for coke oven repair
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JP2004168586A (en) 2002-11-19 2004-06-17 Kawasaki Refract Co Ltd Refractory materials for coke oven repair
JP2007145890A (en) 2005-11-24 2007-06-14 Taihokohzai:Kk Powdery repairing agent for hearth of coke oven carbonization chamber and method for repairing

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