JP7516486B2 - 気体ろ過装置及び気体ろ過装置を備えたレチクルキャリア - Google Patents
気体ろ過装置及び気体ろ過装置を備えたレチクルキャリア Download PDFInfo
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- JP7516486B2 JP7516486B2 JP2022191973A JP2022191973A JP7516486B2 JP 7516486 B2 JP7516486 B2 JP 7516486B2 JP 2022191973 A JP2022191973 A JP 2022191973A JP 2022191973 A JP2022191973 A JP 2022191973A JP 7516486 B2 JP7516486 B2 JP 7516486B2
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- Prior art keywords
- diffusion element
- porous diffusion
- frame
- reticle carrier
- gas
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/16—Rotary, reciprocated or vibrated modules
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
- H10P72/1926—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
- B01D39/1607—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous
- B01D39/1623—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin
- B01D39/163—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being fibrous of synthetic origin sintered or bonded
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D39/00—Filtering material for liquid or gaseous fluids
- B01D39/14—Other self-supporting filtering material ; Other filtering material
- B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
- B01D39/1638—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being particulate
- B01D39/1653—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being particulate of synthetic origin
- B01D39/1661—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres the material being particulate of synthetic origin sintered or bonded
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0001—Making filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0002—Casings; Housings; Frame constructions
- B01D46/0005—Mounting of filtering elements within casings, housings or frames
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/08—Flat membrane modules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
- B01D63/08—Flat membrane modules
- B01D63/087—Single membrane modules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1902—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for a single substrate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
- H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
- H10P72/1906—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for containing masks, reticles or pellicles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
- B01D2239/12—Special parameters characterising the filtering material
- B01D2239/1216—Pore size
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2265/00—Casings, housings or mounting for filters specially adapted for separating dispersed particles from gases or vapours
- B01D2265/06—Details of supporting structures for filtering material, e.g. cores
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2275/00—Filter media structures for filters specially adapted for separating dispersed particles from gases or vapours
- B01D2275/30—Porosity of filtering material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2313/00—Details relating to membrane modules or apparatus
- B01D2313/02—Specific tightening or locking mechanisms
- B01D2313/025—Specific membrane holders
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
- Packaging Frangible Articles (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
11.....................................蓋
12.....................................基台
20.....................................内側ポッド
21.....................................基台
22.....................................蓋
221...................................上面
222...................................窪み
223...................................気体通路
224...................................連結部
30.....................................気体ろ過装置
31.....................................フレーム
311...................................外枠
312...................................内枠
3121.................................支持部
313...................................中空部
314...................................連結部
315...................................結合部
316、316’、316”...............結合部
32.....................................多孔質拡散要素
40.....................................気体ろ過装置
41.....................................板体
42.....................................連結部
50.....................................テスト対象となるレチクルキャリア
51.....................................外側ポッド
52.....................................吸気通路
53.....................................試験チャンバ
Claims (11)
- レチクルキャリアに着脱可能に取り付けられる気体ろ過装置であって、
複数の中空部を備え、前記レチクルキャリアに着脱可能に連結されるフレームと、
少なくとも1つの多孔質拡散要素であって、前記フレームの前記複数の中空部のうちの少なくとも1つの中空部に適合する形状を有することで、前記フレームにしっかりと結合して、前記レチクルキャリアの内部収容空間が前記少なくとも1つの多孔質拡散要素を介して前記レチクルキャリアの外部と連通する少なくとも1つの多孔質拡散要素と、
を含み、
前記複数の中空部が中心に対して対称的に分布している、気体ろ過装置。 - 前記フレームは、外枠と、前記外枠に連結された少なくとも1つの内枠とを有し、前記外枠と前記内枠との間で前記中空部を画定し、前記外枠が複数の連結部を含み、前記複数の連結部がそれぞれ締結具と協働して、前記外枠を前記レチクルキャリアの蓋に着脱可能に連結させ、前記内枠が前記多孔質拡散要素と結合するために用いられる請求項1に記載の気体ろ過装置。
- 前記内枠の内側は、少なくとも1つの結合部を有し、前記結合部は前記多孔質拡散要素の縁を制限して、前記多孔質拡散要素が前記中空部から脱落するのを防止する請求項2に記載の気体ろ過装置。
- 前記内枠の内側は、前記結合部に連結された少なくとも1つの支持部を有し、前記支持部は前記多孔質拡散要素内に嵌め込まれることで、前記多孔質拡散要素が前記中空部から脱落するのを防止する請求項3に記載の気体ろ過装置。
- 前記少なくとも1つの結合部と前記フレームの上面又は下面とは、不連続な階段構造を呈し、前記多孔質拡散要素は焼結によって前記内枠の前記少なくとも1つの結合部と結合される請求項3に記載の気体ろ過装置。
- 前記少なくとも1つの多孔質拡散要素は、上面、下面及び前記上面と前記下面との間に延びる厚さを有し、前記厚さは0.1mm~3.0mmの範囲である請求項1に記載の気体ろ過装置。
- 前記少なくとも1つの多孔質拡散要素は、多孔質粉末材料から焼結によって作製され、前記焼結の温度は210℃~240℃の範囲である請求項1に記載の気体ろ過装置。
- 前記少なくとも1つの多孔質拡散要素の各孔又は平均孔径は、0.1μm~10μmの範囲である請求項1に記載の気体ろ過装置。
- 蓋と、基台と、請求項1に記載の気体ろ過装置とを含み、前記気体ろ過装置は前記蓋に着脱可能に連結されるレチクルキャリア。
- レチクルキャリアであって、
収容空間を画定する蓋及び基台と、
前記蓋に着脱可能に取り付けられた気体ろ過装置と、を含み、前記気体ろ過装置は、
中心に対して対称的に分布している複数の中空部を有するフレームであって、前記蓋に着脱可能に取り付けられたフレームと、
少なくとも1つの多孔質拡散要素であって、前記フレームに結合されて、前記収容空間が前記少なくとも1つの多孔質拡散要素を経由して前記レチクルキャリアの外部と連通する少なくとも1つの多孔質拡散要素と、を備える、
レチクルキャリア。 - レチクルキャリアであって、
収容空間を画定する蓋及び基台と、
前記蓋に着脱可能に取り付けられ、外枠及び少なくとも1つの内枠を備えたフレームであって、前記外枠及び前記内枠が中心に対して対称的に分布している複数の中空部を画定し、前記複数の中空部が、多孔質粉末材料から焼結によって作製された多孔質拡散要素が充填されるためのものであるフレームと、
を含むレチクルキャリア。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202263390353P | 2022-07-19 | 2022-07-19 | |
| US63/390,353 | 2022-07-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024013180A JP2024013180A (ja) | 2024-01-31 |
| JP7516486B2 true JP7516486B2 (ja) | 2024-07-16 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2022191973A Active JP7516486B2 (ja) | 2022-07-19 | 2022-11-30 | 気体ろ過装置及び気体ろ過装置を備えたレチクルキャリア |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240024807A1 (ja) |
| JP (1) | JP7516486B2 (ja) |
| KR (1) | KR102893383B1 (ja) |
| CN (1) | CN117420725A (ja) |
| TW (1) | TWI829427B (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN121310916A (zh) * | 2024-07-05 | 2026-01-09 | 家登精密工业股份有限公司 | 具有感测装置的光罩容器 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011241762A (ja) | 2010-05-18 | 2011-12-01 | Sanki Eng Co Ltd | 黒煙除去装置 |
| JP2016096184A (ja) | 2014-11-12 | 2016-05-26 | ミライアル株式会社 | ガスパージ用フィルタ |
| JP2021015979A (ja) | 2019-07-13 | 2021-02-12 | 家登精密工業股▲ふん▼有限公司 | 基板容器システム |
| JP2022058152A (ja) | 2020-09-30 | 2022-04-11 | 家登精密工業股▲ふん▼有限公司 | ワーク容器システム |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6906783B2 (en) * | 2002-02-22 | 2005-06-14 | Asml Holding N.V. | System for using a two part cover for protecting a reticle |
| US7400383B2 (en) * | 2005-04-04 | 2008-07-15 | Entegris, Inc. | Environmental control in a reticle SMIF pod |
| JP5054012B2 (ja) * | 2005-09-27 | 2012-10-24 | インテグリス・インコーポレーテッド | レチクルポッド |
| KR20080035902A (ko) * | 2006-10-20 | 2008-04-24 | 삼성전자주식회사 | 반도체 제조 설비용 레티클 보관 박스 |
| TWM330970U (en) * | 2007-11-01 | 2008-04-21 | Gudeng Prec Industral Co Ltd | Semiconductor elements storage apparatus and reticle storage apparatus |
| TWM331514U (en) * | 2007-11-15 | 2008-05-01 | Gudeng Prec Industral Co Ltd | Storage apparatus for storing semiconductor element or reticle |
| KR101118473B1 (ko) * | 2009-03-27 | 2012-03-12 | (주)바이오니아 | 나노다공막 및 이의 제조방법 |
| US9592464B2 (en) * | 2012-12-04 | 2017-03-14 | Xavier Rex Prax | HVAC filtration system |
| US12601982B2 (en) * | 2020-09-30 | 2026-04-14 | Gudeng Precision Industrial Co., Ltd | Workpiece container system |
-
2022
- 2022-11-14 TW TW111143345A patent/TWI829427B/zh active
- 2022-11-28 CN CN202211544819.5A patent/CN117420725A/zh active Pending
- 2022-11-29 KR KR1020220162659A patent/KR102893383B1/ko active Active
- 2022-11-29 US US18/070,550 patent/US20240024807A1/en active Pending
- 2022-11-30 JP JP2022191973A patent/JP7516486B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011241762A (ja) | 2010-05-18 | 2011-12-01 | Sanki Eng Co Ltd | 黒煙除去装置 |
| JP2016096184A (ja) | 2014-11-12 | 2016-05-26 | ミライアル株式会社 | ガスパージ用フィルタ |
| JP2021015979A (ja) | 2019-07-13 | 2021-02-12 | 家登精密工業股▲ふん▼有限公司 | 基板容器システム |
| JP2021015951A (ja) | 2019-07-13 | 2021-02-12 | 家登精密工業股▲ふん▼有限公司 | 基板キャリア及びその気体拡散モジュール |
| JP2022058152A (ja) | 2020-09-30 | 2022-04-11 | 家登精密工業股▲ふん▼有限公司 | ワーク容器システム |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202405991A (zh) | 2024-02-01 |
| CN117420725A (zh) | 2024-01-19 |
| KR102893383B1 (ko) | 2025-12-02 |
| KR20240011599A (ko) | 2024-01-26 |
| JP2024013180A (ja) | 2024-01-31 |
| TWI829427B (zh) | 2024-01-11 |
| US20240024807A1 (en) | 2024-01-25 |
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