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JP7524977B2 - Wideband transmission line wiring board - Google Patents
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JP7524977B2 - Wideband transmission line wiring board - Google Patents

Wideband transmission line wiring board Download PDF

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JP7524977B2
JP7524977B2 JP2022572068A JP2022572068A JP7524977B2 JP 7524977 B2 JP7524977 B2 JP 7524977B2 JP 2022572068 A JP2022572068 A JP 2022572068A JP 2022572068 A JP2022572068 A JP 2022572068A JP 7524977 B2 JP7524977 B2 JP 7524977B2
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transmission line
chip inductor
bias circuit
component mounting
mounting surface
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充浩 佐藤
博也 上山
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Murata Manufacturing Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/60Amplifiers in which coupling networks have distributed constants, e.g. with waveguide resonators
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details

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  • Microelectronics & Electronic Packaging (AREA)
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Description

本発明は、広帯域の高周波信号が伝搬する伝送線路が形成され、その伝送線路に電源供給するバイアス回路が実装される広帯域伝送線路配線基板に関するものである。 The present invention relates to a wideband transmission line wiring board in which a transmission line is formed through which a wideband high-frequency signal propagates and a bias circuit is mounted to supply power to the transmission line.

従来、この種の配線基板としては、例えば、特許文献1に開示されたインダクタ配線基板がある。このインダクタ配線基板では、40Gb/sクラスの高周波信号が伝搬する伝送線路と、その伝送線路に接続される伝送路パタンとがフレキシブル基板に実装される。伝送路パタンは、伝送線路の入力端と出力端との間に一端が接続され、その一端から離れるにつれて放射状に広がるように配線されて、コニカル構造のインダクタを生成する。このインダクタは、伝送線路に近いほどインダクタンスが小さく、伝送線路から離れるほどインダクタンスが大きくなるインダクタL1,L2,…Ln(L1<L2<…<Ln)が連続して接続された構成となり、伝送線路に電源供給するバイアス回路となる。このインダクタの実装面の裏面にある基板のグランド面は削除され、寄生容量の低減化が図られる。Conventionally, an example of this type of wiring board is the inductor wiring board disclosed in Patent Document 1. In this inductor wiring board, a transmission line through which a high-frequency signal of 40 Gb/s class propagates and a transmission line pattern connected to the transmission line are mounted on a flexible board. The transmission line pattern is wired so that one end is connected between the input end and the output end of the transmission line and spreads radially as it moves away from the one end, creating an inductor with a conical structure. This inductor is configured by continuously connecting inductors L1, L2, ... Ln (L1 < L2 < ... < Ln) whose inductance is smaller the closer to the transmission line and larger the farther away from the transmission line, and serves as a bias circuit that supplies power to the transmission line. The ground surface of the board on the back side of the mounting surface of this inductor is removed to reduce parasitic capacitance.

また、従来、この種のバイアス回路として、例えば、特許文献2に開示された広帯域バイアス回路がある。この広帯域バイアス回路は、直列接続された3段のインダクタL1,L2,L3から構成され、一端が電源に接続され、他端が増幅回路の出力に接続された伝送線に接続される。この伝送線には、1MHzから3GHzの帯域の高周波信号が伝搬する。伝送線に接続される1段目のインダクタL1は最も小さいインダクタンスを有し、2,3段目に接続されるインダクタL2,L3は順に大きいインダクタンスを有する(L1<L2<L3)。 As another conventional bias circuit of this type, for example, there is a wideband bias circuit disclosed in Patent Document 2. This wideband bias circuit is composed of three stages of inductors L1, L2, and L3 connected in series, one end of which is connected to a power supply, and the other end of which is connected to a transmission line that is connected to the output of an amplifier circuit. High-frequency signals in the 1 MHz to 3 GHz band are transmitted through this transmission line. The first stage inductor L1 connected to the transmission line has the smallest inductance, and the inductors L2 and L3 connected to the second and third stages have increasing inductances (L1<L2<L3).

特開2008-47711号公報JP 2008-47711 A 特開2010-232988号公報JP 2010-232988 A

上記従来の特許文献1および特許文献2に開示された各バイアス回路は、いずれも、伝送線路の透過特性を広い周波数帯域で高く維持する目的で、伝送線路との接続点に近いインダクタほど小さいインダクタンスを持つインダクタを配置する構成になっている。伝送線路の透過特性はSパラメータS21で表される。しかし、インダクタンスの小さいインダクタは、伝搬信号の低い周波数帯域で損失を発生してしまうため、伝送線路は、例えば、数MHzから数十GHzにわたる超広帯域にわたって高い透過特性を維持することができない。 In both of the bias circuits disclosed in the above-mentioned conventional patent documents 1 and 2, inductors with smaller inductances are arranged closer to the connection point with the transmission line in order to maintain the transmission line's high transmission characteristics over a wide frequency band. The transmission characteristics of the transmission line are represented by the S-parameter S21. However, inductors with small inductance generate losses in the low frequency band of the propagating signal, so the transmission line cannot maintain high transmission characteristics over an ultra-wide band ranging from several MHz to several tens of GHz.

また、特許文献1に開示されたバイアス回路は、伝送路パタンが放射状に広がるように配線されてコニカル構造のインダクタが構成されるため、その裏面のグランド面が大きな面積で除去されて、寄生容量の低減化が図られる。このため、グランド面のインピーダンスが高くなり、グランド面に生じる電位振動などでノイズの問題が発生する。In addition, the bias circuit disclosed in Patent Document 1 has a conical inductor structure formed by wiring the transmission line pattern so that it spreads out radially, and a large area of the ground surface on the back side is removed to reduce parasitic capacitance. This increases the impedance of the ground surface, causing noise problems such as potential oscillations on the ground surface.

本発明はこのような課題を解消するためになされたもので、
部品実装面に形成される高周波信号が伝搬する伝送線路と、
部品実装面で伝送線路との接続点に最も近い箇所において伝送線路に一端が接続されて部品実装面に実装される先頭チップインダクタ、および、接続点に2番目に近い箇所から先頭チップインダクタに直列に接続されて部品実装面に実装され、最後に直列に接続される最後尾のものが直流電源に接続される複数の後続チップインダクタから構成され、自己共振周波数が、接続点に2番目に近い箇所において先頭チップインダクタの次に接続される後続チップインダクタの中の後続先頭チップインダクタが最も大きく、先頭チップインダクタが後続先頭チップインダクタの次に大きく、後続先頭チップインダクタに後続する後続チップインダクタが先頭チップインダクタと同じかまたは先頭チップインダクタより順次小さく設定されるバイアス回路と、
部品実装面の裏面に形成され、バイアス回路が実装される部品実装面部分の裏面に位置する領域の導電部が除去されるグランド面と
を備え、広帯域伝送線路配線基板を構成した。
The present invention has been made to solve such problems,
a transmission line formed on the component mounting surface through which a high frequency signal propagates;
a bias circuit including a first chip inductor having one end connected to the transmission line at a location on the component mounting surface closest to the connection point with the transmission line and mounted on the component mounting surface, and multiple subsequent chip inductors connected in series to the first chip inductor from a location second closest to the connection point and mounted on the component mounting surface, with the last one connected in series being connected to a DC power source, the self-resonant frequency of the subsequent first chip inductor among the subsequent chip inductors connected next to the first chip inductor at the location second closest to the connection point being the largest, the first chip inductor being the second largest after the subsequent first chip inductor, and the subsequent chip inductors following the subsequent first chip inductor being set to the same frequency as the first chip inductor or successively smaller frequency than the first chip inductor;
A wideband transmission line wiring board is configured, which is provided with a ground surface formed on the rear side of the component mounting surface and in which the conductive portion in the region located on the rear side of the component mounting surface on which the bias circuit is mounted is removed.

本構成によれば、伝送線路を伝搬して、伝送線路との接続点に最も近い箇所に位置するインダクタで損失を発生させていた低い周波数帯域の伝搬信号は、後続先頭チップインダクタの次に自己共振周波数が大きい先頭チップインダクタの有するインピーダンスによって反射し、バイアス回路への侵入が阻止される。したがって、損失を発生させていた低い周波数帯域の伝搬信号は、伝送線路との接続点に最も近い箇所に位置する先頭インダクタで損失を発生させなくなる。 According to this configuration, a low-frequency band signal that has been propagating through the transmission line and causing loss in the inductor located closest to the connection point with the transmission line is reflected by the impedance of the leading chip inductor that has the second highest self-resonant frequency after the trailing leading chip inductor, and is prevented from entering the bias circuit. Therefore, the low-frequency band signal that has been causing loss no longer causes loss in the leading inductor located closest to the connection point with the transmission line.

また、後続先頭チップインダクタが有する最も大きい自己共振周波数の高周波帯域における伝搬信号は、先頭チップインダクタを通過して後続先頭チップインダクタまで侵入し、先頭チップインダクタから後続先頭チップインダクタに至る経路で、部品実装面裏面のグランド面との間に生じる寄生容量を介して、伝送線路からグランド面へ漏れようとする。しかし、グランド面は、バイアス回路が実装される部品実装面部分の裏面に位置する領域の導電部が除去されるので、そのような寄生容量の発生が低減され、高周波帯域における伝搬信号が伝送線路からグランド面へ漏れるのが防がれる。このため、広帯域にわたって伝送線路を高い透過特性に維持することが可能になる。 In addition, a propagation signal in the high frequency band of the largest self-resonant frequency of the subsequent leading chip inductor passes through the leading chip inductor and penetrates into the subsequent leading chip inductor, and in the path from the leading chip inductor to the subsequent leading chip inductor, the signal tends to leak from the transmission line to the ground plane via the parasitic capacitance that occurs between the leading chip inductor and the ground plane on the back side of the component mounting surface. However, the conductive portion of the ground plane in the area located on the back side of the component mounting surface on which the bias circuit is mounted is removed, so the occurrence of such parasitic capacitance is reduced, and the propagation signal in the high frequency band is prevented from leaking from the transmission line to the ground plane. This makes it possible to maintain high transmission characteristics of the transmission line over a wide band.

また、バイアス回路を構成する各インダクタは、面実装タイプのチップインダクタによって構成される。したがって、バイアス回路を構成する各インダクタは、特許文献1に開示された、伝送路パタンでコニカル構造に形成されるインダクタのように、基板に大きな面積を占めることなく実装することができる。したがって、バイアス回路が実装される部品実装面部分裏面のグランド面に位置する導電部除去領域の面積を小さくして、グランド面のインピーダンスが高くなるのを抑制することができる。このため、グランド面に生じる電位振動などでノイズの問題が発生しなくなる。 In addition, each inductor constituting the bias circuit is composed of a surface-mount type chip inductor. Therefore, each inductor constituting the bias circuit can be mounted on the board without occupying a large area, like the inductor formed in a conical structure with a transmission line pattern disclosed in Patent Document 1. Therefore, the area of the conductive portion removed region located on the ground surface on the back side of the component mounting surface portion on which the bias circuit is mounted can be reduced, preventing the impedance of the ground surface from increasing. As a result, noise problems due to potential vibrations generated on the ground surface do not occur.

この結果、本発明によれば、広帯域にわたって伝送線路を高い透過特性に維持することが可能で、しかも、グランド面に生じる電位振動などでノイズの問題が発生することのないバイアス回路を配線基板に実装できるようになる。As a result, the present invention makes it possible to maintain high transmission characteristics of the transmission line over a wide bandwidth, and also makes it possible to implement a bias circuit on a wiring board that does not cause noise problems due to potential oscillations on the ground surface.

本発明の広帯域伝送線路配線基板の概念を説明する図である。1A and 1B are diagrams illustrating the concept of a wideband transmission line wiring board according to the present invention. 本発明の第1の実施形態による広帯域伝送線路配線基板の概略を説明する図である。1 is a diagram illustrating an outline of a wideband transmission line wiring board according to a first embodiment of the present invention; 第1の実施形態による広帯域伝送線路配線基板においてバイアス回路を構成する各チップインダクタが有するインピーダンスの周波数特性を示すグラフである。5 is a graph showing frequency characteristics of impedance of each chip inductor constituting a bias circuit in the wideband transmission line wiring board according to the first embodiment. 従来の広帯域伝送線路配線基板におけるバイアス回路を、第1の実施形態による広帯域伝送線路配線基板においてバイアス回路を構成する各チップインダクタで模した図である。1 is a diagram illustrating a bias circuit in a conventional wideband transmission line wiring board, modeled on each chip inductor constituting the bias circuit in the wideband transmission line wiring board according to the first embodiment. FIG. 図4に示すバイアス回路の透過特性を示すグラフである。5 is a graph showing the transmission characteristic of the bias circuit shown in FIG. 4 . 図4に示す広帯域伝送線路配線基板を破断して矢視方向から見た断面図である。5 is a cross-sectional view of the wideband transmission line wiring board shown in FIG. 4, taken along the arrow direction. 第1の実施形態による広帯域伝送線路配線基板における伝送線路の透過特性の測定に用いた測定基板を説明する図である。5A and 5B are diagrams illustrating a measurement board used for measuring transmission characteristics of a transmission line in the wideband transmission line wiring board according to the first embodiment. 図7に示す測定基板を破断して矢視方向から見た断面図である。8 is a cross-sectional view of the measurement substrate shown in FIG. 7, taken along the arrow direction. 図7および図8に示す測定基板における伝送線路の透過特性の測定に用いた測定系を示す斜視図である。FIG. 9 is a perspective view showing a measurement system used to measure the transmission characteristics of the transmission line in the measurement board shown in FIGS. 7 and 8 . 図9に示す測定系を使って伝送線路の透過特性を測定した結果を比較例と共に示すグラフ、並びに、各比較例の構成を説明する図である。10 is a graph showing the results of measuring the transmission characteristics of a transmission line using the measurement system shown in FIG. 9 together with comparative examples, and a diagram illustrating the configuration of each comparative example. 本発明の第2の実施形態による広帯域伝送線路配線基板の概略を説明する図である。FIG. 13 is a diagram illustrating an outline of a wideband transmission line wiring board according to a second embodiment of the present invention. 本発明の第3の実施形態による広帯域伝送線路配線基板の概略を説明する図である。FIG. 13 is a diagram illustrating an outline of a wideband transmission line wiring board according to a third embodiment of the present invention. 第3の実施形態による広帯域伝送線路配線基板の表面およびその裏面における配線パターンを示す図である。13A to 13C are diagrams illustrating wiring patterns on a front surface and a back surface of a wideband transmission line wiring board according to a third embodiment.

次に、本発明による広帯域伝送線路配線基板を実施するための形態について、説明する。なお、以下の説明において、同一または相当する部分には同一符号を付して説明する。Next, we will explain the embodiment of the wideband transmission line wiring board according to the present invention. In the following explanation, the same or corresponding parts are denoted by the same reference numerals.

図1は、本発明の広帯域伝送線路配線基板1の概念を説明する図であり、同図(a)は配線基板1の平面図、同図(b)は配線基板1をIb-Ib線で破断して矢視方向から見た断面図である。 Figure 1 is a diagram explaining the concept of the wideband transmission line wiring board 1 of the present invention, where (a) is a plan view of the wiring board 1 and (b) is a cross-sectional view of the wiring board 1 taken along line Ib-Ib and viewed from the direction of the arrow.

配線基板1の部品実装面1aには、IC(高集積化回路)2およびバイアス回路3が実装され、伝送線路4が形成される。伝送線路4には、IC2が図示しない回路と送受信する超広帯域の高周波信号sが伝搬する。バイアス回路3は、伝送路4に一端が接続されて部品実装面1aに実装される先頭チップインダクタL2、および、先頭チップインダクタL2に直列に接続されて部品実装面1aに実装される複数の後続チップインダクタL1,…,Lnから構成される。An IC (highly integrated circuit) 2 and a bias circuit 3 are mounted on the component mounting surface 1a of the wiring board 1, and a transmission line 4 is formed. An ultra-wideband high-frequency signal s that is transmitted and received by the IC 2 to and from a circuit not shown propagates through the transmission line 4. The bias circuit 3 is composed of a leading chip inductor L2, one end of which is connected to the transmission line 4 and mounted on the component mounting surface 1a, and a number of trailing chip inductors L1, ..., Ln, which are connected in series to the leading chip inductor L2 and mounted on the component mounting surface 1a.

一般的に、バイアス回路3はバイアスT回路と呼ばれ、バイアス回路3を構成する先頭チップインダクタL2および後続チップインダクタL1,…,LnはそれぞれバイアスTインダクタと呼ばれる。先頭チップインダクタL2および後続チップインダクタL1,…,Lnは、直方体状の本体の両端部に電極が設けられて構成される表面実装タイプのインダクタであり、配線パターン5a,5b,…5n-1で直列に接続されて、伝送線路4にシャントに接続される。先頭チップインダクタL2に最後に直列に接続される最後尾の後続チップインダクタLnは、配線パターン5nを介して図示しない直流電源に接続される。 In general, the bias circuit 3 is called a bias T circuit, and the leading chip inductor L2 and the trailing chip inductors L1, ..., Ln that constitute the bias circuit 3 are called bias T inductors. The leading chip inductor L2 and the trailing chip inductors L1, ..., Ln are surface-mount type inductors that are configured with electrodes provided at both ends of a rectangular parallelepiped body, and are connected in series with wiring patterns 5a, 5b, ..., 5n-1 and connected in shunt to the transmission line 4. The trailing chip inductor Ln, which is the last to be connected in series to the leading chip inductor L2, is connected to a DC power source (not shown) via wiring pattern 5n.

直流電源からはバイアス回路3を介して伝送線路4に直流バイアス電流iが供給され、IC2、および、伝送線路4を介してIC2と通信する図示しない回路に、バイアス回路3によって直流バイアス電源が供給される。 A DC bias current i is supplied from the DC power supply to the transmission line 4 via the bias circuit 3, and a DC bias power supply is supplied by the bias circuit 3 to IC2 and a circuit (not shown) that communicates with IC2 via the transmission line 4.

伝送線路4を使って行われる通信には、1本の伝送線路4に信号と直流バイアス電源とを重畳させて通信を行うPoC(Power Over Coax.)伝送技術が使用される。PoC伝送技術では、伝送線路4を伝搬する高周波信号と、伝送線路4へ供給される直流バイアス電源とをバイアス回路3によって分離している。バイアス回路3は、直流電源から伝送線路4へ直流電流iを供給しつつ、伝送線路4を伝搬する高周波の伝搬信号sが、伝送線路4の信号入力端から伝送線路4の信号出力端へ透過するのを妨げないようにする必要がある。その透過を阻害する要因としては、バイアス回路3への伝搬信号sの漏洩や、バイアス回路3での伝搬信号sの損失(熱への変換)、バイアス回路3と伝送線路4との接続部の特性インピーダンスの乱れによる伝搬信号sの反射が考えられる。 For communication using the transmission line 4, PoC (Power Over Coax) transmission technology is used, which superimposes a signal and a DC bias power supply on a single transmission line 4. In PoC transmission technology, the high-frequency signal propagating through the transmission line 4 and the DC bias power supply supplied to the transmission line 4 are separated by the bias circuit 3. The bias circuit 3 must supply a DC current i from the DC power supply to the transmission line 4 while not preventing the high-frequency propagation signal s propagating through the transmission line 4 from transmitting from the signal input end of the transmission line 4 to the signal output end of the transmission line 4. Possible factors that hinder this transmission include leakage of the propagation signal s to the bias circuit 3, loss of the propagation signal s in the bias circuit 3 (conversion to heat), and reflection of the propagation signal s due to disturbance in the characteristic impedance of the connection between the bias circuit 3 and the transmission line 4.

バイアス回路3を構成する先頭チップインダクタL2および後続チップインダクタL1,…,Lnは、自己共振周波数が、先頭チップインダクタL2の次に接続される、後続チップインダクタL1,…,Lnの中の後続先頭チップインダクタL1が最も大きく設定される。先頭チップインダクタL2は、後続先頭チップインダクタL1の次に大きく自己共振周波数が設定される。後続先頭チップインダクタL1に後続する後続チップインダクタ…,Lnは、先頭チップインダクタL2と同じかまたは先頭チップインダクタL1より順次小さく、自己共振周波数が設定される。また、インダクタンス値は、後続先頭チップインダクタL1が最も小さく、先頭チップインダクタL2が次に小さく、後続チップインダクタ…,Lnは、先頭チップインダクタL2と同じかまたは先頭チップインダクタL1より順次大きく設定される。 The leading chip inductor L2 and the trailing chip inductors L1, ..., Ln constituting the bias circuit 3 have a self-resonant frequency set to the highest for the trailing leading chip inductor L1 among the trailing chip inductors L1, ..., Ln connected next to the leading chip inductor L2. The leading chip inductor L2 has a self-resonant frequency set to the second highest after the trailing leading chip inductor L1. The trailing chip inductors ..., Ln following the trailing leading chip inductor L1 have a self-resonant frequency set to be the same as the leading chip inductor L2 or successively smaller than the leading chip inductor L1. In addition, the inductance value of the trailing leading chip inductor L1 is the smallest, the leading chip inductor L2 is the next smallest, and the trailing chip inductors ..., Ln are set to be the same as the leading chip inductor L2 or successively larger than the leading chip inductor L1.

これらチップインダクタL2,L1,…,Lnは自己共振周波数付近でインピーダンスが高くなり、各自己共振周波数付近の帯域の伝搬信号sがバイアス回路3に漏洩することを防ぐことができる。これらチップインダクタL2,L1,…,Lnの数は4つ以上になってもよい。These chip inductors L2, L1, ..., Ln have high impedance near the self-resonant frequency, and can prevent the propagation signal s in the band near each self-resonant frequency from leaking to the bias circuit 3. The number of these chip inductors L2, L1, ..., Ln may be four or more.

部品実装面1aの裏面に形成されるグランド面1bは、同図(a)の平面図に薄墨色で描かれており、バイアス回路3が実装される部品実装面部分の裏面に位置する領域1b1の導電部1b2が除去される。部品実装面1aには、同図(b)に一部が示される、後述する表層グランド6が形成されることがある。配線基板1は、複数層に形成され、グランド面1bが形成される層の他、グランド面1cが形成される層を備え、基板裏面にはグランド面1dが形成される。これら表層グランド6および各グランド面1b,1c,1dはスルーホール7によって導通している。 The ground plane 1b formed on the back side of the component mounting surface 1a is drawn in light ink in the plan view of FIG. 1(a), and the conductive portion 1b2 of the area 1b1 located on the back side of the component mounting surface portion on which the bias circuit 3 is mounted is removed. A surface ground 6, described below, a portion of which is shown in FIG. 1(b), may be formed on the component mounting surface 1a. The wiring board 1 is formed in multiple layers, and in addition to the layer on which the ground plane 1b is formed, it also has a layer on which the ground plane 1c is formed, and the ground plane 1d is formed on the back side of the board. The surface ground 6 and each of the ground planes 1b, 1c, and 1d are electrically connected by through holes 7.

図2は、本発明の第1の実施形態によるバイアス回路3が実装される広帯域伝送線路配線基板1Aの概略を説明する図であり、同図(a)は配線基板1Aの平面図、同図(b)は配線基板1AをIIb-IIb線で破断して矢視方向から見た断面図である。 Figure 2 is a diagram illustrating an outline of a wideband transmission line wiring board 1A on which a bias circuit 3 according to a first embodiment of the present invention is implemented, where (a) is a plan view of the wiring board 1A and (b) is a cross-sectional view of the wiring board 1A taken along line IIb-IIb and viewed from the direction of the arrow.

第1の実施形態による配線基板1Aは、バイアス回路3が先頭チップインダクタL2および2つの後続チップインダクタL1,L3から構成される点だけが、図1に示す配線基板1と異なり、他の構成は図1に示す配線基板1と同様である。配線基板1Aは、伝送線路4を伝搬信号sが透過するのを阻害する上記の各要因を回避し、伝送線路4の透過特性S21が、45GHzまでの伝搬信号sは-0.5dB以上、45GHz~60GHzの伝搬信号sは-2.5dB以上となるように、バイアス回路3が広帯域に構成されている。 The wiring board 1A according to the first embodiment differs from the wiring board 1 shown in Fig. 1 only in that the bias circuit 3 is composed of a leading chip inductor L2 and two trailing chip inductors L1, L3, and the other configurations are the same as those of the wiring board 1 shown in Fig. 1. The wiring board 1A avoids the above-mentioned factors that hinder the transmission of the propagating signal s through the transmission line 4, and the bias circuit 3 is configured to be wideband so that the transmission characteristic S21 of the transmission line 4 is -0.5 dB or more for propagating signals s up to 45 GHz and -2.5 dB or more for propagating signals s from 45 GHz to 60 GHz.

伝送線路4には、特性インピーダンスが50Ωに設計されたマイクロストリップ線路やコプレーナ線路等の線路が用いられる。配線基板1Aでは、部品実装面1aに伝送線路4を囲む表層グランド6が形成され、伝送線路4はコプレーナ線路として用いられる。また、バイアス回路3に接続される直流電源にはバッテリーや電圧レギュレータなどが用いられる。 The transmission line 4 is a line such as a microstrip line or a coplanar line designed to have a characteristic impedance of 50 Ω. In the wiring board 1A, a surface ground 6 that surrounds the transmission line 4 is formed on the component mounting surface 1a, and the transmission line 4 is used as a coplanar line. In addition, a battery, a voltage regulator, or the like is used as the DC power source connected to the bias circuit 3.

図3は、各チップインダクタL1,L2,L3が有するインピーダンスの周波数特性を示すグラフである。同グラフの横軸は周波数[Hz]、縦軸はインピーダンス[Ω]を表す。また、太い実線で示される特性線21は後続先頭チップインダクタL1の特性、細い実線で示される特性線22は先頭チップインダクタL2の特性、破線で示される特性線23は後続チップインダクタL3の特性を表す。 Figure 3 is a graph showing the frequency characteristics of the impedance of each chip inductor L1, L2, and L3. The horizontal axis of the graph represents frequency [Hz], and the vertical axis represents impedance [Ω]. The thick solid characteristic line 21 represents the characteristics of the trailing leading chip inductor L1, the thin solid characteristic line 22 represents the characteristics of the leading chip inductor L2, and the dashed characteristic line 23 represents the characteristics of the trailing chip inductor L3.

後続先頭チップインダクタL1には、0603(mm)サイズで、自己共振周波数が約15GHz、インダクタンス値が0.04μHの高周波向けのものが用いられ、先頭チップインダクタL2には、0603(mm)サイズで、自己共振周波数が約1GHz、インダクタンス値が3μHの中間周波数向けのものが用いられる。また、後続チップインダクタL3には、1608(mm)サイズで、自己共振周波数が約20GHz、インダクタンス値が47μHの低周波向けのものが用いられる。The leading chip inductor L1 is 0603 (mm) size, has a self-resonant frequency of about 15 GHz, and an inductance value of 0.04 μH for high frequencies, while the leading chip inductor L2 is 0603 (mm) size, has a self-resonant frequency of about 1 GHz, and an inductance value of 3 μH for medium frequencies. The leading chip inductor L3 is 1608 (mm) size, has a self-resonant frequency of about 20 GHz, and an inductance value of 47 μH for low frequencies.

広帯域にわたりバイアス回路3への伝搬信号sの漏洩を防ぐために、後続先頭チップインダクタL1の自己共振周波数は10~30GHz、先頭チップインダクタL2の自己共振周波数は10MHz~10GHz、後続チップインダクタL3の自己共振周波数は1~500MHzの各帯域となることが望ましい。各チップインダクタL1,L2,L3は、自己共振周波数付近でインピーダンスが高くなり、これら各自己共振周波数付近の帯域の伝搬信号sがバイアス回路3に漏洩することを防ぐ。 To prevent leakage of the propagation signal s to the bias circuit 3 over a wide band, it is desirable that the self-resonant frequency of the trailing leading chip inductor L1 be in the band of 10 to 30 GHz, the self-resonant frequency of the leading chip inductor L2 be in the band of 10 MHz to 10 GHz, and the self-resonant frequency of the trailing chip inductor L3 be in the band of 1 to 500 MHz. Each of the chip inductors L1, L2, and L3 has a high impedance near the self-resonant frequency, preventing the propagation signal s in the band near each of these self-resonant frequencies from leaking to the bias circuit 3.

インピーダンスの周波数特性を示すグラフにおいて、各チップインダクタL1,L2,L3のインピーダンスカーブが急峻で、直列に接続した際の合成インピーダンスに谷が生じる場合は、その谷が埋まるように、バイアス回路3が、各チップインダクタL1,L2,L3のうちの少なくとも1つに並列に抵抗を接続してもよい。その場合、並列に接続する抵抗の抵抗値は500~1000Ωが望ましい。In the graph showing the impedance frequency characteristics, if the impedance curves of the chip inductors L1, L2, and L3 are steep and a valley occurs in the composite impedance when connected in series, the bias circuit 3 may connect a resistor in parallel to at least one of the chip inductors L1, L2, and L3 so as to fill in the valley. In that case, the resistance value of the resistor connected in parallel is preferably 500 to 1000 Ω.

このようにいずれかのチップインダクタL1,L2,L3に並列に抵抗Rが接続されることで、そのチップインダクタの自己共振周波数の帯域幅は、隣接するチップインダクタの自己共振周波数の帯域幅との関係が、各自己共振周波数間で透過特性S21の劣化を招く帯域を発生させない最適な帯域幅に適宜設定される。In this way, by connecting resistor R in parallel to any one of the chip inductors L1, L2, L3, the bandwidth of the self-resonant frequency of that chip inductor is appropriately set to an optimal bandwidth in relation to the bandwidth of the self-resonant frequency of an adjacent chip inductor, such that no band is generated between the self-resonant frequencies that would cause degradation of the transmission characteristic S21.

図4は、従来の配線基板1Zを各チップインダクタL1,L2,L3で模したバイアス回路8を示す。このバイアス回路8は、特許文献1,2に示される各バイアス回路と同様に、伝送線路4との接続点から最も近い位置に、自己共振周波数が最も大きい後続先頭チップインダクタL1が配置され、その次に、後続先頭チップインダクタL1の次に自己共振周波数が大きい先頭チップインダクタL2、最後尾に自己共振周波数が最も小さい後続チップインダクタL3が配置されて、構成される。 Figure 4 shows a bias circuit 8 that mimics a conventional wiring board 1Z with chip inductors L1, L2, and L3. This bias circuit 8, like the bias circuits shown in Patent Documents 1 and 2, is configured such that the trailing leading chip inductor L1, which has the highest self-resonant frequency, is placed closest to the connection point with the transmission line 4, followed by the leading chip inductor L2, which has the next highest self-resonant frequency after the trailing leading chip inductor L1, and finally the trailing chip inductor L3, which has the lowest self-resonant frequency.

図5は、上記のバイアス回路8によって電源供給される伝送線路4の透過特性S21を示すグラフである。同グラフの横軸は周波数、縦軸は透過特性S21[dB]を表す。また、特性線24は伝送線路4の透過特性S21、破線は、透過特性S21の目標ライン25の一例を示す。特性線24は、同グラフにおいて目標ライン25よりも上に位置することが望まれる。 Figure 5 is a graph showing the transmission characteristic S21 of the transmission line 4 supplied with power by the bias circuit 8 described above. The horizontal axis of the graph represents frequency, and the vertical axis represents the transmission characteristic S21 [dB]. Furthermore, characteristic line 24 represents the transmission characteristic S21 of the transmission line 4, and the dashed line represents an example of a target line 25 for the transmission characteristic S21. It is desirable that characteristic line 24 be located above target line 25 on the graph.

従来のバイアス回路8は、伝送線路4との接続点に近いほど自己共振周波数が大きく、インダクタンスが小さいインダクタを配置する構成になっている。したがって、伝送線路4との接続点に最も近い自己共振周波数が10~30GHzの後続先頭チップインダクタL1は、10GHzより低い周波数の伝搬信号sを通して損失を発生させ、熱に変換してしまう。このため、同グラフに示されるように、伝送線路4の透過特性S21は、10GHzより低い楕円26で示す周波数の帯域において、目標ライン25を下回っている。このため、バイアス回路8は、数MHzから数十GHの超広帯域にわたって伝送線路4の透過特性S21を-0.5dB以上に維持することができない。 The conventional bias circuit 8 is configured to arrange inductors with higher self-resonant frequencies and smaller inductances closer to the connection point with the transmission line 4. Therefore, the trailing leading chip inductor L1, which has a self-resonant frequency of 10 to 30 GHz and is closest to the connection point with the transmission line 4, generates losses through the propagating signal s with a frequency lower than 10 GHz and converts them into heat. For this reason, as shown in the graph, the transmission characteristic S21 of the transmission line 4 is below the target line 25 in the frequency band indicated by the ellipse 26 lower than 10 GHz. For this reason, the bias circuit 8 cannot maintain the transmission characteristic S21 of the transmission line 4 at -0.5 dB or higher over an ultra-wide band from several MHz to several tens of GHz.

しかし、第1の実施形態による配線基板1Aによれば、配線基板1Zで伝送線路4との接続点に最も近い箇所に位置するインダクタ(チップインダクタL1)で損失を発生させていた10GHzより低い周波数帯域の伝搬信号sは、後続先頭チップインダクタL1の次に自己共振周波数が大きい先頭チップインダクタL2の有するインピーダンスによって反射し、バイアス回路3への侵入が阻止される。したがって、損失を発生させていた低い周波数帯域の伝搬信号sは、伝送線路4との接続点に最も近い箇所に位置する先頭チップインダクタL2で損失を発生させなくなる。However, according to the wiring board 1A of the first embodiment, the propagation signal s in the frequency band lower than 10 GHz that was causing loss in the inductor (chip inductor L1) located closest to the connection point with the transmission line 4 on the wiring board 1Z is reflected by the impedance of the leading chip inductor L2, which has the second highest self-resonant frequency after the trailing leading chip inductor L1, and is prevented from entering the bias circuit 3. Therefore, the propagation signal s in the low frequency band that was causing loss no longer causes loss in the leading chip inductor L2 located closest to the connection point with the transmission line 4.

また、後続先頭チップインダクタL1が有する最も大きい自己共振周波数の高周波帯域における伝搬信号sは、先頭インダクタL2を通過して後続先頭チップインダクタL1まで侵入し、図6に示す配線基板1Zの断面図に示すように、先頭チップインダクタL2から後続先頭チップインダクタL1に至る経路で、部品実装面裏面のグランド面1bとの間に生じる寄生容量Cを介して、伝送線路4からグランド面1bへ漏れようとする。なお、図6は、各チップインダクタL1,L2,L3の並びを配線基板1Aと同じにした図4に示す配線基板1ZをVIーVI線で破断して矢視方向から見た断面図である。しかし、配線基板1Aにおけるグランド面1bは、図2(b)に示すように、バイアス回路3が実装される部品実装面部分の裏面に位置する領域1b1の導電部1b2が除去されるので、そのような寄生容量Cの発生が低減され、高周波帯域における伝搬信号sが伝送線路4からグランド面1bへ漏れるのが防がれる。このため、超広帯域にわたって伝送線路4を高い透過特性S21に維持することが可能になる。 In addition, the propagation signal s in the high frequency band of the largest self-resonant frequency of the trailing leading chip inductor L1 passes through the leading inductor L2 and penetrates into the trailing leading chip inductor L1, and as shown in the cross-sectional view of the wiring board 1Z shown in FIG. 6, in the path from the leading chip inductor L2 to the trailing leading chip inductor L1, it tries to leak from the transmission line 4 to the ground surface 1b through the parasitic capacitance C generated between the leading chip inductor L2 and the ground surface 1b on the back side of the component mounting surface. Note that FIG. 6 is a cross-sectional view of the wiring board 1Z shown in FIG. 4, in which the arrangement of each chip inductor L1, L2, and L3 is the same as that of the wiring board 1A, cut along the line VI-VI and viewed from the direction of the arrow. However, in the ground surface 1b in the wiring board 1A, as shown in FIG. 2(b), the conductive portion 1b2 of the area 1b1 located on the back side of the component mounting surface portion on which the bias circuit 3 is mounted is removed, so that the occurrence of such parasitic capacitance C is reduced, and the propagation signal s in the high frequency band is prevented from leaking from the transmission line 4 to the ground surface 1b. This makes it possible to maintain high transmission characteristics S21 of the transmission line 4 over an ultra-wide band.

また、バイアス回路3を構成する各チップインダクタL1,L2,L3は、面実装タイプのチップインダクタによって構成される。したがって、バイアス回路3を構成する各チップインダクタL1,L2,L3は、特許文献1に開示された、伝送路パタンでコニカル構造に形成されるインダクタのように、配線基板1Aに大きな面積を占めることなく実装することができる。したがって、バイアス回路3が実装される部品実装面部分裏面のグランド面1bに位置する導電部除去領域1b1の面積を小さくして、グランド面1bのインピーダンスが高くなるのを抑制することができる。このため、グランド面1bに生じる電位振動などでノイズの問題が発生しなくなる。 In addition, each of the chip inductors L1, L2, and L3 constituting the bias circuit 3 is composed of a surface-mount type chip inductor. Therefore, each of the chip inductors L1, L2, and L3 constituting the bias circuit 3 can be mounted on the wiring board 1A without occupying a large area, like the inductor formed in a conical structure with a transmission line pattern disclosed in Patent Document 1. Therefore, the area of the conductive part removal area 1b1 located on the ground surface 1b on the back side of the component mounting surface portion on which the bias circuit 3 is mounted can be reduced, thereby preventing the impedance of the ground surface 1b from increasing. As a result, noise problems due to potential vibrations generated on the ground surface 1b do not occur.

第1の実施形態による配線基板1Aの上記の効果を確認するため、伝送線路4の透過特性S21を実際に測定した。図7(a)は、この測定に用いた測定基板1A’の部品配置図、図7(b)は測定基板1A’の表面およびその裏面に形成される配線パターン図、図8は、図7(a)に示すVIII-VIII線で測定基板1A’を破断して矢視方向から見た断面図である。なお、これら各図における数値の単位は[mm]である。 To confirm the above-mentioned effects of the wiring board 1A according to the first embodiment, the transmission characteristic S21 of the transmission line 4 was actually measured. Figure 7(a) is a component layout diagram of the measurement board 1A' used in this measurement, Figure 7(b) is a diagram of the wiring patterns formed on the front and back surfaces of the measurement board 1A', and Figure 8 is a cross-sectional view of the measurement board 1A' cut along line VIII-VIII shown in Figure 7(a) and viewed from the direction of the arrows. The numerical values in each of these figures are in mm.

図7(a)に示すように、測定基板1A’は、12mm角の大きさを有し、上端から5mm離れた位置に特性インピーダンス51Ωの伝送線路4がコプレーナ線路として形成されている。伝送線路4は0.20mmの幅を有し、左端が信号入力端4a、右端が信号出力端4bになっている。伝送路4の両脇には、0.1mmの間隔をあけて表層グランド6,6が形成されている。後続チップインダクタL3には1,000Ωの抵抗Rが並列に接続されている。先頭チップインダクタL2および後続先頭チップインダクタL1の中心線は後続チップインダクタL3の中心線に一致しており、各中心線はVIII-VIII線上にある。 As shown in Figure 7 (a), the measurement board 1A' has a size of 12 mm square, and a transmission line 4 with a characteristic impedance of 51 Ω is formed as a coplanar line at a position 5 mm away from the upper end. The transmission line 4 has a width of 0.20 mm, with the left end being the signal input terminal 4a and the right end being the signal output terminal 4b. Surface grounds 6, 6 are formed on both sides of the transmission line 4 with a gap of 0.1 mm. A resistor R of 1,000 Ω is connected in parallel to the trailing chip inductor L3. The center lines of the leading chip inductor L2 and the trailing leading chip inductor L1 coincide with the center line of the trailing chip inductor L3, and each center line is on line VIII-VIII.

図7(b)に示すように、破線で示す各チップインダクタL1,L2,L3は配線パターン5a,5bによって直列に接続される。最後尾の後続チップインダクタL3は、配線パターン5cによって電源に代えて基板グランドに接続される。配線パターン5b,5c間には後続チップインダクタL3を実装するための実装パッド5d,5eが形成され、各実装パッド5d,5eには並列に、抵抗Rを実装するための実装パッド5f,5gが形成される。バイアス回路3の裏面における領域1b1の導電部1b2は除去されている。As shown in Figure 7 (b), chip inductors L1, L2, and L3, indicated by dashed lines, are connected in series by wiring patterns 5a and 5b. The last subsequent chip inductor L3 is connected to the board ground instead of the power supply by wiring pattern 5c. Mounting pads 5d and 5e for mounting the subsequent chip inductor L3 are formed between the wiring patterns 5b and 5c, and mounting pads 5f and 5g for mounting resistors R are formed in parallel to each mounting pad 5d and 5e. The conductive portion 1b2 of area 1b1 on the back surface of the bias circuit 3 has been removed.

図8に示すように、基板裏面のグランド面1b,1c,1dは、0.15mm間隔で3層に設けられている。導電部除去領域1b1は測定基板1A’の最も表面に近い層に形成されている。As shown in Figure 8, the ground planes 1b, 1c, and 1d on the back surface of the board are arranged in three layers with 0.15 mm intervals. The conductive portion removal area 1b1 is formed in the layer closest to the surface of the measurement board 1A'.

図9は、測定基板1A’における伝送線路4の透過特性S21の測定に用いた測定系を示す斜視図である。測定は、Keysight社製ネットワークアナライザ31(型名:N5222A)と、Cascade Microtech社製のプローバー32(型名:SUMMIT9000)と、RFプローブ33(型名:ACP65A-GSG-250)とを用いて行った。ネットワークアナライザ31からRFプローブ33の先端までをOPEN/LOAD/SHORT補正をかけて校正し、測定基板1A’における伝送線路4の両端の入力端子4aおよび出力端子4b間におけるSパラメータを測定した。測定したSパラメータは伝送線路4の部分のディエンベディングを行い、図7(b)に白矢印34で示す、バイアス回路3と伝送線路4との接続部分の透過特性S21のみを取得した。 Figure 9 is a perspective view showing the measurement system used to measure the transmission characteristic S21 of the transmission line 4 in the measurement board 1A'. The measurement was performed using a network analyzer 31 (model: N5222A) manufactured by Keysight, a prober 32 (model: SUMMIT9000) manufactured by Cascade Microtech, and an RF probe 33 (model: ACP65A-GSG-250). The network analyzer 31 to the tip of the RF probe 33 was calibrated by applying OPEN/LOAD/SHORT correction, and the S parameters between the input terminal 4a and the output terminal 4b at both ends of the transmission line 4 in the measurement board 1A' were measured. The measured S parameters were obtained by de-embedding the transmission line 4, and only the transmission characteristic S21 of the connection part between the bias circuit 3 and the transmission line 4, shown by the white arrow 34 in Figure 7 (b), was obtained.

図10(a)は、上記の測定結果を比較例と共に示すグラフである。同グラフの横軸は周波数[Hz]、縦軸は透過特性S21[dB]を表す。また、太い実線で表される特性線41は、測定基板1A’におけるバイアス回路3が、図10(b)に示すように、チップインダクタL2,L1,L3の順に直列に接続されて構成され、裏面グランド1bに導電部除去領域1b1が形成されるときに、上記のようにして測定される伝送線路4の透過特性S21を示す。細い実線で表される特性線42は、測定基板1A’におけるバイアス回路3が、図10(c)に示すように、チップインダクタL2,L1,L3の順に直列に接続されて構成されるが、裏面グランド1bに導電部除去領域1b1が形成されないときに、上記のようにして測定される伝送線路4の透過特性S21を示す。破線で表される特性線43は、測定基板1A’におけるバイアス回路3’が、図10(d)に示すように、チップインダクタL1,L2,L3の順に直列に接続されて構成され、裏面グランド1bに導電部除去領域1b1が形成されないときに、上記のようにして測定される伝送線路4の透過特性S21を示す。 Figure 10(a) is a graph showing the above measurement results together with a comparative example. The horizontal axis of the graph represents frequency [Hz], and the vertical axis represents transmission characteristic S21 [dB]. The characteristic line 41 represented by a thick solid line shows the transmission characteristic S21 of the transmission line 4 measured as described above when the bias circuit 3 in the measurement substrate 1A' is configured by connecting chip inductors L2, L1, and L3 in series in this order as shown in Figure 10(b) and the conductive portion removed area 1b1 is formed on the back ground 1b. The characteristic line 42 represented by a thin solid line shows the transmission characteristic S21 of the transmission line 4 measured as described above when the bias circuit 3 in the measurement substrate 1A' is configured by connecting chip inductors L2, L1, and L3 in series in this order as shown in Figure 10(c), but the conductive portion removed area 1b1 is not formed on the back ground 1b. The dashed characteristic line 43 indicates the transmission characteristic S21 of the transmission line 4 measured as described above when the bias circuit 3' in the measurement substrate 1A' is configured by connecting chip inductors L1, L2, and L3 in series in this order, as shown in FIG. 10(d), and no conductive portion removed area 1b1 is formed in the back-surface ground 1b.

同グラフから、第1の実施形態による配線基板1Aのようにバイアス回路3に伝送線路4が接続されるときにおける、特性線41に表される伝送線路4の透過特性S21は、数MHzから数十GHの超広帯域にわたって目標ライン25を上回って、超広帯域にわたって伝送線路4の透過特性S21を目標値以上に維持することが確認された。 From this graph, it was confirmed that when the transmission line 4 is connected to the bias circuit 3 as in the wiring board 1A of the first embodiment, the transmission characteristic S21 of the transmission line 4 represented by the characteristic line 41 exceeds the target line 25 over an ultra-wide band from several MHz to several tens of GHz, and the transmission characteristic S21 of the transmission line 4 is maintained above the target value over the ultra-wide band.

また、バイアス回路3の裏面に導電部除去領域1b1が形成されないときにおける、特性線42に表される伝送線路4の透過特性S21は、浮遊容量C(図6参照)の影響によって、55GHz付近以上の高周波帯域で目標ライン25を下回り、高周波特性が劣化することが確認された。 In addition, when the conductive portion removal area 1b1 is not formed on the back surface of the bias circuit 3, the transmission characteristic S21 of the transmission line 4 represented by the characteristic line 42 falls below the target line 25 in the high frequency band above about 55 GHz due to the influence of the stray capacitance C (see Figure 6), and it was confirmed that the high frequency characteristics are deteriorated.

また、従来のように自己共振周波数の大きい順に各チップインダクタL1,L2,L3が直列に接続されるときにおける、特性線43に表される伝送線路4の透過特性S21は、図5を用いた従来技術の課題で説明したように、10GHz以下の低周波帯域で目標ライン25を下回り、低周波特性が劣化することが確認された。これは、自己共振周波数が10~30GHzのチップインダクタL1は1~10GHzのインピーダンスが低いため(図3参照)、この1~10GHzの周波数帯域の伝搬信号sを通過させてしまうことによる。このときチップインダクタL1の損失によって、この1~10GHzの周波数帯域の伝搬信号sは熱に変換されてしまうため、チップインダクタL1を伝送線路4との接続点直近に配置した場合、伝送線路4の透過特性S21はこの低い周波数帯域において低下してしまう。 In addition, when the chip inductors L1, L2, and L3 are connected in series in descending order of self-resonant frequency as in the conventional case, the transmission characteristic S21 of the transmission line 4 represented by the characteristic line 43 falls below the target line 25 in the low frequency band of 10 GHz or less, as explained in the problem of the conventional technology using FIG. 5, and it was confirmed that the low frequency characteristic is deteriorated. This is because the chip inductor L1, which has a self-resonant frequency of 10 to 30 GHz, has a low impedance of 1 to 10 GHz (see FIG. 3), and passes the propagation signal s in this 1 to 10 GHz frequency band. At this time, the propagation signal s in this 1 to 10 GHz frequency band is converted into heat due to the loss of the chip inductor L1, so if the chip inductor L1 is placed immediately adjacent to the connection point with the transmission line 4, the transmission characteristic S21 of the transmission line 4 will decrease in this low frequency band.

このため、本実施形態では、1~10GHzに自己共振周波数の周波数帯域を持つ先頭チップインダクタL2を後続先頭チップインダクタL1の前段、つまり、伝送線路4との接続点の直近に配置し、この周波数帯域の伝搬信号sを後続先頭チップインダクタL1に到達させないようにしている。このとき、後続先頭チップインダクタL1を伝送線路4から離して配置するため、伝送線路4との接続点から後続先頭チップインダクタL1までの間に高周波の伝搬信号sに干渉する寄生容量Cが発生しやすくなる。この寄生容量Cにより、伝送線路4とバイアス回路3との接続点の特性インピーダンスが低下して、伝送線路4の透過特性S21が劣化してしまう。このため、本実施形態では、バイアス回路3の裏面のグランド面1bにおける領域1b1を削除することで、寄生容量Cの発生を低減させ、透過特性S21を維持させている。For this reason, in this embodiment, the leading chip inductor L2, which has a self-resonant frequency band of 1 to 10 GHz, is placed in front of the trailing leading chip inductor L1, that is, immediately adjacent to the connection point with the transmission line 4, so that the propagation signal s of this frequency band does not reach the trailing leading chip inductor L1. At this time, since the trailing leading chip inductor L1 is placed away from the transmission line 4, a parasitic capacitance C that interferes with the high-frequency propagation signal s is likely to occur between the connection point with the transmission line 4 and the trailing leading chip inductor L1. This parasitic capacitance C reduces the characteristic impedance of the connection point between the transmission line 4 and the bias circuit 3, deteriorating the transmission characteristic S21 of the transmission line 4. For this reason, in this embodiment, the region 1b1 on the ground surface 1b on the back side of the bias circuit 3 is deleted to reduce the occurrence of the parasitic capacitance C and maintain the transmission characteristic S21.

これらの測定結果から、第1の実施形態による配線基板1Aの有効性が確認された。すなわち、第1の実施形態による配線基板1Aによれば、超広帯域にわたって伝送線路4を高い透過特性S21に維持することが可能で、しかも、グランド面1bに生じる電位振動などでノイズの問題が発生することのないバイアス回路3を配線基板1Aに実装できるようになる。These measurement results confirmed the effectiveness of the wiring board 1A according to the first embodiment. That is, the wiring board 1A according to the first embodiment makes it possible to maintain the transmission line 4 at a high transmission characteristic S21 over an ultra-wide band, and also makes it possible to mount a bias circuit 3 on the wiring board 1A that does not cause noise problems due to potential oscillations on the ground surface 1b.

図11は、本発明の第2の実施形態による広帯域伝送線路配線基板1Bの断面図である。 Figure 11 is a cross-sectional view of a wideband transmission line wiring board 1B according to a second embodiment of the present invention.

この配線基板1Bは、基板裏面のグランド面が、部品実装面1aに最も近い層面を含む複数の層面において、バイアス回路3が実装される部品実装面部分の裏面に位置する領域の導電部が除去される。例えば、図示するように、部品実装面1aに最も近い層面のグランド面1bにおける、バイアス回路3が実装される部品実装面部分の裏面に位置する領域1b1の導電部1b2が除去されると共に、部品実装面1aに次に近い層面のグランド面1cにおける、バイアス回路3が実装される部品実装面部分の裏面に位置する領域1c1の導電部1c2が除去される。In this wiring board 1B, the ground surface on the back side of the board has the conductive portion removed from the back side of the component mounting surface portion on which the bias circuit 3 is mounted on multiple layer surfaces, including the layer surface closest to the component mounting surface 1a. For example, as shown in the figure, the conductive portion 1b2 of the region 1b1 located on the back side of the component mounting surface portion on which the bias circuit 3 is mounted on the ground surface 1b of the layer surface closest to the component mounting surface 1a is removed, and the conductive portion 1c2 of the region 1c1 located on the back side of the component mounting surface portion on which the bias circuit 3 is mounted on the ground surface 1c of the layer surface next closest to the component mounting surface 1a is removed.

この第2の実施形態によるバイアス回路3を備える配線基板1Bによれば、バイアス回路3が実装される部品実装面1aに最も近い層面を含む複数の層面において、バイアス回路3が実装される部品実装面部分の裏面に位置する例えば領域1b1、1c1の導電部1b2、1c2が除去されるので、先頭インダクタL2から後続先頭チップインダクタL1に至る経路で、部品実装面裏面の各層面における例えばグランド面1b、1cとの間に生じる寄生容量Cが低減される。このため、寄生容量Cの大きさがさらに抑制されて、高周波帯域における伝搬信号sの伝送線路4から例えばグランド面1b、1cへの漏れが、より効果的に防がれる。よって、高周波帯域における伝送線路4の透過特性S21をより高めることが可能になる。According to the wiring board 1B equipped with the bias circuit 3 according to the second embodiment, the conductive parts 1b2, 1c2 of the regions 1b1, 1c1 located on the back side of the component mounting surface portion on which the bias circuit 3 is mounted are removed on multiple layer surfaces including the layer surface closest to the component mounting surface 1a on which the bias circuit 3 is mounted, so that the parasitic capacitance C generated between, for example, the ground surfaces 1b, 1c on each layer surface on the back side of the component mounting surface is reduced on the path from the leading inductor L2 to the trailing leading chip inductor L1. Therefore, the magnitude of the parasitic capacitance C is further suppressed, and the leakage of the propagation signal s in the high frequency band from the transmission line 4 to, for example, the ground surfaces 1b, 1c is more effectively prevented. Therefore, it is possible to further improve the transmission characteristic S21 of the transmission line 4 in the high frequency band.

図12は、本発明の第3の実施形態による広帯域伝送線路配線基板1Cの断面図、図13は配線基板1Cの表面およびその裏面に形成される配線パターン図である。 Figure 12 is a cross-sectional view of a wideband transmission line wiring board 1C according to a third embodiment of the present invention, and Figure 13 is a diagram of the wiring patterns formed on the front and back surfaces of the wiring board 1C.

この配線基板1Cは、基板裏面のグランド面が、バイアス回路3が実装される部品実装面部分のうちの、先頭チップインダクタL2から後続先頭チップインダクタL1が実装される箇所までの部品実装面部分裏面に位置する領域1b3だけの導電部1b2が除去される。In this wiring board 1C, the ground surface on the back side of the board is removed, and only the conductive portion 1b2 in the area 1b3 located on the back side of the component mounting surface portion where the bias circuit 3 is mounted, from the leading chip inductor L2 to the point where the trailing leading chip inductor L1 is mounted, is removed.

この第3の実施形態による配線基板1Cによれば、寄生容量Cの発生を低減させるためにグランド面の導電部が除去される領域は、先頭チップインダクタL2から後続先頭チップインダクタL1が実装される箇所までの部品実装面部分の裏面に位置する領域だけに限定される。これは、高周波帯域における透過特性S21の劣化は、伝送線路4とバイアス回路3との接続点から後続先頭チップインダクタL1までの間に発生する寄生容量Cが、特性インピーダンスを低下させることに起因するからである。このため、裏面グランドの削除領域を接続点から後続先頭チップインダクタL1までに絞っても、高周波領域の透過特性劣化を抑制する効果は大きく損なわれることはない。According to the wiring board 1C of the third embodiment, the area where the conductive part of the ground surface is removed to reduce the occurrence of parasitic capacitance C is limited to only the area located on the back side of the component mounting surface from the leading chip inductor L2 to the location where the trailing leading chip inductor L1 is mounted. This is because the deterioration of the transmission characteristic S21 in the high frequency band is caused by the parasitic capacitance C that occurs between the connection point of the transmission line 4 and the bias circuit 3 and the trailing leading chip inductor L1, which reduces the characteristic impedance. Therefore, even if the removal area of the back ground is narrowed down to the area from the connection point to the trailing leading chip inductor L1, the effect of suppressing the deterioration of the transmission characteristic in the high frequency band is not significantly impaired.

第3の実施形態による配線基板1Cによれば、バイアス回路3が実装される部品実装面部分裏面のグランド面1bに位置する導電部除去領域1b3の面積をより小さくして、グランド面1bのインピーダンスが高くなるのをさらに抑制することができる。よって、グランド面1bの面内を交流電流が流れた際の電流振幅とグランドインピーダンスとの積で求められる、グランド面1bに生じる電位振動などで、ノイズの問題が発生するのを最小限に抑制することができる。According to the wiring board 1C of the third embodiment, the area of the conductive portion removal region 1b3 located on the ground surface 1b on the back side of the component mounting surface portion on which the bias circuit 3 is mounted can be further reduced, thereby further suppressing an increase in the impedance of the ground surface 1b. This makes it possible to minimize the occurrence of noise problems due to potential oscillations occurring on the ground surface 1b, which are calculated by the product of the current amplitude and the ground impedance when an AC current flows through the ground surface 1b.

1,1A,1B,1C…配線基板
1a…部品実装面
1b,1c,1d…グランド面
1b1,1c1,1b3…領域
1b2,1c2…導電部
2…IC
3…バイアス回路
4…伝送線路
5a,5b,5n-1,5n…配線パターン
5d,5e,5f,5g…実装パッド
6…表層グランド
7…スルーホール
L1…後続先頭チップインダクタ
L2…先頭チップインダクタ
L3,Ln…後続チップインダクタ
1, 1A, 1B, 1C... Wiring board 1a... Component mounting surface 1b, 1c, 1d... Ground surface 1b1, 1c1, 1b3... Area 1b2, 1c2... Conductive part 2... IC
3: Bias circuit 4: Transmission line 5a, 5b, 5n-1, 5n: Wiring patterns 5d, 5e, 5f, 5g: Mounting pads 6: Surface ground 7: Through hole L1: Subsequent leading chip inductor L2: Leading chip inductor L3, Ln: Subsequent chip inductor

Claims (4)

部品実装面に形成される高周波信号が伝搬する伝送線路と、
前記部品実装面で前記伝送線路との接続点に最も近い箇所において前記伝送線路に一端が接続されて前記部品実装面に実装される先頭チップインダクタ、および、前記接続点に2番目に近い箇所から前記先頭チップインダクタに直列に接続されて前記部品実装面に実装され、最後に直列に接続される最後尾のものが直流電源に接続される複数の後続チップインダクタから構成され、自己共振周波数が、前記接続点に2番目に近い箇所において前記先頭チップインダクタの次に接続される前記後続チップインダクタの中の後続先頭チップインダクタが最も大きく、前記先頭チップインダクタが前記後続先頭チップインダクタの次に大きく、前記後続先頭チップインダクタに後続する前記後続チップインダクタが前記先頭チップインダクタと同じかまたは前記先頭チップインダクタより順次小さく設定されるバイアス回路と、
前記部品実装面の裏面に形成され、前記バイアス回路が実装される部品実装面部分の裏面に位置する領域の導電部が除去されるグランド面と
を備える広帯域伝送線路配線基板。
a transmission line formed on the component mounting surface through which a high frequency signal propagates;
a bias circuit including a first chip inductor having one end connected to the transmission line at a location on the component mounting surface closest to a connection point with the transmission line and mounted on the component mounting surface, and a plurality of subsequent chip inductors connected in series to the first chip inductor from a location second closest to the connection point and mounted on the component mounting surface, the last one connected in series being connected to a DC power source, the self-resonant frequency of the subsequent first chip inductor among the subsequent chip inductors connected next to the first chip inductor at the location second closest to the connection point being the largest, the first chip inductor being the second largest after the subsequent first chip inductor, and the subsequent chip inductors following the subsequent first chip inductor being set to the same frequency as the first chip inductor or successively smaller frequencies than the first chip inductor;
a ground surface formed on a rear surface of the component mounting surface, the ground surface being formed by removing a conductive portion in an area located on the rear surface of the component mounting surface on which the bias circuit is mounted.
前記グランド面は、前記部品実装面に最も近い層面を含む複数の層面において、前記バイアス回路が実装される部品実装面部分の裏面に位置する領域の導電部が除去されることを特徴とする請求項1に記載の広帯域伝送線路配線基板。 The wideband transmission line wiring board according to claim 1, characterized in that the ground plane is formed by removing conductive portions in an area located on the back side of the component mounting surface on which the bias circuit is mounted, on a plurality of layer surfaces including the layer surface closest to the component mounting surface. 前記グランド面は、前記バイアス回路が実装される部品実装面部分のうちの、前記先頭チップインダクタから前記後続先頭チップインダクタが実装される箇所までの部品実装面部分の裏面に位置する領域だけの導電部が除去されることを特徴とする請求項1に記載の広帯域伝送線路配線基板。 The broadband transmission line wiring board according to claim 1, characterized in that the ground plane is removed from the conductive portion only in the area located on the back side of the component mounting surface portion on which the bias circuit is mounted, from the first chip inductor to the location where the subsequent first chip inductor is mounted. 前記バイアス回路は、前記先頭チップインダクタおよび前記後続チップインダクタのうちの少なくとも1つに並列に抵抗が接続されることを特徴とする請求項1から請求項3のいずれか1項に記載の広帯域伝送線路配線基板。 A wideband transmission line wiring board as described in any one of claims 1 to 3, characterized in that the bias circuit has a resistor connected in parallel to at least one of the leading chip inductor and the trailing chip inductor.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008047711A (en) 2006-08-16 2008-02-28 Fujitsu Ltd Inductor wiring board, inductor wiring method, and bias T circuit
JP2018061104A (en) 2016-10-04 2018-04-12 株式会社村田製作所 Bias T circuit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008047711A (en) 2006-08-16 2008-02-28 Fujitsu Ltd Inductor wiring board, inductor wiring method, and bias T circuit
JP2018061104A (en) 2016-10-04 2018-04-12 株式会社村田製作所 Bias T circuit

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