JP7528526B2 - Cleaning Method - Google Patents
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- JP7528526B2 JP7528526B2 JP2020082367A JP2020082367A JP7528526B2 JP 7528526 B2 JP7528526 B2 JP 7528526B2 JP 2020082367 A JP2020082367 A JP 2020082367A JP 2020082367 A JP2020082367 A JP 2020082367A JP 7528526 B2 JP7528526 B2 JP 7528526B2
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Description
本発明は、洗浄方法に関する。より詳細には、本発明は、医療機器等の洗浄方法に関する。 The present invention relates to a cleaning method. More specifically, the present invention relates to a cleaning method for medical equipment, etc.
従来、医療機器の殺菌・洗浄には、酸性やアルカリ性の薬品が使用されている。しかしながら、酸性やアルカリ性の薬品が使用されるために、その廃液が下水排除基準を満たさないまま排水されて、コンクリート製の下水道管が損傷している例が後を絶たない。下水道管の損傷は、下水への排水ができなくなると共に、道路陥没を引き起こす可能性もあり、早急な対応が必要である。このような背景のもと、東京都下水道局は、２０１９年１月に、透析排水と下水道管についての注意喚起を発表した。東京都下水道局では、排水についての下水排除基準を水素イオン濃度（ｐＨ）が５を超え９未満の範囲内に収めることを求めている。 Traditionally, acidic or alkaline chemicals have been used to sterilize and clean medical equipment. However, because acidic or alkaline chemicals are used, waste liquid is discharged without meeting the sewage discharge standards, causing damage to concrete sewer pipes in a continuous stream. Damage to sewer pipes not only makes it impossible to drain water into the sewer system, but can also cause roads to collapse, so immediate action is required. In light of this, the Tokyo Metropolitan Government Bureau of Sewerage issued a warning about dialysis wastewater and sewer pipes in January 2019. The Tokyo Metropolitan Government Bureau of Sewerage requires that the sewage discharge standard for wastewater be within the range of hydrogen ion concentration (pH) greater than 5 and less than 9.
医療機器の殺菌・洗浄に用いる殺菌及び洗浄用過酢酸組成物としては、酸性の過酢酸水溶液（特許文献１）、アルミニウム腐食抑制性の酸性酸化剤含有組成物（特許文献２）、アルカリ性の殺菌洗浄用製剤（特許文献３）、スルファミン酸及び有機カルボン酸を含む薬剤（特許文献４）、次亜塩素酸ナトリウム等を含む塩素系の薬剤（特許文献５）などが知られている。しかしながら、これらの組成物は、必ずしも排水についての下水排除基準を満たすものとは言えない。 Known peracetic acid compositions for sterilization and cleaning used in sterilizing and cleaning medical equipment include an acidic aqueous solution of peracetic acid (Patent Document 1), an acidic oxidizing agent-containing composition that inhibits aluminum corrosion (Patent Document 2), an alkaline sterilizing and cleaning preparation (Patent Document 3), an agent containing sulfamic acid and an organic carboxylic acid (Patent Document 4), and a chlorine-based agent containing sodium hypochlorite or the like (Patent Document 5). However, these compositions do not necessarily meet the sewage discharge standards for wastewater.
また、医療機器等の殺菌・洗浄においては、殺菌と共に、タンパク質除去やスケール除去も必要とされる。医療機器等の殺菌・洗浄においてこれらの全ての効果を十分に達成することができる薬剤および洗浄方法はこれまで開発されていない。よって、排水が下水排除基準を満たしつつ、殺菌と共に、タンパク質除去やスケール除去も効果的に行うことができる洗浄方法の開発が依然として望まれている。 In addition, when sterilizing and cleaning medical equipment, etc., protein removal and scale removal are also required in addition to sterilization. No chemicals or cleaning methods have been developed to date that can fully achieve all of these effects in the sterilization and cleaning of medical equipment, etc. Therefore, there is still a need to develop a cleaning method that can effectively remove protein and scale as well as sterilize while ensuring that wastewater meets sewage discharge standards.
排水が下水排除基準を満たしつつ、殺菌と共に、タンパク質除去やスケール除去も効果的に行うことができる洗浄方法の開発が求められている。 There is a need to develop a cleaning method that can effectively remove proteins and scales as well as sterilize wastewater while still allowing it to meet sewage disposal standards.
本発明者らは、鋭意検討を重ねた結果、排水が下水排除基準を満たしつつ、殺菌と共に、タンパク質除去やスケール除去も効果的に行うことができる洗浄方法を提供することができることを見出した。 As a result of extensive research, the inventors have discovered that it is possible to provide a cleaning method that can effectively remove proteins and scales as well as sterilize wastewater while still allowing the wastewater to meet sewage disposal standards.
すなわち、本発明は、下記の実施形態を含む。 That is, the present invention includes the following embodiments:
＜１＞
第１の洗浄用組成物を用いて洗浄する第１の洗浄工程と、
第２の洗浄用組成物を用いて洗浄する第２の洗浄工程と、
を代わる代わる実施することを含む、洗浄方法であって、
前記第１の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
前記第２の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
第１の洗浄用組成物と第２の洗浄用組成物とは、異なる組成物であり、
前記第１の洗浄用組成物及び前記第２の洗浄用組成物のｐＨ値は、それぞれ独立して４．０～１０．０である、洗浄方法。
＜２＞
前記酸が、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩からなる群より選択される１種以上を含む、＜１＞に記載の洗浄方法。
＜３＞
前記過有機酸及び／又はその塩が０．００１～０．１質量％の量で含まれる、＜２＞に記載の洗浄方法。
＜４＞
前記次亜塩素酸及び／又はその塩が０．００２～０．１質量％の量で含まれる、＜２＞に記載の洗浄方法。
＜５＞
前記有機酸及び／又はその塩が０．０２～１０質量％の量で含まれる、＜２＞に記載の洗浄方法。
＜６＞
前記有機酸が、下記式：
ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
で表され、式中、
Ｒは、Ｈ、ＯＨ及び炭素数１～７のアルキル基から選択され、
ｐは、０～２の整数であり、
ｑは、０～１の整数であり、
ｒは、０～２の整数であり、
ｐ＋ｑ＋ｒ＝２を満たす、
＜５＞に記載の洗浄方法。
＜７＞
前記有機酸が、酢酸、クエン酸、リンゴ酸、乳酸、及びオクタン酸からなる群より選択される１種以上である、＜６＞に記載の洗浄方法。
＜８＞
前記酸が、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩からなる群より選択される１種以上を含み、
過有機酸及び／又はその塩を０．００１～０．１質量％、次亜塩素酸及び／又はその塩を０．００２～０．１質量％、有機酸及び／又はその塩を０．０２～１０質量％の量で含む、＜１＞～＜７＞のいずれかに記載の洗浄方法。
＜９＞
前記第１の洗浄工程の後、及び／又は前記第２の洗浄工程の後に水で洗浄する工程をさらに含む、＜１＞～＜８＞のいずれかに記載の洗浄方法。
＜１０＞
洗浄対象物が、医療用器具及び／又は配管である、＜１＞～＜９＞のいずれかに記載の洗浄方法。
＜１１＞
前記洗浄方法が、浸漬法、噴霧法、塗布法、通液法、循環法、及び封入法から選択される方法を用いて実施される、＜１０＞に記載の洗浄方法。
＜１２＞
洗浄後の廃液を処理することなくそのまま配管に流すことをさらに含む、＜１０＞又は＜１１＞に記載の洗浄方法。
＜１３＞
前記医療用器具が、透析用器具である、＜１０＞～＜１２＞のいずれかに記載の洗浄方法。
＜1＞
a first cleaning step of cleaning with a first cleaning composition;
A second cleaning step of cleaning with a second cleaning composition;
A cleaning method comprising alternately carrying out
The first cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover,
The second cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover;
The first cleaning composition and the second cleaning composition are different compositions,
The cleaning method, wherein the pH value of the first cleaning composition and the second cleaning composition is independently 4.0 to 10.0.
＜2＞
The cleaning method according to <1>, wherein the acid includes at least one selected from the group consisting of a peroxy acid and/or a salt thereof, a hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof.
＜3＞
The cleaning method according to <2>, wherein the peroxy acid and/or salt thereof is contained in an amount of 0.001 to 0.1 mass %.
＜4＞
The cleaning method according to <2>, wherein the hypochlorous acid and/or a salt thereof is contained in an amount of 0.002 to 0.1 mass%.
＜5＞
The cleaning method according to <2>, wherein the organic acid and/or salt thereof is contained in an amount of 0.02 to 10 mass %.
＜6＞
The organic acid has the following formula:
RCH p (OH) q (CH 2 COOH) r COOH
In the formula:
R is selected from H, OH, and an alkyl group having 1 to 7 carbon atoms;
p is an integer from 0 to 2,
q is an integer from 0 to 1;
r is an integer from 0 to 2;
p+q+r=2 is satisfied.
The cleaning method according to <5>.
＜７＞
The cleaning method according to <6>, wherein the organic acid is at least one selected from the group consisting of acetic acid, citric acid, malic acid, lactic acid, and octanoic acid.
＜8＞
The acid includes at least one selected from the group consisting of a peroxy acid and/or a salt thereof, a hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof;
The cleaning method according to any one of <1> to <7>, wherein the cleaning agent contains a perorganic acid and/or a salt thereof in an amount of 0.001 to 0.1 mass%, a hypochlorous acid and/or a salt thereof in an amount of 0.002 to 0.1 mass%, and an organic acid and/or a salt thereof in an amount of 0.02 to 10 mass%.
＜9＞
The cleaning method according to any one of <1> to <8>, further comprising a step of cleaning with water after the first cleaning step and/or after the second cleaning step.
＜10＞
The cleaning method according to any one of <1> to <9>, wherein the object to be cleaned is a medical instrument and/or a pipe.
<11>
The cleaning method according to <10>, wherein the cleaning is carried out by using a method selected from a dipping method, a spraying method, a coating method, a liquid passing method, a circulation method, and an encapsulation method.
＜12＞
The cleaning method according to <10> or <11>, further comprising discharging waste liquid after cleaning directly into a pipe without treating it.
＜13＞
The cleaning method according to any one of <10> to <12>, wherein the medical instrument is a dialysis instrument.
本発明によれば、排水が下水排除基準を満たしつつ、殺菌と共に、タンパク質除去やスケール除去も効果的に行うことができる洗浄方法を提供することができる。本発明の洗浄方法は、排水のｐＨ値が下水排除基準を満たすため、使用後の廃液を中和処理する必要なく排水することができる。 The present invention provides a cleaning method that can effectively remove proteins and scales as well as sterilize wastewater while still allowing the wastewater to meet sewage removal standards. The cleaning method of the present invention allows wastewater to be discharged after use without the need for neutralization treatment, because the pH value of the wastewater meets the sewage removal standards.
１．本発明の洗浄方法
本発明の洗浄方法は、
第１の洗浄用組成物を用いて洗浄する第１の洗浄工程と、
第２の洗浄用組成物を用いて洗浄する第２の洗浄工程と、
を代わる代わる実施することを含む。本発明の上記洗浄方法において、
前記第１の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含むものであってよく、
前記第２の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含むものであってよく、
第１の洗浄用組成物と第２の洗浄用組成物とは、異なる組成物である。
1. The cleaning method of the present invention comprises the steps of:
a first cleaning step of cleaning with a first cleaning composition;
A second cleaning step of cleaning with a second cleaning composition;
In the above cleaning method of the present invention,
The first cleaning composition may include at least one selected from the group consisting of an acid, a bactericide, and a protein remover,
The second cleaning composition may include at least one selected from the group consisting of an acid, a bactericide, and a protein remover,
The first cleaning composition and the second cleaning composition are different compositions.
本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物は、そのｐＨ値がそれぞれ独立して４．０～１０．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、例えば、４．０、４．５、５．０、５．１、５．２、５．３、５．４、５．５、５．６、５．７、５．８、５．９、６．０、６．５、７．０、７．５、８．０，８．５、９．０，９．５、１０．０などであってよいが、これらの値に限定されない。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、例えば、４．０～１０．０、４．０～９．５、４．０～９．０、４．０～８．５、４．０～８．０、４．０～７．５、４．０～７．０、４．０～６．５、４．０～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、４．５～１０．０、４．５～９．５、４．５～９．０、４．５～８．５、４．５～８．０、４．５～７．５、４．５～７．０、４．５～６．５、４．５～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．０～１０．０、５．０～９．５、５．０～９．０、５．０～８．５、５．０～８．０、５．０～７．５、５．０～７．０、５．０～６．５、５．０～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．１～１０．０、５．１～９．５、５．１～９．０、５．１～８．５、５．１～８．０、５．１～７．５、５．１～７．０、５．１～６．５、５．１～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．２～１０．０、５．２～９．５、５．２～９．０、５．２～８．５、５．２～８．０、５．２～７．５、５．２～７．０、５．２～６．５、５．２～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．３～１０．０、５．３～９．５、５．３～９．０、５．３～８．５、５．３～８．０、５．３～７．５、５．３～７．０、５．３～６．５、５．３～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．４～１０．０、５．４～９．５、５．４～９．０、５．４～８．５、５．４～８．０、５．４～７．５、５．４～７．０、５．４～６．５、５．４～６．０であってよい。本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．５～１０．０、５．５～９．５、５．５～９．０、５．５～８．５、５．５～８．０、５．５～７．５、５．５～７．０、５．５～６．５、５．５～６．０であってよい。本発明の好ましい実施形態において、殺菌及び洗浄用組成物のｐＨ値は、５．０～９．０である。本発明の好ましい実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５．０超である。本発明の好ましい実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５超１０以下である。本発明の好ましい別の実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値はそれぞれ独立して、５超９以下である。 In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 4.0 to 10.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 4.0, 4.5, 5.0, 5.1, 5.2, 5.3, 5.4, 5.5, 5.6, 5.7, 5.8, 5.9, 6.0, 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5, 10.0, etc., but are not limited to these values. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be, for example, 4.0 to 10.0, 4.0 to 9.5, 4.0 to 9.0, 4.0 to 8.5, 4.0 to 8.0, 4.0 to 7.5, 4.0 to 7.0, 4.0 to 6.5, or 4.0 to 6.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be, for example, 4.5 to 10.0, 4.5 to 9.5, 4.5 to 9.0, 4.5 to 8.5, 4.5 to 8.0, 4.5 to 7.5, 4.5 to 7.0, 4.5 to 6.5, or 4.5 to 6.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 5.0 to 10.0, 5.0 to 9.5, 5.0 to 9.0, 5.0 to 8.5, 5.0 to 8.0, 5.0 to 7.5, 5.0 to 7.0, 5.0 to 6.5, or 5.0 to 6.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 5.1 to 10.0, 5.1 to 9.5, 5.1 to 9.0, 5.1 to 8.5, 5.1 to 8.0, 5.1 to 7.5, 5.1 to 7.0, 5.1 to 6.5, or 5.1 to 6.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 5.2 to 10.0, 5.2 to 9.5, 5.2 to 9.0, 5.2 to 8.5, 5.2 to 8.0, 5.2 to 7.5, 5.2 to 7.0, 5.2 to 6.5, or 5.2 to 6.0. In one embodiment of the present invention, the pH values of the first cleaning composition and the second cleaning composition may be independently 5.3 to 10.0, 5.3 to 9.5, 5.3 to 9.0, 5.3 to 8.5, 5.3 to 8.0, 5.3 to 7.5, 5.3 to 7.0, 5.3 to 6.5, or 5.3 to 6.0. In one embodiment of the present invention, the pH value of the first cleaning composition and the second cleaning composition may be independently 5.4 to 10.0, 5.4 to 9.5, 5.4 to 9.0, 5.4 to 8.5, 5.4 to 8.0, 5.4 to 7.5, 5.4 to 7.0, 5.4 to 6.5, 5.4 to 6.0. In one embodiment of the present invention, the pH value of the first cleaning composition and the second cleaning composition may be independently 5.5 to 10.0, 5.5 to 9.5, 5.5 to 9.0, 5.5 to 8.5, 5.5 to 8.0, 5.5 to 7.5, 5.5 to 7.0, 5.5 to 6.5, 5.5 to 6.0. In a preferred embodiment of the present invention, the pH value of the sterilization and cleaning composition is 5.0 to 9.0. In a preferred embodiment of the present invention, the pH value of the first cleaning composition and the second cleaning composition is independently greater than 5.0. In a preferred embodiment of the present invention, the pH value of the first cleaning composition and the second cleaning composition is independently greater than 5 and equal to or less than 10. In another preferred embodiment of the present invention, the pH value of the first cleaning composition and the second cleaning composition is independently greater than 5 and equal to or less than 9.
本発明の一実施形態において、上記の洗浄方法は、
第１の洗浄用組成物を用いて洗浄する第１の洗浄工程と、
第２の洗浄用組成物を用いて洗浄する第２の洗浄工程と、
を代わる代わる実施することを含む、洗浄方法であって、
前記第１の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
前記第２の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
第１の洗浄用組成物と第２の洗浄用組成物とは、異なる組成物であり、
前記第１の洗浄用組成物及び前記第２の洗浄用組成物のｐＨ値は、それぞれ独立して４．０～１０．０である、洗浄方法であってよい。
In one embodiment of the present invention, the above cleaning method comprises:
a first cleaning step of cleaning with a first cleaning composition;
A second cleaning step of cleaning with a second cleaning composition;
A cleaning method comprising alternately carrying out
The first cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover,
The second cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover;
The first cleaning composition and the second cleaning composition are different compositions,
The cleaning method may be such that the first cleaning composition and the second cleaning composition each independently have a pH value of 4.0 to 10.0.
本発明の一実施形態において、上記の洗浄方法は、前記第１の洗浄工程の後、及び／又は前記第２の洗浄工程の後に、水で洗浄する工程をさらに含んでよい。本発明のこの実施形態において、本発明の洗浄方法は、前記第１の洗浄工程の後に、水で洗浄する工程をさらに含み得る。また、本発明のこの実施形態において、本発明の洗浄方法は、前記第２の洗浄工程の後に、水で洗浄する工程をさらに含み得る。本発明の好ましい実施形態において、本発明の洗浄方法は、前記第１の洗浄工程の後に水で洗浄する工程をさらに含み、前記第２の洗浄工程の後に水で洗浄する工程をさらに含み得る。 In one embodiment of the present invention, the above-mentioned cleaning method may further include a step of cleaning with water after the first cleaning step and/or after the second cleaning step. In this embodiment of the present invention, the cleaning method of the present invention may further include a step of cleaning with water after the first cleaning step. Also, in this embodiment of the present invention, the cleaning method of the present invention may further include a step of cleaning with water after the second cleaning step. In a preferred embodiment of the present invention, the cleaning method of the present invention may further include a step of cleaning with water after the first cleaning step and may further include a step of cleaning with water after the second cleaning step.
本発明の一実施形態において、上記の洗浄方法は、洗浄後の廃液を処理することなくそのまま配管に流すことをさらに含んでよい。上述のように、上記第１の洗浄用組成物及び上記第２の洗浄用組成物のｐＨ値は、それぞれ独立して４．０～１０．０であるから、本発明の洗浄方法は、排水のｐＨ値が下水排除基準を満たすため、使用後の廃液を中和処理する必要なく排水することができる。 In one embodiment of the present invention, the above cleaning method may further include discharging the wastewater after cleaning directly into a pipe without treating it. As described above, the pH values of the first cleaning composition and the second cleaning composition are each independently 4.0 to 10.0, so that the pH value of the wastewater satisfies the sewage discharge standard in the cleaning method of the present invention, and therefore the wastewater after use can be discharged without the need for neutralization treatment.
本発明の洗浄方法において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物は、洗浄剤原液を希釈することなくそのまま用いるか、あるいは任意の濃度に希釈して、例えば、医療用器具、配管、飲料食品容器、工業排水、空調設備の冷却水、衣類、調理器具、食器、浴室、台所、洗濯槽、風呂釜、家具、ペットの殺菌、洗浄等に用いることができる。本発明の好ましい実施形態において、本発明の洗浄方法における洗浄対象物は、医療用器具及び／又は配管であってよい。 In the cleaning method of the present invention, the first cleaning composition and the second cleaning composition can be used as is without diluting the original cleaner solution, or diluted to any concentration, and used for sterilizing and cleaning, for example, medical instruments, piping, beverage and food containers, industrial wastewater, cooling water for air conditioning equipment, clothes, cooking utensils, tableware, bathrooms, kitchens, washing machines, bath heaters, furniture, and pets. In a preferred embodiment of the present invention, the object to be cleaned in the cleaning method of the present invention may be medical instruments and/or piping.
本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物を用いて代わる代わる洗浄する工程を含む、医療用器具の殺菌及び洗浄方法が提供される。本発明の洗浄方法において、上記の第１の洗浄用組成物を用いて洗浄する第１の洗浄工程、及び上記の第２の洗浄用組成物を用いて洗浄する第２の洗浄工程は、それぞれ独立して、浸漬法、噴霧法、塗布法、通液法、循環法、及び封入法のいずれであってもよい。本発明の洗浄方法において、用いる洗浄用組成物の量、希釈率や、洗浄する時間は、微生物の種類や量、洗浄用組成物の濃度などに従って、適宜選択することができる。 In one embodiment of the present invention, a method for sterilizing and cleaning a medical instrument is provided, which includes a step of alternately cleaning with the above-mentioned first cleaning composition and the above-mentioned second cleaning composition. In the cleaning method of the present invention, the first cleaning step of cleaning with the above-mentioned first cleaning composition and the second cleaning step of cleaning with the above-mentioned second cleaning composition may each independently be any of the immersion method, spray method, coating method, liquid passing method, circulation method, and encapsulation method. In the cleaning method of the present invention, the amount of the cleaning composition used, the dilution rate, and the cleaning time can be appropriately selected according to the type and amount of microorganisms, the concentration of the cleaning composition, etc.
本発明の洗浄方法において、前記医療用器具としては、透析用器具、内視鏡用器具、外科手術器具、産科・泌尿器科用器具、麻酔装置類、人工呼吸装置類、歯科用器具、注射針などが挙げられるが、これらに限定されない。本発明の洗浄方法において、前記医療用器具は、好ましくは透析用器具である。 In the cleaning method of the present invention, the medical instruments include, but are not limited to, dialysis instruments, endoscopic instruments, surgical instruments, obstetric and urological instruments, anesthesia devices, artificial respiration devices, dental instruments, and injection needles. In the cleaning method of the present invention, the medical instruments are preferably dialysis instruments.
２．第１の洗浄用組成物及び第２の洗浄用組成物
本発明の洗浄方法において、
前記第１の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み得るものであり、
前記第２の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み得るものであり、
第１の洗浄用組成物と第２の洗浄用組成物とは、異なる組成物であり、
上述のように、前記第１の洗浄用組成物及び前記第２の洗浄用組成物のｐＨ値は、それぞれ独立して４．０～１０．０であってよい。
2. First cleaning composition and second cleaning composition In the cleaning method of the present invention,
The first cleaning composition may include at least one or more selected from the group consisting of an acid, a disinfectant, and a protein remover;
The second cleaning composition may include at least one selected from the group consisting of an acid, a disinfectant, and a protein remover;
The first cleaning composition and the second cleaning composition are different compositions,
As mentioned above, the pH value of the first cleaning composition and the second cleaning composition may each independently be from 4.0 to 10.0.
以下、第１の洗浄用組成物及び第２の洗浄用組成物をそれぞれ構成し得る各成分について説明する。 Below, we will explain each of the components that can make up the first cleaning composition and the second cleaning composition.
第１の洗浄用組成物及び第２の洗浄用組成物はそれぞれ独立して、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み得る。本発明の一実施形態において、第１の洗浄用組成物及び第２の洗浄用組成物はそれぞれ独立して、少なくとも酸を含み得る。本発明の一実施形態において、第１の洗浄用組成物及び第２の洗浄用組成物はそれぞれ独立して、少なくとも殺菌剤を含み得る。本発明の一実施形態において、第１の洗浄用組成物及び第２の洗浄用組成物はそれぞれ独立して、少なくともタンパク質除去剤を含み得る。 The first cleaning composition and the second cleaning composition may each independently include at least one or more selected from the group consisting of an acid, a bactericide, and a protein remover. In one embodiment of the present invention, the first cleaning composition and the second cleaning composition may each independently include at least an acid. In one embodiment of the present invention, the first cleaning composition and the second cleaning composition may each independently include at least a bactericide. In one embodiment of the present invention, the first cleaning composition and the second cleaning composition may each independently include at least a protein remover.
（１）酸
第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る酸は、上記のような洗浄対象物に対して用いることができる酸であれば特に限定されないが、それぞれ独立して、例えば、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩などが挙げられる。本発明の一実施形態において、上記の酸は、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩からなる群より選択される１種以上を含むものであってよい。本発明の一実施形態において、上記の酸は、過有機酸及び／又はその塩を含み得る。本発明の一実施形態において、上記の酸は、次亜塩素酸及び／又はその塩を含み得る。本発明の一実施形態において、上記の酸は、有機酸及び／又はその塩を含み得る。
(1) Acid The acid that can be used in the first cleaning composition and/or the second cleaning composition is not particularly limited as long as it is an acid that can be used for the object to be cleaned as described above, and each of them can independently include, for example, a perorganic acid and/or a salt thereof, hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof. In one embodiment of the present invention, the acid may include one or more selected from the group consisting of a perorganic acid and/or a salt thereof, hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof. In one embodiment of the present invention, the acid may include a perorganic acid and/or a salt thereof. In one embodiment of the present invention, the acid may include a hypochlorous acid and/or a salt thereof. In one embodiment of the present invention, the acid may include an organic acid and/or a salt thereof.
＜過有機酸及び／又はその塩＞
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る有機酸及び／又はその塩としては、例えば、過酢酸及び／又はその塩、過ギ酸及び／又はその塩、過プロピオン酸及び／又はその塩、過ブタン酸及び／又はその塩、過ペンタン酸及び／又はその塩、過ヘキサン酸及び／又はその塩、過ヘプタン酸及び／又はその塩、過オクタン酸及び／又はその塩、過クエン酸及び／又はその塩、過リンゴ酸及び／又はその塩、過乳酸及び／又はその塩、過コハク酸及び／又はその塩、過グルタル酸及び／又はその塩などの過カルボン酸が挙げられるが、これらに限定されない。第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられる過有機酸としては、当技術分野で通常用いられるものを用いることができる。
<Perorganic acid and/or its salt>
Examples of organic acids and/or salts thereof that can be used in the first cleaning composition and/or the second cleaning composition include, but are not limited to, percarboxylic acids such as peracetic acid and/or its salts, performic acid and/or its salts, perpropionic acid and/or its salts, perbutanoic acid and/or its salts, perpentanoic acid and/or its salts, perhexanoic acid and/or its salts, perheptanoic acid and/or its salts, peroctanoic acid and/or its salts, percitric acid and/or its salts, permalic acid and/or its salts, perlactic acid and/or its salts, persuccinic acid and/or its salts, and perglutaric acid and/or its salts. The organic acids used in the first cleaning composition and/or the second cleaning composition may be those commonly used in the art.
本発明の一実施形態において、過有機酸及び／又はその塩は、過酢酸及び／又はその塩であってよい。第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられる過酢酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。 In one embodiment of the present invention, the perorganic acid and/or its salt may be peracetic acid and/or its salt. The peracetic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be any peracetic acid and/or salt commonly used in the art.
第１の洗浄用組成物及び／又は第２の洗浄用組成物における過有機酸及び／又はその塩の濃度は、それぞれ独立して、０．００１～０．１質量％であってよい。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物における過有機酸及び／又はその塩の濃度は、それぞれ独立して、例えば、０．００１質量％、０．００５質量％、０．０１質量％、０．０２質量％、０．０３質量％、０．０４質量％、０．０５質量％、０．１質量％、などであってよいが、これらに限定されない。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物における過有機酸及び／又はその塩の濃度は、好ましくは０．００２～０．０５質量％であってよく、より好ましくは０．００３～０．０４質量％であってよく、さらにより好ましくは０．００３～０．０３質量％であってよい。 The concentration of the peroxy acid and/or its salt in the first cleaning composition and/or the second cleaning composition may be, independently, 0.001 to 0.1% by mass. In one embodiment of the present invention, the concentration of the peroxy acid and/or its salt in the first cleaning composition and/or the second cleaning composition may be, independently, for example, 0.001% by mass, 0.005% by mass, 0.01% by mass, 0.02% by mass, 0.03% by mass, 0.04% by mass, 0.05% by mass, 0.1% by mass, etc., but is not limited thereto. In one embodiment of the present invention, the concentration of the peroxy acid and/or its salt in the first cleaning composition and/or the second cleaning composition may be, preferably, 0.002 to 0.05% by mass, more preferably, 0.003 to 0.04% by mass, and even more preferably, 0.003 to 0.03% by mass.
＜次亜塩素酸及び／又はその塩＞
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る次亜塩素酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る次亜塩素酸及び／又はその塩としては、例えば、次亜塩素酸ナトリウム、次亜塩素カルシウム、次亜塩素酸カリウム、次亜塩素酸水、微酸性次亜塩素酸水、弱酸性次亜塩素酸水などが挙げられるがこれらに限定されない。
<Hypochlorous acid and/or its salt>
The hypochlorous acid and/or its salt that can be used in the first cleaning composition and/or the second cleaning composition can be any that is commonly used in the art. Examples of hypochlorous acid and/or its salt that can be used in the first cleaning composition and/or the second cleaning composition include, but are not limited to, sodium hypochlorite, calcium hypochlorite, potassium hypochlorite, hypochlorous acid water, slightly acidic hypochlorous acid water, weakly acidic hypochlorous acid water, etc.
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る次亜塩素酸及び／又はその塩の濃度は、それぞれ独立して、０．００２～０．１質量％であってよい。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る次亜塩素酸及び／又はその塩の濃度は、それぞれ独立して、例えば、０．００２質量％、０．００３質量％、０．００４質量％、０．００５質量％、０．０１質量％、０．０２質量％、０．０３質量％、０．０４質量％、０．０５質量％、０．１質量％、などであってよいが、これらに限定されない。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物における次亜塩素酸及び／又はその塩の濃度は、好ましくは０．００２～０．０５質量％であってよく、より好ましくは０．００３～０．０４質量％であってよく、さらにより好ましくは０．００３～０．０３質量％であってよい。 The concentration of hypochlorous acid and/or its salt that can be used in the first cleaning composition and/or the second cleaning composition may be, independently, 0.002 to 0.1% by mass. In one embodiment of the present invention, the concentration of hypochlorous acid and/or its salt that can be used in the first cleaning composition and/or the second cleaning composition may be, independently, for example, 0.002% by mass, 0.003% by mass, 0.004% by mass, 0.005% by mass, 0.01% by mass, 0.02% by mass, 0.03% by mass, 0.04% by mass, 0.05% by mass, 0.1% by mass, etc., but is not limited thereto. In one embodiment of the present invention, the concentration of hypochlorous acid and/or a salt thereof in the first cleaning composition and/or the second cleaning composition may be preferably 0.002 to 0.05% by mass, more preferably 0.003 to 0.04% by mass, and even more preferably 0.003 to 0.03% by mass.
＜有機酸及び／又はその塩＞
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る有機酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。
<Organic Acid and/or Salt Thereof>
As the organic acid and/or a salt thereof that can be used in the first cleaning composition and/or the second cleaning composition, those commonly used in the art can be used.
本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る有機酸は、下記式：
ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
で表され、式中、
Ｒは、Ｈ、ＯＨ及び炭素数１～７のアルキル基から選択され、
ｐは、０～２の整数であり、
ｑは、０～１の整数であり、
ｒは、０～２の整数であり、
ｐ＋ｑ＋ｒ＝２を満たすものであってよい。
In one embodiment of the present invention, the organic acid that may be used in the first cleaning composition and/or the second cleaning composition is represented by the following formula:
RCH p (OH) q (CH 2 COOH) r COOH
In the formula:
R is selected from H, OH, and an alkyl group having 1 to 7 carbon atoms;
p is an integer from 0 to 2,
q is an integer from 0 to 1;
r is an integer from 0 to 2;
It may satisfy p+q+r=2.
上記の式中、Ｒは、Ｈ、ＯＨ、メチル、エチル、ｎ－プロピル、イソプロピル、ｎ－ブチル、ｓｅｃ－ブチル、イソブチル、ｔｅｒｔ－ブチル、ｎ－ペンチル、イソペンチル（３－メチルブチル）、ｓｅｃ－ペンチル（１－メチルブチル）、３－ペンチル（１－エチルプロピル）、ｔｅｒｔ－ペンチル（１，１－ジメチルプロピル）、ネオペンチル（２，２－ジメチルプロピル）、ｎ－ヘキシル、イソヘキシル、ｓｅｃ－ヘキシル、ｔｅｒｔ－ヘキシル、ネオヘキシル、ｎ－ヘプチル、イソヘプチル、ｓｅｃ－ヘプチル、ｔｅｒｔ－ヘプチル、ネオヘプチルから選択され得る。 In the above formula, R may be selected from H, OH, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, n-pentyl, isopentyl (3-methylbutyl), sec-pentyl (1-methylbutyl), 3-pentyl (1-ethylpropyl), tert-pentyl (1,1-dimethylpropyl), neopentyl (2,2-dimethylpropyl), n-hexyl, isohexyl, sec-hexyl, tert-hexyl, neohexyl, n-heptyl, isoheptyl, sec-heptyl, tert-heptyl, and neoheptyl.
上記の式中、ｐは、０～２の整数であってよく、０、１、２の中から適宜選択され得る。上記の式中、ｑは、０～１の整数であってよく、０、１の中から適宜選択され得る。上記の式中、ｒは、０～２の整数であってよく、０、１、２の中から適宜選択され得る。但し、上記の式中、ｐ、ｑ、ｒはｐ＋ｑ＋ｒ＝２を満たすものであってよい。 In the above formula, p may be an integer from 0 to 2 and may be appropriately selected from 0, 1, and 2. In the above formula, q may be an integer from 0 to 1 and may be appropriately selected from 0 and 1. In the above formula, r may be an integer from 0 to 2 and may be appropriately selected from 0, 1, and 2. However, in the above formula, p, q, and r may satisfy p+q+r=2.
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る有機酸及び／又はその塩としては、例えば、酢酸及び／又はその塩、クエン酸及び／又はその塩、リンゴ酸及び／又はその塩、乳酸及び／又はその塩、コハク酸及び又はその塩、グルタル酸及び又はその塩、２－ヒドロキシイソ酪酸及び又はその塩、プロピオン酸及び又はその塩、ブタン酸及び／又はその塩、ペンタン酸及び／又はその塩、ヘキサン酸及び／又はその塩、ヘプタン酸及び／又はその塩、オクタン酸及び／又はその塩などのカルボン酸が挙げられるが、これらに限定されない。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る有機酸及び／又はその塩は、酢酸及び／又はその塩、クエン酸及び／又はその塩、リンゴ酸及び／又はその塩、乳酸及び／又はその塩、オクタン酸及び／又はその塩から選択することができる。第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられる有機酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。 Examples of organic acids and/or salts thereof that can be used in the first cleaning composition and/or the second cleaning composition include, but are not limited to, carboxylic acids such as acetic acid and/or its salts, citric acid and/or its salts, malic acid and/or its salts, lactic acid and/or its salts, succinic acid and/or its salts, glutaric acid and/or its salts, 2-hydroxyisobutyric acid and/or its salts, propionic acid and/or its salts, butanoic acid and/or its salts, pentanoic acid and/or its salts, hexanoic acid and/or its salts, heptanoic acid and/or its salts, and octanoic acid and/or its salts. In one embodiment of the present invention, organic acids and/or salts thereof that can be used in the first cleaning composition and/or the second cleaning composition can be selected from acetic acid and/or its salts, citric acid and/or its salts, malic acid and/or its salts, lactic acid and/or its salts, and octanoic acid and/or its salts. The organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be any organic acid commonly used in the art.
本発明の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる有機酸及び／又はその塩は、酢酸及び／又はその塩であってよい。有機酸が酢酸である場合、
式： ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
において、ＲはＨ、ｐ＝２、ｑ＝０、ｒ＝０、ｐ＋ｑ＋ｒ＝２である。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる酢酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。酢酸の塩としては、水溶液とした際にアルカリ性である酢酸塩であれば特に限定されず、例えば、酢酸ナトリウム、酢酸カリウム、酢酸リチウム、酢酸ベリリウム、酢酸マグネシウム、酢酸アルミニウム、酢酸カルシウム、酢酸ルビジウム、酢酸ストロンチウム、酢酸セシウム、酢酸バリウム、酢酸アンモニウムなどが挙げられる。
In a preferred embodiment of the present invention, the organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be acetic acid and/or its salt. When the organic acid is acetic acid,
Formula: RCH p (OH) q (CH 2 COOH) r COOH
In the formula, R is H, p=2, q=0, r=0, and p+q+r=2. The acetic acid and/or salt thereof used in the first cleaning composition and/or the second cleaning composition may be one commonly used in the art. The acetic acid salt is not particularly limited as long as it is an acetate salt that is alkaline when made into an aqueous solution, and examples of the acetate salt include sodium acetate, potassium acetate, lithium acetate, beryllium acetate, magnesium acetate, aluminum acetate, calcium acetate, rubidium acetate, strontium acetate, cesium acetate, barium acetate, and ammonium acetate.
本発明の別の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる有機酸及び／又はその塩は、クエン酸及び／又はその塩であってよい。有機酸がクエン酸である場合、
式： ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
において、ＲはＯＨ、ｐ＝０、ｑ＝０、ｒ＝２、ｐ＋ｑ＋ｒ＝２である。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられるクエン酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。クエン酸の塩としては、水溶液とした際にアルカリ性であるクエン酸塩であれば特に限定されず、例えば、クエン酸一ナトリウム、クエン酸二ナトリウム、クエン酸三ナトリウム、クエン酸一カリウム、クエン酸二カリウム、クエン酸三カリウム、クエン酸リチウム、クエン酸ベリリウム、クエン酸マグネシウム、クエン酸アルミニウム、クエン酸カルシウム、クエン酸ルビジウム、クエン酸ストロンチウム、クエン酸セシウム、クエン酸バリウム、クエン酸一アンモニウム、クエン酸二アンモニウム、クエン酸三アンモニウムなどが挙げられる。
In another preferred embodiment of the present invention, the organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be citric acid and/or its salt. When the organic acid is citric acid,
Formula: RCH p (OH) q (CH 2 COOH) r COOH
In the formula, R is OH, p=0, q=0, r=2, and p+q+r=2. The citric acid and/or salt thereof used in the first cleaning composition and/or the second cleaning composition may be any salt commonly used in the art. The salt of citric acid is not particularly limited as long as it is a citrate salt that is alkaline when made into an aqueous solution, and examples thereof include monosodium citrate, disodium citrate, trisodium citrate, monopotassium citrate, dipotassium citrate, tripotassium citrate, lithium citrate, beryllium citrate, magnesium citrate, aluminum citrate, calcium citrate, rubidium citrate, strontium citrate, cesium citrate, barium citrate, monoammonium citrate, diammonium citrate, and triammonium citrate.
本発明のさらに別の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる有機酸及び／又はその塩は、リンゴ酸及び／又はその塩であってよい。有機酸がリンゴ酸である場合、
式： ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
において、ＲはＨ、ｐ＝０、ｑ＝１、ｒ＝１、ｐ＋ｑ＋ｒ＝２である。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられるリンゴ酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。リンゴ酸の塩としては、水溶液とした際にアルカリ性であるリンゴ酸塩であれば特に限定されず、例えば、リンゴ酸一ナトリウム、リンゴ酸二ナトリウム、リンゴ酸一カリウム、リンゴ酸二カリウム、リンゴ酸リチウム、リンゴ酸ベリリウム、リンゴ酸マグネシウム、リンゴ酸アルミニウム、リンゴ酸カルシウム、リンゴ酸ルビジウム、リンゴ酸ストロンチウム、リンゴ酸セシウム、リンゴ酸バリウム、リンゴ酸一アンモニウム、リンゴ酸二アンモニウムなどが挙げられる。
In yet another preferred embodiment of the present invention, the organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be malic acid and/or its salt. When the organic acid is malic acid,
Formula: RCH p (OH) q (CH 2 COOH) r COOH
In the formula, R is H, p=0, q=1, r=1, and p+q+r=2. As the malic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition, those commonly used in the art can be used. The salt of malic acid is not particularly limited as long as it is a malate salt that is alkaline when made into an aqueous solution, and examples thereof include monosodium malate, disodium malate, monopotassium malate, dipotassium malate, lithium malate, beryllium malate, magnesium malate, aluminum malate, calcium malate, rubidium malate, strontium malate, cesium malate, barium malate, monoammonium malate, and diammonium malate.
本発明の別の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる有機酸及び／又はその塩は、乳酸及び／又はその塩であってよい。有機酸が乳酸である場合、
式： ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
において、ＲはＣＨ３、ｐ＝１、ｑ＝１、ｒ＝０、ｐ＋ｑ＋ｒ＝２である。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる乳酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。乳酸の塩としては、水溶液とした際にアルカリ性である乳酸塩であれば特に限定されず、例えば、乳酸ナトリウム、乳酸カリウム、乳酸リチウム、乳酸ベリリウム、乳酸マグネシウム、乳酸アルミニウム、乳酸カルシウム、乳酸ルビジウム、乳酸ストロンチウム、乳酸セシウム、乳酸バリウム、乳酸アンモニウムなどが挙げられる。
In another preferred embodiment of the present invention, the organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be lactic acid and/or its salt. When the organic acid is lactic acid,
Formula: RCH p (OH) q (CH 2 COOH) r COOH
In the formula, R is CH3, p=1, q=1, r=0, and p+q+r=2. Lactic acid and/or a salt thereof used in the first cleaning composition and/or the second cleaning composition may be any salt commonly used in the art. The salt of lactic acid is not particularly limited as long as it is a lactate salt that is alkaline when made into an aqueous solution, and examples thereof include sodium lactate, potassium lactate, lithium lactate, beryllium lactate, magnesium lactate, aluminum lactate, calcium lactate, rubidium lactate, strontium lactate, cesium lactate, barium lactate, and ammonium lactate.
本発明の更に別の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられる有機酸及び／又はその塩は、オクタン酸及び／又はその塩であってよい。有機酸がオクタン酸である場合、
式： ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
において、ＲはＣＨ３（ＣＨ２）５、ｐ＝２、ｑ＝０、ｒ＝０、ｐ＋ｑ＋ｒ＝２である。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられるオクタン酸及び／又はその塩としては、当技術分野で通常用いられるものを用いることができる。オクタン酸の塩としては、水溶液とした際にアルカリ性であるオクタン酸塩であれば特に限定されず、例えば、オクタン酸ナトリウム、オクタン酸カリウム、オクタン酸リチウム、オクタン酸ベリリウム、オクタン酸マグネシウム、オクタン酸アルミニウム、オクタン酸カルシウム、オクタン酸ルビジウム、オクタン酸ストロンチウム、オクタン酸セシウム、オクタン酸バリウム、オクタン酸アンモニウムなどが挙げられる。
In yet another preferred embodiment of the present invention, the organic acid and/or its salt used in the first cleaning composition and/or the second cleaning composition may be octanoic acid and/or its salt. When the organic acid is octanoic acid,
Formula: RCH p (OH) q (CH 2 COOH) r COOH
In the formula, R is CH 3 (CH 2 ) 5 , p=2, q=0, r=0, and p+q+r=2. Octanoic acid and/or a salt thereof used in the first cleaning composition and/or the second cleaning composition may be one commonly used in the art. The salt of octanoic acid is not particularly limited as long as it is an octanoate salt that is alkaline when made into an aqueous solution, and examples thereof include sodium octanoate, potassium octanoate, lithium octanoate, beryllium octanoate, magnesium octanoate, aluminum octanoate, calcium octanoate, rubidium octanoate, strontium octanoate, cesium octanoate, barium octanoate, and ammonium octanoate.
第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る有機酸及び／又はその塩の濃度は、０．０２～１０質量％であってよい。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物において用いられ得る有機酸及び／又はその塩の濃度は、それぞれ独立して、例えば、０．０２質量％、０．０３質量％、０．０４質量％、０．０５質量％、０．１質量％、０．１５質量％、０．２質量％、０．２５質量％、０．３質量％、０．３５質量％、０．４質量％、０．４５質量％、０．５質量％、０．６質量％、０．７質量％、０．８質量％、０．９質量％、１質量％、１．５質量％、２質量％、３質量％、４質量％、５質量％、６質量％、７質量％、８質量％、９質量％、１０質量％、などであってよいが、これらに限定されない。本発明の一実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物における有機酸及び／又はその塩の濃度は、好ましくは０．０５～８質量％であってよく、より好ましくは０．１～６質量％であってよく、さらにより好ましくは０．２～５質量％であってよい。 The concentration of the organic acid and/or its salt that may be used in the first cleaning composition and/or the second cleaning composition may be 0.02 to 10% by mass. In one embodiment of the present invention, the concentration of the organic acid and/or its salt that can be used in the first cleaning composition and/or the second cleaning composition may be, independently, for example, 0.02 mass%, 0.03 mass%, 0.04 mass%, 0.05 mass%, 0.1 mass%, 0.15 mass%, 0.2 mass%, 0.25 mass%, 0.3 mass%, 0.35 mass%, 0.4 mass%, 0.45 mass%, 0.5 mass%, 0.6 mass%, 0.7 mass%, 0.8 mass%, 0.9 mass%, 1 mass%, 1.5 mass%, 2 mass%, 3 mass%, 4 mass%, 5 mass%, 6 mass%, 7 mass%, 8 mass%, 9 mass%, 10 mass%, etc., but is not limited thereto. In one embodiment of the present invention, the concentration of the organic acid and/or its salt in the first cleaning composition and/or the second cleaning composition may be preferably 0.05 to 8 mass%, more preferably 0.1 to 6 mass%, and even more preferably 0.2 to 5 mass%.
本発明の一実施形態において、
前記酸が、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩からなる群より選択される１種以上を含み、
過有機酸及び／又はその塩を０．００１～０．１質量％、次亜塩素酸及び／又はその塩を０．００２～０．１質量％、有機酸及び／又はその塩を０．０２～１０質量％の量で含む、上記の洗浄方法が提供される。
In one embodiment of the present invention,
The acid includes at least one selected from the group consisting of a peroxy acid and/or a salt thereof, a hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof;
The cleaning method as described above is provided, which contains 0.001 to 0.1 mass % of perorganic acid and/or a salt thereof, 0.002 to 0.1 mass % of hypochlorous acid and/or a salt thereof, and 0.02 to 10 mass % of organic acid and/or a salt thereof.
（２）殺菌剤
第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る殺菌剤は、上記のような洗浄対象物に対して用いることができる殺菌剤であれば特に限定されない。なお、上述した酸及び／又はその塩も殺菌作用を有し得るが、本明細書において、殺菌剤は、上述した酸及び／又はその塩には該当しないものを指す。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る殺菌剤としては、それぞれ独立して、例えば、過酸化水素、ヨウ素剤、アルコール類、フェノール類、陽イオン界面活性剤、陰イオン界面活性剤、非イオン界面活性剤、両性界面活性剤などが挙げられるが、これらに限定されない。
(2) Bactericide The bactericide that can be used in the first cleaning composition and/or the second cleaning composition is not particularly limited as long as it can be used for the object to be cleaned as described above. The above-mentioned acids and/or salts thereof may also have a bactericidal effect, but in this specification, the bactericide refers to one that does not fall under the above-mentioned acids and/or salts thereof. Examples of bactericides that can be used in the first cleaning composition and/or the second cleaning composition include, independently of each other, for example, hydrogen peroxide, iodine agents, alcohols, phenols, cationic surfactants, anionic surfactants, nonionic surfactants, amphoteric surfactants, etc., but are not limited thereto.
本発明の好ましい実施形態において、第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得る殺菌剤は、過酸化水素であってよい。過酸化水素は、それ自体、殺菌・洗浄能力を有するため、組成物全体の殺菌・洗浄効果を高めるのに寄与するだけでなく、酢酸との平衡反応により十分な量の過酢酸の生成及び維持（水溶液中における安定性）に寄与している。よって、酢酸と過酸化水素との組み合わせにより、さらに本発明の組成物の殺菌・洗浄効果を高めることができる。 In a preferred embodiment of the present invention, the germicide that can be used in the first cleaning composition and/or the second cleaning composition may be hydrogen peroxide. Hydrogen peroxide has germicidal and cleaning capabilities by itself, and therefore not only contributes to enhancing the germicidal and cleaning effects of the entire composition, but also contributes to the production and maintenance (stability in an aqueous solution) of a sufficient amount of peracetic acid through an equilibrium reaction with acetic acid. Therefore, the combination of acetic acid and hydrogen peroxide can further enhance the germicidal and cleaning effects of the composition of the present invention.
第１の洗浄用組成物及び／又は第２の洗浄用組成物における過酸化水素の濃度は、それぞれ独立して、０．００１～２５質量％であってよく、好ましくは０．００５～２０質量％、より好ましくは０．０１～１５質量％、さらにより好ましくは０．０２～１０質量％であってよい。過酸化水素の濃度が低すぎると酢酸との平衡反応により生成する過酢酸の量が十分でなく、本発明の殺菌・洗浄効果が十分に発揮されない場合がある。一方、過酸化水素の濃度が高すぎても前記効果は高まらず、かえって安全性に問題が生じる場合がある。 The concentration of hydrogen peroxide in the first cleaning composition and/or the second cleaning composition may be, independently, 0.001 to 25% by mass, preferably 0.005 to 20% by mass, more preferably 0.01 to 15% by mass, and even more preferably 0.02 to 10% by mass. If the concentration of hydrogen peroxide is too low, the amount of peracetic acid produced by the equilibrium reaction with acetic acid may be insufficient, and the sterilization and cleaning effects of the present invention may not be fully exerted. On the other hand, if the concentration of hydrogen peroxide is too high, the effects will not be enhanced, and safety problems may arise.
（３）タンパク質除去剤
第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得るタンパク質除去剤は、上記のような洗浄対象物に対して用いることができるタンパク質除去剤であれば特に限定されない。なお、上述した有機酸及び／又はその塩や過有機酸及び／又はその塩もタンパク質除去作用を有し得るが、本明細書において、タンパク質除去剤は、上述した有機酸及び／又はその塩や過有機酸及び／又はその塩には該当しないものを指す。第１の洗浄用組成物及び／又は第２の洗浄用組成物に用いられ得るタンパク質除去剤としては、それぞれ独立して、例えば、パパイン、リパーゼ、アミラーゼ、マルターゼ、スクラーゼ、ラクターゼ、ペプシン、トリプシン、キモトリプシン、エステラーゼ、アミノアシラーゼ、ペプチターゼ、プロメラインなどのタンパク質分解酵素；炭水化物分解酵素；脂肪分解酵素などが挙げられるが、これらに限定されない。
(3) Protein remover The protein remover that can be used in the first cleaning composition and/or the second cleaning composition is not particularly limited as long as it is a protein remover that can be used for the above-mentioned cleaning object. The above-mentioned organic acids and/or their salts and perorganic acids and/or their salts can also have a protein removing effect, but in this specification, the protein remover refers to one that does not fall under the above-mentioned organic acids and/or their salts and perorganic acids and/or their salts. The protein removers that can be used in the first cleaning composition and/or the second cleaning composition each independently include, for example, protease such as papain, lipase, amylase, maltase, sucrase, lactase, pepsin, trypsin, chymotrypsin, esterase, aminoacylase, peptidase, and bromelain; carbohydrate decomposition enzyme; and lipolysis enzyme, but are not limited thereto.
（４）その他の成分
第１の洗浄用組成物及び第２の洗浄用組成物には、さらに必要に応じて、一般的な殺菌及び洗浄用薬剤等に使用される添加剤など、例えば安定剤、界面活性剤、増粘剤、香料、着色剤、加水分解酵素等が適宜配合されていてもよい。第１の洗浄用組成物及び第２の洗浄用組成物において、酸、殺菌剤、タンパク質除去剤、及び必要に応じて添加する安定剤その他の添加剤以外の残分は、主として水である。
(4) Other Components The first cleaning composition and the second cleaning composition may further contain, as necessary, additives used in general bactericidal and cleaning agents, such as stabilizers, surfactants, thickeners, fragrances, colorants, hydrolases, etc. In the first cleaning composition and the second cleaning composition, the remainder other than the acid, bactericide, protein remover, and stabilizers and other additives added as necessary is mainly water.
本発明の洗浄方法において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物は、上述のように、洗浄剤原液を希釈することなくそのまま用いるか、あるいは任意の濃度に希釈して殺菌及び洗浄用希釈組成物とすることができる。希釈剤としては通常、水が用いられる。希釈剤として用いられる水は、例えば純水、超純水、蒸留水、精製水、注射用水、水道水などが用いられ得る。希釈倍率は、殺菌及び洗浄用希釈組成物として殺菌及び洗浄効果を発揮する濃度にすることができる希釈倍率であればよく、特に限定されないが、好ましくは１～１００００倍、より好ましくは１～１０００倍である。 In the cleaning method of the present invention, the first cleaning composition and the second cleaning composition can be used as the cleaner stock solution without diluting it, or can be diluted to any concentration to prepare a diluted composition for sterilization and cleaning, as described above. Water is usually used as the diluent. Examples of the water used as the diluent include pure water, ultrapure water, distilled water, purified water, water for injection, and tap water. The dilution ratio is not particularly limited as long as it is a dilution ratio that can achieve a concentration that exhibits sterilization and cleaning effects as a diluted composition for sterilization and cleaning, and is preferably 1 to 10,000 times, more preferably 1 to 1,000 times.
３．第１の洗浄用組成物及び第２の洗浄用組成物の製造方法
本発明の一実施形態において、上記第１の洗浄用組成物及び上記第２の洗浄用組成物は、それぞれ、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を混合する混合工程を含むものであってよい。各成分については上述した通りである。各成分を混合する順序は任意であってよく、本発明の殺菌及び洗浄用組成物では、混合した各成分が平衡状態となっている。
3. In one embodiment of the method for producing the first cleaning composition and the second cleaning composition , the first cleaning composition and the second cleaning composition may each include a mixing step of mixing at least one selected from the group consisting of an acid, a bactericide, and a protein remover. Each component is as described above. The order of mixing each component may be arbitrary, and in the bactericidal and cleaning composition of the present invention, each mixed component is in an equilibrium state.
以下に、本発明の実施例を示す。しかしながら、これらの実施例は、本発明の実施形態を例示するものであって、本発明の範囲を限定することを意図するものではない。 Examples of the present invention are given below. However, these examples are merely illustrative of the embodiments of the present invention and are not intended to limit the scope of the present invention.
＜ｐＨ測定＞
洗浄用組成物を純水で適宜希釈し、試料液５０ｇを調製した。各試料液のｐＨをｐＨメーター（ＬＡＱＵＡ、Ｄ－７１Ｓ、株式会社堀場製作所製）を用いて測定した。
○：４～１０
×：４未満、１０より大きい
<pH measurement>
The cleaning composition was appropriately diluted with pure water to prepare 50 g of sample liquid. The pH of each sample liquid was measured using a pH meter (LAQUA, D-71S, manufactured by Horiba, Ltd.).
○: 4 to 10
×: Less than 4, more than 10
＜芽胞懸濁液の調整＞
セレウス菌標準菌株（Ｍｉｃｒｏｂｉｏｌｏｇｉｃｓ社製、製品名：Ｂａｃｉｌｌｕｓ ｃｅｒｅｕｓ ＡＴＣＣ１０８７６）をＭＹＰ寒天（ＡＺＯＮＥ株式会社製、製品名：サニスペック生培地）に塗布し、３５℃で７日間培養した。この寒天培地に減菌蒸留水を加え、菌体をコンラージ棒で掻き取り採取し、遠心分離により減菌蒸留水で洗浄した。芽胞型のみを得るため８０℃で１０分間加熱し生残した菌を芽胞懸濁液とした。
<Preparation of spore suspension>
A standard strain of Bacillus cereus (Microbiologics, product name: Bacillus cereus ATCC10876) was applied to MYP agar (AZONE, product name: Sanispec live medium) and cultured at 35°C for 7 days. Sterilized distilled water was added to this agar medium, and the cells were scraped and collected with a Conlarge rod and washed with sterilized distilled water by centrifugation. In order to obtain only the spore form, the cells were heated at 80°C for 10 minutes, and the surviving bacteria were made into a spore suspension.
＜殺菌試験＞
洗浄用組成物を減菌蒸留水で適宜希釈し、試料液を調製した。各試料液４．５ｍＬに１質量％アルブミン溶液を０．５ｍＬ，芽胞懸濁液５０μＬを加え、２５℃で１２０分間作用させた。作用後、０．１ｍｏｌ／Ｌ減菌チオ硫酸ナトリウム溶液で１０倍に希釈し、セレウス菌検出用培地（日水製薬株式会社製、製品名：コンパクトドライＸ－ＢＣ）を用いて３５℃で４８時間培養し生菌数を測定した。また、芽胞懸濁液の生菌数を測定し、開始時の生菌数とした。殺菌率は開始時の生菌数を１００とし、１２０分後の生菌数の比率により算出した。
<Bactericidal test>
The cleaning composition was appropriately diluted with sterilized distilled water to prepare a sample solution. 0.5 mL of 1% by mass albumin solution and 50 μL of spore suspension were added to 4.5 mL of each sample solution, and allowed to act at 25 ° C. for 120 minutes. After the action, the solution was diluted 10 times with 0.1 mol/L sterilized sodium thiosulfate solution, and cultured at 35 ° C. for 48 hours using a Bacillus cereus detection medium (manufactured by Nissui Pharmaceutical Co., Ltd., product name: Compact Dry X-BC) to measure the viable cell count. The viable cell count of the spore suspension was also measured and used as the viable cell count at the start. The sterilization rate was calculated by the ratio of the viable cell count after 120 minutes to the viable cell count at the start of the experiment, which was set to 100.
＜第１及び第２の洗浄工程後の殺菌率＞
以下の式より第１の洗浄工程及び第２の洗浄工程を経た後の殺菌率を算出した。
第１及び第２の洗浄工程後の殺菌率
＝１００－{[１００－殺菌率（第１の洗浄工程）]×[１００－殺菌率（第２の洗浄工程）]}÷１００
◎：８０％以上
○：５０％以上
△：３０％以上
×：３０％未満
<Bactericidal rate after the first and second cleaning steps>
The sterilization rate after the first and second cleaning steps was calculated using the following formula.
Bactericidal rate after the first and second cleaning steps = 100 - {[100 - sterilization rate (first cleaning step)] x [100 - sterilization rate (second cleaning step)]} ÷ 100
◎: 80% or more ○: 50% or more △: 30% or more ×: Less than 30%
＜タンパク質除去試験＞
洗浄用組成物を純水で適宜希釈し、試料液５０ｇを調製した。各試料液に洗浄評価インジケータ（ネスコスＩＣ Ｗ・Ｉ、株式会社サクラクレパス製）を６０分間浸漬した後、純水１０ｍＬで洗浄し、常温で乾燥した。Ｃ光源、２度視野に設定したハンディ型分光色差計（ＮＦ５５５、日本電色工業株式会社製）を用いて洗浄評価インジケータの汚れの付着していない白色部からの色差（ΔＥａｂ）を測定した。タンパク質除去率は未洗浄の洗浄評価インジケータの色差を１００とし、洗浄後の色差の比率により算出した。
<Protein removal test>
The cleaning composition was appropriately diluted with pure water to prepare 50 g of sample solution. A cleaning evaluation indicator (Nescos IC W.I, manufactured by Sakura Cray-Pas Co., Ltd.) was immersed in each sample solution for 60 minutes, washed with 10 mL of pure water, and dried at room temperature. The color difference (ΔEab) from the unsoiled white part of the cleaning evaluation indicator was measured using a handy spectrophotometer (NF555, manufactured by Nippon Denshoku Industries Co., Ltd.) set to a C light source and a 2-degree field of view. The protein removal rate was calculated by the ratio of the color difference after washing to the color difference of the unwashed cleaning evaluation indicator, which was set to 100.
＜第１及び第２の洗浄工程後のタンパク質除去率＞
以下の式より第１の洗浄工程及び第２の洗浄工程を経た後のタンパク質除去率を算出した。
第１及び第２の洗浄工程後のタンパク質除去率
＝１００－{[１００－タンパク質除去率（第１の洗浄工程）]×[１００－タンパク質除去率（第２の洗浄工程）]}÷１００
◎：９０％以上
○：６５％以上
△：５０％以上
×：５０％未満
<Protein removal rate after first and second washing steps>
The protein removal rate after the first washing step and the second washing step was calculated using the following formula.
Protein removal rate after first and second cleaning steps=100−{[100−protein removal rate (first cleaning step)]×[100−protein removal rate (second cleaning step)]}÷100
◎: 90% or more ○: 65% or more △: 50% or more ×: Less than 50%
＜炭酸Ｃａ溶解量試験＞
洗浄用組成物を純水で適宜希釈し、試料液５０ｇを調製した。各試料液に炭酸Ｃａ（富士フイルム和光純薬株式会社製）を少量ずつ添加し、溶解した重量を炭酸Ｃａ溶解量とした。
<Ca carbonate dissolution test>
The cleaning composition was appropriately diluted with pure water to prepare 50 g of sample liquid. A small amount of calcium carbonate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was added to each sample liquid, and the dissolved weight was recorded as the amount of dissolved calcium carbonate.
＜第１及び第２の洗浄工程後の炭酸Ｃａ溶解量＞
以下の式より第１の洗浄工程及び第２の洗浄工程を経た後の炭酸Ｃａ溶解量を算出した。
第１及び第２の洗浄工程後の炭酸Ｃａ溶解量
＝１００－{[１００－炭酸Ｃａ溶解量（第１の洗浄工程）]×[１００－炭酸Ｃａ溶解量（第２の洗浄工程）]}÷１００
◎：５０ｍｇ以上
○：２０ｍｇ以上
△：１０ｍｇ以上
×：１０ｍｇ未満
<Amount of Ca carbonate dissolved after the first and second cleaning steps>
The amount of dissolved Ca carbonate after the first washing step and the second washing step was calculated using the following formula.
Amount of dissolved calcium carbonate after the first and second cleaning steps=100−{[100−amount of dissolved calcium carbonate (first cleaning step)]×[100−amount of dissolved calcium carbonate (second cleaning step)]}÷100
◎: 50mg or more ○: 20mg or more △: 10mg or more ×: Less than 10mg
＜製造例１：過酢酸含有組成物Ａ（洗浄用組成物ＰＡ－１～ＰＡ－６）＞
純水２３．０ｇと６０質量％の１－ヒドロキシエチリデン－１，１－ジホスホン酸（ＨＥＤＰ、イタルマッチジャパン株式会社製、製品名：デイクエスト２０１０）を０．０２ｇ、エチレンジアミン四酢酸二ナトリウム・二水和物（ＥＤＴＡ・２Ｎａ・２Ｈ２Ｏ、ＭＰ Ｂｉｏｍｅｄｉｃａｌｓ，Ｉｎｃ．製）を０．０１ｇ、ポリオキシエチレン（４．５）ラウリルエーテル酢酸（花王株式会社製、製品名：カオーアキポＲＬＭ－４５）を０．０１ｇ、８０質量％酢酸（昭和電工株式会社製）を１０．０ｇ、３５質量％の過酸化水素（三菱ガス化学株式会社製、製品名：ダイヤパワーＨＰ）を１７．４ｇ、酢酸ナトリウム三水和物（富士フイルム和光純薬株式会社製）を４９．６ｇ、ＰＥ容器内で混合した。混合後、２５℃で７日間熟成することで過酸化水素５．８質量％、酢酸７．６質量％、過酢酸０．４質量％、酢酸ナトリウム２９．９質量％、１－ヒドロキシエチリデン－１，１－ジホスホン酸０．０１質量％、エチレンジアミン四酢酸二ナトリウム０．０１質量％、ポリオキシエチレン（４．５）ラウリルエーテル酢酸０．０１質量％の過酢酸含有組成物Ａを得た。得られた過酢酸含有組成物Ａを純水で希釈して表１に記載の洗浄用組成物ＰＡ－１を調製した。同様にして、表１に記載された組成の洗浄用組成物ＰＡ－２～ＰＡ－６を調製した。
<Production Example 1: Peracetic Acid-Containing Composition A (Cleaning Compositions PA-1 to PA-6)>
23.0 g of pure water, 0.02 g of 60% by weight 1-hydroxyethylidene-1,1-diphosphonic acid (HEDP, Italmatch Japan Co., Ltd., product name: Dequest 2010), 0.01 g of disodium ethylenediaminetetraacetate dihydrate (EDTA.2Na.2H 2 O, MP Biomedicals, Inc.), 0.01 g of polyoxyethylene (4.5) lauryl ether acetate (Kao Corporation, product name: Kao Akipo RLM-45), 10.0 g of 80% by weight acetic acid (Showa Denko K.K.), 17.4 g of 35% by weight hydrogen peroxide (Mitsubishi Gas Chemical Co., Inc., product name: Diapower HP), and 49.6 g of sodium acetate trihydrate (FUJIFILM Wako Pure Chemical Industries, Ltd.) were mixed in a PE container. After mixing, the mixture was aged at 25°C for 7 days to obtain a peracetic acid-containing composition A containing 5.8% by mass of hydrogen peroxide, 7.6% by mass of acetic acid, 0.4% by mass of peracetic acid, 29.9% by mass of sodium acetate, 0.01% by mass of 1-hydroxyethylidene-1,1-diphosphonic acid, 0.01% by mass of disodium ethylenediaminetetraacetate, and 0.01% by mass of polyoxyethylene (4.5) lauryl ether acetic acid. The obtained peracetic acid-containing composition A was diluted with pure water to prepare cleaning composition PA-1 shown in Table 1. In the same manner, cleaning compositions PA-2 to PA-6 having the compositions shown in Table 1 were prepared.
＜製造例２：過酢酸含有組成物Ｂ（洗浄用組成物ＰＡ－７）＞
純水２０．９ｇとピロリン酸（純正化学株式会社製、製品名：二りん酸）を０．２ｇ、８０質量％酢酸（昭和電工株式会社製）を４６．５ｇ、３５質量％の過酸化水素（三菱ガス化学株式会社製、製品名：ダイヤパワーＨＰ）を３２．４ｇ、ＰＥ容器内で混合した。混合後、２５℃で７日間熟成することで過酸化水素８．０質量％、酢酸３２．５質量％、過酢酸６．０質量％、ピロリン酸０．２質量％の過酢酸含有組成物Ｂを得た。得られた過酢酸含有組成物Ｂを純水で希釈して表１に記載の洗浄用組成物ＰＡ－７を調製した。
<Production Example 2: Peracetic acid-containing composition B (cleaning composition PA-7)>
20.9 g of pure water, 0.2 g of pyrophosphoric acid (manufactured by Junsei Chemical Co., Ltd., product name: diphosphoric acid), 46.5 g of 80% by mass acetic acid (manufactured by Showa Denko K.K.), and 32.4 g of 35% by mass hydrogen peroxide (manufactured by Mitsubishi Gas Chemical Co., Ltd., product name: Diapower HP) were mixed in a PE container. After mixing, the mixture was aged at 25 ° C. for 7 days to obtain a peracetic acid-containing composition B containing 8.0% by mass hydrogen peroxide, 32.5% by mass acetic acid, 6.0% by mass peracetic acid, and 0.2% by mass pyrophosphoric acid. The obtained peracetic acid-containing composition B was diluted with pure water to prepare the cleaning composition PA-7 described in Table 1.
＜製造例３：洗浄用組成物Ｃｌ－１～Ｃｌ－２、Ｃｌ－４～Ｃｌ－５＞
純水９７．８ｇ、５質量％次亜塩素酸Ｎａ溶液（富士フイルム和光純薬株式会社製）を２．０ｇ、８０質量％酢酸（昭和電工株式会社製）を０．２２ｇ、ＰＥ容器内で混合し、Ｃｌ－１を調製した。Ｃｌ－１を純水で希釈して表１に記載された洗浄用組成物Ｃｌ－２を調製した。同様にして、表１に記載された洗浄用組成物Ｃｌ－４～Ｃｌ－５を調製した。
<Production Example 3: Cleaning Compositions Cl-1 to Cl-2, Cl-4 to Cl-5>
97.8 g of pure water, 2.0 g of a 5% by mass sodium hypochlorite solution (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 0.22 g of 80% by mass acetic acid (manufactured by Showa Denko K.K.) were mixed in a PE container to prepare Cl-1. Cl-1 was diluted with pure water to prepare cleaning composition Cl-2 shown in Table 1. In the same manner, cleaning compositions Cl-4 to Cl-5 shown in Table 1 were prepared.
＜製造例４：洗浄用組成物Ｃｌ－３＞
純水を９９．６ｇ、５質量％次亜塩素酸Ｎａ溶液（富士フイルム和光純薬株式会社製）を０．４０ｇ、８０質量％酢酸（昭和電工株式会社製）を０．００３８ｇ、ＰＥ容器内で混合し、Ｃｌ－３を調製した。
<Production Example 4: Cleaning composition Cl-3>
99.6 g of pure water, 0.40 g of a 5% by mass sodium hypochlorite solution (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 0.0038 g of 80% by mass acetic acid (manufactured by Showa Denko K.K.) were mixed in a PE container to prepare Cl-3.
＜製造例５：洗浄用組成物Ｃｌ－６＞
５質量％次亜塩素酸Ｎａ溶液（富士フイルム和光純薬株式会社製）を純水で希釈して表１に記載の洗浄用組成物Ｃｌ－６を調製した。
<Production Example 5: Cleaning Composition Cl-6>
A 5% by mass sodium hypochlorite solution (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) was diluted with pure water to prepare cleaning composition Cl-6 described in Table 1.
＜製造例６：有機酸含有組成物Ａ（洗浄用組成物ＯＡ－１～ＯＡ－５）＞
純水３９．９ｇと８０質量％酢酸（昭和電工株式会社製）を１０．０ｇ、酢酸ナトリウム三水和物（富士フイルム和光純薬株式会社製）を５０．１ｇ、ＰＥ容器内で混合し、酢酸８．０質量％、酢酸ナトリウム３０．２質量％の有機酸含有組成物Ａを得た。有機酸含有組成物Ａを純水で希釈して表１に記載された洗浄用組成物ＯＡ－１を調製した。同様にして、表１に記載された洗浄用組成物ＯＡ－２～ＯＡ－５を調製した。
<Production Example 6: Organic Acid-Containing Composition A (Cleaning Compositions OA-1 to OA-5)>
39.9 g of pure water, 10.0 g of 80% by mass acetic acid (manufactured by Showa Denko K.K.), and 50.1 g of sodium acetate trihydrate (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to obtain an organic acid-containing composition A containing 8.0% by mass of acetic acid and 30.2% by mass of sodium acetate. The organic acid-containing composition A was diluted with pure water to prepare cleaning composition OA-1 shown in Table 1. In the same manner, cleaning compositions OA-2 to OA-5 shown in Table 1 were prepared.
＜製造例７：洗浄用組成物ＯＡ－６＞
８０質量％酢酸（昭和電工株式会社製）を純水で希釈して、表１に記載の洗浄用組成物ＯＡ－６を調製した。
<Production Example 7: Cleaning Composition OA-6>
A cleaning composition OA-6 shown in Table 1 was prepared by diluting 80% by mass of acetic acid (manufactured by Showa Denko KK) with pure water.
＜製造例８：有機酸含有組成物Ｂ（洗浄用組成物ＯＡ－７～ＯＡ－８）＞
純水６２．７ｇとクエン酸一水和物（富士フイルム和光純薬株式会社製）を８．８ｇ、クエン酸三ナトリウム二水和物（富士フイルム和光純薬株式会社製）を２８．５ｇ、ＰＥ容器内で混合し、クエン酸８．０質量％、クエン酸三ナトリウム２５．０質量％の有機酸含有組成物Ｂを得た。有機酸含有組成物Ｂを純水で希釈して表１に記載の洗浄用組成物ＯＡ－７を調製した。同様にして、表１に記載された洗浄用組成物ＯＡ－８を調製した。
<Production Example 8: Organic Acid-Containing Composition B (Cleaning Compositions OA-7 to OA-8)>
62.7 g of pure water, 8.8 g of citric acid monohydrate (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 28.5 g of trisodium citrate dihydrate (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to obtain an organic acid-containing composition B containing 8.0 mass % of citric acid and 25.0 mass % of trisodium citrate. The organic acid-containing composition B was diluted with pure water to prepare cleaning composition OA-7 described in Table 1. In the same manner, cleaning composition OA-8 described in Table 1 was prepared.
＜製造例９：洗浄用組成物ＯＡ－９＞
純水９８．９ｇとクエン酸一水和物（富士フイルム和光純薬株式会社製）を１．１ｇ、ＰＥ容器内で混合し、表１に記載の洗浄用組成物ＯＡ－９を調製した。
<Production Example 9: Cleaning Composition OA-9>
98.9 g of pure water and 1.1 g of citric acid monohydrate (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to prepare cleaning composition OA-9 shown in Table 1.
＜製造例１０：洗浄用組成物ＥＮ－１～ＥＮ－４＞
純水９９．０ｇとパパイン（富士フイルム和光純薬株式会社製）を１．０ｇ、ＰＥ容器内で混合し、表１に記載の洗浄用組成物ＥＮ－１を調製した。洗浄用組成物ＥＮ－１を純水で希釈して表１に記載の洗浄用組成物ＥＮ－２を調製した。同様にして、表１に記載された組成の洗浄用組成物ＥＮ－３～ＥＮ－４を調製した。
<Production Example 10: Cleaning Compositions EN-1 to EN-4>
99.0 g of pure water and 1.0 g of papain (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to prepare cleaning composition EN-1 shown in Table 1. Cleaning composition EN-1 was diluted with pure water to prepare cleaning composition EN-2 shown in Table 1. In the same manner, cleaning compositions EN-3 to EN-4 having the compositions shown in Table 1 were prepared.
＜製造例１１：洗浄用組成物ＥＮ－５＞
純水９９．０ｇとリパーゼ（富士フイルム和光純薬株式会社製）を１．０ｇ、ＰＥ容器内で混合し、表１に記載の洗浄用組成物ＥＮ－５を調製した。
<Production Example 11: Cleaning Composition EN-5>
99.0 g of pure water and 1.0 g of lipase (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to prepare cleaning composition EN-5 described in Table 1.
＜製造例１２：洗浄用組成物ＥＮ－６＞
純水９９．０ｇとα－アミラーゼ（富士フイルム和光純薬株式会社製）を１．０ｇ、ＰＥ容器内で混合し、表１に記載の洗浄用組成物ＥＮ－６を調製した。
<Production Example 12: Cleaning Composition EN-6>
99.0 g of pure water and 1.0 g of α-amylase (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) were mixed in a PE container to prepare cleaning composition EN-6 described in Table 1.
上記のようにして得られた洗浄用組成物それぞれについて、ｐＨ測定、殺菌試験、タンパク質除去試験、炭酸Ｃａ溶解量試験を実施した。その結果を表１～表４に示した。 For each of the cleaning compositions obtained as described above, pH measurements, sterilization tests, protein removal tests, and calcium carbonate solubility tests were carried out. The results are shown in Tables 1 to 4.
＜実施例１＞
第１の洗浄用組成物としてＰＡ－１、第２の洗浄用組成物としてＣｌ－１を用いた場合について、第１の洗浄工程及び第２の洗浄工程を経た後の殺菌率、タンパク質除去率、炭酸Ｃａ溶解量を算出した。結果を表５に示した。
Example 1
When PA-1 was used as the first cleaning composition and Cl-1 was used as the second cleaning composition, the sterilization rate, protein removal rate, and amount of dissolved Ca carbonate were calculated after the first cleaning step and the second cleaning step. The results are shown in Table 5.
＜実施例２～１８、比較例１～２６＞
実施例１と同様にして、第１の洗浄用組成物及び第２の洗浄用組成物として表５に記載された洗浄用組成物を用いた場合について、第１の洗浄工程及び第２の洗浄工程を経た後の殺菌率、タンパク質除去率、炭酸Ｃａ溶解量を算出した。結果を表５及び表６に示した。
<Examples 2 to 18, Comparative Examples 1 to 26>
In the same manner as in Example 1, the sterilization rate, protein removal rate, and amount of dissolved Ca carbonate after the first cleaning step and the second cleaning step were calculated for the cleaning compositions shown in Table 5 as the first cleaning composition and the second cleaning composition. The results are shown in Tables 5 and 6.
上記の通り、本発明によれば、排水が下水排除基準を満たしつつ、殺菌と共に、タンパク質除去やスケール除去も効果的に行うことができる洗浄方法を提供することができることが示された。
As described above, it has been shown that the present invention can provide a cleaning method that can effectively remove proteins and scales as well as sterilize wastewater while allowing the wastewater to meet sewage removal standards.
Claims (10)
第２の洗浄用組成物を用いて洗浄する第２の洗浄工程と、
を代わる代わる実施することを含む、洗浄方法であって、
前記第１の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
前記第２の洗浄用組成物は、少なくとも、酸、殺菌剤、及びタンパク質除去剤からなる群より選択される１種以上を含み、
第１の洗浄用組成物と第２の洗浄用組成物とは、異なる組成物であり、
前記第１の洗浄用組成物及び前記第２の洗浄用組成物のｐＨ値は、それぞれ独立して４．０～１０．０であり、
前記酸が、過有機酸及び／又はその塩、次亜塩素酸及び／又はその塩、並びに有機酸及び／又はその塩からなる群より選択される１種以上を含み、
過有機酸及び／又はその塩を０．００１～０．１質量％、次亜塩素酸及び／又はその塩を０．００２～０．１質量％、有機酸及び／又はその塩を０．０２～１０質量％の量で含み、
前記第１の洗浄用組成物および前記第２の洗浄用組成物の少なくともいずれかは、酸を含み、当該酸は有機酸及び／又はその塩であり、
洗浄対象物が、医療用器具及び／又は配管である、洗浄方法。 a first cleaning step of cleaning with a first cleaning composition;
A second cleaning step of cleaning with a second cleaning composition;
A cleaning method comprising alternately carrying out
The first cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover,
The second cleaning composition includes at least one selected from the group consisting of an acid, a disinfectant, and a protein remover;
The first cleaning composition and the second cleaning composition are different compositions,
the pH value of the first cleaning composition and the second cleaning composition is each independently from 4.0 to 10.0;
The acid includes at least one selected from the group consisting of a peroxy acid and/or a salt thereof, a hypochlorous acid and/or a salt thereof, and an organic acid and/or a salt thereof;
Contains 0.001 to 0.1 mass% of a perorganic acid and/or a salt thereof, 0.002 to 0.1 mass% of a hypochlorous acid and/or a salt thereof, and 0.02 to 10 mass% of an organic acid and/or a salt thereof;
At least one of the first cleaning composition and the second cleaning composition contains an acid, and the acid is an organic acid and/or a salt thereof;
A cleaning method in which the object to be cleaned is a medical instrument and/or piping.
ＲＣＨｐ（ＯＨ）ｑ（ＣＨ２ＣＯＯＨ）ｒＣＯＯＨ
で表され、式中、
Ｒは、Ｈ、ＯＨ及び炭素数１～７のアルキル基から選択され、
ｐは、０～２の整数であり、
ｑは、０～１の整数であり、
ｒは、０～２の整数であり、
ｐ＋ｑ＋ｒ＝２を満たす、
請求項４に記載の洗浄方法。 The organic acid has the following formula:
RCH p (OH) q (CH 2 COOH) r COOH
In the formula:
R is selected from H, OH, and an alkyl group having 1 to 7 carbon atoms;
p is an integer from 0 to 2,
q is an integer from 0 to 1;
r is an integer from 0 to 2;
p+q+r=2 is satisfied.
The cleaning method according to claim 4 .
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