JP7531333B2 - Stage apparatus, exposure apparatus, and method for manufacturing an article - Google Patents

Description

The present invention relates to a stage device, an exposure device, and a method for manufacturing an article.

When using photolithography to manufacture products such as semiconductor devices, liquid crystal display devices, imaging devices, and magnetic heads, step-and-scan exposure devices are used. Such exposure devices are also called scanners, and transfer the pattern of the original to a shot area while scanning the original and the substrate relative to one another, and after completing the scanning and exposure of one shot area, move the substrate in steps to scan and expose the next shot area.

The exposure apparatus is also equipped with a stage device that includes a fine movement stage and a coarse movement stage as a stage device capable of holding and moving the substrate (see Patent Documents 1 and 2). This stage device makes it possible to move the substrate in a first direction in synchronization with the original during scanning exposure, and when scanning exposure is completed, to move the substrate in steps in a third direction perpendicular to the first and second directions while making a U-turn in a second direction opposite to the first direction. The fine movement stage also achieves both high-precision position control and low heat generation by using an electromagnet for acceleration and a linear motor for position control.

JP 2005-109522 A Japanese Patent Application Publication No. 8-130179

In order to achieve high productivity in a scanning exposure apparatus, after scanning exposure of one shot area is completed, it is necessary to finish the step movement of the substrate while making a U-turn. Therefore, in the stage apparatus, it is required that the acceleration of the fine movement stage in the direction perpendicular to the scanning direction (hereinafter, X direction) is greater than the acceleration in the scanning direction (hereinafter, Y direction).

The acceleration of the fine movement stage depends on the force (maximum force) generated by the electromagnet, and the maximum force generated by the electromagnet is determined by the projected area of the electromagnet's attraction area projected onto a plane normal to the thrust direction. Therefore, to increase the acceleration in the X direction, the projected area of the attraction area of the electromagnet that generates force in the X direction (X electromagnet) must be increased. However, conventionally, the X electromagnet and the Y electromagnet are configured so that the projected area of the attraction area of the X electromagnet is equal to the projected area of the attraction area of the electromagnet that generates force in the Y direction (Y electromagnet). Therefore, an increase in the size of the X electromagnet also increases the size of the Y electromagnet, and the overall mass also increases.

The present invention has been made in consideration of the problems with the conventional technology, and has as an exemplary object to provide a stage device that is advantageous for increasing the productivity of a scanning-type exposure device without increasing the overall size or mass.

In order to achieve the above-mentioned object, a stage device as one aspect of the present invention is a stage device used in an exposure apparatus that scans and exposes a substrate , and includes a stage that holds and moves the substrate , a first unit including a first electromagnet that generates a force for accelerating the stage in a scanning direction, a second unit including a second electromagnet that generates a force for accelerating the stage in an intersecting direction that intersects the scanning direction, and a moving section that moves a structure in which the first unit and the second unit are provided, and is characterized in that an area of a core of the second electromagnet in a plane having a normal to the intersecting direction is larger than an area of a core of the first electromagnet in a plane having a normal to the scanning direction.

Further objects and other aspects of the present invention will become apparent from the embodiments described below with reference to the accompanying drawings.

The present invention can provide a stage device that is advantageous for increasing the productivity of a scanning exposure device, for example, without increasing the overall size or mass.

1 is a schematic diagram showing a configuration of an exposure apparatus according to one aspect of the present invention. FIG. 2 is a diagram showing the overall configuration of a substrate stage in the first embodiment. FIG. 3 is a diagram showing details of the microelectromagnet shown in FIG. 2 . 5A and 5B are top views of the micromotion electromagnets in the comparative example and the first embodiment, respectively. FIG. 13 is a diagram showing the overall configuration of a substrate stage in a second embodiment. FIG. 6 is a diagram showing details of the fine movement stage shown in FIG. 5 . FIG. 6 is a diagram showing details of a modified example of the fine movement stage shown in FIG. 5 . 6A and 6B are diagrams showing the Y velocity, Y acceleration, X acceleration, and X position during a U-turn period of the substrate stage. FIG. 13 is a diagram showing the relationship between the Y acceleration of the substrate stage and the required X acceleration of the substrate stage. FIG. 1 is a diagram showing the overall configuration of a substrate stage as a comparative example. FIG. 1 is a diagram showing the overall configuration of a substrate stage as a comparative example. FIG. 12 is a schematic diagram showing the configuration of the fine movement stage shown in FIGS. 10 and 11 . 13 is a diagram showing details of the fine movement YLM and the fine movement ZLM shown in FIG. 12. FIG. 12 is a diagram showing details of the microelectromagnet shown in FIG. 11 . 11 is a diagram showing details of the X-slider, the Y-slider, and the XY-slider shown in FIG. 10 . 12 is a diagram showing details of the coarse motion linear motor shown in FIG. 11 . FIG. 2 is a diagram showing a shot arrangement on a substrate.

The following embodiments are described in detail with reference to the attached drawings. Note that the following embodiments do not limit the invention according to the claims. Although the embodiments describe multiple features, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined in any manner. Furthermore, in the attached drawings, the same reference numbers are used for the same or similar configurations, and duplicate explanations are omitted.

Figure 1 is a schematic diagram showing the configuration of an exposure apparatus 1 according to one aspect of the present invention. The exposure apparatus 1 is a lithography apparatus used, for example, in a manufacturing process (lithography process) for semiconductor devices and the like, for forming a pattern on a substrate. The exposure apparatus 1 exposes a substrate W via an original R. In this embodiment, the exposure apparatus 1 is a step-and-scan type (scanning type) exposure apparatus (scanner) that exposes (scanning exposure) the substrate W while scanning the original R and the substrate W relatively in a scanning direction, thereby transferring the pattern of the original R onto the substrate.

As shown in FIG. 1, the exposure apparatus 1 has a stage base 692, a substrate stage 500, a lens barrel base 696, a damper 698, a projection optical system 697, an illumination optical system 699, an original base 694, and an original stage 695. In this embodiment, the direction perpendicular to the paper surface of FIG. 1 is the scanning direction, and the horizontal direction within the paper surface of FIG. 1 is the stepping direction. In addition, a coordinate system is defined in which the scanning direction is the Y axis, a direction intersecting the scanning direction, particularly the stepping direction perpendicular to the scanning direction, is the X axis, and a direction perpendicular to the X and Y axes is the Z axis.

The stage base 692 is supported by the floor 691 via a mount (not shown). The substrate stage 500 is provided on the stage base 692. The lens barrel base 696 is supported by the floor 691 via a damper 698. The lens barrel base 696 is provided with a projection optical system 697 and an original plate base 694. An original plate stage 695 is provided movably (slidably) on the original plate base 694. An illumination optical system 699 is provided above the original plate stage 695.

During exposure, light emitted from a light source (not shown) illuminates the original R via an illumination optical system 699. The pattern of the original R is projected (imaged) onto the substrate W via a projection optical system 697. At this time, the original stage 695 and the substrate stage 500 each scan the original R and the substrate W relatively in the scanning direction. As described below, the substrate stage 500 used by the exposure apparatus 1 can make the acceleration in the step direction perpendicular to the scanning direction greater than the acceleration in the scanning direction. Therefore, the exposure apparatus 1 can provide devices (such as semiconductor devices, liquid crystal display devices, imaging devices, and magnetic heads) with high throughput and good economy.

Before describing the details of the substrate stage 500 in the first and second embodiments, the configuration and problems of a general substrate stage 500A will be described below as a comparative example.

Comparative Example
10 is a diagram showing the overall configuration of a substrate stage 500A as a comparative example. An XY slider 504 is provided on a stage base 505 so as to be movable (slidable) in the X and Y directions. An X slider 502 is provided on the XY slider 504 so as to be movable (slidable) in the X direction. A Y slider 503 is provided on the X slider 502 so as to be movable (slidable) in the Y direction. Coarse linear motors 506 are provided on both sides of the X slider 502 and the Y slider 503. The coarse linear motor 506 moves the X slider 502 and the Y slider 503 in the X and Y directions, respectively. The X slider 502, the Y slider 503, the XY slider 504, and the coarse linear motor 506 function as a moving unit that moves the fine movement base 501-2 as a structure.

Figure 11 is a diagram showing the overall configuration of the substrate stage 500A when viewed from the front side of the Y axis toward the back side of the Y axis. Figure 12 is a schematic diagram showing the configuration of the fine movement stage 501, showing the state in which the fine movement top plate 501-1 has been removed. The fine movement base 501-2 is provided on the XY slider 504. Four fine movement ZLMs (linear motors) 501-6 that perform precise positioning of tilt in the Z direction are provided on the fine movement base 501-2. Furthermore, two fine movement XLMs 501-4 that perform precise positioning in directions around the X and Y axes, and two fine movement YLMs 501-5 that perform precise positioning in directions around the Y and Z axes are provided on the fine movement base 501-2. In other words, the fine movement XLM 501-4 functions as a unit (fourth unit) that controls the position of the fine movement stage 501 in the X direction, and the fine movement YLM 501-5 functions as a unit (third unit) that controls the position of the fine movement stage 501 in the Y direction. In addition, a fine movement electromagnet 501-3 is provided in the center of the fine movement base 501-2 to generate acceleration forces in the X and Y directions.

Figure 13 shows the details of the fine movement YLM 501-5 and fine movement ZLM 501-6, with part of the yoke removed. The fine movement YLM 501-5 is composed of a fine movement YLM coil base 501-52, a fine movement YLM coil 501-51, a fine movement YLM magnet 501-53, a fine movement YLM yoke 501-54, and a fine movement LM spacer 501-70. In this configuration, the fine movement YLM coil base 501-52 is fixed onto the fine movement base 501-2, and the fine movement YLM coil 501-51 is fixed onto the fine movement YLM coil base 501-52.

The fine movement YLM coil 501-51 is an oval coil with a straight section extending vertically, and four fine movement YLM magnets 501-53 are provided with gaps between them so as to face the straight section. Two fine movement YLM yokes 501-54 are provided on the back of the fine movement YLM magnets 501-53 to allow magnetic flux to pass. The magnetization direction of the fine movement YLM magnets 501-53 is the X direction, the fine movement YLM magnets 501-53 adjacent in the Y direction have opposite polarities, and the fine movement YLM magnets 501-53 arranged in the X direction have the same polarity. The fine movement LM spacer 501-70 is used to hold the position of the pair of magnets and yokes against the attractive force acting on them.

The fine movement YLM magnet 501-53, fine movement YLM yoke 501-54, and fine movement LM spacer 501-70 are mounted on the fine movement top plate 501-1. By passing a current through the fine movement YLM coil 501-51, a force proportional to the current can be generated in a direction perpendicular to the straight section, i.e., in the Y direction. In addition, by passing a current through each of the two fine movement YLM coils 501-51 in opposite directions, a moment can be generated around the Z axis.

On the other hand, the fine movement ZLM 501-6 is composed of a fine movement ZLM coil base 501-62, a fine movement ZLM coil 501-61, a fine movement ZLM magnet 501-63, a fine movement ZLM yoke 501-64, and a fine movement LM spacer 501-70. In this configuration, the fine movement ZLM coil base 501-62 is fixed onto the fine movement base 501-2, and the fine movement ZLM coil 501-61 is fixed onto the fine movement ZLM coil base 501-62.

The fine-motion ZLM coil 501-61 is an elliptical coil with a straight portion extending horizontally, and four fine-motion ZLM magnets 501-63 are provided with gaps between them so as to face the straight portion. Two fine-motion ZLM yokes 501-64 are provided on the back of the fine-motion ZLM magnets 501-63 to allow magnetic flux to pass. The magnetization direction of the fine-motion ZLM magnets 501-63 is the X direction, and the fine-motion ZLM magnets 501-63 adjacent in the Z direction have opposite polarities, while the fine-motion ZLM magnets 501-63 arranged in the X direction have the same polarity. The fine-motion LM spacer 501-70 is used to hold the position of the pair of magnets and yokes against the attractive force acting on them.

The fine movement ZLM magnet 501-63, fine movement ZLM yoke 501-64, and fine movement LM spacer 501-70 are mounted on the fine movement top plate 501-1. By passing a current through the fine movement ZLM coil 501-61, a force proportional to the current can be generated in a direction perpendicular to the straight section, i.e., in the Z direction. In addition, because there are four fine movement ZLM coils 501-61, a moment about the X axis and a moment about the Y axis can be generated by combining the current directions.

The fine movement XLM501-4 has the same configuration as the fine movement YLM501-5, and is rotated 90 degrees relative to the fine movement YLM501-5. The fine movement XLM501-4 can generate a force in the X direction and a moment around the Z axis.

Figure 14 is a diagram showing the details of the fine electromagnet 501-3. The fine electromagnet 501-3 is composed of a first unit and a second unit that apply a force to the fine stage 501. The first unit includes a first electromagnet, and is a unit that applies a force generated by the first electromagnet to the fine stage 501 as a force that accelerates the fine stage 501 in the Y direction. The second unit includes a second electromagnet, and is a unit that applies a force generated by the second electromagnet to the fine stage 501 as a force that accelerates the fine stage 501 in the X direction. Specifically, the fine electromagnet 501-3 includes an E core support member 501-30, an I core support member 501-31, and an I core 501-32. Additionally, the fine motion electromagnet 501-3 includes an E core X 501-33, an E core X coil 501-34, an E core Y 501-35, and an E core Y coil 501-36.

An E-core support member 501-30 is fixed onto the fine-motion base 501-2. Two E-cores X 501-33, an E-core X coil 501-34, two E-cores Y 501-35, and an E-core Y coil 501-36 are fixed to the four inner surfaces of the E-core support member 501-30. An I-core 501-32 is provided to these E-cores via a small gap. The I-core 501-32 is provided on the fine-motion top plate 501-1 via an I-core support member 501-31. The four E-cores and I-cores have the same size, and the maximum force they can generate is also the same.

Figure 15 is a diagram showing the details of the X slider 502, Y slider 503, and XY slider 504. The XY slider 504 is composed of a lower XY slider 504-3, a middle XY slider 504-2, and an upper XY slider 504-1. The lower XY slider 504-3 is supported on a stage base 505 so that it can move (slide freely) in the X and Y directions. The middle XY slider 504-2 is stacked on top of the lower XY slider 504-3, and the upper XY slider 504-1 is stacked on top of the middle XY slider 504-2.

The X-slider 502 is composed of an X-beam 502-1, an X-foot 502-2, and an X-yaw guide 502-3. The two X-yaw guides 502-3 are fixed to the two sides of the stage base 505, and the two X-feet 502-2 are connected by the X-beam 502-1.

One X foot 502-2 faces the side of one X yaw guide 502-3 and the upper surface of the stage base 505 via a gap, and is supported so as to be movable (slidable) in the X direction. The other X foot 502-2 faces the side of the other X yaw guide 502-3 and the upper surface of the stage base 505 via a gap, and is supported so as to be movable (slidable) in the X direction. This makes the integrated body of the X beam 502-1 and the two X feet 502-2 movable (slidable) in the X direction. In addition, both sides of the X beam 502-1 face the inner surface of the XY slider 504-2 via a minute space, and restrains the XY slider 504 so as to be movable (slidable) in the X and Y directions.

The Y slider 503 is composed of a Y beam 503-1, a Y foot 503-2, and a Y yaw guide 503-3. The two Y yaw guides 503-3 are fixed to the two sides of the stage base 505, and the two Y feet 503-2 are connected by the Y beam 503-1.

One Y foot 503-2 faces the side of one Y yaw guide 503-3 and the upper surface of the stage base 505 via a gap, and is supported so as to be movable (slidable) in the Y direction. The other Y foot 503-2 faces the side of the other Y yaw guide 503-3 and the upper surface of the stage base 505 via a gap, and is supported so as to be movable (slidable) in the Y direction. This makes the Y beam 503-1 and the two Y feet 503-2 integrated into one body movable (slidable) in the Y direction. In addition, both sides of the Y beam 503-1 face the inner surface of the XY slider top 504-1 via a minute space, and restrain the XY slider 504 so as to be movable (slidable) in the X and Y directions.

16 is a diagram showing details of the coarse motion linear motor 506. The coarse motion linear motor 506 includes a coil 506-1, a coil support plate 506-2, a coil support column 506-3, and a coil base 506-4. The coarse motion linear motor 506 includes a magnet 506-5, a yoke 506-6 , a spacer 506-7, and an arm 506-8.

Coil 506-1 is a two-phase coil unit in which adjacent coils are out of phase with each other by 90 degrees. Coil 506-1 is fixed integrally to coil support plate 506-2, and fixed to coil base 506-4 via coil support pillar 506-3. Coil base 506-4 may be fixed to stage base 692, or may be supported so as to be movable (slidable) in the coil arrangement direction relative to stage base 692. By supporting coil base 506-4 movably in this way, it is possible to absorb the reaction force of acceleration.

The magnets 506-5 are a pair of four-pole magnet units. The magnets 506-5 are arranged so as to sandwich the coil from above and below with a gap therebetween, and a yoke 506-6 is provided behind the magnets. The spacer 506-7 is used to maintain the gap between the pair of magnets against the attraction force. The integrated body of the magnets 506-5, yoke 506-6 , and spacer 506-7 is fixed to the X foot 502-2 or the Y foot 503-2 via the arm 506-8. This allows thrust in the X direction or thrust in the Y direction to be applied to the integrated body of the X beam 502-1 and the two X feet 502-2 or the integrated body of the Y beam 503-1 and the two Y feet 503-2. In addition, in this configuration, a sinusoidal current according to the position is passed through the coil facing the magnet among the two-phase coils, thereby allowing continuous force to be generated.

Figure 17 is a diagram showing the shot arrangement of a substrate W. Shot areas 701 with an X size of Sx and a Y size of Sy are arranged (layed out) on the substrate W, and scanning exposure is performed along the scan (Y direction) and step (X direction) trajectories shown by the arrows in Figure 17. During scanning exposure, the substrate stage scans and moves in the Y direction in synchronization with the original stage at a speed of 1/the magnification (exposure magnification) of the projection optical system, and when scanning exposure is completed, it makes a U-turn in the Y direction while stepping in the X direction to perform scanning exposure of the next shot area.

Figure 8 is a diagram showing the Y-direction speed (Y speed), Y-direction acceleration (Y acceleration), X-direction acceleration (X acceleration), and X-direction position (X position) while the substrate stage is making a U-turn (U-turn period). Figure 8 shows a case where the exposure magnification is 4x, the Y acceleration of the substrate stage is 30G, and the scanning speed of the substrate stage is 5m/s. Referring to Figure 8, an X acceleration of just under 10G is required to complete a step movement of 26mm, which corresponds to the X size Sx of the shot area 701, within the U-turn period of the substrate stage. 10G is greater than 7.5G, which is 30G/exposure magnification, which indicates that the X acceleration is greater than the Y acceleration in the substrate stage.

Figure 9 is a diagram showing the relationship between the Y acceleration of the substrate stage on the horizontal axis and the required X acceleration of the substrate stage on the vertical axis, with the solid line indicating the relationship between them. Figure 9 also shows the relationship when the X acceleration and Y acceleration of the substrate stage are the same, with the dashed line. Referring to Figure 9, once the Y acceleration of the substrate stage exceeds about 7 G, the required X acceleration of the substrate stage will be above the dashed line, meaning that it is required that the X acceleration of the substrate stage be greater than the Y acceleration.

Therefore, in this embodiment, we provide a stage device (substrate stage 500) that is advantageous for increasing the productivity of a scanning-type exposure device by making the X acceleration greater than the Y acceleration without increasing the overall size or mass.

First Embodiment
The substrate stage 500 in the first embodiment will be described with reference to Figures 2, 3, and 4. Figure 2 is a diagram showing the overall configuration of the substrate stage 500 in the first embodiment, and shows a state in which the fine movement top plate 101-1 has been removed. With reference to Figure 2, a fine movement electromagnet 101-3 is provided in the center of the substrate stage 500. In the substrate stage 500 in the first embodiment, the configuration except for the fine movement electromagnet 101-3 is the same as in the comparative example, so in the first embodiment, only the fine movement electromagnet 101-3 will be described.

Figure 3 is a diagram showing the details of the fine electromagnet 101-3. The fine electromagnet 101-3 includes an E core support member 101-30, an I core support member 101-31, an I core X 101-38, and an I core Y 101-37. Furthermore, the fine electromagnet 101-3 includes an E core X 101-33, an E core X coil 101-34, an E core Y 101-35, and an E core Y coil 101-36.

The E-core support member 101-30 is fixed on top of the fine adjustment base 101-2. Two E-cores X101-33 and E-core X-coil 101-34, and two E-cores Y101-35 and E-core Y-coil 101-36 are fixed to the four inner sides of the E-core support member 101-30. I-cores X101-38 and I-cores Y101-37 are provided with tiny gaps between these four E-cores, and are fixed to the fine adjustment top plate 101-1 via the I-core support member 101-31.

Figure 4 is a top view of the fine electromagnet 501-3 in the comparative example and the fine electromagnet 101-3 in the first embodiment. As shown in Figure 4, the E core support member 101-30 has the same size as the E core support member 501-30.

Referring to FIG. 4, the E core X101-33 has a different size from the E core X501-33, and in this embodiment, a size larger than the size of the E core X501-33. In other words, the projected area obtained by projecting (the width of) the E core X101-33 onto a plane whose normal is the X direction is larger than the projected area obtained by projecting the E core X501-33 onto a plane whose normal is the X direction. Therefore, in this embodiment, a large acceleration force can be generated in the X direction, and the X acceleration of the substrate stage 500 can be made larger than in the comparative example.

On the other hand, E-core Y101-35 has the same size as E-core Y501-35. In other words, the projected area obtained by projecting (the width of) E-core Y101-35 onto a plane whose normal is the Y direction is the same as the projected area obtained by projecting E-core Y501-35 onto a plane whose normal is the Y direction. Therefore, in this embodiment, it is possible to generate the same acceleration force in the Y direction as in the comparative example, and it is possible to increase the X acceleration of the substrate stage 500 compared to the comparative example without sacrificing the Y acceleration of the substrate stage 500.

In this way, in this embodiment, the projected area obtained by projecting E-core X101-33 (core of the second electromagnet) onto a plane whose normal is the X direction is larger than the projected area obtained by projecting E-core Y101-35 (core of the first electromagnet) onto a plane whose normal is the Y direction. This allows the X acceleration to be greater than the Y acceleration in the substrate stage 500 without increasing the overall size or mass. Therefore, even if the acceleration in the scanning direction (Y direction) of the substrate stage 500 is increased to improve the productivity of the exposure apparatus 1, the step movement (movement in the X direction) can be completed within the U-turn period of the substrate stage 500.

In terms of making the X acceleration larger than the Y acceleration, it is preferable that the above-mentioned projection area obtained from the E-core X101-33 is 1.1 times or more larger than the above-mentioned projection area obtained from the E-core Y101-35. This is advantageous for increasing the productivity of the exposure apparatus 1.

Second Embodiment
A substrate stage 500 in the second embodiment will be described with reference to Figures 5, 6, and 7. Figure 5 is a diagram showing the overall configuration of the substrate stage 500 in the second embodiment, with the fine movement top plate removed. With reference to Figure 5, a fine movement stage 201 is provided in the center of the substrate stage 500. In the substrate stage 500 in the second embodiment, the configuration except for the fine movement stage 201 is the same as in the comparative example, so in the second embodiment, only the fine movement stage 201 will be described.

Figure 6 is a diagram showing the details of the fine movement stage 201. The fine movement stage 201 is composed of a fine movement top plate (not shown), a fine movement base 201-2, one fine movement XLM (linear motor) 201-4, two fine movement YLMs 201-5, and four fine movement ZLMs 201-6. In this embodiment, the acceleration of the substrate stage 500 in the X and Y directions is performed by linear motors, i.e., the fine movement XLM 201-4 and the fine movement YLM 201-5, rather than by electromagnets. The fine movement XLM 201-4 (second linear motor) constitutes a second unit that applies a force to the fine movement stage 201 to accelerate the fine movement stage 201 in the X direction. The fine movement YLM 201-5 (first linear motor) constitutes a first unit that applies a force to the fine movement stage 201 to accelerate the fine movement stage 201 in the Y direction. In this embodiment, the fine movement XLM 201-4 and the fine movement YLM 201-5 also control the position of the substrate stage 500 in the XY plane and around the Z axis. In other words, the fine movement XLM 201-4 and the fine movement YLM 201-5 also function as a fourth unit that controls the position of the fine movement stage 201 in the X direction and a third unit that controls the position of the fine movement stage 201 in the Y direction, respectively.

In this embodiment, the configuration of the fine movement YLM 201-5 and the fine movement ZLM 201-6 is the same as that of the comparative example. On the other hand, in the fine movement XLM 201-4, three combinations of the fine movement XLM coil 201-41 and the fine movement XLM magnet 201-43 are arranged in a row (triplets) in the X direction. Thus, in this embodiment, the sum of the volumes of the fine movement XLM coil 201-41 and the fine movement XLM magnet 201-43 of the fine movement XLM 201-4 is larger than the sum of the volumes of the fine movement YLM coil and the fine movement YLM magnet of the fine movement YLM 201-5. This allows the X acceleration to be greater than the Y acceleration in the substrate stage 500 without increasing the overall size or mass. Therefore, even if the acceleration in the scanning direction (Y direction) of the substrate stage 500 is increased to improve the productivity of the exposure apparatus 1, the step movement (movement in the X direction) can be completed within the U-turn period of the substrate stage 500.

The sum of the volumes of the fine movement XLM coil 201-41 and fine movement XLM magnet 201-43 of the fine movement XLM 201-4 should be 1.1 times or more the sum of the volumes of the fine movement YLM coil and fine movement YLM magnet of the fine movement YLM 201-5. This is advantageous in terms of making the X acceleration greater than the Y acceleration, and can increase the productivity of the exposure apparatus 1. Also, as shown in FIG. 7, three fine movement XLMs 201-4 shown in FIG. 6 may be arranged in the Y direction. This can further increase the X acceleration in the substrate stage 500.

In addition, in the first and second embodiments, if the acceleration of the substrate stage 500 is SA [G] and the scanning speed of the substrate stage 500 is SV [m/s], then SA/SV > 4.5 is satisfied. In other words, when such a relationship holds between the acceleration of the substrate stage 500 and the scanning speed of the substrate stage 500, it is necessary to make the X acceleration greater than the Y acceleration.

In the first and second embodiments, the acceleration transmission mechanism of the fine movement stage of the substrate stage 500 has been mainly described. However, what is important is that in the scanning type exposure apparatus 1, the step movement is completed within the U-turn period of the substrate stage 500. To achieve this, regardless of whether the substrate stage 500 is a coarse and fine movement separated type or a coarse and fine movement integrated type, it is sufficient that the X acceleration > Y acceleration is realized in the substrate stage 500. In other words, the maximum thrust generated by the second actuator that provides the thrust to move the substrate stage 500 in the X direction (non-scanning direction) should be greater than the maximum thrust generated by the first actuator that provides the thrust to move the substrate stage 500 in the Y direction (scanning direction). In addition, the value obtained by dividing the maximum thrust in the X direction by the movable mass in the X direction may be greater than the value obtained by dividing the maximum thrust in the Y direction by the movable mass in the Y direction.

Specifically, the volume of the X-direction coarse motion linear motors can be made larger than the volume of the Y-direction coarse motion linear motors. Also, if the volumes of the X-direction coarse motion linear motors and the Y-direction coarse motion linear motors are the same, the number of X-direction coarse motion linear motors can be made larger than the number of Y-direction coarse motion linear motors. However, in these cases, the movable mass increases, so it is necessary to confirm that the maximum thrust in the X direction/movable mass in the X direction satisfies the maximum thrust in the Y direction/movable mass in the Y direction.

In addition, if the volumes and numbers of the X-direction coarse linear motors and the Y-direction coarse linear motors are the same, the capacity of the X-direction current driver may be made larger than the capacity of the Y-direction current driver so that a large current can be supplied to the X-direction coarse linear motor. In this case, as a countermeasure against heat generation, the refrigerant flow rate of the cooling mechanism of the X-direction coarse linear motor may be increased more than the refrigerant flow rate of the cooling mechanism of the Y-direction coarse linear motor.

Also, the volume of the X-direction coarse motion linear motor may be made smaller than the volume of the Y-direction coarse motion linear motor, and the capacity of the X-direction current driver may be made larger than the capacity of the Y-direction current driver, so that a large current can be supplied to the X-direction coarse motion linear motor. As a countermeasure against heat generation, the refrigerant flow rate of the cooling mechanism of the X-direction coarse motion linear motor may be increased more than the refrigerant flow rate of the cooling mechanism of the Y-direction coarse motion linear motor. In this case, by making the movable mass in the X-direction smaller than the movable mass in the Y-direction, the X acceleration can be increased.

The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as semiconductor devices, liquid crystal display devices, imaging devices, magnetic heads, and MEMS. The manufacturing method includes a step of exposing a substrate coated with a photosensitive agent using the exposure apparatus 1 described above, and a step of developing the exposed photosensitive agent. In addition, an etching step, an ion implantation step, and the like are performed on the substrate using the developed photosensitive agent pattern as a mask, to form a circuit pattern on the substrate. These steps of exposure, development, etching, and the like are repeated to form a circuit pattern consisting of multiple layers on the substrate. In a post-process, dicing (processing) is performed on the substrate on which the circuit pattern is formed, and chip mounting, bonding, and inspection steps are performed. The manufacturing method may also include other well-known steps (oxidation, film formation, deposition, doping, planarization, resist stripping, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article compared to the conventional method.

The invention is not limited to the above-described embodiment, and various modifications and variations are possible without departing from the spirit and scope of the invention. Therefore, the following claims are appended to disclose the scope of the invention.

1: Exposure device 500: Substrate stage 101-3: Fine electromagnet 101-30: E-core support member 101-31: I-core support member 101-33: E-core X 101-34: E-core X coil 101-35: E-core Y 101-36: E-core Y coil 101-37: I-core Y 101-38: I-core X R: Original W: Substrate

Claims (10)

1. A stage apparatus for use in an exposure apparatus that performs scanning exposure on a substrate , comprising:
A stage that holds and moves the substrate;
a first unit including a first electromagnet that generates a force for accelerating the stage in a scanning direction ;
a second unit including a second electromagnet that generates a force for accelerating the stage in a direction intersecting the scanning direction;
a moving unit that moves a structure on which the first unit and the second unit are provided,
a core area of the second electromagnet in a plane normal to the intersecting direction is larger than a core area of the first electromagnet in a plane normal to the scanning direction. 2. The stage device according to claim 1 , wherein an area of a core of the second electromagnet in a plane having the intersecting direction as a normal line is 1.1 times or more larger than an area of a core of the first electromagnet in a plane having the scanning direction as a normal line. 1. A stage apparatus for use in an exposure apparatus that performs scanning exposure on a substrate , comprising:
A stage that holds and moves the substrate;
a first unit including a first linear motor that generates a force for accelerating the stage in a scanning direction ;
a second unit including a second linear motor that generates a force for accelerating the stage in a direction intersecting the scanning direction;
a moving unit that moves a structure on which the first unit and the second unit are provided,
A stage device according to claim 1, wherein a sum of the volumes of the coils and magnets of said second linear motor is greater than a sum of the volumes of the coils and magnets of said first linear motor. The stage device according to claim 3, characterized in that the sum of the volumes of the coils and magnets of the second linear motor is 1.1 times or more the sum of the volumes of the coils and magnets of the first linear motor. If the acceleration of the stage is SA [G] and the scanning speed of the stage is SV [m/s], then
S/S > 4.5
5. The stage apparatus according to claim 1, wherein the above condition is satisfied. 1. A stage apparatus for use in an exposure apparatus that performs scanning exposure on a substrate , comprising:
A stage that holds and moves the substrate;
a first actuator that generates a thrust force for moving the stage in a scanning direction;
a second actuator that generates a thrust force that moves the stage in a direction intersecting the scanning direction,
a value obtained by dividing a maximum thrust generated by the second actuator by a second movable mass which is a mass of a movable object of the second actuator is larger than a value obtained by dividing a maximum thrust generated by the first actuator by a first movable mass which is a mass of a movable object of the first actuator and is different from the second movable mass ,
the first movable mass and the second movable mass each include a mass of the stage;
A stage apparatus comprising: 1. A stage apparatus for use in an exposure apparatus that performs scanning exposure on a substrate , comprising:
A stage that holds and moves the substrate;
a first unit that applies a force to the stage to accelerate the stage in a scanning direction;
a second unit that applies a force to the stage to accelerate the stage in a direction intersecting the scanning direction;
a moving unit that moves a structure on which the first unit and the second unit are provided,
A stage apparatus, wherein the second unit is larger in size than the first unit. 8. The stage device according to claim 1, wherein the scanning direction and the intersecting direction are perpendicular to each other. An exposure apparatus for scanningly exposing a substrate , comprising:
a stage device according to claim 1 that scans the substrate in a scanning direction;
a projection optical system that projects a pattern of an original onto the substrate being scanned in the scanning direction by the stage device;
An exposure apparatus comprising: exposing a substrate using the exposure apparatus according to claim 9 ;
developing the exposed substrate;
producing an article from the developed substrate;
A method for producing an article, comprising the steps of:

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