JP7532969B2 - Laminated film and conductive substrate - Google Patents
Laminated film and conductive substrate Download PDFInfo
- Publication number
- JP7532969B2 JP7532969B2 JP2020121440A JP2020121440A JP7532969B2 JP 7532969 B2 JP7532969 B2 JP 7532969B2 JP 2020121440 A JP2020121440 A JP 2020121440A JP 2020121440 A JP2020121440 A JP 2020121440A JP 7532969 B2 JP7532969 B2 JP 7532969B2
- Authority
- JP
- Japan
- Prior art keywords
- rubber
- film
- flame retardant
- curing agent
- resin layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 title claims description 15
- 229920005989 resin Polymers 0.000 claims description 93
- 239000011347 resin Substances 0.000 claims description 93
- 229920001971 elastomer Polymers 0.000 claims description 53
- 239000005060 rubber Substances 0.000 claims description 46
- 238000004132 cross linking Methods 0.000 claims description 34
- 239000003795 chemical substances by application Substances 0.000 claims description 33
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 claims description 30
- 239000003063 flame retardant Substances 0.000 claims description 28
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 24
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 22
- 239000004020 conductor Substances 0.000 claims description 20
- 125000003700 epoxy group Chemical group 0.000 claims description 15
- 239000011342 resin composition Substances 0.000 claims description 15
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 14
- 229920000459 Nitrile rubber Polymers 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 13
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 12
- 229910052794 bromium Inorganic materials 0.000 claims description 12
- 150000002148 esters Chemical group 0.000 claims description 11
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 6
- 239000005062 Polybutadiene Substances 0.000 claims description 6
- 229920002857 polybutadiene Polymers 0.000 claims description 6
- 229920003048 styrene butadiene rubber Polymers 0.000 claims description 6
- 229920000800 acrylic rubber Polymers 0.000 claims description 5
- 229920005549 butyl rubber Polymers 0.000 claims description 5
- 229920000058 polyacrylate Polymers 0.000 claims description 5
- 229920000181 Ethylene propylene rubber Polymers 0.000 claims description 4
- 150000001463 antimony compounds Chemical class 0.000 claims description 4
- 229920005558 epichlorohydrin rubber Polymers 0.000 claims description 4
- 229920001973 fluoroelastomer Polymers 0.000 claims description 4
- 229920003049 isoprene rubber Polymers 0.000 claims description 4
- 229920002379 silicone rubber Polymers 0.000 claims description 4
- 229920006311 Urethane elastomer Polymers 0.000 claims description 3
- 229920005556 chlorobutyl Polymers 0.000 claims description 3
- 229920001084 poly(chloroprene) Polymers 0.000 claims description 3
- 239000004945 silicone rubber Substances 0.000 claims description 3
- 239000004636 vulcanized rubber Substances 0.000 claims description 3
- 239000011888 foil Substances 0.000 description 43
- -1 polytetrafluoroethylene Polymers 0.000 description 23
- 239000011889 copper foil Substances 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 239000003822 epoxy resin Substances 0.000 description 12
- 229920000647 polyepoxide Polymers 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical group O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 9
- 239000002966 varnish Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000000806 elastomer Substances 0.000 description 7
- 229920000139 polyethylene terephthalate Polymers 0.000 description 7
- 239000005020 polyethylene terephthalate Substances 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 239000004974 Thermotropic liquid crystal Substances 0.000 description 6
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000005001 laminate film Substances 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229920000728 polyester Polymers 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- 229920001955 polyphenylene ether Polymers 0.000 description 5
- 150000003440 styrenes Chemical class 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- 239000004743 Polypropylene Substances 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- 239000004962 Polyamide-imide Substances 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- 125000004018 acid anhydride group Chemical group 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
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- 229920001230 polyarylate Polymers 0.000 description 3
- 229920001707 polybutylene terephthalate Polymers 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229920002633 Kraton (polymer) Polymers 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
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- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
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Images
Landscapes
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Description
本発明は、積層フィルム及び導体基板に関する。 The present invention relates to a laminated film and a conductive substrate.
携帯電話に代表される移動体通信機器、その基地局装置、サーバー、ルーター等のネットワークインフラ機器、大型コンピュータなどの電子機器では使用する信号の高速化及び大容量化が年々進んでいる。これに伴い、これらの電子機器に搭載されるプリント配線板には高周波化対応が必要となり、伝送損失の低減を可能とする低比誘電率及び低誘電正接の基板材料が求められている。近年、このような高周波信号を扱うアプリケーションとして、上述した電子機器のほかに、ITS分野(自動車、交通システム関連)及び室内の近距離通信分野でも高周波無線信号を扱う新規システムの実用化及び実用計画が進んでおり、今後、これらの機器に搭載するプリント配線板に対しても、低伝送損失基板材料が更に要求されると予想される。 The speed and capacity of signals used in electronic devices such as mobile phones, their base station equipment, network infrastructure equipment such as servers and routers, and large computers are increasing year by year. As a result, the printed wiring boards installed in these electronic devices must be able to handle higher frequencies, and there is a demand for board materials with low dielectric constants and low dielectric tangents that enable reduced transmission loss. In recent years, in addition to the electronic devices mentioned above, new systems that handle high-frequency wireless signals in the ITS field (related to automobiles and transportation systems) and in the indoor short-range communication field have been put into practical use and are planned to be put into practical use as applications that handle such high-frequency signals. It is expected that in the future, there will be an even greater demand for low-transmission-loss board materials for the printed wiring boards installed in these devices.
従来、低伝送損失が要求されるプリント配線板には、ポリフェニレンエーテル(PPE)、ポリイミド(PI)、液晶ポリマー(LCP)、フッ素樹脂等の樹脂が使用されている(例えば、特許文献1~4参照。)。
Conventionally, resins such as polyphenylene ether (PPE), polyimide (PI), liquid crystal polymer (LCP), and fluororesin have been used for printed wiring boards that require low transmission loss (see, for example,
フッ素樹脂は、低誘電特性を有する材料であることが知られているが、導体箔との接着性が低い。液晶ポリマーは融点が高いため、液晶ポリマーを含む配線基板を製造するためには、300℃以上の高温での熱プレスが必要とされる。柔軟で接着性に優れる樹脂材料を用いて導体箔と接着することが考えられるが、柔軟で接着性に優れる樹脂材料は、プリント配線板に求められる難燃性に劣る傾向がある。そのため、低誘電特性、接着性、及び難燃性を兼ね備える樹脂フィルムが求められている。 Fluorine resin is known to be a material with low dielectric properties, but has low adhesion to conductor foil. Liquid crystal polymers have a high melting point, so hot pressing at a high temperature of 300°C or higher is required to manufacture wiring boards containing liquid crystal polymers. It is possible to use a flexible resin material with excellent adhesion to adhere to the conductor foil, but flexible resin materials with excellent adhesion tend to have poor flame retardancy, which is required for printed wiring boards. Therefore, there is a demand for a resin film that combines low dielectric properties, adhesion, and flame retardancy.
本発明は、接着性、低誘電特性、及び難燃性を有する積層フィルム、及び該積層フィルムを用いた導体基板を提供することを目的とする。 The present invention aims to provide a laminated film having adhesive properties, low dielectric properties, and flame retardancy, and a conductive substrate using the laminated film.
本開示の一態様は、基材フィルムと、基材フィルムの両面に設けられた樹脂層とを備え、基材フィルムが、液晶ポリマーフィルム又はフッ素樹脂フィルムであり、樹脂層が、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤と、を含有する樹脂組成物を含む、積層フィルムに関する。 One aspect of the present disclosure relates to a laminated film comprising a base film and resin layers provided on both sides of the base film, the base film being a liquid crystal polymer film or a fluororesin film, and the resin layer including a resin composition containing a rubber component, a crosslinking component having an epoxy group, a curing agent, a bromine-based flame retardant, and a flame retardant assistant.
本開示の他の一態様は、基材フィルムと、基材フィルムの両面に設けられた硬化樹脂層と、硬化樹脂層の基材フィルムと反対側の少なくとも一方の面上に設けられた導体箔と、を有し、基材フィルムが、液晶ポリマーフィルム又はフッ素樹脂フィルムであり、硬化樹脂層が、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤と、を含有する樹脂組成物の硬化物を含む、導体基板に関する。 Another aspect of the present disclosure relates to a conductive substrate having a base film, a cured resin layer provided on both sides of the base film, and a conductive foil provided on at least one side of the cured resin layer opposite the base film, in which the base film is a liquid crystal polymer film or a fluororesin film, and the cured resin layer includes a cured product of a resin composition containing a rubber component, a crosslinking component having an epoxy group, a curing agent, a bromine-based flame retardant, and a flame retardant auxiliary.
本発明によれば、接着性、低誘電特性、及び難燃性を有する積層フィルム、及び該積層フィルムを用いた導体基板を提供することができる。 The present invention provides a laminated film having adhesive properties, low dielectric properties, and flame retardancy, and a conductive substrate using the laminated film.
以下、本発明のいくつかの実施形態について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。 Several embodiments of the present invention are described in detail below. However, the present invention is not limited to the following embodiments.
[積層フィルム]
一実施形態に係る積層フィルムは、基材フィルムと、基材フィルムの両面に設けられた樹脂層とを備える。図1は、積層フィルムの一実施形態を示す模式断面図である。積層フィルム10は、基材フィルム1と、基材フィルム1の両面に設けられた樹脂層3とを備える。
[Laminated film]
A laminate film according to an embodiment of the present invention includes a base film and a resin layer provided on both sides of the base film. Fig. 1 is a schematic cross-sectional view showing an embodiment of the laminate film. The
(基材フィルム)
本実施形態に係る基材フィルムとして、液晶ポリマーフィルム又はフッ素樹脂フィルムを用いることで、誘電特性を向上することができる。基材フィルム1の厚みは、30μm以上、50μm以上、又は80μm以上であってよく、250μm以下、200μm以下、又は150μm以下であってよい。
(Base film)
The dielectric properties can be improved by using a liquid crystal polymer film or a fluororesin film as the base film according to this embodiment. The thickness of the
液晶ポリマーフィルム(以下、単に「LCPフィルム」という場合ある。)は、液晶ポリマーの成形体である。液晶ポリマーフィルムを構成する液晶ポリマーは、溶融状態で液晶性を示すサーモトロピック液晶ポリマーであってもよい。サーモトロピック液晶ポリマーの例としては、サーモトロピック液晶ポリエステル、及びサーモトロピック液晶ポリエステルアミドが挙げられる。サーモトロピック液晶ポリエステル及びサーモトロピック液晶ポリエステルアミドに、イミド結合、ウレタン結合、カルボジイミド結合、カーボネート結合、及びイソシアヌレート結合から選ばれる構造が導入されていてもよい。液晶ポリマーは、p-ヒドロキシ安息香酸に由来する構成単位、及び/又は6-ヒドロキシ-2-ナフトエ酸に由来する構成単位を含むポリマーであってもよい。 A liquid crystal polymer film (hereinafter sometimes simply referred to as "LCP film") is a molded product of a liquid crystal polymer. The liquid crystal polymer constituting the liquid crystal polymer film may be a thermotropic liquid crystal polymer that exhibits liquid crystallinity in a molten state. Examples of thermotropic liquid crystal polymers include thermotropic liquid crystal polyesters and thermotropic liquid crystal polyester amides. A structure selected from an imide bond, a urethane bond, a carbodiimide bond, a carbonate bond, and an isocyanurate bond may be introduced into the thermotropic liquid crystal polyesters and thermotropic liquid crystal polyester amides. The liquid crystal polymer may be a polymer containing a constituent unit derived from p-hydroxybenzoic acid and/or a constituent unit derived from 6-hydroxy-2-naphthoic acid.
液晶ポリマーフィルムは、誘電特性を過剰に損なわない範囲で、液晶ポリマー以外のポリマーを更に含んでもよい。液晶ポリマー以外のポリマーは、220℃以上、又は280~360℃の融点を有するポリマーであってもよく、その例としては、ポリエーテルエーテルケトン、ポリエーテルサルホン、ポリイミド、ポリエーテルイミド、ポリアミド、ポリアミドイミド、及びポリアリレートが挙げられる。 The liquid crystal polymer film may further contain a polymer other than the liquid crystal polymer, provided that the dielectric properties are not excessively impaired. The polymer other than the liquid crystal polymer may be a polymer having a melting point of 220°C or higher, or 280 to 360°C, and examples thereof include polyetheretherketone, polyethersulfone, polyimide, polyetherimide, polyamide, polyamideimide, and polyarylate.
フッ素樹脂フィルムを構成するフッ素樹脂としては、例えば、ポリテトラフルオロエチレン(PTFE)、テトラフルオロエチレン-パ-フルオロアルキルビニルエーテル共重合体(PFA)、テトラフルオロエチレン-パーフルオロアルコキシエチレン重合体(PFE)、テトラフルオロエチレン-ヘキサフルオロプロピレン重合体(FEP)、及びテトラフルオロエチレン-エチレン共重合体(ETFE)が挙げられる。高周波特性により優れることから、フッ素樹脂フィルムは、ポリテトラフルオロエチレンを含むフィルムであることが好ましい。 Examples of fluororesins that make up the fluororesin film include polytetrafluoroethylene (PTFE), tetrafluoroethylene-perfluoroalkylvinylether copolymer (PFA), tetrafluoroethylene-perfluoroalkoxyethylene polymer (PFE), tetrafluoroethylene-hexafluoropropylene polymer (FEP), and tetrafluoroethylene-ethylene copolymer (ETFE). The fluororesin film is preferably a film containing polytetrafluoroethylene, as this has superior high-frequency characteristics.
(樹脂層)
樹脂層は、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤とを含有する樹脂組成物を含む。
(Resin Layer)
The resin layer includes a resin composition that contains a rubber component, a cross-linking component having an epoxy group, a curing agent, a bromine-based flame retardant, and a flame retardant auxiliary.
樹脂層には、主にゴム成分によって、容易に柔軟性が付与される。ゴム成分は、例えば、アクリルゴム、イソプレンゴム、ブチルゴム、スチレンブタジエンゴム、ブタジエンゴム、アクリロニトリルブタジエンゴム、シリコーンゴム、ウレタンゴム、クロロプレンゴム、エチレンプロピレンゴム、フッ素ゴム、硫化ゴム、エピクロルヒドリンゴム、及び塩素化ブチルゴムからなる群より選ばれる少なくとも1種のゴムを含むことができる。吸湿等による配線へのダメージを保護する観点から、ガス透過性が低いゴム成分を用いてもよい。係る観点から、ゴム成分が、スチレンブタジエンゴム、ブタジエンゴム、及びブチルゴムから選ばれる少なくとも1種を含んでもよい。スチレンブタジエンゴムを用いることにより、めっき工程に使用する各種薬液に対する樹脂層の耐性が向上し、歩留まりよく配線基板を製造することができる。 The resin layer is easily given flexibility mainly by the rubber component. The rubber component may contain at least one rubber selected from the group consisting of, for example, acrylic rubber, isoprene rubber, butyl rubber, styrene butadiene rubber, butadiene rubber, acrylonitrile butadiene rubber, silicone rubber, urethane rubber, chloroprene rubber, ethylene propylene rubber, fluororubber, vulcanized rubber, epichlorohydrin rubber, and chlorinated butyl rubber. From the viewpoint of protecting the wiring from damage caused by moisture absorption, etc., a rubber component with low gas permeability may be used. From this viewpoint, the rubber component may contain at least one rubber selected from styrene butadiene rubber, butadiene rubber, and butyl rubber. By using styrene butadiene rubber, the resistance of the resin layer to various chemicals used in the plating process is improved, and wiring boards can be manufactured with a good yield.
アクリルゴムの市販品としては、例えば、日本ゼオン株式会社「Nipol ARシリーズ」、クラレ株式会社「クラリティシリーズ」が挙げられる。イソプレンゴムの市販品としては、例えば日本ゼオン株式会社「Nipol IRシリーズ」が挙げられる。ブチルゴムの市販品としては、例えば、JSR株式会社「BUTYLシリーズ」が挙げられるスチレンブタジエンゴムの市販品としては、例えば、JSR株式会社「ダイナロンSEBSシリーズ」、「ダイナロンHSBRシリーズ」、クレイトンポリマージャパン株式会社「クレイトンDポリマーシリーズ」、アロン化成株式会社「ARシリーズ」が挙げられる。ブタジエンゴムの市販品としては、例えば、日本ゼオン株式会社「Nipol BRシリーズ」が挙げられる。アクリロニトリルブタジエンゴムの市販品としては、例えばJSR株式会社「JSR NBRシリーズ」が挙げられる。シリコーンゴムの市販品としては、例えば信越シリコーン株式会社「KMPシリーズ」が挙げられる。エチレンプロピレンゴムの市販品としては、例えば、JSR株式会社「JSR EPシリーズ」が挙げられる。フッ素ゴムの市販品としては、例えば、ダイキン株式会社「ダイエルシリーズ」が挙げられる。エピクロルヒドリンゴムの市販品としては、例えば、日本ゼオン株式会社「Hydrinシリーズ」が挙げられる。 Examples of commercially available acrylic rubbers include the "Nipol AR Series" from Nippon Zeon Co., Ltd. and the "Clarity Series" from Kuraray Co., Ltd. Examples of commercially available isoprene rubbers include the "Nipol IR Series" from Nippon Zeon Co., Ltd. Examples of commercially available butyl rubbers include the "BUTYL Series" from JSR Corporation Examples of commercially available styrene butadiene rubbers include the "Dynaron SEBS Series" and "Dynaron HSBR Series" from JSR Corporation, the "Craton D Polymer Series" from Clayton Polymer Japan Co., Ltd., and the "AR Series" from Aronkasei Co., Ltd. Examples of commercially available butadiene rubbers include the "Nipol BR Series" from Nippon Zeon Co., Ltd. Examples of commercially available acrylonitrile butadiene rubbers include the "JSR NBR Series" from JSR Corporation. Examples of commercially available silicone rubbers include the "KMP Series" from Shin-Etsu Silicone Co., Ltd. Commercially available ethylene propylene rubber products include, for example, the "JSR EP Series" from JSR Corporation. Commercially available fluororubber products include, for example, the "Dai-El Series" from Daikin Corporation. Commercially available epichlorohydrin rubber products include, for example, the "Hydrin Series" from Zeon Corporation.
ゴム成分は、合成により作製することもできる。例えば、アクリルゴムでは、(メタ)アクリル酸、(メタ)アクリル酸エステル、芳香族ビニル化合物、シアン化ビニル化合物等を反応させることにより得られる。 Rubber components can also be produced synthetically. For example, acrylic rubber is obtained by reacting (meth)acrylic acid, (meth)acrylic acid esters, aromatic vinyl compounds, vinyl cyanide compounds, etc.
ゴム成分は、架橋基を有するゴムを含んでいてもよい。架橋基を有するゴムを用いることにより、伸縮性樹脂層の耐熱性が向上し易い傾向がある。架橋基は、ゴム成分の分子鎖を架橋する反応を進行させ得る反応性基であればよい。その例としては、後述するエポキシ基を有する架橋成分が有する反応性基、酸無水物基、アミノ基、水酸基、エポキシ基及びカルボキシル基が挙げられる。 The rubber component may contain a rubber having a crosslinking group. The use of a rubber having a crosslinking group tends to improve the heat resistance of the elastic resin layer. The crosslinking group may be a reactive group that can proceed with a reaction that crosslinks the molecular chains of the rubber component. Examples of such a group include the reactive groups of a crosslinking component having an epoxy group, which will be described later, an acid anhydride group, an amino group, a hydroxyl group, an epoxy group, and a carboxyl group.
ゴム成分は、酸無水物基又はカルボキシル基のうち少なくとも一方の架橋基を有するゴムを含んでいてもよい。酸無水物基を有するゴムの例としては、無水マレイン酸で部分的に変性されたゴムが挙げられる。無水マレイン酸で部分的に変性されたゴムは、無水マレイン酸に由来する構成単位を含む重合体である。無水マレイン酸で部分的に変性されたゴムの市販品としては、例えば、旭化成株式会社製のスチレン系エラストマー「タフプレン912」がある。 The rubber component may contain a rubber having at least one of the crosslinking groups of an acid anhydride group or a carboxyl group. An example of a rubber having an acid anhydride group is a rubber partially modified with maleic anhydride. The rubber partially modified with maleic anhydride is a polymer containing structural units derived from maleic anhydride. An example of a commercially available product of rubber partially modified with maleic anhydride is the styrene-based elastomer "Tufprene 912" manufactured by Asahi Kasei Corporation.
無水マレイン酸で部分的に変性されたゴムは、無水マレイン酸で部分的に変性された水素添加型スチレン系エラストマーであってもよい。水素添加型スチレン系エラストマーは、耐候性向上等の効果も期待できる。水素添加型スチレン系エラストマーは、不飽和二重結合を含むソフトセグメントを有するスチレン系エラストマーの不飽和二重結合に水素を付加反応させて得られるエラストマーである。無水マレイン酸で部分的に変性された水素添加型スチレン系エラストマーの市販品としては、例えば、クレイトンポリマージャパン株式会社の「FG1901」、「FG1924」、旭化成株式会社の「タフテックM1911」、「タフテックM1913」、「タフテックM1943」が挙げられる。 The rubber partially modified with maleic anhydride may be a hydrogenated styrene-based elastomer partially modified with maleic anhydride. Hydrogenated styrene-based elastomers are also expected to have effects such as improved weather resistance. Hydrogenated styrene-based elastomers are elastomers obtained by adding hydrogen to the unsaturated double bonds of a styrene-based elastomer having a soft segment containing an unsaturated double bond. Commercially available hydrogenated styrene-based elastomers partially modified with maleic anhydride include "FG1901" and "FG1924" from Kraton Polymer Japan Co., Ltd., and "Tuftec M1911", "Tuftec M1913", and "Tuftec M1943" from Asahi Kasei Corporation.
ゴム成分の重量平均分子量(Mw)は、塗膜性の観点から、20000~200000、30000~150000、又は50000~125000であってもよい。ここでのMwは、ゲルパーミエーションクロマトグラフィー(GPC)によって求められる標準ポリスチレン換算値を意味する。 The weight average molecular weight (Mw) of the rubber component may be 20,000 to 200,000, 30,000 to 150,000, or 50,000 to 125,000 from the viewpoint of coating properties. Mw here refers to the standard polystyrene equivalent value determined by gel permeation chromatography (GPC).
樹脂組成物において、ゴム成分の含有量は、ゴム成分、エポキシ基を有する架橋成分及び硬化剤の総量を基準として、60~95質量%であることが好ましく、65~90質量%であることがより好ましく、70~85質量%であることが更に好ましい。ゴム成分の含有量が60質量%以上であると、より十分な伸縮性が得られ易く、かつゴム成分と架橋成分がよく混ざり合う傾向がある。ゴム成分の含有量が95質量%以下であると、樹脂層が密着性、絶縁信頼性、及び耐熱性の点で特に優れた特性を有する傾向がある。樹脂層におけるゴム成分の含有量が、樹脂層の質量を基準として、上記範囲内にあってもよい。 In the resin composition, the content of the rubber component is preferably 60 to 95% by mass, more preferably 65 to 90% by mass, and even more preferably 70 to 85% by mass, based on the total amount of the rubber component, the cross-linking component having an epoxy group, and the curing agent. When the content of the rubber component is 60% by mass or more, more sufficient elasticity is easily obtained, and the rubber component and the cross-linking component tend to mix well. When the content of the rubber component is 95% by mass or less, the resin layer tends to have particularly excellent properties in terms of adhesion, insulation reliability, and heat resistance. The content of the rubber component in the resin layer may be within the above range based on the mass of the resin layer.
エポキシ基を有する架橋成分(以下、単に「架橋成分」という場合がある。)は、硬化反応時に架橋して架橋重合体を形成する成分である。架橋成分は、分子内にエポキシ基を有していれば特に制限されず、例えば一般的なエポキシ樹脂であることができる。エポキシ樹脂としては、単官能、2官能又は多官能のいずれでもよく、特に制限はないが、十分な硬化性を得るためには2官能又は多官能のエポキシ樹脂を用いてもよい。 The cross-linking component having an epoxy group (hereinafter, sometimes simply referred to as "cross-linking component") is a component that cross-links during a curing reaction to form a cross-linked polymer. The cross-linking component is not particularly limited as long as it has an epoxy group in the molecule, and can be, for example, a general epoxy resin. The epoxy resin may be monofunctional, bifunctional, or polyfunctional, and is not particularly limited, but a bifunctional or polyfunctional epoxy resin may be used to obtain sufficient curability.
エポキシ樹脂としては、ビスフェノールA型、ビスフェノールF型、フェノールノボラック型、ナフタレン型、ジシクロペンタジエン型、クレゾールノボラック型等のエポキシ樹脂が挙げられる。脂肪鎖で変性したエポキシ樹脂は、柔軟性を付与できる。市販の脂肪鎖変性エポキシ樹脂としては、例えば、DIC株式会社製のEXA-4816が挙げられる。硬化性、低タック性、及び耐熱性の観点から、フェノールノボラック型、クレゾールノボラック型、ナフタレン型、又はジシクロペンタジエン型のエポキシ樹脂を選択してもよい。これらのエポキシ樹脂は、単独で又は2種類以上を組み合わせて用いることができる。 Epoxy resins include bisphenol A type, bisphenol F type, phenol novolac type, naphthalene type, dicyclopentadiene type, cresol novolac type, and other epoxy resins. Epoxy resins modified with an aliphatic chain can impart flexibility. An example of a commercially available aliphatic chain modified epoxy resin is EXA-4816 manufactured by DIC Corporation. From the viewpoints of curability, low tackiness, and heat resistance, phenol novolac type, cresol novolac type, naphthalene type, or dicyclopentadiene type epoxy resins may be selected. These epoxy resins may be used alone or in combination of two or more types.
無水マレイン酸基又はカルボキシル基を有するゴムと、エポキシ基を有する化合物(エポキシ樹脂)との組み合わせにより、伸縮性樹脂層の耐熱性及び低透湿度、伸縮性樹脂層と導電層との密着性、並びに、伸縮性樹脂層の低いタックの点で、特に優れた効果が得られる。伸縮性樹脂層の耐熱性が向上すると、例えば窒素リフローのような加熱工程における伸縮性樹脂層の劣化を抑制することができる。伸縮性樹脂層が低いタックを有すると、作業性良く導体基板又は配線基板を取り扱うことができる。 The combination of a rubber having a maleic anhydride group or a carboxyl group with a compound having an epoxy group (epoxy resin) provides particularly excellent effects in terms of the heat resistance and low moisture permeability of the elastic resin layer, adhesion between the elastic resin layer and the conductive layer, and low tack of the elastic resin layer. Improved heat resistance of the elastic resin layer can suppress deterioration of the elastic resin layer during a heating process such as nitrogen reflow. Low tack of the elastic resin layer allows for easy handling of the conductor board or wiring board.
樹脂組成物は、本発明の効果を著しく損なわない範囲で、エポキシ基を有する架橋成分以外の他の架橋成分を含んでいてもよい。他の架橋成分の含有量は、伸縮性樹脂層の誘電正接をより十分に低減する観点から、エポキシ基を有する架橋成分100質量部に対して10質量部未満であることが好ましい。 The resin composition may contain other crosslinking components other than the crosslinking component having an epoxy group, as long as the effect of the present invention is not significantly impaired. From the viewpoint of more sufficiently reducing the dielectric tangent of the elastic resin layer, the content of the other crosslinking components is preferably less than 10 parts by mass per 100 parts by mass of the crosslinking component having an epoxy group.
硬化剤は、それ自体が硬化反応に関与する化合物であり、樹脂層の耐熱性を向上しつつ、誘電正接を低減することができる。 The curing agent is a compound that is itself involved in the curing reaction, and can reduce the dielectric tangent while improving the heat resistance of the resin layer.
硬化剤としては特に制限されないが、耐熱性の向上効果及び誘電正接の低減効果をより十分に得る観点から、エステル系硬化剤を用いることができる。エステル系硬化剤としては、例えば、フェノールエステル類、チオフェノールエステル類、N-ヒドロキシアミンエステル類、複素環ヒドロキシ化合物のエステル類等の反応活性の高いエステル基を1分子中に1個又は2個以上有する化合物が挙げられる。エステル系硬化剤の市販品としては、例えば、「EPICLON HPC8000-65T」、「EPICLON HPC8000-L-65MT」、及び「EPICLON HPC8150-60T」(いずれもDIC株式会社製の商品名)が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いることができる。 The curing agent is not particularly limited, but from the viewpoint of more fully obtaining the effect of improving heat resistance and the effect of reducing the dielectric tangent, an ester-based curing agent can be used. Examples of ester-based curing agents include compounds having one or more highly reactive ester groups in one molecule, such as phenol esters, thiophenol esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds. Examples of commercially available ester-based curing agents include "EPICLON HPC8000-65T", "EPICLON HPC8000-L-65MT", and "EPICLON HPC8150-60T" (all trade names manufactured by DIC Corporation). These can be used alone or in combination of two or more.
エステル系硬化剤は、硬化反応時に下記式(I)に示すように架橋成分と反応するものと考えられる。このようなエステル系硬化剤と、架橋成分との反応において水酸基は生成せず、また、副反応が生じたとしても水酸基は生成し難く、その結果、低い誘電正接を実現できるものと考えられる。 During the curing reaction, the ester-based curing agent is thought to react with the crosslinking component as shown in the following formula (I). In the reaction between such an ester-based curing agent and the crosslinking component, no hydroxyl groups are produced, and even if a side reaction occurs, hydroxyl groups are unlikely to be produced. As a result, it is thought that a low dielectric tangent can be achieved.
式中、R1、R2及びR3はそれぞれ独立に、1価の有機基を示すが、本発明の効果がより十分に得られることから、芳香環を有する1価の有機基であってもよい。
In the formula, R 1 , R 2 and R 3 each independently represent a monovalent organic group, but may be a monovalent organic group having an aromatic ring, since this allows the effects of the present invention to be more fully obtained.
樹脂組成物において、架橋成分及び硬化剤の合計の含有量は、ゴム成分、架橋成分及び硬化剤の総量を基準として、5~40質量%であることが好ましく、10~35質量%であることがより好ましく、15~30質量%であることが更に好ましい。架橋成分及び硬化剤の合計の含有量が5質量%以上であると、より十分な硬化が得られ易いと共に、樹脂層が密着性、絶縁信頼性、及び耐熱性の点で特に優れた特性を有する傾向がある。架橋成分及び硬化剤の合計の含有量が40質量%以下であると、より十分な伸縮性が得られ易く、かつゴム成分と架橋成分がよく混ざり合う傾向がある。 In the resin composition, the total content of the crosslinking component and the curing agent is preferably 5 to 40 mass %, more preferably 10 to 35 mass %, and even more preferably 15 to 30 mass %, based on the total amount of the rubber component, the crosslinking component, and the curing agent. When the total content of the crosslinking component and the curing agent is 5 mass % or more, more sufficient curing is easily obtained, and the resin layer tends to have particularly excellent properties in terms of adhesion, insulation reliability, and heat resistance. When the total content of the crosslinking component and the curing agent is 40 mass % or less, more sufficient elasticity is easily obtained, and the rubber component and the crosslinking component tend to mix well.
樹脂組成物において、架橋成分と硬化剤との含有量比は、エポキシ樹脂中のエポキシ基とエステル系硬化剤中のエステル結合との当量比で、4:5~5:4の範囲であることが好ましい。含有量比が上記範囲内であることで、より十分な硬化が得られ易いと共に、伸縮性樹脂層が密着性、絶縁信頼性、及び耐熱性の点で特に優れた特性を有する傾向がある。 In the resin composition, the content ratio of the crosslinking component to the curing agent is preferably in the range of 4:5 to 5:4, in terms of the equivalent ratio of the epoxy groups in the epoxy resin to the ester bonds in the ester-based curing agent. By having the content ratio within the above range, more sufficient curing is easily achieved, and the elastic resin layer tends to have particularly excellent properties in terms of adhesion, insulation reliability, and heat resistance.
樹脂層は、臭素系難燃剤及び難燃助剤の両方を含有することで、自己消化性を有し難燃性に優れる積層フィルムを作製することができる。 The resin layer contains both a brominated flame retardant and a flame retardant assistant, making it possible to produce a laminated film that is self-extinguishing and has excellent flame retardancy.
臭素系難燃剤は、臭素原子が結合した芳香環を有する化合物を含んでよく、トリアジン骨格を有する化合物を含んでもよい。臭素系難燃剤は、誘電特性を向上する観点から、臭素原子が結合した芳香環とトリアジン骨格とを有する化合物を含むことが好ましい。臭素系難燃剤は1種類を単独で用いてもよく、2種類以上を組み合わせて用いてもよい。 The bromine-based flame retardant may include a compound having an aromatic ring to which a bromine atom is bonded, or may include a compound having a triazine skeleton. From the viewpoint of improving dielectric properties, the bromine-based flame retardant preferably includes a compound having an aromatic ring to which a bromine atom is bonded and a triazine skeleton. One type of bromine-based flame retardant may be used alone, or two or more types may be used in combination.
臭素系難燃剤としては、例えば、ヘキサブロモベンゼン、ペンタブロモトルエン、エチレンビス(ペンタブロモフェニル)、エチレンビステトラブロモフタルイミド、1,2-ジブロモ-4-(1,2-ジブロモエチル)シクロヘキサン、テトラブロモシクロオクタン、ヘキサブロモシクロドデカン、ビス(トリブロモフェノキシ)エタン、臭素化ポリフェニレンエーテル、臭素化ポリスチレン、2,4,6-トリス(トリブロモフェノキシ)-1,3,5-トリアジン等の臭素化添加型難燃剤;及びトリブロモフェニルマレイミド、トリブロモフェニルアクリレート、トリブロモフェニルメタクリレート、テトラブロモビスフェノールA型ジメタクリレート、ペンタブロモベンジルアクリレート、臭素化スチレン等の不飽和二重結合基含有の臭素化反応型難燃剤が挙げられる。 Examples of brominated flame retardants include brominated additive flame retardants such as hexabromobenzene, pentabromotoluene, ethylene bis(pentabromophenyl), ethylene bistetrabromophthalimide, 1,2-dibromo-4-(1,2-dibromoethyl)cyclohexane, tetrabromocyclooctane, hexabromocyclododecane, bis(tribromophenoxy)ethane, brominated polyphenylene ether, brominated polystyrene, and 2,4,6-tris(tribromophenoxy)-1,3,5-triazine; and brominated reaction flame retardants containing unsaturated double bond groups, such as tribromophenylmaleimide, tribromophenylacrylate, tribromophenylmethacrylate, tetrabromobisphenol A dimethacrylate, pentabromobenzylacrylate, and brominated styrene.
臭素系難燃剤の含有量は、難燃性と柔軟性とのバランスの観点から、ゴム成分、架橋成分、及び硬化剤の総量100質量部に対して、1~30質量部、2~25質量部、又は4~20質量部であってもよい。 From the viewpoint of the balance between flame retardancy and flexibility, the content of the bromine-based flame retardant may be 1 to 30 parts by mass, 2 to 25 parts by mass, or 4 to 20 parts by mass per 100 parts by mass of the total amount of the rubber component, the cross-linking component, and the curing agent.
難燃助剤としては、例えば、アンチモン化合物を用いることができる。アンチモン化合物としては、例えば、三酸化アンチモン、五酸化アンチモン、及びアンチモン酸ナトリウムが挙げられる。 As a flame retardant auxiliary, for example, an antimony compound can be used. Examples of antimony compounds include antimony trioxide, antimony pentoxide, and sodium antimonate.
難燃助剤の含有量は、難燃性と柔軟性とのバランスの観点から、ゴム成分、架橋成分、及び硬化剤の総量100質量部に対して、1~20質量部、2~18質量部、又は4~16質量部であってもよい。 From the viewpoint of the balance between flame retardancy and flexibility, the content of the flame retardant auxiliary may be 1 to 20 parts by mass, 2 to 18 parts by mass, or 4 to 16 parts by mass per 100 parts by mass of the total amount of the rubber component, the cross-linking component, and the curing agent.
樹脂組成物は、更に硬化促進剤を含有してもよい。硬化促進剤は、硬化反応の触媒として機能する化合物である。硬化促進剤は、三級アミン、イミダゾール、有機酸金属塩、リン系化合物、ルイス酸、アミン錯塩、及びホスフィンから選ばれるものであってもよい。これらの中でも、樹脂組成物のワニスの保存安定性及び硬化性の観点から、イミダゾールを使用してもよい。ゴム成分が無水マレイン酸で部分的に変性されたゴムを含む場合、これと相溶するイミダゾールを選択してもよい。 The resin composition may further contain a curing accelerator. The curing accelerator is a compound that functions as a catalyst for the curing reaction. The curing accelerator may be selected from tertiary amines, imidazoles, organic acid metal salts, phosphorus compounds, Lewis acids, amine complex salts, and phosphines. Among these, imidazole may be used from the viewpoint of storage stability and curing properties of the varnish of the resin composition. When the rubber component contains rubber partially modified with maleic anhydride, an imidazole compatible with this may be selected.
樹脂組成物において、硬化促進剤の含有量は、ゴム成分、架橋成分及び硬化剤の合計量100質量部に対して、0.1~10質量部であってもよい。硬化促進剤の含有量が0.1質量部以上であると、より十分な硬化が得られ易い傾向がある。硬化促進剤の含有量が10質量部以下であると、より十分な耐熱性が得られ易い傾向がある。以上の観点から、硬化促進剤の含有量は0.3~7質量部、又は0.5~5質量部であってもよい。 In the resin composition, the content of the curing accelerator may be 0.1 to 10 parts by mass relative to 100 parts by mass of the total amount of the rubber component, the cross-linking component, and the curing agent. If the content of the curing accelerator is 0.1 parts by mass or more, there is a tendency that more sufficient curing is easily obtained. If the content of the curing accelerator is 10 parts by mass or less, there is a tendency that more sufficient heat resistance is easily obtained. From the above viewpoints, the content of the curing accelerator may be 0.3 to 7 parts by mass, or 0.5 to 5 parts by mass.
樹脂組成物は、以上の成分の他、必要に応じて、酸化防止剤、黄変防止剤、紫外線吸収剤、可視光吸収剤、着色剤、可塑剤、安定剤、充填剤、レベリング剤等を、本発明の効果を著しく損なわない範囲で更に含んでもよい。 In addition to the above components, the resin composition may further contain antioxidants, anti-yellowing agents, ultraviolet absorbers, visible light absorbers, colorants, plasticizers, stabilizers, fillers, leveling agents, etc., as necessary, to the extent that the effects of the present invention are not significantly impaired.
樹脂層の厚さは特に限定されないが、積層フィルムの難燃性と柔軟性のバランスの観点から、1~100μm、2~60μm、3~40μm、又は4~20μmであってよい。 The thickness of the resin layer is not particularly limited, but may be 1 to 100 μm, 2 to 60 μm, 3 to 40 μm, or 4 to 20 μm from the viewpoint of the balance between the flame retardancy and flexibility of the laminated film.
硬化後の樹脂層の弾性率(引張弾性率)は、0.1MPa以上1000MPa以下であってもよい。弾性率が0.1MPa以上1000MPa以下であると、基材としての取り扱い性及び可撓性が特に優れる傾向がある。この観点から、弾性率が0.3MPa以上100MPa以下、又は0.5MPa以上50MPa以下であってもよい。 The elastic modulus (tensile elastic modulus) of the resin layer after curing may be 0.1 MPa or more and 1000 MPa or less. If the elastic modulus is 0.1 MPa or more and 1000 MPa or less, the handleability and flexibility as a substrate tend to be particularly excellent. From this viewpoint, the elastic modulus may be 0.3 MPa or more and 100 MPa or less, or 0.5 MPa or more and 50 MPa or less.
硬化後の樹脂層の破断伸び率は、100%以上であってもよい。破断伸び率が100%以上であると、十分な伸縮性が得られ易い傾向がある。この観点から、破断伸び率は150%以上、200%以上、300%以上又は500%以上であってもよい。破断伸び率の上限は、特に制限されないが、通常1000%程度以下である。 The breaking elongation of the cured resin layer may be 100% or more. If the breaking elongation is 100% or more, sufficient elasticity tends to be obtained. From this viewpoint, the breaking elongation may be 150% or more, 200% or more, 300% or more, or 500% or more. The upper limit of the breaking elongation is not particularly limited, but is usually about 1000% or less.
硬化後の樹脂層の誘電正接(Df)は、樹脂層上に設けられた配線パターンの伝送損失を十分に低減する観点から、0.004以下、0.0035以下、0.003以下、又は、0.0025以下であってもよい。誘電正接の下限は、特に制限されないが、通常0.0005程度以上である。 The dielectric loss tangent (Df) of the cured resin layer may be 0.004 or less, 0.0035 or less, 0.003 or less, or 0.0025 or less, from the viewpoint of sufficiently reducing the transmission loss of the wiring pattern provided on the resin layer. The lower limit of the dielectric loss tangent is not particularly limited, but is usually about 0.0005 or more.
硬化後の樹脂層の比誘電率(Dk)は、樹脂層上に設けられた配線パターンの伝送損失を十分に低減する観点から、3.0以下、2.8以下、又は2.5以下であってもよい。 The dielectric constant (Dk) of the cured resin layer may be 3.0 or less, 2.8 or less, or 2.5 or less, from the viewpoint of sufficiently reducing the transmission loss of the wiring pattern provided on the resin layer.
樹脂層は、例えば、ゴム成分、架橋成分、硬化剤、臭素系難燃剤、難燃助剤、及び、必要により他の成分を、有機溶剤に溶解又は分散して樹脂ワニスを調製し、樹脂ワニスをキャリアフィルムの上に成膜することにより作製される樹脂フィルムを用いて形成することができる。 The resin layer can be formed, for example, by dissolving or dispersing a rubber component, a crosslinking component, a curing agent, a bromine-based flame retardant, a flame retardant assistant, and other components as necessary in an organic solvent to prepare a resin varnish, and then forming the resin varnish onto a carrier film to produce a resin film.
有機溶剤としては、特に制限はないが、例えば、トルエン、キシレン、メシチレン、クメン、p-シメン等の芳香族炭化水素;テトラヒドロフラン、1,4-ジオキサン等の環状エーテル;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、4-ヒドロキシ-4-メチル-2-ペンタノン等のケトン;酢酸メチル、酢酸エチル、酢酸ブチル、乳酸メチル、乳酸エチル、γ-ブチロラクトン等のエステル;エチレンカーボネート、プロピレンカーボネート等の炭酸エステル;N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチルピロリドン等のアミドが挙げられる。溶解性及び沸点の観点から、トルエン、又はN,N-ジメチルアセトアミドを用いてもよい。これらの有機溶剤は、単独で又は2種類以上を組み合わせて使用することができる。樹脂ワニス中の固形分(有機溶媒以外の成分)濃度は、20~80質量%であってもよい。 The organic solvent is not particularly limited, but examples thereof include aromatic hydrocarbons such as toluene, xylene, mesitylene, cumene, and p-cymene; cyclic ethers such as tetrahydrofuran and 1,4-dioxane; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, and 4-hydroxy-4-methyl-2-pentanone; esters such as methyl acetate, ethyl acetate, butyl acetate, methyl lactate, ethyl lactate, and γ-butyrolactone; carbonates such as ethylene carbonate and propylene carbonate; and amides such as N,N-dimethylformamide, N,N-dimethylacetamide, and N-methylpyrrolidone. From the viewpoint of solubility and boiling point, toluene or N,N-dimethylacetamide may be used. These organic solvents may be used alone or in combination of two or more kinds. The solid content (components other than the organic solvent) concentration in the resin varnish may be 20 to 80% by mass.
キャリアフィルムとしては、特に制限されないが、例えば、ポリエチレンテレフタレート(PET)、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステル;ポリエチレン、ポリプロピレン等のポリオレフィン;ポリカーボネート、ポリアミド、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリエーテルスルフィド、ポリエーテルスルホン、ポリエーテルケトン、ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリアリレート、ポリスルホン、液晶ポリマーなどのフィルムが挙げられる。これらの中で、柔軟性及び強靭性の観点から、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート、ポリプロピレン、ポリカーボネート、ポリアミド、ポリイミド、ポリアミドイミド、ポリフェニレンエーテル、ポリフェニレンスルフィド、ポリアリレート、又はポリスルホンのフィルムをキャリアフィルムとして用いてもよい。 The carrier film is not particularly limited, but examples thereof include polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate; polyolefins such as polyethylene and polypropylene; and films of polycarbonate, polyamide, polyimide, polyamideimide, polyetherimide, polyethersulfide, polyethersulfone, polyetherketone, polyphenylene ether, polyphenylene sulfide, polyarylate, polysulfone, and liquid crystal polymers. Among these, from the viewpoint of flexibility and toughness, films of polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polypropylene, polycarbonate, polyamide, polyimide, polyamideimide, polyphenylene ether, polyphenylene sulfide, polyarylate, or polysulfone may be used as the carrier film.
キャリアフィルムの厚みは、特に制限されないが、3~250μmであってもよい。キャリアフィルムの厚みが3μm以上であるとフィルム強度が十分であり、キャリアフィルムの厚みが250μm以下であると十分な柔軟性が得られる。以上の観点から、厚みは5~200μm、又は7~150μmであってもよい。樹脂層との剥離性向上の観点から、シリコーン系化合物、含フッ素化合物等によりキャリアフィルムに離型処理が施されたフィルムを必要に応じて用いてもよい。 The thickness of the carrier film is not particularly limited, but may be 3 to 250 μm. If the thickness of the carrier film is 3 μm or more, the film strength is sufficient, and if the thickness of the carrier film is 250 μm or less, sufficient flexibility is obtained. From the above viewpoints, the thickness may be 5 to 200 μm, or 7 to 150 μm. From the viewpoint of improving the peelability from the resin layer, a film in which the carrier film has been subjected to a release treatment using a silicone-based compound, a fluorine-containing compound, etc. may be used as necessary.
必要に応じて、保護フィルムを樹脂層上に貼り付け、キャリアフィルム、樹脂層及び保護フィルムからなる3層構造の樹脂フィルムとしてもよい。 If necessary, a protective film may be attached onto the resin layer to form a three-layer resin film consisting of a carrier film, a resin layer, and a protective film.
保護フィルムとしては、特に制限はなく、例えば、ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエチレンナフタレート等のポリエステル;ポリエチレン、ポリプロピレン等のポリオレフィンなどのフィルムが挙げられる。これらの中で、柔軟性及び強靭性の観点から、ポリエチレンテレフタレート等のポリエステル、ポリエチレン、ポリプロピレン等のポリオレフィンのフィルムを保護フィルムとして用いてもよい。伸縮性樹脂層との剥離性向上の観点から、シリコーン系化合物、含フッ素化合物等により保護フィルムに離型処理が施されていてもよい。 The protective film is not particularly limited, and examples thereof include films of polyesters such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; and polyolefins such as polyethylene and polypropylene. Among these, from the viewpoint of flexibility and toughness, films of polyesters such as polyethylene terephthalate, and polyolefins such as polyethylene and polypropylene may be used as the protective film. From the viewpoint of improving peelability from the elastic resin layer, the protective film may be subjected to a release treatment using a silicone-based compound, a fluorine-containing compound, or the like.
保護フィルムの厚みは、目的とする柔軟性により適宜変えてよいが、10~250μmであってもよい。厚みが10μm以上であるとフィルム強度が十分である傾向があり、250μm以下であると十分な柔軟性が得られる傾向がある。以上の観点から、厚みは15~200μm、又は20~150μmであってもよい。 The thickness of the protective film may vary depending on the desired flexibility, but may be 10 to 250 μm. A thickness of 10 μm or more tends to provide sufficient film strength, while a thickness of 250 μm or less tends to provide sufficient flexibility. From the above perspective, the thickness may be 15 to 200 μm, or 20 to 150 μm.
積層フィルムは、例えば、樹脂フィルムを2枚準備し、保護フィルムを剥がして露出した樹脂層を基材フィルムの両面に貼り合わせることで作製することができる。 A laminated film can be produced, for example, by preparing two resin films, peeling off the protective films, and bonding the exposed resin layers to both sides of a base film.
[導体基板]
一実施形態に係る導体基板は、基材フィルムと、基材フィルムの両面に設けられた硬化樹脂層と、硬化樹脂層の基材フィルムと反対側の少なくとも一方の面上に設けられた導体箔と、を有する。基材フィルムは、上述した液晶ポリマーフィルム又はフッ素樹脂フィルムである。硬化樹脂層は、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤と、を含有する樹脂組成物の硬化物を含む。すなわち、硬化樹脂層は、本実施形態に係る積層フィルムを構成する樹脂層を硬化したものである。
[Conductor substrate]
The conductive substrate according to one embodiment has a base film, a cured resin layer provided on both sides of the base film, and a conductive foil provided on at least one side of the cured resin layer opposite to the base film. The base film is the above-mentioned liquid crystal polymer film or fluororesin film. The cured resin layer includes a cured product of a resin composition containing a rubber component, a crosslinking component having an epoxy group, a curing agent, a bromine-based flame retardant, and a flame retardant auxiliary. That is, the cured resin layer is a cured resin layer constituting the laminate film according to this embodiment.
導体箔の弾性率は、40~300GPaであってもよい。導体箔の弾性率が40~300GPaであることにより、配線基板の伸長による導体箔の破断が生じ難い傾向がある。同様の観点から、導体箔の弾性率は50GPa以上又は60GPa以上であってもよく、280GPa以下又は250GPa以下であってもよい。ここでの導体箔の弾性率は、共振法によって測定される値であることができる。 The elastic modulus of the conductor foil may be 40 to 300 GPa. When the elastic modulus of the conductor foil is 40 to 300 GPa, the conductor foil is less likely to break due to elongation of the wiring board. From a similar perspective, the elastic modulus of the conductor foil may be 50 GPa or more or 60 GPa or more, and may be 280 GPa or less or 250 GPa or less. The elastic modulus of the conductor foil here may be a value measured by a resonance method.
導体箔は、金属箔であることができる。金属箔としては、銅箔、チタン箔、ステンレス箔、ニッケル箔、パーマロイ箔、42アロイ箔、コバール箔、ニクロム箔、ベリリウム銅箔、燐青銅箔、黄銅箔、洋白箔、アルミニウム箔、錫箔、鉛箔、亜鉛箔、半田箔、鉄箔、タンタル箔、ニオブ箔、モリブデン箔、ジルコニウム箔、金箔、銀箔、パラジウム箔、モネル箔、インコネル箔、ハステロイ箔等が挙げられる。適切な弾性率等の観点から、導体箔は、銅箔、金箔、ニッケル箔、及び鉄箔から選ばれてもよい。配線形成性の観点から、導体箔は銅箔であってもよい。銅箔は、フォトリソグラフィーにより、伸縮性樹脂層の特性を損なわずに、簡易的に配線パターンを形成できる。 The conductor foil may be a metal foil. Examples of the metal foil include copper foil, titanium foil, stainless steel foil, nickel foil, permalloy foil, 42 alloy foil, kovar foil, nichrome foil, beryllium copper foil, phosphor bronze foil, brass foil, nickel silver foil, aluminum foil, tin foil, lead foil, zinc foil, solder foil, iron foil, tantalum foil, niobium foil, molybdenum foil, zirconium foil, gold foil, silver foil, palladium foil, Monel foil, Inconel foil, and Hastelloy foil. From the viewpoint of appropriate elastic modulus, the conductor foil may be selected from copper foil, gold foil, nickel foil, and iron foil. From the viewpoint of wiring formability, the conductor foil may be copper foil. Copper foil can be easily formed into a wiring pattern by photolithography without impairing the properties of the elastic resin layer.
銅箔としては、特に制限はなく、例えば、銅張積層板及びフレキシブル配線板等に用いられる電解銅箔及び圧延銅箔を使用できる。市販の電解銅箔としては、例えば、F0-WS-18(古河電気工業株式会社製、商品名)、NC-WS-20(古河電気工業株式会社製、商品名)、YGP-12(日本電解株式会社製、商品名)、GTS-18(古河電気工業株式会社製、商品名)、及びF2-WS-12(古河電気工業株式会社製、商品名)が挙げられる。圧延銅箔としては、例えば、TPC箔(JX金属株式会社製、商品名)、HA箔(JX金属株式会社製、商品名)、HA-V2箔(JX金属株式会社製、商品名)、及びC1100R(三井住友金属鉱山伸銅株式会社製、商品名)が挙げられる。伸縮性樹脂層との密着性の観点から、粗化処理を施している銅箔を使用してもよい。耐折性の観点から、圧延銅箔を用いてもよい。 The copper foil is not particularly limited, and for example, electrolytic copper foil and rolled copper foil used for copper-clad laminates and flexible wiring boards can be used. Commercially available electrolytic copper foils include, for example, F0-WS-18 (manufactured by Furukawa Electric Co., Ltd., product name), NC-WS-20 (manufactured by Furukawa Electric Co., Ltd., product name), YGP-12 (manufactured by Nippon Denkai Co., Ltd., product name), GTS-18 (manufactured by Furukawa Electric Co., Ltd., product name), and F2-WS-12 (manufactured by Furukawa Electric Co., Ltd., product name). Rolled copper foils include, for example, TPC foil (manufactured by JX Metals Corporation, product name), HA foil (manufactured by JX Metals Corporation, product name), HA-V2 foil (manufactured by JX Metals Corporation, product name), and C1100R (manufactured by Mitsui Sumitomo Metal Mining Co., Ltd., product name). Copper foil that has been subjected to a roughening treatment may be used from the viewpoint of adhesion with the elastic resin layer. Rolled copper foil may be used from the viewpoint of folding resistance.
金属箔は、粗化処理によって形成された粗化面を有していてもよい。この場合、通常、粗化面が伸縮性樹脂層に接する向きで、金属箔が伸縮性樹脂層上に設けられる。伸縮性樹脂層と金属箔との密着性の観点から、粗化面の表面粗さRaは、0.1~3μm、又は0.2~2.0μmであってもよい。微細な配線を容易に形成するために、粗化面の表面粗さRaが0.3~1.5μmであってもよい。 The metal foil may have a roughened surface formed by a roughening treatment. In this case, the metal foil is usually provided on the stretchable resin layer with the roughened surface facing the stretchable resin layer. From the viewpoint of adhesion between the stretchable resin layer and the metal foil, the surface roughness Ra of the roughened surface may be 0.1 to 3 μm, or 0.2 to 2.0 μm. To easily form fine wiring, the surface roughness Ra of the roughened surface may be 0.3 to 1.5 μm.
表面粗さRaは、例えば、表面形状測定装置Wyko NT9100(Veeco社製)を用いて、以下の条件で測定することができる。
測定条件
内部レンズ:1倍
外部レンズ:50倍
測定範囲:0.120×0.095mm
測定深度:10μm
測定方式:垂直走査型干渉方式(VSI方式)
The surface roughness Ra can be measured, for example, using a surface profiler Wyko NT9100 (manufactured by Veeco) under the following conditions.
Measurement conditions: Internal lens: 1x External lens: 50x Measurement range: 0.120 x 0.095 mm
Measurement depth: 10 μm
Measurement method: Vertical scanning interferometry (VSI)
導体箔の厚みは、特に制限はないが、1~50μmであってもよい。導体箔の厚みが1μm以上であると、より容易に配線パターンを形成することができる。導体箔の厚みが50μm以下であると、エッチング及び取り扱いが特に容易である。 The thickness of the conductor foil is not particularly limited, but may be 1 to 50 μm. When the thickness of the conductor foil is 1 μm or more, the wiring pattern can be formed more easily. When the thickness of the conductor foil is 50 μm or less, etching and handling are particularly easy.
導体箔は、樹脂層の片面又は両面上に設けられる。樹脂層の両面上に導体箔を設けることにより、硬化等のための加熱による反りを抑制することができる。 The conductor foil is provided on one or both sides of the resin layer. By providing the conductor foil on both sides of the resin layer, warping due to heating for curing, etc. can be suppressed.
導体箔を設ける方法は特に制限されないが、例えば、硬化樹脂層を形成するための樹脂組成物を金属箔に直接塗工する方法、及び、積層フィルムにおける樹脂層と導体箔とを積層する方法がある。 There are no particular limitations on the method for providing the conductor foil, but examples include a method in which the resin composition for forming the cured resin layer is directly applied to the metal foil, and a method in which the resin layer and the conductor foil in a laminate film are laminated.
以上、本開示の好適な実施形態を説明したが、これらは本発明の説明のための例示であり、本発明の範囲をこれらの実施形態にのみ限定する趣旨ではない。本発明は、その要旨を逸脱しない範囲で、上記実施形態とは異なる種々の態様で実施することができる。 The above describes preferred embodiments of the present disclosure, but these are merely examples for the purpose of explaining the present invention, and are not intended to limit the scope of the present invention to these embodiments alone. The present invention can be implemented in various forms different from the above embodiments without departing from the spirit of the present invention.
本発明について以下の実施例を挙げて更に具体的に説明する。ただし、本発明はこれらの実施例に限定されるものではない。 The present invention will be described in more detail with reference to the following examples. However, the present invention is not limited to these examples.
[実施例1]
(樹脂ワニスの作製)
ポリビンに、無水マレイン酸変性水添スチレンエチレンブタジエンゴム(KRATON株式会社製、商品名「FG1924」、スチレン比:1.3%)80質量部(不揮発分の配合量)、ジシクロペンタジエン型エポキシ樹脂(DIC株式会社製、商品名「EPICLON HP7200H」)10.9質量部(不揮発分の配合量)、エステル系硬化剤(DIC株式会社製、商品名「HPC-8150」)9.1質量部(不揮発分の配合量)、及びトルエン400質量部を加えて混合し、不揮発分25質量%のベース樹脂を得た。次いで、ベース樹脂に、臭素化芳香族トリアジン(第一工業製薬株式会社、商品名「SR-245」)5質量部、三酸価アンチモン(株式会社鈴裕化学製、商品名「ファインカット WP-2」)5質量部、及び1-ベンジル-2-メチルイミダゾール(四国化成工業株式会社製、商品名「1B2MZ」)3質量部を添加して、自転公転ミキサ(株式会社シンキー製、商品名「AR-100」)を用いて混合して、樹脂ワニスを作製した。
[Example 1]
(Preparation of resin varnish)
To a polyvinyl chloride bottle, 80 parts by mass (non-volatile content) of maleic anhydride modified hydrogenated styrene ethylene butadiene rubber (KRATON Corporation, product name "FG1924", styrene ratio: 1.3%), 10.9 parts by mass (non-volatile content) of dicyclopentadiene type epoxy resin (DIC Corporation, product name "EPICLON HP7200H"), 9.1 parts by mass (non-volatile content) of an ester-based curing agent (DIC Corporation, product name "HPC-8150"), and 400 parts by mass of toluene were added and mixed to obtain a base resin with a non-volatile content of 25% by mass. Next, 5 parts by mass of brominated aromatic triazine (manufactured by Daiichi Kogyo Seiyaku Co., Ltd., product name "SR-245"), 5 parts by mass of antimony trioxide (manufactured by Suzuhiro Chemical Co., Ltd., product name "Finecut WP-2"), and 3 parts by mass of 1-benzyl-2-methylimidazole (manufactured by Shikoku Kasei Kogyo Co., Ltd., product name "1B2MZ") were added to the base resin, and mixed using a planetary centrifugal mixer (manufactured by Thinky Corporation, product name "AR-100") to prepare a resin varnish.
(樹脂フィルムの作製)
キャリアフィルムとして離型処理ポリエチレンテレフタレート(PET)フィルム(帝人フィルムソリューション株式会社製、商品名「ピューレックスA31」、厚み25μm)を準備した。このPETフィルムの離型処理面上にナイフコータ(株式会社康井精機製、商品名「SNC-350」)を用いて上記樹脂ワニスを塗布した。塗膜を乾燥機(株式会社二葉科学製、商品名「MSO-80TPS」)中、80℃で20分の加熱により乾燥して、所定の厚みを有する樹脂層を形成させた。形成された樹脂層に、キャリアフィルムと同じ離型処理PETフィルムを、離型処理面が樹脂層側になる向きで保護フィルムとして貼付けて、樹脂フィルムを得た。
(Preparation of resin film)
A release-treated polyethylene terephthalate (PET) film (manufactured by Teijin Film Solutions Co., Ltd., product name "Purex A31", thickness 25 μm) was prepared as a carrier film. The above-mentioned resin varnish was applied to the release-treated surface of this PET film using a knife coater (manufactured by Yasui Seiki Co., Ltd., product name "SNC-350"). The coating film was dried by heating at 80°C for 20 minutes in a dryer (manufactured by Futaba Scientific Co., Ltd., product name "MSO-80TPS") to form a resin layer having a predetermined thickness. A release-treated PET film identical to the carrier film was attached as a protective film to the formed resin layer with the release-treated surface facing the resin layer, to obtain a resin film.
(積層フィルムの作製)
LCPフィルム(株式会社クラレ製、商品名「CTQ」、厚み:100μm)の両面に、樹脂フィルムからキャリアフィルムと保護フィルムを剥がした樹脂層(厚み:5μm)を積層し、真空加圧式ラミネータ(ニッコー・マテリアルズ株式会社製、商品名「V130」)を用いて、圧力0.9MPa、温度100℃及び加圧時間1分の条件でラミネートして、樹脂層/LCP/樹脂層の3層から構成される積層フィルムを得た。
(Preparation of Laminated Film)
A resin layer (thickness: 5 μm) obtained by peeling off the carrier film and protective film from the resin film was laminated on both sides of an LCP film (manufactured by Kuraray Co., Ltd., product name "CTQ", thickness: 100 μm), and laminated using a vacuum pressure laminator (manufactured by Nikko Materials Co., Ltd., product name "V130") under conditions of a pressure of 0.9 MPa, a temperature of 100° C., and a pressure time of 1 minute, to obtain a laminated film consisting of three layers: resin layer/LCP/resin layer.
[実施例2~3及び比較例1]
臭素系難燃剤である臭素化芳香族トリアジン及び難燃助剤である三酸価アンチモンの添加量を、表1に示す量(質量部)に変更して樹脂ワニスを作製したこと以外は実施例1と同様にして、樹脂フィルム及び積層フィルムを作製した。
[Examples 2 to 3 and Comparative Example 1]
Resin films and laminate films were prepared in the same manner as in Example 1, except that the amounts of brominated aromatic triazine, which is a brominated flame retardant, and antimony trioxide, which is a flame retardant assistant, were changed to the amounts (parts by mass) shown in Table 1 to prepare resin varnishes.
[評価]
樹脂フィルム及び積層フィルムについて、以下の評価を行った。結果を表1に示す。
[evaluation]
The resin film and the laminated film were evaluated as follows. The results are shown in Table 1.
(誘電特性)
Split Post Dielectric Reconator(SPDR)法による誘電特性を評価した。樹脂フィルムを、乾燥機(株式会社二葉科学製、商品名「MSO-80TPS」)中、180℃で60分の熱処理し、樹脂層を硬化させて、誘電特性測定用のサンプルを作製した。サンプルを誘電体共振器(QWED製)に設置し、ネットワークアナライザ(アジレント・テクノロジー株式会社製、E8364B)を用いて、周波数10GHzにおける比誘電率(Dk)及び誘電正接(Df)を測定した。
(Dielectric Properties)
The dielectric properties were evaluated by the Split Post Dielectric Reconator (SPDR) method. The resin film was heat-treated at 180°C for 60 minutes in a dryer (manufactured by Futaba Scientific Co., Ltd., product name "MSO-80TPS") to harden the resin layer and prepare a sample for measuring dielectric properties. The sample was placed in a dielectric resonator (manufactured by QWED), and the relative dielectric constant (Dk) and dielectric loss tangent (Df) at a frequency of 10 GHz were measured using a network analyzer (manufactured by Agilent Technologies, Inc., E8364B).
(ピール強度)
樹脂フィルムからキャリアフィルム及び保護フィルムを剥がし、露出した樹脂層の両面に、H-VLP銅箔を重ねた。その状態で、真空加圧式ラミネータ(ニッコー・マテリアルズ株式会社製、商品名「V130」)を用いて、圧力0.9MPa、温度100℃及び加圧時間60秒の条件で銅箔を樹脂層にラミネートした。その後、乾燥機(株式会社二葉科学製、商品名「MSO-80TPS」)中、180℃で60分の加熱により、樹脂層を硬化させて、ピール強度測定用のサンプルを作製した。サンプルのサイズは、幅10mm×長さ70mmとした。サンプルの銅箔と硬化樹脂層間のピール強度を、卓上ピール試験機(株式会社島津製作所、商品名「EZ-S」)を用いて評価した。測定条件は、試験角度90°、ピール速度50mm/分とし剥離方向はサンプルの長さ方向とした。
(Peel Strength)
The carrier film and the protective film were peeled off from the resin film, and H-VLP copper foil was superposed on both sides of the exposed resin layer. In this state, the copper foil was laminated to the resin layer using a vacuum pressure laminator (manufactured by Nikko Materials Co., Ltd., product name "V130") under conditions of a pressure of 0.9 MPa, a temperature of 100°C, and a pressure time of 60 seconds. Thereafter, the resin layer was cured by heating at 180°C for 60 minutes in a dryer (manufactured by Futaba Scientific Co., Ltd., product name "MSO-80TPS") to prepare a sample for peel strength measurement. The size of the sample was 10 mm wide x 70 mm long. The peel strength between the copper foil and the cured resin layer of the sample was evaluated using a tabletop peel tester (Shimadzu Corporation, product name "EZ-S"). The measurement conditions were a test angle of 90°, a peel speed of 50 mm/min, and the peel direction was the length direction of the sample.
(燃焼試験)
積層フィルムを、乾燥機(株式会社二葉科学製、商品名「MSO-80TPS」)中、180℃で60分の加熱により、樹脂層を硬化させて、燃焼試験用のサンプルを作製した。燃焼試験用のサンプルに対して、UL94V試験を実施した。
(Combustion test)
The laminated film was heated in a dryer (manufactured by Futaba Scientific Co., Ltd., product name "MSO-80TPS") at 180°C for 60 minutes to harden the resin layer, thereby preparing a sample for a combustion test. The sample for the combustion test was subjected to a UL94V test.
1…基材フィルム、3…樹脂層。10…積層フィルム。 1...base film, 3...resin layer. 10...laminated film.
Claims (8)
前記基材フィルムが、液晶ポリマーフィルム又はフッ素樹脂フィルムであり、
前記樹脂層が、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤と、を含有する樹脂組成物を含み、
前記硬化剤が、エステル系硬化剤であり、
前記臭素系難燃剤の含有量が、前記ゴム成分、前記架橋成分、及び前記硬化剤の総量100質量部に対して、1~30質量部である、積層フィルム。 A substrate film and a resin layer provided on both sides of the substrate film,
The substrate film is a liquid crystal polymer film or a fluororesin film,
the resin layer includes a resin composition containing a rubber component, a cross-linking component having an epoxy group, a curing agent, a bromine-based flame retardant, and a flame retardant auxiliary;
the curing agent is an ester-based curing agent,
The content of the brominated flame retardant is 1 to 30 parts by mass per 100 parts by mass of the total amount of the rubber component, the crosslinking component, and the curing agent .
前記基材フィルムが、液晶ポリマーフィルム又はフッ素樹脂フィルムであり、
前記硬化樹脂層が、ゴム成分と、エポキシ基を有する架橋成分と、硬化剤と、臭素系難燃剤と、難燃助剤と、を含有する樹脂組成物の硬化物を含み、
前記硬化剤が、エステル系硬化剤であり、
前記臭素系難燃剤の含有量が、前記ゴム成分、前記架橋成分、及び前記硬化剤の総量100質量部に対して、1~30質量部である、導体基板。 The laminated ...
The substrate film is a liquid crystal polymer film or a fluororesin film,
the cured resin layer includes a cured product of a resin composition including a rubber component, a cross-linking component having an epoxy group, a curing agent, a brominated flame retardant, and a flame retardant auxiliary;
The curing agent is an ester-based curing agent,
The content of the brominated flame retardant is 1 to 30 parts by mass per 100 parts by mass of the total amount of the rubber component, the crosslinking component, and the curing agent.
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| JP2004277461A (en) | 2003-03-12 | 2004-10-07 | Tdk Corp | Epoxy resin composition and sheet obtained therefrom, prepreg-like material, sheet with metal foil, laminate, material for electrical insulation, resist material |
| JP2007176967A (en) | 2005-12-27 | 2007-07-12 | Fujikura Ltd | Epoxy resin composition, epoxy adhesive, coverlay, prepreg, metal-clad laminate, printed wiring board |
| JP2018150542A (en) | 2014-07-31 | 2018-09-27 | 東亞合成株式会社 | Laminate with adhesive layer, and flexible copper-clad laminate plate and flexible flat cable using the same |
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| JPH01215851A (en) * | 1988-02-23 | 1989-08-29 | Matsushita Electric Works Ltd | Flame-retarding polyphenylene oxide resin composition and metal-clad laminate thereof |
| JPH11209723A (en) * | 1998-01-30 | 1999-08-03 | Hitachi Chem Co Ltd | Flame retardant adhesive, flame retardant adhesive member, wiring board for mounting semiconductor provided with flame retardant adhesive member, and semiconductor device using the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2004277461A (en) | 2003-03-12 | 2004-10-07 | Tdk Corp | Epoxy resin composition and sheet obtained therefrom, prepreg-like material, sheet with metal foil, laminate, material for electrical insulation, resist material |
| JP2007176967A (en) | 2005-12-27 | 2007-07-12 | Fujikura Ltd | Epoxy resin composition, epoxy adhesive, coverlay, prepreg, metal-clad laminate, printed wiring board |
| JP2018150542A (en) | 2014-07-31 | 2018-09-27 | 東亞合成株式会社 | Laminate with adhesive layer, and flexible copper-clad laminate plate and flexible flat cable using the same |
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