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JP7562730B2 - Driving device, exposure device, exposure method, and article manufacturing method - Google Patents
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JP7562730B2 - Driving device, exposure device, exposure method, and article manufacturing method - Google Patents

Driving device, exposure device, exposure method, and article manufacturing method Download PDF

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JP7562730B2
JP7562730B2 JP2023028688A JP2023028688A JP7562730B2 JP 7562730 B2 JP7562730 B2 JP 7562730B2 JP 2023028688 A JP2023028688 A JP 2023028688A JP 2023028688 A JP2023028688 A JP 2023028688A JP 7562730 B2 JP7562730 B2 JP 7562730B2
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deformation
holding member
optical element
contact area
force
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JP2024121537A (en
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光 杉田
健一郎 蘆川
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Canon Inc
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70258Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Description

本発明は、駆動装置、露光装置、露光方法及び物品の製造方法に関する。 The present invention relates to a drive device, an exposure device, an exposure method, and a method for manufacturing an article.

半導体デバイスや液晶表示デバイスなどの製造工程において、複数の光学素子を有する露光装置が用いられることがある。特許文献1には、流体を用いて光学素子の位置を調整し、収差を低減する方法が開示されている。 In the manufacturing process of semiconductor devices, liquid crystal display devices, and the like, exposure apparatuses having multiple optical elements are sometimes used. Patent Document 1 discloses a method of reducing aberration by adjusting the position of optical elements using a fluid.

特開2000-357651号公報JP 2000-357651 A

ここで、収差を低減するための光学素子の調整が同一条件のもとで行われたとしても、光学素子を調整する部材が光学素子を調整する際に意図せぬ変形をすることで同一の収差変化量を得られないことがある。 Here, even if the adjustment of the optical elements to reduce aberration is performed under the same conditions, the same amount of aberration change may not be obtained because the members that adjust the optical elements may undergo unintended deformation when adjusting the optical elements.

そこで、本発明は、光学素子の調整に有利な駆動装置を提供することを目的とする。 The present invention aims to provide a drive device that is advantageous for adjusting optical elements.

上記目的を達成するために、本発明の一側面としての光学素子を保持する保持部材に力を加えて前記光学素子を移動又は変形させる駆動装置は、ベース部と、変形部と、前記変形部と前記ベース部とに囲まれた空間の圧力を調整する圧力調整部と、を備え、前記変形部は、前記圧力調整部が前記空間の圧力を調整することで変形する部分を有し、前記変形する部分は、変形することで前記保持部材に力を加える領域である接触領域と、前記保持部材に接触しない非接触領域とを含み、記接触領域における前記保持部材に前記力を加える方向の剛性は、前記非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、ことを特徴とする。
In order to achieve the above-mentioned object, one aspect of the present invention provides a driving device that applies a force to a holding member that holds an optical element to move or deform the optical element, comprising a base portion , a deformation portion, and a pressure adjustment portion that adjusts the pressure in a space surrounded by the deformation portion and the base portion, wherein the deformation portion has a portion that deforms when the pressure adjustment portion adjusts the pressure in the space, and the deformed portion includes a contact region that is an area that applies a force to the holding member by deforming, and a non-contact region that does not contact the holding member, and the rigidity in the contact region in the direction in which the force is applied to the holding member is higher than the rigidity in the same direction in at least a portion of the non- contact region.

本発明の更なる目的又はその他の側面は、以下、図面を参照して説明される実施形態によって明らかにされるであろう。 Further objects and other aspects of the present invention will become apparent from the embodiments described below with reference to the drawings.

本発明によれば、光学素子の調整に有利な駆動装置を提供することができる。 The present invention provides a driving device that is advantageous for adjusting optical elements.

第1実施形態における露光装置の構成を示す概略図である。1 is a schematic diagram showing the configuration of an exposure apparatus in a first embodiment. 駆動装置により投影光学系の収差を調整する例である。This is an example in which the aberration of the projection optical system is adjusted by a driving device. 第1実施形態における投影光学系の内部の構成を示す図である。FIG. 2 is a diagram showing the internal configuration of a projection optical system in the first embodiment. 第1実施形態における駆動装置の構成の例を示す図である。FIG. 2 is a diagram illustrating an example of the configuration of a drive device according to the first embodiment. 第1実施形態における投影光学系の内部の構成の一例を示す図である。FIG. 2 is a diagram showing an example of the internal configuration of a projection optical system in the first embodiment. 第1実施形態における露光処理を行うときのフローチャートである。5 is a flowchart for performing an exposure process in the first embodiment. 第2実施形態における駆動装置の構成を示す図である。FIG. 13 is a diagram showing a configuration of a drive device according to a second embodiment. 第3実施形態における投影光学系の内部の構成を示す図である。FIG. 13 is a diagram showing the internal configuration of a projection optical system according to a third embodiment. 第4実施形態における物品の製造方法のフローチャートである。10 is a flowchart of a method for manufacturing an article in a fourth embodiment.

以下に、本発明の実施形態を図面に基づいて説明する。尚、以下の実施形態は特許請求の範囲に係る発明を限定するものではない。実施形態には複数の特徴が記載されているが、これらの複数の特徴の全てが発明に必須のものとは限らず、また、複数の特徴は任意に組み合わせられてもよい。さらに、図面においては、同一若しくは同様の構成に同一の参照番号を付し、重複した説明は省略する。 Below, an embodiment of the present invention will be described with reference to the drawings. Note that the following embodiment does not limit the invention according to the claims. Although the embodiment describes multiple features, not all of these multiple features are necessarily essential to the invention, and multiple features may be combined in any manner. Furthermore, in the drawings, the same reference numbers are used for the same or similar configurations, and duplicate explanations will be omitted.

また、本明細書および図面では、基本的に、鉛直方向をZ軸とし、鉛直方向に対し垂直な水平面をXY平面とする、各軸が相互に直交するXYZ座標系によって方向が示されている。ただし、各図面にXYZ座標系を記載している場合はその座標系を優先する。 In addition, in this specification and drawings, directions are basically indicated by an XYZ coordinate system in which the vertical direction is the Z axis and the horizontal plane perpendicular to the vertical direction is the XY plane, with each axis being orthogonal to each other. However, if an XYZ coordinate system is shown in each drawing, that coordinate system takes precedence.

以下、各実施形態において、具体的な構成を説明する。 The specific configurations of each embodiment are described below.

<第1実施形態>
図1は、本実施形態における露光装置1の構成を示す概略図である。露光装置1は、本実施形態では、ステップ・アンド・リピート方式又はステップ・アンド・スキャン方式により原版(マスク、レチクル)のパターンを、投影光学系を介して基板に露光する投影露光装置である。なお、本実施形態では投影露光装置の例を説明するが、光学素子を調整することにより収差を調整する装置であればよく、特に装置の種類について限定しない。
First Embodiment
1 is a schematic diagram showing the configuration of an exposure apparatus 1 in this embodiment. In this embodiment, the exposure apparatus 1 is a projection exposure apparatus that exposes a pattern of an original (mask, reticle) onto a substrate via a projection optical system by a step-and-repeat method or a step-and-scan method. Note that, although an example of a projection exposure apparatus will be described in this embodiment, any apparatus that adjusts aberration by adjusting optical elements may be used, and there is no particular limitation on the type of apparatus.

露光装置1は、光を照射する照明光学系12と、投影光学系15と、レチクル13を保持するレチクルステージ14と、基板16を保持しつつXY方向に移動可能なステージ17と、制御部11と、を有する。レチクル13は、例えば石英ガラスの表面に転写されるべきパターン(例えば回路パターン)がクロムで形成されている原版である。また、基板16は、例えば単結晶シリコンであり、表面上に感光材料(レジスト)が塗布されている。制御部11は後述する駆動装置の一部であり、駆動装置の駆動を制御する。なお、制御部11は露光装置1内の各部分の制御を併せて行ってもよい。 The exposure apparatus 1 has an illumination optical system 12 that irradiates light, a projection optical system 15, a reticle stage 14 that holds a reticle 13, a stage 17 that can move in the XY directions while holding a substrate 16, and a control unit 11. The reticle 13 is an original plate on which a pattern (e.g., a circuit pattern) to be transferred is formed of chrome on the surface of, for example, quartz glass. The substrate 16 is, for example, single crystal silicon, and has a photosensitive material (resist) applied to its surface. The control unit 11 is part of a drive device described below, and controls the drive of the drive device. The control unit 11 may also control each part of the exposure apparatus 1.

露光装置1において、光源(不図示)からの露光光は、照明光学系12を介して、レチクルステージ14に保持されたレチクル13を照明する。レチクル13を透過した光は、投影光学系15を介して、基板16に照射される。この時、レチクル13に形成されたパターンからの光が基板16表面に結像される。露光装置1はこのように基板16上のショット領域を露光し、複数のショット領域のそれぞれについて同様に露光を行う。 In the exposure apparatus 1, exposure light from a light source (not shown) passes through an illumination optical system 12 and illuminates a reticle 13 held on a reticle stage 14. The light that passes through the reticle 13 passes through a projection optical system 15 and is irradiated onto a substrate 16. At this time, light from the pattern formed on the reticle 13 is imaged on the surface of the substrate 16. The exposure apparatus 1 exposes a shot area on the substrate 16 in this manner, and performs similar exposure on each of the multiple shot areas.

図2は駆動装置により投影光学系15の収差を調整する例である。投影光学系15の鏡筒103の内部には複数の光学素子(レンズ)が備えられている。光学素子には、照明光学系12からの光が入射する。図2(a)は、投影光学系15に備えられた複数の光学素子のうちの1つの光学素子を投影光学系の物体面側から見た場合の図である。投影光学系15に備えられた複数の光学素子のうち、少なくとも1つの光学素子101は保持部材102により保持されている。保持部材102は光学素子101を保持する保持部102aと、弾性ヒンジ120と、を有する。そして、弾性ヒンジ120はヒンジ部104と、凸部105と、を有する。 Figure 2 shows an example of adjusting the aberration of the projection optical system 15 by a driving device. A plurality of optical elements (lenses) are provided inside the lens barrel 103 of the projection optical system 15. Light from the illumination optical system 12 is incident on the optical elements. Figure 2(a) is a diagram of one of the plurality of optical elements provided in the projection optical system 15 as viewed from the object surface side of the projection optical system. At least one optical element 101 of the plurality of optical elements provided in the projection optical system 15 is held by a holding member 102. The holding member 102 has a holding portion 102a that holds the optical element 101, and an elastic hinge 120. The elastic hinge 120 has a hinge portion 104 and a convex portion 105.

投影光学系15に備えられた複数の光学素子のそれぞれは、露光光による熱の吸収等の要因により光学特性が変化することがある。この光学特性の変化により、投影光学系15に収差が発生する。投影光学系15は発生した収差を変化させるための駆動装置110を有し、制御部11は駆動装置110の駆動により投影光学系15に備えられた複数の光学素子のうち少なくとも1つの光学素子101を移動させるよう制御する。光学素子101を移動させる方向は、例えば、投影光学系15の光軸(Z軸方向)と直交する方向(X軸方向又はY軸方向)である。なお、投影光学系15の収差は光学素子101の変形によっても変化するため、制御部11は駆動装置110により力を加えることで光学素子101を変形させるよう制御してもよい。光学素子101の移動又は変形により投影光学系15の収差は変化するため、制御部11は投影光学系15の収差が低減するように駆動装置110により光学素子101を移動又は変形させる量を制御する。 The optical characteristics of each of the optical elements included in the projection optical system 15 may change due to factors such as the absorption of heat by the exposure light. This change in optical characteristics causes aberration in the projection optical system 15. The projection optical system 15 has a driving device 110 for changing the generated aberration, and the control unit 11 controls the driving device 110 to move at least one of the optical elements included in the projection optical system 15, so that the optical element 101 is moved in a direction (X-axis direction or Y-axis direction) perpendicular to the optical axis (Z-axis direction) of the projection optical system 15. Note that the aberration of the projection optical system 15 also changes due to the deformation of the optical element 101, so the control unit 11 may control the optical element 101 to be deformed by applying a force from the driving device 110. Since the aberration of the projection optical system 15 changes due to the movement or deformation of the optical element 101, the control unit 11 controls the amount of movement or deformation of the optical element 101 by the driving device 110 so as to reduce the aberration of the projection optical system 15.

駆動装置110は、変形部106と、ベース部107と、流路108と、圧力調整部109と、を有する。変形部106とベース部107により形成される空間は流路108により圧力調整部109と接続されている。圧力調整部109は、流体を供給又は回収することで、変形部106とベース部107により形成される空間に対して加圧又は減圧を行う。変形部106は、圧力調整部109が空間の圧力を調整することで変形する部分を有する。なお、変形部106はダイヤフラムともいわれる。変形部106とベース部107により形成される空間が圧力調整部109により加圧された場合に、変形部106の変形する部分は、変形部106のX軸方向の長手における中央を中心に+Y方向側に変形する。これは、空間が膨張するように変形部106の変形する部分が変形することと同義である。ここで、加圧された場合には空間の圧力は大気圧よりも高くなる。また、変形部106の形状によっては変形部106のX軸方向の長手における中央が変形の中心とならず、変形部106のX軸方向の長手における中央付近の領域を中心として、変形部106の変形する部分が+Y方向側に変形する場合もあり得る。一方、変形部106とベース部107により形成される空間が圧力調整部109により減圧された場合に、変形部106の変形する部分は、変形部106のX軸方向の長手における中央又は中央付近の領域を中心に-Y方向側に変形する。これは、空間が収縮するように変形部106の変形する部分が変形することと同義である。ここで、図2の例では圧力調整部109が鏡筒103の外側に備えられているが、圧力調整部109の位置は特に限定されない。 The driving device 110 has a deformation part 106, a base part 107, a flow path 108, and a pressure adjustment part 109. The space formed by the deformation part 106 and the base part 107 is connected to the pressure adjustment part 109 by the flow path 108. The pressure adjustment part 109 pressurizes or depressurizes the space formed by the deformation part 106 and the base part 107 by supplying or recovering a fluid. The deformation part 106 has a part that deforms when the pressure adjustment part 109 adjusts the pressure of the space. The deformation part 106 is also called a diaphragm. When the space formed by the deformation part 106 and the base part 107 is pressurized by the pressure adjustment part 109, the deformed part of the deformation part 106 deforms in the +Y direction centered on the center of the longitudinal direction of the deformation part 106 in the X-axis direction. This is synonymous with the part of the deformation part 106 that deforms deforms so that the space expands. Here, when pressurized, the pressure in the space becomes higher than atmospheric pressure. Depending on the shape of the deformation section 106, the center of the deformation in the X-axis direction of the deformation section 106 may not be the center of deformation, and the deformed portion of the deformation section 106 may deform in the +Y direction around a region near the center of the X-axis direction of the deformation section 106. On the other hand, when the space formed by the deformation section 106 and the base section 107 is depressurized by the pressure adjustment section 109, the deformed portion of the deformation section 106 deforms in the -Y direction around the center or a region near the center of the X-axis direction of the deformation section 106. This is synonymous with the deformation of the deformed portion of the deformation section 106 deforming so that the space contracts. Here, in the example of FIG. 2, the pressure adjustment section 109 is provided on the outside of the lens barrel 103, but the position of the pressure adjustment section 109 is not particularly limited.

変形部106の変形する部分が、圧力調整部109からの加圧により+Y方向に変形した場合に、変形部106は弾性ヒンジ120の凸部105と接触し、弾性ヒンジ120を+Y方向に押す。弾性ヒンジ120が+Y方向に押されることで、保持部102aに保持された光学素子101が変形又は+Y方向に移動する。以上説明したように、制御部11は光学素子101を移動又は変形させるよう駆動装置110を制御し、これにより投影光学系15の収差は変化する。 When the deforming portion of the deformation unit 106 is deformed in the +Y direction due to pressure from the pressure adjustment unit 109, the deformation unit 106 comes into contact with the convex portion 105 of the elastic hinge 120 and pushes the elastic hinge 120 in the +Y direction. When the elastic hinge 120 is pushed in the +Y direction, the optical element 101 held by the holding unit 102a is deformed or moves in the +Y direction. As described above, the control unit 11 controls the driving device 110 to move or deform the optical element 101, which changes the aberration of the projection optical system 15.

ここで、弾性ヒンジ120に凸部105を設け、凸部105と変形部106が接触することにより、変形部106が弾性ヒンジ120に力を加えるときの再現性を向上させることができる。例えば、弾性ヒンジ120に凸部105を設けず、ヒンジ部104と変形部106とが直接的に接触すると、変形部106が力を加える際のヒンジ部104と変形部106との接触面積が大きくなる。これにより、ヒンジ部104と変形部106とのそれぞれの平面度や表面粗さが、力が加わる方向に大きく影響する。この影響を低減するために、弾性ヒンジ120に凸部105を設け、変形部106と弾性ヒンジ120とが接触する面積を低減し、これにより接触する部材の平面度や表面粗さの影響を低減し、変形部106からの力の加わる方向のばらつきを低減する。変形部106からの力の加わる方向のばらつきを低減することで、光学素子101の移動量又は変形量のばらつきを低減することができる。なお、別の方法で再現性が補完できる場合は、弾性ヒンジ120に凸部105を設けなくともよい。また、凸部105は変形部106から力を加えられることで容易に変形しない材料、例えばセラミックスや鉄やステンレスから成ることが好ましい。 Here, by providing a convex portion 105 on the elastic hinge 120 and contacting the convex portion 105 with the deformation portion 106, the reproducibility when the deformation portion 106 applies a force to the elastic hinge 120 can be improved. For example, if the elastic hinge 120 does not have the convex portion 105 and the hinge portion 104 and the deformation portion 106 are in direct contact with each other, the contact area between the hinge portion 104 and the deformation portion 106 when the deformation portion 106 applies a force becomes large. As a result, the flatness and surface roughness of the hinge portion 104 and the deformation portion 106 respectively affect the direction in which the force is applied. In order to reduce this effect, the convex portion 105 is provided on the elastic hinge 120, reducing the area of contact between the deformation portion 106 and the elastic hinge 120, thereby reducing the effect of the flatness and surface roughness of the contacting members, and reducing the variation in the direction in which the force from the deformation portion 106 is applied. By reducing the variation in the direction in which the force from the deformation portion 106 is applied, the variation in the amount of movement or deformation of the optical element 101 can be reduced. Note that if reproducibility can be complemented by another method, it is not necessary to provide the protrusion 105 on the elastic hinge 120. In addition, it is preferable that the protrusion 105 is made of a material that does not easily deform when a force is applied from the deformation portion 106, such as ceramics, iron, or stainless steel.

図2(b)は、図2(a)に示した第1領域1000を拡大した図である。変形部106の変形する部分が+Y方向に変形することで凸部105と接触し、保持部材102を+Y方向に押すと、凸部105からの反力により、図2(b)に示すように変形部106が-Y方向側に意図せぬ変形をすることがある。反力により変形部106が変形すると、変形部106の凹面と凸部105の凸面との接触となり、変形部106と凸部105との接触位置が想定していた位置からずれ、変形部106が保持部材102に力を加える方向がずれる。これにより、実際の光学素子101の移動量又は変形量は、所望の光学素子101の移動量又は変形量とは異なる。 2B is an enlarged view of the first region 1000 shown in FIG. 2A. When the deforming portion of the deformation portion 106 deforms in the +Y direction and comes into contact with the convex portion 105, and the holding member 102 is pressed in the +Y direction, the reaction force from the convex portion 105 may cause the deformation portion 106 to deform unintentionally in the -Y direction as shown in FIG. 2B. When the deformation portion 106 deforms due to the reaction force, the concave surface of the deformation portion 106 comes into contact with the convex surface of the convex portion 105, and the contact position between the deformation portion 106 and the convex portion 105 shifts from the expected position, and the direction in which the deformation portion 106 applies force to the holding member 102 shifts. As a result, the actual movement or deformation amount of the optical element 101 differs from the desired movement or deformation amount of the optical element 101.

図3は、本実施形態における投影光学系15の内部の構成を示す図である。本実施形態の制御部11は投影光学系15の収差が低減するように、駆動装置210の駆動により光学素子101を移動又は変形させる量を制御する。なお、本実施形態では駆動装置210の一部である制御部11が駆動装置210を制御する例を示すが、駆動装置210は外部の制御装置により制御される形態でもよい。また、変形部206の変形する部分は圧力調整部109の圧力調整(流体の移動)により変形する。 Figure 3 is a diagram showing the internal configuration of the projection optical system 15 in this embodiment. The control unit 11 in this embodiment controls the amount by which the optical element 101 is moved or deformed by driving the driving device 210 so as to reduce the aberration of the projection optical system 15. Note that in this embodiment, an example is shown in which the control unit 11, which is part of the driving device 210, controls the driving device 210, but the driving device 210 may be controlled by an external control device. In addition, the portion of the deformation unit 206 that deforms is deformed by pressure adjustment (fluid movement) by the pressure adjustment unit 109.

本実施形態の駆動装置210の変形部206の変形する部分は、保持部材102に力を加えるために保持部材102に接触する接触領域と保持部材102に接触しない非接触領域を有する。そして、接触領域における保持部材102に力を加える方向(Y軸方向)の剛性は、保持部材102に接触しない非接触領域のうち少なくとも一部の領域における保持部材102に力を加える方向の剛性よりも高い。ここで、変形部206が保持部材102に接触する接触領域とは、変形部206が保持部材102を押す領域でもある。そして、変形部206が保持部材102に接触しない非接触領域とは、変形部が保持部材102を押さない領域でもある。 The deforming portion of the deformation unit 206 of the driving device 210 of this embodiment has a contact area that contacts the holding member 102 to apply force to the holding member 102, and a non-contact area that does not contact the holding member 102. The rigidity of the contact area in the direction in which force is applied to the holding member 102 (Y-axis direction) is higher than the rigidity of at least a portion of the non-contact area that does not contact the holding member 102 in the direction in which force is applied to the holding member 102. Here, the contact area where the deformation unit 206 contacts the holding member 102 is also the area where the deformation unit 206 presses the holding member 102. The non-contact area where the deformation unit 206 does not contact the holding member 102 is also the area where the deformation unit does not press the holding member 102.

図3(a)は本実施形態における投影光学系15に備えられた複数の光学素子のうちの1つの光学素子を投影光学系の物体面側から見た場合の図である。図3(a)の例では、本実施形態の変形部206は保持部材102に接触する接触領域である中央部の厚みが保持部材102に力を加える方向(Y軸方向)において厚く、中央部から離れるに従い厚みが薄くなる。換言すれば、変形部206の厚さは、保持部材102に接触する接触領域からの距離が大きいほど薄い。つまり、変形部206の保持部材102に接触しない非接触領域である端部の厚みは薄い。変形部206の厚みが厚い領域は変形しづらく剛性が高く、変形部206の厚みが薄い領域は厚みが厚い領域よりも変形しやすく剛性が低い。これにより、変形部206の保持部材102に接触する接触領域における剛性が、変形部206の保持部材102に接触しない非接触領域のうち少なくとも一部の領域の剛性よりも高くなっている。なお、本実施形態における接触領域の剛性とは、接触領域のY軸方向における厚さ部分を含む部分の剛性である。そして、本実施形態における非接触領域の剛性とは、非接触領域のY軸方向における厚さ部分を含む部分の剛性である。 3A is a diagram of one of the optical elements included in the projection optical system 15 in this embodiment, viewed from the object surface side of the projection optical system. In the example of FIG. 3A, the thickness of the central part of the deformation part 206 in this embodiment, which is the contact area that contacts the holding member 102, is thick in the direction in which force is applied to the holding member 102 (Y-axis direction), and the thickness becomes thinner as it moves away from the central part. In other words, the thickness of the deformation part 206 becomes thinner the greater the distance from the contact area that contacts the holding member 102. In other words, the thickness of the end part, which is the non-contact area of the deformation part 206 that does not contact the holding member 102, is thin. The thick area of the deformation part 206 is difficult to deform and has high rigidity, and the thin area of the deformation part 206 is easier to deform and has low rigidity than the thick area. As a result, the rigidity of the contact area of the deformation part 206 that contacts the holding member 102 is higher than the rigidity of at least a part of the non-contact area of the deformation part 206 that does not contact the holding member 102. In this embodiment, the rigidity of the contact area refers to the rigidity of the portion including the thickness of the contact area in the Y-axis direction. In this embodiment, the rigidity of the non-contact area refers to the rigidity of the portion including the thickness of the non-contact area in the Y-axis direction.

ここで、本実施形態では変形部206の保持部材102に接触する接触領域における剛性が、変形部206の保持部材102に接触しない非接触領域のうち少なくとも一部の領域の剛性よりも高い例を示している。しかし、この例は、変形部206の保持部材102に接触する接触領域における剛性の平均値が、変形部206の保持部材102に接触しない非接触領域の剛性の平均値よりも高いことと同義である。 In this embodiment, an example is shown in which the rigidity of the contact area of the deformation section 206 that contacts the holding member 102 is higher than the rigidity of at least a portion of the non-contact area of the deformation section 206 that does not contact the holding member 102. However, this example is equivalent to saying that the average value of the rigidity of the contact area of the deformation section 206 that contacts the holding member 102 is higher than the average value of the rigidity of the non-contact area of the deformation section 206 that does not contact the holding member 102.

変形部206の保持部材102に接触する接触領域における剛性が高いことで、変形部206が保持部材102を押す際の変形部206の保持部材102からの反力による変形量を低減することができる。また、保持部材102からの反力による変形部206の変形量が低減されることで、変形部206と保持部材102との接触面積が小さくなり、変形部206が保持部材102を押したときの再現性を向上することができる。変形部206と保持部材102の接触長さ(接触領域の長手方向の長さ)は、好ましくは変形部206の長手方向の長さの1%以下である。図3(a)の例では、変形部206のX方向に沿った長さが長手方向であり、変形部206とベース部107が結合されている2点間の距離が変形部206の長手方向の長さである。この長さが、例えば100mmであるとき、変形部206と保持部材102の接触面積は100mmの1%以下、つまり1mm以下の長さで接触することが好ましい。 The high rigidity of the contact area of the deformation portion 206 in contact with the holding member 102 can reduce the amount of deformation of the deformation portion 206 due to the reaction force from the holding member 102 when the deformation portion 206 presses the holding member 102. In addition, the reduction in the amount of deformation of the deformation portion 206 due to the reaction force from the holding member 102 reduces the contact area between the deformation portion 206 and the holding member 102, improving the reproducibility when the deformation portion 206 presses the holding member 102. The contact length (longitudinal length of the contact area) between the deformation portion 206 and the holding member 102 is preferably 1% or less of the longitudinal length of the deformation portion 206. In the example of FIG. 3(a), the length of the deformation portion 206 along the X direction is the longitudinal direction, and the distance between the two points where the deformation portion 206 and the base portion 107 are connected is the longitudinal length of the deformation portion 206. When this length is, for example, 100 mm, it is preferable that the contact area between the deformation portion 206 and the holding member 102 is 1% or less of 100 mm, that is, the contact is made over a length of 1 mm or less.

これにより、光学素子101を所望の移動量又は変形量で移動又は変形させることができ、投影光学系15の収差を所望の変化量で変化させることができる。換言すれば、駆動装置210により光学素子101を調整すると、変形部の意図せぬ変形を低減でき、所望の収差変化量又は所望の収差変化量に近い収差変化量を得ることができる。これは、駆動装置210により光学素子101を調整するときの、収差変化量の再現性の向上と同義である。ここで、図3の例では圧力調整部109が鏡筒103の外側に備えられているが、圧力調整部109の位置は特に限定されない。 This allows the optical element 101 to be moved or deformed by a desired amount, and the aberration of the projection optical system 15 to be changed by a desired amount. In other words, by adjusting the optical element 101 with the driving device 210, unintended deformation of the deformation portion can be reduced, and a desired amount of aberration change or an amount of aberration change close to the desired amount of aberration change can be obtained. This is synonymous with improving the reproducibility of the amount of aberration change when adjusting the optical element 101 with the driving device 210. Here, in the example of FIG. 3, the pressure adjustment unit 109 is provided on the outside of the lens barrel 103, but the position of the pressure adjustment unit 109 is not particularly limited.

図3(b)は図3(a)に示した駆動装置210を-X方向側から見た場合の図である。変形部206は薄板部と凸形状部とから成る。凸形状部は、薄板部の保持部材102に接触する接触領域に基づいて設けられている。なお、本実施形態において変形部206の薄板部と凸形状部とは一体となっている。この凸形状は図3(a)に示したようにX軸方向に沿って、弓なりの形状である。また、図3(a)及び図3(b)の例は、凸形状部が平板形状の例である。ここで、例えば薄板部の周りに変形部206を固定するための固定部が設けられている場合に、その固定部は変形部206には含まない。 Figure 3(b) is a diagram of the driving device 210 shown in Figure 3(a) when viewed from the -X direction side. The deformation portion 206 is composed of a thin plate portion and a convex portion. The convex portion is provided based on the contact area of the thin plate portion that contacts the holding member 102. In this embodiment, the thin plate portion and the convex portion of the deformation portion 206 are integrated. This convex shape is an arch shape along the X-axis direction as shown in Figure 3(a). Also, the examples of Figures 3(a) and 3(b) are examples in which the convex portion is flat. Here, for example, if a fixing portion for fixing the deformation portion 206 is provided around the thin plate portion, the fixing portion is not included in the deformation portion 206.

変形部206の材質は、例えば、鉄やステンレスである。鉄やステンレスは加工性が良好であり、薄板部の一部に凸形状部を形成するような複雑な加工を比較的容易に行うことができる材料である。また、変形部206は光学素子101の調整のたびに変形を行う部材であるため、耐久性が高いことが好ましく、鉄やステンレスは耐久性も良好な部材であるため、変形部206の材料として適している。また、本実施形態では変形部206の構成は薄板部と凸形状部が一体である例を示したが、薄板部と凸形状部とを別部材とし、薄板部と凸形状部を結合させて変形部206とする形態でもよい。薄板部と凸形状部を別部材とする場合、例えば薄板部はばね鋼などの材料により形成されてもよい。 The material of the deformation portion 206 is, for example, iron or stainless steel. Iron and stainless steel have good workability and are materials that can be relatively easily processed to form a convex portion in a part of the thin plate portion. In addition, since the deformation portion 206 is a member that is deformed every time the optical element 101 is adjusted, it is preferable that the material is highly durable, and iron and stainless steel are members with good durability, so they are suitable as materials for the deformation portion 206. In addition, in this embodiment, an example is shown in which the deformation portion 206 is configured such that the thin plate portion and the convex portion are integrated, but the thin plate portion and the convex portion may be separate members and the thin plate portion and the convex portion may be joined to form the deformation portion 206. When the thin plate portion and the convex portion are separate members, the thin plate portion may be formed of a material such as spring steel, for example.

変形部206の薄板部の厚みは、変形部206の変形可能量と変形部206の耐久性に影響する。変形部206の薄板部が厚いほど変形部206の変形可能量は小さくなるが耐久性は向上する。一方、変形部206の薄板部が薄いほど変形部206の変形可能量は大きくなるが、耐久性は低下する。そして、変形部206の変形可能量と耐久性は厚みだけでなく変形部206の面積にも影響される。よって、変形部206は変形可能量と耐久性を考慮して設計されることが好ましい。また、変形部206の保持部材102に接触する接触領域の厚さ(Y方向に沿った長さ)は3mm以上であることが好ましい。 The thickness of the thin plate portion of the deformation portion 206 affects the amount of deformation and durability of the deformation portion 206. The thicker the thin plate portion of the deformation portion 206, the smaller the amount of deformation of the deformation portion 206, but the better the durability. On the other hand, the thinner the thin plate portion of the deformation portion 206, the larger the amount of deformation of the deformation portion 206, but the worse the durability. The amount of deformation and durability of the deformation portion 206 are affected not only by the thickness but also by the area of the deformation portion 206. Therefore, it is preferable that the deformation portion 206 is designed taking into consideration the amount of deformation and durability. In addition, it is preferable that the thickness (length along the Y direction) of the contact area of the deformation portion 206 that contacts the holding member 102 is 3 mm or more.

また、変形部206とベース部107とにより形成される空間の容積は、変形部206の変形の精度、つまり光学素子101を移動又は変形させる精度に影響する。光学素子101を移動又は変形させる精度を優先する場合は、容積を小さくするほうが有利である。これは、空間の容積を小さくした方が、圧力調整部109により加圧又は減圧した時の応答性がよくなるためである。一方で容積が小さいと、気体の状態方程式に従い、圧力を変化させた時の温度変化が大きくなる。圧力変化による温度変化が発生すると、鏡筒103の熱変形により、予期せぬ光学特性の変化が発生することがある。よって、変形部206とベース部107は上記のような精度と温度変化についても考慮し、設計されることが好ましい。 The volume of the space formed by the deformation section 206 and the base section 107 also affects the accuracy of deformation of the deformation section 206, that is, the accuracy of moving or deforming the optical element 101. If the accuracy of moving or deforming the optical element 101 is a priority, it is advantageous to make the volume smaller. This is because a smaller volume of the space improves the responsiveness when the pressure is increased or decreased by the pressure adjustment section 109. On the other hand, if the volume is small, the temperature change when the pressure is changed will be large according to the gas state equation. If a temperature change occurs due to a pressure change, the optical tube 103 may be thermally deformed, causing an unexpected change in the optical characteristics. Therefore, it is preferable that the deformation section 206 and the base section 107 are designed taking into consideration the above-mentioned accuracy and temperature change.

ここで、変形部206の形状は図3の例に限定されない。図4は、本実施形態における駆動装置210の構成の例を示す図である。図4(a)の例では、変形部206は薄板部のうち保持部材102に接触する接触領域に凸形状部が設けられており、凸形状はZ軸方向に沿って、弓なりの形状である。図4(b)の例は、投影光学系の物体面側から駆動装置210を見た場合の図であり、変形部206は薄板部のうち保持部材102に接触する接触領域に凸形状部が設けられており、凸形状は矩形形状である。図4(c)は図4(b)に示した駆動装置210を-X方向側から見た場合の図である。なお、図4(a)、図4(b)、図4(c)の例は、凸形状部が平板形状の例である。図4(d)は、+Y方向側から駆動装置210を見た場合の図であり、変形部206は円形状(球面形状)であり、ベース部107は変形部206の外周形状に沿う環状形状である。変形部206は、円形状の中心に近くなるほどY軸方向に沿った厚みが厚くなるよう形成される。図4(d)のような形態にすることで、変形部206の耐久性は向上する。 Here, the shape of the deformation portion 206 is not limited to the example shown in FIG. 3. FIG. 4 is a diagram showing an example of the configuration of the driving device 210 in this embodiment. In the example shown in FIG. 4(a), the deformation portion 206 has a convex portion in the contact area of the thin plate portion that contacts the holding member 102, and the convex shape is an arch shape along the Z axis direction. The example shown in FIG. 4(b) is a diagram showing the driving device 210 as viewed from the object surface side of the projection optical system, and the deformation portion 206 has a convex portion in the contact area of the thin plate portion that contacts the holding member 102, and the convex shape is a rectangular shape. FIG. 4(c) is a diagram showing the driving device 210 shown in FIG. 4(b) as viewed from the -X direction side. Note that the examples shown in FIG. 4(a), FIG. 4(b), and FIG. 4(c) are examples in which the convex portion is flat. FIG. 4(d) is a diagram of the driving device 210 when viewed from the +Y direction side, where the deformation portion 206 is circular (spherical) and the base portion 107 is annular in shape that follows the outer periphery of the deformation portion 206. The deformation portion 206 is formed so that its thickness along the Y axis direction increases the closer it is to the center of the circle. By making it into the shape shown in FIG. 4(d), the durability of the deformation portion 206 is improved.

図5は、本実施形態における投影光学系15の内部の構成の一例を示す図である。図5の例では、本実施形態の駆動装置210(変形部206)を光学素子101の+X方向側、-X方向側、+Y方向側、-Y方向側の4か所に設けている。これにより、駆動装置210の駆動により同一の光学素子101を+X方向側、-X方向側、+Y方向側、-Y方向側に移動又は変形させることができ、投影光学系15の収差の調整に有利である。 Figure 5 is a diagram showing an example of the internal configuration of the projection optical system 15 in this embodiment. In the example of Figure 5, the driving device 210 (deformation unit 206) of this embodiment is provided in four locations on the +X direction side, -X direction side, +Y direction side, and -Y direction side of the optical element 101. This makes it possible to move or deform the same optical element 101 in the +X direction side, -X direction side, +Y direction side, and -Y direction side by driving the driving device 210, which is advantageous for adjusting the aberration of the projection optical system 15.

なお、本実施形態では4つの弾性ヒンジ120を離間して配置した例を示したが、弾性ヒンジ120の配置はこの例に限定されない。例えば、弾性ヒンジは保持部材102を囲むような環状形状の部材であってもよい。この場合、環状形状の弾性ヒンジは、離間して配置された4つの駆動装置210から+X方向側、-X方向側、+Y方向側、-Y方向側に力を加えられる。また、本実施形態では等間隔に4つの駆動装置210を配置し、保持部材102に対して+X方向側、-X方向側、+Y方向側、-Y方向側に力を加える例を示した。しかし、駆動装置210の配置は等間隔でなくともよく、数も4つに限定されず、保持部材102に力を加える方向も特に限定されない。つまり、変形部206を少なくとも4つ以上有し、変形部206の変形により光学素子101は光学素子101を通過する光軸と直交する面上の少なくとも2方向に移動可能であればよい。 In this embodiment, an example in which four elastic hinges 120 are arranged at a distance from each other is shown, but the arrangement of the elastic hinges 120 is not limited to this example. For example, the elastic hinge may be an annular member that surrounds the holding member 102. In this case, the annular elastic hinge is subjected to forces in the +X direction, -X direction, +Y direction, and -Y direction from four drive devices 210 arranged at a distance from each other. In addition, in this embodiment, an example in which four drive devices 210 are arranged at equal intervals and forces are applied to the holding member 102 in the +X direction, -X direction, +Y direction, and -Y direction is shown. However, the arrangement of the drive devices 210 does not have to be at equal intervals, the number is not limited to four, and the direction in which the force is applied to the holding member 102 is not particularly limited. In other words, it is sufficient that the optical element 101 has at least four deformation sections 206 and can move in at least two directions on a plane perpendicular to the optical axis passing through the optical element 101 due to deformation of the deformation sections 206.

図6は、本実施形態における露光処理を行うときのフローチャートである。まず、制御部11又は外部の制御装置が駆動装置210を駆動させることで、変形部206を変形させ、保持部材102に力を加えることで光学素子101を移動又は変形させるよう制御する(S110、調整工程)。なお、変形部206は、光学素子101を保持する保持部材102に接触する接触領域における剛性が保持部材102に接触しない非接触領域のうち少なくとも一部の領域の剛性よりも高い。その後、露光装置1は露光処理を行う(S120、露光工程)。なお、光学素子101の調整は、事前に取得したデータに基づいて所定量だけ駆動装置210を駆動させる制御(オープン制御)であってもよい。或いは、保持部材102に設けられたターゲット又は光学素子101の移動量や変形量をセンサにより検出し、センサが検出した結果に基づいて駆動装置210を駆動させる制御(FB制御)であってもよく、特に限定しない。 Figure 6 is a flowchart when performing the exposure process in this embodiment. First, the control unit 11 or an external control device drives the driving device 210 to deform the deformation unit 206 and control it to apply force to the holding member 102 to move or deform the optical element 101 (S110, adjustment process). Note that the rigidity of the contact area of the deformation unit 206 that contacts the holding member 102 that holds the optical element 101 is higher than the rigidity of at least a part of the non-contact area that does not contact the holding member 102. After that, the exposure device 1 performs the exposure process (S120, exposure process). Note that the adjustment of the optical element 101 may be a control (open control) that drives the driving device 210 by a predetermined amount based on data acquired in advance. Alternatively, the adjustment may be a control (FB control) that detects the amount of movement or deformation of the target or optical element 101 provided on the holding member 102 by a sensor and drives the driving device 210 based on the result detected by the sensor, and is not particularly limited.

また、本実施形態は2つの光学素子により構成される一対のレンズであって、2つの光学素子の間に空間を有するアルバレツレンズに適用されてもよい。アルバレツレンズが第1光学素子と第2光学素子から成る場合、駆動装置210の変形する部分の変形により、第1光学素子と第2光学素子とのうち少なくとも一方を保持している保持部材102に力を加える。駆動装置210により力を加えられた保持部材102に保持されている光学素子は、移動又は変形する。これにより、第1光学素子と第2光学素子に起因する収差を変化させることができる。 This embodiment may also be applied to an Alvarez lens, which is a pair of lenses made up of two optical elements and has a space between the two optical elements. When the Alvarez lens is made up of a first optical element and a second optical element, a force is applied to the holding member 102 holding at least one of the first optical element and the second optical element by the deformation of the deforming portion of the driving device 210. The optical element held by the holding member 102 to which the force is applied by the driving device 210 moves or deforms. This makes it possible to change the aberration caused by the first optical element and the second optical element.

本実施形態の変形部206の変形する部分は、変形する部分の保持部材102に接触する接触領域における厚みを、変形する部分の保持部材102に接触しない非接触領域のうち少なくとも一部の領域の厚みより厚くする。これにより、本実施形態の駆動装置210の変形部206は、変形部206の保持部材102に接触する接触領域における剛性が、変形部206の保持部材102に接触しない非接触領域のうち少なくとも一部の領域の剛性よりも高い。よって、本実施形態の変形部206を有する駆動装置210は、光学素子101の調整において、保持部材102からの反力による調整量の誤差を低減した状態で、光学素子101を所望の移動量又は変形量だけ調整することができる。したがって、本実施形態の駆動装置210は光学素子101の調整に有利である。 The deforming portion of the deformation unit 206 of this embodiment has a thickness in the contact area of the deforming portion that contacts the holding member 102 that is thicker than the thickness of at least a portion of the non-contact area of the deforming portion that does not contact the holding member 102. As a result, the rigidity of the deformation unit 206 of the driving device 210 of this embodiment in the contact area of the deformation unit 206 that contacts the holding member 102 is higher than the rigidity of at least a portion of the non-contact area of the deformation unit 206 that does not contact the holding member 102. Therefore, the driving device 210 having the deformation unit 206 of this embodiment can adjust the optical element 101 by the desired amount of movement or deformation while reducing the error in the adjustment amount due to the reaction force from the holding member 102 when adjusting the optical element 101. Therefore, the driving device 210 of this embodiment is advantageous for adjusting the optical element 101.

<第2実施形態>
本実施形態は、第1実施形態と変形部の変形する部分の保持部材102に接触する接触領域における剛性を高くするための構成が異なる。本実施形態の変形部306は、変形部306の保持部材102に接触する接触領域における材質の剛性を、変形部306の保持部材102に接触しない非接触領域のうち少なくとも一部の領域の材質の剛性より高くする。
Second Embodiment
The present embodiment differs from the first embodiment in the configuration for increasing the rigidity of a contact region of a deforming portion of the deforming portion that contacts the holding member 102. In the deforming portion 306 of the present embodiment, the rigidity of the material in the contact region of the deforming portion 306 that contacts the holding member 102 is made higher than the rigidity of the material of at least a portion of the non-contact region of the deforming portion 306 that does not contact the holding member 102.

図7は本実施形態における駆動装置310の構成を示す図である。駆動装置310の変形部306は、少なくとも2つ以上の材料により形成される。変形部306の保持部材102に接触する接触領域(領域320)は、剛性の高い材料により形成される。剛性の高い材料とは、例えばセラミックスや鉄やステンレスである。変形部306の保持部材102に接触しない非接触領域(領域330、領域340)は、変形部306の保持部材102に接触する接触領域の材質の剛性よりも剛性が低い材料により形成される。これにより、変形部306のY軸方向における厚さが均一であったとしても、変形部306の保持部材102に接触する接触領域が保持部材102に力を加える際に、保持部材102からの反力による変形部306の意図せぬ変形を低減できる。 Figure 7 is a diagram showing the configuration of the driving device 310 in this embodiment. The deformation portion 306 of the driving device 310 is formed of at least two or more materials. The contact area (area 320) of the deformation portion 306 that contacts the holding member 102 is formed of a material with high rigidity. Examples of the material with high rigidity include ceramics, iron, and stainless steel. The non-contact areas (areas 330 and 340) of the deformation portion 306 that do not contact the holding member 102 are formed of a material with a lower rigidity than the rigidity of the material of the contact area of the deformation portion 306 that contacts the holding member 102. As a result, even if the thickness of the deformation portion 306 in the Y-axis direction is uniform, unintended deformation of the deformation portion 306 due to a reaction force from the holding member 102 can be reduced when the contact area of the deformation portion 306 that contacts the holding member 102 applies a force to the holding member 102.

剛性の低い材料とは、例えばアルミニウム又はアルミニウム合金である。ただし、材料はこの例に限定されない。例えば、剛性の高い材料としてセラミックスを採用した場合は、剛性の低い材料としてセラミックスより剛性の低い鉄又はステンレス又はアルミニウム又はアルミニウム合金等を用いてもよい。そして、剛性の高い材料として鉄やステンレスを採用した場合は、剛性の低い材料として鉄やステンレスより剛性の低いアルミニウム又はアルミニウム合金等を用いてもよい。 The low-rigidity material is, for example, aluminum or an aluminum alloy. However, the material is not limited to this example. For example, if ceramics is used as the high-rigidity material, iron, stainless steel, aluminum, or an aluminum alloy, which has a lower rigidity than ceramics, may be used as the low-rigidity material. And, if iron or stainless steel is used as the high-rigidity material, aluminum or an aluminum alloy, which has a lower rigidity than iron or stainless steel, may be used as the low-rigidity material.

このような構成により、第1実施形態と同様に、変形部306の保持部材102に接触する接触領域における剛性が高いことで、変形部306が保持部材102を押す際の変形部306の保持部材102からの反力による変形量を低減することができる。これにより、駆動装置310により光学素子101を調整するときの、収差変化量の再現性を向上できる。よって、本実施形態の変形部306を有する駆動装置310は、光学素子101の調整において、保持部材102からの反力による調整量の誤差を低減した状態で、光学素子101を所望の移動量又は変形量だけ調整することができる。したがって、本実施形態の駆動装置310は光学素子101の調整に有利である。また、本実施形態では、変形部306のY軸方向における厚さが均一である例について説明した。しかし、第1実施形態と本実施形態を組み合わせ、保持部材102と接触する接触領域のY軸方向における厚さと材料を調整し、接触領域の剛性を非接触領域の剛性より高くしてもよい。 With this configuration, as in the first embodiment, the rigidity of the contact area of the deformation portion 306 that contacts the holding member 102 is high, so that the amount of deformation of the deformation portion 306 due to the reaction force from the holding member 102 when the deformation portion 306 presses the holding member 102 can be reduced. This improves the reproducibility of the amount of aberration change when the optical element 101 is adjusted by the driving device 310. Therefore, the driving device 310 having the deformation portion 306 of this embodiment can adjust the optical element 101 by the desired amount of movement or deformation while reducing the error in the amount of adjustment due to the reaction force from the holding member 102 in adjusting the optical element 101. Therefore, the driving device 310 of this embodiment is advantageous for adjusting the optical element 101. In addition, in this embodiment, an example in which the thickness of the deformation portion 306 in the Y-axis direction is uniform has been described. However, the first embodiment and this embodiment may be combined to adjust the thickness and material in the Y-axis direction of the contact area that contacts the holding member 102, so that the rigidity of the contact area is higher than the rigidity of the non-contact area.

<第3実施形態>
本実施形態は、第1実施形態の特徴に加えて、保持部材102と接触して変形した時の変形部506(変形部506の変形する部分)の形状変化を考慮して、変形部506の形状が設計されていることを特徴とする。
Third Embodiment
In addition to the features of the first embodiment, this embodiment is characterized in that the shape of the deformation portion 506 is designed taking into consideration the change in shape of the deformation portion 506 (the part that deforms of the deformation portion 506) when it comes into contact with the holding member 102 and deforms.

制御部11の制御により光学素子101を大きく移動又は変形させる場合に、変形部506が保持部材102を押す力が強くなり、反力が大きくなる。変形部506に加わる保持部材102からの反力が大きくなると、第1実施形態のように保持部材102に接触する接触領域の厚さを厚くして剛性を高くしたとしても、変形部506は意図せぬ変形をすることがある。具体的には、保持部材102からの反力により図2(b)に示すように変形部506が-Y方向側に意図せぬ変形をすることがある。 When the optical element 101 is moved or deformed significantly under the control of the control unit 11, the force with which the deformation unit 506 presses the holding member 102 increases, and the reaction force becomes larger. When the reaction force from the holding member 102 acting on the deformation unit 506 becomes large, the deformation unit 506 may undergo unintended deformation, even if the thickness of the contact area that contacts the holding member 102 is increased to increase rigidity as in the first embodiment. Specifically, the reaction force from the holding member 102 may cause the deformation unit 506 to undergo unintended deformation in the -Y direction as shown in FIG. 2(b).

本実施形態では、変形部506が保持部材102と接触して変形した時の変形部506の形状変化を考慮して、変形部506の形状が設計されている。理想的には、変形部506と保持部材102とが接触して保持部材102から変形部506が反力を受けて変形する変形量は、変形部506の保持部材102に接触する接触領域の厚さを厚くした分と同じであることが好ましい。具体的には、変形部506の保持部材102に接触する接触領域の厚さを3mm厚くした位置においては、保持部材102からの反力により3mm分変形することが好ましい。 In this embodiment, the shape of the deformation portion 506 is designed taking into consideration the change in shape of the deformation portion 506 when it comes into contact with the holding member 102 and deforms. Ideally, the amount of deformation caused by the deformation portion 506 receiving a reaction force from the holding member 102 when the deformation portion 506 comes into contact with the holding member 102 is preferably equal to the thickness of the contact area of the deformation portion 506 that comes into contact with the holding member 102. Specifically, at a position where the thickness of the contact area of the deformation portion 506 that comes into contact with the holding member 102 is increased by 3 mm, it is preferable that the deformation is caused by 3 mm of reaction force from the holding member 102.

しかし、例えば光学素子101を+Y方向に1mm移動させる場合と、3mm移動させる場合とでは、変形部506が保持部材102を押す力は異なり、それにより保持部材102から受ける反力も異なる。つまり、光学素子101を移動又は変形させる量により、反力を受ける量は異なるため、保持部材102から変形部506が反力を受けて変形する変形量を、変形部506の保持部材102に接触する接触領域の厚さを厚くした分と常に同様にすることはできない。 However, for example, when the optical element 101 is moved 1 mm in the +Y direction, the force with which the deformation portion 506 presses the holding member 102 is different from when it is moved 3 mm, and therefore the reaction force it receives from the holding member 102 is also different. In other words, since the amount of reaction force received differs depending on the amount by which the optical element 101 is moved or deformed, the amount of deformation by which the deformation portion 506 deforms as a result of receiving a reaction force from the holding member 102 cannot always be made the same as the amount by which the contact area of the deformation portion 506 that comes into contact with the holding member 102 is increased.

そのため、本実施形態では変形部506の変形可能量の最大変形量と最小変形量の中間値である中間変形量に基づいて変形部506が保持部材102と接触して変形するとき(保持部材102に力を加えるとき)の変形部506の形状変化を考慮する例を示す。なお、本実施形態では変形可能量の最大変形量と最小変形量の中間値である中間変形量に基づいて変形部506の形状変化を考慮する例を示すが、形状変化を考慮する状態は中間変形量に限定されない。例えば、最も高い頻度で光学素子101を移動又は変形させる量、つまり最も頻度が高い変形部506(変形部506の変形する部分)の変形量に基づいて変形部506の形状変化を考慮してもよい。 Therefore, in this embodiment, an example is shown in which the shape change of the deformation portion 506 when it comes into contact with the holding member 102 and deforms (when a force is applied to the holding member 102) is considered based on an intermediate deformation amount that is an intermediate value between the maximum deformation amount and the minimum deformation amount of the deformation portion 506. Note that in this embodiment, an example is shown in which the shape change of the deformation portion 506 is considered based on an intermediate deformation amount that is an intermediate value between the maximum deformation amount and the minimum deformation amount of the deformation portion 506, but the state in which the shape change is considered is not limited to the intermediate deformation amount. For example, the shape change of the deformation portion 506 may be considered based on the amount that moves or deforms the optical element 101 most frequently, that is, the deformation amount of the deformation portion 506 (the part of the deformation portion 506 that deforms) that is most frequently used.

図8は本実施形態における投影光学系15の内部の構成を示す図である。図8の例の駆動装置510の変形部506は、保持部材102に力を加える位置の最大変形量が5mm、最小変形量が1mmである。図8(a)は変形部506が変形していない例である。図8(b)は、図8(a)の状態から光学素子101を+Y方向に中間変形量である3mm移動させるために、制御部11が圧力調整部109に対して変形部506とベース部107から成る空間の圧力を調整するよう制御する例である。これにより図8(b)のように変形部506とベース部107から成る空間が膨張し、変形部506が保持部材102を+Y方向に押す。このとき、変形部506は保持部材102からの反力を受け、変形する。本実施形態では、図8(b)に示すように中間変形量になるよう変形部506が変形したとき、変形部506の弾性ヒンジに接触する接触領域は、変形部506の剛性を高めるために厚みを増した分だけ-Y方向に変形する。 Figure 8 is a diagram showing the internal configuration of the projection optical system 15 in this embodiment. The deformation portion 506 of the driving device 510 in the example of Figure 8 has a maximum deformation amount of 5 mm and a minimum deformation amount of 1 mm at the position where force is applied to the holding member 102. Figure 8 (a) is an example in which the deformation portion 506 is not deformed. Figure 8 (b) is an example in which the control unit 11 controls the pressure adjustment unit 109 to adjust the pressure in the space formed by the deformation portion 506 and the base portion 107 in order to move the optical element 101 in the +Y direction by an intermediate deformation amount of 3 mm from the state of Figure 8 (a). As a result, the space formed by the deformation portion 506 and the base portion 107 expands as shown in Figure 8 (b), and the deformation portion 506 pushes the holding member 102 in the +Y direction. At this time, the deformation portion 506 receives a reaction force from the holding member 102 and deforms. In this embodiment, when the deformation portion 506 is deformed to an intermediate deformation amount as shown in FIG. 8(b), the contact area of the deformation portion 506 that comes into contact with the elastic hinge is deformed in the -Y direction by an amount corresponding to the increased thickness in order to increase the rigidity of the deformation portion 506.

上記の例は、換言すれば、接触面積が最大となるときの変形部506の保持部材102に接触する接触領域の厚さが、接触面積が最大でないときの変形部506の保持部材102に接触する接触領域の厚さよりも小さい変形部506を示す。 In other words, the above example shows a deformation portion 506 in which the thickness of the contact area of the deformation portion 506 that contacts the retaining member 102 when the contact area is maximum is smaller than the thickness of the contact area of the deformation portion 506 that contacts the retaining member 102 when the contact area is not maximum.

本実施形態では変形部506の形状変化を考慮して、変形部506が設計されるが、このとき形状変化を考慮して変形部506の設計を変更する部分は、例えば変形部506の厚みや変形部506の材質である。変形部506の形状変化を考慮して変形部506の厚みを決定してもよいし、材質を決定してもよいし、厚さと材質の両方を決定してもよい。 In this embodiment, the deformation portion 506 is designed taking into consideration the change in shape of the deformation portion 506. At this time, the parts of the design of the deformation portion 506 that are changed taking into consideration the change in shape are, for example, the thickness of the deformation portion 506 and the material of the deformation portion 506. The thickness of the deformation portion 506 may be determined taking into consideration the change in shape of the deformation portion 506, the material may be determined, or both the thickness and the material may be determined.

本実施形態によれば、形状変化を考慮した変形部506を用いることができ、光学素子101の調整にさらに有利である。 According to this embodiment, a deformation portion 506 can be used that takes into account shape changes, which is even more advantageous for adjusting the optical element 101.

<第4実施形態>
本実施形態は、前述した駆動装置を用いて物品を製造することを特徴とする。
Fourth Embodiment
The present embodiment is characterized in that an article is manufactured using the above-described drive device.

図9は本実施形態における物品の製造方法のフローチャートである。前述した駆動装置を用いて、光学素子101を移動又は変形させる調整工程(S210)を行う。 Figure 9 is a flowchart of a method for manufacturing an article in this embodiment. An adjustment step (S210) is performed to move or deform the optical element 101 using the driving device described above.

なお、この調整工程は、変形部の変形する部分が変形して光学素子101を保持する保持部材102に力を加えることで光学素子101を移動又は変形させて調整が行われる。ここで、変形部の変形する部分において、保持部材102に力を加えるために保持部材102に接触する接触領域における剛性が、保持部材102に接触しない非接触領域のうち少なくとも一部の領域における剛性よりも高い。なお、剛性は保持部材102に力を加える方向の剛性である。 In addition, this adjustment process is performed by applying a force to the holding member 102 that holds the optical element 101 by the deforming portion of the deformation part deforming, thereby moving or deforming the optical element 101. Here, in the deforming portion of the deformation part, the rigidity of the contact area that contacts the holding member 102 to apply a force to the holding member 102 is higher than the rigidity of at least a portion of the non-contact area that does not contact the holding member 102. Note that the rigidity is the rigidity in the direction in which the force is applied to the holding member 102.

そして、調整工程の後に、基板にパターンを形成する形成工程(S220)を行い、形成工程でパターンが形成された基板から物品を製造する製造工程(S230)を行う。 After the adjustment process, a formation process (S220) is performed to form a pattern on the substrate, and a manufacturing process (S230) is performed to manufacture an article from the substrate on which the pattern has been formed in the formation process.

この製造方法で製造する物品は、例えば、半導体IC素子、液晶表示素子、カラーフィルタ、MEMS等である。 Items manufactured using this manufacturing method include, for example, semiconductor IC elements, liquid crystal display elements, color filters, MEMS, etc.

形成工程は、例えば、感光材料が塗布された基板(シリコンウエハ、ガラスプレート等)を露光装置(リソグラフィ装置)により露光することで基板にパターンを形成する。 The formation process involves, for example, forming a pattern on a substrate (such as a silicon wafer or glass plate) coated with a photosensitive material by exposing the substrate to light using an exposure device (lithography device).

製造工程は、例えば、パターンが形成された基板(感光材料)の現像、現像された基板に対するエッチング及びレジスト剥離、ダイシング、ボンディング、パッケージングの実施が含まれる。本製造方法によれば、従来よりも高品位の物品を製造することができる。 The manufacturing process includes, for example, developing a substrate (photosensitive material) on which a pattern has been formed, etching the developed substrate, removing the resist, dicing, bonding, and packaging. This manufacturing method makes it possible to manufacture higher quality articles than ever before.

本明細書の開示は、以下の駆動装置、露光装置、露光方法及び物品の製造方法を含む。 The disclosure of this specification includes the following drive device, exposure device, exposure method, and method for manufacturing an article.

[項目1]
光学素子を保持する保持部材に力を加えて前記光学素子を移動又は変形させる駆動装置であって、
ベース部と、
変形することで前記保持部材に力を加える変形部と、
前記変形部と前記ベース部とに囲まれた空間の圧力を調整する圧力調整部と、を有し、
前記変形部は、前記圧力調整部が前記空間の圧力を調整することで変形する部分を有し、
前記変形する部分において、
前記保持部材に力を加えるために前記保持部材に接触する接触領域における前記保持部材に力を加える方向の剛性は、前記保持部材に接触しない非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする駆動装置。
[Item 1]
A driving device that applies a force to a holding member that holds an optical element to move or deform the optical element,
A base portion;
a deformation portion that applies a force to the holding member by deformation;
a pressure adjusting portion that adjusts a pressure in a space surrounded by the deformation portion and the base portion,
the deformation portion has a portion that is deformed by the pressure adjustment portion adjusting the pressure in the space,
In the deformed portion,
a rigidity in a direction in which a force is applied to the holding member in a contact region that contacts the holding member to apply a force to the holding member is higher than a rigidity in the same direction in at least a part of a non-contact region that does not contact the holding member;
A drive device characterized by:

[項目2]
前記接触領域の厚さは、前記非接触領域のうち少なくとも一部の領域の厚さよりも厚いことを特徴とする項目1に記載の駆動装置。
[Item 2]
2. The drive device according to item 1, wherein the thickness of the contact region is greater than the thickness of at least a portion of the non-contact region.

[項目3]
前記変形する部分は、薄板部と、凸形状部と、から成り、前記凸形状部の少なくとも一部が前記保持部材に力を加えることを特徴とする項目1又は2に記載の駆動装置。
[Item 3]
3. The drive device according to claim 1, wherein the deformable portion comprises a thin plate portion and a convex portion, and at least a part of the convex portion applies a force to the holding member.

[項目4]
前記凸形状部は平板形状であることを特徴とする項目3に記載の駆動装置。
[Item 4]
4. The drive device according to claim 3, wherein the convex portion has a flat plate shape.

[項目5]
前記変形する部分の厚さは、前記接触領域からの距離が大きいほど薄くなることを特徴とする項目1~4のうちいずれか1項に記載の駆動装置。
[Item 5]
5. The drive device according to any one of claims 1 to 4, wherein the thickness of the deformed portion becomes thinner as the distance from the contact area increases.

[項目6]
前記変形部は、変形により前記光学素子を、前記光学素子を通過する光軸と直交する方向に移動させることを特徴とする項目1~5のうちいずれか1項に記載の駆動装置。
[Item 6]
The driving device according to any one of items 1 to 5, wherein the deformation section moves the optical element in a direction perpendicular to an optical axis passing through the optical element by deformation.

[項目7]
前記変形部は前記保持部材と接触しているときにおいて、接触面積が最大となるときの前記変形部の前記保持部材に接触する接触領域の厚さが、前記接触面積が最大でないときの前記変形部の前記保持部材に接触する接触領域の厚さよりも小さいことを特徴とする項目1~6のうちいずれか1項に記載の駆動装置。
[Item 7]
A driving device described in any one of items 1 to 6, characterized in that when the deformation portion is in contact with the retaining member, the thickness of the contact area of the deformation portion in contact with the retaining member when the contact area is maximum is smaller than the thickness of the contact area of the deformation portion in contact with the retaining member when the contact area is not maximum.

[項目8]
前記変形部は、前記空間の圧力が大気圧より高くなった場合に前記光学素子を移動又は変形させることを特徴とする項目1~7のうちいずれか1項に記載の駆動装置。
[Item 8]
The driving device according to any one of items 1 to 7, wherein the deformation section moves or deforms the optical element when the pressure in the space becomes higher than atmospheric pressure.

[項目9]
前記変形部はダイヤフラムであることを特徴とする項目1~8のうちいずれか1項に記載の駆動装置。
[Item 9]
The driving device according to any one of items 1 to 8, wherein the deformation portion is a diaphragm.

[項目10]
前記変形部が前記保持部材に力を加えるときの前記接触領域の長手方向における長さは、前記変形部の長手方向の長さの1%以下の長さであることを特徴とする項目1~9のうちいずれか1項に記載の駆動装置。
[Item 10]
A driving device described in any one of items 1 to 9, characterized in that the longitudinal length of the contact area when the deformation portion applies a force to the holding member is 1% or less of the longitudinal length of the deformation portion.

[項目11]
前記変形部を少なくとも4つ以上有し、
複数の前記変形部は同一の前記光学素子を保持する前記保持部材に力を加えることが可能な位置にそれぞれ配置されていることを特徴とする項目1~10のうちいずれか1項に記載の駆動装置。
[Item 11]
The deformation portion has at least four or more.
The driving device according to any one of items 1 to 10, characterized in that the multiple deformation portions are each arranged at a position capable of applying a force to the holding member that holds the same optical element.

[項目12]
前記複数の変形部の変形する部分の変形により、前記光学素子を通過する光軸と直交する面上の少なくとも2方向において前記保持部材に力を加えることができることを特徴とする項目11に記載の駆動装置。
[Item 12]
The driving device described in item 11, characterized in that the deformation of the deforming portions of the multiple deformation sections can apply force to the holding member in at least two directions on a plane perpendicular to an optical axis passing through the optical element.

[項目13]
前記接触領域の材質は、前記非接触領域の材質よりも変形しにくい材質であることを特徴とする項目1~12のうちいずれか1項に記載の駆動装置。
[Item 13]
13. The drive device according to any one of items 1 to 12, wherein the material of the contact region is less prone to deformation than the material of the non-contact region.

[項目14]
前記接触領域の材質はセラミックス又は鉄又はステンレスであることを特徴とする項目13に記載の駆動装置。
[Item 14]
14. The drive device according to item 13, wherein the material of the contact area is ceramic, iron or stainless steel.

[項目15]
光を照射する照明光学系と、
前記照明光学系からの光が入射する光学素子を保持する保持部材と、
変形することで前記保持部材に力を加えて前記光学素子を変形又は移動させる変形部を有する駆動装置と、を有し、
前記変形部の変形する部分において、
前記保持部材に力を加えるために前記保持部材に接触する接触領域における前記保持部材に力を加える方向の剛性は、前記保持部材に接触しない非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする露光装置。
[Item 15]
an illumination optical system that irradiates light;
a holding member for holding an optical element onto which light from the illumination optical system is incident;
a driving device having a deformation section that deforms to apply a force to the holding member to deform or move the optical element,
In the deforming portion of the deformation portion,
a rigidity in a direction in which a force is applied to the holding member in a contact region that contacts the holding member to apply a force to the holding member is higher than a rigidity in the same direction in at least a part of a non-contact region that does not contact the holding member;
An exposure apparatus comprising:

[項目16]
前記変形する部分の変形により、第1光学素子と、前記第1光学素子との間に空間を有する第2光学素子とのうち少なくとも一方を保持している前記保持部材に力を加えることで、前記第1光学素子と前記第2光学素子に起因する収差を変化させることを特徴とする項目15に記載の露光装置。
[Item 16]
The exposure apparatus described in item 15, characterized in that the deformation of the deformable portion applies force to the holding member that holds at least one of a first optical element and a second optical element having a space between the first optical element and the second optical element, thereby changing the aberration caused by the first optical element and the second optical element.

[項目17]
光学素子を保持する保持部材に力を加えるために前記保持部材に接触する接触領域における前記保持部材に力を加える方向の剛性が、前記保持部材に接触しない非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い変形する部分を有する変形部が圧力調整により変形し、前記保持部材に力を加えることで前記光学素子を移動又は変形させる調整工程と、
前記調整工程で移動又は変形した前記光学素子を用いて、基板に露光を行う露光工程と、を有することを特徴とする露光方法。
[Item 17]
an adjustment process in which a deformation section having a deforming portion, the rigidity of which in a contact region that contacts a holding member for applying a force to the holding member that holds an optical element is higher than the rigidity in the said direction in at least a portion of a non-contact region that does not contact the holding member, is deformed by pressure adjustment, and the optical element is moved or deformed by applying a force to the holding member;
an exposure step of exposing a substrate using the optical element moved or deformed in the adjustment step.

[項目18]
光学素子を保持する保持部材に力を加えるために前記保持部材に接触する接触領域における前記保持部材に力を加える方向の剛性が、前記保持部材に接触しない非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い変形する部分を有する変形部が圧力調整により変形し、前記保持部材に力を加えることで前記光学素子を移動又は変形させる調整工程と、
前記調整工程で移動又は変形した前記光学素子を用いて、基板にパターンを形成する形成工程と、
前記形成工程で前記パターンが形成された前記基板から物品を製造する製造工程と、
を有することを特徴とする物品の製造方法。
[Item 18]
an adjustment process in which a deformation section having a deforming portion, the rigidity of which in a contact region that contacts a holding member for applying a force to the holding member that holds an optical element is higher than the rigidity in the said direction in at least a portion of a non-contact region that does not contact the holding member, is deformed by pressure adjustment, and the optical element is moved or deformed by applying a force to the holding member;
a forming step of forming a pattern on a substrate using the optical element moved or deformed in the adjusting step;
a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process;
A method for producing an article, comprising the steps of:

発明は上記実施形態に制限されるものではなく、発明の精神及び範囲から離脱することなく、様々な変更及び変形が可能である。従って、発明の範囲を公にするために請求項を添付する。 The invention is not limited to the above-described embodiment, and various modifications and variations are possible without departing from the spirit and scope of the invention. Therefore, the following claims are appended to disclose the scope of the invention.

Claims (18)

光学素子を保持する保持部材に力を加えて前記光学素子を移動又は変形させる駆動装置であって、
ベース部と、
形部と、
前記変形部と前記ベース部とに囲まれた空間の圧力を調整する圧力調整部と、を備え
前記変形部は、前記圧力調整部が前記空間の圧力を調整することで変形する部分を有し、
前記変形する部分は、変形することで前記保持部材に力を加える領域である接触領域と、前記保持部材に接触しない非接触領域とを含み、
記接触領域における前記保持部材に前記力を加える方向の剛性は、前記非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする駆動装置。
A driving device that applies a force to a holding member that holds an optical element to move or deform the optical element,
A base portion;
A deformation portion;
a pressure adjusting section that adjusts a pressure in a space surrounded by the deformation section and the base section,
the deformation portion has a portion that is deformed by the pressure adjustment portion adjusting the pressure in the space,
the deformable portion includes a contact region that applies a force to the holding member by deformation, and a non-contact region that does not contact the holding member,
The rigidity of the contact area in a direction in which the force is applied to the holding member is higher than the rigidity of at least a portion of the non-contact area in the same direction .
A drive device characterized by:
前記接触領域の厚さは、前記非接触領域のうち少なくとも一部の領域の厚さよりも厚いことを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the thickness of the contact area is greater than the thickness of at least a portion of the non-contact area. 前記変形する部分は、薄板部と、凸形状部と、から成り、前記凸形状部の少なくとも一部が前記保持部材に力を加えることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the deformable portion is composed of a thin plate portion and a convex portion, and at least a portion of the convex portion applies a force to the holding member. 前記凸形状部は平板形状であることを特徴とする請求項3に記載の駆動装置。 The drive device according to claim 3, characterized in that the convex portion is flat. 前記変形する部分の厚さは、前記接触領域からの距離が大きいほど薄くなることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the thickness of the deformed portion becomes thinner as the distance from the contact area increases. 前記変形部は、変形により前記光学素子を、前記光学素子を通過する光軸と直交する方向に移動させることを特徴とする請求項1に記載の駆動装置。 The driving device according to claim 1, characterized in that the deformation unit moves the optical element in a direction perpendicular to an optical axis passing through the optical element by deformation. 前記変形部は前記保持部材と接触しているときにおいて、接触面積が最大となるときの前記変形部の前記保持部材に接触する接触領域の厚さが、前記接触面積が最大でないときの前記変形部の前記保持部材に接触する接触領域の厚さよりも小さいことを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that, when the deformation portion is in contact with the holding member, the thickness of the contact area of the deformation portion in contact with the holding member when the contact area is maximum is smaller than the thickness of the contact area of the deformation portion in contact with the holding member when the contact area is not maximum. 前記変形部は、前記空間の圧力が大気圧より高くなった場合に前記光学素子を移動又は変形させることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the deformation section moves or deforms the optical element when the pressure in the space becomes higher than atmospheric pressure. 前記変形部はダイヤフラムであることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the deformation part is a diaphragm. 前記変形部が前記保持部材に力を加えるときの前記接触領域の長手方向における長さは、前記変形部の長手方向の長さの1%以下の長さであることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the length of the contact area in the longitudinal direction when the deformation part applies a force to the holding member is 1% or less of the longitudinal length of the deformation part. 前記変形部を少なくとも4つ以上有し、
複数の前記変形部は同一の前記光学素子を保持する前記保持部材に力を加えることが可能な位置にそれぞれ配置されていることを特徴とする請求項1に記載の駆動装置。
The deformation portion has at least four or more.
2. The driving device according to claim 1, wherein the plurality of deformation sections are arranged at positions capable of applying a force to the holding member that holds the same optical element.
前記複数の変形部の変形する部分の変形により、前記光学素子を通過する光軸と直交する面上の少なくとも2方向において前記保持部材に力を加えることができることを特徴とする請求項11に記載の駆動装置。 The drive device according to claim 11, characterized in that the deformation of the deforming parts of the plurality of deformation parts can apply a force to the holding member in at least two directions on a plane perpendicular to the optical axis passing through the optical element. 前記接触領域の材質は、前記非接触領域の材質よりも変形しにくい材質であることを特徴とする請求項1に記載の駆動装置。 The drive device according to claim 1, characterized in that the material of the contact area is less prone to deformation than the material of the non-contact area. 前記接触領域の材質はセラミックス又は鉄又はステンレスであることを特徴とする請求項13に記載の駆動装置。 The drive device according to claim 13, characterized in that the material of the contact area is ceramic, iron, or stainless steel. 光を照射する照明光学系と、
前記照明光学系からの光が入射する光学素子を保持する保持部材と、
変形することで前記保持部材に力を加えて前記光学素子を変形又は移動させる変形部を有する駆動装置と、を備え
前記変形部の変形する部分は、変形することで前記保持部材に力を加える領域である接触領域と、前記保持部材に接触しない非接触領域とを含み
記接触領域における前記保持部材に前記力を加える方向の剛性は、前記非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする露光装置。
an illumination optical system that irradiates light;
a holding member for holding an optical element onto which light from the illumination optical system is incident;
a driving device having a deformation section that applies a force to the holding member by deformation to deform or move the optical element,
The deformable portion of the deformation portion includes a contact region that applies a force to the holding member by deformation, and a non-contact region that does not contact the holding member ,
The rigidity of the contact area in a direction in which the force is applied to the holding member is higher than the rigidity of at least a portion of the non-contact area in the same direction .
An exposure apparatus comprising:
前記変形する部分の変形により、第1光学素子と、前記第1光学素子との間に空間を有する第2光学素子とのうち少なくとも一方を保持している前記保持部材に力を加えることで、前記第1光学素子と前記第2光学素子に起因する収差を変化させることを特徴とする請求項15に記載の露光装置。 The exposure apparatus according to claim 15, characterized in that the deformation of the deformable portion applies a force to the holding member that holds at least one of a first optical element and a second optical element having a space between the first optical element and the second optical element, thereby changing the aberration caused by the first optical element and the second optical element. 形する部分を有する変形部が圧力調整により変形し、光学素子を保持する保持部材に力を加えることで前記光学素子を移動又は変形させる調整工程と、
前記調整工程で移動又は変形した前記光学素子を用いて、基板に露光を行う露光工程と、を有し、
前記変形する部分は、変形することで前記保持部材に力を加える領域である接触領域と、前記保持部材に接触しない非接触領域とを含み、
前記接触領域における前記保持部材に前記力を加える方向の剛性は、前記非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする露光方法。
an adjusting step in which a deforming portion having a deforming portion is deformed by pressure adjustment, and a force is applied to a holding member that holds an optical element, thereby moving or deforming the optical element;
an exposure step of exposing a substrate to light using the optical element moved or deformed in the adjustment step ,
the deformable portion includes a contact region that applies a force to the holding member by deformation, and a non-contact region that does not contact the holding member,
The rigidity of the contact area in a direction in which the force is applied to the holding member is higher than the rigidity of at least a portion of the non-contact area in the same direction.
13. An exposure method comprising:
形する部分を有する変形部が圧力調整により変形し、光学素子を保持する保持部材に力を加えることで前記光学素子を移動又は変形させる調整工程と、
前記調整工程で移動又は変形した前記光学素子を用いて、基板にパターンを形成する形成工程と、
前記形成工程で前記パターンが形成された前記基板から物品を製造する製造工程と、
を有し、
前記変形する部分は、変形することで前記保持部材に力を加える領域である接触領域と、前記保持部材に接触しない非接触領域とを含み、
前記接触領域における前記保持部材に前記力を加える方向の剛性は、前記非接触領域のうち少なくとも一部の領域における前記方向の剛性よりも高い、
ことを特徴とする物品の製造方法。
an adjusting step in which a deforming portion having a deforming portion is deformed by pressure adjustment, and a force is applied to a holding member that holds an optical element, thereby moving or deforming the optical element;
a forming step of forming a pattern on a substrate using the optical element moved or deformed in the adjusting step;
a manufacturing process for manufacturing an article from the substrate on which the pattern is formed in the forming process;
having
the deformable portion includes a contact region that applies a force to the holding member by deformation, and a non-contact region that does not contact the holding member,
The rigidity of the contact area in a direction in which the force is applied to the holding member is higher than the rigidity of at least a portion of the non-contact area in the same direction.
A method for producing an article.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357651A (en) 1999-06-16 2000-12-26 Canon Inc Driving apparatus, optical element driving apparatus, exposure apparatus, and device manufacturing method
JP2017537343A (en) 2014-11-24 2017-12-14 エーエスエムエル ネザーランズ ビー.ブイ. Radiation beam equipment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357651A (en) 1999-06-16 2000-12-26 Canon Inc Driving apparatus, optical element driving apparatus, exposure apparatus, and device manufacturing method
JP2017537343A (en) 2014-11-24 2017-12-14 エーエスエムエル ネザーランズ ビー.ブイ. Radiation beam equipment

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