JP7577273B2 - Recording medium - Google Patents
Recording medium Download PDFInfo
- Publication number
- JP7577273B2 JP7577273B2 JP2020177528A JP2020177528A JP7577273B2 JP 7577273 B2 JP7577273 B2 JP 7577273B2 JP 2020177528 A JP2020177528 A JP 2020177528A JP 2020177528 A JP2020177528 A JP 2020177528A JP 7577273 B2 JP7577273 B2 JP 7577273B2
- Authority
- JP
- Japan
- Prior art keywords
- atoms
- thiophene polymer
- layer
- recording medium
- metallic luster
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 242
- 229930192474 thiophene Natural products 0.000 claims description 140
- 229920000642 polymer Polymers 0.000 claims description 133
- 125000004429 atom Chemical group 0.000 claims description 84
- 239000002932 luster Substances 0.000 claims description 79
- 229910052751 metal Inorganic materials 0.000 claims description 49
- 239000002184 metal Substances 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 38
- 125000000217 alkyl group Chemical group 0.000 claims description 15
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 229910052737 gold Inorganic materials 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 3
- GLQWRXYOTXRDNH-UHFFFAOYSA-N thiophen-2-amine Chemical class NC1=CC=CS1 GLQWRXYOTXRDNH-UHFFFAOYSA-N 0.000 claims description 3
- WZMPOCLULGAHJR-UHFFFAOYSA-N thiophen-2-ol Chemical class OC1=CC=CS1 WZMPOCLULGAHJR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 161
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 159
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 78
- 239000007788 liquid Substances 0.000 description 65
- 239000000203 mixture Substances 0.000 description 45
- 239000007787 solid Substances 0.000 description 44
- 239000000243 solution Substances 0.000 description 35
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 33
- 238000000034 method Methods 0.000 description 32
- 238000005406 washing Methods 0.000 description 30
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 29
- 238000000926 separation method Methods 0.000 description 28
- 239000002904 solvent Substances 0.000 description 28
- 239000011248 coating agent Substances 0.000 description 27
- 238000000576 coating method Methods 0.000 description 27
- 150000003577 thiophenes Chemical class 0.000 description 20
- 238000006116 polymerization reaction Methods 0.000 description 19
- 239000010949 copper Substances 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 15
- RFSKGCVUDQRZSD-UHFFFAOYSA-N 3-methoxythiophene Chemical compound COC=1C=CSC=1 RFSKGCVUDQRZSD-UHFFFAOYSA-N 0.000 description 14
- -1 hexafluorophosphate ions Chemical class 0.000 description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 239000007800 oxidant agent Substances 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- 230000001590 oxidative effect Effects 0.000 description 11
- 238000001556 precipitation Methods 0.000 description 11
- 235000010724 Wisteria floribunda Nutrition 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 8
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- LHOWRPZTCLUDOI-UHFFFAOYSA-K iron(3+);triperchlorate Chemical group [Fe+3].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O LHOWRPZTCLUDOI-UHFFFAOYSA-K 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000004020 conductor Substances 0.000 description 5
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 5
- 230000000379 polymerizing effect Effects 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000003115 supporting electrolyte Substances 0.000 description 5
- 238000011282 treatment Methods 0.000 description 5
- QENGPZGAWFQWCZ-UHFFFAOYSA-N 3-Methylthiophene Chemical compound CC=1C=CSC=1 QENGPZGAWFQWCZ-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- NZSSXTMHSXMZBL-UHFFFAOYSA-N 3-butoxythiophene Chemical compound CCCCOC=1C=CSC=1 NZSSXTMHSXMZBL-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000008447 perception Effects 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- MFRXQRCKOQUENC-UHFFFAOYSA-N 3,4-diethoxythiophene Chemical compound CCOC1=CSC=C1OCC MFRXQRCKOQUENC-UHFFFAOYSA-N 0.000 description 1
- KWMRVTDUWMBHRV-UHFFFAOYSA-N 3,4-diethylthiophene Chemical compound CCC1=CSC=C1CC KWMRVTDUWMBHRV-UHFFFAOYSA-N 0.000 description 1
- WNOOCRQGKGWSJE-UHFFFAOYSA-N 3,4-dihydro-2h-thieno[3,4-b][1,4]dioxepine Chemical compound O1CCCOC2=CSC=C21 WNOOCRQGKGWSJE-UHFFFAOYSA-N 0.000 description 1
- ZUDCKLVMBAXBIF-UHFFFAOYSA-N 3,4-dimethoxythiophene Chemical compound COC1=CSC=C1OC ZUDCKLVMBAXBIF-UHFFFAOYSA-N 0.000 description 1
- GPSFYJDZKSRMKZ-UHFFFAOYSA-N 3,4-dimethylthiophene Chemical compound CC1=CSC=C1C GPSFYJDZKSRMKZ-UHFFFAOYSA-N 0.000 description 1
- MBUSOPVRLCFJCS-UHFFFAOYSA-N 3-bromo-4-methylthiophene Chemical compound CC1=CSC=C1Br MBUSOPVRLCFJCS-UHFFFAOYSA-N 0.000 description 1
- KPOCSQCZXMATFR-UHFFFAOYSA-N 3-butylthiophene Chemical compound CCCCC=1C=CSC=1 KPOCSQCZXMATFR-UHFFFAOYSA-N 0.000 description 1
- JAYBIBLZTQMCAY-UHFFFAOYSA-N 3-decylthiophene Chemical compound CCCCCCCCCCC=1C=CSC=1 JAYBIBLZTQMCAY-UHFFFAOYSA-N 0.000 description 1
- RFKWIEFTBMACPZ-UHFFFAOYSA-N 3-dodecylthiophene Chemical compound CCCCCCCCCCCCC=1C=CSC=1 RFKWIEFTBMACPZ-UHFFFAOYSA-N 0.000 description 1
- RDEGOEYUQCUBPE-UHFFFAOYSA-N 3-ethoxythiophene Chemical compound CCOC=1C=CSC=1 RDEGOEYUQCUBPE-UHFFFAOYSA-N 0.000 description 1
- SLDBAXYJAIRQMX-UHFFFAOYSA-N 3-ethylthiophene Chemical compound CCC=1C=CSC=1 SLDBAXYJAIRQMX-UHFFFAOYSA-N 0.000 description 1
- IUUMHORDQCAXQU-UHFFFAOYSA-N 3-heptylthiophene Chemical compound CCCCCCCC=1C=CSC=1 IUUMHORDQCAXQU-UHFFFAOYSA-N 0.000 description 1
- JEDHEMYZURJGRQ-UHFFFAOYSA-N 3-hexylthiophene Chemical compound CCCCCCC=1C=CSC=1 JEDHEMYZURJGRQ-UHFFFAOYSA-N 0.000 description 1
- UUHSVAMCIZLNDQ-UHFFFAOYSA-N 3-nonylthiophene Chemical compound CCCCCCCCCC=1C=CSC=1 UUHSVAMCIZLNDQ-UHFFFAOYSA-N 0.000 description 1
- WQYWXQCOYRZFAV-UHFFFAOYSA-N 3-octylthiophene Chemical compound CCCCCCCCC=1C=CSC=1 WQYWXQCOYRZFAV-UHFFFAOYSA-N 0.000 description 1
- VKJKULUJHYKCGT-UHFFFAOYSA-N 3-propoxythiophene Chemical compound CCCOC=1C=CSC=1 VKJKULUJHYKCGT-UHFFFAOYSA-N 0.000 description 1
- STIIRMZYURVVGK-UHFFFAOYSA-N 3-undecylthiophene Chemical compound CCCCCCCCCCCC=1C=CSC=1 STIIRMZYURVVGK-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 150000000703 Cerium Chemical class 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 235000002918 Fraxinus excelsior Nutrition 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Chemical class [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 238000003411 electrode reaction Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910021397 glassy carbon Inorganic materials 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- PHJGWRWVAVHZJM-UHFFFAOYSA-N n,n-dimethylthiophen-3-amine Chemical compound CN(C)C=1C=CSC=1 PHJGWRWVAVHZJM-UHFFFAOYSA-N 0.000 description 1
- FLYPBMIJIXGULG-UHFFFAOYSA-N n-methylthiophen-3-amine Chemical compound CNC=1C=CSC=1 FLYPBMIJIXGULG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002779 poly(alkoxythiophenes) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920001909 styrene-acrylic polymer Polymers 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 150000005621 tetraalkylammonium salts Chemical class 0.000 description 1
- DKGYESBFCGKOJC-UHFFFAOYSA-N thiophen-3-amine Chemical compound NC=1C=CSC=1 DKGYESBFCGKOJC-UHFFFAOYSA-N 0.000 description 1
- AGZYNVVJQAOVRP-UHFFFAOYSA-N thiophene-3,4-diamine Chemical compound NC1=CSC=C1N AGZYNVVJQAOVRP-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Landscapes
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Description
本開示は、記録媒体を提供する。 This disclosure provides a recording medium.
特許文献1には、可視光線及び赤外線のいずれも透過する性能を有した多層真珠光沢フィルム(1)の片方の面に、赤外線を吸収する性能を有した図柄や文字等の印刷層(3a)、赤外線を透過する性能を有した図柄や文字等の印刷層(3b)が設けられており、印刷層(3a)と印刷層(3b)とが通常光のもとで同色に見え、かつ赤外線領域での分光反射率が相違しているフィルムが開示されている。
特許文献2には、全面若しくは一部に光沢面が形成されている基材上に個別情報表示を行い、且つ、光沢面の少なくとも一部を目視可能とした印刷物が開示されている。
Patent Document 1 discloses a film in which a multilayer pearlescent film (1) having the ability to transmit both visible light and infrared light is provided on one side with a printed layer (3a) having a pattern, letters, etc. having the ability to absorb infrared light, and a printed layer (3b) having a pattern, letters, etc. having the ability to transmit infrared light, and the printed layer (3a) and the printed layer (3b) appear to be the same color under normal light, but have different spectral reflectances in the infrared region.
Patent Document 2 discloses a printed matter in which individual information is displayed on a substrate having a glossy surface formed entirely or partially thereon, and at least a part of the glossy surface is made visible.
特許文献3には、チオフェンモノマーを電位掃引法によって導電体上に電解重合することでチオフェン重合体からなる金属光沢膜を製造する方法が開示されている。
特許文献4には、チオフェン重合体を含む金属光沢を有する膜が開示されている。
特許文献5には、ポリチオフェンを含有し、ポリチオフェンに塩化物イオン又は過塩素酸イオンがドーピングされたメタリック調塗膜形成用塗工液が開示されている。
特許文献6には、過塩素酸イオン、ヘキサフルオロリン酸イオン、テトラフルオロほう酸イオン、塩化物イオン及びパラトルエンスルホン酸イオンの少なくともいずれかがドーピングされたチオフェン重合体を含む金色又は銅色の光沢を有する膜が開示されている。
特許文献7には、ポリエステル樹脂、ポリカーボネート樹脂、ポリビニルピロリドン樹脂、ポリスチレン樹脂、ポリメタクリル酸メチル樹脂及びスチレンアクリル共重合体樹脂の少なくともいずれかと、チオフェン重合体と、溶媒とを含む、金属光沢を有する物品を製造するための溶液が開示されている。
Patent Document 3 discloses a method for producing a metallic gloss film made of a thiophene polymer by electrolytic polymerization of a thiophene monomer on a conductor by a potential sweep method.
Patent Document 4 discloses a film having metallic luster that contains a thiophene polymer.
Patent Document 5 discloses a coating liquid for forming a metallic coating film, which contains polythiophene and is doped with chloride ions or perchlorate ions.
Patent Document 6 discloses a film having a gold or copper luster, which contains a thiophene polymer doped with at least one of perchlorate ions, hexafluorophosphate ions, tetrafluoroborate ions, chloride ions, and paratoluenesulfonate ions.
Patent Document 7 discloses a solution for producing an article having a metallic luster, which contains at least one of a polyester resin, a polycarbonate resin, a polyvinylpyrrolidone resin, a polystyrene resin, a polymethyl methacrylate resin, and a styrene-acrylic copolymer resin, a thiophene polymer, and a solvent.
電子写真式複写機、パソコン用スキャナー又は多色印刷機の性能向上が進むと、紙幣、有価証券、クレジットカード等の偽造が従来よりも簡単に且つ精巧に行われるおそれがある。 As the performance of electrophotographic copying machines, computer scanners, and multi-color printers improves, there is a risk that counterfeiting of banknotes, securities, credit cards, etc. will become easier and more sophisticated than ever before.
本開示の実施形態は、上記状況のもとになされた。
本開示の実施形態は、金属光沢層に含まれるチオフェン重合体の重量平均分子量が200未満又は30000超である場合に比較して、又は、金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量がチオフェン重合体に対して1500ppm超である場合に比較して、原物と複写物との判別が容易な記録媒体を提供することを目的とし、これを達成することを課題とする。
The embodiments of the present disclosure have been made under the above circumstances.
An embodiment of the present disclosure aims to provide a recording medium that makes it easier to distinguish between an original and a copy, as compared with a case in which the weight-average molecular weight of the thiophene polymer contained in the metallic luster layer is less than 200 or exceeds 30,000, or a case in which the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms in the metallic luster layer exceeds 1,500 ppm with respect to the thiophene polymer, and an object of the present disclosure is to achieve this.
前記課題を解決するための具体的手段には、以下の態様が含まれる。
<1> 基材と、
前記基材上に設けられた、チオフェン重合体を含有する金属光沢層と、を有し、
前記金属光沢層に含まれる前記チオフェン重合体の重量平均分子量が200以上30000以下であり、
前記金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量が前記チオフェン重合体に対して1500ppm以下である、
記録媒体。
<2> 前記基材と前記金属光沢層との間に金属層をさらに有する、<1>に記載の記録媒体。
<3> 前記金属層が、Au、Ag、Cu及びAlからなる群から選択される少なくとも1種の金属を含有する、<2>に記載の記録媒体。
<4> 前記金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量が前記チオフェン重合体に対して500ppm以下である、<1>~<3>のいずれか1項に記載の記録媒体。
<5> 前記金属光沢層に含まれる前記チオフェン重合体の重量平均分子量が500以上20000以下である、<1>~<4>のいずれか1項に記載の記録媒体。
<6> 前記チオフェン重合体が、アルコキシチオフェン、アルキルチオフェン、アミノチオフェン及びヒドロキシチオフェンからなる群から選択される少なくとも1種が重合した重合体を含む、<1>~<5>のいずれか1項に記載の記録媒体。
<7> 前記チオフェン重合体が、少なくともアルコキシチオフェンが重合した重合体を含み、前記アルコキシチオフェンが、アルコキシ基の炭素数が1以上6以下であるアルコキシチオフェンを含む、<6>に記載の記録媒体。
<8> 前記チオフェン重合体が、少なくともアルキルチオフェンが重合した重合体を含み、前記アルキルチオフェンが、アルキル基の炭素数が1以上6以下であるアルキルチオフェンを含む、<6>又は<7>に記載の記録媒体。
Specific means for solving the above problems include the following aspects.
<1> A substrate,
A metallic luster layer containing a thiophene polymer provided on the substrate,
the weight average molecular weight of the thiophene polymer contained in the metallic luster layer is 200 or more and 30,000 or less;
the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is 1500 ppm or less relative to the thiophene polymer;
Recording medium.
<2> The recording medium according to <1>, further comprising a metal layer between the substrate and the metallic luster layer.
<3> The recording medium according to <2>, wherein the metal layer contains at least one metal selected from the group consisting of Au, Ag, Cu, and Al.
<4> The recording medium according to any one of <1> to <3>, wherein the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms in the metallic luster layer is 500 ppm or less with respect to the thiophene polymer.
<5> The recording medium according to any one of <1> to <4>, wherein the weight-average molecular weight of the thiophene polymer contained in the metallic luster layer is 500 or more and 20,000 or less.
<6> The recording medium according to any one of <1> to <5>, wherein the thiophene polymer includes a polymer of at least one selected from the group consisting of an alkoxythiophene, an alkylthiophene, an aminothiophene, and a hydroxythiophene.
<7> The recording medium according to <6>, wherein the thiophene polymer includes a polymer in which at least an alkoxythiophene is polymerized, and the alkoxythiophene includes an alkoxythiophene having an alkoxy group having 1 to 6 carbon atoms.
<8> The recording medium according to <6> or <7>, wherein the thiophene polymer includes a polymer of at least an alkylthiophene, and the alkylthiophene includes an alkylthiophene having an alkyl group having 1 to 6 carbon atoms.
<1>、<6>、<7>、<8>によれば、金属光沢層に含まれるチオフェン重合体の重量平均分子量が200未満又は30000超である場合に比較して、又は、金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量がチオフェン重合体に対して1500ppm超である場合に比較して、原物と複写物との判別が容易な記録媒体が提供される。
<2>、<3>によれば、基材と金属光沢層との間に金属層を有しない記録媒体に比較して、原物と複写物との判別が容易な記録媒体が提供される。
<4>によれば、金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量がチオフェン重合体に対して500ppm超である場合に比較して、原物と複写物との判別が容易な記録媒体が提供される。
<5>によれば、金属光沢層に含まれるチオフェン重合体の重量平均分子量が500未満又は20000超である場合に比較して、原物と複写物との判別が容易な記録媒体が提供される。
According to <1>, <6>, <7> and <8>, a recording medium is provided which makes it easier to distinguish between the original and a copy, compared with a case in which the weight-average molecular weight of the thiophene polymer contained in the metallic luster layer is less than 200 or exceeds 30,000, or a case in which the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer exceeds 1,500 ppm with respect to the thiophene polymer.
According to items <2> and <3>, a recording medium is provided which makes it easier to distinguish between the original and the copy, as compared with a recording medium which does not have a metal layer between the base material and the metallic gloss layer.
According to <4>, a recording medium is provided which makes it easier to distinguish between the original and a copy, as compared with a case in which the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms in the metallic luster layer exceeds 500 ppm with respect to the thiophene polymer.
According to <5>, a recording medium is provided which makes it easier to distinguish between the original and a copy, as compared with a case in which the weight-average molecular weight of the thiophene polymer contained in the metallic luster layer is less than 500 or exceeds 20,000.
以下に、本開示の実施形態について説明する。これらの説明及び実施例は実施形態を例示するものであり、実施形態の範囲を制限するものではない。 Embodiments of the present disclosure are described below. These descriptions and examples are intended to illustrate the embodiments and are not intended to limit the scope of the embodiments.
本開示中に段階的に記載されている数値範囲において、一つの数値範囲で記載された上限値又は下限値は、他の段階的な記載の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲において、その数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。 In the numerical ranges described in this disclosure in stages, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another numerical range described in stages. Also, in the numerical ranges described in this disclosure, the upper or lower limit value of that numerical range may be replaced with a value shown in the examples.
本開示において「工程」との語は、独立した工程だけでなく、他の工程と明確に区別できない場合であってもその工程の所期の目的が達成されれば、本用語に含まれる。 In this disclosure, the term "process" includes not only independent processes, but also processes that cannot be clearly distinguished from other processes, as long as the intended purpose of the process is achieved.
本開示において実施形態を、図面を参照して説明する場合、当該実施形態の構成は図面に示された構成に限定されない。また、各図における部材の大きさは概念的なものであり、部材間の大きさの相対的な関係はこれに限定されない。 When embodiments of this disclosure are described with reference to drawings, the configuration of the embodiment is not limited to the configuration shown in the drawings. In addition, the sizes of components in each drawing are conceptual, and the relative relationships between the sizes of components are not limited to these.
本開示において各成分は該当する物質を複数種含んでいてもよい。本開示において組成物中の各成分の量について言及する場合、組成物中に各成分に該当する物質が複数種存在する場合には、特に断らない限り、組成物中に存在する当該複数種の物質の合計量を意味する。 In this disclosure, each component may contain multiple types of the corresponding substance. When referring to the amount of each component in a composition in this disclosure, if there are multiple substances corresponding to each component in the composition, the total amount of those multiple substances present in the composition is meant unless otherwise specified.
<記録媒体>
本実施形態に係る記録媒体は、当該記録媒体が特定の価値を有することを示す情報が記録される予定の記録媒体(つまり、前記情報が記録される前の記録媒体)と、当該記録媒体が特定の価値を有することを示す情報が記録された記録媒体とを含む。
記録媒体が特定の価値を有することを示す情報(以下、単に「情報」という。)は、例えば、「株券」「証券」等の単語、金額、シリアルナンバー、商標、シンボル、ロゴ、エンブレム、バーコード、QRコード(登録商標)、国名、会社名、所在地、電話番号、氏名、生年月日、年齢、生体情報(例えば、指紋形状、静脈形状)、保証期限、保証内容、使用方法などを含む。
情報の記録の方式は、人間の知覚が認識できる方式と、人間の知覚が認識できない方式(例えば、電子的方式、磁気的方式)とを含む。
<Recording media>
The recording medium of this embodiment includes a recording medium onto which information indicating that the recording medium has a specific value is to be recorded (i.e., the recording medium before the information is recorded), and a recording medium onto which information indicating that the recording medium has a specific value is recorded.
Information indicating that a recording medium has a specific value (hereinafter simply referred to as "information") includes, for example, words such as "stock certificate" or "securities", amounts, serial numbers, trademarks, symbols, logos, emblems, bar codes, QR codes (registered trademarks), country names, company names, locations, telephone numbers, names, dates of birth, ages, biometric information (for example, fingerprint shapes, vein shapes), warranty expiration dates, warranty contents, usage methods, and the like.
Methods of recording information include methods that can be recognized by human perception and methods that cannot be recognized by human perception (for example, electronic methods and magnetic methods).
情報が記録された本実施形態に係る記録媒体としては、例えば、紙幣、印紙、証紙、切手、はがき;商品券、株券、債券、手形、小切手、保険証書、宝くじ等の有価証券;クレジットカード、キャッシュカード、デビットカード、プリペイドカード;旅券、査証、健康保険証、運転免許証、IDカード;切符、乗車券、航空券、乗船券、入場券、観覧券;などの物品が挙げられる。
情報が記録される前の本実施形態に係る記録媒体は、換言すれば、上記物品を製造する材料である。
Examples of recording media in this embodiment on which information is recorded include banknotes, revenue stamps, certificates, postage stamps, postcards; securities such as gift certificates, stock certificates, bonds, bills, checks, insurance policies, lottery tickets, etc.; credit cards, cash cards, debit cards, prepaid cards; passports, visas, health insurance cards, driver's licenses, ID cards; tickets, boarding passes, airline tickets, boat tickets, admission tickets, and exhibition tickets.
In other words, the recording medium according to this embodiment before information is recorded thereon is a material for producing the above-mentioned article.
本実施形態に係る記録媒体は、基材と、基材上に設けられた、チオフェン重合体を含有する金属光沢層と、を有し、金属光沢層が下記の(1)及び(2)の特徴を有する。
(1)金属光沢層に含まれるチオフェン重合体の重量平均分子量が200以上30000以下である。
(2)金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量がチオフェン重合体に対して1500ppm以下である。
ppmは、parts per million(百万分率)の略であり、上記(2)は質量基準である。
The recording medium according to this embodiment has a substrate and a metallic luster layer containing a thiophene polymer provided on the substrate, and the metallic luster layer has the following characteristics (1) and (2).
(1) The weight-average molecular weight of the thiophene polymer contained in the metallic luster layer is 200 or more and 30,000 or less.
(2) The total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is 1500 ppm or less based on the thiophene polymer.
ppm is an abbreviation for parts per million, and the above (2) is based on mass.
チオフェン重合体は、2個以上のチオフェン類が重合した重合体である。チオフェン重合体を含有する膜は、層状に配向したチオフェン重合体が特定の波長の光を反射することにより、金属光沢を呈する。チオフェン重合体を含有する金属光沢膜は、電子写真式複写機又は多色印刷機によっては金属光沢の再現が困難であることから、有価証券等の偽造防止用画像として期待されている。本実施形態に係る記録媒体は、チオフェン重合体を含有する金属光沢層が上記(1)及び(2)の特徴を有することによって、金属光沢層が金属光沢に優れ光沢ムラも少ないので、電子写真式複写機又は多色印刷機による金属光沢の再現がより困難であり、原物と複写物との判別が容易である。 A thiophene polymer is a polymer formed by polymerizing two or more thiophenes. A film containing a thiophene polymer exhibits a metallic luster due to the reflection of light of a specific wavelength by the layer-oriented thiophene polymer. A metallic luster film containing a thiophene polymer is expected to be used as an anti-counterfeiting image for securities and the like, since it is difficult to reproduce the metallic luster by an electrophotographic copier or multicolor printer. In the recording medium according to the present embodiment, the metallic luster layer containing the thiophene polymer has the above characteristics (1) and (2), and therefore the metallic luster layer has excellent metallic luster and little uneven luster, making it more difficult to reproduce the metallic luster by an electrophotographic copier or multicolor printer, and making it easy to distinguish between the original and the copy.
図1は、本実施形態に係る記録媒体の一例を示す概略断面図である。図1に示す記録媒体10は、基材12上に金属光沢層14を有する。金属光沢層14は、その一方の面が露出しており、人間の視覚によって認識される。金属光沢層14は、図1に示すように基材12の片面にあってもよく、基材12の両面にあってもよい。金属光沢層14は、基材12の少なくとも片面において、面の一部にあってもよく、面全体にあってもよい。基材12上には情報が記録されていてもよい。金属光沢層14の上に情報が記録されていてもよい。 Figure 1 is a schematic cross-sectional view showing an example of a recording medium according to this embodiment. The recording medium 10 shown in Figure 1 has a metallic luster layer 14 on a substrate 12. One side of the metallic luster layer 14 is exposed and is recognized by human vision. The metallic luster layer 14 may be on one side of the substrate 12 as shown in Figure 1, or on both sides of the substrate 12. The metallic luster layer 14 may be on a part of the surface of at least one side of the substrate 12, or on the entire surface. Information may be recorded on the substrate 12. Information may be recorded on the metallic luster layer 14.
図2は、本実施形態に係る記録媒体の他の一例を示す概略断面図である。図2に示す記録媒体20は、基材22上に金属層23を有し、金属層23上に金属光沢層24を有する。金属光沢層24は、その一方の面が露出しており、人間の視覚によって認識される。金属層23と金属光沢層24とが積層している部位は、金属光沢がより強く発現されるので、電子写真式複写機又は多色印刷機による金属光沢の再現がより困難となる。金属層23及び金属光沢層24は、図2に示すように基材22の片面にあってもよく、基材22の両面にあってもよい。金属層23及び金属光沢層24は、基材22の少なくとも片面において、面の一部にあってもよく、面全体にあってもよい。基材22上には情報が記録されていてもよい。金属光沢層24の上に情報が記録されていてもよい。 Figure 2 is a schematic cross-sectional view showing another example of the recording medium according to this embodiment. The recording medium 20 shown in Figure 2 has a metal layer 23 on a substrate 22, and a metallic gloss layer 24 on the metal layer 23. One side of the metallic gloss layer 24 is exposed and can be recognized by human vision. The area where the metal layer 23 and the metallic gloss layer 24 are laminated exhibits a stronger metallic gloss, making it more difficult to reproduce the metallic gloss using an electrophotographic copier or multi-color printer. The metal layer 23 and the metallic gloss layer 24 may be on one side of the substrate 22 as shown in Figure 2, or on both sides of the substrate 22. The metal layer 23 and the metallic gloss layer 24 may be on a part of the surface or on the entire surface of at least one side of the substrate 22. Information may be recorded on the substrate 22. Information may be recorded on the metallic gloss layer 24.
図1及び図2には図示しないが、金属光沢層14又は金属光沢層24の上には、透明な保護層が積層していてもよい。透明な保護層としては、例えば、樹脂フィルム、樹脂シートが挙げられる。記録媒体10又は記録媒体20は、片面又は両面の全体に透明な保護層を有していてもよい。 Although not shown in FIG. 1 and FIG. 2, a transparent protective layer may be laminated on the metallic gloss layer 14 or the metallic gloss layer 24. Examples of the transparent protective layer include a resin film and a resin sheet. The recording medium 10 or the recording medium 20 may have a transparent protective layer on one or both of its entire surfaces.
図1及び図2には図示しないが、記録媒体10又は記録媒体20は、電磁波で検知可能なコード又はタグを有していてもよい。コード又はタグは、例えば、基材12(又は基材22)上の金属光沢層14(又は金属光沢層24)が無い位置に設けられる。 Although not shown in FIG. 1 and FIG. 2, the recording medium 10 or the recording medium 20 may have a code or tag that can be detected by electromagnetic waves. The code or tag is provided, for example, at a position on the substrate 12 (or the substrate 22) where the metallic gloss layer 14 (or the metallic gloss layer 24) is not present.
本実施形態に係る記録媒体は、図1に示す形態と図2に示す形態とを両方備えていてもよい。例えば、基材の一方の面が図1に示す形態であり、基材の他方の面が図2に示す形態であってもよい。 The recording medium according to this embodiment may have both the form shown in FIG. 1 and the form shown in FIG. 2. For example, one surface of the substrate may have the form shown in FIG. 1, and the other surface of the substrate may have the form shown in FIG. 2.
金属光沢層14は、少なくとも、記録媒体10のおもて面(主要な情報を有する面)にあることが好ましい。金属光沢層14は、記録媒体10の裏面(おもて面と反対側の面)にあってもよく、記録媒体10の両面にあってもよい。金属光沢層14の面積は、特に制限されない。
金属光沢層24の形態も、金属光沢層14の上記形態と同様である。
The metallic luster layer 14 is preferably present at least on the front surface (the surface having the main information) of the recording medium 10. The metallic luster layer 14 may be present on the back surface (the surface opposite to the front surface) of the recording medium 10, or on both surfaces of the recording medium 10. The area of the metallic luster layer 14 is not particularly limited.
The form of the metallic luster layer 24 is similar to that of the metallic luster layer 14 described above.
金属光沢層14の形状は、特に制限されない。金属光沢層14は、情報であってもよく、情報でない図形又は文様でもよい。金属光沢層14が構成する情報としては、例えば、金額、商標、シンボル、ロゴ、エンブレムが挙げられる。金属光沢層14が情報でない図形又は文様である場合、情報の読み取りを妨げないために、金属光沢層14は情報とは別の位置又は情報の下にあることが好ましい。
金属光沢層24の形態も、金属光沢層14の上記形態と同様である。
The shape of the metallic luster layer 14 is not particularly limited. The metallic luster layer 14 may be information, or may be a graphic or pattern that is not information. Examples of information that the metallic luster layer 14 constitutes include monetary amounts, trademarks, symbols, logos, and emblems. When the metallic luster layer 14 is a graphic or pattern that is not information, it is preferable that the metallic luster layer 14 be located in a position separate from or below the information so as not to interfere with reading of the information.
The form of the metallic luster layer 24 is similar to that of the metallic luster layer 14 described above.
金属光沢層14は、金属光沢層14が切り取られたり付け替えられたりすることを防止する観点から、記録媒体10のおもて面全体又は裏面全体に適度な間隔をおいて複数配置してもよい。金属光沢層14は、例えば、記録媒体10の縁部に沿った枠状の形状でもよい。
金属光沢層24の形態も、金属光沢層14の上記形態と同様である。
From the viewpoint of preventing the metallic luster layer 14 from being cut off or replaced, a plurality of metallic luster layers 14 may be disposed at appropriate intervals over the entire front surface or the entire back surface of the recording medium 10. The metallic luster layer 14 may be, for example, in a frame shape that fits along the edge of the recording medium 10.
The form of the metallic luster layer 24 is similar to that of the metallic luster layer 14 described above.
以下、基材、金属光沢層及び金属層について詳細に説明する。以下の説明においては符号を省略する。 The substrate, metallic gloss layer, and metal layer are described in detail below. Reference numerals will be omitted in the following description.
[基材]
記録媒体の基材としては、例えば、紙、コート紙、布、樹脂製のシート、フィルム又は板、金属製のシート、フィルム又は板、ガラス板、セラミック板、磁性体を塗布又は蒸着した樹脂シート、これらの複合物が挙げられる。基材は、その内部又は表面に、電子的方式又は磁気的方式によって情報を記録する部材(例えば、集積回路、磁気テープ)を有していてもよい。
[Substrate]
Examples of the substrate for the recording medium include paper, coated paper, cloth, resin sheets, films or plates, metal sheets, films or plates, glass plates, ceramic plates, resin sheets coated or vapor-deposited with a magnetic material, and composites of these. The substrate may have a member (e.g., an integrated circuit, magnetic tape) inside or on its surface that records information by an electronic or magnetic method.
基材の材質、形状及び厚さは、記録媒体の目的に応じて選択してよい。基材には、金属光沢層の形成より前に情報が記録されていてもよい。 The material, shape, and thickness of the substrate may be selected depending on the purpose of the recording medium. Information may be recorded on the substrate prior to the formation of the metallic gloss layer.
[金属光沢層]
金属光沢層は、少なくともチオフェン重合体を含有する。金属光沢層は、さらに、樹脂、フィラー等を含有していてもよい。
[Metallic gloss layer]
The metallic luster layer contains at least a thiophene polymer. The metallic luster layer may further contain a resin, a filler, and the like.
チオフェン重合体は、2個以上のチオフェン類が重合した重合体である。チオフェン重合体は、1種のチオフェン類が重合した重合体でもよく、複数種のチオフェン類が重合した重合体でもよい。チオフェン重合体の実施形態例として、下記の一般式で表される重合体が挙げられる。 A thiophene polymer is a polymer formed by polymerizing two or more thiophenes. The thiophene polymer may be a polymer formed by polymerizing one type of thiophene, or may be a polymer formed by polymerizing multiple types of thiophenes. An example of a thiophene polymer is a polymer represented by the following general formula:
上記一般式において、Rは置換基であり、mは1又は2であり、nは2以上の整数である。Rは、1種でもよく、複数種でもよい。mが2の場合、1個のチオフェン環が有する2個のRは、同種でもよく、異種でもよい。mが2の場合、1個のチオフェン環において、2個のRが連結して環状基を形成していてもよい。 In the above general formula, R is a substituent, m is 1 or 2, and n is an integer of 2 or more. R may be one type or multiple types. When m is 2, the two Rs in one thiophene ring may be the same type or different types. When m is 2, the two Rs in one thiophene ring may be linked to form a cyclic group.
Rは、例えば、アルコキシ基、アルキル基、アミノ基、ヒドロキシ基、ヒドロキシアルキル基、アリール基、アリル基、シアノ基、ハロゲノ基を示す。Rは、金属光沢層が金属光沢により優れる観点から、アルコキシ基、アルキル基、アミノ基、ヒドロキシ基が好ましく、アルコキシ基、アルキル基、アミノ基がより好ましく、アルコキシ基、アルキル基が更に好ましい。 R represents, for example, an alkoxy group, an alkyl group, an amino group, a hydroxy group, a hydroxyalkyl group, an aryl group, an allyl group, a cyano group, or a halogeno group. From the viewpoint of providing a metallic gloss layer with superior metallic gloss, R is preferably an alkoxy group, an alkyl group, an amino group, or a hydroxy group, more preferably an alkoxy group, an alkyl group, or an amino group, and even more preferably an alkoxy group or an alkyl group.
Rがアルコキシ基である場合、アルコキシ基の炭素数は、チオフェン重合体が層状に配向しやすい観点から、1以上8以下が好ましく、1以上6以下がより好ましく、1以上4以下が更に好ましく、1又は2が特に好ましい。
アルコキシ基を少なくとも1個有するチオフェン類としては、3-メトキシチオフェン、3,4-ジメトキシチオフェン、3-エトキシチオフェン、3,4-ジエトキシチオフェン、3-プロポキシチオフェン、3-ブトキシチオフェン、3,4-エチレンジオキシチオフェン、3,4-プロピレンジオキシチオフェン等が挙げられる。
When R is an alkoxy group, the number of carbon atoms in the alkoxy group is preferably 1 or more and 8 or less, more preferably 1 or more and 6 or less, even more preferably 1 or more and 4 or less, and particularly preferably 1 or 2, from the viewpoint of facilitating the orientation of the thiophene polymer in a layer form.
Examples of thiophenes having at least one alkoxy group include 3-methoxythiophene, 3,4-dimethoxythiophene, 3-ethoxythiophene, 3,4-diethoxythiophene, 3-propoxythiophene, 3-butoxythiophene, 3,4-ethylenedioxythiophene, and 3,4-propylenedioxythiophene.
Rがアルキル基である場合、アルキル基の炭素数は、チオフェン重合体が層状に配向しやすい観点から、1以上12以下が好ましく、1以上8以下がより好ましく、1以上6以下が更に好ましく、1以上4以下が更に好ましく、1又は2が特に好ましい。
アルキル基を少なくとも1個有するチオフェン類としては、3-メチルチオフェン、3,4-ジメチルチオフェン、3-エチルチオフェン、3,4-ジエチルチオフェン、3-ブチルチオフェン、3-ヘキシルチオフェン、3-ヘプチルチオフェン、3-オクチルチオフェン、3-ノニルチオフェン、3-デシルチオフェン、3-ウンデシルチオフェン、3-ドデシルチオフェン、3-ブロモ-4-メチルチオフェン等が挙げられる。
When R is an alkyl group, the number of carbon atoms in the alkyl group is preferably 1 or more and 12 or less, more preferably 1 or more and 8 or less, even more preferably 1 or more and 6 or less, still more preferably 1 or more and 4 or less, and particularly preferably 1 or 2, from the viewpoint of facilitating the orientation of a layer in the thiophene polymer.
Examples of thiophenes having at least one alkyl group include 3-methylthiophene, 3,4-dimethylthiophene, 3-ethylthiophene, 3,4-diethylthiophene, 3-butylthiophene, 3-hexylthiophene, 3-heptylthiophene, 3-octylthiophene, 3-nonylthiophene, 3-decylthiophene, 3-undecylthiophene, 3-dodecylthiophene, and 3-bromo-4-methylthiophene.
Rがアミノ基である場合、アミノ基は、第1級アミノ基(-NH2)でもよく、第2級アミノ基(-NHR1、R1はアルキル基又はアリール基であり、アルキル基が好ましい。)でもよく、第3級アミノ基(-NR1R2、R1及びR2はそれぞれ独立にアルキル基又はアリール基であり、アルキル基が好ましい。)でもよい。第2級アミノ基又は第3級アミノ基におけるアルキル基の炭素数は、チオフェン重合体が層状に配向しやすい観点から、1又は2が好ましい。
アミノ基を少なくとも1個有するチオフェン類としては、3-アミノチオフェン、3,4-ジアミノチオフェン、3-メチルアミノチオフェン、3-ジメチルアミノチオフェン等が挙げられる。
When R is an amino group, the amino group may be a primary amino group (-NH 2 ), a secondary amino group (-NHR 1 , R 1 is an alkyl group or an aryl group, preferably an alkyl group), or a tertiary amino group (-NR 1 R 2 , R 1 and R 2 are each independently an alkyl group or an aryl group, preferably an alkyl group). The number of carbon atoms in the alkyl group in the secondary amino group or tertiary amino group is preferably 1 or 2, from the viewpoint of facilitating layer-like orientation of the thiophene polymer.
Examples of thiophenes having at least one amino group include 3-aminothiophene, 3,4-diaminothiophene, 3-methylaminothiophene, and 3-dimethylaminothiophene.
チオフェン重合体としては、金属光沢層が金属光沢により優れる観点から、アルコキシチオフェン、アルキルチオフェン、アミノチオフェン及びヒドロキシチオフェンからなる群から選択される少なくとも1種が重合した重合体が好ましく、アルコキシチオフェン及びアルキルチオフェンからなる群から選択される少なくとも1種が重合した重合体がより好ましく、アルコキシチオフェンのみが重合したポリ(アルコキシチオフェン)、アルキルチオフェンのみが重合したポリ(アルキルチオフェン)又はアルキルチオフェンとアルコキシチオフェンのみが重合したポリ(アルキルチオフェン)(アルコキシチオフェン)が更に好ましい。アルコキシチオフェンにおけるアルコキシ基の炭素数は、1以上8以下が好ましく、1以上6以下がより好ましく、1以上4以下が更に好ましく、1又は2が特に好ましい。アルキルチオフェンにおけるアルキル基の炭素数は、1以上12以下が好ましく、1以上8以下がより好ましく、1以上6以下が更に好ましく、1以上4以下が更に好ましく、1又は2が特に好ましい。 As the thiophene polymer, from the viewpoint of the metallic luster layer being superior in metallic luster, a polymer in which at least one selected from the group consisting of alkoxythiophenes, alkylthiophenes, aminothiophenes, and hydroxythiophenes is polymerized is preferable, a polymer in which at least one selected from the group consisting of alkoxythiophenes and alkylthiophenes is polymerized is more preferable, and a poly(alkoxythiophene) in which only alkoxythiophenes are polymerized, a poly(alkylthiophene) in which only alkylthiophenes are polymerized, or a poly(alkylthiophene) (alkoxythiophene) in which only alkylthiophenes and alkoxythiophenes are polymerized is even more preferable. The number of carbon atoms of the alkoxy group in the alkoxythiophene is preferably 1 to 8, more preferably 1 to 6, even more preferably 1 to 4, and particularly preferably 1 or 2. The number of carbon atoms of the alkyl group in the alkylthiophene is preferably 1 to 12, more preferably 1 to 8, even more preferably 1 to 6, even more preferably 1 to 4, and particularly preferably 1 or 2.
金属光沢層に含まれるチオフェン重合体は、チオフェン重合体が層状に配向しやすい観点から、重量平均分子量が200以上30000以下であり、500以上20000以下であることが好ましく、1000以上10000以下であることがより好ましい。 The thiophene polymer contained in the metallic luster layer has a weight average molecular weight of 200 to 30,000, preferably 500 to 20,000, and more preferably 1,000 to 10,000, from the viewpoint of facilitating layer-like orientation of the thiophene polymer.
金属光沢層に含まれるチオフェン重合体の分子量測定は、チオフェン重合体が溶解可能な溶剤で金属光沢層を溶かし、チオフェン重合体を抽出して行う。
チオフェン重合体の分子量測定は、ゲル浸透クロマトグラフィー(GPC)によって測定する。測定装置に東ソー(株)製HPLC1100を使用し、カラムに東ソー(株)製TSKgel GMHHR-M(内径7.8mm、長さ30cm)を2本直列に配置して使用し、溶媒にクロロホルムを使用し、標準試料に単分散ポリスチレンを使用する。
The molecular weight of the thiophene polymer contained in the metallic luster layer is measured by dissolving the metallic luster layer in a solvent capable of dissolving the thiophene polymer and extracting the thiophene polymer.
The molecular weight of the thiophene polymer is measured by gel permeation chromatography (GPC) using an HPLC1100 manufactured by Tosoh Corporation as a measuring device, two TSKgel GMHHR-M columns (inner diameter 7.8 mm, length 30 cm) manufactured by Tosoh Corporation arranged in series, chloroform as a solvent, and monodisperse polystyrene as a standard sample.
金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量は、金属光沢層の光沢ムラを抑制する観点から、チオフェン重合体に対して1500ppm以下である。上記金属原子の合計含有量が過剰であると、チオフェン重合体の層状配向が乱れ、金属光沢に光沢ムラが発生しやすい。金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量は、チオフェン重合体に対して、500ppm以下が好ましく、100ppm以下がより好ましい。
ただし、チオフェン重合体のドーピング状態を安定させるために、チオフェン重合体は上記金属原子を少し含むことが好ましく、Fe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量は、チオフェン重合体に対して、1ppm以上が好ましく、5ppm以上がより好ましい。
The total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is 1500 ppm or less relative to the thiophene polymer in order to suppress uneven luster in the metallic luster layer. If the total content of the metal atoms is excessive, the layered orientation of the thiophene polymer is disturbed, and uneven luster is likely to occur in the metallic luster. The total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is preferably 500 ppm or less, more preferably 100 ppm or less, relative to the thiophene polymer.
However, in order to stabilize the doped state of the thiophene polymer, the thiophene polymer preferably contains a small amount of the above metal atoms, and the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms is preferably 1 ppm or more, and more preferably 5 ppm or more, relative to the thiophene polymer.
チオフェン重合体に対するFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量(ppm)の求め方は、下記のとおりである。
金属光沢層を硝酸に溶解し、硝酸溶液を得る。硝酸溶液をマイクロ波照射による加熱(最高到達温度260℃)で灰化し、灰化物を水に溶解又は分散させた液体組成物を得る。この液体組成物を試料にして、誘導結合プラズマ発光分光分析(Inductively coupled plasma optical emission spectrometry,ICP-OES)により、上記金属原子及びS原子を定量し、S原子と各金属原子の比率を求める。単位量の金属光沢層に含まれるチオフェン重合体量(S原子量から換算)と金属原子量とから、チオフェン重合体に対するFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量(ppm)を算出する。
The total content (ppm) of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the thiophene polymer is determined as follows.
The metallic luster layer is dissolved in nitric acid to obtain a nitric acid solution. The nitric acid solution is heated by microwave irradiation (maximum temperature reached: 260°C) to incinerate the nitric acid solution, and the ashes are dissolved or dispersed in water to obtain a liquid composition. This liquid composition is used as a sample, and the metal atoms and S atoms are quantified by inductively coupled plasma optical emission spectrometry (ICP-OES), to obtain the ratio of S atoms to each metal atom. The total content (ppm) of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms relative to the thiophene polymer is calculated from the amount of thiophene polymer (converted from the amount of S atoms) and the amount of metal atoms contained in a unit amount of the metallic luster layer.
金属光沢層の厚さは、金属光沢を呈する厚さであることが好ましく、具体的には、0.01μm以上200μm以下が好ましい。 The thickness of the metallic gloss layer is preferably a thickness that exhibits metallic gloss, specifically, 0.01 μm or more and 200 μm or less.
金属光沢層は、例えば、金属光沢層を形成するための組成物を用いて形成することができる。金属光沢層を形成するための組成物としては、例えば、チオフェン重合体を溶媒に溶解したインク;チオフェン重合体が内添又は外添されたトナー;が挙げられる。金属光沢層の形成方法は、例えば、スクリーン印刷法、オフセット印刷法、インクジェット法、電子写真法である。 The metallic gloss layer can be formed, for example, using a composition for forming a metallic gloss layer. Examples of compositions for forming a metallic gloss layer include ink in which a thiophene polymer is dissolved in a solvent; and toner to which a thiophene polymer is added internally or externally. Methods for forming a metallic gloss layer include, for example, screen printing, offset printing, inkjet printing, and electrophotography.
金属光沢層を基材上又は金属層上に形成後、金属光沢層を基材上又は金属層上に固着させる観点から、金属光沢層を加圧することが好ましい。加圧には、擦ることも含まれる。 After forming the metallic gloss layer on the substrate or metal layer, it is preferable to apply pressure to the metallic gloss layer in order to adhere the metallic gloss layer to the substrate or metal layer. Pressurization also includes rubbing.
金属光沢層を形成するための組成物の製造用のチオフェン重合体は、例えば、酸化重合法によって合成する。酸化重合法は、酸化剤を用いて液相又は固相においてチオフェン類を重合する方法である。 The thiophene polymer for producing the composition for forming the metallic luster layer is synthesized, for example, by oxidative polymerization. The oxidative polymerization method is a method for polymerizing thiophenes in the liquid or solid phase using an oxidizing agent.
酸化剤としては、例えば、第二鉄塩、第二銅塩、セリウム塩、二クロム酸塩、過マンガン酸塩、過硫酸アンモニウム、三フッ化ホウ素、臭素酸塩、過酸化水素、塩素、臭素、ヨウ素が挙げられる。 Examples of oxidizing agents include ferric salts, cupric salts, cerium salts, dichromates, permanganates, ammonium persulfate, boron trifluoride, bromates, hydrogen peroxide, chlorine, bromine, and iodine.
酸化剤としては、第二鉄塩が好ましい。第二鉄塩は、水和物であってもよい。
第二鉄塩の対イオンとしては、例えば、塩化物イオン、クエン酸イオン、シュウ酸イオン、パラトルエンスルホン酸イオン、過塩素酸イオン、ヘキサフルオロリン酸イオン、テトラフルオロほう酸イオン等が挙げられる。第二鉄塩の対イオンとして、過塩素酸イオン、ヘキサフルオロリン酸イオン及びテトラフルオロほう酸イオンの少なくとも1種を用いると、金色に近い光沢を呈する膜を形成することができる。
The oxidizing agent is preferably a ferric salt, which may be in the form of a hydrate.
Examples of counter ions of the ferric salt include chloride ions, citrate ions, oxalate ions, paratoluenesulfonate ions, perchlorate ions, hexafluorophosphate ions, tetrafluoroborate ions, etc. When at least one of the perchlorate ions, hexafluorophosphate ions, and tetrafluoroborate ions is used as the counter ion of the ferric salt, a film exhibiting a gloss close to gold can be formed.
対イオンが過塩素酸イオン、ヘキサフルオロリン酸イオン、テトラフルオロほう酸イオン又は塩化物イオンである酸化剤を用いた場合、これら対イオンはチオフェン重合体に安定的に結合されて残留し、金属光沢の状態を安定的に維持することができる。 When an oxidizing agent whose counter ion is a perchlorate ion, a hexafluorophosphate ion, a tetrafluoroborate ion, or a chloride ion is used, these counter ions remain stably bound to the thiophene polymer, and the metallic luster state can be stably maintained.
酸化重合は、溶媒中において行うことが好ましい。溶媒は、チオフェン類及び酸化剤を溶解し、チオフェン類を効率的に重合させる溶媒が好ましい。溶媒としては、高い極性を有し、ある程度の揮発性を有する有機溶媒であることが好ましい。 The oxidative polymerization is preferably carried out in a solvent. The solvent is preferably one that dissolves the thiophenes and the oxidizing agent and efficiently polymerizes the thiophenes. The solvent is preferably an organic solvent that has high polarity and a certain degree of volatility.
溶媒としては、例えば、アセトニトリル、ニトロメタン、γ-ブチロラクトン、炭酸プロピレン、ニトロメタン、1-メチル-2-ピロリジノン、ジメチルスルホキシド、2-ブタノン、テトラヒドロフラン、アセトン、メタノール、アニソール、クロロホルム、酢酸エチル、ヘキサン、トリクロロエチレン、シクロヘキサノン、ジクロロメタン、クロロホルム、ジメチルホルムアミド、エタノール、ブタノール、ピリジン、ジオキサン、及びこれらの混合物が挙げられる。 Examples of solvents include acetonitrile, nitromethane, γ-butyrolactone, propylene carbonate, nitromethane, 1-methyl-2-pyrrolidinone, dimethylsulfoxide, 2-butanone, tetrahydrofuran, acetone, methanol, anisole, chloroform, ethyl acetate, hexane, trichloroethylene, cyclohexanone, dichloromethane, chloroform, dimethylformamide, ethanol, butanol, pyridine, dioxane, and mixtures thereof.
溶媒としては、金属光沢層が金属光沢により優れる観点から、非プロトン性極性溶媒が好ましく、アセトニトリル、ニトロメタン、γ-ブチロラクトン及び炭酸プロピレンからなる群から選択される少なくとも1種がより好ましい。 From the viewpoint of providing a metallic gloss layer with superior metallic gloss, the solvent is preferably an aprotic polar solvent, and more preferably at least one selected from the group consisting of acetonitrile, nitromethane, γ-butyrolactone, and propylene carbonate.
溶媒とチオフェン類との質量比は、溶媒:チオフェン類=1:0.00007~1:7が好ましく、1:0.0007~1:0.7がより好ましい。
溶媒と酸化剤との質量比は、例えば、酸化剤が過塩素酸鉄(III)n水和物〔第二〕の場合、溶媒:過塩素酸鉄(III)n水和物〔第二〕=1:0.0006~1:6が好ましく、1:0.006~1:0.6がより好ましい。
チオフェン類と酸化剤との質量比は、チオフェン類:酸化剤=1:0.1~1:1000が好ましく、1:1~1:100がより好ましい。
The mass ratio of the solvent to the thiophenes, solvent:thiophenes, is preferably from 1:0.00007 to 1:7, and more preferably from 1:0.0007 to 1:0.7.
For example, when the oxidizing agent is iron(III) perchlorate n-hydrate (2D), the mass ratio of the solvent to the oxidizing agent is preferably solvent:iron(III) perchlorate n-hydrate (2D)=1:0.0006 to 1:6, and more preferably 1:0.006 to 1:0.6.
The mass ratio of the thiophenes to the oxidizing agent, thiophenes:oxidizing agent, is preferably from 1:0.1 to 1:1000, and more preferably from 1:1 to 1:100.
酸化重合の手技は特に制限されない。チオフェン類と酸化剤とを溶媒に一度に加え溶解させて酸化重合を行ってもよく、溶媒にチオフェン類を溶解させた溶液と溶媒に酸化剤を溶解させた溶液とを別々に作製し、両溶液を混合して酸化重合を行ってもよい。 The technique of oxidative polymerization is not particularly limited. The thiophenes and the oxidizing agent may be added to a solvent at once and dissolved to perform oxidative polymerization, or a solution in which the thiophenes are dissolved in a solvent and a solution in which the oxidizing agent is dissolved in a solvent may be separately prepared, and the two solutions may be mixed to perform oxidative polymerization.
酸化重合におけるチオフェン類の濃度、反応温度及び反応時間を変更することで、チオフェン重合体の分子量を調整することができる。 The molecular weight of the thiophene polymer can be adjusted by changing the concentration of thiophenes, reaction temperature, and reaction time in the oxidative polymerization.
酸化重合法で合成したチオフェン重合体は、溶液のまま使用してもよいし、溶媒を除去して粉末状のチオフェン重合体として使用してもよい。 The thiophene polymer synthesized by the oxidative polymerization method may be used as a solution, or the solvent may be removed to use the thiophene polymer in powder form.
粉末状のチオフェン重合体は、酸化重合の際に使用した酸化剤に由来する不純物を含有することがある。不純物を除去する目的で、下記の(a)、(b)及び(c)の少なくとも1つの処理を行うことが好ましい。下記の(a)、(b)及び(c)の少なくとも1つの処理を行うことによって、金属光沢層に含まれるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量を低減することができる。
(a)貧溶媒を用いてチオフェン重合体の洗浄を行う。
(b)チオフェン重合体を良溶媒に溶解させた溶液を、貧溶媒に滴下し、チオフェン重合体を沈殿させる。
(c)貧溶媒を、チオフェン重合体を良溶媒に溶解させた溶液に滴下し、チオフェン重合体を沈殿させる。
貧溶媒としては、メタノール、エタノール、イソプロパノール等のアルコールが好ましく、良溶媒としては、ジメチルホルムアミド、ジメチルスルホキシド、テトラヒドロフラン等が好ましい。
The powdered thiophene polymer may contain impurities derived from the oxidizing agent used in the oxidative polymerization. In order to remove the impurities, it is preferable to carry out at least one of the following treatments (a), (b), and (c). By carrying out at least one of the following treatments (a), (b), and (c), the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms, and Ce atoms contained in the metallic luster layer can be reduced.
(a) The thiophene polymer is washed using a poor solvent.
(b) A solution in which a thiophene polymer is dissolved in a good solvent is dropped into a poor solvent to precipitate the thiophene polymer.
(c) A poor solvent is dropped into a solution in which a thiophene polymer is dissolved in a good solvent, thereby precipitating the thiophene polymer.
As the poor solvent, alcohols such as methanol, ethanol, and isopropanol are preferable, and as the good solvent, dimethylformamide, dimethylsulfoxide, and tetrahydrofuran are preferable.
金属光沢層の形成方法としては、電解重合法も挙げられる。電解重合法は、モノマーを支持電解質を含む溶媒に溶解してなる電解溶液中において、モノマーを電極酸化することにより、不溶性重合体からなる膜を導電体上に形成する方法をいう。電解重合法によれば、チオフェン類を原料にして、導電性の基材上に、又は、基材上に設けた金属層上に、チオフェン重合体を含有する金属光沢層を直接形成することができる。 An example of a method for forming a metallic gloss layer is electrolytic polymerization. Electrolytic polymerization is a method in which a film made of an insoluble polymer is formed on a conductor by electrochemically oxidizing a monomer in an electrolytic solution in which the monomer is dissolved in a solvent containing a supporting electrolyte. According to electrolytic polymerization, a metallic gloss layer containing a thiophene polymer can be directly formed on a conductive substrate or on a metal layer provided on a substrate using thiophenes as a raw material.
電解重合における溶媒としては、例えば、水、アルコール、これらの混合溶媒が挙げられる。また、「電気化学測定法 上巻」107~114頁(藤島昭、相澤益男、井上 徹、技報堂出版、1984年)に記載の溶媒を使用してもよい。 Examples of solvents for electrolytic polymerization include water, alcohol, and mixed solvents of these. Solvents described in "Electrochemical Measurement Methods, Vol. 1," pp. 107-114 (Akira Fujishima, Masuo Aizawa, Toru Inoue, Gihodo Publishing, 1984) may also be used.
支持電解質は、溶媒に十分溶解し且つ電気分解されにくい電解質が好ましい。支持電解質としては、カチオンに注目すれば、リチウム塩、ナトリウム塩、カリウム塩、カルシウム塩、テトラアルキルアンモニウム塩が好ましく、アニオンに注目すれば、ハロゲン化物、硫酸塩、硝酸塩、リン酸塩、過塩素酸塩、三フッ化ホウ素塩、六フッ化リン酸塩が好ましい。 The supporting electrolyte is preferably one that is sufficiently soluble in the solvent and is not easily electrolyzed. In terms of the cation, preferred supporting electrolytes are lithium salts, sodium salts, potassium salts, calcium salts, and tetraalkylammonium salts, and in terms of the anion, preferred supporting electrolytes are halides, sulfates, nitrates, phosphates, perchlorates, boron trifluorides, and hexafluorophosphates.
電解溶液におけるチオフェン類の濃度は、0.1mmol/L以上溶解度以下であることが好ましく、1mmol/L以上1mol/L以下であることがより好ましい。
電解溶液における支持電解質の濃度は、0.001mol/L以上溶解度以下であることが好ましく、0.01mol/L以上1mol/L以下であることがより好ましい。
The concentration of thiophenes in the electrolytic solution is preferably 0.1 mmol/L or more and the solubility thereof or less, and more preferably 1 mmol/L or more and 1 mol/L or less.
The concentration of the supporting electrolyte in the electrolytic solution is preferably 0.001 mol/L or more and the solubility or less, and more preferably 0.01 mol/L or more and 1 mol/L or less.
電解重合法は、動作電極として機能させる導電体と、対向電極と、電位の基準となる参照電極とを用いる3電極式、又は、動作電極として機能させる導電体と、対向電極とを用いる2電極式が好ましい。3電極式は、望むチオフェン重合体を再現性よく重合できる観点から好ましい。 The electrolytic polymerization method is preferably a three-electrode method using a conductor that functions as a working electrode, a counter electrode, and a reference electrode that serves as a potential standard, or a two-electrode method using a conductor that functions as a working electrode and a counter electrode. The three-electrode method is preferred from the viewpoint of being able to polymerize the desired thiophene polymer with good reproducibility.
動作電極として機能させる導電体の材質は、3電極式及び2電極式のいずれにおいても、電極酸化に対して安定な物質であることが好ましい。例えば、酸化インジウムスズ、酸化スズ等の導電膜が塗布された電極(透明ガラス電極、金属電極、グラッシーカーボン電極等)が好ましい。対向電極としては、上記の電極、ステンレス、銅板等の金属電極が好ましい。参照電極は、Ag/AgCl電極、飽和カロメル電極が好ましい。 The material of the conductor functioning as the working electrode is preferably a substance that is stable against electrode oxidation, whether in the three-electrode or two-electrode system. For example, an electrode coated with a conductive film such as indium tin oxide or tin oxide (transparent glass electrode, metal electrode, glassy carbon electrode, etc.) is preferred. As the counter electrode, the above-mentioned electrodes, stainless steel, copper plate, or other metal electrodes are preferred. As the reference electrode, an Ag/AgCl electrode or a saturated calomel electrode is preferred.
電解重合法において陽極酸化させる際、電位掃引法を用いることが好ましい。電位掃引法とは、一定の速度で電位を変化させつつ印加する処理をいう。 When anodizing in electrolytic polymerization, it is preferable to use the potential sweep method. The potential sweep method refers to a process in which a potential is applied while being changed at a constant rate.
電位掃引法は、負電位と正電位の間で掃引することが好ましい。この場合、負電位は、-1.5V以上-0.01V以下の範囲が好ましく、より好ましくは-1.0V以上-0.1V以下の範囲、更に好ましくは-0.7V以上-0.2V以下の範囲である。正電位は、+1.0V以上+3.0V以下の範囲が好ましく、より好ましくは+1.0V以上+2.0V以下の範囲、更に好ましくは+1.0V以上+1.5V以下の範囲である。
電位掃引法の掃引速度は、0.1mV/秒以上10V/秒以下の範囲が好ましく、より好ましくは1mV/秒以上1V/秒以下の範囲、更に好ましくは2mV/秒以上300mV/秒以下の範囲である。
In the potential sweep method, it is preferable to sweep between a negative potential and a positive potential. In this case, the negative potential is preferably in the range of -1.5 V or more and -0.01 V or less, more preferably in the range of -1.0 V or more and -0.1 V or less, and even more preferably in the range of -0.7 V or more and -0.2 V or less. The positive potential is preferably in the range of +1.0 V or more and +3.0 V or less, more preferably in the range of +1.0 V or more and +2.0 V or less, and even more preferably in the range of +1.0 V or more and +1.5 V or less.
The sweep rate in the potential sweep method is preferably in the range of 0.1 mV/sec to 10 V/sec, more preferably in the range of 1 mV/sec to 1 V/sec, and further preferably in the range of 2 mV/sec to 300 mV/sec.
電解重合の時間は、1秒以上5時間以下の範囲が好ましく、10秒以上1時間以下の範囲がより好ましい。
電解重合時の電気分解の温度は、-20℃以上60℃以下の範囲が好ましい。
The time for electrolytic polymerization is preferably in the range of 1 second to 5 hours, more preferably in the range of 10 seconds to 1 hour.
The temperature of electrolysis during electrolytic polymerization is preferably in the range of -20°C or higher and 60°C or lower.
電解重合時の電気分解は、大気中の成分物質が関与することの少ない反応でありまた比較的低電位で行われるため、大気中で行うことができる。電解液中の不純物の酸化など、生成した膜を汚染する可能性を回避する観点から、窒素ガスやアルゴンガス雰囲気中で行うことが好ましいが、汚染の心配はほとんどない。それでもやはり、電解溶液中に酸素が多く存在すると電極反応に影響を与えるおそれがあるため、不活性ガス(窒素ガスやアルゴンガス)によるバブリングを行うことも有用である。 Electrolysis during electropolymerization is a reaction that involves little atmospheric components and is carried out at a relatively low potential, so it can be carried out in the air. It is preferable to carry out the process in a nitrogen or argon gas atmosphere to avoid the possibility of contaminating the formed film, such as by oxidizing impurities in the electrolyte, but there is little risk of contamination. Nevertheless, the presence of a large amount of oxygen in the electrolyte solution can affect the electrode reaction, so bubbling with an inert gas (nitrogen gas or argon gas) is also useful.
電解重合法によって金属光沢層を形成後、金属光沢層を基材上又は金属層上に固着させる観点から、金属光沢層を加圧することが好ましい。加圧には、擦ることも含まれる。 After forming the metallic gloss layer by electrolytic polymerization, it is preferable to apply pressure to the metallic gloss layer in order to fix the metallic gloss layer onto the substrate or metal layer. Pressurization also includes rubbing.
[金属層]
本実施形態に係る記録媒体は、基材と金属光沢層との間に金属層を有することが好ましい。金属光沢層の下に金属層があることによって、金属光沢層の金属光沢がより優れる。
[Metal Layer]
The recording medium according to this embodiment preferably has a metal layer between the substrate and the metallic gloss layer. By having a metal layer below the metallic gloss layer, the metallic gloss of the metallic gloss layer becomes more excellent.
金属層は、金属層及び金属光沢層の金属光沢を増す観点から、Au、Ag、Cu及びAlからなる群から選択される少なくとも1種の金属を含有する金属層であることが好ましい。 From the viewpoint of increasing the metallic luster of the metal layer and the metallic luster layer, it is preferable that the metal layer is a metal layer containing at least one metal selected from the group consisting of Au, Ag, Cu, and Al.
金属層は、少なくとも金属を含有する。金属層は、さらに、樹脂、フィラー等を含有していてもよい。 The metal layer contains at least a metal. The metal layer may further contain a resin, a filler, etc.
金属層の形成には、公知の成膜方法が適用できる。例えば、無電解めっき、真空蒸着、スパッタリング、イオンプレーティング等のめっき;金属粉末と樹脂とを含む塗液を用いた塗工;金属粉末を含むメタリックトナーを用いた画像形成;などの方法が挙げられる。 A known film-forming method can be used to form the metal layer. Examples include plating such as electroless plating, vacuum deposition, sputtering, and ion plating; coating using a coating liquid containing metal powder and resin; and image formation using metallic toner containing metal powder.
金属層の厚さは、0.02μm以上200μm以下が好ましい。 The thickness of the metal layer is preferably 0.02 μm or more and 200 μm or less.
金属光沢層の厚さと金属層の厚さとの比は、金属光沢層の厚さ:金属層の厚さ=1:0.001~1:2000が好ましく、1:0.05~1:20がより好ましい。 The ratio of the thickness of the metallic gloss layer to the thickness of the metal layer is preferably metallic gloss layer thickness:metal layer thickness=1:0.001 to 1:2000, and more preferably 1:0.05 to 1:20.
以下、実施例を例示することで本実施形態をさらに具体的に説明するが、本実施形態は以下の実施例に限定されるものではない。特に断りのない限り、「部」及び「%」は質量基準である。合成、処理、製造などは、特に断りのない限り、室温(25℃±3℃)で行った。 The present embodiment will be described in more detail below by way of examples, but the present embodiment is not limited to the following examples. Unless otherwise specified, "parts" and "%" are by weight. Synthesis, processing, manufacturing, etc. were performed at room temperature (25°C ± 3°C) unless otherwise specified.
<実施例1>
[チオフェン重合体の合成]
3-メトキシチオフェン11.4gを三つ口フラスコに入れ、アセトニトリル0.5Lを入れ、アセトニトリルに3-メトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、過塩素酸鉄(III)n水和物〔第二〕101gをアセトニトリル0.5Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール1Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体10.5gを得た。
Example 1
[Synthesis of thiophene polymer]
11.4 g of 3-methoxythiophene was placed in a three-necked flask, and 0.5 L of acetonitrile was added to dissolve 3-methoxythiophene in acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 101 g of iron (III) perchlorate n-hydrate [II] was dissolved in 0.5 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 1 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected and dried at 60°C under reduced pressure for 16 hours to obtain 10.5 g of a thiophene polymer.
[メタノール洗浄]
合成したチオフェン重合体2.0gをビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.8gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3000であった。
[Methanol washing]
2.0 g of the synthesized thiophene polymer was placed in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45° C., and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid content was placed in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45° C., and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, and the solid content was collected and dried at 60° C. under reduced pressure for 16 hours to obtain 1.8 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3,000.
[塗工液の調製]
メタノール洗浄後のチオフェン重合体1.0gをニトロメタン99gに溶解し、スターラーにて1時間攪拌したのち、22時間静置し、塗工液を得た。
[Preparation of coating liquid]
1.0 g of the thiophene polymer after washing with methanol was dissolved in 99 g of nitromethane, stirred with a stirrer for 1 hour, and then allowed to stand for 22 hours to obtain a coating liquid.
[金属光沢層の形成]
塗工液を普通上質紙(C2紙、富士ゼロックス株式会社)に、一辺10mmの正方形に塗布したのち、温度25℃下に45分間置いて乾燥させ、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
[Formation of metallic gloss layer]
The coating liquid was applied to a regular wood-free paper (C2 paper, Fuji Xerox Co., Ltd.) in a square shape with a side length of 10 mm, and then dried at a temperature of 25° C. for 45 minutes to form a metallic gloss layer. The metallic gloss layer had a thickness of about 1.0 μm.
<実施例2~5、比較例1~2>
実施例1と同様にして、ただし、チオフェン重合体の合成における3-メトキシチオフェンの濃度、反応温度及び反応時間を変更することで、重量平均分子量の異なるチオフェン重合体を合成し、実施例1と同様のメタノール洗浄を施した。こうして、表1に記載の重量平均分子量を有するチオフェン重合体をそれぞれ得た。そして、実施例1と同様にして、塗工液を調製し、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
<Examples 2 to 5, Comparative Examples 1 and 2>
Thiophene polymers having different weight average molecular weights were synthesized in the same manner as in Example 1, except that the concentration of 3-methoxythiophene, the reaction temperature, and the reaction time in the synthesis of the thiophene polymer were changed, and the polymers were washed with methanol in the same manner as in Example 1. In this manner, thiophene polymers having the weight average molecular weights shown in Table 1 were obtained, respectively. Then, a coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1. The metallic gloss layer had a thickness of about 1.0 μm.
<比較例3>
実施例1と同様にして、ただし、合成後のチオフェン重合体にメタノール洗浄を施さないで塗工液の調製に使用し、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
<Comparative Example 3>
A metallic glossy layer was formed in the same manner as in Example 1, except that the synthesized thiophene polymer was used for the preparation of a coating liquid without being washed with methanol. The metallic glossy layer had a thickness of about 1.0 μm.
<比較例4>
実施例1と同様にして、ただし、メタノール洗浄を下記のとおり変更し、塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。
<Comparative Example 4>
A coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1, except that the methanol washing was changed as follows. The metallic gloss layer had a thickness of about 1.0 μm.
[メタノール洗浄]
合成したチオフェン重合体2.0gをビーカーに取り、メタノール50mLを加え、1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.8gを得た。
[Methanol washing]
2.0 g of the synthesized thiophene polymer was placed in a beaker, 50 mL of methanol was added, and the mixture was stirred for 1 hour. Then, the mixture was subjected to solid-liquid separation using a centrifuge, and the solid matter was collected and dried at 60° C. under reduced pressure for 16 hours to obtain 1.8 g of the thiophene polymer.
<実施例6>
実施例1と同様にして、ただし、メタノール洗浄を下記の沈殿処理に変更し、塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。
Example 6
A coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1, except that the methanol washing was changed to the following precipitation treatment. The metallic gloss layer had a thickness of about 1.0 μm.
[沈殿処理]
合成したチオフェン重合体2.0gをビーカーに取り、ジメチルホルムアミド100mLに溶解させた。この溶液をイソプロピルアルコール500mLに30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.85gを得た。
[Precipitation treatment]
2.0 g of the synthesized thiophene polymer was placed in a beaker and dissolved in 100 mL of dimethylformamide. This solution was added dropwise to 500 mL of isopropyl alcohol over 30 minutes to gradually precipitate a solid. Then, solid-liquid separation was performed using a centrifuge, and the solid was collected and dried at 60° C. under reduced pressure for 16 hours to obtain 1.85 g of a thiophene polymer.
<実施例7>
実施例1と同様にして、ただし、メタノール洗浄を下記の沈殿処理及びメタノール洗浄に変更し、塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。
Example 7
A coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1, except that the methanol washing was changed to the following precipitation treatment and methanol washing. The metallic gloss layer had a thickness of about 1.0 μm.
[沈殿処理及びメタノール洗浄]
合成したチオフェン重合体2.0gをビーカーに取り、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.8gを得た。
[Precipitation and methanol washing]
2.0 g of the synthesized thiophene polymer was taken in a beaker and dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate a solid. Then, solid-liquid separation was performed using a centrifuge, the solid content was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid content was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 1.8 g of a thiophene polymer.
<実施例8>
[チオフェン重合体の合成]
3-メトキシチオフェン2.28gを三つ口フラスコに入れ、アセトニトリル0.1Lを入れ、アセトニトリルに3-メトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、テトラフルオロほう酸銅(II)6水和物24.5gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
Example 8
[Synthesis of thiophene polymer]
2.28 g of 3-methoxythiophene was placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve 3-methoxythiophene in acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 24.5 g of copper (II) tetrafluoroborate hexahydrate was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体2.0gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3200であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 2.0 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3200.
[塗工液の調製]
メタノール洗浄後のチオフェン重合体1.0gをニトロメタン99gに溶解し、スターラーにて1時間攪拌したのち、22時間静置し、塗工液を得た。
[Preparation of coating liquid]
1.0 g of the thiophene polymer after washing with methanol was dissolved in 99 g of nitromethane, stirred with a stirrer for 1 hour, and then allowed to stand for 22 hours to obtain a coating liquid.
[金属光沢層の形成]
塗工液を普通上質紙(C2紙、富士ゼロックス株式会社)に、一辺10mmの正方形に塗布したのち、温度25℃下に45分間置いて乾燥させ、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
[Formation of metallic gloss layer]
The coating liquid was applied to a regular wood-free paper (C2 paper, Fuji Xerox Co., Ltd.) in a square shape with a side length of 10 mm, and then dried at a temperature of 25° C. for 45 minutes to form a metallic gloss layer. The metallic gloss layer had a thickness of about 1.0 μm.
<実施例9>
[チオフェン重合体の合成]
3-メトキシチオフェン3.1gを三つ口フラスコに入れ、アセトニトリル0.1Lを入れ、アセトニトリルに3-メトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、過マンガン酸カリウム15.8gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
<Example 9>
[Synthesis of thiophene polymer]
3.1 g of 3-methoxythiophene was placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve 3-methoxythiophene in acetonitrile. The atmosphere inside the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 15.8 g of potassium permanganate was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体2.0gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3300であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 2.0 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3300.
[塗工液の調製]
メタノール洗浄後のチオフェン重合体1.0gをニトロメタン99gに溶解し、スターラーにて1時間攪拌したのち、22時間静置し、塗工液を得た。
[Preparation of coating liquid]
1.0 g of the thiophene polymer after washing with methanol was dissolved in 99 g of nitromethane, stirred with a stirrer for 1 hour, and then allowed to stand for 22 hours to obtain a coating liquid.
[金属光沢層の形成]
塗工液を普通上質紙(C2紙、富士ゼロックス株式会社)に、一辺10mmの正方形に塗布したのち、温度25℃下に45分間置いて乾燥させ、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
[Formation of metallic gloss layer]
The coating liquid was applied to a regular wood-free paper (C2 paper, Fuji Xerox Co., Ltd.) in a square shape with a side length of 10 mm, and then dried at a temperature of 25° C. for 45 minutes to form a metallic gloss layer. The metallic gloss layer had a thickness of about 1.0 μm.
<実施例10>
3-メトキシチオフェン3.1gを三つ口フラスコに入れ、アセトニトリル0.1Lを入れ、アセトニトリルに3-メトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、二クロム酸カリウム19.7gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
Example 10
3.1 g of 3-methoxythiophene was placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve 3-methoxythiophene in acetonitrile. The atmosphere inside the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 19.7 g of potassium dichromate was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体2.0gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3400であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 2.0 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3400.
[塗工液の調製]
メタノール洗浄後のチオフェン重合体1.0gをニトロメタン99gに溶解し、スターラーにて1時間攪拌したのち、22時間静置し、塗工液を得た。
[Preparation of coating liquid]
1.0 g of the thiophene polymer after washing with methanol was dissolved in 99 g of nitromethane, stirred with a stirrer for 1 hour, and then allowed to stand for 22 hours to obtain a coating liquid.
[金属光沢層の形成]
塗工液を普通上質紙(C2紙、富士ゼロックス株式会社)に、一辺10mmの正方形に塗布したのち、温度25℃下に45分間置いて乾燥させ、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
[Formation of metallic gloss layer]
The coating liquid was applied to a regular wood-free paper (C2 paper, Fuji Xerox Co., Ltd.) in a square shape with a side length of 10 mm, and then dried at a temperature of 25° C. for 45 minutes to form a metallic gloss layer. The metallic gloss layer had a thickness of about 1.0 μm.
<実施例11>
3-メトキシチオフェン3.1gを三つ口フラスコに入れ、アセトニトリル0.1Lを入れ、アセトニトリルに3-メトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、硝酸セリウム(IV)アンモニウム54.8gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
Example 11
3.1 g of 3-methoxythiophene was placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve 3-methoxythiophene in acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 54.8 g of cerium (IV) ammonium nitrate was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体2.0gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3100であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 2.0 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3100.
[塗工液の調製]
メタノール洗浄後のチオフェン重合体1.0gをニトロメタン99gに溶解し、スターラーにて1時間攪拌したのち、22時間静置し、塗工液を得た。
[Preparation of coating liquid]
1.0 g of the thiophene polymer after washing with methanol was dissolved in 99 g of nitromethane, stirred with a stirrer for 1 hour, and then allowed to stand for 22 hours to obtain a coating liquid.
[金属光沢層の形成]
塗工液を普通上質紙(C2紙、富士ゼロックス株式会社)に、一辺10mmの正方形に塗布したのち、温度25℃下に45分間置いて乾燥させ、金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
[Formation of metallic gloss layer]
The coating liquid was applied to a regular wood-free paper (C2 paper, Fuji Xerox Co., Ltd.) in a square shape with a side length of 10 mm, and then dried at a temperature of 25° C. for 45 minutes to form a metallic gloss layer. The metallic gloss layer had a thickness of about 1.0 μm.
<実施例12>
[チオフェン重合体の合成]
3-ブトキシチオフェン3.1gを三つ口フラスコ入れ、アセトニトリル0.1Lを入れ、アセトニトリルに3-ブトキシチオフェンを溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、過塩素酸鉄(III)n水和物〔第二〕20gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
Example 12
[Synthesis of thiophene polymer]
3.1 g of 3-butoxythiophene was placed in a three-necked flask, and 0.1 L of acetonitrile was added, and 3-butoxythiophene was dissolved in acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen, and the flask was cooled to 0°C. A solution in which 20 g of iron (III) perchlorate n-hydrate [II] was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature, and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added, and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.9gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3200であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 1.9 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3200.
メタノール洗浄後のチオフェン重合体を用いて、実施例1と同様にして塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。 Using the thiophene polymer after methanol washing, a coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1. The thickness of the metallic gloss layer was approximately 1.0 μm.
<実施例13>
[チオフェン重合体の合成]
3-メチルチオフェン0.02gと3-メトキシチオフェン2.05gとを三つ口フラスコ入れ、アセトニトリル0.1Lを入れ、アセトニトリルにチオフェン類を溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、過塩素酸鉄(III)n水和物〔第二〕20gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
<Example 13>
[Synthesis of thiophene polymer]
0.02 g of 3-methylthiophene and 2.05 g of 3-methoxythiophene were placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve the thiophenes in the acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 20 g of iron (III) perchlorate n-hydrate [II] was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.9gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3200であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 1.9 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3200.
メタノール洗浄後のチオフェン重合体を用いて、実施例1と同様にして塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。 Using the thiophene polymer after methanol washing, a coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1. The thickness of the metallic gloss layer was approximately 1.0 μm.
<実施例14>
[チオフェン重合体の合成]
3,4-エチレンジオキシチオフェン0.03gと3-メトキシチオフェン2.05gとを三つ口フラスコ入れ、アセトニトリル0.1Lを入れ、アセトニトリルにチオフェン類を溶解した。次いで、三つ口フラスコ内を窒素で置換し、0℃に冷却した。次いで、過塩素酸鉄(III)n水和物〔第二〕20gをアセトニトリル0.1Lに溶解させた容液を、当該溶液及び反応系内を5℃以下に保ちながら滴下した。次いで、室温まで温度を上げ室温にて15時間攪拌した。次いで、メタノール0.2Lを加え1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取した。
<Example 14>
[Synthesis of thiophene polymer]
0.03 g of 3,4-ethylenedioxythiophene and 2.05 g of 3-methoxythiophene were placed in a three-necked flask, and 0.1 L of acetonitrile was added to dissolve the thiophenes in the acetonitrile. The atmosphere in the three-necked flask was then replaced with nitrogen and cooled to 0°C. A solution in which 20 g of iron (III) perchlorate n-hydrate [II] was dissolved in 0.1 L of acetonitrile was then added dropwise while maintaining the solution and the reaction system at 5°C or lower. The temperature was then raised to room temperature and the mixture was stirred at room temperature for 15 hours. 0.2 L of methanol was then added and the mixture was stirred for 1 hour. The mixture was then subjected to solid-liquid separation using a centrifuge, and the solid content was collected.
[沈殿処理及びメタノール洗浄]
採取した固形分を、ジメチルホルムアミド100mLに溶解させた。この溶液を攪拌しながら、イソプロピルアルコール1Lを30分間かけて滴下し、固体を徐々に析出させた。次いで、遠心分離機を用いて固液分離し、固形分をビーカーに取り、メタノール50mLを加え、液温を45℃に調整し1時間攪拌した。次いで、遠心分離機を用いて固液分離し、固形分を採取し、減圧下60℃で16時間乾燥し、チオフェン重合体1.9gを得た。メタノール洗浄後のチオフェン重合体の重量平均分子量は3100であった。
[Precipitation and methanol washing]
The collected solid was dissolved in 100 mL of dimethylformamide. While stirring this solution, 1 L of isopropyl alcohol was dropped over 30 minutes to gradually precipitate the solid. Then, solid-liquid separation was performed using a centrifuge, the solid was taken in a beaker, 50 mL of methanol was added, the liquid temperature was adjusted to 45 ° C, and the mixture was stirred for 1 hour. Then, solid-liquid separation was performed using a centrifuge, the solid was collected, and dried at 60 ° C under reduced pressure for 16 hours to obtain 1.9 g of a thiophene polymer. The weight average molecular weight of the thiophene polymer after washing with methanol was 3100.
メタノール洗浄後のチオフェン重合体を用いて、実施例1と同様にして塗工液の調製及び金属光沢層の形成を行った。金属光沢層の厚さは約1.0μmであった。 Using the thiophene polymer after methanol washing, a coating liquid was prepared and a metallic gloss layer was formed in the same manner as in Example 1. The thickness of the metallic gloss layer was approximately 1.0 μm.
<実施例15>
Alフレーク(東洋アルミニウム株式会社)5部及びポリエステル樹脂(バイロン200、東洋紡株式会社)8部をトルエンに分散し、普通上質紙(C2紙、富士ゼロックス株式会社)に塗布したのち、温度60℃下に15分間置いて乾燥させ、厚さ約5.0μmの金属層を形成した。この金属層上に金属光沢層を形成した以外は実施例1と同様にして金属光沢層を形成した。金属光沢層の厚さは約1.0μmであった。
Example 15
Five parts of Al flakes (Toyo Aluminum Co., Ltd.) and eight parts of polyester resin (Vylon 200, Toyobo Co., Ltd.) were dispersed in toluene, applied to ordinary wood-free paper (C2 paper, Fuji Xerox Co., Ltd.), and then dried at a temperature of 60° C. for 15 minutes to form a metal layer having a thickness of about 5.0 μm. A metal layer having a thickness of about 5.0 μm was formed in the same manner as in Example 1, except that a metal layer having a metallic luster was formed on this metal layer. The thickness of the metal layer was about 1.0 μm.
<性能評価>
電子写真方式の複写機DocuCentre-V C6685(富士ゼロックス株式会社)と、トナーカートリッジ「CT202676」(イエロー色)、「CT202675」(マゼンタ色)、「CT202674」(シアン色)、「CT202673」(黒色)及び「CT203318」(金色)(以上、富士ゼロックス株式会社)を用いて、普通上質紙(C2紙、富士ゼロックス株式会社)に各実施例及び各比較例の金属光沢層を複写した。
<Performance evaluation>
Using an electrophotographic copier DocuCentre-V C6685 (Fuji Xerox Co., Ltd.) and toner cartridges “CT202676” (yellow), “CT202675” (magenta), “CT202674” (cyan), “CT202673” (black) and “CT203318” (gold) (all Fuji Xerox Co., Ltd.), the metallic gloss layers of each of the examples and comparative examples were copied onto ordinary high-quality paper (C2 paper, Fuji Xerox Co., Ltd.).
[正反射率の測定]
紫外可視分光光度計UV-2600(株式会社島津製作所)に積分球を取り付け、アルミニウム蒸着ミラーを基準にして、金属光沢層の原物と複写物それぞれの正反射スペクトルを測定した。波長600nmの正反射率(%)を表1に記載する。
[Measurement of regular reflectance]
An integrating sphere was attached to a UV-2600 UV-visible spectrophotometer (Shimadzu Corporation), and the specular reflection spectra of the original and copy of the metallic gloss layer were measured using an aluminum-deposited mirror as a reference. The specular reflectance (%) at a wavelength of 600 nm is shown in Table 1.
[拡散反射率の測定]
紫外可視分光光度計UV-2600(株式会社島津製作所)に積分球を取り付け、硫酸バリウム白板を基準にして、金属光沢層の原物と複写物それぞれの拡散反射スペクトルを測定した。波長600nmの拡散反射率(%)を表1に記載する。
[Measurement of diffuse reflectance]
An integrating sphere was attached to a UV-2600 UV-visible spectrophotometer (Shimadzu Corporation) and the diffuse reflectance spectra of the original and copy of the metallic gloss layer were measured using a barium sulfate white plate as a reference. The diffuse reflectance (%) at a wavelength of 600 nm is shown in Table 1.
[光沢感]
金属光沢層の複写物を目視で観察し、光沢感を下記のとおり分類した。
G1:光沢感がまったくない。
G2:見る角度によっては光沢感がある。
G3:見る角度によらず光沢感がある。
[Glossiness]
The duplicates of the metallic gloss layer were visually observed, and the gloss was classified as follows.
G1: No gloss at all.
G2: Glossy depending on viewing angle.
G3: Glossy regardless of viewing angle.
実施例は、原物と複写物との間で正反射率の差が大きかった。実施例の複写物を目視観察した色味は、黒色に近かった。
比較例は、原物の光沢を複写物が再現しており、複写物の色味は金色から黄色を呈していた。
In the examples, the difference in regular reflectance between the original and the copy was large. The color of the copy in the examples, when visually observed, was close to black.
In the comparative example, the copy reproduced the gloss of the original, and the color of the copy was gold to yellow .
10,20 記録媒体
12,22 基材
14,24 金属光沢層
23 金属層
10, 20 Recording medium 12, 22 Substrate 14, 24 Metallic gloss layer 23 Metal layer
Claims (10)
前記基材上に設けられた、チオフェン重合体を含有する金属光沢層と、を有し、
前記金属光沢層に含まれる前記チオフェン重合体の重量平均分子量が200以上30000以下であり、
前記金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量が前記チオフェン重合体に対して1ppm以上1500ppm以下であり、
Cu原子、Mn原子、Cr原子及びCe原子の含有量が各々0ppmである、
記録媒体。 A substrate;
A metallic luster layer containing a thiophene polymer provided on the substrate,
the weight average molecular weight of the thiophene polymer contained in the metallic luster layer is 200 or more and 30,000 or less;
a total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is 1 ppm or more and 1500 ppm or less with respect to the thiophene polymer,
The contents of Cu atoms, Mn atoms, Cr atoms and Ce atoms are each 0 ppm;
Recording medium.
前記基材上に設けられた、チオフェン重合体を含有する金属光沢層と、を有し、
前記金属光沢層に含まれる前記チオフェン重合体の重量平均分子量が1000以上10000以下であり、
前記金属光沢層におけるFe原子、Cu原子、Mn原子、Cr原子及びCe原子の合計含有量が前記チオフェン重合体に対して1ppm以上100ppm以下である、
記録媒体。 A substrate;
A metallic luster layer containing a thiophene polymer provided on the substrate,
the weight average molecular weight of the thiophene polymer contained in the metallic luster layer is 1,000 or more and 10,000 or less ,
the total content of Fe atoms, Cu atoms, Mn atoms, Cr atoms and Ce atoms in the metallic luster layer is 1 ppm or more and 100 ppm or less with respect to the thiophene polymer;
Recording medium.
前記アルコキシチオフェンが、アルコキシ基の炭素数が1以上6以下であるアルコキシチオフェンを含む、請求項8に記載の記録媒体。 the thiophene polymer contains at least a polymer in which an alkoxythiophene is polymerized,
The recording medium according to claim 8 , wherein the alkoxythiophene includes an alkoxythiophene having an alkoxy group having 1 to 6 carbon atoms.
前記アルキルチオフェンが、アルキル基の炭素数が1以上6以下であるアルキルチオフェンを含む、請求項8又は請求項9に記載の記録媒体。 the thiophene polymer includes a polymer in which at least an alkylthiophene is polymerized,
10. The recording medium according to claim 8 , wherein the alkylthiophene includes an alkylthiophene having an alkyl group having 1 to 6 carbon atoms.
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| JP2000103186A (en) | 1998-09-28 | 2000-04-11 | Dainippon Printing Co Ltd | Certificate sheet and certificate |
| JP2017067912A (en) | 2015-09-29 | 2017-04-06 | 大日本印刷株式会社 | Hologram laminate, information recording medium, and method for manufacturing hologram laminate |
| JP2017110232A (en) | 2012-07-31 | 2017-06-22 | 国立大学法人 千葉大学 | Film with metallic sheen, article by forming the same and manufacturing method of film with metallic sheen |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2000103186A (en) | 1998-09-28 | 2000-04-11 | Dainippon Printing Co Ltd | Certificate sheet and certificate |
| JP2017110232A (en) | 2012-07-31 | 2017-06-22 | 国立大学法人 千葉大学 | Film with metallic sheen, article by forming the same and manufacturing method of film with metallic sheen |
| JP2017067912A (en) | 2015-09-29 | 2017-04-06 | 大日本印刷株式会社 | Hologram laminate, information recording medium, and method for manufacturing hologram laminate |
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