JP7578271B2 - X-ray diffraction measurement device, X-ray diffraction measurement system, and diffraction ring imaging method - Google Patents

Description

The present invention relates to an X-ray diffraction measurement device, an X-ray diffraction measurement system, and a diffraction ring imaging method that irradiate an object to be measured with X-rays and image a diffraction ring on an imaging plane using diffracted X-rays generated by the object to be measured.

Conventionally, there has been known an X-ray diffraction measurement device that irradiates an object to be measured with X-rays, images a diffraction ring, which is an image of the diffracted X-rays, on an imaging surface using the diffracted X-rays generated by the object to be measured, and performs calculation processing using the shape data of the diffraction ring by the cos α method to measure characteristic values such as residual stress of the object to be measured. For example, as shown in Patent Document 1, an X-ray diffraction measurement device having a function of imaging a diffraction ring and a function of reading the imaged diffraction ring is known as such an X-ray diffraction measurement device. The device shown in Patent Document 1 has an X-ray emitter, a diffraction ring imaging means such as an imaging plate, a diffraction ring reading means such as a laser detection device, and a laser scanning means such as a moving mechanism and a rotating mechanism, and a diffraction ring erasing means such as an LED irradiator, all in one housing. The device is capable of continuously performing an imaging process in which a diffraction ring is imaged on an imaging plate using diffracted X-rays generated by irradiating the object to be measured with X-rays, a reading process in which the shape of the diffraction ring is detected by irradiating the imaging plate with a laser light from a laser detection device while scanning it, and an erasing process in which the diffraction ring is erased by irradiating the imaging plate with LED light. This X-ray diffraction measurement device is small and lightweight, so it can be transported to the location of the object to be measured and measurements can be performed in a short time.

There are various objects that can be used for X-ray diffraction measurement, including those with large crystal grains. In such objects, the diffraction surface does not exist uniformly in all directions, and the intensity of the diffracted X-rays in a specific direction in which the diffraction ring is imaged from the X-ray irradiation point may be low. In such cases, the diffraction ring imaged may be discontinuous or partially unclear. As an X-ray diffraction measurement device that addresses this problem, there is an X-ray diffraction measurement device such as that shown in Patent Document 2, which has a mechanism for swinging the housing of the device in multiple directions, and irradiates X-rays while swinging the housing with the X-ray irradiation point as the center of the swing to image the diffraction ring. With this X-ray diffraction measurement device, the intensity of the diffracted X-rays is high in most directions in the direction in which the diffraction ring is imaged from the X-ray irradiation point, and a continuous and clear diffraction ring can be imaged.

Patent No. 5835191 Patent No. 6195140

However, the present inventors have measured various measurement objects using the X-ray diffraction measurement device shown in Patent Document 2, and have confirmed that even when there is almost no residual stress, the diffraction ring captured may deform from a perfect circle, that is, the diffraction ring captured may deviate from a perfect circle due to factors other than residual stress. The present inventors have also confirmed that the same phenomenon occurs even when the housing of the X-ray diffraction measurement device is swung in only one direction. Therefore, even if the diffraction ring is captured by swung the housing of the X-ray diffraction measurement device in multiple directions and a continuous and clear diffraction ring is captured, there is a problem that the residual stress cannot be measured with high accuracy depending on the measurement object.

The present invention has been made to solve this problem, and its purpose is to provide an X-ray diffraction measurement device, X-ray diffraction measurement system, and diffraction ring imaging method that irradiates a measurement object with X-rays and images a diffraction ring on an imaging plane using diffracted X-rays generated by the measurement object, in which the housing of the X-ray diffraction measurement device is swung in multiple directions to image the diffraction ring, thereby imaging a continuous and clear diffraction ring, and in which deviations from a perfect circle of the imaged diffraction ring can be attributed almost entirely to residual stress.

In order to achieve the above object, the present invention is characterized in that the X-ray diffraction measurement device includes an X-ray emitting means for emitting X-rays toward a target object to be measured, a diffraction ring imaging means for receiving diffracted X-rays generated in the object to be measured when X-rays are irradiated from the X-ray emitting means toward the object to be measured on an imaging plane that perpendicularly intersects with the optical axis of the X-rays emitted from the X-ray emitting means and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane, and a housing that incorporates the X-ray emitting means and the diffraction ring imaging means, the device further includes a rocking means for rocking the housing about a rotation axis perpendicular to the optical axis of the X-rays, a rotation axis position changing means for changing the position of the rotation axis of the rocking means relative to the object to be measured, and a rotation axis position changing means arranged in front of the imaging plane as viewed from the object to be measured. The X-ray diffraction measurement device is provided with a mask having a surface parallel to the imaging surface and a passage opening for passing a portion of the diffracted X-rays, the center line of the passage opening passing through the optical axis of the X-rays, a passage opening position changing means for changing the position of the mask passage opening relative to the measurement object, and a swing rotation axis-pass opening relationship fixing means for changing the position of the rotation axis of the swing means by the rotation axis position changing means and changing the position of the mask passage opening by the passage opening position changing means, so that the center line of the mask passage opening is always included in a plane that includes the optical axis of the X-rays and is perpendicular to the rotation axis of the swing means while keeping the rotation position of the imaging surface relative to the measurement object around the optical axis of the X-rays.

According to this, when X-rays are emitted from the X-ray emission means and a diffraction ring is imaged on the imaging surface by the diffraction ring imaging means, the housing of the X-ray diffraction measurement device is swung by the swinging means, the position of the rotation axis of the swinging means is changed by the rotation axis position changing means, the position of the mask's passage opening is changed by the passage opening position changing means, and further, the swing rotation axis-pass opening relationship fixing means fixes the rotation position of the imaging surface around the optical axis of the X-rays relative to the measurement object, and the center line of the mask's passage opening is always included in a plane that includes the optical axis of the X-rays and is perpendicular to the rotation axis of the swinging means. The applicant of the present application performed X-ray diffraction measurements on various measurement objects in this manner and confirmed that this X-ray diffraction measurement device can image continuous and clear diffraction rings and that deviations from a perfect circle of the imaged diffraction rings can be attributed almost entirely to residual stress. That is, when the housing of the X-ray diffraction measurement device is swung to capture an image of a diffraction ring, the cause of the deviation of the imaged diffraction ring from a perfect circle due to factors other than residual stress is confirmed to be that the direction of the line where the plane perpendicular to the rotation axis of the swing intersects with the imaging plane (hereinafter referred to as the swing direction) does not match the radial direction of the imaged diffraction ring. If the radial direction and swing direction of the imaged diffraction ring are significantly different, if the intensity of the diffracted X-rays is high at a specific swing angle, the X-ray intensity curve in the radial direction of the diffraction ring will not have a clear peak position distribution like a Gaussian distribution, and the peak position cannot be determined accurately, so the diffraction ring will deviate significantly from a perfect circle. Therefore, if the housing is swung to capture an image of a diffraction ring using the above-mentioned X-ray diffraction measurement device, the radial direction and swing direction of the imaged diffraction ring will be almost the same direction, and even if the intensity of the diffracted X-rays is high at a specific swing angle, the peak position of the X-ray intensity curve in the radial direction of the diffraction ring can be determined accurately, and the deviation of the imaged diffraction ring from a perfect circle will be mostly due to residual stress.

Another feature of the present invention is that it is provided with an imaging surface rotation means for rotating the imaging surface around the optical axis of the X-rays, the oscillating portion of the oscillating means and the mask are integrated with the housing, the rotation axis position change means and the passage opening position change means are housing rotation means for rotating the housing around the optical axis of the X-rays, and the oscillating rotation axis-passage opening relationship fixing means is a control means for controlling the rotation by the imaging surface rotation means and the rotation by the housing rotation means to be equal in amount and opposite in direction.

According to this, even if the housing is rotated by the housing rotation means, the imaging surface is rotated by the same amount in the opposite direction by the imaging surface rotation means, so the rotation position of the imaging surface around the optical axis of the X-rays relative to the measurement object is fixed. And, since the oscillating part of the oscillating means and the mask are integrated with the housing, the relationship between the position of the rotation axis of the oscillating means and the position of the mask passage opening is fixed. That is, according to this, even without providing a mechanism for rotating the rotation axis of the oscillating means without rotating the housing or a mechanism for rotating the mask placed in front of the imaging surface, it is possible to fix the rotation position of the imaging surface around the optical axis of the X-rays relative to the measurement object, fix the relationship between the position of the rotation axis of the oscillating means and the position of the mask passage opening, and change the position of the rotation axis of the oscillating means and the position of the passage opening. Therefore, since the additional mechanism is not complicated, the cost increase of the device can be suppressed.

Another feature of the present invention is that the X-ray emitting means includes an X-ray tube that emits X-rays and a group of through holes that pass the X-rays emitted from the X-ray tube to convert them into approximately parallel light, the imaging surface is an imaging plate that is fixed to a table with a through hole that is one of the through holes formed in the center, the imaging surface rotating means is a motor with an output shaft that rotates the table around the central axis of the through holes by rotating, the motor is arranged so that the central axis of the output shaft coincides with the central axis of the through holes, and a through hole that is one of the through holes is formed on the output shaft, and the X-ray diffraction measurement device includes a laser detection device that irradiates the imaging plate with laser light and detects the intensity of the light emitted from the imaging plate by the irradiation of the laser light, a moving means that moves the table relative to the laser detection device in a direction parallel to the imaging plate, and a data reading means that captures the light intensity repeatedly detected by the laser detection device at the same timing as the rotation angle of the motor and the moving position of the moving means while the table is rotated by the motor and moved by the moving means, and obtains diffraction ring reading data.

According to this, a means for rotating the imaging plate, which is the imaging surface, is provided as one of the means for reading the imaged diffraction ring, so there is no need to provide a new means for rotating the imaging surface in order to implement the present invention, and an increase in the cost of the device can be suppressed. In other words, by applying the present invention to the X-ray diffraction measurement device shown in the prior art document Patent Document 1, an increase in the cost of the device can be suppressed.

Another feature of the present invention is an X-ray emitting means for emitting X-rays toward a target object to be measured, a diffraction ring imaging means for receiving diffracted X-rays generated in the object when X-rays are irradiated from the X-ray emitting means toward the object to be measured on an imaging plane that perpendicularly intersects with the optical axis of the X-rays emitted from the X-ray emitting means and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane, a housing incorporating the X-ray emitting means and the diffraction ring imaging means, a rocking means for rocking the housing around a rotation axis perpendicular to the optical axis of the X-rays, the rocking part being integral with the housing, and a mask that is disposed integral with the housing in front of the imaging plane as viewed from the object to be measured, has a surface parallel to the imaging plane, and has a passage opening for passing part of the diffracted X-rays. In the X-ray diffraction measurement system including an X-ray diffraction measurement device having a mask whose center line of the passage opening passes through the optical axis of the X-rays and an imaging surface rotation means for rotating the imaging surface around the optical axis of the X-rays, and a stage device having a stage on which a measurement object is placed and a stage rotation means for rotating the stage, the X-ray diffraction measurement system is provided with a position and orientation adjustment means for adjusting the position and orientation of the stage of the stage device relative to the housing of the X-ray diffraction measurement device, and a control means for controlling the rotation amount and direction of the rotation by the stage rotation means and the rotation by the imaging surface rotation means to be equal when the stage is rotated by the stage rotation means and the imaging surface is rotated by the imaging surface rotation means.

According to this, by adjusting the position and attitude of the stage of the stage device relative to the housing of the X-ray diffraction measurement device by the position and attitude adjustment means, it is possible to match the position of the optical axis of the X-rays with the position of the rotation axis of the stage rotation means. Then, in this state, by rotating the stage by the stage rotation means and further rotating the imaging plane by the imaging plane rotation means so that the amount of rotation and the direction of rotation by the stage rotation means are equal, when viewed with the measurement object as a reference, the rotation position of the imaging plane about the optical axis of the X-rays relative to the measurement object is fixed, and the relationship between the position of the rotation axis of the oscillation means and the position of the mask passage opening is fixed, and the position of the rotation axis of the oscillation means and the position of the passage opening can be changed. Therefore, this also provides the same effect as the X-ray diffraction measurement device described above.

Another feature of the present invention is an X-ray diffraction measurement device comprising: an X-ray emitting means for emitting X-rays toward a target object to be measured; a diffraction ring imaging means for receiving diffracted X-rays generated in the object to be measured when X-rays are irradiated from the X-ray emitting means toward the object to be measured on an imaging plane that perpendicularly intersects with the optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane; a housing that incorporates the X-ray emitting means and the diffraction ring imaging means; a mask that is arranged in front of the imaging plane when viewed from the object to be measured, has a surface parallel to the imaging plane, and has a passage opening that allows a portion of the diffracted X-rays to pass, the center line of the passage opening passing through the optical axis of the X-rays; and an imaging plane rotation means for rotating the imaging plane around the optical axis of the X-rays; and a stage on which the object to be measured is placed. In an X-ray diffraction measurement system including a stage device equipped with a stage rotation means for rotating the stage and a rocking means for rocking the stage together with the stage rotation means around a rotation axis perpendicular to the rotation axis of the stage rotation means, such that when a measurement object is placed on the stage, the rotation axis of the rocking means is included in the plane of the measurement object, the X-ray diffraction measurement system is equipped with a position and orientation adjustment means for adjusting the position and orientation of the stage of the stage device relative to the housing of the X-ray diffraction measurement device, and a control means for controlling the amount and direction of rotation by the stage rotation means and the rotation by the imaging plane rotation means to be equal when the stage is rotated by the stage rotation means and the imaging plane is rotated by the imaging plane rotation means.

In this way, in the X-ray diffraction measurement system described above, the rocking means is simply changed from a means for rocking the housing to a means for rocking the stage, and when viewed from the perspective of the measurement object, the rotational position of the imaging surface relative to the measurement object around the optical axis of the X-rays is fixed, and the relationship between the position of the rotation axis of the rocking means and the position of the mask passage opening is fixed, making it possible to change the position of the rotation axis of the rocking means and the position of the passage opening. Therefore, this also makes it possible to obtain the same effect as the X-ray diffraction measurement system described above.

Another feature of the present invention is an X-ray diffraction measurement device comprising: an X-ray emitting means for emitting X-rays toward a target object to be measured; a diffraction ring imaging means for receiving diffracted X-rays generated in the object to be measured when X-rays are irradiated from the X-ray emitting means toward the object to be measured on an imaging plane that perpendicularly intersects with the optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane; a housing that incorporates the X-ray emitting means and the diffraction ring imaging means; a mask that is arranged in front of the imaging plane as viewed from the object to be measured, has a surface parallel to the imaging plane, and has a passage opening that allows a portion of the diffracted X-rays to pass, the center line of the passage opening passing through the optical axis of the X-rays; and a mask rotation means for rotating the mask around the optical axis of the X-rays; and a stage on which the object to be measured is placed, a stage rotation means for rotating the stage, and a rotation axis of the stage rotation means for rotating the stage together with the stage rotation means. In an X-ray diffraction measurement system including a stage device equipped with a rocking means for rocking the stage around a rotation axis perpendicular to the stage, the rotation axis of the rocking means being included in the plane of the measurement object when the measurement object is placed on the stage, and a rocking rotation means for rotating the rocking means around the same rotation axis as the stage rotation means, the X-ray diffraction measurement system is equipped with a position and orientation adjustment means for adjusting the position and orientation of the stage of the stage device relative to the housing of the X-ray diffraction measurement device, and a control means for controlling the rotation amount and the rotation direction of the image plane rotation means to be equal and opposite to each other, and the rotation amount and the direction of the rotation of the stage rotation means to be equal and opposite to each other, when the stage rotation means rotates the stage, the rocking rotation means rotates the rocking means, and the mask rotation means rotates the mask.

According to this, by adjusting the position and attitude of the stage of the stage device relative to the housing of the X-ray diffraction measurement device by the position and attitude adjustment means, it is possible to match the position of the optical axis of the X-rays with the position of the rotation axis of the stage rotation means. Then, in this state, the stage is rotated by the stage rotation means, the imaging surface rotation means rotates the oscillating means so that the rotation amount is equal to the rotation amount by the stage rotation means and the rotation direction is opposite, and further the mask is rotated by the mask rotation means so that the rotation amount is equal to the rotation amount by the stage rotation means and the rotation direction is equal to the rotation amount by the stage rotation means. When viewed with the measurement object as a reference, the rotation position of the imaging surface around the optical axis of the X-rays relative to the measurement object is fixed, and the relationship between the position of the rotation axis of the oscillating means and the position of the mask passage opening is fixed, and the position of the rotation axis of the oscillating means and the position of the passage opening can be changed. Therefore, this also provides the same effect as the above-mentioned X-ray diffraction measurement system.

The present invention can also be implemented as a diffraction ring imaging method in which X-rays are emitted from an X-ray emission means toward a measurement object, diffracted X-rays generated in the measurement object are received on an imaging plane that intersects perpendicularly with the optical axis of the emitted X-rays, and a diffraction ring, which is an image of the diffracted X-rays, is imaged on the imaging plane. When imaging the diffraction ring, the X-ray emission means and the imaging plane are swung together relative to the measurement object around an axis that passes through the X-ray irradiation point on the measurement object and is perpendicular to the optical axis of the X-rays as the axis of rotation, and the position of the axis of rotation is adjusted relative to the measurement object. The invention can also be implemented as a diffraction ring imaging method in which the position of the mask is changed relative to the object to be measured, the mask is placed in front of the imaging plane as viewed from the object to be measured, has a surface parallel to the imaging plane, and has a passage opening that allows some of the diffracted X-rays to pass, and the position of the mask passage opening is changed relative to the object to be measured, with the rotational position of the imaging plane relative to the object to be measured about the optical axis of the X-rays being fixed, and the center line of the mask passage opening is always included in a plane that includes the optical axis of the X-rays and is perpendicular to the axis of rotation of the oscillation.

1 is an overall schematic diagram showing an X-ray diffraction measurement system including an X-ray diffraction measurement device according to an embodiment of the present invention. FIG. 2 is an enlarged view of the X-ray diffraction measurement device of FIG. 1. 3 is an enlarged partial cross-sectional view showing an X-ray emission mechanism portion of the X-ray diffraction measurement apparatus of FIG. 2. 3 is a diagram showing a portion of the X-ray diffraction measurement apparatus of FIG. 2 from which the X-ray exits the apparatus, as viewed from the direction of the optical axis of the emitted X-ray. FIG. 4 is an enlarged perspective view showing a portion of FIG. 3 that emits visible LED light having the same optical axis as the emitted X-rays. 11 is a diagram showing a comparison between the rotational position of the X-ray diffraction measurement device when capturing an image of a diffraction ring and the position of the mask passage opening relative to the imaging plane. FIG. FIG. 13 is an enlarged view of an X-ray diffraction measurement apparatus and a stage device according to another embodiment of the present invention.

First Embodiment
The configuration of an X-ray diffraction measurement system including an X-ray diffraction measurement device according to an embodiment of the present invention will be described with reference to Figures 1 to 5. The X-ray diffraction measurement device is different from the X-ray diffraction measurement device shown in Patent Document 1 of the prior art document in the points related to the present invention in that the device is provided with a mechanism for swinging and rotating the housing 50 of the X-ray diffraction measurement device, that a mask 100 having an opening is attached to the X-ray emission part of the housing 50 of the X-ray diffraction measurement device, and that the device is provided with a control function for rotating the imaging plate 15 by the same amount of rotation in the opposite direction to the rotation direction of the housing 50 of the X-ray diffraction measurement device when swinging and rotating the housing 50 of the X-ray diffraction measurement device. In addition, since the present embodiment is based on the X-ray diffraction measurement device developed by the applicant of the present application in order to miniaturize the X-ray diffraction measurement device shown in Patent Document 1, there are also points that are different from the X-ray diffraction measurement device shown in Patent Document 1 even in points that are not directly related to the present invention. Below, parts that have the same function and structure as the X-ray diffraction measurement system shown in Patent Document 1 will be simply described, and parts that differ will be described in detail.

As shown in Figures 1 and 2, this X-ray diffraction measurement system is composed of an X-ray diffraction measurement device 1, a swinging and rotating mechanism 5, a computer device 90, a high-voltage power supply 95, and an arm-type moving device (only the tip 59 is shown). This X-ray diffraction measurement system adjusts the position and posture of the X-ray diffraction measurement device 1 relative to the measurement object OB by operating the arm-type moving device, irradiates X-rays from the X-ray diffraction measurement device 1 to capture an image of a diffraction ring, reads the captured diffraction ring, and measures the residual stress of the measurement object OB from its shape. In addition, this X-ray diffraction measurement system is configured to swing and rotate the X-ray diffraction measurement device 1 by the swinging and rotating mechanism 5 when capturing an image of the diffraction ring. In the following description, the direction perpendicular to the paper surface of Figures 1 and 2 is the X-axis direction, the horizontal direction is the Y-axis direction, and the vertical direction is the Z-axis direction.

1 and 2, the X-ray diffraction measurement device 1 includes an X-ray tube 10, a table 16 for mounting an imaging plate 15, a table drive mechanism 20 for rotating and moving the table 16, and a laser detection device 30 for detecting diffraction rings, all housed within a housing 50. The X-ray diffraction measurement device 1 also includes various circuits connected to the X-ray tube 10, the table drive mechanism 20, and the laser detection device 30, for controlling their operation and inputting detection signals, and the various circuits enclosed by a two-dot chain line shown outside the housing 50 in FIG. 1 are contained within the two-dot chain line within the housing 50. These various circuits are connected to a computer device 90 and operate according to commands input from a controller 91 of the computer device 90. The computer device 90 has an input device 92 and a display device 93, and outputs commands to the various circuits described above according to input from the input device 92 and the operation of the installed program, and also inputs data output by the various circuits and stores them in memory. As shown in FIG. 1, the X-ray diffraction measurement system includes a high-voltage power supply 95, which outputs a voltage and a current to the X-ray tube 10 for the X-ray tube 10 to emit X-rays. This configuration is the same as that of the X-ray diffraction measurement system shown in Patent Document 1.

2, the housing 50 of the X-ray diffraction measurement device 1 is formed to have a bottom wall 50a, a front wall 50b, a rear wall 50e, a top wall 50f, a side wall (not shown), a cutout wall 50c and a connecting wall 50d that cut out the corners of the bottom wall 50a and the front wall 50b from the front side to the back side of the paper, and an inclined wall 50g that eliminates the corners of the rear wall 50e and the top wall 50f. The cutout wall 50c consists of a flat plate that forms a predetermined angle with the bottom wall 50a and a flat plate that is approximately parallel to the bottom wall 50a, and the connecting wall 50d is perpendicular to the side wall and forms a predetermined angle with the front wall 50b. This predetermined angle is, for example, 30 to 40 degrees, and since the X-rays emitted from the X-ray diffraction measurement device 1 are approximately parallel to the front wall 50b and the side wall, when the position of the housing 50 of the X-ray diffraction measurement device 1 is adjusted so that the connecting wall 50d is parallel to the surface of the measurement object OB, the angle of incidence of the X-rays on the measurement object OB becomes equal to this predetermined angle. The cutout wall 50c has a circular hole 50c1, and when imaging the diffraction ring, the X-rays are emitted through this circular hole 50c1, and the diffracted X-rays generated in the measurement object OB are imaged through this circular hole 50c1. Note that a mask 100 is attached to the cutout wall 50c, which allows only a portion of the circular hole 50c1 to pass the diffracted X-rays, and the diffraction ring imaged is only a portion of the whole. Details of this part will be described later.

The controller 91 of the computer device 90 is an electronic control device whose main component is a microcomputer equipped with a CPU, ROM, RAM, large-capacity storage device, etc., and in response to commands input from the input device 92, executes a program stored in the large-capacity storage device to control the operation of the X-ray diffraction measurement device 1, and performs calculations using the input digital data to calculate characteristic values such as residual stress and create a distribution map of diffracted X-ray intensity. The controller 91 also displays on the display device 93 the measurement conditions and operating status of the X-ray diffraction measurement system input from the input device 92, as well as the characteristic values and distribution map obtained as a result of the calculations. The configuration and functions of the computer device 90 are the same as those of the X-ray diffraction measurement system shown in Patent Document 1.

1 and 2, the X-ray tube 10 is fixed in the upper part of the housing 50, extending in the left-right direction in the figure. This fixing is performed after positioning by fitting the side of the X-ray tube 10 into a groove shaped like a part of the cylindrical side formed in the plate-shaped plate 26 of the table driving mechanism 20 described later. When the X-ray tube 10 receives a high voltage from the high-voltage power supply 95, it emits X-rays in the downward direction in the figure from the circular emission port 11 formed on its side. As shown in FIG. 3, a through hole 26a is formed at the part of the plate-shaped plate 26 that meets the emission port 11, and the X-rays emitted from the emission port 11 pass through the through hole 26a and proceed downward. When a command is input from the controller 91, the X-ray control circuit 71 controls the drive current and drive voltage supplied from the high-voltage power supply 95 to the X-ray tube 10 so that the X-ray tube 10 emits X-rays of a constant intensity. The X-ray tube 10 also includes a cooling device (not shown), and the X-ray control circuit 71 also controls the drive signal supplied to this cooling device.

2, the table drive mechanism 20 is fixed to the housing 50 and has a moving stage 21 below the X-ray tube 10. The moving stage 21 has a convex portion on the opposite side of the drawing, which fits into a groove in the block 19 fixed to the plate 26 of the table drive mechanism 20 and the plate-shaped guide 25 fixed to the block 29. As a result, the moving stage 21 can only move in the direction of the groove in the plate-shaped guide 25, and moves when the feed motor 22 fixed to the block 19, the screw rod 23, and the bearing part 24 fixed to the block 29 rotate. This moving direction is the central axis direction of the X-ray tube 10, or in other words, a direction perpendicular to the optical axis of the emitted X-ray and parallel to the side wall of the housing 50. An encoder 22a is built into the feed motor 22, and when the feed motor 22 rotates, the encoder 22a outputs a pulse train signal to the position detection circuit 72 and the feed motor control circuit 73 shown in FIG. 1.

The position detection circuit 72 and the feed motor control circuit 73 operate according to a command from the controller 91, and the position detection circuit 72 counts the pulse train signal from the encoder 22a to output the movement position, which is the movement distance with the movement limit position as the origin, to the feed motor control circuit 73 and the controller 91. The feed motor control circuit 73 also outputs a drive signal to the feed motor 22 until the movement position input from the controller 91 becomes equal to the movement position input from the position detection circuit 72. Furthermore, when the movement direction and movement speed are input from the controller 91, the feed motor control circuit 73 controls the strength of the drive signal so that the movement speed calculated from the pulse train signal from the encoder 22a becomes the input movement speed. Due to these functions of the position detection circuit 72 and the feed motor control circuit 73, when the controller 91 outputs a command, the moving stage 21 and the spindle motor 27, table 16, imaging plate 15, etc. integrated with the moving stage 21 move to the diffraction ring imaging position, diffraction ring reading position, and diffraction ring erasing position, and move at the movement speed specified in the movement direction specified by the controller 91. These functions are the same as those of the X-ray diffraction measurement system shown in Patent Document 1.

When the moving stage 21 is in the diffraction ring imaging position by the command of the controller 91, as shown in FIG. 3, the X-rays emitted from the exit port 11 of the X-ray tube 10 and passing through the through hole 26a of the plate-shaped plate 26 proceed in the direction of the rotating plate 45. As described later, the rotating plate 45 is connected to the output shaft 46a of the motor 46, and the position is changed by the rotation of the motor 46, so that the rotating plate 45 can be prevented from being in the direction of travel of the X-rays emitted from the through hole 26a. In this state, the X-rays that have passed through the through hole 26a enter the through hole 21a formed in the moving stage 21. The X-rays that have entered the through hole 21a pass through the through hole 28a of the passage member 28 fixed to the tip of the through hole 27b formed in the spindle motor 27 fixed to the moving stage 21. A through hole 27a1 is formed in the output shaft 27a of the spindle motor 27, and the through hole 27b is connected to the through hole 27a1 with its central axis aligned. Therefore, X-rays that pass through through-hole 28a pass through through-hole 27b and through-hole 27a1.

The table 16 is disk-shaped, and is fixed to the output shaft 27a of the spindle motor 27 so that the through hole 16a formed in the central axis of the table 16 is aligned with the through hole 27a1 of the output shaft 27a of the spindle motor 27. The table 16 has a protrusion 17 that protrudes downward from the center of the bottom surface around the central axis, and the outer circumferential surface of the protrusion 17 is formed with a screw thread. The imaging plate 15 is attached to the bottom surface of the table 16 so that the through hole 15a fits into the protrusion 17, and the imaging plate 15 is fixed to the table 16 by screwing a nut-shaped fixing device 18 onto the outer circumferential surface of the protrusion 17. The protrusion 17 also has a through hole 17a formed to be aligned with the through hole 27a1 and the through hole 16a, and the fixing device 18 has a through hole 18a of approximately the same diameter as the through hole 28a of the passage member 28. Therefore, the X-rays that pass through the through holes 27b and 27a1 pass through the through holes 16a, 17a, and 18a, become approximately parallel X-rays, and are emitted from the circular hole 50c1 of the housing 50. As described above, the structure in which the X-rays emitted from the X-ray tube 10 pass through the through holes is the same as that of the X-ray diffraction measurement device shown in Patent Document 1.

Figure 4 is a view of the state in which the mask 100 is attached to the circular hole 50c1 portion of the housing 50, viewed from the optical axis direction of the emitted X-rays. As shown in Figure 4, the mask 100 has passage openings 100a, 100b, and 100c formed therein, and the X-rays emitted from the through hole 18a are emitted from the circular hole 50c1 by passing through the passage opening 100c, but only the diffracted X-rays generated by the measurement object OB that pass through the passage openings 100a and 100b are received by the imaging plate 15. Therefore, the diffraction rings imaged by the imaging plate 15 are only those corresponding to the passage openings 100a and 100b. The center lines of the passage openings 100a and 100b pass through the optical axis of the X-rays and are parallel to the line of the rotation angle 0 of the imaging plate 15. Therefore, when the X-ray diffraction measurement device 1 is in the state shown in FIG. 2 (the optical axis of the X-ray and the normal to the X-ray irradiation point are on the YZ plane) and the imaging plate 15 is in a state of rotation angle 0, the diffraction ring is imaged only near 0° and near 180°. The circumferential width of the passage openings 100a and 100b can be determined appropriately, but in FIG. 4, the width is set to 30° as an example. In addition, the rotation axis of the oscillation of the oscillation rotation mechanism 5 described later intersects perpendicularly with the optical axis of the emitted X-ray and is perpendicular to the direction of the center line of the passage openings 100a and 100b of the mask 100. Therefore, the center lines of the passage openings 100a and 100b of the mask 100 are parallel to a plane perpendicular to the rotation axis of the oscillation means, in other words, the direction of the center line of the passage openings 100a and 100b of the mask 100 coincides with the oscillation direction of the oscillation rotation mechanism 5.

As shown in FIG. 4, the cutout wall 50c is provided with fittings 101 and 102 with an L-shaped cross section for mounting the mask 100. The fittings 101 and 102 have stoppers at their left ends in FIG. 4, and when mounting the mask 100 in the circular hole 50c1, the two edges of the mask 100 are inserted into the grooves of the fittings 101 and 102 and slid until the stoppers stop the mask 100 from moving. When slid all the way to the end, the passage openings 100a, 100b, and 100c of the mask 100 are in the appropriate positions. The mask 100 can be mounted and removed, and the X-ray diffraction measurement system of this embodiment can perform measurements similar to those of the X-ray diffraction measurement system shown in Patent Document 1 in addition to measurements according to the present invention.

An encoder 27c is incorporated in the spindle motor 27, and the encoder 27c outputs a pulse train signal to the spindle motor control circuit 74 and the rotation angle detection circuit 75 shown in FIG. 1. Furthermore, the encoder 27c outputs an index signal to the rotation angle detection circuit 75 and the controller 91 every time the spindle motor 27 rotates once. When the spindle motor control circuit 74 receives the rotation speed from the controller 91, it outputs a drive signal to the spindle motor 27 so that the rotation speed calculated from the pulse train signal input from the encoder 27c becomes the input rotation speed. In addition, the rotation angle detection circuit 75 sets the rotation angle to 0 at the timing when the index signal is input from the encoder 27c, and then calculates the rotation angle from the number of pulses of the input pulse train signal and outputs it to the controller 91. As a result, the table 16 rotates at the specified rotation speed in response to a command from the controller 91, and the rotation angle data is input to the controller 91. These functions are the same as those of the X-ray diffraction measurement system shown in Patent Document 1. The position of the 0° rotation angle of the imaging plate 15 is the position where the laser light is irradiated at the time when the index signal is input when reading the diffraction ring imaged on the imaging plate 15 by the laser irradiation from the laser detection device 30 described later, and this position is a line because it is at each radial position of the imaging plate 15. Then, when the moving stage 21 moves, the central axis of the imaging plate 15 moves in a direction perpendicular to the optical axis of the emitted X-ray while being kept within the plane formed by the optical axis of the emitted X-ray and the line of the 0° rotation angle on the imaging plate 15. Hereinafter, the plane formed by the optical axis of the emitted X-ray and the line of the 0° rotation angle on the imaging plate 15 is referred to as the reference plane. The reference plane is the YZ plane in Figures 1 and 2.

1, the laser detection device 30 is controlled by the laser detection control circuit 77, which irradiates the imaging plate 15 that has captured the diffraction ring with laser light, and detects the intensity of the diffracted X-rays at the laser light irradiation position from the intensity of the light emitted from the imaging plate 15. When the moving stage 21 reaches the diffraction ring reading position by a command from the controller 91 and the spindle motor 27 and the feed motor 22 start rotating, a command is input from the controller 91 to the laser detection control circuit 77, which controls the laser detection device 30 to emit laser light, control the intensity of the emitted laser light, focus control of the laser light irradiation point on the imaging plate 15, and output the emission intensity at the imaging plate 15 to the controller 91. The structure of the laser detection device 30 is the same as that of the X-ray diffraction measurement system shown in Patent Document 1 of the prior art document, and the function of the laser detection control circuit 77 is the same as that of Patent Document 1. In the X-ray diffraction measurement system shown in Patent Document 1, the laser detection control circuit 77 is shown divided into several circuits for each of the above-mentioned controls. After outputting commands to the laser detection control circuit 77, spindle motor control circuit 74, and feed motor control circuit 73, the controller 91 captures the emission intensity data input from the laser detection control circuit 77 at the same timing as the digital data output from the position detection circuit 72 and rotation angle detection circuit 75. As a result, the controller 91 stores the intensity data of the diffracted X-rays in the captured diffraction ring, along with the travel distance data and rotation angle data. This is the diffraction ring reading function, and this function is the same as that of the X-ray diffraction measurement system shown in Patent Document 1.

As shown in FIG. 2, the laser detection device 30 is provided with an LED light source 43, which is controlled by an LED drive circuit 84 shown in FIG. 1 to emit visible light and erase the diffraction ring imaged on the imaging plate 15. After the diffraction ring is read, when the moving stage 21 returns to a predetermined position and resumes movement while the table 16 continues to rotate in response to a command from the controller 91, a command is input from the controller 91 to the LED drive circuit 84, which outputs a drive signal that causes the LED light source 43 to emit visible light of a predetermined intensity. This is the diffraction ring erasing function, and this function is also the same as that of the X-ray diffraction measurement system shown in Patent Document 1.

As shown in FIG. 3, the moving stage 21 has a motor 46 attached to the surface facing the plate-like plate 26, and the motor 46 has a rotating plate 45 attached to the output shaft 46a. FIG. 5 is an enlarged perspective view of the motor 46 and the rotating plate 45. The rotating plate 45 has an LED light source 44 attached so that when the rotating plate 45 rotates until it hits the stopper 47a due to the rotation of the motor 46, the LED light source 44 is attached so that the intersection point between the central axis of the through holes 26a, 21a and the rotating plate 45 becomes the center. When a drive signal is input from the LED drive circuit 85 shown in FIG. 1, the LED light source 44 emits visible light, and the visible light is emitted along the same optical path as the optical path of the emitted X-ray described above and irradiated to the measurement object OB. This allows the optical axis of the emitted X-ray and the irradiation point of the X-ray to be grasped as the optical axis and irradiation point of the visible light. Also, when the rotation plate 45 rotates until it hits the stopper 47b due to the rotation of the motor 46, there is nothing between the through hole 26a and the through hole 21a, and the X-ray emitted from the through hole 26a enters the through hole 21a as described above. The motor 46 rotates in the D1 direction and the D2 direction shown in FIG. 5 by a drive signal from the motor control circuit 86 shown in FIG. 1, and when a command for the rotation direction is input from the controller 91, the motor control circuit 86 outputs a drive signal for rotating in the input rotation direction until the pulse train signal from the encoder 46b of the motor 46 is no longer input. Also, when a command is input from the controller 91, the LED drive circuit 85 outputs a drive signal to the LED light source 44. As a result, the rotation position of the rotation plate 45 and the visible light irradiation from the LED light source 44 are controlled by the controller 91. The structure and control method for irradiating visible light with the same optical axis as the optical axis of the emitted X-ray are the same as those of the X-ray diffraction measurement system shown in Patent Document 1, except for the attachment location of the motor 46.

2 and 4, a camera CA is attached to the cutout wall 50c of the housing 50. The camera CA is composed of a lens barrel to which an imaging lens 48 is attached and an imager 49, and the imager 49 is provided at a location where an image is formed by the imaging lens 48. The imager 49 is composed of a CCD light receiver or a CMOS light receiver, and outputs a signal of an intensity corresponding to the light receiving intensity of each imaging element to the sensor signal extraction circuit 88. The camera CA functions as a digital camera that captures an image of an area centered on the irradiation point of visible light on the measurement object OB, which is at a reference position with respect to the imaging plate 15. The reference position with respect to the imaging plate 15 is a position where the distance from the irradiation point of visible light to the imaging plate 15 is a set value. In this case, the depth of field by the imaging lens 48 and the imager 49 is set in a range before and after the irradiation point. The sensor signal extraction circuit 88 outputs the signal intensity data for each imaging element of the imager 49 to the controller 91 together with data indicating the position of each imaging element (i.e., pixel position), or in the order of the positions of each imaging element. The controller 91 uses the input signal intensity data to display the captured image on the display device 93. This camera function is the same as that of the X-ray diffraction measurement system shown in Patent Document 1.

When the controller 91 receives a command for adjusting the position and attitude from the input device 92, it issues a command to the motor control circuit 86 to rotate the motor 46 in the D1 direction, outputs a command to the LED drive circuit 85 to emit visible light, and further outputs a command to the sensor signal extraction circuit 88 to start operation. As a result, visible light having the same optical axis as the emitted X-ray is irradiated onto the measurement object OB, and photographed image data in the vicinity of the visible light irradiation point of the measurement object OB is input to the controller 91, and a photographed image created from the input photographed image data is displayed on the display device 93. While watching this photographed image, the operator adjusts the position and attitude of the X-ray diffraction measurement device 1 using the arm-type moving device so that the visible light irradiation point and the visible light receiving point on the photographed image are at the reference positions described later. This adjustment method is the same as the X-ray diffraction measurement system shown in Patent Document 1, except that the position and attitude of the X-ray diffraction measurement device 1 is adjusted instead of the position and attitude of the measurement object OB.

2, the oscillating and rotating mechanism 5 has a structure in which the surface of the fixed stage 52 of the goniostage consisting of the driving stage 51 and the fixed stage 52 is fixed to the rotating table 54, and the rotating table 54 is connected to the output shaft of the motor 55. The driving stage 51 of the goniostage is fixed to the connecting part 58 by screwing, and the connecting part 58 is fixed to the housing 50 of the X-ray diffraction measurement device 1 by screwing. The motor 55 is fixed to the connecting part 57 by screwing, and the connecting part 57 is fixed to the fixed base 56 by screwing, and the fixed base 56 is connected to the tip 59 of the arm-type moving device so that it can rotate around the vertical axis (X-axis) of the paper surface of FIG. 2. As a result, the position and posture of the housing 50 of the X-ray diffraction measurement device 1 can be changed together with the oscillating and rotating mechanism 5 by operating the arm-type moving device.

The rotation axis of the drive stage 51 of the gonio stage intersects perpendicularly with the optical axis of the emitted X-rays and is perpendicular to the reference plane. In other words, it intersects perpendicularly with the optical axis of the emitted X-rays and is perpendicular to the central axis direction of the X-ray tube 10, the movement direction of the moving stage 21, and the side wall of the housing 50. When the intersection point is set to the irradiation point of the X-rays (LED light), the distance from the intersection point to the imaging plate 15 is set to a set value. The rotation axis of the rotating table 54 (motor 55) coincides with the optical axis of the emitted X-rays (LED light). Therefore, when the position and attitude of the housing 50 of the X-ray diffraction measurement device 1 is adjusted by the arm-type moving device, the distance from the irradiation point of the X-rays (LED light) to the imaging plate 15 is set to a set value, the drive stage 51 of the gonio stage is driven, and the motor 55 is rotated, the housing 50 of the X-ray diffraction measurement device 1 swings around the irradiation point of the X-rays (LED light), and the position of the rotation axis of the swing changes. In other words, it oscillates around the point of irradiation with the X-rays (LED light), and the direction of the oscillation changes.

As shown in FIG. 1, the motor 53 that drives the drive stage 51 is driven to rotate by a drive signal input from the motor control circuit 80. When the upper and lower limit values of the rotation angle and the rotation speed are input from the controller 91, the motor control circuit 80 stores the input upper and lower limit values of the rotation angle and the rotation speed. When a command to start swinging is input from the controller 91, a drive signal is output so that the motor 53 repeatedly rotates forward and backward at the stored rotation speed between the stored upper and lower limit values of the rotation angle. The motor control circuit 80 switches the drive signal output to the motor 53 from forward rotation to reverse rotation or vice versa when the input rotation angle reaches the stored upper or lower limit value of the rotation angle by continuing to input digital data of the rotation angle at a short time interval set by the rotation angle detection circuit 81. Motor 53 is controlled to rotate at the stored rotation speed by controlling the strength of the drive signal so that the number of pulses per specified time of a pulse train signal output by encoder 53a built into motor 53 corresponds to the stored rotation speed. The pulse train signal output by encoder 53a consists of two signals with a phase difference of π/2, and the direction of rotation can be determined based on which signal has a phase lead.

The rotation angle detection circuit 81 counts the number of pulses of the pulse train signal input from the encoder 53a, counts up or down depending on the rotation direction of the motor 53 to obtain an integrated count value, and outputs the integrated count value as a rotation angle to the motor control circuit 80. The position where the rotation angle is 0 is a position where the left and right side surfaces of the driving stage 51 and the left and right side surfaces of the fixed stage 52 are included in one plane, in other words, the position where the driving stage 51 is halfway between the positive and negative driving limit positions. The rotation angle detection circuit 81 sets the integrated count value to 0 at the rotation angle 0 position by the following operation according to a command from the controller 91 when the power is turned on to the X-ray diffraction measurement device 1. When the power is turned on, the controller 91 outputs a signal to the motor control circuit 80 and the rotation angle detection circuit 81 to instruct the motor control circuit 80 to set the rotation angle to 0, and when this command is input, the motor control circuit 80 outputs a drive signal that rotates the driving stage 51 counterclockwise in FIG. 2, and the rotation angle detection circuit 81 counts the number of pulses of the pulse train signal input from the encoder 53a. When the rotation angle detection circuit 81 stops counting the number of pulses in the pulse train signal, it resets the integrated count value to 0 and outputs a signal indicating the drive limit position to the motor control circuit 80. When the motor control circuit 80 receives a signal indicating the drive limit position, it outputs a drive signal that reverses the direction of rotation of the motor 53, and stops outputting the drive signal when the rotation angle input from the rotation angle detection circuit 81 reaches a pre-stored rotation angle. When the rotation angle detection circuit 81 stops counting the number of pulses in the pulse train signal, it resets the integrated count value again to 0.

1, the motor 55 that drives the rotary table 54 is rotated by a drive signal input from the motor control circuit 82. When the rotation angle is input from the controller 91, the motor control circuit 82 outputs a drive signal until the rotation angle input from the rotation angle detection circuit 83 becomes the input rotation angle. As a result, the rotary table 54 and the goniostage and the housing 50 of the X-ray diffraction measurement device 1 connected thereto are rotated at the angle commanded by the controller 91. The rotation angle detection circuit 83 counts the number of pulses of the pulse train signal input from the encoder 55a, counts up or down depending on the rotation direction of the motor 55 to obtain an integrated count value, and outputs the integrated count value to the motor control circuit 82 as the rotation angle. Then, the integrated count value is set to 0 at the timing when the index signal is input from the encoder 55a. The controller 91 outputs various rotation angles, but the reference value of the rotation angle is the rotation angle when the housing 50 of the X-ray diffraction measurement device 1 is in the state shown in FIG. 1 and FIG. 2, and more specifically, the rotation angle when the central axis direction of the tip 59 of the arm-type moving device is parallel to the reference plane or the side wall of the housing 50. The upper limit of the rotation angle is the rotation angle that is 90° more than the reference value, and the lower limit of the rotation angle is the rotation angle that is 90° less than the reference value. Therefore, when the controller 91 outputs the rotation angle from the upper limit to the lower limit of the rotation angle, the housing 50 of the X-ray diffraction measurement device 1 rotates from a state in which the front wall 50b faces the front side of the paper in FIG. 2 to a state in which the rear wall 50e faces the front side of the paper in FIG. 2 via the state shown in FIG. In other words, the normal vector of the front wall 50b rotates from the positive X-axis direction in FIG. 2 to the negative X-axis direction.

Hereinafter, the operation of the computer device 90 and various circuits in the X-ray diffraction measurement device 1 when the X-ray diffraction measurement system is operated to perform X-ray diffraction measurement will be described. First, as described above, a position and attitude adjustment command is input from the input device 92 to emit visible light with the same optical axis as the emitted X-ray, and the position and attitude of the X-ray diffraction measurement device 1 are adjusted so that the irradiation point and reception point of the visible light in the image captured by the camera CA displayed on the display device 93 are at the reference position. As a result, the distance from the X-ray irradiation point to the imaging plate 15 becomes a set value, the incidence angle of the X-ray to the measurement object OB becomes a set value, and the normal of the measurement object OB at the X-ray irradiation point is included in the reference plane. Also, as described above, the point where the axis of rotation of the swing in the housing 50 of the X-ray diffraction measurement device 1 intersects with the optical axis of the emitted X-ray coincides with the X-ray irradiation point. Next, when a command to start measurement is input from the input device 92, the controller 91 outputs the upper limit of the rotation angle to the motor control circuit 82, and the motor 55 rotates until the rotation angle output by the rotation angle detection circuit 83 reaches the upper limit. At this time, the controller 91 also outputs a rotation angle of 90° to the spindle motor control circuit 74, and rotates the spindle motor 27 at a slow speed until the rotation angle output by the rotation angle detection circuit 75 reaches 90°. Note that the plus or minus sign at the beginning of 90° is set to be in the opposite direction to the rotation of the housing 50 when the rotation angle changes from 0 to 90°. When only the imaging plate 15 is viewed, this state is the state in FIG. 2 where the imaging plate 15 has a rotation angle of 0.

Next, the controller 91 outputs a command to the motor control circuit 80 and the rotation angle detection circuit 81 to swing the housing 50 of the X-ray diffraction measurement device 1, and outputs a command to the X-ray control circuit 71 to emit X-rays from the X-ray tube 10. As a result, a part of the diffraction ring is imaged on the imaging plate 15 by the diffracted X-rays generated in the measurement object OB and passing through the passage openings 100a and 100b of the mask 100. The controller 91 has a time measurement function and measures the time that has elapsed since the command was output to the X-ray control circuit 71. When the elapsed time reaches a preset time, the controller 91 outputs a command to the X-ray control circuit 71 to stop the emission of X-rays from the X-ray tube 10. Next, the controller 91 outputs a value 30° smaller than the upper limit value of the rotation angle to the motor control circuit 82, and the motor 55 rotates until the rotation angle output by the rotation angle detection circuit 83 becomes the rotation angle. 30° is a rotation angle equal to the rotation angle of the circumferential width of the passage openings 100a and 100b shown in FIG. 4, and is a value determined by the rotation angle of the circumferential width of the passage openings 100a and 100b. At this time, the controller 91 also outputs a rotation angle of 30° to the spindle motor control circuit 74 in the opposite direction to the rotation of the housing 50. In this state, when only the imaging plate 15 is viewed, the imaging plate 15 is in the state of FIG. 2 with the rotation angle of 0, and is not rotated with respect to the measurement object OB. In this state, the controller 91 outputs a command to the X-ray control circuit 71 to emit X-rays, and a part of the diffraction ring is imaged on the imaging plate 15 as before. Although the imaging plate 15 is not rotated with respect to the measurement object OB, since the housing 50 of the X-ray diffraction measurement device 1 is rotated by 30°, the passage openings 100a and 100b of the mask 100 are also rotated by 30°, and the part of the diffraction ring imaged on the imaging plate 15 is in a position rotated by 30° from the previous imaging position. In addition, the drive stage 51 of the goniostage is also integrated with the housing 50 of the X-ray diffraction measurement device 1, so the oscillation direction is also rotated by 30°. In other words, the radial direction at the center of a portion of the diffraction ring imaged on the imaging plate 15 coincides with the oscillation direction.

After that, similarly, the housing 50 of the X-ray diffraction measurement device 1 is rotated 30°, and each time the imaging plate 15 is rotated 30° in the opposite direction, X-rays are emitted to image a part of the diffraction ring on the imaging plate 15. The final imaging of the diffraction ring is performed when the housing 50 of the X-ray diffraction measurement device 1 is rotated 150° from the upper limit of the rotation angle, and when this imaging is completed, the diffraction ring is imaged on the imaging plate 15 in its entirety. In both imagings, the imaging plate 15 rotates in the opposite direction by the amount of rotation of the housing 50 of the X-ray diffraction measurement device 1, and the imaging plate 15 does not rotate with respect to the measurement object OB. The passage openings 100a and 100b of the mask 100 and the rocking direction, or in other words, the rotation axis of the rocking, rotate by the same rotation angle each time a part of the diffraction ring is imaged, and when the diffraction ring is imaged, the radial direction at the center of the part of the diffraction ring being imaged and the rocking direction always coincide with each other.

Figure 6 is a diagram comparing the rotation state of the X-ray diffraction measurement device 1 as viewed from above with the position of the passage openings 100a and 100b of the mask 100 relative to the imaging plate 15. In FIG. 6, the rotating table 54, the motor 55, the fixed base 56, and the tip 59 of the arm-type moving device are removed for ease of viewing. In diffraction ring imaging, the X-ray diffraction measurement device 1 rotates at 30° intervals from (a) to (c) in FIG. 6, and the passage openings 100a and 100b of the mask 100 also rotate at 30° intervals accordingly. In addition, since the driving stage 51 is integrated with the housing 50 of the X-ray diffraction measurement device 1, the swing direction also rotates at 30° intervals, and the swing direction and the center line direction of the passage openings 100a and 100b always coincide with each other. At this time, the imaging plate 15 rotates by the same rotation angle in the opposite direction to the rotation direction of the X-ray diffraction measurement device 1, so it can be considered not to move when viewed from the measurement object OB, and when the passage openings 100a and 100b of the mask 100 change from (a) to (c) in Fig. 6, the diffraction ring is imaged all around. However, (a) and (c) in Fig. 6 are the same state except that the passage openings 100a and 100b are switched, and when the diffraction ring is imaged up to the state of (c) in Fig. 6, the diffraction ring is imaged in duplicate, so in reality, the state rotated 30° clockwise from the state of (c) in Fig. 6 is the final diffraction ring imaged state. As can be seen from Fig. 2, when the housing 50 of the X-ray diffraction measurement device 1 is rotated 360° from the state of Fig. 2, there are times when the housing 50 of the X-ray diffraction measurement device 1 is below a plane parallel to the surface of the measurement object OB. However, if the rotation is from (a) to (c) in FIG. 6, that is, if the rotation is between 90° on the positive side and 90° on the negative side from the state in FIG. 2, the housing 50 of the X-ray diffraction measurement device 1 will not be below a plane parallel to the surface of the measurement object OB, and the diffraction ring can be imaged as described above.

As described above, even if the housing 50 of the X-ray diffraction measurement device 1 rotates, the imaging plate 15 is always in the state of FIG. 2 with the rotation angle set to 0, so the diffraction ring imaged on the imaging plate 15 can be considered to be the same as the diffraction ring imaged by the X-ray diffraction measurement device 1 shown in Patent Document 1. Therefore, the method of reading the diffraction ring imaged on the imaging plate 15 is the same as that of the X-ray diffraction measurement system shown in Patent Document 1. That is, the table 16 is rotated and the moving stage 21 is moved, laser is irradiated from the laser detection device 30, and data on the diffracted X-ray intensity at each point on the imaging plate 15 is output to the controller 91 together with the rotation angle data and the movement position data, and these data are stored in the memory of the controller 91. The method of erasing the diffraction ring thereafter is also the same as that of the X-ray diffraction measurement system shown in Patent Document 1, and the diffraction ring is erased by rotating the table 16 and moving the moving stage 21, and irradiating LED light from the LED light source 43 of the laser detection device 30. In addition, the method of calculating characteristic values such as residual stress using the data stored in the memory of the controller 91 is the same as that of the X-ray diffraction measurement system shown in Patent Document 1, and the controller 91 displays the characteristic values such as residual stress obtained as a result of the calculation on the display device 93 together with a map based on the measurement conditions and the diffracted X-ray intensity.

As can be understood from the above description, in the above embodiment, an X-ray emission mechanism consisting of an X-ray tube 10 that emits X-rays toward a target object OB to be measured and through holes 26a, 21a, 28a, 27b, 27a1, 16a, 17a, 18a, and an imaging plate 15 that perpendicularly intersects with the optical axis of the X-rays emitted from the X-ray emission mechanism and receives diffracted X-rays generated at the object OB when X-rays are irradiated from the X-ray emission mechanism toward the object OB to be measured, and the imaging plate In the X-ray diffraction measurement device 1, a diffraction ring imaging mechanism consisting of an imaging plate 15 and a fixture 18, which images a diffraction ring, which is an image of diffracted X-rays, on a table 16, and a housing 50 incorporating an X-ray emission mechanism and a diffraction ring imaging mechanism, a swing mechanism consisting of a drive stage 51, a fixed stage 52, a motor 53, etc., which swings the housing 50 around a rotation axis perpendicular to the optical axis of the X-rays, and a motor 55, etc., which changes the position of the rotation axis of the swing mechanism relative to the measurement object OB, are provided. The X-ray diffraction measurement system includes a rotation axis position change mechanism that changes the position of the rotation axis of the rocking mechanism, a mask 100 that is arranged in front of the imaging plate 15 as viewed from the measurement object OB, has a surface parallel to the imaging plate 15, and has passage openings 100a and 100b that allow part of the diffracted X-rays to pass through, and the center lines of the passage openings 100a and 100b pass through the optical axis of the X-rays, a passage opening position change mechanism consisting of a motor 55 or the like that changes the position of the passage openings 100a and 100b of the mask 100 relative to the measurement object OB, and a means that changes the position of the rotation axis of the rocking mechanism by the rotation axis position change mechanism, and when the position of the passage openings 100a and 100b of the mask 100 is changed by the passage opening position change mechanism, the rotation position of the imaging plate 15 around the optical axis of the X-rays relative to the measurement object OB is fixed, and the center lines of the passage openings 100a and 100b of the mask 100 are always included in a plane that includes the optical axis of the X-rays and is perpendicular to the rotation axis of the rocking mechanism.

According to this, when X-rays are emitted from the X-ray tube 10 and a diffraction ring is imaged on the imaging plate 15, the housing 50 of the X-ray diffraction measurement device 1 is swung by the swing mechanism, the position of the rotation axis of the swing mechanism is changed by the rotation axis position change mechanism, and the position of the passage openings 100a, 100b of the mask 100 is changed by the passage opening position change mechanism, and further, the rotation position of the imaging plate 15 around the optical axis of the X-rays relative to the measurement object OB is fixed, and the center lines of the passage openings 100a, 100b of the mask 100 are always included in a plane that includes the optical axis of the X-rays and is perpendicular to the rotation axis of the swing mechanism. The applicant of the present application has confirmed that by imaging the diffraction ring in this manner, it is possible to image a continuous and clear diffraction ring, and that the deviation of the imaged diffraction ring from a perfect circle can be attributed almost entirely to residual stress. That is, when the diffraction ring is imaged by rocking the housing 50 of the X-ray diffraction measurement device 1 as in the conventional method, the cause of the deviation of the imaged diffraction ring from a perfect circle due to factors other than residual stress is that the direction of rocking (the direction of the line where the plane perpendicular to the axis of rotation of the rocking intersects with the imaging plane) does not match the radial direction of the imaged diffraction ring. However, with the X-ray diffraction measurement system according to the above embodiment, the radial direction of the imaged diffraction ring and the rocking direction are almost the same, so the deviation of the imaged diffraction ring from a perfect circle is mostly due to residual stress.

In addition, in the above embodiment, an imaging surface rotation mechanism such as a spindle motor 27 that rotates the imaging plate 15 around the X-ray optical axis is provided, the oscillating portion of the oscillating mechanism and the mask 100 are integrated with the housing 50, the rotation axis position change mechanism and the passage opening position change mechanism are housing rotation mechanisms such as a motor 55 that rotates the housing 50 around the X-ray optical axis, and the means for fixing the rotation position of the imaging plate 15 around the X-ray optical axis relative to the measurement object OB is a means for controlling the rotation by the imaging surface rotation means and the rotation by the housing rotation means so that the amount of rotation is equal and the direction of rotation is opposite.

According to this, even if the housing 50 is rotated by the housing rotation mechanism, the imaging plate 15 is rotated by the same amount in the opposite direction by the imaging surface rotation mechanism, so that the rotation position of the imaging plate 15 around the optical axis of the X-rays relative to the measurement object OB is fixed. And, since the swinging part of the swinging mechanism and the mask 100 are integrated with the housing 50, the relationship between the position of the rotation axis of the swinging mechanism and the positions of the passage openings 100a, 100b of the mask 100 is fixed. That is, according to this, even without providing a mechanism for rotating the rotation axis of the swinging mechanism without rotating the housing 50 or a mechanism for rotating the mask 100 placed in front of the imaging plate 15, it is possible to fix the rotation position of the imaging plate 15 around the optical axis of the X-rays relative to the measurement object OB, fix the relationship between the position of the rotation axis of the swinging mechanism and the positions of the passage openings 100a, 100b of the mask 100, and change the position of the rotation axis of the swinging mechanism and the positions of the passage openings 100a, 100b. Therefore, the additional mechanism does not become complicated, and the cost of the X-ray diffraction measurement device 1 can be prevented from increasing.

In the above embodiment, the X-ray emission mechanism includes an X-ray tube 10 that emits X-rays and through holes 26a, 21a, 28a, 27b, 27a1, 16a, 17a, and 18a that pass the X-rays emitted from the X-ray tube 10 to convert them into approximately parallel light, the imaging plate 15 is fixed to a table 16 having a through hole 16a formed in the center, and the imaging surface rotation mechanism is a spindle motor 27 having an output shaft 27a that rotates to rotate the table 16 around the central axis of the through holes 26a, 21a, 28a, 27b, 27a1, 16a, 17a, and 18a, and is arranged so that the central axis of the output shaft 27a coincides with the central axis of the through holes 26a, 21a, 28a, 27b, 27a1, 16a, 17a, and 18a, and the through hole 27a1 is formed in the output shaft 27a. The X-ray diffraction measurement system is equipped with a spindle motor 27, a laser detection device 30 that irradiates the imaging plate 15 with laser light and detects the intensity of the light emitted from the imaging plate 15 by the irradiation of the laser light, a table drive mechanism 20 that moves the table 16 relatively to the laser detection device 30 in a direction parallel to the imaging plate 15, and a data reading function that, while the table 16 is rotated by the spindle motor 27 and moved by the table drive mechanism 20, captures the light intensity repeatedly detected by the laser detection device 30 at the same timing as the rotation angle of the spindle motor 27 and the movement position of the table drive mechanism 20, and converts it into diffraction ring reading data.

As a result, since a spindle motor 27 that rotates the imaging plate 15 is provided as one of the functions of reading the captured diffraction ring, there is no need to provide a new mechanism for rotating the imaging plate 15 in order to realize the present invention, and furthermore, it is possible to suppress an increase in the cost of the X-ray diffraction measurement device 1. In other words, by applying the present invention to the X-ray diffraction measurement device shown in the prior art document Patent Document 1, it is possible to suppress an increase in the cost of the device.

Second Embodiment
In the first embodiment, the rocking and rotating mechanism 5 is connected to the top wall 50f of the X-ray diffraction measurement device 1, and the housing 50 of the X-ray diffraction measurement device 1 is rocked and rotated together with the rocking mechanism. However, instead of this, the present invention can be implemented by removing the rotation mechanism from the rocking and rotating mechanism 5 to make it a mechanism that only rocks, providing a rotation mechanism on the stage on which the measurement object OB is placed, matching the rotation axis of the rotation mechanism with the optical axis of the emitted X-rays, and then rocking the housing 50 of the X-ray diffraction measurement device 1 to rotate the measurement object OB. In this case, since it is necessary to place the measurement object OB on the stage and match the rotation axis of the rotation mechanism with the optical axis of the emitted X-rays, the measurement object OB needs to be a small rectangular parallelepiped piece. FIG. 7 is a diagram showing the configuration of an X-ray diffraction measurement system including the X-ray diffraction measurement device 1 of such an embodiment, and corresponds to FIG. 2 of the first embodiment. In addition, since the X-ray diffraction measurement system of the second embodiment has some parts that are the same in function and structure as the X-ray diffraction measurement system of the first embodiment described above, such parts are given the same numbers in Figure 7 and in the following explanation, it will be merely stated that they are the same, and only the differences will be explained.

The X-ray diffraction measurement system of the second embodiment is composed of an X-ray diffraction measurement device 1, a swing mechanism 5', an arm-type moving device, a high-voltage power supply 95, a computer device 90, and a stage device 60. The difference in configuration from the first embodiment is that the swing rotation mechanism 5 becomes a swing mechanism 5' and a stage device 60 is added. In this X-ray diffraction measurement system, the X-ray diffraction measurement device 1 is oriented so that the optical axis of the X-ray emitted from the device is approximately parallel to the direction of gravity, and the position and orientation of the X-ray diffraction measurement device 1 relative to the measurement object OB are adjusted by operating both the arm-type moving device and the stage device 60. The method of adjusting the position and orientation is the same as that of the first embodiment, in which visible LED light with the same optical axis as the emitted X-ray is irradiated while viewing the image captured by the camera CA near the irradiation point. In addition, in the X-ray diffraction measurement, while the first embodiment rotates the housing 50 of the X-ray diffraction measurement device 1 by the motor 55 when imaging the diffraction ring, the second embodiment differs only in that it rotates the motor 69 of the stage device 60, and is otherwise the same as the first embodiment.

The oscillating mechanism 5' is obtained by removing the rotary table 54, motor 55, rotating platform 56, and connecting portion 57 from the oscillating and rotating mechanism 5 of the first embodiment, and by fixing a connecting plate 110 to the fixed stage 52 of the goniostage, and connecting the connecting plate 110 to the tip 59 of the arm-type moving device so that it can rotate around the X-axis (around the perpendicular to the plane of the paper in Figure 7). The operating mode of the oscillating mechanism 5' is the same as the oscillating portion of the oscillating and rotating mechanism 5 of the first embodiment.

The stage device 60 has a tilted block BL on which a measurement object OB is placed, and is equipped with a mechanism for adjusting the position and posture of the tilted block BL and a mechanism for rotating the tilted block BL. The mechanism for adjusting the position and posture is the same as the stage device of the X-ray diffraction measurement system shown in Patent Document 1, and has a mechanism for moving in the X, Y, and Z axes and changing the tilt angle around the X and Y axes, and can adjust the position and posture of the tilted block BL and the measurement object OB placed thereon. The stage device 60 has a Z-axis direction movement mechanism consisting of a height adjustment mechanism 63, an operator 63a, and a first plate 64 on the installation plate 62, on which there is an X-axis tilt angle change function consisting of a second plate 65 and an operator 65a, on which there is a Y-axis tilt angle change function consisting of a third plate 66 and an operator 66a, on which there is an X-axis direction movement function consisting of a fourth plate 67 and an operator 67a, and on which there is a Y-axis direction movement function consisting of a fifth plate 68, an operator 68a, and a moving plate 61. A cylindrical hole is drilled in the moving plate 61, and a motor 69 is set to fit into the hole. The output shaft of the motor 69 is connected to a rotating table 70, and the tilt block BL is fixed to the rotating table 70. This allows the position and posture of the connected tilt block BL and the measurement object OB placed thereon to be changed by rotating the controls 63a, 65a, 66a, 67a, and 68a.

The point where the inclined surface of the inclined block BL intersects with the rotation axis of the motor 69 is shown as the intersection of a cross mark, and the measurement object OB is set on the inclined surface of the inclined block BL so that the measurement point approximately coincides with the intersection of the cross mark. In addition, the angle between the inclined surface of the inclined block BL and the rotation axis of the motor 69 is an angle obtained by subtracting the set value of the X-ray incidence angle from 90°, and when the X-ray incidence angle is set as the reference value for the inclined surface of the inclined block BL and the normal to the inclined surface is included in the reference plane, the rotation axis of the motor 69 and the optical axis of the emitted X-ray become parallel.

In the first embodiment, the adjustment of the position and attitude of the X-ray diffraction measuring device 1 relative to the measurement object OB is performed by setting the distance from the X-ray irradiation point to the imaging plate 15 as a set value, setting the angle of incidence of the X-rays relative to the measurement object OB as a set value, and making the normal of the measurement object OB at the X-ray irradiation point included in the reference plane. In addition, in the second embodiment, the purpose is to make the optical axis of the emitted X-rays coincide with the rotation axis of the motor 69. After adjusting the position and attitude of the X-ray diffraction measuring device 1 relative to the measurement object OB as in the first embodiment, if the LED light irradiation point is matched with the intersection of the cross marks shown on the inclined surface of the inclined block BL, the optical axis of the emitted X-rays coincides with the rotation axis of the motor 69, but since the intersection of the cross marks becomes invisible when the measurement object OB is placed, this alone is an approximate adjustment. Therefore, the inclined block BL is rotated once by the motor 69, and the position of the LED light irradiation point in the image captured by the camera CA at that time is prevented from fluctuating. If the optical axis of the emitted X-rays coincides with the rotation axis of the motor 69, the illumination point of the LED light does not move in the height direction, eliminating any fluctuations in the captured image.

The motor control circuit 82 and the rotation angle detection circuit 83 shown in FIG. 1 of the first embodiment are provided in the stage device 60 in the second embodiment, and the motor control circuit 82 outputs a drive signal to the motor 69, and a pulse train signal from the encoder 69a in the motor 69 is input to the motor control circuit 82 and the rotation angle detection circuit 83. The operation mode of the motor control circuit 82 and the rotation angle detection circuit 83 is the same as in the first embodiment, and the rotation angle of the tilted block BL (measurement object OB) is set to the rotation angle commanded by the controller 91. The rotation of the tilted block BL (measurement object OB) in the diffraction ring imaging is performed instead of the rotation of the housing 50 of the X-ray diffraction measurement device 1 in the first embodiment, and is rotated 150° for every 30° as in the first embodiment. However, in the second embodiment, there is no possibility that the housing 50 of the X-ray diffraction measurement device 1 will come into contact with the measurement object OB, so the range of the rotation angle is not limited. Even if the tilted block BL (measurement object OB) rotates, the rotational position of the imaging plate 15 must be fixed when viewed from the measurement object OB, so that, as in the first embodiment, a command is output from the controller 91 to the spindle motor control circuit 74, and the imaging plate 15 also rotates by the same rotation angle as the tilted block BL. However, unlike the first embodiment, this rotation direction is the same as the rotation direction of the tilted block BL (measurement object OB). To explain in more detail, as shown in FIG. 7, the rotation angle of the imaging plate 15 (table 16) is set to 0 in a state where the normal of the measurement object OB is included in the reference plane, and the imaging plate 15 is rotated by the same rotation angle in the same direction as the rotation of the tilted block BL (measurement object OB) from this state. In this way, if the measurement object OB is used as a reference, the imaging plate 15 is fixed in the state shown in FIG. 7 with the rotation angle set to 0, and the passage openings 100a, 100b of the mask 100 and the rotation axis (swing direction) of the swing mechanism 5' can be seen as having rotated by the amount that the tilted block BL (measurement object OB) has rotated. In other words, if the measurement object OB is used as a reference, this is the same movement as in the first embodiment, and the same effect as in the first embodiment can be obtained.

Furthermore, the implementation of the present invention is not limited to the above-described embodiment, and various modifications are possible without departing from the purpose of the present invention.

In the X-ray diffraction measurement system of the second embodiment, a rocking mechanism 5' is provided to rock the housing 50 of the X-ray diffraction measurement device 1, and a rotation mechanism is provided on the stage device 60 to rotate the tilted block BL (measurement object OB). However, instead of rocking the housing 50 of the X-ray diffraction measurement device 1, the tilted block BL (measurement object OB) of the stage device 60 is rocked together with the rotation mechanism, and the imaging plate 15 (table 16) is rotated by the amount of rotation of the rotation mechanism, so that the present invention can be implemented. In this case, the operator 65a of the stage device 60 shown in FIG. 7 is made into a motor, and the motor is rotated forward and backward. Even with this, if the measurement object OB is used as a reference, the imaging plate 15 is fixed in the state of FIG. 7 with the rotation angle set to 0, and it can be seen that the passage openings 100a and 100b of the mask 100 and the rotation axis of the rocking (rocking direction) rotate while maintaining the same positional relationship, and the same effect as in the first embodiment can be obtained. However, in this case, the point where the axis of rotation of the oscillation and the axis of rotation of the rotation mechanism of the stage device 60 (the optical axis of the emitted X-rays) intersect is fixed, so the measurement object OB is limited to being a small rectangular piece with a fixed thickness.

In addition, the X-ray diffraction measurement device 1 of the first and second embodiments is a device that images a diffraction ring on the imaging plate 15 by the diffracted X-rays generated by the measurement object OB, and reads the diffraction ring by scanning while irradiating a laser beam from the laser detection device 30 and detecting the irradiation position and the light intensity. However, the present invention can be applied to a device that uses an imaging means other than the imaging plate 15 as long as the diffraction ring can be imaged and read. For example, the present invention can be applied to a device that has an X-ray solid-state imaging element having a flat surface with the same area as the imaging plate 15 and detects the intensity distribution of diffracted X-rays by the electrical signal output by each pixel of the X-ray solid-state imaging element. It can also be applied to a device that scans a micro-sized X-ray detection sensor while detecting the position, and detects the intensity distribution of diffracted X-rays from the electrical signal output by the X-ray detection sensor and the scanning position of the X-ray detection sensor. Note that the description in the claims that the diffraction ring, which is an image of diffracted X-rays, is imaged on the imaging surface, also includes the case where the diffracted X-ray intensity for each micro-region is detected by an electrical signal. However, when detecting the diffracted X-ray intensity as an electrical signal, it is difficult to provide a mechanism for rotating the imaging plane as in the first and second embodiments, so a separate rotation mechanism must be provided.

In the first embodiment, when an imaging means that is difficult to rotate is used, another rotation mechanism having the same rotation axis as that of the oscillating rotation mechanism 5 is provided between the oscillating rotation mechanism 5 and the housing 50 of the X-ray diffraction measurement device 1. Furthermore, a circular recess is provided around the circular hole 50c1 of the X-ray diffraction measurement device 1, and the mask 100 with a circular protrusion is fitted into this recess, the outer periphery of the mask 100 is circular with gear teeth, the tip of a motor is made gear-shaped and fitted into the gear teeth, and a mechanism is provided to rotate the mask 100 by rotating the motor. Then, the other rotation mechanism is rotated in the opposite direction by the amount of rotation of the oscillating rotation mechanism 5, and the mask 100 is rotated in the same direction.

In addition, in the second embodiment, when an imaging means that is difficult to rotate is used, a rotation mechanism for the housing 50 having the same rotation axis as the optical axis of the emitted X-ray is provided between the rocking mechanism 5' and the housing 50 of the X-ray diffraction measurement device 1, and a mechanism for rotating the mask 100 is provided as described above. Then, the rotation mechanism for the housing 50 is rotated in the same direction as the rotation table 70 (tilt block BL, measurement object OB) is rotated, and the mask 100 is rotated in the opposite direction.

Furthermore, when using an imaging means that is difficult to rotate in a form in which a rotation mechanism and a swing mechanism are provided on the stage device 60, as in the modified example of the second embodiment described above, a separate rotation mechanism having the same rotation axis as the rotation axis of the turntable 70 is provided below the swing mechanism of the stage device 60, and a mechanism for rotating the mask 100 is provided as described above. Then, the turntable 70 (tilt block BL, measurement object OB) is rotated in the opposite direction by the amount of rotation of the separate rotation axis, and the mask 100 is rotated in the opposite direction.

The first and second embodiments are embodiments of an X-ray diffraction measurement system capable of implementing the present invention, but the present invention can be implemented by preparing and appropriately combining the X-ray diffraction measurement system shown in Patent Document 1 of the prior art document, the rocking mechanism, the rotating mechanism, the stage on which the measurement object OB is placed, and the mask 100 similar to the first and second embodiments. More specifically, when the measurement object OB is irradiated with X-rays to image the diffraction ring, the X-ray diffraction measurement device 1 is rocked relative to the measurement object OB, the position of the rotation axis of the rocking is rotated relative to the measurement object OB, the mask 100 is placed in front of the imaging plane of the diffraction ring as seen from the measurement object OB and rotated relative to the measurement object OB, and at that time, the rotation position of the imaging plane relative to the measurement object OB around the optical axis of X-rays is fixed, and the center lines of the passage openings 100a and 100b of the mask 100 are always included in a plane that includes the optical axis of X-rays and is perpendicular to the rotation axis of the rocking.

In addition, the X-ray diffraction measurement device 1 in the first and second embodiments is an apparatus equipped with a function for reading the diffraction ring imaged on the imaging plate 15, but the present invention can be applied even if the X-ray diffraction measurement device 1 is an apparatus that only images the diffraction ring on the imaging plate 15. In this case, the imaging plate 15 on which the diffraction ring is imaged can be removed from the apparatus and read by another apparatus. Also, a separate apparatus may be used to calculate characteristic values such as residual stress from the diffraction ring data (data on the intensity distribution of diffracted X-rays). In this case, the data must be transferred to another apparatus, which can be done in various ways, such as transferring the data over an internet line or via a storage medium such as a USB memory.

In the first and second embodiments, the circumferential width of the passage openings 100a and 100b of the mask 100 is set to a width of a rotation angle of 30°, but this width can be set as appropriate. However, making the width smaller increases the measurement accuracy but lengthens the measurement time, and making the width larger shortens the measurement time but decreases the measurement accuracy. Therefore, the circumferential width of the passage openings 100a and 100b can be determined by balancing the measurement accuracy and measurement time. Also, if the mask 100 can be attached to and detached from the X-ray diffraction measurement device 1 as in the above embodiment, the passage openings 100a and 100b may be prepared with various circumferential widths.

In the first and second embodiments, the motors 55 and 69 rotate the ring circumferentially through the rotation angle of the passage openings 100a and 100b between the imaging of the diffraction ring. However, instead of this, the motors 55 and 69 may be rotated continuously at a low speed, and the diffraction ring may be imaged while the motors 55 and 69 continue to rotate. In this case, the imaging time (time to receive the diffracted X-rays) at each point in the circumferential direction of the diffraction ring must be the same, so the rotation must be 180°, as shown in FIG. 6.

In addition, in the first embodiment, the position and orientation of the housing 50 of the X-ray diffraction measurement device 1 relative to the measurement object OB can be adjusted by an arm-type moving device, and in the second embodiment, the position and orientation of the housing 50 of the X-ray diffraction measurement device 1 can be adjusted by an arm-type moving device and a stage device 60. However, as long as the position and orientation of the housing 50 of the X-ray diffraction measurement device 1 can be adjusted, any mechanism can be used. For example, the X-ray diffraction measurement device 1 may be attached to a device in which a stage can be moved in three directions and a goniostage that can rotate around two axes is attached to the stage. Furthermore, if the measurement object OB is limited to one with a fixed shape and the position and orientation of the housing 50 of the X-ray diffraction measurement device 1 relative to the measurement object OB is fixed, the mechanism for adjusting the position and orientation may be eliminated.

In the first and second embodiments, the mask 100 is attached to the outside of the housing 50 of the X-ray diffraction measurement device 1. However, if the measurement method for X-ray diffraction measurement is limited to the method according to the present invention and the circumferential width of the passage openings 100a and 100b can be fixed, the mask 100 can be fixed inside the housing 50 of the X-ray diffraction measurement device 1, in front of the imaging plate 15 as viewed from the measurement object OB, so that the plane is parallel to the imaging plate 15.

1...X-ray diffraction measurement device, 5...oscillating rotation mechanism, 5'...oscillating mechanism, 10...X-ray tube, 11...exit port, 15...imaging plate, 15a, 16a, 17a, 18a, 21a, 27a1, 27b, 28a...through hole, 16...table, 17...protrusion, 18...fixing device, 19...block, 20...table driving mechanism, 21...moving stage, 22...feed motor, 23...screw rod, 24...bearing portion, 25...guide, 26...plate-shaped plate, 27...spindle motor, 28...passage member, 29...block, 30...laser detection device, 43...LED light source, 44...LED light source, 45...rotating plate, 46...motor, 47a, 47b...stopper, 48...imaging lens, 49...imager, 50...casing Body, 50a... bottom wall, 50c... cutout wall, 50c1... circular hole, 50d... connecting wall, 51... driving stage, 52... fixed stage, 53... motor, 54... rotating table, 55... motor, 56... fixed base, 57... connecting part, 58... connecting part, 59... tip of arm type moving device, 60... stage device, 61... moving plate, 63a, 65a, 66a, 67a, 68a... operator, 69... motor, 70... rotating table, 90... computer device, 91... controller, 92... input device, 93... display device, 95... high voltage power supply, 100... mask, 100a, 100b, 100c... passage, 101, 102... fitting part, 110... connecting plate, OB... measurement object, CA... camera, BL... tilt block

Claims (6)

An X-ray emission means for emitting X-rays toward a target object to be measured;
a diffraction ring imaging means for receiving diffracted X-rays generated at the object to be measured when X-rays are irradiated from the X-ray emitting means towards the object to be measured on an imaging plane perpendicular to an optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane;
an X-ray diffraction measurement apparatus including a housing incorporating the X-ray emission means and the diffraction ring imaging means,
a swinging means for swinging the housing around a rotation axis perpendicular to the optical axis of the X-rays;
a rotation axis position changing means for changing a position of the rotation axis of the swinging means with respect to the measurement object;
a mask disposed in front of the imaging plane as viewed from the object to be measured, the mask having a surface parallel to the imaging plane and a passage opening for passing a part of the diffracted X-rays, the center line of the passage opening passing through an optical axis of the X-rays;
an aperture position changing means for changing the position of the aperture of the mask relative to the object to be measured;
a swing rotation axis-passage opening relationship fixing means for, when the rotation axis position changing means changes the position of the rotation axis of the swing means and the pass opening position changing means changes the position of the mask pass opening, keeping the rotational position of the imaging surface relative to the measurement object about the optical axis of the X-rays in a fixed state, such that the center line of the mask pass opening is always included in a plane that includes the optical axis of the X-rays and is perpendicular to the rotation axis of the swing means ,
Further, an imaging surface rotating means for rotating the imaging surface around an optical axis of the X-rays is provided,
The swinging portion of the swinging means and the mask are integral with the housing,
the rotation axis position changing means and the passage opening position changing means are a housing rotating means that rotates the housing around the optical axis of the X-rays,
The X-ray diffraction measurement device is characterized in that the oscillating rotation axis-passage opening relationship fixing means is a control means that controls the rotation by the imaging surface rotation means and the rotation by the housing rotation means so that the amount of rotation is equal and the directions of rotation are opposite . 2. The X-ray diffraction measurement apparatus according to claim 1,
the X-ray emission means includes an X-ray tube that emits X-rays and a group of through holes through which the X-rays emitted from the X-ray tube pass to convert the X-rays into substantially parallel light;
the imaging surface is an imaging plate, and is fixed to a table having a through hole, which is one of the through hole groups, formed at a center thereof;
the imaging surface rotation means is a motor having an output shaft that rotates to rotate the table about a central axis of the through hole group, the motor being disposed so that the central axis of the output shaft coincides with the central axis of the through hole group, and a through hole that is one of the through hole group is formed in the output shaft,
a laser detection device that irradiates the imaging plate with a laser beam and detects the intensity of the light emitted from the imaging plate by the irradiation with the laser beam;
a moving means for moving the table relative to the laser detection device in a direction parallel to the imaging plate;
and a data reading means for reading the light intensity repeatedly detected by the laser detection device at the same timing as the rotation angle of the motor and the movement position of the movement means while the table is rotated by the motor and moved by the movement means, and converting the light intensity into diffraction ring read data . An X-ray emission means for emitting X-rays toward a target object to be measured;
a diffraction ring imaging means for receiving diffracted X-rays generated at the object to be measured when X-rays are irradiated from the X-ray emitting means towards the object to be measured on an imaging plane perpendicular to an optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane;
a housing incorporating the X-ray emission means and the diffraction ring imaging means;
a swinging means for swinging the housing about a rotation axis perpendicular to the optical axis of the X-rays, the swinging means having a swinging portion integral with the housing;
a mask disposed integrally with the housing in front of the imaging plane as viewed from the object to be measured, the mask having a surface parallel to the imaging plane and a passage opening for passing a part of the diffracted X-rays, the center line of the passage opening passing through an optical axis of the X-rays;
an imaging surface rotation means for rotating the imaging surface around an optical axis of the X-ray; and
a stage on which the measurement object is placed;
a stage rotating means for rotating the stage;
In an X-ray diffraction measurement system comprising:
a position and orientation adjustment unit for adjusting a position and orientation of the stage of the stage device with respect to a housing of the X-ray diffraction measurement device;
and control means for controlling, when the stage is rotated by the stage rotation means and the imaging plane is rotated by the imaging plane rotation means, the amount and direction of rotation by the stage rotation means and the rotation by the imaging plane rotation means are equal to each other . An X-ray emission means for emitting X-rays toward a target object to be measured;
a diffraction ring imaging means for receiving diffracted X-rays generated at the object to be measured when X-rays are irradiated from the X-ray emitting means towards the object to be measured on an imaging plane perpendicular to an optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane;
a housing incorporating the X-ray emission means and the diffraction ring imaging means;
a mask disposed in front of the imaging plane as viewed from the object to be measured, the mask having a surface parallel to the imaging plane and a passage opening for passing a part of the diffracted X-rays, the center line of the passage opening passing through an optical axis of the X-rays;
an imaging surface rotation means for rotating the imaging surface around an optical axis of the X-ray; and
a stage on which the measurement object is placed;
a stage rotating means for rotating the stage ;
a swinging means for swinging the stage together with the stage rotating means about a rotation axis perpendicular to the rotation axis of the stage rotating means, the rotation axis of the swinging means being included in the plane of the measurement object when the measurement object is placed on the stage ,
a position and orientation adjustment unit for adjusting a position and orientation of the stage of the stage device with respect to a housing of the X-ray diffraction measurement device;
and control means for controlling, when the stage is rotated by the stage rotation means and the imaging plane is rotated by the imaging plane rotation means, the amount and direction of rotation by the stage rotation means and the rotation by the imaging plane rotation means are equal to each other. An X-ray emission means for emitting X-rays toward a target object to be measured;
a diffraction ring imaging means for receiving diffracted X-rays generated at the object to be measured when X-rays are irradiated from the X-ray emitting means towards the object to be measured on an imaging plane perpendicular to an optical axis of the X-rays emitted from the X-ray emitting means, and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane;
a housing incorporating the X-ray emission means and the diffraction ring imaging means;
a mask disposed in front of the imaging plane as viewed from the object to be measured, the mask having a surface parallel to the imaging plane and a passage opening for passing a part of the diffracted X-rays, the center line of the passage opening passing through an optical axis of the X-rays;
an X-ray diffraction measurement apparatus including a mask rotation means for rotating the mask around the optical axis of the X-ray; and
a stage on which the measurement object is placed;
a stage rotating means for rotating the stage;
a swinging means for swinging the stage together with the stage rotating means about a rotation axis perpendicular to the rotation axis of the stage rotating means, the rotation axis of the swinging means being included in the plane of the measurement object when the measurement object is placed on the stage ;
a swinging/rotating means for rotating the swinging means about the same rotation axis as the stage rotating means;
In an X-ray diffraction measurement system comprising:
a position and orientation adjustment unit for adjusting a position and orientation of the stage of the stage device with respect to a housing of the X-ray diffraction measurement device;
and control means for controlling the rotation by the imaging plane rotation means and the rotation by the oscillating rotation means to be equal in amount and in opposite direction when the stage is rotated by the stage rotation means, the oscillating means is rotated by the oscillating rotation means, and the mask is rotated by the mask rotation means, so that the rotation by the stage rotation means and the rotation by the mask rotation means are equal in amount and in direction. A diffraction ring imaging method comprising: emitting X-rays from an X-ray emitting means toward a measurement object; receiving diffracted X-rays generated at the measurement object on an imaging plane perpendicular to an optical axis of the emitted X-rays; and imaging a diffraction ring, which is an image of the diffracted X-rays, on the imaging plane, comprising:
When imaging the diffraction ring,
swinging the X-ray emission means and the imaging surface as a whole relative to the object to be measured about an axis that passes through an irradiation point of the X-rays on the object to be measured and is perpendicular to an optical axis of the X-rays as an axis of rotation, and changing a position of the axis of rotation relative to the object to be measured;
a mask having a surface parallel to the imaging surface, the mask being disposed in front of the imaging surface as viewed from the measurement object, and having a passage opening for passing a part of the diffracted X-rays, the center line of the passage opening passing through an optical axis of the X-rays, the position of the passage opening of the mask being changed relative to the measurement object;
In this diffraction ring imaging method, the rotational position of the imaging surface around the optical axis of the X-rays relative to the object to be measured is kept fixed, and the center line of the mask passage opening is always included in a plane that contains the optical axis of the X-rays and is perpendicular to the rotation axis .

Images