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JP7583556B2 - Magnetic functional polishing fluid - Google Patents
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JP7583556B2 - Magnetic functional polishing fluid - Google Patents

Magnetic functional polishing fluid Download PDF

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JP7583556B2
JP7583556B2 JP2020146003A JP2020146003A JP7583556B2 JP 7583556 B2 JP7583556 B2 JP 7583556B2 JP 2020146003 A JP2020146003 A JP 2020146003A JP 2020146003 A JP2020146003 A JP 2020146003A JP 7583556 B2 JP7583556 B2 JP 7583556B2
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均 西田
優矢 上嶋
修一 赤岩
淳 榮
宏貴 齊藤
仁志 辻
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Kurimoto Ltd
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Description

本開示は、磁気機能性研磨加工液に関する。 This disclosure relates to a magnetic functional polishing fluid.

精密加工の分野において磁場に応答する流体(磁気機能性流体)を用いた研磨が知られている。磁気機能性流体を用いた研磨では砥粒を含んだ磁気機能性研磨加工液を用いて磁気力により研磨が行われる。磁気機能性研磨加工液に磁場を印加すると磁性粒子は凝集体(クラスタ)を形成し、砥粒と共に加工面に押し付けられる。磁場を移動させることによりクラスタが摺動し、砥粒が加工面を研磨する。 In the field of precision machining, polishing using a fluid that responds to a magnetic field (magnetic functional fluid) is known. In polishing using a magnetic functional fluid, polishing is performed by magnetic force using a magnetic functional polishing processing liquid containing abrasive grains. When a magnetic field is applied to the magnetic functional polishing processing liquid, the magnetic particles form aggregates (clusters) and are pressed against the processing surface together with the abrasive grains. The clusters slide when the magnetic field is moved, and the abrasive grains polish the processing surface.

ベース溶液として、ケロシン等の分散媒にナノメータサイズの磁性粒子を分散させた磁性流体を用いた磁気機能性研磨加工液が知られている。ベース溶液には、カルボニル鉄等のマイクロメーターオーダーの磁性粒子と、アルミナ等の非磁性砥粒とが添加される。また、必要に応じて、繊維状のクラスタ補強材が添加される(例えば、特許文献1を参照。)。 A magnetic functional polishing processing liquid is known that uses a magnetic fluid in which nanometer-sized magnetic particles are dispersed in a dispersion medium such as kerosene as a base solution. Micrometer-sized magnetic particles such as carbonyl iron and non-magnetic abrasive grains such as alumina are added to the base solution. In addition, a fibrous cluster reinforcing material is added as necessary (see, for example, Patent Document 1).

特開2006-82213号広報JP2006-82213Publication

しかしながら、従来の磁気機能性研磨加工液を用いて研磨を行うと、平面を平滑化するだけでなく、微細構造も削ってしまい、被研磨物の形状の保持が十分にできないという問題がある。 However, when polishing is performed using conventional magnetic functional polishing fluids, not only is the surface smoothed, but the fine structure is also removed, resulting in the problem that the shape of the workpiece being polished cannot be adequately maintained.

本開示の課題は、被研磨物の平滑化と形状の保持とが両立する磁気機能性研磨加工液を実現できるようにすることである。 The objective of this disclosure is to realize a magnetic functional polishing liquid that can both smooth the polished object and retain its shape.

本開示の磁気機能性研磨加工液の一態様は、分散媒と、平均粒径が15nm以下の第1の磁性粒子と、平均粒子径が20nm以上、200nm以下の第2の磁性粒子と、平均粒子径が0.5μm以上、50μm以下の第3の磁性粒子と、非磁性砥粒と、クラスタ補強材とを含み、クラスタ補強材は、非磁性の繊維状物質である。 One aspect of the magnetic functional polishing liquid disclosed herein includes a dispersion medium, first magnetic particles having an average particle size of 15 nm or less, second magnetic particles having an average particle size of 20 nm or more and 200 nm or less, third magnetic particles having an average particle size of 0.5 μm or more and 50 μm or less, non-magnetic abrasive grains, and a cluster reinforcing material, the cluster reinforcing material being a non-magnetic fibrous material.

本開示の磁気機能性研磨加工液によれば、被研磨物の平滑化と形状の保持とを両立することができる。 The magnetic functional polishing liquid disclosed herein can achieve both smoothing of the polished object and retention of its shape.

一実施形態に係る磁気機能性研磨加工液を示す図である。FIG. 2 is a diagram showing a magnetic functional polishing liquid according to an embodiment. 一実施形態に係る磁気機能性研磨加工液を用いることができる研磨装置の一例を示す図である。FIG. 1 is a diagram showing an example of a polishing device that can use a magnetic functional polishing liquid according to an embodiment. 従来の磁気機能性研磨加工液のクラスタを示す図である。FIG. 1 is a diagram showing a cluster of a conventional magnetic functional polishing liquid. 一実施形態に係る磁気機能性研磨加工液のクラスタを示す図である。FIG. 2 illustrates a cluster of a magnetic functional polishing fluid according to an embodiment. 実施例1の磁気機能性研磨加工液の流動曲線を示すグラフである。2 is a graph showing a flow curve of the magnetic functional polishing liquid of Example 1. 被研磨物の構造を示す図である。FIG. 2 is a diagram showing the structure of an object to be polished. 実施例1の磁気機能性研磨加工液による研磨前後の形状特性を示す図である。FIG. 2 is a diagram showing shape characteristics before and after polishing using the magnetic functional polishing liquid of Example 1. 実施例1の磁気機能性研磨加工液による研磨前後の表面状態を示す写真である。6 is a photograph showing the surface state before and after polishing with the magnetic functional polishing liquid of Example 1. 比較例1の磁気機能性研磨加工液による研磨前後の形状特性を示す図である。FIG. 1 is a diagram showing shape characteristics before and after polishing using the magnetic functional polishing liquid of Comparative Example 1. 比較例1の磁気機能性研磨加工液による研磨前後の表面状態を示す写真である。6 is a photograph showing the surface state before and after polishing with the magnetic functional polishing liquid of Comparative Example 1.

本開示の磁気機能性研磨加工液(以下、加工液という)は、図1に示すように、分散媒106中に、所定の平均粒子径を有する第1の磁性粒子101、第2の磁性粒子102、第3の磁性粒子103、及び非磁性砥粒と、クラスタ補強材105とが分散している。なお、第1の磁性粒子101、第2の磁性粒子102、第3の磁性粒子103、及び非磁性砥粒の平均粒子径は、動的光散乱法又はレーザ回折/散乱法により測定することができる。 As shown in FIG. 1, the magnetic functional polishing processing liquid (hereinafter referred to as the processing liquid) of the present disclosure has first magnetic particles 101, second magnetic particles 102, third magnetic particles 103, non-magnetic abrasive grains, and cluster reinforcement material 105 dispersed in a dispersion medium 106, each having a predetermined average particle size. The average particle sizes of the first magnetic particles 101, second magnetic particles 102, third magnetic particles 103, and non-magnetic abrasive grains can be measured by dynamic light scattering or laser diffraction/scattering.

第1の磁性粒子101、第2の磁性粒子102及び第3の磁性粒子103は、種々の磁性材料により形成することができる。具体的には、鉄、酸化鉄、窒化鉄、炭化鉄、カルボニル鉄、二酸化クロム、低炭素鋼、ニッケル又はコバルト等を用いることができる。また、アルミニウム含有鉄合金、ケイ素含有鉄合金、コバルト含有鉄合金、ニッケル含有鉄合金、バナジウム含有鉄合金、モリブデン含有鉄合金、クロム含有鉄合金、タングステン含有鉄合金、マンガン含有鉄合金又は銅含有鉄合金等の鉄合金を用いることもできる。ガドリニウム、ガドリニウム有機誘導体からなる常磁性、超常磁性又は強磁性化合物粒子及びこれらの混合物からなる粒子等を用いることもできる。 The first magnetic particle 101, the second magnetic particle 102, and the third magnetic particle 103 can be formed from various magnetic materials. Specifically, iron, iron oxide, iron nitride, iron carbide, carbonyl iron, chromium dioxide, low carbon steel, nickel, cobalt, etc. can be used. In addition, iron alloys such as aluminum-containing iron alloys, silicon-containing iron alloys, cobalt-containing iron alloys, nickel-containing iron alloys, vanadium-containing iron alloys, molybdenum-containing iron alloys, chromium-containing iron alloys, tungsten-containing iron alloys, manganese-containing iron alloys, and copper-containing iron alloys can also be used. Paramagnetic, superparamagnetic, or ferromagnetic compound particles made of gadolinium or gadolinium organic derivatives, and particles made of mixtures thereof can also be used.

第1の磁性粒子101は、分散媒に分散させた際に磁性流体としての性質を示すようにする観点から、平均粒子径は、好ましくは15nm以下、より好ましくは12nm以下で、好ましくは5nm以上、より好ましくは8nm以上である。 In order for the first magnetic particles 101 to exhibit the properties of a magnetic fluid when dispersed in a dispersion medium, the average particle diameter is preferably 15 nm or less, more preferably 12 nm or less, and is preferably 5 nm or more, more preferably 8 nm or more.

第2の磁性粒子102には、第1の磁性粒子101よりも大きい磁性粒子を用いることができる。第2の磁性粒子の平均粒子径は、20nm以上、好ましくは50nm以上、より好ましくは80nm以上で、200nm以下、好ましくは150nm以下、より好ましくは120nm以下である。特に限定されないが、二価の鉄と三価の鉄とを含む複合酸化物であるマグネタイト粒子、及びアークプラズマ法により形成した鉄粒子は、好適な粒子径のものが容易に得られるため第2の磁性粒子102として好ましい。 For the second magnetic particles 102, magnetic particles larger than the first magnetic particles 101 can be used. The average particle size of the second magnetic particles is 20 nm or more, preferably 50 nm or more, more preferably 80 nm or more, and 200 nm or less, preferably 150 nm or less, more preferably 120 nm or less. Although not particularly limited, magnetite particles, which are a composite oxide containing divalent iron and trivalent iron, and iron particles formed by an arc plasma method are preferred as the second magnetic particles 102 because they can be easily obtained with a suitable particle size.

第3の磁性粒子103には、一般的なMR流体に用いられるサイズの磁性粒子である。第3の磁性粒子103の平均粒子径は、0.5μm以上、好ましくは0.7μm以上、より好ましくは1μm以上で、50μm以下、好ましくは20μm以下、より好ましくは10μm以下である。特に限定されないが、カルボニル鉄粒子は、磁性体としての特性及び入手の容易性から第3の磁性粒子103として好ましい。 The third magnetic particles 103 are magnetic particles of a size generally used in MR fluids. The average particle size of the third magnetic particles 103 is 0.5 μm or more, preferably 0.7 μm or more, more preferably 1 μm or more, and 50 μm or less, preferably 20 μm or less, more preferably 10 μm or less. Although not particularly limited, carbonyl iron particles are preferred as the third magnetic particles 103 due to their magnetic properties and ease of availability.

非磁性砥粒104は、効果的に研磨を行う観点から、高硬度で鋭利なエッジを持つ非磁性粒子が好ましい。具体的にはアルミナ、炭化ケイ素、ダイヤモンド、又は窒化ホウ素等からなる砥粒を用いることができる。砥粒の平均粒子径は目的に応じて選択することができるが、0.3μm~50μm程度のものを用いることができる。 From the viewpoint of effective polishing, the non-magnetic abrasive grains 104 are preferably non-magnetic particles with high hardness and sharp edges. Specifically, abrasive grains made of alumina, silicon carbide, diamond, boron nitride, etc. can be used. The average particle size of the abrasive grains can be selected according to the purpose, but those of about 0.3 μm to 50 μm can be used.

クラスタ補強材105には、非磁性の繊維状物質を用いることができる。具体的には平均長が0.05mm~0.2mm程度のαセルロース繊維等を用いることができる。 A non-magnetic fibrous material can be used for the cluster reinforcement 105. Specifically, alpha-cellulose fibers with an average length of about 0.05 mm to 0.2 mm can be used.

分散媒は、微粒子の混合体を分散させることができる液体であればどのようなものであってもよい。例えば、水、ケロシン、シリコーンオイル、フッ素オイル、ポリアルファオレフィン(PAO)、パラフィン、エーテル油、エステル油、鉱物油、植物性油又は動物性油等を用いることができる。また、トルエン、キシレン、ヘキサン、及びエーテル類等の有機溶媒又はエチルメチルイミダゾリウム塩、1-ブチル-3-メチルイミダゾリウム塩及び1-メチルピラゾリウム塩等に代表されるイオン性液体(常温溶融塩)類等を用いることもできる。これは、単独で用いることも2種類以上を組み合わせて用いることもできる。 The dispersion medium may be any liquid capable of dispersing the mixture of fine particles. For example, water, kerosene, silicone oil, fluorine oil, polyalphaolefin (PAO), paraffin, ether oil, ester oil, mineral oil, vegetable oil, or animal oil may be used. In addition, organic solvents such as toluene, xylene, hexane, and ethers, or ionic liquids (room-temperature molten salts) such as ethylmethylimidazolium salt, 1-butyl-3-methylimidazolium salt, and 1-methylpyrazolium salt may also be used. These may be used alone or in combination of two or more types.

加工液における全固形物(微粒子の混合体)の体積濃度は、特に限定されないが35vol%~45vol%が好ましい。加工液における全磁性粒子の体積濃度は、特に限定されないが15vol%~25vol%が好ましい。全磁性粒子の全成分に対する比率は、特に限定されないが45質量%~55質量%が好ましい。 The volume concentration of all solids (mixture of fine particles) in the processing liquid is not particularly limited, but is preferably 35 vol% to 45 vol%. The volume concentration of all magnetic particles in the processing liquid is not particularly limited, but is preferably 15 vol% to 25 vol%. The ratio of all magnetic particles to all components is not particularly limited, but is preferably 45 mass% to 55 mass%.

第1の磁性粒子101の全磁性粒子(第1の磁性粒子、第2の磁性粒子及び第3の磁性粒子の総量)に対する比率は、好ましくは30質量%以上、より好ましくは35質量%以上、好ましくは50質量%以下、より好ましくは45質量%以下である。第2の磁性粒子102の全磁性粒子に対する比率は、好ましくは30質量%以上、より好ましくは35質量%以上、好ましくは50質量%以下、より好ましくは45質量%以下である。第3の磁性粒子103の全磁性粒子に対する比率は、好ましくは10質量%以上、より好ましくは15質量%以上、好ましくは30質量%以下、より好ましくは25質量%以下である。非磁性砥粒104の分散媒を含む全成分に対する比率は、10質量%~30質量%が好ましい。クラスタ補強材の全成分に対する比率は、4質量%~10質量%が好ましい。 The ratio of the first magnetic particles 101 to the total magnetic particles (the total amount of the first magnetic particles, the second magnetic particles, and the third magnetic particles) is preferably 30% by mass or more, more preferably 35% by mass or more, preferably 50% by mass or less, and more preferably 45% by mass or less. The ratio of the second magnetic particles 102 to the total magnetic particles is preferably 30% by mass or more, more preferably 35% by mass or more, preferably 50% by mass or less, and more preferably 45% by mass or less. The ratio of the third magnetic particles 103 to the total magnetic particles is preferably 10% by mass or more, more preferably 15% by mass or more, preferably 30% by mass or less, and more preferably 25% by mass or less. The ratio of the non-magnetic abrasive grains 104 to the total components including the dispersion medium is preferably 10% by mass to 30% by mass. The ratio of the cluster reinforcing material to the total components is preferably 4% by mass to 10% by mass.

本実施形態の加工液100は、例えば図2に示すような研磨装置200に用いることができる。研磨装置200は、図示しないパルス電源よりパルス電流が印加されるコイル202と、コイル202の中央部に軸方向に設けられた貫通穴に挿通されている研磨工具203と、被研磨物Wを設置するベース(架台)204と、ベース204内で被研磨物Wを固定するOリング205と、研磨時に被研磨物Wの回転数を制御するモータの主軸206及びモータ207と、から構成されている。 The machining liquid 100 of this embodiment can be used in a polishing device 200 as shown in FIG. 2, for example. The polishing device 200 is composed of a coil 202 to which a pulse current is applied from a pulse power source (not shown), a polishing tool 203 inserted into a through hole provided in the center of the coil 202 in the axial direction, a base (stand) 204 on which the workpiece W is placed, an O-ring 205 that fixes the workpiece W in the base 204, and a motor spindle 206 and a motor 207 that control the rotation speed of the workpiece W during polishing.

被研磨物Wの表面に加工液100を適量滴下して、コイル202にパルス電圧を印加する。コイル202にパルス電圧が印加されると、研磨工具203に磁場(パルス磁場)が発生して、研磨工具203の先端に接している加工液100中に鎖状のクラスタが発生する。 An appropriate amount of the processing liquid 100 is dropped onto the surface of the workpiece W, and a pulse voltage is applied to the coil 202. When the pulse voltage is applied to the coil 202, a magnetic field (pulse magnetic field) is generated in the polishing tool 203, and chain-like clusters are generated in the processing liquid 100 that is in contact with the tip of the polishing tool 203.

クラスタは、研磨工具203の先端と、被研磨物Wとの間に、磁力線に沿って分布する。研磨工具203及び被研磨物Wを回転させて研磨工具203と被研磨物Wとを相対的に移動させることにより被研磨物Wの表面が研磨される。なお、研磨工具203と被研磨物Wとを相対移動させることができれば、研磨工具203及び被研磨物Wを共に回転させる構成に限らず、一方が固定されていてもよい。また、回転運動に限らず直線的な運動とすることもできる。 The clusters are distributed along the magnetic field lines between the tip of the polishing tool 203 and the workpiece W. The surface of the workpiece W is polished by rotating the polishing tool 203 and the workpiece W and moving the polishing tool 203 and the workpiece W relative to each other. Note that, as long as the polishing tool 203 and the workpiece W can be moved relative to each other, the configuration is not limited to rotating both the polishing tool 203 and the workpiece W, and one of them may be fixed. Furthermore, the motion is not limited to rotational motion, and linear motion is also possible.

図3に示すように、第2の磁性粒子102を含まない場合には、クラスタは第3の磁性粒子103とクラスタ補強材105により形成されるため、太く、比較的長いクラスタが形成される。また、強度が高く、加工力が大きいクラスタとなる。しかし、このクラスタは細かい隙間に入り込むことができず、微細加工の精度を十分に高めることができない。また、非磁性砥粒104は、大部分がクラスタ外に存在しており、その多くは分散媒に存在する。このため、研磨は主に、大きなクラスタにより分散媒中の非磁性砥粒104が加工面に押し付けられることにより行われる。 As shown in FIG. 3, when the second magnetic particles 102 are not included, the clusters are formed by the third magnetic particles 103 and the cluster reinforcing material 105, resulting in thick and relatively long clusters. The clusters also have high strength and a large processing force. However, these clusters cannot enter small gaps, and the precision of micromachining cannot be sufficiently improved. In addition, most of the non-magnetic abrasive grains 104 are present outside the clusters, and many of them are present in the dispersion medium. For this reason, polishing is mainly performed by the large clusters pressing the non-magnetic abrasive grains 104 in the dispersion medium against the processing surface.

一方、本実施形態のクラスタ110は、図4に示すように、磁束に沿って配列した第3の磁性粒子103の間に第1の磁性粒子101及び第2の磁性粒子102が入り込み、繊維状のクラスタ補強材105によりクラスタ110が補強された状態となる。第1の磁性粒子101は小さいため、第3の磁性粒子103の間に入り込んでも、パッキングを大きくは乱さない。一方、中間サイズの第2の磁性粒子102が第3の磁性粒子103の間に入り込むことにより、クラスタ110は細くなり、長さも比較的短くなる。このため、本実施形態のクラスタ110は細かい隙間に入り込むことができる。 On the other hand, in the cluster 110 of this embodiment, as shown in FIG. 4, the first magnetic particles 101 and the second magnetic particles 102 get into the gaps between the third magnetic particles 103 arranged along the magnetic flux, and the cluster 110 is reinforced by the fibrous cluster reinforcing material 105. Since the first magnetic particles 101 are small, even if they get into the gaps between the third magnetic particles 103, they do not significantly disrupt the packing. On the other hand, the intermediate-sized second magnetic particles 102 get into the gaps between the third magnetic particles 103, so the cluster 110 becomes thinner and relatively short in length. Therefore, the cluster 110 of this embodiment can get into small gaps.

第1の磁性粒子101は分散媒に多く存在するため,分散媒は磁性を有する流体である。このため、非磁性砥粒104は磁場下において反磁性の性質を持ち、砥粒のクラスタを形成する。本実施形態においても非磁性砥粒104は、非磁性体であるのでクラスタ110内に取り込まれにくいが、クラスタ110を形成する磁性粒子の間にはある程度隙間があるこのため、非磁性砥粒104や砥粒のクラスタはクラスタ110の表面に付着することができる。また、磁性粒子と共に分散媒中に存在する非磁性砥粒104に磁気浮力が働くことにより、非磁性砥粒104は磁場強度が小さい加工表面に移動する。このため、表面に非磁性砥粒104が付着したクラスタ110が加工面に接触すること共に加工表面に存在する非磁性砥粒にクラスタ110の加工力が作用することにより研磨が行われる。このため、クラスタのサイズが小さくても、効率よく研磨を行うことができる。 Since the first magnetic particles 101 are present in large quantities in the dispersion medium, the dispersion medium is a magnetic fluid. Therefore, the non-magnetic abrasive grains 104 have diamagnetic properties under a magnetic field and form abrasive grain clusters. In this embodiment, the non-magnetic abrasive grains 104 are also non-magnetic and are therefore not easily incorporated into the clusters 110, but there are some gaps between the magnetic particles that form the clusters 110, so the non-magnetic abrasive grains 104 and the abrasive grain clusters can adhere to the surface of the clusters 110. In addition, magnetic buoyancy acts on the non-magnetic abrasive grains 104 that exist in the dispersion medium together with the magnetic particles, so that the non-magnetic abrasive grains 104 move to the processing surface where the magnetic field strength is small. Therefore, polishing is performed by the clusters 110 with the non-magnetic abrasive grains 104 attached to their surfaces coming into contact with the processing surface and the processing force of the clusters 110 acting on the non-magnetic abrasive grains present on the processing surface. Therefore, even if the size of the clusters is small, polishing can be performed efficiently.

被研磨物Wは、特に限定されない。特に、本実施形態の加工液を用いることにより、表面の構造の形状精度の保持が容易であるため、表面に微細な構造を有する、被研磨物を好適に研磨することができる。 There are no particular limitations on the workpiece W to be polished. In particular, by using the processing liquid of this embodiment, it is easy to maintain the shape precision of the surface structure, so that it is possible to suitably polish a workpiece having a fine structure on its surface.

(実施例1)
加工液として以下のものを用いた。分散媒であるケロシンを23.7質量%、平均粒子径が10nmの第1の磁性粒子を21.0質量%、平均粒子径が100nmの第2の磁性粒子を19.7質量%、平均粒子径が1μm~7μmの第3の磁性粒子を9.9質量%、平均粒子径が3μmの非磁性砥粒を19.5質量%、クラスタ補強材を6.2質量%の割合で混合し分散させた。第1の磁性粒子、第2の磁性粒子及び第3の磁性粒子の総量に対する第1の磁性粒子の比率は41.4質量%であり、第2の磁性粒子の比率は39.0質量%であり、第3の磁性粒子の比率は19.6質量%である。第1の磁性粒子には、マグネタイト粒子を用いた。第2の磁性粒子には鉄ナノ粒子を用いた。第3の磁性粒子にはカルボニル鉄粒子を用いた。非磁性砥粒には、アルミナを用い、クラスタ補強材には、平均長が約0.1mmのαセルロース繊維を用いた。加工液における全固形分の体積割合は37.6vol%とした。
Example 1
The following was used as the machining liquid. Kerosene, which is a dispersion medium, was mixed and dispersed at 23.7% by mass, first magnetic particles with an average particle size of 10 nm at 21.0% by mass, second magnetic particles with an average particle size of 100 nm at 19.7% by mass, third magnetic particles with an average particle size of 1 μm to 7 μm at 9.9% by mass, non-magnetic abrasive grains with an average particle size of 3 μm at 19.5% by mass, and cluster reinforcement at 6.2% by mass. The ratio of the first magnetic particles to the total amount of the first magnetic particles, second magnetic particles, and third magnetic particles was 41.4% by mass, the ratio of the second magnetic particles was 39.0% by mass, and the ratio of the third magnetic particles was 19.6% by mass. Magnetite particles were used as the first magnetic particles. Iron nanoparticles were used as the second magnetic particles. Carbonyl iron particles were used as the third magnetic particles. The non-magnetic abrasive grains were made of alumina, and the cluster reinforcement material was made of α-cellulose fibers having an average length of about 0.1 mm. The volume ratio of the total solid content in the processing liquid was 37.6 vol%.

図5には、実施例1の加工液の流動曲線を示す。100mT~500mTの磁場を印加した場合には、せん断応力が大きく上昇し、研磨加工に用いる流体として十分な値を示した。また、磁場を印加した状態では、流動曲線は滑らかに変化しており、研磨加工に用いる流体として十分な分散性を示した。 Figure 5 shows the flow curve of the processing fluid of Example 1. When a magnetic field of 100 mT to 500 mT was applied, the shear stress increased significantly, indicating a sufficient value for the fluid to be used in polishing processing. Furthermore, when a magnetic field was applied, the flow curve changed smoothly, indicating sufficient dispersibility for the fluid to be used in polishing processing.

図6に示すような微細構造(溝)を有する被研磨物を研磨し、研磨前後の表面粗さ及び微細構造の形状変化を測定した。被研磨物は、直径30mmで、厚さが10mmの黄銅(C3604 JIS H3250:2012)円板であり、溝の深さhは0.2mm、幅wは0.37mm、中心角度は60°とした。研磨の際には、研磨工具の中心軸と被研磨物の中心軸とにオフセットを設け、研磨工具を揺動運動させた。オフセットの値は4mmとし、揺動距離は6mmとし、速度は40mm/minとした。また、研磨工具と被研磨物とは互いに逆回転させ、研磨工具の回転数は500rpmとし、被研磨物の回転数は、-200rpmとした。 A workpiece having a microstructure (groove) as shown in Figure 6 was polished, and the surface roughness and shape change of the microstructure before and after polishing were measured. The workpiece was a brass (C3604 JIS H3250:2012) disk with a diameter of 30 mm and a thickness of 10 mm, and the groove depth h was 0.2 mm, width w was 0.37 mm, and central angle was 60°. During polishing, an offset was provided between the central axis of the polishing tool and the central axis of the workpiece, and the polishing tool was oscillated. The offset value was 4 mm, the oscillating distance was 6 mm, and the speed was 40 mm/min. The polishing tool and the workpiece were rotated in opposite directions, the polishing tool rotation speed was 500 rpm, and the workpiece rotation speed was -200 rpm.

研磨の際には、研磨工具と被研磨物との間隔を0.5mmとし、コイルに0.1Hzのパルス電圧を印加し、加工液に240mTの磁場を印加した。 During polishing, the distance between the polishing tool and the workpiece was set to 0.5 mm, a pulse voltage of 0.1 Hz was applied to the coil, and a magnetic field of 240 mT was applied to the processing fluid.

被研磨物の中心からの距離が3.5mm~1.0mmの区間における算術平均表面粗さRaは、研磨前には0.193であったが、80分の研磨を行うことにより0.067まで改善された。算術平均表面粗さRaは、表面粗さ・輪郭形状測定器(東京精密製:サーフコム1900DX)により測定した。 The arithmetic mean surface roughness Ra in the range of 3.5 mm to 1.0 mm from the center of the workpiece was 0.193 before polishing, but improved to 0.067 after 80 minutes of polishing. The arithmetic mean surface roughness Ra was measured using a surface roughness and contour shape measuring instrument (Tokyo Seimitsu: Surfcom 1900DX).

図7には、研磨前後の形状変化を測定した結果を示す。形状変化は表面粗さ・輪郭形状測定器(東京精密製:サーフコム1900DX)により測定した。研磨前に溝部の上端部Aに存在していたバリが80分の研磨により除去された一方、上端部Aはエッジを維持しており、溝部の側壁の形状も維持されている。 Figure 7 shows the results of measuring the change in shape before and after polishing. The change in shape was measured using a surface roughness and contour shape measuring device (Tokyo Seimitsu: Surfcom 1900DX). The burrs that were present at the upper end A of the groove before polishing were removed by 80 minutes of polishing, while the edge of the upper end A was maintained, and the shape of the sidewall of the groove was also maintained.

図8には、研磨の前後における、図7における溝部上端部A及び溝部底部Bの位置の顕微鏡写真を示す。溝部上端部A及び溝部底部Bのいずれにおいても、研磨により表面の条痕が低減されており、平滑化されている。 Figure 8 shows micrographs of the positions of the upper end A and the bottom B of the groove in Figure 7 before and after polishing. At both the upper end A and the bottom B of the groove, the surface scratches have been reduced and smoothed by polishing.

(比較例1)
加工液の組成を、ケロシンを24.8質量%、第1の磁性粒子を18.4質量%、第3の磁性粒子を30.4質量%、非磁性砥粒を20.0質量%、クラスタ補強材を6.4質量%とした。第1の磁性粒子、及び第3の磁性粒子の総量に対する第1の磁性粒子の比率は37.7質量%である。第1の磁性粒子、及び第3の磁性粒子の総量に対する第3の磁性粒子の比率は62.3質量%である。加工液における全固形分の体積割合は36.4vol%とした。
(Comparative Example 1)
The composition of the processing liquid was 24.8% by mass of kerosene, 18.4% by mass of the first magnetic particles, 30.4% by mass of the third magnetic particles, 20.0% by mass of non-magnetic abrasive grains, and 6.4% by mass of cluster reinforcement material. The ratio of the first magnetic particles to the total amount of the first magnetic particles and the third magnetic particles was 37.7% by mass. The ratio of the third magnetic particles to the total amount of the first magnetic particles and the third magnetic particles was 62.3% by mass. The volume ratio of the total solid content in the processing liquid was 36.4 vol%.

図9には、研磨前後の形状変化を測定した結果を示す。研磨前に溝部の上端部Aに存在していたバリが80分の研磨により除去された。一方、図10に示すように研磨後の角部の稜線は丸みを帯びている。角部の形状変化は溝の対面の角部においてさらに大きくなった。B部では、溝の斜面においてうねりを生じて形状が大きく変化した。 Figure 9 shows the results of measuring the change in shape before and after polishing. The burrs that were present at the upper end A of the groove before polishing were removed by 80 minutes of polishing. Meanwhile, as shown in Figure 10, the ridges of the corners after polishing are rounded. The change in corner shape was even greater at the corners facing the groove. At part B, undulations occurred on the slope of the groove, causing a significant change in shape.

本開示の加工液は、平滑化と形状の保持とを両立させることができ、精密部品の研磨等において有用である。 The processing fluid disclosed herein is capable of achieving both smoothing and shape retention, making it useful for polishing precision parts, etc.

100 加工液
101 第1の磁性粒子
102 第2の磁性粒子
103 第3の磁性粒子
104 非磁性砥粒
105 クラスタ補強材
106 分散媒
110 クラスタ
200 研磨装置
202 コイル
203 研磨工具
204 ベース
205 Oリング
206 主軸
207 モータ
REFERENCE SIGNS LIST 100 Machining liquid 101 First magnetic particles 102 Second magnetic particles 103 Third magnetic particles 104 Non-magnetic abrasive grains 105 Cluster reinforcement material 106 Dispersion medium 110 Cluster 200 Polishing device 202 Coil 203 Polishing tool 204 Base 205 O-ring 206 Spindle 207 Motor

Claims (2)

分散媒と、
平均粒径が15nm以下の第1の磁性粒子と、
平均粒子径が20nm以上、200nm以下の第2の磁性粒子と、
平均粒子径が0.5μm以上、50μm以下の第3の磁性粒子と、
非磁性砥粒と、
クラスタ補強材とを含み、
前記クラスタ補強材は、非磁性の繊維状物質であり、
前記第1の磁性粒子の磁性粒子の総量に対する比率は、30質量%以上、50質量%以下であり、
前記第2の磁性粒子の磁性粒子の総量に対する比率は、30質量%以上、50質量%以下であり、
前記第3の磁性粒子の磁性粒子の総量に対する比率は、10質量%以上、30質量%以下であり、
前記クラスタ補強材の全成分に対する比率は、4質量%以上、10質量%以下であり、
前記クラスタ補強材は、平均長が0.05mm以上、0.2mm以下のαセルロース繊維である、磁気機能性研磨加工液。
A dispersion medium;
first magnetic particles having an average particle size of 15 nm or less;
second magnetic particles having an average particle size of 20 nm or more and 200 nm or less;
third magnetic particles having an average particle size of 0.5 μm or more and 50 μm or less;
Non-magnetic abrasive grains;
and a cluster reinforcement material.
the cluster reinforcement material is a non-magnetic fibrous material;
a ratio of the first magnetic particles to a total amount of magnetic particles is 30% by mass or more and 50% by mass or less,
a ratio of the second magnetic particles to the total amount of the magnetic particles is 30% by mass or more and 50% by mass or less;
a ratio of the third magnetic particles to a total amount of magnetic particles is 10% by mass or more and 30% by mass or less;
The ratio of the cluster reinforcing material to the total components is 4% by mass or more and 10% by mass or less,
The cluster reinforcing material is α-cellulose fiber having an average length of 0.05 mm or more and 0.2 mm or less .
前記非磁性砥粒は、全成分の総量に対する比率が、10質量%以上、30質量%以下である、請求項に記載の磁気機能性研磨加工液。 The magnetic functional polishing liquid according to claim 1 , wherein the non-magnetic abrasive grains account for 10% by mass or more and 30% by mass or less of the total amount of all components.
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Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2002170791A (en) 2000-12-04 2002-06-14 Akita Prefecture Particle diffusion type mixedly functional fluid and machining method using the same
JP2002544318A (en) 1999-05-06 2002-12-24 エム・ピィ・エム・リミテッド Magnetic polishing fluid
JP2005193319A (en) 2004-01-05 2005-07-21 Japan Science & Technology Agency Polishing method and abrasive that do not require processing pressure control
JP2006082213A (en) 2004-09-17 2006-03-30 Fdk Corp Sharpening and mirror polishing method and sharpening / mirror polishing apparatus
JP2010214505A (en) 2009-03-16 2010-09-30 Akita Prefectural Univ Method for increasing form restoring force of particle dispersion type mixture functional fluid using varied magnetic field and polishing method and polishing device using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002544318A (en) 1999-05-06 2002-12-24 エム・ピィ・エム・リミテッド Magnetic polishing fluid
JP2002170791A (en) 2000-12-04 2002-06-14 Akita Prefecture Particle diffusion type mixedly functional fluid and machining method using the same
JP2005193319A (en) 2004-01-05 2005-07-21 Japan Science & Technology Agency Polishing method and abrasive that do not require processing pressure control
JP2006082213A (en) 2004-09-17 2006-03-30 Fdk Corp Sharpening and mirror polishing method and sharpening / mirror polishing apparatus
JP2010214505A (en) 2009-03-16 2010-09-30 Akita Prefectural Univ Method for increasing form restoring force of particle dispersion type mixture functional fluid using varied magnetic field and polishing method and polishing device using the same

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