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JP7589487B2 - Metal circuit board and semiconductor cooling device - Google Patents
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JP7589487B2 - Metal circuit board and semiconductor cooling device - Google Patents

Metal circuit board and semiconductor cooling device Download PDF

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JP7589487B2
JP7589487B2 JP2020171635A JP2020171635A JP7589487B2 JP 7589487 B2 JP7589487 B2 JP 7589487B2 JP 2020171635 A JP2020171635 A JP 2020171635A JP 2020171635 A JP2020171635 A JP 2020171635A JP 7589487 B2 JP7589487 B2 JP 7589487B2
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circuit board
coating layer
insulating coating
metal circuit
cooling device
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JP2022063389A (en
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孝彦 小野
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Resonac Corp
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Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
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Description

本発明は、半導体素子を搭載する金属回路基板、および金属回路基板を用いた半導体冷却装置に関する。 The present invention relates to a metal circuit board on which a semiconductor element is mounted, and a semiconductor cooling device using the metal circuit board.

金属回路基板は、搭載した半導体素子が発生する熱を放出するために、金属製放熱部材を備えた半導体冷却装置として使用される。半導体冷却装置では、金属回路基板と放熱部材の間は電気的な絶縁性が保持されている必要があるため、両者の間に熱伝導率の高い絶縁部材が配置される。近年、この種の半導体冷却装置は動作電圧が高くなる傾向がある。動作電圧が高くなると金属回路基板と絶縁部材間で部分放電が発生して絶縁部材が劣化する懸念も大きくなり、半導体冷却装置における耐電圧性の向上が求められている。特に、側面にバリが突出していると、局所的な電界集中による絶縁破壊が生じ易くなる。 Metal circuit boards are used as semiconductor cooling devices equipped with metal heat dissipation members to dissipate heat generated by the mounted semiconductor elements. In semiconductor cooling devices, electrical insulation must be maintained between the metal circuit board and the heat dissipation member, so an insulating member with high thermal conductivity is placed between the two. In recent years, the operating voltage of this type of semiconductor cooling device has tended to increase. As the operating voltage increases, there is a growing concern that partial discharges will occur between the metal circuit board and the insulating member, causing deterioration of the insulating member, and there is a demand for improved voltage resistance in semiconductor cooling devices. In particular, if burrs protrude from the side, insulation breakdown is more likely to occur due to localized electric field concentration.

特許文献1においては、絶縁部材上に耐電圧性の信頼性を高めるために導体層を設けるとともに、放熱部材上の絶縁部材、導体層、金属回路基板および半導体素子を樹脂で封止した半導体装置が記載されている。 Patent document 1 describes a semiconductor device in which a conductor layer is provided on an insulating member to improve the reliability of voltage resistance, and the insulating member on a heat dissipation member, the conductor layer, a metal circuit board, and a semiconductor element are sealed with resin.

特許第6536129号公報Patent No. 6536129

特許文献1に記載された封止材は、エポキシ樹脂等の主剤に硬化剤と無機フィラーを配合した樹脂組成物であり、封止方法としてトランスファーモールドやポッティングなどの手法を用いている。しかし、無機フィラーを配合した封止材は流動性が悪いために、金属回路基板の側面や底面の金属バリの隙間や加工による凹凸に十分に充填されず、ボイドが発生する可能性が高い。このため、絶縁信頼性を十分に向上させることができない。 The sealing material described in Patent Document 1 is a resin composition in which a curing agent and inorganic filler are blended with a base material such as epoxy resin, and techniques such as transfer molding and potting are used as the sealing method. However, sealing materials blended with inorganic fillers have poor fluidity, so they do not adequately fill gaps in metal burrs on the sides and bottom of metal circuit boards or unevenness caused by processing, and there is a high possibility that voids will occur. For this reason, it is not possible to sufficiently improve insulation reliability.

本発明は、上述した技術背景に鑑み、金属回路基板の表面に存在するバリに対して確実に絶縁信頼性を向上させることができる金属回路基板、および金属回路基板を用いた半導体冷却装置を目的とする。 In view of the above-mentioned technical background, the present invention aims to provide a metal circuit board that can reliably improve insulation reliability against burrs present on the surface of the metal circuit board, and a semiconductor cooling device that uses the metal circuit board.

即ち、本発明は下記[1]~[10]に記載の構成を有する。 That is, the present invention has the configurations described in [1] to [10] below.

[1]金属板が、半導体素子を搭載する第1の面と、前記第1の面に対向する第2の面と、前記第1の面および第2の面を除く側面とを有し、
前記金属板の側面および/または第2の面が絶縁性コーティング層で覆われていることを特徴とする金属回路基板。
[1] A metal plate has a first surface on which a semiconductor element is mounted, a second surface opposite to the first surface, and a side surface excluding the first surface and the second surface,
A metal circuit board, characterized in that the side surface and/or the second surface of the metal plate are covered with an insulating coating layer.

[2]前記金属板の側面および第2の面の両方が絶縁性コーティング層で覆われている前項1に記載の金属回路基板。 [2] The metal circuit board described in the preceding paragraph 1, in which both the side surface and the second surface of the metal plate are covered with an insulating coating layer.

[3]前記絶縁性コーティング層が樹脂またはセラミックスからなる前項1または2に記載の金属回路基板。 [3] The metal circuit board according to paragraph 1 or 2 above, in which the insulating coating layer is made of resin or ceramics.

[4]前記金属板の側面を覆う絶縁性コーティング層の厚さt1と、該金属板の側面の表面粗さRz1とが、Rz1≦t1の関係を満たしている前項1~3のいずれかに記載の金属回路基板。 [4] A metal circuit board according to any one of paragraphs 1 to 3 above, in which the thickness t1 of the insulating coating layer covering the side surface of the metal plate and the surface roughness Rz1 of the side surface of the metal plate satisfy the relationship Rz1≦t1.

[5]前記金属板の第2の面を覆う絶縁性コーティング層の厚さt2と、該金属板の第2の面の表面粗さRz2とが、Rz2≦t2≦3Rz2の関係を満たしている前項1~4のいずれかに記載の金属回路基板。 [5] A metal circuit board according to any one of paragraphs 1 to 4 above, in which the thickness t2 of the insulating coating layer covering the second surface of the metal plate and the surface roughness Rz2 of the second surface of the metal plate satisfy the relationship Rz2≦t2≦3Rz2.

[6]前記絶縁性コーティング層が金属板の側面の表面形態に追従する表面形態である前項1~5のいずれかに記載の金属回路基板。 [6] A metal circuit board according to any one of items 1 to 5 above, in which the insulating coating layer has a surface shape that conforms to the surface shape of the side surface of the metal plate.

[7]前記絶縁性コーティング層がフラットな表面形態である前項1~5のいずれかに記載の金属回路基板。 [7] A metal circuit board according to any one of items 1 to 5 above, in which the insulating coating layer has a flat surface.

[8]前項1~7のいずれかに記載の金属回路基板と、前記金属回路基板の金属板の第2の面側に接合された絶縁部材と、前記絶縁部材の金属回路基板とは反対側の面に接合された放熱部材とを備えることを特徴とする半導体冷却装置。 [8] A semiconductor cooling device comprising a metal circuit board according to any one of paragraphs 1 to 7 above, an insulating member bonded to the second surface of the metal plate of the metal circuit board, and a heat dissipation member bonded to the surface of the insulating member opposite the metal circuit board.

[9]前記絶縁部材が接着性絶縁樹脂シートの硬化物である前項8に記載の半導体冷却装置。 [9] The semiconductor cooling device according to paragraph 8, wherein the insulating member is a cured product of an adhesive insulating resin sheet.

[10]前記金属回路基板の絶縁性コーティング層の比誘電率が前記絶縁部材の比誘電率よりも大きい前項8または9に記載の半導体冷却装置。 [10] A semiconductor cooling device according to paragraphs 8 or 9, in which the dielectric constant of the insulating coating layer of the metal circuit board is greater than the dielectric constant of the insulating member.

上記[1]に記載の金属回路基板においては、金属板の絶縁性コーティング層で覆われた面はバリが絶縁性コーティング層中に埋没している。このため、前記金属回路基板、絶縁部材、金属製放熱部材を積層した半導体冷却装置における絶縁信頼性を向上させることができる。即ち、前記金属板の側面においては、バリの先端の電界集中を規制し、絶縁破壊を防ぐことによって絶縁信頼性を向上させることができる。また、前記金属板の第2の面においては、バリの絶縁部材への食い込みを防ぐことによって絶縁信頼性を向上させることができる。 In the metal circuit board described in [1] above, the burrs are embedded in the insulating coating layer on the surface of the metal plate covered with the insulating coating layer. This improves the insulation reliability in a semiconductor cooling device in which the metal circuit board, insulating member, and metal heat dissipation member are stacked. That is, on the side surface of the metal plate, the electric field concentration at the tip of the burr is restricted, and insulation breakdown is prevented, thereby improving insulation reliability. Also, on the second surface of the metal plate, insulation reliability is improved by preventing the burr from biting into the insulating member.

上記[2]に記載の金属回路基板によれば、側面および第2の面の両方の面において絶縁信頼性向上効果を得ることができる。 The metal circuit board described in [2] above can provide improved insulation reliability on both the side and second surfaces.

上記[3][4][5][6]に記載の各金属回路基板によれば、なお一層絶縁信頼性を向上させることができる。 The metal circuit boards described in [3], [4], [5] and [6] above can further improve insulation reliability.

上記[6]に記載の金属回路基板によれば、側面のバリの先端まで他の部位と同等の厚さの絶縁材料で覆い、バリの先端を確実に埋没させることができる。ひいては、絶縁信頼性を確実に向上させることができる。 According to the metal circuit board described in [6] above, the tip of the burr on the side can be covered with an insulating material of the same thickness as the other parts, and the tip of the burr can be reliably buried. As a result, the insulation reliability can be reliably improved.

上記[7]に記載の金属回路基板によれば、側面および第2の面のバリや微細な凹凸を絶縁性コーティング層で覆うことができるので、絶縁信頼性を確実に向上させることができる。表面がフラットな絶縁性コーティング層はウエットプロセスにより作製することができる。 According to the metal circuit board described in [7] above, burrs and minute irregularities on the side and second surfaces can be covered with an insulating coating layer, so that insulation reliability can be reliably improved. The insulating coating layer with a flat surface can be produced by a wet process.

上記[8]に記載の半導体冷却装置によれば、上述した金属回路基板による各効果が得られる。 The semiconductor cooling device described in [8] above provides the various effects of the metal circuit board described above.

上記[9]に記載の半導体冷却装置によれば、接着性絶縁樹脂シートを200℃以下の比較的低温で作製できるので、製品の反り、歪みを抑制できる。 According to the semiconductor cooling device described in [9] above, the adhesive insulating resin sheet can be produced at a relatively low temperature of 200°C or less, which makes it possible to suppress warping and distortion of the product.

上記[10]に記載の半導体冷却装置によれば、なお一層絶縁信頼性を向上させることができる。 The semiconductor cooling device described in [10] above can further improve insulation reliability.

本発明の金属回路基板を用いた半導体冷却装置の斜視図である。FIG. 1 is a perspective view of a semiconductor cooling device using the metal circuit board of the present invention. 金属回路基板の一実施形態の断面図である。FIG. 1 is a cross-sectional view of one embodiment of a metal circuit board. 金属回路基板の別の実施形態の断面図である。FIG. 2 is a cross-sectional view of another embodiment of a metal circuit board. 金属回路基板のさらに別の実施形態の断面図である。FIG. 2 is a cross-sectional view of yet another embodiment of a metal circuit board. 図2Bの部分拡大図である。FIG. 2C is a partially enlarged view of FIG. 2B. 金属回路基板のさらに別の実施形態の断面図である。FIG. 2 is a cross-sectional view of yet another embodiment of a metal circuit board.

図1は本発明の金属回路基板を用いた半導体冷却装置の一実施形態である。 Figure 1 shows one embodiment of a semiconductor cooling device using the metal circuit board of the present invention.

半導体冷却装置1は、金属回路基板10A、10B、10Cと、絶縁部材20と、放熱部材21とを備え、これらの部材が積層状態に接合されている。前記半導体冷却装置1は金属回路基板10A、10B、10Cの第1の面に搭載した半導体素子2が発する熱を放熱部材21に排熱する構造である。 The semiconductor cooling device 1 comprises metal circuit boards 10A, 10B, and 10C, an insulating member 20, and a heat dissipation member 21, which are joined in a stacked state. The semiconductor cooling device 1 is structured to dissipate heat generated by a semiconductor element 2 mounted on the first surface of the metal circuit boards 10A, 10B, and 10C to the heat dissipation member 21.

図2A、図2Bおよび図2Cに示すように、前記金属回路基板10A、10B、10Cは金属板11と絶縁性コーティング層12a、12bとによって構成されている。前記金属板11は、半導体素子2を搭載する面を第1の面11a、前記第1の面11aに対向する面を第2の面11b、前記第1の面11aおよび第2の面11b以外の面を側面11cとする。前記金属板11の第1の面11aおよび第2の面11bは金属回路基板10A、10B、10Cの第1面および第2の面でもあり、金属回路基板10A、10B、10Cの第2の面側に絶縁部材20が接合されている。 As shown in Figures 2A, 2B and 2C, the metal circuit boards 10A, 10B and 10C are composed of a metal plate 11 and insulating coating layers 12a and 12b. The metal plate 11 has a first surface 11a on which a semiconductor element 2 is mounted, a second surface 11b opposite the first surface 11a, and a side surface 11c other than the first surface 11a and the second surface 11b. The first surface 11a and the second surface 11b of the metal plate 11 are also the first surface and the second surface of the metal circuit boards 10A, 10B and 10C, and an insulating member 20 is joined to the second surface side of the metal circuit boards 10A, 10B and 10C.

本発明の金属回路基板10A、10B、10Cは、金属板11の側面11cおよび/または第2の面11bが絶縁性コーティング層12a、12bで覆われている。即ち、半導体素子2を搭載する第1の面11aを除く面の少なくともいずれかの面が絶縁性コーティング層12a、12bで覆われている。図2Aの金属回路基板10Aは金属板11の側面11cのみが絶縁性コーティング層12aに覆われている。図2Bの金属回路基板10Bは金属板11の側面11cが絶縁性コーティング層12aで覆われ、第2の面11bが絶縁性コーティング層12bで覆われている。図2Cの金属回路基板10Cは金属板11の第2の面11bのみが絶縁性コーティング層12bで覆われている。 In the metal circuit boards 10A, 10B, and 10C of the present invention, the side surface 11c and/or the second surface 11b of the metal plate 11 are covered with insulating coating layers 12a and 12b. That is, at least one of the surfaces except the first surface 11a on which the semiconductor element 2 is mounted is covered with the insulating coating layer 12a and 12b. In the metal circuit board 10A of FIG. 2A, only the side surface 11c of the metal plate 11 is covered with the insulating coating layer 12a. In the metal circuit board 10B of FIG. 2B, the side surface 11c of the metal plate 11 is covered with the insulating coating layer 12a, and the second surface 11b is covered with the insulating coating layer 12b. In the metal circuit board 10C of FIG. 2C, only the second surface 11b of the metal plate 11 is covered with the insulating coating layer 12b.

前記金属板11は加工時に表面に微細なバリが発生することがある。また、バリ以外にも素材固有の微細な凹凸がある。前記金属回路基板10A、10B、10Cは、金属板11の側面11cおよび/または第2の面11bが絶縁性コーティング層12a、12bに覆われて、バリ(微細な凸部を含む)13が絶縁性コーティング層12a、12b中に埋没している。空気は電気が通りやすいので、金属板11の側面11cからバリ13が突出しているとバリ13の先端の電界集中による絶縁破壊が起こり易くなるが、側面11cを絶縁性コーティング層12aで覆うことによって電界集中を規制し、絶縁破壊を防いで絶縁信頼性を高めることができる。また、金属板11の第2の面11bからバリ13が突出していると、バリ13が絶縁部材20に食い込んで絶縁部材20の絶縁性能を低下させるおそれがあるが、第2の面11bを絶縁性コーティング層12bで覆ってバリの絶縁部材20への食い込みを防ぐことによって絶縁信頼性を高めることができる(図2B参照)。 The metal plate 11 may have fine burrs on its surface during processing. In addition to the burrs, there are also fine irregularities inherent to the material. In the metal circuit boards 10A, 10B, and 10C, the side surface 11c and/or the second surface 11b of the metal plate 11 are covered with insulating coating layers 12a and 12b, and the burrs (including fine protrusions) 13 are embedded in the insulating coating layers 12a and 12b. Since air is a good conductor of electricity, if the burrs 13 protrude from the side surface 11c of the metal plate 11, insulation breakdown due to electric field concentration at the tip of the burrs 13 is likely to occur. However, by covering the side surface 11c with the insulating coating layer 12a, the electric field concentration can be regulated, insulation breakdown can be prevented, and insulation reliability can be improved. Furthermore, if burrs 13 protrude from the second surface 11b of the metal plate 11, there is a risk that the burrs 13 will cut into the insulating member 20 and reduce the insulating performance of the insulating member 20. However, by covering the second surface 11b with an insulating coating layer 12b to prevent the burrs from cutting into the insulating member 20, the insulation reliability can be improved (see FIG. 2B).

前記絶縁性コーティング層12a、12b構成する絶縁性材料として、熱硬化性樹脂、熱可塑性樹脂、光硬化性樹脂、ゴム、セラミックス等を用いることができる。また、前記絶縁性コーティング層12a、12bは半導体冷却装置1の絶縁部材20よりも比誘電率の大きい材料を用いることが好ましく、絶縁信頼性をさらに向上させることができる。前記絶縁性コーティング層12a、12bの比誘電率は5.0~1000が好ましく、絶縁部材20の比誘電率は1.0~3.0が好ましい。 The insulating material constituting the insulating coating layers 12a and 12b may be a thermosetting resin, a thermoplastic resin, a photocurable resin, rubber, ceramics, or the like. In addition, it is preferable that the insulating coating layers 12a and 12b are made of a material having a higher relative dielectric constant than the insulating member 20 of the semiconductor cooling device 1, which can further improve the insulation reliability. The relative dielectric constant of the insulating coating layers 12a and 12b is preferably 5.0 to 1000, and the relative dielectric constant of the insulating member 20 is preferably 1.0 to 3.0.

前記熱硬化性樹脂として、エポキシ樹脂、シアネート樹脂、ポリイミド樹脂、ベンゾオキサジン樹脂、不飽和ポリエステル樹脂、フェノール樹脂、メラミン樹脂、シリコーン樹脂、ビスマレイミド樹脂、およびアクリル樹脂等を例示できる。 Examples of the thermosetting resin include epoxy resin, cyanate resin, polyimide resin, benzoxazine resin, unsaturated polyester resin, phenol resin, melamine resin, silicone resin, bismaleimide resin, and acrylic resin.

前記熱可塑性樹脂として、ポリオレフィン、塩化ビニル樹脂、メタクリル酸メチル樹脂、ナイロン、フッ素樹脂等を例示できる。 Examples of the thermoplastic resin include polyolefin, polyvinyl chloride resin, methyl methacrylate resin, nylon, fluororesin, etc.

前記ゴムとして、アクリルゴム、ニトリルゴム、イソプレンゴム、ウレタンゴム、エチレンプロピレンゴム、スチレン・ブタジエンゴム、ブタジエンゴム、フッ素ゴム、ブチルゴム、シリコンゴム等を例示できる。 Examples of the rubber include acrylic rubber, nitrile rubber, isoprene rubber, urethane rubber, ethylene propylene rubber, styrene-butadiene rubber, butadiene rubber, fluororubber, butyl rubber, and silicone rubber.

前記セラミックスとして、シリカ、アルミナ、硫酸バリウム、水酸化アルミニウム、水酸化マグネシウム、炭酸カルシウム、炭酸マグネシウム、酸化マグネシウム、酸化セリウム、酸化ハフニウム、酸化ジルコニウム、窒化ホウ素、窒化アルミニウム、窒化ケイ素、チタン酸バリウム、チタン酸ストロンチウム、チタン酸カルシウム、チタン酸マグネシウム、チタン酸ビスマス、酸化チタン、ダイヤモンドライクカーボン等の無機化合物の粉体を例示できる。 Examples of the ceramics include powders of inorganic compounds such as silica, alumina, barium sulfate, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, cerium oxide, hafnium oxide, zirconium oxide, boron nitride, aluminum nitride, silicon nitride, barium titanate, strontium titanate, calcium titanate, magnesium titanate, bismuth titanate, titanium oxide, and diamond-like carbon.

上述した絶縁性材料のなかでも、比誘電率の高い金属酸化物が好ましく、さらに酸化チタン、チタン酸バリウム、チタン酸カルシウム、チタン酸ストロンチウムなどのチタン酸系の材料を推奨できる。これらのチタン酸系のコーティング材料は加熱により金属酸化物になりボイドやクラックのない緻密なコーティング層をつくることができる。 Among the insulating materials mentioned above, metal oxides with high relative dielectric constants are preferred, and titanate-based materials such as titanium oxide, barium titanate, calcium titanate, and strontium titanate are also recommended. These titanate-based coating materials turn into metal oxides when heated, making it possible to create a dense coating layer without voids or cracks.

絶縁性コーティング層の形成方法は限定されないが、例えば以下の方法で形成することができる。熱硬化性樹脂の場合は、主剤樹脂に硬化剤を加え、さらに溶剤を加えて流動性を有する樹脂組成物を調製し、この樹脂組成物を金属板11に塗布し、エージングして硬化させる。熱可塑性樹脂の場合は、溶剤を加えて流動性を有する樹脂組成物を調製し、この樹脂組成物を金属板11に塗布し、その後溶剤を除去する。ゴムの場合はゴムを形成するモノマー成分の他に加硫材、溶剤を適宜加えて流動性を有するゴム前駆体組成物を調整し、この組成物を金属板11に塗布し、エージングして硬化させる。
セラミックスの場合は、樹脂や加熱によりセラミックス層を形成する上述した無機化合物を含む粘度の低い前駆体コーティング材を調製し、この前駆体コーティング材を塗工した後に溶媒乾燥、熱分解の工程を経て絶縁層を形成する。
The method for forming the insulating coating layer is not limited, and it can be formed by, for example, the following method. In the case of a thermosetting resin, a curing agent is added to a base resin, and a solvent is further added to prepare a resin composition having fluidity, which is then applied to the metal plate 11 and aged to harden. In the case of a thermoplastic resin, a solvent is added to prepare a resin composition having fluidity, which is then applied to the metal plate 11, and the solvent is then removed. In the case of rubber, a vulcanizing agent and a solvent are appropriately added in addition to the monomer components that form the rubber to prepare a rubber precursor composition having fluidity, which is then applied to the metal plate 11 and aged to harden.
In the case of ceramics, a low-viscosity precursor coating material containing the above-mentioned inorganic compound that forms a ceramic layer by resin or heating is prepared, and after applying this precursor coating material, the insulating layer is formed through a process of solvent drying and thermal decomposition.

上述した樹脂、ゴムおよび前駆体コーティング材のコーティング材料は流動性が高くて金属板11の側面11cおよび/または第2の面11bとバリ13の間の僅かな隙間にも充填され、ボイドを発生することなくバリ13を絶縁性コーティング層12a、12b中に埋没させて完全に覆うことができる。そして、バリ13を完全に覆うことでバリ13に起因する絶縁破壊を防止することができる。特許文献1に参照されるように、半導体素子を含む放熱部材上の全ての部材を封止する場合は、硬化後の封止材に機械的強度が要求されるために大量の無機フィラーを含有させる必要があり、必然的に封止材の流動性が低下する。一方、金属板11の側面11cおよび/または第2の面11bをバリ13が埋没する程度の厚さ絶縁性コーティング層12a、12bで被覆する場合は、高い機械的強度を必要としないので大量の無機フィラーを含有させる必要がなく、流動性の高いコーティング材料を選択できる。 The above-mentioned resin, rubber and precursor coating material coating materials have high fluidity and can fill even the small gap between the side surface 11c and/or second surface 11b of the metal plate 11 and the burr 13, and can completely cover the burr 13 by embedding it in the insulating coating layers 12a, 12b without generating voids. By completely covering the burr 13, it is possible to prevent dielectric breakdown caused by the burr 13. As referred to in Patent Document 1, when sealing all the members on the heat dissipation member including the semiconductor element, the sealing material after curing is required to have mechanical strength, so it is necessary to contain a large amount of inorganic filler, which inevitably reduces the fluidity of the sealing material. On the other hand, when the side surface 11c and/or second surface 11b of the metal plate 11 is covered with the insulating coating layers 12a, 12b to a thickness such that the burr 13 is embedded, high mechanical strength is not required, so there is no need to contain a large amount of inorganic filler, and a coating material with high fluidity can be selected.

また、金属板11の側面11cの絶縁性コーティング層12aは半導体冷却装置1の放熱部材21上の全ての部材を機械強度の高い材料で封止する場合においても有用である。側面11cとバリ13との僅かな隙間は既に絶縁性コーティング層12aで埋め尽くされており、流動性の低い封止材を狭い隙間に入り込ませる必要がないので、流動性が低くても機械的強度の高い封止材を選択できるからである。
(絶縁性コーティング層の厚み)
図3に金属回路基板10Bの部分拡大図を示す。
The insulating coating layer 12a on the side surface 11c of the metal plate 11 is also useful when sealing all the members on the heat dissipation member 21 of the semiconductor cooling device 1 with a material with high mechanical strength. The small gap between the side surface 11c and the burr 13 is already filled with the insulating coating layer 12a, making it unnecessary to fill the narrow gap with a sealing material with low fluidity, and therefore a sealing material with high mechanical strength even if it has low fluidity can be selected.
(Thickness of insulating coating layer)
FIG. 3 shows a partial enlarged view of the metal circuit board 10B.

前記金属板11の側面11cの表面粗さ(最大高さ)をRz1とし、側面11cを覆う絶縁性コーティング層12aの厚みをt1とする。前記側面11cの表面粗さRz1と絶縁性コーティング層12aの厚みt1は、Rz1≦t1の関係を満たしていることが好ましい。この関係はバリ13が先端まで完全に絶縁性コーティング層12aに埋没している状態を示しており、絶縁信頼性向上効果が大きい。Rz1>t1はバリ13の先端が絶縁性コーティング層12aの表面から飛び出した状態であるから、絶縁信頼性向上効果が少ない。絶縁性コーティング層12aの特に好ましい厚さt1はRz1の3倍以上である。また、絶縁性コーティング層12aの厚さt1の上限値に特段の定めはない。 The surface roughness (maximum height) of the side surface 11c of the metal plate 11 is Rz1, and the thickness of the insulating coating layer 12a covering the side surface 11c is t1. The surface roughness Rz1 of the side surface 11c and the thickness t1 of the insulating coating layer 12a preferably satisfy the relationship Rz1≦t1. This relationship indicates a state in which the burr 13 is completely embedded in the insulating coating layer 12a up to its tip, and the effect of improving the insulation reliability is large. When Rz1>t1, the tip of the burr 13 protrudes from the surface of the insulating coating layer 12a, and the effect of improving the insulation reliability is small. The particularly preferable thickness t1 of the insulating coating layer 12a is three times or more Rz1. In addition, there is no particular upper limit to the thickness t1 of the insulating coating layer 12a.

前記金属板11の第2の面11bの表面粗さ(最大高さ)をRz2とし、第2の面11bを覆う絶縁性コーティング層12bの厚みをt2とする。前記第2の面11bの表面粗さRz2と絶縁性コーティング層12bの厚みt2は、Rz2≦t2≦3Rz2の関係を満たしていることが好ましい。厚みt2の下限値が表面粗さRz2であることの理由は、側面11cと同じく、バリ13が先端まで完全に絶縁性コーティング層12bに埋没させて絶縁信頼性を向上させることである。一方、絶縁性コーティング層12bの厚みt2に上限値を設定するのは、第2の面11bが放熱部材21への熱移動路となるので、絶縁性コーティング層12bが熱移動の妨げとなって厚くなるほど冷却性能が低下するためである。前記厚みt2が表面粗さRz2の3倍以下であれば、冷却性能を維持することができる。特に好ましい厚さt2は表面粗さRz2の1倍~3倍である。 The surface roughness (maximum height) of the second surface 11b of the metal plate 11 is Rz2, and the thickness of the insulating coating layer 12b covering the second surface 11b is t2. The surface roughness Rz2 of the second surface 11b and the thickness t2 of the insulating coating layer 12b preferably satisfy the relationship Rz2≦t2≦3Rz2. The reason why the lower limit of the thickness t2 is the surface roughness Rz2 is that, like the side surface 11c, the burrs 13 are completely embedded in the insulating coating layer 12b up to the tip to improve the insulation reliability. On the other hand, the upper limit of the thickness t2 of the insulating coating layer 12b is set because the second surface 11b becomes a heat transfer path to the heat dissipation member 21, and the insulating coating layer 12b becomes an obstacle to heat transfer, so that the thicker the insulating coating layer 12b, the lower the cooling performance. If the thickness t2 is 3 times or less than the surface roughness Rz2, the cooling performance can be maintained. The thickness t2 is particularly preferably 1 to 3 times the surface roughness Rz2.

図3は、図2Bの金属板11の側面11cと第2の面11bの両方の面が絶縁性コーティング層12a、12bで覆われた金属回路基板10Bであるが、どちらか一方の面のみに絶縁性コーティング層12a、12bを形成する場合(図2A、図2C参照)も、厚さt1、t2の好適範囲は同じである。
(絶縁性コーティング層の表面形態および形成方法)
図4および図2Bは金属板11の側面11cを覆う絶縁性コーティング層12c、12aの2種類の表面形態形を示している。
FIG. 3 shows a metal circuit board 10B in which both the side surface 11c and the second surface 11b of the metal plate 11 in FIG. 2B are covered with insulating coating layers 12a, 12b. However, even when the insulating coating layers 12a, 12b are formed on only one of the surfaces (see FIGS. 2A and 2C), the preferred ranges of the thicknesses t1, t2 are the same.
(Surface morphology and formation method of insulating coating layer)
4 and 2B show two types of surface morphology of the insulating coating layers 12c and 12a covering the side surface 11c of the metal plate 11. FIG.

図4の絶縁性コーティング層12cは側面11cの表面形態に追従してバリ13の部分が突出する表面形態であり、絶縁性コーティング層12cの厚みが略一定である。前記バリ13は先端まで他の部位と同じ厚さの絶縁材料で覆われ、バリ13を絶縁性コーティング層12cに確実に埋没させることができる。ひいては、絶縁信頼性を確実に向上させることができる。このような表面形態の絶縁性コーティング層12cはドライプロセスで製膜することにより得られる。ドライプロセスとは、PVD、CVD、蒸着、電子ビーム堆積など化学種をイオン化、ラジカル化、ガス化、単分子化したものを製膜する方法である。 The insulating coating layer 12c in FIG. 4 has a surface shape in which the burr 13 protrudes following the surface shape of the side surface 11c, and the thickness of the insulating coating layer 12c is approximately constant. The burr 13 is covered up to its tip with an insulating material of the same thickness as the other parts, so that the burr 13 can be reliably embedded in the insulating coating layer 12c. In turn, the insulation reliability can be reliably improved. The insulating coating layer 12c with such a surface shape is obtained by forming a film using a dry process. A dry process is a method of forming a film by ionizing, radicalizing, gasifying, and monomolecularizing chemical species using PVD, CVD, vapor deposition, electron beam deposition, etc.

一方、図2Bの絶縁性コーティング層12aはフラットな表面形態であり、バリ13を覆う部分は他の部分よりも厚みが薄くなっている。この表面形態の絶縁性コーティング層12aには、金属バリや金属回路基板側面の微細な凹凸に対しても絶縁層で被覆するというメリットがある。また、このような表面形態はウエットプロセスで製膜することにより得られる。ウエットプロセスとはディッピング、スピンキャスト、スプレーパイロリシスディスペンサ塗布を単独もしくは組み合わせた方法である。 On the other hand, the insulating coating layer 12a in FIG. 2B has a flat surface, and the portion covering the burrs 13 is thinner than the other portions. The insulating coating layer 12a with this surface has the advantage that it covers metal burrs and minute irregularities on the side of the metal circuit board with an insulating layer. In addition, this surface shape can be obtained by forming the film using a wet process. A wet process is a method that uses dipping, spin casting, and spray pyrolysis dispenser application alone or in combination.

前記金属板11の側面11cの絶縁性コーティング層の表面形態は上記2種類のどちらでも良い。しかし、第2の面11bの絶縁性コーティング層は、絶縁部材20との接合性を考慮してフラットな表面形態であることが望ましい。
(半導体冷却装置)
本発明の半導体冷却装置1は、図1に示すように、上述の金属回路基板10A、10B、10Cと、前記金属回路基板10A、10B、10Cの第2の面側に接合された絶縁部材20と、前記絶縁部材20の前記金属回路基板10A、10B、10Cとは反対側の面に接合された放熱部材21とを備えている。
The surface configuration of the insulating coating layer on the side surface 11c of the metal plate 11 may be either of the above two types. However, it is preferable that the insulating coating layer on the second surface 11b has a flat surface configuration in consideration of the bonding with the insulating member 20.
(Semiconductor cooling device)
As shown in FIG. 1, the semiconductor cooling device 1 of the present invention comprises the above-mentioned metal circuit boards 10A, 10B, 10C, an insulating member 20 joined to the second surface side of the metal circuit boards 10A, 10B, 10C, and a heat dissipation member 21 joined to the surface of the insulating member 20 opposite to the metal circuit boards 10A, 10B, 10C.

前記絶縁部材20は樹脂、セラミックス等の任意の絶縁性材料で構成することができ、接着性絶縁樹脂シートの硬化物を推奨できる。接着性絶縁樹脂シートは200℃以下の比較的低温で作製できるため、製品の反り、歪みを抑制できる。 The insulating member 20 can be made of any insulating material such as resin or ceramics, and a cured adhesive insulating resin sheet is recommended. The adhesive insulating resin sheet can be produced at a relatively low temperature of 200°C or less, which helps prevent warping and distortion of the product.

また、前記金属回路基板10A、10B、10Cの絶縁性コーティング層12a、12bの比誘電率は前記絶縁部材20の比誘電率よりも大きくなるように設計することが好ましい。 It is also preferable to design the dielectric constant of the insulating coating layers 12a and 12b of the metal circuit boards 10A, 10B, and 10C to be greater than the dielectric constant of the insulating member 20.

前記放熱部材21はアルミニウムや銅等の熱伝導性の良い任意の材料で構成することができる。また、液冷式、空冷式等の冷却方式も限定されない。 The heat dissipation member 21 can be made of any material with good thermal conductivity, such as aluminum or copper. The cooling method, such as liquid cooling or air cooling, is not limited.

本発明の金属回路基板は金属製放熱部材を備えた半導体冷却装置に好適に利用できる。 The metal circuit board of the present invention can be suitably used in semiconductor cooling devices equipped with metal heat dissipation members.

1…半導体冷却装置
2…半導体素子
10A、10B、10C…金属回路基板
11…金属板
11a…第1の面
11b…第2の面
11c…側面
12a,12b,12c…絶縁性コーティング層
13…バリ
20…絶縁部材
21…放熱部材
t1…側面の絶縁性コーティング層の厚さ
t2…第2の面の絶縁性コーティング層の厚さ
Rz1…側面の表面粗さ
Rz2…第2の面の表面粗さ
1...Semiconductor cooling device 2...Semiconductor element 10A, 10B, 10C...Metal circuit board 11...Metal plate 11a...First surface 11b...Second surface 11c...Side surface 12a, 12b, 12c...Insulating coating layer 13...Burrs 20...Insulating member 21...Heat dissipation member t1...Thickness of insulating coating layer on side surface t2...Thickness of insulating coating layer on second surface Rz1...Surface roughness of side surface Rz2...Surface roughness of second surface

Claims (8)

金属回路基板と、前記金属回路基板の金属板の第2の面側に接合された絶縁部材と、前記絶縁部材の金属回路基板とは反対側の面に接合された放熱部材とを備えた半導体冷却装置であって、
前記金属回路基板は、金属板が、半導体素子を搭載する第1の面と、前記第1の面に対向する第2の面と、前記第1の面および第2の面を除く側面とを有し、
前記金属板の側面および/または第2の面が絶縁性コーティング層で覆われており、
前記絶縁性コーティング層が樹脂からなることを特徴とする半導体冷却装置
A semiconductor cooling device comprising: a metal circuit board; an insulating member bonded to a second surface side of a metal plate of the metal circuit board; and a heat dissipation member bonded to a surface of the insulating member opposite to the metal circuit board,
The metal circuit board is a metal plate having a first surface on which a semiconductor element is mounted, a second surface opposite to the first surface, and a side surface excluding the first surface and the second surface;
The side surface and/or the second surface of the metal plate is covered with an insulating coating layer;
4. A semiconductor cooling device, wherein the insulating coating layer is made of resin.
前記金属回路基板は、前記金属板の側面および第2の面の両方が絶縁性コーティング層で覆われている請求項1に記載の半導体冷却装置 The semiconductor cooling device according to claim 1 , wherein both the side surface and the second surface of the metal circuit board are covered with an insulating coating layer. 前記金属回路基板は、前記金属板の側面を覆う絶縁性コーティング層の厚さt1と、該金属板の側面の表面粗さRz1とが、Rz1≦t1の関係を満たしている請求項1または2に記載の半導体冷却装置 3. The semiconductor cooling device according to claim 1, wherein the metal circuit board has an insulating coating layer covering a side surface of the metal plate with a thickness t1 and a surface roughness Rz1 of the side surface of the metal plate that satisfy the relationship Rz1 ≦t1. 前記金属回路基板は、前記金属板の第2の面を覆う絶縁性コーティング層の厚さt2と、該金属板の第2の面の表面粗さRz2とが、Rz2≦t2≦3Rz2の関係を満たしている請求項1~3のいずれかに記載の半導体冷却装置 The semiconductor cooling device according to any one of claims 1 to 3, wherein the metal circuit board has a thickness t2 of an insulating coating layer covering the second surface of the metal plate and a surface roughness Rz2 of the second surface of the metal plate that satisfies the relationship Rz2≦t2≦3Rz2. 前記金属回路基板は、前記絶縁性コーティング層が金属板の側面の表面形態に追従する表面形態である請求項1~4のいずれかに記載の半導体冷却装置5. The semiconductor cooling device according to claim 1 , wherein the metal circuit board has a surface configuration in which the insulating coating layer conforms to the surface configuration of the side surface of the metal plate. 前記金属回路基板は、前記絶縁性コーティング層がフラットな表面形態である請求項1~4のいずれかに記載の半導体冷却装置5. The semiconductor cooling device according to claim 1 , wherein the insulating coating layer of the metal circuit board has a flat surface. 前記絶縁部材が接着性絶縁樹脂シートの硬化物である請求項1~6のいずれかに記載の半導体冷却装置。 7. The semiconductor cooling device according to claim 1, wherein the insulating member is a cured product of an adhesive insulating resin sheet. 前記金属回路基板の絶縁性コーティング層の比誘電率が前記絶縁部材の比誘電率よりも大きい請求項1~7のいずれかに記載の半導体冷却装置。 8. The semiconductor cooling device according to claim 1, wherein the insulating coating layer of the metal circuit board has a higher dielectric constant than the insulating member.
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