Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP7596892B2 - Vibration damping structure - Google Patents
[go: Go Back, main page]

JP7596892B2 - Vibration damping structure - Google Patents

Vibration damping structure Download PDF

Info

Publication number
JP7596892B2
JP7596892B2 JP2021055954A JP2021055954A JP7596892B2 JP 7596892 B2 JP7596892 B2 JP 7596892B2 JP 2021055954 A JP2021055954 A JP 2021055954A JP 2021055954 A JP2021055954 A JP 2021055954A JP 7596892 B2 JP7596892 B2 JP 7596892B2
Authority
JP
Japan
Prior art keywords
vibration
opposing
rising
foundation
horizontal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021055954A
Other languages
Japanese (ja)
Other versions
JP2022152975A (en
Inventor
健史 藤森
達 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obayashi Corp
Original Assignee
Obayashi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obayashi Corp filed Critical Obayashi Corp
Priority to JP2021055954A priority Critical patent/JP7596892B2/en
Publication of JP2022152975A publication Critical patent/JP2022152975A/en
Application granted granted Critical
Publication of JP7596892B2 publication Critical patent/JP7596892B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Vibration Prevention Devices (AREA)

Description

本発明は、振動減衰構造に関する。 The present invention relates to a vibration damping structure.

従来から、作動時に振動をともなう設備機械などは振動を低減するために、例えば、スラブの上面にゴム状弾性板を載置し、ゴム状弾性板の上に厚板状基礎を重ねて、厚板状基礎とゴム状弾性板とを連結し、厚板状基礎の上に設備機械などを載置する防振構造は知られている(例えば、特許文献1参照)。 Conventionally, in order to reduce vibrations caused by equipment and machinery that vibrate during operation, a vibration-proof structure has been known in which, for example, a rubber-like elastic plate is placed on the top surface of a slab, a thick plate-like foundation is placed on top of the rubber-like elastic plate, the thick plate-like foundation and the rubber-like elastic plate are connected, and the equipment and machinery are placed on the thick plate-like foundation (see, for example, Patent Document 1).

特開平09-177093号公報Japanese Patent Application Publication No. 09-177093

しかし、特許文献1のような防振構造は、設備機械などが載置された厚板状基礎の固有振動数と地盤の固有振動数との共振のピークをずらすことに留まり、振動を減衰させる効果は小さく、減衰性能を十分に確保することができないという課題があった。 However, vibration isolation structures such as those in Patent Document 1 only shift the resonance peak between the natural frequency of the thick plate foundation on which equipment and machinery are placed and the natural frequency of the ground, and have a small effect on damping vibrations, meaning that there is an issue in that sufficient damping performance cannot be ensured.

本発明は、かかる課題に鑑みてなされたものであって、その目的とするところは、振動構造における振動の減衰性能がより高い振動減衰構造を提供することにある。 The present invention was made in consideration of these problems, and its purpose is to provide a vibration damping structure with higher vibration damping performance in a vibrating structure.

かかる目的を達成するため、本発明の振動減衰構造構造は、
支持構造に設けられる振動構造の振動を減衰する振動減衰構造であって、
前記支持構造は、前記振動構造の下に設けられる水平部と、
前記水平部から立ち上がる立ち上がり部と、
を有し、
前記振動構造は、前記立ち上がり部と水平方向に間隔を空けて対向する対向部を有し、
前記水平部の上に防振部を介して設けられており、
前記立ち上がり部の側と前記対向部の側とに各々固定され、前記立ち上がり部と前記対向部との相対変位を減衰する相対変位減衰機構を有し、
前記相対変位減衰機構は、
前記立ち上がり部の側と前記対向部の側とに各々固定される粘弾性部を有していることを特徴とする。
In order to achieve this object, the vibration damping structure of the present invention comprises:
A vibration damping structure for damping vibration of a vibration structure provided on a support structure,
The support structure includes a horizontal portion provided under the vibration structure;
a rising portion rising from the horizontal portion;
having
the vibration structure has an opposing portion facing the rising portion with a gap therebetween in a horizontal direction,
A vibration isolating part is provided on the horizontal part,
a relative displacement attenuation mechanism that is fixed to the rising portion and the opposing portion and that attenuates the relative displacement between the rising portion and the opposing portion ,
The relative displacement damping mechanism includes:
The present invention is characterized in that it has a viscoelastic portion fixed to each of the rising portion side and the opposing portion side .

このような振動減衰構造によれば、振動構造は、支持構造の水平部の上に防振を介して設けられており、支持構造の立ち上がり部と水平方向に間隔を空けて対向する振動構造の対向部との間には相対変位減衰機構が設けられているので、防振部により振動構造の固有振動数と支持構造の固有振動数との共振のピークをずらすとともに、相対変位減衰機構により、支持構造に対する振動構造の変位を減衰させて振動を減衰させることが可能である。このため、振動構造における振動の減衰性能がより高い振動減衰構造を提供することが可能である。 According to this type of vibration damping structure, the vibration structure is provided on the horizontal part of the support structure via vibration isolation, and a relative displacement damping mechanism is provided between the rising part of the support structure and the opposing part of the vibration structure that faces it with a horizontal gap. The vibration isolation part shifts the resonance peak between the natural frequency of the vibration structure and the natural frequency of the support structure, and the relative displacement damping mechanism damps the displacement of the vibration structure relative to the support structure, thereby damping vibration. This makes it possible to provide a vibration damping structure with higher vibration damping performance in the vibration structure.

また、立ち上がり部の側と対向部の側との間に固定される粘弾性部により、支持構造に対する振動構造の変位を減衰させて振動をより確実に減衰させることが可能である。
Furthermore, the viscoelastic portion fixed between the rising portion side and the opposing portion side can attenuate the displacement of the vibrating structure relative to the supporting structure, thereby more reliably attenuating vibrations.

かかる振動減衰構造であって、前記振動構造は、前記対向部から前記立ち上がり部の側に向かって突出する軸、及び、前記立ち上がり部と間隔を空けて対面し前記粘弾性部が固定される対向部面材と、前記対向部面材から横方向に延出される腕部と、前記腕部の先端に設けられ、前記軸に回動自在に支持される回動部と、が一体をなす回動体、を有し、前記支持構造は、前記水平部から立設し、前記腕部が載置された頂部にて前記回動体を支持する支持部を有し、前記腕部は、前記頂部から前記対向部面材の側の長さの方が、前記頂部から前記回動部の側の長さより長いことを特徴とする。 In such a vibration damping structure, the vibration structure has a shaft protruding from the opposing portion toward the rising portion, an opposing surface material that faces the rising portion with a gap therebetween and to which the viscoelastic portion is fixed, an arm extending laterally from the opposing surface material, and a rotating portion provided at the tip of the arm and supported rotatably by the shaft, forming a rotating body integral therewith, and the support structure has a support portion that stands upright from the horizontal portion and supports the rotating body at its top on which the arm portion is placed, and the length of the arm portion from the top to the opposing surface material side is longer than the length from the top to the rotating portion side.

このような振動減衰構造によれば、回動体は、横方向に延出された腕部を介して対向部に回動自在に軸支されており、腕部は支持構造の水平部から立設された支持部の頂部にて支持されている。このため、振動構造が支持構造に対して、下方に変位すると腕部は支持部により上方に押し上げられる。このとき、回動体は軸回りに回動し対向部面材は上方に変位する。また、振動構造が支持構造に対して、上方に変位すると腕部は支持部とともに相対的に下方に変位する。このとき、回動体が軸回りに回動し対向部面材は下方に変位する。 According to this type of vibration damping structure, the rotating body is rotatably supported on the opposing part via an arm extending laterally, and the arm is supported on the top of the support part that stands upright from the horizontal part of the support structure. Therefore, when the vibration structure is displaced downward relative to the support structure, the arm is pushed upward by the support part. At this time, the rotating body rotates around the axis and the opposing surface material is displaced upward. Also, when the vibration structure is displaced upward relative to the support structure, the arm is displaced downward relatively together with the support part. At this time, the rotating body rotates around the axis and the opposing surface material is displaced downward.

このため、振動構造と支持構造とが上下方向に相対変位することにより、立ち上がり部と対向部面材との間に介在された粘弾性部により振動が減衰される。このとき、支持部に載置されている腕部は、支持部の頂部から対向部面材の側の長さの方が、支持部の頂部から回動部の側の長さより長いので、てこの作用により、対向部面材は、振動構造と支持構造との相対変位より大きく変位する。このため、立ち上がり部と対向部との間に粘弾性部が直接設けられている場合よりも大きく変位させて減衰力をより高めることが可能である。 As a result, the vibration is damped by the viscoelastic part interposed between the rising portion and the opposing surface material as the vibration structure and the support structure are displaced relative to each other in the vertical direction. At this time, the length of the arm part placed on the support part from the top of the support part to the opposing surface material is longer than the length from the top of the support part to the rotating part side, so that the opposing surface material is displaced by a greater amount than the relative displacement between the vibration structure and the support structure due to the lever action. As a result, it is possible to increase the damping force by displacing the arm part more than when the viscoelastic part is directly provided between the rising portion and the opposing portion.

かかる振動減衰構造であって、前記立ち上がり部は、前記対向部面材と間隔を空けて対面する立ち上がり部面材を有し、前記粘弾性部は、前記立ち上がり部面材と前記対向部面材とに各々固定されていることを特徴とする。 In this vibration damping structure, the rising portion has a rising surface material that faces the opposing surface material with a gap therebetween, and the viscoelastic portion is fixed to each of the rising surface material and the opposing surface material.

このような振動減衰構造によれば、立ち上がり部面材と対向部面材との間に介在された
粘弾性部により、振動を減衰させることが可能である。
また、 支持構造に設けられる振動構造の振動を減衰する振動減衰構造であって、前記支持構造は、前記振動構造の下に設けられる水平部と、前記水平部から立ち上がる立ち上がり部と、を有し、前記振動構造は、前記立ち上がり部と水平方向に間隔を空けて対向する対向部を有し、前記水平部の上に防振部を介して設けられており、前記立ち上がり部の側と前記対向部の側とに各々固定され、前記立ち上がり部と前記対向部との相対変位を減衰する相対変位減衰機構を有し、前記振動構造は、作動の際に振動を伴う装置が設置される機械基礎であることを特徴とする。
According to such a vibration damping structure, it is possible to damp vibrations by the viscoelastic portion interposed between the rising portion surface material and the opposing portion surface material.
Also, there is provided a vibration damping structure for damping vibration of a vibrating structure provided on a support structure, the support structure having a horizontal portion provided below the vibrating structure and a rising portion rising from the horizontal portion, the vibrating structure having an opposing portion facing the rising portion at a horizontal interval, the support structure being provided on the horizontal portion via a vibration-proof portion, and having a relative displacement damping mechanism fixed to the side of the rising portion and the side of the opposing portion, respectively, for damping relative displacement between the rising portion and the opposing portion, the vibrating structure being a machine foundation on which an apparatus that vibrates during operation is installed.

本発明によれば、振動構造における振動の減衰性能がより高い振動減衰構造を提供することができる。 The present invention provides a vibration damping structure that has higher vibration damping performance.

本実施形態にかかる振動減衰構造を示す縦断面図である。1 is a vertical cross-sectional view showing a vibration damping structure according to an embodiment of the present invention. 図1におけるA-A断面図である。2 is a cross-sectional view taken along line AA in FIG. 1. 本実施形態にかかる振動減衰構造が備える相対変位減衰機構を示す縦断面図である。3 is a vertical cross-sectional view showing a relative displacement damping mechanism provided in the vibration damping structure according to the present embodiment. FIG. 相対変位減衰機構の構成を示す分解斜視図である。FIG. 4 is an exploded perspective view showing a configuration of a relative displacement damping mechanism. 振動構造が上方に変位した状態を示す図である。FIG. 13 is a diagram showing a state in which the vibration structure is displaced upward. 振動構造が下方に変位した状態を示す図である。FIG. 13 is a diagram showing a state in which the vibrating structure is displaced downward.

以下、本発明の一実施形態に係る振動減衰構造について図面を参照して説明する。 The vibration damping structure according to one embodiment of the present invention will be described below with reference to the drawings.

本実施形態に係る振動減衰構造は、図1に示すように、例えば輪転機など、作動の際に振動を伴う装置(不図示)が設置される振動構造としての機械基礎1と、機械基礎1が配置されるピット2aを有する支持構造としての耐圧版2と、ピット2aの底をなす水平部2bと機械基礎1との間に介在される防振部3と、ピット2aの側面(以下、ピット側面という)2cと機械基礎1の側面(以下、基礎側面という)1aとの間に設けられる相対変位減衰機構4と、を有している。 As shown in FIG. 1, the vibration damping structure according to this embodiment includes a machine foundation 1 as a vibration structure on which a device (not shown) that vibrates during operation, such as a rotary press, is installed, a pressure plate 2 as a support structure having a pit 2a in which the machine foundation 1 is placed, a vibration-isolating part 3 interposed between the horizontal part 2b forming the bottom of the pit 2a and the machine foundation 1, and a relative displacement damping mechanism 4 provided between the side of the pit 2a (hereinafter referred to as the pit side) 2c and the side of the machine foundation 1 (hereinafter referred to as the foundation side) 1a.

機械基礎1は、装置が載置される平面を有する直方体状の基礎であり、耐圧版2は、地盤に設けられたコンクリート製の構造体である。 The machine foundation 1 is a rectangular foundation with a flat surface on which the equipment is placed, and the pressure plate 2 is a concrete structure installed on the ground.

耐圧版2に設けられたピット2aは、平面視における形状が長方形状をなして機械基礎1が収容可能な大きさを有している。機械基礎1は、ピット2aの水平部2bに設けられた、たとえば防振ゴムなどのシート状の防振部3の上に固定されている。 The pit 2a in the pressure plate 2 is rectangular in plan view and large enough to accommodate the machine foundation 1. The machine foundation 1 is fixed onto a sheet-like vibration isolation part 3, such as vibration isolation rubber, provided on the horizontal part 2b of the pit 2a.

機械基礎1は、水平面内においてピット2aの中央に配置されており、水平部2bに防振部3を介して配置されると、機械基礎1の4つの基礎側面1aと、ピット2aの4つのピット側面2cとが各々、ほぼ同じ間隔を空けて対面する。ここで、ピット側面2cが、水平部から立ち上がる立ち上がり部に相当し、基礎側面1aが、立ち上がり部と水平方向に間隔を空けて対向する対向部に相当する。 The machine foundation 1 is placed in the center of the pit 2a in the horizontal plane, and when placed on the horizontal part 2b via the vibration isolation part 3, the four foundation sides 1a of the machine foundation 1 face the four pit sides 2c of the pit 2a at approximately the same intervals. Here, the pit sides 2c correspond to the rising parts that rise from the horizontal part, and the foundation sides 1a correspond to the opposing parts that face the rising parts at a horizontal interval.

本実施形態においては、機械基礎1の上面と耐圧版2の上面とがほぼ同一の水平面をなして設置されている。相対変位減衰機構4は、平面視における形状が長方形状をなす機械基礎1の長辺側となる基礎側面1aに図2に示すように2つ並べて配置されている。なお、以下の説明においては、水平方向のうち、平面視において機械基礎1の長辺に沿う方向を左右方向、機械基礎1の短辺に沿う方向を奥行き方向として説明する。 In this embodiment, the upper surface of the machine foundation 1 and the upper surface of the pressure plate 2 are installed on approximately the same horizontal plane. Two relative displacement damping mechanisms 4 are arranged side by side on the foundation side surface 1a, which is the long side of the machine foundation 1, which has a rectangular shape in a plan view, as shown in FIG. 2. In the following explanation, the horizontal direction is described as the left-right direction along the long side of the machine foundation 1 in a plan view, and the direction along the short side of the machine foundation 1 is described as the depth direction.

各相対変位減衰機構4は、図3、図4に示すように、基礎側面1aに設けられる基礎側部材5と、ピット側面2cに設けられるピット側部材6と、基礎側部材5とピット側部材6との間に介在される粘弾性部7と、ピット2aの水平部2bから立設されている支持部としての支持柱8と、を有している。 As shown in Figures 3 and 4, each relative displacement damping mechanism 4 has a foundation side member 5 provided on the foundation side 1a, a pit side member 6 provided on the pit side 2c, a viscoelastic part 7 interposed between the foundation side member 5 and the pit side member 6, and a support pillar 8 as a support part erected from the horizontal part 2b of the pit 2a.

基礎側部材5は、基礎側面1aに対面した状態で固定される基礎ベース板50と、基礎側面1aから、対面するピット側面2cに向かって水平に突出し基礎ベース板50を貫通する軸51と、軸51に回動自在に支持される回動体52と、を有している。 The foundation side member 5 has a foundation base plate 50 that is fixed facing the foundation side surface 1a, a shaft 51 that protrudes horizontally from the foundation side surface 1a toward the opposing pit side surface 2c and passes through the foundation base plate 50, and a rotating body 52 that is supported by the shaft 51 so as to be freely rotatable.

回動体52は、基礎側面1a及びピット側面2cとほぼ平行に配置され、互いに対向する2枚の対向部面材53、54と、2枚の対向部面材53、54の上端を繋ぎ基礎ベース板50側に延出された延出部55aを有する上面材55と、上面材55から左右方向に延出された腕部56と、腕部56の延出された先端に設けられ軸51が貫通する回動部57と、を有している。 The rotating body 52 is arranged approximately parallel to the foundation side surface 1a and the pit side surface 2c, and has two opposing surface members 53, 54 that face each other, a top surface member 55 that connects the upper ends of the two opposing surface members 53, 54 and has an extension portion 55a that extends toward the foundation base plate 50, an arm portion 56 that extends in the left-right direction from the top surface member 55, and a rotating portion 57 that is provided at the extended tip of the arm portion 56 and through which the shaft 51 passes.

回動体52は、回動部57に軸51が挿通されて回動自在に支持された状態で、基礎ベース板50と基礎ベース板50側の対向部面材53とが間隔を空けて配置されており、延出部55aの下に空間が形成されている。 The rotating body 52 is supported so that it can rotate freely with the shaft 51 inserted through the rotating part 57, and the foundation base plate 50 and the opposing surface material 53 on the foundation base plate 50 side are arranged with a gap between them, and a space is formed under the extension part 55a.

ピット側部材6は、ピット側面2cに対面させて固定されるピットベース板60と、ピットベース板60と間隔を空けて対面する第一対面材61と、第一対面材61と間隔を空けて対面する第二対面材62と、ピットベース板60の基礎側面1a側の面から突出し、第一対面材61及び第二対面材62の下端を繋ぐ下面材63とを有している。 The pit side member 6 has a pit base plate 60 fixed facing the pit side surface 2c, a first facing member 61 facing the pit base plate 60 with a gap therebetween, a second facing member 62 facing the first facing member 61 with a gap therebetween, and a bottom member 63 protruding from the surface of the pit base plate 60 facing the foundation side surface 1a and connecting the bottom ends of the first facing member 61 and the second facing member 62.

基礎側部材5が機械基礎1の基礎側面1aに設けられ、ピット側部材6が耐圧版2のピット側面2cに固定された状態では、図3に示すように、基礎ベース板50と基礎ベース板50側の対向部面材53との間に第二対面材62が配置され、2枚の対向部面材53、54の間に第一対面材61が配置される。ここで、第一対面材61及び第二対面材62が、対向部面材と間隔を空けて対面する立ち上がり部面材に相当する。 When the foundation side member 5 is provided on the foundation side 1a of the machine foundation 1 and the pit side member 6 is fixed to the pit side 2c of the pressure plate 2, as shown in FIG. 3, the second facing member 62 is disposed between the foundation base plate 50 and the facing surface member 53 on the foundation base plate 50 side, and the first facing member 61 is disposed between the two facing surface members 53, 54. Here, the first facing member 61 and the second facing member 62 correspond to the rising surface members that face the facing surface member with a gap between them.

第二対面材62の第一対面材61側の面62aと、基礎ベース板50側の対向部面材53との間に粘弾性部7が介在されており、第一対面材61の両面61aと2枚の対向部面材53、54との間にそれぞれ粘弾性部7が介在されている。 A viscoelastic portion 7 is interposed between the surface 62a of the second opposing material 62 on the side of the first opposing material 61 and the opposing surface material 53 on the side of the foundation base plate 50, and a viscoelastic portion 7 is interposed between both surfaces 61a of the first opposing material 61 and the two opposing surface materials 53, 54.

支持柱8は、図2に示すように、耐圧版2の水平部2bから立設し、軸51に支持された回動体52の腕部56の下に位置している。支持柱8は、平面視における形状が、軸51に沿う方向に長い長方形状をなしており、上端部に軸51と平行な軸回りに回動するローラー8aを備えている。軸51に支持された回動体52は、腕部56が支持柱8上に載置される。腕部56が支持柱8上に載置されて支持柱8の頂部8bに支持された回動体52は、腕部56が水平になるように設定されている。このため、相対変位減衰機構4は、機械基礎1と耐圧版2との相対変位が生じていない状態では、腕部56が水平となる状態で回動体52が支持されて設置されている。 As shown in FIG. 2, the support column 8 is erected from the horizontal part 2b of the pressure plate 2 and is located under the arm 56 of the rotating body 52 supported by the shaft 51. The support column 8 has a rectangular shape in a plan view that is long in the direction along the shaft 51, and is provided with a roller 8a at the upper end that rotates around an axis parallel to the shaft 51. The arm 56 of the rotating body 52 supported by the shaft 51 is placed on the support column 8. The arm 56 of the rotating body 52 supported by the top 8b of the support column 8 with the arm 56 placed on the support column 8 is set so that the arm 56 is horizontal. Therefore, in the relative displacement damping mechanism 4, when there is no relative displacement between the machine foundation 1 and the pressure plate 2, the rotating body 52 is supported and installed with the arm 56 horizontal.

機械基礎1上に設置された装置の振動により、機械基礎1が上方に変位すると、機械基礎1に突設された軸51に支持されている回動部57は機械基礎1と共に上方に変位する。このとき、図5に示すように、軸51に回動自在に支持されている回動部57は、腕部56が支持されている支持柱8の頂部8bよりも高くなるので、回動体52は、軸51を中心に対向部面材53、54側が支持柱8の頂部8bより低くなるように回動する。 When the machine foundation 1 is displaced upward due to vibration of the device installed on the machine foundation 1, the rotating part 57 supported by the shaft 51 protruding from the machine foundation 1 is displaced upward together with the machine foundation 1. At this time, as shown in FIG. 5, the rotating part 57 supported rotatably on the shaft 51 becomes higher than the top 8b of the support column 8 on which the arm 56 is supported, so the rotating body 52 rotates around the shaft 51 so that the opposing surface members 53 and 54 are lower than the top 8b of the support column 8.

このとき、支点となる支持柱8の頂部8bからの距離が長い対向部面材53側の上下方向の変位量は、支持柱8の頂部8bからの距離が短い回動部57側の上下方向の変位量より大きくなる。すなわち、機械基礎1と耐圧版2との上下方向の相対変位量L1よりも、対向部面材53の中央における上下方向の相対変位量L2、または、対向部面材53と第一対面材61及び第二対面材62との間に介在された粘弾性部7における軸51とは反対側の上縁角部7aの変位量L3の方が大きくなる。 At this time, the amount of vertical displacement on the opposing surface member 53 side, which is a long distance from the top 8b of the support column 8 serving as the fulcrum, is greater than the amount of vertical displacement on the rotating part 57 side, which is a short distance from the top 8b of the support column 8. In other words, the amount of vertical relative displacement L2 at the center of the opposing surface member 53, or the amount of displacement L3 of the upper edge corner 7a on the opposite side to the axis 51 in the viscoelastic part 7 interposed between the opposing surface member 53 and the first opposing material 61 and second opposing material 62, is greater than the amount of vertical relative displacement L1 between the machine foundation 1 and the pressure plate 2.

また、機械基礎1上に設置された装置の振動により、機械基礎1が下方に変位すると、機械基礎1に突設された軸51に支持されている回動部57も機械基礎1と共に下方に変位する。このとき、図6に示すように、軸51に回動自在に支持されている回動部57は、腕部56が載置されて支持されている支持柱8の頂部8bよりも低くなるので、回動体52は、軸51を中心に対向部面材53側が支持柱8の頂部8bより高くなるように回動する。 When the machine foundation 1 is displaced downward due to vibration of the device installed on the machine foundation 1, the rotating part 57 supported by the shaft 51 protruding from the machine foundation 1 is also displaced downward together with the machine foundation 1. At this time, as shown in FIG. 6, the rotating part 57 supported rotatably on the shaft 51 becomes lower than the top 8b of the support column 8 on which the arm 56 is placed and supported, so the rotating body 52 rotates around the shaft 51 so that the opposing surface material 53 side becomes higher than the top 8b of the support column 8.

このとき、支点となる支持柱8の頂部8bからの距離が長い対向部面材53側の上下方向の移動量は、支持柱8の頂部8bからの距離が短い回動部57側の上下方向の変位量より大きくなる。すなわち、機械基礎1と耐圧版2との上下方向の相対変位量L1よりも、対向部面材53の中央における上下方向の相対変位量L2、または、対向部面材53と第一対面材61及び第二対面材62との間に介在された粘弾性部7における軸51とは反対側の上縁角部7aの変位量L3の方が大きくなる。 At this time, the amount of vertical movement on the opposing surface member 53 side, which is a long distance from the top 8b of the support column 8 serving as the fulcrum, is greater than the amount of vertical displacement on the rotating part 57 side, which is a short distance from the top 8b of the support column 8. In other words, the amount of vertical relative displacement L2 at the center of the opposing surface member 53, or the amount of displacement L3 of the upper edge corner 7a on the opposite side to the axis 51 in the viscoelastic part 7 interposed between the opposing surface member 53 and the first opposing material 61 and second opposing material 62, is greater than the amount of vertical relative displacement L1 between the machine foundation 1 and the pressure plate 2.

このように、機械基礎1と耐圧版2との上下方向の相対変位量L1よりも、対向部面材53と第一対面材61及び第二対面材62とが大きく変位することにより、対向部面材53と第一対面材61及び第二対面材62との間に設けられている粘弾性部7がより大きく変形するので、単純に機械基礎1と耐圧版2との間に粘弾性部が設けられている場合よりも振動減衰効果が高められる。 In this way, the displacement of the opposing surface material 53 and the first and second opposing materials 61 and 62 is greater than the vertical relative displacement amount L1 between the machine foundation 1 and the pressure plate 2, and the viscoelastic portion 7 provided between the opposing surface material 53 and the first and second opposing materials 61 and 62 is greater, so that the vibration damping effect is enhanced compared to when a viscoelastic portion is simply provided between the machine foundation 1 and the pressure plate 2.

本実施形態の振動減衰構造によれば、耐圧版2の水平部2bと機械基礎1との間には防振部3が設けられており、耐圧版2のピット側面2cと奥行き方向に間隔を空けて対向する機械基礎1の基礎側面1aとの間には相対変位減衰機構4が設けられているので、防振部3により装置を含む機械基礎1の固有振動数を共振領域からずらすとともに長周期化し、相対変位減衰機構4により、耐圧版2に対する機械基礎1の変位を減衰させて振動を減衰させることが可能である。 According to the vibration damping structure of this embodiment, a vibration-proof part 3 is provided between the horizontal part 2b of the pressure plate 2 and the machine foundation 1, and a relative displacement damping mechanism 4 is provided between the pit side 2c of the pressure plate 2 and the foundation side 1a of the machine foundation 1, which faces the pit side 2c of the pressure plate 2 and is spaced apart in the depth direction. The vibration-proof part 3 shifts the natural frequency of the machine foundation 1 including the device from the resonance region and lengthens the period, and the relative displacement damping mechanism 4 damps the displacement of the machine foundation 1 relative to the pressure plate 2, thereby damping the vibration.

より具体的には、例えば機械基礎1上に設置される装置からは、2~50Hzの様々な振動が発生しており、装置を機械基礎1に固定することにより固有振動数は約30Hzとなり、機械基礎1の下に防振部3を介在させることにより固有振動数を約19Hzとして、粘弾性部7の効果を発揮し易い帯域まで固有振動を下げたうえで、相対変位減衰機構4により、振動自体を減衰させることができる。すなわち、機械基礎1における振動の減衰性能がより高い振動減衰構造を提供することが可能である。 More specifically, for example, a device installed on the machine foundation 1 generates various vibrations of 2 to 50 Hz, and by fixing the device to the machine foundation 1, the natural frequency becomes approximately 30 Hz, and by placing the vibration isolation part 3 under the machine foundation 1, the natural frequency becomes approximately 19 Hz. After lowering the natural vibration to a band where the effect of the viscoelastic part 7 is easily exerted, the vibration itself can be damped by the relative displacement damping mechanism 4. In other words, it is possible to provide a vibration damping structure with higher vibration damping performance in the machine foundation 1.

また、対向部面材53、54は、横方向に延出された腕部56を介して基礎側面1aに回動自在に軸支されており、腕部56は耐圧版2の水平部2bから立設された支持柱8に支持されている。このため、機械基礎1が耐圧版2に対して、下方に変位すると腕部56は支持柱8により上方に押し上げられる。このとき、軸51に軸支されている回動体52が軸51回りに回動し対向部面材53、54は上方に変位する。 Furthermore, the opposing surface members 53 and 54 are rotatably supported on the foundation side surface 1a via arms 56 extending laterally, and the arms 56 are supported by support columns 8 erected from the horizontal portion 2b of the pressure plate 2. Therefore, when the machine foundation 1 is displaced downward relative to the pressure plate 2, the arms 56 are pushed upward by the support columns 8. At this time, the rotating body 52 supported by the shaft 51 rotates around the shaft 51, and the opposing surface members 53 and 54 are displaced upward.

また、機械基礎1が耐圧版2に対して、上方に変位すると腕部56は支持柱8とともに相対的に下方に変位する。このとき、回動体52が軸51回りに回動し対向部面材53、54は下方に変位する。このため、機械基礎1と耐圧版2とが上下方向に変位することにより、ピット側面2cと基礎側面1aとの間に介在された粘弾性部7により振動が減衰される。 When the machine foundation 1 is displaced upward relative to the pressure plate 2, the arm 56 is displaced downward relative to the support column 8. At this time, the rotating body 52 rotates around the axis 51, and the opposing surface members 53, 54 are displaced downward. Therefore, as the machine foundation 1 and the pressure plate 2 are displaced in the vertical direction, vibrations are damped by the viscoelastic part 7 interposed between the pit side surface 2c and the foundation side surface 1a.

このとき、支持柱8に載置されている腕部56は、載置位置となる支持柱8の頂部8bから対向部面材53、54側の長さL4の方が、支持柱8の頂部8bから軸51側の長さL5より長いので、てこの作用により、機械基礎1と耐圧版2との相対変位より大きく、対向部面材53、54が変位する。このため、ピット側面2cと基礎側面1aとの間に粘弾性部7が直接設けられている場合よりもより効率よく振動を減衰させることが可能である。 At this time, the length L4 of the arm 56 placed on the support column 8 from the top 8b of the support column 8, which is the placement position, to the opposing surface materials 53, 54 is longer than the length L5 from the top 8b of the support column 8 to the shaft 51, so that the lever action displaces the opposing surface materials 53, 54 more than the relative displacement between the machine foundation 1 and the pressure plate 2. This makes it possible to damp vibrations more efficiently than when the viscoelastic part 7 is provided directly between the pit side surface 2c and the foundation side surface 1a.

以上、上記実施形態は、本発明の理解を容易にするためのものであり、本発明を限定して解釈するためのものではない。本発明は、その趣旨を逸脱することなく、変更、改良され得ると共に、本発明にはその等価物が含まれることはいうまでもない。 The above-described embodiments are intended to facilitate understanding of the present invention, and are not intended to limit the scope of the present invention. The present invention may be modified or improved without departing from the spirit of the invention, and it goes without saying that the present invention includes equivalents.

上記実施形態においては、ピット側面2cと基礎側面1aとの間に、回動自在に設けられた基礎側部材5と、ピット側面2cに固定されたピット側部材6との間に粘弾性部7が介在された相対変位減衰機構4が備えられている例について説明したが、これに限らず、例えば、基礎ベース板と対向部面材とが一体に形成された基礎側部材が基礎側面に固定されており、この対向部面材と、ピット側部材の第一対面材及び第二対面材との間に粘弾性部が設けられている、または、基礎側面とピット側面との間に粘弾性部が直接設けられている形態であっても構わない。 In the above embodiment, an example was described in which a relative displacement damping mechanism 4 is provided in which a viscoelastic part 7 is interposed between a foundation side member 5 that is rotatably arranged between the pit side surface 2c and the foundation side surface 1a and a pit side member 6 that is fixed to the pit side surface 2c. However, the present invention is not limited to this. For example, a foundation side member in which a foundation base plate and an opposing surface member are integrally formed is fixed to the foundation side, and a viscoelastic part is provided between this opposing surface member and the first and second opposing materials of the pit side member, or a viscoelastic part is provided directly between the foundation side surface and the pit side surface.

上記実施形態においては、相対変位減衰機構4が、機械基礎1の左右方向に沿う基礎側面1aとピット側面2cとの間に設けられている例について説明したが、機械基礎1の奥行き方向に沿う基礎側面1aとピット側面2cとの間に設けられていてもよい。また、機械基礎1の左右方向に沿う基礎側面1aとピット側面2cとの間、及び、機械基礎1の奥行き方向に沿う基礎側面1aとピット側面2cとの間に各々設けられていても構わない。 In the above embodiment, an example was described in which the relative displacement damping mechanism 4 is provided between the foundation side 1a and the pit side 2c along the left-right direction of the machine foundation 1, but it may also be provided between the foundation side 1a and the pit side 2c along the depth direction of the machine foundation 1. It may also be provided between the foundation side 1a and the pit side 2c along the left-right direction of the machine foundation 1, and between the foundation side 1a and the pit side 2c along the depth direction of the machine foundation 1.

また、ピット側面と基礎側面との間に設ける相対変位減衰機構は、例えば、オイルダンパなど振動を減衰可能なダンパであれば構わない。
また、上記実施形態においては、振動構造を機械基礎1とし、支持構造を耐圧版2とした例について説明したがこれに限るものではない。
Furthermore, the relative displacement damping mechanism provided between the pit side and the foundation side may be any damper capable of damping vibrations, such as an oil damper.
In the above embodiment, an example has been described in which the vibration structure is the machine foundation 1 and the support structure is the pressure plate 2, but the present invention is not limited to this.

1 機械基礎(振動構造に相当)
1a 基礎側面(対向部に相当)
2 耐圧版(支持構造に相当)
2a ピット
2b 水平部
2c ピット側面(立ち上がり部に相当)
3 防振部
4 相対変位減衰機構
5 基礎側部材
6 ピット側部材
7 粘弾性部
7a 上縁角部
8 支持柱(支持部に相当)
8a ローラー
8b 頂部
50 基礎ベース板
51 軸
52 回動体
53 対向部面材
54 対向部面材
55 上面材
55a 延出部
56 腕部
57 回動部
60 ピットベース板
61 第一対面材(立ち上がり部面材に相当)
61a 第一対面材の両面
62 第二対面材(立ち上がり部面材に相当)
62a 第二対面材の第一対面材側の面
63 下面材
L1 相対変位量
L2 相対変位量
L3 変位量
L4 腕部における支持柱の頂部から対向部面材の側の長さ、
L5 腕部における支持柱の頂部からから回動部の側の長さ、
1. Machine foundation (corresponding to a vibrating structure)
1a Foundation side (corresponding to the opposing part)
2 Pressure plate (corresponding to the support structure)
2a Pit 2b Horizontal part 2c Pit side (corresponding to the rising part)
3 Vibration-isolating portion 4 Relative displacement damping mechanism 5 Foundation-side member 6 Pit-side member 7 Viscoelastic portion 7a Upper edge corner portion 8 Support column (corresponding to the support portion)
8a Roller 8b Top 50 Foundation base plate 51 Shaft 52 Rotating body 53 Facing surface material 54 Facing surface material 55 Top surface material 55a Extension 56 Arm 57 Rotating part 60 Pit base plate 61 First facing material (corresponding to rising surface material)
61a: both sides of the first facing material; 62: second facing material (corresponding to the rising surface material);
62a: Surface of the second opposing member on the side of the first opposing member 63: Lower surface member L1: Relative displacement amount L2: Relative displacement amount L3: Displacement amount L4: Length from the top of the support column in the arm portion to the opposing surface member side,
L5: the length of the arm from the top of the support column to the side of the rotating part,

Claims (4)

支持構造に設けられる振動構造の振動を減衰する振動減衰構造であって、
前記支持構造は、前記振動構造の下に設けられる水平部と、
前記水平部から立ち上がる立ち上がり部と、
を有し、
前記振動構造は、前記立ち上がり部と水平方向に間隔を空けて対向する対向部を有し、
前記水平部の上に防振部を介して設けられており、
前記立ち上がり部の側と前記対向部の側とに各々固定され、前記立ち上がり部と前記対向部との相対変位を減衰する相対変位減衰機構を有し、
前記相対変位減衰機構は、
前記立ち上がり部の側と前記対向部の側とに各々固定される粘弾性部を有していることを特徴とする振動減衰構造。
A vibration damping structure for damping vibration of a vibration structure provided on a support structure,
The support structure includes a horizontal portion provided under the vibration structure;
a rising portion rising from the horizontal portion;
having
the vibration structure has an opposing portion facing the rising portion with a gap therebetween in a horizontal direction,
A vibration isolating part is provided on the horizontal part,
a relative displacement attenuation mechanism that is fixed to the rising portion and the opposing portion and that attenuates the relative displacement between the rising portion and the opposing portion,
The relative displacement damping mechanism includes:
A vibration damping structure comprising a viscoelastic portion fixed to each of the raised portion and the opposing portion.
請求項1に記載の振動減衰構造であって、
前記振動構造は、前記対向部から前記立ち上がり部の側に向かって突出する軸、及び、前記立ち上がり部と間隔を空けて対面し前記粘弾性部が固定される対向部面材と、前記対向部面材から横方向に延出される腕部と、前記腕部の先端に設けられ、前記軸に回動自在に支持される回動部と、が一体をなす回動体、を有し、
前記支持構造は、前記水平部から立設し、前記腕部が載置された頂部にて前記回動体を支持する支持部を有し、
前記腕部は、前記頂部から前記対向部面材の側の長さの方が、前記頂部から前記回動部の側の長さより長いことを特徴とする振動減衰構造。
2. The vibration damping structure according to claim 1,
The vibration structure includes a shaft protruding from the facing portion toward the rising portion, a facing surface member facing the rising portion with a gap therebetween and to which the viscoelastic portion is fixed, an arm portion extending laterally from the facing surface member, and a rotating portion provided at the tip of the arm portion and supported by the shaft so as to be freely rotatable, forming a rotating body integral therewith;
the support structure has a support portion that stands upright from the horizontal portion and supports the rotating body at a top portion on which the arm portion is placed,
A vibration damping structure, characterized in that the length of the arm portion from the top to the opposing surface material side is longer than the length of the arm portion from the top to the rotating portion side.
請求項2に記載の振動減衰構造であって、
前記立ち上がり部は、前記対向部面材と間隔を空けて対面する立ち上がり部面材を有し、
前記粘弾性部は、前記立ち上がり部面材と前記対向部面材とに各々固定されていることを特徴とする振動減衰構造。
3. The vibration damping structure according to claim 2,
The rising portion has a rising surface material that faces the opposing surface material with a gap therebetween,
A vibration damping structure characterized in that the viscoelastic portion is fixed to each of the raised portion surface material and the opposing portion surface material.
支持構造に設けられる振動構造の振動を減衰する振動減衰構造であって、
前記支持構造は、前記振動構造の下に設けられる水平部と、
前記水平部から立ち上がる立ち上がり部と、
を有し、
前記振動構造は、前記立ち上がり部と水平方向に間隔を空けて対向する対向部を有し、
前記水平部の上に防振部を介して設けられており、
前記立ち上がり部の側と前記対向部の側とに各々固定され、前記立ち上がり部と前記対向部との相対変位を減衰する相対変位減衰機構を有し、
前記振動構造は、作動の際に振動を伴う装置が設置される機械基礎であることを特徴とする振動減衰構造。
A vibration damping structure for damping vibration of a vibration structure provided on a support structure,
The support structure includes a horizontal portion provided under the vibration structure;
a rising portion rising from the horizontal portion;
having
the vibration structure has an opposing portion facing the rising portion with a gap therebetween in a horizontal direction,
A vibration isolating part is provided on the horizontal part,
a relative displacement attenuation mechanism that is fixed to the rising portion and the opposing portion and that attenuates the relative displacement between the rising portion and the opposing portion,
A vibration damping structure, characterized in that the vibration structure is a machine foundation on which equipment that generates vibrations during operation is installed.
JP2021055954A 2021-03-29 2021-03-29 Vibration damping structure Active JP7596892B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2021055954A JP7596892B2 (en) 2021-03-29 2021-03-29 Vibration damping structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021055954A JP7596892B2 (en) 2021-03-29 2021-03-29 Vibration damping structure

Publications (2)

Publication Number Publication Date
JP2022152975A JP2022152975A (en) 2022-10-12
JP7596892B2 true JP7596892B2 (en) 2024-12-10

Family

ID=83556304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021055954A Active JP7596892B2 (en) 2021-03-29 2021-03-29 Vibration damping structure

Country Status (1)

Country Link
JP (1) JP7596892B2 (en)

Also Published As

Publication number Publication date
JP2022152975A (en) 2022-10-12

Similar Documents

Publication Publication Date Title
JP7596892B2 (en) Vibration damping structure
JP7133431B2 (en) Anti-vibration device
JPH08152045A (en) Anti-vibration device for structures
JPH07259379A (en) Three-dimensional seismic isolation device
JP2011220511A (en) Vibration control device
JPH10159895A (en) Vibration eliminator
JP7141638B2 (en) Vibration isolation structure
JP2013092244A (en) Fall prevention device
JP2023100172A (en) Seismic isolation damper mechanism
JP2006194073A (en) Vibration reducer
KR101328791B1 (en) Vibration isolation device
JP2010193658A (en) Vibrator support stand and method of suppressing resonance with the support stand
RU2349810C1 (en) Flat antivibration support
KR101832624B1 (en) Vibration Absorbing Device
JP2002167779A (en) Basic structure of equipment
JP2011099301A (en) Floor-supporting vibration absorption implement and floor structure
JP7596929B2 (en) Anti-vibration foundation
JP2020190286A (en) Seismic isolator
JP4709041B2 (en) Vibration control device
JP4529049B2 (en) Vibration isolator
JPH0579220A (en) Frame incorporated damping device
JP3829735B2 (en) Floor panel support structure
JPH07109821A (en) Floor base isolation device
JPH0328198Y2 (en)
JP2004340272A (en) Vibration control bed

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20240625

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240702

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240814

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240917

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241003

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241029

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20241111

R150 Certificate of patent or registration of utility model

Ref document number: 7596892

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150