JP7604277B2 - Processing Equipment - Google Patents

Description

The present invention relates to a processing device that removes a convex ring-shaped reinforcement portion from a wafer that has a convex ring-shaped reinforcement portion formed on the back surface corresponding to the peripheral excess area.

The wafer has a device area on the front surface, where multiple devices such as ICs and LSIs are partitioned by planned division lines, and a peripheral excess area surrounding the device area.The back surface is ground to the desired thickness, and then the wafer is divided into individual device chips using a dicing machine and laser processing machine.Each divided device chip is used in electrical equipment such as mobile phones and personal computers.

The applicant has proposed a technology in which a ring-shaped reinforcing portion is left on the back surface of the wafer corresponding to the peripheral excess area to facilitate transportation of the ground wafer, and the wafer is then subjected to a prescribed process, followed by adhering a dicing tape to the back surface of the wafer and supporting the wafer with a frame, and removing the ring-shaped reinforcing portion from the wafer (see, for example, Patent Document 1).

JP 2010-62375 A

However, there are problems with the difficulty of attaching dicing tape to the back surface of the wafer, which has a convex ring-shaped reinforcement portion formed on the back surface corresponding to the peripheral excess area, and integrating it with the frame, as well as the difficulty of cutting and removing the ring-shaped reinforcement portion from the wafer, resulting in poor productivity.

In view of the above, the objective of the present invention is to provide a processing device that can easily attach a dicing tape to the back surface of a wafer having a convex ring-shaped reinforcing portion formed on the back surface corresponding to the peripheral excess area, and can easily integrate the back surface with a frame, and can also easily cut and remove the ring-shaped reinforcing portion from the wafer.

According to the present invention, the following processing device is provided to solve the above problem. That is, the processing device removes the convex reinforcement portion from a wafer having a ring-shaped reinforcement portion formed in a convex shape on the back surface corresponding to the peripheral excess area, and includes a wafer cassette table on which a wafer cassette containing multiple wafers is placed, wafer carrying means for carrying out wafers from the wafer cassette placed on the wafer cassette table, a wafer table for supporting the front side of the wafer carried out by the wafer carrying means, frame housing means for housing multiple ring-shaped frames each having an opening formed therein for housing a wafer, frame carrying means for carrying out frames from the frame housing means, and a frame carrying means for carrying out the frames carried out by the frame carrying means. a frame table for supporting the frame; tape application means disposed above the frame table for applying tape to the frame; tape-attached frame transport means for transporting the frame with the tape applied to it to the wafer table and placing the tape-attached frame on the wafer table by positioning an opening of the frame over the back surface of the wafer supported on the wafer table; tape pressing means for pressing the tape of the tape-attached frame onto the back surface of the wafer; frame unit carrying means for carrying out from the wafer table a frame unit in which the tape of the tape-attached frame and the back surface of the wafer are pressed together by the tape pressing means; a reinforcing part removing means for cutting and removing a ring-shaped reinforcing part from the wafer of the frame unit that has been delivered, a ring-free unit carrying-out means for carrying-out the ring-free unit from the reinforcing part removing means, and a frame cassette table on which a frame cassette containing the ring-free unit carried-out by the ring-free unit carrying-out means is placed, and the tape pressing means includes an upper chamber disposed above the wafer table, a lower chamber that contains the wafer table, and an elevator that raises and lowers the upper chamber to generate a closed state in which it is in contact with the lower chamber and an open state in which it is separated from the lower chamber. The processing device has a closed state, a vacuum section that evacuates the upper chamber and the lower chamber in the closed state, and an atmosphere opening section that opens the upper chamber and the lower chamber to the atmosphere. With the tape of the tape frame positioned on the back surface of the wafer supported on the wafer table, the lifting mechanism is operated to evacuate the upper chamber and the lower chamber while maintaining the closed state, and the tape of the tape frame is pressed against the back surface of the wafer with a pressure roller disposed in the upper chamber, and the pressure roller is applied multiple times to the tape corresponding to a notch formed on the outer periphery of the wafer to press the tape against the notch.

The processing apparatus of the present invention is a processing apparatus for removing a convex reinforcement portion from a wafer having a ring-shaped reinforcement portion formed in a convex shape on the back surface corresponding to the peripheral excess area, and includes a wafer cassette table on which a wafer cassette containing multiple wafers is placed, a wafer carrying means for carrying out wafers from the wafer cassette placed on the wafer cassette table, a wafer table for supporting the front side of the wafer carried out by the wafer carrying means, a frame storage means for storing multiple ring-shaped frames each having an opening for storing a wafer, a frame carrying means for carrying out the frame from the frame storage means, a frame table for supporting the frame carried out by the frame carrying means, and a frame table for supporting the frame. a tape applying means disposed above the table and applying tape to the frame; a tape-attached frame transport means for transporting the frame with the tape applied to it to the wafer table and positioning an opening of the frame over the back surface of the wafer supported on the wafer table and placing the tape-attached frame on the wafer table; a tape pressing means for pressing the tape of the tape-attached frame onto the back surface of the wafer; a frame unit carrying means for carrying out from the wafer table a frame unit in which the tape of the tape-attached frame and the back surface of the wafer are pressed together by the tape pressing means; a reinforcing part removing means for cutting and removing a ring-shaped reinforcing part from the wafer of the frame unit carried out by the frame unit carrying means; a ring-free unit carrying-out means for carrying out the ring-free unit from which the strong portion has been removed from the reinforcing portion removing means, and a frame cassette table on which a frame cassette containing the ring-free unit carried out by the ring-free unit carrying-out means is placed, the tape pressing means comprising an upper chamber disposed above the wafer table, a lower chamber containing the wafer table, a lifting mechanism for raising and lowering the upper chamber to generate a closed state in which it is in contact with the lower chamber and an open state in which it is separated from the lower chamber, a vacuum section for evacuating the upper chamber and the lower chamber in the closed state, and an atmosphere opening section for opening the upper chamber and the lower chamber to the atmosphere, With the tape of the tape-attached frame positioned on the back surface of the wafer supported on the wafer table, the lift mechanism is operated to maintain the closed state while evacuating the upper and lower chambers, and the tape of the tape-attached frame is pressed against the back surface of the wafer by a pressure roller disposed in the upper chamber, and the pressure roller is applied multiple times to the tape corresponding to the notch formed on the outer periphery of the wafer to press the tape against the notch. This makes it easy to attach a dicing tape to the back surface of the wafer, which has a ring-shaped reinforcement portion formed in a convex shape on the back surface corresponding to the outer periphery excess area, and to integrate the dicing tape with the frame, and also makes it easy to cut and remove the ring-shaped reinforcement portion from the wafer, resulting in good productivity. In addition, in the processing device of the present invention, by applying the pressure roller multiple times to firmly press the tape against the notch, when the air-opening portion is opened to the atmosphere, air does not enter between the wafer and the tape through the notch, and the tape can be tightly attached to the base of the convex reinforcement portion by atmospheric pressure.

1 is a perspective view of a processing device constructed in accordance with the present invention; 2 is a perspective view of a wafer to be processed by the processing apparatus shown in FIG. 1 . FIG. 2 is a perspective view of a wafer cassette table and the like shown in FIG. FIG. 2 is a perspective view of the hand shown in FIG. 1 . FIG. 2 is a perspective view of a frame receiving means and the like shown in FIG. 1 . 2A is a perspective view of the tape application means etc. when the frame table shown in FIG. 1 is in a lowered position; FIG. 2B is a perspective view of the tape application means etc. when the frame table shown in FIG. 1 is in an elevated position; FIG. 2 is an exploded perspective view of the tape pressing means shown in FIG. 1 . 11 is a cross-sectional view showing a state in which the pressure roller starts to press the tape in the tape pressing process. FIG. 13 is a cross-sectional view showing a state in which pressing of the tape by the pressing roller has been completed in the tape pressing process. FIG. 13A is a perspective view of a frame unit, and FIG. 13B is a perspective view showing a state in which a pressure roller is applied multiple times to a tape corresponding to a notch in a tape pressing process. FIG. 2 is a perspective view of the reinforcement portion removing means shown in FIG. 1 . FIG. 13 is a schematic diagram showing a state in which a laser beam is irradiated onto the base of the wafer in the reinforcing portion removal process. FIG. 2 is a perspective view of a first lifting table of the reinforcement-part removing means shown in FIG. 1 . FIG. 2 is a perspective view of a separation portion of the reinforcement portion removing means shown in FIG. 1 . FIG. 13 is a schematic diagram showing a state in which the reinforcing portion is being separated from the wafer in the reinforcing portion removing step. FIG. 2 is a perspective view of a discard portion of the reinforcement portion removing means shown in FIG. 1 . FIG. 2 is a perspective view of an inversion mechanism of the ring-free unit discharge means shown in FIG. 2 is a perspective view of a ring-free unit supporting portion and a pushing portion of the ring-free unit carrying-out means shown in FIG. 1 . FIG. 13 is a perspective view showing a state in which a ring-less unit accommodation step is being performed.

Below, a preferred embodiment of a processing device constructed according to the present invention will be described with reference to the drawings.

Referring to FIG. 1, the processing device generally designated by the reference symbol 2 includes a wafer cassette table 8 on which a wafer cassette 6 containing a plurality of wafers is placed, a wafer unloading means 10 for unloading wafers from the wafer cassette 6 placed on the wafer cassette table 8, and a wafer table 12 for supporting the front side of the wafer unloaded by the wafer unloading means 10.

Figure 2 shows a wafer 4 to be processed by a processing device 2. The front surface 4a of the wafer 4 is formed with a device region 18 in which a plurality of devices 14 such as ICs and LSIs are partitioned by a lattice-shaped division line 16, and a peripheral surplus region 20 surrounding the device region 18. In Figure 2, the boundary 22 between the device region 18 and the peripheral surplus region 20 is shown by a two-dot chain line for convenience, but in reality there is no line indicating the boundary 22. On the back surface 4b side of the wafer 4, a ring-shaped reinforcing portion 24 is formed in a convex shape in the peripheral surplus region 20, and the thickness of the peripheral surplus region 20 is greater than the thickness of the device region 18. In addition, a notch 26 indicating the crystal orientation is formed on the periphery of the wafer 4.

As shown in FIG. 3, a wafer cassette 6 contains multiple wafers 4 spaced apart in the vertical direction with the surfaces 4a facing upward. The wafer cassette table 8 in the illustrated embodiment has a top plate 28 on which the wafer cassette 6 is placed, and a support plate 30 that supports the top plate 28. The top plate 28 can be raised and lowered freely, and a lifting means may be provided to raise and lower the top plate 28 to position it at any height.

Continuing the explanation with reference to FIG. 3, the wafer unloading means 10 includes a Y-axis movable member 32 that can move in the Y-axis direction indicated by the arrow Y in FIG. 3, and a Y-axis feed means 34 that moves the Y-axis movable member 32 in the Y-axis direction. The Y-axis feed means 34 includes a ball screw 36 that is connected to the lower end of the Y-axis movable member 32 and extends in the Y-axis direction, and a motor 38 that rotates the ball screw 36. The Y-axis feed means 34 converts the rotational motion of the motor 38 into linear motion by the ball screw 36 and transmits it to the Y-axis movable member 32, and moves the Y-axis movable member 32 in the Y-axis direction along a pair of guide rails 40 that extend in the Y-axis direction. The X-axis direction indicated by the arrow X in FIG. 3 is a direction perpendicular to the Y-axis direction, and the Z-axis direction indicated by the arrow Z in FIG. 3 is a vertical direction perpendicular to the X-axis direction and the Y-axis direction. The XY plane defined by the X-axis direction and the Y-axis direction is substantially horizontal.

As shown in FIG. 3, the wafer unloading means 10 of the illustrated embodiment includes a transport arm 42 and a hand 44 that is disposed at the tip of the transport arm 42 and supports the back surface 4b of the wafer 4 contained in the wafer cassette 6 to turn the wafer 4 over. The transport arm 42 is provided on the upper surface of the Y-axis movable member 32 and is driven by an appropriate drive source (not shown) such as an air drive source or an electric drive source. This drive source drives the transport arm 42 to position the hand 44 at any position in each of the X-axis, Y-axis, and Z-axis directions, and also turns the hand 44 upside down.

Referring to FIG. 4, the hand 44 is preferably a Bernoulli pad that generates negative pressure by ejecting air and supports the wafer 4 without contact. In the illustrated embodiment, the hand 44 is generally C-shaped, and one side of the hand 44 is formed with a plurality of air ejection ports 46 connected to a compressed air supply source (not shown). A plurality of guide pins 48 are attached to the outer periphery of the hand 44 at intervals in the circumferential direction. Each guide pin 48 is configured to be freely movable in the radial direction of the hand 44.

As shown in Figures 3 and 4, the wafer unloading means 10 positions the hand 44 on the back surface 4b (lower side) of the wafer 4 in the wafer cassette 6 placed on the wafer cassette table 8, and then ejects compressed air from the air ejection port 46 of the hand 44 to generate negative pressure on one side of the hand 44 by the Bernoulli effect, and the hand 44 suction-supports the wafer 4 from the back surface 4b without contact. The horizontal movement of the wafer 4 suction-supported by the hand 44 is regulated by each guide pin 48. The wafer unloading means 10 then moves the Y-axis movable member 32 and the transport arm 42 to unload the wafer 4 suction-supported by the hand 44 from the wafer cassette 6.

As shown in FIG. 4, the wafer unloading means 10 in the illustrated embodiment is equipped with a notch detection means 50 that detects the position of the notch 26 in the wafer 4. The notch detection means 50 may include, for example, a light-emitting element 52 and a light-receiving element 54 spaced apart from each other in the vertical direction, and a drive source (not shown) that rotates at least one of the guide pins 48 of the hand 44.

The light-emitting element 52 and the light-receiving element 54 can be attached to the Y-axis movable member 32 or the transport path via an appropriate bracket (not shown). When the guide pin 48 is rotated by the drive source, the rotation of the guide pin 48 causes the wafer 4 supported by suction in the hand 44 to rotate. In order to reliably transmit the rotation from the guide pin 48 to the wafer 4, it is preferable that the outer circumferential surface of the guide pin 48, which is rotated by the drive source, is formed from an appropriate synthetic rubber.

The notch detection means 50 can detect the position of the notch 26 by rotating the wafer 4 via the guide pin 48 with the drive source while the wafer 4 is supported by suction with the hand 44 and the outer periphery of the wafer 4 is positioned between the light emitting element 52 and the light receiving element 54. This makes it possible to adjust the orientation of the wafer 4 to any orientation.

As shown in FIG. 3, the wafer table 12 is disposed adjacent to the wafer unloading means 10. The wafer table 12 in the illustrated embodiment includes an annular support portion 56 that supports the peripheral excess region 20 of the wafer 4 and keeps the portion inside the peripheral excess region 20 out of contact, and a frame support portion 58 that is disposed on the outer periphery of the annular support portion 56 and supports a frame 64 (see FIG. 5) described below. A plurality of suction holes 60 are formed on the upper surface of the annular support portion 56 and spaced apart in the circumferential direction, and each suction hole 60 is connected to a suction means (not shown). The portion of the wafer table 12 radially inward of the annular support portion 56 is a circular recess 62 recessed downward.

When the hand 44 is turned 180° to invert the wafer 4 and place the wafer 4 on the wafer table 12 with the surface 4a of the wafer 4 facing downward, the peripheral excess region 20 of the wafer 4 is supported by the annular support 56 and the device region 18 of the wafer 4 is located in the recess 62. Therefore, even if the wafer 4 is placed on the wafer table 12 with the surface 4a on which the devices 14 are formed facing downward, the devices 14 and the wafer table 12 do not come into contact with each other, preventing damage to the devices 14. In addition, after the wafer table 12 supports the peripheral excess region 20 with the annular support 56, the suction means is activated to generate suction force in each suction hole 60 to suction and hold the peripheral excess region 20, thereby preventing the wafer 4 from shifting out of position.

Referring to FIG. 5, the processing device 2 further includes a frame housing means 66 that houses a plurality of ring-shaped frames 64 each having an opening 64a for housing a wafer 4, a frame ejection means 68 that ejects the frame 64 from the frame housing means 66, and a frame table 70 that supports the frame 64 ejected by the frame ejection means 68.

5, the frame accommodating means 66 of the illustrated embodiment includes a housing 72, a lift plate 74 arranged in the housing 72 so as to be freely raised and lowered, and a lifting means (not shown) for raising and lowering the lift plate 74. In FIG. 5, a Z-axis guide member 78 extending in the Z-axis direction is arranged on the side surface of the housing 72 at the rear side in the X-axis direction. The lift plate 74 is supported by the Z-axis guide member 78 so as to be freely raised and lowered, and the lifting means for raising and lowering the lift plate 74 is arranged inside the Z-axis guide member 78. The lifting means may be configured to have, for example, a ball screw connected to the lift plate 74 and extending in the Z-axis direction, and a motor for rotating the ball screw. In FIG. 5, a door 76 with a handle 76a attached is provided on the side surface of the housing 72 at the front side in the X-axis direction, and in the frame accommodating means 66, the handle 76a is grasped to open the door 76, so that the frame 64 can be accommodated inside the housing 72. In addition, an opening 80 is provided at the upper end of the housing 72.

As shown in FIG. 5, the frames 64 are stacked and accommodated on the top surface of the lift plate 74 inside the housing 72. The topmost frame 64 of the stacked frames 64 is removed from an opening 80 in the housing 72 by a frame removal means 68. When a frame 64 is removed from the opening 80, the frame accommodation means 66 appropriately raises the lift plate 74 by the lifting means, and positions the topmost frame 64 at a position where it can be removed by the frame removal means 68.

Continuing the explanation with reference to FIG. 5, the frame ejection means 68 includes an X-axis guide member 82 fixed to an appropriate bracket (not shown) and extending in the X-axis direction, an X-axis movable member 84 supported by the X-axis guide member 82 so as to be movable in the X-axis direction, an X-axis feed means (not shown) for moving the X-axis movable member 84 in the X-axis direction, a Z-axis movable member 86 supported by the X-axis movable member 84 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the Z-axis movable member 86 in the Z-axis direction. The X-axis feed means of the frame ejection means 68 may be configured to have a ball screw connected to the X-axis movable member 84 and extending in the X-axis direction, and a motor for rotating the ball screw, and the Z-axis feed means may be configured to have a ball screw connected to the Z-axis movable member 86 and extending in the Z-axis direction, and a motor for rotating the ball screw.

The Z-axis movable member 86 of the frame ejection means 68 has a holding portion 88 that holds the frame 64. In the illustrated embodiment, the holding portion 88 has a rectangular substrate 90 and a number of suction pads 92 provided on the underside of the substrate 90, and each suction pad 92 is connected to a suction means (not shown).

The frame ejection means 68 sucks and holds the top frame 64 housed in the frame housing means 66 with the suction pad 92 of the holding portion 88, and then moves the X-axis movable member 84 and the Z-axis movable member 86 to eject the top frame 64 held by suction from the frame housing means 66.

As shown in FIG. 5, the frame table 70 is supported by the Z-axis guide member 94 so that it can be raised and lowered between a lowered position indicated by a solid line and an elevated position indicated by a two-dot chain line. The Z-axis guide member 94 is provided with an appropriate drive source (e.g., an air drive source or an electric drive source) for raising and lowering the frame table 70 between the lowered position and the elevated position. The frame table 70 is adapted to receive the frame 64 discharged by the frame discharge means 68 at the lowered position.

As shown in Figures 1 and 5, the processing device 2 includes a tape application means 98 (see Figure 1) that is disposed above the frame table 70 and applies tape 96 to the frame 64, a tape frame transport means 100 (see Figure 5) that transports the frame 64 with the tape 96 applied (hereinafter sometimes referred to as the "taped frame 64'") to the wafer table 12 and positions the opening 64a of the frame 64 on the back surface 4b of the wafer 4 supported by the wafer table 12 to place the tape frame 64' on the wafer table 12, and a tape pressing means 102 (see Figure 1) that presses the tape 96 of the tape frame 64' against the back surface 4b of the wafer 4.

Referring to FIG. 6, the tape application means 98 in the illustrated embodiment includes a roll tape support section 104 that supports a roll tape 96R on which unused tape 96 is wound, a tape winding section 106 that winds up used tape 96, a tape pull-out section 108 that pulls out the tape 96 from the roll tape 96R, a pressing section 110 that presses the pulled-out tape 96 onto the frame 64, and a cutting section 112 that cuts off any tape 96 that protrudes beyond the outer periphery of the frame 64 along the frame 64.

As shown in FIG. 6, the roll tape support section 104 includes a support roller 114 supported by an appropriate bracket (not shown) so as to be rotatable about an axis extending in the X-axis direction. The support roller 114 supports a roll tape 96R wound into a cylindrical shape, with release paper 116 attached to the adhesive surface of the tape 96 to protect the adhesive surface of the tape 96.

The tape winding unit 106 includes a winding roller 118 supported by an appropriate bracket (not shown) so as to be rotatable about an axis extending in the X-axis direction, and a motor (not shown) that rotates the winding roller 118. As shown in FIG. 6, the tape winding unit 106 rotates the winding roller 118 by the motor, thereby winding up the used tape 96, which has a circular opening 120 formed therein that corresponds to the portion attached to the frame 64.

Continuing the explanation with reference to FIG. 6, the tape pull-out unit 108 includes a pull-out roller 122 disposed below the support roller 114 of the roll tape support unit 104, a motor (not shown) that rotates the pull-out roller 122, and a driven roller 124 that rotates with the rotation of the pull-out roller 122. The tape pull-out unit 108 rotates the driven roller 124 together with the pull-out roller 122 by the motor, thereby pulling out the tape 96 sandwiched between the pull-out roller 122 and the driven roller 124 from the roll tape 96R.

The release paper 116 is peeled off from the tape 96 that has passed between the pull-out roller 122 and the driven roller 124, and the peeled release paper 116 is wound up by the release paper winding section 126. In the illustrated embodiment, the release paper winding section 126 has a release paper winding roller 128 arranged above the driven roller 124, and a motor (not shown) that rotates the release paper winding roller 128. In addition, the tape 96 from which the release paper 116 has been peeled off is guided to the winding roller 118 via a guide roller 130 arranged at a distance from the pull-out roller 122 in the Y-axis direction.

The bonding unit 110 includes a pressure roller 132 arranged to be movable in the Y-axis direction, and a Y-axis feed means (not shown) for moving the pressure roller 132 in the Y-axis direction. The Y-axis feed means of the bonding unit 110 can be composed of an appropriate drive source (for example, an air drive source or an electric drive source).

6, the cutting unit 112 includes a Z-axis guide member 134 fixed to an appropriate bracket (not shown) and extending in the Z-axis direction, a Z-axis movable member 136 supported by the Z-axis guide member 134 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the Z-axis movable member 136 in the Z-axis direction. The Z-axis feed means of the cutting unit 112 may be configured to include a ball screw connected to the Z-axis movable member 136 and extending in the Z-axis direction, and a motor for rotating the ball screw.

The cutting section 112 also includes a motor 138 fixed to the underside of the tip of the Z-axis movable member 136, and an arm piece 140 rotated by the motor 138 around an axis extending in the Z-axis direction. First and second hanging pieces 142a, 142b are attached to the underside of the arm piece 140 at a distance from each other. A circular cutter 144 is supported on the first hanging piece 142a so as to be rotatable around an axis perpendicular to the Z-axis direction, and a pressure roller 146 is supported on the second hanging piece 142b so as to be rotatable around an axis perpendicular to the Z-axis direction.

Before the frame table 70, which has received the frame 64 from the frame discharge means 68, is moved from the lowered position (the position shown in FIG. 6(a)) to the raised position (the position shown in FIG. 6(b)), the tape application means 98 draws out the unused tape 96 using the draw-out roller 122 and the driven roller 124. Then, the frame table 70 is positioned at the raised position so that the pressure roller 132 of the pressure bonding unit 110 can press the tape 96 against the frame 64, and the pressure roller 132 is brought into contact with the frame 64 via the tape 96. Then, the pressure roller 132 rolls in the Y-axis direction while pressing the adhesive surface of the tape 96 against the frame 64 with the pressure roller 132. This allows the tape 96 drawn out from the roll tape 96R by the tape draw-out unit 108 to be pressure bonded to the frame 64.

After the tape 96 is pressed against the frame 64, the tape application means 98 lowers the Z-axis movable member 136 of the cutting section 112 by the Z-axis feed means, presses the cutter 144 against the tape 96 on the frame 64, and presses the frame 64 from above the tape 96 with the pressure roller 146. Next, the motor 138 rotates the arm piece 140, and moves the cutter 144 and the pressure roller 146 in a circular motion along the frame 64. This allows the tape 96 that protrudes beyond the outer periphery of the frame 64 to be cut along the frame 64. In addition, since the pressure roller 146 presses the frame 64 from above the tape 96, the frame 64 and the tape 96 are prevented from shifting in position when the tape 96 is being cut. Then, after the frame table 70 is lowered, the used tape 96 with the circular opening 120 formed in the portion that was pasted to the frame 64 is taken up by the tape take-up section 106.

5, the tape-attached frame transport means 100 includes a Y-axis guide member 148 fixed to an appropriate bracket (not shown) and extending in the Y-axis direction, a Y-axis movable member 150 supported by the Y-axis guide member 148 so as to be movable in the Y-axis direction, a Y-axis feed means (not shown) for moving the Y-axis movable member 150 in the Y-axis direction, a Z-axis movable member 152 supported by the Y-axis movable member 150 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the Z-axis movable member 152 in the Z-axis direction. The Y-axis feed means of the tape-attached frame transport means 100 may be configured to have a ball screw connected to the Y-axis movable member 150 and extending in the Y-axis direction, and a motor for rotating the ball screw, and the Z-axis feed means may be configured to have a ball screw connected to the Z-axis movable member 152 and extending in the Z-axis direction, and a motor for rotating the ball screw.

The Z-axis movable member 152 of the tape-attached frame transport means 100 has a holding portion 154 that holds the tape-attached frame 64'. In the illustrated embodiment, the holding portion 154 has a rectangular base plate 156 and a plurality of suction pads 158 provided on the underside of the base plate 156, and each suction pad 158 is connected to a suction means (not shown).

The tape-attached frame transport means 100 holds the upper surface of the tape-attached frame 64' supported on the frame table 70 with the adhesive side of the tape 96 facing downwards using the suction pads 158 of the holding portion 154, and by moving the Y-axis movable member 150 and the Z-axis movable member 152, transports the tape-attached frame 64' held by the holding portion 154 from the frame table 70 to the wafer table 12, and places the tape-attached frame 64' on the wafer table 12 by positioning the opening 64a of the frame 64 on the back surface 4b of the wafer 4 supported on the wafer table 12.

The tape pressing means 102 will be described with reference to Figures 7 to 9. As shown in Figure 7, the tape pressing means 102 includes an upper chamber 160 disposed above the wafer table 12, a lower chamber 162 housing the wafer table 12, a lifting mechanism 164 that raises and lowers the upper chamber 160 to generate a closed state in which the upper chamber 160 is in contact with the lower chamber 162 and an open state in which the upper chamber 160 is separated from the lower chamber 162, a vacuum section 166 that evacuates the upper chamber 160 and the lower chamber 162 in the closed state, and an atmosphere opening section 168 that opens the upper chamber 160 and the lower chamber 162 to the atmosphere.

As shown in FIG. 7, the upper chamber 160 in the illustrated embodiment includes a circular top plate 170 and a cylindrical side wall 172 that hangs down from the periphery of the top plate 170. A lifting mechanism 164 that can be composed of an appropriate actuator such as an air cylinder is attached to the top surface of the top plate 170. In the storage space defined by the bottom surface of the top plate 170 and the inner peripheral surface of the side wall 172, there are disposed a pressure roller 174 for pressing the tape 96 of the tape-attached frame 64' against the back surface 4b of the wafer 4 supported on the wafer table 12, a support piece 176 for rotatably supporting the pressure roller 174, and a Y-axis feed means 178 for moving the support piece 176 in the Y-axis direction.

The Y-axis feed means 178 has a ball screw 180 that is connected to the support piece 176 and extends in the Y-axis direction, and a motor 182 that rotates the ball screw 180. The Y-axis feed means 178 converts the rotational motion of the motor 182 into linear motion by the ball screw 180 and transmits it to the support piece 176, moving the support piece 176 along a pair of guide rails 184 that extend in the Y-axis direction.

As shown in FIG. 7, the lower chamber 162 has a cylindrical sidewall 186, the upper part of which is open and the lower part of which is closed. A connection opening 188 is formed in the sidewall 186. A vacuum section 166, which may be composed of an appropriate vacuum pump, is connected to the connection opening 188 via a flow path 190. The flow path 190 is provided with an atmosphere opening section 168, which may be composed of an appropriate valve that can open the flow path 190 to the atmosphere.

With the tape 96 of the tape-attached frame 64' positioned on the back surface 4b of the wafer 4 supported on the wafer table 12, the tape pressing means 102 lowers the upper chamber 160 using the lifting mechanism 164, bringing the lower end of the side wall 172 of the upper chamber 160 into contact with the upper end of the side wall 186 of the lower chamber 162, closing the upper chamber 160 and the lower chamber 162, and bringing the pressure roller 174 into contact with the tape-attached frame 64'.

Next, the tape pressing means 102 operates the vacuum pump that constitutes the vacuum section 166 with the valve that constitutes the atmospheric release section 168 closed to evacuate the inside of the upper chamber 160 and the lower chamber 162, and then, as shown in Figures 8 and 9, the Y-axis feed means 178 rolls the pressure roller 174 in the Y-axis direction to press the tape 96 onto the back surface 4b of the wafer 4, thereby generating a frame unit U.

In the illustrated embodiment, as shown in FIG. 10, the pressure roller 174 is applied multiple times to the tape 96 corresponding to the notch 26 formed on the outer periphery of the wafer 4 to press the tape 96 against the notch 26. Specifically, the pressure roller 174 is moved back and forth in the Y-axis direction so as to straddle at least the notch 26, thereby firmly pressing the tape 96 against the notch 26. The pressure roller 174 may be moved back and forth once, but it is preferable to do so multiple times since this allows the tape 96 to be pressed even more firmly.

On the other hand, when the tape 96 is pressed onto the back surface 4b of the wafer 4 by the pressure roller 174, a small gap is formed between the wafer 4 and the tape 96 at the base of the ring-shaped reinforcing portion 24. However, since the wafer 4 and the tape 96 are pressed onto each other while the inside of the upper chamber 160 and the lower chamber 162 are kept in a vacuum state, the pressure in the small gap between the wafer 4 and the tape 96 is lower than atmospheric pressure, and when the air release portion 168 is opened after the tape 96 is pressed onto the wafer 4, the atmospheric pressure presses the tape 96 against the wafer 4.

In the illustrated embodiment, as described above, the pressure roller 174 is applied multiple times to firmly press the tape 96 against the notch 26. This means that when the air-opening section 168 is opened to the atmosphere, air does not get between the wafer 4 and the tape 96 through the notch 26, and the tape 96 can be tightly attached to the base of the convex reinforcing section 24 by atmospheric pressure.

As shown in FIG. 1 and FIG. 11, the processing device 2 further includes a frame unit ejection means 192 for ejecting from the wafer table 12 the frame unit U in which the tape 96 of the tape-attached frame 64' and the back surface 4b of the wafer 4 have been pressed by the tape pressing means 102, a reinforcement part removal means 194 for cutting and removing the ring-shaped reinforcement part 24 from the wafer 4 of the frame unit U ejected by the frame unit ejection means 192, a ring-less unit ejection means 196 (see FIG. 1) for ejecting from the reinforcement part removal means 194 the ring-less unit from which the ring-shaped reinforcement part 24 has been removed, and a frame cassette table 200 (see FIG. 1) on which a frame cassette 198 containing the ring-less unit ejected by the ring-less unit ejection means 196 is placed.

As shown in FIG. 11, the frame unit unloading means 192 in the illustrated embodiment includes a frame unit holding section 202 including a wafer holding section 202a for holding a wafer 4 and a frame holding section 202b for holding a frame 64, and a transport section 206 for transporting the frame unit holding section 202 to a temporary placement table 204.

The wafer holding part 202a of the frame unit holding part 202 includes a circular substrate 208 and a circular suction piece 210 attached to the underside of the substrate 208. A plurality of suction holes (not shown) are formed on the underside of the suction piece 210, and each suction hole is connected to a suction means (not shown). The frame holding part 202b includes a plurality of protruding pieces 212 (four in the illustrated embodiment) that protrude radially outward from the periphery of the substrate 208 of the wafer holding part 202a at intervals in the circumferential direction, and a suction pad 214 attached to the underside of the protruding pieces 212, and each suction pad 214 is connected to a suction means (not shown).

The transport unit 206 includes an X-axis guide member 216 fixed to an appropriate bracket (not shown) and extending in the X-axis direction, an X-axis movable member 218 supported by the X-axis guide member 216 so as to be movable in the X-axis direction, an X-axis feed means (not shown) for moving the X-axis movable member 218 in the X-axis direction, a Z-axis movable member 220 supported by the X-axis movable member 218 so as to be movable in the Z-axis direction, a Z-axis feed means (not shown) for moving the Z-axis movable member 220 in the Z-axis direction, a Y-axis movable member 222 supported by the Z-axis movable member 220 so as to be movable in the Y-axis direction, and a Y-axis feed means (not shown) for moving the Y-axis movable member 222 in the Y-axis direction. The substrate 208 of the wafer holder 202a is connected to the tip of the Y-axis movable member 222. Each of the X-axis, Y-axis, and Z-axis feed means of the conveying unit 206 may be configured to include a ball screw and a motor that rotates the ball screw.

The frame unit unloading means 192 preferably includes a two-dimensional movement mechanism that moves the frame unit holding part 202 two-dimensionally in the horizontal direction, and an imaging part 224 that images the outer periphery of the wafer 4 of the frame unit U held by the frame unit holding part 202. In the illustrated embodiment, the frame unit holding part 202 is moved two-dimensionally in the horizontal direction in the XY plane by the X-axis feed means and Y-axis feed means of the transport part 206, and the transport part 206 constitutes a two-dimensional movement mechanism. In addition, the imaging part 224 in the illustrated embodiment is disposed between the wafer table 12 and the temporary placement table 204, and images the outer periphery of the wafer 4 of the frame unit U held by the frame unit holding part 202 from below the wafer 4.

The frame unit unloading means 192 suction-holds the wafer 4 from the back surface 4b side (tape 96 side) with the suction piece 210 of the wafer holding portion 202a, and suction-holds the frame 64 with the suction pad 214 of the frame holding portion 202b. By operating the transport portion 206, the frame unit U held by the frame unit holding portion 202 is unloaded from the wafer table 12.

The frame unit unloading means 192 in the illustrated embodiment operates the transport section 206 constituting the two-dimensional movement mechanism to measure the coordinates of at least three points on the outer periphery of the wafer 4 of the frame unit U held by the frame unit holding section 202 by imaging at least three points on the outer periphery of the wafer 4 with the imaging section 224, and determines the central coordinates of the wafer 4 based on the measured coordinates of the three points. Then, the frame unit unloading means 192 aligns the center of the wafer 4 with the center of the temporary placement table 204, and temporarily places the frame unit U on the temporary placement table 204.

As shown in FIG. 11, the temporary placement table 204 is disposed at a distance from the wafer table 12 in the X-axis direction. The temporary placement table 204 in the illustrated embodiment includes an annular support portion 226 that supports the peripheral excess area 20 of the wafer 4 of the frame unit U and keeps the portion inside the peripheral excess area 20 out of contact, and a frame support portion 228 that is disposed on the outer periphery of the annular support portion 226 and supports the frame 64.

The radially inner portion of the annular support portion 226 is a circular recess 230 recessed downward. The frame support portion 228 of the temporary placement table 204 is preferably equipped with a heater (not shown), and the tape 96 of the frame unit U temporarily placed on the temporary placement table 204 is heated by the heater to soften the tape 96, so that the tape 96 is more firmly attached to the base of the ring-shaped reinforcing portion 24 by atmospheric pressure.

The processing device 2 of the illustrated embodiment includes a temporary table transport unit 232 that transports the temporary table 204 in the Y-axis direction. The temporary table transport unit 232 includes a Y-axis guide member 234 extending in the Y-axis direction, a Y-axis movable member 236 supported by the Y-axis guide member 234 so as to be movable in the Y-axis direction, and a Y-axis feed means 238 that moves the Y-axis movable member 236 in the Y-axis direction. The temporary table 204 is fixed to the upper part of the Y-axis movable member 236. The Y-axis feed means 238 has a ball screw 240 that is connected to the Y-axis movable member 236 and extends in the Y-axis direction, and a motor 242 that rotates the ball screw 240. The temporary table transport unit 232 converts the rotational motion of the motor 242 into linear motion by the ball screw 240 and transmits it to the Y-axis movable member 236, and transports the temporary table 204 in the Y-axis direction together with the Y-axis movable member 236.

As shown in Figures 1 and 11, the reinforcing part removal means 194 includes a laser beam application means 244 that applies a laser beam toward the base of the ring-shaped reinforcing part 24 formed on the outer periphery of the wafer 4 to form a cutting groove, a first lifting table 246 (see Figure 1) that holds and lifts the frame unit U temporarily placed on the temporary placement table 204 and moves it in the X-axis direction to position it on the laser beam application means 244, and a separation unit 248 that separates the ring-shaped reinforcing part 24 from the cutting groove.

As shown in FIG. 11, the laser beam application means 244 includes a housing 250 arranged adjacent to the temporary placement table 204 in the X-axis direction, an oscillator (not shown) housed in the housing 250 that oscillates a laser beam, a concentrator 252 that focuses the laser beam generated by the oscillator and irradiates the base of the ring-shaped reinforcing portion 24 formed on the outer periphery of the wafer 4, a suction nozzle 254 that sucks up debris generated when the wafer 4 is irradiated with the laser beam, and a suction means (not shown) connected to the suction nozzle 254.

The collector 252 extends upward from the top surface of the housing 250 at an incline toward the suction nozzle 254, which prevents debris generated during irradiation of the laser beam from falling onto the collector 252. The suction nozzle 254 also extends upward from the top surface of the housing 250 at an incline toward the collector 252.

As shown in FIG. 12, the laser beam application means 244 rotates the frame unit U held by the first lift table 246 while applying a laser beam LB toward the base of the ring-shaped reinforcing portion 24 formed on the outer periphery of the wafer 4, forming a ring-shaped cut groove 256 along the base of the reinforcing portion 24 by ablation processing. The laser beam application means 244 also sucks up debris generated by the ablation processing with a suction nozzle 254.

1, the first lift table 246 is disposed above the temporary placement table 204 so as to be movable in the X-axis direction and the Z-axis direction. Explaining with reference to FIG. 13, the first lift table 246 includes an X-axis guide member 258 fixed to an appropriate bracket (not shown) and extending in the X-axis direction, an X-axis movable member 260 supported by the X-axis guide member 258 so as to be movable in the X-axis direction, an X-axis feed means (not shown) for moving the X-axis movable member 260 in the X-axis direction, a Z-axis movable member 262 supported by the X-axis movable member 260 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the Z-axis movable member 262 in the Z-axis direction. Each of the X-axis and Z-axis feed means of the first lift table 246 may be configured to have a ball screw and a motor for rotating the ball screw.

A support shaft 264 extending downward is rotatably supported on the underside of the tip of the Z-axis movable member 262, and a motor 266 that rotates the support shaft 264 around an axis extending in the Z-axis direction is attached to the upper surface of the tip of the Z-axis movable member 262. A circular suction piece 268 is fixed to the lower end of the support shaft 264. A plurality of suction holes (not shown) are formed on the underside of the suction piece 268 at intervals in the circumferential direction on a circumference corresponding to the size of the frame 64, and each suction hole is connected to a suction means.

The first lift table 246 heats the tape 96 by the heater of the frame holding part 228 of the temporary placement table 204, and then sucks and holds the frame 64 part of the frame unit U where the tape 96 is in close contact with the base of the ring-shaped reinforcement part 24 with the suction piece 268. Then, the Z-axis movable member 262 and the X-axis movable member 260 are moved to raise the frame unit U sucked and held by the suction piece 268 and move it in the X-axis direction to position it at the laser beam application means 244. If the frame 64 is made of a magnetic material, an electromagnet (not shown) may be attached to the underside of the suction piece 268, and the suction piece 268 may be configured to suck the frame 64 by magnetic force.

When the laser beam LB is irradiated onto the wafer 4 by the laser beam application means 244, the first lift table 246 operates the motor 266 to rotate the frame unit U held by suction with the suction piece 268. Furthermore, the first lift table 246 moves the frame unit U, in which the cutting groove 256 is formed at the base of the reinforcing portion 24, in the X-axis direction and the Z-axis direction, and temporarily places it on the temporary placement table 204.

1, the separation unit 248 is disposed at a distance from the first lift table 246 in the Y-axis direction within the movable range of the temporary placement table 204 in the Y-axis direction. Explaining with reference to FIGS. 14 and 16, the separation unit 248 includes an ultraviolet ray irradiation unit 270 (see FIG. 14) that irradiates ultraviolet rays onto the tape 96 corresponding to the cut groove 256 to reduce the adhesive strength of the tape 96, a second lift table 272 (see FIG. 14) that exposes the ring-shaped reinforcement unit 24 to the outer periphery, suction-holds the inside of the wafer 4, and supports the frame 64, a separator 274 (see FIG. 14) that acts on the outer periphery of the ring-shaped reinforcement unit 24 to separate the ring-shaped reinforcement unit 24, and a disposal unit 276 (see FIG. 16) that discards the separated ring-shaped reinforcement unit 24.

14, the separation unit 248 in the illustrated embodiment includes a Z-axis guide member 278 fixed to an appropriate bracket (not shown) and extending in the Z-axis direction, a Z-axis movable member 280 supported by the Z-axis guide member 278 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the Z-axis movable member 280 in the Z-axis direction. The Z-axis feed means may include a ball screw connected to the Z-axis movable member 280 and extending in the Z-axis direction, and a motor for rotating the ball screw.

A support piece 282 is supported on the underside of the tip of the Z-axis movable member 280, and a support shaft 286 is rotatably supported to which the second lift table 272 is connected. A motor 284 is attached to the upper surface of the tip of the Z-axis movable member 280, which rotates the second lift table 272 together with the support shaft 286. In the illustrated embodiment, a pair of the ultraviolet ray irradiation units 270 are attached to the support piece 282 at a distance in the Y-axis direction.

The second lift table 272 is circular, and the diameter of the second lift table 272 is slightly smaller than the diameter of the device region 18 of the wafer 4 (the portion inside the ring-shaped reinforcement portion 24). A plurality of suction holes (not shown) are formed in the underside of the second lift table 272, and each suction hole is connected to a suction means.

The separator 274 is attached to the support piece 282. The separator 274 includes a pair of movable pieces 288 spaced apart from each other on the underside of the support piece 282 so as to be movable in the longitudinal direction of the support piece 282, and a pair of feed means 290 for moving the pair of movable pieces 288. Each of the pair of feed means 290 may be composed of an appropriate actuator such as an air cylinder or an electric cylinder.

The separator 274 includes a pair of clamping rollers 292a, 292b supported by the movable pieces 288 at a distance in the vertical direction, and a Z-axis feed means 294 that moves the upper clamping roller 292a in the Z-axis direction. The Z-axis feed means 294 may be composed of an appropriate actuator such as an air cylinder or an electric cylinder. Each of the clamping rollers 292a, 292b is supported by the movable piece 288 so as to be rotatable about an axis extending in the Y-axis direction. A pressure roller 298 is attached to the upper clamping roller 292a via a support shaft 296.

With reference to FIG. 16, the disposal section 276 includes a belt conveyor 300 that conveys the separated ring-shaped reinforcement parts 24, and a dust box 302 in which the ring-shaped reinforcement parts 24 conveyed by the belt conveyor 300 are stored. The belt conveyor 300 is positioned by an appropriate actuator (not shown) at a collection position (position shown by a solid line in FIG. 16) that extends substantially horizontally, and a waiting position (position shown by a two-dot chain line in FIG. 16) that extends substantially vertically. In FIG. 16, a door 304 with a handle 304a is provided on the side of the dust box 302 on the front side in the X-axis direction. A crusher (not shown) that crushes the collected ring-shaped reinforcement parts 24 is attached inside the dust box 302. In the dust box 302, the crushed debris of the ring-shaped reinforcement part 24 stored in the dust box 302 can be removed by grasping the handle 304a and opening the door 304.

When the temporary placement table 204 on which the frame unit U, in which a cutting groove 256 is formed at the base of the reinforcement portion 24, is temporarily placed, is positioned below the separation portion 248 by the temporary placement table transport portion 232, the separation portion 248, as shown in FIG. 15, sucks and holds the back surface 4b side of the wafer 4 of the frame unit U by the second lift table 272, and clamps the frame 64 between the clamping rollers 292a, 292b of the separator 274, and then irradiates ultraviolet rays from a pair of ultraviolet irradiation portions 270 to reduce the adhesive force of the tape 96 attached to the ring-shaped reinforcement portion 24, and presses the ring-shaped reinforcement portion 24 downward with the pressure roller 298, while rotating the frame unit U together with the support shaft 286 and the second lift table 272 by the motor 284 relative to the separator 274, thereby separating the ring-shaped reinforcement portion 24 from the frame unit U. The separated reinforcing portion 24 is transported by the belt conveyor 300 to the dust box 302 and collected. When separating the reinforcing portion 24, the separator 274 may be rotated relative to the frame unit U.

As shown in FIG. 1, the ring-free unit carrying means 196 is disposed adjacent to the reinforcing part removing means 194. Explaining with reference to FIG. 17 and FIG. 18, the ring-free unit carrying means 196 in the illustrated embodiment includes a frame holding part 306 that faces the ring-free unit supported by the second lift table 272 and holds the frame 64, an inversion mechanism 308 (see FIG. 17) that moves toward the frame cassette table 200 and inverts the frame holding part 306, a ring-free unit support part 310 (see FIG. 18) that supports the ring-free unit inverted by the inversion mechanism 308 so that the surface 4a of the wafer 4 faces upward, and a push-in part 312 (see FIG. 18) that inserts the ring-free unit supported by the ring-free unit support part 310 into the frame cassette 198 placed on the frame cassette table 200 and stores it therein.

As shown in FIG. 17, the reversing mechanism 308 includes a Y-axis guide member 314 extending in the Y-axis direction, a Y-axis movable member 316 supported by the Y-axis guide member 314 so as to be movable in the Y-axis direction, a Y-axis feed means (not shown) for moving the Y-axis movable member 316 in the Y-axis direction, an arm 318 supported by the Y-axis movable member 316 so as to be movable in the Z-axis direction, and a Z-axis feed means (not shown) for moving the arm 318 in the Z-axis direction. Each of the Y-axis and Z-axis feed means of the reversing mechanism 308 may be configured to include a ball screw and a motor for rotating the ball screw.

The frame holder 306 is supported on the arm 318 so that it can be turned upside down, and a motor 320 is attached to turn the frame holder 306 upside down. In the illustrated embodiment, the frame holder 306 includes a substrate 324 rotatably supported on the arm 318 via a pair of rotating shafts 322, and a plurality of suction pads 326 attached to one side of the substrate 324, and each suction pad 326 is connected to a suction means (not shown). One of the rotating shafts 322 is connected to the motor 320.

With the suction pad 326 facing upward, the inversion mechanism 308 sucks and holds the underside of the frame 64 of the ring-less unit U' supported by the second lift table 272 with the suction pad 326, and receives the ring-less unit U' from the second lift table 272. The inversion mechanism 308 also inverts the frame holding part 306 with the motor 320 to face the front surface 4a of the wafer 4 upward, and then moves the Y-axis movable member 316 to move the ring-less unit U' held by the frame holding part 306 toward the frame cassette table 200.

As shown in FIG. 18, the ring-less unit support section 310 of the illustrated embodiment includes a pair of support plates 328 supported movably in the X-axis direction via an appropriate bracket (not shown), and a spacing adjustment means (not shown) for adjusting the spacing in the X-axis direction between the pair of support plates 328. The spacing adjustment means may be composed of an appropriate actuator such as an air cylinder or an electric cylinder.

A heater (not shown) is attached to the pair of support plates 328 that support the ring-less unit U'. When the gap between the pair of support plates 328 is narrowed, the pair of support plates 328 heats the tape 96 of the ring-less unit U' with the heater, thereby smoothing out any sagging or wrinkles in the tape 96 that occur when the reinforcing portion 24 is removed.

Continuing the explanation with reference to FIG. 18, the pushing section 312 in the illustrated embodiment includes a Y-axis guide member 330 extending in the Y-axis direction, a Y-axis movable member 332 supported by the Y-axis guide member 330 so as to be movable in the Y-axis direction, and a Y-axis feed means (not shown) for moving the Y-axis movable member 332 in the Y-axis direction. The Y-axis movable member 332 has a base 334 supported by the Y-axis guide member 330, a support 336 extending upward from the upper surface of the base 334, and a pressing piece 338 attached to the upper end of the support 336. The Y-axis feed means of the pushing section 312 may be configured to include a ball screw connected to the Y-axis movable member 332 and extending in the Y-axis direction, and a motor for rotating the ball screw.

As shown in FIG. 19, the ring-less unit support part 310 receives the ring-less unit U' held by the suction pad 326 after widening the gap between the pair of support plates 328 by the gap adjustment means before receiving the ring-less unit U'. Then, when the ring-less unit support part 310 receives the ring-less unit U', the pushing part 312 moves the Y-axis movable member 332 in the Y-axis direction by the Y-axis feed means, so that the ring-less unit U' supported by the ring-less unit support part 310 is inserted into the frame cassette 198 placed on the frame cassette table 200 by the pressing piece 338 and accommodated therein.

The frame cassette 198 shown in Figures 1 and 19 accommodates multiple ring-less units U' spaced apart in the vertical direction with the surfaces 4a of the wafers 4 facing upward. As shown in Figures 18 and 19, the frame cassette table 200 includes a mounting section 340 on which the frame cassette 198 is mounted, and a lifting section 342 that raises and lowers the mounting section 340 to position it at any height. The lifting section 342 may be configured to include a ball screw connected to the mounting section 340 and extending in the Z-axis direction, and a motor that rotates the ball screw.

Next, a processing method will be described in which, using the processing device 2 as described above, a dicing tape 96 is attached to the back surface 4b of the wafer 4 on which a ring-shaped reinforcing portion 24 is formed in a convex shape on the back surface 4b corresponding to the peripheral excess region 20, to integrate the wafer with the frame 64, and the ring-shaped reinforcing portion 24 is cut and removed from the wafer 4.

In the illustrated embodiment, first, as shown in Figs. 1 and 3, a wafer cassette loading step is performed in which a wafer cassette 6 containing multiple wafers 4 is loaded onto a wafer cassette table 8. The wafer cassette 6 contains multiple wafers 4 spaced apart in the vertical direction with the surfaces 4a facing upward.

As shown in Figs. 1 and 5, a frame accommodation step is performed in which a plurality of ring-shaped frames 64, each having an opening 64a for accommodating a wafer 4, are accommodated in a frame accommodation means 66. The frame accommodation step may be performed before or after the wafer cassette placement step.

In the frame storage process, the lift plate 74 of the frame storage means 66 is lowered to a desired position, the handle 76a is grasped to open the door 76, and multiple frames 64 are stacked and stored on the upper surface of the lift plate 74. The height of the lift plate 74 is also adjusted appropriately, and the topmost frame 64 is positioned so that it can be removed by the frame removal means 68.

After the wafer cassette loading process and frame accommodation process are performed, a wafer unloading process is performed in which the wafer 4 is unloaded from the wafer cassette 6 placed on the wafer cassette table 8.

Explaining with reference to FIG. 3, in the wafer unloading process, first, the Y-axis feed means 34 of the wafer unloading means 10 is operated to position the Y-axis movable member 32 near the wafer cassette table 8. Next, the transport arm 42 is driven to position the hand 44 with the air outlet 46 facing upward on the back surface 4b side (lower side) of the wafer 4 in the wafer cassette 6. When the hand 44 is positioned on the back surface 4b side of the wafer 4, a gap exists between the back surface 4b of the wafer 4 and the hand 44, and each guide pin 48 is positioned radially outward.

Next, compressed air is ejected from the air ejection port 46 of the hand 44 to generate negative pressure on one side of the hand 44 by the Bernoulli effect, and the hand 44 suction-supports the wafer 4 from the back surface 4b side without contact. Next, each guide pin 48 is moved radially inward, and the horizontal movement of the wafer 4 suction-supported by the hand 44 is restricted by each guide pin 48. Then, the Y-axis movable member 32 and the transport arm 42 of the wafer unloading means 10 are moved, and the wafer 4 suction-supported by the hand 44 is unloaded from the wafer cassette 6.

After the wafer unloading process is performed, it is preferable to perform a notch detection process in which the position of the notch 26 in the wafer 4 is detected. In the notch detection process, as shown in FIG. 4, the outer periphery of the wafer 4 supported by suction with the hand 44 is positioned between the light emitting element 52 and the light receiving element 54 of the notch detection means 50. Next, the position of the notch 26 in the wafer 4 is detected by rotating the wafer 4 via the guide pin 48 with the drive source. This makes it possible to adjust the orientation of the wafer 4 to any orientation.

After the notch detection process is performed, a wafer support process is performed in which the front surface 4a side of the wafer 4 removed by the wafer removal means 10 is supported by the wafer table 12.

Referring to FIG. 3, in the wafer support process, first, the hand 44 of the wafer unloading means 10 is turned upside down so that the surface 4a of the wafer 4 faces downward. Next, the Y-axis movable member 32 and the transport arm 42 of the wafer unloading means 10 are moved, and the peripheral excess area 20 of the surface 4a of the wafer 4 supported by suction with the hand 44 is brought into contact with the annular support portion 56 of the wafer table 12. At this time, since the device area 18 of the surface 4a of the wafer 4 is located in the recess 62 of the wafer table 12, the device 14 and the wafer table 12 do not come into contact with each other, and damage to the device 14 is prevented.

Then, the suction means of the wafer table 12 is operated to generate suction force in each suction hole 60, thereby suction-holding the peripheral excess area 20 of the surface 4a of the wafer 4. Next, the suction support of the wafer 4 by the hand 44 is released, and the hand 44 is moved away from the wafer table 12. In this manner, the wafer 4 is transferred from the wafer transfer means 10 to the wafer table 12. Since the wafer 4 transferred to the wafer table 12 is held by suction through each suction hole 60, the position of the wafer 4 does not shift.

In addition, after the wafer cassette loading process and the frame accommodation process are performed, a frame removal process is performed in which the frame 64 is removed from the frame accommodation means 66 in parallel with the wafer removal process and the wafer support process.

Referring to FIG. 5, in the frame ejection process, first, the X-axis movable member 84 and the Z-axis movable member 86 of the frame ejection means 68 are moved to bring the suction pad 92 of the holding unit 88 into contact with the top surface of the top frame 64 housed in the frame housing means 66. Next, the suction means of the frame ejection means 68 is operated to generate a suction force in the suction pad 92, thereby sucking and holding the top frame 64 with the suction pad 92. Then, the X-axis movable member 84 and the Z-axis movable member 86 of the frame ejection means 68 are moved, and the top frame 64 sucked and held by the suction pad 92 of the holding unit 88 is ejected from the frame housing means 66.

After the frame removal process is performed, a frame support process is performed in which the frame 64 removed by the frame removal means 68 is supported by the frame table 70.

Continuing the explanation with reference to FIG. 5, in the frame support process, first, the X-axis movable member 84 and the Z-axis movable member 86 of the frame ejection means 68 are moved to bring the frame 64, which is held by suction with the suction pad 92, into contact with the upper surface of the frame table 70. At this time, the frame table 70 is positioned in the lowered position (the position shown by the solid line in FIG. 5). Next, the suction force of the suction pad 92 of the frame ejection means 68 is released, and the frame 64 is placed on the frame table 70. Then, the X-axis movable member 84 and the Z-axis movable member 86 of the frame ejection means 68 are moved to move the holding portion 88 away from above the frame table 70.

After the frame support process is performed, a tape application process is performed in which tape 96 is applied to the frame 64.

Referring to FIG. 6, in the tape application process, first, before moving the frame table 70 from the lowered position (position shown in FIG. 6(a)) to the raised position (position shown in FIG. 6(b)) where the tape 96 can be applied to the frame 64, the tape 96 is pulled out from the roll tape 96R and the tape 96 from which the release paper 116 has been peeled off is positioned above the frame table 70. Note that the adhesive side of the tape 96 positioned above the frame table 70 faces downward.

Next, the frame table 70 is raised to an extent that the pressure roller 132 of the pressure application section 110 of the tape application means 98 can press the tape 96 onto the frame 64 from above. The pressure roller 132 then rolls in the Y-axis direction while pressing the adhesive surface of the tape 96 against the frame 64. This allows the tape 96 pulled out from the roll tape 96R by the tape pull-out section 108 to be pressed onto the frame 64.

Next, the cutter 144 and the pressure roller 146 of the cutting section 112 of the tape application means 98 are lowered, and the cutter 144 is pressed against the tape 96 on the frame 64, while the pressure roller 146 presses the frame 64 from above the tape 96. Next, the motor 138 rotates the arm piece 140, and the cutter 144 and the pressure roller 146 move in a circular motion along the frame 64. This allows the tape 96 that protrudes beyond the outer periphery of the frame 64 to be cut along the frame 64. In addition, since the pressure roller 146 presses the frame 64 from above the tape 96, the frame 64 and the tape 96 are prevented from shifting in position when the tape 96 is being cut. The used tape 96 with the circular opening 120 formed therein is taken up by the tape take-up section 106.

After the tape application process is performed, the frame 64 with the tape 96 applied thereto is transported to the wafer table 12, and the tape-attached frame transport process is performed in which the opening 64a of the frame 64 is positioned on the back surface 4b of the wafer 4 supported on the wafer table 12, and the tape-attached frame 64' is placed on the wafer table 12.

In the tape-attached frame transport process, first, the frame table 70 is moved from the raised position to the lowered position. Next, the Y-axis movable member 150 and the Z-axis movable member 152 of the tape-attached frame transport means 100 (see FIG. 5) are moved so that each suction pad 158 of the holding portion 154 of the tape-attached frame transport means 100 comes into contact with the upper surface of the tape-attached frame 64' (see FIG. 7) supported by the frame table 70 with the adhesive side of the tape 96 facing downward.

Next, the suction means of the tape-attached frame transport means 100 is operated to generate suction force in the suction pad 158, thereby suction-holding the upper surface of the tape-attached frame 64' with the suction pad 158. Next, the Y-axis movable member 150 and the Z-axis movable member 152 of the tape-attached frame transport means 100 are moved, and the tape-attached frame 64' held by suction with the suction pad 158 is transported out of the frame table 70.

Next, the tape-attached frame 64' held by suction with the suction pad 158 of the tape-attached frame transport means 100 is transported to the wafer table 12, and as shown in FIG. 7, the opening 64a of the frame 64 is positioned on the back surface 4b of the wafer 4 supported on the wafer table 12, and the tape-attached frame 64' is brought into contact with the frame support portion 58 of the wafer table 12. At this time, the adhesive surface of the tape 96 of the tape-attached frame 64' faces downward, and the back surface 4b of the wafer 4 faces upward and faces the adhesive surface of the tape 96.

Next, the suction force of the suction pad 158 of the tape-attached frame transport means 100 is released, and the tape-attached frame 64' is placed on the frame support portion 58 of the wafer table 12. Then, the Y-axis movable member 150 and the Z-axis movable member 152 of the tape-attached frame transport means 100 are moved to move the holding portion 154 away from above the wafer table 12.

After the tape-attached frame transport process is performed, a tape-pressing process is performed in which the tape 96 of the tape-attached frame 64' is pressed onto the back surface 4b of the wafer 4.

Referring to Figures 7 to 9, in the tape pressing process, first, the upper chamber 160 is lowered by the lifting mechanism 164 of the tape pressing means 102, and the lower end of the side wall 172 of the upper chamber 160 is brought into contact with the upper end of the side wall 186 of the lower chamber 162. This closes the upper chamber 160 and the lower chamber 162, and brings the pressure roller 174 into contact with the tape-attached frame 64'. Then, as shown in Figure 8, the upper end of the ring-shaped reinforcing portion 24 of the wafer 4 is attached to the adhesive surface of the tape 96 of the tape-attached frame 64'.

Next, with the air release section 168 of the tape pressing means 102 closed, the vacuum section 166 is operated to evacuate the inside of the upper chamber 160 and the lower chamber 162. Next, as shown in Figures 8 and 9, the pressure roller 174 of the tape pressing means 102 is rolled in the Y-axis direction to press the tape 96 onto the back surface 4b of the wafer 4.

In the illustrated embodiment, as shown in FIG. 10, the pressure roller 174 is applied multiple times to the tape 96 corresponding to the notch 26 formed on the outer periphery of the wafer 4, and the tape 96 is pressed against the notch 26. Specifically, the pressure roller 174 is moved back and forth in the Y-axis direction so as to straddle at least the notch 26, thereby firmly pressing the tape 96 against the notch 26. The pressure roller 174 may be moved back and forth once, but it is preferable to move it back and forth multiple times, as this allows the tape 96 to be pressed even more firmly.

In this way, once the frame unit U in which the back surface 4b of the wafer 4 and the tape 96 are pressed against each other are produced, the air-opening portion 168 is opened, and the tape 96 is pressed against the back surface 4b of the wafer 4 along the base of the ring-shaped reinforcing portion 24 by atmospheric pressure. In the illustrated embodiment, as described above, the pressure roller 174 is applied multiple times to firmly press the tape 96 against the notch 26. Therefore, when the air-opening portion 168 is opened to the atmosphere, air does not get between the wafer 4 and the tape 96 through the notch 26, and the tape 96 can be pressed against the base of the convex reinforcing portion 24 by atmospheric pressure.

Then, the upper chamber 160 is raised by the lifting mechanism 164. Note that by creating a vacuum inside the upper chamber 160 and the lower chamber 162, the suction force of the wafer 4 by the wafer table 12 is lost. However, when the upper chamber 160 and the lower chamber 162 are closed, the upper end of the ring-shaped reinforcing portion 24 of the wafer 4 adheres to the adhesive surface of the tape 96 of the taped frame 64', so the position of the wafer 4 does not shift during the tape pressing process.

After the tape bonding process is performed, a frame unit removal process is performed to remove the frame unit U, in which the tape 96 of the tape-attached frame 64' is bonded to the back surface 4b of the wafer 4, from the wafer table 12.

Referring to FIG. 5, in the frame unit unloading process, first, the transport section 206 of the frame unit unloading means 192 is operated to bring the underside of the suction piece 210 of the wafer holding section 202a of the frame unit holding section 202 into contact with the tape 96 on the back surface 4b side of the wafer 4, and the suction pad 214 of the frame holding section 202b into contact with the frame 64.

Next, suction force is generated in the suction piece 210 of the wafer holding part 202a and the suction pad 214 of the frame holding part 202b, and the suction piece 210 of the wafer holding part 202a suction-holds the wafer 4 from the back surface 4b side (tape 96 side), while the suction pad 214 of the frame holding part 202b suction-holds the frame 64. Next, the suction-holding of the wafer 4 by the wafer table 12 is released. Then, the transport part 206 is operated to transport the frame unit U held by the frame unit holding part 202 from the wafer table 12.

After the frame unit removal process is performed, the center of the wafer 4 is aligned with the center of the temporary placement table 204, and the frame unit U is temporarily placed on the temporary placement table 204.

Explaining with reference to FIG. 11, in the temporary placement process, first, the frame unit U held by the frame unit holding part 202 is positioned above the imaging part 224. Next, the transport part 206 constituting the two-dimensional movement mechanism of the frame unit unloading means 192 is operated, and at least three points on the outer periphery of the wafer 4 of the frame unit U held by the frame unit holding part 202 are imaged by the imaging part 224. This measures the coordinates of at least three points on the outer periphery of the wafer 4. Next, the central coordinates of the wafer 4 are obtained based on the measured coordinates of the three points.

Then, the transport unit 206 is operated to position the center of the wafer 4 at the center of the annular support portion 226 of the temporary placement table 204, and the peripheral excess area 20 of the surface 4a of the wafer 4 is brought into contact with the upper surface of the annular support portion 226 of the temporary placement table 204, and the lower surface of the frame 64 is brought into contact with the upper surface of the frame support portion 228 of the temporary placement table 204. At this time, the surface 4a of the wafer 4 faces downward, but since the device area 18 is located in the recess 230 of the temporary placement table 204, the device 14 does not come into contact with the temporary placement table 204, and damage to the device 14 is prevented.

Then, the suction hold of the wafer 4 by the wafer holding part 202a is released, and the suction hold of the frame 64 by the frame holding part 202b is released, and the frame unit U is transferred from the frame unit carrying means 192 to the temporary placement table 204. Next, the heater of the frame support part 228 is operated, and the tape 96 of the frame unit U temporarily placed on the temporary placement table 204 is heated by the heater. This softens the tape 96, and the tape 96 adheres closely to the base of the ring-shaped reinforcing part 24 of the wafer 4.

After the temporary placement process is performed, a reinforcing part removal process is performed in which the ring-shaped reinforcing part 24 is cut and removed from the wafer 4 of the frame unit U that has been removed by the frame unit removal means 192.

Referring to Figures 1, 11 and 13, in the reinforcing part removal process, first, the X-axis movable member 260 and the Z-axis movable member 262 of the first lift table 246 of the reinforcing part removal means 194 are moved to bring the lower surface of the suction piece 268 into contact with the upper surface of the frame 64 of the frame unit U temporarily placed on the temporary placement table 204. Next, suction force is generated in each suction hole of the suction piece 268 of the first lift table 246, and the frame 64 portion of the frame unit U is sucked and held.

Then, the X-axis movable member 260 and the Z-axis movable member 262 of the first lift table 246 are operated, and the frame unit U held by suction with the suction piece 268 is positioned above the laser beam application means 244, as shown in FIG. 12. Next, the focal point of the laser beam LB is positioned at the base of the ring-shaped reinforcing portion 24 of the wafer 4 of the frame unit U.

Next, while the suction piece 268 and the frame unit U are rotated by the motor 266 of the first lift table 246, the laser beam LB is irradiated to the base of the ring-shaped reinforcing part 24 of the wafer 4. This allows ablation processing to be performed on the base of the ring-shaped reinforcing part 24 of the wafer 4, forming a ring-shaped cut groove 256. In addition, when the laser beam LB is irradiated to the wafer 4, the suction means of the laser beam application means 244 is operated to generate a suction force in the suction nozzle 254, and the debris generated by the ablation processing is sucked by the suction nozzle 254.

Then, the X-axis movable member 260 and the Z-axis movable member 262 of the first lift table 246 are moved to bring the peripheral excess area 20 of the front surface 4a of the wafer 4 of the frame unit U, which is suction-held by the suction piece 268, into contact with the upper surface of the annular support portion 226 of the temporary placement table 204, and bring the lower surface of the frame 64 into contact with the upper surface of the frame support portion 228 of the temporary placement table 204. Next, the suction force of the suction piece 268 of the first lift table 246 is released, and the frame unit U is transferred from the first lift table 246 to the temporary placement table 204.

Next, the temporary placement table 204 that has received the frame unit U is positioned below the separation section 248 of the reinforcing part removal means 194 by the temporary placement table transport section 232 (see FIG. 11). At this time, the belt conveyor 300 of the disposal section 276 is positioned in the standby position. Next, the second lift table 272 of the separation section 248 is lowered, and the bottom surface of the second lift table 272 is brought into contact with the tape 96 on the back surface 4b of the wafer 4. Next, a suction force is generated on the bottom surface of the second lift table 272, and the back surface 4b side of the wafer 4 of the frame unit U is suction-held by the second lift table 272.

Then, the second lift table 272, which holds the wafer 4 of the frame unit U by suction, is raised to separate the frame unit U from the temporary placement table 204, and the temporary placement table 204 is moved below the first lift table 246. Next, as shown in FIG. 15, the pair of feed means 290 and Z-axis feed means 294 of the separator 274 are operated to vertically sandwich the frame 64 between the upper and lower sandwiching rollers 292a, 292b. In addition, the belt conveyor 300 of the disposal section 276 is moved from the standby position to the collection position.

Next, ultraviolet light is irradiated from a pair of ultraviolet irradiation units 270 to reduce the adhesive strength of the tape 96 attached to the ring-shaped reinforcement portion 24, and the ring-shaped reinforcement portion 24 is pressed downward by a pressure roller 298 while the motor 284 rotates the frame unit U together with the support shaft 286 and the second lift table 272 relative to the separator 274. This allows the ring-shaped reinforcement portion 24 to be separated from the frame unit U. The reinforcement portion 24 that has fallen from the frame unit U is transported to a dust box 302 by a belt conveyor 300 and collected. Note that the separator 274 may be rotated relative to the frame unit U when separating the reinforcement portion 24.

After the reinforcing portion removal process is performed, a ring-less unit removal process is performed in which the ring-less unit U' from which the ring-shaped reinforcing portion 24 has been removed is removed from the reinforcing portion removal means 194.

In the ring-free unit discharge process, first, the belt conveyor 300 of the disposal section 276 of the reinforcing section removal means 194 is moved from the recovery position to the standby position. Next, the frame holding section 306 of the reversal mechanism 308 (see FIG. 17) of the ring-free unit discharge means 196 is positioned below the ring-free unit U' that is held by suction on the second lift table 272.

Next, with the suction pad 326 of the frame holding portion 306 facing upward, the arm 318 is raised and the suction pad 326 of the frame holding portion 306 is brought into contact with the underside of the frame 64 of the ring-less unit U', which is supported by the second lift table 272 and in which the surface 4a of the wafer 4 faces downward.

Next, suction force is generated in the suction pad 326 of the frame holding portion 306, and the frame 64 of the ring-less unit U' is held by suction with the suction pad 326. Next, the suction hold of the ring-less unit U' by the second lift table 272 is released. This transfers the ring-less unit U' from the second lift table 272 of the reinforcing portion removal means 194 to the frame holding portion 306 of the ring-less unit transport means 196.

After the ring-free unit ejection process is performed, a ring-free unit storage process is performed to store the ring-free unit U' ejected by the ring-free unit ejection means 196.

In the ring-free unit storage process, first, the inversion mechanism 308 of the ring-free unit discharge means 196 is turned upside down, and the ring-free unit U' held by suction in the frame holding part 306 is turned upside down. As a result, the ring-free unit U' is positioned below the frame holding part 306, and the surface 4a of the wafer 4 faces upward.

Then, the Y-axis movable member 316 and the arm 318 of the inversion mechanism 308 are moved to bring the ringless unit U' into contact with the upper surfaces of the pair of support plates 328 of the ringless unit support section 310. At this time, the gap between the pair of support plates 328 is narrowed by the gap adjustment means, and the pair of support plates 328 are in close contact with each other. Next, the suction hold of the ringless unit U' by the frame holding section 306 is released, and the ringless unit U' is placed on the pair of support plates 328. Next, the heaters attached to each support plate 328 are operated to heat the tape 96 of the ringless unit U', thereby smoothing out any sagging or wrinkles in the tape 96 caused by the removal of the reinforcing section 24. Then, the ringless unit U' is again suction-held by the frame holding section 306 and raised.

Next, the gap between the pair of support plates 328 is widened by the gap adjustment means, and the ring-less unit U' is then placed on the upper surface of the support plate 328. Then, as shown in FIG. 19, the ring-less unit U' supported by the ring-less unit support part 310 is pushed by the pressing piece 338 of the pushing part 312, and the ring-less unit U' is inserted into the frame cassette 198 placed on the frame cassette table 200 and accommodated therein.

As described above, in the processing device 2 of the illustrated embodiment, the back surface 4b of the wafer 4 on which the ring-shaped reinforcing portion 24 is formed in a convex shape corresponding to the peripheral excess region 20 can be easily attached with a dicing tape 96 to form an integral part with the frame 64, and the ring-shaped reinforcing portion 24 can be easily cut and removed from the wafer 4, resulting in good productivity.

2: Processing device 4: Wafer 4a: Front surface of wafer 4b: Back surface of wafer 6: Wafer cassette 8: Wafer cassette table 10: Wafer carrying-out means 12: Wafer table 20: Outer peripheral excess area 24: Reinforcement portion 26: Cutout 64: Frame 64a: Opening 64': Frame with tape 66: Frame storage means 68: Frame carrying-out means 70: Frame table 96: Tape 98: Tape sticking means 100: Tape-attached frame transport means 102: Tape pressing means 132: Pressing roller 160: Upper chamber 162: Lower chamber 164: Lifting mechanism 166: Vacuum portion 168: Atmospheric release portion 192: Frame unit carrying-out means 194: Reinforcement portion removing means 196: Ring-free unit carrying-out means 198: Frame cassette 200: Frame cassette table U: Frame unit U': Ringless unit

Claims (1)

A processing apparatus for removing a convex reinforcing portion from a wafer having a ring-shaped reinforcing portion formed in a convex shape on a back surface corresponding to an outer peripheral excess region, comprising:
a wafer cassette table on which a wafer cassette containing a plurality of wafers is placed;
a wafer carrying-out means for carrying out a wafer from the wafer cassette placed on the wafer cassette table;
a wafer table that supports the front surface side of the wafer carried out by the wafer carrying-out means;
a frame receiving means for receiving a plurality of ring-shaped frames each having an opening for receiving a wafer;
a frame ejection means for ejecting the frame from the frame storage means;
a frame table for supporting the frame discharged by the frame discharge means;
a tape application means disposed above the frame table for applying tape to the frame;
a tape-attached frame transport means for transporting the frame with the tape affixed thereto to the wafer table and placing the tape-attached frame on the wafer table by positioning an opening of the frame over the back surface of the wafer supported on the wafer table;
a tape pressing means for pressing the tape of the tape-attached frame onto the back surface of the wafer;
a frame unit carrying means for carrying out, from the wafer table, a frame unit in which the tape of the tape-attached frame and the back surface of the wafer are pressure-bonded by the tape pressure-bonding means;
a reinforcing portion removing means for cutting and removing a ring-shaped reinforcing portion from the wafer of the frame unit carried out by the frame unit carrying-out means;
a ring-free unit carrying-out means for carrying out the ring-free unit from the reinforcing part removing means;
a frame cassette table on which a frame cassette accommodating the ring-free unit discharged by the ring-free unit discharge means is placed;
Including,
the tape pressing means comprises an upper chamber disposed above the wafer table, a lower chamber accommodating the wafer table, a lifting mechanism for raising and lowering the upper chamber to generate a closed state in which the upper chamber is in contact with the lower chamber and an open state in which the upper chamber is separated from the lower chamber, a vacuum section for creating a vacuum in the upper chamber and the lower chamber in the closed state, and an atmosphere opening section for opening the upper chamber and the lower chamber to the atmosphere,
With the tape of a tape-attached frame positioned on the back surface of the wafer supported on the wafer table, the lifting mechanism is operated to evacuate the upper chamber and the lower chamber while maintaining the closed state, and a pressure roller disposed in the upper chamber is used to press the tape of the tape-attached frame onto the back surface of the wafer, and the pressure roller is applied multiple times to the tape corresponding to a notch formed on the outer periphery of the wafer to press the tape into the notch.

Images