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JP7611563B2 - Infrared spectrum measuring device and concentration measuring device - Google Patents
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JP7611563B2 - Infrared spectrum measuring device and concentration measuring device - Google Patents

Infrared spectrum measuring device and concentration measuring device Download PDF

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JP7611563B2
JP7611563B2 JP2020216153A JP2020216153A JP7611563B2 JP 7611563 B2 JP7611563 B2 JP 7611563B2 JP 2020216153 A JP2020216153 A JP 2020216153A JP 2020216153 A JP2020216153 A JP 2020216153A JP 7611563 B2 JP7611563 B2 JP 7611563B2
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逸人 亀野
卓之 世良
純 小勝負
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    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G01N2021/3568Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor applied to semiconductors, e.g. Silicon

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Description

本発明は、赤外吸光スペクトル等を長時間安定して測定できる赤外スペクトル測定装置に関し、例えば、シリコン結晶の不純物である低濃度炭素の測定に適するものに関する。 The present invention relates to an infrared spectrum measuring device that can stably measure infrared absorption spectra, etc. for long periods of time, and is suitable for measuring low-concentration carbon, an impurity in silicon crystals, for example.

電子情報技術産業協会規格(JEITA)EM-3503には、半導体材料であるシリコン結晶中の置換型炭素原子の濃度を、赤外分光光度計を用いて、その特有の赤外吸収ピーク(波数605cm-1付近)により決定する方法が記載されている(非特許文献1参照)。また、SEMI規格MF1391-1107には、試料を80K以下に冷却した状態で、赤外吸光によりシリコンの炭素含有量を測定する方法が記載されている(非特許文献2参照)。 Japan Electronics and Information Technology Industries Association (JEITA) standard EM-3503 describes a method for determining the concentration of substitutional carbon atoms in silicon crystal, a semiconductor material, from its specific infrared absorption peak (near a wave number of 605 cm -1 ) using an infrared spectrophotometer (see Non-Patent Document 1). In addition, SEMI standard MF1391-1107 describes a method for measuring the carbon content of silicon by infrared absorption while cooling the sample to 80K or less (see Non-Patent Document 2).

JEITA規格 EM-3503「赤外吸収によるシリコン結晶中の置換型炭素原子濃度の標準測定法」JEITA Standard EM-3503 "Standard method for measuring the concentration of substitutional carbon atoms in silicon crystals by infrared absorption" SEMI規格 MF1391-1107「赤外吸収によるシリコンの置換型原子炭素含有量の試験方法」SEMI Standard MF1391-1107 "Test method for substitutional carbon content in silicon by infrared absorption"

ところで、半導体材料の技術分野では、シリコン結晶中の不純物をより低い濃度まで測定したいというニーズがある。発明者らは、これを実現するためには、第一に、測定したい吸収ピーク等の波数域が、分析装置の良好な感度特性を示す波数域に生じるようにすること、第二に、必要な回数のスペクトル測定を出来る限り同じ条件で実行できるようにすること(測定の同一性)、が重要であると考えた。すなわち、所望の測定波数域において試料のスペクトルを長時間安定的に測定できることが重要である。 In the field of semiconductor materials technology, there is a need to measure impurities in silicon crystals at even lower concentrations. The inventors believed that in order to achieve this, it is important, first, to ensure that the wavenumber range of the absorption peak or other components to be measured occurs in a wavenumber range that exhibits good sensitivity characteristics of the analytical device, and second, to be able to perform the required number of spectrum measurements under the same conditions as much as possible (measurement uniformity). In other words, it is important to be able to stably measure the spectrum of a sample for a long period of time in the desired measurement wavenumber range.

本発明の目的は、所望の測定波数域の赤外スペクトルを長時間安定して測定可能な赤外スペクトル測定装置、および、このような赤外スペクトル測定装置を利用して試料中の極低濃度物質を測定する濃度測定装置を提供することにある。 The object of the present invention is to provide an infrared spectrum measuring device capable of stably measuring infrared spectra in a desired measurement wavenumber range for a long period of time, and a concentration measuring device that uses such an infrared spectrum measuring device to measure extremely low concentration substances in a sample.

本発明にかかる赤外スペクトル測定装置は、赤外スペクトルを測定する装置であって、試料部と、赤外分光光度計と、半導体構造の光検出器と、所定の冷媒による冷凍サイクルを実行して前記光検出器の半導体検出素子を冷却する冷凍機と、前記半導体検出素子が所定の設定温度になるように前記冷凍機を制御する制御部と、前記光検出器からの検出信号に基づくスペクトル情報を取得する信号処理部と、を備え、前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を、前記半導体検出素子の前記設定温度に定めるように構成され、前記制御部は、前記設定温度を4~150Kの範囲の複数の温度に変更できるように構成された設定変更部を有することを特徴とする。 The infrared spectrum measuring device according to the present invention is a device for measuring infrared spectra, comprising: a sample unit, an infrared spectrophotometer, a semiconductor photodetector, a refrigerator that cools a semiconductor detection element of the photodetector by executing a refrigeration cycle using a predetermined refrigerant, a control unit that controls the refrigerator so that the semiconductor detection element is at a predetermined set temperature, and a signal processing unit that acquires spectral information based on a detection signal from the photodetector, wherein the infrared spectrum measuring device is configured to determine, for the set temperature of the semiconductor detection element, temperature conditions such that fluctuations in the sensitivity characteristics of the infrared spectrum measuring device become small in a predetermined measurement wavenumber range, and the control unit has a setting change unit configured to be able to change the set temperature to a plurality of temperatures in a range of 4 to 150 K.

ここで、冷凍機に使用する冷媒の種類は限定されるものではない。また、より好ましくは、設定変更部による設定温度の変更範囲は4~77Kである。 The type of refrigerant used in the refrigerator is not limited. More preferably, the setting change unit changes the set temperature in a range of 4 to 77 K.

この構成の赤外スペクトル測定装置によれば、制御部の設定変更部が、半導体検出素子の設定温度を4~150Kの範囲の複数の温度に変更することができるので、測定したい吸収ピーク等の波数域において、この赤外スペクトル測定装置の感度特性が良好になる(例えば、温度変動に強い特性を示す)ような半導体検出素子の温度条件を適宜設定することができる。そして、冷凍機および制御部の構成によって、試料のスペクトル測定中、半導体検出素子の温度がその設定温度に維持される。その結果、所定の測定波長域のスペクトルを長時間にわたって繰り返し安定して測定することができる。 According to an infrared spectrum measuring device having this configuration, the setting change section of the control section can change the set temperature of the semiconductor detection element to multiple temperatures in the range of 4 to 150 K, so that it is possible to appropriately set the temperature conditions of the semiconductor detection element such that the sensitivity characteristics of this infrared spectrum measuring device are good (for example, exhibiting characteristics resistant to temperature fluctuations) in the wavenumber range of the absorption peak or the like to be measured. Then, the configuration of the refrigerator and control section maintains the temperature of the semiconductor detection element at the set temperature during the spectrum measurement of the sample. As a result, it is possible to repeatedly and stably measure the spectrum of a specified measurement wavelength range over an extended period of time.

赤外スペクトル測定装置の感度特性は、冷凍機および制御部による温度制御下でも、変動する場合がある。発明者らは、半導体検出素子の冷却温度を変えると、バンドギャップエネルギーの値が変わり、半導体検出素子の検出帯域が波数方向にシフトするとともに、半導体検出素子の検出感度も変化することを利用して、仮に赤外スペクトル測定装置の感度特性に変動が生じても、測定波数域のスペクトル測定に与える影響が小さくなるような半導体検出素子の温度条件を予め決定することにした。具体的には、試料部に何も設置しない状態での光検出器の検出信号に基づいて、冷却温度毎のスペクトル測定装置の感度特性データを取得し、これらの感度特性データに基づいて、最適な冷却温度の設定値を決定する。 The sensitivity characteristics of the infrared spectrum measuring device may vary even under temperature control by the refrigerator and the control unit. By utilizing the fact that changing the cooling temperature of the semiconductor detection element changes the value of the band gap energy, shifts the detection band of the semiconductor detection element in the wavenumber direction, and also changes the detection sensitivity of the semiconductor detection element, the inventors have decided to determine in advance the temperature conditions of the semiconductor detection element such that even if the sensitivity characteristics of the infrared spectrum measuring device fluctuate, the effect on the spectrum measurement in the measurement wavenumber range is small. Specifically, based on the detection signal of the photodetector in a state where nothing is installed in the sample section, sensitivity characteristic data of the spectrum measuring device for each cooling temperature is obtained, and based on this sensitivity characteristic data, an optimal setting value of the cooling temperature is determined.

すなわち、前記赤外スペクトル測定装置において、前記制御部は、前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を、前記半導体検出素子の前記設定温度に定めるように構成され、
前記温度条件は、複数の温度条件で取得された前記赤外スペクトル測定装置の感度特性に基づいて決定されたものである、ことを特徴とする。
That is, in the infrared spectrum measuring device, the control unit is configured to determine, as the set temperature of the semiconductor detection element, a temperature condition in which a fluctuation in sensitivity characteristic of the infrared spectrum measuring device becomes small in a predetermined measurement wave number range;
The temperature condition is determined based on sensitivity characteristics of the infrared spectrum measuring device obtained under a plurality of temperature conditions.

また、前記赤外スペクトル測定装置において、
前記信号処理部は、複数の温度条件で前記赤外スペクトル測定装置の感度特性を取得する感度特性取得部と、前記温度条件毎の前記感度特性に基づいて、前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を選択する温度条件選択部と、を有し、
前記制御部は、前記温度条件選択部で選択された前記温度条件を、前記半導体検出素子の前記設定温度に定めるように構成されている、ことを特徴とする。
In addition, in the infrared spectrum measuring device,
the signal processing unit has a sensitivity characteristic acquisition unit that acquires sensitivity characteristics of the infrared spectrum measuring device under a plurality of temperature conditions, and a temperature condition selection unit that selects a temperature condition under which a variation in the sensitivity characteristics of the infrared spectrum measuring device becomes small in a predetermined measurement wavenumber range, based on the sensitivity characteristics for each of the temperature conditions;
The control unit is configured to determine the temperature condition selected by the temperature condition selection unit as the set temperature of the semiconductor detection element.

この構成の赤外スペクトル測定装置であれば、感度特性取得部および温度条件選択部の構成によって、例えば、新たな測定を開始するタイミングでの、半導体検出素子の温度条件の設定または再設定が容易になる。測定したい吸収ピーク等の波数域が変更されても、新たな測定波数域に対する最適な温度条件を容易に定めることができる。 With an infrared spectrum measuring device having this configuration, the configuration of the sensitivity characteristic acquisition unit and the temperature condition selection unit makes it easy to set or reset the temperature conditions of the semiconductor detection element, for example, when starting a new measurement. Even if the wavenumber range of the absorption peak to be measured is changed, the optimal temperature conditions for the new measurement wavenumber range can be easily determined.

ここで、「前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件」とは、前記所定の測定波数域での波数方向における感度の増減が小さくなる温度条件(言い換えると、所定の測定波数域での感度特性の波数依存性が小さくなるような温度条件、もしくは、所定の測定波数域での波数方向の感度特性が平坦であるような温度条件)であるとよい。半導体検出素子の温度制御がこのような温度条件で実行されれば、温度変動などで赤外スペクトル測定装置の感度特性が変化するような場合でも、所定の測定波数域の感度特性がほとんど変化しないで済む。 Here, "temperature conditions under which the fluctuation in the sensitivity characteristics of the infrared spectrum measuring device is small in a specified measurement wavenumber range" refers to temperature conditions under which the increase or decrease in sensitivity in the wavenumber direction in the specified measurement wavenumber range is small (in other words, temperature conditions under which the wavenumber dependency of the sensitivity characteristics in the specified measurement wavenumber range is small, or temperature conditions under which the sensitivity characteristics in the wavenumber direction in the specified measurement wavenumber range are flat). If the temperature control of the semiconductor detection element is performed under such temperature conditions, even if the sensitivity characteristics of the infrared spectrum measuring device change due to temperature fluctuations, etc., the sensitivity characteristics in the specified measurement wavenumber range will hardly change at all.

または、「前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件」とは、前記感度特性を取得する際の温度条件毎に所定の温度範囲を定めて、当該範囲内の温度条件で取得される複数の前記感度特性のバラツキが、前記所定の測定波数域において小さくなるような温度条件であるとよい。半導体検出素子の温度制御がこのような温度条件で実行されれば、温度変動などで赤外スペクトル測定装置の感度特性が変化するような場合でも、所定の測定波数域の感度特性がほとんど変化しないで済む。 Alternatively, "temperature conditions under which the variation in the sensitivity characteristics of the infrared spectrum measuring device is small in a specified measurement wavenumber range" may refer to temperature conditions under which a specified temperature range is defined for each temperature condition under which the sensitivity characteristics are acquired, and the variation in the multiple sensitivity characteristics acquired under temperature conditions within that range is small in the specified measurement wavenumber range. If the temperature control of the semiconductor detection element is performed under such temperature conditions, even if the sensitivity characteristics of the infrared spectrum measuring device change due to temperature fluctuations or the like, the sensitivity characteristics in the specified measurement wavenumber range will hardly change.

あるいは、上記の2つの温度条件の基準を組み合わせて半導体検出素子の温度条件を設定してもよい。例えば、前者の基準(所定の測定波数域での波数変化に対する感度の増減が小さくなること)と後者の基準(所定の測定波数域における感度特性のバラツキが、所定の温度範囲内の温度条件で取得された複数の感度特性の全体について小さくなること)の両方を適用して、両方の基準を満たすような温度条件を設定してもよい。 Alternatively, the temperature conditions of the semiconductor detection element may be set by combining the above two temperature condition criteria. For example, the temperature conditions may be set to satisfy both criteria by applying both the former criterion (the increase or decrease in sensitivity with respect to wavenumber changes in a specified measurement wavenumber range is small) and the latter criterion (the variation in sensitivity characteristics in a specified measurement wavenumber range is small for all multiple sensitivity characteristics acquired under temperature conditions within a specified temperature range).

以上は、半導体検出素子の温度条件を定める基準の一例に過ぎないが、これらの基準による温度条件を用いれば、所定の測定波数域における測定装置の感度特性を良好な状態に維持しやすい。 The above are merely examples of standards for determining the temperature conditions of a semiconductor detection element, but by using temperature conditions based on these standards, it is easier to maintain the sensitivity characteristics of the measurement device in a good condition in a specified measurement wavenumber range.

また、前記赤外スペクトル測定装置は、さらに、前記試料部と前記半導体検出素子との間に配置された光学フィルターを備え、
当該光学フィルターは、
前記所定の測定波数域よりも低波数側の光の全部もしくは一部を透過しない光学フィルターであり、または、
前記所定の測定波数域よりも高波数側の光の全部もしくは一部、および、前記所定の測定波数域よりも低波数側の光の全部もしくは一部を透過しない光学フィルターであり、
当該光学フィルターは、前記半導体検出素子とともに前記冷凍機によって冷却されるように構成されていること、を特徴とする。
The infrared spectrum measuring device further includes an optical filter disposed between the sample portion and the semiconductor detection element,
The optical filter is
An optical filter that does not transmit all or a part of light on the lower wavenumber side than the predetermined measurement wavenumber range, or
an optical filter that does not transmit all or a part of light on a higher wavenumber side than the predetermined measurement wavenumber range and all or a part of light on a lower wavenumber side than the predetermined measurement wavenumber range;
The optical filter is configured to be cooled by the refrigerator together with the semiconductor detection element.

この構成によれば、光学フィルターによって、所定の測定波数域よりも低波数側の光の全部または一部は、半導体検出器へ進まない。これらの光には、例えば光源側の光学素子や試料からの赤外放射(熱輻射光など)が含まれる場合があり、半導体検出素子の温度変動や熱ノイズの発生の原因になり得る。従って、光学フィルターがこれらの光による影響を抑制し、スペクトル測定の精度が向上する。
また、低波数側の光だけでなく、測定波数域よりも高波数側の光も通さない光学フィルターを用いれば、測定感度をより向上させることができる。
また、この構成によれば、光学フィルターが半導体検出素子とともに冷凍機によって冷却され、温度制御されるので、光学フィルター自体からの赤外放射が半導体検出素子に入ることも抑制される。
According to this configuration, the optical filter prevents all or part of the light with lower wave numbers than the predetermined measurement wave number range from proceeding to the semiconductor detector. This light may include, for example, infrared radiation (thermal radiation light, etc.) from the optical element on the light source side or the sample, which may cause temperature fluctuations and thermal noise in the semiconductor detector. Therefore, the optical filter suppresses the effects of this light, improving the accuracy of the spectrum measurement.
Furthermore, if an optical filter is used that does not transmit not only light on the low wavenumber side but also light on the high wavenumber side above the measurement wavenumber range, the measurement sensitivity can be further improved.
Furthermore, with this configuration, the optical filter is cooled and temperature-controlled by the refrigerator together with the semiconductor detection element, so that infrared radiation from the optical filter itself is prevented from entering the semiconductor detection element.

さらに、前記赤外スペクトル測定装置は、前記光学フィルターの位置を、前記試料部と前記半導体検出素子との間の光路上からオフセットさせるフィルター切替機を備える、ことを特徴とする。または、前記赤外スペクトル測定装置は、前記光学フィルターを、別の光学フィルターに切り替えるフィルター切替機を備える、ことを特徴とする。 Furthermore, the infrared spectrum measuring device is characterized in that it includes a filter changer that offsets the position of the optical filter from the optical path between the sample portion and the semiconductor detection element. Or, the infrared spectrum measuring device is characterized in that it includes a filter changer that switches the optical filter to another optical filter.

この構成によれば、フィルター切替機によって、試料部と半導体検出素子との間の光学フィルターが適宜オフセットされるので、光学フィルターによる波数域制限下(例えば狭帯域)でのスペクトル測定と、そのような波数域制限を受けない広帯域でのスペクトル測定との両方を1つのスペクトル測定装置で実行することができる。また、光学フィルターを別の光学フィルターに切り替えることで、異なる波数域でのスペクトル測定を実行することができる。 According to this configuration, the filter changer appropriately offsets the optical filter between the sample section and the semiconductor detection element, so that a single spectrum measurement device can perform both spectrum measurements under wavenumber range restrictions (e.g., narrow band) imposed by the optical filter and spectrum measurements over a wide band that is not subject to such wavenumber range restrictions. In addition, by switching the optical filter to a different optical filter, spectrum measurements can be performed in different wavenumber ranges.

また、前記赤外スペクトル測定装置は、前記半導体検出素子を冷却するための冷凍機とは別に、前記試料部の試料を冷却するための試料用冷凍機を備える、ことを特徴とする。 The infrared spectrum measuring device is also characterized in that it is equipped with a sample refrigerator for cooling the sample in the sample section, separate from the refrigerator for cooling the semiconductor detection element.

この構成によれば、試料用冷凍機によって試料が冷却されるので、測定したいスペクトルピークに対して測定妨害になりうる現象(例えば、試料が結晶材料である場合の格子振動に伴う広帯域の大きな吸収ピークなど)や試料自体からの赤外放射の発生を抑制することができる。 With this configuration, the sample is cooled by the sample refrigerator, which can suppress phenomena that can interfere with the measurement of the spectral peak to be measured (for example, large broadband absorption peaks caused by lattice vibrations when the sample is a crystalline material) and infrared radiation from the sample itself.

本発明にかかる濃度測定装置は、試料中の物質の濃度値を測定する濃度測定装置であって、上記の赤外スペクトル測定装置の構成を備えるとともに、前記信号処理部は、取得した試料のスペクトル情報から前記所定の測定波数域のスペクトルピークを読み取って、当該スペクトルピークに基づいて前記物質の濃度値を算出するように構成されていることを特徴とする。 The concentration measuring device according to the present invention is a concentration measuring device that measures the concentration value of a substance in a sample, and is characterized in that it has the configuration of the infrared spectrum measuring device described above, and the signal processing unit is configured to read the spectral peak in the specified measurement wavenumber range from the acquired spectral information of the sample, and calculate the concentration value of the substance based on the spectral peak.

特に、前記濃度測定装置は、605cm-1を含むその前後の波数域を前記所定の測定波数域として、前記半導体検出素子の前記設定温度を4K以上、77K未満の温度に定めて、シリコン結晶中の炭素原子濃度を測定することが好ましい。 In particular, it is preferable that the concentration measuring device measures the carbon atom concentration in the silicon crystal by setting the wavenumber range around 605 cm -1 , including the wavenumber range, as the predetermined measurement wavenumber range, and by setting the set temperature of the semiconductor detection element to a temperature of 4 K or higher and lower than 77 K.

以上の構成の濃度測定装置は、赤外スペクトル測定装置と同様に冷凍機および制御部(設定温度の設定変更部を含む)を備えているから、対象物質に特有の吸収ピーク等の波数域において、この濃度測定装置の感度特性が良好になる(例えば、温度変動に強い特性を示す)ような半導体検出素子の温度条件を適宜設定することができる。ここで、良好な感度特性とは、単純に感度が高い状態を指すものではない。例えば、感度自体は中程度であっても、所定の測定波数域における波数方向の感度変化が小さく、平坦になっている状態の方が良好である場合もある。そして、試料のスペクトル測定中、半導体検出素子の温度がその設定温度に維持されるので、試料中の物質のスペクトルピークを長時間にわたって繰り返し安定して測定することができる。その結果、測定されたスペクトルピークに基づく物質の濃度情報を精度よく算出でき、従来方法と比べて、物質の低濃度側の測定限界を改善することができる。 The concentration measuring device having the above configuration is equipped with a refrigerator and a control unit (including a setting change unit for the set temperature) like the infrared spectrum measuring device, so that the temperature conditions of the semiconductor detection element can be appropriately set so that the sensitivity characteristics of this concentration measuring device are good (for example, the characteristics are resistant to temperature fluctuations) in the wave number range of the absorption peak specific to the target substance. Here, good sensitivity characteristics do not simply mean a state of high sensitivity. For example, even if the sensitivity itself is moderate, it may be better if the sensitivity change in the wave number direction in a specified measurement wave number range is small and flat. Then, since the temperature of the semiconductor detection element is maintained at the set temperature during the spectrum measurement of the sample, the spectral peak of the substance in the sample can be repeatedly and stably measured for a long period of time. As a result, the concentration information of the substance based on the measured spectral peak can be calculated with high accuracy, and the measurement limit on the low concentration side of the substance can be improved compared to the conventional method.

一実施形態に係るスペクトル測定装置の全体構成を示す図である。1 is a diagram showing an overall configuration of a spectrum measuring device according to an embodiment; 前記測定装置の制御部および信号処理部の詳細な構成を示す図である。2 is a diagram showing a detailed configuration of a control unit and a signal processing unit of the measuring device. FIG. 前記測定装置を用いて前記冷却温度の設定値を決定するためのフロー図。4 is a flow diagram for determining the cooling temperature set point using the measurement device. 冷却温度毎のスペクトル測定装置の感度特性を模式的に示す図である。FIG. 4 is a diagram showing a schematic diagram of sensitivity characteristics of a spectrum measuring device for each cooling temperature. 前記冷却温度の設定値を決定するための基準の一例を説明するための図。FIG. 4 is a diagram for explaining an example of a criterion for determining a set value of the cooling temperature. 前記測定装置を用いて試料中の特定物質の濃度値を算出するフロー図。4 is a flow diagram for calculating the concentration value of a specific substance in a sample using the measurement device. 前記特定物質の濃度値を算出する際の検出信号の処理を説明するための図。5A and 5B are diagrams for explaining processing of a detection signal when calculating a concentration value of the specific substance.

本実施形態に係るスペクトル測定装置は、分散型やフーリエ変換型の赤外分光光度計(FTIR)を用いて、試料中の物質に起因する各種のスペクトルを所定の測定波長域において高い感度で測定することができる装置である。ここでは、一例として、半導体材料であるシリコン結晶中に低濃度で含まれる置換型炭素原子の濃度を、フーリエ変換型の赤外分光光度計で測定した吸収スペクトルのピークに基づいて算出する場合について説明する。前述のJEITA規格(EM-3503)で想定されている不純物濃度範囲は約0.04ppma~7ppmaであるのに対し、本実施形態のスペクトル測定装置を用いれば、JEITA規格の測定下限の1/10である0.004ppmaまでの測定が可能になり、かつ、このような測定を長時間維持することができる。 The spectrum measuring device according to this embodiment is a device that can measure various spectra resulting from substances in a sample with high sensitivity in a specified measurement wavelength range using a dispersive or Fourier transform infrared spectrophotometer (FTIR). Here, as an example, a case will be described in which the concentration of substitutional carbon atoms contained at low concentrations in silicon crystal, which is a semiconductor material, is calculated based on the peak of the absorption spectrum measured by a Fourier transform infrared spectrophotometer. The impurity concentration range assumed in the aforementioned JEITA standard (EM-3503) is approximately 0.04 ppma to 7 ppma, whereas the spectrum measuring device of this embodiment makes it possible to measure down to 0.004 ppma, which is 1/10 of the lower measurement limit of the JEITA standard, and can maintain such measurements for a long time.

図1のスペクトル測定装置は、フーリエ変換型赤外分光光度計10と、試料部20と、試料用のヘリウム冷凍機22と、コールドフィルター80と、MCT検出素子32を有する光検出器30と、コールドフィルター80及び光検出器30用のヘリウム冷凍機40と、制御部50および信号処理部60とを備える。 The spectrum measuring device in FIG. 1 includes a Fourier transform infrared spectrophotometer 10, a sample section 20, a helium refrigerator 22 for the sample, a cold filter 80, a photodetector 30 having an MCT detection element 32, a helium refrigerator 40 for the cold filter 80 and the photodetector 30, a control section 50, and a signal processing section 60.

フーリエ変換型赤外分光光度計10は、赤外光源11と、赤外光を分割するビームスプリッタ12と、分割光の一方を反射する固定鏡13と、分割光の他方を反射する可動鏡14とを有し、ビームスプリッタ12が、固定鏡13および可動鏡14からの異なる光路長の2光束を合成して赤外干渉波を発生するように構成されている。 The Fourier transform infrared spectrophotometer 10 has an infrared light source 11, a beam splitter 12 that splits the infrared light, a fixed mirror 13 that reflects one of the split lights, and a movable mirror 14 that reflects the other split light, and is configured such that the beam splitter 12 combines two light beams with different optical path lengths from the fixed mirror 13 and the movable mirror 14 to generate an infrared interference wave.

試料部20は、ビームスプリッタ12からの赤外干渉波の光路上に設置された試料ホルダーからなり、この試料ホルダーに試料である半導体材料が着脱可能に保持または載置される。なお、本発明のスペクトル測定装置は、測定対象を固体試料に限らず、試料セルに入った液体試料やガスセルに入った気体試料などでもよい。 The sample section 20 is composed of a sample holder installed on the optical path of the infrared interference wave from the beam splitter 12, and the semiconductor material sample is removably held or placed on this sample holder. Note that the measurement target of the spectrum measuring device of the present invention is not limited to solid samples, and may be a liquid sample contained in a sample cell or a gas sample contained in a gas cell.

試料用のヘリウム冷凍機22は、試料部20の半導体材料を冷却し、そのシリコン結晶の格子振動に伴う広帯域の大きな吸光ピークの発生や、半導体材料自体からの赤外放射の発生を抑制する効果がある。 The helium refrigerator 22 for the sample cools the semiconductor material of the sample section 20, and has the effect of suppressing the generation of large broadband absorption peaks associated with lattice vibrations of the silicon crystal, as well as the generation of infrared radiation from the semiconductor material itself.

コールドフィルター80は、光検出器の直前の光路上に配置されている。コールドフィルター80は、炭素原子の吸収ピークを測定する際の測定波数域(例えば、630~580cm-1)よりも低波数側(長波長側)の光を透過しないように形成されている。カットオフが580cm-1であるコールドフィルター80でも、これよりも低波数のカットオフを有するフィルターでもよい。赤外光源11を含めて、光源側の光学素子や半導体材料(試料)からの赤外放射(熱輻射光など)は、常温部放射であるが、極低温でのスペクトル測定ではその影響が大きい。MCT検出素子32の温度変動や熱ノイズの発生の原因になり得るので、光学フィルターがこれらの光の全部または一部をカットすることで、その影響が抑制され、スペクトル測定の精度が向上する。なお、例えば、測定波数域(630~580cm-1)に合わせた特定の狭帯域の光だけを透過するバンドハスフィルターなどで代用することもできる。また、コールドフィルター(ショートパスフィルター)とロングパスフィルターの2枚のフィルターを組み合わせてもよい。この場合、ロングパスフィルターからの熱放射は、後段のコールドフィルターでカットされるため、ロングパスフィルターについては常温部に設置してもよい。 The cold filter 80 is disposed on the optical path immediately before the photodetector. The cold filter 80 is formed so as not to transmit light on the lower wavenumber side (longer wavelength side) than the measurement wavenumber range (for example, 630 to 580 cm −1 ) when measuring the absorption peak of the carbon atom. The cold filter 80 may have a cutoff of 580 cm −1 , or a filter having a cutoff of a lower wavenumber than this. Infrared radiation (thermal radiation light, etc.) from the optical elements and semiconductor material (sample) on the light source side, including the infrared light source 11, is normal temperature radiation, but its influence is large in spectrum measurement at extremely low temperatures. Since it can cause temperature fluctuations and thermal noise in the MCT detection element 32, the optical filter cuts all or part of these lights, thereby suppressing their influence and improving the accuracy of the spectrum measurement. In addition, for example, a band-pass filter that transmits only light in a specific narrow band that matches the measurement wavenumber range (630 to 580 cm −1 ) can be used instead. In addition, two filters, a cold filter (short pass filter) and a long pass filter, may be combined. In this case, the heat radiation from the long pass filter is cut by the cold filter in the latter stage, so the long pass filter may be installed in the room temperature section.

光検出器30は、試料およびコールドフィルター80を透過した赤外干渉波を受光し、その光強度に応じた検出信号を出力する。本実施形態では、光検出器30として、例えば、中帯域MCT検出器を用いる。 The photodetector 30 receives the infrared interference wave that has passed through the sample and the cold filter 80, and outputs a detection signal according to the light intensity. In this embodiment, for example, a mid-band MCT detector is used as the photodetector 30.

中帯域MCTを構成する半導体構造のMCT検出素子32は、ヘリウム冷凍機40の冷却部に取り付けられ、4K以上、150K以下の温度に冷却されるとよい。例えば、液体窒素を入れたデュワー容器を用いる冷却方法では、液体窒素の蒸発熱(77K)を直接利用した冷却方法であるため、冷却温度を意図的に変更できないが、本実施形態のヘリウム冷凍機40による冷却方法では冷却温度を変更できる。そのため、77Kの温度で測定していたものが、実は冷却し過ぎであって、本来の適切な冷却温度は80Kや90K等の温度であるということが判明する場合もある。本実施形態のようにシリコン結晶中の低濃度炭素原子の含有量を測定する場合は、特に、ヘリウム冷凍機40による冷却温度の範囲を4K以上、77K未満の温度範囲にするとよい。 The MCT detection element 32 of the semiconductor structure constituting the mid-band MCT is attached to the cooling section of the helium refrigerator 40 and is cooled to a temperature of 4K or more and 150K or less. For example, in a cooling method using a Dewar vessel filled with liquid nitrogen, the cooling temperature cannot be intentionally changed because the cooling method directly uses the heat of evaporation of liquid nitrogen (77K), but the cooling temperature can be changed in the cooling method using the helium refrigerator 40 of this embodiment. Therefore, it may be found that the measurement at a temperature of 77K was actually too cold, and that the proper cooling temperature is a temperature of 80K or 90K. When measuring the content of low-concentration carbon atoms in silicon crystals as in this embodiment, it is particularly preferable to set the cooling temperature range of the helium refrigerator 40 to a temperature range of 4K or more and less than 77K.

ヘリウム冷凍機40は、液体ヘリウムを冷媒として用いて所定の冷凍サイクルを実行するように構成されており、制御部50は、MCT検出素子が所定の設定温度になるようにヘリウム冷凍機40を制御するように構成されている。ヘリウム冷凍機40としては、例えば住友重機械工業(株)製のGM冷凍機などを採用することができる。 The helium refrigerator 40 is configured to execute a predetermined refrigeration cycle using liquid helium as a refrigerant, and the control unit 50 is configured to control the helium refrigerator 40 so that the MCT detection element reaches a predetermined set temperature. As the helium refrigerator 40, for example, a GM refrigerator manufactured by Sumitomo Heavy Industries, Ltd. can be used.

上述のように従来のデュワー容器に液体窒素や液体ヘリウムを入れて光検出器30を冷却する構成では、それらの蒸発温度が光検出器30の冷却温度になるため、冷却温度を自在に制御することは困難だった。本実施形態では、光検出器30の冷却にヘリウム冷凍機40を用いるので、蒸発温度以上の幅広い温度範囲(例えば約4K以上、約150K以下)から任意に冷却温度の設定値を定めて、MCT検出素子の温度制御を可能にした。 As described above, in the conventional configuration in which liquid nitrogen or liquid helium is poured into a Dewar vessel to cool the photodetector 30, the evaporation temperature of the liquid nitrogen or liquid helium becomes the cooling temperature of the photodetector 30, making it difficult to freely control the cooling temperature. In this embodiment, a helium refrigerator 40 is used to cool the photodetector 30, so the cooling temperature can be set arbitrarily from a wide range of temperatures above the evaporation temperature (e.g., from about 4 K to about 150 K), making it possible to control the temperature of the MCT detection element.

なお、ヘリウム以外の冷媒(窒素などの液化ガス)による冷凍機を用いても同様に、その冷媒に応じた冷却温度範囲での温度制御が可能になる。 In addition, even if a refrigerator using a refrigerant other than helium (a liquefied gas such as nitrogen) is used, it is possible to control the temperature within the cooling temperature range appropriate for that refrigerant.

また、MCT検出素子と一緒にコールドフィルター80も、ヘリウム冷凍機40によって同様に冷却され、温度制御される。コールドフィルター80を冷却することで、ノイズ信号の原因になるフィルター自体からの赤外放射が抑制される。 The cold filter 80, together with the MCT detection element, is also cooled and temperature controlled by the helium refrigerator 40. By cooling the cold filter 80, infrared radiation from the filter itself, which causes noise signals, is suppressed.

信号処理部60は、光検出器30からの検出信号を処理してインタフェログラムデータを取得し、フーリエ変換等の処理を実行して、吸光スペクトル等のスペクトル情報を算出する。信号処理部60は、例えばスペクトル測定装置に内蔵されたマイクロコンピュータや、装置とは別体のパーソナルコンピュータなどで構成される。 The signal processing unit 60 processes the detection signal from the photodetector 30 to obtain interferogram data, and performs processing such as Fourier transform to calculate spectral information such as the absorption spectrum. The signal processing unit 60 is composed of, for example, a microcomputer built into the spectrum measuring device, or a personal computer separate from the device.

なお、図示しないが、本実施形態のスペクトル測定装置は、試料部20にオートサンプラーなどの機構を用いて、複数の試料を自動で連続測定可能に構成されていてもよい。本実施形態では、ヘリウム冷凍機で極低温冷却を実施しているため、試料室等の開放に伴う外乱や昇温の影響を受けると、通常よりも温度再到達時間が長くなってしまう。オートサンプラーなどの機構を用いれば、そのような時間ロスをなくすことができ、試料室等の開閉などによる外乱を受けることなく、長時間かつ多検体の測定をより安定して行うことができる。 Although not shown, the spectrum measuring device of this embodiment may be configured to automatically measure multiple samples continuously using a mechanism such as an autosampler in the sample section 20. In this embodiment, cryogenic cooling is performed using a helium refrigerator, so if there is an influence of disturbance or temperature rise caused by opening the sample chamber, etc., the time it takes to reach the temperature again will be longer than usual. By using a mechanism such as an autosampler, it is possible to eliminate such time loss and perform long-term and multi-analyte measurements more stably without being affected by disturbances such as opening and closing the sample chamber, etc.

図2を用いて、光検出器30を温度制御するための設定温度を決定するための構成について説明する。制御部50は、ヘリウム冷凍機40を介してMCT検出素子32が設定温度になるように温度制御を実行する温度制御部52と、その設定温度を変更可能な設定変更部54とを有して構成されている。 The configuration for determining the set temperature for controlling the temperature of the photodetector 30 will be described with reference to FIG. 2. The control unit 50 is configured to include a temperature control unit 52 that performs temperature control via the helium refrigerator 40 so that the MCT detection element 32 reaches the set temperature, and a setting change unit 54 that can change the set temperature.

図2の信号処理部60は、フーリエ変換部62、スペクトル情報取得部64、濃度情報取得部66、感度特性取得部68および温度条件選択部70を有して構成されている。 The signal processing unit 60 in FIG. 2 is composed of a Fourier transform unit 62, a spectrum information acquisition unit 64, a concentration information acquisition unit 66, a sensitivity characteristic acquisition unit 68, and a temperature condition selection unit 70.

フーリエ変換部62は、光検出器30からの検出信号で構成されるインタフェログラムデータをフーリエ変換する。スペクトル情報取得部64は、フーリエ変換後のデータを処理して所望のスペクトルデータを算出する。濃度情報取得部66は、算出されたスペクトルデータに基づいて試料中の特定物質(炭素原子等)の濃度値を取得する。 The Fourier transform unit 62 performs a Fourier transform on the interferogram data consisting of the detection signal from the photodetector 30. The spectrum information acquisition unit 64 processes the data after the Fourier transform to calculate the desired spectrum data. The concentration information acquisition unit 66 acquires the concentration value of a specific substance (such as carbon atoms) in the sample based on the calculated spectrum data.

本実施形態に特徴的な感度特性取得部68は、設定変更部54によって変更される設定温度毎に、MCT検出素子32を含むスペクトル測定装置全体の感度特性を取得する。また、温度条件選択部70は、設定温度毎の感度特性に基づいて、スペクトル測定装置の感度特性の変動が所定の測定波数域(例えば、630~580cm-1)で小さくなるような温度条件を選択するように構成されている。温度条件選択部70によって選択された温度条件は制御部50に渡され、試料のスペクトル情報を取得する際にMCT検出素子32を温度制御するための設定温度になる。 The sensitivity characteristic acquisition unit 68, which is characteristic of this embodiment, acquires the sensitivity characteristic of the entire spectrum measurement device including the MCT detection element 32 for each set temperature changed by the setting change unit 54. The temperature condition selection unit 70 is configured to select temperature conditions based on the sensitivity characteristic for each set temperature such that the fluctuation of the sensitivity characteristic of the spectrum measurement device is small in a predetermined measurement wavenumber range (e.g., 630 to 580 cm -1 ). The temperature conditions selected by the temperature condition selection unit 70 are passed to the control unit 50, and become the set temperatures for controlling the temperature of the MCT detection element 32 when acquiring spectrum information of a sample.

図2のヘリウム冷凍機40には、光検出器30とともにコールドフィルター80が配置されている。コールドフィルター80は、フィルター切替機82によりスイング移動可能に設けられ、そのスイング位置に応じてフィルターの位置が光路上かオフセット位置か選択される。フィルター切替機82を使って、コールドフィルター80を適宜オフセットすれば、フィルターによる波数域制限下での測定から、そのような波数域制限を受けない測定への切り替えがスムーズに行える。なお、異なる波数域でのスペクトル測定を実行するため、コールドフィルター80を含む複数の光学フィルターを適宜切り替え可能に構成されたフィルター切替機を用いてもよい。 In the helium refrigerator 40 in FIG. 2, a cold filter 80 is placed together with the photodetector 30. The cold filter 80 is provided so that it can be swung by a filter switcher 82, and the position of the filter is selected to be on the optical path or at an offset position depending on the swing position. By appropriately offsetting the cold filter 80 using the filter switcher 82, it is possible to smoothly switch from a measurement under the wavenumber range restriction by the filter to a measurement without such wavenumber range restriction. Note that a filter switcher configured to be able to appropriately switch between multiple optical filters including the cold filter 80 may be used to perform spectral measurements in different wavenumber ranges.

なお、制御部50としては、図2の構成に限られず、設定変更部54に代えて、予め選択された温度条件を温度制御の設定温度として設定する機能だけの設定変更部にしてもよく、この場合、信号処理部60には感度特性取得部68と温度条件選択部70とを設けなくてもよい。設定値は、予めスペクトル測定装置の感度特性の変動が測定波数域で小さくなるような温度条件に基づくものであり、同じ赤外分光光度計10および光検出器30の構成を用いて、スペクトル測定装置の感度特性を測定して決定されたものが設定される。 The control unit 50 is not limited to the configuration shown in FIG. 2, and may be a setting change unit that only has the function of setting a preselected temperature condition as the set temperature for temperature control, instead of the setting change unit 54. In this case, the signal processing unit 60 does not need to be provided with the sensitivity characteristic acquisition unit 68 and the temperature condition selection unit 70. The set value is based on temperature conditions that reduce the fluctuation of the sensitivity characteristic of the spectrum measuring device in the measurement wavenumber range, and is set by measuring the sensitivity characteristic of the spectrum measuring device using the same infrared spectrophotometer 10 and photodetector 30 configuration.

光検出器30の冷却温度が変わると、MCT検出素子32の感度特性(検出感度や検出帯域)が変化する。これを利用すれば、冷却温度の調整による感度特性の最適化を実現することができる。本実施形態では、以下の手順で、所定の測定波数域での最適な設定温度を決定することにした。 When the cooling temperature of the photodetector 30 changes, the sensitivity characteristics (detection sensitivity and detection band) of the MCT detection element 32 change. This can be used to optimize the sensitivity characteristics by adjusting the cooling temperature. In this embodiment, the optimal set temperature for a specified measurement wavenumber range is determined by the following procedure.

事前測定の手順
図3に事前測定の手順を示す。事前測定は、測定装置に体差があることを考慮して、測定装置毎に実行する。また、測定装置に固有の光学的特性が経時的に変化することを考慮して定期的に、測定装置の事前測定(温度条件の再設定)を実行することが好ましい。

The procedure for pre-measurement is shown in Figure 3. Considering that there are individual differences in the measurement devices, the pre-measurement is performed for each measurement device. Also, considering that the optical characteristics specific to the measurement device change over time, it is preferable to perform the pre-measurement (resetting of temperature conditions) of the measurement device periodically.

まず、制御部50の設定変更部54が、光検出器30を温度制御するための設定温度TをT1に設定する(ステップS11)。次に、温度制御部52が、ヘリウム冷凍機40を介して光検出器30の温度を制御する(ステップS12)。そして、試料部に試料を設置しない状態で、フーリエ変換型赤外分光光度計10を用いてスペクトルを測定し、これをスペクトル測定装置の感度特性として取り扱う(ステップS13)。 First, the setting change unit 54 of the control unit 50 sets the set temperature T for controlling the temperature of the photodetector 30 to T1 (step S11). Next, the temperature control unit 52 controls the temperature of the photodetector 30 via the helium refrigerator 40 (step S12). Then, without placing a sample in the sample unit, the spectrum is measured using the Fourier transform infrared spectrophotometer 10, and this is treated as the sensitivity characteristic of the spectrum measurement device (step S13).

設定変更部54が、次の設定温度T2に変更し(ステップS14)、同様に、感度特性を取得する(ステップS11~S13)。このようにして、所定の設定温度(例えばT1~T5)の温度制御下での感度特性が全て取得される。 The setting change unit 54 changes to the next set temperature T2 (step S14) and similarly acquires the sensitivity characteristics (steps S11 to S13). In this way, all sensitivity characteristics under temperature control at the specified set temperatures (e.g., T1 to T5) are acquired.

この事前測定において、設定変更部54が、設定温度を例えば4K以上、150K以下の範囲で変更してもよい。好ましくは、4K以上、77K未満の範囲である。また、設定温度を変更するピッチを、例えば0.1K~10Kのピッチにしてもよい。温度変化に対するスペクトル測定装置の感度特性の変化が大きい温度条件の前後では、ピッチを細かくすることで、感度特性の変化を正確に取得することができる。なお、光検出器30の温度制御の精度が低い場合は、ピッチを細かくし過ぎても意味がないので、その温度制御の精度に応じてピッチを設定するとよい。 In this preliminary measurement, the setting change unit 54 may change the set temperature, for example, in the range of 4 K or more and 150 K or less. Preferably, it is in the range of 4 K or more and less than 77 K. The pitch at which the set temperature is changed may be, for example, 0.1 K to 10 K. By making the pitch finer around temperature conditions where the sensitivity characteristics of the spectrum measuring device change significantly in response to temperature changes, the change in sensitivity characteristics can be obtained accurately. Note that if the accuracy of temperature control of the photodetector 30 is low, making the pitch too fine is meaningless, so it is advisable to set the pitch according to the accuracy of the temperature control.

図4に設定温度T1~T5毎のスペクトル測定装置の感度特性を模式的に示す。温度条件選択部70は、感度特性に基づいて、光検出器30の温度制御の設定温度を決定する(ステップS15)。この手順では、図4に示す測定波数域(例えば、630~580cm-1)の感度特性に着目し、この波数域での感度特性の波数依存性が小さい温度条件を選択する(基準1)。言い換えると、測定波数域において波数(横軸)方向における感度(縦軸)の増減が小さい(平坦である)ものを選択する。図4の例では、設定温度T3とT4での感度特性の波数依存性が小さく、温度条件がT3とT4に絞られる。 FIG. 4 shows a schematic diagram of the sensitivity characteristics of the spectrum measuring device for each set temperature T1 to T5. The temperature condition selection unit 70 determines the set temperature for temperature control of the photodetector 30 based on the sensitivity characteristics (step S15). In this procedure, the sensitivity characteristics in the measurement wavenumber range (for example, 630 to 580 cm −1 ) shown in FIG. 4 are focused on, and a temperature condition in which the wavenumber dependency of the sensitivity characteristics in this wavenumber range is small is selected (criterion 1). In other words, a temperature condition in which the increase or decrease in sensitivity (vertical axis) in the wavenumber (horizontal axis) direction in the measurement wavenumber range is small (flat) is selected. In the example of FIG. 4, the wavenumber dependency of the sensitivity characteristics at the set temperatures T3 and T4 is small, and the temperature conditions are narrowed down to T3 and T4.

本実施形態では、更に、温度変化に対する感度特性の変化(バラツキ)が小さい温度条件を選択することにした(基準2)。図5を用いて説明すると、まず、設定温度T3を含む所定の温度範囲(T28~T32)と、設定温度T4を含む所定の温度範囲(T38~T42)とを設定する。それぞれの温度範囲の最高温度と最低温度の差分は同じにする。そして、目的の物質に応じた目標波数(炭素原子の場合は波数605cm-1)における温度毎の感度のバラツキが小さいものを選択する。図5の例では、設定温度T3の方が感度のバラツキが小さく、温度制御の設定温度TはT3に決定される。 In this embodiment, a temperature condition with a small change (variation) in sensitivity characteristics with respect to temperature change is further selected (criterion 2). Explaining with reference to FIG. 5, first, a predetermined temperature range (T28-T32) including the set temperature T3 and a predetermined temperature range (T38-T42) including the set temperature T4 are set. The difference between the maximum temperature and the minimum temperature in each temperature range is set to be the same. Then, a temperature with a small variation in sensitivity for each temperature at a target wave number according to the target substance (wave number 605 cm -1 in the case of carbon atom) is selected. In the example of FIG. 5, the set temperature T3 has a smaller variation in sensitivity, and the set temperature T for temperature control is determined to be T3.

なお、光検出器30の感度の変化は、SN比にも影響を与えるため、SN比が高くなることを選択基準に加えてもよい(基準3)。例えば、基準1~3の全てを適用して総合的に判断して、最適な温度条件を決定してもよい。 In addition, because changes in the sensitivity of the photodetector 30 also affect the S/N ratio, increasing the S/N ratio may be added to the selection criteria (criterion 3). For example, the optimal temperature conditions may be determined by comprehensively determining the criteria 1 to 3.

上述の基準2の変形例として、温度毎に測定波数域の感度の平均値を算出し、設定された温度範囲において感度の平均値の変化(バラツキ)が小さいものを選択するようにしてもよい。 As a variation of the above-mentioned criterion 2, the average sensitivity of the measurement wavenumber range may be calculated for each temperature, and the sensitivity with the smallest change (variation) in the average sensitivity within the set temperature range may be selected.

光検出器30の感度が多少低くなる温度条件であっても、所定の測定波数域(例えば目標波数605cm-1付近の帯域)での感度特性が平坦になっている方が、光検出器30の温度変動などに対しても正しい測定値が得られやすくなる。つまり、測定波数域での感度特性の勾配が小さい方が、温度変動に強いと言える。 Even under temperature conditions where the sensitivity of the photodetector 30 is somewhat low, a flat sensitivity characteristic in a predetermined measurement wavenumber range (for example, a band near the target wavenumber of 605 cm −1 ) makes it easier to obtain accurate measurement values even with temperature fluctuations in the photodetector 30. In other words, it can be said that a smaller gradient of the sensitivity characteristic in the measurement wavenumber range is more resistant to temperature fluctuations.

また、本測定でのピーク検出において、ピーク位置での吸収スペクトルの縦軸値を単に読み取るのではなく、ピークスペクトルに対してベースラインを引いて、ベースラインからピークトップまでの差分を読み取るため、目標波数(例えば605cm-1)付近一帯の感度特性が平坦であることが、測定値の正確さを高めるために重要になる。このことから本実施形態における測定波数域は、測定対象のスペクトルピークが生じる帯域に応じて適宜定められるべきであり、少なくともピーク全体を含むように定めることが好ましい。 Furthermore, in peak detection in this measurement, instead of simply reading the vertical axis value of the absorption spectrum at the peak position, a baseline is drawn for the peak spectrum and the difference from the baseline to the peak top is read, so that it is important to improve the accuracy of the measurement value that the sensitivity characteristics in the vicinity of the target wavenumber (e.g., 605 cm -1 ) are flat. For this reason, the measurement wavenumber range in this embodiment should be appropriately determined according to the band in which the spectrum peak of the measurement target occurs, and it is preferable to determine it so as to include at least the entire peak.

なお、光検出器30の温度制御の設定温度を変更すると、図4の例のように、MCT検出素子32の検出帯域が必要以上に低波数側に拡張される場合もある。本実施形態では、極低温状態のコールドフィルター80を併用しているので、上記のように拡張された低波数側の検出帯域で検出される光を、コールドフィルター80で事前にカットすることもできる。従って、設定温度の変更によって、検出帯域が必要以上に低波数側に拡張されたとしても、それによるスペクトル測定の精度への影響を排除することができる。 When the set temperature of the temperature control of the photodetector 30 is changed, the detection band of the MCT detection element 32 may be extended unnecessarily to the low wavenumber side, as in the example of FIG. 4. In this embodiment, the cold filter 80 in an extremely low temperature state is also used, so that the light detected in the extended low wavenumber detection band as described above can be cut in advance by the cold filter 80. Therefore, even if the detection band is extended unnecessarily to the low wavenumber side by changing the set temperature, the effect on the accuracy of the spectrum measurement due to this can be eliminated.

本測定の手順
事前測定で選択された温度条件(T=T3)を用いた本測定の手順を図6に示す。まず、温度制御部52が設定温度T3による光検出器30の温度制御を実行する(ステップS21)。次に、試料部20に試料を設置しない状態にして(ステップS22)、フーリエ変換型赤外分光光度計10を用いてスペクトルを測定し、これをバックグラウンドのデータとして扱う(ステップS23)。なお、事前測定で取得した設定温度T3の感度特性データをバックグラウンドのデータに流用することもできる。
Procedure for Main Measurement The procedure for the main measurement using the temperature condition (T=T3) selected in the preliminary measurement is shown in Fig. 6. First, the temperature control unit 52 controls the temperature of the photodetector 30 at the set temperature T3 (step S21). Next, with no sample placed on the sample unit 20 (step S22), the spectrum is measured using the Fourier transform infrared spectrophotometer 10, and this is treated as background data (step S23). Note that the sensitivity characteristic data for the set temperature T3 obtained in the preliminary measurement can also be used as background data.

次に、試料部20に参照試料を設置して(ステップS24)、同様にスペクトルを取得する(ステップS22~S23)。ここでは、参照試料として、例えば低炭素含有(ほとんど炭素を含んでいない)ウェーハを用いる。その他、基準になるような試料を参照試料として用いてもよい。また、試料部20に測定試料のウェーハを設置して(ステップS24)、同様にスペクトルを取得する(ステップS22~S23)。 Next, a reference sample is placed in the sample section 20 (step S24), and a spectrum is similarly obtained (steps S22 to S23). Here, for example, a low carbon content (almost no carbon) wafer is used as the reference sample. Other samples that serve as standards may also be used as the reference sample. A measurement sample wafer is then placed in the sample section 20 (step S24), and a spectrum is similarly obtained (steps S22 to S23).

ここでは、フーリエ変換型赤外分光光度計10によって、約700~500cm-1の波数範囲の透過スペクトルが測定される。図7(A)に、フーリエ変換型赤外分光光度計10によるシングルビーム測定で得られる信号(SB信号)を、それぞれ、バックグラウンドの透過スペクトルI、参照試料の透過スペクトルI、測定試料の透過スペクトルIとして示す。 Here, the transmission spectrum in the wave number range of about 700 to 500 cm −1 is measured by the Fourier transform infrared spectrophotometer 10. In Fig. 7A, the signals (SB signals) obtained by single beam measurement by the Fourier transform infrared spectrophotometer 10 are shown as the background transmission spectrum I 0 , the reference sample transmission spectrum I R , and the measurement sample transmission spectrum I 1 , respectively.

次に、スペクトル情報取得部64が参照試料および測定試料の透過スペクトルI、IをそれぞれバックグラウンドスペクトルIで割って透過率スペクトル(I/I0、/I)を算出する(ステップS25)。図7(B)に、算出した透過率スペクトル(I/I0、/I)をそれぞれ示す。「%T」で表示されることが多い。続けて、透過率スペクトル(I/I0、/I)を吸光スペクトルに変換する(ステップS26)。図7(C)に参照試料および測定試料の吸収スペクトルを示す。縦軸は吸光度(Abs)を表す。 Next, the spectrum information acquisition unit 64 divides the transmission spectra I R and I 1 of the reference sample and the measurement sample by the background spectrum I 0 to calculate the transmittance spectra (I R /I 0, I 1 /I 0 ) (step S25). The calculated transmittance spectra (I R /I 0, I 1 /I 0 ) are shown in FIG. 7(B). They are often displayed as "% T". Next, the transmittance spectra (I R /I 0, I 1 /I 0 ) are converted to absorption spectra (step S26). The absorption spectra of the reference sample and the measurement sample are shown in FIG. 7(C). The vertical axis represents absorbance (Abs).

なお、シリコン結晶中の炭素濃度の測定が難しい理由は、一般的なFTIRの光源では、その吸収ピークである605cm-1付近の波数域での検出光が暗くなってしまい適切ではない。また、適切な検出帯域の光検出器がなかったことである。しかも、炭素濃度に由来する吸収ピークは、図7(C)の測定試料の吸光スペクトルに示すように、シリコン格子振動に由来する広帯域の大きな吸収ピークに重畳するため、通常は、測定試料の吸光スペクトルから、炭素濃度がゼロと仮定できる参照試料(参照ウェハ)の吸光スペクトルを差し引いて、炭素のピーク高さを算出する。ここで、両測定の同一性が取れていることが、適切な差スペクトルを得る条件になっており、炭素濃度の定量精度を決める一番の要因になる。つまり、測定試料と参照試料の2つの測定を安定して実行できることが重要である。また、多検体のスペクトル測定においては、それぞれの測定の同一性も重要になる。また、所定のSN比を得るために測定時間(例えば、フーリエ変換型赤外分光光度計10の積算回数を増やす等)を長くすることも必要になるので、長時間のスペクトル測定が安定して実行できることも重要になる。 The reason why it is difficult to measure the carbon concentration in silicon crystal is that the light source of a general FTIR is not suitable because the detection light in the wave number region around 605 cm −1 , which is the absorption peak, becomes dark. In addition, there was no photodetector with an appropriate detection band. Moreover, since the absorption peak derived from the carbon concentration overlaps with the large absorption peak in a wide band derived from silicon lattice vibration, as shown in the absorption spectrum of the measurement sample in FIG. 7(C), the absorption spectrum of the reference sample (reference wafer) whose carbon concentration can be assumed to be zero is usually subtracted from the absorption spectrum of the measurement sample to calculate the carbon peak height. Here, the identity of both measurements is a condition for obtaining an appropriate difference spectrum, and is the most important factor in determining the quantitative accuracy of the carbon concentration. In other words, it is important to be able to stably perform two measurements of the measurement sample and the reference sample. In addition, in the spectrum measurement of multiple samples, the identity of each measurement is also important. Furthermore, in order to obtain a predetermined signal-to-noise ratio, it is necessary to extend the measurement time (for example, by increasing the number of integration times of the Fourier transform infrared spectrophotometer 10), so it is also important that spectral measurements can be performed stably for a long period of time.

本実施形態では、事前測定において、測定波数域でのスペクトル測定装置の感度特性の変動が小さくなるような温度条件を選択し、その温度条件を本測定での冷却温度の設定値として用いることにした。その結果、本測定において長時間の安定したスペクトル測定の実行が可能となり、測定波数域において参照試料のスペクトル測定と測定試料のスペクトル測定との同一性を取ることが可能となり、両スペクトルの差を取ることで正確な吸収ピークを算出することができるようになった。 In this embodiment, in the preliminary measurement, temperature conditions are selected that reduce the fluctuation in the sensitivity characteristics of the spectrum measurement device in the measurement wavenumber range, and these temperature conditions are used as the set value of the cooling temperature in the main measurement. As a result, it is possible to perform stable spectrum measurement for a long period of time in the main measurement, and it is possible to obtain identity between the spectrum measurement of the reference sample and the spectrum measurement of the measurement sample in the measurement wavenumber range, and it is now possible to calculate an accurate absorption peak by taking the difference between the two spectra.

つまり、図6の手順において、測定試料の吸光スペクトルから参照試料の吸光スペクトルを差し引くことで、特定物質(炭素原子)のみの吸収スペクトルを算出する(ステップS27)。図7(D)に、測定波数域に生じる吸収ピーク(残留ピーク)を拡大したものを示す。なお、参照試料と測定試料の厚さが異なる場合は、参照試料の吸光スペクトルに「測定試料厚さ/参照試料厚さ」を掛けたものを、測定試料の吸光スペクトルから差し引けばよい。 In other words, in the procedure of FIG. 6, the absorption spectrum of the reference sample is subtracted from the absorption spectrum of the measurement sample to calculate the absorption spectrum of only the specific substance (carbon atom) (step S27). FIG. 7(D) shows an enlarged view of the absorption peak (residual peak) occurring in the measurement wavenumber range. Note that if the thicknesses of the reference sample and the measurement sample are different, the absorption spectrum of the reference sample can be multiplied by "measurement sample thickness/reference sample thickness" and then subtracted from the absorption spectrum of the measurement sample.

最後に、濃度情報取得部66が図7(D)の特定物質の吸収ピークの測定波数域(例えば、630~580cm-1)にベースラインを引き、ピークトップの吸光度Apeakと、そのピーク波数におけるベースラインの吸光度Abaseとを読み取って、両者の差(Apeak-Abase)である「ピーク高さ」を算出する。そして、ピーク高さと試料の厚さから吸収係数を算定し、特定物質の濃度値を算出する(ステップS28)。なお、吸収ピークの全半値幅を測定し、例えば6cm-1よりも大きい場合は不適切であるため、測定条件を見直すようにしてもよい。 Finally, the concentration information acquisition unit 66 draws a baseline in the measurement wavenumber range (e.g., 630-580 cm -1 ) of the absorption peak of the specific substance in Fig. 7 (D), reads the absorbance Apeak of the peak top and the absorbance Abase of the baseline at the peak wavenumber, and calculates the "peak height" which is the difference between the two (Apeak-Abase). Then, the absorption coefficient is calculated from the peak height and the thickness of the sample, and the concentration value of the specific substance is calculated (step S28). Note that the full half width of the absorption peak is measured, and if it is greater than, for example, 6 cm -1 , it is inappropriate, so the measurement conditions may be reviewed.

中帯域MCTの感度特性について言うと、広帯域MCTよりも感度が高いので、できれば光検出器として中帯域MCTを用いたい。しかし、液体窒素での冷却温度(77K)では、中帯域MCTのカットオフが650~600cm-1にあり、605cm-1付近の波数域では感度が急峻に立ち上がっているため、測定には使用できない。しかし、ヘリウム冷凍機で冷却した中帯域MCTであれば、カットオフを500cm-1未満まで拡張することができる。 Regarding the sensitivity characteristics of mid-band MCT, it is more sensitive than wideband MCT, so it is desirable to use mid-band MCT as a photodetector if possible. However, at the cooling temperature of liquid nitrogen (77K), the cutoff of mid-band MCT is at 650-600 cm -1 , and the sensitivity rises sharply in the wavenumber range around 605 cm -1 , so it cannot be used for measurement. However, if the mid-band MCT is cooled by a helium refrigerator, the cutoff can be extended to less than 500 cm -1 .

MCTの温度変動が生じた場合に、カットオフの波数位置が微妙にシフトするため、カットオフ付近の波数域でのピーク検出は上手くいかない。しかし、カットオフから離れた波数域では、感度特性の変化が緩やかになるので、そのような波数域でピーク検出ができると非常に有効である。 When the temperature of the MCT fluctuates, the cutoff wavenumber position shifts slightly, making it difficult to detect peaks in the wavenumber range near the cutoff. However, in wavenumber ranges away from the cutoff, the change in sensitivity characteristics becomes more gradual, so it is very effective to be able to detect peaks in such wavenumber ranges.

本実施形態では、光検出器のカットオフ付近に生じる炭素原子の吸収ピークを測定する場合に、以下の手順を行なうことができる。
まず、ヘリウム冷凍機による中帯域MCTの冷却温度を調整して、中帯域MCTのカットオフを500cm-1未満まで拡張させる。
また、炭素原子のピークの検出帯域(605cm-1付近)が、ちょうど、中帯域MCTを含む測定装置全体の感度特性の波数方向の変化がなだらか(平坦)である帯域になるように、中帯域MCTの冷却温度を積極的に微調整する。
このような手順で温度調整された中帯域MCTを用いれば、シリコン結晶中の炭素濃度のデータを長時間にわたって繰り返し安定的に取得することができる。
In this embodiment, when measuring an absorption peak of a carbon atom occurring near the cutoff of the photodetector, the following procedure can be carried out.
First, the cooling temperature of the mid-band MCT by the helium refrigerator is adjusted to extend the cutoff of the mid-band MCT to less than 500 cm −1 .
In addition, the cooling temperature of the mid-band MCT is actively fine-tuned so that the detection band of the carbon atom peak (around 605 cm -1 ) is exactly in a band where the change in the wavenumber direction of the sensitivity characteristics of the entire measurement device including the mid-band MCT is gradual (flat).
By using a mid-band MCT whose temperature has been adjusted in this manner, data on the carbon concentration in the silicon crystal can be repeatedly and stably obtained over a long period of time.

なお、検出したいピークは特定の狭い波数帯域に生じるため、中帯域MCTが受光する光の波数帯域をその狭波数帯域に限定した方が、測定感度を向上させることができる。例えば、温度制御された中帯域MCTのカットオフ特性を利用して、不必要な低波数側(長波長側)の光が検出されないようにすることができる。また、不必要な高波数側(短波長側)の光を、適切なロングパスまたはバンドパスフィルターによって、中帯域MCTの前で除去することもできる。例えば、中帯域MCTとバンドパスフィルターとの併用によって、中帯域MCTのカットオフ特性をより顕著にさせることもできる。 In addition, since the peak to be detected occurs in a specific narrow wavenumber band, limiting the wavenumber band of the light received by the mid-band MCT to that narrow wavenumber band can improve measurement sensitivity. For example, the cutoff characteristics of a temperature-controlled mid-band MCT can be used to prevent unnecessary light on the low wavenumber side (longer wavelength side) from being detected. Also, unnecessary light on the high wavenumber side (shorter wavelength side) can be removed before the mid-band MCT by an appropriate long-pass or band-pass filter. For example, the cutoff characteristics of the mid-band MCT can be made more pronounced by using a mid-band MCT in combination with a band-pass filter.

また、光検出器の前に設けるロングパスフィルターやバンドパスフィルターは、コールドフィルターと同様にヘリウム冷凍機による冷却および温度調整を受けて、フィルター自体からの熱放射を抑制するようにしてもよい。また、試料の冷却を行って、試料からの熱放射も可能な限り抑制している。従って、光検出器は、試料および光検出器前のフィルターからの有害な熱放射光の影響をほとんど受けずに済む。 The long-pass filter and band-pass filter placed in front of the photodetector may be cooled and temperature-regulated by a helium refrigerator in the same way as the cold filter, to suppress thermal radiation from the filter itself. The sample is also cooled to suppress thermal radiation from the sample as much as possible. Therefore, the photodetector is hardly affected by harmful thermal radiation from the sample and the filter in front of the photodetector.

なお、中帯域MCTよりも低い波数域まで検出可能な広帯域MCTを用いる場合にも本発明を適用することで、例えば低波数域にある測定波数域のピークを感度よく測定できるというメリットがある。また、本発明は、MCT検出器に限られず、各種フォトダイオードなどの他の半導体検出器であって、冷却温度を4K~150Kの範囲内で変更した場合にその感度特性が変化するような半導体検出器を備えた赤外分光光度計にも適用できる。 The present invention can also be applied to cases where a wideband MCT capable of detecting wavenumber ranges lower than those of a midband MCT is used, offering the advantage of being able to measure peaks in the measurement wavenumber range, for example, in the low wavenumber range, with good sensitivity. The present invention is not limited to MCT detectors, and can also be applied to infrared spectrophotometers equipped with other semiconductor detectors, such as various photodiodes, whose sensitivity characteristics change when the cooling temperature is changed within the range of 4K to 150K.

10 フーリエ変換型赤外分光光度計(赤外分光光度計)
20 試料部
22 試料用ヘリウム冷凍機(試料用冷凍機)
30 光検出器
32 MCT検出素子(半導体検出素子)
40 ヘリウム冷凍機(冷凍機)
50 制御部
54 設定変更部
60 信号処理部
68 感度特性取得部
70 温度条件選択部
80 コールドフィルター(光学フィルター)
82 フィルター切替機
10. Fourier transform infrared spectrophotometer (infrared spectrophotometer)
20 Sample section 22 Helium refrigerator for sample (refrigerator for sample)
30 Photodetector 32 MCT detector (semiconductor detector)
40 Helium refrigerator (refrigerator)
50 Control unit 54 Setting change unit 60 Signal processing unit 68 Sensitivity characteristic acquisition unit 70 Temperature condition selection unit 80 Cold filter (optical filter)
82 Filter changer

Claims (11)

料部と、
赤外分光光度計と、
半導体構造の光検出器と、
所定の冷媒による冷凍サイクルを実行して前記光検出器の半導体検出素子を冷却する冷凍機と、
前記半導体検出素子が所定の設定温度になるように前記冷凍機を制御する制御部と、
前記光検出器からの検出信号に基づくスペクトル情報を取得する信号処理部と、を備える赤外スペクトル測定装置であって
前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を、前記半導体検出素子の前記設定温度に定めるように構成され、
前記制御部は、前記設定温度を4~150Kの範囲の複数の温度に変更できるように構成された設定変更部を有することを特徴とする赤外スペクトル測定装置。
A sample portion;
An infrared spectrophotometer;
a photodetector having a semiconductor structure;
a refrigerator that executes a refrigeration cycle using a predetermined refrigerant to cool a semiconductor detection element of the photodetector;
a control unit that controls the refrigerator so that the semiconductor detection element is at a predetermined set temperature;
and a signal processing unit that acquires spectrum information based on a detection signal from the photodetector,
The set temperature of the semiconductor detection element is determined to be a temperature condition such that the fluctuation of the sensitivity characteristic of the infrared spectrum measuring device is small in a predetermined measurement wave number range,
The control unit has a setting change unit configured to change the set temperature to a plurality of temperatures in a range of 4 to 150 K.
請求項1記載の赤外スペクトル測定装置において、
前記制御部は、前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を、前記半導体検出素子の前記設定温度に定めるように構成され、
前記温度条件は、複数の温度条件で取得された前記赤外スペクトル測定装置の感度特性に基づいて決定されたものである、ことを特徴とする赤外スペクトル測定装置。
2. The infrared spectrometer according to claim 1,
the control unit is configured to determine a temperature condition for the set temperature of the semiconductor detection element such that a fluctuation in sensitivity characteristic of the infrared spectrum measurement device is small in a predetermined measurement wavenumber range;
4. An infrared spectrum measuring apparatus according to claim 1, wherein the temperature condition is determined based on sensitivity characteristics of the infrared spectrum measuring apparatus obtained under a plurality of temperature conditions.
請求項1記載の赤外スペクトル測定装置において、
前記信号処理部は、
複数の温度条件で前記赤外スペクトル測定装置の感度特性を取得する感度特性取得部と、
前記温度条件毎の前記感度特性に基づいて、前記スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件を選択する温度条件選択部と、を有し、
前記制御部は、前記温度条件選択部で選択された前記温度条件を、前記半導体検出素子の前記設定温度に定めるように構成されている、
ことを特徴とする赤外スペクトル測定装置。
2. The infrared spectrometer according to claim 1,
The signal processing unit includes:
a sensitivity characteristic acquisition unit that acquires sensitivity characteristics of the infrared spectrum measurement device under a plurality of temperature conditions;
a temperature condition selection unit that selects a temperature condition based on the sensitivity characteristic for each temperature condition such that a variation in the sensitivity characteristic of the spectrum measurement device is small in a predetermined measurement wavenumber range,
The control unit is configured to determine the temperature condition selected by the temperature condition selection unit as the set temperature of the semiconductor detection element.
An infrared spectrum measuring device comprising:
請求項2または3記載の赤外スペクトル測定装置において、
前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件とは、
前記所定の測定波数域での波数方向における感度の増減が小さくなる温度条件であることを特徴とする赤外スペクトル測定装置。
4. The infrared spectrometer according to claim 2,
The temperature condition under which the fluctuation in the sensitivity characteristic of the infrared spectrum measuring device becomes small in a predetermined measurement wave number range is as follows:
An infrared spectrum measuring apparatus characterized in that the temperature conditions are such that the increase or decrease in sensitivity in the wavenumber direction in the specified measurement wavenumber range is small.
請求項2から4のいずれかに記載の赤外スペクトル測定装置において、
前記赤外スペクトル測定装置の感度特性の変動が所定の測定波数域で小さくなるような温度条件とは、
前記感度特性を取得する際の温度条件毎に所定の温度範囲を定めて、当該範囲内の温度条件で取得される複数の前記感度特性のバラツキが、前記所定の測定波数域において小さくなるような温度条件であることを特徴とする赤外スペクトル測定装置。
5. The infrared spectrometer according to claim 2,
The temperature condition under which the fluctuation in the sensitivity characteristic of the infrared spectrum measuring device becomes small in a predetermined measurement wave number range is as follows:
an infrared spectrum measuring device, characterized in that a predetermined temperature range is determined for each temperature condition when the sensitivity characteristics are acquired, and the temperature conditions are such that a variation in the plurality of sensitivity characteristics acquired under temperature conditions within the temperature range is small in the predetermined measurement wavenumber range.
請求項1から5のいずれかに記載の赤外スペクトル測定装置において、
前記試料部と前記半導体検出素子との間に配置された光学フィルターを備え、
当該光学フィルターは、
前記所定の測定波数域よりも低波数側の光の全部もしくは一部を透過しない光学フィルターであり、または、
前記所定の測定波数域よりも高波数側の光の全部もしくは一部、および、前記所定の測定波数域よりも低波数側の光の全部もしくは一部を透過しない光学フィルターであり、
当該光学フィルターは、前記半導体検出素子とともに前記冷凍機によって冷却されるように構成されていること、を特徴とする赤外スペクトル測定装置。
6. The infrared spectrometer according to claim 1,
an optical filter disposed between the sample portion and the semiconductor detection element;
The optical filter is
An optical filter that does not transmit all or a part of light on the lower wavenumber side than the predetermined measurement wavenumber range, or
an optical filter that does not transmit all or a part of light on a higher wavenumber side than the predetermined measurement wavenumber range and all or a part of light on a lower wavenumber side than the predetermined measurement wavenumber range;
The infrared spectrum measuring device is characterized in that the optical filter is configured to be cooled by the refrigerator together with the semiconductor detection element.
請求項6記載の赤外スペクトル測定装置において、
前記光学フィルターの位置を、前記試料部と前記半導体検出素子との間の光路上からオフセットさせるフィルター切替機を備える、ことを特徴とする赤外スペクトル測定装置。
7. The infrared spectrometer according to claim 6,
13. An infrared spectrum measuring device comprising: a filter changer for offsetting the position of the optical filter from the optical path between the sample portion and the semiconductor detection element.
請求項6記載の赤外スペクトル測定装置において、
前記光学フィルターを、別の光学フィルターに切り替えるフィルター切替機を備える、ことを特徴とする赤外スペクトル測定装置。
7. The infrared spectrometer according to claim 6,
An infrared spectrum measuring device comprising a filter changer for changing the optical filter into another optical filter.
請求項1から8のいずれかに記載の赤外スペクトル測定装置において、
前記半導体検出素子を冷却するための冷凍機とは別に、前記試料部の試料を冷却するための試料用冷凍機を備える、ことを特徴とする赤外スペクトル測定装置。
9. The infrared spectrometer according to claim 1,
an infrared spectrum measuring device comprising a refrigerator for cooling a sample in the sample portion, in addition to a refrigerator for cooling the semiconductor detection element;
請求項1から9のいずれかに記載の赤外スペクトル測定装置の構成を備えて、試料中の物質の濃度値を測定する濃度測定装置であって、
前記信号処理部は、取得した試料のスペクトル情報から前記所定の測定波数域のスペクトルピークを読み取って、当該スペクトルピークに基づいて前記物質の濃度値を算出するように構成されていることを特徴とする濃度測定装置。
A concentration measurement device for measuring a concentration value of a substance in a sample, comprising the infrared spectrum measurement device according to any one of claims 1 to 9,
The signal processing unit is configured to read a spectral peak in the specified measurement wavenumber range from the acquired spectral information of the sample, and calculate a concentration value of the substance based on the spectral peak.
請求項10記載の濃度測定装置は、
605cm-1を含むその前後の波数域を前記所定の測定波数域として、
前記半導体検出素子の前記設定温度を4K以上、77K未満の温度に定めて、
シリコン結晶中の炭素原子濃度を測定することを特徴とする濃度測定装置。
The concentration measuring device according to claim 10,
The wavenumber range including 605 cm −1 and its vicinity is set as the predetermined measurement wavenumber range,
The set temperature of the semiconductor detection element is set to a temperature of 4 K or more and less than 77 K,
A concentration measuring device for measuring the concentration of carbon atoms in a silicon crystal.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006073572A (en) 2004-08-31 2006-03-16 Oki Electric Ind Co Ltd Semiconductor crystal defect testing method and equipment thereof, and semiconductor device manufacturing method using the semiconductor crystal defect testing equipment
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US4177381A (en) * 1974-09-27 1979-12-04 Andros Incorporated Gas analyzer sample cell
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JP6441759B2 (en) * 2015-07-24 2018-12-19 株式会社堀場製作所 Output correction method for photodetector used in spectroscopic analyzer

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* Cited by examiner, † Cited by third party
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JP2006073572A (en) 2004-08-31 2006-03-16 Oki Electric Ind Co Ltd Semiconductor crystal defect testing method and equipment thereof, and semiconductor device manufacturing method using the semiconductor crystal defect testing equipment
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