JP7623865B2 - Hexagonal boron nitride powder and resin composition - Google Patents
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Description
本開示は、六方晶窒化ホウ素粉末、及び樹脂組成物に関する。 This disclosure relates to hexagonal boron nitride powder and a resin composition.
トランジスタ、サイリスタ、CPU等の電子部品においては、使用時に発生する熱を効率良く放熱することが重要な問題となっている。そのため、このような電子部品と共に、高い熱伝導性を有する放熱部材が用いられる。一方、窒化ホウ素粒子は、高熱伝導性及び高絶縁性を有しているため、放熱部材における充填材として幅広く利用されている。 In electronic components such as transistors, thyristors, and CPUs, efficient dissipation of heat generated during use is an important issue. For this reason, heat dissipation components with high thermal conductivity are used together with such electronic components. Meanwhile, boron nitride particles have high thermal conductivity and high insulating properties, and are therefore widely used as a filler in heat dissipation components.
例えば、特許文献1では、樹脂等の絶縁性放熱材の充填材として用いた場合に、上記樹脂等の熱伝導率及び耐電圧(絶縁破壊電圧)を高めることができる六方晶窒化ホウ素粉末及びその製造方法が提案されている。 For example, Patent Document 1 proposes a hexagonal boron nitride powder that, when used as a filler for insulating heat dissipation materials such as resins, can increase the thermal conductivity and withstand voltage (dielectric breakdown voltage) of the resins, and a method for producing the same.
近年、電子部品を搭載したデバイスでは信号の高速伝送化や大容量化が進んでいる。このため、使用時に高温に晒され得る放熱部材にもより優れた絶縁性が求められる。絶縁性を十分に発揮させるため、具体的には誘電率が低く、且つ誘電正接の小さい放熱部材が望ましい。 In recent years, devices equipped with electronic components have become faster in signal transmission and have larger capacity. For this reason, heat dissipation materials that may be exposed to high temperatures during use are also required to have better insulation properties. To fully demonstrate their insulation properties, it is desirable for the heat dissipation materials to have a low dielectric constant and a small dielectric loss tangent.
放熱部材の誘電率及び誘電正接を低下させる方法としては、例えば、使用する樹脂として誘電率及び誘電正接の小さな樹脂を用いることが考えられる。しかし、例えば、低誘電率、低誘電正接の樹脂として知られるフッ素樹脂等は、加工性、熱的特性、機械特性等が当該用途においては不足している。そこで熱的特性の向上の観点から、一般には充填材が使用されているが、充填材の配合量を十分に確保できない、充填材の配合によって樹脂の低誘電正接の特性が十分に発揮されないといった場合が生じ得る。また、充填材の平均粒子径を小さくすることによって充填量を上げることも考えられるが、粒子径のバラつきが大きくなる傾向にあり、凝集が発生し充填性が低下し得る。 One way to reduce the dielectric constant and dielectric tangent of a heat dissipation component is, for example, to use a resin with a small dielectric constant and dielectric tangent. However, for example, fluororesins, which are known to have low dielectric constants and low dielectric tangents, are insufficient in terms of processability, thermal properties, mechanical properties, etc., for this application. Therefore, from the perspective of improving thermal properties, fillers are generally used, but there may be cases where the amount of filler mixed is not sufficient, or the low dielectric tangent properties of the resin are not fully exhibited due to the addition of fillers. Another option is to increase the filling amount by reducing the average particle size of the filler, but this tends to increase the variation in particle size, which can lead to aggregation and reduced filling properties.
本開示は、充填量の調整が容易であり、絶縁性に優れる放熱部材を製造可能な六方晶窒化ホウ素粉末、及び樹脂組成物を提供することを目的とする。 The present disclosure aims to provide a hexagonal boron nitride powder and a resin composition that can be used to manufacture heat dissipation components with excellent insulating properties and that can be easily adjusted in terms of filling amount.
本開示の一側面は、六方晶窒化ホウ素の一次粒子を含み、上記一次粒子の平均粒子径が5~15μmであり、タップ密度(単位:g/cm3)と、上記平均粒子径とが、[タップ密度]≧0.025×[平均粒子径]+0.55 ・・・(1)の関係を満たす、六方晶窒化ホウ素粉末を提供する。 One aspect of the present disclosure provides a hexagonal boron nitride powder comprising primary particles of hexagonal boron nitride, the primary particles having an average particle size of 5 to 15 μm, and a tap density (unit: g/cm 3 ) and the average particle size satisfying the relationship: [tap density]≧0.025×[average particle size]+0.55 (1).
発明者らは鋭意検討することによって、上記六方晶窒化ホウ素粉末のように、式(1)の関係を満たす大きなタップ密度を有する粉末、つまり粒径に対して想定される所定の密度以上に充填が可能な粉末は、粒子の形状及び分布が、充填性及び絶縁性の向上に好適なものとなっていることを見出した。すなわち、上記六方晶窒化ホウ素粉末は充填量の調整が容易であり、当該六方晶窒化ホウ素粉末は絶縁性に優れる放熱部材を製造する材料として好適である。 The inventors have found through extensive research that powders with a large tap density that satisfies the relationship of formula (1), such as the above-mentioned hexagonal boron nitride powder, i.e., powders that can be packed to a density equal to or greater than the predetermined density expected for the particle size, have particle shapes and distributions that are suitable for improving packing and insulating properties. In other words, the above-mentioned hexagonal boron nitride powder allows easy adjustment of the packing amount, and is suitable as a material for manufacturing heat dissipation components with excellent insulating properties.
上記一次粒子の平均厚みが0.7~1.5μmであってよい。 The average thickness of the primary particles may be 0.7 to 1.5 μm.
上記六方晶窒化ホウ素粉末は、200℃に加熱した際の単位質量当たりの水分量が150ppm未満であってよい。 The hexagonal boron nitride powder may have a moisture content of less than 150 ppm per unit mass when heated to 200°C.
上記六方晶窒化ホウ素粉末は、比表面積が2.5m2/g未満であってよい。 The hexagonal boron nitride powder may have a specific surface area of less than 2.5 m 2 /g.
本開示の一側面は、樹脂と、上述の六方晶窒化ホウ素粉末と、を含有する、樹脂組成物を提供する。 One aspect of the present disclosure provides a resin composition containing a resin and the above-mentioned hexagonal boron nitride powder.
上記樹脂組成物は、上述の六方晶窒化ホウ素粉末を含有することから、絶縁性に優れる放熱部材の製造に好適である。 The above resin composition contains the above-mentioned hexagonal boron nitride powder, making it suitable for producing heat dissipation components with excellent insulating properties.
本開示によれば、充填量の調整が容易であり、絶縁性に優れる放熱部材を製造可能な六方晶窒化ホウ素粉末、及び樹脂組成物を提供できる。 The present disclosure provides a hexagonal boron nitride powder and a resin composition that can be used to manufacture heat dissipation components with excellent insulating properties and that can easily adjust the filling amount.
以下、本開示の実施形態について説明する。ただし、以下の実施形態は、本開示を説明するための例示であり、本開示を以下の内容に限定する趣旨ではない。 Embodiments of the present disclosure are described below. However, the following embodiments are merely examples for explaining the present disclosure, and are not intended to limit the present disclosure to the following contents.
本明細書において例示する材料は特に断らない限り、1種を単独で又は2種以上を組み合わせて用いることができる。組成物中の各成分の含有量は、組成物中の各成分に該当する物質が複数存在する場合には、特に断らない限り、組成物中に存在する当該複数の物質の合計量を意味する。 Unless otherwise specified, the materials exemplified in this specification may be used alone or in combination of two or more. When multiple substances corresponding to each component are present in the composition, the content of each component in the composition means the total amount of the multiple substances present in the composition, unless otherwise specified.
六方晶窒化ホウ素粉末の一実施形態は、六方晶窒化ホウ素の一次粒子を含み、上記一次粒子の平均粒子径が5~15μmである。そして、六方晶窒化ホウ素粉末のタップ密度と、上記平均粒子径とが、下記式(1)の関係を満たす。下記式(1)は、[タップ密度]がg/cm3単位で測定される数値を意味し、[平均粒子径]がμm単位で測定される数値を意味し、数値のみに着目して比較する式である。当該六方晶窒化ホウ素粉末は一次粒子の平均粒子径に対して、同程度の平均粒子径を有する従来の六方晶窒化ホウ素粉末と比較して大きなタップ密度を有する。
[タップ密度]≧0.025×[平均粒子径]+0.55 ・・・(1)
One embodiment of the hexagonal boron nitride powder contains primary particles of hexagonal boron nitride, and the primary particles have an average particle size of 5 to 15 μm. The tap density of the hexagonal boron nitride powder and the average particle size satisfy the relationship of the following formula (1). In the following formula (1), [tap density] means a numerical value measured in g/ cm3 , and [average particle size] means a numerical value measured in μm, and the formula focuses on the numerical values for comparison. The hexagonal boron nitride powder has a larger tap density relative to the average particle size of the primary particles than a conventional hexagonal boron nitride powder having a similar average particle size.
[Tap density] ≧ 0.025 × [average particle size] + 0.55 ... (1)
上記六方晶窒化ホウ素粉末において、一次粒子の平均粒子径の下限値は、例えば、6.5μm以上、7.0μm以上、7.5μm以上、8.0μm以上、又は8.5μm以上であってよい。平均粒子径の下限値が上記範囲内であると、樹脂への充填性と得られる放熱部材の絶縁性とをより高水準で両立し得る。上記一次粒子の平均粒子径の上限値は、例えば、14.5μm以下、又は14.0μm以下であってよい。平均粒子径の上限値が上記範囲内であると、樹脂組成物の成形性やその表面の均一性を良好な状態にできる。例えば、樹脂中に六方晶窒化ホウ素粉末を分散させシート状に成形して用いる場合には、シートの厚みに合わせて上記一次粒子の平均粒子径を選択してよい。 In the above hexagonal boron nitride powder, the lower limit of the average particle diameter of the primary particles may be, for example, 6.5 μm or more, 7.0 μm or more, 7.5 μm or more, 8.0 μm or more, or 8.5 μm or more. When the lower limit of the average particle diameter is within the above range, the filling property into the resin and the insulating property of the obtained heat dissipation member can be compatible at a higher level. The upper limit of the average particle diameter of the primary particles may be, for example, 14.5 μm or less, or 14.0 μm or less. When the upper limit of the average particle diameter is within the above range, the moldability of the resin composition and the uniformity of its surface can be made good. For example, when the hexagonal boron nitride powder is dispersed in a resin and molded into a sheet for use, the average particle diameter of the primary particles may be selected according to the thickness of the sheet.
本明細書における平均粒子径は、六方晶窒化ホウ素粉末に対するホモジナイザー処理を行ったサンプルを対象として測定して得られる値であり、凝集粒子を含まない平均粒子径である。本明細書における平均粒子径はまた、累積粒度分布の累積値が50%となる粒子径(メジアン径、d50)である。本明細書における平均粒子径は、ISO 13320:2009の記載に準拠し、レーザー回折散乱法粒度分布測定装置を用いて測定する。具体的には、本明細書の実施例に記載の方法で測定する。レーザー回折散乱法粒度分布測定装置としては、例えば、ベックマンコールター社製の「LS-13 320」(装置名)等を使用できる。 The average particle size in this specification is a value obtained by measuring a sample of hexagonal boron nitride powder that has been subjected to homogenization, and is an average particle size that does not include aggregated particles. The average particle size in this specification is also the particle size (median size, d50) at which the cumulative value of the cumulative particle size distribution is 50%. The average particle size in this specification is measured using a laser diffraction scattering particle size distribution measuring device in accordance with the description of ISO 13320:2009. Specifically, it is measured by the method described in the examples of this specification. As a laser diffraction scattering particle size distribution measuring device, for example, the "LS-13 320" (device name) manufactured by Beckman Coulter, Inc. can be used.
上述の六方晶窒化ホウ素粉末はタップ密度が比較的大きいが、これは一次粒子の平均粒径のバラつきが抑制されていることによると推察される。六方晶窒化ホウ素粉末のタップ密度は上記式(1)の関係を満たせばよいが、タップ密度の下限値は、例えば、0.70g/cm3以上、0.75g/cm3以上、又は0.80g/cm3以上であってよい。タップ密度の下限値が上記範囲内であることで、樹脂への充填性をより向上させることができる。六方晶窒化ホウ素粉末のタップ密度の上限値は、特に制限されるものではないが、窒化ホウ素の理論密度(2.26g/cm3)から考えて、例えば、1.5g/cm3程度の値であってよく、1.3g/cm3以下、又は1.0g/cm3以下であってよい。 The above-mentioned hexagonal boron nitride powder has a relatively large tap density, which is presumably due to the suppression of variation in the average particle size of the primary particles. The tap density of the hexagonal boron nitride powder only needs to satisfy the relationship of the above formula (1), and the lower limit of the tap density may be, for example, 0.70 g/cm 3 or more, 0.75 g/cm 3 or more, or 0.80 g/cm 3 or more. By having the lower limit of the tap density within the above range, the filling property into the resin can be further improved. The upper limit of the tap density of the hexagonal boron nitride powder is not particularly limited, but may be, for example, about 1.5 g/cm 3 , 1.3 g/cm 3 or less, or 1.0 g/cm 3 or less, in consideration of the theoretical density of boron nitride (2.26 g/cm 3 ).
本明細書における「タップ密度」は、JIS R 1628:1997「ファインセラミックス粉末の嵩密度測定方法」に記載の方法に準拠して求められる値を意味し、具体的には、実施例に記載の方法で決定される。 In this specification, "tap density" refers to a value determined in accordance with the method described in JIS R 1628:1997 "Method for measuring bulk density of fine ceramic powders," and is specifically determined by the method described in the examples.
六方晶窒化ホウ素の一次粒子は厚みの大きなものであってよい。一次粒子の平均厚みの下限値は、例えば、0.7μm以上、0.8μm以上、0.9μm以上、又は1.0μm以上であってよい。一次粒子の平均厚みの下限値が上記範囲内であることで、六方晶窒化ホウ素粉末の樹脂等への充填性をより向上させることができる。一次粒子の平均厚みの上限値は、例えば、2.0μm以下、1.5μm以下、又は1.3μm以下であってよい。一次粒子の平均厚みの上限値が上記範囲内である場合、平均粒径が20μm以上になる可能性がある。一次粒子の平均厚みは上記範囲内で調整してよく、例えば、0.7~1.5μm、0.9~1.4μm、又は1.0~1.3μmであってよい。 The primary particles of hexagonal boron nitride may be thick. The lower limit of the average thickness of the primary particles may be, for example, 0.7 μm or more, 0.8 μm or more, 0.9 μm or more, or 1.0 μm or more. When the lower limit of the average thickness of the primary particles is within the above range, the filling property of the hexagonal boron nitride powder into resins and the like can be further improved. The upper limit of the average thickness of the primary particles may be, for example, 2.0 μm or less, 1.5 μm or less, or 1.3 μm or less. When the upper limit of the average thickness of the primary particles is within the above range, the average particle size may be 20 μm or more. The average thickness of the primary particles may be adjusted within the above range, and may be, for example, 0.7 to 1.5 μm, 0.9 to 1.4 μm, or 1.0 to 1.3 μm.
六方晶窒化ホウ素粉末はその表面に水分を吸着し得る。水分を吸着した六方晶窒化ホウ素粉末に対して周期的な電場を印加した際に、電気エネルギーの一部が熱エネルギーとして消費されることを促進し得ることから、誘電正接が上昇する傾向にある。六方晶窒化ホウ素粉末は誘電正接をより低下させる観点から、好ましくは水分量が低いものであってよい。 Hexagonal boron nitride powder can adsorb moisture on its surface. When a periodic electric field is applied to hexagonal boron nitride powder that has adsorbed moisture, this can promote the consumption of part of the electrical energy as thermal energy, which tends to increase the dielectric tangent. From the viewpoint of further reducing the dielectric tangent, the hexagonal boron nitride powder may preferably have a low moisture content.
六方晶窒化ホウ素粉末の表面における水分は200℃まで加熱することによって脱離し得る。上記六方晶窒化ホウ素粉末は、200℃に加熱した際の単位質量当たりの水分量が、例えば、150ppm未満、148ppm以下、又は145ppm以下であってよい。 Moisture on the surface of the hexagonal boron nitride powder can be desorbed by heating to 200°C. The moisture content per unit mass of the hexagonal boron nitride powder when heated to 200°C may be, for example, less than 150 ppm, 148 ppm or less, or 145 ppm or less.
本明細書における水分量とは、JIS K 0068:2001「化学製品の水分測定方法」の記載に準拠してカールフィッシャー法に基づいて測定される値を意味する。具体的には、まず、空焼きされたアルミナボードに上記測定サンプルを所定量だけ採取し、これを25℃に恒温調整された炉内に静置し、キャリアガスとして窒素ガスを用い測定温度(200℃)まで加熱した際に発生する水分を電量滴定法によって測定し、得られた結果を単位質量(1g)あたりに換算することによって、水分量を決定することができる。測定装置としては、例えば、三菱化学製の「微量水分測定装置CA-06」(製品名)等を使用できる。滴定溶液としては、例えば、陰極液として三菱化学製の「アクアミクロンAX」(商品名)等を用い、陽極液として三菱化学製の「アクアミクロンCXU」(商品名)等を用いることができる。 The moisture content in this specification means a value measured based on the Karl Fischer method in accordance with the description of JIS K 0068:2001 "Method for measuring moisture content in chemical products". Specifically, a predetermined amount of the measurement sample is first collected on an air-baked alumina board, and the sample is placed in a furnace thermostatically controlled at 25°C. Nitrogen gas is used as a carrier gas to heat the sample to the measurement temperature (200°C). The moisture content is determined by measuring the moisture content by coulometric titration and converting the result to a value per unit mass (1g). As a measuring device, for example, Mitsubishi Chemical's "Trace Moisture Measuring Device CA-06" (product name) can be used. As a titration solution, for example, Mitsubishi Chemical's "Aquamicron AX" (product name) can be used as the catholyte, and Mitsubishi Chemical's "Aquamicron CXU" (product name) can be used as the anolyte.
六方晶窒化ホウ素粉末の比表面積の上限値は、例えば、2.5m2/g未満、2.2m2/g以下、2.0m2/g以下、1.8m2/g以下、又は1.6m2/g以下であってよい。比表面積の上限値が上記範囲内であると、水分等の吸着を抑制し、誘電正接をより低下させ得る。六方晶窒化ホウ素粉末の比表面積の下限値は、例えば、0.5m2/g以上、0.8m2/g以上、1.0m2/g以上、1.2m2/g以上、又は1.4m2/g以上であってよい。なお、現実的に合成し得る六方晶窒化ホウ素粉末の比表面積は0.4m2/g以上である。六方晶窒化ホウ素粉末の比表面積は上述の範囲内で調整でき、例えば、0.3~2.5m2/g、又は1.0~2.2m2/gであってよい。 The upper limit of the specific surface area of the hexagonal boron nitride powder may be, for example, less than 2.5 m 2 /g, 2.2 m 2 /g or less, 2.0 m 2 /g or less, 1.8 m 2 /g or less, or 1.6 m 2 /g or less. When the upper limit of the specific surface area is within the above range, adsorption of moisture and the like can be suppressed, and the dielectric tangent can be further reduced. The lower limit of the specific surface area of the hexagonal boron nitride powder may be, for example, 0.5 m 2 /g or more, 0.8 m 2 /g or more, 1.0 m 2 /g or more, 1.2 m 2 /g or more, or 1.4 m 2 /g or more. The specific surface area of the hexagonal boron nitride powder that can be practically synthesized is 0.4 m 2 /g or more. The specific surface area of the hexagonal boron nitride powder can be adjusted within the above range and may be, for example, 0.3 to 2.5 m 2 /g, or 1.0 to 2.2 m 2 /g.
本明細書における比表面積は、JIS Z 8830:2013「ガス吸着による粉体(固体)の比表面積測定方法」の記載に準拠し、比表面積測定装置を用い測定される値を意味し、窒素ガスを使用したBET一点法を適用して算出される値である。より具体的には、実施例に記載の方法で測定する。 The specific surface area in this specification refers to a value measured using a specific surface area measuring device in accordance with the description in JIS Z 8830:2013 "Method for measuring the specific surface area of powders (solids) by gas adsorption," and is a value calculated by applying the BET single-point method using nitrogen gas. More specifically, it is measured by the method described in the Examples.
六方晶窒化ホウ素粉末は配向性に優れるものであることが望ましい。六方晶窒化ホウ素粉末の配向性指数の下限値は、例えば、20以上、30以上、又は35以上であってよい。六方晶窒化ホウ素粉末の配向性指数の上限値は、例えば、200以下、150以下、又は100以下であってよい。 It is desirable that the hexagonal boron nitride powder has excellent orientation. The lower limit of the orientation index of the hexagonal boron nitride powder may be, for example, 20 or more, 30 or more, or 35 or more. The upper limit of the orientation index of the hexagonal boron nitride powder may be, for example, 200 or less, 150 or less, or 100 or less.
本明細書における配向性指数は、以下の方法に沿って測定される値を意味する。六方晶窒化ホウ素粉末に対するX線回折測定を行うことによって、六方晶窒化ホウ素粉末のX線回折スペクトルから、(002)面及び(100)面に対応するピーク強度I(002)及びI(100)を取得する。得られたピーク強度を用いて、六方晶窒化ホウ素粉末の配向性指数[I(002)/I(100)]を算出する。より具体的には、実施例に記載の方法で測定を行う。X線回折装置としては、例えば、株式会社リガク製の「ULTIMA-IV」(商品名)等を用いることができる。 The orientation index in this specification means a value measured according to the following method. By performing X-ray diffraction measurement on hexagonal boron nitride powder, peak intensities I(002) and I(100) corresponding to the (002) and (100) planes are obtained from the X-ray diffraction spectrum of the hexagonal boron nitride powder. The obtained peak intensities are used to calculate the orientation index [I(002)/I(100)] of the hexagonal boron nitride powder. More specifically, the measurement is performed according to the method described in the Examples. As an X-ray diffraction device, for example, "ULTIMA-IV" (product name) manufactured by Rigaku Corporation can be used.
上述の六方晶窒化ホウ素粉末は、例えば、以下のような方法で製造することができる。六方晶窒化ホウ素粉末の製造方法の一実施形態は、いわゆる炭素還元法を応用した製造方法であり、ホウ酸を含むホウ素含有化合物と、炭素含有化合物とを含む混合粉末を、窒素加圧雰囲気下で焼成して、窒化ホウ素を含む焼成物を得る工程(以下、低温焼成工程ともいう)と、上記工程よりも高く、2050℃未満の温度で上記焼成物を加熱処理し、六方晶窒化ホウ素(hBN)の一次粒子を生成する工程(以下、焼成工程ともいう)と、を有する。 The above-mentioned hexagonal boron nitride powder can be manufactured, for example, by the following method. One embodiment of the manufacturing method of hexagonal boron nitride powder is a manufacturing method that applies the so-called carbon reduction method, and includes a process of sintering a mixed powder containing a boron-containing compound containing boric acid and a carbon-containing compound under a nitrogen pressure atmosphere to obtain a sintered product containing boron nitride (hereinafter also referred to as a low-temperature sintering process), and a process of heat-treating the sintered product at a temperature higher than the above process and less than 2050°C to generate primary particles of hexagonal boron nitride (hBN) (hereinafter also referred to as a sintering process).
ホウ素含有化合物は構成元素としてホウ素を有する化合物である。ホウ素含有化合物としては、純度が高く比較的安価な原料を用いることができる。このようなホウ素含有化合物としては、ホウ酸の他、例えば、酸化ホウ素などが挙げられる。ホウ素含有化合物はホウ酸を含むが、ホウ酸は加熱によって脱水し酸化ホウ素となり、原料粉末の加熱処理中に液相を形成すると共に粒成長を促す助剤としても働くことができる。 A boron-containing compound is a compound that has boron as a constituent element. A raw material with high purity and relatively low cost can be used as the boron-containing compound. In addition to boric acid, examples of such boron-containing compounds include boron oxide. A boron-containing compound contains boric acid, which is dehydrated by heating to become boron oxide, which forms a liquid phase during the heat treatment of the raw material powder and can also act as an auxiliary agent to promote grain growth.
炭素含有化合物は構成元素として炭素原子を有する化合物である。炭素含有化合物としては、純度が高く比較的安価な原料を用いることができる。このような炭素含有化合物としては、例えば、カーボンブラック及びアセチレンブラック等が挙げられる。使用するカーボンブラックの比表面積は、250m2/g未満、又は200m2/g未満であることが好ましい。カーボンブラックの比表面積が上記範囲内であることによって、窒化ホウ素の一次粒子の成長をより促進することができ比表面積の小さな六方晶窒化ホウ素粉末の調製がより容易となる。 The carbon-containing compound is a compound having carbon atoms as a constituent element. As the carbon-containing compound, a raw material having high purity and relatively low cost can be used. Examples of such carbon-containing compounds include carbon black and acetylene black. The specific surface area of the carbon black used is preferably less than 250 m 2 /g or less than 200 m 2 /g. By having the specific surface area of the carbon black within the above range, the growth of the primary particles of boron nitride can be further promoted, and the preparation of a hexagonal boron nitride powder having a small specific surface area becomes easier.
混合粉末において、ホウ素含有化合物を炭素含有化合物に対して過剰量となるように配合してよい。混合粉末は、炭素含有化合物及びホウ素含有化合物に加えて、その他の化合物を含有してもよい。その他の化合物としては、例えば、核剤としての窒化ホウ素等が挙げられる。混合粉末が核剤としての窒化ホウ素を含有することで、合成される六方晶窒化ホウ素粉末の平均粒径をより容易に制御することができる。混合粉末は、好ましくは核剤を含む。混合粉末が核剤を含む場合、比表面積の小さな六方晶窒化ホウ素粉末(例えば、比表面積が2.5m2/g以下である六方晶窒化ホウ素粉末)の調製がより容易となる。 In the mixed powder, the boron-containing compound may be blended in an excess amount relative to the carbon-containing compound. The mixed powder may contain other compounds in addition to the carbon-containing compound and the boron-containing compound. Examples of other compounds include boron nitride as a nucleating agent. When the mixed powder contains boron nitride as a nucleating agent, the average particle size of the synthesized hexagonal boron nitride powder can be more easily controlled. The mixed powder preferably contains a nucleating agent. When the mixed powder contains a nucleating agent, it becomes easier to prepare a hexagonal boron nitride powder with a small specific surface area (for example, a hexagonal boron nitride powder with a specific surface area of 2.5 m 2 /g or less).
低温焼成工程は加圧下で行われる。低温焼成工程における圧力は、例えば、0.25MPa以上5.0MPa未満、0.25~3.0MPa、0.25~2.0MPa、0.25~1.0MPa、0.25MPa以上1.0MPa未満、0.30~2.0MPa、又は0.50~2.0MPaであってよい。低温焼成工程における圧力を高くすることで、ホウ素含有化合物等の原料の揮発をより抑制し、副生成物である炭化ホウ素の生成を抑制することができる。また低温焼成工程における圧力を高くすることで、窒化ホウ素粉末の比表面積の増加を抑制することができる。低温焼成工程の圧力の上限値を上記範囲内とすることで、窒化ホウ素の一次粒子の成長をより促進することができる。 The low-temperature firing process is carried out under pressure. The pressure in the low-temperature firing process may be, for example, 0.25 MPa or more and less than 5.0 MPa, 0.25 to 3.0 MPa, 0.25 to 2.0 MPa, 0.25 to 1.0 MPa, 0.25 MPa or more and less than 1.0 MPa, 0.30 to 2.0 MPa, or 0.50 to 2.0 MPa. By increasing the pressure in the low-temperature firing process, the volatilization of raw materials such as boron-containing compounds can be further suppressed, and the generation of boron carbide, which is a by-product, can be suppressed. In addition, by increasing the pressure in the low-temperature firing process, the increase in the specific surface area of the boron nitride powder can be suppressed. By setting the upper limit of the pressure in the low-temperature firing process within the above range, the growth of primary particles of boron nitride can be further promoted.
低温焼成工程における加熱温度は、例えば、1650℃以上1800℃未満、1650~1750℃、又は1650~1700℃であってよい。低温焼成工程における加熱温度の下限値を上記範囲内とすることで、反応を促進させ、得られる窒化ホウ素の収量を向上させることができる。低温焼成工程における加熱温度の上限値を上記範囲内とすることで、副生成物の生成を十分に抑制することができる。 The heating temperature in the low-temperature firing process may be, for example, 1650°C or higher and lower than 1800°C, 1650 to 1750°C, or 1650 to 1700°C. By setting the lower limit of the heating temperature in the low-temperature firing process within the above range, the reaction can be promoted and the yield of boron nitride obtained can be improved. By setting the upper limit of the heating temperature in the low-temperature firing process within the above range, the generation of by-products can be sufficiently suppressed.
低温焼成工程における加熱時間は、例えば、1~10時間、1~5時間、又は2~4時間であってよい。窒化ホウ素を合成する反応の序盤である工程において、比較的低温で所定時間の間、維持することで、反応系をより均質化することができ、ひいては形成される窒化ホウ素をより均質化できる。なお、本明細書において加熱時間とは、加熱対象物の周囲環境の温度が所定の温度に到達してから当該温度で維持する時間(保持時間)を意味する。 The heating time in the low-temperature firing step may be, for example, 1 to 10 hours, 1 to 5 hours, or 2 to 4 hours. In the early stages of the reaction to synthesize boron nitride, maintaining a relatively low temperature for a specified time can make the reaction system more homogenous, and thus the boron nitride formed can be made more homogenous. In this specification, the heating time refers to the time (retention time) during which the temperature of the environment surrounding the object to be heated is maintained at a specified temperature after it has reached that temperature.
焼成工程は、低温焼成工程で得られた焼成物を、低温焼成工程よりも高い温度で加熱処理して六方晶窒化ホウ素(hBN)の一次粒子を生成し、上記一次粒子が凝集して構成される凝集粒子を含む粉末を得る工程である。 The sintering process is a process in which the sintered product obtained in the low-temperature sintering process is heated at a temperature higher than that in the low-temperature sintering process to generate primary particles of hexagonal boron nitride (hBN), and a powder containing agglomerated particles formed by the aggregation of the primary particles is obtained.
焼成工程における加熱温度は、低温焼成工程よりも高く、2050℃未満の温度である。焼成工程における加熱温度を蒸気範囲内とすることで黒鉛化指数をより高め、結晶性に優れる六方晶窒化ホウ素を得ることができる。焼成工程の加熱温度は、2000℃以下であってよい。焼成工程における加熱時間は、例えば、3~15時間、5~10時間、又は6~9時間であってよい。 The heating temperature in the calcination process is higher than that in the low-temperature calcination process and is less than 2050°C. By setting the heating temperature in the calcination process within the steam range, the graphitization index can be further increased, and hexagonal boron nitride with excellent crystallinity can be obtained. The heating temperature in the calcination process may be 2000°C or less. The heating time in the calcination process may be, for example, 3 to 15 hours, 5 to 10 hours, or 6 to 9 hours.
焼成工程の圧力は、例えば、0.25MPa以上5.0MPa未満、0.25~3.0MPa、0.25~2.0MPa、0.25~1.0MPa、0.25MPa以上1.0MPa未満、0.30~2.0MPa、又は0.50~2.0MPaであってよい。焼成工程における圧力を高くすることで、得られる原料粉末の純度をより向上させることができる。焼成工程における圧力の上限値を上記範囲内とすることで、原料粉末の調製コストをより低減することができ、工業的に優位である。 The pressure in the firing process may be, for example, 0.25 MPa or more and less than 5.0 MPa, 0.25 to 3.0 MPa, 0.25 to 2.0 MPa, 0.25 to 1.0 MPa, 0.25 MPa or more and less than 1.0 MPa, 0.30 to 2.0 MPa, or 0.50 to 2.0 MPa. By increasing the pressure in the firing process, the purity of the obtained raw material powder can be further improved. By setting the upper limit of the pressure in the firing process within the above range, the cost of preparing the raw material powder can be further reduced, which is industrially advantageous.
以上の工程によって、六方晶窒化ホウ素粉末を得ることができる。低温焼成工程又は焼成工程の後に、粉砕工程を行ってもよい。粉砕工程においては、一般的な粉砕機又は解砕機を用いることができる。 By the above steps, hexagonal boron nitride powder can be obtained. A pulverization step may be carried out after the low-temperature firing step or the firing step. A general pulverizer or crusher may be used in the pulverization step.
本開示に係る六方晶窒化ホウ素粉末は充填性に優れ、誘電正接も低いことから、高周波電圧が印加されるような用途にも使用可能である。本開示に係る六方晶窒化ホウ素粉末は、例えば、高周波回路を構成する電子部品に使用される樹脂組成物への充填材として好適である。樹脂組成物の一実施形態は、樹脂と、上述の六方晶窒化ホウ素粉末とを含有する。 The hexagonal boron nitride powder according to the present disclosure has excellent filling properties and a low dielectric tangent, and can therefore be used in applications where high-frequency voltage is applied. The hexagonal boron nitride powder according to the present disclosure is suitable, for example, as a filler for resin compositions used in electronic components that constitute high-frequency circuits. One embodiment of the resin composition contains a resin and the above-mentioned hexagonal boron nitride powder.
六方晶窒化ホウ素粉末の含有量の下限値は、樹脂組成物の全体積を基準として、例えば、30体積%以上、40体積%以上、50体積%以上であってよい。六方晶窒化ホウ素粉末の含有量の下限値が上記範囲内であることで、樹脂組成物の熱伝導率を向上させ、優れた放熱性能が得られ得る。六方晶窒化ホウ素粉末の含有量の上限値は、樹脂組成物の全体積を基準として、例えば、85体積%以下、80体積%以下、又は70体積%以下であってよい。六方晶窒化ホウ素粉末の含有量の上限値が上記範囲内であることで、樹脂組成物の成形時に内部に空隙が発生することをより抑制することができ、また絶縁性及び機械強度の低下を抑制することができる。 The lower limit of the content of the hexagonal boron nitride powder may be, for example, 30% by volume or more, 40% by volume or more, or 50% by volume or more, based on the total volume of the resin composition. When the lower limit of the content of the hexagonal boron nitride powder is within the above range, the thermal conductivity of the resin composition can be improved and excellent heat dissipation performance can be obtained. The upper limit of the content of the hexagonal boron nitride powder may be, for example, 85% by volume or less, 80% by volume or less, or 70% by volume or less, based on the total volume of the resin composition. When the upper limit of the content of the hexagonal boron nitride powder is within the above range, it is possible to further suppress the generation of voids inside the resin composition during molding, and also to suppress a decrease in insulation and mechanical strength.
樹脂は、例えば、液晶ポリマー、フッ素樹脂、シリコーン樹脂、シリコーンゴム、アクリル樹脂、ポリオレフィン(ポリエチレン等)、エポキシ樹脂、フェノール樹脂、メラミン樹脂、ユリア樹脂、不飽和ポリエステル、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリフェニレンエーテル、ポリフェニレンスルフィド、全芳香族ポリエステル、ポリスルホン、ポリエーテルスルホン、ポリカーボネート、マレイミド変性樹脂、ABS(アクリロニトリル-ブタジエン-スチレン)樹脂、AAS(アクリロニトリル-アクリルゴム・スチレン)樹脂、及びAES(アクリロニトリル・エチレン・プロピレン・ジエンゴム-スチレン)樹脂が挙げられる。 Examples of resins include liquid crystal polymers, fluororesins, silicone resins, silicone rubber, acrylic resins, polyolefins (polyethylene, etc.), epoxy resins, phenolic resins, melamine resins, urea resins, unsaturated polyesters, polyimides, polyamideimides, polyetherimides, polybutylene terephthalate, polyethylene terephthalate, polyphenylene ether, polyphenylene sulfide, wholly aromatic polyesters, polysulfones, polyethersulfones, polycarbonates, maleimide-modified resins, ABS (acrylonitrile-butadiene-styrene) resins, AAS (acrylonitrile-acrylic rubber-styrene) resins, and AES (acrylonitrile-ethylene-propylene-diene rubber-styrene) resins.
樹脂の含有量は、樹脂組成物の全体積を基準として、15体積%以上、20体積%以上、又は30体積%以上であってよく、70体積%以下、60体積%以下、又は50体積%以下であってよい。 The resin content may be 15% by volume or more, 20% by volume or more, or 30% by volume or more, and may be 70% by volume or less, 60% by volume or less, or 50% by volume or less, based on the total volume of the resin composition.
樹脂組成物は、樹脂を硬化させる硬化剤を更に含有していてよい。硬化剤は、樹脂の種類によって適宜選択してよい。例えば、樹脂がエポキシ樹脂である場合、硬化剤としては、例えば、フェノールノボラック化合物、酸無水物、アミノ化合物、及びイミダゾール化合物等が挙げられる。硬化剤の含有量は、樹脂100質量部に対して、例えば、0.5質量部以上又は1.0質量部以上であってよく、15質量部以下又は10質量部以下であってよい。 The resin composition may further contain a curing agent that cures the resin. The curing agent may be appropriately selected depending on the type of resin. For example, when the resin is an epoxy resin, examples of the curing agent include phenol novolac compounds, acid anhydrides, amino compounds, and imidazole compounds. The content of the curing agent may be, for example, 0.5 parts by mass or more or 1.0 parts by mass or more, and 15 parts by mass or less or 10 parts by mass or less, relative to 100 parts by mass of the resin.
以上、幾つかの実施形態について説明したが、本開示は上記実施形態に何ら限定されるものではない。また、上述した実施形態についての説明内容は、互いに適用することができる。 Although several embodiments have been described above, the present disclosure is in no way limited to the above-mentioned embodiments. Furthermore, the contents of the descriptions of the above-mentioned embodiments can be mutually applied.
以下、本開示について、実施例及び比較例を用いてより詳細に説明する。なお、本開示は以下の実施例に限定されるものではない。 The present disclosure will be described in more detail below using examples and comparative examples. Note that the present disclosure is not limited to the following examples.
(実施例1)
[六方晶窒化ホウ素粉末の調製]
ホウ酸(株式会社高純度化学研究所製)100質量部と、アセチレンブラック(デンカ株式会社製、グレード名:FX-35、比表面積:130m2/g)22質量部と、炭酸ナトリウム(純度99.5質量%以上)1質量部とをヘンシェルミキサーを用いて混合して混合粉末(原料粉末)を得た。得られた混合粉末を250℃の乾燥機に入れ、3時間保持することでホウ酸の脱水を行った。脱水後の混合粉末をプレス成型機の直径100Φの型に入れ、加熱温度:200℃及びプレス圧:30MPaの条件にて成型を行った。このようにして得られた原料粉末のペレットを以降の加熱処理に供した。
Example 1
[Preparation of hexagonal boron nitride powder]
100 parts by mass of boric acid (manufactured by Kojundo Chemical Laboratory Co., Ltd.), 22 parts by mass of acetylene black (manufactured by Denka Co., Ltd., grade name: FX-35, specific surface area: 130 m 2 /g), and 1 part by mass of sodium carbonate (purity 99.5% by mass or more) were mixed using a Henschel mixer to obtain a mixed powder (raw material powder). The obtained mixed powder was placed in a dryer at 250°C and held for 3 hours to dehydrate the boric acid. The dehydrated mixed powder was placed in a mold with a diameter of 100Φ in a press molding machine and molded under the conditions of a heating temperature of 200°C and a pressing pressure of 30 MPa. The pellets of the raw material powder obtained in this manner were subjected to the subsequent heat treatment.
まず、上記ペレットをカーボン雰囲気炉内に静置し、0.65MPaに加圧された窒素雰囲気において昇温速度:5℃/分で1750℃まで昇温し、1750℃にて3時間保持して上記ペレットの加熱処理を行い、第一の加熱処理物を得た(第一工程)。次に、カーボン雰囲気炉内を昇温速度:2℃/分で1800℃まで更に昇温し、1800℃にて3時間保持して第一の加熱処理物を加熱処理し、第二の加熱処理物を得た(第二工程)。その後、カーボン雰囲気炉内を昇温速度:2℃/分で2050℃まで更に昇温し、2050℃にて7時間保持して第二の加熱処理物を高温で焼成した(第三工程)。焼成後の緩く凝集した窒化ホウ素をヘンシェルミキサーで解砕し、真空乾燥機を用いて解砕後の粉末を250℃で5時間乾燥した後、目開き:63μmの篩を通し、篩を通過した粉末を得た。このようにして、六方晶窒化ホウ素粉末を調製した。 First, the pellets were placed in a carbon atmosphere furnace, heated to 1750°C at a heating rate of 5°C/min in a nitrogen atmosphere pressurized to 0.65 MPa, and held at 1750°C for 3 hours to heat-treat the pellets, obtaining a first heat-treated product (first step). Next, the temperature in the carbon atmosphere furnace was further raised to 1800°C at a heating rate of 2°C/min, and held at 1800°C for 3 hours to heat-treat the first heat-treated product, obtaining a second heat-treated product (second step). After that, the temperature in the carbon atmosphere furnace was further raised to 2050°C at a heating rate of 2°C/min, and held at 2050°C for 7 hours to sinter the second heat-treated product at a high temperature (third step). The loosely aggregated boron nitride after sintering was crushed with a Henschel mixer, and the crushed powder was dried at 250°C for 5 hours using a vacuum dryer, and then passed through a sieve with a mesh size of 63 μm to obtain a powder that passed through the sieve. In this way, hexagonal boron nitride powder was prepared.
<六方晶窒化ホウ素粉末の物性測定>
得られた六方晶窒化ホウ素粉末に対して、後述する方法に沿って、一次粒子の平均粒子径、タップ密度、純度、一次粒子の平均厚み、25~200℃まで加熱した際の水分量、、比表面積、及び配向性指数を測定した。結果を表1に示す。
<Measurement of physical properties of hexagonal boron nitride powder>
The obtained hexagonal boron nitride powder was measured for the average particle size of the primary particles, tap density, purity, average thickness of the primary particles, water content when heated to 25 to 200° C., specific surface area, and orientation index according to the methods described below. The results are shown in Table 1.
[一次粒子の平均粒子径]
六方晶窒化ホウ素粉末における一次粒子の平均粒子径は、ISO 13320:2009の記載に準拠し、レーザー回折散乱法粒度分布測定装置(ベックマンコールター社製、装置名「LS-13 320」)を用いて測定した。なお、六方晶窒化ホウ素粉末は測定に際して、超音波ホモジナイザー(日本精機製作所製、商品名「US-300E」)を用い、AMPLITUDE(振幅)80%にて超音波分散を1分30秒間で1回行うことで、六方晶窒化ホウ素粉末の分散液を調製し、これを測定対象とした。粒度分布の測定に際し、六方晶窒化ホウ素粉末を分散させる溶媒には水を用い、分散剤にはヘキサメタリン酸を用いた。この際、水の屈折率として1.33の数値を用い、窒化ホウ素粉末の屈折率として1.80の数値を用いた。
[Average particle size of primary particles]
The average particle size of the primary particles in the hexagonal boron nitride powder was measured using a laser diffraction scattering particle size distribution measuring device (manufactured by Beckman Coulter, Inc., device name "LS-13 320") in accordance with the description of ISO 13320:2009. In addition, when measuring the hexagonal boron nitride powder, an ultrasonic homogenizer (manufactured by Nippon Seiki Seisakusho, product name "US-300E") was used, and ultrasonic dispersion was performed once for 1 minute 30 seconds at AMPLITUDE (amplitude) 80%, to prepare a dispersion liquid of the hexagonal boron nitride powder, which was used as the measurement subject. When measuring the particle size distribution, water was used as the solvent for dispersing the hexagonal boron nitride powder, and hexametaphosphoric acid was used as the dispersant. At this time, a value of 1.33 was used as the refractive index of water, and a value of 1.80 was used as the refractive index of the boron nitride powder.
[タップ密度]
六方晶窒化ホウ素粉末とのタップ密度は、JIS R 1628:1997「ファインセラミックス粉末の嵩密度測定方法」に記載の方法に準拠して測定した。具体的には、六方晶窒化ホウ素粉末を100cm3の専用容器に充填し、タッピングタイム180秒、タッピング回数180回、タップリフト18mmの条件でタッピングを行った後のかさ密度を測定し、得られた値をタップ密度とした。測定は、市販の装置(ホソカワミクロン製、パウダテスタ)を用いた。
[Tap density]
The tap density of hexagonal boron nitride powder was measured in accordance with the method described in JIS R 1628:1997 "Method for measuring bulk density of fine ceramic powders". Specifically, the hexagonal boron nitride powder was filled into a 100 cm3 dedicated container, and tapped under the conditions of a tapping time of 180 seconds, tapping number of 180 times, and tap lift of 18 mm, after which the bulk density was measured, and the obtained value was taken as the tap density. For the measurement, a commercially available device (Powder Tester, manufactured by Hosokawa Micron Co., Ltd.) was used.
[純度]
六方晶窒化ホウ素粉末を水酸化ナトリウムでアルカリ分解させ、水蒸気蒸留法によって分解液からアンモニアを蒸留して、ホウ酸水溶液に捕集した。この捕集液を対象として、硫酸規定液で滴定行った。滴定の結果から窒化ホウ素粉末中の窒素原子(N)の含有量を算出した。得られた窒素原子の含有量から、式(2)に基づいて、窒化ホウ素粉末中の六方晶窒化ホウ素(hBN)の含有量を決定し、六方晶窒化ホウ素粉末の純度を算出した。なお、六方晶窒化ホウ素の式量は24.818g/mol、窒素原子の原子量は14.006g/molを用いた。
試料中の六方晶窒化ホウ素(hBN)の含有量[質量%]=窒素原子(N)の含有量[質量%]×1.772・・・(2)
[purity]
Hexagonal boron nitride powder was decomposed with sodium hydroxide, and ammonia was distilled from the decomposition liquid by steam distillation and collected in an aqueous boric acid solution. This collected liquid was titrated with a normal sulfuric acid solution. The content of nitrogen atoms (N) in the boron nitride powder was calculated from the titration results. From the obtained nitrogen atom content, the content of hexagonal boron nitride (hBN) in the boron nitride powder was determined based on formula (2), and the purity of the hexagonal boron nitride powder was calculated. The formula weight of hexagonal boron nitride was 24.818 g/mol, and the atomic weight of the nitrogen atom was 14.006 g/mol.
Content of hexagonal boron nitride (hBN) in sample [mass%] = content of nitrogen atoms (N) [mass%] × 1.772 ... (2)
[一次粒子の平均厚み]
六方晶窒化ホウ素の一次粒子の平均厚みを以下の方法に沿って測定した。プレス成型機(株式会社リガク製、商品名:BRE-32)を用いて、3gの六方晶窒化ホウ素粉末を5MPaの圧力で円盤状(直径:30mmφ)に成型した。樹脂(GATAN社製、商品名:G2エポキシ)を用いて、得られた成型体を包埋した。次に、圧力をかけた方向と並行方向に断面ミリング加工を行うことによって、六方晶窒化ホウ素の一次粒子の断面が露出した試料を調製した。この断面を走査型電子顕微鏡(日本電子株式会社製、商品名:JSM-6010LA)によって撮影した。得られた粒子像を画像解析ソフトウェア(株式会社マウンテック製、商品名:Mac-View)に取り込み、得られた写真から矩形粒子の短辺(粒子厚み、粒子短径に相当)を測定した。測定は、任意に選択した100個の一次粒子に対して行った。これをアスペクト比とした。このようにして、一次粒子の平均厚みを決定した。
[Average thickness of primary particles]
The average thickness of the primary particles of hexagonal boron nitride was measured according to the following method. 3 g of hexagonal boron nitride powder was molded into a disk shape (diameter: 30 mmφ) at a pressure of 5 MPa using a press molding machine (manufactured by Rigaku Corporation, product name: BRE-32). The obtained molded body was embedded using resin (manufactured by GATAN Co., Ltd., product name: G2 Epoxy). Next, a sample in which the cross section of the primary particles of hexagonal boron nitride was exposed was prepared by performing cross-sectional milling in a direction parallel to the direction of pressure application. This cross section was photographed using a scanning electron microscope (manufactured by JEOL Ltd., product name: JSM-6010LA). The obtained particle image was imported into image analysis software (manufactured by Mountec Co., Ltd., product name: Mac-View), and the short side of the rectangular particle (corresponding to the particle thickness and particle short diameter) was measured from the obtained photograph. The measurement was performed on 100 arbitrarily selected primary particles. This was taken as the aspect ratio. In this way, the average thickness of the primary particles was determined.
[水分量]
六方晶窒化ホウ素粉末の25~200℃まで加熱した際の水分量及び201~500℃まで加熱した際の水分量をカールフィッシャー法に基づいて測定した。まず、空焼きされたアルミナボードに上記測定サンプルを所定量だけ採取し、これを25℃に恒温調整された炉内に静置し、25℃から測定温度(200℃又は500℃)まで加熱した際に発生する水分を電量滴定法によって測定し、得られた結果を単位質量(1g)あたりに換算することによって、水分量(単位:ppm)を決定した。
[Moisture content]
The moisture content of the hexagonal boron nitride powder was measured by the Karl Fischer method when it was heated to 25 to 200° C. and when it was heated to 201 to 500° C. First, a predetermined amount of the measurement sample was collected on an air-baked alumina board, and this was placed in a furnace thermostatically controlled at 25° C. The moisture generated when it was heated from 25° C. to the measurement temperature (200° C. or 500° C.) was measured by coulometric titration, and the obtained results were converted per unit mass (1 g) to determine the moisture content (unit: ppm).
[比表面積]
六方晶窒化ホウ素粉末の比表面積は、JIS Z 8830:2013「ガス吸着による粉体(固体)の比表面積測定方法」の記載に準拠し、窒素ガスを使用したBET一点法を適用して算出した。比表面積測定装置としては、ユアサアイオニクス株式会社製の比表面積測定装置(装置名:カンターソーブ)を用いた。なお、測定は、窒化ホウ素粉末を、300℃で、15分間かけて、乾燥脱気した後に行った。
[Specific surface area]
The specific surface area of the hexagonal boron nitride powder was calculated by applying the BET single point method using nitrogen gas in accordance with the description of JIS Z 8830:2013 "Method for measuring the specific surface area of powder (solid) by gas adsorption". A specific surface area measuring device (device name: Cantorsorb) manufactured by Yuasa Ionics Co., Ltd. was used as the specific surface area measuring device. The measurement was performed after drying and degassing the boron nitride powder at 300°C for 15 minutes.
[配向性指数]
六方晶窒化ホウ素粉末の配向性指数を以下の方法に沿って測定した。測定には、X線回折装置(株式会社リガク製、商品名:ULTIMA-IV)を用いた。まず、X線回折装置に付属している深さ0.2mmの凹部を有するガラスセルの凹部に六方晶窒化ホウ素粉末を充填し固めることで測定試料を作製した。測定試料にX線を照射して、ベースライン補正を行った後の、測定資料の(002)面と(100)面とのピーク強度を決定し、この比[I(002)/I(100)]を配向性指数とした。
[Orientation Index]
The orientation index of hexagonal boron nitride powder was measured according to the following method. For the measurement, an X-ray diffractometer (manufactured by Rigaku Corporation, product name: ULTIMA-IV) was used. First, a measurement sample was prepared by filling and solidifying hexagonal boron nitride powder into the recess of a glass cell with a depth of 0.2 mm attached to the X-ray diffractometer. The measurement sample was irradiated with X-rays, and the peak intensities of the (002) and (100) planes of the measurement sample after baseline correction were determined, and the ratio [I(002)/I(100)] was taken as the orientation index.
<六方晶窒化ホウ素粉末の充填性評価>
得られた六方晶窒化ホウ素粉末を充填材として用いた際の充填性評価を行った。具体的には、信越化学製のシリコーンオイルKF96-100に対して、上記六方晶窒化ホウ素粉末が20体積%となるように配合し、シンキー製の泡とり廉太郎RE-310を使用し2000rpmで3分間撹拌しスラリーを調製した。日本シグナルヘグナー社製のレオメーター(製品名:MCR300、円形平板(直径:25mmφ)、ギャップ:1m)を用いて、上記スラリーの粘度を測定し、得られた結果から、下記の基準に基づいて充填性を評価した。結果を表1に示す。
A:せん断速度20rpmの時の粘度が5000mPa・s以下である。
B:せん断速度20rpmの時の粘度が5000mPa・s超10000mPa・s以下である。
C:せん断速度20rpmの時の粘度が10000mPa・s超15000mPa・s以下である。
D:せん断速度20rpmの時の粘度が15000mPa・s超である。
<Evaluation of packing properties of hexagonal boron nitride powder>
The filling property of the obtained hexagonal boron nitride powder was evaluated when it was used as a filler. Specifically, the hexagonal boron nitride powder was mixed with silicone oil KF96-100 manufactured by Shin-Etsu Chemical Co., Ltd. so that the amount was 20% by volume, and a slurry was prepared by stirring for 3 minutes at 2000 rpm using a Thinky Rentaro RE-310 foam remover. The viscosity of the slurry was measured using a rheometer manufactured by Nippon Signal Hegner Co., Ltd. (product name: MCR300, circular flat plate (diameter: 25 mmφ), gap: 1 m), and the filling property was evaluated based on the obtained results based on the following criteria. The results are shown in Table 1.
A: The viscosity at a shear rate of 20 rpm is 5,000 mPa·s or less.
B: The viscosity at a shear rate of 20 rpm is more than 5,000 mPa·s and not more than 10,000 mPa·s.
C: The viscosity at a shear rate of 20 rpm is more than 10,000 mPa·s and not more than 15,000 mPa·s.
D: Viscosity at a shear rate of 20 rpm exceeds 15,000 mPa·s.
<六方晶窒化ホウ素粉末の誘電特性評価>
得られた六方晶窒化ホウ素粉末を充填材として用いた際の誘電正接を測定した。具体的には、空洞共振器法の測定装置(キーコム製測定システム 摂動法 空洞共振器タイプ DPS18)を用いて、温度25℃の条件で測定を行うことによって、六方晶窒化ホウ素粉末の1GHzにおける誘電正接を求めた。結果を表1に示す。
<Evaluation of dielectric properties of hexagonal boron nitride powder>
The dielectric loss tangent of the obtained hexagonal boron nitride powder was measured when it was used as a filler. Specifically, the dielectric loss tangent of the hexagonal boron nitride powder at 1 GHz was obtained by performing the measurement at a temperature of 25° C. using a cavity resonator measuring device (Keycom measurement system, perturbation method, cavity resonator type DPS18). The results are shown in Table 1.
<六方晶窒化ホウ素粉末の絶縁性評価>
得られた窒化ホウ素粉末の樹脂への充填材としての特性の評価として、得られた六方晶窒化ホウ素粉末を充填材として用いた際の絶縁性評価を行った。具体的には、六方晶窒化ホウ素粉末を充填材として用いた場合の誘電率及び誘電正接を測定した。ナフタレン型エポキシ樹脂(DIC株式会社製、商品名:HP4032)100部と硬化剤としてイミダゾール類(四国化成工業株式会社製、商品名:2E4MZ-CN)10部との混合物を100体積%として、六方晶窒化ホウ素粉末が55体積%となるように混合し混合物を調製いた。次に、上記混合物を、目開き:150μmのフィルターに通篩後、PET製シートの上に厚みが0.20mmになるように塗布した後、500Paの減圧脱泡を10分間行った。その後、温度150℃、圧力160kg/cm2の条件で60分間のプレス加熱加圧を行って0.10mmのシートとした。作製したシートの絶縁破壊電圧の測定は、JIS C 6481:1996「プリント配線板用銅張積層板試験方法」の記載に準拠して行った。測定には、菊水電子工業株式会社製の耐圧・絶縁試験機(製品名:TOS 8650)を用い、100サンプル測定を行い、その算術平均値を絶縁破壊電圧とした。結果を表1に示す。
A:絶縁破壊電圧が60kV/mm以上である。
B:絶縁破壊電圧が40kV/mm以上60kV/mm未満である。
C:絶縁破壊電圧が40kV/mm未満である。
<Evaluation of the insulating properties of hexagonal boron nitride powder>
As an evaluation of the properties of the obtained boron nitride powder as a filler for resin, an insulation evaluation was performed when the obtained hexagonal boron nitride powder was used as a filler. Specifically, the dielectric constant and dielectric loss tangent were measured when the hexagonal boron nitride powder was used as a filler. A mixture of 100 parts of naphthalene-type epoxy resin (manufactured by DIC Corporation, product name: HP4032) and 10 parts of imidazoles (manufactured by Shikoku Kasei Kogyo Co., Ltd., product name: 2E4MZ-CN) as a curing agent was taken as 100 volume %, and hexagonal boron nitride powder was mixed to 55 volume % to prepare a mixture. Next, the above mixture was sieved through a filter with an opening of 150 μm, and then applied to a PET sheet to a thickness of 0.20 mm, and degassed under reduced pressure of 500 Pa for 10 minutes. Then, the mixture was pressed and heated for 60 minutes under conditions of a temperature of 150 ° C. and a pressure of 160 kg / cm 2 to form a 0.10 mm sheet. The dielectric breakdown voltage of the prepared sheet was measured in accordance with the description of JIS C 6481:1996 "Test method for copper-clad laminates for printed wiring boards". For the measurement, a withstand voltage and insulation tester (product name: TOS 8650) manufactured by Kikusui Electronics Co., Ltd. was used to measure 100 samples, and the arithmetic average value was taken as the dielectric breakdown voltage. The results are shown in Table 1.
A: The dielectric breakdown voltage is 60 kV/mm or more.
B: The dielectric breakdown voltage is 40 kV/mm or more and less than 60 kV/mm.
C: The dielectric breakdown voltage is less than 40 kV/mm.
(実施例2)
原料であるアセチレンブラックをアセチレンブラック(デンカ株式会社製、グレード名:Li400、比表面積:40m2/g)に変更し、原料に、窒化ホウ素粉末(デンカ株式会社製、デンカボロンナイトライド粉末、グレード名:MGP)を1質量%外割添加し、カーボン雰囲気炉内の圧力を0.85MPaに変更したこと以外は、実施例1と同様にして、六方晶窒化ホウ素粉末を調製した。
Example 2
Hexagonal boron nitride powder was prepared in the same manner as in Example 1, except that the raw material acetylene black was changed to acetylene black (manufactured by Denka Company Ltd., grade name: Li400, specific surface area: 40 m2 /g), 1 mass% of boron nitride powder (manufactured by Denka Company Ltd., Denka boron nitride powder, grade name: MGP) was added to the raw material, and the pressure in the carbon atmosphere furnace was changed to 0.85 MPa.
(実施例3)
原料であるアセチレンブラックをアセチレンブラック(デンカ株式会社製、グレード名:Li400、比表面積:40m2/g)に変更し、カーボン雰囲気炉内の圧力を0.85MPaに変更したこと以外は、実施例1と同様にして、六方晶窒化ホウ素粉末を調製した。
Example 3
Hexagonal boron nitride powder was prepared in the same manner as in Example 1, except that the raw material acetylene black was changed to acetylene black (manufactured by Denka Co., Ltd., grade name: Li400, specific surface area: 40 m2 /g) and the pressure in the carbon atmosphere furnace was changed to 0.85 MPa.
(実施例4)
カーボン雰囲気炉内の圧力を0.90MPaに変更したこと以外は、実施例1と同様にして、六方晶窒化ホウ素粉末を調製した。
Example 4
A hexagonal boron nitride powder was prepared in the same manner as in Example 1, except that the pressure in the carbon atmosphere furnace was changed to 0.90 MPa.
実施例2~4で得られた六方晶窒化ホウ素粉末について、一次粒子の平均粒子径、タップ密度、純度、一次粒子の平均厚み、25~200℃まで加熱した際の水分量、比表面積、及び配向性指数を、実施例1と同様に測定した。実施例2~4で得られた六方晶窒化ホウ素粉末について、実施例1と同様に充填性及び絶縁性の評価を行った。結果を表1に示す。 For the hexagonal boron nitride powders obtained in Examples 2 to 4, the average particle size of the primary particles, tap density, purity, average thickness of the primary particles, moisture content when heated to 25 to 200°C, specific surface area, and orientation index were measured in the same manner as in Example 1. For the hexagonal boron nitride powders obtained in Examples 2 to 4, the packing property and insulating property were evaluated in the same manner as in Example 1. The results are shown in Table 1.
(比較例1)
ホウ酸粉末(純度99.8質量%以上、関東化学株式会社製)量100質量部、メラミン粉末(純度99.0質量%以上、富士フイルム和光純薬社製)9質量部、助剤として炭酸ナトリウム(純度99.5質量%以上)13質量部を添加し、アルミナ製乳鉢を用い10分間混合して、混合粉末を得た。乾燥後の混合粉末を、六方晶窒化ホウ素製の容器に入れ、電気炉内に配置した。電気炉内に窒素ガスを流通させながら、10℃/分の昇温速度で室温から1000℃に昇温した。1000℃で2時間保持した後、加熱を止めて自然冷却した。温度が100℃以下になった時点で電気炉を開放した。このようにして、低結晶性の六方晶窒化ホウ素を含む仮焼物を得た。
(Comparative Example 1)
100 parts by mass of boric acid powder (purity 99.8% by mass or more, manufactured by Kanto Chemical Co., Ltd.), 9 parts by mass of melamine powder (purity 99.0% by mass or more, manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), and 13 parts by mass of sodium carbonate (purity 99.5% by mass or more) as an auxiliary agent were added and mixed for 10 minutes using an alumina mortar to obtain a mixed powder. The mixed powder after drying was placed in a container made of hexagonal boron nitride and placed in an electric furnace. While circulating nitrogen gas in the electric furnace, the temperature was raised from room temperature to 1000°C at a heating rate of 10°C/min. After holding at 1000°C for 2 hours, heating was stopped and the material was allowed to cool naturally. When the temperature reached 100°C or less, the electric furnace was opened. In this way, a calcined product containing low-crystalline hexagonal boron nitride was obtained.
上記仮焼物100gを、上述の電気炉内に配置した。電気炉内に窒素ガスを流通させながら、10℃/分の速度で室温から1800℃に昇温した。1800℃の焼成温度で4時間保持した後、加熱を止めて自然冷却した。温度が100℃以下になった時点で電気炉を開放した。得られた焼成物を回収し、アルミナ製乳鉢で10分間粉砕して、六方晶窒化ホウ素を含む粗粉を得た。 100 g of the above calcined product was placed in the electric furnace. While circulating nitrogen gas in the electric furnace, the temperature was raised from room temperature to 1800°C at a rate of 10°C/min. After maintaining the calcination temperature of 1800°C for 4 hours, heating was stopped and the product was allowed to cool naturally. When the temperature reached 100°C or less, the electric furnace was opened. The resulting calcined product was collected and pulverized in an alumina mortar for 10 minutes to obtain a coarse powder containing hexagonal boron nitride.
次に、上記粗粉中に含まれる不純物を除くため、希硝酸(硝酸濃度:5質量%)500gに、上記粗粉30gを投入し、室温で60分間攪拌した。攪拌後、吸引ろ過によって固液分離し、ろ液が中性になるまで、水を入れ替えて、最終的に洗浄液の電気伝導度が1mS/m以下になるまで洗浄した。洗浄後、乾燥機を用いて120℃で3時間乾燥させることによって乾燥粉末を得た。乾燥後、篩目200μmの篩で通篩し、得られた粉末を比較例1の六方晶窒化ホウ素粉末とした。 Next, in order to remove impurities contained in the coarse powder, 30 g of the coarse powder was added to 500 g of dilute nitric acid (nitric acid concentration: 5% by mass) and stirred at room temperature for 60 minutes. After stirring, the mixture was separated into solid and liquid by suction filtration, and the water was replaced until the filtrate became neutral, and finally, the mixture was washed until the electrical conductivity of the washing liquid was 1 mS/m or less. After washing, the mixture was dried at 120°C for 3 hours using a dryer to obtain a dry powder. After drying, the mixture was sieved through a sieve with 200 μm mesh, and the obtained powder was used as the hexagonal boron nitride powder of Comparative Example 1.
(比較例2)
焼成温度を1700℃に変更し、焼成後にボールミルで2時間解砕したこと以外は、比較例1と同様にして、六方晶窒化ホウ素粉末を調製した。
(Comparative Example 2)
A hexagonal boron nitride powder was prepared in the same manner as in Comparative Example 1, except that the firing temperature was changed to 1700° C. and the powder was crushed in a ball mill for 2 hours after firing.
(比較例3)
炭酸ナトリウムの代わりに炭酸カルシウムを使用し、焼成条件を2050℃、35時間に変更したこと以外は、比較例1と同様にして、六方晶窒化ホウ素粉末を調製した。
(Comparative Example 3)
A hexagonal boron nitride powder was prepared in the same manner as in Comparative Example 1, except that calcium carbonate was used instead of sodium carbonate and the firing conditions were changed to 2050° C. and 35 hours.
(比較例4)
焼成温度を1700℃に変更し、酸処理及び乾燥して得られた乾燥粉末を再度電気炉内に配置し、電気炉内に窒素ガスを流通させながら、10℃/分の昇温速度で室温から2000℃に昇温し、2000℃の焼成温度で4時間保持させて焼成後の粉末(比較例4の六方晶窒化ホウ素粉末)を回収したこと以外は、比較例1と同様にして、六方晶窒化ホウ素粉末を調製した。
(Comparative Example 4)
Hexagonal boron nitride powder was prepared in the same manner as in Comparative Example 1, except that the firing temperature was changed to 1700°C, the dried powder obtained by the acid treatment and drying was placed again in the electric furnace, and the temperature was raised from room temperature to 2000°C at a heating rate of 10°C/min while nitrogen gas was circulated through the electric furnace, and the powder after firing (hexagonal boron nitride powder of Comparative Example 4) was collected by holding the temperature at 2000°C for 4 hours.
(比較例5)
炭酸ナトリウム量の配合量を20質量部に変更し、焼成温度を1850℃に変更したこと以外は、比較例1と同様にして、六方晶窒化ホウ素粉末を調製した。
(Comparative Example 5)
A hexagonal boron nitride powder was prepared in the same manner as in Comparative Example 1, except that the blending amount of sodium carbonate was changed to 20 parts by mass and the firing temperature was changed to 1850°C.
(比較例6)
原料であるアセチレンブラックをアセチレンブラック(デンカ株式会社製、グレード名:SAB、比表面積:370m2/g)に変更ししたこと以外は、実施例1と同様にして、六方晶窒化ホウ素粉末を調製した。
(Comparative Example 6)
A hexagonal boron nitride powder was prepared in the same manner as in Example 1, except that the raw material acetylene black was changed to acetylene black (manufactured by Denka Company, grade name: SAB, specific surface area: 370 m 2 /g).
比較例1~6で得られた六方晶窒化ホウ素粉末について、一次粒子の平均粒子径、タップ密度、純度、一次粒子の平均厚み、25~200℃まで加熱した際の水分量、比表面積、及び配向性指数を、実施例1と同様に測定した。比較例1~6で得られた六方晶窒化ホウ素粉末について、実施例1と同様に充填性及び絶縁性の評価を行った。結果を表2に示す。 For the hexagonal boron nitride powders obtained in Comparative Examples 1 to 6, the average particle size of the primary particles, tap density, purity, average thickness of the primary particles, moisture content when heated to 25 to 200°C, specific surface area, and orientation index were measured in the same manner as in Example 1. For the hexagonal boron nitride powders obtained in Comparative Examples 1 to 6, the packing property and insulating property were evaluated in the same manner as in Example 1. The results are shown in Table 2.
表2中、「-※」はフィルターの目詰まりが生じ、測定ができなかったことを意味する。 In Table 2, "- * " means that the filter was clogged and measurement was not possible.
本開示によれば、充填量の調整が容易であり、絶縁性に優れる放熱部材を製造可能な六方晶窒化ホウ素粉末、及び樹脂組成物を提供できる。 The present disclosure provides a hexagonal boron nitride powder and a resin composition that can be used to manufacture heat dissipation components with excellent insulating properties and that can easily adjust the filling amount.
Claims (4)
前記一次粒子の平均厚みが0.7~1.5μmであり、
タップ密度と、前記平均粒子径とが、
[タップ密度]≧0.025×[平均粒子径]+0.55 ・・・(1)
の関係を満たす、六方晶窒化ホウ素粉末。 It contains primary particles of hexagonal boron nitride, and the average particle size of the primary particles is 5 to 15 μm,
The average thickness of the primary particles is 0.7 to 1.5 μm,
The tap density and the average particle size are
[Tap density] ≧ 0.025 × [average particle size] + 0.55 ... (1)
Hexagonal boron nitride powder that satisfies the relationship.
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