Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP7624820B2 - Joining structure, joining method, and manufacturing method of case and resin member - Google Patents
[go: Go Back, main page]

JP7624820B2 - Joining structure, joining method, and manufacturing method of case and resin member - Google Patents

Joining structure, joining method, and manufacturing method of case and resin member Download PDF

Info

Publication number
JP7624820B2
JP7624820B2 JP2020170616A JP2020170616A JP7624820B2 JP 7624820 B2 JP7624820 B2 JP 7624820B2 JP 2020170616 A JP2020170616 A JP 2020170616A JP 2020170616 A JP2020170616 A JP 2020170616A JP 7624820 B2 JP7624820 B2 JP 7624820B2
Authority
JP
Japan
Prior art keywords
metal
resin
joining
metal film
joining surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020170616A
Other languages
Japanese (ja)
Other versions
JP2022062536A (en
Inventor
清貴 森
博之 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokai Kogyo Co Ltd
Original Assignee
Tokai Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokai Kogyo Co Ltd filed Critical Tokai Kogyo Co Ltd
Priority to JP2020170616A priority Critical patent/JP7624820B2/en
Publication of JP2022062536A publication Critical patent/JP2022062536A/en
Application granted granted Critical
Publication of JP7624820B2 publication Critical patent/JP7624820B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Packaging Frangible Articles (AREA)
  • Physical Vapour Deposition (AREA)

Description

本発明は、樹脂部材と金属部材とをシール材を介して接合する接合構造及び接合方法並びにケース及び樹脂部材の製造方法に関する発明である。 The present invention relates to a joining structure and joining method for joining a resin member and a metal member via a sealing material, as well as a manufacturing method for a case and a resin member.

例えば、特許文献1(特許第5278443号公報)には、エンジンの金属製のシリンダブロックおよびシリンダヘッドと樹脂製のタイミングチェーンカバーとを接合してシールする場合に、予めタイミングチェーンカバーの接合面に対しプラズマ処理を施した上で、このタイミングチェーンカバーの接合面に金属溶射膜を形成し、更に、この金属溶射膜の表面に対しプラズマ処理を施した上で、この金属溶射膜上にペースト状ガスケットを塗布して、タイミングチェーンカバーをシリンダブロックおよびシリンダヘッドに接合してシールすることが記載されている。 For example, Patent Document 1 (Patent Publication No. 5278443) describes how, when joining and sealing a resin timing chain cover to a metal cylinder block and cylinder head of an engine, the joining surface of the timing chain cover is first subjected to plasma treatment, a metal sprayed film is formed on the joining surface of the timing chain cover, the surface of the metal sprayed film is then subjected to plasma treatment, a paste-like gasket is applied onto the metal sprayed film, and the timing chain cover is joined and sealed to the cylinder block and cylinder head.

特許第5278443号公報Patent No. 5278443

上記特許文献1の構造では、タイミングチェーンカバーの接合面に金属溶射膜を形成する前に、両者の接着力を高めるために、タイミングチェーンカバーの接合面にプラズマ処理を施し、更に、金属溶射膜を形成した後にも当該金属溶射膜の表面にプラズマ処理を施す必要がある。このため、工程数が増えて生産性が低下するだけでなく、プラズマ処理を施す装置も必要となり、設備コストも増えるという欠点がある。かといって、タイミングチェーンカバーの接合面にプラズマ処理を施さずに金属溶射膜を形成したり、金属溶射膜の表面にプラズマ処理を施さずにペースト状ガスケットを塗布すると、接着力が弱くなって剥離等の問題が発生しやすくなる。 In the structure of Patent Document 1, before forming the metal sprayed film on the joining surface of the timing chain cover, the joining surface of the timing chain cover is subjected to plasma treatment in order to increase the adhesive strength between the two, and furthermore, after the metal sprayed film is formed, the surface of the metal sprayed film must be subjected to plasma treatment. This not only increases the number of steps and reduces productivity, but also requires a device to perform plasma treatment, which has the disadvantage of increasing equipment costs. However, if the metal sprayed film is formed on the joining surface of the timing chain cover without performing plasma treatment, or if a paste-like gasket is applied to the surface of the metal sprayed film without performing plasma treatment, the adhesive strength will be weakened and problems such as peeling will be more likely to occur.

そこで、本発明が解決しようとする課題は、工程数の削減と設備コストの低減を可能にしながら樹脂部材と金属部材との接合力を強くできる接合構造及び接合方法並びにケース及び樹脂部材の製造方法を提供することである。 The problem that the present invention aims to solve is to provide a joining structure and joining method that can strengthen the joining force between a resin member and a metal member while reducing the number of steps and reducing equipment costs, as well as a method for manufacturing a case and a resin member.

上記課題を解決するために、本発明は、樹脂部材の接合面と金属部材の接合面とをシール材を介して接合する接合構造において、前記金属部材はアルミニウムでケース状に形成され、前記樹脂部材はポリフェニレンサルファイド樹脂で前記金属部材の開口部又は貫通孔に被せられる形状に形成され、前記樹脂部材の接合面の少なくとも一部には、膜厚0.05μm以上1μm以下の金属膜がスパッタリングにより形成されていることを特徴とするものである。 In order to solve the above problems, the present invention provides a joining structure in which a joining surface of a resin member and a joining surface of a metal member are joined via a sealing material, the metal member is formed in a case shape from aluminum, the resin member is formed in a shape that covers an opening or a through hole of the metal member from polyphenylene sulfide resin, and a metal film with a film thickness of 0.05 μm or more and 1 μm or less is formed by sputtering on at least a portion of the joining surface of the resin member.

この接合構造では、樹脂部材の接合面の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜がスパッタリングにより形成されているため、樹脂部材の接合面に形成した金属膜がシール材を介して樹脂部材と金属部材との接合力を強くする役割を果たす。この場合、樹脂部材の接合面に形成する金属膜はスパッタリングにより形成するため、前記特許文献1の金属溶射膜とは異なり、樹脂部材の接合面にプラズマ処理を施さずに金属膜を形成しても、樹脂部材の接合面と金属膜との接着力を確保できる。しかも、スパッタリングにより高純度の金属膜を形成できるため、前記特許文献1の金属溶射膜とは異なり、金属膜の表面にプラズマ処理を施さずに金属膜の表面にシール材を塗布しても、金属膜に対するシール材の接着力を弱めることがなく、接着力を確保できる。更に、金属膜の膜厚を0.05μm以上1μm以下としているため、金属膜としての接着力増強の効果と樹脂部材の接合面からの金属膜の剥離防止の効果を確保できる。これは、金属膜の膜厚が0.05μm未満になると、金属膜の膜厚が薄くなり過ぎて金属膜としてのシール材との接着力の増強効果が不足するためであり、一方、金属膜の膜厚が1μmより厚くなると、金属膜の全応力(=内部応力×膜厚)が大きくなり過ぎて、樹脂部材と金属膜との熱膨張係数の差による金属膜の剥離等の問題が発生しやすくなるためである。
しかも、本発明では、金属部材がアルミニウムで形成され、樹脂部材がポリフェニレンサルファイド樹脂で形成されているため、接合する樹脂部材と金属部材とが線膨張係数が近い材料で形成されている。このため、ケース状に形成された金属部材に樹脂部材が被せられて接合された状態において、温度変化が生じた場合にも膨脹・収縮の度合いが近くなり、金属部材と樹脂部材とをシール材を介して安定して接合することができる。
In this joining structure, a metal film having a thickness of 0.05 μm or more and 1 μm or less is formed by sputtering on at least a part of the joining surface of the resin member, so that the metal film formed on the joining surface of the resin member plays a role of strengthening the joining force between the resin member and the metal member through the sealing material. In this case, since the metal film formed on the joining surface of the resin member is formed by sputtering, unlike the metal sprayed film of Patent Document 1, even if the metal film is formed without performing plasma treatment on the joining surface of the resin member, the adhesive force between the joining surface of the resin member and the metal film can be ensured. Moreover, since a high-purity metal film can be formed by sputtering, unlike the metal sprayed film of Patent Document 1, even if the sealing material is applied to the surface of the metal film without performing plasma treatment on the surface of the metal film, the adhesive force of the sealing material to the metal film is not weakened, and the adhesive force can be ensured. Furthermore, since the thickness of the metal film is set to 0.05 μm or more and 1 μm or less, the effect of increasing the adhesive force as a metal film and the effect of preventing the metal film from peeling off from the joining surface of the resin member can be ensured. This is because, if the thickness of the metal film is less than 0.05 μm, the metal film becomes too thin and the effect of enhancing the adhesive strength of the metal film with the sealing material is insufficient; on the other hand, if the thickness of the metal film is more than 1 μm, the total stress of the metal film (= internal stress x film thickness) becomes too large, making it more likely that problems such as peeling of the metal film will occur due to the difference in thermal expansion coefficient between the resin member and the metal film.
Moreover, in the present invention, the metal member is made of aluminum and the resin member is made of polyphenylene sulfide resin, so that the resin member and the metal member to be joined are made of materials with similar linear expansion coefficients. Therefore, when the resin member is placed over the metal member formed into a case shape and joined, the degrees of expansion and contraction are similar even when a temperature change occurs, and the metal member and the resin member can be stably joined via the sealant.

この場合、金属膜の膜厚を0.05μm以上0.2μm以下にすれば、金属膜の全応力を適度に小さくすることができるため、樹脂部材と金属膜との熱膨張係数の差による金属膜の剥離等の問題を効果的に回避できる。 In this case, if the thickness of the metal film is set to 0.05 μm or more and 0.2 μm or less, the total stress of the metal film can be appropriately reduced, effectively avoiding problems such as peeling of the metal film due to the difference in thermal expansion coefficient between the resin member and the metal film.

更に、シール材として液状ガスケット(FIPG)を用いれば、接着力と共にシール性も十分に確保できる。 Furthermore, by using a liquid gasket (FIPG) as a sealing material, sufficient sealing performance can be ensured along with adhesive strength.

この場合、金属膜は、樹脂部材の接合面の一部のみに形成しても良いが、例えば、樹脂部材が電子ユニットを収容するためにケース状に形成されている場合には、その開口縁部全周に亘って連続して接合面を形成し、その接合面の全周に亘って連続して金属膜を形成するようにしても良い。このようにすれば、電子ユニットを収容した樹脂部材と金属部材との間のシール性も十分に確保できる。 In this case, the metal film may be formed only on a part of the joint surface of the resin member, but for example, if the resin member is formed in a case shape to house the electronic unit, the joint surface may be formed continuously around the entire circumference of the opening edge, and the metal film may be formed continuously around the entire circumference of the joint surface. In this way, sufficient sealing can be ensured between the resin member housing the electronic unit and the metal member.

また、金属膜を成膜するスパッタリング工程において、金属膜の成膜温度を30℃以上150℃以下に設定すると良い。金属膜の成膜温度を150℃以下に設定することで、金属膜の膜厚を1μm以下に形成しやすくなると共に、熱応力を小さくすることができ、金属膜の剥離等の問題をより効果的に回避できる。また、金属膜の成膜温度を30℃以上にすることで、成膜不良を防止できる。 In addition, in the sputtering process for forming the metal film, it is advisable to set the deposition temperature of the metal film to 30°C or higher and 150°C or lower. By setting the deposition temperature of the metal film to 150°C or lower, it becomes easier to form a metal film with a thickness of 1 μm or less, and thermal stress can be reduced, making it possible to more effectively avoid problems such as peeling of the metal film. Furthermore, by setting the deposition temperature of the metal film to 30°C or higher, it is possible to prevent poor deposition.

図1は本発明の一実施例における金属ケースと樹脂蓋体とを接合した状態を示す縦断面図である。FIG. 1 is a vertical cross-sectional view showing a state in which a metal case and a resin lid are joined together in one embodiment of the present invention. 図2は金属ケースから樹脂蓋体と樹脂キャップを取り外した状態(スパッタリング工程前の状態)を示す外観斜視図である。FIG. 2 is an external perspective view showing a state in which the resin lid body and the resin cap have been removed from the metal case (state before the sputtering step). 図3はスパッタリングで金属膜を形成した樹脂蓋体を示す外観斜視図である。FIG. 3 is an external perspective view showing a resin lid body on which a metal film is formed by sputtering. 図4はスパッタリングで金属膜を形成した樹脂キャップを示す外観斜視図である。FIG. 4 is a perspective view showing the appearance of a resin cap on which a metal film is formed by sputtering.

以下、本発明を実施するための形態を電子ユニット収容ケース10に適用して具体化した一実施例を説明する。
図1及び図2に示すように、本実施例の電子ユニット収容ケース10は、例えば車載電装品であるパワーコントロールユニット等の電子ユニット(図示せず)を収容するためにケース状に形成された金属部材である金属ケース11と、この金属ケース11の上面開口部に被せられる樹脂部材である樹脂蓋体12と、金属ケース11の側面に形成された配線用、ドレイン用等の貫通孔13に被せられる樹脂部材である樹脂キャップ14等の部品から構成されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to an electronic unit housing case 10 will be described below.
As shown in Figures 1 and 2, the electronic unit storage case 10 of this embodiment is composed of parts such as a metal case 11 which is a metal member formed into a case shape to store an electronic unit (not shown) such as a power control unit, which is an in-vehicle electrical component, a resin lid body 12 which is a resin member that covers the top opening of the metal case 11, and a resin cap 14 which is a resin member that covers a through hole 13 for wiring, drain, etc. formed on the side of the metal case 11.

ここで、金属ケース11は、例えば、アルミニウム、SUS、鉄、銅等の金属で形成されている。一方、樹脂蓋体12と樹脂キャップ14は、例えば、ポリフェニレンサルファイド樹脂、ポリプロピレン、ポリアミド等の樹脂で所定形状に成形されている。この金属ケース11と樹脂蓋体12や、金属ケース11と樹脂キャップ14は、温度差が生じた際にも両者を密着させることができるように線膨張係数が近い材料で形成すると良い。 Here, the metal case 11 is formed from a metal such as aluminum, SUS, iron, or copper. On the other hand, the resin lid 12 and the resin cap 14 are molded into a predetermined shape from a resin such as polyphenylene sulfide resin, polypropylene, or polyamide. The metal case 11 and the resin lid 12, or the metal case 11 and the resin cap 14, are preferably formed from materials with similar linear expansion coefficients so that they can be tightly attached even when a temperature difference occurs.

次に、金属ケース11に対して樹脂蓋体12と樹脂キャップ14を接合する構造を説明する。
図2に示すように、金属ケース11の上面開口縁部全周に亘って連続して接合面11aが平面の四角枠状に形成されていると共に、金属ケース11の側面の貫通孔13の開口縁部全周に亘って連続して接合面13aが円環状に形成されている。
Next, a structure for joining the resin lid body 12 and the resin cap 14 to the metal case 11 will be described.
As shown in FIG. 2 , the joining surface 11a is formed in a flat rectangular frame shape continuously around the entire periphery of the edge of the top opening of the metal case 11, and the joining surface 13a is formed in a circular ring shape continuously around the entire periphery of the edge of the opening of the through hole 13 on the side of the metal case 11.

一方、図3に示すように、樹脂蓋体12の接合側の面(下面)には、金属ケース11の接合面11aと同じ形状の接合面12aが形成されている。図4に示すように、樹脂キャップ14の接合側の面には、金属ケース11の貫通孔13の周囲の接合面13aと同じ形状の接合面14aが形成されている。 On the other hand, as shown in Fig. 3, the joining surface (lower surface) of the resin lid 12 has a joining surface 12a having the same shape as the joining surface 11a of the metal case 11. As shown in Fig. 4, the joining surface of the resin cap 14 has a joining surface 14a having the same shape as the joining surface 13a around the through hole 13 of the metal case 11.

そして、樹脂蓋体12の接合面12aと樹脂キャップ14の接合面14aには、それぞれ接合面12a,14aの全周に亘って連続して膜厚0.05μm以上1μm以下(より好ましくは膜厚0.05μm以上0,2μm以下)の金属膜15,16がスパッタリングにより形成されている。金属膜15,16の幅W(図3、図4参照)は、接合面12a,14aの幅と同一であっても良いし、それよりも少し狭くても良い。金属膜15,16は、例えば、アルミニウム、SUS等の金属で形成されている。 Metal films 15, 16 with a thickness of 0.05 μm to 1 μm (more preferably 0.05 μm to 0.2 μm) are formed by sputtering on the joining surfaces 12a, 14a of the resin lid 12 and 14a, respectively, continuously around the entire circumference of the joining surfaces 12a, 14a. The width W (see Figures 3 and 4) of the metal films 15, 16 may be the same as the width of the joining surfaces 12a, 14a, or may be slightly narrower. The metal films 15, 16 are formed of a metal such as aluminum or SUS.

金属ケース11に対して樹脂蓋体12と樹脂キャップ14を接合するシール材17としては、シリコン系の液状ガスケット(Formed In Place Gasket:FIPG)が使用されている。このシール材17(液状ガスケット)は、樹脂蓋体12と樹脂キャップ14の接合面12a,14aに形成した金属膜15,16の表面に塗布した後に弾性を有する状態で固まって接着力を発揮する。従って、樹脂蓋体12と樹脂キャップ14の接合面12a,14aに形成した金属膜15,16の表面にシール材17を塗布した後に、そのシール材17が固まる前に、金属ケース11の接合面11a,13aに樹脂蓋体12と樹脂キャップ14を被せて、金属膜15,16表面のシール材17を金属ケース11の接合面11a,13aに十分に密着させた状態にしてシール材17を固まらせることで、樹脂蓋体12と樹脂キャップ14を金属ケース11に接合して金属ケース11の開口部と貫通孔13をシールするものである。樹脂蓋体12と樹脂キャップ14の接合面12a,14aは、平面であっても良いし、シール材17との接着強度を高めるために、細かな段差や凹凸のある非平面であっても良い。 A silicone-based liquid gasket (Formed In Place Gasket: FIPG) is used as the sealant 17 that joins the resin lid 12 and the resin cap 14 to the metal case 11. This sealant 17 (liquid gasket) is applied to the surfaces of the metal films 15, 16 formed on the joining surfaces 12a, 14a of the resin lid 12 and the resin cap 14, and then hardens in an elastic state to exert adhesive strength. Therefore, after applying the sealant 17 to the surfaces of the metal films 15, 16 formed on the joint surfaces 12a, 14a of the resin lid 12 and the resin cap 14, the resin lid 12 and the resin cap 14 are placed on the joint surfaces 11a, 13a of the metal case 11 before the sealant 17 hardens, and the sealant 17 on the surfaces of the metal films 15, 16 is brought into sufficient contact with the joint surfaces 11a, 13a of the metal case 11, and the sealant 17 is allowed to harden, thereby joining the resin lid 12 and the resin cap 14 to the metal case 11 and sealing the opening and the through hole 13 of the metal case 11. The joint surfaces 12a, 14a of the resin lid 12 and the resin cap 14 may be flat, or may be non-flat with small steps or irregularities to increase the adhesive strength with the sealant 17.

金属膜15,16を成膜するスパッタリング工程では、例えば、マグネトロンスパッタリング法、2極スパッタリング法、DC(直流)スパッタリング法、RF(高周波)スパッタリング法、反応性スパッタリング法、イオンビームスパッタリング法等のいずれかの方法を使用すれば良い。 In the sputtering process for forming the metal films 15 and 16, any of the following methods may be used: magnetron sputtering, bipolar sputtering, DC (direct current) sputtering, RF (radio frequency) sputtering, reactive sputtering, ion beam sputtering, etc.

スパッタリングを行う前に、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)以外の部分は、マスキングして、接合面12a(14a)のみに金属膜15(16)が成膜されるようにする。マスキングに使用する部材は、耐熱性があり、真空にも耐え得る材質のテープやプレートを用いると良く、例えば、カプトン(登録商標)粘着テープを用いると良い。スパッタリングは、溶射に比べて小さい面積にも金属膜15(16)を成膜することができる利点がある。 Before sputtering, the resin lid 12 (resin cap 14) is masked except for the joining surface 12a (14a) so that the metal film 15 (16) is formed only on the joining surface 12a (14a). The material used for masking should be a tape or plate made of a material that is heat resistant and can withstand a vacuum, for example, Kapton (registered trademark) adhesive tape. Sputtering has the advantage that the metal film 15 (16) can be formed on a smaller area than thermal spraying.

また、スパッタリング中に、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)の表面最高温度(成膜温度)を測定するために、色が変化する温度が異なる複数枚の温度測定シールを接合面12a(14a)の複数箇所に貼り付けて、複数枚の温度測定シールのうちの色が変化したシールにより温度を測定する。この際、複数枚の温度測定シールは、色が変化する温度が所定温度(例えば10℃)ずつ異なるようにすれば良い。この成膜温度の測定は、生産開始前のテスト生産の段階で行って、スパッタリング装置の運転条件を成膜温度が適正温度範囲である30℃~150℃の範囲内に収まるように調整して実際の生産を開始するようにすれば良い。 In addition, to measure the maximum surface temperature (film formation temperature) of the joining surface 12a (14a) of the resin lid 12 (resin cap 14) during sputtering, multiple temperature measurement stickers that change color at different temperatures are attached to multiple locations on the joining surface 12a (14a), and the temperature is measured using one of the multiple temperature measurement stickers that has changed color. In this case, the multiple temperature measurement stickers can be designed so that the temperatures at which they change color differ by a predetermined temperature (e.g., 10°C). This film formation temperature measurement can be performed at the test production stage before production begins, and the operating conditions of the sputtering device can be adjusted so that the film formation temperature falls within the appropriate temperature range of 30°C to 150°C before actual production begins.

例えば、膜厚が0.2μmの金属膜15(16)を成膜する場合には、スパッタリング装置の電力が10kWで、成膜時間が14秒、接合面12a(14a)の表面温度が50℃~60℃となるようにすれば良い。スパッタリングにより、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)に膜厚0.05μm以上の金属膜15(16)を容易に成膜することができる。 For example, when forming a metal film 15 (16) with a thickness of 0.2 μm, the power of the sputtering device should be 10 kW, the film formation time should be 14 seconds, and the surface temperature of the joining surface 12a (14a) should be 50°C to 60°C. By sputtering, a metal film 15 (16) with a thickness of 0.05 μm or more can be easily formed on the joining surface 12a (14a) of the resin lid 12 (resin cap 14).

また、金属膜15(16)の膜厚が厚くなり過ぎると、金属膜15(16)の全応力が大きくなり過ぎて樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)から金属膜15(16)が剥離しやすくなるため、金属膜15(16)の膜厚を1μm以下にすると良い。これにより、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)から金属膜15(16)が剥離し難くなる。 In addition, if the thickness of the metal film 15 (16) becomes too thick, the total stress of the metal film 15 (16) becomes too large, and the metal film 15 (16) becomes more likely to peel off from the joining surface 12a (14a) of the resin lid body 12 (resin cap 14), so it is preferable to set the thickness of the metal film 15 (16) to 1 μm or less. This makes it difficult for the metal film 15 (16) to peel off from the joining surface 12a (14a) of the resin lid body 12 (resin cap 14).

参考までに、金属膜15(16)の全応力は、下記の[1]式で算出されることから明らかなように、膜厚に比例して大きくなり、全応力が大きいほど、金属膜15(16)が剥離しやすくなるという性質がある。 For reference, the total stress of the metal film 15 (16) increases in proportion to the film thickness, as can be seen from the calculation using the following formula [1]. The greater the total stress, the more likely the metal film 15 (16) is to peel off.

全応力=内部応力×膜厚 ……[1]
内部応力=熱応力+真応力 ……[2]
ここで、真応力は樹脂蓋体12(樹脂キャップ14)にかかる応力であり、スパッタリングと溶射とは同じ大きさである。
Total stress = internal stress x film thickness … [1]
Internal stress = thermal stress + true stress … [2]
Here, the true stress is the stress applied to the resin lid 12 (resin cap 14), and the true stress is the same in both sputtering and thermal spraying.

熱応力は次の[3]式で算出される。
熱応力=Ef・Δα・ΔT/(1-vf) ……[3]
ここで、Efは金属膜15(16)のヤング率である。
The thermal stress is calculated using the following formula [3].
Thermal stress = Ef・Δα・ΔT/(1-vf) ...[3]
Here, Ef is the Young's modulus of the metal film 15 (16).

Δαは金属膜15(16)と樹脂蓋体12(樹脂キャップ14)の熱膨張係数の差である。従って、熱応力を小さくするためには、金属膜15(16)と樹脂蓋体12(樹脂キャップ14)は、両者の熱膨張係数の差が小さい材料で形成すれば良い。 Δα is the difference in thermal expansion coefficient between the metal film 15 (16) and the resin lid body 12 (resin cap 14). Therefore, in order to reduce thermal stress, the metal film 15 (16) and the resin lid body 12 (resin cap 14) should be made of materials that have a small difference in thermal expansion coefficient between them.

ΔTは成膜温度と室温の温度差である。スパッタリングは溶射に比べて成膜温度が低いため、スパッタリングは溶射に比べてΔTが小さい。溶射の成膜温度は最高300℃であるのに対し、スパッタリングの成膜温度は30℃~150℃である。 ΔT is the temperature difference between the film formation temperature and room temperature. Sputtering has a lower film formation temperature than thermal spraying, so ΔT is smaller for sputtering than for thermal spraying. The film formation temperature for thermal spraying is up to 300°C, while the film formation temperature for sputtering is 30°C to 150°C.

vfは金属膜15(16)のポアソン比である。スパッタリングで用いる金属と溶射で用いる金属が同じであれば、vfはスパッタリングと溶射で同じ大きさである。 vf is the Poisson's ratio of the metal film 15 (16). If the metal used in sputtering is the same as the metal used in thermal spraying, vf is the same for sputtering and thermal spraying.

従って、上記[1]式で算出される金属膜15(16)の全応力を適正範囲内に収めて金属膜15(16)が剥離し難くするためには、金属膜15(16)と樹脂蓋体12(樹脂キャップ14)は、両者の熱膨張係数の差が小さい材料で形成することが好ましく、且つ、金属膜15(16)の膜厚を0.05μm以上1μm以下にすると共に、成膜温度を30℃以上150℃以下にすることが好ましい。 Therefore, in order to keep the total stress of the metal film 15 (16) calculated by the above formula [1] within an appropriate range and make the metal film 15 (16) less likely to peel off, it is preferable that the metal film 15 (16) and the resin lid body 12 (resin cap 14) are formed from materials with a small difference in thermal expansion coefficient between them, and it is preferable that the film thickness of the metal film 15 (16) be 0.05 μm or more and 1 μm or less, and that the film formation temperature be 30°C or more and 150°C or less.

以上説明した電子ユニット収容ケース10を製造する場合、樹脂を所定形状に成形して接合面12a(14a)を有する樹脂蓋体12(樹脂キャップ14)を形成する成形工程と、その後、前記接合面12a(14a)の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜15(16)をスパッタリングにより形成するスパッタリング工程とを自社の工場で行うようにしても良いし、他社で成形した樹脂蓋体12(樹脂キャップ14)を購入等により入手して、自社で、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜15(16)を形成するスパッタリング工程のみを行うようにしても良い。 When manufacturing the electronic unit housing case 10 described above, the molding process of forming the resin lid body 12 (resin cap 14) having the joint surface 12a (14a) by molding the resin into a predetermined shape and then the sputtering process of forming the metal film 15 (16) having a thickness of 0.05 μm to 1 μm on at least a part of the joint surface 12a (14a) by sputtering may be performed in the company's own factory, or the company may purchase the resin lid body 12 (resin cap 14) molded by another company and only perform the sputtering process of forming the metal film 15 (16) having a thickness of 0.05 μm to 1 μm on at least a part of the joint surface 12a (14a) of the resin lid body 12 (resin cap 14) in-house.

また、金属ケース11を製造する工程及び/又は樹脂蓋体12(樹脂キャップ14)と金属ケース11とをシール材17を介して接合する工程についても、自社で行っても良いし、他社で行っても良い。 In addition, the process of manufacturing the metal case 11 and/or the process of joining the resin lid 12 (resin cap 14) and the metal case 11 via the sealing material 17 may be performed in-house or by another company.

以上説明した本実施例によれば、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)と金属ケース11の接合面11a(13a)とをシール材17を介して接合する接合構造において、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜15(16)がスパッタリングにより形成されているため、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)に形成した金属膜15(16)がシール材17を介して樹脂蓋体12(樹脂キャップ14)と金属ケース11との接合力を強くする役割を果たす。 According to the present embodiment described above, in the joining structure in which the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) and the joining surface 11a (13a) of the metal case 11 are joined via the sealing material 17, a metal film 15 (16) having a thickness of 0.05 μm or more and 1 μm or less is formed by sputtering on at least a part of the joining surface 12a (14a) of the resin lid body 12 (resin cap 14), so that the metal film 15 (16) formed on the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) plays a role in strengthening the joining force between the resin lid body 12 (resin cap 14) and the metal case 11 via the sealing material 17.

この場合、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)に形成する金属膜15(16)はスパッタリングにより形成するため、前記特許文献1の金属溶射膜とは異なり、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)にプラズマ処理を施さずに金属膜15(16)を形成しても、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)と金属膜15(16)との接着力を確保できる。しかも、スパッタリングにより高純度の金属膜15(16)を形成できるため、前記特許文献1の金属溶射膜とは異なり、金属膜15(16)の表面にプラズマ処理を施さずに金属膜15(16)の表面にシール材17を塗布しても、金属膜15(16)に対するシール材17の接着力を弱めることがなく、接着力を確保できる。 In this case, the metal film 15 (16) formed on the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) is formed by sputtering, so unlike the metal sprayed film in Patent Document 1, even if the metal film 15 (16) is formed without performing plasma treatment on the joining surface 12a (14a) of the resin lid body 12 (resin cap 14), the adhesive strength between the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) and the metal film 15 (16) can be ensured. Moreover, since a high-purity metal film 15 (16) can be formed by sputtering, unlike the metal sprayed film in Patent Document 1, even if the sealing material 17 is applied to the surface of the metal film 15 (16) without performing plasma treatment on the surface of the metal film 15 (16), the adhesive strength of the sealing material 17 to the metal film 15 (16) is not weakened, and the adhesive strength can be ensured.

更に、金属膜15(16)の膜厚を0.05μm以上1μm以下としているため、金属膜15(16)としての接着力増強の効果と樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)からの金属膜15(16)の剥離防止の効果を確保できる。これは、金属膜15(16)の膜厚が0.05μm未満になると、金属膜15(16)の膜厚が薄くなり過ぎて金属膜15(16)としてのシール材17との接着力の増強効果が不足するためであり、一方、金属膜15(16)の膜厚が1μmより厚くなると、金属膜15(16)の全応力が大きくなり過ぎて、樹脂蓋体12(樹脂キャップ14)と金属膜15(16)との熱膨張係数の差による金属膜15(16)の剥離等の問題が発生しやすくなるためである。 Furthermore, since the thickness of the metal film 15 (16) is set to 0.05 μm or more and 1 μm or less, the effect of increasing the adhesive strength of the metal film 15 (16) and the effect of preventing the metal film 15 (16) from peeling off from the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) can be ensured. This is because if the thickness of the metal film 15 (16) is less than 0.05 μm, the thickness of the metal film 15 (16) becomes too thin and the effect of increasing the adhesive strength of the metal film 15 (16) with the seal material 17 is insufficient. On the other hand, if the thickness of the metal film 15 (16) is thicker than 1 μm, the total stress of the metal film 15 (16) becomes too large, and problems such as peeling of the metal film 15 (16) due to the difference in thermal expansion coefficient between the resin lid body 12 (resin cap 14) and the metal film 15 (16) are likely to occur.

この場合、金属膜15(16)の膜厚を0.2μm以下にすれば、金属膜15(16)の全応力を適度に小さくすることができるため、樹脂蓋体12(樹脂キャップ14)と金属膜15(16)との熱膨張係数の差による金属膜15(16)の剥離等の問題をより確実に回避できる。 In this case, if the thickness of the metal film 15 (16) is set to 0.2 μm or less, the total stress of the metal film 15 (16) can be appropriately reduced, so that problems such as peeling of the metal film 15 (16) due to the difference in thermal expansion coefficient between the resin lid body 12 (resin cap 14) and the metal film 15 (16) can be more reliably avoided.

また、本実施例では、金属膜15(16)を成膜するスパッタリング工程において、金属膜15(16)の成膜温度を150℃以下に設定したので、金属膜15(16)の膜厚を1μm以下に形成しやすくなると共に、熱応力を小さくすることができ、金属膜15(16)の剥離等の問題をより確実に回避できる。 In addition, in this embodiment, in the sputtering process for forming the metal film 15 (16), the deposition temperature for the metal film 15 (16) is set to 150°C or less, which makes it easier to form the metal film 15 (16) to a thickness of 1 μm or less, reduces thermal stress, and more reliably avoids problems such as peeling of the metal film 15 (16).

尚、本実施例では、樹脂蓋体12(樹脂キャップ14)の接合面12a(14a)の全周に亘って連続して金属膜15(16)をスパッタリングにより形成するようにしたが、接合面12a(14a)に間欠的に金属膜をスパッタリングにより形成するようにしても良い。 In this embodiment, the metal film 15 (16) is formed continuously around the entire circumference of the joining surface 12a (14a) of the resin lid body 12 (resin cap 14) by sputtering, but the metal film may be formed intermittently on the joining surface 12a (14a) by sputtering.

また、本実施例では、ケースを金属で形成し、それに被せる蓋(キャップ)を樹脂で形成したが、これとは反対に、ケースを樹脂で形成し、それに被せる蓋(キャップ)を金属で形成した構成としても良く、この場合には、樹脂ケースの接合面の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜をスパッタリングにより形成した後、樹脂ケースと金属蓋(金属キャップ)とをシール材を介して接合すれば良い。 In addition, in this embodiment, the case is made of metal and the lid (cap) that covers it is made of resin, but the opposite configuration may be used, where the case is made of resin and the lid (cap) that covers it is made of metal. In this case, a metal film with a thickness of 0.05 μm to 1 μm is formed by sputtering on at least a portion of the joining surface of the resin case, and then the resin case and the metal lid (metal cap) are joined via a sealant.

その他、本発明は、電子ユニットを収容するケースに限定されず、電子ユニット以外のものを収容するケースであっても良く、更に言えば、ケースに限定されず、ケース以外の形状であっても良い。要は、樹脂部材と金属部材とをシール材を介して接合する構造であれば、ケース以外の形状のものであっても本発明を適用して実施できる。 In addition, the present invention is not limited to cases that house electronic units, but may also be cases that house things other than electronic units, and furthermore, is not limited to cases, but may be shapes other than cases. In short, as long as the structure is one in which a resin member and a metal member are joined via a sealing material, the present invention can be applied and implemented even if the shape is other than a case.

10…電子ユニット収容ケース、11…金属ケース(金属部材)、11a…接合面、12…樹脂蓋体(樹脂部材)、12a…接合面、13…貫通孔、13a…接合面、14…樹脂キャップ(樹脂部材)、14a…接合面、15,16…金属膜、17…シール材(液状ガスケット)
DESCRIPTION OF SYMBOLS 10...electronic unit housing case, 11...metal case (metal member), 11a...joint surface, 12...resin lid (resin member), 12a...joint surface, 13...through hole, 13a...joint surface, 14...resin cap (resin member), 14a...joint surface, 15, 16...metal film, 17...sealing material (liquid gasket)

Claims (12)

樹脂部材の接合面と金属部材の接合面とをシール材を介して接合する接合構造において、
前記金属部材はアルミニウムでケース状に形成され、
前記樹脂部材はポリフェニレンサルファイド樹脂で前記金属部材の開口部又は貫通孔に被せられる形状に形成され、
前記樹脂部材の接合面の少なくとも一部には、膜厚0.05μm以上1μm以下の金属膜がスパッタリングにより形成されていることを特徴とする接合構造。
In a joining structure in which a joining surface of a resin member and a joining surface of a metal member are joined via a sealant,
The metal member is made of aluminum and formed into a case shape,
the resin member is made of polyphenylene sulfide resin and is formed into a shape that covers the opening or the through hole of the metal member,
A joint structure, characterized in that a metal film having a thickness of 0.05 μm or more and 1 μm or less is formed by sputtering on at least a part of the joint surface of the resin member.
前記金属膜の膜厚は、0.05μm以上0.2μm以下であることを特徴とする請求項1に記載の接合構造。 The junction structure described in claim 1, characterized in that the thickness of the metal film is 0.05 μm or more and 0.2 μm or less. 前記シール材は、液状ガスケットであることを特徴とする請求項1又は2に記載の接合構造。 The joining structure according to claim 1 or 2, characterized in that the sealing material is a liquid gasket. 樹脂部材の接合面と、金属部材の接合面とをシール材を介して接合するケースにおいて、
前記金属部材は、電子ユニットを収容するためにアルミニウムでケース状に形成され、その開口縁部全周に亘って連続して接合面が形成され、
前記樹脂部材はポリフェニレンサルファイド樹脂で前記金属部材の開口部又は貫通孔に被せられる形状に形成され、
前記樹脂部材の接合面の全周に亘って膜厚0.05μm以上1μm以下の金属膜がスパッタリングにより連続して形成されていることを特徴とするケース。
In a case where a joining surface of a resin member and a joining surface of a metal member are joined via a sealant,
the metal member is made of aluminum and formed in a case shape to house an electronic unit, and a joint surface is formed continuously around the entire periphery of an opening edge of the metal member;
the resin member is made of polyphenylene sulfide resin and is formed into a shape that covers the opening or the through hole of the metal member,
A case characterized in that a metal film having a thickness of 0.05 μm or more and 1 μm or less is continuously formed by sputtering over the entire periphery of the joining surface of the resin member.
アルミニウムでケース状に形成された金属部材の接合面とポリフェニレンサルファイド樹脂で前記金属部材の開口部又は貫通孔に被せられる形状に形成された樹脂部材の接合面とをシール材を介して接合する接合方法において、
前記樹脂部材の接合面の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜をスパッタリングにより形成するスパッタリング工程と、
その後、前記樹脂部材の接合面と前記金属部材の接合面とをシール材を介して接合する接合工程と
を含むことを特徴とする接合方法。
1. A method for joining a joining surface of a metal member formed of aluminum in a case shape to a joining surface of a resin member formed of polyphenylene sulfide resin in a shape that covers an opening or a through hole of the metal member , the method comprising the steps of:
a sputtering step of forming a metal film having a thickness of 0.05 μm or more and 1 μm or less on at least a part of the joining surface of the resin member by sputtering;
and then a joining step of joining a joining surface of the resin member and a joining surface of the metal member via a sealant.
前記スパッタリング工程において、前記金属膜の膜厚を0.05μm以上0.2μm以下に形成することを特徴とする請求項5に記載の接合方法。 The bonding method according to claim 5, characterized in that in the sputtering process, the metal film is formed to a thickness of 0.05 μm or more and 0.2 μm or less. 前記スパッタリング工程において、前記金属膜の成膜温度を30℃以上150℃以下にすることを特徴とする請求項5又は6に記載の接合方法。 The bonding method according to claim 5 or 6, characterized in that in the sputtering process, the deposition temperature of the metal film is set to 30°C or higher and 150°C or lower. 前記接合工程において、前記シール材として液状ガスケットを使用することを特徴とする請求項5乃至7のいずれかに記載の接合方法。 The joining method according to any one of claims 5 to 7, characterized in that a liquid gasket is used as the sealing material in the joining process. アルミニウムでケース状に形成された金属部材とシール材を介して接合するための接合面を有する樹脂部材の製造方法において、
ポリフェニレンサルファイド樹脂を前記金属部材の開口部又は貫通孔に被せられる形状に成形して前記接合面を有する前記樹脂部材を形成する成形工程と、
その後、前記接合面の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜をスパッタリングにより形成するスパッタリング工程と
を含むことを特徴とする樹脂部材の製造方法。
A method for manufacturing a resin member having a joining surface for joining, via a sealant, to a metal member formed in an aluminum case shape, comprising:
a molding step of forming the resin member having the joining surface by molding a polyphenylene sulfide resin into a shape that covers the opening or the through hole of the metal member ;
and then a sputtering step of forming a metal film having a thickness of 0.05 μm or more and 1 μm or less on at least a part of the joining surface by sputtering.
前記成形工程において、前記樹脂部材内に電子ユニットを収容するために前記樹脂部材をケース状に成形して、その開口縁部全周に亘って連続して前記接合面を形成し、
前記スパッタリング工程において、前記金属膜を前記接合面の全周に亘って連続して形成することを特徴とする請求項9に記載の樹脂部材の製造方法。
In the molding step, the resin member is molded into a case shape to accommodate an electronic unit in the resin member, and the joining surface is formed continuously around an entire periphery of an opening edge portion of the case.
10. The method for producing a resin member according to claim 9, wherein in the sputtering step, the metal film is formed continuously over the entire periphery of the joining surface.
アルミニウムでケース状に形成された金属部材とシール材を介して接合するための接合面を有する樹脂部材の製造方法において、
ポリフェニレンサルファイド樹脂で前記金属部材の開口部又は貫通孔に被せられる形状に成形され、前記接合面を有する前記樹脂部材を入手する工程と、
入手した前記樹脂部材の前記接合面の少なくとも一部に、膜厚0.05μm以上1μm以下の金属膜をスパッタリングにより形成するスパッタリング工程と
を含むことを特徴とする樹脂部材の製造方法。
A method for manufacturing a resin member having a joining surface for joining, via a sealant, to a metal member formed in an aluminum case shape, comprising:
obtaining a resin member molded from polyphenylene sulfide resin into a shape that covers the opening or through hole of the metal member, the resin member having the joining surface;
a sputtering step of forming a metal film having a thickness of 0.05 μm or more and 1 μm or less by sputtering on at least a part of the joining surface of the obtained resin member.
前記スパッタリング工程において、前記金属膜の成膜温度を30℃以上150℃以下にすることを特徴とする請求項9乃至11のいずれかに記載の樹脂部材の製造方法。 The method for manufacturing a resin member according to any one of claims 9 to 11, characterized in that in the sputtering process, the deposition temperature of the metal film is set to 30°C or higher and 150°C or lower.
JP2020170616A 2020-10-08 2020-10-08 Joining structure, joining method, and manufacturing method of case and resin member Active JP7624820B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020170616A JP7624820B2 (en) 2020-10-08 2020-10-08 Joining structure, joining method, and manufacturing method of case and resin member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020170616A JP7624820B2 (en) 2020-10-08 2020-10-08 Joining structure, joining method, and manufacturing method of case and resin member

Publications (2)

Publication Number Publication Date
JP2022062536A JP2022062536A (en) 2022-04-20
JP7624820B2 true JP7624820B2 (en) 2025-01-31

Family

ID=81210894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020170616A Active JP7624820B2 (en) 2020-10-08 2020-10-08 Joining structure, joining method, and manufacturing method of case and resin member

Country Status (1)

Country Link
JP (1) JP7624820B2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003042296A (en) 2001-07-27 2003-02-13 Suzutora:Kk Antistatic packing material
JP5278443B2 (en) 2009-01-23 2013-09-04 トヨタ自動車株式会社 Seal structure
JP2016508896A (en) 2012-12-31 2016-03-24 サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ Metallization and surface coating solutions on glass filled high performance amorphous polymer compositions

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003042296A (en) 2001-07-27 2003-02-13 Suzutora:Kk Antistatic packing material
JP5278443B2 (en) 2009-01-23 2013-09-04 トヨタ自動車株式会社 Seal structure
JP2016508896A (en) 2012-12-31 2016-03-24 サビック グローバル テクノロジーズ ベスローテン フェンノートシャップ Metallization and surface coating solutions on glass filled high performance amorphous polymer compositions

Also Published As

Publication number Publication date
JP2022062536A (en) 2022-04-20

Similar Documents

Publication Publication Date Title
CA2243213C (en) Electrically screening housing
JP4780718B2 (en) Package for integrated circuit die
JPH03197129A (en) Multilayer material containing flexible graphite mechanically, electrically and thermally strengthened by means of metal
US12096569B2 (en) Manufacturing method of insulated metal substrate
JPWO2000068992A1 (en) Semiconductor Devices
WO2005069462A1 (en) Electric device for junction and its manufacturing method
JP7624820B2 (en) Joining structure, joining method, and manufacturing method of case and resin member
JPH0370626A (en) Method for mounting molding and gasket to glass plate
US20040081532A1 (en) Metal plane jointing structure and making method thereof
KR20160134685A (en) Electronic control module and method for producing the same
JPH0757853A (en) Manufacture of pane provided with element for electric connection, and equipment therefor
JP2010026307A (en) Liquid crystal display element and method of manufacturing the same
DK88683A (en) PROCEDURE FOR PREPARING A DOUBLE LAYER
CN116017841A (en) Circuit board, preparation method thereof and display panel
EP3201945B1 (en) Method for manufacturing a cover lid with selective and edge metallization
JPH06224241A (en) Molding method for resin-sealed circuit device
JP2000100302A (en) High frequency relay
JP2000040759A (en) Semiconductor device and method of manufacturing semiconductor device
JPH0249757Y2 (en)
KR200206223Y1 (en) Baking material for aluminium welding aluminium surface layer formed
JPS6118841B2 (en)
EP0587296B1 (en) Tab tape and method for producing it
JP2003332480A (en) Substrate for ic
JPH0747078Y2 (en) Vacuum insulation container made of synthetic resin
JP2677614B2 (en) Microwave integrated circuit device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230809

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20240821

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20240909

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20241011

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250110

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250121

R150 Certificate of patent or registration of utility model

Ref document number: 7624820

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150