JP7625385B2 - Light direction control element, method of manufacturing light direction control element, and image pickup element - Google Patents

Description

This disclosure relates to a beam direction control element, a method for manufacturing a beam direction control element, and an imaging element.

Light direction control elements that control the direction of transmitted light are known. For example, Patent Document 1 discloses a collimating screen that includes a substrate, a plurality of light-transmitting columns formed in a predetermined pattern on the substrate, and a light-absorbing material disposed between the light-transmitting columns. In the collimating screen of Patent Document 1, the light-absorbing material absorbs incident light with a large angle of incidence, so that the emission angle of the light emitted from the collimating screen can be controlled within a predetermined range.

US Patent Application Publication No. 2007/0139765

In Patent Document 1, after forming light-transmitting columns with a high aspect ratio in a predetermined pattern, a light-absorbing material is filled between the light-transmitting columns. When light-transmitting columns are formed on a substrate, the aspect ratio of the light-transmitting columns is high, so the light-transmitting columns formed on the periphery of the predetermined pattern may tilt toward the outside of the predetermined pattern.

The present disclosure has been made in consideration of the above circumstances, and aims to provide a light direction control element in which the inclination of the light-transmitting layer is suppressed, a method for manufacturing a light direction control element, and an imaging element.

In order to achieve the above object, a light direction control element according to a first aspect comprises:
A substrate;
A plurality of light-transmitting layers arranged on a main surface of the substrate;
a light absorbing layer disposed between the light transmitting layers;
a plurality of tilt prevention layers provided on the main surface of the base and arranged on the outer periphery of a region in which the plurality of light-transmitting layers are arranged ;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.

A method for manufacturing a beam direction control element according to a second aspect includes the steps of:
A step of laminating a light-transmitting material having photosensitivity on a main surface of a substrate;
forming a plurality of light-transmitting layers arranged from the light-transmitting material and a plurality of tilt prevention layers arranged on an outer periphery of an area in which the plurality of light-transmitting layers are arranged;
forming a light absorbing layer between the plurality of light transmitting layers ;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.

An imaging element according to a third aspect comprises:
A substrate;
A plurality of light receiving units arranged on a main surface of the substrate, the light receiving units receiving light from an imaging target;
a light-transmitting layer disposed on each of the light-receiving portions;
a light absorbing layer disposed between the light transmitting layers;
a plurality of tilt prevention layers provided on the main surface of the substrate and arranged on the outer periphery of a region in which the light-transmitting layer is arranged ;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.

The tilt prevention layer is placed around the outer periphery of the area in which the light-transmitting layer is placed, preventing the light-transmitting layer from tilting.

FIG. 2 is a schematic diagram showing the top surface of a beam direction control element according to the first embodiment. 2 is a cross-sectional view of the beam direction control element shown in FIG. 1 taken along the line AA. 5A to 5C are schematic diagrams for explaining the angular distribution of transmitted light according to the first embodiment. 4 is a flowchart showing a method for manufacturing a beam direction control element according to the first embodiment. FIG. 2 is a schematic diagram showing laminated light-transmitting materials having photosensitivity according to the first embodiment. FIG. 2 is a schematic diagram showing a formed light transmitting layer and an anti-tilt layer according to the first embodiment. FIG. 11 is a schematic diagram showing the top surface of a beam direction control element according to a second embodiment. FIG. 11 is a schematic diagram showing the top surface of a beam direction control element according to a third embodiment. FIG. 11 is a schematic diagram showing the top surface of a beam direction control element according to a fourth embodiment. FIG. 13 is a schematic diagram showing the top surface of a beam direction control element according to embodiment 5. FIG. 13 is a schematic diagram showing a beam direction control element according to a sixth embodiment. FIG. 13 is a schematic diagram showing an anti-tilt layer according to a modified example. FIG. 13 is a schematic diagram showing an anti-tilt layer according to a modified example. FIG. 13 is a schematic diagram showing a beam direction control element according to a modified example. 1 is a photograph showing a light-transmitting layer in a central portion according to Example 1. 13 is a photograph showing a light-transmitting layer at an end in the +X direction according to Example 1. 13 is a photograph showing a light-transmitting layer at an end in the −X direction according to Example 1. 13 is a photograph showing a light-transmitting layer in the center according to a comparative example. 13 is a photograph showing a light-transmitting layer at the +X direction end according to a comparative example. 13 is a photograph showing a light-transmitting layer at the −X direction end according to a comparative example. 13 is a photograph showing a light-transmitting layer at the +X direction end according to Example 2. 13 is a photograph showing a light-transmitting layer at the +X direction end according to Example 3. 13 is a photograph showing a light-transmitting layer and an anti-tilt layer according to Example 4.

The light direction control element according to the embodiment will be described below with reference to the drawings.

<Embodiment 1>
With reference to FIG. 1 to FIG. 6, the beam direction control element 100 according to this embodiment will be described. As shown in FIG. 1 and FIG. 2, the beam direction control element 100 includes a base 10, a light-transmitting layer 20, a light-absorbing layer 30, and an anti-tilt layer 40. In this embodiment, the base 10 is a substrate having light-transmitting properties. The light-transmitting layer 20 is arranged in a predetermined pattern on the main surface 12 of the base 10. The light-absorbing layer 30 is disposed between the light-transmitting layers 20. The anti-tilt layer 40 is disposed on the outer periphery of the predetermined pattern of the light-transmitting layer 20. For ease of understanding, in this specification, the right direction (right direction of the paper) of the beam direction control element 100 in FIG. 1 is described as the +X direction, the upward direction (upward direction of the paper) is described as the +Y direction, and the direction perpendicular to the +X direction and the +Y direction (forward direction of the paper) is described as the +Z direction.

The beam direction control element 100 is provided on the display surface of a display device (e.g., a liquid crystal display), the light receiving surface of an image sensor, etc. The beam direction control element 100 controls the angular distribution of the transmitted light (i.e., the light emitted from the beam direction control element 100). Specifically, as shown in FIG. 3, the incident light L1 having a large incident angle θ1 among the incident light to the beam direction control element 100 is absorbed by the light absorbing layer 30. On the other hand, the incident light L2 having a small incident angle θ2 among the incident light to the beam direction control element 100 is not absorbed by the light absorbing layer 30 and transmits through the beam direction control element 100 (translucent layer 20). This controls the angular distribution of the light transmitted through the beam direction control element 100. The angular distribution of the transmitted light can be controlled by the height H, width D1, and refractive index of the translucent layer 20.

Returning to FIG. 1, the substrate 10 of the beam direction control element 100 transmits visible light. The substrate 10 is, for example, a flat glass substrate. A light transmitting layer 20, a light absorbing layer 30, and an anti-tilt layer 40 are formed on the main surface 12 of the substrate 10, as shown in FIG. 2.

The light-transmitting layer 20 of the light-direction control element 100 transmits visible light. As shown in Figs. 1 and 2, the light-transmitting layer 20 is formed in a columnar shape from a light-transmitting material having photosensitivity on the main surface 12 of the substrate 10. The aspect ratio (height H/width D1) of the columnar light-transmitting layer 20 is preferably 1 or more, and more preferably 8 or more. The light-transmitting layer 20 is arranged in a predetermined pattern on the main surface 12 of the substrate 10. In this embodiment, the light-transmitting layer 20 is formed in a square column shape from a chemically amplified photoresist: SU-8 (product name, Nippon Kayaku Co., Ltd.), and is arranged in a matrix.

The light absorbing layer 30 of the light direction control element 100 is formed on the main surface 12 of the substrate 10. As shown in Figs. 1 and 2, the light absorbing layer 30 is disposed between the light transmitting layers 20. In this embodiment, the light absorbing layers 30 and the light transmitting layers 20 are arranged alternately. The light absorbing layer 30 is formed from, for example, a black curable resin to the same height as the light transmitting layers 20.

The tilt prevention layer 40 of the beam direction control element 100 suppresses the light transmitting layer 20 from tilting toward the outside of a predetermined pattern. The tilt prevention layer 40 is formed on the main surface 12 of the base 10, and is disposed on the outer periphery of the region T in which the light transmitting layer 20 is disposed. In this specification, the outer periphery of the region T means the periphery around the outside of the region T.
In this embodiment, the tilt prevention layer 40 is made of a light-sensitive transparent material (SU-8) and is formed to the same height as the light-transmitting layer 20. As shown in Fig. 1, the tilt prevention layer 40 is formed in a frame shape on the outer periphery of the region T in which the light-transmitting layer 20 is disposed. The distance M between the tilt prevention layer 40 and the region T is, for example, 150 µm.

The width D2 of the tilt prevention layer 40 is preferably wider than the width D1 of the light-transmitting layer 20. This allows the tilt prevention layer 40 to better suppress tilting of the light-transmitting layer 20. In this specification, the width D1 of the light-transmitting layer 20 refers to the width (distance) between the surface 20a facing the tilt prevention layer 40 and the surface 20b opposite the surface 20a facing the tilt prevention layer 40. In addition, the width D2 of the tilt prevention layer 40 refers to the width (distance) between the surface 40a facing the light-transmitting layer 20 and the surface 40b opposite the surface 40a facing the light-transmitting layer 20.

Next, referring to FIG. 4, a method for manufacturing the beam direction control element 100 will be described. FIG. 4 is a flowchart showing the method for manufacturing the beam direction control element 100. The method for manufacturing the beam direction control element 100 includes a step of stacking a light-sensitive light-transmitting material 22 (hereinafter referred to as light-transmitting material 22) on the main surface 12 of the substrate 10 (step S10), a step of forming from the light-transmitting material 22 a plurality of arranged light-transmitting layers 20 and an anti-tilt layer 40 arranged on the periphery of the region T in which the plurality of light-transmitting layers 20 are arranged (step S20), and a step of forming a light absorbing layer 30 between the plurality of light-transmitting layers 20 (step S30).

In step S10, first, the base 10 and the light-transmitting material 22 that forms the light-transmitting layer 20 and the tilt prevention layer 40 are prepared. In this embodiment, a flat glass substrate is prepared as the base 10, and SU-8 is prepared as the light-transmitting material 22. Next, as shown in FIG. 5, the light-transmitting material 22 is laminated on the main surface 12 of the base 10. The light-transmitting material 22 is laminated on the main surface 12 by spin coating, screen printing, spray coating, wire coater, or the like. The thickness of the light-transmitting material 22, i.e., the height H of the light-transmitting layer 20, is, for example, 10 μm to 600 μm.

As shown in FIG. 4, step S20 includes a process of pre-baking the laminated light-transmitting material 22 (step S22), a process of exposing the light-transmitting material 22 to a predetermined pattern of the light-transmitting layer 20 and the tilt prevention layer 40 (step S24), a process of developing the exposed light-transmitting material 22 (step S26), and a process of post-baking the developed light-transmitting material 22 (step S28).

In step S22, the laminated light-transmitting material 22 is pre-baked (heated) to remove the solvent contained in the laminated light-transmitting material 22. The heating temperature is, for example, 95°C.

In step S24, the light-transmitting material 22 is exposed to the predetermined pattern of the light-transmitting layer 20 and the tilt prevention layer 40 using a mask having an opening pattern of the light-transmitting layer 20 and the tilt prevention layer 40. The exposure light is, for example, ultraviolet light with a wavelength of 365 nm.

In step S26, the exposed light-transmitting material 22 is developed with a developer. The development method may be a shower method or a dip method. The developability of the light-transmitting material 22 is improved by rocking the substrate 10. After development, the developed light-transmitting material 22 is rinsed with a rinse liquid. The rinse method is the same as the development method.

In step S28, post-baking (heating) is performed to promote cross-linking of the light-transmitting material 22. The heating temperature is, for example, 150°C.
6, a plurality of light-transmitting layers 20 arranged in a predetermined pattern and an anti-tilt layer 40 arranged on the outer periphery of the region T in which the light-transmitting layers 20 are arranged are formed. In this embodiment, the anti-tilt layer 40 is formed together with the light-transmitting layer 20, so that tilt of the light-transmitting layer 20 can be suppressed.

In step S30, black curable resin is filled between the light-transmitting layers 20, and then the black curable resin is cured to form the light-absorbing layer 30 between the light-transmitting layers 20. In this manner, the light-direction control element 100 can be manufactured.

As described above, the tilt prevention layer 40 is disposed on the outer periphery of the region T in which the light-transmitting layer 20 is disposed, so that the light-direction control element 100 can suppress the tilt of the light-transmitting layer 20. Furthermore, the manufacturing method of the light-direction control element 100 forms the tilt prevention layer 40 disposed on the outer periphery of the region T in which the light-transmitting layer 20 is disposed together with the light-transmitting layer 20, so that the tilt of the light-transmitting layer 20 can be suppressed.

<Embodiment 2>
Although the tilt prevention layer 40 in the first embodiment is formed in a frame shape, the shape of the tilt prevention layer 40 is arbitrary.

As shown in FIG. 7, the beam direction control element 100 of this embodiment has anti-tilt layers 41-48 divided into multiple parts. Each of the anti-tilt layers 41-48 is formed in a rectangular shape. The anti-tilt layers 41-48 are arranged on the outer periphery of region T, surrounding region T. The other configurations are the same as those of the beam direction control element 100 of embodiment 1.

In the light direction control element 100 of this embodiment, the tilt prevention layers 41-48 are also arranged on the outer periphery of the region T in which the light transmitting layer 20 is arranged, so tilting of the light transmitting layer 20 can be suppressed. In addition, in the manufacture of the light direction control element 100, circulation of the developer can be facilitated, improving developability. Furthermore, the adhesion of the light transmitting layer 20 to the base 10 can be improved.

<Embodiment 3>
In the first embodiment, one frame-shaped anti-tilt layer 40 is disposed on the outer periphery of the region T, but a plurality of anti-tilt layers 50 may be disposed opposite the light-transmitting layer 20 .

The beam direction control element 100 of this embodiment has a plurality of anti-tilt layers 50 as shown in FIG. 8. The plurality of anti-tilt layers 50 are arranged on the periphery of the region T in which the light-transmitting layer 20 is arranged, and surround the region T. Each of the anti-tilt layers 50 faces each of the light-transmitting layers 20 arranged on the outermost periphery in the region T. The other configurations are the same as those of the beam direction control element 100 of the first embodiment. Note that, in this embodiment, the width D2 of the anti-tilt layer 50 (the width between the surface 50a facing the light-transmitting layer 20 and the surface 50b opposite the surface 50a facing the light-transmitting layer 20) is preferably wider than the width D1 of the light-transmitting layer 20.

In the light direction control element 100 of this embodiment, the tilt prevention layer 50 is also arranged on the outer periphery of the region T in which the light-transmitting layer 20 is arranged, so that tilt of the light-transmitting layer 20 can be suppressed.

<Embodiment 4>
In embodiment 3, multiple anti-tilt layers 50 are arranged opposite the light-transmitting layer 20, but if the region T in which the light-transmitting layer 20 is arranged is polygonal in shape, the anti-tilt layer 52 may be arranged in a position opposite a corner 62 of the region T.

In the beam direction control element 100 of this embodiment, as shown in FIG. 9, a plurality of light-transmitting layers 20 are arranged in a matrix in a rectangular region T. Each of the tilt prevention layers 50 is arranged opposite the light-transmitting layers 20 arranged at the outermost periphery in region T, similar to the tilt prevention layer 50 of embodiment 3. Furthermore, the tilt prevention layer 52 is arranged at a position opposite a corner 62 of region T on the periphery of region T. The other configurations are the same as those of the beam direction control element 100 of embodiment 3.

In this embodiment, the tilt prevention layer 50 is also disposed on the outer periphery of the region T in which the light-transmitting layer 20 is disposed, so tilting of the light-transmitting layer 20 can be suppressed. In addition, the tilt prevention layer 52 faces the corner 62 of the region T, so tilting of the light-transmitting layer 20 disposed near the corner 62 of the region T can be further suppressed.

<Embodiment 5>
In the third embodiment, a plurality of anti-tilt layers 50 are disposed opposite the light-transmitting layer 20, but the anti-tilt layers 50 may be connected to each other.

In the beam direction control element 100 of this embodiment, each of the tilt prevention layers 50 is arranged opposite each of the light-transmitting layers 20 arranged at the outermost periphery in the region T, similar to the tilt prevention layers 50 of embodiment 3. Furthermore, as shown in FIG. 10, the tilt prevention layers 50 are connected to each other at the end opposite the light-transmitting layers 20. The other configurations are the same as those of the beam direction control element 100 of embodiment 3.

In this embodiment, the tilt prevention layer 50 is also arranged on the outer periphery of the region T in which the light-transmitting layer 20 is arranged, so that tilt of the light-transmitting layer 20 can be suppressed. Furthermore, since the tilt prevention layers 50 are connected to each other, tilt of the tilt prevention layers 50 can be suppressed.

<Embodiment 6>
In the beam direction control element 100 of the first to fifth embodiments, the base 10 is a substrate having light-transmitting properties, but the base 10 is not limited to a substrate having light-transmitting properties.

In this embodiment, the base 10 is an imaging element. The imaging element is, for example, a CCD (Charge Coupled Device) image sensor. As shown in FIG. 11, the base 10 has a substrate 10a and a plurality of light receiving sections 14. The plurality of light receiving sections 14 are arranged on the main surface 12 and receive light from the imaging target.

In this embodiment, the light-transmitting layer 20 is located on the light-receiving portion 14 of the substrate 10. The light-absorbing layer 30 is located between the light-transmitting layers 20. The other configurations of the light-direction control element 100 of this embodiment are the same as those of the light-direction control element 100 of the first embodiment.

In this embodiment, the light absorbing layer 30 removes light incident on the light receiving section 14 from unnecessary angles, so that a clear image can be captured. Also in this embodiment, the tilt prevention layer 40 is arranged on the periphery of the region T in which the light transmitting layer 20 is arranged, so that the tilt of the light transmitting layer 20 can be suppressed. The light direction control element 100 of this embodiment is also represented as an imaging element, for example, including a substrate 10a, a plurality of light receiving sections 14 arranged on the main surface 12 of the substrate 10a and receiving light from an imaging target, a light transmitting layer 20 arranged on the light receiving section 14, a light absorbing layer 30 arranged between the light transmitting layers 20, and a tilt prevention layer 40 arranged on the periphery of the region T in which the light transmitting layer 20 is arranged.

<Modification>
Although the embodiments have been described above, the present disclosure can be modified in various ways without departing from the gist of the present disclosure.

The base 10 in the first to fifth embodiments is a flat glass substrate, but the base 10 may be made of a translucent resin.

In the first to fifth embodiments, the light-transmitting layers 20 are arranged in a matrix, but the arrangement of the light-transmitting layers 20 is arbitrary. The light-transmitting layers 20 may be arranged, for example, in a staggered pattern. In the sixth embodiment, the light-transmitting layers 20 are arranged in accordance with the arrangement of the light-receiving sections 14. In the first to sixth embodiments, the light-transmitting layers 20 have a rectangular prism shape, but the shape of the light-transmitting layers 20 is arbitrary. The shape of the light-transmitting layers 20 may be, for example, a cylinder.

The shape of the region T in which the light-transmitting layer 20 is disposed may be any shape. Although the region T in the first and second embodiments is rectangular, the region T may be polygonal, circular, etc.

The light-transmitting material 22 that forms the light-transmitting layer 20 and the tilt prevention layer 40 is not limited to SU-8, but may be any material that has photosensitivity and light-transmitting properties. The light-transmitting material 22 may be exposed by proximity exposure in which a gap is provided between the light-transmitting material 22 and a mask, or by contact exposure in which the light-transmitting material 22 and the mask are in contact.

In the process of exposing the light-transmitting material 22 to a predetermined pattern of the light-transmitting layer 20 and the tilt prevention layer 40 (step S24), after the light-transmitting material 22 is exposed, a PEB (Post Exposure Bake) process may be performed.

The tilt prevention layers 40, 41 to 48, 50, and 52 are arranged around the outer periphery of region T, but it is sufficient that the tilt prevention layers are arranged around the outer periphery of region T. As shown in FIG. 12, two opposing tilt prevention layers 54 and 55 may be arranged around the outer periphery of region T, sandwiching region T therebetween.

The tilt prevention layer 52 of the fourth embodiment is disposed opposite a corner 62 of the rectangular region T. If the region T has a polygonal shape, the tilt prevention layer 52 may be disposed opposite a corner of the polygonal shape. In addition, the tilt prevention layers 50 and 52 of the fourth embodiment may be connected to each other as shown in FIG. 13.

The black curable resin that forms the light absorbing layer may be a thermosetting resin or a UV (Ultraviolet) curable resin.

In the sixth embodiment, the light-transmitting layer 20 is formed directly on the light-receiving section 14, but other members may be provided between the light-transmitting layer 20 and the light-receiving section 14. For example, a protective layer that protects the light-receiving section 14 may be provided directly on the light-receiving section 14, and the light-transmitting layer 20 may be provided on the protective layer. Furthermore, the imaging element is not limited to a CCD image sensor. The imaging element may be, for example, a CMOS (Complementary Metal Oxide Semiconductor) image sensor.

The light-transmitting layer 20 of embodiment 6 may be disposed on at least a portion of the light-receiving section 14. The light-transmitting layer 20 may be disposed on a portion of the light-receiving section 14 as shown in FIG. 14. In addition, the light-transmitting layer 20 may be disposed in a position overlapping a portion of the light-receiving section 14 in a plan view.

Although the above describes a preferred embodiment, the present disclosure is not limited to the specific embodiment, and includes the inventions described in the claims and their equivalents.

The present disclosure will be explained in more detail with reference to the following examples, but the present disclosure is not limited to these examples.

Example 1
In this example, the base 10 was a flat glass substrate, and the light-transmitting layer 20 and the tilt prevention layer 40 of the first embodiment were formed on the main surface 12 of the base 10. In this example, the size of the region T in which the light-transmitting layer 20 was arranged was 30 mm x 30 mm, and the shape of the light-transmitting layer 20 was a regular square prism. The width D1 of the light-transmitting layer 20 was 50 μm, the height H of the light-transmitting layer 20 was 400 μm, and the arrangement pitch of the light-transmitting layer 20 was 100 μm. In addition, the width D2 of the tilt prevention layer 40 was 250 μm, the height of the tilt prevention layer 40 was 400 μm, and the interval M between the tilt prevention layer 40 and the region T was 150 μm.
According to steps S10 and S20 (steps S22 to S28) in the method for manufacturing beam direction control element 100, light transmitting layer 20 and tilt prevention layer 40 were formed.

Furthermore, as a comparative example not having an anti-tilt layer 40, only a light-transmitting layer 20 similar to that of this embodiment was formed on the main surface 12 of the substrate 10.

Figures 15, 16, and 17 respectively show the central light-transmitting layer 20, the light-transmitting layer 20 at the end in the +X direction, and the light-transmitting layer 20 at the end in the -X direction in region T formed in this embodiment. Also, Figures 18, 19, and 20 respectively show the central light-transmitting layer 20, the light-transmitting layer 20 at the end in the +X direction, and the light-transmitting layer 20 at the end in the -X direction in region T formed in the comparative example. Note that the chipped portions of the light-transmitting layer 20 in Figures 15 to 20 are chips that occurred during breaking to prepare samples for photography.

As shown in Figures 15 to 17, the light-transmitting layer 20 formed in this embodiment is not inclined. On the other hand, as shown in Figures 19 and 20, the light-transmitting layer 20 formed in the comparative example is inclined toward the outside of region T at the -X direction end and the +X direction end.

As described above, the tilt prevention layer 40 is disposed on the outer periphery of the region T in which the light-transmitting layer 20 is disposed, thereby suppressing tilt of the light-transmitting layer 20.

<Examples 2 and 3>
As in Example 1, the light-transmitting layer 20 and the tilt prevention layer 40 of the first embodiment were formed on the main surface 12 of the base 10. The height H of the light-transmitting layer 20 and the height of the tilt prevention layer 40 were set to 350 μm, and the width D2 of the tilt prevention layer 40 was set to 250 μm (Example 2) and 450 μm (Example 3). The other configurations were the same as in Example 1.

Figure 21 shows the light-transmitting layer 20 at the end in the +X direction in Example 2, and Figure 22 shows the light-transmitting layer 20 at the end in the +X direction in Example 3. As shown in Figures 21 and 22, the light-transmitting layer 20 formed in Examples 2 and 3 is not tilted. Therefore, by arranging the tilt prevention layer 40 on the outer periphery of region T, tilting of the light-transmitting layer 20 can be suppressed.

Example 4
In this example, the base 10 was a flat glass substrate, and the light-transmitting layer 20 and the tilt prevention layers 50 and 52 of the fourth embodiment were formed on the main surface 12 of the base 10. In this example, the size of the region T in which the light-transmitting layer 20 was arranged was 30 mm x 30 mm, and the shape of the light-transmitting layer 20 was a regular square prism. The width D1 of the light-transmitting layer 20 was 50 μm, the height H of the light-transmitting layer 20 was 400 μm, and the arrangement pitch of the light-transmitting layer 20 was 100 μm. In addition, the width D2 of the tilt prevention layers 50 and 52 was 250 μm, the height of the tilt prevention layers 50 and 52 was 400 μm, and the interval M between the tilt prevention layer 50 and the region T was 50 μm. The light-transmitting layer 20 and the tilt prevention layers 50 and 52 were formed according to steps S10 and S20 in the manufacturing method of the light-direction control element 100.

Figure 23 shows the light-transmitting layer 20 and anti-tilt layers 50, 52 in this embodiment. As shown in Figure 23, the light-transmitting layer 20 is not tilted.

As described above, each of the tilt prevention layers 50 arranged on the outer periphery of region T faces each of the light-transmitting layers 20 arranged on the outermost periphery of region T, so tilting of the light-transmitting layers 20 can be suppressed. In addition, since the tilt prevention layer 52 faces the corner 62 of region T, tilting of the light-transmitting layers 20 arranged near the corner 62 can be further suppressed.

10 Base, 10a Substrate, 12 Main surface, 14 Light receiving section, 20 Light-transmitting layer, 20a Surface facing the tilt prevention layer, 20b Surface opposite to the surface facing the tilt prevention layer, 22 Light-transmitting material having photosensitivity, 30 Light absorption layer, 40, 41, 42, 43, 44, 45, 46, 47, 48, 50, 52, 54, 55 Tilt prevention layer, 40a, 50a Surface facing the light-transmitting layer, 40b, 50b Surface opposite to the surface facing the light-transmitting layer, 62 Corner, 100 Light-direction control element, D1, D2 Width, H Height, M Interval, T Area, L1, L2 Incident light, θ1, θ2 Incident angle

Claims (13)

A substrate;
A plurality of light-transmitting layers arranged on a main surface of the substrate;
a light absorbing layer disposed between the light transmitting layers;
a plurality of tilt prevention layers provided on the main surface of the base and arranged on the outer periphery of a region in which the plurality of light-transmitting layers are arranged;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.
Beam steering element. The plurality of tilt prevention layers are connected to each other.
2. A beam direction control element according to claim 1. The plurality of anti-tilt layers surround an area in which the plurality of light-transmitting layers are disposed.
3. A beam direction control element according to claim 1 or 2. The width of the tilt prevention layer is wider than the width of the light transmitting layer.
A beam direction control element according to any one of claims 1 to 3. The light-transmitting layer is columnar.
5. A beam direction control element according to claim 1. The base is a substrate having optical transparency.
6. A beam direction control element according to any one of claims 1 to 5. The substrate is an image sensor.
6. A beam direction control element according to any one of claims 1 to 5. The light absorbing layer is disposed between the light transmitting layer and the tilt prevention layer and between the plurality of tilt prevention layers.
A beam direction control element according to any one of claims 1 to 7. A step of laminating a light-transmitting material having photosensitivity on a main surface of a substrate;
forming a plurality of light-transmitting layers arranged from the light-transmitting material and a plurality of tilt prevention layers arranged on an outer periphery of an area in which the plurality of light-transmitting layers are arranged;
forming a light absorbing layer between the plurality of light transmitting layers;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.
A method for manufacturing a beam direction control element. In the step of forming a light absorbing layer between the plurality of light transmitting layers, a light absorbing layer is formed between the light transmitting layer and the tilt prevention layer and between the plurality of tilt prevention layers.
A method for manufacturing a beam direction control element according to claim 9. A substrate;
A plurality of light receiving units arranged on a main surface of the substrate, the light receiving units receiving light from an imaging target;
a light-transmitting layer disposed on each of the light-receiving portions;
a light absorbing layer disposed between the light transmitting layers;
a plurality of tilt prevention layers provided on the main surface of the substrate and arranged on the outer periphery of a region in which the light-transmitting layer is arranged;
Each of the tilt prevention layers faces each of the light transmitting layers arranged on the outermost periphery in a one-to-one relationship.
Image sensor. The light-transmitting layer is disposed at a position overlapping a part of the light-receiving portion.
The imaging device according to claim 11 . The light absorbing layer is disposed between the light transmitting layer and the tilt prevention layer and between the plurality of tilt prevention layers.
The imaging device according to claim 11 or 12.

Images