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JP7628840B2 - Vacuum device manufacturing method - Google Patents
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JP7628840B2 - Vacuum device manufacturing method - Google Patents

Vacuum device manufacturing method Download PDF

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JP7628840B2
JP7628840B2 JP2021033296A JP2021033296A JP7628840B2 JP 7628840 B2 JP7628840 B2 JP 7628840B2 JP 2021033296 A JP2021033296 A JP 2021033296A JP 2021033296 A JP2021033296 A JP 2021033296A JP 7628840 B2 JP7628840 B2 JP 7628840B2
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vacuum
vacuum device
housing
heating
chamber
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JP2022134266A (en
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佳宏 津村
伸紀 大島
正志 関根
康秀 吉川
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Azbil Corp
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Description

本発明は、真空室を有する真空装置の製造方法、及び、真空装置に関する。 The present invention relates to a method for manufacturing a vacuum device having a vacuum chamber, and to a vacuum device.

真空装置の真空室は、例えば、特許文献1に開示されているような方法で形成される。まず、真空室(基準圧力室7)となる部屋に連通するパイプ(真空引き用パイプ9)を介して当該部屋を真空引きする。その後、パイプの一部を加圧変形させ、加圧変形させた部分を抵抗溶接により溶接して封止することで、真空室を形成する。 The vacuum chamber of the vacuum device is formed, for example, by a method such as that disclosed in Patent Document 1. First, a vacuum is drawn through a pipe (vacuum drawing pipe 9) that communicates with a room that will become the vacuum chamber (reference pressure chamber 7). After that, a part of the pipe is pressurized and deformed, and the pressurized and deformed part is welded and sealed by resistance welding to form the vacuum chamber.

特開昭63-133032号公報Japanese Unexamined Patent Publication No. 63-133032

特許文献1が開示する従来の真空室の形成では、真空引きのあとにパイプを物理的に変形させて封止を行う必要がある。従って、真空室の形成に手間がかかる。 In the conventional method of forming a vacuum chamber disclosed in Patent Document 1, it is necessary to physically deform the pipe after drawing a vacuum to seal it. Therefore, forming the vacuum chamber is time-consuming.

本発明は、真空室を容易に形成できるようにすることを課題とする。 The objective of the present invention is to make it possible to easily form a vacuum chamber.

上記課題を解決するため、本発明の第1の観点に係る真空装置の製造方法は、真空室となる部屋を内部に有する筐体であり、前記部屋と前記筐体の外部とを連通させる貫通孔を有する筐体と、前記貫通孔に配置され、前記部屋と前記筐体の前記外部とを連通させる連通路を有する部材と、を備える、真空室形成前の真空装置を形成する第1ステップと、前記真空装置を収容した真空加熱炉内の気体を排気することで前記部屋内の気体を前記部屋から前記連通路を介して排気し、前記真空加熱炉内で前記部材を加熱して軟化させることで前記部材をその自重により変形させて前記貫通孔を封止し、これにより前記真空室を形成する第2ステップと、を有する。 In order to solve the above problem, the manufacturing method of a vacuum device according to the first aspect of the present invention includes a first step of forming a vacuum device before forming a vacuum chamber, the vacuum device including a housing having a chamber therein that serves as a vacuum chamber, the housing having a through hole that connects the chamber to the outside of the housing, and a member that is disposed in the through hole and has a communication passage that connects the chamber to the outside of the housing; and a second step of evacuating gas from a vacuum heating furnace that houses the vacuum device to evacuate the gas from the chamber through the communication passage, heating and softening the member in the vacuum heating furnace to deform the member under its own weight and seal the through hole, thereby forming the vacuum chamber.

前記第1ステップで形成される前記真空装置は、加熱されることで活性化するゲッターを前記部屋内に備え、前記第2ステップでは、前記部材が変形して前記貫通孔を封止したあとも前記真空加熱炉内で前記真空装置を加熱して前記ゲッターを活性化させる、ようにしてもよい。 The vacuum device formed in the first step may include a getter in the chamber that is activated by heating, and in the second step, the vacuum device may be heated in the vacuum heating furnace to activate the getter even after the member has deformed to seal the through-hole.

前記第2ステップでは、前記真空装置を第1加熱温度で加熱し、前記部材を軟化及び変形させ、その後、前記部材の温度を軟化点よりも低い温度とする第2加熱温度で前記真空装置を加熱して前記ゲッターを活性化させる、ようにしてもよい。 In the second step, the vacuum device may be heated at a first heating temperature to soften and deform the member, and then the vacuum device may be heated at a second heating temperature that brings the temperature of the member to a temperature lower than the softening point, thereby activating the getter.

前記部材は、軟化点とガラス転移点とを有する材料により形成されており、前記第2加熱温度は、前記部材の温度を前記ガラス転移点よりも高く前記軟化点よりも低い温度に加熱する温度である、ようにしてもよい。 The member may be formed of a material having a softening point and a glass transition point, and the second heating temperature may be a temperature that heats the member to a temperature higher than the glass transition point and lower than the softening point.

前記第2ステップでは、前記部材を変形させる加熱の前に、前記真空加熱炉内で当該加熱の際の加熱温度よりも低い加熱温度で前記真空装置を加熱することで前記部屋内を脱ガスする、ようにしてもよい。 In the second step, prior to the heating that deforms the member, the vacuum device may be heated in the vacuum heating furnace at a heating temperature that is lower than the heating temperature during the heating, thereby degassing the chamber.

前記貫通孔は、前記筐体の前記外部側に配置された第1部分と、前記筐体の前記部屋側に位置して第1部分と連通し、第1部分の中心軸方向からみて第1部分よりも小さい第2部分と、を備え、前記第1部分の内壁にテーパーが設けられている、ように構成されてもよい。 The through hole may be configured to include a first portion disposed on the exterior side of the housing, and a second portion located on the room side of the housing, communicating with the first portion, and smaller than the first portion as viewed in the direction of the central axis of the first portion, and the inner wall of the first portion may be tapered.

前記真空装置は、前記真空室の気圧と測定対象の気圧との差圧を検出する圧力センサである、ようにしてもよい。 The vacuum device may be a pressure sensor that detects the pressure difference between the air pressure in the vacuum chamber and the air pressure to be measured.

本発明の第2の観点に係る真空装置は、真空室が形成される前の真空装置であって、前記真空室となる部屋を内部に有する筐体であり、前記部屋と前記筐体の外部とを連通させる貫通孔を有する筐体と、前記貫通孔に配置され、前記部屋と前記筐体の前記外部とを連通させる連通路を有し、加熱されることで自重により変形して前記貫通孔を封止するように形成された部材と、を備える。 The vacuum device according to the second aspect of the present invention is a vacuum device before a vacuum chamber is formed, and is a housing having a room inside that will become the vacuum chamber, the housing having a through hole that connects the room to the outside of the housing, and a member that is disposed in the through hole, has a communication passage that connects the room to the outside of the housing, and is formed so that it deforms under its own weight when heated to seal the through hole.

本発明によれば、真空室が容易に形成される。 The present invention makes it easy to form a vacuum chamber.

図1は、本発明の実施の形態に係る真空装置の製造方法の流れ図である。FIG. 1 is a flow chart of a method for manufacturing a vacuum device according to an embodiment of the present invention. 図2は、真空室形成前の真空装置の断面図である。FIG. 2 is a cross-sectional view of the vacuum apparatus before the vacuum chamber is formed. 図3は、真空加熱炉にて真空装置を加熱して真空室を形成する際の様子を示す模式図である。FIG. 3 is a schematic diagram showing a state in which a vacuum chamber is formed by heating the vacuum device in a vacuum heating furnace. 図4の上段は、真空加熱炉内にて真空装置を加熱する際の真空装置の温度の時間経過を示すグラフであり、下段は、真空加熱炉内を排気する際の当該真空加熱炉内の気圧の時間経過を示すグラフである。The upper graph in Figure 4 is a graph showing the temperature of the vacuum device over time when the vacuum device is heated in the vacuum heating furnace, and the lower graph is a graph showing the air pressure inside the vacuum heating furnace over time when the vacuum heating furnace is evacuated. 図1の真空装置の貫通孔、貫通孔に配置された筒状部材、及び、真空装置を加熱するヒータを示す真空装置及びヒータの拡大立面図及び拡大断面図である。2A and 2B are an enlarged elevational view and an enlarged sectional view of the vacuum device and a heater, showing a through hole of the vacuum device in FIG. 1, a cylindrical member disposed in the through hole, and a heater for heating the vacuum device. 図5の筒状部材が変形して貫通孔を封止する封止部に変化した後の様子を示す真空装置及びヒータの拡大断面図である。6 is an enlarged cross-sectional view of the vacuum device and the heater, showing a state after the cylindrical member in FIG. 5 has been deformed and changed into a sealing portion that seals the through hole. FIG. 変形例に係る真空装置の貫通孔、貫通孔に配置された筒状部材、及び、真空装置を加熱するヒータを示す真空装置及びヒータの拡大立面図及び拡大断面図である。13A and 13B are an enlarged elevation view and an enlarged cross-sectional view of a vacuum device and a heater, showing a through hole of a vacuum device according to a modified example, a cylindrical member disposed in the through hole, and a heater for heating the vacuum device. 図7の筒状部材が変形して貫通孔を封止する封止部に変化した後の様子を示す真空装置及びヒータの拡大断面図である。8 is an enlarged cross-sectional view of the vacuum device and the heater, showing a state after the cylindrical member in FIG. 7 has been deformed and changed into a sealing portion that seals the through hole. FIG. 筒状部材が変形して変形例に係る貫通孔を封止する封止部に変化した後の様子を示す真空装置及びヒータの拡大断面図である。13 is an enlarged cross-sectional view of the vacuum device and the heater, showing a state after the cylindrical member has been deformed into a sealing portion that seals the through hole according to the modified example. FIG.

以下、本発明の実施に係る真空装置の製造方法について、図面を参照して説明する。本実施の形態で製造される真空装置は、半導体製造装置等の真空チャンバ内の真空度(気圧)を計測する隔膜真空計の圧力センサとする。 The manufacturing method of a vacuum device according to the present invention will be described below with reference to the drawings. The vacuum device manufactured in this embodiment is a pressure sensor for a diaphragm vacuum gauge that measures the degree of vacuum (atmospheric pressure) in a vacuum chamber of a semiconductor manufacturing device or the like.

図1に示すように、本発明の実施の形態に係る真空装置の製造方法は、真空室が形成される前の真空装置10(図2参照)を形成するステップS11と、真空装置10を真空加熱炉101(図3参照)内に配置し、真空加熱炉101内の気体を排気しかつ真空加熱炉101内で真空装置10を加熱することで真空室を形成するステップS12と、を有する。 As shown in FIG. 1, the method for manufacturing a vacuum device according to an embodiment of the present invention includes step S11 of forming a vacuum device 10 (see FIG. 2) before a vacuum chamber is formed, and step S12 of placing the vacuum device 10 in a vacuum heating furnace 101 (see FIG. 3), evacuating the gas in the vacuum heating furnace 101, and heating the vacuum device 10 in the vacuum heating furnace 101 to form a vacuum chamber.

ステップS11で形成される真空装置10は、図2に示すように、真空室となる部屋R3を内部に有する筐体20であり、部屋R3と筐体20の外部とを連通させる貫通孔22Aを有する筐体20を備える。さらに、真空装置10は、貫通孔22Aに配置される筒状部材70であり、部屋R3と筐体20の外部とを連通させる連通路71を有する筒状部材70(図5も参照)も備える。以下、このような構成の真空装置10の詳細について説明する。 The vacuum device 10 formed in step S11 is a housing 20 having a room R3 therein, which serves as a vacuum chamber, as shown in FIG. 2, and includes a housing 20 having a through hole 22A that connects the room R3 to the outside of the housing 20. The vacuum device 10 further includes a cylindrical member 70 (see also FIG. 5) that is disposed in the through hole 22A and has a communication passage 71 that connects the room R3 to the outside of the housing 20. Details of the vacuum device 10 configured in this way are described below.

図2に示すように、真空装置10は、筐体20と、バッフル30と、センサ素子支持部40と、センサ素子50と、ゲッター60と、筒状部材70と、を備える。 As shown in FIG. 2, the vacuum device 10 includes a housing 20, a baffle 30, a sensor element support 40, a sensor element 50, a getter 60, and a cylindrical member 70.

筐体20は、第1筐体部材21と、第2筐体部材22と、第3筐体部材23と、を備え、上記各部材30~60を収容する。筐体20の内部には、筐体20の外の計測対象の気圧を有する空間である上記半導体計測装置の真空チャンバ内と連通する連通路R1と、連通路R1と連通して上記真空チャンバ内の気圧と同じ気圧を有する連通空間R2と、ステップS12で、連通空間R2の気圧と比較される真空の気圧が封入された真空室となる部屋R3と、が形成されている。 The housing 20 includes a first housing member 21, a second housing member 22, and a third housing member 23, and houses the above-mentioned members 30 to 60. Inside the housing 20, there are formed a communication passage R1 that communicates with the inside of the vacuum chamber of the semiconductor measuring device, which is a space outside the housing 20 that has the air pressure of the measurement target, a communication space R2 that communicates with the communication passage R1 and has the same air pressure as the air pressure inside the vacuum chamber, and a room R3 that serves as a vacuum chamber filled with a vacuum air pressure that is compared with the air pressure in the communication space R2 in step S12.

筐体20の第1筐体部材21は、連通路R1及び連通空間R2を区画するロート形状を有している。第1筐体部材21には、円筒状の第2筐体部材22が、溶接等により、センサ素子支持部40の後述の円盤状の金属薄板41の周縁部を挟んで接合されている。第2筐体部材22には、円板形状の第3筐体部材23が溶接等によりに接合されている。第3筐体部材23は、第2筐体部材22とともに、真空室となる部屋R3を区画している。 The first housing member 21 of the housing 20 has a funnel shape that defines the communication passage R1 and the communication space R2. A cylindrical second housing member 22 is joined to the first housing member 21 by welding or the like, sandwiching the peripheral portion of a disk-shaped metal sheet 41 (described below) of the sensor element support portion 40. A disk-shaped third housing member 23 is joined to the second housing member 22 by welding or the like. The third housing member 23, together with the second housing member 22, defines a room R3 that serves as a vacuum chamber.

第3筐体部材23は、円盤形状の本体23Aと、本体23Aに形成された貫通孔23Bを通り、センサ素子50に接続されている電極23Cと、電極23Cが通る貫通孔23Bをシールするハーメチックシール23Dと、を備える。電極23Cは、センサ素子50が検出する後述の差圧の電気信号を筐体20の外部に伝送する。電極23Cは、リードピン23CAと、リードピン23CAが内部を通る円筒形状で金属製のシールド23CBと、リードピン23CAとシールド23CBとの間をシールするハーメチックシール23CCと、を備える。なお、電極の数は、任意であり、通常は複数設けられる。 The third housing member 23 comprises a disk-shaped main body 23A, an electrode 23C that passes through a through hole 23B formed in the main body 23A and is connected to the sensor element 50, and a hermetic seal 23D that seals the through hole 23B through which the electrode 23C passes. The electrode 23C transmits an electrical signal of the differential pressure detected by the sensor element 50 (described below) to the outside of the housing 20. The electrode 23C comprises a lead pin 23CA, a cylindrical metallic shield 23CB through which the lead pin 23CA passes, and a hermetic seal 23CC that seals between the lead pin 23CA and the shield 23CB. The number of electrodes is arbitrary, and typically multiple electrodes are provided.

第2筐体部材22には、径方向に貫通し、部屋R3と筐体20の外部(つまり径方向外側の空間)とを連通させる貫通孔22Aが設けられている。貫通孔22Aは、第2筐体部材22の径方向の外周側つまり筐体20の外部側に円柱状の大径部22Bを備え、内周側つまり部屋R3側に大径部22Bよりも小径の円柱状の小径部22Cを備える。大径部22Bと小径部22Cとは連通している。大径部22Bと小径部22Cとの各中心軸は、同じ軸線上に位置している。つまり、大径部22Bの中心軸方向から見て、小径部22Cは、大径部22Bの中央に配置されている。大径部22Bには、筒状部材70がはめ込まれている。 The second housing member 22 is provided with a through hole 22A that penetrates in the radial direction and communicates the room R3 with the outside of the housing 20 (i.e., the space on the radially outer side). The through hole 22A has a cylindrical large diameter portion 22B on the radial outer periphery side of the second housing member 22, i.e., the outer side of the housing 20, and a cylindrical small diameter portion 22C with a smaller diameter than the large diameter portion 22B on the inner periphery side, i.e., the room R3 side. The large diameter portion 22B and the small diameter portion 22C are in communication. The central axes of the large diameter portion 22B and the small diameter portion 22C are located on the same axis. In other words, when viewed from the central axis direction of the large diameter portion 22B, the small diameter portion 22C is located in the center of the large diameter portion 22B. A cylindrical member 70 is fitted into the large diameter portion 22B.

筐体20は、金属製の筐体本体20Sと、当該筐体本体に取り付けられた電極23C及びハーメチックシール23D等の各種部品と、を含んで構成されている。この実施の形態の筐体本体20Sは、例えば、第1筐体部材21と、第2筐体部材22と、第3筐体部材23の本体23Aと、から構成されている。 The housing 20 is composed of a metal housing body 20S and various parts attached to the housing body, such as an electrode 23C and a hermetic seal 23D. In this embodiment, the housing body 20S is composed of, for example, a first housing member 21, a second housing member 22, and a body 23A of a third housing member 23.

バッフル30は、第1筐体部材21に不図示の固定部材等により固定され、上記真空チャンバから連通路R1を通って上方の連通空間R2に流入する気体の流れを筐体20の外周方向に変える。 The baffle 30 is fixed to the first housing member 21 by a fixing member (not shown) or the like, and redirects the flow of gas flowing from the vacuum chamber through the communication passage R1 into the upper communication space R2 toward the outer periphery of the housing 20.

センサ素子支持部40は、センサ素子50を支持する。センサ素子支持部40は、円盤状の金属薄板41と、センサ素子50が固定された台座42と、を備える。金属薄板41は、上述のように、その周縁部が第1筐体部材21及び第2筐体部材22に接合されており、筐体20により支持されている。台座42は、第1円板42A及び第2円板42Bを備える。第1円板42Aと第2円板42Bとは、金属薄板41を上下から挟んだ状態でボルト及びナット等により締結されている。これにより、台座42は、金属薄板41に固定される。 The sensor element support part 40 supports the sensor element 50. The sensor element support part 40 comprises a disk-shaped thin metal plate 41 and a base 42 to which the sensor element 50 is fixed. As described above, the thin metal plate 41 has its peripheral portion joined to the first housing member 21 and the second housing member 22, and is supported by the housing 20. The base 42 comprises a first circular plate 42A and a second circular plate 42B. The first circular plate 42A and the second circular plate 42B are fastened by bolts, nuts, etc. with the thin metal plate 41 sandwiched between them from above and below. In this way, the base 42 is fixed to the thin metal plate 41.

センサ素子支持部40は、第1筐体部材21とともに連通空間R2を区画している。センサ素子支持部40の中央には、台座42及び金属薄板41を上下方向に貫通し、連通空間R2の気圧をセンサ素子50に導く貫通孔40Aが形成されている。 The sensor element support 40, together with the first housing member 21, defines the communication space R2. A through hole 40A is formed in the center of the sensor element support 40, which passes through the base 42 and the thin metal plate 41 in the vertical direction and directs the air pressure in the communication space R2 to the sensor element 50.

センサ素子50は、貫通孔40Aを覆うようにして台座42に密着した状態で固定されている。センサ素子50は、センサ素子支持部40、第2筐体部材22、及び、第3筐体部材23とともに部屋R3を区画している。センサ素子50は、部屋R3内の気圧と、貫通孔40Aを介して導かれる連通空間R2の気圧つまり上記真空チャンバ内の気圧(真空装置10の測定対象)との差圧を、例えば静電容量の変化により検出する。センサ素子50は、どのような方式のセンサ素子でもよく、例えば、圧電素子を利用したセンサ素子であってもよい。 The sensor element 50 is fixed in close contact with the base 42 so as to cover the through hole 40A. The sensor element 50, together with the sensor element support 40, the second housing member 22, and the third housing member 23, defines the room R3. The sensor element 50 detects the pressure difference between the air pressure in the room R3 and the air pressure in the communication space R2 introduced via the through hole 40A, i.e., the air pressure in the vacuum chamber (the object of measurement of the vacuum device 10), for example, by a change in capacitance. The sensor element 50 may be a sensor element of any type, for example, a sensor element that uses a piezoelectric element.

ゲッター60は、加熱されることで活性化し、部屋R3を真空室としたときに当該部屋R3内に残留する残留気体を吸着する。この吸着により、部屋R3の真空度が向上する。このようなゲッター60としては、非蒸発型のゲッターがある。図示はしていないが、ゲッター60は、第3筐体部材23の本体23Aの部屋R3側の面に接着剤等で固定されるか、当該下面にボルト又は溶接等で取り付けられた固定部材により固定される。ゲッター60は、ボルト等により直接本体23Aに固定されてもよい。 The getter 60 is activated by heating, and adsorbs residual gas remaining in the chamber R3 when the chamber R3 is made into a vacuum chamber. This adsorption improves the degree of vacuum in the chamber R3. An example of such a getter 60 is a non-evaporable getter. Although not shown, the getter 60 is fixed to the surface of the main body 23A of the third housing member 23 facing the chamber R3 with adhesive or the like, or is fixed to the underside of the main body 23A with a fixing member attached by bolts or welding or the like. The getter 60 may also be fixed directly to the main body 23A with bolts or the like.

筒状部材70は、第2筐体部材22の貫通孔22Aの大径部22Bに嵌め入れられる。筒状部材70は、円筒状であり、上述のように、貫通孔22Aに配置される(図2及び図5参照)。筒状部材70の中空部は、部屋R3と筐体20の外部とを連通させる連通路71を形成している。連通路71は、円柱形状であり、その中心軸が大径部22Bの中心軸に一致するように配置されている。連通路71は、貫通孔22Aの小径部22Cと連通することで、部屋R3と筐体20の外部とを連通させている。筒状部材70は、ガラス粉体を圧縮成形して形成された成形体であり、ステップS12での加熱により軟化するように構成されている。筒状部材70は、ここではガラス粉体によるガラス製とするが、合成樹脂粉体による合成樹脂製としてもよい。筒状部材70は、粉体で形成されたものでなくてもよい。 The cylindrical member 70 is fitted into the large diameter portion 22B of the through hole 22A of the second housing member 22. The cylindrical member 70 is cylindrical and is disposed in the through hole 22A as described above (see FIG. 2 and FIG. 5). The hollow portion of the cylindrical member 70 forms a communication passage 71 that communicates the room R3 with the outside of the housing 20. The communication passage 71 is cylindrical and disposed so that its central axis coincides with the central axis of the large diameter portion 22B. The communication passage 71 communicates with the small diameter portion 22C of the through hole 22A, thereby communicating the room R3 with the outside of the housing 20. The cylindrical member 70 is a molded body formed by compressing and molding glass powder, and is configured to be softened by heating in step S12. Here, the cylindrical member 70 is made of glass using glass powder, but may be made of synthetic resin using synthetic resin powder. The cylindrical member 70 does not have to be formed of powder.

図1に示すステップS11では、例えば、第3筐体部材23を形成し、形成した第3筐体部材23にゲッター60を取り付ける。他方、センサ素子支持部40(金属薄板41)の周縁部を、第2筐体部材22と、バッフル30が取り付けられた第1筐体部材21とにより挟み込んで、これらを溶接して接合し、これらからなるユニットを形成する。その後、ステップS11で形成したユニットに、センサ素子50を配置しつつ、第3筐体部材23を溶接等により接合する。センサ素子50は、第3筐体部材23の電極23Cと電気的に接続された状態で、センサ素子支持部40に固定される。さらに、ステップS11では、適宜のタイミングで、筒状部材70が第2筐体部材22の貫通孔22Aの大径部22Bに嵌め入れられる。 In step S11 shown in FIG. 1, for example, the third housing member 23 is formed, and the getter 60 is attached to the formed third housing member 23. On the other hand, the peripheral portion of the sensor element support portion 40 (thin metal plate 41) is sandwiched between the second housing member 22 and the first housing member 21 to which the baffle 30 is attached, and these are welded and joined to form a unit. After that, the third housing member 23 is joined by welding or the like to the unit formed in step S11 while the sensor element 50 is placed. The sensor element 50 is fixed to the sensor element support portion 40 in a state in which it is electrically connected to the electrode 23C of the third housing member 23. Furthermore, in step S11, the cylindrical member 70 is fitted into the large diameter portion 22B of the through hole 22A of the second housing member 22 at an appropriate timing.

真空装置10は、上述のように、ステップS12で加熱される。真空装置10は、この加熱によって不都合が生じないような材料で形成される。この点については、ステップS12を説明してから説明する。 The vacuum device 10 is heated in step S12 as described above. The vacuum device 10 is made of a material that will not be adversely affected by this heating. This will be explained after step S12.

ステップS12では、図3の模式図に示すように、ステップS11で形成された真空装置10が、真空加熱炉101内に配置される。真空装置10は、筐体20の貫通孔22Aの中心軸が上下方向(天地方向)に沿う向きで配置される。真空加熱炉101内には、真空装置10の筐体20に接触するヒータ102が配置されている。真空加熱炉101内の気体は、真空ポンプ103により排気される。 In step S12, as shown in the schematic diagram of FIG. 3, the vacuum device 10 formed in step S11 is placed in a vacuum heating furnace 101. The vacuum device 10 is placed so that the central axis of the through hole 22A of the housing 20 is oriented along the vertical direction (top-bottom direction). A heater 102 is placed in the vacuum heating furnace 101, in contact with the housing 20 of the vacuum device 10. The gas in the vacuum heating furnace 101 is exhausted by a vacuum pump 103.

ヒータ102は、不図示のヒータ電源からの電流により発熱し、真空装置10を加熱する。ヒータ102に流れる電流量を制御することで、ヒータ102の温度(ヒータ温度)が制御される。図3において内部構造を省略しているが、ヒータ102は、例えば、シーズヒータ等が埋め込まれ円筒形状に形成されたバンドヒータである。ヒータ102は、真空装置10の筐体20の側面に接触し、当該筐体20を加熱することで真空装置10を加熱する。ヒータ102は、筒状部材70を露出させる露出孔102Aを備える。ヒータ102は、例えば、電磁誘導等により発熱するように構成されてもよい。ヒータ102は、ゲッター60を効率よく加熱するため、筐体20の第3筐体部材23に接触する部位をさらに備えてもよい。 The heater 102 generates heat by current from a heater power supply (not shown) and heats the vacuum device 10. The temperature of the heater 102 (heater temperature) is controlled by controlling the amount of current flowing through the heater 102. Although the internal structure is omitted in FIG. 3, the heater 102 is, for example, a band heater formed into a cylindrical shape with a sheath heater embedded therein. The heater 102 contacts the side of the housing 20 of the vacuum device 10 and heats the housing 20, thereby heating the vacuum device 10. The heater 102 has an exposure hole 102A that exposes the cylindrical member 70. The heater 102 may be configured to generate heat by, for example, electromagnetic induction. The heater 102 may further have a portion that contacts the third housing member 23 of the housing 20 in order to efficiently heat the getter 60.

ステップS12では、真空加熱炉101内の気体を真空ポンプ103により排気しつつ、真空装置10をヒータ102により加熱する。この排気及び加熱のプロセスを、図4を参照して説明する。なお、真空加熱炉101内は、当初、空気又は不活性ガス(例えば、窒素ガス)といった気体で満たされているものとする。また、下記で説明する真空装置10の各温度は、特に言及がない限り、真空装置10の筐体20(特に筐体20の大部分である筐体本体20S)の温度であり、当該筐体20の熱が伝わる筒状部材70の温度ともいえる。当該温度は、不図示の温度センサ等により検出される。また、ヒータ102の発熱温度であって真空装置10を加熱する加熱温度を、ヒータ温度ともいう。 In step S12, the vacuum device 10 is heated by the heater 102 while the gas in the vacuum heating furnace 101 is exhausted by the vacuum pump 103. This exhaust and heating process will be described with reference to FIG. 4. It is assumed that the inside of the vacuum heating furnace 101 is initially filled with a gas such as air or an inert gas (e.g., nitrogen gas). In addition, unless otherwise specified, each temperature of the vacuum device 10 described below is the temperature of the housing 20 of the vacuum device 10 (particularly the housing body 20S which is the majority of the housing 20), and can also be said to be the temperature of the cylindrical member 70 to which the heat of the housing 20 is transmitted. The temperature is detected by a temperature sensor or the like (not shown). In addition, the heating temperature of the heater 102 which heats the vacuum device 10 is also called the heater temperature.

ステップS12では、まず、ヒータ102のヒータ温度を上げて真空装置10を温度Aまで加熱するとともに(期間T0~T2)、真空加熱炉101内を排気することで真空加熱炉101内の気圧を1.00*10-4Paオーダーの高真空まで低下させる(期間T0~T1)。ここでは、真空装置10の温度が温度Aに達するよりも前に、気圧を1.00*10-4Paオーダーの高真空まで低下させる(時間T1<T2)。この高真空は、後述の冷却の途中(時間T8)まで維持される(例えば真空ポンプ103は稼働したままとする)。これにより、後述のように真空室を形成する際の加熱によって不純物等のガスが発生しても、部屋R3内の真空度を保つことができる。真空加熱炉101内の気体の排気により真空装置10の部屋R3内の気体も筒状部材70の連通路71を介して排気される。従って、真空加熱炉101内が高真空のときは部屋R3も高真空である。 In step S12, first, the heater temperature of the heater 102 is increased to heat the vacuum device 10 to temperature A (period T0 to T2), and the vacuum furnace 101 is evacuated to reduce the air pressure in the vacuum furnace 101 to a high vacuum of the order of 1.00*10 −4 Pa (period T0 to T1). Here, the air pressure is reduced to a high vacuum of the order of 1.00*10 −4 Pa before the temperature of the vacuum device 10 reaches temperature A (time T1<T2). This high vacuum is maintained until the middle of the cooling process (time T8) described later (for example, the vacuum pump 103 is kept operating). This makes it possible to maintain the degree of vacuum in the room R3 even if gas such as impurities is generated by heating when forming a vacuum chamber as described later. The gas in the room R3 of the vacuum device 10 is also evacuated through the communication passage 71 of the cylindrical member 70 by evacuating the gas in the vacuum furnace 101. Therefore, when the inside of the vacuum heating furnace 101 is at a high vacuum, the room R3 is also at a high vacuum.

真空装置10の温度が温度Aに達したときには、その温度Aが第1所定期間維持される(期間T2~T3)。この温度Aの維持は、高真空中で行われる。これにより、部屋R3内の内壁面、及び、ゲッター60等に付着した不純物がガス化して排気される脱ガスが行われる。温度Aは、筒状部材70のガラス転移点よりも低い温度である。このため、真空装置10の温度が温度Aであるときには、筒状部材70は、硬化状態のままである。 When the temperature of the vacuum device 10 reaches temperature A, that temperature A is maintained for a first predetermined period (period T2 to T3). This maintenance of temperature A is performed in a high vacuum. This causes degassing, in which impurities adhering to the inner wall surface of the room R3 and the getter 60, etc., are gasified and exhausted. Temperature A is lower than the glass transition point of the cylindrical member 70. Therefore, when the temperature of the vacuum device 10 is temperature A, the cylindrical member 70 remains in a hardened state.

上記の脱ガス後、ヒータ102によるヒータ温度を上げて、真空装置10を高真空中で温度Cまで加熱し(期間T3~T4)、当該温度Cを第2所定期間維持する(期間T4~T5)。温度Cは、筒状部材70の軟化点よりも高く、筒状部材70の焼成に適した温度である。このような加熱により、図5に拡大して示す筒状部材70は、各粉体及び全体が軟化し、その自重により変形し、焼成されて、図6に示す封止部70Hに変化する。筒状部材70が変形して形成されたこの封止部70Hは、筒状部材70の連通路71が塞がった形状であり、筐体20の貫通孔22Aを封止している。これにより、部屋R3は、真空室となる。 After the degassing, the heater temperature of the heater 102 is increased to heat the vacuum device 10 to temperature C in a high vacuum (period T3 to T4), and the temperature C is maintained for a second predetermined period (period T4 to T5). Temperature C is higher than the softening point of the cylindrical member 70 and is a temperature suitable for firing the cylindrical member 70. By such heating, the cylindrical member 70 shown in an enlarged view in FIG. 5 softens in each powder and as a whole, deforms under its own weight, is fired, and changes into the sealing portion 70H shown in FIG. 6. The sealing portion 70H formed by the deformation of the cylindrical member 70 has a shape in which the communication passage 71 of the cylindrical member 70 is blocked, and seals the through hole 22A of the housing 20. As a result, the room R3 becomes a vacuum chamber.

その後、ヒータ102のヒータ温度を下げて、真空装置10の温度を、封止部70Hの軟化点以下かつガラス転移点以上の温度Bまで徐々に下げ(期間T5~T6)、封止部70Hの形状を安定させる。その後、温度Bを第3所定期間維持し(期間T6~T7)、ゲッター60を活性化させる。これにより、真空室となっている部屋R3の真空度が向上する。なお、第3所定期間の前から、具体的には、真空装置10が期間T3~T6においてゲッター60が活性化に必要な温度となったタイミングから、ゲッター60の活性化のための加熱は開始されている。従って、この実施の形態での第3所定期間の長さは、真空装置10が期間T3~T6においてゲッター60の活性化に必要な温度となる期間も考慮されて設定される。上述のように、ゲッター60の活性化のために、真空装置10は、封止部70Hのガラス転移点以上の温度に加熱される。これにより、部屋R3の真空度が向上したときに、真空度の向上度合いに応じて、封止部70Hの一部が筐体20の貫通孔22Aの小径部22C内に引き込まれる。 Then, the heater temperature of the heater 102 is lowered, and the temperature of the vacuum device 10 is gradually lowered to a temperature B below the softening point and above the glass transition point of the sealing portion 70H (period T5 to T6), stabilizing the shape of the sealing portion 70H. Then, the temperature B is maintained for a third predetermined period (period T6 to T7) to activate the getter 60. This improves the vacuum level of the chamber R3, which is a vacuum chamber. Note that heating for activating the getter 60 is started before the third predetermined period, specifically, from the timing when the vacuum device 10 reaches the temperature required for the activation of the getter 60 during the period T3 to T6. Therefore, the length of the third predetermined period in this embodiment is set taking into consideration the period during which the vacuum device 10 reaches the temperature required for the activation of the getter 60 during the period T3 to T6. As described above, in order to activate the getter 60, the vacuum device 10 is heated to a temperature above the glass transition point of the sealing portion 70H. As a result, when the degree of vacuum in the room R3 is improved, a portion of the sealing portion 70H is drawn into the small diameter portion 22C of the through hole 22A of the housing 20 depending on the degree of improvement in the degree of vacuum.

その後、ヒータ温度を徐々に下げて、真空装置10を冷却する(期間T7~T9)。当該冷却の途中で、高真空状態も解除され(時間T8)、真空加熱炉101内には空気又は不活性ガスが導入される。この冷却により、封止部70Hも冷却されガラス状態に硬化する。 Then, the heater temperature is gradually lowered to cool the vacuum device 10 (period T7 to T9). During this cooling, the high vacuum state is released (time T8), and air or an inert gas is introduced into the vacuum heating furnace 101. This cooling also cools the sealing portion 70H, causing it to harden into a glass state.

以上のような一連の加熱により、部屋R3を真空室とした真空装置10が完成する。 Through this series of heating steps, the vacuum device 10 is completed, with room R3 serving as a vacuum chamber.

上記の一連の加熱により、真空装置10は、最高で温度Cまで加熱される。また、ゲッター60を活性化するための温度Bは、筒状部材70のガラス転移点よりも高い。このようなことから、下記のような温度の大小関係が好ましい。つまり、筒状部材70のガラス転移点<ゲッター60を活性化させるための温度B<筒状部材70を変形させて貫通孔22Aを封止するための温度C<ステップS11で形成された真空装置10つまり真空室形成前の真空装置10の耐熱温度、となる温度の大小関係が好ましい。なお、真空装置10の耐熱温度とは、真空装置10がその温度で故障又は変形等しない温度である。 By the above series of heating steps, the vacuum device 10 is heated up to a maximum temperature C. Furthermore, the temperature B for activating the getter 60 is higher than the glass transition point of the cylindrical member 70. For this reason, the following relationship of temperatures is preferable. In other words, the following relationship of temperatures is preferable: glass transition point of the cylindrical member 70 < temperature B for activating the getter 60 < temperature C for deforming the cylindrical member 70 to seal the through hole 22A < heat resistance temperature of the vacuum device 10 formed in step S11, i.e., the vacuum device 10 before the vacuum chamber is formed. The heat resistance temperature of the vacuum device 10 is the temperature at which the vacuum device 10 will not break down or deform.

上記大小関係を満たすため、例えば、筐体20の金属部分である筐体本体20Sをニッケルークロムー鉄合金(例えばインコネル600)で形成し、筒状部材70を、ビスマス系無鉛ガラスで形成する。さらに、ハーメチックシール23D等をコバールガラスで形成し、センサ素子支持部40及びセンサ素子50をサファイヤ等で形成するとよい。このような場合、筒状部材70のガラス転移点は350℃で、ガラス軟化点は410℃で、推奨焼成温度は460℃である。そこで、温度Aを250℃、温度Bを370℃、温度Cを410~460℃とする。また、各部材の材料は任意であり、前記に限定されない。 To satisfy the above size relationship, for example, the housing body 20S, which is the metal part of the housing 20, is made of a nickel-chromium-iron alloy (e.g., Inconel 600), and the cylindrical member 70 is made of bismuth-based lead-free glass. Furthermore, it is advisable to form the hermetic seal 23D and the like from Kovar glass, and the sensor element support part 40 and the sensor element 50 from sapphire or the like. In such a case, the glass transition point of the cylindrical member 70 is 350°C, the glass softening point is 410°C, and the recommended firing temperature is 460°C. Therefore, temperature A is set to 250°C, temperature B to 370°C, and temperature C to 410 to 460°C. Furthermore, the materials of each member are arbitrary and are not limited to those mentioned above.

以上の通り、本実施の形態では、ステップS11により、真空室となる部屋R3を有する筐体20及び筐体20の貫通孔22Aに配置された筒状部材70を備える真空室形成前の真空装置10を形成する。さらに、ステップS12により、真空装置10を収容した真空加熱炉101内の気体を排気することで部屋R3内の気体を部屋R3から排気する。かつ、真空加熱炉101内で真空装置10を加熱することで筒状部材70を加熱して軟化させる。軟化した筒状部材70は、自重により変形して封止部70Hとなって、真空装置10の筐体20の貫通孔22Aを封止する。これらにより、部屋R3が真空室となる。従って、本実施の形態では、筒状部材70を機械的な力を加えて変形させることなく、加熱のみにより貫通孔22Aを封止して真空室を形成するので、真空室が容易に形成される。 As described above, in this embodiment, in step S11, the vacuum device 10 before the formation of the vacuum chamber is formed, which includes the housing 20 having the chamber R3 to be the vacuum chamber and the cylindrical member 70 arranged in the through hole 22A of the housing 20. Furthermore, in step S12, the gas in the vacuum heating furnace 101 that houses the vacuum device 10 is exhausted, thereby exhausting the gas in the chamber R3 from the chamber R3. In addition, the vacuum device 10 is heated in the vacuum heating furnace 101 to heat and soften the cylindrical member 70. The softened cylindrical member 70 deforms under its own weight to become a sealing portion 70H, which seals the through hole 22A of the housing 20 of the vacuum device 10. As a result, the chamber R3 becomes a vacuum chamber. Therefore, in this embodiment, the vacuum chamber is formed by sealing the through hole 22A only by heating without deforming the cylindrical member 70 by applying a mechanical force, so that the vacuum chamber is easily formed.

さらに、ステップS12では、筒状部材70を変形させて筐体20の貫通孔22Aを封止したあと、つまり、封止部70H形成後も、真空加熱炉101内で真空装置10を加熱してゲッター60を活性化させる。これにより、真空加熱炉101内で、真空室の形成及びゲッター60の活性化を一連の工程で行うことができ、真空室の真空度を容易に向上させることができる。特に、従来は、真空室の形成のため、真空引き、溶接、ゲッターの加熱の3工程を別々に行っているが、本実施の形態では、真空加熱炉101内で、ゲッター60の活性化までを一連の工程で行うことができ、真空室、特に、真空度がゲッター60によって向上した真空室を容易に形成できる。 Furthermore, in step S12, after the cylindrical member 70 is deformed to seal the through hole 22A of the housing 20, that is, after the sealing portion 70H is formed, the vacuum device 10 is heated in the vacuum heating furnace 101 to activate the getter 60. This allows the formation of a vacuum chamber and the activation of the getter 60 to be performed in a series of steps in the vacuum heating furnace 101, and the degree of vacuum in the vacuum chamber can be easily improved. In particular, in the past, three separate steps of evacuation, welding, and heating the getter were performed to form a vacuum chamber, but in this embodiment, the steps up to the activation of the getter 60 can be performed in a series of steps in the vacuum heating furnace 101, and a vacuum chamber, particularly a vacuum chamber whose degree of vacuum is improved by the getter 60, can be easily formed.

さらに、ステップS12では、真空装置10を第1ヒータ温度(第1加熱温度)で加熱して真空装置10ないし筒状部材70の温度を温度Cまで上げて、筒状部材70を変形させ封止部Hを形成する。その後、ヒータ温度を下げ、筒状部材70の温度を軟化点よりも低い温度とする第2ヒータ温度(第2加熱温度)で真空装置10を加熱して、ゲッター60を活性化させる。これにより、封止部70Hの形状を安定化させた状態でゲッター60を活性化できる。従って、第1ヒータ温度のままで真空装置10を加熱してゲッター60を活性させてしまうことに比べて、筒状部材70の形状が安定せず、その一部が貫通孔22Aの小径部22C内に垂れ流れ、その後、部屋R3内に流入するといった不都合が抑制される。 Furthermore, in step S12, the vacuum device 10 is heated at the first heater temperature (first heating temperature) to raise the temperature of the vacuum device 10 or the cylindrical member 70 to temperature C, and the cylindrical member 70 is deformed to form the sealing portion H. After that, the heater temperature is lowered, and the vacuum device 10 is heated at the second heater temperature (second heating temperature) at which the temperature of the cylindrical member 70 is lower than the softening point, and the getter 60 is activated. This allows the getter 60 to be activated in a state in which the shape of the sealing portion 70H is stabilized. Therefore, compared to activating the getter 60 by heating the vacuum device 10 at the first heater temperature, the inconvenience of the shape of the cylindrical member 70 being unstable, a part of it dripping into the small diameter portion 22C of the through hole 22A, and then flowing into the room R3 is suppressed.

さらに、上記第2ヒータ温度は、筒状部材70(封止部70H)の温度をガラス転移点よりも高く軟化点よりも低い温度Bに加熱する温度であることにより、封止部70Hの形成後に、当該封止部70Hを一定期間ゴム状態で保持することができる。これにより、封止部70Hが急激に冷えることによって割れる等の不都合が回避される。また、例えば、ゲッター60の活性化により部屋R3の真空度が上がって、その気圧が下がっても、この気圧の低下に追従して封止部70Hの一部が小径部22Cに引き込まれることで封止部70Hが変形することができる。これにより、封止部70Hは、その後の真空装置10の冷却時に、真空室となっている部屋R3の気圧に応じた形状で硬化できる。これにより、封止部70Hの硬化後に、ゲッター60の活性化前後での部屋R3の気圧差による負荷(封止部70Hを部屋R3に吸引する吸引力)が封止部70Hに掛かることが抑制される。 Furthermore, since the second heater temperature is a temperature that heats the cylindrical member 70 (sealing portion 70H) to a temperature B that is higher than the glass transition point and lower than the softening point, the sealing portion 70H can be maintained in a rubber state for a certain period of time after the sealing portion 70H is formed. This prevents the sealing portion 70H from cracking due to a sudden cooling. In addition, even if the vacuum level in the room R3 increases due to the activation of the getter 60 and the air pressure drops, the sealing portion 70H can be deformed by a part of the sealing portion 70H being drawn into the small diameter portion 22C in response to the drop in air pressure. As a result, the sealing portion 70H can be hardened in a shape that corresponds to the air pressure of the room R3, which is a vacuum chamber, when the vacuum device 10 is subsequently cooled. This prevents the sealing portion 70H from being subjected to a load (suction force that sucks the sealing portion 70H into the room R3) due to the air pressure difference in the room R3 before and after the activation of the getter 60 after the sealing portion 70H is hardened.

さらに、ステップS12では、真空装置10を温度Cまで上げて筒状部材70を変形させる加熱の前に、前記真空加熱炉内で、当該加熱の際の第1ヒータ温度(第1加熱温度)よりも低い第3ヒータ温度(第3加熱温度)で真空装置10を温度Aに加熱することで部屋R3内を脱ガスする。これにより、脱ガスからゲッター60の活性化までを真空加熱炉101で一連の工程で行うことができる。 Furthermore, in step S12, before the heating is performed by raising the vacuum device 10 to temperature C to deform the cylindrical member 70, the vacuum device 10 is heated to temperature A in the vacuum heating furnace at a third heater temperature (third heating temperature) that is lower than the first heater temperature (first heating temperature) during the heating, thereby degassing the inside of the chamber R3. This allows the vacuum heating furnace 101 to perform a series of steps from degassing to activation of the getter 60.

さらに、ステップS11で形成される真空室形成前の真空装置10では、真空室となる部屋R3を内部に有する筐体20の貫通孔22Aに、連通路71を有し、加熱されることで自重により変形して貫通孔22Aを封止するように形成された筒状部材70が設けられている。これにより、真空加熱炉101内を真空引きし、当該真空加熱炉101内で筒状部材70を加熱して変形させることで、真空室が形成されるので、真空室が容易に形成される。 Furthermore, in the vacuum device 10 before the formation of the vacuum chamber formed in step S11, a cylindrical member 70 is provided in the through hole 22A of the housing 20, which has the chamber R3 inside it to become the vacuum chamber, and which has a communication passage 71 and is formed so that it deforms under its own weight when heated to seal the through hole 22A. As a result, the vacuum chamber is formed by drawing a vacuum inside the vacuum heating furnace 101 and heating and deforming the cylindrical member 70 inside the vacuum heating furnace 101, so that the vacuum chamber is easily formed.

上記実施の形態では、一連の加熱処理等を真空加熱炉101内で行うことができる。従って、真空加熱炉101内にステップS11で形成された複数の真空装置10を入れて、当該複数の真空装置10について一度に上記加熱処理等を行い、各真空装置10について真空室を形成してもよい。これにより、複数の真空装置10それぞれの真空室の形成を一度に容易に行うことができる。 In the above embodiment, a series of heating processes and the like can be carried out in the vacuum heating furnace 101. Therefore, the multiple vacuum devices 10 formed in step S11 can be placed in the vacuum heating furnace 101, and the above heating processes and the like can be carried out on the multiple vacuum devices 10 at once, forming a vacuum chamber for each vacuum device 10. This makes it possible to easily form a vacuum chamber for each of the multiple vacuum devices 10 at once.

上記実施の形態については、種々の変形を施してもよい。例えば、真空装置10の形状は、適宜変更できる。例えば、筐体20は、上記実施の形態では円柱状の形状であるが、多角柱の形状であってもよい。筐体20の貫通孔22Aの形状も任意である。貫通孔22Aは、円柱形状でなく、多角柱形状であってもよい。筒状部材70の形状も貫通孔22Aの形状に応じて多角筒状であってもよい。ステップS12の各プロセスは、手動により行われても、不図示のコントローラによりヒータ102及び真空ポンプ103が制御されることで行われてもよい。 The above embodiment may be modified in various ways. For example, the shape of the vacuum device 10 may be changed as appropriate. For example, the housing 20 is cylindrical in the above embodiment, but may be polygonal. The shape of the through hole 22A of the housing 20 is also arbitrary. The through hole 22A may be polygonal instead of cylindrical. The shape of the cylindrical member 70 may also be polygonal depending on the shape of the through hole 22A. Each process of step S12 may be performed manually or by controlling the heater 102 and the vacuum pump 103 with a controller (not shown).

ステップS12において、真空装置10は、貫通孔22Aの中心軸が水平方向に沿う向きで真空加熱炉101内に配置されてもよい。このような場合であっても、加熱された筒状部材70は、自重により変形することで連通路71が塞がれ、その結果、貫通孔22Aを封止する封止部70Hに変形することができる。このような場合、ゲッター60を活性化させるヒータ温度を、上記のように、筒状部材70(封止部70H)の温度をガラス転移点よりも高い温度Bとするとよい。これにより、真空装置10ないし筒状部材70を温度Bとする加熱時において封止部70Hをゴム状態として封止部70Hの形状を保持でき、貫通孔22Aから軟化状態の封止部70Hの多くが流れ落ちてしまうことを防止される。 In step S12, the vacuum device 10 may be placed in the vacuum heating furnace 101 with the central axis of the through hole 22A oriented horizontally. Even in this case, the heated cylindrical member 70 may deform under its own weight, blocking the communication passage 71, and as a result, may deform into the sealing portion 70H that seals the through hole 22A. In this case, the heater temperature for activating the getter 60 may be set to temperature B, which is higher than the glass transition point of the cylindrical member 70 (sealing portion 70H), as described above. This allows the sealing portion 70H to be in a rubber state during heating to temperature B of the vacuum device 10 or the cylindrical member 70, and the shape of the sealing portion 70H can be maintained, preventing much of the softened sealing portion 70H from flowing down from the through hole 22A.

筐体20の第2筐体部材22の貫通孔22A、及び、筒状部材70を、図7に示すような貫通孔222A及び切り欠き部材270に変更してもよい。貫通孔222Aは、貫通孔22Aの大径部22B及び小径部22Cにそれぞれ対応する大径部222B及び小径部222Cを有する。小径部222Cは、大径部222Bの下部(大径部222B及び小径部222Cの中心軸が水平方向に沿う向きのときの天地方向を上下方向とした場合の下部)と連通するように配置されている。切り欠き部材270は、筒状部材70の連通路71に対応する連通路271を有する。連通路271は、小径部222Cと連通しており、切り欠き部材270の下部に設けられた切り欠き孔により構成されている。このような場合の真空装置10をステップS12において加熱する場合は、大径部222B及び小径部222Cの中心軸が水平方向に沿う向きで真空加熱炉101内に配置されてもよい。このような場合、加熱された切り欠き部材270は、図8に示すように、自重により変形することで連通路271が塞がれ、その結果、貫通孔222Aを封止する封止部270Hに変形することができる。ここでは、特に、自重による切り欠き部材270の変形により、連通路271を容易につぶすことができ、貫通孔222Aの下部に位置する小径部222Cを容易に封止できる。これらのように、上記実施の形態及び変形例における筐体20の貫通孔22A等に配置される部材は、連通路71等を有する部材であればよい。 The through hole 22A of the second housing member 22 of the housing 20 and the cylindrical member 70 may be changed to a through hole 222A and a notch member 270 as shown in FIG. 7. The through hole 222A has a large diameter portion 222B and a small diameter portion 222C corresponding to the large diameter portion 22B and the small diameter portion 22C of the through hole 22A, respectively. The small diameter portion 222C is arranged so as to communicate with the lower portion of the large diameter portion 222B (the lower portion when the top-to-bottom direction when the central axes of the large diameter portion 222B and the small diameter portion 222C are oriented along the horizontal direction is the up-down direction). The notch member 270 has a communication passage 271 corresponding to the communication passage 71 of the cylindrical member 70. The communication passage 271 is communicated with the small diameter portion 222C and is constituted by a notch hole provided in the lower portion of the notch member 270. In such a case, when the vacuum device 10 is heated in step S12, the large diameter portion 222B and the small diameter portion 222C may be placed in the vacuum heating furnace 101 with the central axes of the large diameter portion 222B and the small diameter portion 222C oriented horizontally. In such a case, the heated cutout member 270 may be deformed by its own weight to block the communication passage 271, as shown in FIG. 8, and as a result, the cutout member 270 may be deformed into a sealing portion 270H that seals the through hole 222A. In particular, the deformation of the cutout member 270 by its own weight can easily crush the communication passage 271, and the small diameter portion 222C located at the bottom of the through hole 222A can be easily sealed. In this way, the member placed in the through hole 22A of the housing 20 in the above embodiment and modified example may be a member having a communication passage 71, etc.

上記貫通孔22A及び222Aといった、真空装置10の筐体20の、部屋R3と筐体20の外部とを連通させる貫通孔は、筐体20の外部側に配置された第1部分(上記では、大径部22B)と、部屋R3側に位置して第1部分と連通し、第1部分の中心軸方向からみて第1部分よりも小さい第2部分(上記では、小径部22C)と、を備えるものであるとよい。これにより、第1部分に、筒状部材70等の連通路を有する部材を配置することができ、当該部材が変形したときに第2部分を容易に塞ぐことができる。従って、変形後の当該部材つまり封止部が貫通孔を容易に封止できる。さらに、第1部分の内壁、具体的には、側内面又は底面にテーパーが設けられてもよい。例えば、図9に示すように、大径部22Bにおける、小径部22Cの開口が形成されている底面22BAを円錐台の側面形状とすることで、この底面BAにテーパーを設けてもよい。このようなテーパーにより、封止部70Hと貫通孔22Aの内壁との接合面積を大きくすることができ、封止部70Hの筐体20に対する良好な接合強度が得られる。なお、封止部70Hとなる前の筒状部材70の外面についても、底面BAに合わさるテーパーを設けてもよい。 The through holes such as the through holes 22A and 222A, which communicate between the room R3 and the outside of the housing 20 of the vacuum device 10, may have a first portion (large diameter portion 22B in the above) located on the outside of the housing 20, and a second portion (small diameter portion 22C in the above) located on the room R3 side, which communicates with the first portion and is smaller than the first portion when viewed from the central axis direction of the first portion. This allows a member having a communication path such as a cylindrical member 70 to be placed in the first portion, and when the member is deformed, the second portion can be easily blocked. Therefore, the member after deformation, that is, the sealing portion, can easily seal the through hole. Furthermore, a taper may be provided on the inner wall of the first portion, specifically, on the side inner surface or bottom surface. For example, as shown in FIG. 9, the bottom surface 22BA on which the opening of the small diameter portion 22C is formed in the large diameter portion 22B may be formed into a side shape of a truncated cone, so that the bottom surface BA is tapered. This taper increases the bonding area between the sealing portion 70H and the inner wall of the through hole 22A, and provides good bonding strength between the sealing portion 70H and the housing 20. Note that the outer surface of the cylindrical member 70 before it becomes the sealing portion 70H may also be tapered to match the bottom surface BA.

ステップS12での、筒状部材70又は切り欠き部材270といった、封止部となる部材を加熱して変形させる際、当該部材を直接加熱してもよい。上記の軟化は、筒状部材70等の封止部となる部材が融点を有する場合、当該部材がその融点を超えて溶融することであってもよい。 In step S12, when the member to be the sealing part, such as the cylindrical member 70 or the notched member 270, is heated and deformed, the member may be directly heated. When the member to be the sealing part, such as the cylindrical member 70, has a melting point, the softening may be caused by the member exceeding the melting point and melting.

本発明は、真空室を内部に有する筐体を有する真空装置及びその製造方法一般に適用できる。例えば、本発明は、真空室の気圧と測定対象の気圧との差圧を検出する圧力センサとして形成される真空装置及びその製造方法の他、真空チャンバを有する半導体製造装置、ランプ、電子管、真空断熱材、MEMS(Micro Electro Mechanical Systems)等の各種の真空装置及びその製造方法に適用可能である。なお、圧力センサは、測定対象の気圧を伝達するシリコンオイル等の液体が封入されたセンサであってもよい。 The present invention can be generally applied to vacuum devices having a housing with a vacuum chamber inside and methods for manufacturing the same. For example, the present invention can be applied to vacuum devices formed as pressure sensors that detect the pressure difference between the air pressure in the vacuum chamber and the air pressure of the object to be measured, as well as to various vacuum devices and methods for manufacturing the same, such as semiconductor manufacturing equipment having a vacuum chamber, lamps, electron tubes, vacuum insulation materials, and MEMS (Micro Electro Mechanical Systems). The pressure sensor may be a sensor filled with a liquid such as silicone oil that transmits the air pressure of the object to be measured.

以上、実施の形態及び変形例を参照して本発明を説明したが、本発明は、上記の実施の形態及び変形例に限定されるものではない。例えば、本発明には、本発明の技術思想の範囲内で当業者が理解し得る、上記の実施の形態及び変形例に対する様々な変更が含まれる。上記実施の形態及び変形例に挙げた各構成は、矛盾の無い範囲で適宜組み合わせることができる。 Although the present invention has been described above with reference to the embodiments and modifications, the present invention is not limited to the above-mentioned embodiments and modifications. For example, the present invention includes various modifications to the above-mentioned embodiments and modifications that can be understood by a person skilled in the art within the scope of the technical concept of the present invention. The configurations listed in the above-mentioned embodiments and modifications can be combined as appropriate within a range that does not cause inconsistencies.

10…真空装置、20…筐体、21…第1筐体部材、22…第2筐体部材、22A…貫通孔、22B…大径部、22BA…底面、22C…小径部、23…第3筐体部材、23A…本体、23B…貫通孔、23C…電極、23D…ハーメチックシール、30…バッフル、40…センサ素子支持部、40A…貫通孔、50…センサ素子、60…ゲッター、70…筒状部材、71…連通路、222A…貫通孔、222B…大径部、222C…小径部、270…切り欠き部材、271…連通路、R1…連通路、R2…連通空間、R3…部屋。 10...vacuum device, 20...housing, 21...first housing member, 22...second housing member, 22A...through hole, 22B...large diameter portion, 22BA...bottom surface, 22C...small diameter portion, 23...third housing member, 23A...main body, 23B...through hole, 23C...electrode, 23D...hermetic seal, 30...baffle, 40...sensor element support portion, 40A...through hole, 50...sensor element, 60...getter, 70...cylindrical member, 71...communication passage, 222A...through hole, 222B...large diameter portion, 222C...small diameter portion, 270...notch member, 271...communication passage, R1...communication passage, R2...communication space, R3...room.

Claims (6)

真空室となる部屋を内部に有する筐体であり、前記部屋と前記筐体の外部とを連通させる貫通孔を有する筐体と、前記貫通孔に配置され、前記部屋と前記筐体の前記外部とを連通させる連通路を有する部材と、前記部屋内に配置され、加熱されることで活性化するゲッターと、を備える、真空室形成前の真空装置を形成する第1ステップと、
前記真空装置を収容した真空加熱炉内の気体を排気することで前記部屋内の気体を前記部屋から前記連通路を介して排気し、前記真空加熱炉内で前記真空装置を第1加熱温度で加熱することで前記部材を軟化させ前記部材をその自重により変形させて前記貫通孔を封止し、その後前記真空装置の加熱温度を前記第1加熱温度から第2加熱温度に下げることで前記貫通孔を封止したあとも前記真空加熱炉内で前記真空装置を加熱し前記ゲッターを活性化させ、これにより前記真空室を形成する第2ステップと、を有し、
前記部材は、軟化点とガラス転移点とを有し、
前記第1加熱温度は、前記部材の温度を前記軟化点よりも高くする加熱温度であり、
前記第2加熱温度は、前記部材の温度を前記ガラス転移点よりも高く前記軟化点よりも低くする加熱温度である、
真空装置の製造方法。
a first step of forming a vacuum device before forming a vacuum chamber, the vacuum device comprising: a housing having a chamber therein that serves as a vacuum chamber, the housing having a through hole that connects the chamber to the outside of the housing; a member that is disposed in the through hole and has a communication passage that connects the chamber to the outside of the housing; and a getter that is disposed in the chamber and is activated by heating ;
a second step of evacuating gas from a vacuum heating furnace containing the vacuum device to evacuate the gas from the room through the communicating passage, heating the vacuum device at a first heating temperature in the vacuum heating furnace to soften the member and deform the member under its own weight to seal the through hole, and then lowering the heating temperature of the vacuum device from the first heating temperature to a second heating temperature to heat the vacuum device in the vacuum heating furnace even after sealing the through hole and activate the getter, thereby forming the vacuum chamber ;
The member has a softening point and a glass transition point,
the first heating temperature is a heating temperature that increases the temperature of the member above the softening point,
The second heating temperature is a heating temperature that makes the temperature of the member higher than the glass transition point and lower than the softening point.
A method for manufacturing a vacuum device.
前記貫通孔は、前記筐体の前記外部の側に配置されかつ前記部材が配置される第1部分と、前記筐体の前記部屋の側に位置して前記第1部分と連通し、前記第1部分の中心軸方向からみて前記第1部分よりも小さい第2部分と、を備え、the through hole includes a first portion disposed on the exterior side of the housing and in which the member is disposed, and a second portion located on the room side of the housing, communicating with the first portion, and being smaller than the first portion when viewed in a central axis direction of the first portion;
前記第2ステップでは、前記第2加熱温度での加熱で前記ゲッターを活性化させることで前記部屋の真空度を向上させ、ガラス転移した前記部材の一部を前記第2部分内に引き込む、In the second step, the getter is activated by heating at the second heating temperature to improve the degree of vacuum in the chamber, and a part of the member that has undergone glass transition is drawn into the second part.
請求項1に記載の真空装置の製造方法。A method for manufacturing the vacuum device according to claim 1 .
前記第2ステップでは、前記第2加熱温度による加熱により前記部材を前記ガラス転移点よりも高く前記軟化点よりも低い温度で加熱することで前記部材を一定期間ゴム状態で保持する、In the second step, the member is heated at the second heating temperature to a temperature higher than the glass transition point and lower than the softening point, thereby maintaining the member in a rubbery state for a certain period of time.
請求項1又は2に記載の真空装置の製造方法。A method for manufacturing a vacuum device according to claim 1 or 2.
前記部材はビスマス系無鉛ガラスである、The member is a bismuth-based lead-free glass.
請求項1から3のいずれか1項に記載の真空装置の製造方法。The method for manufacturing a vacuum device according to any one of claims 1 to 3.
前記第2ステップでは、前記部材を変形させる加熱の前に、前記真空加熱炉内で当該加熱の際の加熱温度よりも低い加熱温度で前記真空装置を加熱することで前記部屋内を脱ガスする、
請求項1から4のいずれか1項に記載の真空装置の製造方法。
In the second step, before the heating for deforming the member, the vacuum device is heated at a heating temperature lower than the heating temperature during the heating in the vacuum heating furnace to degas the chamber.
A method for manufacturing a vacuum device according to any one of claims 1 to 4.
前記真空装置は、前記真空室の気圧と測定対象の気圧との差圧を検出する圧力センサである、
請求項1からのいずれか1項に記載の真空装置の製造方法。
The vacuum device is a pressure sensor that detects a differential pressure between the air pressure in the vacuum chamber and the air pressure of the object to be measured.
A method for manufacturing a vacuum device according to any one of claims 1 to 5 .
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