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JP7629776B2 - Electrode, anode for water electrolysis, electrolysis cell, and method for producing hydrogen - Google Patents
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JP7629776B2 - Electrode, anode for water electrolysis, electrolysis cell, and method for producing hydrogen - Google Patents

Electrode, anode for water electrolysis, electrolysis cell, and method for producing hydrogen Download PDF

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JP7629776B2
JP7629776B2 JP2021052313A JP2021052313A JP7629776B2 JP 7629776 B2 JP7629776 B2 JP 7629776B2 JP 2021052313 A JP2021052313 A JP 2021052313A JP 2021052313 A JP2021052313 A JP 2021052313A JP 7629776 B2 JP7629776 B2 JP 7629776B2
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JP2022149949A (en
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英明 新納
雄一 藤井
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Asahi Kasei Corp
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Priority to US18/551,193 priority patent/US20240175149A1/en
Priority to EP22775858.8A priority patent/EP4317054A4/en
Priority to PCT/JP2022/014663 priority patent/WO2022203077A1/en
Priority to KR1020237030373A priority patent/KR20230142590A/en
Priority to AU2022245619A priority patent/AU2022245619B2/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Description

本発明は、電極、水電解用陽極、該水電解用陽極を用いた複極式電解セル、及び該水電解用陽極を用いた水素の製造方法に関する。 The present invention relates to an electrode, an anode for water electrolysis, a bipolar electrolysis cell using the anode for water electrolysis, and a method for producing hydrogen using the anode for water electrolysis.

近年、COによる地球温暖化、化石燃料の埋蔵量の減少等の問題を解決するためのクリーンエネルギーとして、再生可能エネルギーを利用して製造した水素が注目されている。再生可能エネルギーを利用した水素製造においては、従来の化石燃料の改質による水素製造に匹敵する安価なコストが求められている。そのため、再生可能エネルギーを利用した水素製造には、従来の技術では達成できなかった水準の高いエネルギー効率と安価な設備が求められる。 In recent years, hydrogen produced using renewable energy has been attracting attention as a clean energy source to solve problems such as global warming caused by CO2 and dwindling reserves of fossil fuels. Hydrogen production using renewable energy requires low costs comparable to those of conventional hydrogen production by reforming fossil fuels. Therefore, hydrogen production using renewable energy requires high levels of energy efficiency and inexpensive equipment that could not be achieved with conventional technologies.

上記の要求に応え得る水素の製造方法として、水の電解分解(水電解)が挙げられる。例えば、風力又は太陽光等の自然エネルギーによる発電を利用した水電解により、水素を製造し、貯蓄あるいは運搬する構想がいくつも提案されている。 One method of producing hydrogen that can meet the above requirements is the electrolytic decomposition of water (water electrolysis). For example, several ideas have been proposed to produce hydrogen through water electrolysis using power generated by natural energies such as wind or solar power, and then store or transport it.

水の電気分解では、水に電流を流すことにより陽極において酸素が発生し、陰極において水素が発生する。電解における主なエネルギー損失の要因として、陽極及び陰極の過電圧が挙げられる。この過電圧を低減することで、効率よく水素を製造することが可能になる。特に陽極の過電圧は陰極の過電圧に比べて高く、陽極の過電圧を下げるための研究開発が広く進められている。 In water electrolysis, oxygen is generated at the anode and hydrogen is generated at the cathode by passing an electric current through the water. The main cause of energy loss in electrolysis is the overvoltage of the anode and cathode. Reducing this overvoltage makes it possible to produce hydrogen efficiently. In particular, the overvoltage of the anode is higher than the overvoltage of the cathode, and research and development into reducing the overvoltage of the anode is being widely pursued.

ペロブスカイト型構造を有する酸化物の中には、高い酸素発生能を有する材料が知られており、水電解用陽極材料として着目されている(非特許文献1)。ペロブスカイト型構造を有する酸化物を、アルカリ水電解用陽極として用いるためには、導電性基材の表面上に酸化物層を形成する方法がある。例えば特許文献1には、ニッケル多孔基材の表面上に、結晶成分におけるペロブスカイト型酸化物の含有率が高い金属酸化物の層を形成させることで、低い酸素過電圧と高い耐久性を有する水電解用陽極、およびその陽極を用いた水電解装置が開示されている。 Among oxides having a perovskite structure, materials with high oxygen generating capacity are known, and they have attracted attention as anode materials for water electrolysis (Non-Patent Document 1). In order to use an oxide having a perovskite structure as an anode for alkaline water electrolysis, there is a method of forming an oxide layer on the surface of a conductive substrate. For example, Patent Document 1 discloses a water electrolysis anode with low oxygen overvoltage and high durability by forming a metal oxide layer with a high content of perovskite oxide in the crystalline component on the surface of a nickel porous substrate, and a water electrolysis device using the anode.

国際公開第2018/155503号International Publication No. 2018/155503

Science,2011,334,1383Science, 2011, 334, 1383

特許文献1に記載の陽極は、長時間の通電に対し高い耐久性を示すが、通電のない状態で特に高い液温のアルカリ性電解液に浸漬すると、過電圧が上昇する課題があると分かった。 The anode described in Patent Document 1 exhibits high durability when electricity is applied for long periods of time, but it has been found that there is a problem in that overvoltage increases when the anode is immersed in an alkaline electrolyte at a particularly high temperature in a state where no electricity is applied.

本発明は、このような問題に鑑みてなされたものであり、酸素発生の過電圧が低く、高温アルカリ耐久性の高い電極、水電解用の陽極、該水電解用陽極を用いた複極式電解セル、及び該水電解用陽極を用いた水素の製造方法を提供することを目的とする。 The present invention has been made in consideration of these problems, and aims to provide an electrode with low oxygen generation overvoltage and high high-temperature alkaline durability, an anode for water electrolysis, a bipolar electrolysis cell using the anode for water electrolysis, and a method for producing hydrogen using the anode for water electrolysis.

本発明者らは、上記課題を解決すべく鋭意研究し、実験を重ねた。その結果、基材上に特定の組成および構造を有するLaNi3-z層を形成させた電極が、低い酸素過電圧と高い高温アルカリ耐久性を有し、水電解用陽極として使用可能であることを見出し、本発明に至った。 The present inventors have conducted extensive research and experiments to solve the above problems, and as a result have found that an electrode having a LaNi x M y O 3-z layer having a specific composition and structure formed on a substrate has low oxygen overvoltage and high high-temperature alkaline durability and can be used as an anode for water electrolysis, thereby completing the present invention.

すなわち、本発明は、以下のとおりである。
[1]基材上に、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.6以下、zは-0.5以上0.5以下、Mは少なくともNb、Ta、Sb、Ti、Mn、Zrのいずれか1種を含む)を有し、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°以下であることを特徴とする、電極。
[2]yが0.002以上0.2未満である、[1]に記載の電極。
[3]LaNi3-zのXRDメインピーク位置2θが32.7°以上33.2°以下である、[1]または[2]に記載の電極。
[4]MがNbである、[1]~[3]のいずれか1つに記載の電極。
[5]LaNi3-zのXRDメインピーク半値幅が0.6°以上0.85°以下である、[1]~[4]のいずれか1つに記載の電極。
[6]LaNi3-zのXRDメインピーク強度が6,000以上100,000以下である、[1]~[5]のいずれか1つに記載の電極。
[7][1]~[6]のいずれか一つに記載の電極を陽極に用いてなることを特徴とする、電解セル。
[8]アルカリを含有する水を電解槽により水電解し、水素を製造する水素製造方法において、前記電解槽は、少なくとも陽極と陰極を備え、前記陽極は、基材上に、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.6以下、zは-0.5以上0.5以下、Mは少なくともNb、Ta、Sb、Ti、Mn、Zrのいずれか1種を含む)を有し、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°以下であることを特徴とする、水素の製造方法。
That is, the present invention is as follows.
[1] An electrode having LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.6 or less, z is -0.5 or more and 0.5 or less, and M contains at least one of Nb, Ta, Sb, Ti, Mn, and Zr) on a substrate, the XRD main peak position 2θ of LaNi x M y O 3-z being 32.6° or more and 33.2° or less.
[2] The electrode according to [1], wherein y is 0.002 or more and less than 0.2.
[3] The electrode according to [1] or [2], wherein the XRD main peak position 2θ of LaNi x M y O 3-z is 32.7° or more and 33.2° or less.
[4] The electrode according to any one of [1] to [3], wherein M is Nb.
[5] The electrode according to any one of [1] to [4], wherein the XRD main peak half width of LaNi x M y O 3-z is 0.6° or more and 0.85° or less.
[6] The electrode according to any one of [1] to [5], wherein the XRD main peak intensity of LaNi x M y O 3-z is 6,000 or more and 100,000 or less.
[7] An electrolytic cell comprising the electrode according to any one of [1] to [6] as an anode.
[8] A method for producing hydrogen by electrolyzing alkali-containing water in an electrolytic cell to produce hydrogen, the electrolytic cell comprising at least an anode and a cathode, the anode having LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.6 or less, z is -0.5 or more and 0.5 or less, M is at least one of Nb, Ta, Sb, Ti, Mn and Zr) on a substrate, and the XRD main peak position 2θ of LaNi x M y O 3-z is 32.6° or more and 33.2° or less.

本発明によれば、低い酸素過電圧を有し、かつ高温のアルカリへの耐久性に優れた安価な電極、水電解用陽極及びこの水電解用陽極を備えた水電解セルを得られる。 The present invention provides an inexpensive electrode that has low oxygen overvoltage and excellent durability against high-temperature alkali, a water electrolysis anode, and a water electrolysis cell equipped with this water electrolysis anode.

本実施形態の電極を陽極として備える電解セルを含む電解槽の一例の全体について示す側面図である。FIG. 1 is a side view showing an example of an entire electrolytic cell including an electrolytic cell having the electrode of the present embodiment as an anode. 本実施形態の電極を陽極として備える電解セルを含む電解槽の、図1の破線四角枠の部分の電解セル内部の断面を示す図である。FIG. 2 is a diagram showing a cross section of the inside of an electrolytic cell of an electrolytic cell including the electrode of the present embodiment as an anode, the electrolytic cell being surrounded by a dashed rectangular frame in FIG. 1 . 実施例、比較例で用いた電解装置の概要を示す図である。FIG. 1 is a diagram showing an outline of an electrolysis device used in Examples and Comparative Examples. 電解試験で用いた複極式電解槽の概要を示す図である。FIG. 1 is a diagram showing an outline of a bipolar electrolytic cell used in an electrolysis test.

以下、本発明を実施するための形態(以下、「本実施形態」という。)について詳細に説明する。なお、以下の本実施形態は本発明を説明するための例示であり、本発明を限定する趣旨ではない。また、本発明は、その要旨を逸脱しない限り、さまざまな変形が可能である。 The following describes in detail the form for carrying out the present invention (hereinafter, referred to as the "present embodiment"). Note that the following present embodiment is an example for explaining the present invention, and is not intended to limit the present invention. Furthermore, the present invention can be modified in various ways without departing from the gist of the invention.

(電極)
本実施形態において、電極は、少なくとも、基材を有することが第一の特徴である。
基材は、導電性を有することが好ましい。導電性基材の材質としては、例えば、ニッケル、ニッケルを主成分とした材料、チタン、GC(Glassy Carbon)、タンタル、ジルコニウム、金、白金、パラジウム等が挙げられる。ニッケルを主成分とした材料としては、例えばモネル、インコネルやハステロイなどのニッケル基合金が挙げられる。
電極調製時の焼成工程に対する耐熱性の観点から、基材の材質は金属であることがより好ましい。加えて、アルカリ水溶液中の酸素発生電位においても溶解されずかつ貴金属と比較して安価に入手できる金属であり、耐久性、導電性及び経済性の観点から、ニッケルまたはニッケルを主成分とした材料がさらに好ましい。
電極の導電性基材の形状としては、平板状でもよいが、多数の孔を有する板状である多孔体であってもよい。多孔体の具体的な形状としては、エキスパンドメタル、パンチングメタル、平織メッシュ、発泡金属、又はこれらに類似する形状が挙げられる。これらの中で、エキスパンドメタルが好ましく、寸法は特に制限されないが、電解表面積増加によるガス発生量の増加と、電解により発生するガスの電極表面からの効率的な除去を両立させるため、また、機械的強度の観点から、メッシュの短目方向の中心間距離(SW)は2mm以上5mm以下、メッシュの長目方向の中心間距離(LW)は3mm以上10mm以下、厚みは0.2mm以上2mm以下、開口率は20%以上80%以下が好ましい。より好ましくは、SWは3mm以上4mm以下、LWは4mm以上6mm以下、厚みは0.8mm以上1.5mm以下、開口率は40%以上60%以下である。
(electrode)
In this embodiment, the electrode has at least a substrate.
The substrate is preferably conductive. Examples of the conductive substrate include nickel, materials containing nickel as a main component, titanium, glassy carbon (GC), tantalum, zirconium, gold, platinum, and palladium. Examples of materials containing nickel as a main component include nickel-based alloys such as Monel, Inconel, and Hastelloy.
From the viewpoint of heat resistance in the firing step during electrode preparation, the material of the substrate is preferably a metal, and further preferably nickel or a material mainly composed of nickel, which is a metal that is not dissolved even at the oxygen generating potential in an alkaline aqueous solution and is available at a lower cost than precious metals, from the viewpoints of durability, electrical conductivity, and economy.
The shape of the conductive substrate of the electrode may be flat, or may be a porous body having a plate shape with many holes. Specific shapes of the porous body include expanded metal, punched metal, plain weave mesh, foam metal, or shapes similar thereto. Among these, expanded metal is preferred, and the dimensions are not particularly limited, but in order to achieve both an increase in the amount of gas generated due to an increase in the electrolysis surface area and efficient removal of the gas generated by electrolysis from the electrode surface, and from the viewpoint of mechanical strength, the center-to-center distance (SW) in the short direction of the mesh is preferably 2 mm or more and 5 mm or less, the center-to-center distance (LW) in the long direction of the mesh is preferably 3 mm or more and 10 mm or less, the thickness is preferably 0.2 mm or more and 2 mm or less, and the aperture ratio is preferably 20% or more and 80% or less. More preferably, SW is 3 mm or more and 4 mm or less, LW is 4 mm or more and 6 mm or less, the thickness is 0.8 mm or more and 1.5 mm or less, and the aperture ratio is 40% or more and 60% or less.

本実施形態において、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.6以下、zは-0.5以上0.5以下、Mは少なくともNb、Ta、Sb、Ti、Mn、Zrのいずれか1種を含む)を有することが、第二の特徴である。
本実施形態においては、ペロブスカイト型構造の金属酸化物として、Bサイトの少なくとも一部に、Niを配置することで、高い酸素発生能を実現することができる。さらに、Niと共にBサイトに元素Mを配置することが、高温のアルカリに対する耐久性を付与する要件の一つである。元素Mとしては、少なくともNb、Ta、Sb、Ti、Mn、Zrのいずれか1種を含む。MとしてNb、Ta、Sb、Ti、Mn、Zrの2種類以上が含まれていても良い。Mとして、少量の添加で高温のアルカリに耐久性を付与できる観点から、Nb、Ta、Sb、Ti、Zrが好ましく、高温のアルカリ耐久性に優れる観点から、さらに好ましくはTa、Sb、Tiであり、さらに少量の添加で、高温のアルカリに対する耐久性と過電圧を両立が可能な観点から、Nbが最も好ましい。
x+yは、高温の耐アルカリ性の観点から0.8以上1.2以下である。高温の耐アルカリ性と過電圧を両立する観点から、好ましくは0.8以上1.05以下であり、さらに好ましくは、1.0以上1.05以下である。
yは、高温の耐アルカリ性の観点から、0.001以上0.6以下である。高温の耐アルカリ性と過電圧を両立する観点から、好ましくは0.002以上0.2未満であり、さらに好ましくは、0.005以上0.1以下である。
zは、-0.5以上0.5以下である。本発明において、zは、Laを3価、Niを3価、Nbを5価、Taを5価、Sbを5価、Tiを4価、Mnを3価、Zrを4価、Oを-2価とし、組成式の価数バランスが合うように計算し求められるOの組成比率3-zより求められる。例えば、組成式LaNiZr3-zにおいて、x=0.9、y=0.1であれば、3-z=(3+3×0.9+4×0.1)/2の関係式から、z=-0.05と求まる。
基材上に、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.6以下、zは-0.5以上0.5以下、Mは少なくともNb、Ta、Sb、Ti、Mn、Zrのいずれか1種を含む)を有することは、例えば、基材上の金属酸化物層を剥離して王水等の酸に溶解し、ICP-AES(誘導結合プラズマ発光分光分析)法により組成分析を行う方法や、基材上の金属酸化物層を剥離して蛍光X線分析装置により組成分析を行う方法や、電極断面のSEM-EDX分析など公知の方法により確認することができる。
A second feature of this embodiment is that it has LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.6 or less, z is −0.5 or more and 0.5 or less, and M includes at least one of Nb, Ta, Sb, Ti, Mn, and Zr).
In this embodiment, as a metal oxide having a perovskite structure, high oxygen generating ability can be realized by disposing Ni at least in a part of the B site. Furthermore, disposing element M at the B site together with Ni is one of the requirements for imparting durability to high-temperature alkali. Element M includes at least one of Nb, Ta, Sb, Ti, Mn, and Zr. M may include two or more of Nb, Ta, Sb, Ti, Mn, and Zr. As M, from the viewpoint of being able to impart durability to high-temperature alkali with a small amount of addition, Nb, Ta, Sb, Ti, and Zr are preferred, and from the viewpoint of excellent durability to high-temperature alkali, Ta, Sb, and Ti are more preferred, and from the viewpoint of being able to achieve both durability to high-temperature alkali and overvoltage with a small amount of addition, Nb is the most preferred.
From the viewpoint of high-temperature alkali resistance, x+y is 0.8 or more and 1.2 or less. From the viewpoint of achieving both high-temperature alkali resistance and overvoltage, x+y is preferably 0.8 or more and 1.05 or less, and more preferably 1.0 or more and 1.05 or less.
From the viewpoint of high-temperature alkali resistance, y is 0.001 or more and 0.6 or less. From the viewpoint of achieving both high-temperature alkali resistance and overvoltage, y is preferably 0.002 or more and less than 0.2, and more preferably 0.005 or more and 0.1 or less.
z is -0.5 or more and 0.5 or less. In the present invention, z is determined from the composition ratio 3-z of O calculated by assuming La to be trivalent, Ni to be trivalent, Nb to be pentavalent, Ta to be pentavalent, Sb to be pentavalent, Ti to be tetravalent, Mn to be trivalent, Zr to be tetravalent, and O to be -2 valent, so that the valence balance of the composition formula is matched. For example, in the composition formula LaNi x ZryO3 -z , if x = 0.9 and y = 0.1, z = -0.05 is determined from the relational formula 3-z = (3 + 3 x 0.9 + 4 x 0.1) / 2.
The presence of LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.6 or less, z is −0.5 or more and 0.5 or less, and M includes at least one of Nb, Ta, Sb, Ti, Mn, and Zr) on the substrate can be confirmed by a known method such as a method of peeling off a metal oxide layer on the substrate and dissolving it in an acid such as aqua regia, and performing a composition analysis by ICP-AES (inductively coupled plasma atomic emission spectroscopy), a method of peeling off a metal oxide layer on the substrate and performing a composition analysis by an X-ray fluorescence analyzer, or SEM-EDX analysis of the cross section of the electrode.

本実施形態において、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°以下であることが、第三の特徴である。
本実施形態において、LaNi3-zのXRDメインピーク位置は、電極によりシフトするが、X線源としてCuのKα1線を使用し、電極のXRD(X線回折)を測定した際、PDF01-070-5757カードのLaNiOの(104)面メインピーク位置2θ=33.166°を参考に、2θ=32.5°~33.2°付近のピークを、LaNi3-zのメインピーク位置とする。
LaNi3-zのメインピーク位置は、2θ=43.276°付近のNiOのメインピーク位置2θが、PDF00-047-1049カードデータのNiOの(200)面の2θ=43.276°になるよう、「X軸のオフセット」ツールを使用してXRDスペクトルをシフト補正した後、算出する。
LaNi3-zのXRDメインピーク位置2θは、高温のアルカリ耐性の観点から、32.6°以上33.2°以下である。
A third feature of this embodiment is that the XRD main peak position 2θ of LaNi x M y O 3-z is 32.6° or more and 33.2° or less.
In this embodiment, the XRD main peak position of LaNi x M y O 3-z shifts depending on the electrode, but when Cu Kα1 ray is used as the X-ray source and XRD (X-ray diffraction) of the electrode is measured, the peak in the vicinity of 2θ = 32.5° to 33.2° is determined to be the main peak position of LaNi x M y O 3-z , referring to the (104) plane main peak position 2θ = 33.166° of LaNiO 3 on the PDF01-070-5757 card.
The main peak position of LaNi x M y O 3-z is calculated after shift-correcting the XRD spectrum using the "X-axis offset" tool so that the main peak position 2θ of NiO near 2θ = 43.276° becomes 2θ = 43.276° of the (200) plane of NiO in the PDF00-047-1049 card data.
The XRD main peak position 2θ of LaNi x M y O 3-z is 32.6° or more and 33.2° or less from the viewpoint of high temperature alkali resistance.

本発明者らは、LaNiOに対し所定量Niを元素Mで置換し、あるいはLaNiOに対し所定量元素Mを添加したLaNi3-zの、XRDメインピーク位置2θを32.6°以上33.2°になるように制御し調製したLaNi3-zが、驚くべきことに高温のアルカリへの高い耐久性を示すことを見出した。この理由は明らかではないが、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°とすることで、高温のアルカリとLaNi3-zの反応点となる酸素欠陥の濃度が低減し、また元素Mを添加することにより、高温のアルカリ中でLaNi3-z中の酸素欠陥の生成が抑制されたためであると思われる。 The present inventors have surprisingly found that LaNi x M y O 3-z , which is prepared by substituting a predetermined amount of Ni in LaNiO 3 with element M or adding a predetermined amount of element M to LaNiO 3 and controlling the XRD main peak position 2θ to be 32.6° or more and 33.2 °, exhibits high durability to high-temperature alkali. The reason for this is unclear, but it is believed that by adjusting the XRD main peak position 2θ of LaNi x M y O 3-z to be 32.6° or more and 33.2°, the concentration of oxygen defects that become reaction points between high-temperature alkali and LaNi x M y O 3-z is reduced, and by adding element M, the generation of oxygen defects in LaNi x M y O 3-z in high-temperature alkali is suppressed.

高温のアルカリへの耐久性に優れる観点から、32.7°以上33.2°以下が好ましく、高温のアルカリへの耐久性と過電圧を両立する観点から、さらに好ましくは32.75°以上33.2°以下であり、最も好ましくは、32.8°以上33.2°以下である。 From the viewpoint of excellent durability to high-temperature alkali, it is preferably 32.7° or more and 33.2° or less, and from the viewpoint of achieving both durability to high-temperature alkali and overvoltage, it is more preferably 32.75° or more and 33.2° or less, and most preferably 32.8° or more and 33.2° or less.

本実施形態において、LaNi3-zのXRDメインピーク半値幅は、高温のアルカリへの耐久性の観点から、0.6°以上0.85°以下が好ましい。メインピーク半値幅は、2θが31°以上35°以下の範囲をピークとして、算出される半値幅を指す。
LaNi3-zのXRDメインピーク半値幅は、より好ましくは0.6°以上0.8°以下であり、高温のアルカリへの耐久性と過電圧を両立する観点から、さらに好ましくは、0.6°以上0.75°以下である。
In this embodiment, the XRD main peak half width of LaNi x M y O 3-z is preferably 0.6° or more and 0.85° or less from the viewpoint of durability to high-temperature alkali. The main peak half width refers to the half width calculated with a peak in the range of 2θ of 31° or more and 35° or less.
The XRD main peak half width of LaNi x M y O 3-z is more preferably 0.6° or more and 0.8° or less, and from the viewpoint of achieving both high-temperature alkali durability and overvoltage, is further preferably 0.6° or more and 0.75° or less.

本実施形態において、LaNi3-zのXRDメインピーク強度は、高温のアルカリへの耐久性の観点から、6,000以上100,000以下であることが好ましい。メインピーク強度は、XRD測定装置D8 ADVANCE(ブルカージャパン株式会社販売)を用いて測定したメインピークのピーク位置の測定強度(Counts)から、ベースラインの強度を引いた強度を指す。測定条件は、実施例にて後述する。
LaNi3-zのXRDメインピーク強度は、より好ましくは、6,500以上5,0000以下であり、さらに好ましくは7,000以上20,000以下であり、高温のアルカリへの耐久性と過電圧を両立する観点から、最も好ましくは、7,000以上17,000以下である。
In this embodiment, the XRD main peak intensity of LaNi x M y O 3-z is preferably 6,000 or more and 100,000 or less from the viewpoint of durability against high-temperature alkali. The main peak intensity refers to the intensity obtained by subtracting the baseline intensity from the measured intensity (Counts) at the peak position of the main peak measured using an XRD measurement device D8 ADVANCE (sold by Bruker Japan Co., Ltd.). The measurement conditions will be described later in the examples.
The XRD main peak intensity of LaNi x M y O 3-z is more preferably 6,500 or more and 5,0000 or less, further preferably 7,000 or more and 20,000 or less, and from the viewpoint of achieving both high-temperature alkali durability and overvoltage, it is most preferably 7,000 or more and 17,000 or less.

本実施形態の電極は、水電解用陽極として実用に供することが可能であり、本実施形態の電極を陽極に用いた水電解用電解セル、及び該水電解用陽極を用いた水素の製造方法を提供することが可能である。水電解にはアルカリを含有する水を用いてよい。 The electrode of this embodiment can be put to practical use as an anode for water electrolysis, and it is possible to provide an electrolysis cell for water electrolysis using the electrode of this embodiment as the anode, and a method for producing hydrogen using the anode for water electrolysis. Water containing an alkali may be used for water electrolysis.

(電極の調製法)
本実施形態の電極は、基材にLa、Ni、Mの金属塩を含む水溶液(塗布液)を塗布し、乾燥、仮焼成を行い、基材上に所定重量のLaNi3-z前駆体を形成後、これを本焼成することにより調製することができる。
(Preparation of Electrodes)
The electrode of this embodiment can be prepared by applying an aqueous solution (coating liquid) containing metal salts of La, Ni, and M to a substrate, drying and pre-firing the resulting solution, forming a predetermined weight of LaNi x M y O 3-z precursor on the substrate, and then firing the resulting precursor.

金属塩としては、硝酸塩、オキシ硝酸塩、塩化物、シュウ酸塩、酒石酸塩、酢酸塩、硫酸塩、等水溶性の塩を用いることができる。金属塩は、無水塩でも、含水塩でも構わない。
La、Ni、Mは、金属塩の代わりに、酸化物あるいは水酸化物の水分散性のゾルを使用してもよい。
MとしてNbを用いる場合には、溶解性の観点から、シュウ酸ニオブもしくはシュウ酸ニオブアンモニウムを用いることが好ましい。また、MとしてSbを用いる場合には、酒石酸アンチモンを用いることが好ましい。
塗布液には、グリシン等のアミノ酸、シュウ酸や酒石酸等のカルボン酸等、有機配位子を添加することが、高温のアルカリへの耐久性の高いLaNi3-zの調製を容易にする観点から、好ましい。
特にグリシンと金属硝酸塩を溶解した塗布液を用いると、高温のアルカリへの耐久性と過電圧を両立する電極を調製することが容易となるため、グリシンは好ましい有機配位子である。
The metal salt may be a water-soluble salt such as a nitrate, oxynitrate, chloride, oxalate, tartrate, acetate, sulfate, etc. The metal salt may be either anhydrous or hydrated.
For La, Ni, and M, a water-dispersible sol of an oxide or hydroxide may be used instead of a metal salt.
When Nb is used as M, it is preferable to use niobium oxalate or ammonium niobium oxalate from the viewpoint of solubility. When Sb is used as M, it is preferable to use antimony tartrate.
It is preferable to add an organic ligand, such as an amino acid such as glycine, or a carboxylic acid such as oxalic acid or tartaric acid, to the coating liquid from the viewpoint of facilitating the preparation of LaNi x M y O 3-z , which has high resistance to high-temperature alkali.
In particular, when a coating solution in which glycine and a metal nitrate are dissolved is used, it becomes easy to prepare an electrode that has both high durability against high-temperature alkali and an overvoltage, and therefore glycine is a preferred organic ligand.

La、Ni、Mの金属塩を含む水溶液の濃度は、LaNi3-z基準の重量モル濃度で0.1mol/kg溶媒以上、4mol/kg溶媒以下が好ましい。0.1mol/kg溶媒以上では、少ない塗布回数で電極調製が可能となる。4mol/kg溶媒以下では、金属塩や有機配位子の溶解が容易となり、塗布液の生産性の観点から好ましい。より好ましくは、0.2mol/kg溶媒以上2.0mol/kg溶媒以下であり、さらに好ましくは0.2mol/kg溶媒以上1.0mol/kg溶媒以下である。 The concentration of the aqueous solution containing metal salts of La, Ni, and M is preferably 0.1 mol/kg or more and 4 mol/kg or less in terms of weight molar concentration based on LaNi x M y O 3-z. At 0.1 mol/kg or more, an electrode can be prepared with a small number of coatings. At 4 mol/kg or less, dissolution of metal salts and organic ligands becomes easy, which is preferable from the viewpoint of productivity of the coating solution. More preferably, it is 0.2 mol/kg or more and 2.0 mol/kg or less, and even more preferably, it is 0.2 mol/kg or more and 1.0 mol/kg or less.

基材に塗布液を塗布後、乾燥する温度は、50℃以上200℃以下が好ましい。50℃以上であれば、乾燥が3分以上1時間以内で完了し、生産性の観点から好ましい。200℃以下であれば、乾燥後基材の冷却時間が短くなり、生産性の観点から好ましい。
乾燥後の基材を仮焼成する温度は、300℃以上500℃以下が好ましい。300℃以上であれば、仮焼成が3分以上1時間以内で完了し、生産性の観点から好ましい。500℃以下であれば、乾燥後基材の冷却時間が短くなり、生産性の観点から好ましい。
The temperature at which the coating liquid is applied to the substrate and then dried is preferably 50° C. to 200° C. If the temperature is 50° C. or higher, the drying can be completed within 3 minutes to 1 hour, which is preferable from the viewpoint of productivity. If the temperature is 200° C. or lower, the cooling time of the substrate after drying can be shortened, which is preferable from the viewpoint of productivity.
The temperature for pre-baking the dried substrate is preferably 300° C. or higher and 500° C. or lower. If it is 300° C. or higher, the pre-baking is completed within 3 minutes to 1 hour, which is preferable from the viewpoint of productivity. If it is 500° C. or lower, the cooling time of the dried substrate is shortened, which is preferable from the viewpoint of productivity.

塗布、乾燥、仮焼成は、所望のLaNi3-z付着量の電極を調製するため、繰り返し行ってもよい。 The coating, drying and calcination steps may be repeated to prepare an electrode having a desired amount of LaNi x M y O 3-z deposited thereon.

本焼成する温度は、500℃以上1000℃以下で行うことが可能であるが、800℃以上で焼成することが好ましい。800℃以上で焼成すると、10分以上24時間以内の焼成時間で、LaNi3-zのXRDメインピーク位置2θを、32.6°以上33.2°になるように制御し、高温のアルカリへの耐久性の高い電極を調製することが可能となり、生産性の観点から好ましい。 The temperature for the main firing can be from 500° C. to 1000° C., but firing at 800° C. or higher is preferred. When firing at 800° C. or higher, the XRD main peak position 2θ of LaNi x M y O 3-z can be controlled to 32.6° to 33.2° for a firing time of 10 minutes to 24 hours, making it possible to prepare an electrode that is highly durable against high-temperature alkali, which is preferred from the viewpoint of productivity.

元素Mは、あらかじめLa、Niの金属塩、または酸化物あるいは水酸化物の水分散性のゾルを含む塗布液を塗布し、乾燥、仮焼成を行なった後、電極に元素Mの金属塩または酸化物あるいは水酸化物の水分散性のゾルを含む塗布液を上塗りする要領で塗布し、乾燥、仮焼成し、本焼成する方法で添加してもよい。
また、元素Mは、あらかじめLa、Niの金属塩または酸化物あるいは水酸化物の水分散性のゾルを含む塗布液を塗布し、乾燥、仮焼成、本焼成を行なった後、電極に元素Mの金属塩または酸化物あるいは水酸化物の水分散性のゾルを含む塗布液を上塗りする要領で塗布し、乾燥、仮焼成し、本焼成する方法で添加してもよい。
The element M may be added by a method in which a coating liquid containing a water-dispersible sol of a metal salt, or an oxide or hydroxide of La or Ni is applied in advance, dried, and pre-baked, and then a coating liquid containing a water-dispersible sol of a metal salt, oxide, or hydroxide of element M is applied to the electrode in a topcoat manner, dried, pre-baked, and finally baked.
Alternatively, the element M may be added by a method in which a coating liquid containing a water-dispersible sol of a metal salt, oxide, or hydroxide of La or Ni is applied in advance, followed by drying, pre-baking, and main baking, and then a coating liquid containing a water-dispersible sol of a metal salt, oxide, or hydroxide of the element M is applied to the electrode in a topcoat manner, followed by drying, pre-baking, and main baking.

(電解槽)
図1に、本実施形態の電極を陽極として備える電解セルを含む電解槽の一例の全体についての側面図を示す。
図2に、本実施形態の電極を陽極として備える電解セルを含む電解槽の一例のゼロギャップ構造の図(図1に示す破線四角枠の部分の断面図)を示す。
本実施形態の複極式電解槽50(図3参照)は、隔膜4が陽極2a及び陰極2cと接触してゼロギャップ構造Zが形成されている(図2参照)。
なお、図3に、実施例、比較例で用いた電解装置の概要を示す。図4に、電解試験で用いた複極式電解槽の概要を示す。
(Electrolytic cell)
FIG. 1 shows a side view of an example of an entire electrolytic cell including an electrolytic cell equipped with the electrode of this embodiment as an anode.
FIG. 2 shows a diagram of a zero gap structure of an example of an electrolytic cell including an electrolytic cell equipped with the electrode of this embodiment as an anode (a cross-sectional view of the part enclosed by the dashed square frame in FIG. 1).
In the bipolar electrolytic cell 50 (see FIG. 3) of this embodiment, the diaphragm 4 is in contact with the anode 2a and the cathode 2c to form a zero-gap structure Z (see FIG. 2).
The electrolysis apparatus used in the examples and comparative examples is shown in Fig. 3. The bipolar electrolytic cell used in the electrolysis tests is shown in Fig. 4.

(エレメント)
図1に示すように、複極式電解槽50では、複極式エレメント60が、陽極ターミナルエレメント51aと陰極ターミナルエレメント51cとの間に配置され、隔膜4は、陽極ターミナルエレメント51aと複極式エレメント60との間、隣接して並ぶ複極式エレメント60同士の間、及び複極式エレメント60と陰極ターミナルエレメント51cとの間に配置されている。
本実施形態では、特に、複極式電解槽50における、隣接する2つの複極式エレメント60間の互いの隔壁1間における部分、及び、隣接する複極式エレメント60とターミナルエレメントとの間の互いの隔壁1間における部分、を電解セル65と称する。電解セル65は、一方のエレメントの隔壁1、陽極室5a、陽極2a、及び、隔膜4、及び、他方のエレメントの陰極2c、陰極室5c、隔壁1を含む。
(element)
As shown in FIG. 1, in a bipolar electrolytic cell 50, a bipolar element 60 is disposed between an anode terminal element 51 a and a cathode terminal element 51 c, and diaphragms 4 are disposed between the anode terminal element 51 a and the bipolar element 60, between adjacent bipolar elements 60, and between the bipolar element 60 and the cathode terminal element 51 c.
In this embodiment, in particular, the portion between the partition walls 1 between two adjacent bipolar elements 60 and the portion between the partition walls 1 between adjacent bipolar elements 60 and terminal elements in the bipolar electrolytic cell 50 are referred to as the electrolytic cell 65. The electrolytic cell 65 includes the partition wall 1, anode chamber 5a, anode 2a, and diaphragm 4 of one element, and the cathode 2c, cathode chamber 5c, and partition wall 1 of the other element.

(電極室)
本実施形態における複極式電解槽50では、図2に示すとおり、隔壁1と外枠3と隔膜4とにより、電解液が通過する電極室5が画成されている。ここで、隔壁1を挟んで陽極側の電極室5が陽極室5a、陰極側の電極室5が陰極室5cである。
本実施形態においては、複極式電解槽のヘッダー管の配設態様としては、内部ヘッダー型及び外部ヘッダー型を採用できるところ、陽極及び陰極自身が占める空間も電極室の内部にある空間であるものとしてよい。また、特に、気液分離ボックスが設けられている場合、気液分離ボックスが占める空間も電極室の内部にある空間であるものとしてよい。
(Electrode chamber)
2, in the bipolar electrolytic cell 50 of this embodiment, an electrode chamber 5 through which the electrolytic solution passes is defined by the partition wall 1, the outer frame 3, and the diaphragm 4. Here, the electrode chamber 5 on the anode side across the partition wall 1 is the anode chamber 5a, and the electrode chamber 5 on the cathode side is the cathode chamber 5c.
In this embodiment, the header pipe of the bipolar electrolytic cell may be of an internal header type or an external header type, and the space occupied by the anode and cathode themselves may be considered to be the space inside the electrode chamber. In particular, when a gas-liquid separation box is provided, the space occupied by the gas-liquid separation box may be considered to be the space inside the electrode chamber.

(リブ)
本実施形態のアルカリ水電解用複極式電解セル65では、リブ6が電極2と物理的に接続されていることが好ましい。かかる構成によれば、リブ6が電極2の支持体となり、ゼロギャップ構造Zを維持しやすい。また、リブ6は隔壁1と電気的につながっていることが好ましい。また、リブ6を設けることでは、電極室5内における気液の流れの乱れにより電極室5に生じる対流を低減して、局所的な電解液の温度の上昇を抑制することができる。
ここで、リブに、電極が設けられていてもよく、リブに、集電体、導電性弾性体、電極がこの順に設けられていてもよい。
前述の一例のアルカリ水電解用複極式電解セルでは、陰極室において、陰極リブ-陰極集電体-導電性弾性体-陰極の順に重ね合わせられた構造が採用され、陽極室において、陽極リブ-陽極の順に重ね合わせられた構造が採用されている。
なお、前述の一例のアルカリ水電解用複極式電解セルでは、陰極室において上記「陰極リブ-陰極集電体-導電性弾性体-陰極」の構造が採用され、陽極室において上記「陽極リブ-陽極」の構造が採用されているが、本発明ではこれに限定されることなく、陽極室においても「陽極リブ-陽極集電体-導電性弾性体-陽極」構造が採用されてもよい。
詳細には、本実施形態のアルカリ水電解用複極式電解セルでは、図2に示すように、隔壁1にリブ6(陽極リブ、陰極リブ)が取り付けられていることが好ましい。
リブ(陽極リブ、陰極リブ)には、陽極又は陰極を支える役割だけでなく、電流を隔壁から陽極又は陰極へ伝える役割を備えることが好ましい。
本実施形態のアルカリ水電解用複極式電解セルでは、リブの少なくとも一部が導電性を備えことが好ましく、リブ全体が導電性を備えことがさらに好ましい。かかる構成によれば、電極たわみによるセル電圧の上昇を抑制することができる。
リブの材料としては、一般的に導電性の金属が用いられる。例えば、ニッケルメッキを施した軟鋼、ステンレススチール、ニッケル等が利用できる。リブの材料は、特に隔壁と同じ材料であることが好ましく、特にニッケルであることが最も好ましい。
隣接する陽極リブ同士の間隔、又は隣接する陰極リブ同士の間隔は、電解圧力や陽極室と陰極室の圧力差等を勘案して決められる。
陽極リブ同士の間隔、又は隣接する陰極リブ同士の間隔が狭すぎれば電解液やガスの流動を阻害するだけでなくコストも高くなる欠点がある。リブピッチが10mm以上であると、電極裏面へのガス抜けが良好となる。また広すぎると、陽極室と陰極室とのわずかな差圧で保持している電極(陽極や陰極)が変形したり、陽極リブや陰極リブの数が少なくなることによる電気抵抗が増したりする等の欠点が生じる。リブピッチが150mm以下であると電極がたわみにくくなる。リブの数、リブの長さ、リブと隔壁とのなす角度、貫通孔の数や貫通孔の隔壁に沿う所与の方向についての間隔(ピッチ)は、本発明の効果が得られる限り、適宜定められてよい。リブは、隔壁に沿う所与の方向(例えば、鉛直方向としてもよいし、図3に示すように隔壁の平面視形状が略長方形である場合、向かい合う2組の辺のうちの1組の辺の方向と同じ方向としてもよい)に対して平行に設けられることが好ましい。陽極リブのリブピッチと、陰極リブのリブピッチとは、同一であってもよいし異なっていてもよく、陽極リブのリブピッチ及び陰極リブのリブピッチが共に上記範囲を満たすことが好ましい。
陽極リブや陰極リブの隔壁への取り付けについてはレーザー溶接等が用いられる。
また、リブの厚みは、コストや製作性、強度等も考慮して、0.5mm以上5mm以下としてよく、lmm以上2mm以下のものが用いやすいが、特に限定されない。
電極や集電体のリブへの取り付けは、通常スポット溶接で行われるが、その他のレーザー溶接等による方法でもよく、更にはワイヤーやひも状の部材を用い、結びつけて密着させる方法でもよい。リブは、陽極又は陰極と同様に、スポット溶接、レーザー溶接等の手段で隔壁に固定されている。
(rib)
In the bipolar electrolytic cell 65 for alkaline water electrolysis of this embodiment, the rib 6 is preferably physically connected to the electrode 2. With such a configuration, the rib 6 serves as a support for the electrode 2, making it easy to maintain the zero gap structure Z. In addition, the rib 6 is preferably electrically connected to the partition wall 1. Furthermore, the provision of the rib 6 can reduce convection that occurs in the electrode chamber 5 due to turbulence in the gas-liquid flow in the electrode chamber 5, thereby suppressing a local increase in the temperature of the electrolyte.
Here, an electrode may be provided on the rib, or a current collector, a conductive elastic body, and an electrode may be provided on the rib in this order.
In the above-described example of the bipolar electrolytic cell for alkaline water electrolysis, a structure is adopted in which the cathode rib-cathode current collector-conductive elastic body-cathode are stacked in this order in the cathode chamber, and a structure is adopted in which the anode rib-anode are stacked in this order in the anode chamber.
In the above-mentioned example of the bipolar electrolytic cell for alkaline water electrolysis, the above-mentioned "cathode rib-cathode current collector-conductive elastic body-cathode" structure is adopted in the cathode chamber, and the above-mentioned "anode rib-anode" structure is adopted in the anode chamber; however, the present invention is not limited to this structure, and the anode chamber may also have an "anode rib-anode current collector-conductive elastic body-anode" structure.
In detail, in the bipolar electrolytic cell for alkaline water electrolysis of the present embodiment, as shown in FIG. 2 , ribs 6 (anode rib, cathode rib) are preferably attached to the partition wall 1.
It is preferable that the ribs (anode ribs, cathode ribs) not only have a role of supporting the anode or cathode but also have a role of conducting current from the partition wall to the anode or cathode.
In the bipolar electrolytic cell for alkaline water electrolysis of the present embodiment, it is preferable that at least a part of the rib is conductive, and it is more preferable that the entire rib is conductive. With such a configuration, an increase in cell voltage due to electrode deflection can be suppressed.
The material of the rib is generally a conductive metal, such as nickel-plated mild steel, stainless steel, nickel, etc. The material of the rib is preferably the same as that of the partition wall, and most preferably nickel.
The distance between adjacent anode ribs or the distance between adjacent cathode ribs is determined taking into consideration the electrolysis pressure and the pressure difference between the anode chamber and the cathode chamber, etc.
If the interval between the anode ribs or the interval between the adjacent cathode ribs is too narrow, not only the flow of the electrolyte or gas is hindered, but also the cost is increased. If the rib pitch is 10 mm or more, gas escape to the back surface of the electrode is favorable. If the rib pitch is too wide, the electrodes (anode and cathode) held by a slight pressure difference between the anode chamber and the cathode chamber are deformed, and the number of anode ribs and cathode ribs is reduced, resulting in defects such as increased electrical resistance. If the rib pitch is 150 mm or less, the electrodes are less likely to bend. The number of ribs, the length of the rib, the angle between the rib and the partition wall, the number of through holes, and the interval (pitch) of the through holes in a given direction along the partition wall may be appropriately determined as long as the effects of the present invention are obtained. The ribs are preferably provided parallel to a given direction along the partition wall (for example, the vertical direction may be set, or the same direction as the direction of one of two pairs of opposing sides when the partition wall has a substantially rectangular shape in plan view as shown in FIG. 3). The rib pitch of the anode rib and the rib pitch of the cathode rib may be the same or different, and it is preferable that the rib pitch of the anode rib and the rib pitch of the cathode rib both satisfy the above range.
The anode ribs and cathode ribs are attached to the bulkhead by laser welding or the like.
The thickness of the rib may be from 0.5 mm to 5 mm, taking into consideration cost, ease of production, strength, etc., and is not particularly limited, with a thickness of from 1 mm to 2 mm being preferred.
The electrodes and current collectors are usually attached to the ribs by spot welding, but other methods such as laser welding may also be used, or they may be tied together with a wire or string-like member for close contact. The ribs are fixed to the partition wall by spot welding, laser welding, or other means, in the same manner as the anode and cathode.

(水素の製造方法)
次に、本実施形態の複極式電解槽を用いたアルカリ水電解による水素の製造方法について説明する。
本実施形態においては、前述のような陽極及び陰極を備え、電解液が循環した複極式電解槽に電流を印加して水電解を行うことにより、陰極で水素を製造する。このとき、電源として、例えば変動電源を用いることができる。変動電源とは、系統電力等の、安定して出力される電源と異なり、再生可能エネルギー発電所由来の数秒乃至数分単位で出力が変動する電源のことである。再生可能エネルギー発電の方法は特に限定されないが、例えば、太陽光発電や風力発電が挙げられる。
例えば、複極式電解槽を利用した電解の場合、電解液中のカチオン性電解質は、エレメントの陽極室から、隔膜を通過して、隣接するエレメントの陰極室へ移動し、アニオン性電解質はエレメントの陰極室から隔膜を通過して、隣接するエレメントの陽極室へ移動する。よって、電解中の電流は、エレメントが直列に連結された方向に沿って、流れることになる。つまり、電流は、隔膜を介して、一方のエレメントの陽極室から、隣接するエレメントの陰極室に向かって流れる。電解に伴い、陽極室内で酸素ガスが生成し、陰極室内で水素ガスが生成する。
(Method of producing hydrogen)
Next, a method for producing hydrogen by alkaline water electrolysis using the bipolar electrolytic cell of this embodiment will be described.
In this embodiment, hydrogen is produced at the cathode by applying a current to a bipolar electrolytic cell having an anode and a cathode as described above and circulating an electrolyte, thereby performing water electrolysis. In this case, for example, a variable power supply can be used as the power supply. A variable power supply is a power supply derived from a renewable energy power plant whose output fluctuates in units of a few seconds to a few minutes, unlike a power supply that provides a stable output, such as grid power. The method of generating renewable energy is not particularly limited, but examples include solar power generation and wind power generation.
For example, in the case of electrolysis using a bipolar electrolytic cell, the cationic electrolyte in the electrolytic solution moves from the anode chamber of an element through the diaphragm to the cathode chamber of an adjacent element, and the anionic electrolyte moves from the cathode chamber of an element through the diaphragm to the anode chamber of the adjacent element. Thus, the current during electrolysis flows in the direction in which the elements are connected in series. That is, the current flows from the anode chamber of one element to the cathode chamber of the adjacent element through the diaphragm. As a result of electrolysis, oxygen gas is produced in the anode chamber and hydrogen gas is produced in the cathode chamber.

本実施形態のアルカリ水電解用複極式電解セル65は、複極式電解槽50、アルカリ水電解用電解装置70等に用いることができる。上記アルカリ水電解用電解装置70としては、例えば、本実施形態の複極式電解槽50と、電解液を循環させるための送液ポンプ71と、電解液と水素及び/又は酸素とを分離する気液分離タンク72と電解により消費した水を補給するための水補給器と、を有する装置等が挙げられる。
上記アルカリ水電解用電解装置は、さらに、整流器74、酸素濃度計75、水素濃度計76、流量計77、圧力計78、熱交換器79、圧力制御弁80等を備えてよい。
上記アルカリ水電解用電解装置を用いたアルカリ水電解方法において、電解セルに与える電流密度としては、4kA/m~20kA/mであることが好ましく、6kA/m~15kA/mであることがさらに好ましい。
特に、変動電源を使用する場合には、電流密度の上限を上記範囲にすることが好ましい。
The bipolar electrolytic cell 65 for alkaline water electrolysis of this embodiment can be used in the bipolar electrolytic cell 50, the electrolytic device 70 for alkaline water electrolysis, etc. Examples of the electrolytic device 70 for alkaline water electrolysis include a device including the bipolar electrolytic cell 50 of this embodiment, a liquid delivery pump 71 for circulating the electrolytic solution, a gas-liquid separation tank 72 for separating the electrolytic solution from hydrogen and/or oxygen, and a water supply device for supplying water consumed by electrolysis.
The alkaline water electrolysis apparatus may further include a rectifier 74, an oxygen concentration meter 75, a hydrogen concentration meter 76, a flow meter 77, a pressure meter 78, a heat exchanger 79, a pressure control valve 80, and the like.
In the alkaline water electrolysis method using the alkaline water electrolysis apparatus, the current density applied to the electrolytic cell is preferably 4 kA/m 2 to 20 kA/m 2 , and more preferably 6 kA/m 2 to 15 kA/m 2 .
In particular, when a variable power supply is used, it is preferable to set the upper limit of the current density within the above range.

以上、図面を参照して、本発明の実施形態の電極、電解セル、水素の製造方法について例示説明したが、本発明の電極、電解セル、水素の製造方法は、上記の例に限定されることはなく、上記実施形態には、適宜変更を加えることができる。 The electrodes, electrolytic cells, and hydrogen production methods of the present invention have been illustrated and described above with reference to the drawings. However, the electrodes, electrolytic cells, and hydrogen production methods of the present invention are not limited to the above examples, and the above embodiments can be modified as appropriate.

(実施例1)
ニッケル多孔基材として、SW3.0mm、LW4.5mm、厚み1.2mm、開口率54%のニッケルエキスパンドメタルを用意した。このニッケルエキスパンドメタルにブラスト処理を施した後に、縦10cm、横10cmの大きさの基板を切り出し、50℃6Nの塩酸中にて6時間酸処理した後、水洗、乾燥し、塗布用基材とした。
次に、表1の実施例1の組成のA液、B液を調製した。B液はシュウ酸ニオブアンモニウムを純水に溶解して調製し、Nbの濃度はICP-AES(誘導結合プラズマ発光分光分析)法により確認した。
底辺6cm×10cm、高さ11cmの角形のポリエチレン製容器にA液をいれ、マグネチックスターラーで撹拌しながら、B液をゆっくりと混合し、実施例1の塗布液とした。
塗布液を撹拌しながら、塗布用基材を縦向きにして、下半分を塗布液内に浸漬後、基材の上下をひっくり返して上半分も塗布液内に浸漬し、基材全面に塗布液を塗布後、基材を縦向きのままエアガンによるエアブロー処理により過剰な塗布液を吹き飛ばした。
その後、60℃で10分乾燥し、さらに400℃で10分間の焼成を行い、基材表面に金属酸化物層を形成した。
この塗布、乾燥及び焼成のサイクルを13回繰り返した後、さらに800℃で1時間の焼成を行い、塗布用基材上に付着量40g/mの金属酸化物層を形成させて、水電解用陽極を得た。
Example 1
As a nickel porous substrate, a nickel expand metal having SW 3.0 mm, LW 4.5 mm, thickness 1.2 mm, and aperture ratio 54% was prepared. After blasting treatment was performed on this nickel expand metal, a substrate having a length of 10 cm and a width of 10 cm was cut out, which was then acid-treated in 6N hydrochloric acid at 50° C. for 6 hours, washed with water, and dried to obtain a substrate for coating.
Next, solutions A and B were prepared having the compositions of Example 1 in Table 1. Solution B was prepared by dissolving ammonium niobium oxalate in pure water, and the concentration of Nb was confirmed by ICP-AES (inductively coupled plasma atomic emission spectrometry).
Solution A was placed in a rectangular polyethylene container measuring 6 cm at the base and 10 cm at the height of 11 cm, and solution B was slowly mixed in while stirring with a magnetic stirrer to prepare the coating solution of Example 1.
While stirring the coating liquid, the substrate to be coated was held vertically and the lower half was immersed in the coating liquid, and then the substrate was turned upside down and the upper half was also immersed in the coating liquid. After the coating liquid was applied to the entire surface of the substrate, the substrate was kept vertically oriented and then subjected to an air blowing treatment with an air gun to blow off excess coating liquid.
Thereafter, the substrate was dried at 60° C. for 10 minutes and then baked at 400° C. for 10 minutes to form a metal oxide layer on the surface of the substrate.
This cycle of coating, drying and firing was repeated 13 times, and then firing was further performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 40 g/m 2 on the coating substrate, thereby obtaining an anode for water electrolysis.

(実施例2~6)
実施例1と同じ方法で塗布用基材を準備し、表1の実施例2~6の組成のA液、B液を調製後、実施例1と同様にA液とB液を角型のポリエチレン製容器内で混合し、実施例2~6の塗布液を調製後、実施例1と同様に塗布、乾燥及び焼成のサイクルを繰り返した後、800℃で1時間の焼成を行い、塗布用基材上に付着量40g/mの金属酸化物層を形成させて、実施例2~6の水電解用陽極を得た。
(Examples 2 to 6)
A substrate for application was prepared in the same manner as in Example 1. Liquids A and B having the compositions of Examples 2 to 6 in Table 1 were prepared. Liquids A and B were then mixed in a rectangular polyethylene container in the same manner as in Example 1 to prepare the coating solutions of Examples 2 to 6. Then, a cycle of application, drying, and firing was repeated in the same manner as in Example 1, and firing was performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 40 g/ m2 on the substrate for application, thereby obtaining water electrolysis anodes of Examples 2 to 6.

(実施例7)
純水400gにNi(NO・6HOを9.30g、La(NO・6HOを34.64g、グリシン(CNO)を30.03g、Mn(NO・6HOを13.78g溶解し、実施例7の塗布液を調製し、この塗布液を、底辺13cm×13cm、高さ10cmのポリエチレン製容器に移した。
実施例1と同様にして塗布用基材を準備した。この基材を、容器内塗布液中に完全に浸漬して引き上げ、基材全面に塗布液を塗布後、基材を縦向きにして、エアガンによるエアブロー処理により過剰な塗布液を吹き飛ばした。
その後、60℃で10分乾燥し、さらに400℃で10分間の焼成を行い、基材表面に金属酸化物層を形成した。
この塗布、乾燥及び焼成のサイクルを13回繰り返した後、さらに800℃で1時間の焼成を行い、塗布用基材上に付着量40g/mの金属酸化物層を形成させて、水電解用陽極を得た。
(Example 7)
9.30 g of Ni( NO3 ) 2.6H2O , 34.64 g of La( NO3 ) 3.6H2O , 30.03 g of glycine ( C2H5NO2 ) , and 13.78 g of Mn( NO3 ) 2.6H2O were dissolved in 400 g of pure water to prepare a coating solution for Example 7. This coating solution was transferred to a polyethylene container having a base dimension of 13 cm x 13 cm and a height of 10 cm.
A substrate for coating was prepared in the same manner as in Example 1. This substrate was completely immersed in the coating liquid in a container and then pulled out, the coating liquid was applied to the entire surface of the substrate, and the substrate was then turned vertically, and excess coating liquid was blown off by air blowing treatment using an air gun.
Thereafter, the substrate was dried at 60° C. for 10 minutes and then baked at 400° C. for 10 minutes to form a metal oxide layer on the surface of the substrate.
This cycle of coating, drying and firing was repeated 13 times, and then firing was further performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 40 g/m 2 on the coating substrate, thereby obtaining an anode for water electrolysis.

(実施例8)
純水200gにNi(NO・6HOを18.61g、La(NO・6HOを34.64g、グリシンを27.63g溶解し、実施例8のA液とした。一次粒子径10nmのTiOゾルに純水を加えて希釈し、Ti濃度80mmol/kgゾルのTiOゾルを調製し、実施例8のB液とした。
実施例1と同様にA液とB液を角型のポリエチレン製容器内で混合し、実施例8の塗布液とした。実施例1と同様に塗布、乾燥及び焼成のサイクルを繰り返した後、800℃で1時間の焼成を行い、塗布用基材上に付着量40g/mの金属酸化物層を形成させて、実施例8の水電解用陽極を得た。
(Example 8)
18.61 g of Ni( NO3 ) 2.6H2O , 34.64 g of La( NO3 ) 3.6H2O , and 27.63 g of glycine were dissolved in 200 g of pure water to obtain a solution A of Example 8. A TiO2 sol having a primary particle size of 10 nm was diluted with pure water to prepare a TiO2 sol having a Ti concentration of 80 mmol/kg sol, which was obtained as a solution B of Example 8.
Solutions A and B were mixed in a rectangular polyethylene container in the same manner as in Example 1 to prepare a coating solution for Example 8. After repeating a cycle of coating, drying, and baking in the same manner as in Example 1, baking was performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 40 g/ m2 on the coating substrate, thereby obtaining an anode for water electrolysis of Example 8.

(実施例9)
純水400gにNi(NO・6HOを20.93g、La(NO・6HOを34.64g、グリシンを30.03g、ZrO(NO・2HOを2.14g溶解し、実施例7の塗布液を調製した。
その後、実施例7と同様にして、実施例9の水電解用陽極を得た。
(Example 9)
A coating solution of Example 7 was prepared by dissolving 20.93 g of Ni(NO 3 ) 2.6H 2 O, 34.64 g of La(NO 3 ) 3.6H 2 O, 30.03 g of glycine, and 2.14 g of ZrO(NO 3 ) 2.2H 2 O in 400 g of pure water.
Thereafter, the same procedure as in Example 7 was carried out to obtain an anode for water electrolysis of Example 9.

(実施例10)
純水400gにNi(NO・6HOを26.75g、La(NO・6HOを34.64g、グリシンを31.83g、TaClを1.43g溶解し、実施例10の塗布液を調製した。
その後、実施例7と同様にして、実施例10の水電解用陽極を得た。
(Example 10)
A coating solution of Example 10 was prepared by dissolving 26.75 g of Ni (NO 3 ) 2.6H 2 O, 34.64 g of La ( NO 3 ) 3.6H 2 O, 31.83 g of glycine, and 1.43 g of TaCl 5 in 400 g of pure water.
Thereafter, the same procedure as in Example 7 was carried out to obtain an anode for water electrolysis of Example 10.

(実施例11)
純水200gにNi(NO・6HOを17.45g、La(NO・6HOを34.64g、グリシン27.03gを溶解し、実施例11のA液とした。酒石酸アンチモンを純水に溶解し、Sb濃度が20mmol/kg溶液の酒石酸アンチモン溶液を調製し、実施例11のB液とした。Sbの濃度はICP-AES(誘導結合プラズマ発光分光分析)法により確認した。
実施例1と同様にA液とB液を角型のポリエチレン製容器内で混合し、実施例11の塗布液とした。実施例1と同様に塗布、乾燥及び焼成のサイクルを繰り返した後、800℃で1時間の焼成を行い、塗布用基材上に付着量40g/mの金属酸化物層を形成させて、実施例11の水電解用陽極を得た。
Example 11
17.45 g of Ni(NO3)2.6H2O , 34.64 g of La( NO3 ) 3.6H2O , and 27.03 g of glycine were dissolved in 200 g of pure water to prepare Solution A of Example 11. Antimony tartrate was dissolved in pure water to prepare an antimony tartrate solution with an Sb concentration of 20 mmol/kg, which was used as Solution B of Example 11. The Sb concentration was confirmed by ICP-AES (inductively coupled plasma-atomic emission spectroscopy).
Similarly to Example 1, solutions A and B were mixed in a rectangular polyethylene container to prepare a coating solution for Example 11. After repeating a cycle of coating, drying, and baking in the same manner as in Example 1, baking was performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 40 g/ m2 on the coating substrate, thereby obtaining an anode for water electrolysis for Example 11.

(実施例12)
純水400gにNi(NO・6HOを23.26g、La(NO・6HOを34.64g、グリシンを30.03g溶解し、実施例12の塗布液を調製した。
実施例1と同じ方法で塗布用基材を準備し、スプレーコート装置(旭サナック株式会社販売rCoater)を使用して、基材の両面に塗布液を塗布後、60℃で10分乾燥し、さらに400℃で10分間の焼成を行い、基材表面に金属酸化物層を形成した。
この塗布、乾燥及び焼成のサイクルを24回繰り返した。
さらに、一次粒子径5nm以下のNbゾルを希釈して、Nb濃度が200mmol/kgゾルのNbゾルを調製した。
このNbゾルを、スプレーコート装置により両面塗布後60℃10分乾燥し、塗布前の基材に対する重量増加を算出したところ、38mgであった。LaNiOの基材への担持量が1.4gであり、LaNiOの1モルの重量が245.6g、Nbの1モルの重量が265.2gであることから、38mgのNbを塗布したことにより、LaNiO1モルに対しNbを0.05モルの比率で塗布したと分かった。
60℃10分乾燥した基材を400℃10分焼成し、さらに800℃1時間焼成し、付着量144g/mの金属酸化物層を形成させて、実施例12の水電解用陽極を得た。
Example 12
A coating solution of Example 12 was prepared by dissolving 23.26 g of Ni (NO 3 ) 2.6H 2 O, 34.64 g of La(NO 3 ) 3.6H 2 O, and 30.03 g of glycine in 400 g of pure water.
A substrate for application was prepared in the same manner as in Example 1, and the coating liquid was applied to both sides of the substrate using a spray coating device (rCoater sold by Asahi Sunac Corporation). The substrate was then dried at 60°C for 10 minutes and then baked at 400°C for 10 minutes to form a metal oxide layer on the substrate surface.
This cycle of coating, drying and baking was repeated 24 times.
Furthermore, Nb 2 O 5 sol having a primary particle size of 5 nm or less was diluted to prepare Nb 2 O 5 sol having an Nb concentration of 200 mmol/kg sol.
This Nb2O5 sol was applied to both sides using a spray coater, dried at 60°C for 10 minutes, and the weight increase relative to the substrate before application was calculated to be 38mg. Since the amount of LaNiO3 supported on the substrate was 1.4g, the weight of 1 mole of LaNiO3 was 245.6g, and the weight of 1 mole of Nb2O5 was 265.2g, it was found that 0.05 moles of Nb was applied to 1 mole of LaNiO3 by applying 38mg of Nb2O5 .
The substrate dried at 60° C. for 10 minutes was baked at 400° C. for 10 minutes and further baked at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 144 g/m 2 , thereby obtaining an anode for water electrolysis of Example 12.

(実施例13)
実施例12と同様にして、実施例13の塗布液を調製した。その後、この塗布液を、底辺13cm×13cm、高さ10cmのポリエチレン製容器に移した。
実施例1と同じ方法で塗布用基材を準備した。この基材を、容器内塗布液中に完全に浸漬して引き上げ、基材全面に塗布液を塗布後、基材を横向きにして、エアガンによるエアブロー処理により過剰な塗布液を吹き飛ばした。その後、60℃で10分乾燥し、さらに400℃で10分間の焼成を行い、基材表面に金属酸化物層を形成した。
この塗布、乾燥及び焼成のサイクルを24回繰り返した。
シュウ酸ニオブアンモニウムを純水に溶解し、Nb濃度43.8mmol/kg溶液のシュウ酸ニオブアンモニウム水溶液を調製した。このシュウ酸ニオブアンモニウム水溶液を、底辺13cm×13cm、高さ10cmのポリエチレン製容器に移した。
基材表面に金属酸化物層を形成した基材をシュウ酸ニオブアンモニウム水溶液中に完全に浸漬して引き上げ、基材全面に塗布液を塗布後、基材を横向きにして、エアガンにより微弱な風をあてて、基材の目に詰まっている塗布液を落とした。エアガン処理後基材の重量を測定すると、基材にはシュウ酸ニオブアンモニウム水溶液が1.3g塗布されていた。LaNiOの基材への担持量が1.4gであり、LaNiOの1モルの重量が245.6gであることから、1.3gのNb濃度43.8mmol/kg溶液のシュウ酸ニオブアンモニウム水溶液を塗布したことにより、LaNiO1モルに対しNbを0.01モルの比率で塗布したと分かった。
シュウ酸ニオブアンモニウム水溶液を塗布した基材を60℃10分乾燥後、400℃10分焼成し、さらに800℃1時間焼成し、付着量141g/mの金属酸化物層を形成させて、実施例13の水電解用陽極を得た。
Example 13
A coating solution for Example 13 was prepared in the same manner as in Example 12. Thereafter, this coating solution was transferred to a polyethylene container having a base dimension of 13 cm×13 cm and a height of 10 cm.
A substrate for coating was prepared in the same manner as in Example 1. This substrate was completely immersed in the coating solution in the container and then pulled out, the coating solution was applied to the entire surface of the substrate, and the substrate was then turned sideways and the excess coating solution was blown off by air blowing using an air gun. Thereafter, the substrate was dried at 60°C for 10 minutes and further baked at 400°C for 10 minutes to form a metal oxide layer on the substrate surface.
This cycle of coating, drying and baking was repeated 24 times.
Ammonium niobium oxalate was dissolved in pure water to prepare an aqueous solution of ammonium niobium oxalate with a Nb concentration of 43.8 mmol/kg. The aqueous solution of ammonium niobium oxalate was transferred to a polyethylene container having a base of 13 cm×13 cm and a height of 10 cm.
The substrate with a metal oxide layer formed on the substrate surface was completely immersed in an aqueous solution of ammonium niobium oxalate and pulled out, and the entire substrate surface was coated with the coating solution. The substrate was then turned sideways and a weak wind was applied from an air gun to remove the coating solution that had clogged the substrate. When the weight of the substrate was measured after the air gun treatment, 1.3 g of an aqueous solution of ammonium niobium oxalate was applied to the substrate. Since the amount of LaNiO3 supported on the substrate was 1.4 g and the weight of 1 mole of LaNiO3 was 245.6 g, it was found that 1.3 g of an aqueous solution of ammonium niobium oxalate with an Nb concentration of 43.8 mmol/kg was applied, and Nb was applied at a ratio of 0.01 mole to 1 mole of LaNiO3.
The substrate coated with the aqueous solution of ammonium niobium oxalate was dried at 60° C. for 10 minutes, then baked at 400° C. for 10 minutes and further baked at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 141 g/ m2 , thereby obtaining an anode for water electrolysis of Example 13.

(実施例14)
実施例13と同様にして、乾燥及び焼成のサイクルを24回繰り返した後、800℃1時間焼成を行い、基材表面に金属酸化物層を形成した。
シュウ酸ニオブアンモニウムを純水に溶解し、Nb濃度87.7mmol/kg溶液のシュウ酸ニオブアンモニウム水溶液を調製した。このシュウ酸ニオブアンモニウム水溶液を、底辺13cm×13cm、高さ10cmのポリエチレン製容器に移した。
基材表面に金属酸化物層を形成した基材をシュウ酸ニオブアンモニウム水溶液中に完全に浸漬して引き上げ、基材全面に塗布液を塗布後、基材を横向きにして、エアガンにより微弱な風をあてて、基材の目に詰まっている塗布液を落とした。エアガン処理後基材の重量を測定すると、基材にはシュウ酸ニオブアンモニウム水溶液が1.3g塗布されていた。LaNiOの基材への担持量が1.4gであり、LaNiOの1モルの重量が245.6gであることから、1.3gのNb濃度87.7mmol/kg溶液のシュウ酸ニオブアンモニウム水溶液を塗布したことにより、LaNiO1モルに対しNbを0.02モルの比率で塗布したと分かった。
シュウ酸ニオブアンモニウム水溶液を塗布した基材を60℃10分乾燥後、400℃10分焼成し、さらに800℃1時間焼成し、付着量142g/mの金属酸化物層を形成させて、実施例14の水電解用陽極を得た。
(Example 14)
In the same manner as in Example 13, the cycle of drying and firing was repeated 24 times, and then firing was carried out at 800° C. for 1 hour to form a metal oxide layer on the surface of the substrate.
Ammonium niobium oxalate was dissolved in pure water to prepare an aqueous solution of ammonium niobium oxalate with a Nb concentration of 87.7 mmol/kg. The aqueous solution of ammonium niobium oxalate was transferred to a polyethylene container having a base of 13 cm×13 cm and a height of 10 cm.
The substrate with a metal oxide layer formed on the substrate surface was completely immersed in an aqueous solution of ammonium niobium oxalate and pulled out, and the entire substrate surface was coated with the coating solution. The substrate was then turned sideways and a weak wind was applied from an air gun to remove the coating solution that had clogged the substrate. When the weight of the substrate was measured after the air gun treatment, 1.3 g of an aqueous solution of ammonium niobium oxalate was applied to the substrate. Since the amount of LaNiO3 supported on the substrate was 1.4 g and the weight of 1 mole of LaNiO3 was 245.6 g, it was found that 1.3 g of an aqueous solution of ammonium niobium oxalate with an Nb concentration of 87.7 mmol/kg was applied, and thus 0.02 moles of Nb were applied to 1 mole of LaNiO3 .
The substrate coated with the aqueous solution of ammonium niobium oxalate was dried at 60° C. for 10 minutes, then baked at 400° C. for 10 minutes and further baked at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 142 g/ m2 , thereby obtaining an anode for water electrolysis of Example 14.

(実施例15)
実施例13と同様にして、乾燥及び焼成のサイクルを33回繰り返した後、800℃1時間焼成を行い、基材表面に金属酸化物層を形成した。
その後、Nb濃度125mmol/kg溶液のシュウ酸ニオブアンモニウム水溶液を調製し、実施例14と同様の方法で、LaNiO1モルに対しNbを0.02モルの比率で塗布し、60℃10分乾燥後、400℃10分焼成し、さらに800℃1時間焼成し、付着量202g/mの金属酸化物層を形成させて、実施例15の水電解用陽極を得た。
(Example 15)
In the same manner as in Example 13, the cycle of drying and firing was repeated 33 times, and then firing was carried out at 800° C. for 1 hour to form a metal oxide layer on the surface of the substrate.
Thereafter, an aqueous solution of ammonium niobium oxalate with an Nb concentration of 125 mmol/kg was prepared, and in the same manner as in Example 14, Nb was applied at a ratio of 0.02 mol per 1 mol of LaNiO 3 , dried at 60° C. for 10 minutes, baked at 400° C. for 10 minutes, and further baked at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 202 g/m 2 , thereby obtaining an anode for water electrolysis of Example 15.

(比較例1)
実施例1と同様にして塗布用基材を準備した。
次に、酢酸ランタン1.5水和物、硝酸ニッケル六水和物を、それぞれ0.20mol/L、0.20mol/Lの濃度になるよう調合した塗布液を調製した。
塗布ロールの最下部に上記塗布液を入れたバットを設置し、EPDM製の塗布ロールに塗布液をしみこませ、その上部にロールと塗布液とが常に接するようにロールを設置し、さらにその上にPVC製のローラーを設置して、上記基材に塗布液を塗布した(ロール法)。塗布液が乾燥する前に手早く、2つのEPDM製スポンジロールの間にこの基材を通過させた。その後、50℃で10分間乾燥させた後、マッフル炉を用いて400℃で10分間の焼成を行って基材表面に金属酸化物層を形成した。
このロール塗布、乾燥及び焼成のサイクルを13回繰り返した後、さらに800℃で1時間の焼成を行い、付着量42g/mの金属酸化物層を形成させて、水電解用陽極を得た。
(Comparative Example 1)
A substrate for application was prepared in the same manner as in Example 1.
Next, lanthanum acetate 1.5 hydrate and nickel nitrate hexahydrate were mixed to have concentrations of 0.20 mol/L and 0.20 mol/L, respectively, to prepare a coating liquid.
A vat containing the above coating liquid was placed at the bottom of the coating roll, the coating liquid was soaked into an EPDM coating roll, a roll was placed on top of it so that the roll and the coating liquid were always in contact with each other, and a PVC roller was placed on top of it to apply the coating liquid to the substrate (roll method). The substrate was quickly passed between two EPDM sponge rolls before the coating liquid dried. After that, it was dried at 50°C for 10 minutes, and then baked at 400°C for 10 minutes in a muffle furnace to form a metal oxide layer on the substrate surface.
This cycle of roll coating, drying and firing was repeated 13 times, and then firing was further performed at 800° C. for 1 hour to form a metal oxide layer with a deposition amount of 42 g/m 2 , thereby obtaining an anode for water electrolysis.

(比較例2)
実施例1と同様にして塗布用基材を準備した。
次に、硝酸ランタン六水和物、硝酸ニッケル六水和物、シュウ酸ニオブアンモニウムn水和物、グリシンを、それぞれ0.20mol/L、0.16mol/L、0.04mol/L、0.36mol/Lの濃度になるように塗布液を調製した。
比較例1と同様にロール法でロール塗布、乾燥及び焼成のサイクルを40回繰り返した後、さらに700℃で1時間の焼成を行い、金属酸化物層を形成させて、付着量145g/mの水電解用陽極を得た。
(Comparative Example 2)
A substrate for application was prepared in the same manner as in Example 1.
Next, coating solutions were prepared so that lanthanum nitrate hexahydrate, nickel nitrate hexahydrate, ammonium niobium oxalate n-hydrate, and glycine had concentrations of 0.20 mol/L, 0.16 mol/L, 0.04 mol/L, and 0.36 mol/L, respectively.
In the same manner as in Comparative Example 1, a cycle of roll coating, drying and firing was repeated 40 times by the roll method, and then firing was further performed at 700° C. for 1 hour to form a metal oxide layer, thereby obtaining a water electrolysis anode with a coating weight of 145 g/ m2 .

(XRD測定方法)
試験陽極を2cm×2cmに切り出し、XRD測定装置D8 ADVANCE(ブルカージャパン株式会社販売)を用いて測定した。試験陽極は、バルク試料ホルダー(溝φ40mm、深さ6mm、材質PMMA)の中央位置に位置し、表面の高さはホルダーの縁の高さと同じになるように、試料電極の四隅の下に粘土片を置き、その上から試料電極を押さえつけて固定した。測定は、試料を15rpmで回転させながら、2θ=10°~70°の範囲を3080ステップに分け、1ステップ4秒で測定した。X線は、CuのKα1線を使用し、X線源の電圧40kV、電流40mAであった。発散スリットは0.8°を使用した。その他、測定条件設定ソフトであるXRD WIZARDで確認できる検出器やフィルター等の装置の設定(Overview data)を表2に示す。
解析ソフトDIFFRAC.EVAを使用し、「ピークサーチ」ツールを使用してXRDスペクトルのピークサーチを実施し、各ピークのピーク位置の2θと求めた。
LaNi3-zのメインピーク位置は、2θ=43.276°付近のNiOのメインピークをピークサーチで検出し、そのNiOのメインピーク位置2θの検出値が、NiOのPDF00-047-1049カードデータの(200)面の2θ=43.276°になるよう、「X軸のオフセット」ツールを使用してXRDスペクトルをシフト補正した後、算出した。
LaNi3-zのメインピーク位置は、試料によりシフトするが、PDF01-070-5757カードの(104)面メインピーク位置2θ=33.166°を参考に、2θ=32.5°~33.2°付近のピーク位置を、LaNi3-zのメインピーク位置とした。
LaNi3-zのメインピーク強度は、「ピークサーチ」ツールで算出された、LaNi3-zメインピークの純強度とした。
LaNi3-zのメインピーク半値幅は、解析ソフトDIFFRAC.EVAの「エリアの作成」ツールを使用し、左端を31°、右端を35°と設定してエリアを選択し、算出される半値幅により求めた。
(XRD Measurement Method)
The test anode was cut to 2 cm x 2 cm and measured using an XRD measuring device D8 ADVANCE (sold by Bruker Japan Co., Ltd.). The test anode was located at the center of the bulk sample holder (groove φ40 mm, depth 6 mm, material PMMA), and pieces of clay were placed under the four corners of the sample electrode so that the surface height was the same as the height of the edge of the holder, and the sample electrode was pressed down and fixed from above. The measurement was performed by rotating the sample at 15 rpm, dividing the range of 2θ = 10 ° to 70 ° into 3080 steps, and measuring one step for 4 seconds. X-rays were used, and the voltage of the X-ray source was 40 kV and the current was 40 mA. A divergence slit of 0.8 ° was used. In addition, the settings (overview data) of the device such as the detector and filter that can be confirmed with the measurement condition setting software XRD WIZARD are shown in Table 2.
Using the analysis software DIFFRAC.EVA, a peak search of the XRD spectrum was performed using the "peak search" tool, and the 2θ of the peak position of each peak was determined.
The main peak position of LaNi x M y O 3-z was calculated by detecting the main peak of NiO near 2θ = 43.276° by peak search, and then shift-correcting the XRD spectrum using the "X-axis offset" tool so that the detected value of the NiO main peak position 2θ was 2θ = 43.276° of the (200) plane of the NiO PDF00-047-1049 card data.
The main peak position of LaNi x M y O 3-z shifts depending on the sample, but the peak position near 2θ = 32.5° to 33.2° was determined to be the main peak position of LaNi x M y O 3-z by referring to the (104) plane main peak position 2θ = 33.166° on the PDF01-070-5757 card.
The main peak intensity of LaNi x M y O 3-z was taken as the net intensity of the main peak of LaNi x M y O 3-z calculated using the "Peak Search" tool.
The half-width of the main peak of LaNi x M y O 3-z was determined by using the "Create Area" tool of the analysis software DIFFRAC.EVA to select an area by setting the left end to 31° and the right end to 35°, and calculating the half-width.

(耐アルカリ試験)
試験陽極を2cm×2cmに切り出し、XRDを測定し、LaNi3-zのメインピーク強度を算出した。
耐アルカリ試験は、下記の手順で行った。
試験陽極を、容量19mLのPFA製密閉容器(外径30mmφ、蓋含む高さ44mm、容量)に入れ、容器内を8mol/L水酸化カリウム水溶液(関東化学株式会社販売)で満たし、密閉した。
その後、送風定温恒温器(製品名DKN402、ヤマト科学株式会社製造)内にPFA製密閉容器を入れ、密閉容器内液の液温が90℃になるよう加温し、内液温が90℃の状態で24時間保持させた後、密閉容器を送風定温恒温器から取り出し氷冷した。
密閉容器より電極を取り出し、水洗乾燥後、再度XRDを測定し、LaNi3-zのメインピーク強度を算出した。
耐アルカリ性の指標として、下式によりピーク強度維持率を求めた。
(ピーク強度維持率(%))=(耐アルカリ試験後のLaNi3-zのXRDメインピーク強度)/(耐アルカリ試験前のLaNi3-zのXRDメインピーク強度)×100
実施例1~15及び比較例1~2における評価結果を表3に示す。
(Alkaline resistance test)
The test anode was cut to a size of 2 cm x 2 cm, and XRD was measured to calculate the main peak intensity of LaNi x M y O 3-z .
The alkali resistance test was carried out according to the following procedure.
The test anode was placed in a 19 mL PFA sealed container (outer diameter 30 mmφ, height including lid 44 mm, capacity), the container was filled with an 8 mol/L potassium hydroxide aqueous solution (sold by Kanto Chemical Co., Ltd.) and sealed.
Thereafter, the PFA sealed container was placed in an air-blowing constant temperature incubator (product name DKN402, manufactured by Yamato Scientific Co., Ltd.) and heated so that the temperature of the liquid in the sealed container reached 90°C. The liquid was kept at this temperature for 24 hours, after which the sealed container was removed from the air-blowing constant temperature incubator and cooled on ice.
The electrode was taken out of the sealed container, washed with water and dried, and then the XRD was measured again to calculate the main peak intensity of LaNi x M y O 3-z .
As an index of alkali resistance, the peak strength retention rate was calculated by the following formula.
(Peak strength retention rate (%))=(XRD main peak strength of LaNi x M y O 3-z after alkali resistance test)/(XRD main peak strength of LaNi x M y O 3-z before alkali resistance test)×100
The evaluation results for Examples 1 to 15 and Comparative Examples 1 and 2 are shown in Table 3.

(陽極の耐アルカリ試験後の酸素過電圧の測定)
耐アルカリ試験後の陽極の酸素過電圧は下記の手順で測定した。
耐アルカリ試験後陽極(2cm×2cm)を、PTFEで被覆したニッケル製の棒にニッケル製のネジで固定した。対極には白金メッシュを使用し、80℃、32wt%水酸化ナトリウム水溶液中で、電流密度6kA/mで電解し、酸素過電圧を測定した。酸素過電圧は、液抵抗によるオーム損の影響を排除するために、ルギン管を使用する三電極法によって測定した。ルギン管の先端と陽極との間隔は、常に1mmに固定した。酸素過電圧の測定装置としては、ソーラートロン社製のポテンショガルバノスタット「1470Eシステム」を用いた。三電極法用の参照極としては、銀-塩化銀(Ag/AgCl)を用いた。三電極法を使用しても排除しきれない電解液抵抗を交流インピーダンス法で測定し、電解液抵抗の測定値に基づき前記酸素過電圧を補正した。
ソーラートロン社製の周波数特性分析器「1255B」を使用して、実部と虚部をプロットしたCole-Coleプロットを取得した後に、等価回路フィッティングにより解析することで、電解液抵抗と二重層容量を算出した。
三電極法を使用しても排除しきれないオーム損を交流インピーダンス法で測定し、オーム損の測定値に基づき前記酸素過電圧を補正した。オーム損の測定には、ソーラートロン社製の周波数特性分析器「1255B」を使用した。
実施例1~15及び比較例1~2における評価結果を表3に示す。
(Measurement of oxygen overvoltage after alkaline resistance test of anode)
The oxygen overvoltage of the anode after the alkali resistance test was measured by the following procedure.
After the alkali resistance test, the anode (2 cm x 2 cm) was fixed to a nickel rod coated with PTFE with a nickel screw. A platinum mesh was used as the counter electrode, and electrolysis was performed at 80°C in a 32 wt% aqueous sodium hydroxide solution at a current density of 6 kA/ m2 to measure the oxygen overvoltage. The oxygen overvoltage was measured by the three-electrode method using a Luggin capillary in order to eliminate the influence of ohmic loss due to solution resistance. The distance between the tip of the Luggin capillary and the anode was always fixed at 1 mm. A potentiogalvanostat "1470E system" manufactured by Solartron was used as the oxygen overvoltage measuring device. Silver-silver chloride (Ag/AgCl) was used as the reference electrode for the three-electrode method. The electrolyte resistance that could not be completely eliminated even by using the three-electrode method was measured by an AC impedance method, and the oxygen overvoltage was corrected based on the measured electrolyte resistance.
A Cole-Cole plot was obtained by plotting the real and imaginary parts using a frequency response analyzer "1255B" manufactured by Solartron, and the electrolyte resistance and double layer capacitance were calculated by analyzing the plot using equivalent circuit fitting.
The ohmic loss that could not be completely eliminated even by using the three-electrode method was measured by the AC impedance method, and the oxygen overvoltage was corrected based on the measured ohmic loss. The ohmic loss was measured using a frequency characteristic analyzer "1255B" manufactured by Solartron.
The evaluation results for Examples 1 to 15 and Comparative Examples 1 and 2 are shown in Table 3.

(実施例16)
アルカリ水電解用電解セル、複極式電解槽を下記の通りに作製した。
-陽極-
実施例14と同様の方法で作製した。
-陰極-
導電性基材として、直径0.15mmのニッケルの細線を40メッシュで編んだ平織メッシュ基材上に白金を担持したものを用いた。
-隔壁、外枠-
複極式エレメントとして、陽極と陰極とを区画する隔壁と、隔壁を取り囲む外枠と、を備えたものを用いた。隔壁及び複極式エレメントのフレーム等の電解液に接液する部材の材料は、全てニッケルとした。
-導電性弾性体-
導電性弾性体は、線径0.15mmのニッケル製ワイヤーを織ったものを、波高さ5mmになるように波付け加工したものを使用した。
-隔膜-
酸化ジルコニウム(商品名「EP酸化ジルコニウム」、第一稀元素化学工業社製)、N-メチル-2-ピロリドン(和光純薬工業社製)、ポリスルホン(「ユーデル」(登録商標)、ソルベイアドバンストポリマーズ社製)、及びポリビニルピロリドン(重量平均分子量(Mw)900000、和光純薬工業社製)を用いて、以下の成分組成の塗工液を得た。
ポリスルホン:15質量部
ポリビニルピロリドン:6質量部
N-メチル-2-ピロリドン:70質量部
酸化ジルコニウム:45質量部
上記塗工液を、基材であるポリフェニレンサルファイドメッシュ(くればぁ社製、膜厚280μm、目開き358μm、繊維径150μm)の両表面に対して塗工した。塗工後直ちに、塗工液を塗工した基材を蒸気下へ晒し、その後、凝固浴中へ浸漬して、基材表面に塗膜を形成させた。その後、純水で塗膜を十分洗浄して多孔膜を得た。
-ガスケット-
ガスケットは、厚み4.0mm、幅18mmの内寸504mm角の四角形状のもので、内側に平面視で電極室と同じ寸法の開口部を有し、隔膜を挿入することで保持するためのスリット構造を有するものを使用した。
-ゼロギャップ型複極式エレメント-
外部ヘッダー型のゼロギャップ型セルユニット60は、540mm×620mmの長方形とし、陽極2a及び陰極2cの通電面の面積は500mm×500mmとした。ゼロギャップ型複極式エレメント60の陰極側は、陰極2c、導電性弾性体2e、陰極集電体2rが積層され、陰極リブ6を介して隔壁1と接続され、電解液が流れる陰極室5cがある。また、陽極側は、陽極2aが陽極リブ6を介して隔壁1と接続され、電解液が流れる陽極室5aがある(図2)。
陽極室5aの深さ(陽極室深さ、図2における隔壁と陽極との距離)は25mm、陰極室5cの深さ(陰極室深さ、図2における隔壁と陰極集電体との距離)25mmとし、材質はニッケルとした。高さ25mm、厚み1.5mmのニッケル製の陽極リブ6と、高さ25mm、厚み1.5mmのニッケル製の陰極リブ6を溶接により取り付けたニッケル製の隔壁1の厚みは2mmとした。
陰極集電体2rとして、集電体として、あらかじめブラスト処理を施したニッケルエキスパンド基材を用いた。基材の厚みは1mmで、開口率は54%であった。導電性弾性体2eを、陰極集電体2r上にスポット溶接して固定した。このゼロギャップ型複極式エレメントを、隔膜を保持したガスケットを介してスタックさせることで、陽極2aと陰極2cとが隔膜4に押し付けられたゼロギャップ構造Zを形成することができる。
(Example 16)
An electrolytic cell for alkaline water electrolysis and a bipolar electrolytic cell were prepared as follows.
-anode-
It was prepared in the same manner as in Example 14.
-cathode-
The conductive substrate used was a plain weave mesh substrate made of nickel thin wires having a diameter of 0.15 mm woven at 40 meshes, on which platinum was supported.
- Partition walls, outer frames -
The bipolar element used had a partition wall separating the anode and cathode and an outer frame surrounding the partition wall. All of the materials of the members that come into contact with the electrolyte, such as the partition wall and the frame of the bipolar element, were made of nickel.
-Conductive elastic body-
The conductive elastic body used was made by weaving nickel wires having a wire diameter of 0.15 mm and corrugating them to a wave height of 5 mm.
-diaphragm-
A coating solution having the following component composition was obtained using zirconium oxide (product name "EP Zirconium Oxide", manufactured by Daiichi Kigenso Kagaku Kogyo Co., Ltd.), N-methyl-2-pyrrolidone (manufactured by Wako Pure Chemical Industries, Ltd.), polysulfone ("Udel" (registered trademark), manufactured by Solvay Advanced Polymers), and polyvinylpyrrolidone (weight average molecular weight (Mw) 900,000, manufactured by Wako Pure Chemical Industries, Ltd.).
Polysulfone: 15 parts by weight Polyvinylpyrrolidone: 6 parts by weight N-methyl-2-pyrrolidone: 70 parts by weight Zirconium oxide: 45 parts by weight The above coating liquid was applied to both surfaces of a substrate, a polyphenylene sulfide mesh (manufactured by Kureha Co., Ltd., film thickness 280 μm, mesh size 358 μm, fiber diameter 150 μm). Immediately after coating, the substrate coated with the coating liquid was exposed to steam, and then immersed in a coagulation bath to form a coating film on the substrate surface. The coating film was then thoroughly washed with pure water to obtain a porous film.
-gasket-
The gasket used was a square gasket with inner dimensions of 504 mm square, 4.0 mm thick and 18 mm wide, with an opening on the inside of the same dimensions as the electrode chamber in a plan view, and a slit structure for inserting and holding the diaphragm.
-Zero gap type multi-pole element-
The external header type zero gap type cell unit 60 was a rectangle of 540 mm x 620 mm, and the area of the current-carrying surface of the anode 2a and cathode 2c was 500 mm x 500 mm. The cathode side of the zero gap type bipolar element 60 has a cathode chamber 5c in which the cathode 2c, conductive elastic body 2e, and cathode current collector 2r are laminated and connected to the partition wall 1 via a cathode rib 6, and an electrolyte flows. The anode side has an anode chamber 5a in which the anode 2a is connected to the partition wall 1 via an anode rib 6, and an electrolyte flows (FIG. 2).
The depth of the anode chamber 5a (anode chamber depth, the distance between the partition wall and the anode in FIG. 2 ) was 25 mm, and the depth of the cathode chamber 5c (cathode chamber depth, the distance between the partition wall and the cathode current collector in FIG. 2 ) was 25 mm and made of nickel. The thickness of the nickel partition wall 1 to which the nickel anode rib 6 with a height of 25 mm and a thickness of 1.5 mm and the nickel cathode rib 6 with a height of 25 mm and a thickness of 1.5 mm were attached by welding was 2 mm.
A nickel expand base material that had been previously subjected to blasting was used as the cathode current collector 2r. The thickness of the base material was 1 mm, and the aperture ratio was 54%. The conductive elastic body 2e was fixed by spot welding onto the cathode current collector 2r. By stacking this zero-gap type bipolar element via a gasket that holds the diaphragm, a zero-gap structure Z in which the anode 2a and the cathode 2c are pressed against the diaphragm 4 can be formed.

(比較例3)
比較例2と同様にして作製した陽極を用いたこと以外は、実施例16と同様にしてゼロギャップ型複極式エレメントを製造した。
(Comparative Example 3)
A zero-gap type bipolar element was produced in the same manner as in Example 16 , except that an anode prepared in the same manner as in Comparative Example 2 was used.

上記実施例16及び比較例3の電解装置を用いて、電解液を90℃に保温し循環させながら24時間静置後、電解液温度を80℃に下げ、電流密度が6kA/mとなるように連続で500時間正通電し、水電解を行った。実施例16、比較例3の各セルの対電圧をモニターし、対電圧の推移を記録した。各セルのセル電圧を、実施例16及び比較例3それぞれ3セルの平均値をとって比較した。
実施例16では3セル平均電圧が、通電500時間後1.77Vと低い値であったのに対して、比較例3では3セル平均電圧が、通電500時間後で1.95Vと高い値が得られた。よって、実施例16の陽極が比較例3よりも高いアルカリ耐久性を持つことで、長時間運転においても低いセル電圧が実現できたと結論付けられる。
Using the electrolysis devices of Example 16 and Comparative Example 3, the electrolyte was kept at 90° C. and circulated while standing for 24 hours, and then the electrolyte temperature was lowered to 80° C., and a positive current was applied continuously for 500 hours so that the current density was 6 kA/m 2 , to perform water electrolysis. The voltage versus each cell of Example 16 and Comparative Example 3 was monitored, and the progress of the voltage versus each cell was recorded. The cell voltage of each cell was compared by taking the average value of three cells of each of Example 16 and Comparative Example 3.
In Example 16, the three-cell average voltage after 500 hours of current application was a low value of 1.77 V, whereas in Comparative Example 3, the three-cell average voltage after 500 hours of current application was a high value of 1.95 V. Therefore, it can be concluded that the anode of Example 16 has higher alkali durability than Comparative Example 3, and thus a low cell voltage was achieved even during long-term operation.

Figure 0007629776000001
Figure 0007629776000001

Figure 0007629776000002
Figure 0007629776000002

Figure 0007629776000003
Figure 0007629776000003

本発明の電極は、酸素発生の過電圧が低く、高温アルカリへの耐久性が高いため、アルカリを含有する水の電気分解において、水電解槽の陽極として好適に利用できる。 The electrode of the present invention has a low overvoltage for oxygen generation and is highly resistant to high-temperature alkali, making it suitable for use as an anode in a water electrolysis cell for electrolyzing water containing alkali.

1 隔壁
2 電極
2a 陽極
2c 陰極
2e 導電性弾性体
2r 陰極集電体
3 外枠
4 隔膜
5a 陽極室
5c 陰極室
6 リブ
7 ガスケット
50 複極式電解槽
51g ファストヘッド、ルーズヘッド
51i 絶縁板
51a 陽極ターミナルエレメント
51c 陰極ターミナルエレメント
51r タイロッド
60 複極式エレメント
65 電解セル
70 電解装置
71 送液ポンプ
72 気液分離タンク
74 整流器
75 酸素濃度計
76 水素濃度計
77 流量計
78 圧力計
79 熱交換器
80 圧力制御弁
Z ゼロギャップ構造
REFERENCE SIGNS LIST 1 Partition wall 2 Electrode 2a Anode 2c Cathode 2e Conductive elastic body 2r Cathode current collector 3 Outer frame 4 Diaphragm 5a Anode chamber 5c Cathode chamber 6 Rib 7 Gasket 50 Bipolar electrolytic cell 51g Fast head, loose head 51i Insulating plate 51a Anode terminal element 51c Cathode terminal element 51r Tie rod 60 Bipolar element 65 Electrolytic cell 70 Electrolytic device 71 Liquid delivery pump 72 Gas-liquid separation tank 74 Rectifier 75 Oxygen concentration meter 76 Hydrogen concentration meter 77 Flow meter 78 Pressure gauge 79 Heat exchanger 80 Pressure control valve Z Zero gap structure

Claims (8)

基材上に、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.15以下、zは-0.5以上0.5以下、Mは少なくともNb、Sbのいずれか1種を含む)を有し、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°以下であることを特徴とする、電極。 An electrode comprising LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.15 or less, z is -0.5 or more and 0.5 or less, M contains at least one of Nb and Sb ) on a substrate, and the XRD main peak position 2θ of LaNi x M y O 3-z is 32.6° or more and 33.2° or less. 前記yが0.002以上0.2未満である、請求項1に記載の電極。 The electrode according to claim 1, wherein y is equal to or greater than 0.002 and less than 0.2. 前記LaNi3-zのXRDメインピーク位置2θが32.7°以上33.2°以下である、請求項1または2に記載の電極。 3. The electrode according to claim 1, wherein the XRD main peak position 2θ of the LaNi x M y O 3-z is 32.7° or more and 33.2° or less. 前記MがNbである、請求項1~3のいずれか1項に記載の電極。 An electrode according to any one of claims 1 to 3, wherein M is Nb. 前記LaNi3-zのXRDメインピーク半値幅が0.6°以上0.85°以下である、請求項1~4のいずれか1項に記載の電極。 5. The electrode according to claim 1, wherein the XRD main peak half width of the LaNi x M y O 3-z is 0.6° or more and 0.85° or less. 前記LaNi3-zのXRDメインピーク強度が6,000以上100,000以下である、請求項1~5のいずれか1項に記載の電極。 6. The electrode according to claim 1, wherein the XRD main peak intensity of the LaNi x M y O 3-z is 6,000 or more and 100,000 or less. 請求項1~6のいずれか1項に記載の電極を陽極に用いてなることを特徴とする、電解セル。 An electrolytic cell characterized by using the electrode according to any one of claims 1 to 6 as an anode. アルカリを含有する水を電解槽により水電解し、水素を製造する水素製造方法において、前記電解槽は、少なくとも陽極と陰極を備え、前記陽極は、基材上に、LaNi3-z(x+yは0.8以上1.2以下、yは0.001以上0.15以下、zは-0.5以上0.5以下、Mは少なくともNb、Sbのいずれか1種を含む)を有し、LaNi3-zのXRDメインピーク位置2θが32.6°以上33.2°以下であることを特徴とする、水素の製造方法。 A hydrogen production method for producing hydrogen by electrolyzing alkali-containing water in an electrolytic cell, the electrolytic cell comprising at least an anode and a cathode, the anode having LaNi x M y O 3-z (x+y is 0.8 or more and 1.2 or less, y is 0.001 or more and 0.15 or less, z is -0.5 or more and 0.5 or less, M contains at least one of Nb and Sb ) on a substrate, and the XRD main peak position 2θ of LaNi x M y O 3-z is 32.6° or more and 33.2° or less.
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