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JP7634370B2 - Hydrogen peroxide removal method and device, and pure water production device - Google Patents
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JP7634370B2 - Hydrogen peroxide removal method and device, and pure water production device - Google Patents

Hydrogen peroxide removal method and device, and pure water production device Download PDF

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JP7634370B2
JP7634370B2 JP2021003463A JP2021003463A JP7634370B2 JP 7634370 B2 JP7634370 B2 JP 7634370B2 JP 2021003463 A JP2021003463 A JP 2021003463A JP 2021003463 A JP2021003463 A JP 2021003463A JP 7634370 B2 JP7634370 B2 JP 7634370B2
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hydrogen peroxide
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眞弓 阿部
慶介 佐々木
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Organo Corp
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Priority to US18/011,305 priority patent/US20230249992A1/en
Priority to PCT/JP2021/019568 priority patent/WO2021261143A1/en
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Description

本発明は、排水処理や純水・超純水製造工程において、水中の過酸化水素を除去するための方法及び装置と、純水製造装置とに関する。 The present invention relates to a method and device for removing hydrogen peroxide from water during wastewater treatment and the production of pure water and ultrapure water, and to a pure water production system.

従来、電子部品の洗浄や表面処理において、酸やアルカリなどの薬液とともに酸化剤として過酸化水素が広く用いられている。過酸化水素は、酸化力を有しているため、水処理システムを構成するイオン交換樹脂装置など、耐酸化性の低い装置に過酸化水素が流入しないように、適切に管理して除去する必要がある。一般に酸化剤による劣化は水処理設備に回復不可能な致命的なダメージを与える。特に電気再生式脱イオン装置(EDI:electrodeionization)内のイオン交換樹脂は、酸化剤が存在すると劣化しやすいことが知られている。例えば、超純水製造システムにおいて被処理水中に過酸化水素が含まれると、超純水製造システムに含まれるイオン交換樹脂の一部が酸化分解されて有機物の溶出を引き起こすことが知られている。 Hydrogen peroxide has been widely used as an oxidizing agent together with chemicals such as acids and alkalis in the cleaning and surface treatment of electronic components. Because hydrogen peroxide has oxidizing power, it is necessary to properly manage and remove hydrogen peroxide so that it does not flow into equipment with low oxidation resistance, such as ion exchange resin devices that make up water treatment systems. In general, deterioration caused by oxidizing agents causes irreparable and fatal damage to water treatment equipment. In particular, it is known that the ion exchange resin in an electrodeionization device (EDI) is easily deteriorated in the presence of oxidizing agents. For example, it is known that when hydrogen peroxide is contained in the water to be treated in an ultrapure water production system, part of the ion exchange resin contained in the ultrapure water production system is oxidized and decomposed, causing the elution of organic matter.

また過酸化水素は、酸化力を有することにより殺菌力も高いため、過酸化水素を含む排水を純水システムから系外の排水システムへと排出しようとするときも、排水処理システムに含まれる生物処理設備に影響を与える可能性があることから、予め過酸化水素を除去してから排出する必要性がある。また、純水・超純水製造システムにおいては、全有機炭素(TOC:Total Organic Carbon)成分の分解を目的とした紫外線酸化装置を用いる場合があり、紫外線酸化を行った後の処理水には微量の過酸化水素が含まれていることが知られている。 Hydrogen peroxide also has strong sterilizing power due to its oxidizing power, so when wastewater containing hydrogen peroxide is discharged from a pure water system to an external wastewater system, it is necessary to remove the hydrogen peroxide before discharging it, as this may affect the biological treatment equipment included in the wastewater treatment system. In addition, pure water and ultrapure water production systems sometimes use ultraviolet oxidation equipment aimed at breaking down total organic carbon (TOC) components, and it is known that the treated water after ultraviolet oxidation contains trace amounts of hydrogen peroxide.

従来から、被処理水中の過酸化水素を低減する方法として、還元剤を添加する方法、活性炭と接触させる方法、金属を担持した樹脂と接触させる方法などがある。還元剤を添加する方法では、過酸化水素を含む被処理水に、亜硫酸ナトリウム、亜硫酸水素ナトリウム、チオ硫酸ナトリウムなどの還元剤を添加する。還元剤と過酸化水素との反応速度は非常に大きいので、この方法によれば確実に過酸化水素を分解除去することが可能であるが、還元剤の添加量を制御することが難しく、また、過酸化水素を確実に除去するためには過剰量の還元剤の添加が必要となり、還元剤が液中のイオン量を増加させ、水質悪化を招きかねない。 Conventional methods for reducing hydrogen peroxide in water to be treated include adding a reducing agent, contacting the water with activated carbon, and contacting the water with a metal-supported resin. In the method of adding a reducing agent, a reducing agent such as sodium sulfite, sodium hydrogen sulfite, or sodium thiosulfate is added to the water to be treated that contains hydrogen peroxide. Since the reaction rate between the reducing agent and hydrogen peroxide is very high, this method can reliably decompose and remove hydrogen peroxide. However, it is difficult to control the amount of reducing agent added, and in order to reliably remove hydrogen peroxide, an excessive amount of reducing agent must be added, and the reducing agent increases the amount of ions in the liquid, which can lead to a deterioration in water quality.

活性炭と接触させる方法では、通常、活性炭の充填塔を設置して被処理水を通水するが、反応速度が遅いために通水空間速度を高くすることができず、装置が大型化するという問題がある。また活性炭には、過酸化水素の分解に伴って、自身も酸化されて粒子の崩壊が起こる懸念がある。 In the method of contacting the water with activated carbon, a packed tower of activated carbon is usually installed and the water to be treated is passed through it, but because the reaction rate is slow, the space velocity of the water passing through cannot be increased, and this poses the problem of the equipment becoming larger. In addition, there is a concern that the activated carbon itself may be oxidized as the hydrogen peroxide decomposes, causing the particles to collapse.

金属を担持した樹脂と接触させる方法としては、例えば、パラジウムや白金触媒をイオン交換樹脂に担持させた触媒樹脂に、過酸化水素を含有する被処理水を接触させる方法が提案されている(特許文献1)。この方法では、過酸化水素は、下記式に示す反応によって分解される。
2H→2HO+O
As a method of contacting with a metal-supported resin, for example, a method of contacting the water to be treated containing hydrogen peroxide with a catalytic resin in which a palladium or platinum catalyst is supported on an ion exchange resin has been proposed (Patent Document 1). In this method, hydrogen peroxide is decomposed by the reaction shown in the following formula.
2H 2 O 2 → 2H 2 O+O 2

過酸化水素の分解除去とは関係ないが、特許文献2には、電気再生式脱イオン装置の濃縮室に充填するイオン交換体に関連して、脱塩室における脱塩処理後に濃縮室から取り出されるイオン交換体の体積を濃縮室の容積の103%~125%となるように濃縮室にイオン交換体を充填することが開示されている。 Although not related to the decomposition and removal of hydrogen peroxide, Patent Document 2 discloses that, in relation to the ion exchanger filled in the concentration chamber of an electric regenerative deionization device, the concentration chamber is filled with the ion exchanger so that the volume of the ion exchanger removed from the concentration chamber after the desalination process in the desalination chamber is 103% to 125% of the volume of the concentration chamber.

特開2007-185587号公報JP 2007-185587 A 特開2016-129863号公報JP 2016-129863 A

イオン交換樹脂にパラジウムや白金などからなる触媒を担持した触媒樹脂によって過酸化水素を分解除去する方法は、活性炭と接触させる方法に比べては過酸化水素の分解速度は大きいものの、分解速度をさらに向上させることが望まれている。また、触媒樹脂を用いる方法では、時間の経過に伴って過酸化水素の分解速度が低下することが知られており、長期間にわたって安定して過酸化水素を分解できることが望まれている。 The method of decomposing and removing hydrogen peroxide using catalytic resins, which are ion exchange resins carrying catalysts such as palladium or platinum, has a higher decomposition rate of hydrogen peroxide than the method of contacting hydrogen peroxide with activated carbon, but it is desirable to further improve the decomposition rate. In addition, it is known that the decomposition rate of hydrogen peroxide decreases over time in the method using catalytic resins, and it is desirable to be able to decompose hydrogen peroxide stably over a long period of time.

本発明は、被処理水中の幅広い濃度領域の過酸化水素を、迅速に安定して長期間処理することができる、過酸化水素除去方法、及び装置、並びに当該装置を備える純水製造装置を提供することを目的とする。本発明の別の目的は、排水処理にも適用できる過酸化水素除去方法及び装置を提供することにある。 The present invention aims to provide a hydrogen peroxide removal method and device that can quickly and stably treat a wide range of hydrogen peroxide concentrations in the water being treated over a long period of time, as well as a pure water production system equipped with said device. Another aim of the present invention is to provide a hydrogen peroxide removal method and device that can also be applied to wastewater treatment.

本発明の過酸化水素除去方法は、被処理水に含まれる過酸化水素を除去する方法であって、陽極と陰極との間に直流電圧を印加しつつ、陽極と陰極との間に設けられてイオン交換体が充填されている過酸化水素除去室に被処理水を通水する工程を有し、過酸化水素除去室に充填されているイオン交換体の少なくとも一部は、過酸化水素分解能を有する金属触媒が担持されているイオン交換体であり、通水する工程ののちに過酸化水素除去室から取り出されるイオン交換体の自由状態での、イオン交換体の粒子間の空隙も含めたかさ体積を過酸化水素除去室の容積で除算した値である充填率が95%以上125%以下である。 The hydrogen peroxide removal method of the present invention is a method for removing hydrogen peroxide contained in water to be treated, and includes a step of passing the water to be treated through a hydrogen peroxide removal chamber that is provided between an anode and a cathode and filled with an ion exchanger while applying a DC voltage between the anode and the cathode, at least a part of the ion exchanger filled in the hydrogen peroxide removal chamber is an ion exchanger that supports a metal catalyst having hydrogen peroxide decomposition ability, and the filling rate, which is the value obtained by dividing the bulk volume , including voids between the ion exchanger particles, in a free state of the ion exchanger removed from the hydrogen peroxide removal chamber after the water passing step by the volume of the hydrogen peroxide removal chamber, is 95% or more and 125% or less.

本発明の過酸化水素除去装置は、被処理水に含まれる過酸化水素を除去する過酸化水素除去装置であって、陽極及び陰極と、陽極と陰極との間に設けられてイオン交換体が充填されている過酸化水素除去室と、を有し、過酸化水素除去室に充填されているイオン交換体の少なくとも一部は、過酸化水素分解能を有する金属触媒が担持されているイオン交換体であり、陽極と陰極の間に直流電圧が印加され、陽極と陰極との間に直流電圧を印加して被処理水を過酸化水素除去室に通水したのちに過酸化水素除去室から取り出されるイオン交換体の自由状態での、イオン交換体の粒子間の空隙も含めたかさ体積を過酸化水素除去室の容積で除算した値である充填率が、95%以上125%以下である。 The hydrogen peroxide removal apparatus of the present invention is a hydrogen peroxide removal apparatus that removes hydrogen peroxide contained in water to be treated, and has an anode and a cathode, and a hydrogen peroxide removal chamber provided between the anode and the cathode and filled with an ion exchanger, at least a part of the ion exchanger filled in the hydrogen peroxide removal chamber is an ion exchanger supporting a metal catalyst having hydrogen peroxide decomposition ability, a DC voltage is applied between the anode and the cathode, and the filling rate, which is the value obtained by dividing the bulk volume, including voids between the ion exchanger particles, in a free state of the ion exchanger when the DC voltage is applied between the anode and the cathode to pass the water to be treated through the hydrogen peroxide removal chamber and then removed from the hydrogen peroxide removal chamber, is 95% or more and 125% or less.

本発明の純水製造装置は、本発明に基づく過酸化水素除去装置と、過酸化水素除去装置の前段に設けられた紫外線酸化装置と、を有する。 The pure water production system of the present invention has a hydrogen peroxide removal device based on the present invention and an ultraviolet oxidation device provided upstream of the hydrogen peroxide removal device.

本発明では、陽極と陰極との間に配置されている過酸化水素除去室に、過酸化水素分解能を有する金属触媒が担持されているイオン交換体を充填し、被処理水を過酸化水素除去室に通水しながら陽極と陰極との間に直流電圧を印加する。このように構成することにより、本発明によれば、過酸化水素の分解とイオン交換体の電気再生とが並行して進行することとなり、過酸化水素の分解除去性能を長期にわたって安定して高いまま維持することができる。さらに本発明は、陽極と陰極との間に直流電圧を印加して被処理水を過酸化水素除去室に通水したのちに過酸化水素除去室から取り出されるイオン交換体の自由状態での体積を過酸化水素除去室の容積で除算した値である充填率が、95%以上125%以下であることを特徴とする。このような充填率となるようにイオン交換体を過酸化水素除去室に充填することにより、過酸化水素除去室への被処理水の通水を円滑に行いつつ、過酸化水素除去室の実効的な電気抵抗を小さくすることができ、過酸化水素除去装置に印加する直流電圧の値を小さくすることができる。印加直流電圧を小さくできることにより、本発明によれば、過酸化水素除去室に供給される単位流量の被処理水当たりの消費電力を小さくすることが可能になる。 In the present invention, an ion exchanger carrying a metal catalyst having hydrogen peroxide decomposition ability is filled in the hydrogen peroxide removal chamber arranged between the anode and the cathode, and a direct current voltage is applied between the anode and the cathode while the water to be treated is passed through the hydrogen peroxide removal chamber. By configuring in this way, according to the present invention, the decomposition of hydrogen peroxide and the electrical regeneration of the ion exchanger proceed in parallel, and the hydrogen peroxide decomposition and removal performance can be maintained at a high level for a long period of time. Furthermore, the present invention is characterized in that the filling rate, which is the value obtained by dividing the volume of the ion exchanger in a free state taken out from the hydrogen peroxide removal chamber after passing the water to be treated through the hydrogen peroxide removal chamber by the volume of the hydrogen peroxide removal chamber by applying a direct current voltage between the anode and the cathode, is 95% or more and 125% or less. By filling the hydrogen peroxide removal chamber with the ion exchanger to achieve such a filling rate, the effective electrical resistance of the hydrogen peroxide removal chamber can be reduced while smoothly passing the water to be treated through the hydrogen peroxide removal chamber, and the value of the direct current voltage applied to the hydrogen peroxide removal device can be reduced. By reducing the applied DC voltage, the present invention makes it possible to reduce the power consumption per unit flow rate of treated water supplied to the hydrogen peroxide removal chamber.

過酸化水素除去室に充填されるイオン交換体についての上述した充填率は、陽極と陰極との間に直流電圧を印加して被処理水を過酸化水素除去室に通水したのちに測定されるものである。この状態ではイオン交換体は、十分に水を含み、かつイオン形は再生形と塩形とが混在している状態である。例えばイオン交換樹脂であるイオン交換体の体積は、含水量やイオン形が再生形であるか塩形であるかによって変化し、十分に水を含んで膨潤し、かつイオン形が再生形であるときにイオン交換体の体積は最大となる。そこで、含水量が比較的小さい、及び/またはイオン形が塩形であるイオン交換体を過酸化水素除去室に充填し、その後、直流電圧の印加と被処理水の通水を行ってイオン交換体の体積を大きくすることによって、充填率が100%を超えるように過酸化水素除去室にイオン交換体を充填することができる。 The above-mentioned filling rate of the ion exchanger filled in the hydrogen peroxide removal chamber is measured after applying a DC voltage between the anode and cathode and passing the water to be treated through the hydrogen peroxide removal chamber. In this state, the ion exchanger contains sufficient water and has a mixture of regenerated and salt ions. For example, the volume of the ion exchanger, which is an ion exchange resin, varies depending on the water content and whether the ion form is regenerated or salt, and the volume of the ion exchanger is maximum when it swells with sufficient water and has the regenerated ion form. Therefore, the hydrogen peroxide removal chamber is filled with ion exchangers that have a relatively small water content and/or have a salt ion form, and then a DC voltage is applied and the water to be treated is passed through the ion exchanger to increase its volume, thereby filling the hydrogen peroxide removal chamber with ion exchangers so that the filling rate exceeds 100%.

本発明において過酸化水素分解能を有する金属触媒は、例えば、パラジウム、白金などの白金族金属触媒の他、鉄、マンガン、ニッケル、金、銀、銅、クロム、アルミニウム、並びにそれらの化合物などが挙げられる。その中でも、白金族金属触媒は、過酸化水素分解に対する触媒活性が高いため、より好適に用いられる。白金族金属触媒とは、ルテニウム、ロジウム、パラジウム、オスミウム、イリジウム及び白金の中から選ばれた1以上の金属を含む触媒のことである。白金族金属触媒は、これらの金属元素のいずれかを単独で含むものであっても、これらのうちの2種以上を組み合わせたものであってもよい。これらのなかで、白金、パラジウム、白金/パラジウム合金は、触媒活性が高く、白金族金属触媒として好適に用いられる。 In the present invention, examples of metal catalysts capable of decomposing hydrogen peroxide include platinum group metal catalysts such as palladium and platinum, as well as iron, manganese, nickel, gold, silver, copper, chromium, aluminum, and compounds thereof. Among these, platinum group metal catalysts are more preferably used because of their high catalytic activity for decomposing hydrogen peroxide. A platinum group metal catalyst is a catalyst containing one or more metals selected from ruthenium, rhodium, palladium, osmium, iridium, and platinum. A platinum group metal catalyst may contain any one of these metal elements alone or may be a combination of two or more of these. Among these, platinum, palladium, and platinum/palladium alloys have high catalytic activity and are preferably used as platinum group metal catalysts.

本発明は、アニオン交換体に対する負荷となる炭酸成分を含む被処理水から過酸化水素を除去するときに、金属触媒として白金族金属触媒を担持したアニオン交換体を用いることにより、より優位性を発揮することができる。そして、過酸化水素除去室がその陽極の側においてアニオン交換膜によって区画されている場合には、被処理水から過酸化水素除去室内のアニオン交換体に吸着したアニオン成分すなわち炭酸成分は、電気再生によりアニオン交換体から脱離し、アニオンの形態で陽極側のアニオン交換膜を介して過酸化水素除去室から排出される。すなわち、本発明によれば、過酸化水素が除去された処理水を生成するだけでなく、処理水の水質の向上を図ることもできる。 The present invention is more advantageous when removing hydrogen peroxide from treated water containing carbonic acid components that are a load on the anion exchanger by using an anion exchanger carrying a platinum group metal catalyst as a metal catalyst. When the hydrogen peroxide removal chamber is partitioned by an anion exchange membrane on the anode side, the anion components, i.e., carbonic acid components, adsorbed from the treated water to the anion exchanger in the hydrogen peroxide removal chamber are desorbed from the anion exchanger by electrical regeneration and discharged in the form of anions from the hydrogen peroxide removal chamber via the anion exchange membrane on the anode side. In other words, the present invention not only produces treated water from which hydrogen peroxide has been removed, but also improves the quality of the treated water.

また本発明では、直流電圧を連続して印加することにより、白金族金属触媒が担持されているイオン交換体の再生状態が維持できるため、空間速度(Space Velocity:SV)を100h-1以上に設定して運転することも可能である。空間速度SVは、単位時間あたりに、過酸化水素除去室内に充填された白金族金属触媒が担持されたイオン交換体の体積の何倍相当分の被処理水を処理しているかを表す単位である。具体的には、被処理水の流量(L/h)を白金族金属触媒が担持されたイオン交換体の体積(L)で除算することにより、SV値を求めることできる。SV値を通常の2倍、3倍で運用できるようになることは、同じ量の被処理水の処理を行うために、貴金属を担持しているために高価である触媒の量を1/2、1/3と減らすことが可能となり、有利である。 In addition, in the present invention, the regeneration state of the ion exchanger carrying the platinum group metal catalyst can be maintained by continuously applying a DC voltage, so that it is possible to operate the device by setting the space velocity (SV) to 100 h −1 or more. The space velocity SV is a unit that indicates how many times the volume of the ion exchanger carrying the platinum group metal catalyst filled in the hydrogen peroxide removal chamber is treated per unit time. Specifically, the SV value can be calculated by dividing the flow rate (L/h) of the water to be treated by the volume (L) of the ion exchanger carrying the platinum group metal catalyst. Being able to operate at a SV value that is twice or three times the normal value is advantageous because it makes it possible to reduce the amount of catalyst, which is expensive because it carries a precious metal, to 1/2 or 1/3 in order to treat the same amount of water to be treated.

本発明の過酸化水素除去装置では、中間イオン交換膜を介して過酸化水素除去室の陰極側もしくは陽極側に隣接してイオン交換体が充填されている脱塩室を設け、過酸化水素除去室によって処理された処理水が脱塩室に通水されるように構成してもよい。このように構成することにより、被処理水からの過酸化水素の除去と被処理水の脱塩とを同時に行うことができる。脱塩室から排出される処理水を用いることにより、高純度の純水及び超純水を製造することが可能になる。 In the hydrogen peroxide removal device of the present invention, a desalting chamber filled with an ion exchanger may be provided adjacent to the cathode or anode side of the hydrogen peroxide removal chamber via an intermediate ion exchange membrane, and treated water treated by the hydrogen peroxide removal chamber may be passed through the desalting chamber. This configuration allows hydrogen peroxide to be removed from the water to be treated and desalted at the same time. By using the treated water discharged from the desalting chamber, it becomes possible to produce highly pure water and ultrapure water.

本発明によれば、幅広い濃度範囲の過酸化水素を含む被処理水から長期間にわたり安定して過酸化水素を除去できるようになる。その結果、例えば、過酸化水素を含む被処理水が供給される水処理設備全体の安定した運用を行うことが可能になる。 According to the present invention, it becomes possible to stably remove hydrogen peroxide over a long period of time from water to be treated that contains a wide range of hydrogen peroxide concentrations. As a result, it becomes possible to stably operate the entire water treatment facility to which water to be treated that contains hydrogen peroxide is supplied, for example.

本発明の第1の実施形態の過酸化水素除去装置を示す模式図である。1 is a schematic diagram showing a hydrogen peroxide removal device according to a first embodiment of the present invention. FIG. 過酸化水素除去装置の具体例を示す模式図である。FIG. 2 is a schematic diagram showing a specific example of a hydrogen peroxide removal device. 図2に示す過酸化水素除去装置における水の流れの例を示す模式図である。3 is a schematic diagram showing an example of the flow of water in the hydrogen peroxide removal device shown in FIG. 2. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 本発明の第2の実施形態の過酸化水素除去装置を示す模式図である。FIG. 4 is a schematic diagram showing a hydrogen peroxide removal device according to a second embodiment of the present invention. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 本発明の第3の実施形態の過酸化水素除去装置を示す模式図である。FIG. 11 is a schematic diagram showing a hydrogen peroxide removal device according to a third embodiment of the present invention. 過酸化水素除去装置の具体例を示す模式図である。FIG. 2 is a schematic diagram showing a specific example of a hydrogen peroxide removal device. 図15に示す過酸化水素除去装置の動作を説明する模式図である。FIG. 16 is a schematic diagram illustrating the operation of the hydrogen peroxide removal device shown in FIG. 15 . 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 本発明の第4の実施形態の過酸化水素除去装置を示す模式図である。FIG. 13 is a schematic diagram showing a hydrogen peroxide removal device according to a fourth embodiment of the present invention. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 過酸化水素除去装置の別の具体例を示す模式図である。FIG. 2 is a schematic diagram showing another specific example of a hydrogen peroxide removal device. 従来技術の純水製造装置の構成の一例を示す模式図である。FIG. 1 is a schematic diagram showing an example of the configuration of a conventional water purifying apparatus. 本発明に基づく純水製造装置の構成の一例を示す模式図である。1 is a schematic diagram showing an example of the configuration of a pure water producing apparatus based on the present invention. 超純水製造装置の構成の一例を示す模式図である。FIG. 1 is a schematic diagram showing an example of the configuration of an ultrapure water production apparatus. 超純水製造装置の構成の他の例を示す模式図である。FIG. 2 is a schematic diagram showing another example of the configuration of an ultrapure water production apparatus. 超純水製造装置の構成の他の例を示す模式図である。FIG. 2 is a schematic diagram showing another example of the configuration of an ultrapure water production apparatus. 超純水製造装置の構成の他の例を示す模式図である。FIG. 2 is a schematic diagram showing another example of the configuration of an ultrapure water production apparatus. 実施例2の過酸化水素除去装置の要部を示す模式図である。FIG. 11 is a schematic diagram showing a main part of a hydrogen peroxide removal device according to a second embodiment. 実施例3の過酸化水素除去装置の要部を示す模式図である。FIG. 11 is a schematic diagram showing a main part of a hydrogen peroxide removal device according to a third embodiment. 実施例5の結果を示すグラフである。1 is a graph showing the results of Example 5.

次に、本発明の実施の形態について、図面を参照して本発明を説明する。ただし本発明は、図面に記載された態様に限定されるものではない。 Next, the present invention will be described with reference to the drawings. However, the present invention is not limited to the embodiment shown in the drawings.

[第1の実施形態]
図1は、本発明の第1の実施形態の過酸化水素除去装置の構成を示している。本発明に基づく過酸化水素除去装置は、陽極11を備えた陽極室21と陰極12を備えた陰極室25との間に少なくとも1つの過酸化水素除去室23を備えており、過酸化水素除去室23は、陽極11の側に位置する第1のイオン交換膜と陽極12の側に位置する第2のイオン交換膜とによって区画されている。過酸化水素除去室23には、過酸化水素分解能を有する金属触媒が担持されているイオン交換体が充填されている。図1に示す例では、陽極11の側に配置される第1のイオン交換膜はアニオン交換膜32であり、陰極12の側に配置される第2のイオン交換膜はカチオン交換膜33であり、過酸化水素除去室23内には、白金族金属触媒が担持されたイオン交換体(IER)が充填されている。図において、白金族金属触媒が担持されたイオン交換体を「Cat. IER」で表記している。具体的には図1に示される過酸化水素除去装置では、陽極11と陰極12とが向き合っており、陽極11と陰極12の間に、陽極室21、第1の濃縮室22、過酸化水素除去室23、第2の濃縮室24及び陰極室25が陽極11の側からこの順で配置されている。陽極室21と第1の濃縮室22はカチオン交換膜31で仕切られ、第1の濃縮室22と過酸化水素除去室23はアニオン交換膜32で仕切られ、過酸化水素除去室23と第2の濃縮室24はカチオン交換膜33で仕切られ、第2の濃縮室24と陰極室25はアニオン交換膜34で仕切られている。陽極室21、第1の濃縮室22、第2の濃縮室24及び陰極室25には、それぞれ白金族金属触媒を担持していないイオン交換体が充填されている。ここで、イオン交換体としては、アニオン交換体及びカチオン交換体のいずれか、あるいはそれらの両方が用いられる。アニオン交換体とカチオン交換体の両方を用いる場合には、イオン交換体の充填形態は、アニオン交換体及びカチオン交換体を混合して充填した混床構成であってもよいし、アニオン交換体の層とカチオン交換体の層とがそれぞれ形成されるようにそれらを充填する複層床構成であってもよい。
[First embodiment]
FIG. 1 shows the configuration of a hydrogen peroxide removal device according to a first embodiment of the present invention. The hydrogen peroxide removal device according to the present invention includes at least one hydrogen peroxide removal chamber 23 between an anode chamber 21 equipped with an anode 11 and a cathode chamber 25 equipped with a cathode 12, and the hydrogen peroxide removal chamber 23 is partitioned by a first ion exchange membrane located on the anode 11 side and a second ion exchange membrane located on the anode 12 side. The hydrogen peroxide removal chamber 23 is filled with an ion exchanger carrying a metal catalyst having hydrogen peroxide decomposition ability. In the example shown in FIG. 1, the first ion exchange membrane located on the anode 11 side is an anion exchange membrane 32, and the second ion exchange membrane located on the cathode 12 side is a cation exchange membrane 33, and the hydrogen peroxide removal chamber 23 is filled with an ion exchanger (IER) carrying a platinum group metal catalyst. In the figure, the ion exchanger carrying a platinum group metal catalyst is indicated as "Cat. IER". 1 , an anode 11 and a cathode 12 face each other, and an anode chamber 21, a first concentrating chamber 22, a hydrogen peroxide removal chamber 23, a second concentrating chamber 24, and a cathode chamber 25 are arranged between the anode 11 and the cathode 12 in this order from the anode 11 side. The anode chamber 21 and the first concentrating chamber 22 are separated by a cation exchange membrane 31, the first concentrating chamber 22 and the hydrogen peroxide removal chamber 23 are separated by an anion exchange membrane 32, the hydrogen peroxide removal chamber 23 and the second concentrating chamber 24 are separated by a cation exchange membrane 33, and the second concentrating chamber 24 and the cathode chamber 25 are separated by an anion exchange membrane 34. The anode chamber 21, the first concentrating chamber 22, the second concentrating chamber 24, and the cathode chamber 25 are each filled with an ion exchanger that does not support a platinum group metal catalyst. Here, the ion exchanger may be either an anion exchanger or a cation exchanger, or both of them. When both an anion exchanger and a cation exchanger are used, the ion exchanger may be packed in a mixed bed configuration in which an anion exchanger and a cation exchanger are mixed and packed, or in a multi-layered bed configuration in which an anion exchanger layer and a cation exchanger layer are packed separately.

次に、図1に示す過酸化水素除去装置の動作を説明する。過酸化水素を含む被処理水から過酸化水素を除去するときは、陽極室21、第1の濃縮室22、第2の濃縮室24、陰極室25にそれぞれ供給水を通水し、陽極11と陰極12との間に直流電圧を印加した状態で、過酸化水素除去室23に被処理水を通水する。過酸化水素を含んだ被処理水を過酸化水素除去室23に通水すると、被処理水中の過酸化水素は、過酸化水素除去室23内のイオン交換体に担持された白金族金属触媒との間の触媒反応によって水と酸素とに分解され、その結果、過酸化水素除去室23からは過酸化水素が除去された処理水が流出する。このとき、過酸化水素除去室23では、印加電流によって異種のイオン交換性物質の界面で生じる電位差により、水の解離反応(HO→H+OH)が同時に起こり、水素イオン(H)及び水酸化物イオン(OH)が生成する。異種のイオン交換性物質の界面は、例えば、アニオン交換膜とカチオン交換体との界面、カチオン交換膜とアニオン交換体との界面、あるいはカチオン交換体とアニオン交換体との界面である。このように生成した水素イオンと水酸化物イオンとによって、先に過酸化水素除去室23内のイオン交換体に吸着されていたイオン成分がイオン交換されてイオン交換体から脱離する。脱離したイオン成分のうちアニオンはアニオン交換膜32を介して陽極11に近い方の第1の濃縮室22に移動し、この第1の濃縮室22から濃縮水として排出される。一方、カチオンは、カチオン交換膜33を介して陰極12に近い方の第2の濃縮室24に移動し、この第2の濃縮室24から濃縮水として排出される。結局、過酸化水素除去室23に供給された被処理水中のイオン成分は、第1の濃縮室22及び第2の濃縮室24に移行して排出され、同時に、過酸化水素除去室23のイオン交換体も再生される。なお、陽極室21及び陰極室25からは電極水がそれぞれ排出される。なお、直流電圧の印加は被処理水の通水時に連続的に行ってもよいし、断続的に行ってもよい。 Next, the operation of the hydrogen peroxide removal apparatus shown in Fig. 1 will be described. When hydrogen peroxide is removed from water to be treated that contains hydrogen peroxide, feed water is passed through the anode chamber 21, the first concentrating chamber 22, the second concentrating chamber 24, and the cathode chamber 25, respectively, and the water to be treated is passed through the hydrogen peroxide removal chamber 23 in a state in which a DC voltage is applied between the anode 11 and the cathode 12. When the water to be treated that contains hydrogen peroxide is passed through the hydrogen peroxide removal chamber 23, the hydrogen peroxide in the water to be treated is decomposed into water and oxygen by a catalytic reaction with the platinum group metal catalyst supported on the ion exchanger in the hydrogen peroxide removal chamber 23, and as a result, treated water from which hydrogen peroxide has been removed flows out from the hydrogen peroxide removal chamber 23. At this time, in the hydrogen peroxide removal chamber 23, a dissociation reaction of water (H 2 O→H + +OH ) occurs simultaneously due to a potential difference generated at the interface between different ion exchange materials by the applied current, and hydrogen ions (H + ) and hydroxide ions (OH ) are generated. The interface between different ion exchange materials is, for example, the interface between an anion exchange membrane and a cation exchanger, the interface between a cation exchange membrane and an anion exchanger, or the interface between a cation exchanger and an anion exchanger. The hydrogen ions and hydroxide ions thus generated exchange the ionic components previously adsorbed on the ion exchanger in the hydrogen peroxide removal chamber 23, and are desorbed from the ion exchanger. Among the desorbed ionic components, anions move through the anion exchange membrane 32 to the first concentrating chamber 22 closer to the anode 11, and are discharged from this first concentrating chamber 22 as concentrated water. On the other hand, the cations migrate through the cation exchange membrane 33 to the second concentrating chamber 24 closer to the cathode 12, and are discharged from the second concentrating chamber 24 as concentrated water. Ultimately, the ionic components in the water to be treated supplied to the hydrogen peroxide removal chamber 23 migrate to the first concentrating chamber 22 and the second concentrating chamber 24 and are discharged, and at the same time, the ion exchanger in the hydrogen peroxide removal chamber 23 is regenerated. Electrode water is discharged from the anode chamber 21 and the cathode chamber 25, respectively. The application of the DC voltage may be continuous or intermittent while the water to be treated is passing through.

濃縮室22,24及び電極室(すなわち陽極室21及び陰極室25)に通水する供給水としては、特に制限はなく、それぞれ独立の供給水を用いることができ、また、同一の供給水を分岐して用いてもよい。さらに、被処理水や過酸化水素除去室23から排出される処理水を供給水として通水してもよいし、過酸化水素を含まない別系統の供給水を通水してもよい。また図では、電極室、濃縮室22,24及び過酸化水素除去室23での供給水や被処理水の流れは相互に並流の関係となっているが、隣接する室の間で向流となるように水を流してよい。 There are no particular limitations on the supply water passed through the concentration chambers 22, 24 and the electrode chambers (i.e., the anode chamber 21 and the cathode chamber 25), and independent supply water can be used for each, or the same supply water can be branched and used. Furthermore, the water to be treated or the treated water discharged from the hydrogen peroxide removal chamber 23 can be passed as the supply water, or a supply water from a separate system that does not contain hydrogen peroxide can be passed. In the figure, the flow of the supply water and the water to be treated in the electrode chambers, the concentration chambers 22, 24, and the hydrogen peroxide removal chamber 23 is parallel to each other, but the water may be passed in a countercurrent manner between adjacent chambers.

図1に示す構成では、[濃縮室(C)22|アニオン交換膜(AEM)32|過酸化水素除去室(H)23|カチオン交換膜(CEM)33|濃縮室(C)24]からなる基本構成が陽極11と陰極12の間に配置されている。この基本構成をセルセットと呼ぶ。実際には、電極間にこのようなセルセットを複数個(図1では「Nセット」)並置し、電気的には複数個のセルセットが一端を陽極11とし、他端を陰極12として直列接続されるようにして、処理能力の増大を図ることができる。この場合、隣接するセルセット間で隣り合う濃縮室を共有することができるので、本発明に基づく過酸化水素除去装置の構成としては、[AEM|H|CEM|C]からなる繰り返し単位をXで表すこととすると、[陽極室|CEM|C|X|X|・・・|X|AEM|陰極室]の構成とすることができる。このような直列構造において、陽極室21に最も近い過酸化水素除去室23に関し、陽極室21との間に独立の濃縮室22を介在させることなく陽極室21自体を濃縮室22として機能させることができる。同様に、陰極室25に最も近い過酸化水素除去室23に関し、陰極室25との間に独立の濃縮室24を介在させることなく陰極室25自体を濃縮室24として機能させることができる。 In the configuration shown in FIG. 1, a basic configuration consisting of [concentration chamber (C) 22 | anion exchange membrane (AEM) 32 | hydrogen peroxide removal chamber (H) 23 | cation exchange membrane (CEM) 33 | concentration chamber (C) 24] is arranged between the anode 11 and the cathode 12. This basic configuration is called a cell set. In practice, a plurality of such cell sets ("N sets" in FIG. 1) are arranged in parallel between the electrodes, and the plurality of cell sets are electrically connected in series with one end serving as the anode 11 and the other end serving as the cathode 12, thereby increasing the processing capacity. In this case, adjacent concentration chambers can be shared between adjacent cell sets, so that the configuration of the hydrogen peroxide removal device based on the present invention can be configured as [anode chamber | CEM | C | X | X | ... | X | AEM | cathode chamber], where X represents the repeating unit consisting of [AEM | H | CEM | C]. In such a series structure, the anode chamber 21 itself can function as the concentration chamber 22 for the hydrogen peroxide removal chamber 23 closest to the anode chamber 21, without an independent concentration chamber 22 between the anode chamber 21 and the chamber 21. Similarly, the cathode chamber 25 itself can function as the concentration chamber 24 for the hydrogen peroxide removal chamber 23 closest to the cathode chamber 25, without an independent concentration chamber 24 between the cathode chamber 25 and the chamber 25.

本発明に基づく過酸化水素除去装置では、上述したように、陽極11と陰極12との間に直流電圧を印加して過酸化水素除去室23内のイオン交換体、例えば粒状のイオン交換樹脂を電気再生しつつ、過酸化水素の除去や脱塩を行う。陽極11と陰極12との間に印加される電圧を小さくするためには、過酸化水素除去室23内において、通水が阻害されない範囲内でイオン交換体が密に充填されていることが有効である。また、イオン交換体、特にイオン交換樹脂は、その含水量やイオン形によって粒径が変化することが知られている。イオン形が再生形であるときは、すなわちアニオン交換体であればイオン交換基に水酸化物イオンが吸着され、カチオン交換体であればイオン交換基に水素イオンが吸着された状態としたときは、再生形以外のイオン形(例えば塩化物イオンやナトリウムイオンが吸着された状態)であるとき、すなわち塩形であるときに比べて粒径が大きくなる。また、イオン交換体の含水量が大きければ粒径も大きくなる。イオン交換体、特にイオン交換樹脂は弾性を有し、圧力が加われば変形し、圧力の印加が終われば元の形状に戻る性質を有する。そこで、過酸化水素除去室23の変形がないものと仮定して、粒径が小さな状態でイオン交換体を過酸化水素除去室23に充填し、その後、通水や電気再生によりイオン交換体を膨張させてイオン交換体が過酸化水素除去室23内で密に充填されるようにすることが好ましい。もっとも、イオン交換体があまりにも過密に過酸化水素除去室23に存在すると、過酸化水素除去室23への通水が阻害されて好ましくない。 In the hydrogen peroxide removal device according to the present invention, as described above, a direct current voltage is applied between the anode 11 and the cathode 12 to electrically regenerate the ion exchanger in the hydrogen peroxide removal chamber 23, for example, granular ion exchange resin, while removing and desalination hydrogen peroxide. In order to reduce the voltage applied between the anode 11 and the cathode 12, it is effective to pack the ion exchanger densely in the hydrogen peroxide removal chamber 23 within a range in which water flow is not hindered. It is also known that the particle size of ion exchangers, particularly ion exchange resins, changes depending on their water content and ion form. When the ion form is the regenerated form, that is, when hydroxide ions are adsorbed to the ion exchange group in the case of an anion exchanger, or when hydrogen ions are adsorbed to the ion exchange group in the case of a cation exchanger, the particle size becomes larger than when the ion form is other than the regenerated form (for example, when chloride ions or sodium ions are adsorbed), that is, when the ion exchanger is in the salt form. Also, the particle size becomes larger when the water content of the ion exchanger is large. Ion exchangers, particularly ion exchange resins, are elastic and deform when pressure is applied, and return to their original shape when pressure is removed. Assuming that hydrogen peroxide removal chamber 23 does not deform, it is preferable to fill hydrogen peroxide removal chamber 23 with ion exchangers in a small particle size state, and then expand the ion exchangers by passing water through or by electrical regeneration so that the ion exchangers are densely packed in hydrogen peroxide removal chamber 23. However, if the ion exchangers are too densely packed in hydrogen peroxide removal chamber 23, this is undesirable as it inhibits water from passing through hydrogen peroxide removal chamber 23.

そこで本発明に基づく過酸化水素除去装置では、陽極11と陰極12との間に直流電圧を印加して被処理水を過酸化水素除去室23に通水したのちに過酸化水素除去室23から取り出されるイオン交換体の自由状態での体積を過酸化水素除去室23の容積で除算した値である充填率が、95%以上125%以下であるようにする。充填率は、102%以上125%以下であることが好ましい。ここでイオン交換体の自由状態での体積とは、過酸化水素除去室23によってイオン交換体が拘束されない状態での、粒子間の空隙も含めた見かけの体積のことである。以下に説明するように本発明に基づく過酸化水素除去装置では、金属触媒を担持させたイオン交換体に加え、金属触媒を担持させていないイオン交換体を過酸化水素除去室23に充填する場合もある。本発明による効果はイオン交換体相互間での物理的な密着度合いによるものと考えられるので、金属触媒を担持させたイオン交換体と金属触媒を担持させていないイオン交換体とが共存する場合における充填率は、過酸化水素除去室23から取り出したイオン交換体の全体の自由状態での体積に基づいて定められる。以下、本発明に基づく種々の過酸化水素除去装置を説明するが、そのいずれにおいても過酸化水素除去室23におけるイオン交換体の充填率は95%以上125%以下である。 Therefore, in the hydrogen peroxide removal device according to the present invention, a DC voltage is applied between the anode 11 and the cathode 12 to pass the water to be treated through the hydrogen peroxide removal chamber 23, and then the filling rate, which is the value obtained by dividing the volume of the ion exchanger in a free state that is removed from the hydrogen peroxide removal chamber 23 by the volume of the hydrogen peroxide removal chamber 23, is set to be 95% or more and 125% or less. The filling rate is preferably 102% or more and 125% or less. Here, the volume of the ion exchanger in a free state refers to the apparent volume including the voids between the particles when the ion exchanger is not restrained by the hydrogen peroxide removal chamber 23. As described below, in the hydrogen peroxide removal device according to the present invention, in addition to the ion exchanger carrying a metal catalyst, the hydrogen peroxide removal chamber 23 may be filled with an ion exchanger that does not carry a metal catalyst. Since the effect of the present invention is believed to be due to the degree of physical adhesion between the ion exchangers, the filling rate in the case where an ion exchanger carrying a metal catalyst and an ion exchanger not carrying a metal catalyst coexist is determined based on the total free-state volume of the ion exchangers removed from the hydrogen peroxide removal chamber 23. Various hydrogen peroxide removal devices based on the present invention will be described below, and in all of them, the filling rate of the ion exchanger in the hydrogen peroxide removal chamber 23 is 95% or more and 125% or less.

図2は、図1に示す構成において、陽極室21にカチオン交換樹脂(CER)を充填し、濃縮室22,24及び陰極室25にアニオン交換樹脂(AER)を充填し、過酸化水素除去室23には、白金族金属触媒を担持させたアニオン交換樹脂(Cat. AER)を充填した例を示している。 Figure 2 shows an example of the configuration shown in Figure 1, in which the anode chamber 21 is filled with a cation exchange resin (CER), the concentration chambers 22 and 24 and the cathode chamber 25 are filled with anion exchange resin (AER), and the hydrogen peroxide removal chamber 23 is filled with anion exchange resin (Cat. AER) carrying a platinum group metal catalyst.

図3は、図2に示す過酸化水素除去装置において、陽極室21、第1の濃縮室22、第2の濃縮室24及び陰極室25への供給水として、過酸化水素除去室23で過酸化水素が除去されたのちの処理水を用いる例を示している。過酸化水素除去室23から得られる処理水の一部を第1の濃縮室22、第2の濃縮室24に通水し、それぞれ濃縮水として、排出する。また、処理水の一部を陰極室25に通水し、排出された電極水をさらに陽極室21に通水している。過酸化水素が除去された処理水を濃縮室及び電極室に通水する供給水として使用することにより、濃縮室、電極室に含まれるイオン交換体を酸化劣化させるおそれが低くなる。 Figure 3 shows an example of the hydrogen peroxide removal device shown in Figure 2, in which treated water from which hydrogen peroxide has been removed in the hydrogen peroxide removal chamber 23 is used as the supply water to the anode chamber 21, the first concentration chamber 22, the second concentration chamber 24, and the cathode chamber 25. A portion of the treated water obtained from the hydrogen peroxide removal chamber 23 is passed through the first concentration chamber 22 and the second concentration chamber 24, and discharged as concentrated water. In addition, a portion of the treated water is passed through the cathode chamber 25, and the discharged electrode water is further passed through the anode chamber 21. By using the treated water from which hydrogen peroxide has been removed as the supply water to be passed through the concentration chambers and the electrode chambers, the risk of oxidative deterioration of the ion exchangers contained in the concentration chambers and the electrode chambers is reduced.

第1の実施形態の過酸化水素除去装置においては、白金族金属触媒を担持させたアニオン交換体(Cat. AER)に加えて金属触媒を担持させていないイオン交換体を過酸化水素除去室23に充填することができる。以下、そのような例について説明する。過酸化水素除去室23に、金属触媒を担持させていないイオン交換体を充填するときは、そのイオン交換体が過酸化水素によって劣化することがないように、金属触媒を担持させたイオン交換体が過酸化水素除去室23における被処理水の入口に接して配置されるように、各イオン交換体の配置を定めることが好ましい。なお以下の説明において、白金族金属触媒を担持させたアニオン交換樹脂を触媒担持アニオン交換樹脂(Cat. AER)とも呼ぶ。単にアニオン交換樹脂(AER)及びカチオン交換樹脂(CER)と言うときは、それぞれ、金属触媒を担持させていないアニオン交換樹脂及びカチオン交換樹脂のことを指す。 In the hydrogen peroxide removal device of the first embodiment, in addition to the anion exchanger (Cat. AER) carrying a platinum group metal catalyst, an ion exchanger not carrying a metal catalyst can be filled in the hydrogen peroxide removal chamber 23. Such an example will be described below. When filling the hydrogen peroxide removal chamber 23 with an ion exchanger not carrying a metal catalyst, it is preferable to determine the arrangement of each ion exchanger so that the ion exchanger carrying a metal catalyst is placed in contact with the inlet of the water to be treated in the hydrogen peroxide removal chamber 23 so that the ion exchanger is not deteriorated by hydrogen peroxide. In the following description, an anion exchange resin carrying a platinum group metal catalyst is also called a catalyst-carrying anion exchange resin (Cat. AER). When simply referring to an anion exchange resin (AER) and a cation exchange resin (CER), they refer to an anion exchange resin not carrying a metal catalyst and a cation exchange resin, respectively.

図4に示した過酸化水素除去装置では、触媒担持アニオン交換樹脂(Cat. AER)とアニオン交換樹脂(AER)とが混合された形態で過酸化水素除去室23に充填されている。なお、アニオン交換樹脂(AER)に代えてカチオン交換樹脂(CER)が充填されていてもよい。この構成では、触媒担持アニオン交換樹脂(Cat. AER)だけを過酸化水素除去室23に充填する場合に比べ、高価な白金族金属触媒の使用量を削減することができるので、コストを低減することができる。 In the hydrogen peroxide removal device shown in FIG. 4, the hydrogen peroxide removal chamber 23 is filled with a mixture of a catalyst-supported anion exchange resin (Cat. AER) and an anion exchange resin (AER). Note that a cation exchange resin (CER) may be filled in place of the anion exchange resin (AER). In this configuration, the amount of expensive platinum group metal catalyst used can be reduced compared to when only a catalyst-supported anion exchange resin (Cat. AER) is filled in the hydrogen peroxide removal chamber 23, thereby reducing costs.

図5に示した過酸化水素除去装置では、触媒担持アニオン交換樹脂(Cat. AER)の層とアニオン交換樹脂(AER)の層とが、水の流れに沿って触媒担持アニオン交換樹脂(Cat. AER)の層の方が上流側となるように、これらの層が交互に配置した複層床構成で過酸化水素除去室23に充填されている。この過酸化水素除去装置では、過酸化水素除去室23における被処理水の入口の近傍において過酸化水素の分解除去が行われるとともに、過酸化水素除去室23の全体においてアニオンに対する脱塩処理が行われる。 In the hydrogen peroxide removal device shown in FIG. 5, a layer of catalyst-supported anion exchange resin (Cat. AER) and a layer of anion exchange resin (AER) are filled in the hydrogen peroxide removal chamber 23 in a multi-layered bed configuration in which these layers are alternately arranged so that the layer of catalyst-supported anion exchange resin (Cat. AER) is upstream along the water flow. In this hydrogen peroxide removal device, hydrogen peroxide is decomposed and removed near the inlet of the water to be treated in the hydrogen peroxide removal chamber 23, and desalination of anions is performed throughout the hydrogen peroxide removal chamber 23.

図6に示す過酸化水素除去装置は、図5に示す過酸化水素除去装置の過酸化水素除去室23において、アニオン交換樹脂(AER)の代わりにカチオン交換樹脂(CER)を充填したものである。したがって過酸化水素除去室23では、触媒担持アニオン交換樹脂(Cat. AER)の層とカチオン交換樹脂(CER)の層とが、水の流れに沿って触媒担持アニオン交換樹脂(Cat. AER)の層の方が上流側となるように、複層床構成で充填されている。この過酸化水素除去装置では、過酸化水素除去室23における被処理水の入口の近傍において過酸化水素の分解除去が行われるともに、全体としてアニオン及びカチオンに対する脱塩処理が行われる。 The hydrogen peroxide removal device shown in FIG. 6 is the same as the hydrogen peroxide removal device shown in FIG. 5, except that the hydrogen peroxide removal chamber 23 is filled with cation exchange resin (CER) instead of anion exchange resin (AER). Therefore, in the hydrogen peroxide removal chamber 23, a layer of catalyst-supported anion exchange resin (Cat. AER) and a layer of cation exchange resin (CER) are filled in a multi-layered bed configuration, with the layer of catalyst-supported anion exchange resin (Cat. AER) being upstream along the water flow. In this hydrogen peroxide removal device, hydrogen peroxide is decomposed and removed near the inlet of the water to be treated in the hydrogen peroxide removal chamber 23, and desalination of anions and cations is performed overall.

図7に示した過酸化水素除去装置では、触媒担持アニオン交換樹脂(Cat. AER)の層とカチオン交換樹脂(CER)の層とアニオン交換樹脂(AER)の層とが水の流れに沿って上流側からこの順で、複層床構成で過酸化水素除去室23に充填されている。この過酸化水素除去装置の過酸化水素除去室23においても、過酸化水素の除去と、アニオン及びカチオンの両方に対する脱塩処理が行なわれ、同時にそれぞれのイオン交換樹脂の再生が行われる。 In the hydrogen peroxide removal device shown in FIG. 7, a layer of catalyst-supported anion exchange resin (Cat. AER), a layer of cation exchange resin (CER), and a layer of anion exchange resin (AER) are packed in the hydrogen peroxide removal chamber 23 in this order from the upstream side along the water flow in a multi-layered bed configuration. In the hydrogen peroxide removal chamber 23 of this hydrogen peroxide removal device, hydrogen peroxide is removed and both anions and cations are desalted, and at the same time, the respective ion exchange resins are regenerated.

図5~図7を用いて説明した過酸化水素除去装置においても、過酸化水素除去室23を複層床構成とすることにより、触媒担持アニオン交換樹脂(Cat. AER)だけを過酸化水素除去室23に充填する場合に比べ、高価な白金族金属触媒の使用量を削減することができるので、コストを低減することができる。 In the hydrogen peroxide removal device described with reference to Figures 5 to 7, by making the hydrogen peroxide removal chamber 23 into a multi-layered bed configuration, the amount of expensive platinum group metal catalyst used can be reduced compared to when only catalyst-supported anion exchange resin (Cat. AER) is filled in the hydrogen peroxide removal chamber 23, thereby reducing costs.

先に述べたように、陽極室に隣接する濃縮室を設けずに陽極室が濃縮室としても機能することができ、同様に、陰極室に隣接する濃縮室を設けずに陰極室が濃縮室としても機能するようにすることができる。図8に示す過酸化水素除去装置では、陽極11、陽極室26、アニオン交換膜32、過酸化水素除去室23、カチオン交換膜33、陰極室27及び陰極12がこの順で配置されている。陽極室26及び陰極室27はいずれも濃縮室としての機能を備える。陽極室26にはアニオン交換樹脂(AER)またはカチオン交換樹脂(CER)が充填され、過酸化水素除去室23には触媒担持アニオン交換樹脂(Cat. AER)が充填され、陰極室27にはアニオン交換樹脂(AER)またはカチオン交換樹脂(CER)が充填されている。この過酸化水素除去装置は、濃縮室22,24としての機能を陽極室26及び陰極室27がそれぞれ備えてその代わりに濃縮室22,24が設けられていない点を除けば図2に示した過酸化水素除去装置と同じである。したがって、図8に示す過酸化水素除去装置は、図2に示した過酸化水素除去装置と同様に動作する。 As mentioned above, the anode chamber can function as a concentration chamber without providing a concentration chamber adjacent to the anode chamber, and similarly, the cathode chamber can function as a concentration chamber without providing a concentration chamber adjacent to the cathode chamber. In the hydrogen peroxide removal device shown in FIG. 8, the anode 11, the anode chamber 26, the anion exchange membrane 32, the hydrogen peroxide removal chamber 23, the cation exchange membrane 33, the cathode chamber 27, and the cathode 12 are arranged in this order. Both the anode chamber 26 and the cathode chamber 27 function as concentration chambers. The anode chamber 26 is filled with an anion exchange resin (AER) or a cation exchange resin (CER), the hydrogen peroxide removal chamber 23 is filled with a catalyst-supported anion exchange resin (Cat. AER), and the cathode chamber 27 is filled with an anion exchange resin (AER) or a cation exchange resin (CER). This hydrogen peroxide removal device is the same as the hydrogen peroxide removal device shown in FIG. 2, except that the anode chamber 26 and the cathode chamber 27 each have the functions of the concentration chambers 22 and 24, and instead, the concentration chambers 22 and 24 are not provided. Therefore, the hydrogen peroxide removal device shown in FIG. 8 operates in the same way as the hydrogen peroxide removal device shown in FIG. 2.

[第2の実施形態]
次に、本発明の第2の実施形態の過酸化水素除去装置について説明する。第1の実施形態の過酸化水素除去装置において、陽極11と陰極12の間において、過酸化水素除去室23の陰極側もしくは陽極側に中間イオン交換膜を介して過酸化水素除去室23に隣接するように脱塩室を設け、被処理水を過酸化水素除去室に通水して得られた処理水を脱塩室に通水するようにすることができる。脱塩室にはイオン交換体が充填される。このように構成することにより、被処理水からの過酸化水素の除去と脱塩とを同時に行うことができ、高い純度の純水ならびに超純水を製造することが可能となる。中間イオン交換膜は、アニオン交換膜であってもカチオン交換膜であってもよく、バイポーラ膜などの複合膜であってもよい。
Second Embodiment
Next, a hydrogen peroxide removal device according to a second embodiment of the present invention will be described. In the hydrogen peroxide removal device according to the first embodiment, a desalination chamber is provided adjacent to the hydrogen peroxide removal chamber 23 on the cathode or anode side of the hydrogen peroxide removal chamber 23 between the anode 11 and the cathode 12 via an intermediate ion exchange membrane, and treated water obtained by passing the water to be treated through the hydrogen peroxide removal chamber is passed through the desalination chamber. The desalination chamber is filled with an ion exchanger. With this configuration, removal of hydrogen peroxide from the water to be treated and desalination can be performed simultaneously, making it possible to produce pure water and ultrapure water of high purity. The intermediate ion exchange membrane may be an anion exchange membrane or a cation exchange membrane, or may be a composite membrane such as a bipolar membrane.

図9は、第2の実施形態の過酸化水素装置を示している。図示される過酸化水素除去装置は、図1に示す過酸化水素除去装置の第2のイオン交換膜に代えて、中間イオン交換膜36を配置したものである。中間イオン交換膜36の陰極12の側に、イオン交換体が充填された脱塩室28が設けられ、脱塩室28と陰極室25の間に第2のイオン交換膜が配置し、過酸化水素除去室23で処理された処理水が、脱塩室28に通水される。過酸化水素除去室23におけるイオン交換体の充填率は、第1の実施形態と場合と同様に、95%以上125%以下となっている。図示したものでは、陽極11、陽極室21、カチオン交換膜31、第1の濃縮室22、アニオン交換膜32、過酸化水素除去室23、中間イオン交換膜36、脱塩室28、カチオン交換膜33、第2の濃縮室24、アニオン交換膜34、陰極室25及び陰極12がこの順で配置されている。 Figure 9 shows a hydrogen peroxide device of the second embodiment. The illustrated hydrogen peroxide removal device has an intermediate ion exchange membrane 36 instead of the second ion exchange membrane of the hydrogen peroxide removal device shown in Figure 1. A desalination chamber 28 filled with an ion exchanger is provided on the cathode 12 side of the intermediate ion exchange membrane 36, and a second ion exchange membrane is disposed between the desalination chamber 28 and the cathode chamber 25, and treated water treated in the hydrogen peroxide removal chamber 23 is passed through the desalination chamber 28. The filling rate of the ion exchanger in the hydrogen peroxide removal chamber 23 is 95% or more and 125% or less, as in the first embodiment. In the diagram, the anode 11, anode chamber 21, cation exchange membrane 31, first concentration chamber 22, anion exchange membrane 32, hydrogen peroxide removal chamber 23, intermediate ion exchange membrane 36, desalting chamber 28, cation exchange membrane 33, second concentration chamber 24, anion exchange membrane 34, cathode chamber 25, and cathode 12 are arranged in this order.

図10は、第2の実施形態の過酸化水素除去装置の具体例の1つを示している。図10に示される過酸化水素除去装置は、図2に示す過酸化水素除去装置において過酸化水素除去室23と第2の濃縮室24との間に脱塩室28を配置したものである。過酸化水素除去室23と脱塩室28とは、中間イオン交換膜であるカチオン交換膜35によって仕切られており、脱塩室28と第2の濃縮室24とは第2のイオン交換膜であるカチオン交換膜33で仕切られている。被処理水は過酸化水素除去室23に供給され、過酸化水素除去室23において過酸化水素を分解除去されたのち、脱塩室28に通水される。脱塩室28からは、過酸化水素が除去され脱塩処理がなされた処理水が排出される。図10に示す過酸化水素除去装置においても、アニオン交換膜32から第2の濃縮室24までを繰り返し単位Xとして、陽極室21に隣接する第1の濃縮室22と、陰極室25に接するアニオン交換膜34との間に、繰り返し単位Xを直列に複数セット設けることができる。 Figure 10 shows one specific example of the hydrogen peroxide removal device of the second embodiment. The hydrogen peroxide removal device shown in Figure 10 is the hydrogen peroxide removal device shown in Figure 2, in which a desalting chamber 28 is arranged between the hydrogen peroxide removal chamber 23 and the second concentration chamber 24. The hydrogen peroxide removal chamber 23 and the desalting chamber 28 are separated by a cation exchange membrane 35, which is an intermediate ion exchange membrane, and the desalting chamber 28 and the second concentration chamber 24 are separated by a cation exchange membrane 33, which is a second ion exchange membrane. The water to be treated is supplied to the hydrogen peroxide removal chamber 23, where hydrogen peroxide is decomposed and removed, and then passed through the desalting chamber 28. The desalting chamber 28 discharges treated water from which hydrogen peroxide has been removed and desalted. In the hydrogen peroxide removal device shown in FIG. 10, the anion exchange membrane 32 to the second concentration chamber 24 are defined as a repeating unit X, and multiple sets of repeating units X can be provided in series between the first concentration chamber 22 adjacent to the anode chamber 21 and the anion exchange membrane 34 in contact with the cathode chamber 25.

図11に示す過酸化水素除去装置は、脱塩室28に対してアニオン交換樹脂とカチオン交換樹脂とを混床(MB)形態で充填した点で、図10に示す過酸化水素除去装置とは異なっている。図11において、過酸化水素除去室23と脱塩室28とを仕切る中間イオン交換膜は、アニオン交換膜37によって構成されている。 The hydrogen peroxide removal device shown in FIG. 11 differs from the hydrogen peroxide removal device shown in FIG. 10 in that the desalting chamber 28 is filled with anion exchange resin and cation exchange resin in a mixed bed (MB) form. In FIG. 11, the intermediate ion exchange membrane that separates the hydrogen peroxide removal chamber 23 and the desalting chamber 28 is composed of anion exchange membrane 37.

図12に示す過酸化水素除去装置は、過酸化水素除去室23と脱塩室28を仕切る中間イオン交換膜としてアニオン交換膜37を用いるとともに、脱塩室28において、水の流れ方向に沿ってカチオン交換樹脂(CER)の層とアニオン交換樹脂(AER)の層とをこの順で交互に配置した複層床構成で充填している点で、図10に示す過酸化水素除去装置と異なっている。脱塩室28と陰極12の側の濃縮室24とはカチオン交換膜33によって仕切られている。 The hydrogen peroxide removal device shown in FIG. 12 differs from the hydrogen peroxide removal device shown in FIG. 10 in that it uses an anion exchange membrane 37 as an intermediate ion exchange membrane separating the hydrogen peroxide removal chamber 23 and the deionization chamber 28, and in that the deionization chamber 28 is filled with a multi-layered bed configuration in which layers of cation exchange resin (CER) and layers of anion exchange resin (AER) are alternately arranged in this order along the water flow direction. The deionization chamber 28 and the concentration chamber 24 on the cathode 12 side are separated by a cation exchange membrane 33.

図13に示す過酸化水素除去装置は、図12に示す過酸化水素除去装置において、陰極12側の濃縮室24と陰極室25との間に、補助となる過酸化水素除去室29を配置したものである。この過酸化水素除去室29にも、白金族金属触媒を担持させたアニオン交換体(Cat. AER)が、充填率が95%以上125%以下であるように充填され、被処理水が供給される。過酸化水素除去室29から排出される水は、過酸化水素除去室23から排出される水と合流して脱塩室28に供給される。濃縮室24と過酸化水素除去室29とはアニオン交換膜34を挟んで隣接し、過酸化水素除去室29と陰極室25とはアニオン交換膜38を挟んで隣接する。図13に示す過酸化水素除去装置は、複数の過酸化水素除去室23,29を有するため、より効率的に過酸化水素の除去が行うことができる。 The hydrogen peroxide removal device shown in FIG. 13 is the hydrogen peroxide removal device shown in FIG. 12, except that an auxiliary hydrogen peroxide removal chamber 29 is placed between the concentration chamber 24 and the cathode chamber 25 on the cathode 12 side. This hydrogen peroxide removal chamber 29 is also filled with an anion exchanger (Cat. AER) carrying a platinum group metal catalyst so that the filling rate is 95% or more and 125% or less, and the water to be treated is supplied to it. The water discharged from the hydrogen peroxide removal chamber 29 is merged with the water discharged from the hydrogen peroxide removal chamber 23 and supplied to the deionization chamber 28. The concentration chamber 24 and the hydrogen peroxide removal chamber 29 are adjacent to each other with an anion exchange membrane 34 in between, and the hydrogen peroxide removal chamber 29 and the cathode chamber 25 are adjacent to each other with an anion exchange membrane 38 in between. The hydrogen peroxide removal device shown in FIG. 13 has multiple hydrogen peroxide removal chambers 23 and 29, so that hydrogen peroxide can be removed more efficiently.

[第3の実施形態]
第1の実施形態の過酸化水素除去装置において過酸化水素除去室23内のイオン交換体の再生に利用される水酸化物イオンは、アニオン交換樹脂とカチオン交換膜とが接する点、あるいはアニオン交換樹脂とカチオン交換樹脂とが接する点において発生する水の解離反応によって生じたものである。イオン交換樹脂とイオン交換膜とが接する面積や、イオン交換樹脂が相互に接する面積は小さいので、過酸化水素除去室23内のイオン交換体の再生に用いられる水酸化物イオンの生成量も小さい。過酸化水素除去室23内に大量に水酸化物イオンを供給できるようにすれば、過酸化水素除去室23におけるイオン交換体の充填率を95%以上125%とすることの効果と相まって、イオン交換体の再生効率をさらに向上させ、過酸化水素除去室23の実効的な電気抵抗をさらに低下させることができる。そこで第3の実施形態の過酸化水素除去装置では、過酸化水素除去室23と陰極12との間に、カチオン交換膜が陰極12の側となりアニオン交換膜が過酸化水素除去室23の側となるようにカチオン交換膜とアニオン交換膜とが相互に重ね合わされたものを配置する。このように構成すると、陽極11と陰極12との間に直流電圧を印加したときに、電流によって生じる電位差によってカチオン交換膜とアニオン交換膜との界面において水の解離反応が進行し、水酸化物イオン(OH)がアニオン交換膜から過酸化水素除去室に供給される。その結果、陽極11と陰極12との間の電気抵抗がより小さくなって、低電圧で大電流を過酸化水素除去室に流すことが可能となり、過酸化水素除去室23内のイオン交換体の再生を促進することができる。カチオン交換膜とアニオン交換膜を重ね合わせるときに、単純に両者を重ね合わせてもよいし、両者の界面に水の解離反応を促進する触媒を配置することによりバイポーラ膜として構成してもよい。
[Third embodiment]
In the hydrogen peroxide removal device of the first embodiment, the hydroxide ions used to regenerate the ion exchanger in the hydrogen peroxide removal chamber 23 are generated by a dissociation reaction of water that occurs at the contact point between the anion exchange resin and the cation exchange membrane, or at the contact point between the anion exchange resin and the cation exchange resin. Since the contact area between the ion exchange resin and the ion exchange membrane and the contact area between the ion exchange resins are small, the amount of hydroxide ions generated to regenerate the ion exchanger in the hydrogen peroxide removal chamber 23 is also small. If a large amount of hydroxide ions can be supplied to the hydrogen peroxide removal chamber 23, combined with the effect of setting the filling rate of the ion exchanger in the hydrogen peroxide removal chamber 23 to 95% or more and 125%, the regeneration efficiency of the ion exchanger can be further improved and the effective electrical resistance of the hydrogen peroxide removal chamber 23 can be further reduced. Therefore, in the hydrogen peroxide removal device of the third embodiment, a cation exchange membrane and an anion exchange membrane are arranged between the hydrogen peroxide removal chamber 23 and the cathode 12, with the cation exchange membrane on the cathode 12 side and the anion exchange membrane on the hydrogen peroxide removal chamber 23 side. With this configuration, when a direct current voltage is applied between the anode 11 and the cathode 12, a dissociation reaction of water proceeds at the interface between the cation exchange membrane and the anion exchange membrane due to the potential difference caused by the current, and hydroxide ions (OH ) are supplied from the anion exchange membrane to the hydrogen peroxide removal chamber. As a result, the electrical resistance between the anode 11 and the cathode 12 becomes smaller, making it possible to pass a large current through the hydrogen peroxide removal chamber at a low voltage, and promoting the regeneration of the ion exchanger in the hydrogen peroxide removal chamber 23. When the cation exchange membrane and the anion exchange membrane are overlapped, they may simply be overlapped, or a bipolar membrane may be configured by arranging a catalyst that promotes the dissociation reaction of water at the interface between the two.

図14は、第3の実施形態の過酸化水素除去装置の構成を示している。この過酸化水素除去装置は、図1に示す過酸化水素除去装置において、過酸化水素除去室23と第2の濃縮室24との間を仕切るカチオン交換膜33の過酸化水素除去室23側の面に、アニオン交換膜81を配置し、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにしたものである。具体的には図14に示される過酸化水素除去装置では、陽極11と陰極12とが向き合っており、陽極11と陰極12の間に、陽極室21、第1の濃縮室22、過酸化水素除去室23、第2の濃縮室24及び陰極室25が陽極11の側からこの順で配置されている。陽極室21と第1の濃縮室22はカチオン交換膜31で仕切られ、第1の濃縮室22と過酸化水素除去室23はアニオン交換膜32で仕切られている。過酸化水素除去室23と第2の濃縮室24は、アニオン交換膜81とカチオン交換膜33とを相互に重ね合わせたもので仕切られている。第2の濃縮室24と陰極室25はアニオン交換膜34で仕切られている。陽極室21、第1の濃縮室22、第2の濃縮室24及び陰極室25には、図1に示した過酸化水素除去装置と同様に、それぞれ白金族金属触媒を担持していないイオン交換体が充填されている。この実施形態においても、過酸化水素除去室23におけるイオン交換体の充填率は95%以上125%以下となっている。 Figure 14 shows the configuration of a hydrogen peroxide removal device of the third embodiment. This hydrogen peroxide removal device is the hydrogen peroxide removal device shown in Figure 1, in which an anion exchange membrane 81 is arranged on the hydrogen peroxide removal chamber 23 side surface of the cation exchange membrane 33 that separates the hydrogen peroxide removal chamber 23 and the second concentration chamber 24, and the anion exchange membrane 81 and the cation exchange membrane 33 are overlapped with each other. Specifically, in the hydrogen peroxide removal device shown in Figure 14, the anode 11 and the cathode 12 face each other, and the anode chamber 21, the first concentration chamber 22, the hydrogen peroxide removal chamber 23, the second concentration chamber 24, and the cathode chamber 25 are arranged in this order from the anode 11 side between the anode 11 and the cathode 12. The anode chamber 21 and the first concentration chamber 22 are separated by the cation exchange membrane 31, and the first concentration chamber 22 and the hydrogen peroxide removal chamber 23 are separated by the anion exchange membrane 32. The hydrogen peroxide removal chamber 23 and the second concentration chamber 24 are separated by an anion exchange membrane 81 and a cation exchange membrane 33 stacked on top of each other. The second concentration chamber 24 and the cathode chamber 25 are separated by an anion exchange membrane 34. The anode chamber 21, the first concentration chamber 22, the second concentration chamber 24, and the cathode chamber 25 are filled with an ion exchanger that does not support a platinum group metal catalyst, as in the hydrogen peroxide removal device shown in FIG. 1. In this embodiment, the filling rate of the ion exchanger in the hydrogen peroxide removal chamber 23 is 95% or more and 125% or less.

次に、図14に示す過酸化水素除去装置の動作を説明する。過酸化水素を含む被処理水から過酸化水素を除去するときは、図1に示す装置の場合と同様に、陽極室21、濃縮室22,24及び陰極室25にそれぞれ供給水を通水し、陽極11と陰極12との間に直流電圧を印加した状態で、過酸化水素除去室23に被処理水を通水する。過酸化水素を含んだ被処理水を過酸化水素除去室23に通水すると、被処理水中の過酸化水素は、過酸化水素除去室23内のイオン交換体に担持された白金族金属触媒との間の触媒反応によって水と酸素とに分解され、その結果、過酸化水素除去室23からは過酸化水素が除去された処理水が流出する。このとき、過酸化水素除去室23では、印加電流によって異種のイオン交換性物質の界面で生じる電位差により、水の解離反応(HO→H+OH)が起こり、水素イオン(H)及び水酸化物イオン(OH)が生成し、水素イオンと水酸化物イオンとによって、先に過酸化水素除去室23内のイオン交換体に吸着されていたイオン成分がイオン交換されてイオン交換体から脱離する。脱離したイオン成分のうちアニオンはアニオン交換膜32を介して陽極11に近い方の第1の濃縮室22に移動し、この第1の濃縮室22から濃縮水として排出される。同時に、過酸化水素除去室23のイオン交換体も再生される。陽極室21及び陰極室25からは電極水がそれぞれ排出される。なお、直流電圧の印加は被処理水の通水時に連続的に行ってもよいし、断続的に行ってもよい。 Next, the operation of the hydrogen peroxide removal apparatus shown in Fig. 14 will be described. When hydrogen peroxide is removed from water to be treated that contains hydrogen peroxide, as in the case of the apparatus shown in Fig. 1, feed water is passed through the anode chamber 21, the concentration chambers 22, 24, and the cathode chamber 25, respectively, and the water to be treated is passed through the hydrogen peroxide removal chamber 23 with a DC voltage applied between the anode 11 and the cathode 12. When the water to be treated that contains hydrogen peroxide is passed through the hydrogen peroxide removal chamber 23, the hydrogen peroxide in the water to be treated is decomposed into water and oxygen by a catalytic reaction with the platinum group metal catalyst supported on the ion exchanger in the hydrogen peroxide removal chamber 23, and as a result, treated water from which hydrogen peroxide has been removed flows out from the hydrogen peroxide removal chamber 23. At this time, in the hydrogen peroxide removal chamber 23, a dissociation reaction of water (H 2 O→H + +OH ) occurs due to a potential difference generated at the interface between different ion exchange materials by the applied current, generating hydrogen ions (H + ) and hydroxide ions (OH ). The hydrogen ions and hydroxide ions exchange the ionic components previously adsorbed on the ion exchanger in the hydrogen peroxide removal chamber 23, causing them to be desorbed from the ion exchanger. Among the desorbed ionic components, anions move through the anion exchange membrane 32 to the first concentration chamber 22 closer to the anode 11, and are discharged from the first concentration chamber 22 as concentrated water. At the same time, the ion exchanger in the hydrogen peroxide removal chamber 23 is also regenerated. Electrode water is discharged from the anode chamber 21 and the cathode chamber 25. The application of the DC voltage may be performed continuously or intermittently while the water to be treated is passing through the chamber.

図14に示した過酸化水素除去装置では、アニオン交換膜81とカチオン交換膜33の界面において効率よく水の解離反応が進行し、アニオン交換膜81を介して大量の水酸化物イオンが過酸化水素除去室23内に供給される。大量の水酸化物イオンが供給されることにより過酸化水素除去室23の実効的な電気抵抗を小さくできるので、過酸化水素除去室23内のアニオン交換体の電気再生のために陽極11と陰極12の間に印加される直流電圧も小さくすることができる。 In the hydrogen peroxide removal device shown in FIG. 14, the water dissociation reaction proceeds efficiently at the interface between the anion exchange membrane 81 and the cation exchange membrane 33, and a large amount of hydroxide ions are supplied to the hydrogen peroxide removal chamber 23 through the anion exchange membrane 81. By supplying a large amount of hydroxide ions, the effective electrical resistance of the hydrogen peroxide removal chamber 23 can be reduced, and the DC voltage applied between the anode 11 and the cathode 12 for electrical regeneration of the anion exchanger in the hydrogen peroxide removal chamber 23 can also be reduced.

図14に示す構成では、[アニオン交換膜(AEM)32|過酸化水素除去室(H)23|アニオン交換膜(AEM)81|カチオン交換膜(CEM)33|濃縮室(C)24]からなる構成を繰り返し単位Xとして、陽極室21に隣接する濃縮室22と、陰極室25を区画するアニオン交換膜34の間に、繰り返し単位Xを直列に複数セット設けることができる。このような直列構造において、陽極室21に最も近い過酸化水素除去室23に関し、陽極室21との間に独立の濃縮室22を介在させることなく陽極室21自体を濃縮室22として機能させることができる。同様に、陰極室25に最も近い過酸化水素除去室23に関し、陰極室25との間に独立の濃縮室24を介在させることなく陰極室25自体を濃縮室24として機能させることができる。 In the configuration shown in FIG. 14, a repeating unit X is configured as a structure consisting of [anion exchange membrane (AEM) 32 | hydrogen peroxide removal chamber (H) 23 | anion exchange membrane (AEM) 81 | cation exchange membrane (CEM) 33 | concentration chamber (C) 24], and multiple sets of repeating units X can be provided in series between the concentration chamber 22 adjacent to the anode chamber 21 and the anion exchange membrane 34 that divides the cathode chamber 25. In such a series structure, the anode chamber 21 itself can function as the concentration chamber 22 for the hydrogen peroxide removal chamber 23 closest to the anode chamber 21 without interposing an independent concentration chamber 22 between the anode chamber 21 and the anode chamber 21. Similarly, the cathode chamber 25 itself can function as the concentration chamber 24 for the hydrogen peroxide removal chamber 23 closest to the cathode chamber 25 without interposing an independent concentration chamber 24 between the cathode chamber 25 and the anode chamber 25.

図15は、図14に示す構成において、陽極室21にカチオン交換樹脂(CER)を充填し、濃縮室22,24及び陰極室25にアニオン交換樹脂(AER)を充填し、過酸化水素除去室23には、触媒担持アニオン交換樹脂(Cat. AER)を充填した例を示している。言い換えれば図15に示す過酸化水素除去装置は、図2に示す装置において、過酸化水素除去室23と濃縮室24とを仕切るカチオン交換膜33の過酸化水素除去室23側の面に、アニオン交換膜81を配置し、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにしたものである。被処理水中のTOC成分を紫外線酸化装置により分解除去した場合、紫外線酸化装置から排出される水には炭酸成分と微量の過酸化水素が含まれている。そのような水を被処理水として被処理水から過酸化水素を分解除去する場合、過酸化水素の除去とともに炭酸成分も除去できることが好ましい。図15に示す装置では、アニオン交換膜81を介して、水解離反応により生成した水酸化物イオンが供給されるので過酸化水素除去室23内は塩基性の環境となり、被処理水中の炭酸成分は炭酸イオンあるいは重炭酸イオンとしてアニオン交換体に吸着し、次いで水酸化物イオンによってイオン交換されてアニオン交換膜32を介して濃縮室22に移動する。水酸化物イオンによるアニオン交換体の再生も促進される。したがって、図15に示す過酸化水素除去装置では、被処理水中の過酸化水素を分解除去できるとともに、被処理水から炭酸成分を除去することもできる。図15に示す過酸化水素除去装置においても、図3に示すものと同様に、陽極室21、第1の濃縮室22、第2の濃縮室24及び陰極室25への供給水として、過酸化水素除去室23で過酸化水素が除去されたのちの処理水を用いることができる。具体的には、過酸化水素除去室23から得られる処理水の一部を濃縮室22,24に通水し、それぞれ濃縮水として排出し、また、処理水の一部を陰極室25に通水し、排出された電極水をさらに陽極室21に通水することができる。 Figure 15 shows an example in which the anode chamber 21 is filled with a cation exchange resin (CER), the concentration chambers 22, 24 and the cathode chamber 25 are filled with an anion exchange resin (AER), and the hydrogen peroxide removal chamber 23 is filled with a catalyst-supported anion exchange resin (Cat. AER) in the configuration shown in Figure 14. In other words, the hydrogen peroxide removal device shown in Figure 15 is the device shown in Figure 2 in which an anion exchange membrane 81 is arranged on the surface of the hydrogen peroxide removal chamber 23 side of the cation exchange membrane 33 that separates the hydrogen peroxide removal chamber 23 and the concentration chamber 24, and the anion exchange membrane 81 and the cation exchange membrane 33 are overlapped with each other. When the TOC components in the water to be treated are decomposed and removed by the ultraviolet oxidation device, the water discharged from the ultraviolet oxidation device contains carbonic acid components and a small amount of hydrogen peroxide. When such water is treated as the water to be treated and hydrogen peroxide is decomposed and removed from the water to be treated, it is preferable to be able to remove the carbonic acid components as well as the hydrogen peroxide. In the apparatus shown in FIG. 15, hydroxide ions produced by the water dissociation reaction are supplied through the anion exchange membrane 81, so that the hydrogen peroxide removal chamber 23 becomes a basic environment, and the carbonic acid components in the water to be treated are adsorbed onto the anion exchanger as carbonate ions or bicarbonate ions, and then ion-exchanged by the hydroxide ions and move to the concentration chamber 22 through the anion exchange membrane 32. Regeneration of the anion exchanger by the hydroxide ions is also promoted. Therefore, in the hydrogen peroxide removal apparatus shown in FIG. 15, hydrogen peroxide in the water to be treated can be decomposed and removed, and carbonic acid components can also be removed from the water to be treated. In the hydrogen peroxide removal apparatus shown in FIG. 15, as in the apparatus shown in FIG. 3, the treated water after hydrogen peroxide removal in the hydrogen peroxide removal chamber 23 can be used as the supply water to the anode chamber 21, the first concentration chamber 22, the second concentration chamber 24, and the cathode chamber 25. Specifically, a portion of the treated water obtained from the hydrogen peroxide removal chamber 23 is passed through the concentration chambers 22 and 24, and each is discharged as concentrated water. Also, a portion of the treated water is passed through the cathode chamber 25, and the discharged electrode water is further passed through the anode chamber 21.

図16は、図15に示す過酸化水素除去装置の動作を具体的に示す図であって、過酸化水素除去室23とその近傍を示している。矢印で示すように過酸化水素除去室23とその両側の濃縮室22,24とでは、水の流れが逆向きとなっている。ここでは、白金族金属触媒がパラジウム(Pd)からなり、パラジウム触媒を担持させた粒状のアニオン交換樹脂(Pd AER)がアニオン交換体として過酸化水素除去室23に充填されている。濃縮室22,24には、金属触媒を担持させていない粒状のアニオン交換樹脂がアニオン交換体として充填されている。図示されるように、陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生し、水素イオンはカチオン交換膜33を介して濃縮室24に移動し、水酸化物イオンはアニオン交換膜81を介して過酸化水素除去室23に移動する。以下の説明において、パラジウム触媒を担持させた粒状のアニオン交換樹脂(Pd AER)のことを、Pd担持アニオン交換樹脂(Pd AER)とも呼ぶ。 Figure 16 is a diagram specifically showing the operation of the hydrogen peroxide removal device shown in Figure 15, showing the hydrogen peroxide removal chamber 23 and its vicinity. As shown by the arrows, the flow of water is in the opposite direction between the hydrogen peroxide removal chamber 23 and the concentration chambers 22 and 24 on both sides of the hydrogen peroxide removal chamber 23. Here, the platinum group metal catalyst is made of palladium (Pd), and granular anion exchange resin (Pd AER) carrying the palladium catalyst is filled in the hydrogen peroxide removal chamber 23 as an anion exchanger. The concentration chambers 22 and 24 are filled with granular anion exchange resin not carrying a metal catalyst as an anion exchanger. As shown in the figure, when a direct current is applied between the anode 11 and the cathode 12, a dissociation reaction of water proceeds at the interface between the anion exchange membrane 81 and the cation exchange membrane 33 due to the potential difference generated by the current, generating hydrogen ions and hydroxide ions. The hydrogen ions move to the concentration chamber 24 through the cation exchange membrane 33, and the hydroxide ions move to the hydrogen peroxide removal chamber 23 through the anion exchange membrane 81. In the following description, granular anion exchange resin (Pd AER) carrying a palladium catalyst is also referred to as Pd-loaded anion exchange resin (Pd AER).

第3の実施形態の過酸化水素除去装置においても、第1の実施形態の装置と同様に、白金族金属触媒を担持させたアニオン交換体(Cat. AER)に加えて金属触媒を担持させていないイオン交換体を過酸化水素除去室23に充填することができる。以下、そのような例について説明する。 In the hydrogen peroxide removal device of the third embodiment, as in the device of the first embodiment, in addition to the anion exchanger (Cat. AER) carrying a platinum group metal catalyst, an ion exchanger not carrying a metal catalyst can be filled into the hydrogen peroxide removal chamber 23. Such an example will be described below.

図17に示す過酸化水素除去装置は、図4に示す装置において、過酸化水素除去室23と濃縮室24とを仕切るカチオン交換膜33の過酸化水素除去室23側の面に、アニオン交換膜81を配置し、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにしたものである。この構成においても、高価な白金族金属触媒の使用量を削減することができるので、コストを低減することができる。 The hydrogen peroxide removal device shown in FIG. 17 is the same as the device shown in FIG. 4, except that an anion exchange membrane 81 is placed on the hydrogen peroxide removal chamber 23 side of the cation exchange membrane 33 that separates the hydrogen peroxide removal chamber 23 from the concentration chamber 24, and the anion exchange membrane 81 and the cation exchange membrane 33 are overlapped. Even with this configuration, the amount of expensive platinum group metal catalyst used can be reduced, resulting in reduced costs.

図18に示す過酸化水素除去装置は、図5に示す装置において、過酸化水素除去室23と濃縮室24とを仕切るカチオン交換膜33の過酸化水素除去室23側の面に、アニオン交換膜81を配置し、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにしたものである。この過酸化水素除去装置では、図16を用いて説明した場合と同様に、陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生する。水酸化物イオンは、アニオン交換膜81から、Pd担持アニオン交換樹脂(Pd AER)の層と金属触媒を担持させていないアニオン交換樹脂(AER)の層の両方に移動する。この過酸化水素除去装置では、過酸化水素除去室23における被処理水の入口の近傍において過酸化水素の分解除去が行われるとともに、過酸化水素除去室23の全体においてアニオンに対する脱塩処理が行われる。 The hydrogen peroxide removal device shown in Fig. 18 is the device shown in Fig. 5, in which an anion exchange membrane 81 is placed on the hydrogen peroxide removal chamber 23 side of the cation exchange membrane 33 that separates the hydrogen peroxide removal chamber 23 and the concentration chamber 24, and the anion exchange membrane 81 and the cation exchange membrane 33 are overlapped with each other. In this hydrogen peroxide removal device, as in the case described with reference to Fig. 16, when a direct current is applied between the anode 11 and the cathode 12, a dissociation reaction of water proceeds at the interface between the anion exchange membrane 81 and the cation exchange membrane 33 due to the potential difference caused by the current, generating hydrogen ions and hydroxide ions. The hydroxide ions move from the anion exchange membrane 81 to both the layer of Pd-supported anion exchange resin (Pd AER) and the layer of anion exchange resin (AER) that does not support a metal catalyst. In this hydrogen peroxide removal device, hydrogen peroxide is decomposed and removed near the inlet of the water to be treated in the hydrogen peroxide removal chamber 23, and anions are desalted throughout the hydrogen peroxide removal chamber 23.

図19に示す過酸化水素除去装置は、図18に示す過酸化水素除去装置の過酸化水素除去室23において、アニオン交換樹脂(AER)の代わりにカチオン交換樹脂(CER)を充填したものである。したがって過酸化水素除去室23では、触媒担持アニオン交換樹脂(Cat. AER)の層とカチオン交換樹脂(CER)の層とが、水の流れに沿って触媒担持アニオン交換樹脂(Cat. AER)の層の方が上流側となるように、複層床構成で充填されている。そしてこの複層床構成において、カチオン交換樹脂(CER)が形成されている位置では、アニオン交換膜81は設けられておらず、カチオン交換樹脂(CER)とカチオン交換膜33とが直接接している。この過酸化水素除去装置では、陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生し、水素イオンはカチオン交換膜33を介して濃縮室24に移動し、水酸化物イオンはアニオン交換膜81を介して過酸化水素除去室23に移動する。さらにアニオン交換膜32と過酸化水素除去室23内のカチオン交換樹脂(CER)との界面でも水が解離し、水素イオンと水酸化物イオンとが発生する。水素イオンは、カチオン交換樹脂(CER)内を拡散してカチオン交換樹脂(CER)を再生する。過酸化水素除去室23内のカチオン交換樹脂(CER)から脱離したカチオンは、アニオン交換膜81と重ね合わされていない位置のカチオン交換樹脂(CER)を通って、陰極12側の濃縮室24に移動する。したがって、図19に示す過酸化水素除去装置では、過酸化水素除去室23において、過酸化水素の除去と、アニオン及びカチオンの両方に対する脱塩処理が行なわれ、同時に触媒担持アニオン交換樹脂(Cat. AER)とカチオン交換樹脂(CER)の両方の再生が行われる。 The hydrogen peroxide removal device shown in Figure 19 is the hydrogen peroxide removal device shown in Figure 18, in which the hydrogen peroxide removal chamber 23 is filled with a cation exchange resin (CER) instead of an anion exchange resin (AER). Therefore, in the hydrogen peroxide removal chamber 23, a layer of catalyst-supported anion exchange resin (Cat. AER) and a layer of cation exchange resin (CER) are filled in a multi-layered bed configuration so that the layer of catalyst-supported anion exchange resin (Cat. AER) is upstream along the water flow. In this multi-layered bed configuration, the anion exchange membrane 81 is not provided at the position where the cation exchange resin (CER) is formed, and the cation exchange resin (CER) and the cation exchange membrane 33 are in direct contact with each other. In this hydrogen peroxide removal device, when a direct current is applied between the anode 11 and the cathode 12, a potential difference caused by the current causes a water dissociation reaction to proceed at the interface between the anion exchange membrane 81 and the cation exchange membrane 33, generating hydrogen ions and hydroxide ions. The hydrogen ions move to the concentration chamber 24 via the cation exchange membrane 33, and the hydroxide ions move to the hydrogen peroxide removal chamber 23 via the anion exchange membrane 81. Water is also dissociated at the interface between the anion exchange membrane 32 and the cation exchange resin (CER) in the hydrogen peroxide removal chamber 23, generating hydrogen ions and hydroxide ions. The hydrogen ions diffuse through the cation exchange resin (CER) to regenerate the cation exchange resin (CER). Cations desorbed from the cation exchange resin (CER) in the hydrogen peroxide removal chamber 23 move to the concentration chamber 24 on the cathode 12 side through the cation exchange resin (CER) at a position not overlapping with the anion exchange membrane 81. Therefore, in the hydrogen peroxide removal device shown in FIG. 19, hydrogen peroxide is removed and both anions and cations are desalted in the hydrogen peroxide removal chamber 23, while at the same time regenerating both the catalyst-supported anion exchange resin (Cat. AER) and the cation exchange resin (CER).

図20に示す過酸化水素除去装置は、図15に示す過酸化水素除去装置において、触媒担持アニオン交換樹脂(Cat. AER)の層とカチオン交換樹脂(CER)の層とアニオン交換樹脂(AER)の層とが水の流れに沿って上流側からこの順で、複層床構成で過酸化水素除去室23に充填されているものである。カチオン交換膜33と相互に重なり合うアニオン交換膜81は、触媒担持アニオン交換樹脂(Cat. AER)の層が形成されている位置にしか設けられていない。カチオン交換樹脂(CER)とアニオン交換樹脂(AER)はカチオン交換膜33と直接接している。陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生する。水酸化物イオンは、アニオン交換膜81から、Pd担持アニオン交換樹脂(Pd AER)の層に移動する。同時にアニオン交換膜32と過酸化水素除去室23内のカチオン交換樹脂(CER)との界面と、過酸化水素除去室23内のアニオン交換樹脂(AER)とカチオン交換膜33の界面とでも水が解離して水素イオンと水酸化物イオンとが発生する。アニオン交換膜32との界面で発生した水素イオンは、カチオン交換樹脂(CER)内を拡散し、カチオン交換樹脂(CER)を再生する。カチオン交換膜33との界面で発生した水酸化物イオンは、アニオン交換樹脂(AER)内を拡散してこのアニオン交換樹脂(AER)を再生する。この過酸化水素除去装置の過酸化水素除去室23においても、過酸化水素の除去と、アニオン及びカチオンの両方に対する脱塩処理が行なわれ、同時にそれぞれのイオン交換樹脂の再生が行われる。なお、図20に示す過酸化水素除去装置において、カチオン交換膜33と相互に重なり合うアニオン交換膜81は、触媒担持アニオン交換樹脂(Cat. AER)の層の形成位置だけでなく、アニオン交換樹脂(AER)の形成位置に設けられていてもよい。 The hydrogen peroxide removal device shown in FIG. 20 is the hydrogen peroxide removal device shown in FIG. 15, in which a layer of catalyst-supported anion exchange resin (Cat. AER), a layer of cation exchange resin (CER), and a layer of anion exchange resin (AER) are filled in the hydrogen peroxide removal chamber 23 in this order from the upstream side along the water flow in a multi-layered bed configuration. The anion exchange membrane 81, which overlaps with the cation exchange membrane 33, is only provided at the position where the layer of catalyst-supported anion exchange resin (Cat. AER) is formed. The cation exchange resin (CER) and the anion exchange resin (AER) are in direct contact with the cation exchange membrane 33. When a direct current is applied between the anode 11 and the cathode 12, the potential difference generated by the current causes a water dissociation reaction to proceed at the interface between the anion exchange membrane 81 and the cation exchange membrane 33, generating hydrogen ions and hydroxide ions. The hydroxide ions move from the anion exchange membrane 81 to the layer of the Pd-loaded anion exchange resin (Pd AER). At the same time, water dissociates at the interface between the anion exchange membrane 32 and the cation exchange resin (CER) in the hydrogen peroxide removal chamber 23, and at the interface between the anion exchange resin (AER) in the hydrogen peroxide removal chamber 23 and the cation exchange membrane 33, generating hydrogen ions and hydroxide ions. The hydrogen ions generated at the interface with the anion exchange membrane 32 diffuse within the cation exchange resin (CER) and regenerate the cation exchange resin (CER). The hydroxide ions generated at the interface with the cation exchange membrane 33 diffuse within the anion exchange resin (AER) and regenerate the anion exchange resin (AER). In the hydrogen peroxide removal chamber 23 of this hydrogen peroxide removal device, removal of hydrogen peroxide and desalination of both anions and cations are also performed, and at the same time, regeneration of each ion exchange resin is performed. In the hydrogen peroxide removal device shown in FIG. 20, the anion exchange membrane 81 that overlaps with the cation exchange membrane 33 may be provided not only at the position where the catalyst-supported anion exchange resin (Cat. AER) layer is formed, but also at the position where the anion exchange resin (AER) is formed.

図18~図20を用いて説明した過酸化水素除去装置においても、過酸化水素除去室23を複層床構成とすることにより、触媒担持アニオン交換樹脂(Cat. AER)だけを過酸化水素除去室23に充填する場合に比べ、高価な白金族金属触媒の使用量を削減することができるので、コストを低減することができる。 In the hydrogen peroxide removal device described using Figures 18 to 20, by making the hydrogen peroxide removal chamber 23 into a multi-layered bed configuration, the amount of expensive platinum group metal catalyst used can be reduced compared to when only catalyst-supported anion exchange resin (Cat. AER) is filled in the hydrogen peroxide removal chamber 23, thereby reducing costs.

図21に示す過酸化水素除去装置は、図8に示す過酸化水素除去装置において、過酸化水素除去室23と陰極室27との間を仕切るカチオン交換膜33の過酸化水素除去室23側の面に、アニオン交換膜81を配置し、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにしたものである。この過酸化水素除去装置は、濃縮室22,24としての機能を陽極室26及び陰極室27がそれぞれ備えてその代わりに濃縮室22,24が設けられていない点を除けば図15に示した過酸化水素除去装置と同じである。したがって、図21に示す過酸化水素除去装置は、図15に示した過酸化水素除去装置と同様に動作する。 The hydrogen peroxide removal device shown in FIG. 21 is the hydrogen peroxide removal device shown in FIG. 8, except that an anion exchange membrane 81 is placed on the hydrogen peroxide removal chamber 23 side of the cation exchange membrane 33 that separates the hydrogen peroxide removal chamber 23 from the cathode chamber 27, and the anion exchange membrane 81 and the cation exchange membrane 33 are overlapped with each other. This hydrogen peroxide removal device is the same as the hydrogen peroxide removal device shown in FIG. 15, except that the anode chamber 26 and the cathode chamber 27 each have the functions of the concentration chambers 22 and 24, and instead, the concentration chambers 22 and 24 are not provided. Therefore, the hydrogen peroxide removal device shown in FIG. 21 operates in the same way as the hydrogen peroxide removal device shown in FIG. 15.

[第4の実施形態]
次に、本発明の第4の実施形態の過酸化水素除去装置について説明する。第4の過酸化水素除去装置は、上述した第2の実施形態の過酸化水素除去装置において、過酸化水素除去室23に供給される水酸化物イオンの量を増やすために、過酸化水素除去室23と陰極12との間に、カチオン交換膜が陰極12の側となりアニオン交換膜が過酸化水素除去室23の側となるようにカチオン交換膜とアニオン交換膜とが相互に重ね合わされたものを配置したものである。この場合、過酸化水素除去室23と脱塩室28とを仕切る中間イオン交換膜自体を、アニオン交換膜が過酸化水素除去室23の側となるようにアニオン交換膜とカチオン交換膜を相互に重ねたものとしてもよい。あるいは、脱塩室28に少なくともアニオン交換樹脂が充填されている場合には、中間イオン交換膜をアニオン交換膜とし、脱塩室28がその陰極12の側で、アニオン交換膜が過酸化水素除去室23の側となるようにアニオン交換膜とカチオン交換膜を相互に重ねたものによって区画されるようにすることもできる。この実施形態においても、過酸化水素除去室23におけるイオン交換体の充填率は、95%以上125%以下となっている。
[Fourth embodiment]
Next, a hydrogen peroxide removal device according to a fourth embodiment of the present invention will be described. In the fourth hydrogen peroxide removal device, in order to increase the amount of hydroxide ions supplied to the hydrogen peroxide removal chamber 23 in the hydrogen peroxide removal device according to the second embodiment described above, a cation exchange membrane and an anion exchange membrane are arranged between the hydrogen peroxide removal chamber 23 and the cathode 12, with the cation exchange membrane on the cathode 12 side and the anion exchange membrane on the hydrogen peroxide removal chamber 23 side. In this case, the intermediate ion exchange membrane itself separating the hydrogen peroxide removal chamber 23 and the desalting chamber 28 may be an anion exchange membrane and a cation exchange membrane overlapped with each other, with the anion exchange membrane on the hydrogen peroxide removal chamber 23 side. Alternatively, when the desalting chamber 28 is filled with at least an anion exchange resin, the intermediate ion exchange membrane may be an anion exchange membrane, and the desalting chamber 28 may be partitioned by an anion exchange membrane and a cation exchange membrane overlapped with each other, with the anion exchange membrane on the cathode 12 side and the anion exchange membrane on the hydrogen peroxide removal chamber 23 side. In this embodiment as well, the filling rate of the ion exchanger in the hydrogen peroxide removal chamber 23 is 95% or more and 125% or less.

図22に示す過酸化水素除去装置は、図10に示す過酸化水素除去装置において、中間イオン交換膜として設けられているカチオン交換膜35の過酸化水素除去室23の側に、アニオン交換膜82とカチオン交換膜35とが相互に重ね合わされるようにアニオン交換膜82を配置したものである。この場合、アニオン交換膜82とカチオン交換膜35とを相互に重ね合わせたものは、中間イオン交換膜に該当する。被処理水は過酸化水素除去室23に供給され、過酸化水素除去室23において過酸化水素を分解除去されたのち、脱塩室28に通水される。脱塩室28からは、過酸化水素が除去され脱塩処理がなされた処理水が排出される。図22に示す過酸化水素除去装置においても、アニオン交換膜32から第2の濃縮室24までを繰り返し単位Xとして、陽極室21に隣接する第1の濃縮室22と、陰極室25に接するアニオン交換膜34との間に、繰り返し単位Xを直列に複数セット設けることができる。 22 shows a hydrogen peroxide removal device in which an anion exchange membrane 82 and a cation exchange membrane 35 are arranged on the hydrogen peroxide removal chamber 23 side of the cation exchange membrane 35 provided as an intermediate ion exchange membrane in the hydrogen peroxide removal device shown in FIG. 10, so that the anion exchange membrane 82 and the cation exchange membrane 35 are mutually overlapped. In this case, the anion exchange membrane 82 and the cation exchange membrane 35 overlapped with each other correspond to the intermediate ion exchange membrane. The water to be treated is supplied to the hydrogen peroxide removal chamber 23, where hydrogen peroxide is decomposed and removed, and then the water is passed through the desalting chamber 28. The desalting chamber 28 discharges treated water from which hydrogen peroxide has been removed and desalted. In the hydrogen peroxide removal device shown in FIG. 22, the anion exchange membrane 32 to the second concentrating chamber 24 are set as a repeating unit X, and multiple sets of repeating units X can be provided in series between the first concentrating chamber 22 adjacent to the anode chamber 21 and the anion exchange membrane 34 in contact with the cathode chamber 25.

図22に示す過酸化水素除去装置では、アニオン交換膜82とカチオン交換膜35の界面において水の解離反応が起きて水素イオンと水酸化物イオンが発生し、この水酸化物イオンが過酸化水素除去室23に供給されるので、過酸化水素除去室23の実効的な電気抵抗が低下する。また、過酸化水素除去室23内のアニオン交換樹脂の再生も促進される。このことは、過酸化水素の除去とともにアニオン成分、特に炭酸成分を除去することに関して有利である。 In the hydrogen peroxide removal device shown in FIG. 22, a water dissociation reaction occurs at the interface between the anion exchange membrane 82 and the cation exchange membrane 35 to generate hydrogen ions and hydroxide ions, and these hydroxide ions are supplied to the hydrogen peroxide removal chamber 23, lowering the effective electrical resistance of the hydrogen peroxide removal chamber 23. This also promotes regeneration of the anion exchange resin in the hydrogen peroxide removal chamber 23. This is advantageous for removing anion components, especially carbon dioxide components, along with removing hydrogen peroxide.

図23に示す過酸化水素除去装置は、図11に示す過酸化水素除去装置において、中間イオン交換膜として設けられているアニオン交換膜37の脱塩室28の側に、アニオン交換膜37とカチオン交換膜83とが相互に重ね合わされるようにカチオン交換膜83を配置したものである。図23に示す過酸化水素除去装置では、アニオン交換膜37とカチオン交換膜83とを相互に重ね合わせたものは、中間イオン交換膜に該当する。 The hydrogen peroxide removal device shown in FIG. 23 is the hydrogen peroxide removal device shown in FIG. 11, except that a cation exchange membrane 83 is arranged on the desalting chamber 28 side of the anion exchange membrane 37 provided as an intermediate ion exchange membrane, so that the anion exchange membrane 37 and the cation exchange membrane 83 are overlapped with each other. In the hydrogen peroxide removal device shown in FIG. 23, the anion exchange membrane 37 and the cation exchange membrane 83 overlapped with each other correspond to the intermediate ion exchange membrane.

図24に示す過酸化水素除去装置は、図12に示す過酸化水素除去装置において、脱塩室28と濃縮室24とを仕切るカチオン交換膜33の脱塩室28の側に、アニオン交換膜81とカチオン交換膜33とが相互に重ね合わされるようにアニオン交換膜81を配置したものである。ただし、アニオン交換膜81は、脱塩室28においてアニオン交換樹脂(AER)が充填されている位置のみに設けられており、脱塩室28内のカチオン交換樹脂(CER)はカチオン交換膜33と直接接している。この過酸化水素除去装置では、陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生する。水酸化物イオンは、脱塩室28内のアニオン交換樹脂(AER)を拡散し、中間イオン交換膜であるアニオン交換膜37を通って過酸化水素除去室23に移動する。また、アニオン交換膜37と脱塩室28内のカチオン交換樹脂(CER)との界面での水の解離反応が進行して水素イオンと水酸化物イオンが発生し、この水素イオンはカチオン交換樹脂(CER)内を拡散する。水素イオンが拡散するので、脱塩室28においてカチオン交換樹脂(CER)が充填されている領域は酸性環境となり、被処理水中の炭酸成分が遊離炭酸(CO)となる。この遊離炭酸は、脱塩室28内のアニオン交換樹脂(AER)が充填されている領域に到達し、この領域は塩基性環境であるので炭酸イオンあるいは重炭酸イオン(炭酸水素イオン)としてアニオン交換樹脂に吸着され、さらに、アニオン交換膜37、過酸化水素除去室23及びアニオン交換膜32を経て濃縮室22に移動する。 The hydrogen peroxide removal device shown in Fig. 24 is the same as the hydrogen peroxide removal device shown in Fig. 12, except that an anion exchange membrane 81 and a cation exchange membrane 33 are arranged on the deionization compartment 28 side of the cation exchange membrane 33 that separates the deionization compartment 28 and the concentration compartment 24, so that the anion exchange membrane 81 and the cation exchange membrane 33 are mutually overlapped. However, the anion exchange membrane 81 is provided only at the position in the deionization compartment 28 where the anion exchange resin (AER) is filled, and the cation exchange resin (CER) in the deionization compartment 28 is in direct contact with the cation exchange membrane 33. In this hydrogen peroxide removal device, when a direct current is applied between the anode 11 and the cathode 12, a dissociation reaction of water proceeds at the interface between the anion exchange membrane 81 and the cation exchange membrane 33 due to the potential difference generated by the current, generating hydrogen ions and hydroxide ions. The hydroxide ions diffuse through the anion exchange resin (AER) in the deionization compartment 28 and move to the hydrogen peroxide removal compartment 23 through the anion exchange membrane 37, which is an intermediate ion exchange membrane. In addition, a water dissociation reaction occurs at the interface between the anion exchange membrane 37 and the cation exchange resin (CER) in the deionization chamber 28, generating hydrogen ions and hydroxide ions, which diffuse through the cation exchange resin (CER). As the hydrogen ions diffuse, the region in the deionization chamber 28 filled with the cation exchange resin (CER) becomes an acidic environment, and the carbonate components in the water to be treated become free carbon dioxide (CO 2 ). This free carbon dioxide reaches the region in the deionization chamber 28 filled with the anion exchange resin (AER), and since this region is in a basic environment, it is adsorbed by the anion exchange resin as carbonate ions or bicarbonate ions (hydrogen carbonate ions), and then moves through the anion exchange membrane 37, the hydrogen peroxide removal chamber 23, and the anion exchange membrane 32 to the concentration chamber 22.

図25に示す過酸化水素除去装置は、図24に示す過酸化水素除去装置において、過酸化水素除去室23と脱塩室28とを入れ替え、中間イオン交換膜であるアニオン交換膜37を挟んで陽極11の側を脱塩室28とし、陰極12の側を過酸化水素除去室23としたものである。過酸化水素除去室23では、その被処理水の入口側に触媒担持アニオン交換樹脂(Cat. AER)が配置され、出口側にカチオン交換樹脂(CER)が配置されている。過酸化水素除去室23と陰極12側の濃縮室24との間はカチオン交換膜33で区画されているが、触媒担持アニオン交換樹脂(Cat. AER)が設けられている位置では、カチオン交換膜33の陽極側11にアニオン交換膜81が重ね合わされ、触媒担持アニオン交換樹脂(Cat. AER)の層はアニオン交換膜81に接している。カチオン交換樹脂(CER)の層は、カチオン交換膜33に直接接している。脱塩室28には、アニオン交換樹脂(AER)が充填されている。被処理水は、過酸化水素除去室23を通液したのち、脱塩室28に供給され、脱塩室28からは、過酸化水素が除去され、脱塩処理がなされた処理水が排出される。この過酸化水素除去装置では、陽極11と陰極12との間に直流電流を印加すると、電流によって生じる電位差によってアニオン交換膜81とカチオン交換膜33の界面で水の解離反応が進行して水素イオンと水酸化物イオンが発生する。水酸化物イオンは、過酸化水素除去室23内のPd担持アニオン交換樹脂(AER)の層に供給される。中間イオン交換膜であるアニオン交換膜37と過酸化水素除去室23内のカチオン交換樹脂(CER)の界面においても水の解離反応が進行し、このとき発生した水素イオンは、過酸化水素除去室23内のカチオン交換樹脂(CER)に供給される。 The hydrogen peroxide removal device shown in FIG. 25 is the hydrogen peroxide removal device shown in FIG. 24, in which the hydrogen peroxide removal chamber 23 and the desalination chamber 28 are interchanged, with the anion exchange membrane 37, which is an intermediate ion exchange membrane, sandwiched between the anode 11 side and the hydrogen peroxide removal chamber 23 on the cathode 12 side. In the hydrogen peroxide removal chamber 23, a catalyst-supported anion exchange resin (Cat. AER) is disposed on the inlet side of the water to be treated, and a cation exchange resin (CER) is disposed on the outlet side. The hydrogen peroxide removal chamber 23 and the concentration chamber 24 on the cathode 12 side are partitioned by a cation exchange membrane 33, but at the position where the catalyst-supported anion exchange resin (Cat. AER) is provided, an anion exchange membrane 81 is superimposed on the anode side 11 of the cation exchange membrane 33, and the layer of the catalyst-supported anion exchange resin (Cat. AER) is in contact with the anion exchange membrane 81. The layer of cation exchange resin (CER) is in direct contact with the cation exchange membrane 33. The deionization chamber 28 is filled with anion exchange resin (AER). The water to be treated passes through the hydrogen peroxide removal chamber 23 and is then supplied to the deionization chamber 28, from which hydrogen peroxide is removed and desalted treated water is discharged. In this hydrogen peroxide removal device, when a direct current is applied between the anode 11 and the cathode 12, a potential difference caused by the current causes a dissociation reaction of water to proceed at the interface between the anion exchange membrane 81 and the cation exchange membrane 33, generating hydrogen ions and hydroxide ions. The hydroxide ions are supplied to the layer of Pd-supported anion exchange resin (AER) in the hydrogen peroxide removal chamber 23. The water dissociation reaction also proceeds at the interface between the anion exchange membrane 37, which is an intermediate ion exchange membrane, and the cation exchange resin (CER) in the hydrogen peroxide removal chamber 23, and the hydrogen ions generated at this time are supplied to the cation exchange resin (CER) in the hydrogen peroxide removal chamber 23.

図26に示す過酸化水素除去装置は、図24に示す過酸化水素除去装置において、陰極12側の濃縮室24と陰極室25との間に、補助となる過酸化水素除去室29を配置したものである。この過酸化水素除去室29にも、白金族金属触媒を担持させたアニオン交換体(Cat. AER)が充填され、被処理水が供給される。過酸化水素除去室29から排出される水は、過酸化水素除去室23から排出される水と合流して脱塩室28に供給される。濃縮室24と過酸化水素除去室29とはアニオン交換膜34を挟んで隣接し、過酸化水素除去室29と陰極室25とはアニオン交換膜38を挟んで隣接する。図26に示す過酸化水素除去装置は、複数の過酸化水素除去室23,29を有するため、より効率的に過酸化水素の除去が行うことができる。 The hydrogen peroxide removal device shown in FIG. 26 is the hydrogen peroxide removal device shown in FIG. 24, except that an auxiliary hydrogen peroxide removal chamber 29 is placed between the concentration chamber 24 and the cathode chamber 25 on the cathode 12 side. This hydrogen peroxide removal chamber 29 is also filled with an anion exchanger (Cat. AER) carrying a platinum group metal catalyst, and the water to be treated is supplied to it. The water discharged from the hydrogen peroxide removal chamber 29 is combined with the water discharged from the hydrogen peroxide removal chamber 23 and supplied to the deionization chamber 28. The concentration chamber 24 and the hydrogen peroxide removal chamber 29 are adjacent to each other with an anion exchange membrane 34 in between, and the hydrogen peroxide removal chamber 29 and the cathode chamber 25 are adjacent to each other with an anion exchange membrane 38 in between. The hydrogen peroxide removal device shown in FIG. 26 has multiple hydrogen peroxide removal chambers 23 and 29, so that hydrogen peroxide can be removed more efficiently.

本発明に基づく過酸化水素除去装置に用いられるアニオン交換体は、金属触媒が担持させるために用いられるものかそうでないかによらず、特に限定されるものではなく、モノリス状多孔質アニオン交換体やアニオン交換樹脂が好適に用いられる。また、アニオン交換膜としては、特に限定はないが、例えば、均質アニオン交換膜や不均質アニオン交換膜が好適に用いられる。また、カチオン交換体は特に限定ないが、モノリス状多孔質カチオン交換体やカチオン交換樹脂が好適に用いられる。また、カチオン交換膜としては、特に限定はないが、例えば、均質カチオン交換膜や不均質カチオン交換膜が好適に用いられる。加えて、中間イオン交換膜としては、特に限定はないが、例えば、均質アニオン交換膜や不均質アニオン交換膜、均質カチオン交換膜や不均質カチオン交換膜、バイポーラ膜などが好適に用いられる。 The anion exchanger used in the hydrogen peroxide removal device according to the present invention is not particularly limited, regardless of whether it is used to support a metal catalyst or not, and is preferably a monolithic porous anion exchanger or an anion exchange resin. The anion exchange membrane is not particularly limited, but for example, a homogeneous anion exchange membrane or a heterogeneous anion exchange membrane is preferably used. The cation exchanger is not particularly limited, but for example, a monolithic porous cation exchanger or a cation exchange resin is preferably used. The cation exchange membrane is not particularly limited, but for example, a homogeneous cation exchange membrane or a heterogeneous cation exchange membrane is preferably used. In addition, the intermediate ion exchange membrane is not particularly limited, but for example, a homogeneous anion exchange membrane or a heterogeneous anion exchange membrane, a homogeneous cation exchange membrane or a heterogeneous cation exchange membrane, a bipolar membrane, etc. are preferably used.

また、アニオン交換樹脂またはカチオン交換樹脂の母体となる樹脂としては、特に制限はないが、三次元的な網目構造を持った有機高分子を母体とするものが好ましく、例えば、母体となる有機高分子としては、スチレン-ジビニルベンゼンの共重合体(スチレン系)や、アクリル酸-ジビニルベンゼンの共重合体(アクリル系)などを挙げることができる。 The parent resin for the anion exchange resin or cation exchange resin is not particularly limited, but is preferably an organic polymer with a three-dimensional network structure. For example, examples of the parent organic polymer include styrene-divinylbenzene copolymers (styrene-based) and acrylic acid-divinylbenzene copolymers (acrylic-based).

さらに、アニオン交換体の種類としては、弱塩基性アニオン交換体、強塩基性アニオン交換体等が挙げられる。カチオン交換体の種類としては、弱酸性カチオン交換体、強酸性カチオン交換体等が挙げられる。本発明に用いられる白金族金属触媒を担持したイオン交換体は、上記のカチオン交換体、アニオン交換体に白金族金属触媒の粒子が担持されているものである。 Furthermore, the types of anion exchangers include weakly basic anion exchangers and strongly basic anion exchangers. The types of cation exchangers include weakly acidic cation exchangers and strongly acidic cation exchangers. The ion exchangers carrying a platinum group metal catalyst used in the present invention are those in which particles of a platinum group metal catalyst are carried on the above-mentioned cation exchangers and anion exchangers.

本発明に用いられる白金族金属触媒を担持させたイオン交換体の製造方法には特に制約はなく、公知の方法により白金族金属の粒子をイオン交換体に担持させることにより、白金族金属触媒を担持させたイオン交換体を得ることができる。例えば、アニオン交換体を塩化パラジウムの塩酸水溶液に浸漬し、塩化パラジウム酸アニオンをイオン交換によりアニオン交換体に吸着させ、次いで、還元剤と接触させてパラジウム金属ナノ粒子をアニオン交換体に担持する方法がある。あるいは、アニオン交換体をカラムに充填し、塩化パラジウムの塩酸水溶液を通液して塩化パラジウム酸アニオンをイオン交換によりアニオン交換体に吸着させ、次いで、還元剤を通液してパラジウム金属ナノ粒子をアニオン交換体に担持する方法がある。これらの方法において用いられる還元剤にも特に制約はなく、メタノール、エタノール、イソプロパノール等のアルコールや、ギ酸、シュウ酸、クエン酸、アスコルビン酸等のカルボン酸、アセトン、メチルエチルケトン等のケトン、ホルムアルデヒドやアセトアルデヒド等のアルデヒド、水素化ホウ素ナトリウム、ヒドラジン等が挙げられる。 There are no particular limitations on the method of producing the ion exchanger carrying the platinum group metal catalyst used in the present invention, and the ion exchanger carrying the platinum group metal catalyst can be obtained by carrying platinum group metal particles on the ion exchanger by a known method. For example, there is a method in which the anion exchanger is immersed in an aqueous hydrochloric acid solution of palladium chloride, the chloropalladate anions are adsorbed on the anion exchanger by ion exchange, and then the anion exchanger is contacted with a reducing agent to carry palladium metal nanoparticles on the anion exchanger. Alternatively, there is a method in which the anion exchanger is packed in a column, an aqueous hydrochloric acid solution of palladium chloride is passed through the column to adsorb the chloropalladate anions on the anion exchanger by ion exchange, and then the reducing agent is passed through the column to carry palladium metal nanoparticles on the anion exchanger. There are no particular limitations on the reducing agent used in these methods, and examples include alcohols such as methanol, ethanol, and isopropanol, carboxylic acids such as formic acid, oxalic acid, citric acid, and ascorbic acid, ketones such as acetone and methyl ethyl ketone, aldehydes such as formaldehyde and acetaldehyde, sodium borohydride, and hydrazine.

本発明に基づく過酸化水素除去装置に供給される被処理水は、過酸化水素を含んでいるものであれば特に限定はなく、その過酸化水素の濃度としては、例えば、1μg/L以上、5μg/L以上、10μg/L以上、100μg/L以上、1000μg/L以上のものを挙げることができる。また被処理水は、炭酸成分を含んでいてもよい。ここで炭酸成分は、HCO、HCO 、CO 2-のことを指す。炭酸成分は、例えば紫外線酸化装置によりTOC成分の分解除去を行ったときに発生する。本明細書において、これらの炭酸成分の総量を「全炭酸」といい、その濃度をCO換算濃度(as CO)として表す。被処理水の全炭酸の濃度としては、特に制限はないが、例えば、0.01mg/L(as CO)以上、0.1mg/L(as CO)以上、1.0mg/L(as CO)以上のものを挙げることができる。被処理水の導電率にも特に制限はないが、例えば、0.1μS/cm以上、1μS/cm以上のものを挙げることができる。また被処理水は、ナトリウム等の塩成分を含んでいてもよい。被処理水中に含まれるナトリウムの濃度には、特に制限はないが、例えば、1μg/L以上、10μg/L以上、100μg/L以上等を挙げることができる。 The water to be treated that is supplied to the hydrogen peroxide removal device according to the present invention is not particularly limited as long as it contains hydrogen peroxide, and the hydrogen peroxide concentration may be, for example, 1 μg/L or more, 5 μg/L or more, 10 μg/L or more, 100 μg/L or more, or 1000 μg/L or more. The water to be treated may also contain a carbonate component. Here, the carbonate component refers to H 2 CO 3 , HCO 3 - , and CO 3 2- . The carbonate component is generated, for example, when TOC components are decomposed and removed by an ultraviolet oxidation device. In this specification, the total amount of these carbonate components is referred to as "total carbonate," and the concentration is expressed as a CO 2 equivalent concentration (as CO 2 ). The total carbon dioxide concentration of the water to be treated is not particularly limited, but may be, for example, 0.01 mg/L (as CO2 ) or more, 0.1 mg/L (as CO2 ) or more, or 1.0 mg/L (as CO2 ) or more. The conductivity of the water to be treated is also not particularly limited, but may be, for example, 0.1 μS/cm or more, or 1 μS/cm or more. The water to be treated may also contain salt components such as sodium. The concentration of sodium contained in the water to be treated is not particularly limited, but may be, for example, 1 μg/L or more, 10 μg/L or more, or 100 μg/L or more.

本発明において、白金族金属触媒を担持したイオン交換体の充填体積に対する、被処理水の通水空間速度は、過酸化水素が除去できるものであれば特に制限はないが、例えば、10h-1以上、100h-1以上、200h-1以上を挙げることができる。また、被処理水から除去される過酸化水素の除去率についても特に制限はないが、例えば、60%以上、80%以上、90%以上、95%以上を挙げることができる。 In the present invention, the space velocity of the water to be treated relative to the packed volume of the ion exchanger supporting a platinum group metal catalyst is not particularly limited as long as hydrogen peroxide can be removed, and examples of such a space velocity include 10 h -1 or more, 100 h -1 or more, and 200 h -1 or more. There is also no particular limitation on the removal rate of hydrogen peroxide removed from the water to be treated, and examples of such a space velocity include 60% or more, 80% or more, 90% or more, and 95% or more.

本発明において、過酸化水素除去室23の厚さは9mm以上30mm以下とすることが好ましい。ここで過酸化水素除去室23の厚さとは、陽極11と陰極12の間に直流電圧を印加したときの電圧印加方向に沿った過酸化水素除去室23のサイズのことであり、過酸化水素除去室23の厚さ方向は、一般に、過酸化水素除去室23における被処理水の流れ方向に直交する。過酸化水素除去室23の厚さが薄すぎると処理可能な被処理水の流量が小さくなりすぎる。一方、過酸化水素除去室23の厚さが厚すぎると、陽極11と陰極12との間に印加すべき直流電圧を過度に高くなるとともに、イオン交換体の量に比べて水の解離によって発生する水酸化物イオンや水素イオンの量が不足するので、過酸化水素除去室23内のイオン交換体の電気再生が十分に行われなくなる。 In the present invention, the thickness of the hydrogen peroxide removal chamber 23 is preferably 9 mm or more and 30 mm or less. Here, the thickness of the hydrogen peroxide removal chamber 23 refers to the size of the hydrogen peroxide removal chamber 23 along the voltage application direction when a DC voltage is applied between the anode 11 and the cathode 12, and the thickness direction of the hydrogen peroxide removal chamber 23 is generally perpendicular to the flow direction of the water to be treated in the hydrogen peroxide removal chamber 23. If the thickness of the hydrogen peroxide removal chamber 23 is too thin, the flow rate of the water to be treated that can be treated becomes too small. On the other hand, if the thickness of the hydrogen peroxide removal chamber 23 is too thick, the DC voltage to be applied between the anode 11 and the cathode 12 becomes excessively high, and the amount of hydroxide ions and hydrogen ions generated by dissociation of water is insufficient compared to the amount of the ion exchanger, so that electrical regeneration of the ion exchanger in the hydrogen peroxide removal chamber 23 is not performed sufficiently.

本発明に基づく過酸化水素除去装置は、例えば、純水製造装置あるいは超純水製造装置に組み込むことができる。以下、本発明に基づく過酸化水素除去装置を組み込んだ純水製造装置及び超純水製造装置について説明する。 The hydrogen peroxide removal device according to the present invention can be incorporated, for example, into a pure water production system or an ultrapure water production system. Below, we will explain the pure water production system and the ultrapure water production system that incorporate the hydrogen peroxide removal device according to the present invention.

図27は、従来技術における純水製造装置の構成の一例を示している。この純水製造装置では、原水を貯蔵する原水タンク41、第1の逆浸透膜装置51、第2の逆浸透膜装置52、逆浸透膜処理水タンク42、電気再生式脱イオン装置(EDI)54、EDI処理水タンク43、紫外線酸化装置(UV)55、非再生型イオン交換樹脂(CP)56及び脱気膜(MD)58がこの順で配置され、原水はこの順で処理される。その結果、最終的に純水が製造される。この純水製造装置においては、後段の設備が満水になった場合には、系内にて循環運転を行うことになるが、紫外線酸化装置55より発生する過酸化水素により、電気再生式脱イオン装置54内のイオン交換体が酸化劣化するおそれがある。そこで、系内で循環させるときは、紫外線酸化装置55の処理水が、電気再生式脱イオン装置54に循環しないように、製造された純水をEDI処理水タンク43に循環させ、電気再生式脱イオン装置54の処理水を逆浸透膜処理水タンク42に循環させる必要がある。このような純水製造装置は、循環のための複数のラインやEDI処理水タンクが必要となり、複雑な構成となる。 Figure 27 shows an example of the configuration of a pure water production system in the prior art. In this pure water production system, a raw water tank 41 for storing raw water, a first reverse osmosis membrane device 51, a second reverse osmosis membrane device 52, a reverse osmosis membrane treated water tank 42, an electric regenerative deionization device (EDI) 54, an EDI treated water tank 43, an ultraviolet oxidation device (UV) 55, a non-regenerative ion exchange resin (CP) 56, and a degassing membrane (MD) 58 are arranged in this order, and the raw water is treated in this order. As a result, pure water is finally produced. In this pure water production system, when the equipment in the latter stage is full of water, a circulation operation is performed within the system, but there is a risk that the ion exchanger in the electric regenerative deionization device 54 will be oxidized and deteriorated by hydrogen peroxide generated by the ultraviolet oxidation device 55. Therefore, when circulating within the system, it is necessary to circulate the produced pure water to the EDI treated water tank 43 and circulate the treated water of the electrical deionization device 54 to the reverse osmosis membrane treated water tank 42 so that the treated water of the ultraviolet oxidation device 55 is not circulated to the electrical deionization device 54. Such a pure water production system requires multiple lines and EDI treated water tanks for circulation, resulting in a complex configuration.

図28は、本発明に基づく過酸化水素除去装置を備えた純水製造装置の構成の一例を示している。図示される純水製造装置300では、原水タンク41、第1の逆浸透膜装置51、第2の逆浸透膜装置52、逆浸透膜処理水タンク42、紫外線酸化装置(UV)55、過酸化水素除去装置100、電気再生式脱イオン装置(EDI)54及び脱気膜(MD)58がこの順で配置され、原水はこの順で処理され、その結果、純水が製造される。ここで用いる過酸化水素除去装置100は、本発明に基づく過酸化水素除去装置であればどのようなものであってもよいが、図1~図26に示した過酸化水素除去装置のいずれかを用いることが好ましい。この純水製造装置では、純水の供給先である後段の設備が満水になった場合には、製造された純水を逆浸透膜処理水タンク42に循環させる。すなわち、紫外線酸化装置55の後段に過酸化水素除去装置100を配置することにより、紫外線酸化装置55により発生する過酸化水素による、電気再生式脱イオン装置54への影響を回避することが可能となる。また、上述の説明から明らかになるように過酸化水素除去装置100自体が、電気再生式脱イオン装置と同様の脱塩性能を備えることから、この構成により、電気再生式脱イオン装置を2段直列に配置した場合と同等な高純度の純水を得ることが可能となる。純水製造装置に要求される脱塩性能によっては、電気再生式脱イオン装置(EDI)54を設けることなく、過酸化水素除去装置100の出口水がそのまま脱気膜(MD)58に供給されるようにしてもよい。処理水を循環させる系統を1系統とすることで、図27に示される装置で必要とされた、EDI処理水タンクや、EDI処理水の循環ラインが不要になり、コストの低い純水製造装置とすることができる。 Figure 28 shows an example of the configuration of a pure water production system equipped with a hydrogen peroxide removal device based on the present invention. In the illustrated pure water production system 300, a raw water tank 41, a first reverse osmosis membrane device 51, a second reverse osmosis membrane device 52, a reverse osmosis membrane treated water tank 42, an ultraviolet oxidation device (UV) 55, a hydrogen peroxide removal device 100, an electric deionization device (EDI) 54, and a degassing membrane (MD) 58 are arranged in this order, and the raw water is treated in this order, resulting in the production of pure water. The hydrogen peroxide removal device 100 used here may be any hydrogen peroxide removal device based on the present invention, but it is preferable to use any of the hydrogen peroxide removal devices shown in Figures 1 to 26. In this pure water production system, when the downstream equipment to which the pure water is supplied becomes full, the produced pure water is circulated to the reverse osmosis membrane treated water tank 42. That is, by arranging the hydrogen peroxide removal device 100 after the ultraviolet oxidation device 55, it is possible to avoid the influence of hydrogen peroxide generated by the ultraviolet oxidation device 55 on the electrodeionization device 54. As is clear from the above description, the hydrogen peroxide removal device 100 itself has the same desalination performance as the electrodeionization device, and this configuration makes it possible to obtain pure water of high purity equivalent to that obtained when two electrodeionization devices are arranged in series. Depending on the desalination performance required for the pure water production system, the outlet water of the hydrogen peroxide removal device 100 may be directly supplied to the degassing membrane (MD) 58 without providing the electrodeionization device (EDI) 54. By providing a single system for circulating the treated water, the EDI treated water tank and the EDI treated water circulation line required in the system shown in FIG. 27 are no longer necessary, making it possible to provide a low-cost pure water production system.

なお、図28では、脱気膜(MD)58の処理水の少なくとも一部を逆浸透膜処理水タンク42に循環しているが、過酸化水素除去装置100または電気再生式脱イオン装置(EDI)54の処理水を逆浸透膜処理水タンク42に循環してもよい。また、過酸化水素除去装置100の濃縮室、電極室に通水する供給水として、紫外線酸化装置55をバイパスした水を利用してもよく、そうすることが好ましい。紫外線酸化装置55をバイパスした水を利用することにより、過酸化水素濃度が低いか過酸化水素を含まない水が濃縮室と電極室に供給されることとなるので、濃縮室と電極室に充填されているイオン交換体の劣化を抑制できる。 28, at least a portion of the treated water from the degassing membrane (MD) 58 is circulated to the reverse osmosis treated water tank 42, but the treated water from the hydrogen peroxide removal device 100 or the electrical deionization device (EDI) 54 may also be circulated to the reverse osmosis treated water tank 42. In addition, water that bypasses the ultraviolet oxidation device 55 may be used as the supply water to be passed through the concentration chamber and electrode chamber of the hydrogen peroxide removal device 100, and this is preferable. By using water that bypasses the ultraviolet oxidation device 55, water with a low hydrogen peroxide concentration or no hydrogen peroxide is supplied to the concentration chamber and electrode chamber, so deterioration of the ion exchanger filled in the concentration chamber and electrode chamber can be suppressed.

純水製造装置では、過酸化水素除去装置の前段に炭酸除去手段を設けてもよい。過酸化水除去装置に供給される被処理水中の炭酸成分が少なくなると、過酸化水素除去装置に印加する電圧を低くすることが可能となり、消費電力を少なくできる。炭酸除去手段としては、逆浸透膜(RO)装置や、逆浸透膜装置への塩基性薬剤の添加、さらには、図28には示していないが、脱気膜(MD)、脱炭酸塔、アニオン交換樹脂塔などを用いることができる。 In a pure water production system, a carbon dioxide removal means may be provided in front of the hydrogen peroxide removal device. When the amount of carbon dioxide components in the water being treated and supplied to the hydrogen peroxide removal device is reduced, it becomes possible to lower the voltage applied to the hydrogen peroxide removal device, thereby reducing power consumption. Carbon dioxide removal means may include a reverse osmosis (RO) device, the addition of a basic agent to the reverse osmosis device, and, although not shown in FIG. 28, a deaeration membrane (MD), a decarbonation tower, an anion exchange resin tower, etc.

図29は、本発明に基づく過酸化水素除去装置を組み込んだ超純水製造装置の構成の一例を示している。図示される超純水製造装置400は、図28に示した純水製造装置300を一次純水システムとして用い、さらにサブシステムを配置して、超純水を製造するものである。サブシステムでは、一次純水システムからの一次純水を貯える純水タンク45が設けられており、純水タンク45の出口に対し、紫外線酸化装置(UV)61、非再生型イオン交換樹脂(CP)63、脱気膜(MD)65、及び限外濾過膜(UF)67がこの順で配置されて一次純水がこの順で処理され、超純水が製造される。製造された超純水の一部は純水タンク45に循環される。限外濾過膜(UF)67の代わりに精密濾過膜を用いてもよい。また、一次純水システムにおいて電気再生式脱イオン装置(EDI)54を設けない構成とすることもできる。 Figure 29 shows an example of the configuration of an ultrapure water production system incorporating a hydrogen peroxide removal device according to the present invention. The illustrated ultrapure water production system 400 uses the pure water production system 300 shown in Figure 28 as a primary pure water system, and further arranges a subsystem to produce ultrapure water. In the subsystem, a pure water tank 45 is provided to store primary pure water from the primary pure water system, and an ultraviolet oxidation device (UV) 61, a non-regenerated ion exchange resin (CP) 63, a degassing membrane (MD) 65, and an ultrafiltration membrane (UF) 67 are arranged in this order at the outlet of the pure water tank 45, and the primary pure water is treated in this order to produce ultrapure water. A part of the produced ultrapure water is circulated to the pure water tank 45. A microfiltration membrane may be used instead of the ultrafiltration membrane (UF) 67. Also, the primary pure water system may be configured without providing an electric regenerative deionization device (EDI) 54.

図30に示す超純水製造装置は、図29に示す超純水製造装置の一次純水システムにおける紫外線酸化装置(UV)55、過酸化水素除去装置100及び電気再生式脱イオン装置(EDI)54の配置順を、電気再生式脱イオン装置(EDI)54、紫外線酸化装置(UV)55及び過酸化水素除去装置100の順に入れ替えたものである。また図31に示す超純水製造装置は、図30に示す超純水製造装置の一次純水システムにおいて、電気再生式脱イオン装置(EDI)54の後段であって紫外線酸化装置(UV)の前段となる位置にホウ素選択性イオン交換樹脂(B IER)57やホウ素選択性吸着体などのホウ素除去装置を設けたものである。 The ultrapure water production system shown in FIG. 30 is a system in which the order of the ultraviolet oxidation device (UV) 55, hydrogen peroxide removal device 100, and electrical deionization device (EDI) 54 in the primary pure water system of the ultrapure water production system shown in FIG. 29 is changed to the order of electrical deionization device (EDI) 54, ultraviolet oxidation device (UV) 55, and hydrogen peroxide removal device 100. The ultrapure water production system shown in FIG. 31 is a system in which a boron removal device such as a boron-selective ion exchange resin (B IER) 57 or a boron-selective adsorbent is provided in the primary pure water system of the ultrapure water production system shown in FIG. 30, after the electrical deionization device (EDI) 54 and before the ultraviolet oxidation device (UV).

超純水製造装置において、本発明に基づく過酸化水素除去装置100をサブシステムに配置することもできる。図32は、図30に示す超純水製造装置において、一次純水システムから過酸化水素除去装置100を取り除いて紫外線酸化装置(UV)55の出口水がそのまま脱気膜(MD)58に供給されるようにし、サブシステムにおいて非再生型イオン交換樹脂(CP)63の代わりに過酸化水素除去装置100を設けたものである。一次純水システムでは、過酸化水素除去装置100の代わりに非再生型イオン交換樹脂(CP)56が設けられている。過酸化水素除去装置100には脱塩性能を持たせることができるので、サブシステムにおいて非再生型イオン交換樹脂(CP)63の代わりに過酸化水素除去装置100を設けたとしても、限外濾過膜(UF)67の出口水として得られる超純水の水質が劣化することはない。サブシステムにおいて、非再生型イオン交換樹脂(CP)63はそのまま残して過酸化水素除去装置100を設けるようにしてもよい。このようにすることで、過酸化水素除去装置100では取り切れなかったイオン成分を非再生型イオン交換樹脂(CP)63で除去でき、さらに、非再生型イオン交換樹脂(CP)63では除去することのできない過酸化水素を除去することができ、それぞれの機能を補完することができる。過酸化水素除去装置100と非再生型イオン交換樹脂(CP)63との両方を直列に設ける場合、過酸化水素除去装置100に先に通水しても、非再生型イオン交換樹脂(CP)63に先に通水してもよい。 In the ultrapure water production system, the hydrogen peroxide removal device 100 according to the present invention can also be arranged in the subsystem. FIG. 32 shows the ultrapure water production system shown in FIG. 30, in which the hydrogen peroxide removal device 100 is removed from the primary pure water system so that the outlet water of the ultraviolet oxidation device (UV) 55 is directly supplied to the degassing membrane (MD) 58, and the hydrogen peroxide removal device 100 is provided in place of the non-regenerative ion exchange resin (CP) 63 in the subsystem. In the primary pure water system, the non-regenerative ion exchange resin (CP) 56 is provided in place of the hydrogen peroxide removal device 100. Since the hydrogen peroxide removal device 100 can be provided with desalination performance, even if the hydrogen peroxide removal device 100 is provided in place of the non-regenerative ion exchange resin (CP) 63 in the subsystem, the quality of the ultrapure water obtained as the outlet water of the ultrafiltration membrane (UF) 67 does not deteriorate. In the subsystem, the non-regenerative ion exchange resin (CP) 63 may be left as it is and the hydrogen peroxide removal device 100 may be provided. In this way, the non-regenerative ion exchange resin (CP) 63 can remove ionic components that could not be removed by the hydrogen peroxide removal device 100, and furthermore, it can remove hydrogen peroxide that cannot be removed by the non-regenerative ion exchange resin (CP) 63, thereby complementing each other's functions. When both the hydrogen peroxide removal device 100 and the non-regenerative ion exchange resin (CP) 63 are provided in series, water may be passed through the hydrogen peroxide removal device 100 first, or through the non-regenerative ion exchange resin (CP) 63 first.

次に、実施例により本発明をさらに詳しく説明する。 Next, the present invention will be explained in more detail using examples.

[実施例1]
陽極11と陰極12の間に複数の過酸化水素除去室23が配置されるようにして図15及び図16に示した過酸化水素除去装置を組み立てた。10cm×10cmの正方形の開口を有する厚さ1cmの枠体を用意し、この枠体を2枚重ねてそこに再生形のPd担持アニオン交換樹脂(Pd AER)を充填することにより、厚さ2cmの過酸化水素除去室23を構成した。過酸化水素除去室23は、その陽極11の側はアニオン交換膜32で区画され、陰極12の側は、カチオン交換膜33が陰極12の側となるようにアニオン交換膜81とカチオン交換膜33とが相互に重ね合わされた膜で区画されている。電極室(陽極室21及び陰極室25)、濃縮室22,24については、同じ枠体を使用してイオン交換体を充填することにより、それぞれ厚さが1cmとなるようにした。電極室、濃縮室22,24及び過酸化水素除去室23に対し、導電率が1.3μS/cmであり、過酸化水素濃度が97.5μg/Lであり、全炭酸濃度が0.103mg/L(as CO)である水を供給し、電流が1.04Aとなるように陽極11と陰極12の間に直流電圧を印加した。過酸化水素除去室23への被処理水流量を88L/hとした。
[Example 1]
The hydrogen peroxide removal device shown in Figures 15 and 16 was assembled such that a plurality of hydrogen peroxide removal chambers 23 were arranged between the anode 11 and the cathode 12. A 1 cm thick frame having a 10 cm x 10 cm square opening was prepared, and two of these frames were stacked and filled with regenerated Pd-loaded anion exchange resin (Pd AER) to form a 2 cm thick hydrogen peroxide removal chamber 23. The hydrogen peroxide removal chamber 23 was partitioned on the anode 11 side by an anion exchange membrane 32, and on the cathode 12 side by a membrane in which an anion exchange membrane 81 and a cation exchange membrane 33 were mutually stacked so that the cation exchange membrane 33 was on the cathode 12 side. The electrode chambers (anode chamber 21 and cathode chamber 25) and concentration chambers 22 and 24 were each 1 cm thick by filling them with ion exchangers using the same frame. Water having a conductivity of 1.3 μS/cm, a hydrogen peroxide concentration of 97.5 μg/L, and a total carbonate concentration of 0.103 mg/L (as CO 2 ) was supplied to the electrode chambers, concentration chambers 22, 24, and hydrogen peroxide removal chamber 23, and a DC voltage was applied between anode 11 and cathode 12 so as to give a current of 1.04 A. The flow rate of water to be treated into hydrogen peroxide removal chamber 23 was set to 88 L/h.

過酸化水素除去装置への通水と直流電圧の印加を開始して約1000時間が経過して系が安定したときの、過酸化水素除去室23から排出される処理水に含まれる過酸化水素濃度を求め、この過酸化水素除去装置における過酸化水素除去率を求めた。同時に被処理水の比抵抗と、そのときに印加されている直流電圧の値とを求め、印加電圧と電流値とに基づいて、被処理水の単位流量当たりの消費電力を求めた。結果を表1に示す。また、これらの測定を終えたのち、Pd担持アニオン交換樹脂(Pd AER)を過酸化水素除去室23から取り出して自由状態でのその体積を求めたところ、過酸化水素除去室23の容積の95~100%であった。 When the system stabilized approximately 1000 hours after water was passed through the hydrogen peroxide removal device and DC voltage was applied, the hydrogen peroxide concentration in the treated water discharged from the hydrogen peroxide removal chamber 23 was determined, and the hydrogen peroxide removal rate in the hydrogen peroxide removal device was calculated. At the same time, the resistivity of the water being treated and the value of the DC voltage being applied at that time were calculated, and the power consumption per unit flow rate of the water being treated was calculated based on the applied voltage and current value. The results are shown in Table 1. After these measurements were completed, the Pd-loaded anion exchange resin (Pd AER) was removed from the hydrogen peroxide removal chamber 23 and its volume in the free state was calculated, which was 95-100% of the volume of the hydrogen peroxide removal chamber 23.

[実施例2]
実施例1と同様の過酸化水素除去装置であるが、過酸化水素除去室23とその陰極12の側に位置する濃縮室24との間がカチオン交換膜33のみによって仕切られている過酸化水素除去装置を組み立てた。この実施例2の過酸化水素除去装置は、図2に示した構造を有する。図33は実施例2の過酸化水素除去装置の要部を示している。実施例2の過酸化水素除去装置では、実施例1で用いた枠体を1枚だけ使用することによって、過酸化水素除去室23の厚さが1cmとなっている。
[Example 2]
A hydrogen peroxide removal apparatus similar to that of Example 1 was assembled in which the hydrogen peroxide removal chamber 23 and the concentration chamber 24 located on the side of the cathode 12 are separated only by a cation exchange membrane 33. The hydrogen peroxide removal apparatus of Example 2 has the structure shown in Fig. 2. Fig. 33 shows the main parts of the hydrogen peroxide removal apparatus of Example 2. In the hydrogen peroxide removal apparatus of Example 2, only one frame used in Example 1 is used, so that the thickness of the hydrogen peroxide removal chamber 23 is 1 cm.

実施例1と同じ水を使用し、過酸化水素除去室23への被処理水流量を56L/hとし、陽極11と陰極12の間を流れる電流が0.66Aとなるようにして、実施例1と同じ測定を行った。結果を表1に示す。また、測定を終えたのち、Pd担持アニオン交換樹脂(Pd AER)を過酸化水素除去室23から取り出して自由状態でのその体積を求めたところ、過酸化水素除去室23の容積の95~100%であった。なお、実施例2の過酸化水素除去装置では、Pd担持アニオン交換樹脂(Pd AER)とカチオン交換膜33との界面で水の解離反応が進行するが、このとき発生した水素イオンが過酸化水素除去室23に隣接する濃縮室24に放出され、濃縮室24内の水に含まれる炭酸成分と反応し、遊離炭酸を生じさせる。遊離炭酸は、荷電を有しないため、カチオン交換膜33の荷電反発による影響を受けず、濃縮室24から過酸化水素除去室23内へとカチオン交換膜33を介して拡散する。この遊離炭酸は、イオン形でないので過酸化水素除去室23内のPd担持アニオン交換樹脂(Pd AER)にも吸着されにくく、処理水側にリークして水質を低下させる原因になる。炭酸成分がPd担持アニオン交換樹脂(Pd AER)に吸着されるためには、炭酸イオンまたは重炭酸イオンに変換されている必要がある。これに対し、実施例1の過酸化水素除去装置では、遊離炭酸が拡散するカチオン交換膜33に対してアニオン交換膜81が重ね合わされているため、遊離炭酸は、アニオン交換膜81を通過するときに確実に炭酸イオンや重炭酸イオンに変換されてから過酸化水素除去室23に放出されるから、処理水における水質低下が起こりにくい。 The same measurements as in Example 1 were performed using the same water as in Example 1, with the flow rate of the water to be treated into the hydrogen peroxide removal chamber 23 set to 56 L/h, and the current flowing between the anode 11 and the cathode 12 set to 0.66 A. The results are shown in Table 1. After the measurements were completed, the Pd-loaded anion exchange resin (Pd AER) was removed from the hydrogen peroxide removal chamber 23 and its volume in the free state was measured, which was 95 to 100% of the volume of the hydrogen peroxide removal chamber 23. In the hydrogen peroxide removal device of Example 2, a water dissociation reaction proceeds at the interface between the Pd-loaded anion exchange resin (Pd AER) and the cation exchange membrane 33, and the hydrogen ions generated at this time are released into the concentration chamber 24 adjacent to the hydrogen peroxide removal chamber 23 and react with the carbonic acid component contained in the water in the concentration chamber 24 to produce free carbonic acid. Since free carbon dioxide does not have a charge, it is not affected by the charge repulsion of the cation exchange membrane 33 and diffuses from the concentration chamber 24 into the hydrogen peroxide removal chamber 23 through the cation exchange membrane 33. Since this free carbon dioxide is not in an ionic form, it is difficult to be adsorbed by the Pd-loaded anion exchange resin (Pd AER) in the hydrogen peroxide removal chamber 23, and leaks into the treated water, causing a deterioration in water quality. In order for the carbonic acid component to be adsorbed by the Pd-loaded anion exchange resin (Pd AER), it must be converted into carbonate ions or bicarbonate ions. In contrast, in the hydrogen peroxide removal device of Example 1, the anion exchange membrane 81 is superimposed on the cation exchange membrane 33 through which the free carbon dioxide diffuses, so that the free carbon dioxide is reliably converted into carbonate ions or bicarbonate ions when passing through the anion exchange membrane 81 before being released into the hydrogen peroxide removal chamber 23, and therefore the water quality of the treated water is less likely to deteriorate.

[実施例3]
実施例1と同様の過酸化水素除去装置であるが、過酸化水素除去室23とその陰極12の側に位置する濃縮室24との間がカチオン交換膜33のみによって仕切られている過酸化水素除去装置を組み立てた。図34は実施例3の過酸化水素除去装置の要部を示している。実施例3の過酸化水素除去装置では、過酸化水素除去室23の厚さは実施例1と同じく2cmとなっている。実施例3の過酸化水素除去装置も図2に示した構造を有し、実施例2と実施例3とは、過酸化水素除去室23の厚さだけが異なっている。
[Example 3]
A hydrogen peroxide removal apparatus similar to that of Example 1 was assembled in which the hydrogen peroxide removal chamber 23 and the concentration chamber 24 located on the side of the cathode 12 are separated only by a cation exchange membrane 33. Figure 34 shows the main parts of the hydrogen peroxide removal apparatus of Example 3. In the hydrogen peroxide removal apparatus of Example 3, the thickness of the hydrogen peroxide removal chamber 23 is 2 cm, the same as in Example 1. The hydrogen peroxide removal apparatus of Example 3 also has the structure shown in Figure 2, and only the thickness of the hydrogen peroxide removal chamber 23 differs between Examples 2 and 3.

実施例1と同じ水を使用し、過酸化水素除去室23への被処理水流量を88L/hとし、陽極11と陰極12の間を流れる電流が1.04Aとなるようにして、実施例1と同じ測定を行った。結果を表1に示す。また、測定を終えたのち、Pd担持アニオン交換樹脂(Pd AER)を過酸化水素除去室23から取り出して自由状態でのその体積を求めたところ、過酸化水素除去室23の容積の95~100%であった。なお、実施例3の過酸化水素除去装置でも、Pd担持アニオン交換樹脂(Pd AER)とカチオン交換膜33との界面で水の解離反応が進行するが、このとき発生した水素イオンはカチオン交換膜33を介して濃縮室24に拡散し、遊離炭酸を生じさせる。 The same measurements as in Example 1 were performed using the same water as in Example 1, with the flow rate of the water to be treated into the hydrogen peroxide removal chamber 23 set to 88 L/h, and the current flowing between the anode 11 and the cathode 12 set to 1.04 A. The results are shown in Table 1. After the measurements were completed, the Pd-loaded anion exchange resin (Pd AER) was removed from the hydrogen peroxide removal chamber 23 and its volume in the free state was measured; it was 95-100% of the volume of the hydrogen peroxide removal chamber 23. In the hydrogen peroxide removal device of Example 3, the water dissociation reaction also proceeds at the interface between the Pd-loaded anion exchange resin (Pd AER) and the cation exchange membrane 33, and the hydrogen ions generated at this time diffuse into the concentration chamber 24 through the cation exchange membrane 33, producing free carbon dioxide.

Figure 0007634370000001
Figure 0007634370000001

実施例1~3を比較すると、過酸化水素除去率はほぼ同じであり、処理水の比抵抗は、実施例1が最も高い。実施例1~3のいずれも、陽極11と陰極12との間に印加される直流電圧は実用可能な範囲内にあった。しかしながら、実施例1では印加電圧が10.0Vであるのに対し、実施例1よりも電流値を小さくしたにも関わらず実施例2では印加電圧が14.6Vであって実施例1の約1.5倍になった。実施例1と同じ電流値である実施例3では印加電圧が29.2Vであって約3倍になった。印加電圧が高くなったことに伴い、処理水の単位流量当たりの消費電力では、実施例1では0.11W・h/Lであるのに対し、実施例2では0.17W・h/Lであって実施例1の約1.5倍となり、実施例3では0.33W・h/Lであって実施例1の約3倍となった。このように実施例1では印加電圧を低くでき、処理水量当たりの消費電力を小さくできるのは、実施例1ではアニオン交換膜81とカチオン交換膜33との接合界面の全面で水の解離反応が発生するので、イオン交換体の電気再生に使用される水酸化物イオンが大量に過酸化水素除去室23に供給されるためと考えられる。これに対して実施例2,3では、Pd担持アニオン交換樹脂(Pd AER)とカチオン交換膜33とが接する点という比較的狭い場所でしか水の解離反応が進行しないので、水酸化物イオンの生成量が少なく、印加電圧の上昇がもたらされたものと考えらえる。また、実施例1において処理水の比抵抗が高いのは、濃縮室24から過酸化水素除去室23に拡散する遊離炭酸が、アニオン交換膜81を拡散するときに炭酸イオンあるいは重炭酸イオンに変換され、その後、Pd担持アニオン交換樹脂(Pd AER)に捕捉されるためであると考えられる。 Comparing Examples 1 to 3, the hydrogen peroxide removal rate was almost the same, and Example 1 had the highest resistivity of the treated water. In all of Examples 1 to 3, the DC voltage applied between the anode 11 and the cathode 12 was within a practical range. However, in Example 1, the applied voltage was 10.0 V, while in Example 2, the applied voltage was 14.6 V, which was about 1.5 times that of Example 1, despite the current value being smaller than that of Example 1. In Example 3, which had the same current value as Example 1, the applied voltage was 29.2 V, which was about three times that of Example 1. As the applied voltage increased, the power consumption per unit flow rate of the treated water was 0.11 W·h/L in Example 1, while it was 0.17 W·h/L in Example 2, which was about 1.5 times that of Example 1, and 0.33 W·h/L in Example 3, which was about three times that of Example 1. Thus, in Example 1, the applied voltage can be lowered and the power consumption per amount of treated water can be reduced because, in Example 1, the water dissociation reaction occurs over the entire surface of the interface between the anion exchange membrane 81 and the cation exchange membrane 33, so that a large amount of hydroxide ions used for electrical regeneration of the ion exchanger are supplied to the hydrogen peroxide removal chamber 23. In contrast, in Examples 2 and 3, the water dissociation reaction proceeds only in a relatively narrow area, that is, the point where the Pd-loaded anion exchange resin (Pd AER) and the cation exchange membrane 33 contact, so that the amount of hydroxide ions produced is small, resulting in an increase in the applied voltage. In addition, the resistivity of the treated water is high in Example 1 because the free carbonic acid diffusing from the concentration chamber 24 to the hydrogen peroxide removal chamber 23 is converted to carbonate ions or bicarbonate ions when diffusing through the anion exchange membrane 81, and then captured by the Pd-loaded anion exchange resin (Pd AER).

[実施例4]
過酸化水素除去室におけるイオン交換体の充填率について検討した。ここでイオン交換体の充填率とは、上述したように、陽極と陰極との間に直流電圧を印加して被処理水を過酸化水素除去室に通水したのちに過酸化水素除去室から取り出されるイオン交換体の自由状態での体積を、過酸化水素除去室の容積で除算して得られる値のことである。実施例1と同じ構成の過酸化水素除去装置を使用し、過酸化水素除去室23には塩形のPd担持アニオン交換樹脂(Pd AER)を充填した。このときの充填量を変えることにより実施例4-1と実施例4-2の過酸化水素除去装置を構成した。電極室、濃縮室22,24及び過酸化水素除去室23に対し、導電率が1.3μS/cmであり、過酸化水素濃度が97.5μg/Lであり、全炭酸濃度が0.103mg/L(as CO)である水を供給し、電流が1.04Aとなるように陽極11と陰極12の間に電圧を印加した。過酸化水素除去室23への被処理水流量を88L/hとした。
[Example 4]
The filling rate of the ion exchanger in the hydrogen peroxide removal chamber was examined. Here, the filling rate of the ion exchanger refers to the value obtained by dividing the volume of the ion exchanger in a free state that is removed from the hydrogen peroxide removal chamber after the water to be treated is passed through the hydrogen peroxide removal chamber by the volume of the hydrogen peroxide removal chamber, as described above. A hydrogen peroxide removal device having the same configuration as in Example 1 was used, and the hydrogen peroxide removal chamber 23 was filled with a salt-type Pd-supported anion exchange resin (Pd AER). The hydrogen peroxide removal devices of Example 4-1 and Example 4-2 were constructed by changing the filling amount at this time. Water having a conductivity of 1.3 μS/cm, a hydrogen peroxide concentration of 97.5 μg/L, and a total carbonate concentration of 0.103 mg/L (as CO 2 ) was supplied to the electrode chambers, concentration chambers 22, 24, and hydrogen peroxide removal chamber 23, and a voltage was applied between anode 11 and cathode 12 so as to give a current of 1.04 A. The flow rate of water to be treated into hydrogen peroxide removal chamber 23 was set to 88 L/h.

実施例4-1及び実施例4-2のそれぞれの過酸化水素除去装置について、過酸化水素除去装置への通水と直流電圧の印加を開始して約500時間が経過して系が安定したときの、過酸化水素除去室23から排出される処理水に含まれる過酸化水素濃度を求め、この過酸化水素除去装置における過酸化水素除去率を求めた。同時に被処理水の比抵抗と、そのときに印加されている直流電圧の値とを求めた。結果を表2に示す。また、これらの測定を終えたのち、Pd担持アニオン交換樹脂(Pd AER)を過酸化水素除去室23から取り出して自由状態でのその体積を求めて充填率を求めたところ、実施例4-1では110~115%であり、実施例4-2では95~100%であった。 For each of the hydrogen peroxide removal devices of Examples 4-1 and 4-2, the concentration of hydrogen peroxide contained in the treated water discharged from the hydrogen peroxide removal chamber 23 was determined when the system stabilized approximately 500 hours after water flow through the hydrogen peroxide removal device and application of DC voltage was started, and the hydrogen peroxide removal rate of this hydrogen peroxide removal device was determined. At the same time, the resistivity of the water to be treated and the value of the DC voltage applied at that time were determined. The results are shown in Table 2. After these measurements were completed, the Pd-supported anion exchange resin (Pd AER) was removed from the hydrogen peroxide removal chamber 23 and its volume in the free state was determined to determine the filling rate, which was 110-115% in Example 4-1 and 95-100% in Example 4-2.

Figure 0007634370000002
Figure 0007634370000002

実施例4-1と実施例4-2とを比較すると、過酸化水素除去率はほぼ同じであり、処理水の比抵抗には若干の差がある。しかしながら、充填率が高い実施例4-1では印加電圧が6.5Vであるのに対し、充填率が低い実施例4-2では印加電圧が29.2Vであり、実施例4-1に比べて約4.5倍となった。実施例1と比較しても、より充填率が高い実施例4-1では印加電圧を低くすることができた。被処理水の通水を妨げない範囲で充填率を高めることにより、印加電圧を低くできることが分かった。また、電圧が低くなり電流が流れやすくなったことで、実施例4-1の処理水の比抵抗の方が若干高く良好な値になったものと考えられる。 Comparing Example 4-1 and Example 4-2, the hydrogen peroxide removal rate is almost the same, but there is a slight difference in the resistivity of the treated water. However, in Example 4-1, which has a high filling rate, the applied voltage is 6.5 V, while in Example 4-2, which has a low filling rate, the applied voltage is 29.2 V, which is about 4.5 times that of Example 4-1. Even compared to Example 1, the applied voltage could be lowered in Example 4-1, which has a higher filling rate. It was found that the applied voltage can be lowered by increasing the filling rate within a range that does not impede the flow of the water to be treated. In addition, it is believed that the resistivity of the treated water in Example 4-1 was slightly higher and more favorable because the voltage was lower and current flowed more easily.

[実施例5]
白金族金属触媒を担持させたイオン交換体の充填率と過酸化水素除去室の電気抵抗との関係を調べた。ここでは過酸化水素除去室を模するために両側に白金の板電極を備える53.1cmの空間を用意し、充填率に相当するようにこの空間に対し、塩形のPd担持アニオン交換樹脂を充填し、温度25℃の超純水を通水した。そして、LCRメータを使用して板電極間に周波数1kHz、電圧1000mVの交流電圧を印加して板電極間のインピーダンスを測定し、これを、過酸化水素除去装置として運転する際の直流電圧を印加したときの電気抵抗として評価した。結果を図35に示す。図35に示すように、充填率が0.95(すなわち95%)未満であると電気抵抗は著しく大きくなり、過酸化水素除去室23内のイオン交換体の電気再生には多くのエネルギーを必要とするものとなった。充填率は0.95以上1.25以下(すなわち95%以上125%以下)であることが好ましく、1.02以上1.25以下(すなわち102%以上125%以下)であることがより好ましいことが分かった。
[Example 5]
The relationship between the packing rate of the ion exchanger carrying a platinum group metal catalyst and the electrical resistance of the hydrogen peroxide removal chamber was investigated. In this case, a space of 53.1 cm3 with platinum plate electrodes on both sides was prepared to simulate the hydrogen peroxide removal chamber, and the space was filled with salt-form Pd-carrying anion exchange resin to correspond to the packing rate, and ultrapure water at a temperature of 25°C was passed through it. Then, an LCR meter was used to apply an AC voltage of 1 kHz and 1000 mV between the plate electrodes to measure the impedance between the plate electrodes, and this was evaluated as the electrical resistance when a DC voltage was applied when operating as a hydrogen peroxide removal device. The results are shown in Figure 35. As shown in Figure 35, when the packing rate was less than 0.95 (i.e., 95%), the electrical resistance became significantly large, and a lot of energy was required for the electrical regeneration of the ion exchanger in the hydrogen peroxide removal chamber 23. It has been found that the filling rate is preferably 0.95 to 1.25 (i.e., 95% to 125%), and more preferably 1.02 to 1.25 (i.e., 102% to 125%).

[実施例6]
実施例4と同様に、過酸化水素除去室におけるイオン交換体の充填率について検討した。図34に示す、実施例3と同じ構成の過酸化水素除去装置を使用し、過酸化水素除去室23には塩形のPd担持アニオン交換樹脂(Pd AER)を充填した。このときの充填量を変えることにより実施例6-1と実施例6-2の過酸化水素除去装置を構成した。電極室、濃縮室22,24及び過酸化水素除去室23に対し、実施例6-1では、導電率が1.2μS/cmであり、過酸化水素濃度が102μg/Lであり、全炭酸濃度が0.104mg/L(as CO)である水を供給し、実施例6-2では、導電率が1.3μS/cmであり、過酸化水素濃度が96.3μg/Lであり、全炭酸濃度が0.103mg/L(as CO)である水を供給した。実施例6-1及び実施例6-2のいずれにおいても、過酸化水素除去室23への被処理水流量を88L/hとし、電流が1.04Aとなるように陽極11と陰極12の間に電圧を印加した。
[Example 6]
As in Example 4, the filling rate of the ion exchanger in the hydrogen peroxide removal chamber was examined. A hydrogen peroxide removal device having the same configuration as in Example 3 shown in FIG. 34 was used, and the hydrogen peroxide removal chamber 23 was filled with a salt-type Pd-supported anion exchange resin (Pd AER). The hydrogen peroxide removal devices of Examples 6-1 and 6-2 were constructed by changing the filling amount. In Example 6-1, water with a conductivity of 1.2 μS/cm, a hydrogen peroxide concentration of 102 μg/L, and a total carbonate concentration of 0.104 mg/L (as CO 2 ) was supplied to the electrode chamber, the concentration chambers 22 and 24, and the hydrogen peroxide removal chamber 23, and in Example 6-2, water with a conductivity of 1.3 μS/cm, a hydrogen peroxide concentration of 96.3 μg/L, and a total carbonate concentration of 0.103 mg/L (as CO 2 ) was supplied to the electrode chamber, the concentration chambers 22 and 24, and the hydrogen peroxide removal chamber 23. In both Example 6-1 and Example 6-2, the flow rate of the water to be treated into the hydrogen peroxide removal chamber 23 was set to 88 L/h, and a voltage was applied between the anode 11 and the cathode 12 so that the current was 1.04 A.

実施例6-1及び実施例6-2のそれぞれの過酸化水素除去装置について、過酸化水素除去装置への通水と直流電圧の印加を開始して約300時間が経過して系が安定したときの、過酸化水素除去室23から排出される処理水に含まれる過酸化水素濃度を求め、この過酸化水素除去装置における過酸化水素除去率を求めた。同時に処理水の比抵抗と、そのときに印加されている直流電圧の値と、処理水量当たりの消費電力とを求めた。結果を表3に示す。また、これらの測定を終えたのち、Pd担持アニオン交換樹脂(Pd AER)を過酸化水素除去室23から取り出して自由状態でのその体積を求めて充填率を求めたところ、実施例6-1では110~115%であり、実施例6-2では95~100%であった。 For each of the hydrogen peroxide removal devices of Examples 6-1 and 6-2, the concentration of hydrogen peroxide contained in the treated water discharged from the hydrogen peroxide removal chamber 23 was determined when the system stabilized approximately 300 hours after the start of water flow and application of DC voltage to the hydrogen peroxide removal device, and the hydrogen peroxide removal rate of this hydrogen peroxide removal device was calculated. At the same time, the resistivity of the treated water, the value of the DC voltage applied at that time, and the power consumption per amount of treated water were determined. The results are shown in Table 3. After these measurements were completed, the Pd-supported anion exchange resin (Pd AER) was removed from the hydrogen peroxide removal chamber 23 and its volume in the free state was determined to determine the filling rate, which was 110-115% in Example 6-1 and 95-100% in Example 6-2.

Figure 0007634370000003
Figure 0007634370000003

実施例6-1と実施例6-2とを比較すると、過酸化水素除去率はほぼ同じであり、処理水の比抵抗には差がある。印加電圧に関し、充填率が高い実施例6-1では充填率が低い実施例6-2の半分以下となり、その分、消費電力が低くなった。電圧が低くなり電流が流れやすくなったことで、実施例6-1の処理水の比抵抗の方が実施例6-2の場合よりも高くなり、良好な値になったものと考えられる。 Comparing Example 6-1 and Example 6-2, the hydrogen peroxide removal rate is almost the same, but there is a difference in the resistivity of the treated water. With regard to the applied voltage, Example 6-1, which has a high filling rate, had less than half the voltage of Example 6-2, which has a low filling rate, and as a result, the power consumption was lower. It is believed that the lower voltage, which made it easier for current to flow, resulted in the resistivity of the treated water in Example 6-1 being higher than in Example 6-2, resulting in a better value.

11 陽極
12 陰極
21,26 陽極室
22,24 濃縮室
23,29 過酸化水素除去室
25,27 陰極室
28 脱塩室
31,33,35,83 カチオン交換膜(CEM)
32,34,37,38,81,82 アニオン交換膜(AEM)
36 中間イオン交換膜
51,52 逆浸透膜装置
54 電気再生式脱イオン装置(EDI)
55,61 紫外線酸化装置(UV)
56,63 非再生型イオン交換樹脂(CP)
57 ホウ素選択性イオン交換樹脂(B IER)
58,65 脱気膜(MD)
67 限外濾過膜(UF)
100 過酸化水素除去装置
300 純水製造装置
400 超純水製造装置
11 Anode 12 Cathode 21, 26 Anode chamber 22, 24 Concentration chamber 23, 29 Hydrogen peroxide removal chamber 25, 27 Cathode chamber 28 Deionization chamber 31, 33, 35, 83 Cation exchange membrane (CEM)
32, 34, 37, 38, 81, 82 Anion exchange membrane (AEM)
36 Intermediate ion exchange membrane 51, 52 Reverse osmosis membrane device 54 Electrodeionization device (EDI)
55, 61 Ultraviolet oxidation device (UV)
56, 63 Non-regenerative ion exchange resin (CP)
57 Boron-selective ion exchange resin (B IER)
58, 65 Degassing membrane (MD)
67 Ultrafiltration membrane (UF)
100 Hydrogen peroxide removal device 300 Pure water production device 400 Ultrapure water production device

Claims (11)

被処理水に含まれる過酸化水素を除去する方法であって、
陽極と陰極との間に直流電圧を印加しつつ、前記陽極と前記陰極との間に設けられてイオン交換体が充填されている過酸化水素除去室に前記被処理水を通水する工程を有し、
前記過酸化水素除去室に充填されている前記イオン交換体の少なくとも一部は、過酸化水素分解能を有する金属触媒が担持されているイオン交換体であり、
前記通水する工程ののちに前記過酸化水素除去室から取り出される前記イオン交換体の自由状態での、前記イオン交換体の粒子間の空隙も含めたかさ体積を前記過酸化水素除去室の容積で除算した値である充填率が95%以上125%以下である、方法。
A method for removing hydrogen peroxide contained in water to be treated, comprising the steps of:
The method includes a step of passing the water to be treated through a hydrogen peroxide removal chamber filled with an ion exchanger and disposed between an anode and a cathode while applying a DC voltage between the anode and the cathode,
At least a portion of the ion exchanger packed in the hydrogen peroxide removal chamber is an ion exchanger carrying a metal catalyst having hydrogen peroxide decomposition ability,
a filling factor, which is the value obtained by dividing the bulk volume , including voids between particles, of the ion exchanger in a free state when removed from the hydrogen peroxide removal chamber after the water passing step by the volume of the hydrogen peroxide removal chamber, is 95% or more and 125% or less.
前記充填率が102%以上125%以下である、請求項1に記載の方法。 The method of claim 1, wherein the filling rate is 102% or more and 125% or less. 前記金属触媒が白金族金属触媒であり、前記金属触媒が担持されている前記イオン交換体がアニオン交換体である、請求項1または2に記載の方法。 The method according to claim 1 or 2, wherein the metal catalyst is a platinum group metal catalyst, and the ion exchanger on which the metal catalyst is supported is an anion exchanger. 前記過酸化水素除去室は、その前記陽極の側においてアニオン交換膜によって区画され、その前記陰極の側においてイオン交換膜によって区画されている、請求項1乃至3のいずれか1項に記載の方法。 The method according to any one of claims 1 to 3, wherein the hydrogen peroxide removal chamber is partitioned by an anion exchange membrane on the anode side and by an ion exchange membrane on the cathode side. 被処理水に含まれる過酸化水素を除去する過酸化水素除去装置であって、
陽極及び陰極と、
前記陽極と前記陰極との間に設けられてイオン交換体が充填されている過酸化水素除去室と、
を有し、
前記過酸化水素除去室に充填されている前記イオン交換体の少なくとも一部は、過酸化水素分解能を有する金属触媒が担持されているイオン交換体であり、
前記陽極と前記陰極の間に直流電圧が印加され、
前記陽極と前記陰極との間に直流電圧を印加して前記被処理水を前記過酸化水素除去室に通水したのちに前記過酸化水素除去室から取り出される前記イオン交換体の自由状態での、前記イオン交換体の粒子間の空隙も含めたかさ体積を前記過酸化水素除去室の容積で除算した値である充填率が、95%以上125%以下である、過酸化水素除去装置。
A hydrogen peroxide removal device for removing hydrogen peroxide contained in water to be treated,
an anode and a cathode;
a hydrogen peroxide removal chamber provided between the anode and the cathode and filled with an ion exchanger;
having
At least a portion of the ion exchanger packed in the hydrogen peroxide removal chamber is an ion exchanger carrying a metal catalyst having hydrogen peroxide decomposition ability,
A DC voltage is applied between the anode and the cathode,
a filling rate, which is a value obtained by dividing the bulk volume, including voids between particles of the ion exchanger , in a free state when the ion exchanger is removed from the hydrogen peroxide removal chamber after a DC voltage is applied between the anode and the cathode to pass the water to be treated through the hydrogen peroxide removal chamber, by the volume of the hydrogen peroxide removal chamber, of 95% or more and 125% or less.
前記充填率が102%以上125%以下である、請求項5に記載の過酸化水素除去装置。 The hydrogen peroxide removal device according to claim 5, wherein the filling rate is 102% or more and 125% or less. 前記金属触媒が白金族金属触媒であり、前記金属触媒が担持されている前記イオン交換体がアニオン交換体である、請求項5または6に記載の過酸化水素除去装置。 The hydrogen peroxide removal device according to claim 5 or 6, wherein the metal catalyst is a platinum group metal catalyst, and the ion exchanger on which the metal catalyst is supported is an anion exchanger. 前記過酸化水素除去室は、その前記陽極の側においてアニオン交換膜によって区画され、その前記陰極の側においてイオン交換膜によって区画されている、請求項5乃至7のいずれか1項に記載の過酸化水素除去装置。 The hydrogen peroxide removal device according to any one of claims 5 to 7, wherein the hydrogen peroxide removal chamber is partitioned by an anion exchange membrane on the anode side and by an ion exchange membrane on the cathode side. 前記イオン交換膜の前記陰極の側もしくは前記陽極の側にイオン交換体が充填された脱塩室を備え、
前記過酸化水素除去室によって処理された処理水が前記脱塩室に通水される、請求項8に記載の過酸化水素除去装置。
A deionization chamber filled with an ion exchanger is provided on the cathode side or the anode side of the ion exchange membrane,
9. The hydrogen peroxide removal apparatus according to claim 8, wherein water treated in the hydrogen peroxide removal chamber is passed through the deionization chamber.
前記過酸化水素除去室において、前記被処理水の入口に接して、前記金属触媒が担持されている前記イオン交換体が配置している、請求項5乃至9のいずれか1項に記載の過酸化水素除去装置。 The hydrogen peroxide removal device according to any one of claims 5 to 9, wherein the ion exchanger carrying the metal catalyst is disposed in contact with the inlet of the water to be treated in the hydrogen peroxide removal chamber. 請求項5乃至10のいずれか1項に記載の過酸化水素除去装置と、
前記過酸化水素除去装置の前段に設けられた紫外線酸化装置と、
を有する、純水製造装置。
The hydrogen peroxide removal device according to any one of claims 5 to 10,
an ultraviolet oxidation device provided upstream of the hydrogen peroxide removal device;
A pure water production apparatus having the above structure.
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