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JP7636788B2 - Method for synthesizing small molecule compound BRD0539 - Google Patents
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JP7636788B2 - Method for synthesizing small molecule compound BRD0539 - Google Patents

Method for synthesizing small molecule compound BRD0539 Download PDF

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JP7636788B2
JP7636788B2 JP2021085011A JP2021085011A JP7636788B2 JP 7636788 B2 JP7636788 B2 JP 7636788B2 JP 2021085011 A JP2021085011 A JP 2021085011A JP 2021085011 A JP2021085011 A JP 2021085011A JP 7636788 B2 JP7636788 B2 JP 7636788B2
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芳隆 松島
明香 舟久保
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Tokyo University of Agriculture
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Description

この発明は、CRISPR-Cas9の阻害剤である低分子化合物BRD0539の新規な合成方法に関に関する。 This invention relates to a novel method for synthesizing the small molecule compound BRD0539, an inhibitor of CRISPR-Cas9.

CRISPR-Cas9 は、外来性ウイルスやプラスミドへの獲得免疫を与える微生物の適応免疫システムとして、細菌や古細菌において発見されたものであり、細菌がウイルスの侵入した際にウイルスの遺伝子を自分の遺伝子の中に取りこんで記憶し、同じウイルスが再度侵入した場合、その遺伝子を切断し排除するという免疫機構である(非特許文献1等)。これを応用することでDNAの任意の塩基配列を認識し、その部分を削除・置換することができ、従来のものよりも高精度で簡便なゲノム編集技術として注目されている(非特許文献2,3等)。
一方、2019年にCRISPR-Cas9の阻害剤となる低分子化合物BRD0539(化1)が発見された(非特許文献4)。この阻害剤であるBRD0539を用いれば、CRISPR-Cas9の活性をより正確に制御することが可能になる。

Figure 0007636788000001
CRISPR-Cas9 was discovered in bacteria and archaea as an adaptive immune system of microorganisms that confers acquired immunity to foreign viruses and plasmids, and is an immune mechanism in which, when a virus invades a bacterium, the bacterium incorporates the viral gene into its own genes and memorizes it, and if the same virus invades again, it cuts and eliminates the gene (Non-Patent Document 1, etc.). By applying this, it is possible to recognize any base sequence in DNA and delete or replace that part, and it has attracted attention as a genome editing technology that is more accurate and simpler than conventional methods (Non-Patent Documents 2, 3, etc.).
Meanwhile, in 2019, a small molecule compound BRD0539 (Chemical 1), which acts as an inhibitor of CRISPR-Cas9, was discovered (Non-Patent Document 4). Using this inhibitor, BRD0539, it is possible to more precisely control the activity of CRISPR-Cas9.
Figure 0007636788000001

BRD0539の合成経路は既に報告されている(非特許文献5、特許文献1等)。
最初に報告されたBRD0539の合成方法(非特許文献5)の概要を、下式(化4)に示す。即ち、4-ブロモアニリンを出発物質とし、Povarov反応により三環性の化合物2を合成し、その後還元により化合物3に変換する。化合物3以降の変換反応(Fmoc基の脱保護、N-トシル化(スルホンアミド化)、鈴木・宮浦カップリング)は固相合成で行なわれている。この合成方法においては、化合物3以後の変換において、ポリマー(Si)に固定されることでヒドロキシ基が保護されている。

Figure 0007636788000002
The synthetic route for BRD0539 has already been reported (Non-Patent Document 5, Patent Document 1, etc.).
The outline of the first reported synthesis method of BRD0539 (Non-Patent Document 5) is shown in the following formula (Chemical Formula 4). That is, 4-bromoaniline is used as a starting material, and tricyclic compound 2 is synthesized by Povarov reaction, which is then converted to compound 3 by reduction. The conversion reactions after compound 3 (deprotection of Fmoc group, N-tosylation (sulfonamidation), Suzuki-Miyaura coupling) are carried out by solid-phase synthesis. In this synthesis method, the hydroxyl group is protected by being fixed to a polymer (Si) in the conversion after compound 3.
Figure 0007636788000002

その後報告された方法(特許文献1)では、下式(化5)に示すように、先の合成経路を基本とし、化合物3に相当する化合物をN-Boc体3'(93 % e.e.)として得た後、ヒドロキシ基を3,3-ジメチルブチリル(DMB)基で保護した化合物を用いて以後の変換(脱Boc、トシル化、鈴木・宮浦カップリング、脱DMB)を行う。この合成方法においては、ヒドロキシ基をDMB基で保護してその後の変換を行っている。

Figure 0007636788000003
In a method reported later (Patent Document 1), as shown in the following formula (Chemical Formula 5), based on the above synthetic route, a compound corresponding to compound 3 is obtained as an N-Boc compound 3' (93% ee), and then a compound in which the hydroxy group is protected with a 3,3-dimethylbutyryl (DMB) group is used for subsequent transformations (removal of Boc, tosylation, Suzuki-Miyaura coupling, removal of DMB). In this synthetic method, the hydroxy group is protected with a DMB group and the subsequent transformations are carried out.
Figure 0007636788000003

国際公開WO2020/068304International Publication WO2020/068304

Science, 2007, 315, 1709-1712.Science, 2007, 315, 1709-1712. Science, 2012, 337, 816-821.Science, 2012, 337, 816-821. Nature Biotechnology, 2014, 32, 347-355.Nature Biotechnology, 2014, 32, 347-355. Cell, 2019, 177, 1067-1079.e19.Cell, 2019, 177, 1067-1079.e19. ACS Comb. Sci. 2012, 14, 621-630. (ACS Comb. Sci. 2014, 16, 46-46.に修正あり)ACS Comb. Sci. 2012, 14, 621-630. (Corrected in ACS Comb. Sci. 2014, 16, 46-46.)

CRISPR-Cas9の阻害剤であるBRD0539を用いれば、CRISPR-Cas9の活性をより正確に制御することができるため、BRD0539の合成が簡易になって入手が容易になれば、その合成方法の有用性は高い。
しかし、既報告のBRD0539の合成経路(非特許文献5、特許文献1等)は、全て出発物質(上記化学式(化4)では化合物3)のヒドロキシ基(最終生成物であるBRD0539の4位のヒドロキシメチル基のヒドロキシ基に相当する)を保護することにより行われており、工程も多く複雑であり、改善を要すると考えられた。
そのため、本発明は、従来のBRD0539の合成経路より効率のよい合成経路を提供することを目的とする。
Since the use of the CRISPR-Cas9 inhibitor BRD0539 allows for more precise control of CRISPR-Cas9 activity, if the synthesis of BRD0539 becomes easier and more readily available, this synthesis method will be highly useful.
However, all of the previously reported synthetic routes to BRD0539 (Non-Patent Document 5, Patent Document 1, etc.) were carried out by protecting the hydroxy group (corresponding to the hydroxy group of the hydroxymethyl group at position 4 of the final product, BRD0539) of the starting material (compound 3 in the above chemical formula (chemical formula 4)). The routes involved many complicated steps, and it was believed that improvements were required.
Therefore, an object of the present invention is to provide a synthetic route for BRD0539 that is more efficient than conventional synthetic routes.

本発明者は、鋭意努力の結果、下式(化6)に示すように、従来の合成方法と異なり、出発物質(ここでは化合物3)のヒドロキシ基を保護することなしに、より効率的な合成を達成した。

Figure 0007636788000004
まず、第1段階で、出発物質(化合物3)のアミノ基の保護基(ここではFmoc基)を脱保護した反応液に、アミン類(ピリジン)とトシルクロリド(TsCl)を加えてトシル化したところ(One-pot反応)、目的の化合物7を収率よく得ることに成功した(73%)。次に、第2段階の鈴木・宮浦カップリング反応においても、ヒドロキシ基を保護せずとも高収率(94%)で反応が進行し、目的のBRD0539を得ることができた。この合成経路は、化合物3から2段階で、BRD0539を収率69%で得ることができ、大変効率の良い合成法といえる。
即ち、本発明者は、出発物質である下記化合物Aのヒドロキシ基を反応の全工程に渡って保護せずに、この反応を行うことができることを見出し、少ない工程で容易にBRD0539を合成することのできる経路を開発することに成功した。 As a result of extensive efforts, the present inventors have achieved a more efficient synthesis as shown in the following formula (Chemical Formula 6), which differs from conventional synthesis methods in that it does not require protection of the hydroxy group of the starting material (here, compound 3).
Figure 0007636788000004
First, in the first step, the amino protecting group (Fmoc group in this case) of the starting material (compound 3) was deprotected, and the reaction solution was treated with amines (pyridine) and tosyl chloride (TsCl) to perform tosylation (one-pot reaction), successfully obtaining the target compound 7 in good yield (73%). Next, in the second step, the Suzuki-Miyaura coupling reaction, the reaction proceeded in high yield (94%) even without protecting the hydroxyl group, and the target BRD0539 was obtained. This synthetic route can obtain BRD0539 in 69% yield in two steps from compound 3, making it a very efficient synthetic method.
That is, the present inventors have discovered that this reaction can be carried out without protecting the hydroxy group of the starting material, Compound A, throughout all steps of the reaction, and have succeeded in developing a route by which BRD0539 can be easily synthesized in fewer steps.

即ち、本発明は、下式(化1)

Figure 0007636788000005
で表される化合物BRD0539を合成する方法であって、
(i)第1段階:下式(化2)に示すように、溶液中に下記化合物Aを用意し、該化合物Aのアミノ基の保護基Xを脱保護した後、アミン類の存在下で下記化合物Aにp-トルエンスルホニルクロライド(TsCl)又はp-トルエンスルホン酸無水物を反応させて、化合物Bを合成する段階、及び
Figure 0007636788000006
(式中、Xはアミノ基の保護基、Yはハロゲン原子又はトリフラート(TfO)を表す。以下同じ。)
(ii)第2段階:下式(化3)に示すように、溶液中で、該化合物Bに2-フルオロフェニルボロン酸若しくはそのエステル又は2-フルオロフェニルトリフルオロボレート塩を反応させて、化合物BRD0539を合成する段階、
Figure 0007636788000007
から成る方法である。 That is, the present invention provides a compound represented by the following formula (Chemical Formula 1):
Figure 0007636788000005
A method for synthesizing a compound represented by the formula:
(i) First step: as shown in the following formula (Chemical Formula 2), a step of preparing the following compound A in a solution, deprotecting a protecting group X of an amino group of the compound A, and then reacting the following compound A with p-toluenesulfonyl chloride (TsCl) or p-toluenesulfonic anhydride in the presence of amines to synthesize a compound B;
Figure 0007636788000006
(In the formula, X represents a protecting group for an amino group, and Y represents a halogen atom or triflate (TfO). The same applies below.)
(ii) second step: reacting compound B with 2-fluorophenylboronic acid or its ester, or 2-fluorophenyltrifluoroborate salt in a solution to synthesize compound BRD0539, as shown in the following formula (chemical formula 3);
Figure 0007636788000007
The method consists of the following.

本発明は、低分子化合物BRD0539を合成する方法であって、以下に説明する2段階から成る。 The present invention is a method for synthesizing the small molecule compound BRD0539, which consists of two steps as described below.

(i)第1段階:
(a)まず下記化合物Aの溶液を用意する。この化合物Aは下式(化7)で表される。

Figure 0007636788000008
式中、Xはアミノ基の保護基を表す。 (i) First Stage:
(a) First, a solution of the following compound A is prepared. This compound A is represented by the following formula (Chemical Formula 7).
Figure 0007636788000008
In the formula, X represents an amino-protecting group.

下記に、このアミノ基の保護基の例とその脱保護方法を挙げる。ただし、本発明の化合物Aのアミノ基の保護基としては、これらに限定される必要はない。
(a) 9-フルオレニルメチルオキシカルボニル(Fmoc)基 -- フッ化テトラブチルアンモニウム(TBAF)、ピペリジンなどのアミンや塩基により処理することにより脱保護できる。
(b) tert-ブトキシカルボニル(Boc)基 -- トリフルオロ酢酸や塩酸-酢酸エチル溶液などの強酸性条件下で脱保護できる。
(c) ベンジルオキシカルボニル(Cbz)基 -- パラジウムを触媒とした水素添加反応、バーチ還元などで脱離できる。
(d) 2-ニトロベンゼンスルホニル(Ns)基 -- 塩基性条件下チオールを作用させることで脱保護できる。
(e) 2,2,2-トリクロロエトキシカルボニル(Troc)基 -- 亜鉛粉末-酢酸などを作用させることで脱保護できる。
(f) アリルオキシカルボニル(Alloc)基 -- パラジウム触媒存在下、アミンなどを加えて脱保護できる。
(g) トリフルオロアセチル(CF3CO-)基 -- 水酸化ナトリウム水溶液などの処理により脱離できる。
(h) p-トルエンスルホニル(Ts)基 -- バーチ還元などにより脱離できる。
(i) 2-(トリメチルシリル)エトキシカルボニル(Teoc)基 -- フッ化テトラブチルアンモニウム(TBAF)などの含フッ素化合物(フッ化物イオン)により処理することにより脱保護できる。
Examples of the protecting group for the amino group and the method for deprotecting the same are given below, however, the protecting group for the amino group of compound A of the present invention is not necessarily limited to these.
(a) 9-Fluorenylmethyloxycarbonyl (Fmoc) group - can be deprotected by treatment with amines such as tetrabutylammonium fluoride (TBAF) or piperidine or a base.
(b) tert-butoxycarbonyl (Boc) group - can be deprotected under strong acidic conditions such as trifluoroacetic acid or hydrochloric acid-ethyl acetate solution.
(c) Benzyloxycarbonyl (Cbz) group - can be removed by palladium-catalyzed hydrogenation or Birch reduction.
(d) 2-Nitrobenzenesulfonyl (Ns) group - can be deprotected by the action of a thiol under basic conditions.
(e) 2,2,2-trichloroethoxycarbonyl (Troc) group - can be deprotected by treatment with zinc powder and acetic acid, etc.
(f) Allyloxycarbonyl (Alloc) group: This can be deprotected by adding an amine in the presence of a palladium catalyst.
(g) Trifluoroacetyl (CF 3 CO-) group -- can be removed by treatment with an aqueous solution of sodium hydroxide, etc.
(h) p-Toluenesulfonyl (Ts) group - can be removed by Birch reduction, etc.
(i) 2-(trimethylsilyl)ethoxycarbonyl (Teoc) group -- can be deprotected by treatment with a fluorine-containing compound (fluoride ion) such as tetrabutylammonium fluoride (TBAF).

本発明で用いる場合、これらの中で、9-フルオレニルメチルオキシカルボニル(Fmoc)基、tert-ブトキシカルボニル(Boc)基、ベンジルオキシカルボニル(Cbz)基、2-ニトロベンゼンスルホニル(ノシル)(Ns)基が好ましい。
また上式中、Yはハロゲン原子又はトリフラート(TfO)を表す。
溶液の溶媒としては、THFやジオキサンなどのエーテル系の有機溶媒が好ましい。
反応溶液中の化合物Aの濃度は、好ましくは、約10 mM~500 mMである。
Of these, 9-fluorenylmethyloxycarbonyl (Fmoc) group, tert-butoxycarbonyl (Boc) group, benzyloxycarbonyl (Cbz) group, and 2-nitrobenzenesulfonyl (nosyl) (Ns) group are preferred for use in the present invention.
In the above formula, Y represents a halogen atom or triflate (TfO).
As the solvent for the solution, an ether-based organic solvent such as THF or dioxane is preferable.
The concentration of Compound A in the reaction solution is preferably about 10 mM to 500 mM.

(b)次に、この化合物Aのアミノ基の保護基Xを脱保護する。適切な脱保護方法は保護基により異なり、その方法は上記に挙げた。例えば、実施例で用いたFmoc基をTBAFを用いて脱保護する場合のTBAFの濃度は約0.01mM~1M程度である。
なお、この脱保護は、通常温度0~60℃で1~数時間程度で完了するが、次の反応に進む前に、この脱保護が進んだことを確認することが好ましい。具体的には、例えば、薄層クロマトグラフィー(TLC)により、UVランプ照射や発色剤などを用いて、原料の消失を確認する。この脱保護の程度は、完全に原料が消失することが好ましいが、完全でなくともほとんどの原料が消失する程度でもよい。
(b) Next, the protecting group X of the amino group of this compound A is deprotected. The appropriate deprotection method varies depending on the protecting group, and the method is described above. For example, when the Fmoc group used in the examples is deprotected using TBAF, the concentration of TBAF is about 0.01 mM to 1 M.
This deprotection is usually completed within 1 to several hours at a temperature of 0 to 60°C, but it is preferable to confirm that this deprotection has progressed before proceeding to the next reaction. Specifically, for example, the disappearance of the raw materials is confirmed by thin layer chromatography (TLC) using UV lamp irradiation or a color developer. It is preferable that this deprotection is completed to the extent that the raw materials are completely disappeared, but it is also acceptable if the deprotection is completed to the extent that most of the raw materials are disappeared.

(c)次に、脱保護されたアミノ基を有する化合物Aのそのままの反応液に、アミン類の存在下でp-トルエンスルホニルクロライド(TsCl)又はp-トルエンスルホン酸無水物を加えて、トシル化(スルホンアミド化)する。
このアミン類としては、ピリジン、トリエチルアミン、ジイソプロピルエチルアミン、イミダゾール、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン(DBU)、1,4-ジアザビシクロ[2.2.2]オクタン(DABCO)などを使用できる。
この反応は通常0~60℃程度、好ましくは室温で行い、反応時間は数時間~数日程度である。圧は一般的には常圧である。この他の反応条件として、無水条件(アルゴンや窒素雰囲気下、塩化カルシウム管を取り付ける、など)が好ましい。
用いるアミン類、TsCl、p-トルエンスルホン酸無水物の反応液中の濃度は、それぞれ約10 mM~10 M程度、好ましくは約10 mM~500 mM程度である。
(c) Next, p-toluenesulfonyl chloride (TsCl) or p-toluenesulfonic anhydride is added to the reaction solution of Compound A having the deprotected amino group in the presence of amines to perform tosylation (sulfonamidation).
Examples of the amines that can be used include pyridine, triethylamine, diisopropylethylamine, imidazole, 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU), and 1,4-diazabicyclo[2.2.2]octane (DABCO).
This reaction is usually carried out at about 0 to 60°C, preferably at room temperature, and the reaction time is about several hours to several days. The pressure is generally normal pressure. Other preferable reaction conditions include anhydrous conditions (under an argon or nitrogen atmosphere, with a calcium chloride tube attached, etc.).
The concentrations of the amines, TsCl, and p-toluenesulfonic anhydride used in the reaction solution are each about 10 mM to 10 M, preferably about 10 mM to 500 mM.

その結果、下式で表される化合物Bが生成する。

Figure 0007636788000009
As a result, compound B represented by the following formula is produced.
Figure 0007636788000009

(ii)第2段階:
この段階では、溶液中で、化合物Bに2-フルオロフェニルボロン酸若しくはそのエステル又は2-フルオロフェニルトリフルオロボレート塩を反応させる。この反応は、いわゆる鈴木・宮浦カップリングであり、通常パラジウム触媒と塩基を用いる。反応条件は鈴木・宮浦カップリングの通常の条件を用いることができる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、トリス(ジベンジリデンアセトン)ジパラジウム、パラジウムカーボン、酢酸パラジウム、[1,1'-ビス(ジフェニルホスフィノ)フェロセン]二塩化パラジウム、ジクロロビス(トリシクロヘキシルホスフィン)パラジウム、クロロ(2-ジシクロヘキシルホスフィノ-2',4',6'-トリイソプロピル-1,1'-ビフェニル)[2-(2'-アミノ-1,1'-ビフェニル)]パラジウム(II)などが挙げられるが、これらに限定されない。また、パラジウム触媒の代わりに、[1,1′-ビス(ジフェニルホスフィノ)フェロセン]ジクロロニッケル、塩化ニッケル、ビス(1,5-シクロオクタジエン)ニッケルなどのニッケル触媒を使用することもできる。塩基としては、例えば、ナトリウムメトキシド、炭酸水素ナトリウム、炭酸カリウム、炭酸ナトリウム、水酸化ナトリウム、フッ化セシウム、水酸化タリウム、リン酸三カリウム水和物などが用いられるがこれに限定されない。反応液中の塩基と触媒の濃度は、それぞれ、10 mM~500 mM程度である。
溶媒としては、THFなどのエーテル系の有機溶媒のほか水を用いることもできる。
(ii) Second Stage:
In this step, compound B is reacted with 2-fluorophenylboronic acid or its ester, or 2-fluorophenyl trifluoroborate salt in a solution. This reaction is the so-called Suzuki-Miyaura coupling, and usually uses a palladium catalyst and a base. The reaction conditions can be the usual conditions for Suzuki-Miyaura coupling. Palladium catalysts include, but are not limited to, tetrakis(triphenylphosphine)palladium, tris(dibenzylideneacetone)dipalladium, palladium on carbon, palladium acetate, [1,1'-bis(diphenylphosphino)ferrocene]palladium dichloride, dichlorobis(tricyclohexylphosphine)palladium, and chloro(2-dicyclohexylphosphino-2',4',6'-triisopropyl-1,1'-biphenyl)[2-(2'-amino-1,1'-biphenyl)]palladium(II). Also, instead of the palladium catalyst, a nickel catalyst such as [1,1'-bis(diphenylphosphino)ferrocene]dichloronickel, nickel chloride, or bis(1,5-cyclooctadiene)nickel can be used. Examples of the base that can be used include, but are not limited to, sodium methoxide, sodium bicarbonate, potassium carbonate, sodium carbonate, sodium hydroxide, cesium fluoride, thallium hydroxide, and tripotassium phosphate hydrate. The concentrations of the base and catalyst in the reaction solution are each about 10 mM to 500 mM.
As the solvent, an ether-based organic solvent such as THF, as well as water can be used.

反応溶液中の化合物Bの濃度は、好ましくは、約10 mM~500 mMである。
反応物としては、2-フルオロフェニルボロン酸若しくはそのエステル又は2-フルオロフェニルトリフルオロボレート塩が用いられる。このエステルとしては、ピナコールエステル(pin)、トリメチレングリコールエステル、ジイソプロピルエステル、カテコールエステル、ネオペンチルグリコールエステルなど、2-フルオロフェニルトリフルオロボレート塩としては、そのカリウム塩、そのテトラブチルアンモニウム塩などが挙げられるが、これらに限定されない。反応溶液中のこれらの反応物の濃度は10 mM~500 mM程度である。
この反応は通常0~60℃程度、好ましくは室温で行い、反応時間は数時間~数日程度である。圧は一般的には常圧である。この他の反応条件として、無水条件(アルゴンや窒素雰囲気下、塩化カルシウム管を取り付ける、など)が好ましい。
その結果、低分子化合物BRD0539が得られる。
The concentration of compound B in the reaction solution is preferably about 10 mM to 500 mM.
As the reactant, 2-fluorophenylboronic acid or its ester, or 2-fluorophenyltrifluoroborate salt is used. Examples of the ester include pinacol ester (pin), trimethylene glycol ester, diisopropyl ester, catechol ester, neopentyl glycol ester, etc., and examples of the 2-fluorophenyltrifluoroborate salt include, but are not limited to, its potassium salt and its tetrabutylammonium salt. The concentration of these reactants in the reaction solution is about 10 mM to 500 mM.
This reaction is usually carried out at about 0 to 60°C, preferably at room temperature, and the reaction time is about several hours to several days. The pressure is generally normal pressure. Other preferable reaction conditions include anhydrous conditions (under an argon or nitrogen atmosphere, with a calcium chloride tube attached, etc.).
The result is the small molecule compound BRD0539.

これら第1段階と第2段階を以下のいずれかの方法で行ってもよい。
(1)第1段階の反応生成物である化合物Bを抽出して精製したのちに、別途この化合物Bを用いて第2段階を進める。
(2)第1段階の反応生成物である化合物Bを抽出せずにそのまま第2段階を行う。
These first and second steps may be carried out in any of the following ways.
(1) After extracting and purifying the compound B, which is the reaction product of the first step, the second step is carried out separately using this compound B.
(2) The second step is carried out without extracting the compound B, which is the reaction product of the first step.

以下、実施例にて本発明を例証するが本発明を限定することを意図するものではない。
以下の実施例中、融点はYanaco MP-500Pで測定した未補正の値である。NMRスペクトルはJEOL ECX 400分光計で測定した(1H-NMR : 399.8 MHz, 13C-NMR : 100.5 MHz)。1H及び13C NMRスペクトルの化学シフトの報告値は、内部標準物質テトラメチルシラン (δH = 0) あるいは溶媒のシグナル (CDCl3 δC = 77.0) を基準として報告した。IRスペクトルはFT IR分光計(島津製作所製 Prestige-21)にて測定した。旋光度はRudolph Research Analytical社のAUTOPOL 4Tにて測定し、比旋光度の値を10-1 deg cm2 g-1の単位で報告した。HRMS(高分解能質量スペクトル)は質量分析装置(アジレント・テクノロジー株式会社製6530C qTOF)ESIポジティブモードにて測定した。フラッシュカラムクロマトグラフィー/シリカゲルカラムクロマトグラフィーは全て関東化学のシリカゲル60N (spherical, neutral, 40-50 mm)を用いて行った。薄層クロマトグラフィーには Merck Kieselgel 60 F254を用いた。
The present invention will be illustrated by the following examples, but is not intended to limit the present invention.
In the following examples, melting points are uncorrected values measured on a Yanaco MP-500P. NMR spectra were measured on a JEOL ECX 400 spectrometer ( 1H -NMR: 399.8 MHz, 13C -NMR: 100.5 MHz). Reported chemical shifts for 1H and 13C NMR spectra were reported relative to the internal standard tetramethylsilane ( δH = 0) or the solvent signal ( CDCl3 δC = 77.0). IR spectra were measured on a Shimadzu Prestige-21 FT IR spectrometer. Optical rotations were measured on a Rudolph Research Analytical AUTOPOL 4T, and specific rotations were reported in units of 10-1 deg cm2 g -1 . HRMS (high resolution mass spectra) were measured on a mass spectrometer (Agilent Technologies 6530C qTOF) in ESI positive mode. Flash column chromatography and silica gel column chromatography were all performed using Kanto Chemical silica gel 60N (spherical, neutral, 40-50 mm). Merck Kieselgel 60 F254 was used for thin-layer chromatography.

製造例1
本製造例では、(3aR,4R,9bR)-1-((9H-fluoren-9-yl)methyl) 4-ethyl 8-bromo-3,3a,4,5-tetrahydro-1H-pyrrolo[3,2-c]quinoline-1,4(2H,9bH)-dicarboxylate (化合物2)を合成した。本製造例の反応式を以下に示す。

Figure 0007636788000010
アルゴン雰囲気下、無水硫酸マグネシウム (0.312 g) に2-オキソ酢酸エチル(東京化成工業株式会社製) (47 %トルエン溶液, 1.37 g, 5.53 mmol) を加え0℃に冷却した。4-ブロモアニリン(東京化成工業株式会社製) (0.793 g, 4.61 mmol) の無水トルエン(富士フイルム和光純薬株式会社製)(9.5 mL) 溶液をシリンジポンプで30分かけて加え、0 ℃で1 時間攪拌した。反応液を吸引ろ過、減圧濃縮することで中間体イミン(化合物1)を得た。これにトルエンを加え留去した(共沸によって水を除去)後、続く反応を行った。アルゴン雰囲気下、化合物1を無水トルエン (27.3 mL) に溶解し、キラル尿素触媒 (R)-N-[(1R,2R)-2-(3-(3,5-ビス(トリフルオロメチル)フェニル)ウレイド)シクロヘキシル]-tert-ブチル-スルフィンアミド(Sigma-Aldrich社製) (0.0871 mg, 0.184 mmol) と粉末状の5Åモレキュラーシーブス (0.0792 g)、(9H-フルオレン-9-イル)メチル 2,3-ジヒドロ-1H-ピロール-1-カルボキシレート(自作)(1.65 g, 5.94 mmol) の無水トルエン (9.5 mL) 溶液を加え、室温で5分攪拌した。反応液を-65℃に冷却した後、無水のp-トルエンスルホン酸 (0.0158 g, 0.0917 mmol) の無水THF(富士フイルム和光純薬株式会社製) (200 μL) 溶液を少量ずつ加え-65℃で1時間攪拌した。反応液を減圧濃縮することにより反応を終了させ粗生成物を得た。粗生成物をフラッシュカラムクロマトグラフィー(ヘキサン : EtOAc = 1 : 1, シリカゲル 407 g)により精製し、化合物2 (1.78 g, 収率70 %) を得た。 Production Example 1
In this example, (3aR,4R,9bR)-1-((9H-fluoren-9-yl)methyl) 4-ethyl 8-bromo-3,3a,4,5-tetrahydro-1H-pyrrolo[3,2-c]quinoline-1,4(2H,9bH)-dicarboxylate (compound 2) was synthesized. The reaction scheme of this example is shown below.
Figure 0007636788000010
Under an argon atmosphere, ethyl 2-oxoacetate (Tokyo Chemical Industry Co., Ltd.) (47% toluene solution, 1.37 g, 5.53 mmol) was added to anhydrous magnesium sulfate (0.312 g) and cooled to 0°C. A solution of 4-bromoaniline (Tokyo Chemical Industry Co., Ltd.) (0.793 g, 4.61 mmol) in anhydrous toluene (Fujifilm Wako Pure Chemical Industries, Ltd.) (9.5 mL) was added over 30 minutes using a syringe pump, and the mixture was stirred at 0°C for 1 hour. The reaction solution was suction filtered and concentrated under reduced pressure to obtain an intermediate imine (compound 1). Toluene was added and distilled off (water was removed by azeotropy), and the subsequent reaction was carried out. Under an argon atmosphere, compound 1 was dissolved in anhydrous toluene (27.3 mL), and the chiral urea catalyst (R)-N-[(1R,2R)-2-(3-(3,5-bis(trifluoromethyl)phenyl)ureido)cyclohexyl]-tert-butyl-sulfinamide (Sigma-Aldrich) (0.0871 mg, 0.184 mmol), powdered 5 Å molecular sieves (0.0792 g), and a solution of (9H-fluoren-9-yl)methyl 2,3-dihydro-1H-pyrrole-1-carboxylate (self-made) (1.65 g, 5.94 mmol) in anhydrous toluene (9.5 mL) were added, followed by stirring at room temperature for 5 min. After cooling the reaction solution to -65°C, a solution of anhydrous p-toluenesulfonic acid (0.0158 g, 0.0917 mmol) in anhydrous THF (FUJIFILM Wako Pure Chemical Industries, Ltd.) (200 μL) was added in small portions and stirred at -65°C for 1 hour. The reaction was terminated by concentrating the reaction solution under reduced pressure to obtain a crude product. The crude product was purified by flash column chromatography (hexane: EtOAc = 1:1, silica gel 407 g) to obtain compound 2 (1.78 g, 70% yield).

製造例2
本製造例では、化合物2 から(3aR,4R,9bR)-(9H-fluoren-9-yl)methyl 8-bromo-4-(hydroxymethyl)-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinoline-1-carboxylate (化合物3)を合成した。本製造例の反応式を以下に示す。

Figure 0007636788000011
アルゴン雰囲気下、製造例1で得た化合物2 (2.12 g, 3.88 mmol) を無水THF(富士フイルム和光純薬株式会社製)(39 mL) に溶解し0℃に冷却した後、LiBH4 in THF(関東化学株式会社製)(2.0 M, 2.9 mL, 5.8 mmol) を加え室温までゆっくりと温度を上げ、室温で3時間攪拌した。sat. NH4Cl aq. (ca. 20 mL) を加え反応を終了させEtOAc (ca. 15 mL) で2回抽出した。抽出した有機層を飽和食塩水 (ca. 20 mL) で洗い、MgSO4で乾燥させた後、吸引ろ過、減圧濃縮することで粗生成物を得た。粗生成物をフラッシュカラムクロマトグラフィー(ヘキサン : EtOAc = 1 : 1, シリカゲル 407 g) により精製し、化合物3 (1.19 g, 82 % e.e, 収率74 %) を得た。これらはベンゼン : CH2Cl2 = 9 : 1によって二回再結晶を行うことで99 % e.eの化合物3 (0.996 g) を得た。(Chiral OJ-H column, MeOH : EtOH = 1 : 1, 1.0 mL/min, 210 nm; 保持時間 : timemajor = 6.64 and timeminor = 5.91 min.)
化合物3: mp 107.8~110.1℃; [α]D20.0 +135.6°(c 0.980, CHCl3); 1H-NMR (399.8 MHz, CDCl3): δ = 7.77 (d, 1 H, J = 7.3 Hz), 7.71 (d, 1 H, J = 1.8 Hz), 7.67-7.59 (m, 2 H), 7.47-7.37 (m, 3 H), 7.36-7.28 (m, 2 H), 7.10 (dd, 1 H, J = 2.3, 8.7 Hz), 6.40 (d, 1 H, J = 8.7 Hz), 5.25 (d, 0.7 H, J = 7.3 Hz), 5.09 (d, 0.3 H, J = 6.7 Hz), 4.57-4.46 (m, 1 H) 4.46-4.37 (m, 1 H), 4.37-4.18 (m, 2 H), 3.84-3.72 (m, 1 H), 3.71-3.50 (m, 2 H), 3.50-3.34 (m, 1 H) , 2.41-2.29 (m, 1 H), 2.01 (quin, 1 H, J = 11.1 Hz),1.94-1.75 (m, 2 H), 1.64 (s, 1 H) ppm; 13C-NMR (100.5 MHz, CDCl3): δ = 156.6, 143.9,143.9, 142.1, 141.3, 132.6, 131.1, 130.9, 127.7, 127.3, 127.0, 125.0, 125.0, 124.8, 124.2, 119.9, 116.2, 110.1, 67.8, 67.5, 65.0, 56.4, 56.2, 52.7, 52.4, 47.3, 47.2, 45.1, 38.9, 38.4, 34.9, 22.6, 21.6; Anal. Calcd for C27H25BrN2O3: C, 64.16; H, 4.49; N, 5.54. HRMS (ESI+) Calcd for C27H25BrN2O3 [M+H]+: 505.1127, found: 505.1126. Production Example 2
In this preparation example, (3aR,4R,9bR)-(9H-fluoren-9-yl)methyl 8-bromo-4-(hydroxymethyl)-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinoline-1-carboxylate (compound 3) was synthesized from compound 2. The reaction scheme of this preparation example is shown below.
Figure 0007636788000011
Under an argon atmosphere, compound 2 (2.12 g, 3.88 mmol) obtained in Preparation Example 1 was dissolved in anhydrous THF (FUJIFILM Wako Pure Chemical Co., Ltd.) (39 mL) and cooled to 0°C. LiBH4 in THF (Kanto Chemical Co., Ltd.) (2.0 M, 2.9 mL, 5.8 mmol) was added, the temperature was slowly raised to room temperature, and the mixture was stirred at room temperature for 3 hours. The reaction was terminated by adding sat. NH4Cl aq. (ca. 20 mL), and the mixture was extracted twice with EtOAc (ca. 15 mL). The extracted organic layer was washed with saturated saline (ca. 20 mL), dried over MgSO4 , filtered by suction, and concentrated under reduced pressure to obtain a crude product. The crude product was purified by flash column chromatography (hexane: EtOAc = 1:1, silica gel 407 g) to obtain compound 3 (1.19 g, 82% ee, 74% yield). These were recrystallized twice from benzene:CH 2 Cl 2 = 9:1 to give compound 3 (0.996 g) with 99% ee. (Chiral OJ-H column, MeOH:EtOH = 1:1, 1.0 mL/min, 210 nm; retention time: timemajor = 6.64 and timeminor = 5.91 min.)
Compound 3: mp 107.8~110.1℃; [α]D20.0 +135.6°(c 0.980, CHCl 3 ); 1 H-NMR (399.8 MHz, CDCl 3 ): δ = 7.77 (d, 1 H, J = 7.3 Hz), 7.71 (d, 1 H, J = 1.8 Hz), 7.67-7.59 (m, 2 H), 7.47-7.37 (m, 3 H), 7.36-7.28 (m, 2 H), 7.10 (dd, 1 H, J = 2.3, 8.7 Hz), 6.40 (d, 1 H, J = 8.7 Hz), 5.25 (d, 0.7 H, J = 7.3 Hz), 5.09 (d, 0.3 H, J = 6.7 Hz), 4.57-4.46 (m, 1 H) 4.46-4.37 (m, 1 H), 4.37-4.18 (m, 2 H), 3.84-3.72 (m, 1 H), 3.71-3.50 (m, 2 H), 3.50-3.34 13C - NMR (100.5 MHz , CDCl 3 ): δ = 156.6, 143.9,143.9, 142.1, 141.3, 132.6, 131.1, 130.9, 127.7, 127.3, 127.0, 125.0, 125.0, 124.8, 124.2, 119.9, 116.2, 110.1, 67.8, 67.5, 65.0, 56.4, 56.2, 52.7, 52.4, 47.3, 47.2, 45.1, 38.9, 38.4, 34.9, 22.6, 21.6; Calcd for C 27 H 25 BrN 2 O 3 : C, 64.16; H, 4.49; N, 5.54. HRMS (ESI+) Calcd for C 27 H 25 BrN 2 O 3 [M+H]+: 505.1127, found: 505.1126.

実施例1
本実施例では、化合物3から2段階でBRD0539を合成した。本実施例の反応式を以下に示す。

Figure 0007636788000012
Example 1
In this example, BRD0539 was synthesized in two steps from compound 3. The reaction scheme of this example is shown below.
Figure 0007636788000012

第1段階:化合物3から((3aR,4R,9bR)-8-bromo-1-tosyl-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinolin-4-yl)methanol(化合物7)を合成した。
アルゴン雰囲気下、製造例2で得た化合物3 (1.08 g, 2.14 mmol) を無水THF(富士フイルム和光純薬株式会社製)(79.3 mL)に溶解し、TBAF in THF(Sigma-Aldrich社製)(1.0 M, 4.3 mL, 4.3 mmol) を加え、室温で2時間攪拌した。TLCにより原料の消失を確認した後、脱水ピリジン(関東化学株式会社製)(13.7 mL) を加えた後、0℃に冷却しTsCl(p-トルエンスルホニルクロリド(又はトシルクロリドともいう)/東京化成工業株式会社製)(0.612 g, 3.21 mmol) を加え室温で3時間攪拌した。その後、TsCl (0.312 g, 1.63 mmol) を追加した後15時間、さらにTsCl (0.502 g, 2.63 mmol) を加え2時間攪拌した後、水 (ca. 100 mL) を加え反応を停止、しばらく撹拌した後、CH2Cl2 (ca. 30 mL) で3回抽出した。抽出した有機層を飽和食塩水 (ca. 100 mL) で洗い、MgSO4で乾燥させた後、吸引ろ過、減圧濃縮することで粗生成物を得た。この粗生成物をフラッシュカラムクロマトグラフィー (ヘキサン : EtOAc = 1 : 3, シリカゲル 407 g) により精製し、化合物7 (0.683 g, 収率73 %) を得た。分析用サンプルは再結晶(EtOAc)によって得た。
化合物7: mp 207.2~208.5℃; [α]D20.0 +103°(c 1.07, CHCl3); 1H-NMR (CDCl3/TMS): δ = 7.82 (s, 1 H), 7.78 (d, 2 H, J = 8.2 Hz), 7.36 (d, 2 H, J = 7.8 Hz), 7.12 (d, 1 H, J = 8.7 Hz), 6.39 (dd, 1 H, J = 1.1, 8.7 Hz), 5.00 (d, 1 H, J = 7.3 Hz), 4.19 (brs, 1 H), 3.63 (d, 1 H, J = 7.3 Hz), 3.55-3.44 (m, 2 H), 3.34-3.36 (m, 1 H), 2.46 (s, 3 H), 1.92 (quin, 1 H, J = 9.7 Hz), 1.77-1.63 (m, 2 H) ppm; 13C-NMR (CDCl3/TMS): δ = 143.8, 143.2, 135.0, 133.4, 131.1, 129.9, 127.6, 122.4, 116.2, 110.5, 65.0, 58.9, 52.5, 47.2, 38.3, 23.1, 21.6; Anal. Calcd for C19H21BrN2O3S: C, 52.18; H, 4.89; N, 6.41. Found: C, 52.04; H, 4.82; N, 6.31 %.
Step 1: ((3aR,4R,9bR)-8-bromo-1-tosyl-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinolin-4-yl)methanol (compound 7) was synthesized from compound 3.
Under an argon atmosphere, compound 3 (1.08 g, 2.14 mmol) obtained in Production Example 2 was dissolved in anhydrous THF (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) (79.3 mL), TBAF in THF (manufactured by Sigma-Aldrich Co., Ltd.) (1.0 M, 4.3 mL, 4.3 mmol) was added, and the mixture was stirred at room temperature for 2 hours. After confirming the disappearance of the raw materials by TLC, dehydrated pyridine (manufactured by Kanto Chemical Co., Ltd.) (13.7 mL) was added, and the mixture was cooled to 0°C, and TsCl (p-toluenesulfonyl chloride (also called tosyl chloride)/manufactured by Tokyo Chemical Industry Co., Ltd.) (0.612 g, 3.21 mmol) was added, and the mixture was stirred at room temperature for 3 hours. After that, TsCl (0.312 g, 1.63 mmol) was added and stirred for 15 hours, and then TsCl (0.502 g, 2.63 mmol) was added and stirred for 2 hours, after which water (ca. 100 mL) was added to stop the reaction, and after stirring for a while, the mixture was extracted three times with CH 2 Cl 2 (ca. 30 mL). The extracted organic layer was washed with saturated brine (ca. 100 mL), dried over MgSO 4 , suction filtered, and concentrated under reduced pressure to obtain the crude product. This crude product was purified by flash column chromatography (hexane: EtOAc = 1:3, silica gel 407 g) to obtain compound 7 (0.683 g, 73% yield). A sample for analysis was obtained by recrystallization (EtOAc).
Compound 7: mp 207.2~208.5℃; [α]D20.0 +103°(c 1.07, CHCl 3 ); 1 H-NMR (CDCl 3 /TMS): δ = 7.82 (s, 1 H), 7.78 (d, 2 H, J = 8.2 Hz), 7.36 (d, 2 H, J = 7.8 Hz), 7.12 (d, 1 H, J = 8.7 Hz), 6.39 (dd, 1 H, J = 1.1, 8.7 Hz), 5.00 (d, 1 H, J = 7.3 Hz), 4.19 (brs, 1 H), 3.63 (d, 1 H, J = 7.3 Hz), 3.55-3.44 (m, 2H), 13C -NMR (CDCl 3 /TMS): δ = 143.8, 143.2, 135.0, 133.4, 131.1, 129.9, 127.6 , 122.4, 116.2, 110.5, 65.0, 58.9, 52.5 , 47.2, 38.3 , 23.1, 21.6 ; Anal. 52.18; H, 4.89; N, 6.41. Found: C, 52.04; H, 4.82; N, 6.31 %.

第2段階:化合物7から((3aR,4R,9bR)-8-(2-fluorophenyl)-1-tosyl-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinolin-4-yl)methanol (BRD0539)を合成した。
アルゴン雰囲気下、第1段階で得た化合物7 (0.683 g, 1.56 mmol) をTHF (52.0 mL) に溶解し、蒸溜水 (17.3 mL) を加えたのち、2-フルオロフェニルボロン酸(東京化成工業株式会社製)(0.363 g, 2.34 mmol)、K3PO4・nH2O (リン酸三カリウム水和物76.7 %, 1.12 g, 4.05 mmol)、及びパラジウム触媒(クロロ(2-ジシクロヘキシルホスフィノ-2',4',6'-トリイソプロピル-1,1'-ビフェニル)[2-(2'-アミノ-1,1'-ビフェニル)]パラジウム(II)/Sigma-Aldrich社製X-Phos Pd-G2)(0.0614 g, 0.0781 mmol)を加え室温で3時間攪拌した。反応混合液をEtOAc (ca. 20 mL) で三回抽出し、有機層をNa2SO4で乾燥させた後、吸引ろ過、減圧濃縮することで粗生成物を得た。粗生成物をフラッシュカラムクロマトグラフィー (ヘキサン : EtOAc = 1 : 2, シリカゲル 212 g)により精製し、BRD0539 (0.661 g, 収率94 %) を得た。分析用サンプルは再結晶(MeOH)によって得た。
BRD0539: mp 101.2.0~104.4℃; [α]D20.0 105°(c 0.960, CHCl3); 1H-NMR (CDCl3/TMS): δ = 7.90 (s, 1 H), 7.79 (d, 2 H, J = 7.8 Hz), 7.43 (t, 1 H, J = 7.8 Hz), 7.36-7.27 (m, 3 H), 7.25-7.04 (m, 3 H), 6.56 (d, 1 H, J = 8.2 Hz), 5.09 (d, 1 H, J = 7.3 Hz), 4.28 (brs, 1 H ), 3.62 (dd, 3 H, J =2.3, 9.2 Hz), 3.58-3.42 (m, 2 H), 3.42-3.25 (m, 2 H), 2.43 (s, 3 H), 1.98 (quin, 1 H, J = 10.6 Hz), 1.87-1.73 (m, 1 H), 1.71-1.57, (m, 2 H) ppm; 13C-NMR (CDCl3 / TMS): δ = 159.7 (d, J = 246.4 Hz), 143.6, 142.9, 135.2, 131.3 (d, J = 1.9 Hz),130.4 (d, J = 3.8 Hz), 129.9, 129.0 (d, J = 4.8 Hz), 127.9 (d, J = 7.6 Hz), 127.6, 126.2,124.3 (d, J = 3.8 Hz), 120.5, 116.0, 115.8, 114.5, 65.1, 59.2, 52.6, 47.2, 38.7, 23.2, 21.5; Anal. Calcd for C27H25BrN2O3: C, 66.35; H, 5.57; N, 6.19. Found: C, 66.34; H, 5.73; N, 6.15 %.
Step 2: ((3aR,4R,9bR)-8-(2-fluorophenyl)-1-tosyl-2,3,3a,4,5,9b-hexahydro-1H-pyrrolo[3,2-c]quinolin-4-yl)methanol (BRD0539) was synthesized from compound 7.
Under an argon atmosphere, compound 7 (0.683 g, 1.56 mmol) obtained in the first step was dissolved in THF (52.0 mL) and distilled water (17.3 mL) was added. Then, 2-fluorophenylboronic acid (Tokyo Chemical Industry Co., Ltd.) (0.363 g, 2.34 mmol), K 3 PO 4 · nH 2 O (tripotassium phosphate hydrate 76.7%, 1.12 g, 4.05 mmol), and palladium catalyst (chloro(2-dicyclohexylphosphino-2',4',6'-triisopropyl-1,1'-biphenyl) [2-(2'-amino-1,1'-biphenyl)] palladium (II) / Sigma-Aldrich X-Phos Pd-G2) (0.0614 g, 0.0781 mmol) were added and the mixture was stirred at room temperature for 3 hours. The reaction mixture was extracted three times with EtOAc (ca. 20 mL), and the organic layer was dried over Na2SO4 , filtered, and concentrated under reduced pressure to obtain the crude product. The crude product was purified by flash column chromatography (hexane: EtOAc = 1:2, silica gel 212 g) to give BRD0539 (0.661 g, 94% yield). An analytical sample was obtained by recrystallization (MeOH).
BRD0539: mp 101.2.0~104.4℃; [α]D20.0 105°(c 0.960, CHCl 3 ); 1 H-NMR (CDCl 3 /TMS): δ = 7.90 (s, 1 H), 7.79 (d, 2 H, J = 7.8 Hz), 7.43 (t, 1 H, J = 7.8 Hz), 7.36-7.27 (m, 3 H), 7.25-7.04 (m, 3 H), 6.56 (d, 1 H, J = 8.2 Hz), 5.09 (d, 1 H, J = 7.3 Hz), 4.28 (brs, 1 H ), 3.62 (dd, 3 H, J =2.3, 9.2 Hz), 3.58-3.42 (m, 2 H), 3.42-3.25 (m, 2 H), 2.43 (s, 3 H), 1.98 (quin, 1 H, J = 10.6 Hz), 1.87-1.73 (m, 1 H), 1.71-1.57, (m, 2 H) ppm; 13 C-NMR (CDCl 3 / TMS): δ = 159.7 (d, J = 246.4 Hz), 143.6, 142.9, 135.2, 131.3 (d, J = 1.9 Hz),130.4 (d, J = 3.8 Hz), 129.9, 129.0 (d, J = 4.8 Hz), 127.9 (d, J = 7.6 Hz), Anal. Calcd for C 27 H 25 BrN 2 O 3 : C, 66.35; H, 5.57; N, 6.19. Found: C, 66.34; H, 5.73; N, 6.15 %.

Claims (3)

下式(化1)
Figure 0007636788000013
で表される化合物BRD0539を合成する方法であって、
(i)第1段階:下式(化2)に示すように、溶液中に下記化合物Aを用意し、該化合物Aのアミノ基の保護基Xを脱保護した後、アミン類の存在下で下記化合物Aにp-トルエンスルホニルクロライド(TsCl)又はp-トルエンスルホン酸無水物を反応させて、化合物Bを合成する段階、及び
Figure 0007636788000014
(式中、Xはアミノ基の保護基、Yはハロゲン原子又はトリフラート(TfO)を表す。以下同じ。)
(ii)第2段階:下式(化3)に示すように、溶液中で、該化合物Bに2-フルオロフェニルボロン酸若しくはそのエステル又は2-フルオロフェニルトリフルオロボレート塩を反応させて、化合物BRD0539を合成する段階、
Figure 0007636788000015
から成る方法。
The following formula (Chemical Formula 1)
Figure 0007636788000013
A method for synthesizing a compound represented by the formula:
(i) First step: as shown in the following formula (Chemical Formula 2), a step of preparing the following compound A in a solution, deprotecting a protecting group X of an amino group of the compound A, and then reacting the following compound A with p-toluenesulfonyl chloride (TsCl) or p-toluenesulfonic anhydride in the presence of amines to synthesize a compound B;
Figure 0007636788000014
(In the formula, X represents a protecting group for an amino group, and Y represents a halogen atom or triflate (TfO). The same applies hereinafter.)
(ii) second step: reacting compound B with 2-fluorophenylboronic acid or its ester, or 2-fluorophenyltrifluoroborate salt in a solution to synthesize compound BRD0539, as shown in the following formula (chemical formula 3);
Figure 0007636788000015
The method comprising:
前記第1段階と第2段階を以下のいずれかの方法で行う、請求項1に記載の方法。
(1)第1段階の反応生成物である化合物Bを抽出して精製したのちに、別途この化合物Bを用いて第2段階を進める。
(2)第1段階の反応生成物である化合物Bを抽出せずに第2段階を行う。
2. The method of claim 1, wherein the first and second steps are carried out in one of the following ways:
(1) After extracting and purifying the compound B, which is the reaction product of the first step, the second step is carried out separately using this compound B.
(2) The second step is carried out without extracting compound B, which is the reaction product of the first step.
前記アミノ基の保護基Xが、9-フルオレニルメチルオキシカルボニル(Fmoc)基、tert-ブトキシカルボニル(Boc)基、又はベンジルオキシカルボニル(Cbz)基、2-ニトロベンゼンスルホニル(ノシル)(Ns)基である請求項1又は2に記載の方法。 The method according to claim 1 or 2, wherein the protecting group X of the amino group is a 9-fluorenylmethyloxycarbonyl (Fmoc) group, a tert-butoxycarbonyl (Boc) group, a benzyloxycarbonyl (Cbz) group, or a 2-nitrobenzenesulfonyl (nosyl) (Ns) group.
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Non-Patent Citations (2)

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ACS Combinatorial Science,2012年,Vol.14,pp.621-630
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