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JP7658672B2 - Heat Treatment Equipment - Google Patents
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JP7658672B2 - Heat Treatment Equipment - Google Patents

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JP7658672B2
JP7658672B2 JP2021096161A JP2021096161A JP7658672B2 JP 7658672 B2 JP7658672 B2 JP 7658672B2 JP 2021096161 A JP2021096161 A JP 2021096161A JP 2021096161 A JP2021096161 A JP 2021096161A JP 7658672 B2 JP7658672 B2 JP 7658672B2
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partition members
heat treatment
processing vessel
treatment apparatus
partition
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JP2022187917A (en
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正義 増永
誠 小林
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Tokyo Electron Ltd
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本開示は、熱処理装置に関する。 This disclosure relates to a heat treatment device.

処理容器とその周囲に設けられた加熱手段との間の空間に仕切りを設け、該空間を温度センサが設けられている位置と対応する第1の空間と、該第1の空間を除く第2の空間とに区画する技術が知られている(例えば、特許文献1参照)。 A technique is known in which a partition is provided in the space between the processing vessel and the heating means provided around it, dividing the space into a first space corresponding to the position where the temperature sensor is provided, and a second space excluding the first space (see, for example, Patent Document 1).

特開2020-098808号公報JP 2020-098808 A

本開示は、処理容器内の温度ばらつきを低減できる技術を提供する。 This disclosure provides technology that can reduce temperature variation within a processing vessel.

本開示の一態様による熱処理装置は、筒状の処理容器と、前記処理容器の周囲に空間を隔てて設けられる断熱部材と、前記断熱部材の内周側に設けられる発熱体と、前記空間に設けられる仕切構造体と、を有し、前記仕切構造体は、前記処理容器の長手方向に延在して前記空間を仕切る複数の第1の仕切部材と、前記処理容器の周方向に延在して前記空間を仕切る複数の第2の仕切部材と、を含前記複数の第1の仕切部材は、各々が前記処理容器の長手方向に伸縮自在である A heat treatment apparatus according to one aspect of the present disclosure has a cylindrical processing vessel, an insulating member arranged around the processing vessel with a space therebetween, a heating element arranged on the inner side of the insulating member, and a partition structure arranged in the space, wherein the partition structure includes a plurality of first partition members extending in the longitudinal direction of the processing vessel and dividing the space, and a plurality of second partition members extending in the circumferential direction of the processing vessel and dividing the space, and each of the plurality of first partition members is freely expandable and contractible in the longitudinal direction of the processing vessel .

本開示によれば、処理容器内の温度ばらつきを低減できる。 This disclosure makes it possible to reduce temperature variations within the processing vessel.

第1の実施形態の熱処理装置の一例を示す縦断面図FIG. 1 is a vertical cross-sectional view showing an example of a heat treatment apparatus according to a first embodiment; 図1の横断面図Cross-sectional view of FIG. 図1の仕切構造体を説明するための斜視図FIG. 2 is a perspective view for explaining the partition structure of FIG. 1 ; 第2の実施形態の熱処理装置の一例を示す斜視図(1)FIG. 1 is a perspective view showing an example of a heat treatment apparatus according to a second embodiment; 第2の実施形態の熱処理装置の一例を示す斜視図(2)FIG. 2 is a perspective view showing an example of a heat treatment apparatus according to a second embodiment; 第3の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a third embodiment; 図6の分解斜視図FIG. 7 is an exploded perspective view of FIG. 図6の横仕切部材の変形例を示す斜視図FIG. 7 is a perspective view showing a modification of the horizontal partition member of FIG. 6 . 第4の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a fourth embodiment; 図9の分解斜視図FIG. 10 is an exploded perspective view of FIG. 図9の横仕切部材の変形例を示す図FIG. 10 is a diagram showing a modification of the horizontal partition member of FIG. 9 . 図9の横仕切部材の別の変形例を示す図FIG. 10 is a diagram showing another modified example of the horizontal partition member of FIG. 9 . 第5の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a fifth embodiment; 第6の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a sixth embodiment; 第7の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a seventh embodiment; 図15の分解斜視図FIG. 16 is an exploded perspective view of FIG. 図15の縦仕切部材の変形例を示す図FIG. 16 is a diagram showing a modification of the vertical partition member of FIG. 15 . 図15の縦仕切部材の別の変形例を示す図FIG. 16 is a diagram showing another modified example of the vertical partition member of FIG. 15 . 図15の縦仕切部材の更に別の変形例を示す図FIG. 16 is a diagram showing yet another modified example of the vertical partition member of FIG. 15 . 図15の横仕切部材の変形例を示す図FIG. 16 is a diagram showing a modification of the horizontal partition member of FIG. 15 . 第8の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to an eighth embodiment; 図21の熱処理装置の一例を示す斜視図FIG. 22 is a perspective view showing an example of the heat treatment apparatus of FIG. 21 . 図21の縦仕切部材の変形例を示す斜視図FIG. 22 is a perspective view showing a modification of the vertical partition member of FIG. 21 . 第9の実施形態の熱処理装置の一例を示す斜視図FIG. 13 is a perspective view showing an example of a heat treatment apparatus according to a ninth embodiment; 図24の分解斜視図25 is an exploded perspective view of FIG. 第10の実施形態の熱処理装置の一例を示す斜視図FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a tenth embodiment; 第11の実施形態の熱処理装置の一例を示す斜視図FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to an eleventh embodiment; 第12の実施形態の熱処理装置の一例を示す斜視図FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a twelfth embodiment; 第13の実施形態の熱処理装置の一例を示す斜視図FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a thirteenth embodiment; 第14の実施形態の熱処理装置の一例を示す斜視図FIG. 23 is a perspective view showing an example of a heat treatment apparatus according to a fourteenth embodiment;

以下、添付の図面を参照しながら、本開示の限定的でない例示の実施形態について説明する。添付の全図面中、同一又は対応する部材又は部品については、同一又は対応する参照符号を付し、重複する説明を省略する。 Hereinafter, non-limiting exemplary embodiments of the present disclosure will be described with reference to the attached drawings. In all the attached drawings, the same or corresponding members or parts are denoted by the same or corresponding reference numerals, and duplicate descriptions will be omitted.

〔第1の実施形態〕
図1~図3を参照し、第1の実施形態の熱処理装置1Aの一例について説明する。第1の実施形態の熱処理装置1Aは、複数の基板Wに対して一度に熱処理を行うバッチ式の縦型熱処理装置である。熱処理装置1Aは、処理容器10、ガス供給部30、排気部40、加熱部50、温度センサ60、制御部90等を有する。
First Embodiment
An example of a heat treatment apparatus 1A according to a first embodiment will be described with reference to Figures 1 to 3. The heat treatment apparatus 1A according to the first embodiment is a batch-type vertical heat treatment apparatus that simultaneously performs heat treatment on a plurality of substrates W. The heat treatment apparatus 1A includes a processing vessel 10, a gas supply unit 30, an exhaust unit 40, a heating unit 50, a temperature sensor 60, a control unit 90, and the like.

処理容器10は、内部を減圧可能である。処理容器10は、基板Wを収容する。基板Wは、例えば半導体ウエハである。処理容器10は、内管11、外管12等を含む。内管11は、下端及び上端が開口する筒状を有する。外管12は、下端が開口し、上端が閉塞する有天井の筒状を有する。外管12は、内管11の外側を覆うように配置される。内管11及び外管12は、石英等の耐熱材料により形成されており、同軸状に配置されて二重管構造となっている。内管11及び外管12は、例えばステンレス鋼により形成されたマニホールド13によって、下端が保持されている。マニホールド13は、ベースプレート14に固定されている。ただし、マニホールド13を設けることなく、処理容器10全体を、例えば石英によって形成してもよい。 The processing vessel 10 can reduce the pressure inside. The processing vessel 10 accommodates a substrate W. The substrate W is, for example, a semiconductor wafer. The processing vessel 10 includes an inner tube 11, an outer tube 12, and the like. The inner tube 11 has a cylindrical shape with an open lower end and an open upper end. The outer tube 12 has a cylindrical shape with a ceiling that is open at the lower end and closed at the upper end. The outer tube 12 is arranged to cover the outside of the inner tube 11. The inner tube 11 and the outer tube 12 are made of a heat-resistant material such as quartz, and are arranged coaxially to form a double tube structure. The inner tube 11 and the outer tube 12 are held at their lower ends by a manifold 13 made of, for example, stainless steel. The manifold 13 is fixed to a base plate 14. However, the entire processing vessel 10 may be made of, for example, quartz without providing the manifold 13.

マニホールド13の下端の開口には、例えばステンレス鋼により形成される円盤状の蓋体15が、シール部材16を介して気密封止可能に取り付けられている。蓋体15の略中心部には、例えば磁性流体シール17によって気密状態で回転可能な回転軸18が挿通されている。回転軸18の下端は、回転機構19に接続されている。回転軸18の上端には、例えばステンレス鋼により形成されるテーブル20が固定されている。 A disk-shaped lid 15 made of, for example, stainless steel is attached to the opening at the lower end of the manifold 13 so as to be airtightly sealed via a seal member 16. A rotating shaft 18 that can rotate in an airtight state by, for example, a magnetic fluid seal 17 is inserted into the approximate center of the lid 15. The lower end of the rotating shaft 18 is connected to a rotating mechanism 19. A table 20 made of, for example, stainless steel is fixed to the upper end of the rotating shaft 18.

テーブル20上には、例えば石英により形成される保温筒21が設置されている。保温筒21上には、例えば石英により形成されるボート22が載置されている。 A thermal insulation cylinder 21 made of, for example, quartz is placed on the table 20. A boat 22 made of, for example, quartz is placed on the thermal insulation cylinder 21.

ボート22には、複数(例えば50枚~150枚)の基板Wが、所定の間隔(例えば10mm程度のピッチ)で収容されている。ボート22、保温筒21、テーブル20及び蓋体15は、例えばボートエレベータである昇降機構23により、一体となって、処理容器10内にロード(搬入)され、処理容器10内からアンロード(搬出)される。 The boat 22 contains multiple (e.g., 50 to 150) substrates W at a predetermined interval (e.g., a pitch of about 10 mm). The boat 22, heat-retaining cylinder 21, table 20, and lid 15 are loaded (carried into) and unloaded (carried out) of the processing vessel 10 as a whole by a lifting mechanism 23, e.g., a boat elevator.

ガス供給部30は、処理容器10内に処理ガスを供給する。ガス供給部30は、ガスノズル31、ガス供給系32等を含む。 The gas supply unit 30 supplies a processing gas into the processing vessel 10. The gas supply unit 30 includes a gas nozzle 31, a gas supply system 32, etc.

ガスノズル31は、例えば石英により形成されている。ガスノズル31は、マニホールド13を気密に貫通するように設けられている。ガスノズル31は、基端がガス供給系32に接続され、先端が内管11内に位置する。ガスノズル31は、基端から導入される処理ガスを、先端の開口から内管11内に吐出する。 The gas nozzle 31 is made of, for example, quartz. The gas nozzle 31 is provided so as to pass through the manifold 13 airtightly. The base end of the gas nozzle 31 is connected to the gas supply system 32, and the tip is located inside the inner tube 11. The gas nozzle 31 discharges the process gas introduced from the base end into the inner tube 11 from the opening at the tip.

ガス供給系32は、ガスノズル31の基端に接続されている。ガス供給系32は、ガス源、バルブ、流量制御器(いずれも図示せず)等を含む。ガス源は、成膜ガス、エッチングガス、クリーニングガス、パージガス等のガス源を含む。ガス供給系32は、ガス源からの処理ガスを流量制御器で流量を制御してガスノズル31に導入する。 The gas supply system 32 is connected to the base end of the gas nozzle 31. The gas supply system 32 includes a gas source, a valve, a flow controller (none of which are shown), and the like. The gas source includes a deposition gas, an etching gas, a cleaning gas, a purge gas, and the like. The gas supply system 32 introduces the processing gas from the gas source into the gas nozzle 31 by controlling the flow rate with the flow controller.

なお、図1の例では、ガス供給部30が1つのガスノズル31を含む場合を説明したが、これに限定されない。例えば、ガス供給部30は、2つ以上のガスノズルを含んでいてもよい。 In the example of FIG. 1, the gas supply unit 30 includes one gas nozzle 31, but this is not limited thereto. For example, the gas supply unit 30 may include two or more gas nozzles.

排気部40は、処理容器10内の各種の処理ガスを排気する。排気部40は、ガス出口41、排気系42等を含む。 The exhaust section 40 exhausts various processing gases from within the processing vessel 10. The exhaust section 40 includes a gas outlet 41, an exhaust system 42, etc.

ガス出口41は、マニホールド13の上部に設けられている。ガス出口41には、排気系42が接続されている。 The gas outlet 41 is provided at the top of the manifold 13. The gas outlet 41 is connected to an exhaust system 42.

排気系42は、圧力調整弁、真空ポンプ(いずれも図示せず)等を含む。排気系42は、圧力調整弁で処理容器10内の圧力を調整しながら、真空ポンプで処理容器10内の処理ガスを排気する。 The exhaust system 42 includes a pressure adjustment valve, a vacuum pump (neither shown), etc. The exhaust system 42 adjusts the pressure inside the processing vessel 10 with the pressure adjustment valve while exhausting the processing gas inside the processing vessel 10 with the vacuum pump.

加熱部50は、処理容器10内の基板Wを加熱する。加熱部50は、断熱部材51、保護カバー52、発熱体53、保持部材54等を含む。 The heating unit 50 heats the substrate W in the processing vessel 10. The heating unit 50 includes a heat insulating member 51, a protective cover 52, a heating element 53, a holding member 54, etc.

断熱部材51は、天井部を有し、下端が開口した円筒体状に形成されている。断熱部材51は、処理容器10の周囲に空間Sを隔てて設けられている。断熱部材51の下端は、ベースプレート14に支持されている。断熱部材51は、例えば熱伝導性が低く、柔らかい無定形のシリカ及びアルミナの混合物により形成されている。 The insulating member 51 has a ceiling and is formed in a cylindrical shape with an open bottom end. The insulating member 51 is provided around the processing vessel 10 with a space S between them. The bottom end of the insulating member 51 is supported by the base plate 14. The insulating member 51 is formed, for example, from a mixture of soft amorphous silica and alumina, which have low thermal conductivity.

保護カバー52は、断熱部材51の外周の全面を覆うように取り付けられている。保護カバー52は、例えばステンレス鋼により形成されている。 The protective cover 52 is attached so as to cover the entire outer periphery of the insulating member 51. The protective cover 52 is made of, for example, stainless steel.

発熱体53は、断熱部材51の内周側に、螺旋状に巻回して配置されている。発熱体53は、断熱部材51の内面から所定の間隙を隔てた状態で、保持部材54によって、熱膨張及び熱収縮可能に保持されている。ただし、発熱体53は、保持部材54による保持に代えて、断熱部材51の内周側に螺旋状に溝部(図示せず)を形成し、溝部に嵌めこまれて固定されていてもよい。発熱体53は、電源(図示せず)に接続されており、電源から電力が供給されることで発熱し、ボート22に保持された基板Wを加熱する。発熱体53は、上下方向(処理容器10の長手方向)において複数の加熱領域(ゾーン)に区分されている。このように発熱体53が上下方向において複数の加熱領域に区分されている場合、加熱領域ごとに発熱体53の発熱量を制御することで、処理容器10の上下方向の温度を調節できる。図1の例では、複数の加熱領域は、上方から下方に向かって設けられた、TOP領域、CT領域、CTR領域、CB領域及びBTM領域を含む。なお、発熱体53は、複数の加熱領域に区分されることなく、単一の加熱領域を形成していてもよい。 The heating element 53 is arranged in a spirally wound manner on the inner periphery of the insulating member 51. The heating element 53 is held by the holding member 54 so as to be capable of thermal expansion and thermal contraction, with a predetermined gap between the heating element 53 and the inner surface of the insulating member 51. However, instead of being held by the holding member 54, the heating element 53 may be fixed by being fitted into a spiral groove (not shown) formed on the inner periphery of the insulating member 51. The heating element 53 is connected to a power source (not shown) and generates heat when power is supplied from the power source, thereby heating the substrate W held in the boat 22. The heating element 53 is divided into a plurality of heating regions (zones) in the vertical direction (the longitudinal direction of the processing vessel 10). When the heating element 53 is divided into a plurality of heating regions in the vertical direction in this way, the temperature in the vertical direction of the processing vessel 10 can be adjusted by controlling the amount of heat generated by the heating element 53 for each heating region. In the example of FIG. 1, the multiple heating regions include a TOP region, a CT region, a CTR region, a CB region, and a BTM region arranged from top to bottom. Note that the heating element 53 may form a single heating region without being divided into multiple heating regions.

保持部材54は、断熱部材51の内面に、断熱部材51の軸方向に伸び、かつ、周方向に所定の間隔で設けられている。保持部材54は、発熱体53を、熱膨張及び熱収縮可能に保持する。 The holding members 54 extend in the axial direction of the insulating member 51 on the inner surface of the insulating member 51 and are provided at predetermined intervals in the circumferential direction. The holding members 54 hold the heating element 53 so that it can thermally expand and contract.

温度センサ60は、処理容器10内の温度を測定する。温度センサ60は、測温部61~65を含む。測温部61~65は、内管11と外管12との間に、上下方向に間隔をおいて設けられている。測温部61~65は、それぞれBTM領域、CB領域、CTR領域、CT領域、TOP領域に設けられ、それぞれBTM領域、CB領域、CTR領域、CT領域、TOP領域の温度を測定する。なお、測温部61~65は、内管11内に設けられていてもよく、空間Sに設けられていてもよい。 The temperature sensor 60 measures the temperature inside the processing vessel 10. The temperature sensor 60 includes temperature measuring units 61-65. The temperature measuring units 61-65 are provided at intervals in the vertical direction between the inner tube 11 and the outer tube 12. The temperature measuring units 61-65 are provided in the BTM region, CB region, CTR region, CT region, and TOP region, respectively, and measure the temperatures of the BTM region, CB region, CTR region, CT region, and TOP region, respectively. The temperature measuring units 61-65 may be provided in the inner tube 11 or in the space S.

制御部90は、熱処理装置1Aの各部の動作を制御するように構成される。制御部90は、例えばコンピュータであってよい。熱処理装置1Aの各部の動作を行うコンピュータのプログラムは、記憶媒体に記憶されている。記憶媒体は、例えばフレキシブルディスク、コンパクトディスク、ハードディスク、フラッシュメモリ、DVD等である。 The control unit 90 is configured to control the operation of each part of the heat treatment device 1A. The control unit 90 may be, for example, a computer. The computer program that controls the operation of each part of the heat treatment device 1A is stored in a storage medium. The storage medium may be, for example, a flexible disk, a compact disk, a hard disk, a flash memory, a DVD, etc.

また、熱処理装置1Aは、仕切構造体100を有する。仕切構造体100は、空間Sに設けられる。仕切構造体100は、耐熱材料、例えばアルミナ(Al)、窒化アルミニウム(AlN)等のセラミックス材料や石英により形成される。仕切構造体100は、縦仕切部材111~115、横仕切部材121~124等を含む。 The heat treatment apparatus 1A also has a partition structure 100. The partition structure 100 is provided in the space S. The partition structure 100 is made of a heat-resistant material, for example, a ceramic material such as alumina (Al 2 O 3 ) or aluminum nitride (AlN), or quartz. The partition structure 100 includes vertical partition members 111-115, horizontal partition members 121-124, etc.

縦仕切部材111~115は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材111~115は、下端がマニホールド13によって保持される。各縦仕切部材111~115は、上下方向に延在して空間Sを仕切る。各縦仕切部材111~115は、矩形板状を有し、上端がTOP領域とCT領域との境界よりも上方まで延在する。 The vertical partition members 111-115 are spaced apart in the circumferential direction of the processing vessel 10. The lower end of each of the vertical partition members 111-115 is held by the manifold 13. Each of the vertical partition members 111-115 extends in the vertical direction to separate the space S. Each of the vertical partition members 111-115 has a rectangular plate shape, and the upper end extends above the boundary between the TOP region and the CT region.

横仕切部材121~124は、上下方向に間隔をおいて設けられる。横仕切部材121~124は、それぞれBTM領域とCB領域との境界、CB領域とCTR領域との境界、CTR領域とCT領域との境界、CT領域とTOP領域との境界に設けられる。各横仕切部材121~124は、水平方向に延在して空間Sを仕切る。各横仕切部材121~124は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材121~124は、縦仕切部材111~115に着脱自在に取り付けられる。ただし、各横仕切部材121~124は、縦仕切部材111~115と一体で形成されていてもよい。 The horizontal partition members 121 to 124 are provided at intervals in the vertical direction. The horizontal partition members 121 to 124 are provided at the boundary between the BTM area and the CB area, the boundary between the CB area and the CTR area, the boundary between the CTR area and the CT area, and the boundary between the CT area and the TOP area, respectively. Each of the horizontal partition members 121 to 124 extends in the horizontal direction to divide the space S. Each of the horizontal partition members 121 to 124 has a circular plate shape, a center coincident with the center of the outer pipe 12, an inner diameter approximately the same as the outer diameter of the outer pipe 12, and an outer diameter slightly smaller than the inner diameter of the heat insulating member 51. Each of the horizontal partition members 121 to 124 is detachably attached to the vertical partition members 111 to 115. However, each of the horizontal partition members 121 to 124 may be formed integrally with the vertical partition members 111 to 115.

以上に説明したように、第1の実施形態の熱処理装置1Aは、上下方向に延在して空間Sを仕切る複数の縦仕切部材111~115と、水平方向に延在して空間Sを仕切る複数の横仕切部材121~124とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1A of the first embodiment has a plurality of vertical partition members 111-115 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 121-124 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第2の実施形態〕
図4及び図5を参照し、第2の実施形態の熱処理装置1Bの一例について説明する。図4は断熱部材の内側に処理容器が取り付けられる前の状態を示し、図5は断熱部材の内側に処理容器が取り付けられた後の状態を示す。
Second Embodiment
An example of a heat treatment apparatus 1B according to a second embodiment will be described with reference to Fig. 4 and Fig. 5. Fig. 4 shows a state before a treatment container is attached inside a heat insulating member, and Fig. 5 shows a state after the treatment container is attached inside the heat insulating member.

第2の実施形態の熱処理装置1Bは、仕切構造体100に代えて、仕切構造体200を有する点で、熱処理装置1Aと異なる。なお、その他の構成については、熱処理装置1Aと同じである。以下、熱処理装置1Aと異なる点を中心に説明する。 The heat treatment apparatus 1B of the second embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 200 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

仕切構造体200は、空間Sに設けられる。仕切構造体200は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体200は、縦仕切部材211~215、横仕切部材221~224、支持部材230等を含む。 The partition structure 200 is provided in the space S. The partition structure 200 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 200 includes vertical partition members 211-215, horizontal partition members 221-224, a support member 230, and the like.

縦仕切部材211~215は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材211~215は、上下方向に延在して空間Sを仕切る。各縦仕切部材211~215は、下端が最下部の加熱領域まで延在し、上端が最上部の加熱領域まで延在する。各縦仕切部材211~215は、つづら折り状に折り畳み可能である。すなわち、各縦仕切部材211~215は、上下方向に伸縮自在である。例えば、各縦仕切部材211~215は、断熱部材51の内側に処理容器10が取り付けられていない状態では折り畳まれて収縮し(図4)、断熱部材51の内側に処理容器10が取り付けられた状態では折り畳まれることなく伸長する(図5)。 The vertical partition members 211-215 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 211-215 extends in the vertical direction to divide the space S. The lower end of each of the vertical partition members 211-215 extends to the lowermost heating area, and the upper end of each of the vertical partition members 211-215 extends to the uppermost heating area. Each of the vertical partition members 211-215 can be folded in a zigzag shape. That is, each of the vertical partition members 211-215 can be expanded and contracted in the vertical direction. For example, each of the vertical partition members 211-215 is folded and contracted when the processing vessel 10 is not attached inside the insulating member 51 (FIG. 4), and extends without being folded when the processing vessel 10 is attached inside the insulating member 51 (FIG. 5).

横仕切部材221~224は、第1の実施形態の横仕切部材121~124と同じ構成であってよい。各横仕切部材221~224は、縦仕切部材211~215の伸縮に伴って上下方向に移動する。例えば、各横仕切部材221~224は、縦仕切部材211~215が収縮すると、BTM領域に移動する。また、例えば各横仕切部材221~224は、縦仕切部材211~215が伸長すると、それぞれBTM領域とCB領域との境界、CB領域とCTR領域との境界、CTR領域とCT領域との境界、CT領域とTOP領域との境界に移動し、空間Sを仕切る。 The horizontal partition members 221-224 may have the same configuration as the horizontal partition members 121-124 in the first embodiment. Each of the horizontal partition members 221-224 moves vertically as the vertical partition members 211-215 expand and contract. For example, when the vertical partition members 211-215 contract, each of the horizontal partition members 221-224 moves to the BTM region. Also, for example, when the vertical partition members 211-215 expand, each of the horizontal partition members 221-224 moves to the boundary between the BTM region and the CB region, the boundary between the CB region and the CTR region, the boundary between the CTR region and the CT region, and the boundary between the CT region and the TOP region, respectively, and divides the space S.

支持部材230は、各縦仕切部材211~215の上端と連結されている。支持部材230は、外管12の天井部に沿ったキャップ状を有し、外管12の天井部に保持される(図5)。支持部材230が外管12の天井部に保持されると、縦仕切部材211~215が伸長する。 The support member 230 is connected to the upper ends of the vertical partition members 211 to 215. The support member 230 has a cap shape that fits along the ceiling of the outer pipe 12, and is held in the ceiling of the outer pipe 12 (Figure 5). When the support member 230 is held in the ceiling of the outer pipe 12, the vertical partition members 211 to 215 extend.

以上に説明したように、第2の実施形態の熱処理装置1Bは、上下方向に延在して空間Sを仕切る複数の縦仕切部材211~215と、水平方向に延在して空間Sを仕切る複数の横仕切部材221~224とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1B of the second embodiment has a plurality of vertical partition members 211-215 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 221-224 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第3の実施形態〕
図6及び図7を参照し、第3の実施形態の熱処理装置1Cの一例について説明する。なお、図6及び図7では、外管及び仕切構造体を除く構成の図示を省略している。
Third Embodiment
An example of a heat treatment apparatus 1C according to a third embodiment will be described with reference to Fig. 6 and Fig. 7. Note that in Fig. 6 and Fig. 7, illustration of components other than an outer tube and a partition structure is omitted.

第3の実施形態の熱処理装置1Cは、仕切構造体100に代えて、仕切構造体300を有する点で、熱処理装置1Aと異なる。なお、その他の構成については、熱処理装置1Aと同じである。以下、熱処理装置1Aと異なる点を中心に説明する。 The heat treatment apparatus 1C of the third embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 300 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following will mainly explain the differences from the heat treatment apparatus 1A.

仕切構造体300は、空間Sに設けられる。仕切構造体300は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体300は、縦仕切部材311~314、横仕切部材321~323等を含む。 The partition structure 300 is provided in the space S. The partition structure 300 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 300 includes vertical partition members 311-314, horizontal partition members 321-323, and the like.

縦仕切部材311~314は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材311~314は、外管12の外周壁に固定される。各縦仕切部材311~314は、上下方向に延在して空間Sを仕切る。各縦仕切部材311~314は、矩形板状を有し、下端が最下部の加熱領域まで延在し、上端が最上部の加熱領域まで延在する。 The vertical partition members 311-314 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 311-314 is fixed to the outer peripheral wall of the outer tube 12. Each of the vertical partition members 311-314 extends in the vertical direction to separate the space S. Each of the vertical partition members 311-314 has a rectangular plate shape, with the lower end extending to the lowermost heating area and the upper end extending to the uppermost heating area.

縦仕切部材311には、上下方向に間隔をあけて3つの切欠き311n~311nが形成されている。縦仕切部材312には、上下方向に間隔をあけて3つの切欠き312n~312nが形成されている。縦仕切部材313には、上下方向に間隔をあけて3つの切欠き313n~313nが形成されている。縦仕切部材314には、上下方向に間隔をあけて3つの切欠き314n~314nが形成されている。 The vertical partition member 311 has three notches 311n 1 to 311n 3 spaced apart in the up-down direction. The vertical partition member 312 has three notches 312n 1 to 312n 3 spaced apart in the up-down direction. The vertical partition member 313 has three notches 313n 1 to 313n 3 spaced apart in the up-down direction. The vertical partition member 314 has three notches 314n 1 to 314n 3 spaced apart in the up - down direction.

各切欠き311n~311n,312n~312n,313n~313n,314n~314nは、例えば隣接する加熱領域の境界に形成されている。各縦仕切部材311~314は、切欠き311n,312n,313n,314nで横仕切部材321を保持する。各縦仕切部材311~314は、切欠き311n,312n,313n,314nで横仕切部材322を保持する。各縦仕切部材311~314は、切欠き311n,312n,313n,314nで横仕切部材323を保持する。 Each of the notches 311n1 to 311n3 , 312n1 to 312n3 , 313n1 to 313n3 , and 314n1 to 314n3 is formed, for example, at the boundary between adjacent heating regions. Each of the vertical partition members 311 to 314 holds the horizontal partition member 321 at the notches 311n1 , 312n1 , 313n1 , and 314n1 . Each of the vertical partition members 311 to 314 holds the horizontal partition member 322 at the notches 311n2 , 312n2 , 313n2 , and 314n2 . Each of the vertical partition members 311 to 314 holds the horizontal partition member 323 at the notches 311n3 , 312n3 , 313n3 , and 314n3 .

横仕切部材321~323は、上下方向に間隔をおいて設けられる。各横仕切部材321~323は、隣接する加熱領域の境界に設けられる。各横仕切部材321~323は、水平方向に延在して空間Sを仕切る。各横仕切部材321~323は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材321~323には、切欠き321n~323nが形成されている。 The horizontal partition members 321-323 are spaced apart in the vertical direction. Each of the horizontal partition members 321-323 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 321-323 extends horizontally to separate the space S. Each of the horizontal partition members 321-323 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. Each of the horizontal partition members 321-323 has a notch 321n-323n formed therein.

切欠き321n~323nは、横仕切部材321~323の内周部分に形成されている。横仕切部材321は、切欠き321nと縦仕切部材311~314の位置を合わせた状態(図7)で下方に移動させ、切欠き311n,312n,313n,314nの高さ位置で回転させることで、縦仕切部材311~314に取り付けられる(図6)。横仕切部材322は、切欠き322nと縦仕切部材311~314の位置を合わせた状態(図7)で下方に移動させ、切欠き311n,312n,313n,314nの高さ位置で回転させることで、縦仕切部材311~314に取り付けられる(図6)。横仕切部材323は、切欠き323nと縦仕切部材311~314の位置を合わせた状態(図7)で下方に移動させ、切欠き311n,312n,313n,314nの高さ位置で回転させることで、縦仕切部材311~314に取り付けられる(図6)。このように、各横仕切部材321~323は、縦仕切部材311~314に着脱自在に取り付けられる。 The notches 321n to 323n are formed on the inner periphery of the horizontal partition members 321 to 323. The horizontal partition member 321 is attached to the vertical partition members 311 to 314 by moving it downward with the notch 321n aligned with the vertical partition members 311 to 314 (FIG. 7) and rotating it at the height of the notches 311n 1 , 312n 1 , 313n 1 , and 314n 1 (FIG. 6). The horizontal partition member 322 is attached to the vertical partition members 311 to 314 by moving it downward with the notch 322n aligned with the vertical partition members 311 to 314 (FIG. 7) and rotating it at the height of the notches 311n 2 , 312n 2 , 313n 2 , and 314n 2 (FIG. 6). The horizontal partition member 323 is attached to the vertical partition members 311 to 314 by moving it downward with the notches 323n aligned with the vertical partition members 311 to 314 (FIG. 7) and rotating it at the height of the notches 311n 3 , 312n 3 , 313n 3 , and 314n 3 (FIG. 6). In this way, the horizontal partition members 321 to 323 are detachably attached to the vertical partition members 311 to 314.

以上に説明したように、第3の実施形態の熱処理装置1Cは、上下方向に延在して空間Sを仕切る複数の縦仕切部材311~314と、水平方向に延在して空間Sを仕切る複数の横仕切部材321~323とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1C of the third embodiment has a plurality of vertical partition members 311-314 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 321-323 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

なお、第3の実施形態の熱処理装置1Cでは、各横仕切部材321~323が円環板状を有する場合を説明したが、これに限定されない。例えば、横仕切部材321~323のうち少なくとも1つが、処理容器10の周方向において複数に分割されていてもよい。一例としては、図8に示されるように、横仕切部材321は、半円環板状を有する2つの分割片321a,321bを含んでいてもよい。この場合、横仕切部材321を縦仕切部材311~314に取り付ける際に、縦仕切部材311~314の上方から取り付けることなく、外管12の側方から取り付けることができるので、横仕切部材321に切欠きを設けなくてもよい。また、横仕切部材322,323についても、横仕切部材321と同様であってよい。 In the heat treatment apparatus 1C of the third embodiment, the horizontal partition members 321 to 323 are described as having an annular plate shape, but the present invention is not limited to this. For example, at least one of the horizontal partition members 321 to 323 may be divided into a plurality of pieces in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 8, the horizontal partition member 321 may include two divided pieces 321a and 321b having a semicircular plate shape. In this case, when the horizontal partition member 321 is attached to the vertical partition members 311 to 314, it can be attached from the side of the outer tube 12 without attaching it from above the vertical partition members 311 to 314, so that it is not necessary to provide a notch in the horizontal partition member 321. The horizontal partition members 322 and 323 may also be similar to the horizontal partition member 321.

〔第4の実施形態〕
図9及び図10を参照し、第4の実施形態の熱処理装置1Dの一例について説明する。なお、図9及び図10では、外管及び仕切構造体を除く構成の図示を省略している。
Fourth embodiment
An example of a heat treatment apparatus 1D according to a fourth embodiment will be described with reference to Fig. 9 and Fig. 10. Note that in Fig. 9 and Fig. 10, illustration of components other than an outer tube and a partition structure is omitted.

第4の実施形態の熱処理装置1Dは、仕切構造体300に代えて、仕切構造体400を有する点で、熱処理装置1Cと異なる。なお、その他の構成については、熱処理装置1Cと同じである。以下、熱処理装置1Cと異なる点を中心に説明する。 The heat treatment apparatus 1D of the fourth embodiment differs from the heat treatment apparatus 1C in that it has a partition structure 400 instead of the partition structure 300. The rest of the configuration is the same as that of the heat treatment apparatus 1C. The following will focus on the differences from the heat treatment apparatus 1C.

仕切構造体400は、空間Sに設けられる。仕切構造体400は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体400は、縦仕切部材411~414、横仕切部材421~423、凸部431~434等を含む。 The partition structure 400 is provided in the space S. The partition structure 400 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 400 includes vertical partition members 411-414, horizontal partition members 421-423, protrusions 431-434, and the like.

縦仕切部材411~414は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材411~414は、上下方向に延在して空間Sを仕切る。各縦仕切部材411~414は、矩形板状を有し、下端が最下部の加熱領域まで延在し、上端が最上部の加熱領域まで延在する。 The vertical partition members 411-414 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 411-414 extends in the vertical direction to divide the space S. Each of the vertical partition members 411-414 has a rectangular plate shape, with its lower end extending to the lowermost heating area and its upper end extending to the uppermost heating area.

縦仕切部材411は、上下方向において分割された3つの分割片411a~411cを含む。縦仕切部材412は、上下方向において分割された3つの分割片412a~412cを含む。縦仕切部材413は、上下方向において分割された3つの分割片413a~413cを含む。 The vertical partition member 411 includes three divided pieces 411a to 411c that are divided in the vertical direction. The vertical partition member 412 includes three divided pieces 412a to 412c that are divided in the vertical direction. The vertical partition member 413 includes three divided pieces 413a to 413c that are divided in the vertical direction.

分割片411a~414aは、横仕切部材421の下面に該横仕切部材421と一体で形成されている。分割片411b~414bは、横仕切部材422の下面に該横仕切部材422と一体で形成されている。分割片411c~414cは、横仕切部材423の下面に該横仕切部材423と一体で形成されている。 Segments 411a to 414a are formed integrally with horizontal partition member 421 on the lower surface of horizontal partition member 421. Segments 411b to 414b are formed integrally with horizontal partition member 422 on the lower surface of horizontal partition member 422. Segments 411c to 414c are formed integrally with horizontal partition member 423 on the lower surface of horizontal partition member 423.

横仕切部材421~423は、上下方向に間隔をおいて設けられる。各横仕切部材421~423は、隣接する加熱領域の境界に設けられる。各横仕切部材421~423は、水平方向に延在して空間Sを仕切る。各横仕切部材421~423は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材421~423には、切欠き421n~423nが形成されている。 The horizontal partition members 421-423 are spaced apart in the vertical direction. Each of the horizontal partition members 421-423 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 421-423 extends in the horizontal direction to separate the space S. Each of the horizontal partition members 421-423 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. Each of the horizontal partition members 421-423 has a notch 421n-423n formed therein.

切欠き421n~423nは、横仕切部材421~423の内周部分に形成されている。横仕切部材421は、切欠き421nと凸部431~434の位置を合わせた状態(図10)で下方に移動させ、最下部の凸部431~434の上面の高さ位置で回転させることで、最下部の凸部431~434上に取り付けられる(図9)。横仕切部材422は、切欠き422nと凸部431~434の位置を合わせた状態(図10)で下方に移動させ、中段部の凸部431~434の上面の高さ位置で回転させることで、中段部の凸部431~434上に取り付けられる(図9)。横仕切部材423は、切欠き423nと凸部431~434の位置を合わせた状態(図10)で下方に移動させ、最上部の凸部431~434の上面の高さ位置で回転させることで、最上部の凸部431~434上に取り付けられる(図9)。このように、縦仕切部材411~414及び横仕切部材421~423は、外管12に着脱自在に取り付けられる。 The notches 421n to 423n are formed on the inner periphery of the horizontal partition members 421 to 423. The horizontal partition member 421 is attached to the lowermost convex portions 431 to 434 by moving it downward with the notches 421n and the convex portions 431 to 434 aligned (FIG. 10) and rotating it at the height of the upper surfaces of the lowermost convex portions 431 to 434 (FIG. 9). The horizontal partition member 422 is attached to the middle-stage convex portions 431 to 434 by moving it downward with the notches 422n and the convex portions 431 to 434 aligned (FIG. 10) and rotating it at the height of the upper surfaces of the middle-stage convex portions 431 to 434 (FIG. 9). The horizontal partition member 423 is attached to the uppermost convex portion 431-434 by moving it downward with the notch 423n aligned with the convex portions 431-434 (FIG. 10) and rotating it at the same height as the top surface of the uppermost convex portion 431-434 (FIG. 9). In this way, the vertical partition members 411-414 and the horizontal partition members 421-423 are detachably attached to the outer tube 12.

凸部431~434は、処理容器10の周方向に間隔をおいて設けられる。各凸部431~434は、外管12の外周壁から突出し、上面で横仕切部材421~423を保持する。各凸部431~434は、例えば直方体形状を有する。ただし、各凸部431~434は、処理容器10の径方向を軸方向とする円柱形状を有していてもよい。 The protrusions 431-434 are spaced apart in the circumferential direction of the processing vessel 10. Each of the protrusions 431-434 protrudes from the outer peripheral wall of the outer tube 12 and holds the horizontal partition members 421-423 on its upper surface. Each of the protrusions 431-434 has, for example, a rectangular parallelepiped shape. However, each of the protrusions 431-434 may have a cylindrical shape with its axial direction being the radial direction of the processing vessel 10.

以上に説明したように、第4の実施形態の熱処理装置1Dは、上下方向に延在して空間Sを仕切る複数の縦仕切部材411~414と、水平方向に延在して空間Sを仕切る複数の横仕切部材421~423とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1D of the fourth embodiment has a plurality of vertical partition members 411-414 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 421-423 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

なお、第4の実施形態の熱処理装置1Dでは、横仕切部材421~423が別体で形成される場合を説明したが、これに限定されない。例えば、図11に示されるように、2つの横仕切部材421,422が分割片411b~414bで接続されて一体で形成されていてもよい。また、例えば2つの横仕切部材422,423が一体で形成されていてもよく、3つの横仕切部材421~423が一体で形成されていてもよい。 In the fourth embodiment of the heat treatment device 1D, the horizontal partition members 421 to 423 are formed separately, but this is not limiting. For example, as shown in FIG. 11, two horizontal partition members 421, 422 may be connected by split pieces 411b to 414b and formed as a single unit. Also, for example, two horizontal partition members 422, 423 may be formed as a single unit, or three horizontal partition members 421 to 423 may be formed as a single unit.

また、第4の実施形態の熱処理装置1Dでは、各横仕切部材421~423が円環板状を有する場合を説明したが、これに限定されない。例えば、横仕切部材421~423のうち少なくとも1つが、処理容器10の周方向において複数に分割されていてもよい。一例としては、図12に示されるように、横仕切部材421は、半円環板状を有する2つの分割片421a,421bを含んでいてもよい。この場合、横仕切部材421を最下部の凸部431~434上に取り付ける際に、凸部431~434の上方から取り付けることなく、外管12の側方から取り付けることができるので、横仕切部材421に切欠きを設けなくてもよい。また、横仕切部材422,423についても、横仕切部材421と同様であってよい。 In the fourth embodiment of the heat treatment apparatus 1D, the horizontal partition members 421 to 423 are described as having an annular plate shape, but the present invention is not limited to this. For example, at least one of the horizontal partition members 421 to 423 may be divided into a plurality of pieces in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 12, the horizontal partition member 421 may include two divided pieces 421a and 421b having a semi-annular plate shape. In this case, when the horizontal partition member 421 is attached to the lowermost convex parts 431 to 434, it can be attached from the side of the outer tube 12 without attaching it from above the convex parts 431 to 434, so that it is not necessary to provide a notch in the horizontal partition member 421. The horizontal partition members 422 and 423 may also be similar to the horizontal partition member 421.

〔第5の実施形態〕
図13を参照し、第5の実施形態の熱処理装置1Eの一例について説明する。なお、図13では、外管及び仕切構造体を除く構成の図示を省略している。
Fifth embodiment
An example of a heat treatment apparatus 1E according to the fifth embodiment will be described with reference to Fig. 13. Note that in Fig. 13, configurations other than the outer tube and the partition structure are omitted from illustration.

第5の実施形態の熱処理装置1Eは、仕切構造体400に代えて、仕切構造体500を有する点で、熱処理装置1Dと異なる。なお、その他の構成については、熱処理装置1Dと同じである。以下、熱処理装置1Dと異なる点を中心に説明する。 The heat treatment apparatus 1E of the fifth embodiment differs from the heat treatment apparatus 1D in that it has a partition structure 500 instead of the partition structure 400. The rest of the configuration is the same as that of the heat treatment apparatus 1D. The following will focus on the differences from the heat treatment apparatus 1D.

仕切構造体500は、空間Sに設けられる。仕切構造体500は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体500は、縦仕切部材511~514、横仕切部材521~523、凸部531~534等を含む。 The partition structure 500 is provided in the space S. The partition structure 500 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 500 includes vertical partition members 511-514, horizontal partition members 521-523, convex portions 531-534, and the like.

縦仕切部材511~514は、第4の実施形態の縦仕切部材411~414と同じ構成であってよい。 The vertical partition members 511 to 514 may have the same configuration as the vertical partition members 411 to 414 in the fourth embodiment.

横仕切部材521~523は、第4の実施形態の横仕切部材421~423と異なり、切欠き421n~423nが形成されていない形態を有する。なお、その他は、横仕切部材421~423と同じ構成であってよい。 The horizontal partition members 521 to 523 are different from the horizontal partition members 421 to 423 of the fourth embodiment in that they do not have the notches 421n to 423n. The rest of the configuration may be the same as the horizontal partition members 421 to 423.

凸部531~534は、第4の実施形態の凸部431~434と異なり、最下部のみに設けられている。 The protrusions 531 to 534 are provided only at the bottom, unlike the protrusions 431 to 434 in the fourth embodiment.

仕切構造体500では、凸部431~434上に横仕切部材521が載置され、横仕切部材521上に縦仕切部材511b~514bの下端が載置され、横仕切部材522上に縦仕切部材511c~514cの下端が載置される(図13)。 In the partition structure 500, the horizontal partition member 521 is placed on the protrusions 431 to 434, the lower ends of the vertical partition members 511b to 514b are placed on the horizontal partition member 521, and the lower ends of the vertical partition members 511c to 514c are placed on the horizontal partition member 522 (Figure 13).

以上に説明したように、第5の実施形態の熱処理装置1Eは、上下方向に延在して空間Sを仕切る複数の縦仕切部材511~514と、水平方向に延在して空間Sを仕切る複数の横仕切部材521~523とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1E of the fifth embodiment has a plurality of vertical partition members 511-514 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 521-523 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第6の実施形態〕
図14を参照し、第6の実施形態の熱処理装置1Fの一例について説明する。なお、図14では、外管及び仕切構造体を除く構成の図示を省略している。
Sixth embodiment
An example of a heat treatment apparatus 1F according to the sixth embodiment will be described with reference to Fig. 14. Note that in Fig. 14, configurations other than an outer tube and a partition structure are omitted from illustration.

第6の実施形態の熱処理装置1Fは、仕切構造体500に代えて、仕切構造体600を有する点で、熱処理装置1Eと異なる。なお、その他の構成については、熱処理装置1Eと同じである。以下、熱処理装置1Dと異なる点を中心に説明する。 The heat treatment apparatus 1F of the sixth embodiment differs from the heat treatment apparatus 1E in that it has a partition structure 600 instead of the partition structure 500. The rest of the configuration is the same as that of the heat treatment apparatus 1E. The following will focus on the differences from the heat treatment apparatus 1D.

仕切構造体600は、空間Sに設けられる。仕切構造体600は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体600は、縦仕切部材611~614、横仕切部材621~623、凸部630等を含む。 The partition structure 600 is provided in the space S. The partition structure 600 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 600 includes vertical partition members 611-614, horizontal partition members 621-623, a protrusion 630, and the like.

縦仕切部材611~614は、第5の実施形態の縦仕切部材511~514と同じ構成であってよい。 The vertical partition members 611 to 614 may have the same configuration as the vertical partition members 511 to 514 in the fifth embodiment.

横仕切部材621~623は、第5の実施形態の横仕切部材521~523と同じ構成であってよい。 The horizontal partition members 621 to 623 may have the same configuration as the horizontal partition members 521 to 523 in the fifth embodiment.

凸部630は、外管12の外周壁から突出する鍔形状を有し、上面で横仕切部材621~623を保持する。 The protrusion 630 has a flange shape that protrudes from the outer peripheral wall of the outer tube 12, and holds the horizontal partition members 621 to 623 on its upper surface.

仕切構造体600では、凸部630上に縦仕切部材611a~614aの下端が載置され、横仕切部材621上に縦仕切部材611b~614bの下端が載置され、横仕切部材622上に縦仕切部材611c~614cの下端が載置される(図14)。 In the partition structure 600, the lower ends of the vertical partition members 611a to 614a are placed on the protrusion 630, the lower ends of the vertical partition members 611b to 614b are placed on the horizontal partition member 621, and the lower ends of the vertical partition members 611c to 614c are placed on the horizontal partition member 622 (Figure 14).

以上に説明したように、第6の実施形態の熱処理装置1Fは、上下方向に延在して空間Sを仕切る複数の縦仕切部材611~614と、水平方向に延在して空間Sを仕切る複数の横仕切部材621~623とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1F of the sixth embodiment has a plurality of vertical partition members 611-614 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 621-623 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第7の実施形態〕
図15及び図16を参照し、第7の実施形態の熱処理装置1Gの一例について説明する。なお、図15及び図16では、外管及び仕切構造体を除く構成の図示を省略している。
Seventh embodiment
An example of a heat treatment apparatus 1G according to the seventh embodiment will be described with reference to Fig. 15 and Fig. 16. Note that in Fig. 15 and Fig. 16, illustration of components other than the outer tube and the partition structure is omitted.

第7の実施形態の熱処理装置1Gは、仕切構造体100に代えて、仕切構造体700を有する点で、熱処理装置1Aと異なる。なお、その他の構成については、熱処理装置1Aと同じである。以下、熱処理装置1Aと異なる点を中心に説明する。 The seventh embodiment of the heat treatment apparatus 1G differs from the heat treatment apparatus 1A in that it has a partition structure 700 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

仕切構造体700は、空間Sに設けられる。仕切構造体700は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体700は、縦仕切部材711~714、横仕切部材721~724、凸部731~734等を含む。 The partition structure 700 is provided in the space S. The partition structure 700 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 700 includes vertical partition members 711-714, horizontal partition members 721-724, protrusions 731-734, and the like.

縦仕切部材711~714は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材711~714は、横仕切部材721~724に着脱自在に取り付けられる。各縦仕切部材711~714は、上下方向に延在して空間Sを仕切る。各縦仕切部材711~714は、矩形板状を有し、下端が最下部の加熱領域まで延在し、上端が最上部の加熱領域まで延在する。 The vertical partition members 711-714 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 711-714 is detachably attached to the horizontal partition members 721-724. Each of the vertical partition members 711-714 extends in the vertical direction to divide the space S. Each of the vertical partition members 711-714 has a rectangular plate shape, with its lower end extending to the lowermost heating area and its upper end extending to the uppermost heating area.

縦仕切部材711には、上下方向に間隔をあけて4つの切欠き711n~711nが形成されている。縦仕切部材711は、切欠き711n~711nを外側切欠き721m~724mに差し込むことで、横仕切部材721~724に取り付けられる。 Four notches 711n 1 to 711n 4 are formed at intervals in the vertical direction in the vertical partition member 711. The vertical partition member 711 is attached to the horizontal partition members 721 to 724 by inserting the notches 711n 1 to 711n 4 into the outer notches 721m to 724m.

縦仕切部材712には、上下方向に間隔をあけて4つの切欠き712n~712nが形成されている。縦仕切部材712は、切欠き712n~712nを外側切欠き721m~724mに差し込むことで、横仕切部材721~724に取り付けられる。 Four notches 712n 1 to 712n 4 are formed at intervals in the vertical direction in the vertical partition member 712. The vertical partition member 712 is attached to the horizontal partition members 721 to 724 by inserting the notches 712n 1 to 712n 4 into the outer notches 721m to 724m.

縦仕切部材713には、上下方向に間隔をあけて4つの切欠き713n~713nが形成されている。縦仕切部材713は、切欠き713n~713nを外側切欠き721m~724mに差し込むことで、横仕切部材721~724に取り付けられる。 Four notches 713n 1 to 713n 4 are formed at intervals in the vertical direction in the vertical partition member 713. The vertical partition member 713 is attached to the horizontal partition members 721 to 724 by inserting the notches 713n 1 to 713n 4 into the outer notches 721m to 724m.

縦仕切部材714には、上下方向に間隔をあけて4つの切欠き714n~714nが形成されている。縦仕切部材711は、切欠き714n~714nを外側切欠き721m~724mに差し込むことで、横仕切部材721~724に取り付けられる。 Four notches 714n 1 to 714n 4 are formed at intervals in the vertical direction in the vertical partition member 714. The vertical partition member 711 is attached to the horizontal partition members 721 to 724 by inserting the notches 714n 1 to 714n 4 into the outer notches 721m to 724m.

横仕切部材721~724は、上下方向に間隔をおいて設けられる。各横仕切部材721~724は、隣接する加熱領域の境界に設けられる。各横仕切部材721~724は、水平方向に延在して空間Sを仕切る。各横仕切部材721~724は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材721~724には、内側切欠き721n~724n及び外側切欠き721m~724mが形成されている。 The horizontal partition members 721-724 are spaced apart in the vertical direction. Each of the horizontal partition members 721-724 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 721-724 extends horizontally to separate the space S. Each of the horizontal partition members 721-724 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. Each of the horizontal partition members 721-724 has inner notches 721n-724n and outer notches 721m-724m formed therein.

内側切欠き721n~724nは、横仕切部材721~724の内周部分に形成されている。横仕切部材721は、内側切欠き721nと凸部731~734の位置を合わせた状態(図16)で下方に移動させ、最下部の凸部731~734の上面の高さ位置で回転させることで、最下部の凸部731~734上に取り付けられる(図15)。横仕切部材722は、内側切欠き722nと凸部731~734の位置を合わせた状態(図16)で下方に移動させ、下から2段目の凸部731~734の上面の高さ位置で回転させることで、下から2段目の凸部731~734上に取り付けられる(図15)。横仕切部材723は、内側切欠き723nと凸部731~734の位置を合わせた状態(図16)で下方に移動させ、下から3段目の凸部731~734の上面の高さ位置で回転させることで、下から3段目の凸部731~734上に取り付けられる(図15)。横仕切部材724は、内側切欠き724nと凸部731~734の位置を合わせた状態(図16)で下方に移動させ、最上部の凸部731~734の上面の高さ位置で回転させることで、最上部の凸部731~734上に取り付けられる(図15)。このように、横仕切部材721~724は、凸部731~734上に着脱自在に取り付けられる。 The inner notches 721n to 724n are formed on the inner periphery of the horizontal partition members 721 to 724. The horizontal partition member 721 is attached to the bottommost convex portion 731 to 734 by moving it downward with the inner notch 721n and the convex portions 731 to 734 aligned (FIG. 16) and rotating it at the height of the upper surface of the bottommost convex portion 731 to 734 (FIG. 15). The horizontal partition member 722 is attached to the second-lowest convex portion 731 to 734 by moving it downward with the inner notch 722n and the convex portions 731 to 734 aligned (FIG. 16) and rotating it at the height of the upper surface of the second-lowest convex portion 731 to 734 (FIG. 15). The horizontal partition member 723 is attached onto the third protrusion 731-734 from the bottom by moving it downward with the inner notch 723n aligned with the protrusions 731-734 (FIG. 16) and rotating it at the height of the upper surfaces of the third protrusion 731-734 from the bottom (FIG. 15). The horizontal partition member 724 is attached onto the topmost protrusion 731-734 by moving it downward with the inner notch 724n aligned with the protrusions 731-734 (FIG. 16) and rotating it at the height of the upper surfaces of the topmost protrusion 731-734 (FIG. 15). In this way, the horizontal partition members 721-724 are detachably attached onto the protrusions 731-734.

外側切欠き721m~724mは、横仕切部材721~724の外周部分に形成されている。 The outer notches 721m to 724m are formed on the outer periphery of the horizontal partition members 721 to 724.

凸部731~734は、処理容器10の周方向に間隔をおいて設けられる。各凸部731~734は、外管12の外周壁から突出し、横仕切部材721~724を保持する。各凸部731~734は、例えば直方体形状を有する。ただし、各凸部731~734は、処理容器10の径方向を軸方向とする円柱形状を有していてもよい。 The protrusions 731-734 are spaced apart in the circumferential direction of the processing vessel 10. Each of the protrusions 731-734 protrudes from the outer peripheral wall of the outer tube 12 and holds the horizontal partition members 721-724. Each of the protrusions 731-734 has, for example, a rectangular parallelepiped shape. However, each of the protrusions 731-734 may have a cylindrical shape with the radial direction of the processing vessel 10 as its axial direction.

以上に説明したように、第7の実施形態の熱処理装置1Gは、上下方向に延在して空間Sを仕切る複数の縦仕切部材711~714と、水平方向に延在して空間Sを仕切る複数の横仕切部材721~724とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1G of the seventh embodiment has a plurality of vertical partition members 711-714 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 721-724 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

なお、第7の実施形態の熱処理装置1Gでは、各縦仕切部材711~714に側面視で矩形状の切欠き711n~711n,712n~712n,713n~713n,714n~714nが形成されている場合を説明したが、これに限定されない。例えば、図17に示されるように、各切欠き711n~711nは側面視でL字状であってもよい。また、各切欠き712n~712n,713n~713n,714n~714nについても、各切欠き711n~711nと同様に側面視でL字状であってもよい。切欠き711n~711n,712n~712n,713n~713n,714n~714nが側面視でL字状であることにより、振動等により横仕切部材721~724から縦仕切部材711~714が脱離することが抑制される。 In the heat treatment apparatus 1G of the seventh embodiment, the vertical partition members 711 to 714 are formed with the rectangular notches 711n 1 to 711n 4 , 712n 1 to 712n 4 , 713n 1 to 713n 4 , and 714n 1 to 714n 4 in a side view, but the present invention is not limited to this. For example, as shown in FIG. 17, the notches 711n 1 to 711n 4 may be L-shaped in a side view. Similarly to the notches 711n 1 to 711n 4 , the notches 712n 1 to 712n 4 , 713n 1 to 713n 4 , and 714n 1 to 714n 4 may also be L-shaped in a side view. Since the notches 711n 1 to 711n 4 , 712n 1 to 712n 4 , 713n 1 to 713n 4 , and 714n 1 to 714n 4 are L-shaped in side view, the vertical partition members 711 to 714 are prevented from detaching from the horizontal partition members 721 to 724 due to vibration or the like.

また、第7の実施形態の熱処理装置1Gでは、各縦仕切部材711~714が最下部の加熱領域から最上部の加熱領域まで延在する場合を説明したが、これに限定されない。例えば、各縦仕切部材711~714は、上下方向において複数に分割されていてもよい。一例としては、図18及び図19に示されるように、縦仕切部材711は、上下方向において分割された2つの分割片711a,711bを含んでいてもよい。また、縦仕切部材712~714についても、縦仕切部材711と同様であってよい。 In addition, in the seventh embodiment of the heat treatment device 1G, the vertical partition members 711-714 extend from the lowermost heating region to the uppermost heating region, but this is not limited to the above. For example, each of the vertical partition members 711-714 may be divided into multiple parts in the vertical direction. As an example, as shown in Figures 18 and 19, the vertical partition member 711 may include two divided pieces 711a and 711b divided in the vertical direction. Furthermore, the vertical partition members 712-714 may be similar to the vertical partition member 711.

また、第7の実施形態の熱処理装置1Gでは、各横仕切部材721~724が円環板状を有する場合を説明したが、これに限定されない。例えば、横仕切部材721~724のうち少なくとも1つが、処理容器10の周方向において複数に分割されていてもよい。一例としては、図20に示されるように、横仕切部材721は、半円環板状を有する2つの分割片721a,721bを含んでいてもよい。この場合、横仕切部材721を最下部の凸部731~734上に取り付ける際に、凸部731~734の上方から取り付けることなく、外管12の側方から取り付けることができるので、横仕切部材721に内側切欠きを設けなくてもよい。また、横仕切部材722~724についても、横仕切部材721と同様であってよい。 In the seventh embodiment of the heat treatment apparatus 1G, the horizontal partition members 721 to 724 are described as having an annular plate shape, but the present invention is not limited to this. For example, at least one of the horizontal partition members 721 to 724 may be divided into a plurality of pieces in the circumferential direction of the treatment vessel 10. As an example, as shown in FIG. 20, the horizontal partition member 721 may include two divided pieces 721a and 721b having a semi-annular plate shape. In this case, when the horizontal partition member 721 is attached to the lowermost convex parts 731 to 734, it can be attached from the side of the outer tube 12 without attaching it from above the convex parts 731 to 734, so that it is not necessary to provide an inner notch in the horizontal partition member 721. In addition, the horizontal partition members 722 to 724 may be similar to the horizontal partition member 721.

〔第8の実施形態〕
図21及び図22を参照し、第8の実施形態の熱処理装置1Hの一例について説明する。なお、図21及び図22では、外管及び仕切構造体を除く構成の図示を省略している。
Eighth embodiment
An example of a heat treatment apparatus 1H according to an eighth embodiment will be described with reference to Fig. 21 and Fig. 22. Note that in Fig. 21 and Fig. 22, illustration of components other than an outer tube and a partition structure is omitted.

第8の実施形態の熱処理装置1Hは、仕切構造体700に代えて、仕切構造体800を有する点で、熱処理装置1Gと異なる。なお、その他の構成については、熱処理装置1Gと同じである。以下、熱処理装置1Gと異なる点を中心に説明する。 The heat treatment apparatus 1H of the eighth embodiment differs from the heat treatment apparatus 1G in that it has a partition structure 800 instead of the partition structure 700. The rest of the configuration is the same as that of the heat treatment apparatus 1G. The following will focus on the differences from the heat treatment apparatus 1G.

仕切構造体800は、空間Sに設けられる。仕切構造体800は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体800は、縦仕切部材811~814、横仕切部材821~824、凸部831~834等を含む。 The partition structure 800 is provided in the space S. The partition structure 800 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 800 includes vertical partition members 811-814, horizontal partition members 821-824, protrusions 831-834, and the like.

縦仕切部材811~814は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材811~814は、横仕切部材821~824に着脱自在に取り付けられる。各縦仕切部材811~814は、上下方向に延在して空間Sを仕切る。 The vertical partition members 811-814 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 811-814 is detachably attached to the horizontal partition members 821-824. Each of the vertical partition members 811-814 extends in the vertical direction to divide the space S.

縦仕切部材811は分割片811a~811cを含み、縦仕切部材812は分割片812a~812cを含み、縦仕切部材813は分割片813a~813cを含み、縦仕切部材814は分割片814a~814cを含む。分割片811a~814aは、横仕切部材821と横仕切部材822との間に取り付けられる。分割片811b~814bは、横仕切部材822と横仕切部材823との間に取り付けられる。分割片811c~814cは、横仕切部材823と横仕切部材824との間に取り付けられる。 Vertical partition member 811 includes segments 811a to 811c, vertical partition member 812 includes segments 812a to 812c, vertical partition member 813 includes segments 813a to 813c, and vertical partition member 814 includes segments 814a to 814c. Segments 811a to 814a are attached between horizontal partition members 821 and 822. Segments 811b to 814b are attached between horizontal partition members 822 and 823. Segments 811c to 814c are attached between horizontal partition members 823 and 824.

分割片811a~811cは、脚部811a~811c、接続部811a~811c及び腕部811a~811cを含む。分割片812a~812cは、脚部812a~812c、接続部812a~812c及び腕部812a~812cを含む。分割片813a~813cは、脚部812a~812c、接続部812a~812c及び腕部812a~812cを含む。分割片814a~814cは、脚部814a~814c、接続部814a~814c及び腕部814a~814cを含む。 The segments 811a to 811c include legs 811a1 to 811c1 , connecting portions 811a2 to 811c2 , and arms 811a3 to 811c3 . The segments 812a to 812c include legs 812a1 to 812c1 , connecting portions 812a2 to 812c2, and arms 812a3 to 812c3 . The segments 813a to 813c include legs 812a1 to 812c1 , connecting portions 812a2 to 812c2 , and arms 812a3 to 812c3 . The divided pieces 814a to 814c include leg portions 814a 1 to 814c 1 , connection portions 814a 2 to 814c 2 , and arm portions 814a 3 to 814c 3 .

脚部811a~814aは、横仕切部材821と同じ曲率の円弧板状を有し、横仕切部材821上に載置される。接続部811a~814aは、矩形板状を有し、脚部811a~814aと腕部811a~814aとを接続する。腕部811a~814aは、横仕切部材822と同じ曲率の円弧板状を有し、上面で横仕切部材822を支持する。 The legs 811a1 to 814a1 have an arc-shaped plate shape with the same curvature as the horizontal partition member 821, and are placed on the horizontal partition member 821. The connecting portions 811a2 to 814a2 have a rectangular plate shape, and connect the legs 811a1 to 814a1 and the arms 811a3 to 814a3 . The arms 811a3 to 814a3 have an arc-shaped plate shape with the same curvature as the horizontal partition member 822, and support the horizontal partition member 822 on their upper surfaces.

脚部811b~814bは、横仕切部材822と同じ曲率の円弧板状を有し、横仕切部材822上に載置される。接続部811b~814bは、矩形板状を有し、脚部811b~814bと腕部811b~814bとを接続する。腕部811b~814bは、横仕切部材823と同じ曲率の円弧板状を有し、上面で横仕切部材823を支持する。 The legs 811b 1 to 814b 1 have an arc plate shape with the same curvature as the horizontal partition member 822, and are placed on the horizontal partition member 822. The connecting portions 811b 2 to 814b 2 have a rectangular plate shape, and connect the legs 811b 1 to 814b 1 to the arm portions 811b 3 to 814b 3. The arm portions 811b 3 to 814b 3 have an arc plate shape with the same curvature as the horizontal partition member 823, and support the horizontal partition member 823 on their upper surfaces.

脚部811c~814cは、横仕切部材823と同じ曲率の円弧板状を有し、横仕切部材823上に載置される。接続部811c~814cは、矩形板状を有し、脚部811c~814cと腕部811c~814cとを接続する。腕部811c~814cは、横仕切部材824と同じ曲率の円弧板状を有し、上面で横仕切部材824を支持する。 The legs 811c1 to 814c1 have an arc plate shape with the same curvature as the horizontal partition member 823, and are placed on the horizontal partition member 823. The connecting portions 811c2 to 814c2 have a rectangular plate shape, and connect the legs 811c1 to 814c1 to the arm portions 811c3 to 814c3 . The arm portions 811c3 to 814c3 have an arc plate shape with the same curvature as the horizontal partition member 824, and support the horizontal partition member 824 on their upper surfaces.

横仕切部材821~824は、上下方向に間隔をおいて設けられる。各横仕切部材821~824は、隣接する加熱領域の境界に設けられる。各横仕切部材821~824は、水平方向に延在して空間Sを仕切る。各横仕切部材821~824は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材821~824には、切欠き821n~824nが形成されている。 The horizontal partition members 821-824 are spaced apart in the vertical direction. Each of the horizontal partition members 821-824 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 821-824 extends in the horizontal direction to separate the space S. Each of the horizontal partition members 821-824 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. Each of the horizontal partition members 821-824 has a notch 821n-824n formed therein.

切欠き821n~824nは、横仕切部材821~824の内周部分に形成されている。横仕切部材821は、切欠き821nと凸部831~834の位置を合わせた状態(図22)で下方に移動させ、最下部の凸部831~834の上面の高さ位置で回転させることで、最下部の凸部831~834上に取り付けられる(図21)。横仕切部材822は、切欠き822nと凸部831~834の位置を合わせた状態(図22)で下方に移動させ、下から2段目の凸部831~834の上面の高さ位置で回転させることで、下から2段目の凸部831~834上に取り付けられる(図21)。横仕切部材823は、切欠き823nと凸部831~834の位置を合わせた状態(図22)で下方に移動させ、下から3段目の凸部831~834の上面の高さ位置で回転させることで、下から3段目の凸部831~834上に取り付けられる(図21)。横仕切部材824は、切欠き824nと凸部831~834の位置を合わせた状態(図22)で下方に移動させ、最上部の凸部831~834の上面の高さ位置で回転させることで、最上部の凸部831~834上に取り付けられる(図21)。このように、横仕切部材821~824は、凸部831~834上に着脱自在に取り付けられる。 The notches 821n to 824n are formed on the inner periphery of the horizontal partition members 821 to 824. The horizontal partition member 821 is attached to the bottommost convex portion 831 to 834 by moving it downward with the notch 821n and the convex portions 831 to 834 aligned (FIG. 22) and rotating it at the height of the top surface of the bottommost convex portion 831 to 834 (FIG. 21). The horizontal partition member 822 is attached to the second-lowest convex portion 831 to 834 by moving it downward with the notch 822n and the convex portions 831 to 834 aligned (FIG. 22) and rotating it at the height of the top surface of the second-lowest convex portion 831 to 834 (FIG. 21). The horizontal partition member 823 is attached onto the third protrusion 831-834 from the bottom by moving it downward with the notch 823n aligned with the protrusions 831-834 (FIG. 22) and rotating it at the height of the upper surfaces of the third protrusion 831-834 from the bottom (FIG. 21). The horizontal partition member 824 is attached onto the topmost protrusion 831-834 by moving it downward with the notch 824n aligned with the protrusions 831-834 (FIG. 22) and rotating it at the height of the upper surfaces of the topmost protrusion 831-834 (FIG. 21). In this way, the horizontal partition members 821-824 are detachably attached onto the protrusions 831-834.

凸部831~834は、第7の実施形態の凸部731~734と同じ構成であってよい。 The convex portions 831 to 834 may have the same configuration as the convex portions 731 to 734 in the seventh embodiment.

以上に説明したように、第8の実施形態の熱処理装置1Hは、上下方向に延在して空間Sを仕切る複数の縦仕切部材811~814と、水平方向に延在して空間Sを仕切る複数の横仕切部材821~824とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1H of the eighth embodiment has a plurality of vertical partition members 811-814 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 821-824 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

なお、第8の実施形態の熱処理装置1Hでは、分割片が脚部、接続部及び腕部を含む場合を説明したが、これに限定されない。例えば、図23に示されるように、分割片811aは脚部811a及び接続部811aを有し、腕部811aを有していない構成であってもよい。また、分割片811b~811c,812a~812c,813a~813c,814a~814cについても、分割片811aと同じ構成であってよい。また、分割片に含まれる脚部、接続部及び腕部は別体で形成されていてもよく、一体で形成されていてもよい。 In the heat treatment device 1H of the eighth embodiment, the divided pieces include legs, connecting parts, and arms, but the present invention is not limited to this. For example, as shown in FIG. 23 , the divided pieces 811a may have legs 811a1 and connecting parts 811a2 , but may not have arms 811a3 . The divided pieces 811b to 811c, 812a to 812c, 813a to 813c, and 814a to 814c may have the same configuration as the divided piece 811a. The legs, connecting parts, and arms included in the divided pieces may be formed separately or integrally.

〔第9の実施形態〕
図24及び図25を参照し、第9の実施形態の熱処理装置1Iの一例について説明する。なお、図24及び図25では、外管及び仕切構造体を除く構成の図示を省略している。
Ninth embodiment
An example of a heat treatment apparatus 1I according to the ninth embodiment will be described with reference to Fig. 24 and Fig. 25. Note that in Fig. 24 and Fig. 25, illustration of the configuration other than the outer tube and the partition structure is omitted.

第9の実施形態の熱処理装置1Iは、仕切構造体700に代えて、仕切構造体900を有する点で、熱処理装置1Gと異なる。なお、その他の構成については、熱処理装置1Gと同じである。以下、熱処理装置1Gと異なる点を中心に説明する。 The heat treatment apparatus 1I of the ninth embodiment differs from the heat treatment apparatus 1G in that it has a partition structure 900 instead of the partition structure 700. The rest of the configuration is the same as that of the heat treatment apparatus 1G. The following description will focus on the differences from the heat treatment apparatus 1G.

仕切構造体900は、空間Sに設けられる。仕切構造体900は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体900は、縦仕切部材911~914、横仕切部材921~924、凸部931~934等を含む。 The partition structure 900 is provided in the space S. The partition structure 900 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 900 includes vertical partition members 911-914, horizontal partition members 921-924, protrusions 931-934, and the like.

縦仕切部材911~914は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材911~914は、横仕切部材921~924に着脱自在に取り付けられる。各縦仕切部材911~914は、上下方向に延在して空間Sを仕切る。 The vertical partition members 911-914 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 911-914 is detachably attached to the horizontal partition members 921-924. Each of the vertical partition members 911-914 extends in the vertical direction to divide the space S.

縦仕切部材911は分割片911a~911cを含み、縦仕切部材912は分割片912a~912cを含み、縦仕切部材913は分割片913a~913cを含み、縦仕切部材914は分割片914a~914cを含む。分割片911a~914aは、横仕切部材921と横仕切部材922との間に取り付けられる。分割片911b~914bは、横仕切部材922と横仕切部材923との間に取り付けられる。分割片911c~914cは、横仕切部材923と横仕切部材924との間に取り付けられる。 Vertical partition member 911 includes segments 911a to 911c, vertical partition member 912 includes segments 912a to 912c, vertical partition member 913 includes segments 913a to 913c, and vertical partition member 914 includes segments 914a to 914c. Segments 911a to 914a are attached between horizontal partition members 921 and 922. Segments 911b to 914b are attached between horizontal partition members 922 and 923. Segments 911c to 914c are attached between horizontal partition members 923 and 924.

横仕切部材921~924は、上下方向に間隔をおいて設けられる。各横仕切部材921~924は、隣接する加熱領域の境界に設けられる。各横仕切部材921~924は、水平方向に延在して空間Sを仕切る。各横仕切部材921~924は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。各横仕切部材921~924には、切欠き921n~924n及びガイド部921g~923gが形成されている。 The horizontal partition members 921-924 are spaced apart in the vertical direction. Each of the horizontal partition members 921-924 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 921-924 extends horizontally to separate the space S. Each of the horizontal partition members 921-924 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. Each of the horizontal partition members 921-924 has notches 921n-924n and guide portions 921g-923g formed therein.

切欠き921n~924nは、横仕切部材921~924の内周部分に形成されている。横仕切部材921は、切欠き921nと凸部931~934の位置を合わせた状態(図25)で下方に移動させ、最下部の凸部931~934の上面の高さ位置で回転させることで、最下部の凸部931~934上に取り付けられる(図24)。横仕切部材922は、切欠き922nと凸部931~934の位置を合わせた状態(図25)で下方に移動させ、下から2段目の凸部931~934の上面の高さ位置で回転させることで、下から2段目の凸部931~934上に取り付けられる(図24)。横仕切部材923は、切欠き923nと凸部931~934の位置を合わせた状態(図25)で下方に移動させ、下から3段目の凸部931~934の上面の高さ位置で回転させることで、下から3段目の凸部931~934上に取り付けられる(図24)。横仕切部材924は、切欠き924nと凸部931~934の位置を合わせた状態(図25)で下方に移動させ、最上部の凸部931~934の上面の高さ位置で回転させることで、最上部の凸部931~934上に取り付けられる(図24)。このように、横仕切部材921~924は、凸部931~934上に着脱自在に取り付けられる。 The notches 921n to 924n are formed on the inner periphery of the horizontal partition members 921 to 924. The horizontal partition member 921 is attached to the bottommost convex portion 931 to 934 by moving it downward with the notches 921n and the convex portions 931 to 934 aligned (FIG. 25) and rotating it at the height of the top surface of the bottommost convex portion 931 to 934 (FIG. 24). The horizontal partition member 922 is attached to the second-lowest convex portion 931 to 934 by moving it downward with the notches 922n and the convex portions 931 to 934 aligned (FIG. 25) and rotating it at the height of the top surface of the second-lowest convex portion 931 to 934 (FIG. 24). The horizontal partition member 923 is attached onto the third protrusion 931-934 from the bottom by moving it downward with the notch 923n aligned with the protrusions 931-934 (FIG. 25) and rotating it at the height of the upper surfaces of the third protrusion 931-934 from the bottom (FIG. 24). The horizontal partition member 924 is attached onto the topmost protrusion 931-934 by moving it downward with the notch 924n aligned with the protrusions 931-934 (FIG. 25) and rotating it at the height of the upper surfaces of the topmost protrusion 931-934 (FIG. 24). In this way, the horizontal partition members 921-924 are detachably attached onto the protrusions 931-934.

ガイド部921g~923gは、横仕切部材921~924に固定され、隣接する横仕切部材921~924間において縦仕切部材911~914を保持する。ガイド部921gは、横仕切部材921の上面に固定された下ガイド921g及び横仕切部材921の下面に固定された上ガイド921gを含み、横仕切部材921と横仕切部材922との間に分割片911a~914aを保持する。ガイド部922gは、横仕切部材922の上面に固定された下ガイド922g及び横仕切部材923の下面に固定された上ガイド922gを含み、横仕切部材922と横仕切部材923との間に分割片911b~914bを保持する。ガイド部923gは、横仕切部材923の上面に固定された下ガイド923g及び横仕切部材924の下面に固定された上ガイド923gを含み、横仕切部材923と横仕切部材924との間に分割片911c~914cを保持する。 The guide portions 921g to 923g are fixed to the horizontal partition members 921 to 924, and hold the vertical partition members 911 to 914 between the adjacent horizontal partition members 921 to 924. The guide portion 921g includes a lower guide 921g1 fixed to the upper surface of the horizontal partition member 921 and an upper guide 921g2 fixed to the lower surface of the horizontal partition member 921, and holds the divided pieces 911a to 914a between the horizontal partition members 921 and 922. The guide portion 922g includes a lower guide 922g1 fixed to the upper surface of the horizontal partition member 922 and an upper guide 922g2 fixed to the lower surface of the horizontal partition member 923, and holds the divided pieces 911b to 914b between the horizontal partition members 922 and 923. The guide portion 923g includes a lower guide 923g1 fixed to the upper surface of the horizontal partition member 923 and an upper guide 923g2 fixed to the lower surface of the horizontal partition member 924, and holds the divided pieces 911c to 914c between the horizontal partition members 923 and 924.

凸部931~934は、第7の実施形態の凸部731~734と同じ構成であってよい。 The convex portions 931 to 934 may have the same configuration as the convex portions 731 to 734 in the seventh embodiment.

以上に説明したように、第9の実施形態の熱処理装置1Iは、上下方向に延在して空間Sを仕切る複数の縦仕切部材911~914と、水平方向に延在して空間Sを仕切る複数の横仕切部材921~924とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1I of the ninth embodiment has a plurality of vertical partition members 911-914 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 921-924 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第10の実施形態〕
図26を参照し、第10の実施形態の熱処理装置1Jの一例について説明する。なお、図26では、仕切構造体を除く構成の図示を省略している。
Tenth embodiment
An example of a heat treatment apparatus 1J according to the tenth embodiment will be described with reference to Fig. 26. Note that in Fig. 26, illustration of the configuration other than the partition structure is omitted.

第10の実施形態の熱処理装置1Jは、仕切構造体100に代えて、仕切構造体1000を有する点で、熱処理装置1Aと異なる。なお、その他の構成については、熱処理装置1Aと同じである。以下、熱処理装置1Aと異なる点を中心に説明する。 The heat treatment apparatus 1J of the tenth embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 1000 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

仕切構造体1000は、空間Sに設けられる。仕切構造体1000は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体1000は、縦仕切部材1011~1014、横仕切部材1021~1024、上部仕切部材1031~1034等を含む。 The partition structure 1000 is provided in the space S. The partition structure 1000 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 1000 includes vertical partition members 1011-1014, horizontal partition members 1021-1024, upper partition members 1031-1034, and the like.

縦仕切部材1011~1014は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材1011~1014は、横仕切部材1021~1024に取り付けられる。各縦仕切部材1011~1014は、上下方向に延在して空間Sを仕切る。 The vertical partition members 1011-1014 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 1011-1014 is attached to a horizontal partition member 1021-1024. Each of the vertical partition members 1011-1014 extends in the vertical direction to divide the space S.

横仕切部材1021~1024は、上下方向に間隔をおいて設けられる。各横仕切部材1021~1024は、隣接する加熱領域の境界に設けられる。各横仕切部材1021~1024は、水平方向に延在して空間Sを仕切る。各横仕切部材1021~1024は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。 The horizontal partition members 1021-1024 are spaced apart in the vertical direction. Each of the horizontal partition members 1021-1024 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1021-1024 extends in the horizontal direction to separate the space S. Each of the horizontal partition members 1021-1024 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51.

上部仕切部材1031~1034は、外管12の天井部と断熱部材51の天井部との間に、処理容器10の周方向に間隔をおいて設けられる。各上部仕切部材1031~1034は、外管12の径方向に延在し、外管12の天井部と断熱部材51の天井部との間の空間Sを仕切る。各上部仕切部材1031~1034は、例えば横仕切部材1024の上面に取り付けられる。 The upper partition members 1031-1034 are provided at intervals in the circumferential direction of the processing vessel 10 between the ceiling of the outer pipe 12 and the ceiling of the insulating member 51. Each of the upper partition members 1031-1034 extends in the radial direction of the outer pipe 12 and separates the space S between the ceiling of the outer pipe 12 and the ceiling of the insulating member 51. Each of the upper partition members 1031-1034 is attached to the upper surface of the horizontal partition member 1024, for example.

以上に説明したように、第10の実施形態の熱処理装置1Jは、上下方向に延在して空間Sを仕切る複数の縦仕切部材1011~1014と、水平方向に延在して空間Sを仕切る複数の横仕切部材1021~1024とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1J of the tenth embodiment has a plurality of vertical partition members 1011-1014 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 1021-1024 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

また、第10の実施形態の熱処理装置1Jは、外管12の径方向に延在し、外管12の天井部と断熱部材51の天井部との間の空間Sを仕切る上部仕切部材1031~1034を有する。これにより、外管12の天井部と断熱部材51の天井部との間の空間S内において、処理容器10の周方向で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきをより低減できる。 The heat treatment apparatus 1J of the tenth embodiment also has upper partition members 1031-1034 that extend radially of the outer tube 12 and partition the space S between the ceiling of the outer tube 12 and the ceiling of the insulating member 51. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S between the ceiling of the outer tube 12 and the ceiling of the insulating member 51. As a result, the temperature variation within the processing vessel 10 can be further reduced.

〔第11の実施形態〕
図27を参照し、第11の実施形態の熱処理装置1Kの一例について説明する。なお、図27では、外管及び仕切構造体を除く構成の図示を省略している。
Eleventh embodiment
An example of a heat treatment apparatus 1K according to the eleventh embodiment will be described with reference to Fig. 27. Note that in Fig. 27, configurations other than the outer tube and the partition structure are omitted from illustration.

第11の実施形態の熱処理装置1Kは、仕切構造体100に代えて、仕切構造体1100を有する点で、熱処理装置1Aと異なる。なお、その他の構成については、熱処理装置1Aと同じである。以下、熱処理装置1Aと異なる点を中心に説明する。 The heat treatment apparatus 1K of the eleventh embodiment differs from the heat treatment apparatus 1A in that it has a partition structure 1100 instead of the partition structure 100. The rest of the configuration is the same as that of the heat treatment apparatus 1A. The following description will focus on the differences from the heat treatment apparatus 1A.

仕切構造体1100は、空間Sに設けられる。仕切構造体1100は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体1100は、縦仕切部材1111~1114、横仕切部材1121~1123、凸部1130、吊下げ部1140等を含む。 The partition structure 1100 is provided in the space S. The partition structure 1100 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 1100 includes vertical partition members 1111-1114, horizontal partition members 1121-1123, a convex portion 1130, a hanging portion 1140, and the like.

縦仕切部材1111~1114は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材1111~1114は、上下方向に延在して空間Sを仕切る。 The vertical partition members 1111-1114 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 1111-1114 extends in the vertical direction to separate the space S.

横仕切部材1121~1123は、上下方向に間隔をおいて設けられる。各横仕切部材1121~1123は、隣接する加熱領域の境界に設けられる。各横仕切部材1121~1123は、水平方向に延在して空間Sを仕切る。各横仕切部材1121~1123は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。横仕切部材1121~1123は、縦仕切部材1111~1114と一体で形成されている。 The horizontal partition members 1121-1123 are spaced apart in the vertical direction. Each of the horizontal partition members 1121-1123 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1121-1123 extends horizontally to separate the space S. Each of the horizontal partition members 1121-1123 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51. The horizontal partition members 1121-1123 are formed integrally with the vertical partition members 1111-1114.

凸部1130は、外管12の頭頂部に取り付けられている。凸部1130は、例えば上下方向を軸方向とする円柱形状を有する。ただし、凸部1130は、直方体形状を有していてもよい。 The protrusion 1130 is attached to the top of the outer tube 12. The protrusion 1130 has, for example, a cylindrical shape with the axial direction being the up-down direction. However, the protrusion 1130 may also have a rectangular parallelepiped shape.

吊下げ部1140は、一端が凸部1130に取り付けられ、他端が縦仕切部材1111~1114に取り付けられており、凸部1130に対して縦仕切部材1111~1114を吊り下げた状態で保持する。 The hanging portion 1140 has one end attached to the convex portion 1130 and the other end attached to the vertical partition members 1111-1114, and holds the vertical partition members 1111-1114 in a suspended state relative to the convex portion 1130.

以上に説明したように、第11の実施形態の熱処理装置1Kは、上下方向に延在して空間Sを仕切る複数の縦仕切部材1111~1114と、水平方向に延在して空間Sを仕切る複数の横仕切部材1121~1123とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1K of the eleventh embodiment has a plurality of vertical partition members 1111-1114 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 1121-1123 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第12の実施形態〕
図28を参照し、第12の実施形態の熱処理装置1Lの一例について説明する。なお、図28では、外管及び仕切構造体を除く構成の図示を省略している。
[Twelfth embodiment]
An example of a heat treatment apparatus 1L according to the twelfth embodiment will be described with reference to Fig. 28. Note that in Fig. 28, configurations other than the outer tube and the partition structure are omitted from illustration.

第12の実施形態の熱処理装置1Lは、仕切構造体1100に代えて、仕切構造体1200を有する点で、熱処理装置1Kと異なる。なお、その他の構成については、熱処理装置1Kと同じである。以下、熱処理装置1Kと異なる点を中心に説明する。 The heat treatment apparatus 1L of the twelfth embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1200 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following description will focus on the differences from the heat treatment apparatus 1K.

仕切構造体1200は、空間Sに設けられる。仕切構造体1200は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体1200は、縦仕切部材1211~1214、横仕切部材1221~1223、吊下げ部1231~1234等を含む。 The partition structure 1200 is provided in the space S. The partition structure 1200 is formed of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 1200 includes vertical partition members 1211-1214, horizontal partition members 1221-1223, hanging portions 1231-1234, and the like.

縦仕切部材1211~1214は、第11の実施形態の縦仕切部材1111~1114と同じ構成であってよい。 The vertical partition members 1211 to 1214 may have the same configuration as the vertical partition members 1111 to 1114 in the eleventh embodiment.

横仕切部材1221~1223は、第11の実施形態の横仕切部材1121~1123と同じ構成であってよい。 The horizontal partition members 1221 to 1223 may have the same configuration as the horizontal partition members 1121 to 1123 in the eleventh embodiment.

吊下げ部1231~1234は、一端が断熱部材51の天井部に取り付けられ、他端が縦仕切部材1211~1214の上端に取り付けられており、断熱部材51に対して縦仕切部材1211~1214を吊り下げた状態で保持する。 The hanging parts 1231 to 1234 have one end attached to the ceiling of the insulation member 51 and the other end attached to the upper ends of the vertical partition members 1211 to 1214, and hold the vertical partition members 1211 to 1214 in a suspended state relative to the insulation member 51.

以上に説明したように、第12の実施形態の熱処理装置1Kは、上下方向に延在して空間Sを仕切る複数の縦仕切部材1211~1214と、水平方向に延在して空間Sを仕切る複数の横仕切部材1221~1223とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1K of the twelfth embodiment has a plurality of vertical partition members 1211-1214 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 1221-1223 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第13の実施形態〕
図29を参照し、第13の実施形態の熱処理装置1Mの一例について説明する。なお、図29では、外管及び仕切構造体を除く構成の図示を省略している。
Thirteenth embodiment
An example of a heat treatment apparatus 1M according to the thirteenth embodiment will be described with reference to Fig. 29. Note that in Fig. 29, illustration of components other than the outer tube and the partition structure is omitted.

第13の実施形態の熱処理装置1Mは、仕切構造体1100に代えて、仕切構造体1300を有する点で、熱処理装置1Kと異なる。なお、その他の構成については、熱処理装置1Kと同じである。以下、熱処理装置1Kと異なる点を中心に説明する。 The heat treatment apparatus 1M of the thirteenth embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1300 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following description will focus on the differences from the heat treatment apparatus 1K.

仕切構造体1300は、空間Sに設けられる。仕切構造体1300は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体1300は、縦仕切部材1311~1314、横仕切部材1321~1323等を含む。 The partition structure 1300 is provided in the space S. The partition structure 1300 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 1300 includes vertical partition members 1311-1314, horizontal partition members 1321-1323, and the like.

縦仕切部材1311~1314は、第11の実施形態の縦仕切部材1111~1114と同じ構成であってよい。 The vertical partition members 1311 to 1314 may have the same configuration as the vertical partition members 1111 to 1114 in the eleventh embodiment.

横仕切部材1321~1323は、第11の実施形態の横仕切部材1121~1123と同じ構成であってよい。横仕切部材1321~1323は、下端がマニホールド13上に載置される。 The horizontal partition members 1321 to 1323 may have the same configuration as the horizontal partition members 1121 to 1123 of the eleventh embodiment. The lower ends of the horizontal partition members 1321 to 1323 are placed on the manifold 13.

以上に説明したように、第13の実施形態の熱処理装置1Kは、上下方向に延在して空間Sを仕切る複数の縦仕切部材1311~1314と、水平方向に延在して空間Sを仕切る複数の横仕切部材1321~1323とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1K of the thirteenth embodiment has a plurality of vertical partition members 1311-1314 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 1321-1323 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

〔第14の実施形態〕
図30を参照し、第14の実施形態の熱処理装置1Nの一例について説明する。なお、図30では、外管及び仕切構造体を除く構成の図示を省略している。
Fourteenth embodiment
An example of a heat treatment apparatus 1N according to a fourteenth embodiment will be described with reference to Fig. 30. Note that in Fig. 30, configurations other than the outer tube and the partition structure are omitted.

第14の実施形態の熱処理装置1Nは、仕切構造体1100に代えて、仕切構造体1400を有する点で、熱処理装置1Kと異なる。なお、その他の構成については、熱処理装置1Kと同じである。以下、熱処理装置1Kと異なる点を中心に説明する。 The heat treatment apparatus 1N of the 14th embodiment differs from the heat treatment apparatus 1K in that it has a partition structure 1400 instead of the partition structure 1100. The rest of the configuration is the same as that of the heat treatment apparatus 1K. The following will focus on the differences from the heat treatment apparatus 1K.

仕切構造体1400は、空間Sに設けられる。仕切構造体1400は、耐熱材料、例えばAl、AlN等のセラミックス材料や石英により形成される。仕切構造体1400は、縦仕切部材1411~1414、横仕切部材1421~1423等を含む。 The partition structure 1400 is provided in the space S. The partition structure 1400 is made of a heat-resistant material, for example, a ceramic material such as Al 2 O 3 or AlN, or quartz. The partition structure 1400 includes vertical partition members 1411 to 1414, horizontal partition members 1421 to 1423, and the like.

縦仕切部材1411~1414は、処理容器10の周方向に間隔をおいて設けられる。各縦仕切部材1411~1414は、上下方向に延在して空間Sを仕切る。 The vertical partition members 1411 to 1414 are spaced apart in the circumferential direction of the processing vessel 10. Each of the vertical partition members 1411 to 1414 extends in the vertical direction to separate the space S.

横仕切部材1421~1423は、上下方向に間隔をおいて設けられる。各横仕切部材1421~1423は、隣接する加熱領域の境界に設けられる。各横仕切部材1421~1423は、水平方向に延在して空間Sを仕切る。各横仕切部材1421~1423は、円環板状を有し、中心が外管12の中心と同じであり、内径が外管12の外径と略同じであり、外径が断熱部材51の内径よりも僅かに小さい。 The horizontal partition members 1421-1423 are spaced apart in the vertical direction. Each of the horizontal partition members 1421-1423 is provided at the boundary between adjacent heating regions. Each of the horizontal partition members 1421-1423 extends in the horizontal direction to separate the space S. Each of the horizontal partition members 1421-1423 has an annular plate shape, a center coincident with the center of the outer tube 12, an inner diameter approximately the same as the outer diameter of the outer tube 12, and an outer diameter slightly smaller than the inner diameter of the insulating member 51.

また、縦仕切部材1411~1414と横仕切部材1421~1423とは一体で形成され、外管12の外周壁に固定されている。なお、縦仕切部材1411~1414及び横仕切部材1421~1423は、外管12と一体で形成されていてもよい。 The vertical partition members 1411-1414 and the horizontal partition members 1421-1423 are formed integrally and fixed to the outer peripheral wall of the outer tube 12. The vertical partition members 1411-1414 and the horizontal partition members 1421-1423 may be formed integrally with the outer tube 12.

以上に説明したように、第14の実施形態の熱処理装置1Nは、上下方向に延在して空間Sを仕切る複数の縦仕切部材1411~1414と、水平方向に延在して空間Sを仕切る複数の横仕切部材1421~1423とを有する。これにより、空間S内において、処理容器10の周方向で対流が生じることを抑制でき、また異なる加熱領域の間で対流が生じることを抑制できる。その結果、処理容器10内の温度ばらつきを低減できる。 As described above, the heat treatment apparatus 1N of the 14th embodiment has a plurality of vertical partition members 1411-1414 that extend in the vertical direction and divide the space S, and a plurality of horizontal partition members 1421-1423 that extend in the horizontal direction and divide the space S. This makes it possible to suppress the occurrence of convection in the circumferential direction of the processing vessel 10 within the space S, and also to suppress the occurrence of convection between different heating regions. As a result, the temperature variation within the processing vessel 10 can be reduced.

なお、上記の実施形態において、縦仕切部材111~114,211~214,311~314,411~414,511~514,611~614,711~714,811~814,911~914,1011~1014,1111~1114,1211~1214,1311~1314,1411~1414は、第1の仕切部材の一例である。 In the above embodiment, the vertical partition members 111-114, 211-214, 311-314, 411-414, 511-514, 611-614, 711-714, 811-814, 911-914, 1011-1014, 1111-1114, 1211-1214, 1311-1314, and 1411-1414 are examples of first partition members.

また、上記の実施形態において、横仕切部材121~124,221~224,321~323,421~423,521~523,621~623,721~724,821~824,921~924,1021~1024,1121~1123,1221~1223,1321~1323,1421~1423は、第2の仕切部材の一例である。 In addition, in the above embodiment, horizontal partition members 121-124, 221-224, 321-323, 421-423, 521-523, 621-623, 721-724, 821-824, 921-924, 1021-1024, 1121-1123, 1221-1223, 1321-1323, and 1421-1423 are examples of second partition members.

また、上記の実施形態において、上部仕切部材1031~1034は、第3の仕切部材の一例である。 In addition, in the above embodiment, the upper partition members 1031 to 1034 are an example of a third partition member.

今回開示された実施形態はすべての点で例示であって制限的なものではないと考えられるべきである。上記の実施形態は、添付の請求の範囲及びその趣旨を逸脱することなく、様々な形態で省略、置換、変更されてもよい。 The embodiments disclosed herein should be considered in all respects as illustrative and not restrictive. The above-described embodiments may be omitted, substituted, or modified in various ways without departing from the scope and spirit of the appended claims.

なお、上記の実施形態では、仕切構造体が4つの縦仕切部材を含む場合を説明したが、本開示はこれに限定されない。例えば、仕切構造体は、2つ又は3つの縦仕切部材を含む構成であってもよく、5つ以上の縦仕切部材を含む構成であってもよい。 In the above embodiment, the partition structure includes four vertical partition members, but the present disclosure is not limited to this. For example, the partition structure may include two or three vertical partition members, or may include five or more vertical partition members.

また、上記の実施形態では、仕切構造体が3つ又は4つの横仕切部材を含む場合を説明したが、本開示はこれに限定されない。例えば、仕切構造体は、2つの横仕切部材を含む構成であってもよく、5つ以上の横仕切部材を含む構成であってもよい。 In addition, in the above embodiment, the partition structure includes three or four horizontal partition members, but the present disclosure is not limited to this. For example, the partition structure may include two horizontal partition members, or may include five or more horizontal partition members.

1A~1N 熱処理装置
10 処理容器
51 断熱部材
53 発熱体
100 仕切構造体
111~114 縦仕切部材
121~124 横仕切部材
S 空間
1A to 1N Heat treatment apparatus 10 Treatment vessel 51 Heat insulating member 53 Heat generating element 100 Partition structure 111 to 114 Vertical partition members 121 to 124 Horizontal partition members S Space

Claims (16)

筒状の処理容器と、
前記処理容器の周囲に空間を隔てて設けられる断熱部材と、
前記断熱部材の内周側に設けられる発熱体と、
前記空間に設けられる仕切構造体と、
を有し、
前記仕切構造体は、
前記処理容器の長手方向に延在して前記空間を仕切る複数の第1の仕切部材と、
前記処理容器の周方向に延在して前記空間を仕切る複数の第2の仕切部材と、
を含
前記複数の第1の仕切部材は、各々が前記処理容器の長手方向に伸縮自在である、
熱処理装置。
A cylindrical processing vessel;
a heat insulating member provided around the processing vessel with a space therebetween;
A heating element provided on an inner circumferential side of the heat insulating member;
A partition structure provided in the space;
having
The partition structure includes:
a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space;
a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space;
Including ,
Each of the plurality of first partition members is extendable and contractible in a longitudinal direction of the processing vessel.
Heat treatment equipment.
筒状の処理容器と、
前記処理容器の周囲に空間を隔てて設けられる断熱部材と、
前記断熱部材の内周側に設けられる発熱体と、
前記空間に設けられる仕切構造体と、
を有し、
前記仕切構造体は、
前記処理容器の長手方向に延在して前記空間を仕切る複数の第1の仕切部材と、
前記処理容器の周方向に延在して前記空間を仕切る複数の第2の仕切部材と、
を含
前記複数の第1の仕切部材のうちの1つ以上と前記複数の第2の仕切部材のうちの1つ以上とは、一体で形成されている、
熱処理装置。
A cylindrical processing vessel;
a heat insulating member provided around the processing vessel with a space therebetween;
A heating element provided on an inner circumferential side of the heat insulating member;
A partition structure provided in the space;
having
The partition structure includes:
a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space;
a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space;
Including ,
One or more of the plurality of first partition members and one or more of the plurality of second partition members are integrally formed.
Heat treatment equipment.
一端が閉塞した筒状の処理容器と、
前記処理容器の周囲に空間を隔てて設けられる断熱部材と、
前記断熱部材の内周側に設けられる発熱体と、
前記空間に設けられる仕切構造体と、
を有し、
前記仕切構造体は、
前記処理容器の長手方向に延在して前記空間を仕切る複数の第1の仕切部材と、
前記処理容器の周方向に延在して前記空間を仕切る複数の第2の仕切部材と、
前記処理容器の前記一端に保持される支持部材と、
を含
前記支持部材は、前記複数の第1の仕切部材と連結されている、
熱処理装置。
A cylindrical processing vessel having one end closed ;
a heat insulating member provided around the processing vessel with a space therebetween;
A heating element provided on an inner circumferential side of the heat insulating member;
A partition structure provided in the space;
having
The partition structure includes:
a plurality of first partition members extending in a longitudinal direction of the processing vessel and partitioning the space;
a plurality of second partition members extending in a circumferential direction of the processing vessel to partition the space;
a support member held at the one end of the processing vessel;
Including ,
The support member is connected to the plurality of first partition members.
Heat treatment equipment.
前記仕切構造体は、前記処理容器に着脱自在に取り付けられる、
請求項1乃至3のいずれか一項に記載の熱処理装置。
The partition structure is detachably attached to the processing vessel.
The heat treatment apparatus according to claim 1 .
前記仕切構造体は、前記処理容器と一体で形成される、
請求項に記載の熱処理装置。
The partition structure is integrally formed with the processing vessel.
The heat treatment apparatus according to claim 2 .
前記仕切構造体は、前記断熱部材に支持される、
請求項に記載の熱処理装置。
The partition structure is supported by the heat insulating member.
The heat treatment apparatus according to claim 2 .
前記複数の第1の仕切部材は、前記処理容器の周方向に間隔をおいて設けられる、
請求項1乃至のいずれか一項に記載の熱処理装置。
The plurality of first partition members are provided at intervals in a circumferential direction of the processing vessel.
The heat treatment apparatus according to claim 1 .
前記複数の第1の仕切部材は、各々が矩形板状を有する、
請求項1乃至のいずれか一項に記載の熱処理装置。
Each of the plurality of first partition members has a rectangular plate shape.
The heat treatment apparatus according to claim 1 .
前記複数の第1の仕切部材のうち少なくとも1つは、前記処理容器の長手方向において分割された複数の分割片を含む、
請求項に記載の熱処理装置。
At least one of the plurality of first partition members includes a plurality of divided pieces divided in a longitudinal direction of the processing vessel.
The heat treatment apparatus according to claim 2 .
前記複数の第1の仕切部材は、各々が前記処理容器の長手方向に伸縮自在である、
請求項に記載の熱処理装置。
Each of the plurality of first partition members is extendable and contractible in a longitudinal direction of the processing vessel.
The heat treatment device according to claim 3 .
前記複数の第2の仕切部材は、各々が円環板状を有する、
請求項1乃至10のいずれか一項に記載の熱処理装置。
Each of the plurality of second partition members has an annular plate shape.
The heat treatment apparatus according to claim 1 .
前記複数の第2の仕切部材のうち少なくとも1つは、前記処理容器の周方向において分割された複数の分割片を含む、
請求項1乃至11のいずれか一項に記載の熱処理装置。
At least one of the plurality of second partition members includes a plurality of divided pieces divided in a circumferential direction of the processing vessel.
The heat treatment apparatus according to claim 1 .
前記複数の第1の仕切部材と前記複数の第2の仕切部材とは、着脱自在に接続される、
請求項1乃至12のいずれか一項に記載の熱処理装置。
The plurality of first partition members and the plurality of second partition members are detachably connected to each other.
The heat treatment apparatus according to claim 1 .
前記仕切構造体は、前記処理容器の外周壁から突出し、前記複数の第2の仕切部材を保持する複数の凸部を含む、
請求項に記載の熱処理装置。
the partition structure includes a plurality of protrusions protruding from an outer peripheral wall of the processing vessel and holding the plurality of second partition members;
The heat treatment apparatus according to claim 2 .
前記処理容器は、一端が閉塞しており、
前記仕切構造体は、前記処理容器の前記一端と前記断熱部材との間の空間を仕切る第3の仕切部材を含む、
請求項に記載の熱処理装置。
The processing vessel has one end closed,
the partition structure includes a third partition member that partitions a space between the one end of the processing vessel and the heat insulating member.
The heat treatment apparatus according to claim 2 .
前記仕切構造体は、耐熱材料により形成される、
請求項1乃至15のいずれか一項に記載の熱処理装置。
The partition structure is formed of a heat-resistant material.
The heat treatment apparatus according to claim 1 .
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JP2012212819A (en) 2011-03-31 2012-11-01 Tokyo Electron Ltd Vertical batch-type film deposition apparatus
JP2014096453A (en) 2012-11-08 2014-05-22 Tokyo Electron Ltd Heat treatment apparatus
JP2020098808A (en) 2018-12-17 2020-06-25 東京エレクトロン株式会社 Heat treatment equipment

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